JP5991530B2 - Bisphenol derivatives - Google Patents
Bisphenol derivatives Download PDFInfo
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- JP5991530B2 JP5991530B2 JP2012242719A JP2012242719A JP5991530B2 JP 5991530 B2 JP5991530 B2 JP 5991530B2 JP 2012242719 A JP2012242719 A JP 2012242719A JP 2012242719 A JP2012242719 A JP 2012242719A JP 5991530 B2 JP5991530 B2 JP 5991530B2
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- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical class C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 title 1
- 150000001875 compounds Chemical class 0.000 claims description 95
- 239000000203 mixture Substances 0.000 claims description 56
- 239000004973 liquid crystal related substance Substances 0.000 claims description 38
- 125000004432 carbon atom Chemical group C* 0.000 claims description 21
- 125000002947 alkylene group Chemical group 0.000 claims description 15
- 230000003287 optical effect Effects 0.000 claims description 15
- 229920000642 polymer Polymers 0.000 claims description 15
- 230000000379 polymerizing effect Effects 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 9
- 239000000049 pigment Substances 0.000 claims description 3
- 239000002537 cosmetic Substances 0.000 claims description 2
- 239000004820 Pressure-sensitive adhesive Substances 0.000 claims 1
- 239000000853 adhesive Substances 0.000 claims 1
- 230000001070 adhesive effect Effects 0.000 claims 1
- 239000003905 agrochemical Substances 0.000 claims 1
- 239000000976 ink Substances 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 239000010408 film Substances 0.000 description 31
- 238000006116 polymerization reaction Methods 0.000 description 15
- 239000000758 substrate Substances 0.000 description 15
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 11
- -1 o-dichloroben Chemical compound 0.000 description 11
- 239000003112 inhibitor Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 8
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 6
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 5
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N Methyl ethyl ketone Natural products CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 230000000704 physical effect Effects 0.000 description 5
- KZMGYPLQYOPHEL-UHFFFAOYSA-N Boron trifluoride etherate Chemical compound FB(F)F.CCOCC KZMGYPLQYOPHEL-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 125000001309 chloro group Chemical group Cl* 0.000 description 4
- 230000003098 cholesteric effect Effects 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 125000001153 fluoro group Chemical group F* 0.000 description 4
- 229920001721 polyimide Polymers 0.000 description 4
- QAEDZJGFFMLHHQ-UHFFFAOYSA-N trifluoroacetic anhydride Chemical compound FC(F)(F)C(=O)OC(=O)C(F)(F)F QAEDZJGFFMLHHQ-UHFFFAOYSA-N 0.000 description 4
- 229910015900 BF3 Inorganic materials 0.000 description 3
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical group OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 239000007810 chemical reaction solvent Substances 0.000 description 3
- 125000004093 cyano group Chemical group *C#N 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000003999 initiator Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 239000003208 petroleum Substances 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 239000004986 Cholesteric liquid crystals (ChLC) Substances 0.000 description 2
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 239000004990 Smectic liquid crystal Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 239000000010 aprotic solvent Substances 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 150000008282 halocarbons Chemical class 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 2
- IVSZLXZYQVIEFR-UHFFFAOYSA-N m-xylene Chemical group CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000012788 optical film Substances 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- PGMYKACGEOXYJE-UHFFFAOYSA-N pentyl acetate Chemical compound CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- UKDOTCFNLHHKOF-FGRDZWBJSA-N (z)-1-chloroprop-1-ene;(z)-1,2-dichloroethene Chemical group C\C=C/Cl.Cl\C=C/Cl UKDOTCFNLHHKOF-FGRDZWBJSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- 125000004955 1,4-cyclohexylene group Chemical group [H]C1([H])C([H])([H])C([H])([*:1])C([H])([H])C([H])([H])C1([H])[*:2] 0.000 description 1
- VFWCMGCRMGJXDK-UHFFFAOYSA-N 1-chlorobutane Chemical compound CCCCCl VFWCMGCRMGJXDK-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- IRPGOXJVTQTAAN-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropanal Chemical compound FC(F)(F)C(F)(F)C=O IRPGOXJVTQTAAN-UHFFFAOYSA-N 0.000 description 1
- 125000005714 2,5- (1,3-dioxanylene) group Chemical group [H]C1([H])OC([H])([*:1])OC([H])([H])C1([H])[*:2] 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- SFXNZFATUMWBHR-UHFFFAOYSA-N 2-morpholin-4-yl-2-pyridin-3-ylacetonitrile Chemical compound C=1C=CN=CC=1C(C#N)N1CCOCC1 SFXNZFATUMWBHR-UHFFFAOYSA-N 0.000 description 1
- 150000004786 2-naphthols Chemical class 0.000 description 1
- JBIJLHTVPXGSAM-UHFFFAOYSA-N 2-naphthylamine Chemical class C1=CC=CC2=CC(N)=CC=C21 JBIJLHTVPXGSAM-UHFFFAOYSA-N 0.000 description 1
- JIGUICYYOYEXFS-UHFFFAOYSA-N 3-tert-butylbenzene-1,2-diol Chemical class CC(C)(C)C1=CC=CC(O)=C1O JIGUICYYOYEXFS-UHFFFAOYSA-N 0.000 description 1
- VGVHNLRUAMRIEW-UHFFFAOYSA-N 4-methylcyclohexan-1-one Chemical compound CC1CCC(=O)CC1 VGVHNLRUAMRIEW-UHFFFAOYSA-N 0.000 description 1
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminum fluoride Inorganic materials F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 description 1
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 229910021532 Calcite Inorganic materials 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- QMMFVYPAHWMCMS-UHFFFAOYSA-N Dimethyl sulfide Chemical compound CSC QMMFVYPAHWMCMS-UHFFFAOYSA-N 0.000 description 1
- 239000001293 FEMA 3089 Substances 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- 239000004988 Nematic liquid crystal Substances 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical group ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- LVZGQWKTUCVPBQ-UHFFFAOYSA-N acetic acid;trifluoroborane Chemical compound CC(O)=O.FB(F)F LVZGQWKTUCVPBQ-UHFFFAOYSA-N 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- SMZOGRDCAXLAAR-UHFFFAOYSA-N aluminium isopropoxide Chemical compound [Al+3].CC(C)[O-].CC(C)[O-].CC(C)[O-] SMZOGRDCAXLAAR-UHFFFAOYSA-N 0.000 description 1
- JPUHCPXFQIXLMW-UHFFFAOYSA-N aluminium triethoxide Chemical compound CCO[Al](OCC)OCC JPUHCPXFQIXLMW-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229940043232 butyl acetate Drugs 0.000 description 1
- QGJOPFRUJISHPQ-NJFSPNSNSA-N carbon disulfide-14c Chemical compound S=[14C]=S QGJOPFRUJISHPQ-NJFSPNSNSA-N 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000011280 coal tar Substances 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000002999 depolarising effect Effects 0.000 description 1
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 1
- ZYJCLCOFXJJJPI-UHFFFAOYSA-N dibutylboron;trifluoromethanesulfonic acid Chemical compound OS(=O)(=O)C(F)(F)F.CCCC[B]CCCC ZYJCLCOFXJJJPI-UHFFFAOYSA-N 0.000 description 1
- FBVDLYBQGQLANQ-UHFFFAOYSA-N dicyclohexylboranyl trifluoromethanesulfonate Chemical compound C1CCCCC1B(OS(=O)(=O)C(F)(F)F)C1CCCCC1 FBVDLYBQGQLANQ-UHFFFAOYSA-N 0.000 description 1
- 238000007607 die coating method Methods 0.000 description 1
- 229960004132 diethyl ether Drugs 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 229940052303 ethers for general anesthesia Drugs 0.000 description 1
- 229940093499 ethyl acetate Drugs 0.000 description 1
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000007765 extrusion coating Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000003349 gelling agent Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 150000004676 glycans Chemical class 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- DMEGYFMYUHOHGS-UHFFFAOYSA-N heptamethylene Natural products C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- 229940117955 isoamyl acetate Drugs 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
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- 229940011051 isopropyl acetate Drugs 0.000 description 1
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- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
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- JBXYCUKPDAAYAS-UHFFFAOYSA-N methanol;trifluoroborane Chemical compound OC.FB(F)F JBXYCUKPDAAYAS-UHFFFAOYSA-N 0.000 description 1
- KTPWETRNSUKEME-UHFFFAOYSA-N methoxymethane;trifluoroborane Chemical compound COC.FB(F)F KTPWETRNSUKEME-UHFFFAOYSA-N 0.000 description 1
- BRWZPVRDOUWXKE-UHFFFAOYSA-N methylsulfanylmethane;trifluoroborane Chemical compound CSC.FB(F)F BRWZPVRDOUWXKE-UHFFFAOYSA-N 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- XVDBWWRIXBMVJV-UHFFFAOYSA-N n-[bis(dimethylamino)phosphanyl]-n-methylmethanamine Chemical compound CN(C)P(N(C)C)N(C)C XVDBWWRIXBMVJV-UHFFFAOYSA-N 0.000 description 1
- 150000002828 nitro derivatives Chemical class 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 150000002832 nitroso derivatives Chemical class 0.000 description 1
- 229940078552 o-xylene Drugs 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- VENBJVSTINLYEU-UHFFFAOYSA-N phenol;trifluoroborane Chemical compound FB(F)F.OC1=CC=CC=C1 VENBJVSTINLYEU-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 229920002493 poly(chlorotrifluoroethylene) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000005023 polychlorotrifluoroethylene (PCTFE) polymer Substances 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001282 polysaccharide Polymers 0.000 description 1
- 239000005017 polysaccharide Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- RQPQOULISUUGNY-UHFFFAOYSA-N propan-1-ol;trifluoroborane Chemical compound CCCO.FB(F)F RQPQOULISUUGNY-UHFFFAOYSA-N 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 125000006239 protecting group Chemical group 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 150000003232 pyrogallols Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 235000015096 spirit Nutrition 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 229950011008 tetrachloroethylene Drugs 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- CAYKLJBSARHIDI-UHFFFAOYSA-K trichloroalumane;hydrate Chemical compound O.Cl[Al](Cl)Cl CAYKLJBSARHIDI-UHFFFAOYSA-K 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- 150000008648 triflates Chemical class 0.000 description 1
- MJCYPBSRKLJZTB-UHFFFAOYSA-N trifluoroborane;dihydrate Chemical compound O.O.FB(F)F MJCYPBSRKLJZTB-UHFFFAOYSA-N 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polarising Elements (AREA)
- Liquid Crystal (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Anti-Oxidant Or Stabilizer Compositions (AREA)
Description
本発明は重合禁止剤、当該重合禁止剤を中間体として製造される化合物、当該重合禁止剤を含有する重合性組成物及び当該重合性組成物を用いた光学異方体に関する。 The present invention relates to a polymerization inhibitor, a compound produced using the polymerization inhibitor as an intermediate, a polymerizable composition containing the polymerization inhibitor, and an optical anisotropic body using the polymerizable composition.
重合性液晶組成物は種々のフィルムに使用される。例えば、当該組成物を液晶状態で配列させた後、重合させることにより、均一な配向を有するフィルムを作製することが可能である。このようにして作製したフィルムは、液晶ディスプレイに必要な偏光板、位相差板などに使用することができる。また、重合性液晶組成物はコレステリック構造を有するフィルムの作製にも使用することができる。多くの場合、要求される光学特性、重合速度、溶解性、融点、ガラス転移温度、フィルムの透明性、機械的強度、表面硬度、耐熱性及び耐光性を満たすために、複数の重合性化合物及び添加剤からなる組成物が使用される。 The polymerizable liquid crystal composition is used for various films. For example, it is possible to produce a film having a uniform orientation by aligning the composition in a liquid crystal state and then polymerizing the composition. Thus, the produced film can be used for a polarizing plate, a phase difference plate, etc. which are required for a liquid crystal display. The polymerizable liquid crystal composition can also be used to produce a film having a cholesteric structure. In many cases, a plurality of polymerizable compounds and to satisfy the required optical properties, polymerization rate, solubility, melting point, glass transition temperature, film transparency, mechanical strength, surface hardness, heat resistance and light resistance A composition consisting of additives is used.
コレステリック構造を有するフィルムは、そのコレステリックピッチに対応する波長の光を選択的に反射することが知られている。この選択反射特性を、ディスプレイ用の偏光反射板として利用する試みがなされている。そのためには、選択反射の波長領域を広げるための工夫が必要である。一つの方法として、重合性コレステリック液晶組成物に重合禁止剤を添加することが有効であることが知られている(特許文献1)。 It is known that a film having a cholesteric structure selectively reflects light having a wavelength corresponding to the cholesteric pitch. Attempts have been made to use this selective reflection characteristic as a polarizing reflector for displays. For that purpose, a device for expanding the wavelength region of selective reflection is necessary. As one method, it is known that it is effective to add a polymerization inhibitor to the polymerizable cholesteric liquid crystal composition (Patent Document 1).
しかしながら、一般的に用いられている重合禁止剤を当該組成物に添加すると、得られたフィルムの耐熱性が大きく低下してしまう問題があった。また、従来の重合禁止剤を添加した組成物をフィルムに塗布すると、ムラが多く生じてしまう問題があった(特許文献2〜3)。そのようなフィルムをディスプレイ製品に使用すると、製品の表示品質を大きく低下させてしまうことから、当用途において、フィルムの耐熱性を低下させること無く、フィルムにムラを引き起こしにくい重合禁止剤の開発が必要とされていた。 However, when a commonly used polymerization inhibitor is added to the composition, there is a problem that the heat resistance of the obtained film is greatly reduced. Moreover, when the composition which added the conventional polymerization inhibitor was apply | coated to the film, there existed a problem which a lot of nonuniformity produced (patent documents 2-3). If such a film is used in a display product, the display quality of the product will be greatly reduced, so in this application, the development of a polymerization inhibitor that does not cause unevenness in the film without reducing the heat resistance of the film has been developed. Was needed.
本発明が解決しようとする課題は、重合性組成物を重合して得られる重合物を作製した際に、重合物の耐熱性を低下させること無く、重合物にムラを生じさせにくい重合禁止剤を提供することである。また、当該重合性組成物を重合させることで得られる重合体及び当該重合体を用いた光学異方体を提供することである。 The problem to be solved by the present invention is a polymerization inhibitor that does not cause unevenness in a polymer without reducing the heat resistance of the polymer when a polymer obtained by polymerizing the polymerizable composition is produced. Is to provide. Moreover, it is providing the polymer obtained by polymerizing the said polymeric composition, and the optical anisotropic body using the said polymer.
一般式(I) Formula (I)
(式中、Spは炭素原子数6から25のアルキレン基を表す。)で表される化合物及び当該化合物を用いた重合性組成物を提供する。 (Wherein Sp represents an alkylene group having 6 to 25 carbon atoms) and a polymerizable composition using the compound are provided.
本願発明の化合物は、重合性組成物に添加しフィルムにした場合に、耐熱性が高く、ムラが少ないことから、重合性組成物の構成部材として有用である。また、本願発明の化合物を含有する重合性組成物を用いて作製した光学異方体は、耐熱性が高く、ムラが少ないことから、光学フィルム等の用途に有用である。 The compound of the present invention is useful as a component of the polymerizable composition because it has high heat resistance and little unevenness when added to the polymerizable composition to form a film. Moreover, the optical anisotropic body produced using the polymerizable composition containing the compound of the present invention has high heat resistance and little unevenness, and thus is useful for applications such as optical films.
本願発明は一般式(I)で表される化合物を提供し、併せて当該化合物を含有する重合性組成物、当該重合性組成物を重合させることにより得られる重合体及び当該重合体を用いた光学異方体を提供する。 The present invention provides a compound represented by the general formula (I), and also uses a polymerizable composition containing the compound, a polymer obtained by polymerizing the polymerizable composition, and the polymer. Provide an optical anisotropic body.
一般式(I)において、Spは炭素原子数6から25のアルキレン基を表すが、原料の入手容易さの観点から炭素原子数6から25の直鎖アルキレン基が好ましく、炭素原子数6から18の直鎖アルキレン基がより好ましく、重合性組成物に添加しフィルムにした場合のムラの少なさの観点から炭素原子数が6から18のうちの偶数である直鎖アルキレン基がさらに好ましく、他の成分との相溶性の観点から炭素原子数が6から10のうちの偶数である直鎖アルキレン基が特に好ましい。 In the general formula (I), Sp represents an alkylene group having 6 to 25 carbon atoms. However, a straight chain alkylene group having 6 to 25 carbon atoms is preferable from the viewpoint of availability of raw materials, and 6 to 18 carbon atoms. Is more preferable, and from the viewpoint of less unevenness when added to the polymerizable composition to form a film, a linear alkylene group having an even number of 6 to 18 carbon atoms is more preferable. From the viewpoint of compatibility with the above component, a linear alkylene group having an even number of 6 to 10 carbon atoms is particularly preferable.
一般式(I)で表される化合物として具体的には、下記の式(I−1)から式(I−12)で表される化合物が好ましい。 Specifically, compounds represented by the following formulas (I-1) to (I-12) are preferred as the compounds represented by the general formula (I).
本願発明の化合物は以下の製法で製造することができる。
(製法1)下記式(S−3)で表される化合物の製造
The compound of this invention can be manufactured with the following manufacturing methods.
(Production method 1) Production of a compound represented by the following formula (S-3)
式(S−1)で表される化合物を酸存在下、式(S−2)で表される化合物と反応させることによって、式(S−3)で表される化合物を得ることができる。酸としては、反応過程において式(S−3)で表される化合物を与えるものであれば特に制限は無いが、例えば塩化アルミニウム、アルミニウムイソプロポキシド、アルミニウムエトキシド、塩化アルミニウム水和物、臭化アルミニウム、三フッ化ホウ素、ジブチルホウ素トリフルオロメタンスルホン酸、トリフルオロメタンスルホン酸ジシクロヘキシルホウ素、ボロントリクロリド、ボロントリクロリド・メチルスルフィド錯体、ボロントリフルオリド・テトラヒドロフラン錯体、三フッ化ホウ素tert−ブチルメチルエーテル錯体、三フッ化ホウ素メタノール錯体、三フッ化ホウ素二水和物、三フッ化ホウ素ジエチルエーテラート、三フッ化ホウ素ジブチルエーテラート、三フッ化ホウ素フェノール錯体、三フッ化ホウ素プロパノール錯体、三フッ化ホウ素メチルエーテラート、三フッ化ホウ素ジエチルエーテラート、三フッ化ホウ素メチルスルフィド錯体、三フッ化ホウ素酢酸錯体、金属トリフラート、トリフルオロ酢酸無水物、ケイ素化合物等が挙げられる。式(S−1)で表される化合物はそのまま反応に用いても良く、ヒドロキシル基を保護した後反応に用いても良い。保護基としては、例えば、GREENE’S PROTECTIVE GROUPS IN ORGANIG SYNTHESIS((Fourth Edition)、PETER G.M.WUTS、THEODORA W.GREENE共著、A John Wiley & Sons,Inc.,Publication)に挙げられている基が好ましい。式(S−2)で表される化合物はそのまま反応に用いても良く、酸ハロゲン化合物、エステル、アルデヒド又は混合酸無水物に誘導して用いても良い。その反応条件としては、例えば、実験化学講座(日本化学会編、丸善株式会社発行)、Organic Syntheses(A John Wiley & Sons,Inc.,Publication)、Beilstein Handbook of Organic Chemistry(Beilstein−Institut fuer Literatur der Organischen Chemie、Springer−Verlag Berlin and Heidelberg GmbH & Co.K)、Fiesers’ Reagents for Organic Synthesis(John Wiley & Sons,Inc.)等の文献若しくはSciFinder又はReaxys等のデータベースに挙げられている条件が好ましい。また、必要に応じて反応溶媒を使用することができる。反応溶媒としては、反応過程において式(S−3)で表される化合物を与えるものであれば特に制限は無いが、好ましい反応溶媒として例えば、クロロホルム、四塩化炭素、ジクロロメタン、1,2−ジクロロエタン、1,2−ジクロロエチレン、1,1,2,2−テトラクロロエタン、トリクロロエチレン、1−クロロブタン、二硫化炭素、アセトン、アセトニトリル、ベンゾニトリル、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、ジメチルスルホキシド、ジエチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノエチルエーテルアセテート、エチレングリコールモノブチルエーテル、エチレングリコールモノメチルエーテル、ジエチレングリコールジエチルエーテル、o−ジクロロベンゼン、キシレン、o−キシレン、p−キシレン、m−キシレン、クロロベンゼン、酢酸イソブチル、酢酸イソプロピル、酢酸イソアミル、酢酸エチル、酢酸ブチル、酢酸プロピル、酢酸ペンチル、酢酸メチル、酢酸2−メトキシエチル、ヘキサメチルリン酸トリアミド、トリス(ジメチルアミノ)ホスフィン、シクロヘキサノン、1,4−ジオキサン、ジクロロメタン、スチレン、テトラクロロエチレン、テトラヒドロフラン、ピリジン、1−メチル−2−ピロリジノン、1,1,1−トリクロロエタン、トルエン、ヘキサン、ペンタン、シクロヘキサン、シクロペンタン、ヘプタン、ベンゼン、メチルイソブチルケトン、tert−ブチルメチルエーテル、メチルエチルケトン、メチルシクロヘキサノン、メチルブチルケトン、ジエチルケトン、ガソリン、コールタールナフサ、石油エーテル、石油ナフサ、石油ベンジン、テレビン油、ミネラルスピリットが挙げられる。 The compound represented by the formula (S-3) can be obtained by reacting the compound represented by the formula (S-1) with the compound represented by the formula (S-2) in the presence of an acid. The acid is not particularly limited as long as it gives the compound represented by the formula (S-3) in the reaction process. For example, aluminum chloride, aluminum isopropoxide, aluminum ethoxide, aluminum chloride hydrate, odor Aluminum fluoride, boron trifluoride, dibutyl boron trifluoromethane sulfonic acid, dicyclohexyl boron trifluoromethane sulfonate, boron trichloride, boron trichloride / methyl sulfide complex, boron trifluoride / tetrahydrofuran complex, boron trifluoride tert-butyl methyl ether Complex, boron trifluoride methanol complex, boron trifluoride dihydrate, boron trifluoride diethyl etherate, boron trifluoride dibutyl etherate, boron trifluoride phenol complex, boron trifluoride propanol Body, boron trifluoride methyl etherate, boron trifluoride diethyl etherate, boron trifluoride methyl sulfide complex, boron trifluoride acetic acid complex, metal triflates, trifluoroacetic anhydride, silicon compounds, and the like. The compound represented by the formula (S-1) may be used for the reaction as it is, or may be used for the reaction after protecting the hydroxyl group. Examples of the protecting group include GREENE'S PROTECTIVE GROUPS IN ORGANIG SYNTHESIS ((Fourth Edition), PETER GM WUTS, THEODORA W. GREENE, A John Wiley & Inc., Inc.). Groups are preferred. The compound represented by the formula (S-2) may be used in the reaction as it is, or may be derived from an acid halogen compound, an ester, an aldehyde, or a mixed acid anhydride. The reaction conditions include, for example, an experimental chemistry course (edited by the Chemical Society of Japan, published by Maruzen Co., Ltd.), Organic Synthesis (A John Wiley & Sons, Inc., Publication), and Beilstein Handbook of Organic Chemistry (Industry Chemistry). Organischen Chemie, Springer-Verlag Berlin and Heidelberg GmbH & Co. K), Fiesers' Reagents for Organic Synthesis (John Wiley & Sons et al. It is to have conditions are preferred. Moreover, a reaction solvent can be used as needed. The reaction solvent is not particularly limited as long as it gives the compound represented by the formula (S-3) in the reaction process, but preferred reaction solvents include, for example, chloroform, carbon tetrachloride, dichloromethane, 1,2-dichloroethane. 1,2-dichloroethylene, 1,1,2,2-tetrachloroethane, trichloroethylene, 1-chlorobutane, carbon disulfide, acetone, acetonitrile, benzonitrile, N, N-dimethylformamide, N, N-dimethylacetamide, dimethyl Sulfoxide, diethyl ether, ethylene glycol monoethyl ether, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether, ethylene glycol monomethyl ether, diethylene glycol diethyl ether, o-dichloroben , Xylene, o-xylene, p-xylene, m-xylene, chlorobenzene, isobutyl acetate, isopropyl acetate, isoamyl acetate, ethyl acetate, butyl acetate, propyl acetate, pentyl acetate, methyl acetate, 2-methoxyethyl acetate, hexamethyl Triamide phosphate, tris (dimethylamino) phosphine, cyclohexanone, 1,4-dioxane, dichloromethane, styrene, tetrachloroethylene, tetrahydrofuran, pyridine, 1-methyl-2-pyrrolidinone, 1,1,1-trichloroethane, toluene, hexane, pentane , Cyclohexane, cyclopentane, heptane, benzene, methyl isobutyl ketone, tert-butyl methyl ether, methyl ethyl ketone, methyl cyclohexanone, methyl butyl ketone, diethyl ketone Down, gasoline, coal tar naphtha, petroleum ether, petroleum naphtha, petroleum benzine, turpentine oil, and mineral spirits.
本願発明の化合物は、ネマチック液晶組成物、スメクチック液晶組成物、キラルスメクチック液晶組成物及びコレステリック液晶組成物に使用することが好ましい。本願発明の反応性化合物を用いる液晶組成物において本願発明以外の化合物を添加しても構わない。 The compound of the present invention is preferably used in a nematic liquid crystal composition, a smectic liquid crystal composition, a chiral smectic liquid crystal composition, and a cholesteric liquid crystal composition. In the liquid crystal composition using the reactive compound of the present invention, a compound other than the present invention may be added.
本願発明の反応性化合物と混合して使用される他の反応性化合物としては、具体的には一般式(II) Specific examples of other reactive compounds used in combination with the reactive compound of the present invention include those represented by the general formula (II)
(式中、P1及びP2は各々独立して下記の式(P−1)から式(P−17) (Wherein P 1 and P 2 are each independently the following formulas (P-1) to (P-17)
から選ばれる基を表し、S1及びS2は各々独立して単結合又は炭素原子数1〜18個のアルキレン基を表すが、1個の−CH2−又は隣接していない2個以上の−CH2−は酸素原子、−COO−、−OCO−、−OCOO−に置き換えられても良く、X3及びX4は各々独立して、単結合、−O−、−S−、−OCH2−、−CH2O−、−CO−、−COO−、−OCO−、−CO−S−、−S−CO−、−O−CO−O−、−OCOOCH2−、−CH2OCOO−、−CO−NH−、−NH−CO−、−SCH2−、−CH2S−、−CH=N−、−SCH2−、−CH2S−、−CH=CH−COO−、−CH=CH−OCO−、−COO−CH=CH−、−OCO−CH=CH−、−COO−CH2CH2−、−OCO−CH2CH2−、−CH2CH2−COO−、−CH2CH2−OCO−、−COO−CH2−、−OCO−CH2−、−CH2−COO−、−CH2−OCO−、−CF2−、−CF2O−、−OCF2−、−CH2CH2−、−CF2CH2−、−CH2CF2−、−CF2CF2−、−CY=CY−又は−C≡C−を表し(式中、Yは各々独立して水素原子、炭素原子数1から12のアルキル基、フッ素原子、塩素原子又はシアノ基を表す。)、Z1は各々独立して、単結合、−O−、−S−、−OCH2−、−CH2O−、−CO−、−COO−、−OCO−、−CO−S−、−S−CO−、−O−CO−O−、−OCOOCH2−、−CH2OCOO−、−CO−NH−、−NH−CO−、−SCH2−、−CH2S−、−CH=N−、−SCH2−、−CH2S−、−CH=CH−COO−、−CH=CH−OCO−、−COO−CH=CH−、−OCO−CH=CH−、−COO−CH2CH2−、−OCO−CH2CH2−、−CH2CH2−COO−、−CH2CH2−OCO−、−COO−CH2−、−OCO−CH2−、−CH2−COO−、−CH2−OCO−、−CF2−、−CF2O−、−OCF2−、−CH2CH2−、−CF2CH2−、−CH2CF2−、−CF2CF2−、−CY=CY−又は−C≡C−を表し(式中、Yは各々独立して水素原子、炭素原子数1から12のアルキル基、フッ素原子、塩素原子又はシアノ基を表す。)、A1及びA2は各々独立して、1,4−フェニレン基、1,4−シクロヘキシレン基、ピリジン−2,5−ジイル基、ピリミジン−2,5−ジイル基、ナフタレン−2,6−ジイル基、テトラヒドロナフタレン−2,6−ジイル基又は1,3−ジオキサン−2,5−ジイル基を表すが、A1及びA2は各々独立して無置換であるか又はアルキル基、ハロゲン化アルキル基、アルコキシ基、ハロゲン化アルコキシ基、ハロゲノ基、シアノ基又はニトロ基に置換されていても良く、m1は0、1、2又は3を表し、m1が2又は3を表す場合、2個あるいは3個存在するA1及び/又はZ1は同一であっても異なっていても良い。)で表される化合物が好ましく、一般式(II)のP1及びP2がアクリル基又はメタクリル基である場合が特に好ましい。具体的には、一般式(III) And S 1 and S 2 each independently represents a single bond or an alkylene group having 1 to 18 carbon atoms, but one —CH 2 — or two or more not adjacent to each other. —CH 2 — may be replaced by an oxygen atom, —COO—, —OCO—, —OCOO—, and X 3 and X 4 are each independently a single bond, —O—, —S—, —OCH. 2 -, - CH 2 O - , - CO -, - COO -, - OCO -, - CO-S -, - S-CO -, - OCO-O -, - OCOOCH 2 -, - CH 2 OCOO -, - CO-NH -, - NH-CO -, - SCH 2 -, - CH 2 S -, - CH = N -, - SCH 2 -, - CH 2 S -, - CH = CH-COO-, —CH═CH—OCO—, —COO—CH═CH—, —OCO—CH═CH—, —COO—CH 2 CH 2 -, - OCO-CH 2 CH 2 -, - CH 2 CH 2 -COO -, - CH 2 CH 2 -OCO -, - COO-CH 2 -, - OCO-CH 2 -, - CH 2 -COO-, -CH 2 -OCO -, - CF 2 -, - CF 2 O -, - OCF 2 -, - CH 2 CH 2 -, - CF 2 CH 2 -, - CH 2 CF 2 -, - CF 2 CF 2 - , -CY = CY- or -C≡C- (wherein Y independently represents a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, a fluorine atom, a chlorine atom or a cyano group). Z 1 is each independently a single bond, —O—, —S—, —OCH 2 —, —CH 2 O—, —CO—, —COO—, —OCO—, —CO—S—, —S. -CO -, - O-CO- O -, - OCOOCH 2 -, - CH 2 OCOO -, - CO-NH -, - N -CO -, - SCH 2 -, - CH 2 S -, - CH = N -, - SCH 2 -, - CH 2 S -, - CH = CH-COO -, - CH = CH-OCO -, - COO -CH = CH -, - OCO- CH = CH -, - COO-CH 2 CH 2 -, - OCO-CH 2 CH 2 -, - CH 2 CH 2 -COO -, - CH 2 CH 2 -OCO-, -COO-CH 2 -, - OCO -CH 2 -, - CH 2 -COO -, - CH 2 -OCO -, - CF 2 -, - CF 2 O -, - OCF 2 -, - CH 2 CH 2 - , —CF 2 CH 2 —, —CH 2 CF 2 —, —CF 2 CF 2 —, —CY═CY— or —C≡C— (wherein Y is independently a hydrogen atom or carbon atom) An alkyl group, a fluorine atom, a chlorine atom or a cyano group represented by formulas 1 to 12 is represented. ), A 1 and A 2 are each independently 1,4-phenylene group, 1,4-cyclohexylene group, pyridine-2,5-diyl group, pyrimidine-2,5-diyl group, naphthalene-2, 6-diyl group, tetrahydronaphthalene-2,6-diyl group or 1,3-dioxane-2,5-diyl group, wherein A 1 and A 2 are each independently unsubstituted or an alkyl group, A halogenated alkyl group, an alkoxy group, a halogenated alkoxy group, a halogeno group, a cyano group or a nitro group, and m1 represents 0, 1, 2 or 3, and when m1 represents 2 or 3, Two or three A 1 and / or Z 1 may be the same or different. It is preferably a compound represented by), when P 1 and P 2 of the general formula (II) is an acrylic group or methacrylic group are particularly preferable. Specifically, the general formula (III)
(式中、S3及びS4は各々独立して炭素原子数2から18のアルキレン基、X3及びX4は各々独立して−O−、−COO−、−OCO−又は単結合を表し、Z3及びZ4は各々独立して−COO−又は−OCO−を表し、A3、A4及びA5は各々独立して無置換或いはフッ素原子、塩素原子又は炭素原子数1から4のアルキル基又はアルコキシ基によって置換された1,4−フェニレン基を表す。)で表される化合物が好ましく、下記式(III−1)から式(III−8)で表される化合物が特に好ましい。 (Wherein S 3 and S 4 each independently represent an alkylene group having 2 to 18 carbon atoms, and X 3 and X 4 each independently represent —O—, —COO—, —OCO— or a single bond). , Z 3 and Z 4 each independently represent —COO— or —OCO—, and A 3 , A 4 and A 5 each independently represent an unsubstituted or fluorine atom, chlorine atom or carbon atom having 1 to 4 carbon atoms. Represents a 1,4-phenylene group substituted by an alkyl group or an alkoxy group.), And compounds represented by the following formulas (III-1) to (III-8) are particularly preferable.
(式中、S3は一般式(III)におけるS3と同じ意味を表し、S4は一般式(III)におけるS4と同じ意味を表す。)上記式(III−1)から式(III−8)において、S3及びS4が各々独立して炭素原子数2から8のアルキレン基である化合物がさらに好ましい。 (Wherein, S 3 has the same meaning as S 3 in the general formula (III), S 4 represents the same meaning as S 4 in the general formula (III).) The above formula (III-1) from the formula (III In −8), compounds in which S 3 and S 4 are each independently an alkylene group having 2 to 8 carbon atoms are further preferred.
また、一般式(IV) Moreover, general formula (IV)
(式中、S5及びS6は各々独立して炭素原子数2から18のアルキレン基、X5及びX6は各々独立して−O−、−COO−、−OCO−又は単結合を表し、Z5は−COO−又は−OCO−を表し、A6、A7及びA8は各々独立して無置換或いはフッ素原子、塩素原子又は炭素原子数1から4のアルキル基又はアルコキシ基によって置換された1,4−フェニレン基を表す。)で表される化合物が好ましく、下記式(IV−1)から式(IV−8)で表される化合物が特に好ましい。 (In the formula, S 5 and S 6 each independently represent an alkylene group having 2 to 18 carbon atoms, and X 5 and X 6 each independently represent —O—, —COO—, —OCO— or a single bond. , Z 5 represents —COO— or —OCO—, and A 6 , A 7 and A 8 are each independently unsubstituted or substituted by a fluorine atom, a chlorine atom, an alkyl group having 1 to 4 carbon atoms or an alkoxy group. And a compound represented by the following formula (IV-1) to formula (IV-8) is particularly preferable.
(式中、S5は一般式(IV)におけるS5と同じ意味を表し、S6は一般式(IV)におけるS6と同じ意味を表す。)上記式(IV−1)から式(IV−8)において、耐熱性及び耐久性の観点から、式(IV−2)、式(IV−5)、式(IV−6)、式(IV−7)及び式(IV−8)で表される化合物が好ましく、式(IV−2)で表される化合物がさらに好ましく、S5及びS6が各々独立して炭素原子数2から8のアルキレン基である化合物が特に好ましい。 (Wherein, S 5 has the same meaning as S 5 in the general formula (IV), S 6 in the general formula (IV) represents the same meaning as S 6.) The formula (IV-1) from the formula (IV -8), from the viewpoint of heat resistance and durability, the formula (IV-2), formula (IV-5), formula (IV-6), formula (IV-7) and formula (IV-8) are used. The compound represented by formula (IV-2) is more preferable, and the compound in which S 5 and S 6 are each independently an alkylene group having 2 to 8 carbon atoms is particularly preferable.
この他、好ましい2官能重合性化合物としては下記一般式(V−1)から式(V−5)で表される化合物が挙げられる。 In addition, preferable bifunctional polymerizable compounds include compounds represented by the following general formulas (V-1) to (V-5).
(式中、S7及びS8は各々独立して炭素原子数2から18のアルキレン基を表す。)上記式(V−1)から式(V−5)において、式(V−2)、式(V−3)及び式(V−5)で表される化合物が好ましく、S7及びS8が各々独立して炭素原子数2から8のアルキレン基である化合物が特に好ましい。 (In the formula, S 7 and S 8 each independently represent an alkylene group having 2 to 18 carbon atoms.) In the above formulas (V-1) to (V-5), the formula (V-2), Compounds represented by formula (V-3) and formula (V-5) are preferable, and compounds in which S 7 and S 8 are each independently an alkylene group having 2 to 8 carbon atoms are particularly preferable.
本願発明の化合物を含有する重合性液晶組成物には、当該組成物の液晶性を大きく損なわない程度に、液晶性を示さない重合性化合物を添加することも可能である。具体的には、この技術分野で高分子形成性モノマーあるいは高分子形成性オリゴマーとして認識される化合物であれば特に制限なく使用可能である。 A polymerizable compound that does not exhibit liquid crystallinity can be added to the polymerizable liquid crystal composition containing the compound of the present invention to such an extent that the liquid crystallinity of the composition is not significantly impaired. Specifically, any compound that is recognized as a polymer-forming monomer or polymer-forming oligomer in this technical field can be used without particular limitation.
また、本願発明の化合物を含有する重合性液晶組成物に添加する光重合開始剤の濃度は、0.1〜10質量%であることが好ましく、0.2〜5質量%であることがさらに好ましい。光重合開始剤としては、ベンゾインエーテル類、ベンゾフェノン類、アセトフェノン類、ベンジルケタール類、アシルフォスフィンオキサイド等が使用可能である。 The concentration of the photopolymerization initiator added to the polymerizable liquid crystal composition containing the compound of the present invention is preferably 0.1 to 10% by mass, and more preferably 0.2 to 5% by mass. preferable. As the photopolymerization initiator, benzoin ethers, benzophenones, acetophenones, benzyl ketals, acylphosphine oxides and the like can be used.
また、本願発明の化合物を含有する重合性液晶組成物には、その保存安定性を向上させるために、安定剤を添加することもできる。安定剤としては、例えば、ヒドロキノン、ヒドロキノンモノアルキルエーテル類、第三ブチルカテコール類、ピロガロール類、チオフェノール類、ニトロ化合物類、β−ナフチルアミン類、β−ナフトール類、ニトロソ化合物等が挙げられる。安定剤を使用する場合の添加量は、液晶組成物に対して0.005〜1質量%であることが好ましく、0.02〜0.5質量%であることがさらに好ましい。 In addition, a stabilizer may be added to the polymerizable liquid crystal composition containing the compound of the present invention in order to improve its storage stability. Examples of the stabilizer include hydroquinone, hydroquinone monoalkyl ethers, tert-butylcatechols, pyrogallols, thiophenols, nitro compounds, β-naphthylamines, β-naphthols, nitroso compounds and the like. When the stabilizer is used, the addition amount is preferably 0.005 to 1% by mass and more preferably 0.02 to 0.5% by mass with respect to the liquid crystal composition.
また、本願発明の化合物を含有する重合性液晶組成物をフィルム類、光学素子類、機能性顔料類、医薬品類、化粧品類、コーティング剤類、合成樹脂類等の用途に利用する場合には、その目的に応じて金属、金属錯体、染料、顔料、色素、蛍光材料、燐光材料、界面活性剤、レベリング剤、チキソ剤、ゲル化剤、多糖類、紫外線吸収剤、赤外線吸収剤、抗酸化剤、イオン交換樹脂、酸化チタン等の金属酸化物等を添加することもできる。 Further, when the polymerizable liquid crystal composition containing the compound of the present invention is used for applications such as films, optical elements, functional pigments, pharmaceuticals, cosmetics, coating agents, synthetic resins, Depending on the purpose, metals, metal complexes, dyes, pigments, dyes, fluorescent materials, phosphorescent materials, surfactants, leveling agents, thixotropic agents, gelling agents, polysaccharides, ultraviolet absorbers, infrared absorbers, antioxidants Further, metal oxides such as ion exchange resin and titanium oxide can be added.
本願発明の化合物を含有する重合性液晶組成物を重合することにより得られるポリマーは種々の用途に利用できる。例えば、本願発明の化合物を含有する重合性液晶組成物を、配向させずに重合することにより得られるポリマーは、光散乱板、偏光解消板、モアレ縞防止板として利用可能である。また、配向させた後に重合することにより得られるポリマーは、光学異方性を有しており有用である。このような光学異方体は、例えば、本願発明の化合物を含有する重合性液晶組成物を、布等でラビング処理した基板、有機薄膜を形成した基板又はSiO2を斜方蒸着した配向膜を有する基板に担持させるか、基板間に挟持させた後、当該重合性液晶組成物を重合することによって製造することができる。 The polymer obtained by polymerizing the polymerizable liquid crystal composition containing the compound of the present invention can be used for various applications. For example, a polymer obtained by polymerizing a polymerizable liquid crystal composition containing the compound of the present invention without orientation can be used as a light scattering plate, a depolarizing plate, and a moire fringe prevention plate. Moreover, the polymer obtained by superposing | polymerizing after orientating has optical anisotropy, and is useful. Such an optical anisotropic body includes, for example, a substrate obtained by rubbing a polymerizable liquid crystal composition containing the compound of the present invention with a cloth, a substrate on which an organic thin film is formed, or an alignment film on which SiO 2 is obliquely deposited. It can be produced by polymerizing the polymerizable liquid crystal composition after it is supported on a substrate having it or sandwiched between substrates.
重合性液晶組成物を基板上に担持させる際の方法としては、スピンコーティング、ダイコーティング、エクストルージョンコーティング、ロールコーティング、ワイヤーバーコーティング、グラビアコーティング、スプレーコーティング、ディッピング、プリント法等を挙げることができる。またコーティングの際、重合性液晶組成物に有機溶媒を添加しても良い。有機溶媒としては、炭化水素系溶媒、ハロゲン化炭化水素系溶媒、エーテル系溶媒、アルコール系溶媒、ケトン系溶媒、エステル系溶媒、非プロトン性溶媒等を使用することができるが、例えば炭化水素系溶媒としてはトルエン又はヘキサンを、ハロゲン化炭化水素系溶媒としては塩化メチレンを、エーテル系溶媒としてはテトラヒドロフラン、アセトキシ−2−エトキシエタン又はプロピレングリコールモノメチルエーテルアセテートを、アルコール系溶媒としてはメタノール、エタノール又はイソプロパノールを、ケトン系溶媒としてはアセトン、メチルエチルケトン、シクロヘキサノン、γ−ブチルラクトン又はN−メチルピロリジノン類を、エステル系溶媒としては酢酸エチル又はセロソルブを、非プロトン性溶媒としてはジメチルホルムアミド又はアセトニトリルを挙げることができる。これらは単独でも、組み合わせて用いても良く、その蒸気圧と重合性液晶組成物の溶解性を考慮し、適宜選択すれば良い。添加した有機溶媒を揮発させる方法としては、自然乾燥、加熱乾燥、減圧乾燥、減圧加熱乾燥を用いることができる。重合性液晶材料の塗布性をさらに向上させるためには、基板上にポリイミド薄膜等の中間層を設けることや、重合性液晶材料にレベリング剤を添加する事も有効である。基板上にポリイミド薄膜等の中間層を設ける方法は、重合性液晶材料を重合することにより得られるポリマーと基板との密着性を向上させるために有効である。 Examples of the method for supporting the polymerizable liquid crystal composition on the substrate include spin coating, die coating, extrusion coating, roll coating, wire bar coating, gravure coating, spray coating, dipping, and printing. . Further, an organic solvent may be added to the polymerizable liquid crystal composition during coating. As the organic solvent, hydrocarbon solvents, halogenated hydrocarbon solvents, ether solvents, alcohol solvents, ketone solvents, ester solvents, aprotic solvents and the like can be used. The solvent is toluene or hexane, the halogenated hydrocarbon solvent is methylene chloride, the ether solvent is tetrahydrofuran, acetoxy-2-ethoxyethane or propylene glycol monomethyl ether acetate, and the alcohol solvent is methanol, ethanol or Isopropanol, acetone, methyl ethyl ketone, cyclohexanone, γ-butyl lactone or N-methylpyrrolidinone as the ketone solvent, ethyl acetate or cellosolve as the ester solvent, dimethyl as the aprotic solvent It can be mentioned formamide or acetonitrile. These may be used alone or in combination, and may be appropriately selected in consideration of the vapor pressure and the solubility of the polymerizable liquid crystal composition. As a method for volatilizing the added organic solvent, natural drying, heat drying, reduced pressure drying, or reduced pressure heat drying can be used. In order to further improve the applicability of the polymerizable liquid crystal material, it is also effective to provide an intermediate layer such as a polyimide thin film on the substrate or to add a leveling agent to the polymerizable liquid crystal material. The method of providing an intermediate layer such as a polyimide thin film on a substrate is effective for improving the adhesion between a polymer obtained by polymerizing a polymerizable liquid crystal material and the substrate.
上記以外の配向処理としては、液晶材料の流動配向の利用、電場又は磁場の利用を挙げることができる。これらの配向手段は単独で用いても、また組み合わせて用いても良い。さらに、ラビングに代わる配向処理方法として、光配向法を用いることもできる。基板の形状としては、平板の他に、曲面を構成部分として有していても良い。基板を構成する材料は、有機材料、無機材料を問わずに用いることができる。基板の材料となる有機材料としては、例えば、ポリエチレンテレフタレート、ポリカーボネート、ポリイミド、ポリアミド、ポリメタクリル酸メチル、ポリスチレン、ポリ塩化ビニル、ポリテトラフルオロエチレン、ポリクロロトリフルオロエチレン、ポリアリレート、ポリスルホン、トリアセチルセルロース、セルロース、ポリエーテルエーテルケトン等が挙げられ、また、無機材料としては、例えば、シリコン、ガラス、方解石等が挙げられる。 Examples of the alignment treatment other than the above include use of fluid alignment of a liquid crystal material, use of an electric field or a magnetic field. These orientation means may be used alone or in combination. Furthermore, a photo-alignment method can be used as an alignment treatment method instead of rubbing. As a shape of the substrate, in addition to a flat plate, a curved surface may be included as a constituent part. The material which comprises a board | substrate can be used regardless of an organic material and an inorganic material. Examples of the organic material used as the substrate material include polyethylene terephthalate, polycarbonate, polyimide, polyamide, polymethyl methacrylate, polystyrene, polyvinyl chloride, polytetrafluoroethylene, polychlorotrifluoroethylene, polyarylate, polysulfone, and triacetyl. Cellulose, cellulose, polyetheretherketone and the like can be mentioned, and examples of the inorganic material include silicon, glass and calcite.
本願発明の化合物を含有する重合性液晶組成物を重合させる際、迅速に重合が進行することが望ましいため、紫外線又は電子線等の活性エネルギー線を照射することにより重合させる方法が好ましい。紫外線を使用する場合、偏光光源を用いても良く、非偏光光源を用いても良い。また、液晶組成物を2枚の基板間に挟持させて状態で重合を行う場合、少なくとも照射面側の基板は活性エネルギー線に対して適当な透明性を有していなければならない。また、光照射時にマスクを用いて特定の部分のみを重合させた後、電場や磁場又は温度等の条件を変化させることにより、未重合部分の配向状態を変化させて、さらに活性エネルギー線を照射して重合させるという手段を用いても良い。また、照射時の温度は、本発明の重合性液晶組成物の液晶状態が保持される温度範囲内であることが好ましい。特に、光重合によって光学異方体を製造しようとする場合には、意図しない熱重合の誘起を避ける意味からも可能な限り室温に近い温度、即ち、典型的には25℃での温度で重合させることが好ましい。活性エネルギー線の強度は、0.1mW/cm2〜2W/cm2が好ましい。強度が0.1mW/cm2以下の場合、光重合を完了させるのに多大な時間が必要になり生産性が悪化してしまい、2W/cm2以上の場合、重合性液晶化合物又は重合性液晶組成物が劣化してしまう危険がある。 When the polymerizable liquid crystal composition containing the compound of the present invention is polymerized, it is desirable that the polymerization proceeds rapidly. Therefore, a method of polymerizing by irradiating active energy rays such as ultraviolet rays or electron beams is preferable. When ultraviolet rays are used, a polarized light source or a non-polarized light source may be used. Further, when the polymerization is carried out with the liquid crystal composition sandwiched between two substrates, at least the substrate on the irradiation surface side must have appropriate transparency to the active energy rays. Moreover, after polymerizing only a specific part using a mask at the time of light irradiation, the orientation state of the unpolymerized part is changed by changing conditions such as an electric field, a magnetic field, or temperature, and further irradiation with active energy rays is performed. Then, it is possible to use a means for polymerization. Moreover, it is preferable that the temperature at the time of irradiation exists in the temperature range by which the liquid crystal state of the polymeric liquid crystal composition of this invention is hold | maintained. In particular, when an optical anisotropic body is to be produced by photopolymerization, the polymerization is carried out at a temperature as close to room temperature as possible from the viewpoint of avoiding unintentional induction of thermal polymerization, that is, typically at a temperature of 25 ° C. It is preferable to make it. The intensity of the active energy ray is preferably 0.1 mW / cm 2 to 2 W / cm 2 . When the intensity is 0.1 mW / cm 2 or less, a great amount of time is required to complete the photopolymerization and the productivity is deteriorated. When the intensity is 2 W / cm 2 or more, the polymerizable liquid crystal compound or the polymerizable liquid crystal is used. There is a risk that the composition will deteriorate.
重合によって得られた当該光学異方体は、初期の特性変化を軽減し、安定的な特性発現を図ることを目的として熱処理を施すこともできる。熱処理の温度は50〜250℃の範囲であることが好ましく、熱処理時間は30秒〜12時間の範囲であることが好ましい。 The optical anisotropic body obtained by polymerization can be subjected to a heat treatment for the purpose of reducing initial characteristic changes and achieving stable characteristic expression. The heat treatment temperature is preferably in the range of 50 to 250 ° C., and the heat treatment time is preferably in the range of 30 seconds to 12 hours.
このような方法によって製造される当該光学異方体は、基板から剥離して単体で用いても、剥離せずに用いても良い。また、得られた光学異方体を積層しても、他の基板に貼り合わせて用いてもよい。 The optical anisotropic body manufactured by such a method may be peeled off from the substrate and used alone or without being peeled off. Further, the obtained optical anisotropic bodies may be laminated or bonded to another substrate for use.
以下、実施例を挙げて本発明を更に記述するが、本発明はこれらの実施例に限定されるものではない。また、以下の実施例及び比較例の組成物における「%」は『質量%』を意味する。
(実施例1) 式(I−1)で表される化合物の製造
EXAMPLES Hereinafter, although an Example is given and this invention is further described, this invention is not limited to these Examples. Further, “%” in the compositions of the following Examples and Comparative Examples means “% by mass”.
Example 1 Production of Compound Represented by Formula (I-1)
撹拌装置を備えたフラスコに、式(I−1−1)で表される化合物 5.00g(24.2ミリモル)、式(I−1−2)で表される化合物 2.11g(12.1ミリモル)、トリフルオロ酢酸無水物 5.09g(24.2ミリモル)を加え混合した。5時間撹拌した後、ジクロロメタンで希釈し、分液処理、カラムクロマトグラフィー(シリカゲル)及び分散洗浄(ヘキサン)によって精製することにより、目的の式(I−1)で表される化合物 5.31gを得た。
式(I−1)で表される化合物の物性値
1H NMR(CDCl3)δ 1.45(m,40H),1.75(quin,4H),2.92(t,4H),5.70(s,2H),7.85(s,4H)ppm.
13C NMR(CDCl3)δ 24.6,29.4,30.1,34.3,38.0,125.7,128.9,135.6,158.2,199.9ppm.
融点 172℃
LRMS(EI)m/z 550
(実施例2) 式(I−2)で表される化合物の製造
In a flask equipped with a stirrer, 5.00 g (24.2 mmol) of the compound represented by the formula (I-1-1) and 2.11 g of the compound represented by the formula (I-1-2) (12.12). 1 mmol) and 5.09 g (24.2 mmol) of trifluoroacetic anhydride were added and mixed. After stirring for 5 hours, it is diluted with dichloromethane and purified by liquid separation treatment, column chromatography (silica gel), and dispersion washing (hexane) to obtain 5.31 g of the target compound of formula (I-1). Obtained.
Physical property values of compounds represented by formula (I-1)
1 H NMR (CDCl 3 ) δ 1.45 (m, 40H), 1.75 (quin, 4H), 2.92 (t, 4H), 5.70 (s, 2H), 7.85 (s, 4H) ppm.
13 C NMR (CDCl 3 ) δ 24.6, 29.4, 30.1, 34.3, 38.0, 125.7, 128.9, 135.6, 158.2, 199.9 ppm.
Melting point 172 ° C
LRMS (EI) m / z 550
Example 2 Production of Compound Represented by Formula (I-2)
実施例1に記載の式(I−1−2)で表される化合物を式(I−2−1)で表される化合物に置き換えた以外は、実施例1と同様の方法によって式(I−2)で表される化合物を製造した。
式(I−2)で表される化合物の物性値
1H NMR(CDCl3)δ 1.45(m,42H),1.75(quin,4H),2.92(t,4H),5.70(s,2H),7.85(s,4H)ppm.
13C NMR(CDCl3)δ 24.6,24.6,29.4,30.1,34.3,38.0,125.7,128.9,135.6,158.2,199.9ppm.
LRMS(EI)m/z 564
(実施例3) 式(I−3)で表される化合物の製造
Except that the compound represented by the formula (I-1-2) described in Example 1 was replaced by the compound represented by the formula (I-2-1), the compound of the formula (I -2) was produced.
Physical property value of compound represented by formula (I-2)
1 H NMR (CDCl 3 ) δ 1.45 (m, 42H), 1.75 (quin, 4H), 2.92 (t, 4H), 5.70 (s, 2H), 7.85 (s, 4H) ppm.
13 C NMR (CDCl 3 ) δ 24.6, 24.6, 29.4, 30.1, 34.3, 38.0, 125.7, 128.9, 135.6, 158.2, 199. 9 ppm.
LRMS (EI) m / z 564
Example 3 Production of Compound Represented by Formula (I-3)
実施例1に記載の式(I−1−2)で表される化合物を式(I−3−1)で表される化合物に置き換えた以外は、実施例1と同様の方法によって式(I−3)で表される化合物を製造した。
式(I−3)で表される化合物の物性値
1H NMR(CDCl3)δ 1.45(m,44H),1.75(quin,4H),2.92(t,4H),5.70(s,2H),7.85(s,4H)ppm.
13C NMR(CDCl3)δ 24.6,24.6,29.4,30.1,34.3,38.0,125.7,128.9,135.6,158.2,199.9ppm.
LRMS(EI)m/z 578
(実施例4) 式(I−4)で表される化合物の製造
Except that the compound represented by the formula (I-1-2) described in Example 1 was replaced with the compound represented by the formula (I-3-1), the compound of the formula (I The compound represented by -3) was produced.
Physical property value of compound represented by formula (I-3)
1 H NMR (CDCl 3 ) δ 1.45 (m, 44H), 1.75 (quin, 4H), 2.92 (t, 4H), 5.70 (s, 2H), 7.85 (s, 4H) ppm.
13 C NMR (CDCl 3 ) δ 24.6, 24.6, 29.4, 30.1, 34.3, 38.0, 125.7, 128.9, 135.6, 158.2, 199. 9 ppm.
LRMS (EI) m / z 578
Example 4 Production of Compound Represented by Formula (I-4)
実施例1に記載の式(I−1−2)で表される化合物を式(I−4−1)で表される化合物に置き換えた以外は、実施例1と同様の方法によって式(I−4)で表される化合物を製造した。
式(I−4)で表される化合物の物性値
1H NMR(CDCl3)δ 1.45(m,60H),1.75(quin,4H),2.92(t,4H),5.70(s,2H),7.85(s,4H)ppm.
13C NMR(CDCl3)δ 24.6,24.6,24.6,24.6,29.4,30.1,34.3,38.0,125.7,128.9,135.6,158.2,199.9ppm.
LRMS(EI)m/z 690
(実施例5) 式(I−5)で表される化合物の製造
Except that the compound represented by the formula (I-1-2) described in Example 1 was replaced with the compound represented by the formula (I-4-1), the compound of the formula (I -4) was produced.
Physical property values of compounds represented by formula (I-4)
1 H NMR (CDCl 3 ) δ 1.45 (m, 60H), 1.75 (quin, 4H), 2.92 (t, 4H), 5.70 (s, 2H), 7.85 (s, 4H) ppm.
13 C NMR (CDCl 3 ) δ 24.6, 24.6, 24.6, 24.6, 29.4, 30.1, 34.3, 38.0, 125.7, 128.9, 135. 6, 158.2, 199.9 ppm.
LRMS (EI) m / z 690
Example 5 Production of Compound Represented by Formula (I-5)
実施例1に記載の式(I−1−2)で表される化合物を式(I−5−1)で表される化合物に置き換えた以外は、実施例1と同様の方法によって式(I−5)で表される化合物を製造した。
式(I−5)で表される化合物の物性値
1H NMR(CDCl3)δ 1.45(m,64H),1.75(quin,4H),2.92(t,4H),5.70(s,2H),7.85(s,4H)ppm.
13C NMR(CDCl3)δ 24.6,24.6,24.6,24.6,29.4,30.1,34.3,38.0,125.7,128.9,135.6,158.2,199.9ppm.
LRMS(EI)m/z 718
(実施例6〜15及び比較例1〜8)
実施例1〜実施例5に記載の本願発明の式(I−1)から式(I−5)で表される化合物並びに、重合禁止剤として一般的に用いられる式(C−1)で表される化合物、特許文献3(特開平05−301865号公報)記載の式(C−2)で表される化合物、特許文献2(DE1811322A1号公報)記載の式(C−3)及び式(C−4)で表される化合物の各々を、液晶組成物に添加しフィルム化を行い評価した。
Except that the compound represented by the formula (I-1-2) described in Example 1 was replaced with the compound represented by the formula (I-5-1), the compound of the formula (I The compound represented by -5) was produced.
Physical property values of compounds represented by formula (I-5)
1 H NMR (CDCl 3 ) δ 1.45 (m, 64H), 1.75 (quin, 4H), 2.92 (t, 4H), 5.70 (s, 2H), 7.85 (s, 4H) ppm.
13 C NMR (CDCl 3 ) δ 24.6, 24.6, 24.6, 24.6, 29.4, 30.1, 34.3, 38.0, 125.7, 128.9, 135. 6, 158.2, 199.9 ppm.
LRMS (EI) m / z 718
(Examples 6-15 and Comparative Examples 1-8)
The compounds represented by formulas (I-1) to (I-5) of the present invention described in Examples 1 to 5 and the formula (C-1) generally used as a polymerization inhibitor A compound represented by the formula (C-2) described in Patent Document 3 (Japanese Patent Laid-Open No. 05-301865), a formula (C-3) and a formula (C) described in Patent Document 2 (DE181132A1) Each of the compounds represented by -4) was added to a liquid crystal composition to form a film and evaluated.
式(X−1)で表される化合物20%、式(X−2)で表される化合物32%、式(X−3)で表される化合物40%、式(X−4)で表される化合物8%からなる液晶組成物を母体液晶(X)とした。 20% of the compound represented by the formula (X-1), 32% of the compound represented by the formula (X-2), 40% of the compound represented by the formula (X-3), represented by the formula (X-4) A liquid crystal composition composed of 8% of the compound was used as a base liquid crystal (X).
母体液晶(X)に評価対象となる化合物を0.5%添加することにより調製した組成物各々に対し、光重合開始剤Irgacure907(BASF社製)を3%添加した後シクロペンタノンに溶解させ25%の溶液とした。この溶液を、ラビング処理したポリイミド付きガラスにスピンコート法で塗布し、65℃で3分乾燥した。得られた塗膜を60℃のホットプレート上に置き、バンドパスフィルターを使用し365nmの紫外線を15mW/cm2の強度で10秒間照射した。続いてバンドパスフィルターを取り外し70mW/cm2の強度で20秒間照射した。得られたフィルムについて、ムラの評価を行った。目視によってフィルム上にムラ等が無く全体に均一であれば◎、ムラが見られる場合はムラの程度によって○、△又は×とした。その結果を下記表1に示す。 3% of photopolymerization initiator Irgacure 907 (manufactured by BASF) was added to each of the compositions prepared by adding 0.5% of the compound to be evaluated to the base liquid crystal (X) and then dissolved in cyclopentanone. A 25% solution was obtained. This solution was applied to a glass with polyimide subjected to a rubbing treatment by a spin coating method and dried at 65 ° C. for 3 minutes. The obtained coating film was placed on a hot plate at 60 ° C., and irradiated with 365 nm ultraviolet rays at an intensity of 15 mW / cm 2 for 10 seconds using a bandpass filter. Subsequently, the bandpass filter was removed, and irradiation was performed at an intensity of 70 mW / cm 2 for 20 seconds. The obtained film was evaluated for unevenness. If there is no unevenness on the film by visual observation and it is uniform as a whole, it is marked as ◯, Δ, or × depending on the degree of unevenness when unevenness is observed. The results are shown in Table 1 below.
※目視によってフィルム上にムラが無く全体に均一であれば◎、ムラが1〜2カ所に小さく見られる場合には○、ムラが5〜10カ所に見られる場合には△、ムラが無数に見られる場合は×とした。 * If there is no unevenness on the film by visual observation, it will be ◎, if the unevenness is seen as small as 1 to 2 places, ○, if the unevenness is seen in 5 to 10 places, Δ, and innumerable unevenness. When it was seen, it was set as x.
このように、本願発明の化合物を添加した重合性液晶組成物を用いて作製したフィルムはいずれも、比較化合物(C−1)を添加した比較例1のフィルムと比較して、ムラが少ないか、ムラの程度が同程度であることから同等若しくはそれ以上の均一性であることがわかる。また、本願発明の化合物を添加した重合性液晶組成物を用いて作製したフィルムはいずれも、比較化合物(C−2)から比較化合物(C−4)を添加した比較例2から比較例4のフィルムと比較して、ムラが少ないことがわかる。 Thus, is any film produced using the polymerizable liquid crystal composition added with the compound of the present invention less uneven than the film of Comparative Example 1 added with the comparative compound (C-1)? From the fact that the degree of unevenness is the same, it can be seen that the uniformity is equal or higher. Moreover, as for the film produced using the polymeric liquid crystal composition which added the compound of this invention, all of the comparative example 2 to the comparative example 4 which added the comparative compound (C-4) to the comparative compound (C-4). It can be seen that there is less unevenness compared to the film.
得られたコレステリックフィルムの選択反射波長を株式会社日立製作所製分光光度計U−4100を用いて測定した。耐熱性評価を行うために、得られたフィルムを200℃で60分間ポストベークした。ポストベーク後のフィルムの選択反射波長を同様に測定した。その結果を下記表2に示す。 The selective reflection wavelength of the obtained cholesteric film was measured using a spectrophotometer U-4100 manufactured by Hitachi, Ltd. In order to perform heat resistance evaluation, the obtained film was post-baked at 200 ° C. for 60 minutes. The selective reflection wavelength of the post-baked film was measured in the same manner. The results are shown in Table 2 below.
このように、比較化合物(C−1)を添加した重合性液晶組成物を用いて作製したフィルムは、ポストベーク後に選択反射波長帯域が大きく低下している。また、比較化合物(C−2)及び比較化合物(C−3)を添加した重合性液晶組成物を用いて作製したフィルムは、ポストベーク後に選択反射波長帯域がわずかに低下している。それに対し、本願発明の化合物を添加した重合性液晶組成物を用いて作製したフィルムはいずれも、ポストベーク後にも選択反射波長帯域がほとんど低下しておらず、高い耐熱性を有することがわかる。 Thus, the film produced using the polymerizable liquid crystal composition to which the comparative compound (C-1) is added has a significantly reduced selective reflection wavelength band after post-baking. Moreover, the film produced using the polymerizable liquid crystal composition to which the comparative compound (C-2) and the comparative compound (C-3) are added has a slightly reduced selective reflection wavelength band after post-baking. On the other hand, it can be seen that any film produced using the polymerizable liquid crystal composition to which the compound of the present invention is added has a high heat resistance, with the selective reflection wavelength band hardly decreasing even after post-baking.
以上の結果から、本願発明の化合物を添加した重合性液晶組成物を用いて作製したフィルムは、ムラが少なく且つ、耐熱性が高いことがわかる。従って、本願発明の化合物は重合性組成物の構成部材として有用である。また、本願発明の化合物を含有する組成物を用いた光学異方体は、光学フィルム等の用途に有用である。 From the above results, it can be seen that the film produced using the polymerizable liquid crystal composition to which the compound of the present invention is added has little unevenness and high heat resistance. Therefore, the compound of the present invention is useful as a constituent member of the polymerizable composition. Moreover, the optical anisotropic body using the composition containing the compound of this invention is useful for uses, such as an optical film.
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