JP5830940B2 - Prepreg, metal-clad laminate and printed wiring board - Google Patents
Prepreg, metal-clad laminate and printed wiring board Download PDFInfo
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- JP5830940B2 JP5830940B2 JP2011122806A JP2011122806A JP5830940B2 JP 5830940 B2 JP5830940 B2 JP 5830940B2 JP 2011122806 A JP2011122806 A JP 2011122806A JP 2011122806 A JP2011122806 A JP 2011122806A JP 5830940 B2 JP5830940 B2 JP 5830940B2
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- 239000000126 substance Substances 0.000 claims description 80
- 239000000945 filler Substances 0.000 claims description 56
- 229910052698 phosphorus Inorganic materials 0.000 claims description 53
- 239000003795 chemical substances by application Substances 0.000 claims description 51
- 239000011574 phosphorus Substances 0.000 claims description 46
- 239000011521 glass Substances 0.000 claims description 42
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 40
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 39
- 239000011342 resin composition Substances 0.000 claims description 28
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 claims description 26
- 239000004593 Epoxy Substances 0.000 claims description 25
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 22
- 239000002245 particle Substances 0.000 claims description 21
- 125000000962 organic group Chemical group 0.000 claims description 20
- 125000000217 alkyl group Chemical group 0.000 claims description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 10
- 125000004437 phosphorous atom Chemical group 0.000 claims description 9
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 8
- 150000001875 compounds Chemical class 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 7
- 239000007787 solid Substances 0.000 claims description 7
- 125000003118 aryl group Chemical group 0.000 claims description 6
- 230000005484 gravity Effects 0.000 claims description 6
- 125000003700 epoxy group Chemical group 0.000 claims description 4
- 239000011888 foil Substances 0.000 claims description 4
- 238000003825 pressing Methods 0.000 claims description 4
- 229920005989 resin Polymers 0.000 description 51
- 239000011347 resin Substances 0.000 description 51
- 239000003822 epoxy resin Substances 0.000 description 37
- 229920000647 polyepoxide Polymers 0.000 description 37
- 229920003986 novolac Polymers 0.000 description 23
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 18
- 239000005011 phenolic resin Substances 0.000 description 17
- 238000000034 method Methods 0.000 description 13
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 12
- 239000000758 substrate Substances 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 10
- 238000003786 synthesis reaction Methods 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 8
- 229910052802 copper Inorganic materials 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 239000000377 silicon dioxide Substances 0.000 description 7
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000004843 novolac epoxy resin Substances 0.000 description 5
- 150000003017 phosphorus Chemical class 0.000 description 5
- 239000002966 varnish Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 4
- -1 amine compounds Chemical class 0.000 description 4
- 238000013329 compounding Methods 0.000 description 4
- 239000007822 coupling agent Substances 0.000 description 4
- 229930003836 cresol Natural products 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 239000011256 inorganic filler Substances 0.000 description 4
- 229910003475 inorganic filler Inorganic materials 0.000 description 4
- 239000000155 melt Substances 0.000 description 4
- ZRSNZINYAWTAHE-UHFFFAOYSA-N p-methoxybenzaldehyde Chemical compound COC1=CC=C(C=O)C=C1 ZRSNZINYAWTAHE-UHFFFAOYSA-N 0.000 description 4
- 150000002989 phenols Chemical class 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000000691 measurement method Methods 0.000 description 3
- 229920001568 phenolic resin Polymers 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- 239000002759 woven fabric Substances 0.000 description 3
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- 0 CC(C)c1ccc(*(C)C)cc1 Chemical compound CC(C)c1ccc(*(C)C)cc1 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 239000004745 nonwoven fabric Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 description 2
- 125000000467 secondary amino group Chemical class [H]N([*:1])[*:2] 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- WBODDOZXDKQEFS-UHFFFAOYSA-N 1,2,3,4-tetramethyl-5-phenylbenzene Chemical group CC1=C(C)C(C)=CC(C=2C=CC=CC=2)=C1C WBODDOZXDKQEFS-UHFFFAOYSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- BLBVJHVRECUXKP-UHFFFAOYSA-N 2,3-dimethoxy-1,4-dimethylbenzene Chemical group COC1=C(C)C=CC(C)=C1OC BLBVJHVRECUXKP-UHFFFAOYSA-N 0.000 description 1
- BSYJHYLAMMJNRC-UHFFFAOYSA-N 2,4,4-trimethylpentan-2-ol Chemical compound CC(C)(C)CC(C)(C)O BSYJHYLAMMJNRC-UHFFFAOYSA-N 0.000 description 1
- KMRIWYPVRWEWRG-UHFFFAOYSA-N 2-(6-oxobenzo[c][2,1]benzoxaphosphinin-6-yl)benzene-1,4-diol Chemical compound OC1=CC=C(O)C(P2(=O)C3=CC=CC=C3C3=CC=CC=C3O2)=C1 KMRIWYPVRWEWRG-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- BYSXXRDYEGGSGK-UHFFFAOYSA-N CCc1ccc(CCc(cccc2)c2O)cc1 Chemical compound CCc1ccc(CCc(cccc2)c2O)cc1 BYSXXRDYEGGSGK-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- 229910005793 GeO 2 Inorganic materials 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- XAVGNEJDRLVNOO-UHFFFAOYSA-N [P].OC1=CC=CC=C1 Chemical compound [P].OC1=CC=CC=C1 XAVGNEJDRLVNOO-UHFFFAOYSA-N 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 150000001343 alkyl silanes Chemical class 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 1
- 239000004842 bisphenol F epoxy resin Substances 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 230000036571 hydration Effects 0.000 description 1
- 238000006703 hydration reaction Methods 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000012784 inorganic fiber Substances 0.000 description 1
- 229910001853 inorganic hydroxide Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 1
- UFWIBTONFRDIAS-UHFFFAOYSA-N naphthalene-acid Natural products C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 1
- 150000004780 naphthols Chemical class 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- IYMSIPPWHNIMGE-UHFFFAOYSA-N silylurea Chemical compound NC(=O)N[SiH3] IYMSIPPWHNIMGE-UHFFFAOYSA-N 0.000 description 1
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical compound S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 125000001302 tertiary amino group Chemical group 0.000 description 1
- 238000003856 thermoforming Methods 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
- 125000006839 xylylene group Chemical group 0.000 description 1
- 150000003755 zirconium compounds Chemical class 0.000 description 1
Landscapes
- Reinforced Plastic Materials (AREA)
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
Description
本発明は、プリプレグと、このプリプレグを用いた金属張積層板及び印刷配線板とに関する。 The present invention relates to a prepreg, and a metal-clad laminate and a printed wiring board using the prepreg.
近年、半導体など電子機器の分野では高密度実装技術の進歩から従来の面実装からエリア実装に移行していくトレンドが進行し、BGA(Ball Grid Allay)やCSP(チップサイズパッケージ)など新しいパッケージが登場、増加しつつある。そのため以前にも増してインターポーザ用基板が注目されるようになり、高耐熱、低熱膨張のガラスエポキシ基板の要求が高まっている。
このような状況下、一般的に熱膨張係数を低減するために無機充填材、特に球状溶融シリカが多用されている。また、環境問題の高まりと共に、ハロゲン化物を含有しない樹脂系が求められ、難燃剤として水酸化アルミニウムを初めとした無機水酸化物と併用が多用されている(例えば、特許文献1〜3)。
In recent years, in the field of electronic equipment such as semiconductors, a trend of shifting from conventional surface mounting to area mounting has progressed due to advances in high-density mounting technology, and new packages such as BGA (Ball Grid Allay) and CSP (chip size package) have been developed. Appearance is increasing. For this reason, interposer substrates have attracted more attention than ever before, and there is an increasing demand for glass epoxy substrates with high heat resistance and low thermal expansion.
Under such circumstances, in general, inorganic fillers, particularly spherical fused silica, are frequently used to reduce the thermal expansion coefficient. In addition, with increasing environmental problems, resin systems that do not contain halides are required, and in combination with inorganic hydroxides such as aluminum hydroxide as flame retardants (for example, Patent Documents 1 to 3).
熱膨張係数低減を目的としてシリカ等のガラスフィラーを配合し、更に難燃性の確保及び加工性の向上を目的として水酸化アルミニウムを併用してなるプリプレグにあっては、このプリプレグを用いて基材を作製するときに、ガラスフィラーと水酸化アルミニウムの流動性の不均一性に起因して基材端部に樹脂の流動からなるスジが発生し、基材外観が悪化する、基材端部が中央部に比べて特性が低下する、基材のドリル加工性が低下する、といった問題があった。 In the case of a prepreg comprising a glass filler such as silica for the purpose of reducing the thermal expansion coefficient and further using aluminum hydroxide for the purpose of ensuring flame retardancy and improving processability, When producing a material, streaks composed of resin flow are generated at the end of the base due to non-uniformity of the fluidity of the glass filler and aluminum hydroxide, and the base end deteriorates. However, there are problems that the characteristics are deteriorated compared to the central part, and the drilling workability of the base material is lowered.
そこで、本発明は、シリカ等のガラスフィラーと共に、難燃性の確保や加工性の向上を目的として水酸化アルミニウムを併用しているにもかかわらず、ガラスフィラーが均一に分散し、樹脂の流動性が確保され、回路成形性に優れ、ドリル加工性に優れ、かつ低熱膨張である金属張積層板を得ることが可能なプリプレグと、このプリプレグを用いた金属張積層板及び印刷配線板とを提供することを目的とする。 Therefore, in the present invention, although glass hydroxide such as silica is used together with aluminum hydroxide for the purpose of ensuring flame retardancy and improving workability, the glass filler is uniformly dispersed, and the resin flow A prepreg capable of obtaining a metal-clad laminate having excellent properties, excellent circuit formability, excellent drillability, and low thermal expansion, and a metal-clad laminate and a printed wiring board using the prepreg The purpose is to provide.
本発明は以下の[1]〜[7]を提供するものである。
[1]基材に樹脂組成物を含浸させてなるプリプレグにおいて、前記樹脂組成物が、平均粒径2.5〜4.5μmの水酸化アルミニウムと、平均粒径1.0〜3.0μm、比重2.3〜2.6g/cm3かつSiO2の含有量が50〜65質量%のガラスフィラーとを含んでおり、前記樹脂組成物の固形分総量中における前記水酸化アルミニウムと前記ガラスフィラーの配合量の合計が30〜50質量%であるプリプレグ。
[2]前記樹脂組成物が1分子中にエポキシ基を少なくとも2個以上有する非ハロゲン化エポキシ化合物を有する[1]に記載のプリプレグ。
[3]前記樹脂組成物が下記化学式(1)で示されるリン含有硬化剤を含む[1]又は[2]に記載のプリプレグ。
[4]前記化学式(1)におけるRで示される有機基が、下記化学式(2)、(3)、(4)、(5)、及び(6)から選択される構造の1種又は2種以上を有し、フェノール性水酸基を2個以上有する[3]に記載のプリプレグ。
(化学式(2)〜(6)における*は、化学式(1)のリン原子に直接結合する部位であることを示す。)
[5]化学式(1)におけるRで示される有機基が、下記化学式(7)、(8)及び(9)から選択される構造の1種又は2種以上を有し、フェノール性水酸基を2個以上有する請求項4に記載のエポキシ樹脂組成物。
(化学式(7)〜(9)における*は、化学式(1)のリン原子に直接結合する部位であることを示す。)
[7][6]に記載の金属張積層板の金属層を配線加工して成る印刷配線板。
The present invention provides the following [1] to [7].
[1] In a prepreg formed by impregnating a resin composition into a substrate, the resin composition contains aluminum hydroxide having an average particle diameter of 2.5 to 4.5 μm, an average particle diameter of 1.0 to 3.0 μm, A glass filler having a specific gravity of 2.3 to 2.6 g / cm 3 and a SiO 2 content of 50 to 65 mass%, and the aluminum hydroxide and the glass filler in the total solid content of the resin composition The prepreg whose sum total of the compounding quantity is 30-50 mass%.
[2] The prepreg according to [1], wherein the resin composition has a non-halogenated epoxy compound having at least two epoxy groups in one molecule.
[3] The prepreg according to [1] or [2], wherein the resin composition includes a phosphorus-containing curing agent represented by the following chemical formula (1).
[4] One or two kinds of structures in which the organic group represented by R in the chemical formula (1) is selected from the following chemical formulas (2), (3), (4), (5), and (6) The prepreg according to [3], having the above and having two or more phenolic hydroxyl groups.
(* In chemical formulas (2) to (6) indicates a site directly bonded to the phosphorus atom of chemical formula (1).)
[5] The organic group represented by R in the chemical formula (1) has one or more types of structures selected from the following chemical formulas (7), (8) and (9), and has 2 phenolic hydroxyl groups. The epoxy resin composition according to claim 4 having at least one.
(* In chemical formulas (7) to (9) indicates a site directly bonded to the phosphorus atom of chemical formula (1).)
[7] A printed wiring board obtained by wiring a metal layer of the metal-clad laminate according to [6].
本発明によると、ガラスフィラーと水酸化アルミニウムとを併用しているにもかかわらず、ガラスフィラーが均一に分散しており、ドリル加工性に優れ、かつ低熱膨張率である金属張積層板を得ることが可能なプリプレグと、このプリプレグを用いた金属針積層板及び印刷配線板とを提供することが可能である。 According to the present invention, despite the combined use of glass filler and aluminum hydroxide, the glass filler is uniformly dispersed, and a metal-clad laminate having excellent drill workability and a low thermal expansion coefficient is obtained. It is possible to provide a prepreg that can be used, and a metal needle laminate and a printed wiring board using the prepreg.
[プリプレグ]
本発明に用いるプリプレグは、基材に特定の樹脂組成物を含浸させてなるものである。
<基材>
基材としては、金属箔張り積層板や多層印刷配線板を製造する際に用いられるものであれば特に制限されないが、通常、織布や不織布等の繊維基材が用いられる。繊維基材の材質としては、ガラス、アルミナ、ボロン、シリカアルミナガラス、シリカガラス、チラノ、炭化ケイ素、窒化ケイ素、ジルコニア等の無機繊維やアラミド、ポリエーテルエーテルケトン、ポリエーテルイミド、ポリエーテルサルフォン、カーボン、セルロース等の有機繊維等およびこれらの混抄系があり、特にガラス繊維の織布が好ましく用いられる。プリプレグに使用される基材としては、10μm〜200μmのガラス織布が特に好適に用いられる。
[Prepreg]
The prepreg used in the present invention is obtained by impregnating a base material with a specific resin composition.
<Base material>
The substrate is not particularly limited as long as it is used when producing a metal foil-clad laminate or a multilayer printed wiring board, but a fiber substrate such as a woven fabric or a nonwoven fabric is usually used. Examples of the fiber base material include glass, alumina, boron, silica-alumina glass, silica glass, tyrano, silicon carbide, silicon nitride, zirconia, and other inorganic fibers, aramid, polyetheretherketone, polyetherimide, polyethersulfone Further, there are organic fibers such as carbon and cellulose, and mixed papers thereof, and glass fiber woven fabrics are particularly preferably used. As the base material used for the prepreg, a glass woven fabric of 10 μm to 200 μm is particularly preferably used.
<樹脂組成物>
上記樹脂組成物は、平均粒径2.5〜4.5μmの水酸化アルミニウムと、平均粒径1.0〜3.0μm、比重2.3〜2.6g/cm3かつSiO2比率50〜65質量%のガラスフィラーとを含んでおり、固形分総量中における前記水酸化アルミニウムと前記ガラスフィラーの配合量の合計が30〜50質量%であるものである。
次に、樹脂組成物の各成分について説明する。
<Resin composition>
The resin composition includes aluminum hydroxide having an average particle diameter of 2.5 to 4.5 μm, an average particle diameter of 1.0 to 3.0 μm, a specific gravity of 2.3 to 2.6 g / cm 3 and a SiO 2 ratio of 50 to 50. 65 mass% glass filler is included, and the total of the compounding quantity of the said aluminum hydroxide and the said glass filler in solid content total amount is 30-50 mass%.
Next, each component of the resin composition will be described.
≪水酸化アルミニウム≫
上記樹脂組成物は、水酸化アルミニウムを含んでいる。水酸化アルミニウムは水酸化マグネシウムやその他の無機水和物に比べ水和水の数が多く、難燃性が良好であり、また酸・アルカリに対しても比較的安定であるため、積層板用途に好適である。また、樹脂の流動を勘案すると、平均粒径は2.5〜4.5μmであることが必要である。2.5μmを下回ると比表面積の増大により、耐薬品性が低下する。また4.5μmを上回ると、ワニス中での沈降が早くなるため好ましくない。
なお、平均粒径は、例えば、日機装株式会社製レーザー散乱粒度分布計MT3000等を用い水を分散液として測定することができる。
≪Aluminum hydroxide≫
The resin composition contains aluminum hydroxide. Aluminum hydroxide has more hydration water than magnesium hydroxide and other inorganic hydrates, has good flame retardancy, and is relatively stable against acids and alkalis. It is suitable for. In consideration of resin flow, the average particle size needs to be 2.5 to 4.5 μm. If it is less than 2.5 μm, the chemical resistance decreases due to an increase in specific surface area. On the other hand, if it exceeds 4.5 μm, the sedimentation in the varnish is accelerated, which is not preferable.
The average particle diameter can be measured using water as a dispersion using, for example, a laser scattering particle size distribution meter MT3000 manufactured by Nikkiso Co., Ltd.
≪ガラスフィラー≫
また、ガラスフィラーとしては、SiO2の含有量が50〜65質量%であるものが用いられる。SiO2の含有量が50%未満であると熱膨張低減効果が小さくなり、また、65%を上回るとドリル等の加工性が悪化するため好ましくない。
ガラスフィラー中のSiO2以外の成分としては、Al2O3、K2O、Na2O、CaO、Fe2O3、B2O3、SrO、MgO、MnO、GeO2、P2O3、P2O5、Y2O5、ZrO2等が考えられるがこれらに制限されるものではない。
また、ガラスフィラーは、平均粒径が1.0μm〜3.0μmであり、かつ比重が2.3g/cm3〜2.5g/cm3である。この範囲外のガラスフィラーを有するプリプレグは、樹脂の流動性低下が大きくなり、凝集が発生して回路成形性に劣るものとなる。
熱膨張特性としては、Tg以下における熱膨張係数が40ppm/℃であることが好ましい。また、ガラスフィラーの溶融温度は、1700℃以上であると、撹拌が均一に行われて品質が安定するため好ましい。
≪Glass filler≫
As the glass filler, those content of SiO 2 is 50 to 65 mass% is used. If the content of SiO 2 is less than 50%, the effect of reducing thermal expansion becomes small, and if it exceeds 65%, the workability of a drill or the like deteriorates, which is not preferable.
Components other than SiO 2 in the glass filler include Al 2 O 3 , K 2 O, Na 2 O, CaO, Fe 2 O 3 , B 2 O 3 , SrO, MgO, MnO, GeO 2 and P 2 O 3. , P 2 O 5 , Y 2 O 5 , ZrO 2 and the like can be considered, but are not limited thereto.
The glass filler has an average particle size of 1.0Myuemu~3.0Myuemu, and specific gravity of 2.3g / cm 3 ~2.5g / cm 3 . A prepreg having a glass filler outside this range has a large decrease in resin fluidity, and agglomeration occurs, resulting in poor circuit moldability.
As a thermal expansion characteristic, it is preferable that the thermal expansion coefficient below Tg is 40 ppm / ° C. The melting temperature of the glass filler is preferably 1700 ° C. or higher because stirring is performed uniformly and the quality is stabilized.
≪水酸化アルミニウム及びガラスフィラー≫
樹脂組成物の固形分総量中における、前記水酸化アルミニウムと前記ガラスフィラーの配合量の合計は、30〜50質量%である。この合計が30質量%を下回ると、接続信頼性を確保するための低熱膨張特性を得られず、また、50質量%を上回ると、外層ピール強度の低下、ドリル磨耗量増加、及び回路成形性の低下が認められる。
なお、水酸化アルミニウムとガラスフィラーの使用比率は任意に設定することができるが、4:6〜6:4であることが好ましい。この範囲内であると、耐熱性が高く、ドリル摩耗量が小さく、流動性に優れたものとなる。
≪Aluminum hydroxide and glass filler≫
The sum total of the compounding quantity of the said aluminum hydroxide and the said glass filler in the solid content total amount of a resin composition is 30-50 mass%. If this total is less than 30% by mass, low thermal expansion characteristics for ensuring connection reliability cannot be obtained, and if it exceeds 50% by mass, the outer layer peel strength decreases, the drill wear increases, and the circuit formability. Decrease is observed.
The use ratio of aluminum hydroxide and glass filler can be arbitrarily set, but is preferably 4: 6 to 6: 4. Within this range, heat resistance is high, drill wear is small, and fluidity is excellent.
≪樹脂≫
樹脂組成物中における樹脂としては特に制限はないが、熱硬化性樹脂が望ましく、耐熱性に富む熱可塑性樹脂でもよい。樹脂としては、例えばエポキシ樹脂、ポリイミド樹脂、トリアジン樹脂、メラミン樹脂、フェノール樹脂等が用いられる。また、これらの樹脂は2種類以上併用しても良く、必要に応じて後述する各種硬化剤、硬化促進剤を樹脂に配合し、これらを溶剤、溶液として配合してもかまわない。
≪Resin≫
The resin in the resin composition is not particularly limited, but is preferably a thermosetting resin, and may be a thermoplastic resin having high heat resistance. As the resin, for example, an epoxy resin, a polyimide resin, a triazine resin, a melamine resin, a phenol resin, or the like is used. Two or more kinds of these resins may be used in combination, and if necessary, various curing agents and curing accelerators described later may be blended in the resin, and these may be blended as a solvent or a solution.
上記樹脂としては、1分子中にエポキシ基を少なくとも2個以上有するエポキシ樹脂を用いることが好ましい。特に、1分子中にエポキシ基を少なくとも2個以上有し、かつハロゲン原子を含有しない非ハロゲン化エポキシ化合物を含むことが好ましい。これにより、火災等による燃焼時にハロゲン元素に起因する有毒ガスが発生することが防止され、また、加熱時にハロゲン元素の分解により耐熱性や信頼性が低下することも防止される。この非ハロゲン化エポキシ化合物としては、例えば、ビスフェノールAエポキシ樹脂、ビスフェノールFエポキシ樹脂、ビスフェノールS型エポキシ樹脂、ビフェニル型エポキシ樹脂、脂環式エポキシ樹脂、フェノールノボラックエポキシ樹脂、ビスフェノールAノボラックエポキシ樹脂、クレゾールノボラックエポキシ樹脂、多官能フェノールのジグリシジルエーテル化物、多官能アルコールのジグリシジルエーテル化物、これらの水素添加物などが挙げられるが、これらに限定されるものではない。これら非ハロゲン化エポキシ化合物は、単独で用いても、何種類かを併用しても良い。これらのなかでも、耐熱性及び高いガラス転移温度を考慮すると、フェノールノボラックエポキシ樹脂、ビスフェノールAノボラックエポキシ樹脂、クレゾールノボラックエポキシ樹脂等のノボラック型エポキシ樹脂が好ましい。また、電気特性を考慮すると、テトラメチルビフェニル型エポキシ、フェノールアラキルエポキシ、ナフタレンアラキルエポキシ、ジシクロペンタジエン型エポキシ等のエポキシ樹脂を用いることが望ましい。 As the resin, it is preferable to use an epoxy resin having at least two epoxy groups in one molecule. In particular, it is preferable to include a non-halogenated epoxy compound having at least two epoxy groups in one molecule and not containing a halogen atom. This prevents the generation of toxic gas due to the halogen element during combustion due to a fire or the like, and also prevents the heat resistance and reliability from being degraded due to decomposition of the halogen element during heating. Examples of the non-halogenated epoxy compound include bisphenol A epoxy resin, bisphenol F epoxy resin, bisphenol S type epoxy resin, biphenyl type epoxy resin, alicyclic epoxy resin, phenol novolac epoxy resin, bisphenol A novolac epoxy resin, and cresol. Examples thereof include, but are not limited to, novolak epoxy resins, diglycidyl etherified products of polyfunctional phenols, diglycidyl etherified products of polyfunctional alcohols, and hydrogenated products thereof. These non-halogenated epoxy compounds may be used alone or in combination. Among these, in consideration of heat resistance and a high glass transition temperature, novolac type epoxy resins such as phenol novolac epoxy resin, bisphenol A novolac epoxy resin, and cresol novolac epoxy resin are preferable. In consideration of electrical characteristics, it is desirable to use an epoxy resin such as tetramethylbiphenyl type epoxy, phenol aralkyl epoxy, naphthalene aralkyl epoxy, or dicyclopentadiene type epoxy.
≪硬化剤≫
硬化剤としては、従来公知の種々のものを使用することができ、例えば樹脂としてエポキシ樹脂を用いる場合には、ジシアンジアミド、ジアミノジフェニルメタン、ジアミノジフェニルスルフォン等のアミン化合物、無水フタル酸、無水ピロメリット酸等の酸無水物化合物、フェノールノボラック樹脂やクレゾールノボラック樹脂等の多官能性フェノール化合物などを挙げることができる。これらの硬化剤は何種類かを併用することも可能である。
(リン含有硬化剤)
また、リン含有硬化剤を使用することもできる。このリン含有硬化剤としては、下記化学式(1)で示されるリン含有硬化剤を好適に用いることができる。
≪Curing agent≫
As the curing agent, various conventionally known ones can be used. For example, when an epoxy resin is used as the resin, amine compounds such as dicyandiamide, diaminodiphenylmethane, and diaminodiphenylsulfone, phthalic anhydride, pyromellitic anhydride And polyfunctional phenolic compounds such as phenol novolac resins and cresol novolac resins. Several kinds of these curing agents can be used in combination.
(Phosphorus-containing curing agent)
A phosphorus-containing curing agent can also be used. As this phosphorus containing hardening | curing agent, the phosphorus containing hardening | curing agent shown by following Chemical formula (1) can be used conveniently.
(ただし、Rはフェノール性水酸基を2個以上有しかつ分子量が180以上である有機基である。) (However, R is an organic group having two or more phenolic hydroxyl groups and a molecular weight of 180 or more.)
このリン含有硬化剤を用いたプリプレグ、金属箔張積層板などの成形品は、難燃性を有し、更に耐熱性、電気特性、耐水性等の特性も非常に良好である。
上記化学式(1)中、Rはフェノール性水酸基を2個以上有しかつ分子量が180以上である有機基であることが好ましく、190以上である有機基であることがより好ましい。この分子量が180以上であると、リン硬化剤の溶剤溶解性が向上し、取り扱い性が向上する。リン含有硬化剤としては、例えば、HCA−HQ(10−(2,5−ジヒドロキシフェニル)−10H−9−オキサ−10−ホスファフェナントレン−10−オキシド)、HCA−NQ(10−(2,7−ジヒドロキシナフチル)−10−ジヒドロ−9−オキサ−10−ホスファフェナントレン−10−オキシド)等が挙げられる。
これらは、溶剤への溶解性が低いため、プレ反応を行ってから配合することが一般的である。更に有機基(R)の構造中に化学式(−(CH2)−)で示される構造を有することが好ましい。化学式(−(CH2)−)で示される構造を有する場合、耐熱性が向上し、取り扱い性が向上する。
Molded articles such as prepregs and metal foil-clad laminates using this phosphorus-containing curing agent have flame retardancy and also have very good characteristics such as heat resistance, electrical characteristics, and water resistance.
In the above chemical formula (1), R is preferably an organic group having two or more phenolic hydroxyl groups and a molecular weight of 180 or more, more preferably an organic group of 190 or more. When the molecular weight is 180 or more, the solvent solubility of the phosphorus curing agent is improved and the handleability is improved. Examples of the phosphorus-containing curing agent include HCA-HQ (10- (2,5-dihydroxyphenyl) -10H-9-oxa-10-phosphaphenanthrene-10-oxide), HCA-NQ (10- (2, 7-dihydroxynaphthyl) -10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide) and the like.
Since these have low solubility in a solvent, they are generally blended after a pre-reaction. Furthermore, it is preferable that the structure of the organic group (R) has a structure represented by the chemical formula (— (CH 2 ) —). When it has a structure represented by the chemical formula (— (CH 2 ) —), the heat resistance is improved and the handleability is improved.
難燃性の観点からは、樹脂組成物中のリン含有量は、樹脂組成物の固形分全体の0.8〜5.0質量%であることが好ましく、1.0〜2.5質量%であることがより好ましい。リン含有量が、樹脂組成物の固形分全体の0.8質量%未満の場合は、安定した難燃性が得られ難く、5.0質量%を超える場合は、硬化物の特性が悪化する。
ここで、リン含有量とは、樹脂組成物中におけるリン原子の含有量であり、例えば、分子量620の物質にリン原子が1個あり、この物質を50質量%含む配合であれば、2.5質量%のリン成分含有量になる(リン原子の原子量が約31であるから、31/620×0.5=0.0250)。
From the viewpoint of flame retardancy, the phosphorus content in the resin composition is preferably 0.8 to 5.0 mass% of the total solid content of the resin composition, and preferably 1.0 to 2.5 mass%. It is more preferable that When the phosphorus content is less than 0.8% by mass of the total solid content of the resin composition, it is difficult to obtain stable flame retardancy, and when it exceeds 5.0% by mass, the properties of the cured product are deteriorated. .
Here, the phosphorus content is the content of phosphorus atoms in the resin composition. For example, if a substance having a molecular weight of 620 has one phosphorus atom and contains 50% by mass of this substance, 2. The phosphorus component content is 5 mass% (since the atomic weight of phosphorus atoms is about 31, 31/620 × 0.5 = 0.0250).
(化学式(1)におけるRで示される有機基)
化学式(1)におけるRで示される有機基は、下記化学式(2)、(3)、(4)、(5)、及び(6)から選択される構造の1種又は2種以上を有し、フェノール性水酸基を2個以上有する。化学式(2)〜(6)における*は、化学式(1)のリン原子に直接結合する部位であることを示す。
(Organic group represented by R in chemical formula (1))
The organic group represented by R in the chemical formula (1) has one or more types of structures selected from the following chemical formulas (2), (3), (4), (5), and (6). And having two or more phenolic hydroxyl groups. * In chemical formulas (2) to (6) indicates a site directly bonded to the phosphorus atom of chemical formula (1).
また、化学式(1)におけるRで示される有機基は、下記化学式(7)、(8)及び(9)から選択される構造の1種又は2種以上を有し、フェノール性水酸基を2個以上有する有機基とすることができる。化学式(7)〜(9)における*は、化学式(1)のリン原子に直接結合する部位であることを示す。 In addition, the organic group represented by R in the chemical formula (1) has one or more types of structures selected from the following chemical formulas (7), (8) and (9), and includes two phenolic hydroxyl groups. It can be set as the organic group which has the above. * In chemical formulas (7) to (9) indicates a site directly bonded to the phosphorus atom of chemical formula (1).
上記化学式(2)で示される構造を有する場合、該リン含有硬化剤を含むエポキシ樹脂組成物の耐熱性が向上する。また、反応系である溶媒へのリン含有硬化剤の溶解性が向上するため取り扱い性が向上する。
上記化学式(3)で示される構造を有する場合、樹脂との反応性が向上する。
上記化学式(4)で示される構造を有する場合、該リン含有硬化剤を含むエポキシ樹脂組成物の耐熱性が向上する。
上記化学式(5)〜(9)で示される構造を有する場合、該リン含有硬化剤を含むエポキシ樹脂組成物の耐熱性が向上する。
特に、上記化学式(2)で示される構造を有する該リン含有硬化剤は、低粘度であるため、取り扱い性に優れ、生産性を向上することができる。
When it has a structure shown by the said Chemical formula (2), the heat resistance of the epoxy resin composition containing this phosphorus containing hardening | curing agent improves. Moreover, since the solubility of the phosphorus containing hardening | curing agent to the solvent which is a reaction system improves, a handleability improves.
When having the structure represented by the chemical formula (3), the reactivity with the resin is improved.
When it has a structure shown by the said Chemical formula (4), the heat resistance of the epoxy resin composition containing this phosphorus containing hardening | curing agent improves.
When it has a structure shown by the said Chemical formula (5)-(9), the heat resistance of the epoxy resin composition containing this phosphorus containing hardening | curing agent improves.
In particular, since the phosphorus-containing curing agent having the structure represented by the chemical formula (2) has a low viscosity, it is excellent in handleability and can improve productivity.
(リン含有硬化剤1)
例えば、リン含有硬化剤は、下記化学式(10)で表される構造単位Aと化学式(11)で表される構造単位Bとを有する樹脂とすることができる。
(Phosphorus-containing curing agent 1)
For example, the phosphorus-containing curing agent can be a resin having a structural unit A represented by the following chemical formula (10) and a structural unit B represented by the chemical formula (11).
すなわち、この樹脂は、構造単位Aが複数個連続してなるユニットを有していてもよく、構造単位Bが複数個連続してなるユニットを有していてもよく、構造単位Aと構造単位Bとが交互に連結してなるユニットを有していてもよく、前記三者ユニットが混在した構造を有していてもよい。
上述した構造単位を有するフェノール樹脂をリン含有硬化剤として用いた場合には、エポキシ樹脂組成物の耐熱性が向上する。
That is, this resin may have a unit in which a plurality of structural units A are continuous, or may have a unit in which a plurality of structural units B are continuous. It may have a unit formed by alternately connecting B and may have a structure in which the three party units are mixed.
When the phenol resin having the structural unit described above is used as a phosphorus-containing curing agent, the heat resistance of the epoxy resin composition is improved.
(リン含有硬化剤2)
(A)リン含有硬化剤は、下記化学式(12)で表される構造単位Cと化学式(13)で表される構造単位Dとを有する樹脂とすることができる。
(Phosphorus-containing curing agent 2)
(A) The phosphorus-containing curing agent can be a resin having a structural unit C represented by the following chemical formula (12) and a structural unit D represented by the chemical formula (13).
すなわち、この樹脂は、構造単位Cが複数個連続してなるユニットを有していてもよく、構造単位Dが複数個連続してなるユニットを有していてもよく、構造単位Cと構造単位Dとが交互に連結してなるユニットを有していてもよく、前記三者ユニットが混在した構造を有していてもよい。
上述した構造単位を有するフェノール樹脂をリン含有硬化剤として用いた場合には、エポキシ樹脂組成物の耐熱性が向上する。
That is, this resin may have a unit in which a plurality of structural units C are continuous, or may have a unit in which a plurality of structural units D are continuous. It may have a unit formed by alternately connecting D and may have a structure in which the three party units are mixed.
When the phenol resin having the structural unit described above is used as a phosphorus-containing curing agent, the heat resistance of the epoxy resin composition is improved.
(リン含有硬化剤3)
(A)リン含有硬化剤は、下記化学式(14)で表される構造単位Eと化学式(15)で表される構造単位Fとを有する樹脂とすることができる。
(Phosphorus-containing curing agent 3)
(A) The phosphorus-containing curing agent may be a resin having a structural unit E represented by the following chemical formula (14) and a structural unit F represented by the chemical formula (15).
すなわち、この樹脂は、構造単位Eが複数個連続してなるユニットを有していてもよく、構造単位Fが複数個連続してなるユニットを有していてもよく、構造単位Eと構造単位Fとが交互に連結してなるユニットを有していてもよく、前記三者ユニットが混在した構造を有していてもよい。
上述した構造単位を有するフェノール樹脂をリン含有硬化剤として用いた場合には、エポキシ樹脂組成物の耐熱性が向上する。
That is, this resin may have a unit in which a plurality of structural units E are continuous, or may have a unit in which a plurality of structural units F are continuous. It may have a unit formed by alternately connecting with F, and may have a structure in which the three party units are mixed.
When the phenol resin having the structural unit described above is used as a phosphorus-containing curing agent, the heat resistance of the epoxy resin composition is improved.
(リン含有硬化剤の製造方法)
化学式(1)で表されるリン含有硬化剤は、化学式(16)で表されるリン化合物に、フェノール性水酸基を有する化合物を反応して得られる。また、場合により、p−アニスアルデヒドを添加してもよい。
(Method for producing phosphorus-containing curing agent)
The phosphorus-containing curing agent represented by the chemical formula (1) is obtained by reacting a compound having a phenolic hydroxyl group with the phosphorus compound represented by the chemical formula (16). In some cases, p-anisaldehyde may be added.
リン含有硬化剤の製造にかかり使用可能なフェノール性水酸基を有する化合物としては、1分子中に2個以上のフェノール性水酸基を有する化合物が好ましく、フェノール、クレゾール、キシレノール、レゾルシン、カテコール、ビスフェノールA、ビスフェノールFなどのフェノール類又はα−ナフトール、β−ナフトール、ジヒドロキシナフタレン等のナフトール類とホルムアルデヒド、アセトアルデヒド、プロピオンアルデヒド、ベンズアルデヒド、サリチルアルデヒド等のアルデヒド類とを酸性触媒下で縮合又は共縮合させて得られる樹脂(ノボラック類)、ポリパラビニルフェノール樹脂、フェノール類とジメトキシパラキシレンから合成されるキシリレン基を有するフェノール・アラルキル樹脂などがあり、単独又は2種類以上併用してもよい。 As a compound having a phenolic hydroxyl group that can be used in the production of a phosphorus-containing curing agent, a compound having two or more phenolic hydroxyl groups in one molecule is preferable, and phenol, cresol, xylenol, resorcin, catechol, bisphenol A, Obtained by condensing or co-condensing phenols such as bisphenol F or naphthols such as α-naphthol, β-naphthol, dihydroxynaphthalene and the like and aldehydes such as formaldehyde, acetaldehyde, propionaldehyde, benzaldehyde, salicylaldehyde in the presence of an acidic catalyst. Resins (novolaks), polyparavinylphenol resins, phenol / aralkyl resins having a xylylene group synthesized from phenols and dimethoxyparaxylene, alone or in combination of two or more May be used.
≪硬化促進剤≫
硬化促進剤の種類や配合量は特に制限されるものではなく、例えばイミダゾール系化合物、有機リン系化合物、第2級アミン、第3級アミン、第4級アンモニウム塩等が用いられ、2種類以上を併用しても良い。硬化促進剤の配合量も特に制限されるものではないが、主材である樹脂100質量部に対して0.01〜10.0質量部が望ましい。
≪Curing accelerator≫
The type and blending amount of the curing accelerator are not particularly limited, and for example, imidazole compounds, organophosphorus compounds, secondary amines, tertiary amines, quaternary ammonium salts, etc. are used, and two or more types are used. May be used in combination. Although the compounding quantity of a hardening accelerator is not restrict | limited in particular, 0.01-10.0 mass parts is desirable with respect to 100 mass parts of resin which is a main material.
≪カップリング剤≫
樹脂組成物中には、カップリング剤を添加してもよい。カップリング剤を添加することによって、無機充填材の分散性を向上させ、耐薬品性やピール強度に優れる材料を得ることができる。
カップリング剤としては、熱硬化性樹脂組成物に一般に使用されているもので特に制限はないが、たとえば、1級及び/又は2級及び/又は3級アミノ基を有するシラン化合物、エポキシシラン、メルカプトシラン、アルキルシラン、ウレイドシラン、ビニルシラン等の各種シラン系化合物、チタン系化合物、アルミニウムキレート類、アルミニウム/ジルコニウム系化合物等が挙げられる。
≪Coupling agent≫
A coupling agent may be added to the resin composition. By adding a coupling agent, the dispersibility of the inorganic filler can be improved, and a material excellent in chemical resistance and peel strength can be obtained.
The coupling agent is generally used in thermosetting resin compositions and is not particularly limited. For example, a silane compound having primary and / or secondary and / or tertiary amino groups, epoxy silane, Examples include various silane compounds such as mercaptosilane, alkyl silane, ureido silane, and vinyl silane, titanium compounds, aluminum chelates, and aluminum / zirconium compounds.
<プリプレグの製造方法>
基材に樹脂組成物を含浸させる方法としては特に制限されるものではない。例えば、ウェット方式やドライ方式などで、樹脂組成物ワニスに基材を含浸させる方法、樹脂組成物を基材に塗布する方法などが挙げられる。例えば、ガラスクロスやガラス不織布に前記熱硬化性樹脂組成物を塗布・含浸させ、連続又は非連続的に加熱乾燥してBステージ化することにより、プリプレグを得ることができる。
<Method for producing prepreg>
The method for impregnating the base material with the resin composition is not particularly limited. For example, a method of impregnating a substrate with a resin composition varnish by a wet method or a dry method, a method of applying a resin composition to a substrate, and the like can be mentioned. For example, a prepreg can be obtained by applying and impregnating the thermosetting resin composition to a glass cloth or a glass nonwoven fabric, and heating or drying continuously or discontinuously to form a B stage.
[金属張積層板及び印刷配線板]
上記プリプレグまたはそれを複数枚積層した積層体に、必要に応じてその片面又は両面に金属箔を重ね、加熱加圧成形することにより金属箔張積層板となる。この加熱温度は好ましくは170℃〜240℃であり、圧力は好ましくは1〜8MPaである。
また、この金属張積層板の金属層を配線加工(回路加工)して印刷配線板(回路板)とすることができる。
この金属箔としては8μm〜80μmが一般的であり、この積層体の厚みとしては20μm〜200μmが一般的である。
[Metal-clad laminates and printed wiring boards]
A metal foil-clad laminate is obtained by laminating a metal foil on one or both sides of the prepreg or a laminate obtained by laminating a plurality of the prepregs and then subjecting the laminate to heating and pressing. The heating temperature is preferably 170 ° C to 240 ° C, and the pressure is preferably 1 to 8 MPa.
Further, the metal layer of the metal-clad laminate can be processed by wiring (circuit processing) to obtain a printed wiring board (circuit board).
The metal foil is generally 8 μm to 80 μm, and the thickness of the laminate is generally 20 μm to 200 μm.
更に、金属箔張積層板または回路パターン形成済みの内層用基板の両面又は片面に、上記プリプレグを介し樹脂面を対向させて積層し、加熱成形して、さらに外層の回路形成を施すことにより、多層プリント配線板を得ることもできる。 Further, by laminating the metal foil-clad laminate or the circuit pattern-formed inner layer substrate with the resin surface facing each other through the prepreg, thermoforming, and further forming the outer layer circuit, A multilayer printed wiring board can also be obtained.
以下に、実施例により本発明をさらに詳しく説明するが、本発明の技術思想を逸脱しない限り、本発明はこれらの実施例に限定されるものではない。
[製造例1(ガラスフィラーA)]
SiO2:53質量%、Al2O3:14質量%、CaO:20質量%、MgO:3質量%、B2O3:10質量%を含有する無機物を高温溶解させ冷却した後、ボールミルで粉砕、サイクロン分級機で分級を実施し、平均粒径2.0μm、比重2.5g/cm3のガラスフィラー(破砕無機充填物)Aを作製した。
なお、平均粒径は、日機装株式会社製レーザー散乱粒度分布計MT3000を用い水を分散液として測定した。
Hereinafter, the present invention will be described in more detail with reference to examples. However, the present invention is not limited to these examples without departing from the technical idea of the present invention.
[Production Example 1 (Glass Filler A)]
After an inorganic substance containing SiO 2 : 53 mass%, Al 2 O 3 : 14 mass%, CaO: 20 mass%, MgO: 3 mass%, B 2 O 3 : 10 mass% is dissolved at high temperature and cooled, Crushing and classification with a cyclone classifier were carried out to produce a glass filler (crushed inorganic filler) A having an average particle size of 2.0 μm and a specific gravity of 2.5 g / cm 3 .
The average particle diameter was measured using water as a dispersion using a laser scattering particle size distribution analyzer MT3000 manufactured by Nikkiso Co., Ltd.
[製造例2(ガラスフィラーB)]
SiO2:62質量%、Al2O3:18質量%、CaO:8質量%、B2O3:12質量%を含有する無機物を高温溶解させ冷却した後、ボールミルで粉砕、サイクロン分級機で分級を実施し、平均粒径2.0μm、比重2.4g/cm3のガラスフィラー(破砕無機充填物)Bを作製した。
[Production Example 2 (Glass filler B)]
An inorganic substance containing SiO 2 : 62% by mass, Al 2 O 3 : 18% by mass, CaO: 8% by mass, B 2 O 3 : 12% by mass is dissolved at high temperature and cooled, and then pulverized with a ball mill, with a cyclone classifier. Classification was performed to prepare a glass filler (crushed inorganic filler) B having an average particle size of 2.0 μm and a specific gravity of 2.4 g / cm 3 .
[合成例1(リン系樹脂(硬化剤)1)]
以下に、リン系樹脂(硬化剤)1の合成方法を述べる。
なお、180℃における溶融粘度はASTM D4287に準拠して測定し、軟化点はJIS K7234に準拠して測定した。
温度計、冷却管、分留管、窒素ガス導入管、撹拌機を取り付けたフラスコにフェノールノボラック樹脂192.4g(1.85モル)とp-アニスアルデヒド68.0g(0.50モル)と9,10−ジヒドロ−9−オキサ−10−ホスファフェナントレン−10−オキサイド(以下HCAと略)108.0g(0.50モル)を仕込み、180℃まで昇温し180℃で8時間反応させた。
ついで、水を加熱減圧下に除去し、下記化学式(10)で表される構造単位と下記化学式(11)で表される構造単位とを有するフェノール樹脂(リン系樹脂(硬化剤))1を355g得た。得られたフェノール樹脂(リン系樹脂(硬化剤))1の軟化点は125℃(B&R法)、溶融粘度(測定法:ICI粘度計法、測定温度:180℃)は13dPa・s、水酸基当量は190g/eq、リン含有量4.2質量%であった。
[Synthesis Example 1 (Phosphorus Resin (Curing Agent) 1)]
A method for synthesizing the phosphorus resin (curing agent) 1 will be described below.
The melt viscosity at 180 ° C. was measured according to ASTM D4287, and the softening point was measured according to JIS K7234.
In a flask equipped with a thermometer, a condenser tube, a fractionating tube, a nitrogen gas inlet tube, and a stirrer, 192.4 g (1.85 mol) of phenol novolac resin, 68.0 g (0.50 mol) of p-anisaldehyde and 9 , 10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide (hereinafter abbreviated as HCA) 108.0 g (0.50 mol), heated to 180 ° C. and reacted at 180 ° C. for 8 hours. .
Next, water is removed under reduced pressure by heating, and a phenol resin (phosphorous resin (curing agent)) 1 having a structural unit represented by the following chemical formula (10) and a structural unit represented by the following chemical formula (11) is obtained. 355 g was obtained. The obtained phenol resin (phosphorus resin (curing agent)) 1 has a softening point of 125 ° C. (B & R method), a melt viscosity (measurement method: ICI viscometer method, measurement temperature: 180 ° C.) of 13 dPa · s, hydroxyl group equivalent Was 190 g / eq, and the phosphorus content was 4.2 mass%.
[合成例2(リン系樹脂(硬化剤)2)]
合成例1において、フェノールノボラック樹脂の代わりにビスフェノールAノボラック樹脂330.4g(2.80モル)に変えた以外は合成例1と同様にして、下記化学式(12)で表される構造単位と下記化学式(13)で表される構造単位とを有するフェノール樹脂(リン系樹脂(硬化剤))2を490g得た。このフェノール樹脂(リン系樹脂(硬化剤))2の軟化点は139℃(B&R法)、溶融粘度(測定法:ICI粘度計法、測定温度:180℃)は65dPa・s、水酸基当量は232g/eq、リン含有量3.1質量%であった。
[Synthesis Example 2 (Phosphorus resin (curing agent) 2)]
In the synthesis example 1, the structural unit represented by the following chemical formula (12) and the following structure are the same as those in the synthesis example 1 except that the phenol novolac resin is changed to 330.4 g (2.80 mol) instead of the phenol novolac resin. 490 g of phenol resin (phosphorus resin (curing agent)) 2 having a structural unit represented by the chemical formula (13) was obtained. The softening point of this phenol resin (phosphorus resin (curing agent)) 2 is 139 ° C. (B & R method), the melt viscosity (measurement method: ICI viscometer method, measurement temperature: 180 ° C.) is 65 dPa · s, and the hydroxyl group equivalent is 232 g. / Eq, phosphorus content was 3.1% by mass.
[合成例3(リン系樹脂(硬化剤)3)]
合成例1において、フェノールノボラック樹脂の代わりにフェノールアラルキル樹脂392.9g(2.35モル)に変えた以外は合成例1と同様にして、下記化学式(14)で表される構造単位と下記化学式(15)で表される構造単位とを有するフェノール樹脂(リン系樹脂(硬化剤))3を550g得た。得られたフェノール樹脂(リン系樹脂(硬化剤))3の軟化点は102℃(B&R法)、溶融粘度(測定法:ICI粘度計法、測定温度:150℃)は2.5dPa・s、水酸基当量は232g/eq、rinn含有量2.7質量%であった。
[Synthesis Example 3 (Phosphorus resin (curing agent) 3)]
In Synthesis Example 1, the structural unit represented by the following chemical formula (14) and the following chemical formula were used in the same manner as in Synthesis Example 1 except that the phenol aralkyl resin was changed to 392.9 g (2.35 mol) instead of the phenol novolak resin. 550 g of phenol resin (phosphorus resin (curing agent)) 3 having the structural unit represented by (15) was obtained. The obtained phenol resin (phosphorus resin (curing agent)) 3 has a softening point of 102 ° C. (B & R method) and a melt viscosity (measurement method: ICI viscometer method, measurement temperature: 150 ° C.) of 2.5 dPa · s, The hydroxyl equivalent was 232 g / eq, and the rinn content was 2.7% by mass.
[実施例1]
撹拌装置、コンデンサ、及び温度計を備えたガラスフラスコに、エポキシ樹脂として、フェノールノボラック型エポキシ樹脂(エポキシ当量:178、三菱化学株式会社製、エピコート154)25.0質量部、及び臭素化エポキシ樹脂(エポキシ当量:475、三菱化学株式会社製、エピコート5046)75.0質量部を添加し、硬化剤(フェノール樹脂)としてフェノールノボラック樹脂(日立化成工業株式会社製、HP−1100)31.3質量部を添加し、充填材(1)として水酸化アルミニウム(住友化学株式会社製、CL−303、平均粒径4.1μm)30.0質量部を添加し、充填材(2)としてガラスフィラーA30.0質量部を添加し、硬化促進剤として2E4MZ(四国化成株式会社製)0.1質量部を添加した混合物を、ワニス温度40℃でMEK(メチルエチルケトン)に溶解、希釈し、1時間室温にて撹拌を行い、固形分60質量%の樹脂組成物ワニスになるようにMEKで調整した。
このワニスを厚さ約100μmのガラス布(スタイル2116、Eガラス)に含浸後、150℃で5分乾燥して樹脂分50質量%のプリプレグを得た。このプリプレグを16枚重ね、その両側に12μmの銅箔を重ね、170℃、90分、4.0MPaのプレス条件で加熱加圧し、厚さ約1.6mmの銅張積層板を作製した。
[Example 1]
In a glass flask equipped with a stirrer, a condenser, and a thermometer, 25.0 parts by mass of a phenol novolac type epoxy resin (epoxy equivalent: 178, manufactured by Mitsubishi Chemical Corporation, Epicoat 154) as an epoxy resin, and a brominated epoxy resin (Epoxy equivalent: 475, manufactured by Mitsubishi Chemical Corporation, Epicoat 5046) 75.0 parts by mass was added, and phenol novolak resin (Hitachi Chemical Industry Co., Ltd., HP-1100) 31.3 parts by mass as a curing agent (phenol resin). 30.0 parts by weight of aluminum hydroxide (manufactured by Sumitomo Chemical Co., Ltd., CL-303, average particle size 4.1 μm) is added as filler (1), and glass filler A30 is used as filler (2). 0.0 part by mass and 2E4MZ (manufactured by Shikoku Kasei Co., Ltd.) 0.1 part by mass as a curing accelerator Things and dissolved in MEK (methyl ethyl ketone) with a varnish temperature 40 ° C., diluted, stirring is carried out for 1 hour at room temperature, was adjusted with MEK to a solid content of 60 mass% of the resin composition varnish.
This varnish was impregnated into a glass cloth (style 2116, E glass) having a thickness of about 100 μm and dried at 150 ° C. for 5 minutes to obtain a prepreg having a resin content of 50% by mass. Sixteen prepregs were stacked, 12 μm copper foils were stacked on both sides thereof, and heated and pressed under 170 ° C. for 90 minutes and 4.0 MPa pressing conditions to prepare a copper clad laminate having a thickness of about 1.6 mm.
[実施例2]
エポキシ樹脂として、フェノールノボラック型エポキシ樹脂(エポキシ当量:178、三菱化学株式会社製、エピコート154)15.0質量部、テトラキスヒドロキシフェニルメタン型エポキシ樹脂(エポキシ当量:200、三菱化学株式会社製、エピコート1031S)3.0質量部、及び臭素化エポキシ樹脂(エポキシ当量:475、三菱化学株式会社製、エピコート5046)82.0質量部を用い、硬化剤(フェノール樹脂)としてフェノールノボラック樹脂(日立化成工業株式会社製、HP−1100)28.6質量部を用い、充填材(1)として水酸化アルミニウム(住友化学株式会社製、CL−303)43.0質量部を用い、充填材(2)としてガラスフィラーA43.0質量部を用いた以外は実施例1と同様にしてプリプレグと銅張積層板を得た。
[Example 2]
As epoxy resin, phenol novolac type epoxy resin (epoxy equivalent: 178, manufactured by Mitsubishi Chemical Corporation, Epicoat 154) 15.0 parts by mass, tetrakishydroxyphenylmethane type epoxy resin (epoxy equivalent: 200, manufactured by Mitsubishi Chemical Corporation, Epicoat) 1031S) 3.0 parts by mass and brominated epoxy resin (epoxy equivalent: 475, manufactured by Mitsubishi Chemical Corporation, Epicoat 5046) 82.0 parts by mass, phenol novolac resin (Hitachi Chemical Industries) as a curing agent (phenol resin) As a filler (2), 28.6 parts by mass, HP-1100), 43.0 parts by mass of aluminum hydroxide (Sumitomo Chemical Co., Ltd., CL-303) are used as the filler (1). The same as in Example 1 except that 43.0 parts by mass of glass filler A was used. To give a leg and a copper-clad laminate.
[実施例3]
エポキシ樹脂としてフェノールノボラック型エポキシ樹脂(エポキシ当量:178、三菱化学株式会社製、エピコート154)100.0質量部を用い、硬化剤(フェノール樹脂)としてフェノールノボラック樹脂(日立化成工業株式会社製、HP−1100)59.0質量部を用い、充填材(1)として水酸化アルミニウム(住友化学株式会社製、CL−303)79.0質量部を用い、充填材(2)としてガラスフィラーA79.0質量部を用いた以外は実施例1と同様にしてプリプレグと銅張積層板を得た。
[Example 3]
100.0 parts by mass of a phenol novolac type epoxy resin (epoxy equivalent: 178, manufactured by Mitsubishi Chemical Corporation, Epicoat 154) is used as an epoxy resin, and a phenol novolak resin (manufactured by Hitachi Chemical Co., Ltd., HP) is used as a curing agent (phenol resin). −1100) 59.0 parts by mass, 79.0 parts by mass of aluminum hydroxide (manufactured by Sumitomo Chemical Co., Ltd., CL-303) as filler (1), and glass filler A79.0 as filler (2). A prepreg and a copper clad laminate were obtained in the same manner as in Example 1 except that the parts by mass were used.
[実施例4]
エポキシ樹脂としてフェノールノボラック型エポキシ樹脂(エポキシ当量:178、三菱化学株式会社製、エピコート154)80.0質量部、及びテトラキスヒドロキシフェニルメタン型エポキシ樹脂(エポキシ当量:200、三菱化学株式会社製、エピコート1031S)20.0質量部を用い、硬化剤(フェノール樹脂)としてフェノールノボラック樹脂(日立化成工業株式会社製、HP−1100)53.0質量部を用い、リン系樹脂(硬化剤)としてリンフェノール樹脂(ダウケミカルカンパニー、XZ−92741)33.5質量部を用い、充填材(1)として水酸化アルミニウム(住友化学株式会社製、CL−303)60.0質量部を用い、充填材(2)としてガラスフィラーB60.0質量部を用いた以外は実施例1と同様にしてプリプレグと銅張積層板を得た。
[Example 4]
As epoxy resin, phenol novolac type epoxy resin (epoxy equivalent: 178, manufactured by Mitsubishi Chemical Corporation, Epicoat 154) 80.0 parts by mass, and tetrakishydroxyphenylmethane type epoxy resin (epoxy equivalent: 200, manufactured by Mitsubishi Chemical Corporation, Epicoat) 1031S) 20.0 parts by mass, 53.0 parts by mass of phenol novolac resin (manufactured by Hitachi Chemical Co., Ltd., HP-1100) as a curing agent (phenol resin), and phosphorus phenol as a phosphorus resin (curing agent) 33.5 parts by mass of resin (Dow Chemical Company, XZ-92741) and 60.0 parts by mass of aluminum hydroxide (manufactured by Sumitomo Chemical Co., Ltd., CL-303) as filler (1) and filler (2 ) As in Example 1 except that 60.0 parts by mass of glass filler B is used. It was obtained a prepreg and a copper-clad laminate.
[実施例5]
充填材(2)としてガラスフィラーB40.0質量部を用いた以外は実施例4と同様にプリプレグと銅張積層板を得た。
[Example 5]
A prepreg and a copper clad laminate were obtained in the same manner as in Example 4 except that 40.0 parts by mass of glass filler B was used as the filler (2).
[実施例6]
エポキシ樹脂として、フェノールノボラック型エポキシ樹脂(エポキシ当量:178、三菱化学株式会社製、エピコート154)80.0質量部、及びビスフェノールAノボラック型エポキシ樹脂(エポキシ当量:210、三菱化学株式会社製、エピコート157)20.0質量部を用い、硬化剤(フェノール樹脂)を省略し、リン系樹脂(硬化剤)として上記合成例1で合成した樹脂103.5質量部を用い、充填材(1)として水酸化アルミニウム(住友化学株式会社製、CL−303)45.0質量部を用い、充填材(2)としてガラスフィラーA45.0質量部を用いた以外は実施例1と同様にプリプレグと銅張積層板を得た。
[Example 6]
As epoxy resins, phenol novolac type epoxy resin (epoxy equivalent: 178, manufactured by Mitsubishi Chemical Corporation, Epicoat 154) 80.0 parts by mass, and bisphenol A novolac type epoxy resin (epoxy equivalent: 210, manufactured by Mitsubishi Chemical Corporation, Epicoat) 157) Using 20.0 parts by mass, omitting the curing agent (phenolic resin), using 103.5 parts by mass of the resin synthesized in Synthesis Example 1 as the phosphorus resin (curing agent), and using the filler (1) Prepreg and copper-clad as in Example 1 except that 45.0 parts by mass of aluminum hydroxide (Sumitomo Chemical Co., Ltd., CL-303) and 45.0 parts by mass of glass filler A as filler (2) were used. A laminate was obtained.
[実施例7]
エポキシ樹脂として、フェノールノボラック型エポキシ樹脂(エポキシ当量:178、三菱化学株式会社製、エピコート154)50.0質量部、及びビスフェノールAノボラック型エポキシ樹脂(エポキシ当量:210、三菱化学株式会社製、エピコート157)50.0質量部を用い、硬化剤(フェノール樹脂)を省略し、リン系樹脂(硬化剤)として上記合成例2で合成した樹脂119.0質量部を用い、充填材(1)として水酸化アルミニウム(住友化学株式会社製、CL−303)60.0質量部を用い、充填材(2)としてガラスフィラーA90.0質量部を用いた以外は実施例1と同様にプリプレグと銅張積層板を得た。
[Example 7]
As epoxy resins, 50.0 parts by mass of phenol novolac type epoxy resin (epoxy equivalent: 178, manufactured by Mitsubishi Chemical Corporation, Epicoat 154) and bisphenol A novolac type epoxy resin (epoxy equivalent: 210, manufactured by Mitsubishi Chemical Corporation, Epicoat) 157) Using 50.0 parts by mass, omitting the curing agent (phenolic resin), using 119.0 parts by mass of the resin synthesized in Synthesis Example 2 as the phosphorus resin (curing agent), and using the filler (1) Prepreg and copper-clad as in Example 1 except that 60.0 parts by mass of aluminum hydroxide (CL-303, manufactured by Sumitomo Chemical Co., Ltd.) and 90.0 parts by mass of glass filler A as filler (2) were used. A laminate was obtained.
[実施例8]
エポキシ樹脂として、フェノールノボラック型エポキシ樹脂(エポキシ当量:178、三菱化学株式会社製、エピコート154)30.0質量部、及びビスフェノールAノボラック型エポキシ樹脂(エポキシ当量:210、三菱化学株式会社製、エピコート157)70.0質量部を用い、硬化剤(フェノール樹脂)を省略し、リン系樹脂(硬化剤)として上記合成例3で合成した樹脂100.0質量部を用い、充填材(1)として水酸化アルミニウム(住友化学株式会社製、CL−303)120.0質量部を用い、充填材(2)としてガラスフィラーB80.0質量部を用いた以外は実施例1と同様にプリプレグと銅張積層板を得た。
[Example 8]
As epoxy resins, phenol novolac type epoxy resin (epoxy equivalent: 178, manufactured by Mitsubishi Chemical Corporation, Epicoat 154) 30.0 parts by mass, and bisphenol A novolac type epoxy resin (epoxy equivalent: 210, manufactured by Mitsubishi Chemical Corporation, Epicoat) 157) Using 70.0 parts by mass, omitting the curing agent (phenolic resin), using 100.0 parts by mass of the resin synthesized in Synthesis Example 3 as a phosphorus resin (curing agent), and using the filler (1) Prepreg and copper-clad as in Example 1 except that 120.0 parts by mass of aluminum hydroxide (CL-303, manufactured by Sumitomo Chemical Co., Ltd.) and 80.0 parts by mass of glass filler B as filler (2) were used. A laminate was obtained.
[比較例1]
充填材(2)に代えて、充填材(3)としてシリカ(株式会社アドマテックス製、SO−25R、アモルファスシリカパウダー、平均粒径0.5μm)30質量部を用いた以外は実施例1と同様にプリプレグと銅張積層板を得た。
[Comparative Example 1]
Example 1 except that 30 parts by mass of silica (manufactured by Admatechs Co., Ltd., SO-25R, amorphous silica powder, average particle size 0.5 μm) was used as the filler (3) instead of the filler (2). Similarly, a prepreg and a copper clad laminate were obtained.
[比較例2]
充填材(1)に代えて、充填材(3)としてシリカ(株式会社アドマテックス製、SO−25R、アモルファスシリカパウダー、平均粒径0.5μm)43質量部を用いた以外は実施例2と同様にプリプレグと銅張積層板を得た。
[Comparative Example 2]
Example 2 except that 43 parts by mass of silica (manufactured by Admatechs, SO-25R, amorphous silica powder, average particle size 0.5 μm) was used as the filler (3) in place of the filler (1). Similarly, a prepreg and a copper clad laminate were obtained.
[比較例3]
充填材(1)及び充填材(2)を添加しない以外は実施例2と同様にプリプレグと銅張積層板を得た。
表1及び表2は、実施例1〜8及び比較例1〜3で用いた主な成分をまとめたものである。
[Comparative Example 3]
A prepreg and a copper clad laminate were obtained in the same manner as in Example 2 except that the filler (1) and the filler (2) were not added.
Tables 1 and 2 summarize the main components used in Examples 1-8 and Comparative Examples 1-3.
[評価]
実施例1〜8及び比較例1〜3で作製した銅張積層板の外層銅箔を全面エッチングしたものを試料とし、以下の評価を行った。その結果を表3に示す。
(1)外観評価
上記試料の表面に樹脂の流動からなるスジが発生しないものを「良好」とした。また、スジが発生したものを「スジ」とし、発生場所を特定した。
(2)熱膨張係数
上記試料について、TMA2940(株式会社TAインスツルメント製)を用いて圧縮法により面方向及び厚み方向の熱膨張率を50〜120℃の範囲で測定した。
(3)ドリル加工性
上記試料について、ドリル径0.2mm、回転数300krpm、送り速度2.1m/min、重ね枚数2枚、エントリーボード150μmアルミ板にて、20,000穴の穴明け加工を実施し、ドリルの刃先磨耗量を測定した。なお、ドリルはユニオンツール社製の製品番号:MD E747Sを用いた。
[Evaluation]
The following evaluations were performed using samples obtained by etching the entire surface of the outer layer copper foil of the copper clad laminate produced in Examples 1 to 8 and Comparative Examples 1 to 3. The results are shown in Table 3.
(1) Appearance evaluation A sample in which no streak consisting of resin flow was generated on the surface of the sample was defined as "good". In addition, a streak was defined as a streak, and the occurrence location was identified.
(2) Thermal expansion coefficient About the said sample, the thermal expansion coefficient of the surface direction and the thickness direction was measured in the range of 50-120 degreeC by the compression method using TMA2940 (made by TA Instruments Co., Ltd.).
(3) Drill workability With respect to the above sample, drilling of 20,000 holes was performed with a drill diameter of 0.2 mm, a rotation speed of 300 krpm, a feed rate of 2.1 m / min, two stacked sheets, and an entry board 150 μm aluminum plate. The drill edge wear was measured. In addition, the product number: MD E747S by a union tool company was used for the drill.
[結果]
実施例の銅張積層板は、基材外観に優れ、熱膨張係数が小さく、ドリル加工性(寿命)に優れることが判明した。
これに対し、充填材(2)に代えて平均粒径の小さいシリカ(平均粒径0.5μm)を用いた比較例1では、シリカと水酸化アルミニウムの流動性の不均一性から基板表面端部に樹脂の流動からなるスジが発生し、基板外観が悪化した。
また、充填材(2)と共に平均粒径の小さいシリカ(平均粒径0.5μm)を用いた比較例2は、ドリル加工性に劣っていた。
充填材を含有しない比較例3は、熱膨張係数が高かった。
[result]
The copper-clad laminates of the examples were found to have excellent substrate appearance, a small coefficient of thermal expansion, and excellent drillability (lifetime).
On the other hand, in Comparative Example 1 in which silica having a small average particle diameter (average particle diameter of 0.5 μm) was used instead of the filler (2), the substrate surface edge was not obtained due to the non-uniform fluidity of silica and aluminum hydroxide. A streak of resin flow occurred in the part, and the appearance of the substrate deteriorated.
Moreover, the comparative example 2 which used the silica (average particle diameter of 0.5 micrometer) with a small average particle diameter with the filler (2) was inferior to drill workability.
Comparative Example 3 containing no filler had a high coefficient of thermal expansion.
Claims (7)
前記樹脂組成物が、平均粒径2.5〜4.5μmの水酸化アルミニウムと、平均粒径1.0〜3.0μm、比重2.3〜2.6g/cm3かつSiO2の含有量が50〜65質量%のガラスフィラーとを含んでおり、
前記樹脂組成物の固形分総量中における前記水酸化アルミニウムと前記ガラスフィラーの配合量の合計が30〜50質量%であり、
前記水酸化アルミニウムと前記ガラスフィラーの使用比率が4:6〜6:4であるプリプレグ。 In the prepreg formed by impregnating the base material with the resin composition,
The resin composition contains aluminum hydroxide having an average particle diameter of 2.5 to 4.5 μm, an average particle diameter of 1.0 to 3.0 μm, a specific gravity of 2.3 to 2.6 g / cm 3 and a content of SiO 2 . Contains 50 to 65 mass% glass filler,
The total amount of the aluminum hydroxide and the glass filler in the total solid content of the resin composition is 30 to 50% by mass ,
A prepreg in which the usage ratio of the aluminum hydroxide and the glass filler is 4: 6 to 6: 4 .
(化学式(2)〜(6)における*は、化学式(1)のリン原子に直接結合する部位であることを示す。)
(* In chemical formulas (2) to (6) indicates a site directly bonded to the phosphorus atom of chemical formula (1).)
(化学式(7)〜(9)における*は、化学式(1)のリン原子に直接結合する部位であることを示す。)
(* In chemical formulas (7) to (9) indicates a site directly bonded to the phosphorus atom of chemical formula (1).)
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