JP5396025B2 - 磁性螺旋研磨装置 - Google Patents
磁性螺旋研磨装置 Download PDFInfo
- Publication number
- JP5396025B2 JP5396025B2 JP2008021210A JP2008021210A JP5396025B2 JP 5396025 B2 JP5396025 B2 JP 5396025B2 JP 2008021210 A JP2008021210 A JP 2008021210A JP 2008021210 A JP2008021210 A JP 2008021210A JP 5396025 B2 JP5396025 B2 JP 5396025B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- abrasive
- workpiece
- support frame
- polishing apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000005498 polishing Methods 0.000 title claims description 32
- 238000012545 processing Methods 0.000 claims description 24
- 238000005096 rolling process Methods 0.000 claims description 20
- 239000006061 abrasive grain Substances 0.000 claims description 10
- 239000000696 magnetic material Substances 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 7
- 239000002245 particle Substances 0.000 claims description 5
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 claims description 4
- 239000003921 oil Substances 0.000 claims description 4
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 4
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 4
- 239000000839 emulsion Substances 0.000 claims description 3
- 229920000642 polymer Polymers 0.000 claims description 3
- 239000010687 lubricating oil Substances 0.000 claims description 2
- 229920002545 silicone oil Polymers 0.000 claims 1
- 238000003756 stirring Methods 0.000 description 16
- 239000000463 material Substances 0.000 description 13
- 238000000034 method Methods 0.000 description 13
- 239000003082 abrasive agent Substances 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 230000003746 surface roughness Effects 0.000 description 7
- 230000009471 action Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 239000000428 dust Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 238000003754 machining Methods 0.000 description 3
- 230000005389 magnetism Effects 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 229910001111 Fine metal Inorganic materials 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007123 defense Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 230000009969 flowable effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000010705 motor oil Substances 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
- B24B31/10—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work
- B24B31/102—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work using an alternating magnetic field
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Description
International Journal of Machine Tool & Manufacture、Vol.44、pp.201−211国際誌 International Journal of Machine Tool & Manufacture、Vol.44、pp.1019−1029国際誌
11 主軸クランプホルダー
12 転動棒
13 本体
131 上蓋
132 基座
133 ケーシング
14 磁力制御装置
15 固定スリーブ
16 支持フレーム
17 撹拌装置
2 被加工物
3 研磨材
4 加工機械
41 スピンドル
42 挟み持ち装置
51 工程
52 工程
53 工程
54 工程
55 工程
56 工程
Claims (4)
- 少なくとも、加工機械のスピンドルに螺合される主軸クランプホルダー(11)と、
該主軸クランプホルダー(11)にロックされて固定される転動棒(12)と、
上蓋(131)と基座(132)及びこれら上蓋(131)と基座(132)との間に位置するケーシング(133)から構成され、鉄金属や非鉄金属から選ばれた金属から成ると共に研磨材が内部に収納される本体(13)と、
該本体(13)に接続され、該ケーシング(133)を囲む磁力制御装置(14)と、
両端が該本体(13)のケーシング(133)に接続される固定スリーブ(15)と、
該基座(132)上に設けられ、該固定スリーブ(15)を支持する支持フレーム(16)と、
該基座(132)と該支持フレーム(16)の間に設置される撹拌装置(17)が含有され、
上記磁力制御装置(14)が、電磁石であって、正負磁界を調整制御され、磁界磁力による吸引反発作用で磁性材が含まれる該研磨剤を、該固定スリーブ(15)と該支持フレーム(16)内で循環運動せしめるように構成される、
ことを特徴とする、磁性螺旋研磨装置。 - 該研磨材は、エンジンオイルや潤滑油と、該磁性材と、異なる粒径である炭化けい素や他の研磨粒とが混合されるものであることを特徴とする、請求項1に記載の磁性螺旋研磨装置。
- 該研磨材は、シリコン油と、ロウ油と、該磁性材と、異なる粒径である炭化けい素や他の研磨粒が添加された高分子エマルジョンとが混合されるものであることを特徴とする、請求項1に記載の磁性螺旋研磨装置。
- 該本体(13)は、更に、温度測定装置が実装されることを特徴とする、請求項1に記載の磁性螺旋研磨装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW096135218 | 2007-09-20 | ||
TW096135218A TW200914180A (en) | 2007-09-20 | 2007-09-20 | Magnetic spiral grinding and polishing device and method thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009072901A JP2009072901A (ja) | 2009-04-09 |
JP5396025B2 true JP5396025B2 (ja) | 2014-01-22 |
Family
ID=40608415
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008021210A Expired - Fee Related JP5396025B2 (ja) | 2007-09-20 | 2008-01-31 | 磁性螺旋研磨装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US8162720B2 (ja) |
JP (1) | JP5396025B2 (ja) |
TW (1) | TW200914180A (ja) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8038510B2 (en) * | 2008-10-29 | 2011-10-18 | Southern Taiwan University | Apparatus and method for spiral polishing with electromagnetic abrasive |
CN102248478A (zh) * | 2011-08-15 | 2011-11-23 | 四川欧曼机械有限公司 | 一种新型抛光机 |
US20140220869A1 (en) * | 2013-02-01 | 2014-08-07 | Southern Taiwan University Of Science And Technology | Subtle vortex polishing apparatus |
US9017142B2 (en) * | 2013-02-14 | 2015-04-28 | Ericus Andreas van Kleef | Mass finishing apparatus and method |
CN104249288A (zh) * | 2013-06-28 | 2014-12-31 | 王又增 | 旋转珩磨装置 |
US10632585B2 (en) * | 2015-04-23 | 2020-04-28 | University Of Florida Research Foundation, Inc. | Hybrid tool with both fixed-abrasive and loose-abrasive phases |
CN107984330A (zh) * | 2017-11-27 | 2018-05-04 | 安徽和润特种玻璃有限公司 | 一种玻璃磨角加工设备 |
CN108247548A (zh) * | 2017-12-21 | 2018-07-06 | 长春理工大学 | 一种同轴心异向旋转的磨粒流搅拌抛光系统 |
CN108747796A (zh) * | 2018-05-21 | 2018-11-06 | 浙江工业大学 | 一种叶片转动式液态金属抛光装置 |
CN108436743B (zh) * | 2018-05-21 | 2024-04-09 | 浙江工业大学 | 一种电场磁场双向变化的液态金属抛光装置及方法 |
CN109202715B (zh) * | 2018-10-10 | 2019-09-24 | 安徽胜利精密制造科技有限公司 | 一种笔记本电脑外壳注塑件无尘打磨装置 |
CN110340743B (zh) * | 2019-07-18 | 2021-08-20 | 浙江科惠医疗器械股份有限公司 | 一种人工关节球用双螺杆双抛光通道抛光装置 |
CN110216529B (zh) * | 2019-07-18 | 2021-01-26 | 浙江科惠医疗器械股份有限公司 | 一种生物陶瓷人工关节球面循环抛光机 |
CN110405544A (zh) * | 2019-08-29 | 2019-11-05 | 长春理工大学 | 一种基于磁性磨料的磨粒流精密研抛阀套的装置 |
CN114599761A (zh) * | 2019-10-28 | 2022-06-07 | 3M创新有限公司 | 修整金属表面的系统和方法 |
CN112296860A (zh) * | 2020-09-25 | 2021-02-02 | 蚌埠弘皓机电有限公司 | 一种长丝杆表面处理装置 |
CN112428070A (zh) * | 2020-11-21 | 2021-03-02 | 鲁宇 | 一种去除铁轨表面刺边并进行抛光的装置 |
CN113442001B (zh) * | 2021-06-11 | 2022-10-28 | 浙江工业大学 | 一种基于力流变抛光技术的滚珠丝杠抛光方法 |
CN113813852B (zh) * | 2021-09-18 | 2023-08-15 | 深圳盘古钠祥新能源有限责任公司 | 一种硬碳材料生产预处理装置 |
CN114850984B (zh) * | 2022-06-01 | 2024-03-08 | 浙江鑫豪机械有限公司 | 一种研磨抛光装置及其使用方法 |
CN114986376A (zh) * | 2022-06-16 | 2022-09-02 | 山东理工大学 | 一种磁针磁力研磨机 |
CN114770358B (zh) * | 2022-06-23 | 2022-08-23 | 烟台永昌精密织针有限公司 | 一种用于研磨织针的抛光设备 |
CN116141089B (zh) * | 2023-04-19 | 2023-07-14 | 北大荒集团总医院(黑龙江省第二肿瘤医院、黑龙江垦区残疾人康复中心、北大荒集团妇幼保健院、齐齐哈尔医学院附属第十一医院) | 一种手术刀磨削设备 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2735232A (en) * | 1956-02-21 | simjian | ||
US2735231A (en) * | 1953-05-22 | 1956-02-21 | Reflectone Corp | simjian |
JP2596982Y2 (ja) * | 1992-12-24 | 1999-06-28 | 三井精機工業株式会社 | 雌ねじ状部材の内面研磨装置 |
JP3378668B2 (ja) * | 1994-08-12 | 2003-02-17 | 共栄電工株式会社 | 軸状部材の表面処理装置 |
JPH09239656A (ja) * | 1996-03-05 | 1997-09-16 | Toyota Motor Corp | 表面磨き加工方法 |
JP2007021660A (ja) * | 2005-07-15 | 2007-02-01 | Fdk Corp | 複雑形状体の鏡面研磨方法および鏡面研磨装置 |
TWI284075B (en) * | 2005-08-31 | 2007-07-21 | Univ Nat Central | Grinding material spiral grinding device and method thereof |
TWI288687B (en) * | 2006-07-06 | 2007-10-21 | Univ Nat Central | Device and method for grinding spiral portion |
-
2007
- 2007-09-20 TW TW096135218A patent/TW200914180A/zh not_active IP Right Cessation
-
2008
- 2008-01-31 JP JP2008021210A patent/JP5396025B2/ja not_active Expired - Fee Related
- 2008-02-15 US US12/071,164 patent/US8162720B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
TWI328486B (ja) | 2010-08-11 |
JP2009072901A (ja) | 2009-04-09 |
US20100136887A1 (en) | 2010-06-03 |
US8162720B2 (en) | 2012-04-24 |
TW200914180A (en) | 2009-04-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5396025B2 (ja) | 磁性螺旋研磨装置 | |
US7217173B1 (en) | Apparatus micro lapping with abrasive for polishing precision screw and polishing method thereof | |
Doi et al. | Advances in CMP polishing technologies | |
CN107617933B (zh) | 一种动态磁场磁流变抛光装置 | |
Mutalib et al. | Magnetorheological finishing on metal surface: A review | |
Mahalik et al. | Nanofinishing techniques | |
Judal et al. | Electrochemical magnetic abrasive machining of AISI304 stainless steel tubes | |
CN114473720B (zh) | 一种透镜阵列光学元件抛光方法及装置 | |
CN108857599B (zh) | 一种立式磁流变抛光装置及方法 | |
CN213106270U (zh) | 一种基于磁性复合流体的抛光装置 | |
Wu et al. | Nano-precision polishing of CVD SiC using MCF (magnetic compound fluid) slurry | |
Katahira et al. | Experimental investigation of machinability and surface quality of sapphire machined with polycrystalline diamond micro-milling tool | |
JP2006247835A (ja) | 超砥粒加工工具およびその使用方法 | |
JP2007021661A (ja) | 複雑形状体の鏡面研磨方法および鏡面研磨装置 | |
Soffie et al. | The morphological and surface roughness of magnetorheological polished AISI 6010 surface | |
CN111843627A (zh) | 一种基于磁性复合流体的抛光方法及抛光装置 | |
Wu et al. | Mirror surface finishing of acrylic resin using MCF-based polishing liquid | |
JP2007045878A (ja) | 磁性砥粒 | |
JP4263673B2 (ja) | 磁気内面研磨方法及び装置 | |
Gill et al. | Magnetic Abrasive Polishing of Stainless Steel SS304 with Diamond-Based Sintered Magnetic Abrasives | |
Sundaram et al. | Micro ultrasonic machining using oil based abrasive slurry | |
CN110253091B (zh) | 一种齿轮轮廓的抛光机构 | |
Singh et al. | Investigation of Process Parameters of a Novel Magnetorheological Finishing Process for External Cylindrical Surfaces | |
Doshi et al. | Some investigations on magnetic abrasive finishing of aluminium alloy | |
SINGH et al. | A novel rotating wheel magnetorheological finishing process for external cylindrical workpieces |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20100916 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110915 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20120928 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20121009 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20121226 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20130110 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20130207 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20130213 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20130306 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130319 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20130319 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20130930 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20131021 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5396025 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |