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JP5392693B2 - Test contact - Google Patents

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JP5392693B2
JP5392693B2 JP2007129803A JP2007129803A JP5392693B2 JP 5392693 B2 JP5392693 B2 JP 5392693B2 JP 2007129803 A JP2007129803 A JP 2007129803A JP 2007129803 A JP2007129803 A JP 2007129803A JP 5392693 B2 JP5392693 B2 JP 5392693B2
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contact
electrode
tip
plate
test
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JP2008286559A (en
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健史 長谷
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Ueno Seiki Co Ltd
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Ueno Seiki Co Ltd
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Description

本発明は、半導体部品等の電子部品の電気特性(電圧、電流、抵抗、周波数等)を正確に検査するテストコンタクトに関する。   The present invention relates to a test contact for accurately inspecting electrical characteristics (voltage, current, resistance, frequency, etc.) of an electronic component such as a semiconductor component.

半導体部品は、前工程と呼ばれるプロセスで、Siウェハ上に多数作成された後、後工程と呼ばれるプロセスにて個片に分離され、電気特性検査、特性分類、マーキング、外観検査等の工程を経た後、テープ、コンテナチューブなどに梱包されて出荷される。   After many semiconductor parts are created on a Si wafer in a process called a pre-process, they are separated into individual pieces in a process called a post-process, and have undergone processes such as electrical property inspection, property classification, marking, and appearance inspection. After that, they are packed in a tape or container tube and shipped.

このような半導体部品は、個片に分離された後の工程において、保持機構に保持されて搬送機構により搬送され、搬送経路に沿って設けられた各工程処理部において、各種の処理を施される。   Such semiconductor components are held by a holding mechanism and conveyed by a conveyance mechanism in a process after being separated into individual pieces, and various processes are performed in each process processing unit provided along the conveyance path. The

このような工程処理のうち、半導体部品の電圧、電流、抵抗又は周波数等を測定検査する電気特性検査においては、半導体部品の電極に板状の金属(以下、「コンタクト」という)を接触させて行う方法と(特許文献1参照)、ソケットに半導体部品を挿入して行う方法とがある(特許文献2参照)。   Among such process processes, in electrical characteristic inspection for measuring and inspecting the voltage, current, resistance or frequency of a semiconductor component, a plate-like metal (hereinafter referred to as “contact”) is brought into contact with the electrode of the semiconductor component. There are a method of performing (see Patent Document 1) and a method of performing by inserting a semiconductor component into a socket (see Patent Document 2).

半導体部品の電極にコンタクトを接触させて電気検査を行う手法では、通常は半導体部品の電極部は酸化した絶縁膜で覆われているため、半導体部品をテストする際、その絶縁膜を壊し、導通部を露出させた上でコンタクトを当てる。導通部を露出させるためには、半導体部品がコンタクトに当たる際に、コンタクトを動かし、絶縁膜を破壊する必要がある。   In the method of performing electrical inspection by contacting a contact with an electrode of a semiconductor component, the electrode part of the semiconductor component is usually covered with an oxidized insulating film. Make contact with the exposed part. In order to expose the conductive portion, it is necessary to move the contact and destroy the insulating film when the semiconductor component hits the contact.

一方、ソケットに半導体部品を挿入して電気検査を行う手法では、ソケット内部では屈曲形状をした板を並べ、緩衝材を取り付けて基板の導体と接触させるものである。
特開2001−345359号公報 特開平7−5229号公報
On the other hand, in the technique of inserting a semiconductor component into a socket and conducting an electrical inspection, bent plates are arranged inside the socket, and a cushioning material is attached to make contact with the conductor of the substrate.
JP 2001-345359 A JP 7-5229 A

ところで、半導体部品の電極にコンタクトを接触させて電気検査を行う手法において、図5の水平コンタクトや図6の積層コンタクトに示すように、コンタクトを水平や垂直に並べただけでは、このようなコンタクトを半導体部品に押し当てても金属が動かないため、絶縁膜を破壊することができない。   By the way, in the method of performing electrical inspection by bringing a contact into contact with an electrode of a semiconductor component, such a contact is simply obtained by arranging the contacts horizontally or vertically as shown in the horizontal contact in FIG. 5 or the laminated contact in FIG. Since the metal does not move even when pressed against the semiconductor component, the insulating film cannot be destroyed.

また、半導体部品をソケットに挿入して電気検査を行う方法においては、ソケット、緩衝材を設けて垂直にコンタクトを並べ、基板の導体に押し当てているが、緩衝材の寿命が短いことと基板の導体が薄いため傷ついて検査不能になってしまう。   In the method of conducting electrical inspection by inserting a semiconductor component into a socket, a socket and a buffer material are provided and contacts are arranged vertically and pressed against the conductor of the substrate. Since the conductor of the wire is thin, it is damaged and cannot be inspected.

さらに、近年の環境保護対策に基づき、はんだの成分の鉛フリー化が進んでいるが、鉛フリーの成分はスズの含有量が多くなっている。このようなスズの酸化がテスト時の歩留りを一層悪くしている。さらに鉛フリーはんだの酸化膜は硬いために従来のコンタクトでは酸化膜の除去が困難であった。   Furthermore, lead-free solder components are progressing based on recent environmental protection measures, but lead-free components have a high tin content. Such oxidation of tin further deteriorates the yield during testing. Further, since the oxide film of lead-free solder is hard, it is difficult to remove the oxide film with a conventional contact.

本発明は、上記のような従来技術の問題点を解決するために提案されたものであり、その目的は、絶縁酸化膜が形成された半導体部品の電極に対してもコンタクトを正確に接触させることができ、正確な電気測定検査が可能で、歩留まりを向上させることのできるテストコンタクトを提供することにある。   The present invention has been proposed in order to solve the above-described problems of the prior art, and the object thereof is to accurately bring the contact into contact with the electrode of the semiconductor component on which the insulating oxide film is formed. An object of the present invention is to provide a test contact that can perform an accurate electrical measurement inspection and can improve the yield.

上記の目的を達成するため、請求項1の発明は、電子部品の電極にコンタクトを接触させて電子部品の電気特性を検査するテストコンタクトにおいて、前記コンタクトは、弾性力のある細長い板状体からなり、前記板状体の先端部側には、この板状体の先端部を前記電極との接触方向に向かって屈曲させる屈曲部が形成され、前記コンタクトには、この屈曲部を境界として、前記接触方向に傾斜した傾斜部と、前記傾斜部の傾斜方向と交差する方向に伸びた前記傾斜部よりも長い水平部とが形成され、前記傾斜部の先端部が、前記電極の表面に対して傾斜角度を持って接触し、前記水平には、その水平部の撓みを抑制する補助板が設けられ、前記板状体の前記補助板が設けられた部分における前記屈曲部とは反対側の部分であって、前記屈曲部から傾斜部先端までの長さよりも前記屈曲部から離れた位置に、前記板状体と補助板が前記傾斜方向と反対方向へ移動することを阻止する支点が設けられていることを特徴とす
In order to achieve the above object, according to the first aspect of the present invention, there is provided a test contact for inspecting electrical characteristics of an electronic component by bringing the contact into contact with an electrode of the electronic component, wherein the contact is made of an elongated plate having elasticity. A bent portion that bends the distal end portion of the plate-like body in the contact direction with the electrode is formed on the distal end side of the plate-like body, and the contact has the bent portion as a boundary, An inclined portion that is inclined in the contact direction and a horizontal portion that is longer than the inclined portion that extends in a direction intersecting with the inclined direction of the inclined portion are formed, and a tip portion of the inclined portion is in contact with the surface of the electrode. with an inclination angle in contact Te, the horizontal portion is opposite to its deflection in the horizontal portion suppresses the auxiliary plate is provided, the bent portion in the portion where the auxiliary plate is provided in the plate-like body Part of the Spaced apart from the bent portion than the length from the inclined tip from parts, and characterized in that the supporting point of the plate-like body and the auxiliary plate is prevented from moving in the opposite direction as the tilt direction is provided you.

以上のような態様では、コンタクトの先端部に、電子部品が挿入される側に向けて傾斜するように曲げた屈曲部を設けることにより、半導体部品をコンタクトに押し付けた際に、コンタクトの先端部分が半導体部品の電極に接触しながら移動する。これにより、電極部の酸化絶縁膜を引っ掻いて、この酸化絶縁膜を壊すことができ、正確な電気測定検査が可能となる。   In the aspect as described above, when the semiconductor component is pressed against the contact by providing a bent portion at the tip of the contact so as to be inclined toward the side where the electronic component is inserted, the tip of the contact Moves while contacting the electrode of the semiconductor component. Thereby, the oxide insulating film of the electrode portion can be scratched to break the oxide insulating film, and an accurate electrical measurement inspection can be performed.

また、コンタクトの水平面に補助板を設けない場合には、コンタクト先端に半導体部品の電極が接触した際に、コンタクトはその支点を元に長手方向が曲がりやすく、コンタクトの先端部が電極の酸化絶縁膜を引っ掻く方向に動きにくい。一方で、水平面に補助板を設けた場合には、支点を元に長手方向が曲がりにくく、コンタクトの先端部が電極の酸化絶縁膜を引っ掻く方向に動き易くなる。   Also, when an auxiliary plate is not provided on the horizontal surface of the contact, when the electrode of the semiconductor component comes into contact with the contact tip, the contact tends to bend in the longitudinal direction based on its fulcrum, and the contact tip is the oxide insulation of the electrode. Hard to move in the direction of scratching the membrane. On the other hand, when the auxiliary plate is provided on the horizontal plane, the longitudinal direction is difficult to bend based on the fulcrum, and the tip of the contact is easily moved in the direction of scratching the oxide insulating film of the electrode.

請求項2の発明は、請求項1記載の発明において、前記コンタクトは、銅およびその合金、ステンレス鋼、タングステンおよびその合金、超硬合金のいずれかからなることを特徴とする。   According to a second aspect of the present invention, in the first aspect of the present invention, the contact is made of any one of copper and its alloy, stainless steel, tungsten and its alloy, and a cemented carbide.

以上のような態様では、前記コンタクトは、通常は銅およびその合金を使用するが、ハンダ付着が著しい場合は、ステンレス鋼、タングステンおよびその合金、超硬合金などのハンダが付着しにくい材料を使用することにより、電気特性検査の精度が低下するのを防止することができる。   In the above embodiment, the contact is usually made of copper and its alloy. However, when the solder adheres significantly, a material such as stainless steel, tungsten and its alloy, cemented carbide, etc., which is hard to adhere to solder is used. By doing so, it is possible to prevent the accuracy of the electrical characteristic inspection from being lowered.

以上のような本発明によれば、絶縁酸化膜が形成された半導体部品の電極に対してもコンタクトを正確に接触させることができ、正確な電気測定検査が可能で、歩留まりを向上させることのできるテストコンタクトを提供することができる。   According to the present invention as described above, the contact can be accurately brought into contact with the electrode of the semiconductor component on which the insulating oxide film is formed, the accurate electrical measurement inspection can be performed, and the yield can be improved. Test contacts that can be provided.

次に、本発明を実施するための最良の形態(以下、実施形態とする)を、図1〜図4を参照して説明する。   Next, the best mode for carrying out the present invention (hereinafter referred to as an embodiment) will be described with reference to FIGS.

(1)実施形態
[構成]
本発明の実施形態におけるテストコンタクト1は、図1に示すように、一枚の板状からなるコンタクト11の先端から5mmの位置に50度の角度となるように屈曲部12が形成され、この屈曲部12より根元側の水平面を形成する水平部13に補助板14を設けたものである。そして、このコンタクト11の先端部が半導体部品Cの電極Eに接触して、半導体部品Cの電気検査を行うように構成されている。
(1) Embodiment [Configuration]
As shown in FIG. 1, the test contact 1 in the embodiment of the present invention is formed with a bent portion 12 at an angle of 50 degrees at a position of 5 mm from the tip of the contact 11 made of a single plate. An auxiliary plate 14 is provided on a horizontal portion 13 that forms a horizontal plane on the base side from the bent portion 12. The tip of the contact 11 is in contact with the electrode E of the semiconductor component C, so that the electrical inspection of the semiconductor component C is performed.

より具体的には、テストコンタクト1は、図2(a)及び(b)に示すように、一枚の板を先端から5mmの位置で、先端側が50度の傾斜面となるように曲げることにより屈曲部12を形成し、この屈曲部12を境にして、屈曲部よりも根元側の水平面を形成する水平部13に補助板14を載せて、ねじ等で締め付ける。ただし接着や溶接によって接合してもよい。   More specifically, as shown in FIGS. 2A and 2B, the test contact 1 bends a single plate at a position 5 mm from the tip so that the tip side has an inclined surface of 50 degrees. Then, the bent portion 12 is formed, and the auxiliary plate 14 is placed on the horizontal portion 13 that forms a horizontal plane on the base side of the bent portion with the bent portion 12 as a boundary, and tightened with a screw or the like. However, you may join by adhesion | attachment or welding.

このコンタクト11に用いる金属材料として、通常は銅およびその合金を用いる。他には、ステンレス鋼、タングステンおよびその合金、超硬合金を用いる。これは、コンタクト11を半導体部品の電極に接触させることによって、電気検査を繰り返していると、コンタクト11の表面にハンダ屑が付着して検査の精度が低下するため、ハンダが付着しにくい材料を用いたものである。通常は銅およびその合金を使用するが、ハンダ付着が著しい場合には、ステンレス鋼、タングステンおよびその合金、超硬合金を用いる。   As the metal material used for the contact 11, copper and its alloy are usually used. In addition, stainless steel, tungsten and its alloys, and cemented carbide are used. This is because when the electrical inspection is repeated by bringing the contact 11 into contact with the electrode of the semiconductor component, solder scraps adhere to the surface of the contact 11 and the accuracy of the inspection is lowered. It is what was used. Usually, copper and its alloys are used, but when solder adhesion is remarkable, stainless steel, tungsten and its alloys, and cemented carbide are used.

補助板14は、コンタクト11に用いる金属と同様の材料を用いてもいいし、絶縁性ある材料を用いてもよい。コンタクト11の曲げを抑制する作用を奏するものであれば用いる材料は限定されない。   The auxiliary plate 14 may be made of the same material as the metal used for the contact 11 or may be made of an insulating material. The material to be used is not limited as long as it has an effect of suppressing the bending of the contact 11.

[作用効果]
以上のような本実施形態のテストコンタクト1では、図3(a)及び(b)に示すように、コンタクト11の先端部を屈曲部12から曲げて傾斜させ傾斜面を設けたことにより、半導体部品Cをコンタクト11に押し付けた際に、コンタクト11の先端部分が半導体部品Cの電極Eに接触しながら移動する。これにより、電極Eの酸化絶縁膜を引っ掻いて、この酸化絶縁膜を壊すことができ、正確な電気測定検査が可能となる。
[Function and effect]
In the test contact 1 of the present embodiment as described above, as shown in FIGS. 3A and 3B, the tip portion of the contact 11 is bent from the bent portion 12 to be inclined, thereby providing an inclined surface. When the component C is pressed against the contact 11, the tip of the contact 11 moves while contacting the electrode E of the semiconductor component C. Thus, the oxide insulating film of the electrode E can be scratched to break the oxide insulating film, and an accurate electrical measurement inspection can be performed.

また、図4(a)に示すように、水平部13に補助板14を設けない場合には、コンタクト11先端に半導体部品Cの電極Eが接触した際に、コンタクト11はその支点を元に長手方向が曲がりやすく、コンタクト11の先端部が電極Eの酸化絶縁膜を引っ掻く方向に動きにくい。一方で、図4(b)に示すように、水平部13に補助板14を設けた場合には、支点を元に長手方向が曲がりにくく、コンタクト11の先端部が電極Eの酸化絶縁膜を引っ掻く方向に動き易くなる。   4A, when the auxiliary plate 14 is not provided in the horizontal portion 13, when the electrode E of the semiconductor component C contacts the tip of the contact 11, the contact 11 is based on the fulcrum. The longitudinal direction is easy to bend, and the tip of the contact 11 is difficult to move in the direction of scratching the oxide insulating film of the electrode E. On the other hand, as shown in FIG. 4B, when the auxiliary plate 14 is provided in the horizontal portion 13, the longitudinal direction is difficult to bend based on the fulcrum, and the tip portion of the contact 11 forms the oxide insulating film of the electrode E. It becomes easy to move in the direction of scratching.

以上のような作用により、テストコンタクト1全体の歩留まりが向上する。本発明者による実施結果では、従来の水平に配置したフラットなコンタクトの場合には、10000個テストのうちで300個がテスト不良で、テスト歩留りが3%であったが、本実施形態のテストコンタクトの場合には、10000個テストのうちテスト不良は0個で、テスト歩留りは0%であった。   With the above operation, the yield of the entire test contact 1 is improved. According to the results of the implementation by the present inventor, in the case of a flat contact arranged horizontally in the past, 300 out of 10000 tests were defective and the test yield was 3%. In the case of the contact, the test failure was 0 out of 10,000 tests, and the test yield was 0%.

また、もともとフラットなコンタクト11の先端部を屈曲部12から曲げるだけで、傾斜面を設けることができるので、簡便かつ安価にて作成することができる。さらに、半導体部品Cをソケットに挿入して電気特性検査を行う場合に比べ、緩衝材と基板が不要であり、ユニットの使用可能時間である装置寿命を長くすることができる。   In addition, since the inclined surface can be provided simply by bending the distal end portion of the flat contact 11 from the bent portion 12, it can be produced easily and inexpensively. Furthermore, as compared with the case where the semiconductor component C is inserted into the socket and the electrical characteristic inspection is performed, the cushioning material and the substrate are unnecessary, and the device life, which is the usable time of the unit, can be extended.

図5や図6で示した従来のテストコンタクトでは、例えば、コンタクトを水平又は垂直に配置し、その間に誘電体を挟んで構成するものもあったが、このような従来のテストコンタクトでは、その誘電体の存在により高周波デバイスにおける電気特性検査には不向きであった。一方で、本実施形態のテストコンタクト1は、水平に配置したフラットなコンタクトを曲げて構成した簡易な構成からなり、誘電体を用いていないので、高周波デバイスの電気特性検査にも対応可能である。   In the conventional test contacts shown in FIGS. 5 and 6, for example, some contacts are arranged horizontally or vertically and a dielectric is interposed between them. In such a conventional test contact, Due to the presence of dielectric, it is not suitable for electrical property inspection in high frequency devices. On the other hand, the test contact 1 of the present embodiment has a simple configuration in which a flat contact arranged horizontally is bent, and does not use a dielectric, so that it can cope with the electrical characteristic inspection of a high-frequency device. .

コンタクト11を半導体部品Cの電極Eに接触させることによって、電気検査を繰り返していると、コンタクト11にハンダ屑が付着して検査の精度が低下することとなる。そこで、本実施形態では、コンタクト11の金属材料として、通常は銅およびその合金を使用するが、ハンダ屑付着が著しい場合は、ステンレス鋼(SUS)や、タングステンおよびその合金、超硬合金などのハンダ付着がしにくい材料を使用することにより、電気特性検査の精度が低下するのを防止することができる。   If the electrical inspection is repeated by bringing the contact 11 into contact with the electrode E of the semiconductor component C, solder scraps adhere to the contact 11 and the inspection accuracy decreases. Therefore, in the present embodiment, copper and its alloy are usually used as the metal material of the contact 11, but in the case where solder scrap adhesion is remarkable, stainless steel (SUS), tungsten and its alloy, cemented carbide, etc. By using a material that hardly adheres to solder, it is possible to prevent the accuracy of the electrical property inspection from being lowered.

(2)他の実施形態
本発明は、上記のような実施形態に限定されるものではなく、次のような実施の形態も包含するものである。コンタクトの傾斜は、最適な例を示したに過ぎず、半導体部品が保持機構に保持されて下降してくる方向、すなわちコンタクトの上方側が鈍角となる範囲で傾斜を形成するように屈曲部を構成すればよい。
(2) Other Embodiments The present invention is not limited to the embodiment described above, and includes the following embodiments. The inclination of the contact is merely an optimum example, and the bent portion is formed so that the inclination is formed in the direction in which the semiconductor component is held and lowered by the holding mechanism, that is, in the range where the upper side of the contact becomes an obtuse angle. do it.

上記実施形態において示したテストコンタクトの具体的な寸法はすべて任意であり、特に、絶縁性球状樹脂については、その大きさを処理対象である半導体部品の規格に合わせて適宜変更することができる。   The specific dimensions of the test contacts shown in the above embodiment are all arbitrary. In particular, the size of the insulating spherical resin can be changed as appropriate in accordance with the standard of the semiconductor component to be processed.

本発明の実施形態におけるテストコンタクトの構成を示す側面図。The side view which shows the structure of the test contact in embodiment of this invention. 本発明の実施形態におけるテストコンタクトの製造工程を示す模式図(a)及び(b)。The schematic diagram (a) and (b) which show the manufacturing process of the test contact in embodiment of this invention. 本発明の実施形態におけるテストコンタクトの電気特性検査時の作用を示す模式図(a)及び(b)。The schematic diagram (a) and (b) which shows the effect | action at the time of the electrical property test | inspection of the test contact in embodiment of this invention. 本発明の実施形態におけるテストコンタクトの電気特性検査時の作用を従来技術と比較した模式図(a)及び(b)。The schematic diagram (a) and (b) which compared the effect | action at the time of the electrical property test | inspection of the test contact in embodiment of this invention with a prior art. 従来のテストコンタクトにおける水平コンタクトの構成を示す模式図。The schematic diagram which shows the structure of the horizontal contact in the conventional test contact. 従来のテストコンタクトにおける積層コンタクトの構成を示す模式図。The schematic diagram which shows the structure of the lamination | stacking contact in the conventional test contact.

符号の説明Explanation of symbols

1…テストコンタクト
11…コンタクト
12…屈曲部
13…水平部
14…補助板
C…半導体部品
E…電極
DESCRIPTION OF SYMBOLS 1 ... Test contact 11 ... Contact 12 ... Bending part 13 ... Horizontal part 14 ... Auxiliary board C ... Semiconductor component E ... Electrode

Claims (2)

電子部品の電極にコンタクトを接触させて電子部品の電気特性を検査するテストコンタクトにおいて、
前記コンタクトは、弾性力のある細長い板状体からなり、
前記板状体の先端部側には、この板状体の先端部を前記電極との接触方向に向かって屈曲させる屈曲部が形成され、
前記コンタクトには、この屈曲部を境界として、前記接触方向に傾斜した傾斜部と、前記傾斜部の傾斜方向と交差する方向に伸びた前記傾斜部よりも長い水平部とが形成され、
前記傾斜部の先端部が、前記電極の表面に対して傾斜角度を持って接触し、
前記水平には、その水平部の撓みを抑制する補助板が設けられ、
前記板状体の前記補助板が設けられた部分における前記屈曲部とは反対側の部分であって、前記屈曲部から傾斜部先端までの長さよりも前記屈曲部から離れた位置に、前記板状体と補助板が前記傾斜方向と反対方向へ移動することを阻止する支点が設けられていることを特徴とするテストコンタクト。
In the test contact that inspects the electrical characteristics of the electronic component by contacting the contact with the electrode of the electronic component,
The contact consists of an elongated plate-like body having elasticity,
On the tip side of the plate-like body, a bent portion is formed that bends the tip of the plate-like body in the contact direction with the electrode,
The contact is formed with an inclined portion inclined in the contact direction with the bent portion as a boundary, and a horizontal portion longer than the inclined portion extending in a direction intersecting the inclined direction of the inclined portion,
The tip of the inclined portion is in contact with the surface of the electrode with an inclination angle,
The horizontal portion is provided with an auxiliary plate that suppresses bending of the horizontal portion,
The portion of the plate-like body on the side opposite to the bent portion in the portion where the auxiliary plate is provided, at a position farther from the bent portion than the length from the bent portion to the tip of the inclined portion. A test contact, characterized in that a fulcrum for preventing the rod and the auxiliary plate from moving in the direction opposite to the inclination direction is provided .
前記コンタクトは、銅およびその合金、ステンレス鋼、タングステンおよびその合金、超硬合金のいずれかからなることを特徴とする請求項1記載のテストコンタクト。   2. The test contact according to claim 1, wherein the contact is made of any one of copper and an alloy thereof, stainless steel, tungsten and an alloy thereof, and a cemented carbide.
JP2007129803A 2007-05-15 2007-05-15 Test contact Expired - Fee Related JP5392693B2 (en)

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