JP5233858B2 - Epoxy resin composition, cured product thereof, and semiconductor device - Google Patents

Description

  The present invention relates to an epoxy resin composition, a cured product, and a semiconductor encapsulating material that are non-halogen-based, exhibit high flame retardancy, exhibit high adhesion to a substrate, and have excellent solder crack resistance.

Epoxy resin compositions containing an epoxy resin and its curing agent as essential components are excellent in various properties such as electrical insulation, high heat resistance, moisture resistance, and dimensional stability. Substrates, electronic components such as resist ink, conductive adhesives such as conductive paste and other adhesives, liquid sealing materials such as underfill, liquid crystal sealing materials, flexible substrate coverlays, matrix for composite materials, paints, photoresists Widely used in materials and color developing materials. Among these, in the field of electronic materials such as semiconductors and printed wiring boards, they are used as sealing materials and substrate materials, and the demand for higher performance is increasing with technological innovation in these fields.
When the epoxy resin composition is used in the field of electronic materials typified by a sealing material, a halogen-based flame retardant such as bromine has been blended together with an antimony compound so far to impart flame retardancy to the cured product. However, in recent environmental and safety efforts, environmentally and flame-resistant flame retardants that do not use halogen-based flame retardants that may cause dioxins and do not use antimony compounds that are suspected of carcinogenicity. There is a strong demand for the development of a conversion method. Further, non-halogenation of the semiconductor sealing material is a technology that greatly contributes to the improvement of the reliability of semiconductor devices exposed to high temperatures, and is highly expected in the market.
For example, an epoxy resin obtained by reacting a phenol resin obtained by reacting a hydroxy group-containing aromatic compound, an alkoxy group-containing aromatic compound, and a carbonyl group-containing compound with epihalohydrin is known as an electronic component sealing material that meets such required characteristics. (See Patent Document 1 below).
However, although the epoxy resin disclosed in Patent Document 1 has achieved a certain degree of flame retardancy, it cannot satisfy the higher flame retardance performance that has been demanded in recent years, and lead frames, etc. The adhesion to metal was not sufficient.
This point will be described in detail. For example, in the field of semiconductor sealing materials, the reflow processing temperature has increased due to the shift to lead-free solder, and improvement in solder crack resistance (reflow properties) is required. As a means, means for reducing moisture absorption by increasing the filling of inorganic fillers such as fused silica powder is used. In this case, adhesion between a resin and a metal typified by lead frame (Cu, Ag, PPF, etc.) is used. However, there is a problem that peeling is likely to occur between the lead frame and the sealing material. Therefore, a material excellent in adhesion to the lead frame has been demanded as an electronic component sealing material corresponding to lead-free solder.

JP 2006-274236 A

  Accordingly, the problem to be solved by the present invention is to use an epoxy resin composition that exhibits an excellent flame retardant effect and has excellent adhesion to a metal such as a lead frame, a cured product thereof, and the composition. An object is to provide a semiconductor device having excellent reliability.

As a result of intensive studies to solve the above problems, the present inventors have as an epoxy resin component in the epoxy resin composition,
A glycidyloxy group-containing aromatic hydrocarbon group (E), an alkoxy group-containing condensed polycyclic aromatic hydrocarbon group (B), and
Each of the divalent hydrocarbon groups (X) selected from a methylene group, an alkylidene group, and an aromatic hydrocarbon structure-containing methylene group, and the glycidyloxy group-containing aromatic hydrocarbon group (E) and the alkoxy group-containing condensed polycyclic aromatic hydrocarbon group (B) is a divalent hydrocarbon group (X) selected from the methylene group, alkylidene group, and aromatic hydrocarbon structure-containing methylene group. ) Is selected from the group consisting of an epoxy resin (a1) having a structure bonded through a molecular structure in the molecular structure, a bisphenol type epoxy resin and a biphenol type epoxy resin, and an epoxy equivalent of 2 of 250 g / eq to 700 g / eq. By using together with the functional epoxy resin (a2), the cured product exhibits extremely high flame retardancy while being non-halogen, It found that excellent adhesion, and have completed the present invention.

That is, the present invention is an epoxy resin composition containing the epoxy resin (A) and the curing agent (B) as essential components,
As the epoxy resin (A),
Glycidyloxy group-containing aromatic hydrocarbon group (E),
An alkoxy group-containing condensed polycyclic aromatic hydrocarbon group (B), and
Each structural site of a divalent hydrocarbon group (X) selected from a methylene group, an alkylidene group, and an aromatic hydrocarbon structure-containing methylene group, and
The glycidyloxy group-containing aromatic hydrocarbon group (E) and the alkoxy group-containing condensed polycyclic aromatic hydrocarbon group (B) are selected from the methylene group, the alkylidene group, and the aromatic hydrocarbon structure-containing methylene group. An epoxy resin (a1) having in its molecular structure a structure bonded via a divalent hydrocarbon group (X), and
Bifunctional epoxy resin (a2) selected from the group consisting of bisphenol-type epoxy resins and biphenol-type epoxy resins and having an epoxy equivalent weight in the range of 250 g / eq to 700 g / eq
It is related with the epoxy resin composition characterized by using together.

  The present invention further relates to a cured product obtained by curing the epoxy resin composition.

  The present invention further relates to a semiconductor device in which a semiconductor chip and a lead frame are sealed using the epoxy resin composition.

  According to the present invention, an epoxy resin composition that exhibits an excellent flame retardant effect and has excellent adhesion to a metal such as a lead frame, a cured product thereof, and reliability can be obtained by using the composition. An excellent semiconductor device can be provided.

Hereinafter, the present invention will be described in detail.
The epoxy resin (a1), which is a component of the epoxy resin (A) used in the present invention, includes a glycidyloxy group-containing aromatic hydrocarbon group (E) and an alkoxy group-containing condensed polycyclic aromatic hydrocarbon group (B). And a divalent hydrocarbon group (X) selected from a methylene group, an alkylidene group, and an aromatic hydrocarbon structure-containing methylene group, and the glycidyloxy group-containing aromatic A divalent hydrocarbon in which the hydrocarbon group (E) and the alkoxy group-containing condensed polycyclic aromatic hydrocarbon group (B) are selected from the methylene group, alkylidene group, and aromatic hydrocarbon structure-containing methylene group It is represented by an epoxy resin having in its molecular structure a structure bonded through the group (X). In this invention, since this epoxy resin (a1) is used, the flame retardance excellent in the hardened | cured material can be provided.

  Specifically, the epoxy resin (a1) includes a phenolic hydroxyl group-containing aromatic hydrocarbon group (P), an alkoxy group-containing condensed polycyclic aromatic hydrocarbon group (B), a methylene group, an alkylidene group, And a divalent hydrocarbon group (X) selected from the aromatic hydrocarbon structure-containing methylene group, and the phenolic hydroxyl group-containing aromatic hydrocarbon group (P) and the alkoxy The group-containing condensed polycyclic aromatic hydrocarbon group (B) is bonded through a divalent hydrocarbon group (X) selected from the methylene group, alkylidene group, and aromatic hydrocarbon structure-containing methylene group. Examples thereof include an epoxy resin obtained by reacting a phenol resin (ph1) having a structure in the molecular structure with epihalohydrin.

  The phenol resin (ph1) can be produced by reacting a hydroxy group-containing aromatic compound (p), an alkoxy group-containing aromatic compound (b), and a carbonyl group-containing compound (x).

  Specific examples of the hydroxy group-containing aromatic compound (p) used in the above production method include unsubstituted phenols such as phenol, resorcinol and hydroquinone, cresol, phenylphenol, ethylphenol, n-propylphenol and iso-propyl. Monosubstituted phenols such as phenol and t-butylphenol, disubstituted phenols such as xylenol, methylpropylphenol, methylbutylphenol, methylhexylphenol, dipropylphenol and dibutylphenol, mesitol, 2,3,5-trimethylphenol, 2 , 3,6-trimethylphenol and the like, and naphthols such as 1-naphthol, 2-naphthol and methylnaphthol. When manufacturing the said phenol resin (ph1), the said compound may be used independently and may use 2 or more types together.

  Among these, 1-naphthol, 2-naphthol, cresol, and phenol are particularly preferable because the cured product has excellent flame retardancy.

Next, the alkoxy group-containing aromatic compound (b) specifically includes 1-methoxynaphthalene, 2-methoxynaphthalene, 1-methyl-2-methoxynaphthalene, 1-methoxy-2-methylnaphthalene, 1,3. , 5-trimethyl-2-methoxynaphthalene, 2,6-dimethoxynaphthalene, 2,7-dimethoxynaphthalene, 1-ethoxynaphthalene,
1,4-dimethoxynaphthalene, 1-t-butoxynaphthalene, 1-methoxyanthracene, and the like can be given.

  Among these, 2-methoxynaphthalene and 2,7-dimethoxynaphthalene are particularly preferable from the viewpoint of easily forming an alkoxynaphthalene skeleton at the molecular end, and 2-methoxynaphthalene is preferable from the viewpoint of flame retardancy and dielectric properties.

  Next, the carbonyl group-containing compound (x) is specifically an aliphatic aldehyde such as formaldehyde, acetaldehyde or propionaldehyde, a dialdehyde such as glyoxal, benzaldehyde, 4-methylbenzaldehyde, 3,4-dimethylbenzaldehyde, Examples thereof include aromatic aldehydes such as 4-biphenylaldehyde and naphthylaldehyde, and ketone compounds such as benzophenone, fluorenone and indanone.

  Among these, formaldehyde, benzaldehyde, 4-biphenylaldehyde, and naphthylaldehyde are preferable from the viewpoint that the obtained cured product has excellent flame retardancy, and formaldehyde is preferable from the viewpoint that the obtained resin has low viscosity.

  The following methods 1) to 3) are the methods for reacting the hydroxy group-containing aromatic compound (p), the alkoxy group-containing condensed polycyclic aromatic compound (b) and the carbonyl group-containing compound (x). Can be mentioned.

Method 1): A hydroxy group-containing aromatic compound (p), an alkoxy group-containing condensed polycyclic aromatic compound (b) and a carbonyl group-containing compound (x) are charged substantially simultaneously, and an appropriate polymerization catalyst is present. A method in which the reaction is carried out with stirring under heating.
Method 2): After reacting 0.05 to 30 mol, preferably 2 to 30 mol, of the carbonyl group-containing compound (x) with respect to 1 mol of the alkoxy group-containing condensed polycyclic aromatic compound (b), A method in which a hydroxy group-containing aromatic compound (p) is charged and reacted.
Method 3): Hydroxy group-containing aromatic compound (p) and alkoxy group-containing condensed polycyclic aromatic compound (b) are mixed in advance, and carbonyl group-containing compound (x) is continuously or intermittently added thereto. A method in which a reaction is carried out by adding it to the system.

  In the above method 1), “substantially simultaneously” means that all raw materials are charged until the reaction is accelerated by heating.

  The desired epoxy resin (a1) can be obtained by reacting the phenol resin (ph1) thus obtained with epihalohydrin. Specifically, 2 to 10 mol of epihalohydrin is added to 1 mol of phenolic hydroxyl group in the phenol resin (ph1), and further 0.9 to 2.0 mol of basicity to 1 mol of phenolic hydroxyl group. The method of making it react at the temperature of 20-120 degreeC for 0.5 to 10 hours, adding a catalyst collectively or gradually is mentioned. The basic catalyst may be solid or an aqueous solution thereof. When an aqueous solution is used, it is continuously added and water and epihalohydrins are continuously distilled from the reaction mixture under reduced pressure or normal pressure. It is preferable that the solution is further separated to remove water and the epihalohydrin is continuously returned to the reaction mixture.

  In the first batch of epoxy resin production, all of the epihalohydrins used for preparation are new in industrial production, but the subsequent batches are consumed by the reaction with epihalohydrins recovered from the crude reaction product. It is preferable to use in combination with new epihalohydrins corresponding to the amount disappeared. At this time, the epihalohydrin used is not particularly limited, and examples thereof include epichlorohydrin, epibromohydrin, β-methylepichlorohydrin, and the like. Of these, epichlorohydrin is preferred because it is easily available industrially.

  Specific examples of the basic catalyst include alkaline earth metal hydroxides, alkali metal carbonates, and alkali metal hydroxides. In particular, alkali metal hydroxides are preferable from the viewpoint of excellent catalytic activity of the epoxy resin synthesis reaction, and examples thereof include sodium hydroxide and potassium hydroxide. In use, these basic catalysts may be used in the form of an aqueous solution of about 10 to 55% by mass, or in the form of a solid. Moreover, the reaction rate in the synthesis | combination of an epoxy resin can be raised by using an organic solvent together. Examples of such organic solvents include, but are not limited to, ketones such as acetone and methyl ethyl ketone, alcohols such as methanol, ethanol, 1-propyl alcohol, isopropyl alcohol, 1-butanol, secondary butanol, and tertiary butanol, methyl Examples include cellosolves such as cellosolve and ethyl cellosolve, ethers such as tetrahydrofuran, 1,4-dioxane, 1,3-dioxane and diethoxyethane, and aprotic polar solvents such as acetonitrile, dimethyl sulfoxide and dimethylformamide. These organic solvents may be used alone or in combination of two or more as appropriate in order to adjust the polarity.

  After the reaction product of the epoxidation reaction is washed with water, unreacted epihalohydrin and the organic solvent to be used in combination are distilled off by distillation under heating and reduced pressure. Further, in order to obtain an epoxy resin with less hydrolyzable halogen, the obtained epoxy resin is again dissolved in an organic solvent such as toluene, methyl isobutyl ketone, methyl ethyl ketone, and alkali metal hydroxide such as sodium hydroxide or potassium hydroxide. Further reaction can be carried out by adding an aqueous solution of the product. At this time, a phase transfer catalyst such as a quaternary ammonium salt or crown ether may be present for the purpose of improving the reaction rate. When the phase transfer catalyst is used, the amount used is preferably in the range of 0.1 to 3.0% by mass with respect to the epoxy resin used. After completion of the reaction, the generated salt is removed by filtration, washing with water, and a high-purity epoxy resin can be obtained by distilling off a solvent such as toluene and methyl isobutyl ketone under heating and reduced pressure.

  The epoxy resin (A) used in the present invention is a combination of the bifunctional epoxy resin (a2) and the reaction product (a1) described above.

  The bifunctional epoxy resin (a2) used in the present invention is a bisphenol type epoxy resin or a biphenol type epoxy resin having an epoxy equivalent in the range of 250 g / eq to 700 g / eq. Since the bifunctional epoxy resin (a2) has an epoxy equivalent of 250 g / eq or more, it has good adhesion to the lead frame and also has good flame retardancy. On the other hand, since the epoxy equivalent is 700 g / eq or less, the mixing property at the time of melt-kneading with the epoxy resin (a1) is good, and the fluidity at the time of melting in electronic component sealing materials is excellent. Become.

  Here, the bifunctional epoxy resin (a2) can be obtained by epoxidizing bisphenols or biphenols so as to have a predetermined epoxy equivalent. As the bisphenols, bisphenol A, bisphenol F, Bis (4-hydroxyphenyl) menthane, bis (4-hydroxyphenyl) dicyclopentane, 4,4′-dihydroxybenzophenone, bis (4-hydroxyphenyl) ether, bis (4-hydroxy-3-methylphenyl) ether, Bis (3,5-dimethyl-4-hydroxyphenyl) ether, bis (4-hydroxyphenyl) sulfide, bis (4-hydroxy-3-methylphenyl) sulfide, bis (3,5-dimethyl-4-hydroxyphenyl) Sulfide, bis (4-hydroxy Enyl) sulfone, bis (4-hydroxy-3-methylphenyl) sulfone, bis (3,5-dimethyl-4-hydroxyphenyl) sulfone, 1,1-bis (4-hydroxyphenyl) cyclohexane, 1,1-bis (4-Hydroxy-3-methylphenyl) cyclohexane, 1,1-bis (3,5-dimethyl-4-hydroxyphenyl) cyclohexane, 1,1′-bis (3-t-butyl-6-methyl-4- Hydroxyphenyl) butane and the like.

On the other hand, examples of biphenols include 4,4′-dihydroxybiphenyl, 4,4′-dihydroxy-3,3 ′, 5,5′-tetramethylbiphenyl [tetramethylbiphenyl], and the like.
In addition, the above-mentioned bisphenol F may contain a polynuclear body in the range of 0.1 to 20% by mass.

  Of these, tetramethylbiphenol type epoxy resin using tetramethylbiphenol as a raw material phenol; bisphenol A type using bisphenol A as a raw material phenol because of its excellent flame retardancy, adhesion to metals, and solder crack resistance. Epoxy resin: Bisphenol F type epoxy resin using bisphenol F as a raw material phenol is particularly preferable.

Examples of the method for adjusting the epoxy equivalent of the bifunctional epoxy resin to 250 to 700 g / eq include the following method 3) and method 4).
Method 3): A bifunctional phenol selected from the bisphenol and the biphenols and an epihalohydrin are reacted in an excess ratio of the epihalohydrin to the phenolic hydroxyl group of the bifunctional phenol to obtain a low molecular weight epoxy resin, The obtained low molecular weight epoxy resin and the bifunctional phenol compound are overlapped at a ratio such that the hydroxyl equivalent of the bifunctional phenol compound is 0.05 to 0.35 equivalent to 1 equivalent of epoxy of the low molecular weight epoxy resin. Addition reaction method.
Method 4): A method in which an epoxy resin is obtained by reacting an epihalohydrin and the bifunctional phenol compound at a ratio of 0.9 to 2.0 equivalents of a phenolic hydroxyl group with respect to 1.0 mol of epichlorohydrin.

The low molecular weight epoxy resin obtained by reacting the bifunctional phenol and epihalohydrin in the method 3) usually has an epoxy equivalent in the range of 160 to 230 g / eq, and the reaction can be carried out by a conventional method. it can. The low molecular weight epoxy resin may be a commercially available low molecular weight type bisphenol type epoxy resin or a low molecular weight type biphenol type epoxy resin.
Next, the reaction between the low molecular weight epoxy resin and the bifunctional phenol compound is carried out by alkali metal hydroxides such as sodium hydroxide and potassium hydroxide, tertiary amines such as triethylamine and benzyldimethylamine, tetramethylammonium chloride and the like. It can be obtained by reaction using a catalyst such as a quaternary ammonium salt, an imidazole compound, or triphenylphosphine.

  The reaction can be performed in the presence of an organic solvent as necessary. The organic solvent is not particularly limited. For example, acetone, methyl ethyl ketone, methyl isobutyl ketone, methanol, ethanol, isopropyl alcohol, n-butanol, methoxypropanol, methyl cellosolve, ethyl cellosolve, ethyl carbitol, ethyl acetate, xylene, Toluene, cyclohexanone, N, N-dimethylformamide and the like can be used.

  Next, in the method 4), specifically, 0.9 to 2.0 mol of phenolic hydroxyl group in the phenol resin is added to 1 mol of epihalohydrin, and further, 0.1 mol to 1 mol of epihalohydrin used. The method of making it react at the temperature of 20-120 degreeC for 0.5 to 10 hours, adding the basic catalyst of the ratio used as 9-2.0 mol collectively or gradually is mentioned. This basic catalyst may be solid or its aqueous solution may be used, and the reaction may be carried out under normal pressure or under pressure.

  Specific examples of the basic catalyst used here include alkaline earth metal hydroxides, alkali metal carbonates, and alkali metal hydroxides. In particular, alkali metal hydroxides are preferable from the viewpoint of excellent catalytic activity of the epoxy resin synthesis reaction, and examples thereof include sodium hydroxide and potassium hydroxide. In use, these basic catalysts may be used in the form of an aqueous solution of about 10 to 55% by mass, or in the form of a solid. Moreover, the reaction rate in the synthesis | combination of an epoxy resin can be raised by using an organic solvent together. Examples of such organic solvents include, but are not limited to, ketones such as acetone and methyl ethyl ketone, alcohols such as methanol, ethanol, 1-propyl alcohol, isopropyl alcohol, 1-butanol, secondary butanol, and tertiary butanol, methyl Examples include cellosolves such as cellosolve and ethyl cellosolve, ethers such as tetrahydrofuran, 1,4-dioxane, 1,3-dioxane and diethoxyethane, and aprotic polar solvents such as acetonitrile, dimethyl sulfoxide and dimethylformamide. These organic solvents may be used alone or in combination of two or more as appropriate in order to adjust the polarity.

  After the epoxidation is completed, the formed salt is removed by filtration, washing with water, and the target epoxy resin (a2) can be obtained by distilling off solvents such as toluene and methyl isobutyl ketone under heating and reduced pressure. it can.

  Here, the method 4) is preferable from the viewpoint of excellent electrical characteristics of the package and low halogen in semiconductor package applications. This is because not only the reaction catalyst does not remain, but also surprisingly, there are very few extracted water chloride ions compared to the epoxy resin obtained by the method 3). However, in this case, it is necessary to reduce easily hydrolyzable chlorine, specifically 150 ppm or less, more preferably 100 ppm or less.

  Further, the epoxy resin (a1) and the epoxy resin (a2) may be mixed and kneaded together with other components when compounded, but it is preferable to uniformly mix them in advance in a molten state.

  Here, the mixing ratio of the epoxy resin (a1) and the epoxy resin (a2) is such that the mass ratio [(a1) / (a2)] is in the range of 95/5 to 60/40. It is preferable because it has excellent fluidity and moldability characteristics, and is excellent in adhesion to metal when cured, solder crack resistance, and flame retardancy. Specifically, that is, by using 5% by weight or more of (a2) with respect to the epoxy resin (a1), the adhesiveness with a metal when it is made a cured product, solder crack resistance, and further flame retardancy are dramatically improved. In addition, the moldability is dramatically improved by using the epoxy resin (a2) at 40% by weight or less with respect to the epoxy resin (a1).

  The reason why the flame retardancy is drastically improved by using 5% by mass or more of the epoxy resin (a2) is considered that the cured product is excellent in adhesion to an inorganic filler such as silica. If the adhesion is weak, cracks are likely to occur during combustion, and the surface area of the combustion field is increased to promote combustion and deteriorate flame retardancy.

  Further, in the present invention, the epoxy resin (A) is a mixture of the epoxy resin (a1) and the epoxy resin (a2), and the mixture is measured from −30 ° C. to 100 by differential scanning calorimetry (DSC). It is preferable that the midpoint glass transition temperature is 5 to 30 ° C. when measured by raising the temperature to 3 ° C. at a rate of 3 ° C. per minute. By making Tg 10 ° C. or higher, workability is drastically improved (it becomes difficult to block) and adhesion is enhanced. On the other hand, in order to enable high filling of inorganic fillers such as silica, the melt viscosity is reduced. It is necessary to reduce sufficiently, and for that purpose, it is necessary to make it 30 degrees C or less. Here, the melt viscosity necessary for highly filling the inorganic filler is such that the ICI viscosity at 150 ° C. is 0.1 to 3.0 dPa · s.

  In addition to the epoxy resin (A) described above in the epoxy resin composition of the present invention, another epoxy resin (A ′) may be used in combination as long as the characteristics of the present invention are not impaired.

  The other epoxy resin (A ′) used here is not particularly limited, and various epoxy resins can be used. For example, liquid bisphenol A type epoxy resin, liquid bisphenol F type epoxy resin, liquid type Bisphenol S type epoxy resin, liquid bisphenol AD type epoxy resin, resorcinol type epoxy resin, hydroquinone type epoxy resin, catechol type epoxy resin, dihydroxynaphthalene type epoxy resin, liquid biphenyl type epoxy resin, sulfur containing epoxy resin, stilbene type epoxy resin, etc. Bifunctional epoxy resin, triglycidyl isosocyanurate, methoxynaphthalene modified aralkyl epoxy resin, methoxynaphthalene modified novolak resin, phenol novolac epoxy resin, cresol novola Type epoxy resin, triphenylmethane type epoxy resin, tetraphenylethane type epoxy resin, dicyclopentadiene-phenol addition reaction type epoxy resin, phenol aralkyl type epoxy resin (epoxidized product of zylock resin), naphthol formaldehyde condensation type epoxy resin, Naphthol novolac type epoxy resin, naphthol aralkyl type epoxy resin, naphthol-phenol co-condensed novolac type epoxy resin, naphthol-cresol co-condensed novolac type epoxy resin, aromatic hydrocarbon formaldehyde resin modified phenolic resin type epoxy resin, biphenyl modified novolac type epoxy resin Resin (epoxidized product of polyphenol resin in which phenol nucleus is linked by bisphenylenemethylene group), biphenyl modified naphthol type epoxy resin (Epoxy compound of polyvalent naphthol resin in which naphthol nucleus is linked by bismethylene group), alkoxy group-containing novolac type epoxy resin, alkoxy group-containing phenol aralkyl resin, tetrabromobisphenol A type epoxy resin, Japanese Patent Laid-Open No. 4-11662 or Examples thereof include epoxy resins derived from various 9,10-dihydro-9-oxa-10-phosphaphenanthrene = 10-oxide described in JP-A-11-166035.

  Moreover, the said epoxy resin may be used independently and may mix 2 or more types. Among these epoxy resins, bisphenol F-type epoxy resins, biphenyl-type epoxy resins, and tetramethylbiphenyl-type epoxy resins are preferable in terms of particularly low viscosity, and phenol aralkyl-type epoxy resins and biphenyls are preferable in terms of excellent flame retardancy. A modified novolac type epoxy resin is preferred.

  When using the other epoxy resins (a3) described above, the amount of the epoxy resin (a3) used in the total epoxy resin component is in the range of 70% by mass or less, in particular in the range of 50% by mass to 10% by mass. Preferably there is.

As the curing agent (B) used in the epoxy resin composition of the invention, various curing agents for epoxy resins can be used, such as amine compounds, acid anhydride compounds, amide compounds,
Examples include epoxy resin curing agents such as phenolic compounds.

Specifically, polyamide resin synthesized from diaminodiphenylmethane, diethylenetriamine, triethylenetetramine, diaminodiphenylsulfone, isophoronediamine, dicyandiamide, and linolenic acid and ethylenediamine, phthalic anhydride, trimellitic anhydride, pyrone anhydride Mellitic acid, maleic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methyl nadic anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, phenol novolac resin, cresol novolac resin, aromatic hydrocarbon formaldehyde resin modified Phenol resin, dicyclopentadiene phenol addition resin; phenol aralkyl resin, cresol aralkyl resin, naphthol aralkyl resin, biphenyl modified Hydroxyaromatic compounds containing a structure in which a hydroxyl group-containing aromatic structure is linked using bisaralkyl as a nodule group such as an enol aralkyl resin; phenol trimethylol methane resin, tetraphenylol ethane resin, naphthol novolak resin, naphthol-phenol co-condensation Novolac resin, naphthol-cresol co-condensed novolak resin, biphenyl-modified phenol resin, aminotriazine-modified phenol resin, alkoxy group-containing aromatic ring-modified novolak resin (polyhydric phenol compound in which phenol nucleus and alkoxy group-containing aromatic ring are linked with formaldehyde) Examples thereof include polyhydric phenol compounds such as polyhydric phenol compounds and the like, and modified products thereof, imidazoles, BF ₃ -amine complexes, and guanidine derivatives. Moreover, these hardening | curing agents may be used independently and may mix 2 or more types.

  Among these curing agents, hydroxy aromatic compounds containing a structure in which a hydroxyl group-containing aromatic structure is linked with bisaralkyl as a nodule group, an alkoxy group-containing aromatic ring-modified novolak resin, an aromatic hydrocarbon formaldehyde resin-modified phenol resin , Aminotriazine-modified phenolic resin (polyhydric phenol compound in which phenol nucleus is linked with melamine or benzoguanamine), alkoxy group-containing aromatic ring-modified novolak resin (polyhydric phenol in which phenol nucleus and alkoxy group-containing aromatic ring are linked with formaldehyde) Polyhydric phenol compounds such as (compound) are preferred from the viewpoint of excellent flame retardancy, and aralkyl type phenol resins are preferred. For example, when it is desired to improve moldability, a phenol novolac resin is preferable, and the curing agent can be used in combination as appropriate depending on the application and required characteristics.

  Specific examples of the hydroxyaromatic compound having a structure in which a hydroxyl group-containing aromatic structure is linked using bisaralkyl as a nodule group include the following general formula (1):

（式中、Ｘ^１はベンゼン環、ナフタレン環、若しくはこれらの芳香核にアルキル基を有する構造部位であり、Ａｒ^１はベンゼン骨格、ビフェニル骨格、ナフタレン骨格、若しくはこれらの芳香核にアルキル基を有する構造部位であり、Ｒ^１は同一でも異なっていてもよい水素原子又は炭素数１〜６の炭化水素基であり、ｎは１〜４である。）で表されるアラルキル型フェノール類；

(In the formula, X ¹ is a benzene ring, a naphthalene ring, or a structural part having an alkyl group in an aromatic nucleus thereof, and Ar ¹ has an alkyl group in a benzene skeleton, a biphenyl skeleton, a naphthalene skeleton, or an aromatic nucleus thereof. An aralkyl-type phenol represented by the following formula: R ¹ is a hydrogen atom which may be the same or different or a hydrocarbon group having 1 to 6 carbon atoms, and n is 1 to 4.

As the alkoxy group-containing aromatic ring-modified novolak resin, specifically,
Phenolic hydroxyl group-containing aromatic hydrocarbon group (P),
An alkoxy group-containing condensed polycyclic aromatic hydrocarbon group (B), and
Divalent hydrocarbon group (X) selected from a methylene group, an alkylidene group, and an methylene group containing an aromatic hydrocarbon structure
And the phenolic hydroxyl group-containing aromatic hydrocarbon group (P) and the alkoxy group-containing condensed polycyclic aromatic hydrocarbon group (B) are the methylene group and the alkylidene group. And a phenol resin having in its molecular structure a structure bonded via a divalent hydrocarbon group (X) selected from methylene groups containing an aromatic hydrocarbon structure.

As the aromatic hydrocarbon formaldehyde resin-modified phenol resin, specifically, the following general formula (2)

（式中、Ｘ^２は置換基を有していてもよい芳香環であり、Ａｒ^２はフェニル基、ビフェニル基、ナフチル基、若しくはこれらの芳香核にアルキル基を有する構造部位でありｎは１〜４である。）で表されるフェノール樹脂が挙げられる。
これらの硬化剤はそれぞれ単独で用いてもよく、また、２種以上併用してもよい。

(In the formula, X ² is an aromatic ring which may have a substituent, Ar ² is a phenyl group, a biphenyl group, a naphthyl group, or a structural site having an alkyl group in the aromatic nucleus, and n is 1 To 4)).
These curing agents may be used alone or in combination of two or more.

  Although it does not restrict | limit especially as a compounding quantity of the hardening | curing agent (B) in the epoxy resin composition of this invention, From the point that the mechanical physical property etc. of the hardened | cured material obtained are favorable, epoxy resin (A) and The amount of the active group in the curing agent is preferably 0.5 to 1.5 equivalents with respect to a total of 1 equivalent of epoxy groups with other epoxy resins used in combination as necessary.

  Moreover, a hardening accelerator can also be suitably used together with the epoxy resin composition of this invention as needed. Various curing accelerators can be used, and examples thereof include phosphorus compounds, tertiary amines, imidazoles, organic acid metal salts, Lewis acids, and amine complex salts. In particular, when used as a semiconductor encapsulating material, it is excellent in curability, heat resistance, electrical characteristics, moisture resistance reliability, etc., so that triphenylphosphine is used for phosphorus compounds and 1,8-diazabicyclo is used for tertiary amines. -[5,4,0] -undecene (DBU) is preferred.

  Since the epoxy resin composition of the present invention described in detail above has an excellent flame retardancy imparting effect, the flame retardant of the cured product can be obtained without adding a conventionally used flame retardant. Good properties. However, in order to exert a higher degree of flame retardancy, for example, in the field of semiconductor sealing materials, it contains substantially halogen atoms in a range that does not reduce the moldability in the sealing process and the reliability of the semiconductor device. A non-halogen flame retardant (C) may be added.

  The epoxy resin composition containing such a non-halogen flame retardant (C) is substantially free of halogen atoms. For example, halogen atoms due to trace amounts of impurities of about 5000 ppm or less derived from epihalohydrin contained in the epoxy resin. May be included.

  Examples of the non-halogen flame retardant (C) include phosphorus flame retardants, nitrogen flame retardants, silicone flame retardants, inorganic flame retardants, and organic metal salt flame retardants. It is not limited at all, and it may be used alone, or a plurality of flame retardants of the same system may be used, or flame retardants of different systems may be used in combination.

  As the phosphorus flame retardant, either inorganic or organic can be used. Examples of the inorganic compounds include red phosphorus, monoammonium phosphate, diammonium phosphate, triammonium phosphate, ammonium phosphates such as ammonium polyphosphate, and inorganic nitrogen-containing phosphorus compounds such as phosphate amide. .

  The red phosphorus is preferably subjected to a surface treatment for the purpose of preventing hydrolysis and the like. Examples of the surface treatment method include (i) magnesium hydroxide, aluminum hydroxide, zinc hydroxide, water A method of coating with an inorganic compound such as titanium oxide, bismuth oxide, bismuth hydroxide, bismuth nitrate or a mixture thereof; (ii) an inorganic compound such as magnesium hydroxide, aluminum hydroxide, zinc hydroxide, titanium hydroxide; and A method of coating with a mixture of a thermosetting resin such as a phenol resin, (iii) thermosetting of a phenol resin or the like on a coating of an inorganic compound such as magnesium hydroxide, aluminum hydroxide, zinc hydroxide, or titanium hydroxide For example, a method of double coating with a resin may be used.

  Examples of the organic phosphorus compound include, for example, general-purpose organic phosphorus compounds such as phosphate ester compounds, phosphonic acid compounds, phosphinic acid compounds, phosphine oxide compounds, phosphorane compounds, organic nitrogen-containing phosphorus compounds, and 9,10- Dihydro-9-oxa 10-phosphaphenanthrene = 10-oxide, 10- (2,5-dihydrooxyphenyl) -10H-9-oxa-10-phosphaphenanthrene = 10-oxide, 10- (2,7- Examples thereof include cyclic organophosphorus compounds such as dihydrooxynaphthyl) -10H-9-oxa-10-phosphaphenanthrene = 10-oxide, and derivatives obtained by reacting them with compounds such as epoxy resins and phenol resins.

  The blending amount thereof is appropriately selected depending on the type of the phosphorus-based flame retardant, the other components of the epoxy resin composition, and the desired degree of flame retardancy. For example, epoxy resin, curing agent, non-halogen In 100 parts by mass of the epoxy resin composition containing all of the flame retardant and other fillers and additives, when using red phosphorus as a non-halogen flame retardant, in the range of 0.1 to 2.0 parts by mass It is preferable to mix, and when using an organophosphorus compound, it is also preferable to mix in the range of 0.1 to 10.0 parts by mass, particularly in the range of 0.5 to 6.0 parts by mass. Is preferred.

In addition, when using the phosphorous flame retardant, the phosphorous flame retardant may be used in combination with hydrotalcite, magnesium hydroxide, boric compound, zirconium oxide, black dye, calcium carbonate, zeolite, zinc molybdate, activated carbon, etc. Good.

  Examples of the nitrogen-based flame retardant include triazine compounds, cyanuric acid compounds, isocyanuric acid compounds, phenothiazines, and the like, and triazine compounds, cyanuric acid compounds, and isocyanuric acid compounds are preferable.

  Examples of the triazine compound include melamine, acetoguanamine, benzoguanamine, melon, melam, succinoguanamine, ethylene dimelamine, melamine polyphosphate, triguanamine, and the like, for example, (i) guanylmelamine sulfate, melem sulfate, sulfate (Iii) co-condensates of phenols such as phenol, cresol, xylenol, butylphenol and nonylphenol with melamines such as melamine, benzoguanamine, acetoguanamine and formguanamine and formaldehyde, (iii) (Ii) a mixture of a co-condensate of (ii) and a phenolic resin such as a phenol formaldehyde condensate, (iv) those obtained by further modifying (ii) and (iii) with paulownia oil, isomerized linseed oil, etc. It is.

  Specific examples of the cyanuric acid compound include cyanuric acid and cyanuric acid melamine.

  The amount of the nitrogen-based flame retardant is appropriately selected depending on the type of the nitrogen-based flame retardant, the other components of the epoxy resin composition, and the desired degree of flame retardancy. It is preferable to mix in the range of 0.05 to 10 parts by mass, especially in the range of 0.05 to 10 parts by mass, in 100 parts by mass of the epoxy resin composition containing all of the agent, non-halogen flame retardant and other fillers and additives. It is preferable to mix in the range of 5 parts by mass.

Moreover, when using the said nitrogen-type flame retardant, you may use together a metal hydroxide, a molybdenum compound, etc.

  The silicone flame retardant is not particularly limited as long as it is an organic compound containing a silicon atom, and examples thereof include silicone oil, silicone rubber, and silicone resin.

  The amount of the silicone flame retardant is appropriately selected according to the type of the silicone flame retardant, the other components of the epoxy resin composition, and the desired degree of flame retardancy. It is preferable to mix in the range of 0.05 to 20 parts by mass in 100 parts by mass of the epoxy resin composition containing all of the agent, non-halogen flame retardant and other fillers and additives. Moreover, when using the said silicone type flame retardant, you may use a molybdenum compound, an alumina, etc. together.

  Examples of the inorganic flame retardant include metal hydroxide, metal oxide, metal carbonate compound, metal powder, boron compound, and low melting point glass.

  Specific examples of the metal hydroxide include aluminum hydroxide, magnesium hydroxide, dolomite, hydrotalcite, calcium hydroxide, barium hydroxide, zirconium hydroxide and the like.

  Specific examples of the metal oxide include, for example, zinc molybdate, molybdenum trioxide, zinc stannate, tin oxide, aluminum oxide, iron oxide, titanium oxide, manganese oxide, zirconium oxide, zinc oxide, molybdenum oxide, and cobalt oxide. Bismuth oxide, chromium oxide, nickel oxide, copper oxide, tungsten oxide and the like.

  Specific examples of the metal carbonate compound include zinc carbonate, magnesium carbonate, calcium carbonate, barium carbonate, basic magnesium carbonate, aluminum carbonate, iron carbonate, cobalt carbonate, and titanium carbonate.

  Specific examples of the metal powder include aluminum, iron, titanium, manganese, zinc, molybdenum, cobalt, bismuth, chromium, nickel, copper, tungsten, and tin.

  Specific examples of the boron compound include zinc borate, zinc metaborate, barium metaborate, boric acid, and borax.

Specific examples of the low-melting-point glass include, for example, Ceeley (Bokusui Brown), hydrated glass SiO ₂ —MgO—H ₂ O, PbO—B ₂ O ₃ system, ZnO—P ₂ O ₅ —MgO system, P ₂ O ₅ —B ₂ O ₃ —PbO—MgO, P—Sn—O—F, PbO—V ₂ O ₅ —TeO ₂ , Al ₂ O ₃ —H ₂ O, lead borosilicate, etc. The glassy compound can be mentioned.

  The blending amount of the inorganic flame retardant is appropriately selected according to the type of the inorganic flame retardant, the other components of the epoxy resin composition, and the desired degree of flame retardancy. For example, epoxy resin, cured It is preferable to mix in the range of 0.05 to 20 parts by mass in 100 parts by mass of the epoxy resin composition in which all of the agent, non-halogen flame retardant and other fillers and additives are blended. It is preferable to mix in the range of 15 parts by mass.

  Examples of the organic metal salt flame retardant include ferrocene, acetylacetonate metal complex, organic metal carbonyl compound, organic cobalt salt compound, organic sulfonic acid metal salt, metal atom and aromatic compound or heterocyclic compound or an ionic bond or Examples thereof include a coordinated compound.

  The amount of the organometallic salt-based flame retardant is appropriately selected depending on the type of the organometallic salt-based flame retardant, the other components of the epoxy resin composition, and the desired degree of flame retardancy. It is preferable to mix in the range of 0.005 to 10 parts by mass in 100 parts by mass of the epoxy resin composition containing all of the epoxy resin, the curing agent, the non-halogen flame retardant, and other fillers and additives.

An inorganic filler can be blended in the epoxy resin composition of the present invention as necessary. Examples of the inorganic filler include fused silica, crystalline silica, alumina, silicon nitride, and aluminum hydroxide. In particular, when the epoxy resin composition of the present invention is used for a semiconductor encapsulant, it is preferable to use fused silica because the amount of the inorganic filler can be particularly increased. The fused silica can be used in either a crushed shape or a spherical shape. However, in order to increase the blending amount of the fused silica and suppress an increase in the melt viscosity of the molding material, it is preferable to mainly use a spherical shape. In order to further increase the blending amount of the spherical silica, it is preferable to appropriately adjust the particle size distribution of the spherical silica.
The filling rate may be appropriately selected according to the use, but for semiconductor encapsulant use, a higher value is preferable in consideration of flame retardancy, and is 65 to 95% by mass with respect to the total amount of the epoxy resin composition. , More preferably in the range of 80 to 95% by mass. Moreover, when using for uses, such as an electrically conductive paste, electroconductive fillers, such as silver powder and copper powder, can be used.

  Various compounding agents, such as a silane coupling agent, a mold release agent, an ion trap agent, a pigment, an emulsifier, can be added to the epoxy resin composition of this invention as needed.

  The epoxy resin composition of the present invention can be obtained by uniformly mixing the above-described components. The epoxy resin composition of the present invention, in which the epoxy resin of the present invention, a curing agent and, if necessary, a curing accelerator are blended, can be easily made into a cured product by a method similar to a conventionally known method. Examples of the cured product include molded cured products such as laminates, cast products, adhesive layers, coating films, and films.

  Applications of the epoxy resin composition of the present invention include semiconductor sealing materials, printed circuit boards, interlayer insulating materials for build-up boards, die attach agents, underfills, grab top materials, liquid sealing materials for TCP, conductive pastes Resin compositions used for electronic circuit boards such as liquid crystal sealing materials, flexible substrate coverlays, resist inks, optical waveguides that require a high refractive index, resin casting materials, composite materials, adhesives, insulating paints, etc. A coating material etc. are mentioned. Among these, in addition to flame retardancy, it can be suitably used as a semiconductor sealing material because it has good adhesion to a lead frame.

  In order to produce an epoxy resin composition prepared for a semiconductor encapsulant, an epoxy resin and a compounding agent such as a curing agent and an inorganic filler are optionally used as an extruder, a kneader, a roll, etc. It is possible to obtain a melt-mixed type epoxy resin composition by mixing thoroughly until uniform.

  The semiconductor device of the present invention can be manufactured by sealing the semiconductor chip and the lead frame using the epoxy resin composition thus obtained. Specifically, the semiconductor package is formed by casting the composition using a casting, transfer molding machine, injection molding machine or the like, and further heating at 50 to 200 ° C. for 2 to 10 hours. And a method of forming a semiconductor device.

  In order to process the epoxy resin composition of the present invention into a printed circuit board composition, for example, a resin composition for a prepreg can be used. Although it can be used without a solvent depending on the viscosity of the epoxy resin composition, it is preferable to obtain a resin composition for prepreg by varnishing using an organic solvent. As the organic solvent, it is preferable to use a polar solvent having a boiling point of 160 ° C. or lower such as methyl ethyl ketone, acetone, dimethylformamide, etc., and it can be used alone or as a mixed solvent of two or more kinds. The obtained varnish is impregnated into various reinforcing substrates such as paper, glass cloth, glass nonwoven fabric, aramid paper, aramid cloth, glass mat, and glass roving cloth, and the heating temperature according to the solvent type used, preferably 50 By heating at ˜170 ° C., a prepreg that is a cured product can be obtained. The mass ratio of the resin composition and the reinforcing substrate used at this time is not particularly limited, but it is usually preferable that the resin content in the prepreg is 20 to 60% by mass. Moreover, when manufacturing a copper clad laminated board using this epoxy resin composition, the prepreg obtained as mentioned above is laminated | stacked by a conventional method, copper foil is laminated | stacked suitably, and it is under pressure of 1-10 MPa. A copper-clad laminate can be obtained by thermocompression bonding at 170 to 250 ° C. for 10 minutes to 3 hours.

  When using the epoxy resin composition of the present invention as a resist ink, for example, using a cationic polymerization catalyst with the epoxy resin as a curing agent, and further adding a pigment, talc, and filler to form a resist ink composition And a method of applying a resist ink cured product after coating on a printed circuit board by a screen printing method.

  When the epoxy resin composition of the present invention is used as a conductive paste, for example, a method of dispersing fine conductive particles in the epoxy resin composition to form a composition for an anisotropic conductive film, which is liquid at room temperature Examples of the method include a paste resin composition for circuit connection and an anisotropic conductive adhesive.

Examples of a method for obtaining an interlayer insulating material for a build-up board from the epoxy resin composition of the present invention include, for example, a spray coating method, a curtain, and the like on a wiring board on which a circuit is formed by using the curable resin composition appropriately blended with rubber, filler, After applying using a coating method or the like, it is cured. Then, after drilling a predetermined through-hole part etc. as needed, it treats with a roughening agent, forms the unevenness | corrugation by washing the surface with hot water, and metal-treats, such as copper. As the plating method, electroless plating or electrolytic plating treatment is preferable, and examples of the roughening agent include an oxidizing agent, an alkali, and an organic solvent. Such operations are sequentially repeated as desired, and a build-up base can be obtained by alternately building up and forming the resin insulating layer and the conductor layer having a predetermined circuit pattern. However, the through-hole portion is formed after the outermost resin insulating layer is formed. In addition, a resin-coated copper foil obtained by semi-curing the resin composition on the copper foil is thermocompression-bonded at 170 to 250 ° C. on a circuit board on which a circuit is formed, thereby forming a roughened surface and plating treatment. It is also possible to produce a build-up substrate by omitting the process.

  The method for obtaining the cured product of the present invention may be based on a general method for curing an epoxy resin composition. For example, the heating temperature condition may be appropriately selected depending on the type and use of the curing agent to be combined. What is necessary is just to heat the composition obtained by the said method in the temperature range of about room temperature-250 degreeC. As the molding method and the like, a general method of the epoxy resin composition is used, and a condition specific to the epoxy resin composition of the present invention is not particularly required.

  Next, the present invention will be specifically described with reference to Examples and Comparative Examples. In the following, “parts” and “%” are based on weight unless otherwise specified. The melt viscosity at 150 ° C., the midpoint glass transition temperature, and the extracted water chloride ion were measured under the following conditions.

-Melt viscosity at 150 ° C: according to ASTM D4287-Midpoint glass transition temperature:
In the DSC curve measured under the following conditions, the temperature at the point where the straight line that is equidistant from the extended straight line of each baseline in accordance with JIS K7121 and the curve of the stepwise change portion of the glass transition intersect It was.
Equipment: DSC1 manufactured by METTLER TOLEDO
Sample amount: about 5mg
Measurement temperature range: -30 ° C to 100 ° C
Temperature condition: 3 ° C./min.
・ Extracted water chloride ion;
A pressurizable container having a diameter of 58 mm and a depth of 33 mm was charged with 5 g of a sample and 50 g of distilled water and heated at 160 ° C. for 20 hours. Then, after cooling to room temperature, the chlorine ion of the supernatant was measured.

Synthesis Example 1 [Synthesis of Epoxy Resin (E-1)]
To a flask equipped with a thermometer, a condenser tube, a fractionating tube, a nitrogen gas inlet tube, and a stirrer, 432.4 g (4.00 mol) of o-cresol and 158.2 g (1.00 mol) of 2-methoxynaphthalene 179.3 g of a 41% by weight formaldehyde aqueous solution (2.45 mol of formaldehyde) was added, 9.0 g of oxalic acid was added, the temperature was raised to 100 ° C., and the mixture was reacted at 100 ° C. for 3 hours. Subsequently, 73.2 g (formaldehyde 1.00 mol) of 41 mass% formaldehyde aqueous solution was dripped over 1 hour, collecting water with a fractionating tube. After completion of the dropwise addition, the temperature was raised to 150 ° C. over 1 hour, and further reacted at 150 ° C. for 2 hours. After completion of the reaction, 1500 g of methyl isobutyl ketone was further added, transferred to a separatory funnel and washed with water. Subsequently, after washing with water until the washing water showed neutrality, unreacted o-cresol, 2-methoxynaphthalene and methyl isobutyl ketone were removed from the organic layer under heating and reduced pressure to obtain a phenol resin. The obtained phenol resin has a hydroxyl group equivalent of 164 g / eq. Met.

  Next, while purging the flask equipped with a thermometer, a dropping funnel, a condenser, and a stirrer with nitrogen gas purge, 164 g (1 equivalent of hydroxyl group) of the obtained phenol resin, 463 g of epichlorohydrin (5.0 mol), n-butanol 139 g and 2 g of tetraethylbenzylammonium chloride were charged and dissolved. After raising the temperature to 65 ° C., the pressure was reduced to an azeotropic pressure, and 90 g (1.1 mol) of a 49% aqueous sodium hydroxide solution was added dropwise over 5 hours. Thereafter, stirring was continued for 0.5 hours under the same conditions. During this time, the distillate distilled by azeotropic distillation was separated with a Dean-Stark trap, the water layer was removed, and the reaction was carried out while returning the oil layer to the reaction system. Thereafter, unreacted epichlorohydrin was distilled off under reduced pressure. 590 g of methyl isobutyl ketone and 177 g of n-butanol were added to the crude epoxy resin thus obtained and dissolved. Further, 10 g of a 10% aqueous sodium hydroxide solution was added to this solution and reacted at 80 ° C. for 2 hours, and then washing with water 150 g was repeated three times until the pH of the washing solution became neutral. Next, the system was dehydrated by azeotropic distillation, and after microfiltration, the solvent was distilled off under reduced pressure to obtain an epoxy resin (E-1). The resulting epoxy resin has a melt viscosity (measurement method: ICI viscometer method, measurement temperature: 150 ° C.) of 0.8 dPa · s, and an epoxy equivalent of 250 g / eq. Met.

Synthesis Example 2 [Synthesis of Epoxy Resin (E-2)]
While a nitrogen gas purge was applied to a flask equipped with a thermometer, a dropping funnel, a condenser, and a stirrer, 142.8 g (1.43 equivalents of hydroxyl group) of bisphenol F (DIC Corporation, “DIC-BPF”), epichlorohydrin 92. 5 g (1.0 mol) and 40 g of n-butanol were charged and dissolved. Thereafter, 240 g of 20% aqueous sodium hydroxide solution was added dropwise over 3 hours, and the reaction was continued for 2 hours at the same temperature. Then, 250 g of methyl isobutyl ketone was added and the temperature was raised to 80 ° C. Was removed. Thereafter, water washing with 150 g of water was repeated three times until the pH of the washing liquid became neutral. Water was removed by azeotropic distillation, filtration was performed, and methyl isobutyl ketone was further distilled off to obtain an epoxy resin (E-2). The resulting epoxy resin had a melt viscosity (measurement method: ICI viscometer method, measurement temperature: 150 ° C.) of 2.6 dPa · s and an epoxy equivalent of 475 g / eq.

Synthesis Example 4 [Synthesis of Epoxy Resin (E-3)]
In Synthesis Example 2, 3,3 ′, 5,5′-tetramethyl-4,4′-biphenol 151.3 g (hydroxyl group 1.25 equivalent) instead of bisphenol F (“DIC-BPF” manufactured by DIC Corporation) An epoxy resin (E-3) was obtained in the same manner as in Synthesis Example 2 except that 92.5 g (1.0 mol) of epichlorohydrin was used. The resulting epoxy resin had a melt viscosity (measurement method: ICI viscometer method, measurement temperature: 150 ° C.) of 2.0 dPa · s, and an epoxy equivalent of 350 g / eq.

Synthesis Example 5 [Synthesis of Epoxy Resin (E-4)]
A flask equipped with a thermometer, a dropping funnel, a condenser, and a stirrer was purged with nitrogen gas, and 188 g of bisphenol A type liquid epoxy resin (“Epiclon 850-S” epoxy equivalent 188 g / eq, manufactured by DIC Corporation) (epoxy group) 1 equivalent), 19 g (0.083 mol) of bisphenol A and 0.04 g of triphenylphosphine were charged, and the temperature was raised to 140 ° C. over 4 hours. Thereafter, the mixture was reacted at 140 ° C. for 5 hours to obtain an epoxy resin (E-5). The resulting epoxy resin has a melt viscosity (measurement method: ICI viscometer method, measurement temperature: 150 ° C.) of 0.2 dPa · s, and an epoxy equivalent of 250 g / eq. Met.

[Production of epoxy resin mixture]
The epoxy resin obtained in Synthesis Examples 1 to 5 and the bisphenol A type solid epoxy resin (“Epiclon 1055” manufactured by DIC Corporation, epoxy equivalent 475 g / eq., Softening point 69 ° C.) were mixed in the formulation described in Table 1 ( Mixing temperature: 130 ° C.) An epoxy resin used in the examples was prepared.

Examples 1-7 and Comparative Example 1
Various materials shown in Tables 2 to 3 were used, and a target composition was obtained by melt-kneading for 10 minutes at a temperature of 100 ° C. using two rolls. About the obtained epoxy resin composition, gel time was measured by the following method and sclerosis | hardenability was tested. Moreover, after press-molding this for 10 minutes at 180 degreeC and making it harden | cure further at 180 degreeC for 5 hours after that, the test piece for DMA measurement and UL-94V test was created, and the physical property of hardened | cured material was evaluated by the following method. . Adhesion is a copper foil (made by Furukawa Circuit Foil Co., Ltd., 35 μm thick, treated with GTS-MP as the adhesive surface with the resin composition) on one side of the epoxy resin composition during the press molding. A test piece was prepared from what was further cured at 180 ° C. for 5 hours.
Table 4 shows the evaluation results of the obtained cured product.

Gel time: 0.15 g of the epoxy resin composition is placed on a cure plate (made by THERMO ELECTRIC) heated to 175 ° C., and time measurement is started with a stopwatch. Stir the sample evenly with the tip of the rod and stop the stopwatch when the sample breaks into a string and remains on the plate. The time until this sample was cut and remained on the plate was defined as the gel time.
Glass transition temperature: measured using a viscoelasticity measuring device (solid rheometric measuring device “RSAII” manufactured by Rheometric Co., Ltd., double currant lever method; frequency 1 Hz, heating rate 3 ° C./min).
Thermal elastic modulus: Measured using a viscoelasticity measuring device (solid rheometry measuring device “RSAII” manufactured by Rheometric Co., Ltd., double-calendar lever method; frequency 1 Hz, temperature rising rate 3 ° C./min), and the obtained chart The storage modulus was measured.
・ Adhesion:
The peel strength was measured at a speed of 50 mm / min using a test piece having a width of 1.0 mm.
·Flame retardance:
In accordance with the UL-94 test method, a combustion test was performed using five test pieces having a thickness of 1.6 mm.

  In addition, the material used for the Example and the comparative example is as follows.

  In Examples 1 to 3 and 5 to 7 using the epoxy resin composition of the present invention, sufficient flame retardancy is exhibited in the obtained cured product without adding a flame retardant, and adhesion to metal is also achieved. Was very good. On the other hand, Comparative Example 1 did not show sufficient flame retardancy but also had poor adhesion to metal. As is clear from these comparative examples, it was confirmed that the epoxy resin composition used in the comparative examples was not at a level that was sufficiently satisfactory in the performance of the cured product.

  In Example 4 obtained by blending a non-halogen flame retardant, the flame retardancy and adhesion of the cured product were extremely good.

Claims (9)

An epoxy resin composition comprising an epoxy resin (A) and a curing agent (B) as essential components,
As the epoxy resin (A),
Glycidyloxy group-containing aromatic hydrocarbon group (E),
An alkoxy group-containing condensed polycyclic aromatic hydrocarbon group (B), and
Each structural site of a divalent hydrocarbon group (X) selected from a methylene group, an alkylidene group, and an aromatic hydrocarbon structure-containing methylene group, and
The glycidyloxy group-containing aromatic hydrocarbon group (E) and the alkoxy group-containing condensed polycyclic aromatic hydrocarbon group (B) are selected from the methylene group, the alkylidene group, and the aromatic hydrocarbon structure-containing methylene group. An epoxy resin (a1) having in its molecular structure a structure bonded via a divalent hydrocarbon group (X), and
Bifunctional epoxy resin (a2) selected from the group consisting of bisphenol-type epoxy resins and biphenol-type epoxy resins and having an epoxy equivalent weight in the range of 250 g / eq to 700 g / eq
, And
The mass ratio [(a1) / (a2)] of the epoxy resin (a1) and the bifunctional epoxy resin (a2) in the epoxy resin (A) is 95/5 to 60/40. epoxy resin composition, characterized in that there. The epoxy resin (A) is a mixture of the epoxy resin (a1) and the bifunctional epoxy resin (a2), and the mixture is subjected to differential scanning calorimetry (DSC) from −30 ° C. to 100 ° C. per minute 3 2. The epoxy resin composition according to claim 1, wherein the glass transition temperature at the midpoint when measured by raising the temperature at a rate of 5 ° C. is in the range of 5 to 30 ° C. The epoxy resin (A) is a mixture of the epoxy resin (a1) and the bifunctional epoxy resin (a2), and the melt viscosity in an ICI viscometer at 150 ° C. of the mixture is 0.1 to 3.0 dPa -The epoxy resin composition of Claim 1 which is the range of s. The epoxy resin composition according to any one of claims 1 to 3 , wherein the curing agent (B) is a hydroxy aromatic compound having a structure in which a hydroxyl group-containing aromatic structure is linked with bisaralkyl as a nodule group. . Furthermore, the epoxy resin composition of Claim 1 containing a hardening accelerator. Furthermore, the epoxy resin composition of Claim 1 containing an inorganic filler. 2. One or more non-halogen flame retardants (C) selected from the group consisting of phosphorus flame retardants, nitrogen flame retardants, silicone flame retardants, inorganic flame retardants, and organometallic flame retardants. The epoxy resin composition as described. A cured product obtained by curing the epoxy resin composition according to any one of claims 1-7. An epoxy resin composition according to any one of claims 1 to 7, a semiconductor device obtained by encapsulating a semiconductor chip and the lead frame.