JP5108661B2 - レーザ加工装置およびレーザ加工方法 - Google Patents
レーザ加工装置およびレーザ加工方法 Download PDFInfo
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- JP5108661B2 JP5108661B2 JP2008174999A JP2008174999A JP5108661B2 JP 5108661 B2 JP5108661 B2 JP 5108661B2 JP 2008174999 A JP2008174999 A JP 2008174999A JP 2008174999 A JP2008174999 A JP 2008174999A JP 5108661 B2 JP5108661 B2 JP 5108661B2
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- 238000012545 processing Methods 0.000 title claims description 163
- 238000003672 processing method Methods 0.000 title claims description 22
- 238000000034 method Methods 0.000 claims description 26
- 230000003287 optical effect Effects 0.000 claims description 19
- 238000003860 storage Methods 0.000 claims description 19
- 230000001678 irradiating effect Effects 0.000 claims description 7
- 238000003384 imaging method Methods 0.000 claims description 5
- 238000003754 machining Methods 0.000 description 30
- 238000009826 distribution Methods 0.000 description 4
- 238000004422 calculation algorithm Methods 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010330 laser marking Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000004088 simulation Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
- B41J2/44—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using single radiation source per colour, e.g. lighting beams or shutter arrangements
- B41J2/442—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using single radiation source per colour, e.g. lighting beams or shutter arrangements using lasers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
- B41J2/465—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using masks, e.g. light-switching masks
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/06—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
- G02B27/4244—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application in wavelength selecting devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/0005—Adaptation of holography to specific applications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
- G03H1/0808—Methods of numerical synthesis, e.g. coherent ray tracing [CRT], diffraction specific
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/24—Ablative recording, e.g. by burning marks; Spark recording
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
- G02B27/425—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application in illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/0236—Form or shape of the hologram when not registered to the substrate, e.g. trimming the hologram to alphanumerical shape
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/22—Processes or apparatus for obtaining an optical image from holograms
- G03H1/2286—Particular reconstruction light ; Beam properties
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/22—Processes or apparatus for obtaining an optical image from holograms
- G03H1/2294—Addressing the hologram to an active spatial light modulator
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/0005—Adaptation of holography to specific applications
- G03H2001/0094—Adaptation of holography to specific applications for patterning or machining using the holobject as input light distribution
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
- G03H1/0808—Methods of numerical synthesis, e.g. coherent ray tracing [CRT], diffraction specific
- G03H2001/0816—Iterative algorithms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/22—Processes or apparatus for obtaining an optical image from holograms
- G03H1/2202—Reconstruction geometries or arrangements
- G03H1/2205—Reconstruction geometries or arrangements using downstream optical component
- G03H2001/2213—Diffusing screen revealing the real holobject, e.g. container filed with gel to reveal the 3D holobject
- G03H2001/2215—Plane screen
- G03H2001/2218—Plane screen being perpendicular to optical axis
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2210/00—Object characteristics
- G03H2210/50—Nature of the object
- G03H2210/52—Alphanumerical
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2225/00—Active addressable light modulator
- G03H2225/30—Modulation
- G03H2225/32—Phase only
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2240/00—Hologram nature or properties
- G03H2240/50—Parameters or numerical values associated with holography, e.g. peel strength
- G03H2240/51—Intensity, power or luminance
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2240/00—Hologram nature or properties
- G03H2240/50—Parameters or numerical values associated with holography, e.g. peel strength
- G03H2240/53—Diffraction efficiency [DE]
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- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
- Holo Graphy (AREA)
Description
Claims (2)
- 加工対象物に対してレーザ光を照射することにより、2以上の基本加工パターンを含む全体加工パターンで一括して前記加工対象物を加工するレーザ加工装置であって、
レーザ光を出力するレーザ光源と、
前記レーザ光源から出力されたレーザ光を入力し、2次元配列された複数の画素それぞれにおいて前記レーザ光の位相を変調する全体ホログラムを呈示して、その位相変調後のレーザ光を出力する位相変調型の空間光変調器と、
前記空間光変調器から出力されるレーザ光を入力して、そのレーザ光を前記加工対象物において結像させる集光光学系と、
複数の基本加工パターンそれぞれに対応して前記空間光変調器に呈示されるべき複数の基本ホログラムを記憶する記憶部と、
前記記憶部により記憶された複数の基本ホログラムのうちから選択した基本ホログラムに基づいて全体ホログラムを構成して、その構成した全体ホログラムを前記空間光変調器に呈示させる制御部と、
を備え、
前記制御部が、
前記記憶部により記憶された複数の基本ホログラムのうち、前記加工対象物における全体加工パターンに含まれる各基本加工パターンに対応する基本ホログラムを選択し、
その選択した各基本ホログラムについて、前記空間光変調器における基本ホログラムの呈示領域に入力されるレーザ光の強度をIとし、基本ホログラムにおけるレーザ光の回折効率をηとし、基本ホログラムに対応する基本加工パターンにおける集光点数をnとしたときに、「Iη/n」の値の偏差が小さくなるように、前記空間光変調器における各基本ホログラムの呈示領域を決定し、
その決定した前記空間光変調器における各基本ホログラムの呈示領域から前記加工対象物における対応する基本加工パターンの結像領域へ前記集光光学系によりレーザ光が結像されるように、グレーティングを各基本ホログラムに重畳して全体ホログラムを構成し、その構成した全体ホログラムを前記空間光変調器に呈示させる、
ことを特徴とするレーザ加工装置。 - 加工対象物に対してレーザ光を照射することにより、2以上の基本加工パターンを含む全体加工パターンで一括して前記加工対象物を加工するレーザ加工方法であって、
レーザ光を出力するレーザ光源と、
前記レーザ光源から出力されたレーザ光を入力し、2次元配列された複数の画素それぞれにおいて前記レーザ光の位相を変調する全体ホログラムを呈示して、その位相変調後のレーザ光を出力する位相変調型の空間光変調器と、
前記空間光変調器から出力されるレーザ光を入力して、そのレーザ光を前記加工対象物において結像させる集光光学系と、
複数の基本加工パターンそれぞれに対応して前記空間光変調器に呈示されるべき複数の基本ホログラムを記憶する記憶部と、
を備えるレーザ加工装置を用い、
前記記憶部により記憶された複数の基本ホログラムのうち、前記加工対象物における全体加工パターンに含まれる各基本加工パターンに対応する基本ホログラムを選択し、
その選択した各基本ホログラムについて、前記空間光変調器における基本ホログラムの呈示領域に入力されるレーザ光の強度をIとし、基本ホログラムにおけるレーザ光の回折効率をηとし、基本ホログラムに対応する基本加工パターンにおける集光点数をnとしたときに、「Iη/n」の値の偏差が小さくなるように、前記空間光変調器における各基本ホログラムの呈示領域を決定し、
その決定した前記空間光変調器における各基本ホログラムの呈示領域から前記加工対象物における対応する基本加工パターンの結像領域へ前記集光光学系によりレーザ光が結像されるように、グレーティングを各基本ホログラムに重畳して全体ホログラムを構成し、その構成した全体ホログラムを前記空間光変調器に呈示させる、
ことを特徴とするレーザ加工方法。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008174999A JP5108661B2 (ja) | 2008-07-03 | 2008-07-03 | レーザ加工装置およびレーザ加工方法 |
US12/496,249 US8957349B2 (en) | 2008-07-03 | 2009-07-01 | Laser machining device and laser machining method |
CN2009101587074A CN101618637B (zh) | 2008-07-03 | 2009-07-03 | 激光加工装置和激光加工方法 |
Applications Claiming Priority (1)
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---|---|---|---|
JP2008174999A JP5108661B2 (ja) | 2008-07-03 | 2008-07-03 | レーザ加工装置およびレーザ加工方法 |
Publications (2)
Publication Number | Publication Date |
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JP2010012494A JP2010012494A (ja) | 2010-01-21 |
JP5108661B2 true JP5108661B2 (ja) | 2012-12-26 |
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JP2008174999A Active JP5108661B2 (ja) | 2008-07-03 | 2008-07-03 | レーザ加工装置およびレーザ加工方法 |
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US (1) | US8957349B2 (ja) |
JP (1) | JP5108661B2 (ja) |
CN (1) | CN101618637B (ja) |
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JP5479925B2 (ja) * | 2010-01-27 | 2014-04-23 | 浜松ホトニクス株式会社 | レーザ加工システム |
JP5479924B2 (ja) | 2010-01-27 | 2014-04-23 | 浜松ホトニクス株式会社 | レーザ加工方法 |
JP2013043430A (ja) * | 2011-08-26 | 2013-03-04 | Seiko Instruments Inc | サーマルヘッド、プリンタおよびマーキング方法 |
WO2013094011A1 (ja) * | 2011-12-20 | 2013-06-27 | Necディスプレイソリューションズ株式会社 | 画像投射装置およびその制御方法 |
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WO2013156664A1 (en) * | 2012-04-20 | 2013-10-24 | Upm-Kymmene Corporation | A method and an apparatus for producing markings on a moving web |
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JP6043228B2 (ja) * | 2013-04-05 | 2016-12-14 | 浜松ホトニクス株式会社 | 光学モジュールおよび光照射装置 |
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JP6768444B2 (ja) | 2016-10-14 | 2020-10-14 | 浜松ホトニクス株式会社 | レーザ加工装置、及び、動作確認方法 |
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