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JP5155033B2 - Thermally conductive silicone composition - Google Patents

Thermally conductive silicone composition Download PDF

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JP5155033B2
JP5155033B2 JP2008166827A JP2008166827A JP5155033B2 JP 5155033 B2 JP5155033 B2 JP 5155033B2 JP 2008166827 A JP2008166827 A JP 2008166827A JP 2008166827 A JP2008166827 A JP 2008166827A JP 5155033 B2 JP5155033 B2 JP 5155033B2
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JP2010006923A (en
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長 田村
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/12Polysiloxanes containing silicon bound to hydrogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/20Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
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    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73253Bump and layer connectors

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Description

本発明は、熱伝導性シリコーン組成物に係り、さらに詳しくは、接着性に優れ良好な熱伝導性を有する硬化物を得ることができる熱伝導性シリコーン組成物に関する。   The present invention relates to a thermally conductive silicone composition, and more particularly, to a thermally conductive silicone composition capable of obtaining a cured product having excellent adhesiveness and excellent thermal conductivity.

従来から電子部品の多くには、使用時の温度上昇による損傷や性能低下を防止するため、ヒートシンクやヒートスプレッダ等の放熱部材が用いられている。電子部品から発生する熱を放熱部材に効率よく伝導させるため、一般に、電子部品と放熱部材との間には熱伝導性材料が介在されている。   Conventionally, in many electronic components, a heat radiating member such as a heat sink or a heat spreader has been used in order to prevent damage or performance degradation due to temperature rise during use. In order to efficiently conduct heat generated from the electronic component to the heat radiating member, generally, a heat conductive material is interposed between the electronic component and the heat radiating member.

熱伝導性材料としては、放熱シートや放熱グリースが知られている(例えば特許文献1参照)。一般に、放熱シートは手軽にマウントできるメリットはあるが、発熱性電子部品であるCPUや放熱フィン等の表面にはミクロ的に多数の凹凸があるため、それらの被着面へ確実に密着することが難しい。そのため、放熱部材と放熱シートとの間等に空気層が介在し、その結果放熱効果を十分に発揮できないという不都合がある。   As the heat conductive material, a heat radiating sheet and a heat radiating grease are known (see, for example, Patent Document 1). In general, the heat dissipation sheet has the merit that it can be mounted easily, but the surface of the heat-generating electronic parts such as CPU and heat dissipation fins has many microscopic irregularities, so that it adheres securely to the adherend. Is difficult. For this reason, there is an inconvenience that an air layer is interposed between the heat radiating member and the heat radiating sheet, and as a result, the heat radiating effect cannot be sufficiently exhibited.

これに対して、放熱グリースはその性状が液体に近く、放熱シートに比べて発熱性電子部品や放熱部材表面の凹凸に影響されることなく、両者に密着して界面熱抵抗を小さくすることができるという利点があるが、長時間使用するとオイルブリードが生じやすい等の問題があった。   On the other hand, heat radiation grease is close to liquid and is less affected by unevenness on the surface of heat-generating electronic components and heat-dissipating members compared to heat-dissipating sheets, and can reduce the interfacial thermal resistance. Although there is an advantage that it can be used, there is a problem that oil bleeding is likely to occur when used for a long time.

そのような理由から、液状シリコーンゴム組成物をベース成分とし、接着性付与剤等を配合した加熱硬化型の熱伝導性シリコーン組成物が提案されている。   For such a reason, a heat-curable heat conductive silicone composition in which a liquid silicone rubber composition is used as a base component and an adhesiveness imparting agent is blended has been proposed.

しかしながら、従来の熱伝導性シリコーン組成物においては、熱伝導性を付与する充填剤の配合量が少ないため、熱伝導性が十分ではなかった。そして、熱伝導性を向上させるために充填剤の配合量を増すと、硬化前の組成物の粘度が高くなるため、作業性(塗布作業性)が悪くなるばかりでなく、電子部品に使用される金属基材(アルミニウムやニッケル)に対する濡れ性も悪くなるという問題があった。また、前記金属基材に対する接着性が不十分であるため、接着不良が発生しやすかった。さらに、近年の電子部品の高集積化、高速化に伴う発熱量のさらなる増大により、より熱伝導性に優れたシリコーン組成物が求められているが、従来の組成物ではこのような要求に十分に応えられなかった。
特開2004−161797公報
However, in the conventional heat conductive silicone composition, since there are few compounding quantities of the filler which provides heat conductivity, heat conductivity was not enough. And if the blending amount of the filler is increased in order to improve the thermal conductivity, the viscosity of the composition before curing increases, so not only the workability (coating workability) is deteriorated but also used for electronic parts. There is a problem that the wettability with respect to the metal base material (aluminum or nickel) is also deteriorated. Moreover, since the adhesiveness with respect to the said metal base material is inadequate, the adhesion defect was easy to generate | occur | produce. Furthermore, due to the further increase in the amount of heat generated in recent years due to higher integration and higher speed of electronic components, there is a need for silicone compositions with better thermal conductivity, but conventional compositions are sufficient for such demands. I couldn't respond.
JP 2004-161797 A

本発明はこのような問題を解決するためになされたもので、低粘度で作業性(塗布作業性)が良好であり、接着性に優れ高い熱伝導性を有する硬化物を形成するシリコーン組成物を提供することを目的とする。   The present invention was made to solve such problems, and has a low viscosity, good workability (coating workability), a silicone composition that forms a cured product having excellent adhesiveness and high thermal conductivity. The purpose is to provide.

本発明者らは、上記目的を達成するために鋭意検討した結果、(A)トリメトキシシリル基とアルケニル基を有する低粘度のシロキサンオリゴマーと、(B)異なる平均粒径を有する充填剤の3種をそれぞれの配合比を規定して併用した熱伝導性充填剤と、(E)接着性付与剤とを配合し、(D)架橋剤を特定量配合することによって、(B)熱伝導性充填剤を高充填しても低粘度で作業性に優れ、さらに接着性に優れた硬化物が得られることを見出し、本発明を完成するに至った。   As a result of intensive studies to achieve the above object, the present inventors have found that (A) a low-viscosity siloxane oligomer having a trimethoxysilyl group and an alkenyl group, and (B) a filler having a different average particle diameter. (B) Thermal conductivity by blending a heat conductive filler that uses seeds in combination with each blending ratio, and (E) an adhesion-imparting agent, and (D) a specific amount of a crosslinking agent. The present inventors have found that a cured product having a low viscosity, excellent workability, and excellent adhesiveness can be obtained even when the filler is highly charged, and the present invention has been completed.

すなわち、本発明の熱伝導性シリコーン組成物は、(A)23℃における粘度が10〜100mPa・sであり、下記一般式で表されるアルケニル基含有シロキサンオリゴマー100重量部と、

Figure 0005155033
(式中、Zはアルケニル基、mは0〜20の整数、nは10〜40の整数であり、m+nは10〜40である。)

(B)(B1)最大粒径が60μm以下であって、粒径10〜30μmの粒子を全体の90重量%以上含み、平均粒径が10μm以上、50μm未満のアルミニウム粉末または酸化アルミニウム、(B2)最大粒径が10μm以下であって、粒径2〜7μmの粒子を全体の90重量%以上含み、平均粒径が1μm以上、10μm未満のアルミニウム粉末または酸化アルミニウムおよび(B3)最大粒径が3μm以下であって、粒径0.2〜0.8μmの粒子を全体の60重量%以上含み、平均粒径が0.1μm以上、1μm未満の酸化アルミニウムをそれぞれ含む熱伝導性充填剤1000〜3000重量部(但し、(B1)は(B)成分全体の50〜70vol%となる量、(B2)は(B)成分全体の10〜30vol%となる量、(B3)は(B)成分全体の10〜30vol%となる量である。)と、(C)白金系触媒の触媒量と、(D)1分子中にケイ素原子に結合した水素原子を3個以上有するポリオルガノハイドロジェンシロキサンを、(A)成分のアルケニル基1個に対してケイ素原子に結合した水素原子が0.5〜2.0個となる量、および(E)接着性付与剤1.0〜10重量部を含有することを特徴としている。 That is, the thermally conductive silicone composition of the present invention has (A) a viscosity of 10 to 100 mPa · s at 23 ° C., and 100 parts by weight of an alkenyl group-containing siloxane oligomer represented by the following general formula:
Figure 0005155033
(In the formula, Z is an alkenyl group, m is an integer of 0 to 20, n is an integer of 10 to 40, and m + n is 10 to 40.)

(B) (B1) An aluminum powder or aluminum oxide having a maximum particle size of 60 μm or less and containing 90% by weight or more of particles having a particle size of 10 to 30 μm and an average particle size of 10 μm or more and less than 50 μm, (B2 ) a the maximum particle size of 10 [mu] m or less, contains particles having a particle diameter 2~7μm total 90 wt% or more, an average particle diameter of 1μm or more, aluminum powder or aluminum oxide and (B3 less than 10 [mu] m) is the maximum particle size Thermally conductive filler 1000 that includes 3 μm or less of particles having a particle size of 0.2 to 0.8 μm and 60% by weight or more of the whole, and an aluminum oxide having an average particle size of 0.1 μm or more and less than 1 μm. 3000 parts by weight (provided that (B1) is an amount that is 50 to 70 vol% of the entire component (B), (B2) is an amount that is 10 to 30 vol% of the entire component (B), and (B3) is the component (B) Overall 10 (C) a catalyst amount of a platinum-based catalyst, and (D) a polyorganohydrogensiloxane having three or more hydrogen atoms bonded to silicon atoms in one molecule (A ) An amount of 0.5 to 2.0 hydrogen atoms bonded to a silicon atom with respect to one alkenyl group of the component, and (E) 1.0 to 10 parts by weight of an adhesion promoter. It is a feature.

上記構成の本発明のシリコーン組成物は、低粘度で作業性(塗布作業性)が良好であり、かつ接着性に優れ良好な熱伝導性を有する硬化物を形成する。   The silicone composition of the present invention having the above structure forms a cured product having low viscosity, good workability (coating workability), excellent adhesion, and good thermal conductivity.

以下、本発明の熱伝導性シリコーン組成物について詳細に説明する。   Hereinafter, the thermally conductive silicone composition of the present invention will be described in detail.

[(A)成分]
(A)成分のアルケニル基含有シロキサンオリゴマーは、アルケニル基を末端の一部に有しており、さらにトリメトキシシリル基を有する。(A)成分は、後述する(B)成分である熱伝導性充填剤の表面処理剤(ウェッター)としての働きをし、熱伝導性充填剤を多量に配合しても、組成物に良好な流動性と作業性を付与する。また(A)成分は、(C)成分である白金系触媒の存在下で(D)成分であるSi−H基を有する架橋剤(ポリオルガノハイドロジェンシロキサン)と付加反応を行う。
[(A) component]
The alkenyl group-containing siloxane oligomer of component (A) has an alkenyl group at a part of the terminal and further has a trimethoxysilyl group. The component (A) serves as a surface treatment agent (wetter) for the thermally conductive filler that is the component (B) described later, and is good for the composition even if a large amount of the thermally conductive filler is blended. Gives fluidity and workability. Moreover, (A) component performs addition reaction with the crosslinking agent (polyorganohydrogensiloxane) which has Si-H group which is (D) component in presence of the platinum-type catalyst which is (C) component.

(A)成分は、下記一般式:

Figure 0005155033
で表される。 The component (A) has the following general formula:
Figure 0005155033
It is represented by

式中、Zはアルケニル基であり、例えばビニル基、アリル基、ブテニル基、ペテニル基、ヘキセニル基などの炭素原子数2〜6のアルケニル基が挙げられる。好ましくはビニル基である。mは0〜20の整数であり、好ましくは0〜5の整数である。nは10〜40の整数であり、好ましくは20〜30の整数である。m+nは10〜40であり、好ましくは20〜30である。m+nの値が10未満であると、(A)成分の分子量が低いため、架橋後の未反応物がブリードアウトしやすい。一方、m+nの値が40を超えると、組成物の粘度上昇を抑制できず、良好な作業性が得られない。   In formula, Z is an alkenyl group, for example, C2-C6 alkenyl groups, such as a vinyl group, an allyl group, a butenyl group, a petenyl group, a hexenyl group, are mentioned. A vinyl group is preferred. m is an integer of 0-20, preferably an integer of 0-5. n is an integer of 10 to 40, preferably an integer of 20 to 30. m + n is 10 to 40, preferably 20 to 30. When the value of m + n is less than 10, since the molecular weight of the component (A) is low, the unreacted product after crosslinking is likely to bleed out. On the other hand, if the value of m + n exceeds 40, an increase in the viscosity of the composition cannot be suppressed, and good workability cannot be obtained.

(A)成分の23℃における粘度は、10〜100mPa・sであり、好ましくは30〜80mPa・sである。粘度が10mPa・s未満であると、分子量が低いため架橋後の未反応物がブリードアウトしやすくなる。一方、粘度が100mPa・sを超えると、組成物の製造プロセスにおいて、(B)成分の熱伝導性充填剤と(A)成分を混練した際に(B)成分を分散させることは可能であるがパテ状になりやすく、他成分の配合が困難になる。   (A) The viscosity in 23 degreeC of a component is 10-100 mPa * s, Preferably it is 30-80 mPa * s. When the viscosity is less than 10 mPa · s, since the molecular weight is low, unreacted materials after crosslinking are likely to bleed out. On the other hand, when the viscosity exceeds 100 mPa · s, it is possible to disperse the component (B) when the thermally conductive filler of the component (B) and the component (A) are kneaded in the production process of the composition. Tends to be putty-like, making it difficult to blend other ingredients.

[(B)成分]
(B)成分の熱伝導性充填剤は、組成物に熱伝導性を付与する成分であり、特定の平均粒径を有する3種類のアルミニウム粉末または酸化アルミニウム粉末を併用する。すなわち、(B)成分としては、(B1)平均粒径が10μm以上、50μm未満のアルミニウム粉末または酸化アルミニウム粉末、(B2)平均粒径が1μm以上、10μm未満のアルミニウム粉末または酸化アルミニウム粉末、(B3)平均粒径が0.1μm以上、1μm未満の酸化アルミニウム粉末をそれぞれ使用する。本組成物に電気絶縁性が要求される場合には、(B1)成分、(B2)成分および(B3)成分は全て酸化アルミニウム粉末であることが好ましい。
[Component (B)]
(B) The heat conductive filler of a component is a component which provides heat conductivity to a composition, and uses together 3 types of aluminum powder or aluminum oxide powder which has a specific average particle diameter. That is, as the component (B), (B1) an aluminum powder or aluminum oxide powder having an average particle diameter of 10 μm or more and less than 50 μm, (B2) an aluminum powder or aluminum oxide powder having an average particle diameter of 1 μm or more and less than 10 μm, ( B3) An aluminum oxide powder having an average particle size of 0.1 μm or more and less than 1 μm is used. When electrical insulation is required for the present composition, it is preferable that the components (B1), (B2) and (B3) are all aluminum oxide powder.

(B1)成分の平均粒径は10μm以上、50μm未満であり、好ましくは10〜30μmである。平均粒径が50μmを超えると、組成物の安定性が悪化し、オイル分離が起こりやすい。(B1)の最大粒径は60μm以下であって、粒径10〜30μmの粒子を(B1)成分全体の90重量%以上含むことが好ましい。平均粒径が上記範囲であれば、粒径もしくは粒度分布の異なるものを混合して用いてもよい。平均粒径および最大粒径は、レーザ回折法により測定した値である。(B1)の形状は限定されず、例えば球状、不定形状のいずれでもよい。   (B1) The average particle diameter of a component is 10 micrometers or more and less than 50 micrometers, Preferably it is 10-30 micrometers. When the average particle size exceeds 50 μm, the stability of the composition is deteriorated and oil separation tends to occur. The maximum particle size of (B1) is 60 μm or less, and it is preferable that particles having a particle size of 10 to 30 μm are contained in 90% by weight or more of the total component (B1). As long as the average particle size is in the above range, those having different particle sizes or particle size distributions may be mixed and used. The average particle size and the maximum particle size are values measured by a laser diffraction method. The shape of (B1) is not limited, and may be, for example, either a spherical shape or an indefinite shape.

(B2)成分の平均粒径は1μm以上、10μm未満であり、好ましくは2〜7μmである。(B2)の最大粒径は10μm以下であって、粒径2〜7μmの粒子を(B2)成分全体の90重量%以上含むことが好ましい。平均粒径が上記範囲であれば、粒径もしくは粒度分布の異なるものを混合して用いてもよい。(B2)の形状は限定されず、例えば球状、不定形状のいずれでもよい。   (B2) The average particle diameter of a component is 1 micrometer or more and less than 10 micrometers, Preferably it is 2-7 micrometers. The maximum particle size of (B2) is 10 μm or less, and it is preferable that particles having a particle size of 2 to 7 μm are contained in 90% by weight or more of the total component (B2). As long as the average particle size is in the above range, those having different particle sizes or particle size distributions may be mixed and used. The shape of (B2) is not limited, and may be, for example, either a spherical shape or an indefinite shape.

(B3)成分の平均粒径は0.1μm以上、1μm未満であり、好ましくは0.2〜0.8μmである。平均粒径が0.1μm未満であると、所望の低粘度の組成物を得ることが難しい。(B3)の最大粒径は3μm以下であって、粒径0.2〜0.8μmの粒子を(B3)成分全体の60重量%以上含むことが好ましい。平均粒径が上記範囲であれば、粒径もしくは粒度分布の異なるものを混合して用いてもよい。(B3)の形状は限定されず、例えば球状、不定形状のいずれでもよい。   (B3) The average particle diameter of a component is 0.1 micrometer or more and less than 1 micrometer, Preferably it is 0.2-0.8 micrometer. If the average particle size is less than 0.1 μm, it is difficult to obtain a desired low-viscosity composition. The maximum particle size of (B3) is 3 μm or less, and it is preferable that particles having a particle size of 0.2 to 0.8 μm are contained in an amount of 60% by weight or more of the total component (B3). As long as the average particle size is in the above range, those having different particle sizes or particle size distributions may be mixed and used. The shape of (B3) is not limited, and may be either spherical or indefinite.

(B)成分の配合量は、(A)成分100重量部に対して1000〜3000重量部、好ましくは1500〜2500重量部とする。配合量が1000重量部未満であると、所望の熱伝導率が得られない。一方、3000重量部を越えると、組成物の流動性が低下して作業性の悪化を招く。   (B) The compounding quantity of a component shall be 1000-3000 weight part with respect to 100 weight part of (A) component, Preferably it is 1500-2500 weight part. If the blending amount is less than 1000 parts by weight, the desired thermal conductivity cannot be obtained. On the other hand, when it exceeds 3000 parts by weight, the fluidity of the composition is lowered and the workability is deteriorated.

(B)成分を構成する(B1)〜(B3)の各成分の配合割合は、(B1)成分が(B)成分全体に対して50〜70vol%(容量%)となる量、好ましくは55〜65vol%となる量である。なお、アルミニウムの比重は2.70であり、酸化アルミニウム(アルミナ)の比重は3.97である。(B1)成分の配合割合が前記範囲を外れた場合には、(B)成分と(A)成分を混練した際に(B)成分が分散せずに粉状になりやすく、他成分の配合が不可能になる。   The blending ratio of the components (B1) to (B3) constituting the component (B) is such that the component (B1) is 50 to 70 vol% (volume%) with respect to the entire component (B), preferably 55. It is the quantity which becomes -65 vol%. The specific gravity of aluminum is 2.70, and the specific gravity of aluminum oxide (alumina) is 3.97. When the blending ratio of the component (B1) is out of the above range, when the component (B) and the component (A) are kneaded, the component (B) is not easily dispersed and becomes powdery. Becomes impossible.

また、(B2)成分の配合割合は、(B)成分全体に対して10〜30vol%となる量、好ましくは15〜25vol%となる量である。(B2)成分の配合割合が前記範囲を外れた場合には、組成物の粘度が上昇し、良好な作業性が得られない。   Further, the blending ratio of the component (B2) is an amount that becomes 10 to 30 vol%, preferably 15 to 25 vol%, with respect to the entire component (B). When the blending ratio of the component (B2) is out of the above range, the viscosity of the composition increases and good workability cannot be obtained.

(B3)成分の配合割合は、(B)成分全体に対して10〜30vol%となる量、好ましくは15〜25vol%となる量である。(B3)成分の配合割合が(B)成分全体の30vol%を超えると、(B)成分と(A)成分を混練した際に(B)成分が分散せずに粉状になりやすく、他成分の配合が不可能になる。一方、(B)成分全体の10vol%未満であると、組成物の粘度が上昇し、良好な作業性が得られない。   The blending ratio of the component (B3) is an amount that becomes 10 to 30 vol%, preferably 15 to 25 vol%, with respect to the entire component (B). When the blending ratio of the component (B3) exceeds 30 vol% of the total component (B), when the component (B) and the component (A) are kneaded, the component (B) is easily dispersed without being dispersed. It becomes impossible to mix the ingredients. On the other hand, if it is less than 10 vol% of the total component (B), the viscosity of the composition increases, and good workability cannot be obtained.

[(C)成分]
(C)成分としては、ヒドロシリル化反応に用いる触媒として周知の白金系触媒を使用することができる。白金系触媒としては、例えば白金黒、塩化第二白金、塩化白金酸、塩化白金酸と一価アルコールとの反応物、塩化白金酸とオレフィン類やビニルシロキサンとの錯体、白金ビスアセトアセテートなどが挙げられる。
[Component (C)]
As the component (C), a known platinum-based catalyst can be used as a catalyst used in the hydrosilylation reaction. Examples of the platinum-based catalyst include platinum black, platinous chloride, chloroplatinic acid, a reaction product of chloroplatinic acid and a monohydric alcohol, a complex of chloroplatinic acid with olefins and vinyl siloxane, platinum bisacetoacetate, and the like. Can be mentioned.

(C)成分の配合量は、組成物の硬化に必要な量であればよく、所望の硬化速度等に応じて適宜調整することができる。通常、組成物の合計量に対して、白金元素に換算して0.01〜100ppmの範囲とすることが好ましい。配合量が0.01ppm未満であると、組成物が十分に硬化しにくくなり、一方100ppmを超える量を配合しても組成物の硬化速度が顕著に向上しにくい。   The blending amount of the component (C) may be an amount necessary for curing the composition, and can be appropriately adjusted according to a desired curing rate. Usually, it is preferable to set it as 0.01-100 ppm in conversion of a platinum element with respect to the total amount of a composition. If the blending amount is less than 0.01 ppm, the composition will not be sufficiently cured, and even if an amount exceeding 100 ppm is blended, the curing rate of the composition will not be significantly improved.

[(D)成分]
(D)成分のポリオルガノハイドロジェンシロキサンは架橋剤であり、1分子中にケイ素原子に結合した水素原子を3個以上有する。この水素原子は、分子鎖末端のケイ素原子に結合していても、分子鎖中間のケイ素原子に結合していても、両者に結合していてもよい。
[(D) component]
The polyorganohydrogensiloxane of component (D) is a crosslinking agent and has 3 or more hydrogen atoms bonded to silicon atoms in one molecule. This hydrogen atom may be bonded to the silicon atom at the end of the molecular chain, may be bonded to the silicon atom in the middle of the molecular chain, or may be bonded to both.

(D)成分としては、一般式:
SiO[4−(p+q)]/2
で示されるものが用いられる。
As the component (D), the general formula:
R 2 p H q SiO [4- (p + q)] / 2
What is shown by is used.

式中、Rは、脂肪族不飽和結合を除く同一または異なる置換または非置換の1価の炭化水素基である。Rとしては、例えばメチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert−ブチル基、ヘキシル基、シクロヘキシル基、オクチル基のようなアルキル基;フェニル基、トリル基のようなアリール基;ベンジル基、フェニルエチル基のようなアラルキル基;およびこれらの基の水素原子の一部または全部がフッ素、塩素、臭素などのハロゲン原子やシアノ基で置換されているもの、例えばクロロメチル基、ブロモエチル基、トリフルオロプロピル基、シアノエチル基などが挙げられる。合成のし易さ、コストの点から、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基等の炭素原子数1〜4のアルキル基が好ましく、メチル基がより好ましい。 In the formula, R 2 is the same or different substituted or unsubstituted monovalent hydrocarbon group excluding an aliphatic unsaturated bond. Examples of R 2 include an alkyl group such as a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tert-butyl group, a hexyl group, a cyclohexyl group, and an octyl group; Aryl groups; aralkyl groups such as benzyl and phenylethyl groups; and those in which some or all of the hydrogen atoms are substituted with halogen atoms such as fluorine, chlorine, bromine or cyano groups, such as chloro A methyl group, a bromoethyl group, a trifluoropropyl group, a cyanoethyl group and the like can be mentioned. From the viewpoint of ease of synthesis and cost, an alkyl group having 1 to 4 carbon atoms such as methyl group, ethyl group, propyl group, isopropyl group, butyl group and isobutyl group is preferable, and a methyl group is more preferable.

p、qは、それぞれ、0.5≦p≦2、0<q≦2、0.5<p+q≦3を満足する正数であり、好ましくは0.6≦p≦1.9、0.01≦q≦1.0、0.6≦p+q≦2.8を満足する正数である。   p and q are positive numbers satisfying 0.5 ≦ p ≦ 2, 0 <q ≦ 2, and 0.5 <p + q ≦ 3, respectively, preferably 0.6 ≦ p ≦ 1.9, 0.8. It is a positive number satisfying 01 ≦ q ≦ 1.0 and 0.6 ≦ p + q ≦ 2.8.

(D)成分の分子構造としては、直鎖状、分岐鎖状、環状あるいは三次元網目状のいずれであってもよく、1種を単独でまたは2種以上を組み合わせて使用することができる。   The molecular structure of component (D) may be any of linear, branched, cyclic, or three-dimensional network, and can be used alone or in combination of two or more.

(D)成分の23℃における粘度は、0.001〜1Pa・sであり、好ましくは0.01〜0.5Pa・sである。   (D) The viscosity in 23 degreeC of a component is 0.001-1 Pa.s, Preferably it is 0.01-0.5 Pa.s.

(D)成分の配合量は、(A)成分のアルケニル基1個に対して、(D)成分のケイ素原子に結合した水素原子が0.5〜2.0個となる量であり、好ましくは0.7〜1.5個となる量である。ケイ素原子に結合した水素原子が0.5個未満では、硬化物の十分な架橋が得られず、所望の硬化性を得ることが難しい。一方、2.0個を超えても硬化性および硬化物の硬さに大きな差異は生じず、かえって(B)成分である熱伝導性充填剤の配合割合が減少され、その結果熱伝導率が低減されることになる。   Component (D) is blended in such an amount that 0.5 to 2.0 hydrogen atoms bonded to silicon atoms in component (D) are present per alkenyl group in component (A), preferably Is an amount of 0.7 to 1.5. If the number of hydrogen atoms bonded to the silicon atom is less than 0.5, sufficient crosslinking of the cured product cannot be obtained, and it is difficult to obtain a desired curability. On the other hand, even if the number exceeds 2.0, there is no significant difference in curability and hardness of the cured product, but the blending ratio of the thermally conductive filler as the component (B) is reduced, and as a result, the thermal conductivity is reduced. Will be reduced.

[(E)成分]
(E)成分は接着性付与剤であり、以下に示す(a)、(b)および(c)成分からなる群から選ばれる1種以上の有機ケイ素化合物を使用することができる。
[(E) component]
The component (E) is an adhesiveness imparting agent, and one or more organic silicon compounds selected from the group consisting of the components (a), (b) and (c) shown below can be used.

(a)成分の有機ケイ素化合物は、シラン誘導体またはポリシロキサン誘導体であり、合成の容易さから、ケイ素原子に結合した水素原子すなわちSi−H結合を分子中に少なくとも1個と、一般式(I)

Figure 0005155033
で示され、別個のシロキサン単位に含まれる基を分子中に少なくとも1個有するポリシロキサン骨格を持つものであることが好ましい。ここで、Qは、合成の容易さと耐加水分解性の点から、炭素原子数2個以上の直鎖状または分岐状のアルキレン基が好ましく、特にメチレン基あるいはイソプロピレン基が好ましい。またQは、耐加水分解性の点から、炭素原子数3個以上の直鎖状または分岐状のアルキレン基が好ましく、特にプロピレン基が好ましい。さらに、一般式(I)におけるRは、炭素数1〜4のアルキル基を表す。メチル基、エチル基、プロピル基、イソプロピル基およびブチル基を例示することができるが、組成物が良好な接着性を示すことから、メチル基およびエチル基が好ましい。このような側鎖を含むシロキサン単位は、分子中のSi−H結合にアクリル酸またはメタクリル酸のトリアルコキシシリルプロピルエステルを付加させるなどの方法で合成することができる。このような有機ケイ素化合物のシロキサン骨格は、環状でも鎖状でもよく、またそれらの混合物でもよいが、合成の容易さから環状ポリシロキサン骨格を有するものが最も好ましい。環状の場合は、合成の容易さから、シロキサン環を形成するケイ素原子の数は3〜6個、好ましくは4個のものが用いられる。鎖状の場合は、分子量が大きいと粘度が高くなって合成や取り扱いに不便になるので、シロキサン鎖を形成するケイ素原子は、2〜20個、好ましくは4〜10個のものが用いられる。 The organosilicon compound as component (a) is a silane derivative or a polysiloxane derivative, and from the viewpoint of ease of synthesis, at least one hydrogen atom bonded to a silicon atom, that is, a Si—H bond, is represented by the general formula (I )
Figure 0005155033
And a polysiloxane skeleton having at least one group contained in a separate siloxane unit in the molecule. Here, Q 1 is preferably a linear or branched alkylene group having 2 or more carbon atoms, particularly a methylene group or an isopropylene group, from the viewpoint of ease of synthesis and hydrolysis resistance. Q 2 is preferably a linear or branched alkylene group having 3 or more carbon atoms from the viewpoint of hydrolysis resistance, and particularly preferably a propylene group. Further, R 1 in the general formula (I) represents an alkyl group having 1 to 4 carbon atoms. A methyl group, an ethyl group, a propyl group, an isopropyl group, and a butyl group can be exemplified, but a methyl group and an ethyl group are preferable because the composition exhibits good adhesiveness. Such a siloxane unit containing a side chain can be synthesized by a method such as adding a trialkoxysilylpropyl ester of acrylic acid or methacrylic acid to a Si—H bond in the molecule. Such a siloxane skeleton of the organosilicon compound may be cyclic or chain-like, or a mixture thereof, but those having a cyclic polysiloxane skeleton are most preferable from the viewpoint of ease of synthesis. In the case of a ring, the number of silicon atoms forming the siloxane ring is 3 to 6, preferably 4, for ease of synthesis. In the case of a chain, a large molecular weight increases the viscosity, which is inconvenient for synthesis and handling. Therefore, 2 to 20 silicon atoms, preferably 4 to 10 silicon atoms are used to form a siloxane chain.

(b)成分の有機ケイ素化合物は、アルコキシ基を分子中に少なくとも2個含有し、かつエポキシ基を含有するシランまたはシロキサンである。基材との接着性を向上させる観点から、ケイ素原子に結合するアルコキシ基の数は3個以上であることがより好ましい。(b)成分の有機ケイ素化合物としては、γ−グリシドキシプロピルトリメトキシシラン、γ−グリシドキシプロピルメチルジメトキシシラン、γ−グリシドキシプロピルトリエトキシシラン、γ−グリシドシキプロピルメチルジエトキシシランなどのシラン、式:

Figure 0005155033
で表されるシロキサンなどが例示される。 The organosilicon compound as component (b) is a silane or siloxane containing at least two alkoxy groups in the molecule and containing an epoxy group. From the viewpoint of improving the adhesion to the substrate, the number of alkoxy groups bonded to the silicon atom is more preferably 3 or more. As the organosilicon compound of component (b), γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropylmethyldimethoxysilane, γ-glycidoxypropyltriethoxysilane, γ-glycidoxypropylmethyldiethoxy Silanes such as silane, formula:
Figure 0005155033
The siloxane etc. which are represented by these are illustrated.

(c)成分の有機ケイ素化合物は、不飽和二重結合を有する炭化水素基を有するアルコキシシランまたはシロキサンである。基材との接着性を向上させる観点から、ケイ素原子に結合するアルコキシ基の数は3個以上であることがより好ましい。不飽和二重結合を有する炭化水素基としては、ビニル基、アリル基などのアルケニル基;アクリロイル基、メタクリロイル基、アクリロキシプロピル基、メタクリロキシプロピル基などの基が例示される。(c)成分の有機ケイ素化合物としては、ビニルトリメトキシシラン、ビニルトリエトキシシラン、γ−メタクリロキシプロピルトリメトキシシラン、γ−メタクリロキシプロピルメチルジメトキシシラン、さらに式:

Figure 0005155033
で表されるシランおよびその加水分解縮合物が例示される。 The organosilicon compound as component (c) is an alkoxysilane or siloxane having a hydrocarbon group having an unsaturated double bond. From the viewpoint of improving the adhesion to the substrate, the number of alkoxy groups bonded to the silicon atom is more preferably 3 or more. Examples of the hydrocarbon group having an unsaturated double bond include alkenyl groups such as vinyl group and allyl group; groups such as acryloyl group, methacryloyl group, acryloxypropyl group, and methacryloxypropyl group. As the organosilicon compound of component (c), vinyltrimethoxysilane, vinyltriethoxysilane, γ-methacryloxypropyltrimethoxysilane, γ-methacryloxypropylmethyldimethoxysilane, and the formula:
Figure 0005155033
And the hydrolysis-condensation product thereof are exemplified.

これら(a)、(b)および(c)成分の有機ケイ素化合物は、いずれも付加反応型組成物の接着性付与剤として有用であり、単独で用いることもできるが、基材との接着性をより向上させるためには2種以上を併用してもよい。(a)、(b)および(c)成分から成る(E)成分の配合量は、前記(A)成分100重量部に対して1〜10重量部とする。1重量部未満の場合は十分な接着力が得られず、10重量部を超える場合は硬化物の機械的特性が低下し好ましくない。   These organosilicon compounds of components (a), (b) and (c) are all useful as an adhesion-imparting agent for addition-reaction type compositions, and can be used alone, but have an adhesive property to a substrate. Two or more kinds may be used in combination in order to further improve. The blending amount of the component (E) composed of the components (a), (b) and (c) is 1 to 10 parts by weight with respect to 100 parts by weight of the component (A). When the amount is less than 1 part by weight, sufficient adhesive strength cannot be obtained, and when it exceeds 10 parts by weight, the mechanical properties of the cured product are deteriorated, which is not preferable.

[その他任意成分]
本発明の熱伝導性シリコーン組成物は、上記(A)〜(E)の各成分を基本成分とし、これに必要に応じて本発明の目的を損なわない範囲で、補強性シリカ、難燃性付与剤、耐熱性向上剤、可塑剤、着色剤等を添加してもよい。また、トリアリルイソシアヌレートのような反応調節剤を添加することもできる。
[Other optional ingredients]
The heat-conductive silicone composition of the present invention comprises the above components (A) to (E) as basic components, and in the range that does not impair the object of the present invention, if necessary, the reinforcing silica and flame retardancy An imparting agent, a heat resistance improver, a plasticizer, a colorant, and the like may be added. In addition, a reaction regulator such as triallyl isocyanurate can be added.

[熱伝導性シリコーン組成物の製造方法]
本発明の熱伝導性シリコーン組成物を製造する場合において、各成分の添加順序は特に限定されるものではないが、例えば(A)成分であるアルケニル基含有シロキサンオリゴマーと(B)成分である熱伝導性充填剤を後述する混練機で混練した後、(C)白金系触媒と架橋剤である(D)ポリオルガノハイドロジェンシロキサン、および必要に応じてその他の任意成分を添加して混練することが好ましい。混練機としては、加熱手段および冷却手段を備えたプラネタリーミキサー、3本ロール、ニーダー、品川ミキサー等が挙げられる。これらを単独でまたは組み合わせて使用することができる。
[Method for producing thermally conductive silicone composition]
In the production of the heat conductive silicone composition of the present invention, the order of addition of the respective components is not particularly limited. For example, the alkenyl group-containing siloxane oligomer (A) and the heat (B) are used. After kneading the conductive filler with a kneader described later, (C) a platinum-based catalyst and (D) polyorganohydrogensiloxane which is a crosslinking agent, and other optional components as necessary are kneaded. Is preferred. Examples of the kneading machine include a planetary mixer equipped with a heating means and a cooling means, a three-roller, a kneader, and a Shinagawa mixer. These can be used alone or in combination.

本発明の熱伝導性シリコーン組成物の粘度は、23℃において30〜300Pa・sであることが好ましい。粘度が300Pa・sを超えると、例えばシリンジ等に組成物を収容して発熱性電子部品と放熱部材との間隙に注入する際に吐出し難くなり、作業性の低下を招きやすい。一方、30Pa・s未満であると、塗布時に液ダレを起こしやすい。   The viscosity of the heat conductive silicone composition of the present invention is preferably 30 to 300 Pa · s at 23 ° C. When the viscosity exceeds 300 Pa · s, for example, when the composition is stored in a syringe or the like and injected into the gap between the heat-generating electronic component and the heat-dissipating member, it becomes difficult to discharge, and workability is likely to deteriorate. On the other hand, if it is less than 30 Pa · s, liquid dripping is likely to occur during coating.

本発明の熱伝導性シリコーン組成物の硬化方法としては、該組成物を室温で放置する方法や、50〜200℃の温度で加熱する方法が挙げられる。迅速に硬化させる観点から、加熱する方法を採ることが好ましい。得られる硬化物は熱伝導性に優れており、かつアルミニウムやニッケル等の金属基材に対する接着性が良好である。   Examples of the method for curing the thermally conductive silicone composition of the present invention include a method of leaving the composition at room temperature and a method of heating at a temperature of 50 to 200 ° C. From the viewpoint of rapid curing, it is preferable to employ a heating method. The resulting cured product has excellent thermal conductivity and good adhesion to a metal substrate such as aluminum or nickel.

硬化物の23℃における熱伝導率(熱線法で測定)は、3.0W/(m・K)以上であり、さらに4.5W/(m・K)まで熱伝導率を高めることも可能である。熱伝導率が3.0W/(m・K)未満であると、用途によっては熱伝導性能が不十分になる場合があり、用途が限定されるため好ましくない。   The thermal conductivity of the cured product at 23 ° C. (measured by the hot wire method) is 3.0 W / (m · K) or more, and it is also possible to increase the thermal conductivity to 4.5 W / (m · K). is there. If the thermal conductivity is less than 3.0 W / (m · K), the thermal conductivity performance may be insufficient depending on the application, which is not preferable because the application is limited.

このように本発明の熱伝導性シリコーン組成物は、低粘度で塗布作業性に優れ、接着性に優れ熱伝導性が良好な硬化物を形成する。したがって、発熱性電子部品と放熱部材との間に介在される熱伝導性材料として好適している。   As described above, the thermally conductive silicone composition of the present invention forms a cured product having a low viscosity, excellent coating workability, excellent adhesion, and good thermal conductivity. Therefore, it is suitable as a heat conductive material interposed between the heat-generating electronic component and the heat dissipation member.

次に、本発明の熱伝導性シリコーン組成物を用いた半導体装置について、図面を参照して説明する。図1は、半導体装置の構成を模式的に示す断面図である。   Next, a semiconductor device using the thermally conductive silicone composition of the present invention will be described with reference to the drawings. FIG. 1 is a cross-sectional view schematically showing a configuration of a semiconductor device.

この半導体装置1は、配線基板2に実装されたCPU等の発熱性電子部品3と、この電子部品からの発熱を放散させるために周りに設けられたヒートスプレッダ4との間に、上述した熱伝導性シリコーン組成物の硬化物層5が形成された構造を有する。この硬化物層5を介して、発熱性電子部品3とヒートスプレッダ4とが接着されており、かつ発熱性電子部品3からヒートスプレッダ4への熱の放散が助けられる。また、ヒートスプレッダ4とヒートシンク6等の放熱部材との間には、熱伝導層7が介在されている。この熱伝導層7は、熱伝導性のシリコーングリースあるいは熱伝導性のシートから構成されているが、前記した熱伝導性シリコーン組成物の硬化物層とすることもできる。熱伝導層7を熱伝導性シリコーングリースあるいは熱伝導性のシートとした場合には、修理などのために、ヒートシンク6等の放熱部材をヒートスプレッダ4から取り外す際の作業が容易である。なお、図において、符号8は、発熱性電子部品3を配線基板2に実装するための接続バンプ、9はバンプ接続部を気密に封止する封止層をそれぞれ示す。   The semiconductor device 1 includes the above-described heat conduction between a heat-generating electronic component 3 such as a CPU mounted on a wiring board 2 and a heat spreader 4 provided in the periphery to dissipate heat generated from the electronic component. The cured product layer 5 of the conductive silicone composition has a structure. The exothermic electronic component 3 and the heat spreader 4 are bonded via the cured product layer 5, and heat dissipation from the exothermic electronic component 3 to the heat spreader 4 is aided. Further, a heat conductive layer 7 is interposed between the heat spreader 4 and a heat radiating member such as the heat sink 6. The heat conductive layer 7 is composed of a heat conductive silicone grease or a heat conductive sheet, but may be a cured layer of the above-described heat conductive silicone composition. When the heat conductive layer 7 is made of a heat conductive silicone grease or a heat conductive sheet, it is easy to remove a heat radiating member such as the heat sink 6 from the heat spreader 4 for repair or the like. In the figure, reference numeral 8 denotes a connection bump for mounting the heat-generating electronic component 3 on the wiring substrate 2, and 9 denotes a sealing layer for hermetically sealing the bump connection portion.

熱伝導性シリコーン組成物の硬化物層5の厚さは、5〜300μmであることが好ましい。厚さが5μmより薄いと、間に隙間が生じるおそれがあるうえに、接着が不十分となる。一方、300μmより厚いと、熱抵抗が大きくなり、放熱効果が悪化し易い。   The thickness of the cured product layer 5 of the heat conductive silicone composition is preferably 5 to 300 μm. If the thickness is less than 5 μm, a gap may be formed between them, and adhesion is insufficient. On the other hand, if it is thicker than 300 μm, the thermal resistance increases and the heat dissipation effect tends to deteriorate.

このような半導体装置1は、配線基板2に実装された発熱性電子部品3に、例えばシリンジで熱伝導性シリコーン組成物を5〜300μmの厚みで塗布し、その上にヒートスプレッダ4を被せて加熱硬化させた後、さらに熱伝導性シリコーングリース等の熱伝導層7とヒートシンク6を配置し、ヒートシンク6と配線基板2とを押圧することによって得られる。   In such a semiconductor device 1, a heat conductive silicone composition is applied to a heat-generating electronic component 3 mounted on a wiring board 2 with a thickness of 5 to 300 μm, for example, with a syringe, and a heat spreader 4 is placed thereon to heat. After curing, a heat conductive layer 7 such as a heat conductive silicone grease and a heat sink 6 are further disposed, and the heat sink 6 and the wiring board 2 are pressed.

本発明の熱伝導性シリコーン組成物を実施例により詳細に説明する。実施例および比較例で得られた熱伝導性シリコーン組成物の特性を、以下のようにして測定・評価し、結果を表1に示した。なお、表1に示した特性は23℃において測定した値であり、平均粒径はレーザ回折法により測定した値である。   The heat conductive silicone composition of this invention is demonstrated in detail by an Example. The characteristics of the thermally conductive silicone compositions obtained in the examples and comparative examples were measured and evaluated as follows, and the results are shown in Table 1. The characteristics shown in Table 1 are values measured at 23 ° C., and the average particle diameter is a value measured by a laser diffraction method.

[粘度]
熱伝導性シリコーン組成物の23℃における粘度を、粘度計(商品名:Brookfield Engineering社製、HBT型)を用いて測定した。
[viscosity]
The viscosity at 23 ° C. of the thermally conductive silicone composition was measured using a viscometer (trade name: Brookfield Engineering, HBT type).

[熱伝導率]
実施例1、2および比較例2で得られたシリコーン組成物を深さ2.5cmの型に流し込み、150℃の熱風乾燥機中で1時間加熱して硬化させた。硬化物を室温に冷却した後、京都電子工業(株)社製の熱伝導率計(商品名:QTM−500)を用いて熱伝導率を測定した。
[Thermal conductivity]
The silicone compositions obtained in Examples 1 and 2 and Comparative Example 2 were poured into a mold having a depth of 2.5 cm and cured by heating in a hot air dryer at 150 ° C. for 1 hour. After the cured product was cooled to room temperature, the thermal conductivity was measured using a thermal conductivity meter (trade name: QTM-500) manufactured by Kyoto Electronics Industry Co., Ltd.

[接着性]
80mm×25mm×2mmの2枚のアルミニウム板を、長辺を10mmだけ重ねて平行に置き、重ねた部分の間に、実施例1、2および比較例2で得られたシリコーン組成物の層(厚さ1mm)を形成した後、150℃で1時間加熱して硬化させ放冷した。こうしてアルミニウム板に対する接着性試験の試料を作製した。また、同様にして、ニッケルメッキ板に対する接着性試験の試料を作製した。こうして得られた試料を引張試験機に装着し、10mm/min.の引張速度で接着性の試験を行い、剥離の有無を調べた。剥離のないものを、接着性良好と評価した。
[Adhesiveness]
Two aluminum plates of 80 mm × 25 mm × 2 mm were placed in parallel with the long sides overlapped by 10 mm, and the layers of the silicone compositions obtained in Examples 1 and 2 and Comparative Example 2 ( After forming a thickness of 1 mm, it was cured by heating at 150 ° C. for 1 hour and allowed to cool. In this way, a sample for an adhesion test for an aluminum plate was prepared. Similarly, a sample for an adhesion test with respect to a nickel-plated plate was prepared. The sample thus obtained was mounted on a tensile tester and 10 mm / min. An adhesion test was conducted at a tensile speed of 5 to examine whether there was any peeling. Those without peeling were evaluated as having good adhesion.

実施例1
まず、(A-1)23℃における粘度が0.050Pa・sであり、下記式:

Figure 0005155033
で表されるビニル基含有シロキサンオリゴマー(式中、Viはビニル基を意味する。ビニル基量0.68mmol/g)100重量部と、(B1-1)平均粒径18μmの丸み状の酸化アルミニウム1140重量部と、(B2)平均粒径3μmの丸み状の酸化アルミニウム380重量部、および(B3)平均粒径0.4μmの丸み状の酸化アルミニウム380重量部を、プラネタリーミキサーで150℃に加熱して120分間混練した後、30℃まで冷却した。次いで、(C)塩化白金酸のビニルシロキサン錯体化合物(白金量2.0重量%)0.2重量部(白金元素量として0.5ppm)と、(D)23℃における粘度が0.1Pa・sであり、
式:(CH)SiO[SiH(CH)O]23[Si(CH)O]16Si(CH)
で表されるポリオルガノハイドロジェンシロキサン(Si−H基の含有量8.4mmol/g)8.1重量部と、(E-1)γ−グリシドキシプロピルトリメトキシシラン2重量部と、(E-2)γ−メタクリロキシプロピルトリメトキシシラン2重量部、および反応調節剤としてトリアリルイソシアヌレート0.5重量をそれぞれプラネタリーミキサーに添加し、常温(23℃)で30分間均一に混練して、熱伝導性シリコーン組成物を得た。この組成物の特性を測定し、結果を表1に示した。 Example 1
First, (A-1) the viscosity at 23 ° C. is 0.050 Pa · s, and the following formula:
Figure 0005155033
100 parts by weight of a vinyl group-containing siloxane oligomer represented by the formula (wherein Vi represents a vinyl group, vinyl group amount 0.68 mmol / g) and (B1-1) round aluminum oxide having an average particle size of 18 μm 1140 parts by weight, (B2) 380 parts by weight of round aluminum oxide having an average particle diameter of 3 μm, and (B3) 380 parts by weight of round aluminum oxide having an average particle diameter of 0.4 μm were brought to 150 ° C. with a planetary mixer. After heating and kneading for 120 minutes, the mixture was cooled to 30 ° C. Next, (C) 0.2 parts by weight of a vinylsiloxane complex compound of chloroplatinic acid (platinum amount 2.0% by weight) (0.5 ppm as the amount of platinum element) and (D) a viscosity at 23 ° C. of 0.1 Pa · s,
Formula: (CH 3 ) 3 SiO [SiH (CH 3 ) O] 23 [Si (CH 3 ) 2 O] 16 Si (CH 3 ) 3
8.1 parts by weight of a polyorganohydrogensiloxane represented by formula (Si-H group content 8.4 mmol / g), (E-1) 2 parts by weight of γ-glycidoxypropyltrimethoxysilane, E-2) Add 2 parts by weight of γ-methacryloxypropyltrimethoxysilane and 0.5 parts by weight of triallyl isocyanurate as a reaction regulator, respectively, and knead uniformly at room temperature (23 ° C.) for 30 minutes. Thus, a heat conductive silicone composition was obtained. The properties of this composition were measured and the results are shown in Table 1.

実施例2
実施例1の(B1-1)平均粒径18μmの酸化アルミニウム1140重量部を、(B1-2)平均粒径20μmのアルミニウム770重量部に変えた以外は、実施例1と同様にして、熱伝導性シリコーン組成物を得た。この組成物の特性を測定し、結果を表1に示した。
Example 2
In the same manner as in Example 1, except that 1140 parts by weight of aluminum oxide (B1-1) having an average particle diameter of 18 μm in Example 1 was changed to 770 parts by weight of aluminum having (B1-2) an average particle diameter of 20 μm, A conductive silicone composition was obtained. The properties of this composition were measured and the results are shown in Table 1.

比較例1
実施例1の(A-1)23℃における粘度が0.050Pa・sであるビニル基含有シロキサンオリゴマー100重量部を、(A-2)式:

Figure 0005155033
で表され、23℃における粘度が0.180Pa・sであるビニル基含有シロキサンオリゴマー100重量部に変えたところ、(B)成分が(A)成分に分散したがパテ状となったため、組成物の調製を中止した。 Comparative Example 1
In Example 1, (A-1) 100 parts by weight of a vinyl group-containing siloxane oligomer having a viscosity at 23 ° C. of 0.050 Pa · s is represented by the formula (A-2):
Figure 0005155033
When the viscosity was changed to 100 parts by weight of a vinyl group-containing siloxane oligomer having a viscosity at 23 ° C. of 0.180 Pa · s, the component (B) was dispersed in the component (A) but became putty. The preparation of was stopped.

比較例2
実施例1の(A-1)23℃における粘度が0.050Pa・sであるビニル基含有シロキサンオリゴマー100重量部の代わりに、(A-3)23℃における粘度が0.050Pa・sであり、下記式:

Figure 0005155033
で表されるビニル基をもたないシロキサンオリゴマー20重量部と、(A-4)23℃における粘度が0.10Pa・sの両末端ビニル基含有シロキサン(ビニル基量0.33mmol/g)80重量部との混合物を用いた。また、(D)成分であるポリオルガノハイドロジェンシロキサンの配合量を3.14重量部とした。それ以外は実施例1と同様にして、熱伝導性シリコーン組成物を得た。この組成物の特性を測定し、結果を表1に示した。 Comparative Example 2
Instead of 100 parts by weight of the vinyl group-containing siloxane oligomer having a viscosity at 23 ° C. of (A-1) of Example 1 of (A-3), the viscosity at 23 ° C. of (A-3) is 0.050 Pa · s. The following formula:
Figure 0005155033
20 parts by weight of a siloxane oligomer having no vinyl group and (A-4) a siloxane containing both terminal vinyl groups having a viscosity of 0.10 Pa · s at 23 ° C. (vinyl group amount 0.33 mmol / g) 80 A mixture with parts by weight was used. Moreover, the compounding quantity of polyorganohydrogensiloxane which is (D) component was 3.14 weight part. Other than that was carried out similarly to Example 1, and obtained the heat conductive silicone composition. The properties of this composition were measured and the results are shown in Table 1.

比較例3
実施例1の(B1-1)平均粒径18μmの酸化アルミニウムの配合量を1520重量部とし、(B2)平均粒径3μmの酸化アルミニウムの配合量を190重量部とした。また、(B3)平均粒径0.4μmの酸化アルミニウムの配合量を190重量部とした。それ以外は実施例1と同様に調製しようとしたところ、(B)成分が(A)成分に分散せずに粉状のままであったため、組成物の調製を中止した。
Comparative Example 3
In Example 1, (B1-1) the amount of aluminum oxide having an average particle size of 18 μm was 1520 parts by weight, and (B2) the amount of aluminum oxide having an average particle size of 3 μm was 190 parts by weight. Further, the blending amount of (B3) aluminum oxide having an average particle diameter of 0.4 μm was 190 parts by weight. Otherwise, preparation was performed in the same manner as in Example 1. However, since the component (B) was not dispersed in the component (A) and remained in powder form, the preparation of the composition was stopped.

比較例4
実施例1の(B1-1)平均粒径18μmの酸化アルミニウムの配合量を760重量部とし、(B2)平均粒径3μmの酸化アルミニウムの配合量を570重量部とした。また、(B3)平均粒径0.4μmの酸化アルミニウムの配合量を570重量部とした。それ以外は実施例1と同様に調製しようとしたところ、(B)成分が(A)成分に分散せずに粉状のままであったため、組成物の調製を中止した。
Comparative Example 4
In Example 1, (B1-1) the amount of aluminum oxide having an average particle size of 18 μm was 760 parts by weight, and (B2) the amount of aluminum oxide having an average particle size of 3 μm was 570 parts by weight. The blending amount of (B3) aluminum oxide having an average particle size of 0.4 μm was 570 parts by weight. Otherwise, preparation was performed in the same manner as in Example 1. However, since the component (B) was not dispersed in the component (A) and remained in powder form, the preparation of the composition was stopped.

比較例5
実施例1の(B1-1)平均粒径18μmの酸化アルミニウムの配合量を950重量部とし、(B2)平均粒径3μmの酸化アルミニウムの配合量を760重量部とした。また、(B3)平均粒径0.4μmの酸化アルミニウムの配合量を190重量部とした。それ以外は実施例1と同様に調製しようとしたところ、(B)成分が(A)成分に分散せずに粉状のままであったため、組成物の調製を中止した。
Comparative Example 5
In Example 1, (B1-1) the amount of aluminum oxide having an average particle size of 18 μm was 950 parts by weight, and (B2) the amount of aluminum oxide having an average particle size of 3 μm was 760 parts by weight. Further, the blending amount of (B3) aluminum oxide having an average particle diameter of 0.4 μm was 190 parts by weight. Otherwise, preparation was performed in the same manner as in Example 1. However, since the component (B) was not dispersed in the component (A) and remained in powder form, the preparation of the composition was stopped.

比較例6
実施例1の(B1-1)平均粒径18μmの酸化アルミニウムの配合量を1330重量部とし、(B2)平均粒径3μmの酸化アルミニウム380重量部の配合量を95重量部とした。また、(B3)平均粒径0.4μmの酸化アルミニウムの配合量を475重量部とした。それ以外は実施例1と同様にしたところ、(B)成分が(A)成分に分散したがパテ状となったため、組成物の調製を中止した。
Comparative Example 6
The amount of (B1-1) aluminum oxide having an average particle size of 18 μm in Example 1 was 1330 parts by weight, and the amount of (B2) 380 parts by weight of aluminum oxide having an average particle size of 3 μm was 95 parts by weight. The blending amount of (B3) aluminum oxide having an average particle size of 0.4 μm was 475 parts by weight. Otherwise in the same manner as in Example 1, the component (B) was dispersed in the component (A) but became putty, so the preparation of the composition was stopped.

比較例7
実施例1の(B1-1)平均粒径18μmの酸化アルミニウムの配合量を950重量部とし、(B2)平均粒径3μmの酸化アルミニウムの配合量を190重量部とした。また、(B3)平均粒径0.4μmの酸化アルミニウムの配合量を760重量部とした。それ以外は実施例1と同様に調製しようとしたところ、(B)成分が(A)成分に分散せず、粉状のままであったため、組成物の調製を中止した。
Comparative Example 7
In Example 1, (B1-1) the amount of aluminum oxide having an average particle size of 18 μm was 950 parts by weight, and (B2) the amount of aluminum oxide having an average particle size of 3 μm was 190 parts by weight. The blending amount of (B3) aluminum oxide having an average particle size of 0.4 μm was 760 parts by weight. Otherwise, preparation was performed in the same manner as in Example 1. However, since the component (B) was not dispersed in the component (A) and remained in powder form, preparation of the composition was stopped.

比較例8
実施例1の(B1-1)平均粒径18μmの酸化アルミニウムの配合量を1330重量部とし、(B2)平均粒径3μmの酸化アルミニウムの配合量を475重量部とした。また、(B3)平均粒径0.4μmの酸化アルミニウムの配合量を95重量部とした。それ以外は実施例1と同様に調製しようとしたところ、(B)成分が(A)成分に分散したがパテ状となったため、組成物の調製を中止した。
Comparative Example 8
In Example 1, (B1-1) the amount of aluminum oxide having an average particle size of 18 μm was 1330 parts by weight, and (B2) the amount of aluminum oxide having an average particle size of 3 μm was 475 parts by weight. The blending amount of (B3) aluminum oxide having an average particle size of 0.4 μm was 95 parts by weight. Otherwise, preparation was performed in the same manner as in Example 1. However, since the component (B) was dispersed in the component (A) but became putty, the preparation of the composition was stopped.

Figure 0005155033
Figure 0005155033

表1から明らかなように、実施例1,2のシリコーン組成物は、(B)成分である熱伝導性充填剤が高充填されているが低粘度であるため、良好な塗布性能や塗布作業性を有する。また、硬化物が、熱伝導率4.5W/(m・K)以上という極めて高い熱伝導性を示すうえに、金属基材(アルミニウム板およびニッケルメッキ板)に対する接着性に優れている。   As is clear from Table 1, the silicone compositions of Examples 1 and 2 are highly filled with the thermally conductive filler as the component (B) but have a low viscosity, so that good coating performance and coating work are achieved. Have sex. Moreover, the cured product exhibits extremely high thermal conductivity of 4.5 W / (m · K) or more, and is excellent in adhesion to metal substrates (aluminum plates and nickel plated plates).

本発明の熱伝導シリコーン組成物を適用した半導体装置の一例を示す断面図である。It is sectional drawing which shows an example of the semiconductor device to which the heat conductive silicone composition of this invention is applied.

符号の説明Explanation of symbols

1…半導体装置、2…配線基板、3…発熱性電子部品、4…ヒートスプレッダ、5…熱伝導性シリコーン組成物の硬化物層、6…ヒートシンク。   DESCRIPTION OF SYMBOLS 1 ... Semiconductor device, 2 ... Wiring board, 3 ... Exothermic electronic component, 4 ... Heat spreader, 5 ... Hardened | cured material layer of a heat conductive silicone composition, 6 ... Heat sink.

Claims (4)

(A)23℃における粘度が10〜100mPa・sであり、下記一般式で表されるアルケニル基含有シロキサンオリゴマー100重量部と、
Figure 0005155033
(式中、Zはアルケニル基、mは0〜20の整数、nは10〜40の整数であり、m+nは10〜40である。)
(B)(B1)最大粒径が60μm以下であって、粒径10〜30μmの粒子を全体の90重量%以上含み、平均粒径が10μm以上、50μm未満のアルミニウム粉末または酸化アルミニウム、(B2)最大粒径が10μm以下であって、粒径2〜7μmの粒子を全体の90重量%以上含み、平均粒径が1μm以上、10μm未満のアルミニウム粉末または酸化アルミニウムおよび(B3)最大粒径が3μm以下であって、粒径0.2〜0.8μmの粒子を全体の60重量%以上含み、平均粒径が0.1μm以上、1μm未満の酸化アルミニウムをそれぞれ含む熱伝導性充填剤1000〜3000重量部(但し、(B1)は(B)成分全体の50〜70容量%(vol%)となる量、(B2)は(B)成分全体の10〜30vol%となる量、(B3)は(B)成分全体の10〜30vol%となる量である。)と、
(C)白金系触媒の触媒量と、
(D)1分子中にケイ素原子に結合した水素原子を3個以上有するポリオルガノハイドロジェンシロキサンを、(A)成分のアルケニル基1個に対してケイ素原子に結合した水素原子が0.5〜2.0個となる量、および
(E)接着性付与剤1.0〜10重量部
を含有することを特徴とする熱伝導性シリコーン組成物。
(A) The viscosity at 23 ° C. is 10 to 100 mPa · s, and 100 parts by weight of an alkenyl group-containing siloxane oligomer represented by the following general formula:
Figure 0005155033
(In the formula, Z is an alkenyl group, m is an integer of 0 to 20, n is an integer of 10 to 40, and m + n is 10 to 40.)
(B) (B1) An aluminum powder or aluminum oxide having a maximum particle size of 60 μm or less and containing 90% by weight or more of particles having a particle size of 10 to 30 μm and an average particle size of 10 μm or more and less than 50 μm, (B2 ) Aluminum powder or aluminum oxide having a maximum particle size of 10 μm or less, containing 90% by weight or more of particles having a particle size of 2 to 7 μm , an average particle size of 1 μm or more and less than 10 μm, and (B3) the maximum particle size Thermally conductive filler 1000 that includes 3 μm or less of particles having a particle size of 0.2 to 0.8 μm and 60% by weight or more of the whole, and an aluminum oxide having an average particle size of 0.1 μm or more and less than 1 μm. 3000 parts by weight (provided that (B1) is 50 to 70% by volume (vol%) of the total component (B), (B2) is 10 to 30 vol% of the total (B) component, (B3) (B) component As the amount to be 10 to 30 vol% of the body.)
(C) the amount of platinum-based catalyst;
(D) A polyorganohydrogensiloxane having three or more hydrogen atoms bonded to silicon atoms in one molecule, wherein 0.5 to 0.5 hydrogen atoms bonded to silicon atoms per one alkenyl group of component (A) A thermally conductive silicone composition comprising an amount of 2.0, and (E) 1.0 to 10 parts by weight of an adhesion-imparting agent.
前記(E)成分である接着性付与剤は、
下記(a)〜(c)から成る群から選ばれる1種以上の有機ケイ素化合物であることを特徴とする請求項1記載の熱伝導性シリコーン組成物。
(a)ケイ素原子に結合した水素原子を分子中に少なくとも1個と、一般式(I)
Figure 0005155033
(式中、QおよびQは直鎖状または分岐状のアルキレン基を表し、Rは炭素数1〜4のアルキル基を表す。)で表わされる基を分子中に少なくとも1個有する有機ケイ素化合物
(b)ケイ素原子に結合したアルコキシ基を分子中に少なくとも2個と、エポキシ基を分子中に少なくとも1個有する有機ケイ素化合物
(c)ケイ素原子に結合したアルコキシ基を分子中に少なくとも1個と、不飽和二重結合を有する炭化水素基を分子中に少なくとも1個有する有機ケイ素化合物
The adhesiveness imparting agent as the component (E) is
The thermally conductive silicone composition according to claim 1, wherein the composition is one or more organic silicon compounds selected from the group consisting of the following (a) to (c).
(A) at least one hydrogen atom bonded to a silicon atom in the molecule;
Figure 0005155033
(In the formula, Q 1 and Q 2 represent a linear or branched alkylene group, and R 1 represents an alkyl group having 1 to 4 carbon atoms.) Organic having at least one group represented in the molecule Silicon compound (b) Organosilicon compound having at least two alkoxy groups bonded to a silicon atom and at least one epoxy group in the molecule (c) At least one alkoxy group bonded to a silicon atom in the molecule And an organosilicon compound having at least one hydrocarbon group having an unsaturated double bond in the molecule
硬化前の23℃における粘度が30〜300Pa・sであることを特徴とする請求項1または2記載の熱伝導性シリコーン組成物。 The thermally conductive silicone composition according to claim 1 or 2, wherein the viscosity at 23 ° C before curing is 30 to 300 Pa · s. 硬化物の熱伝導率が3.0W/(m・K)以上であることを特徴とする請求項1乃至3のいずれか1項記載の熱伝導性シリコーン組成物。 The thermally conductive silicone composition according to any one of claims 1 to 3, wherein the cured product has a thermal conductivity of 3.0 W / (m · K) or more.
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