JP4919508B2 - Photoresist monomer, polymer compound and photoresist composition - Google Patents

Description

  The present invention relates to a photoresist monomer, a polymer compound, a photoresist composition, and a semiconductor manufacturing method using the photoresist composition, which are used when fine processing of a semiconductor is performed.

In the manufacture of semiconductors, lithographic techniques for pattern formation have recently been made extremely fine in line width due to dramatic innovation. Initially, i-line and g-line were used for exposure for lithography, and the line width was wide. Therefore, the capacity of the manufactured semiconductor was low. However, recent technological developments have made it possible to use a KrF excimer laser, and the line width has become extremely fine. Since then, development has progressed with the aim of applying an ArF excimer laser having a shorter wavelength, and its practical application has been made in recent years. In the exposure with a KrF excimer laser, a conventional novolac or styrene resin was used, but the wavelength of the ArF excimer laser is 193 nm, which is even shorter, and aromatic such as a novolac or styrene resin. In order to absorb the wavelength, the structure of the resin was replaced with an alicyclic one that does not contain aromatics. The resin used is mainly acrylic, and applies a mechanism in which acrylic acid is protected with a protecting group, and the protecting group is eliminated by an acid generated by exposure to form a carboxylic acid, which becomes alkali-soluble. Many of the protective groups currently used are alicyclic and do not have a polar group, which alone affects the poor adhesion to the substrate and the affinity with an alkali developer. Many acrylic monomers having a ring skeleton as an ester group have been proposed. Among them, an alicyclic skeleton having a lactone ring as a polar group is highly evaluated for its functionality and is used in large numbers. There exist patent document 1 and patent document 2 as the part. A proposal of a monocyclic ester group of a lactone ring is also in Patent Document 3 and the like, but the single ring lacks the most required function of a resist, ie, etching resistance, and seems not to be used so much. Currently, a method called immersion exposure, in which the space between the substrate and the exposure machine is filled with a high-density liquid, has been studied. Further, the resist pattern has become finer and the film thickness tends to be reduced accordingly. There is a strong demand for monomers containing Further, a resin having a large amount of an alicyclic acrylic ester having a lactone ring has difficulty in solubility in an organic solvent such as a resist solvent, and there is a strong demand for a resin used in a resist for improving solubility.
Japanese Patent Laid-Open No. 2000-026446 JP 2006-076981 A JP-A-10-274852

  The object of the present invention is to maintain stability such as chemical resistance when applied to a resist resin and the like, while having excellent solubility in an organic solvent, hydrolyzability and / or solubility in water after hydrolysis. An object of the present invention is to provide a polycyclic ester containing a novel lactone skeleton useful as a monomer component such as a high-functional polymer that can be improved, a resin thereof, a composition for photoresist, and a method for producing a semiconductor. A further object of the present invention is to provide a resin exhibiting high etching resistance when used as a resin for a photoresist, and to provide a photoresist resin and its composition, particularly used in immersion exposure. is there.

  As a result of various studies on monomers having a lactone skeleton used in photoresist resins, the present invention has led to the discovery of monomers having good solvent solubility and high etching resistance when made into resins, The present invention has been completed.

  The present invention relates to the following formula (I)

（式中、Ｒ^ａは水素原子、ハロゲン原子、又はハロゲン原子を有してもよい炭素数１〜６のアルキル基を示し、Ｒ^１はメチル基を示し、Ａはメチレン基、酸素原子、又は硫黄原子を示す。）で表されるフォトレジスト用単量体を提供するものである。

(In the formula, R ^a represents a hydrogen atom, a halogen atom, or an alkyl group having 1 to 6 carbon atoms which may have a halogen atom, R ¹ represents a methyl group, A represents a methylene group, an oxygen atom, or The present invention provides a photoresist monomer represented by the following formula:

  Furthermore, the present invention provides the following formula (1)

（式中、Ｒ^ａは水素原子、ハロゲン原子、又はハロゲン原子を有してもよい炭素数１〜６のアルキル基を示し、Ｒ^１はメチル基を示し、Ａはメチレン基、酸素原子、又は硫黄原子を示す。）で表されるモノマー単位を有するフォトレジスト用高分子化合物を提供するものである。

(In the formula, R ^a represents a hydrogen atom, a halogen atom, or an alkyl group having 1 to 6 carbon atoms which may have a halogen atom, R ¹ represents a methyl group, A represents a methylene group, an oxygen atom, or The present invention provides a photoresist polymer compound having a monomer unit represented by the following formula:

  Furthermore, in the present invention, the polymer compound further comprises the following formulas (2a) to (2d):

（式中、環Ｚは置換基を有していてもよい炭素数５〜２０の脂環式炭化水素環を示す。Ｒ^ｂは水素原子又は置換基を有していてもよい炭素数１〜６のアルキル基を示す。Ｒ^２〜Ｒ^４は、同一又は異なって、置換基を有していてもよい炭素数１〜６のアルキル基を示す。Ｒ^５は環Ｚに結合している置換基であって、同一又は異なって、オキソ基、アルキル基、保護基で保護されていてもよいヒドロキシル基、保護基で保護されていてもよいヒドロキシアルキル基、又は保護基で保護されていてもよいカルボキシル基を示す。但し、ｍ個のＲ^５のうち少なくとも１つは、−ＣＯＯＲ^ｄ基を示す。前記Ｒ^ｄは置換基を有していてもよい第３級炭化水素基、テトラヒドロフラニル基、テトラヒドロピラニル基、又はオキセパニル基を示す。ｍは１〜３の整数を示す。Ｒ^６、Ｒ^７は、同一又は異なって、水素原子又は置換基を有していてもよい炭素数１〜６のアルキル基を示す。Ｒ^８は水素原子又は有機基を示す。Ｒ^６、Ｒ^７、Ｒ^８のうち少なくとも２つが互いに結合して隣接する原子とともに環を形成していてもよい）から選択された少なくとも１種のモノマー単位を含む前記記載のフォトレジスト用高分子化合物を提供するものである。

(In the formula, ring Z represents an alicyclic hydrocarbon ring having 5 to 20 carbon atoms which may have a substituent. R ^b represents 1 to 1 carbon atoms which may have a hydrogen atom or a substituent. 6 represents an alkyl group of 6. R ^{2 to} R ⁴ are the same or different and each represents an optionally substituted alkyl group having 1 to 6 carbon atoms, and R ⁵ represents a substituent bonded to ring Z. The same or different, an oxo group, an alkyl group, a hydroxyl group that may be protected with a protecting group, a hydroxyalkyl group that may be protected with a protecting group, or a group that is protected with a protecting group A good carboxyl group, provided that at least one of m R ⁵ represents a —COOR ^d group, wherein R ^d is a tertiary hydrocarbon group or a tetrahydrofuranyl group which may have a substituent; , Tetrahydropyranyl group, or oxepanyl group, m is .R ^6, R ⁷ indicating a to 3 integers are the same or different, a hydrogen atom or a substituted showing also alkyl group having 1 to 6 carbon atoms .R ⁸ is hydrogen atom or an organic group Wherein at least two of R ⁶ , R ⁷ , and R ⁸ may be bonded to each other to form a ring together with adjacent atoms). The high molecular compound for use is provided.

  In the present invention, the polymer compound may further be represented by the following formula (3):

（式中、環Ｙは炭素数６〜２０の有橋脂環式炭化水素環を示す。Ｒ^ｃは水素原子又は置換基を有していてもよい炭素数１〜６のアルキル基を示す。Ｒ^９は環Ｙに結合している置換基であって、同一又は異なって、オキソ基、アルキル基、保護基で保護されていてもよいヒドロキシル基、保護基で保護されていてもよいヒドロキシアルキル基、又は保護基で保護されていてもよいカルボキシル基を示す。ｎはＲ^９の個数であって１〜５の整数を示す。）で表されるモノマー単位を含むことを特徴とする前記に記載のフォトレジスト用高分子化合物を提供するものである。

(In the formula, ring Y represents a bridged alicyclic hydrocarbon ring having 6 to 20 carbon atoms. R ^c represents a hydrogen atom or an optionally substituted alkyl group having 1 to 6 carbon atoms. R ⁹ is a substituent bonded to ring Y and is the same or different and is an oxo group, an alkyl group, a hydroxyl group which may be protected with a protecting group, or a hydroxyalkyl which may be protected with a protecting group Or a carboxyl group which may be protected with a protecting group, wherein n is the number of R ⁹ and represents an integer of 1 to 5). The high molecular compound for photoresist as described is provided.

  The present invention further provides the polymer compound for photoresists according to any one of the above, having a weight average molecular weight of 1,000 to 50,000.

  Moreover, this invention provides the high molecular compound for photoresists in any one of the said that molecular weight distribution is 1.0-3.0.

  The present invention further provides a photoresist composition comprising any of the above polymer compounds for photoresist and at least a photoacid generator.

  The present invention also provides a method for producing a semiconductor, characterized in that a pattern is formed using the photoresist composition described above.

  According to the present invention, when derived into a polymer or the like, while maintaining stability such as chemical resistance, it is excellent in solubility in organic solvents, has ring hydrolyzability and / or solubility in water after hydrolysis. Provided are a polycyclic ester containing a novel lactone skeleton useful as a monomer component such as a high-functional polymer that can be improved, a resin thereof, a composition for photoresist, and a method for producing a semiconductor. Furthermore, when used as a resin for a photoresist, a resin exhibiting high etching resistance is provided, and a photoresist resin and its composition, particularly used in immersion exposure, are provided.

In the present specification, methacrylic acid and acrylic such as methacrylic acid derivatives and acrylic acid derivatives may be collectively referred to as (meth) acrylic, or (meth) acryloyl or the like.
The photoresist monomer of the present invention is represented by the formula (I). In the formula (I), R ^a represents a hydrogen atom, a halogen atom, or an alkyl group having 1 to 6 carbon atoms which may have a halogen atom, R ¹ represents a methyl group, A represents a methylene group, an oxygen atom Or a sulfur atom.

Examples of the halogen atom as ^Ra include a fluorine atom, a chlorine atom, and an iodo atom. Examples of the alkyl group having 1 to 6 carbon atoms which may have a halogen atom include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, tert-butyl, pentyl and hexyl groups.

Of the monomers represented by the formula (I), 2-methyl-6- (meth) acryloxy-4-oxatricyclo [5.2.1.0 ^5,9 ] decane-3- is particularly preferred as an example. The production method for ON (hereinafter sometimes abbreviated as MMOD) will be described below together with the reaction formula.

2-Methyl-6- (meth) acryloxy-4-oxatricyclo [5.2.1.0 ^5,9 ] decan-3-one is 2-methyl-6 as shown in the following formula (4). It is synthesized from -hydroxy-4-oxatricyclo [5.2.1.0 ^5,9 ] decan-3-one (hereinafter sometimes referred to as MHOD) and a (meth) acrylic acid derivative.

（メタ）アクリル酸誘導体としては、（メタ）アクリル酸、無水（メタ）アクリル酸、（メタ）アクリル酸クロライドなどが挙げられる。（メタ）アクリル酸を使用する場合は、蒸留方法による脱水縮合によってエステル化され合成される。脱水縮合はエステル化によって生成する水を反応系外へ追い出すために、水と共沸する有機溶媒が使用される。また、蒸留系外へ出された後に、水と分液する有機溶媒が好ましい。それにより、分液した有機溶媒はデカンターなどを使用して、水と分離して、再び反応系内へ戻すことが可能である。

Examples of the (meth) acrylic acid derivative include (meth) acrylic acid, anhydrous (meth) acrylic acid, (meth) acrylic acid chloride and the like. When (meth) acrylic acid is used, it is esterified and synthesized by dehydration condensation by a distillation method. In the dehydration condensation, an organic solvent azeotroped with water is used to drive water generated by esterification out of the reaction system. In addition, an organic solvent that is separated from water after being taken out of the distillation system is preferable. Thereby, the separated organic solvent can be separated from water using a decanter or the like and returned to the reaction system again.

  When anhydrous (meth) acrylic acid or (meth) acrylic acid chloride is used, esterification is possible by reacting as a solution, but it is also preferable to use an acid catalyst or a basic substance. The MMOD obtained by the reaction can be purified using ordinary purification means such as column chromatography or recrystallization.

2-Methyl-6-hydroxy-4-oxatricyclo [5.2.1.0 ^5,9 ] decan-3-one (MHOD), which is a raw material used in the formula (4), is represented by the following formula ( It is synthesized as shown in 5).

この合成工程は原料であるα−メチル−５−ノルボルネン−２−酢酸（以降ＭＮ酸と呼ぶこともある）の２重結合を酸化し、エポキシ化することでフリーのカルボン酸とエポキシ基が反応して環化しラクトン環を形成し、２−メチル−６−ヒドロキシ−４−オキサトリシクロ［５．２．１．０^5,9］デカン−３−オン（ＭＨＯＤ）を生成するものである。この工程を環化工程と呼ぶこととする。この環化工程においてエポキシ基を生成させる反応においては過酸または過酸化物が使用される。

In this synthesis process, the free carboxylic acid and the epoxy group react by oxidizing and epoxidizing the double bond of the raw material α-methyl-5-norbornene-2-acetic acid (hereinafter sometimes referred to as MN acid). And cyclized to form a lactone ring to produce 2-methyl-6-hydroxy-4-oxatricyclo [5.2.1.0 ^5,9 ] decan-3-one (MHOD). This process is called a cyclization process. In the reaction for generating an epoxy group in this cyclization step, a peracid or a peroxide is used.

  Examples of the peracid include organic peracids such as performic acid, peracetic acid, trifluoroperacetic acid, perbenzoic acid, m-chloroperbenzoic acid, and monoperoxyphthalic acid; and inorganic peracids such as permanganic acid. . Peracids can also be used in the form of salts. The organic peracid may be an equilibrium peracid (eg, equilibrium formic acid, equilibrium peracetic acid, etc.). That is, for example, organic acids such as formic acid and acetic acid may be used in combination with hydrogen peroxide to generate the corresponding organic peracid in the system. When using an equilibrium peracid, a small amount of a strong acid such as sulfuric acid may be added as a catalyst. The amount of peracid used is, for example, about 0.8 to 2 mol, preferably 0.9 to 1.5 mol, more preferably about 0.95 to 1.2 mol, per 1 mol of MN acid.

  Examples of the peroxide to be reacted with MN acid include hydrogen peroxide, peroxide, hydroperoxide, peroxo acid, peroxo acid salt, and the like. As hydrogen peroxide, pure hydrogen peroxide may be used, but from the viewpoint of handling, it is usually used in a form diluted with an appropriate solvent, for example, water (for example, 30% by weight hydrogen peroxide). . The amount of peroxide such as hydrogen peroxide used is, for example, about 0.9 to 5 mol, preferably about 0.9 to 3 mol, more preferably about 0.95 to 2 mol, per 1 mol of MN acid. It is.

  The hydrogen peroxide is often used together with a metal compound as a catalyst. Examples of the metal compound include oxides containing metal elements such as W, Mo, V, Mn, and Re, oxo acids or salts thereof, sulfides, halides, oxyhalides, borides, carbides, silicides, Examples thereof include nitrides, phosphides, peroxides, complexes (inorganic complexes and organic complexes), and organometallic compounds. These metal compounds can be used alone or in combination of two or more.

Examples of the oxide include tungsten oxide (WO ₂ , WO ₃ etc.), molybdenum oxide (MoO ₂ , MoO ₃ etc.), vanadium oxide (VO, V ₂ O ₃ , VO ₂ , V ₂ O ₅ etc.), Examples include manganese oxide (MnO, Mn ₂ O ₃ , Mn ₃ O ₄ , MnO ₂ , Mn ₂ O _7, etc.), composite oxides containing metal elements such as W, Mo, V, and Mn.

  Oxo acids include tungstic acid, molybdic acid, vanadic acid, manganic acid, and other isopolyacids such as isopolytungstic acid, isopolymolybdic acid, isopolyvanadate; phosphotungstic acid, silicotungstic acid, phosphomolybdenum sun And heteropolyacids composed of the above metal elements such as silicomolybdic acid and phosphovanadmolybdic acid and other metal elements. As the other metal element in the heteropolyacid, phosphorus or silicon, particularly phosphorus is preferable.

  Examples of the salt of oxo acid include alkali metal salts such as sodium salt and potassium salt of oxo acid; alkaline earth metal salts such as magnesium salt, calcium salt and barium salt; ammonium salt; transition metal salt and the like. The salt of an oxo acid (for example, a salt of a heteropoly acid) may be a salt in which a part of the hydrogen atom corresponding to the cation is replaced with another cation.

  Examples of the peroxide containing a metal element include peroxo acids (for example, peroxotungstic acid, peroxomolybdic acid, peroxovanadate, etc.), peroxo acid salts (alkali metal salts, alkaline earth metal salts of the peroxo acids, Ammonium salts, transition metal salts, etc.), peracids (permanganic acid, etc.), peracid salts (alkali metal salts, alkaline earth metal salts, ammonium salts, transition metal salts, etc. of the peracids).

  The amount of the metal compound used together with hydrogen peroxide is, for example, about 0.0001 to 2 mol, preferably about 0.0005 to 0.5 mol, more preferably 0.001 to 1 mol of MN acid. About 0.2 mol.

  The reaction of MN acid with peracid or peroxide is carried out in the presence or absence of a solvent. Examples of the solvent include alcohols such as t-butyl alcohol; halogenated hydrocarbons such as chloroform, dichloromethane, and 1,2-dichloroethane; aromatic hydrocarbons such as benzene; and aliphatic hydrocarbons such as hexane, heptane, and octane. Alicyclic hydrocarbons such as cyclohexane; amides such as N, N-dimethylformamide and N, N-dimethylacetamide; nitriles such as acetonitrile, propionitrile and benzonitrile; linear or cyclic ethers such as ethyl ether and tetrahydrofuran An ester such as ethyl acetate; an organic acid such as acetic acid; water and the like. These solvents are used alone or in combination of two or more. In the case of performing the reaction in a heterogeneous system, water or a solvent containing water is often used as a solvent.

  Although reaction temperature can be suitably selected in view of reaction rate and reaction selectivity, it is generally about −10 to 100 ° C., preferably about 0 to 90 ° C. The reaction may be carried out by any method such as batch, semi-batch and continuous methods.

By the above reaction, epoxidation of the double bond of MN acid occurs, and an epoxy compound in which the double bond of MN acid is epoxidized is generated. Further, this epoxy group reacts with carboxylic acid in the molecule to form a lactone ring and a hydroxyl group, and 2-methyl-6-hydroxy-4-oxatricyclo [5.2.1.0 ^5,9 ] decane. -3-ON (MHOD) is generated.

  MHOD produced by the reaction can be separated and purified by separation means such as filtration, concentration, distillation, extraction, crystallization, recrystallization, column chromatography, or a combination thereof.

  The α-methyl-5-norbornene-2-acetic acid (MN acid) used in the formula (5) can be synthesized by the following formula (6), for example.

原料としては、２，５−ノルボルナジエンとプロピオン酸ソーダとの反応によるものである。この反応において、プロピオン酸ソーダに代えて、酪酸ソーダを使用すれば上記式（Ｉ）におけるＲ^１がエチル基であるモノマーが合成されることになり、炭素数５の脂肪酸である吉草酸のソーダ塩を使用することでＲ^１がプロピル基、ヘキサン酸のソーダ塩を使用することでＲ^１がブチル基であるモノマーが得られる。Ｒ^１がアルキル基ではなく水素原子であっても有用ではあるが、合成方法が煩雑であったり、エステル基の炭素数が減少すると耐エッチング性が悪化する要因となるので好ましくない。なを、式（６）に示した反応は米国特許３，００８，９８２号に提案されている。

The raw material is a reaction between 2,5-norbornadiene and sodium propionate. In this reaction, if sodium butyrate is used instead of sodium propionate, a monomer in which R ¹ in the above formula (I) is an ethyl group is synthesized, soda of valeric acid which is a fatty acid having 5 carbon atoms. By using a salt, a monomer in which R ¹ is a propyl group and by using a hexanoic acid soda salt, a R ¹ is a butyl group can be obtained. Although it is useful if R ¹ is not an alkyl group but a hydrogen atom, it is not preferable because the synthesis method is complicated, or if the number of carbon atoms of the ester group decreases, etching resistance deteriorates. The reaction shown in the formula (6) is proposed in US Pat. No. 3,008,982.

  The polymer compound will be described below. The polymer compound of the present invention contains a monomer unit (repeating unit) corresponding to a polycyclic ester containing a lactone skeleton represented by the above formula (1), that is, a monomer represented by the above formula (I). Yes. The monomer unit may contain one kind or two or more kinds. Such a polymer compound can be obtained by polymerizing a polycyclic ester containing a lactone skeleton represented by the above formula (I).

  When used as a photoresist resin, the polymer compound of the present invention may have other monomer units in addition to the monomer unit represented by the formula (1). Such another monomer unit can be formed by copolymerizing a polymerizable unsaturated monomer corresponding to the other monomer unit with a polycyclic ester containing a lactone skeleton represented by the formula (I). .

  Examples of the polymerizable unsaturated monomer corresponding to the other monomer unit include a monomer capable of generating a carboxyl group by a decomposition reaction or the like. Examples of such a monomer include compounds represented by the following formulas (7a), (7b), (7c), and (7d).

上記式中、環Ｚは置換基を有していてもよい炭素数５〜２０の脂環式炭化水素環を示す。Ｒ^ｂは水素原子又は置換基を有していてもよい炭素数１〜６のアルキル基を示す。Ｒ^２〜Ｒ^４は、同一又は異なって、置換基を有していてもよい炭素数１〜６のアルキル基を示す。Ｒ^５は環Ｚに結合している置換基であって、同一又は異なって、オキソ基、アルキル基、保護基で保護されていてもよいヒドロキシル基、保護基で保護されていてもよいヒドロキシアルキル基、又は保護基で保護されていてもよいカルボキシル基を示す。但し、ｍ個のＲ^５のうち少なくとも１つは、−ＣＯＯＲ^ｄ基を示す。前記Ｒ^ｄは置換基を有していてもよい第３級炭化水素基、テトラヒドロフラニル基、テトラヒドロピラニル基、又はオキセパニル基を示す。ｍは１〜３の整数を示す。Ｒ^６、Ｒ^７は、同一又は異なって、水素原子又は置換基を有していてもよい炭素数１〜６のアルキル基を示す。Ｒ^８は水素原子又は有機基を示す。Ｒ^６、Ｒ^７、Ｒ^８のうち少なくとも２つが互いに結合して隣接する原子とともに環を形成していてもよい。

式（７ａ）、（７ｂ）、（７ｃ）、（７ｄ）中、環Ｚにおける炭素数５〜２０の脂環式炭化水素環は単環であっても、縮合環や橋かけ環等の多環であってもよい。代表的な脂環式炭化水素環として、例えば、シクロヘキサン環、シクロオクタン環、シクロデカン環、アダマンタン環、ノルボルナン環、ノルボルネン環、ボルナン環、イソボルナン環、パーヒドロインデン環、デカリン環、パーヒドロフルオレン環（トリシクロ［７．４．０．０^3,8］トリデカン環）、パーヒドロアントラセン環、トリシクロ［５．２．１．０^2,6］デカン環、トリシクロ［４．２．２．１^2,5］ウンデカン環、テトラシクロ［４．４．０．１^2,5．１^7,10］ドデカン環などが挙げられる。脂環式炭化水素環には、メチル基等のアルキル基（例えば、Ｃ_1-4アルキル基など）、塩素原子等のハロゲン原子、保護基で保護されていてもよいヒドロキシル基、オキソ基、保護基で保護されていてもよいカルボキシル基などの置換基を有していてもよい。環Ｚは例えばアダマンタン環等の多環の脂環式炭化水素環（橋かけ環式炭化水素環）であるのが好ましい。

In said formula, the ring Z shows the C5-C20 alicyclic hydrocarbon ring which may have a substituent. R ^b represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms which may have a substituent. R < ² > -R < ⁴ > is the same or different and shows the C1-C6 alkyl group which may have a substituent. R ⁵ is a substituent bonded to ring Z and is the same or different and is an oxo group, an alkyl group, a hydroxyl group which may be protected with a protecting group, or a hydroxyalkyl which may be protected with a protecting group Or a carboxyl group which may be protected with a protecting group. However, at least one of m R ⁵ represents a —COOR ^d group. R ^d represents a tertiary hydrocarbon group, a tetrahydrofuranyl group, a tetrahydropyranyl group, or an oxepanyl group which may have a substituent. m shows the integer of 1-3. R ⁶ and R ⁷ are the same or different and each represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms which may have a substituent. R ⁸ represents a hydrogen atom or an organic group. At least two of R ⁶ , R ⁷ and R ⁸ may be bonded to each other to form a ring with adjacent atoms.

In the formulas (7a), (7b), (7c), and (7d), the alicyclic hydrocarbon ring having 5 to 20 carbon atoms in the ring Z may be a single ring or a condensed ring or a bridged ring. It may be a ring. Typical alicyclic hydrocarbon rings include, for example, cyclohexane ring, cyclooctane ring, cyclodecane ring, adamantane ring, norbornane ring, norbornene ring, bornane ring, isobornane ring, perhydroindene ring, decalin ring, perhydrofluorene ring. (Tricyclo [7.4.0.0 ^3,8 ] tridecane ring), perhydroanthracene ring, tricyclo [5.2.1.0 ^2,6 ] decane ring, tricyclo [4.2.2.1 ^{2, 5} ] Undecane ring, tetracyclo [4.4.0.1 ^2,5 . 1 ^7,10 ] dodecane ring and the like. The alicyclic hydrocarbon ring includes an alkyl group such as a methyl group (eg, a C _1-4 alkyl group), a halogen atom such as a chlorine atom, a hydroxyl group optionally protected by a protecting group, an oxo group, a protected group It may have a substituent such as a carboxyl group which may be protected with a group. The ring Z is preferably a polycyclic alicyclic hydrocarbon ring (bridged hydrocarbon ring) such as an adamantane ring.

As the alkyl group having 1 to 6 carbon atoms which may have a substituent in R ^{2 to} R ⁴ , R ⁶ and R ⁷ in formulas (7a), (7b), (7c) and (7d), For example, a linear or branched alkyl group having 1 to 6 carbon atoms such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, s-butyl, t-butyl, hexyl group; carbon 1 such as trifluoromethyl group -6 haloalkyl groups and the like. In the formula (7c), examples of the alkyl group represented by R ⁵ include linear or methyl groups such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, s-butyl, t-butyl, hexyl, octyl, decyl, and dodecyl groups. Examples include branched chain alkyl groups having about 1 to 20 carbon atoms. Examples of the hydroxyl group that may be protected with a protecting group for R ⁵ include a hydroxyl group and a substituted oxy group (for example, a C _1-4 alkoxy group such as methoxy, ethoxy, propoxy group, etc.). Examples of the hydroxyalkyl group which may be protected with a protecting group include a group in which a hydroxyl group which may be protected with the protecting group is bonded via an alkylene group having 1 to 6 carbon atoms.

At least one of m R ^{5 s} represents a —COOR ^d group, and the R ^d may be a tertiary hydrocarbon group, a tetrahydrofuranyl group, a tetrahydropyranyl group, or an optionally substituted group. An oxepanyl group is shown. Examples of the tertiary hydrocarbon group include t-butyl, t-amyl, 2-methyl-2-adamantyl, (1-methyl-1-adamantyl) ethyl group, and the like. The tetrahydrofuranyl group includes a 2-tetrahydrofuranyl group, the tetrahydropyranyl group includes a 2-tetrahydropyranyl group, and the oxepanyl group includes a 2-oxepanyl group.

Examples of the organic group for R ⁸ include a group containing a hydrocarbon group and / or a heterocyclic group. The hydrocarbon group includes an aliphatic hydrocarbon group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group, and a group in which two or more of these are bonded. Examples of the aliphatic hydrocarbon group include linear or branched alkyl groups such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, s-butyl, t-butyl, hexyl, and octyl groups (C _{1- 8} alkyl groups); linear or branched alkenyl groups such as allyl groups (C _2-8 alkenyl groups, etc.); linear or branched alkynyl groups such as propynyl groups (C _2-8 alkynyl) Group, etc.). Examples of the alicyclic hydrocarbon group include cycloalkyl groups such as cyclopropyl, cyclopentyl, and cyclohexyl groups (3 to 8 membered cycloalkyl groups); cycloalkenyl groups such as cyclopentenyl and cyclohexenyl groups (3 to 8 members). Cycloalkenyl groups and the like); bridged carbocyclic groups such as adamantyl and norbornyl groups (C _4-20 bridged carbocyclic groups and the like) and the like. Examples of the aromatic hydrocarbon group include C _6-14 aromatic hydrocarbon groups such as phenyl and naphthyl groups. Examples of the group in which an aliphatic hydrocarbon group and an aromatic hydrocarbon group are bonded include benzyl and 2-phenylethyl groups. These hydrocarbon groups are protected with alkyl groups (C _1-4 alkyl groups, etc.), haloalkyl groups (C _1-4 haloalkyl groups, etc.), halogen atoms, hydroxyl groups that may be protected with protecting groups, and protecting groups. It may have a substituent such as a hydroxymethyl group which may be protected, a carboxyl group which may be protected with a protecting group, or an oxo group. As the protecting group, a protecting group conventionally used in the field of organic synthesis can be used.

  Examples of the heterocyclic group include heterocyclic groups containing at least one heteroatom selected from an oxygen atom, a sulfur atom and a nitrogen atom.

Preferred organic groups include C _1-8 alkyl groups, organic groups containing a cyclic skeleton, and the like. The “ring” constituting the cyclic skeleton includes a monocyclic or polycyclic non-aromatic or aromatic carbocyclic or heterocyclic ring. Of these, monocyclic or polycyclic non-aromatic carbocycles and lactone rings (which may be condensed with non-aromatic carbocycles) are particularly preferable. Examples of the monocyclic non-aromatic carbocycle include a cycloalkane ring having about 3 to 15 members such as a cyclopentane ring and a cyclohexane ring.

Examples of the polycyclic non-aromatic carbocyclic ring (bridged carbocyclic ring) include, for example, an adamantane ring; a norbornane ring, a norbornene ring, a bornane ring, an isobornane ring, a tricyclo [5.2.1.0 ^2,6 ] decane ring, Tetracyclo [4.4.0.1 ^2,5 . ^1,7,10 ] ring containing norbornane ring or norbornene ring such as dodecane ring; perhydroindene ring, decalin ring (perhydronaphthalene ring), perhydrofluorene ring (tricyclo [7.4.0.0 ^3,8 ] Tridecane ring), a ring in which a polycyclic aromatic condensed ring such as perhydroanthracene ring is hydrogenated (preferably a fully hydrogenated ring); a tricyclo [4.2.2.1 ^2,5 ] undecane ring, etc. And a bridged carbocyclic ring (for example, a bridged carbocyclic ring having about 6 to 20 carbon atoms). Examples of the lactone ring include a γ-butyrolactone ring, 4-oxatricyclo [4.3.1.1 ^3,8 ] undecan-5-one ring, and 4-oxatricyclo [4.2.1.0 ^{3. , 7} ] nonan-5-one ring, 4-oxatricyclo [5.2.1.0 ^2,6 ] decan-5-one ring, and the like.

The ring constituting the cyclic skeleton includes an alkyl group such as a methyl group (eg, a C _1-4 alkyl group), a haloalkyl group such as a trifluoromethyl group (eg, a C _1-4 haloalkyl group), a chlorine atom Or a halogen atom such as a fluorine atom, a hydroxyl group that may be protected with a protective group, a hydroxyalkyl group that may be protected with a protective group, a mercapto group that may be protected with a protective group, or a protective group. It may have a substituent such as a carboxyl group which may be protected, an amino group which may be protected with a protecting group, and a sulfonic acid group which may be protected with a protecting group. As the protecting group, a protecting group conventionally used in the field of organic synthesis can be used.

The ring constituting the cyclic skeleton may be directly bonded to an oxygen atom (oxygen atom adjacent to R ⁸ ) shown in the formula (7d) or may be bonded via a linking group. . Examples of the linking group include a linear or branched alkylene group such as methylene, methylmethylene, dimethylmethylene, ethylene, propylene, and trimethylene group; a carbonyl group; an oxygen atom (ether bond; —O—); an oxycarbonyl group ( An ester bond; —COO—); an aminocarbonyl group (amide bond; —CONH—); and a group in which a plurality of these are bonded.

At least two of R ⁶ , R ⁷ and R ⁸ may be bonded to each other to form a ring together with adjacent atoms. Examples of the ring include cycloalkane rings such as cyclopropane ring, cyclopentane ring and cyclohexane ring; oxygen-containing rings such as tetrahydrofuran ring, tetrahydropyran ring and oxepane ring; bridged ring and the like.

  In the compounds represented by formulas (7a) to (7d), stereoisomers may exist, respectively, but these can be used alone or as a mixture of two or more.

  Although the following compound is mentioned as a typical example of a compound represented by Formula (7a), It is not limited to these. 2- (meth) acryloyloxy-2-methyladamantane, 1-hydroxy-2- (meth) acryloyloxy-2-methyladamantane, 5-hydroxy-2- (meth) acryloyloxy-2-methyladamantane, 2- ( (Meth) acryloyloxy-2-ethyladamantane.

  Although the following compound is mentioned as a typical example of a compound represented by Formula (7b), It is not limited to these. 1- (1- (meth) acryloyloxy-1-methylethyl) adamantane, 1-hydroxy-3- (1- (meth) acryloyloxy-1-methylethyl) adamantane, 1- (1-ethyl-1- ( (Meth) acryloyloxypropyl) adamantane, 1- (1- (meth) acryloyloxy-1-methylpropyl) adamantane.

  Although the following compound is mentioned as a typical example of a compound represented by Formula (7c), It is not limited to these. 1-t-butoxycarbonyl-3- (meth) acryloyloxyadamantane, 1- (2-tetrahydropyranyloxycarbonyl) -3- (meth) acryloyloxyadamantane.

  Although the following compound is mentioned as a typical example of a compound represented by Formula (7d), It is not limited to these. 1-adamantyloxy-1-ethyl (meth) acrylate, 1-adamantylmethyloxy-1-ethyl (meth) acrylate, 2- (1-adamantylethyl) oxy-1-ethyl (meth) acrylate, 1-bornyloxy-1 -Ethyl (meth) acrylate, 2-norbornyloxy-1-ethyl (meth) acrylate, 2-tetrahydropyranyl (meth) acrylate, 2-tetrahydrofuranyl (meth) acrylate.

  The compound represented by the formula (7d) can be obtained, for example, by reacting the corresponding vinyl ether compound and (meth) acrylic acid by a conventional method using an acid catalyst. For example, 1-adamantyloxy-1-ethyl (meth) acrylate can be produced by reacting 1-adamantyl-vinyl-ether with (meth) acrylic acid in the presence of an acid catalyst.

  Another example of the polymerizable unsaturated monomer corresponding to the other monomer unit is a monomer that can impart or improve hydrophilicity or water solubility. Examples of such monomers include hydroxyl group-containing monomers (including compounds in which hydroxyl groups are protected), mercapto group-containing monomers (including compounds in which mercapto groups are protected), carboxyl groups Containing monomers (including compounds in which carboxyl groups are protected), amino group-containing monomers (including compounds in which amino groups are protected), sulfonic acid group-containing monomers (where sulfonic acid groups are protected) Polar group-containing monomers such as lactone skeleton-containing monomers, cyclic ketone skeleton-containing monomers, acid anhydride group-containing monomers, and imide group-containing monomers.

A typical example of the polar group-containing monomer is a monomer represented by the following formula (8).

上記式中、環Ｙは炭素数６〜２０の脂環式炭化水素環を示す。Ｒ^ｃは前記に同じ。Ｒ⁹は環Ｙに結合している置換基であって、同一又は異なって、オキソ基、アルキル基、保護基で保護されていてもよいヒドロキシル基、保護基で保護されていてもよいヒドロキシアルキル基、保護基で保護されていてもよいカルボキシル基、保護基で保護されていてもよいアミノ基、又は保護基で保護されていてもよいスルホン酸基を示す。但し、ｎ個のＲ⁹のうち少なくとも１つは、オキソ基、保護基で保護されていてもよいヒドロキシル基、保護基で保護されていてもよいヒドロキシアルキル基、保護基で保護されていてもよいカルボキシル基、保護基で保護されていてもよいアミノ基、又は保護基で保護されていてもよいスルホン酸基を示す。ｎは１〜５の整数を示す。

In said formula, the ring Y shows a C6-C20 alicyclic hydrocarbon ring. R ^c is the same as above. R ⁹ is a substituent bonded to ring Y and is the same or different and is an oxo group, an alkyl group, a hydroxyl group which may be protected with a protecting group, or a hydroxyalkyl which may be protected with a protecting group A carboxyl group that may be protected with a protecting group, an amino group that may be protected with a protecting group, or a sulfonic acid group that may be protected with a protecting group. However, at least one of n R ⁹ groups may be an oxo group, a hydroxyl group that may be protected with a protecting group, a hydroxyalkyl group that may be protected with a protecting group, or a protective group. A good carboxyl group, an amino group which may be protected with a protecting group, or a sulfonic acid group which may be protected with a protecting group. n shows the integer of 1-5.

The alicyclic hydrocarbon ring having 6 to 20 carbon atoms in the ring Y may be a single ring or a polycyclic ring such as a condensed ring or a bridged ring. Typical alicyclic hydrocarbon rings include, for example, cyclohexane ring, cyclooctane ring, cyclodecane ring, adamantane ring, norbornane ring, norbornene ring, bornane ring, isobornane ring, perhydroindene ring, decalin ring, perhydrofluorene ring. (Tricyclo [7.4.0.0 ^3,8 ] tridecane ring), perhydroanthracene ring, tricyclo [5.2.1.0 ^2,6 ] decane ring, tricyclo [4.2.2.1 ^{2, 5} ] Undecane ring, tetracyclo [4.4.0.1 ^2,5 . 1 ^7,10 ] dodecane ring and the like. The alicyclic hydrocarbon ring is protected with an alkyl group such as a methyl group (for example, a C _1-4 alkyl group), a haloalkyl group such as a trifluoromethyl group, a halogen atom such as a fluorine atom or a chlorine atom, or a protecting group. A hydroxyl group which may be protected, a hydroxyalkyl group which may be protected with a protecting group, a mercapto group which may be protected with a protecting group, an oxo group, a carboxyl group which may be protected with a protecting group, a protecting group It may have a substituent such as an amino group which may be protected with a sulfonic acid group which may be protected with a protecting group.

In formula (8), the alkyl group for R ⁹ is a linear or branched chain such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, s-butyl, t-butyl, hexyl, octyl, decyl, dodecyl group, etc. And an alkyl group having about 1 to 20 carbon atoms. Examples of the amino group that may be protected with a protecting group include an amino group and a substituted amino group (for example, C _1-4 alkylamino groups such as methylamino, ethylamino, propylamino group, etc.). Examples of the sulfonic acid group that may be protected with a protecting group include a —SO ₃ ^Re group. R ^e represents a hydrogen atom or an alkyl group, and examples of the alkyl group include linear or branched carbon such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, s-butyl, t-butyl, and hexyl groups. Examples thereof include alkyl groups of 1 to 6. R ⁹ may be protected with a protecting group, a hydroxyl group which may be protected with a protecting group, a hydroxyalkyl group which may be protected with a protecting group, a mercapto group which may be protected with a protecting group, or a carboxyl which may be protected with a protecting group The groups are the same as described above.

  Although the following compound is mentioned as a typical example of a compound represented by Formula (8), It is not limited to these. 1-hydroxy-3- (meth) acryloyloxyadamantane, 1,3-dihydroxy-5- (meth) acryloyloxyadamantane, 1-carboxy-3- (meth) acryloyloxyadamantane, 1,3-dicarboxy-5 (Meth) acryloyloxyadamantane, 1-carboxy-3-hydroxy-5- (meth) acryloyloxyadamantane, 1-t-butoxycarbonyl-3- (meth) acryloyloxyadamantane, 1,3-bis (t-butoxycarbonyl) ) -5- (meth) acryloyloxyadamantane, 1-t-butoxycarbonyl-3-hydroxy-5- (meth) acryloyloxyadamantane, 1- (2-tetrahydropyranyloxycarbonyl) -3- (meth) acryloyloxy Adamantane, , 3-bis (2-tetrahydropyranyloxycarbonyl) -5- (meth) acryloyloxyadamantane, 1-hydroxy-3- (2-tetrahydropyranyloxycarbonyl) -5- (meth) acryloyloxyadamantane, 1- (Meth) acryloyloxy-4-oxoadamantane.

As the polymer compound of the present invention, a monomer having a lactone skeleton excluding the monomer represented by the formula (I) may be used for copolymerization. Specific examples thereof include the following compounds. 1- (meth) acryloyloxy-4-oxatricyclo [4.3.1.1 ^3,8 ] undecan-5-one, 1-cyano-5- (meth) acryloyloxy-3-oxatricyclo [4 .2.1.0 ^4,8 ] nonan-2-one, 9-cyano-5- (meth) acryloyloxy-3-oxatricyclo [4.2.1.0 ^4,8 ] nonan-2-one 1- (meth) acryloyloxy-4,7-dioxatricyclo [4.4.1.1 ^3,9 ] dodecane-5,8-dione, 1- (meth) acryloyloxy-4,8-di Oxatricyclo [4.4.1.1 ^3,9 ] dodecane-5,7-dione, 1- (meth) acryloyloxy-5,7-dioxatricyclo [4.4.1.1 ^3,9 ] Dodecane-4,8-dione, 2- (meth) acryloyloxy-4-oxatrici B [4.2.1.0 ^{3, 7]} nonane-5-one, 2- (meth) acryloyloxy-2-methyl-4-oxatricyclo [4.2.1.0 ^3,7] nonane - 5-one, 2- (meth) acryloyloxy-6-methyl-4-oxatricyclo [4.2.1.0 ^3,7 ] nonan-5-one, 2- (meth) acryloyloxy-9-methyl -4-oxatricyclo [4.2.1.0 ^3,7 ] nonan-5-one, 2- (meth) acryloyloxy-9-carboxy-4-oxatricyclo [4.2.1.0 ^{3 , 7} ] nonan-5-one, 2- (meth) acryloyloxy-9-methoxycarbonyl-4-oxatricyclo [4.2.1.0 ^3,7 ] nonan-5-one, 2- (meth) Acryloyloxy-9-ethoxycarbonyl-4-oxatricyclo [4.2.1. ^3,7] nonane-5-one, 2- (meth) acryloyloxy -9-t-butoxycarbonyl-4-oxatricyclo [4.2.1.0 ^3,7] nonan-5-one, 8- (Meth) acryloyloxy-4-oxatricyclo [5.2.1.0 ^2,6 ] decan-5-one, 9- (meth) acryloyloxy-4-oxatricyclo [5.2.1.0 ^2,6 ] decan-5-one, 4- (meth) acryloyloxy-6-oxabicyclo [3.2.1] octane-7-one, 4- (meth) acryloyloxy-4-methyl-6-oxa Bicyclo [3.2.1] octane-7-one, 4- (meth) acryloyloxy-5-methyl-6-oxabicyclo [3.2.1] octane-7-one, 4- (meth) acryloyloxy -4,5-dimethyl-6-oxabici B [3.2.1] octane-7-one, 6- (meth) acryloyloxy-2-oxabicyclo [2.2.2] octane-3-one, 6- (meth) acryloyloxy-6-methyl 2-oxabicyclo [2.2.2] octane-3-one, 6- (meth) acryloyloxy-1-methyl-2-oxabicyclo [2.2.2] octane-3-one, 6- ( (Meth) acryloyloxy-1,6-dimethyl-2-oxabicyclo [2.2.2] octane-3-one, β- (meth) acryloyloxy-γ-butyrolactone, β- (meth) acryloyloxy-α, α-dimethyl-γ-butyrolactone, β- (meth) acryloyloxy-γ, γ-dimethyl-γ-butyrolactone, β- (meth) acryloyloxy-α, α, β-trimethyl-γ-butyrola , Β- (meth) acryloyloxy-β, γ, γ-trimethyl-γ-butyrolactone, β- (meth) acryloyloxy-α, α, β, γ, γ-pentamethyl-γ-butyrolactone, α- (meta ) Acrylyloxy-γ-butyrolactone, α- (meth) acryloyloxy-α-methyl-γ-butyrolactone, α- (meth) acryloyloxy-β, β-dimethyl-γ-butyrolactone, α- (meth) acryloyloxy- α, β, β-trimethyl-γ-butyrolactone, α- (meth) acryloyloxy-γ, γ-dimethyl-γ-butyrolactone, α- (meth) acryloyloxy-α, γ, γ-trimethyl-γ-butyrolactone, α- (meth) acryloyloxy-β, β, γ, γ-tetramethyl-γ-butyrolactone, α- (meth) acryloyloxy-α, , Β, γ, γ- pentamethyl -γ- butyrolactone, .gamma. (meth) acryloyloxy-gamma, .gamma.-dimethyl -γ- butyrolactone.

  The polymer compound of the present invention may further contain, for example, acrylic acid, methacrylic acid, maleic anhydride, maleimide and the like as a copolymerization component.

  In the polymer compound of the present invention, the proportion of the monomer unit represented by the formula (1) is not particularly limited, but is generally 1 to 90 mol%, preferably 5 to 80, based on all monomer units constituting the polymer. It is about mol%, More preferably, it is about 10-60 mol%. Moreover, the ratio of the monomer unit corresponding to the monomer which can produce | generate a carboxyl group by decomposition reaction etc. is 10-95 mol%, for example, Preferably it is 15-90 mol%, More preferably, it is about 20-60 mol%. . The proportion of monomer units corresponding to at least one monomer selected from a hydroxyl group-containing monomer, a mercapto group-containing monomer, and a carboxyl group-containing monomer is, for example, 0 to 95 mol%, preferably 5 It is about -90 mol%, More preferably, it is about 10-50 mol%.

  In obtaining the polymer compound of the present invention, the polymerization of the monomer mixture is carried out by a conventional method used for producing an acrylic polymer, such as solution polymerization, bulk polymerization, suspension polymerization, bulk-suspension polymerization, and emulsion polymerization. Although it can be performed, solution polymerization is particularly preferred. Furthermore, drop polymerization is preferable among solution polymerization. Specifically, for example, (i) a monomer solution previously dissolved in an organic solvent and a polymerization initiator solution dissolved in an organic solvent are prepared in an organic solvent kept at a constant temperature. A method in which the monomer solution and the polymerization initiator solution are respectively dropped, and (ii) a method in which a mixed solution in which the monomer and the polymerization initiator are dissolved in an organic solvent is dropped into an organic solvent maintained at a constant temperature. (Iii) A monomer solution previously dissolved in an organic solvent and a polymerization initiator solution dissolved in the organic solvent are respectively prepared, and the polymerization initiator solution is dropped into the monomer solution maintained at a constant temperature. It is performed by a method or the like.

  As the polymerization solvent, a known solvent can be used. For example, ether (chain ether such as diethyl ether, propylene glycol monomethyl ether, etc., chain ether such as tetrahydrofuran, dioxane, etc.), ester (methyl acetate, ethyl acetate, Glycol ether esters such as butyl acetate, ethyl lactate, propylene glycol monomethyl ether acetate), ketones (acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, etc.), amides (N, N-dimethylacetamide, N, N-dimethylformamide, etc.) ), Sulfoxide (dimethylsulfoxide, etc.), alcohol (methanol, ethanol, propanol, etc.), hydrocarbon (aromatic hydrocarbons such as benzene, toluene, xylene, etc.) Aliphatic hydrocarbons such as hexane, and alicyclic hydrocarbons such as cyclohexane), and mixtures of these solvents. Moreover, a well-known polymerization initiator can be used as a polymerization initiator. The polymerization temperature can be appropriately selected within a range of about 30 to 150 ° C., for example.

  The polymer obtained by polymerization can be purified by precipitation or reprecipitation. The precipitation or reprecipitation solvent may be either an organic solvent or water, or a mixed solvent. Examples of the organic solvent used as the precipitation or reprecipitation solvent include hydrocarbons (aliphatic hydrocarbons such as pentane, hexane, heptane, and octane; alicyclic hydrocarbons such as cyclohexane and methylcyclohexane; aromatics such as benzene, toluene, and xylene. Aromatic hydrocarbons), halogenated hydrocarbons (halogenated aliphatic hydrocarbons such as methylene chloride, chloroform and carbon tetrachloride; halogenated aromatic hydrocarbons such as chlorobenzene and dichlorobenzene), nitro compounds (nitromethane, nitroethane, etc.) , Nitrile (acetonitrile, benzonitrile, etc.), ether (chain ether such as diethyl ether, diisopropyl ether, dimethoxyethane; cyclic ether such as tetrahydrofuran, dioxane), ketone (acetone, methyl ethyl ketone) Diisobutyl ketone, etc.), ester (ethyl acetate, butyl acetate, etc.), carbonate (dimethyl carbonate, diethyl carbonate, ethylene carbonate, propylene carbonate, etc.), alcohol (methanol, ethanol, propanol, isopropyl alcohol, butanol, etc.), carboxylic acid (acetic acid, etc.) Etc.), and mixed solvents containing these solvents.

  Among these, as the organic solvent used as the precipitation or reprecipitation solvent, a solvent containing at least a hydrocarbon (particularly an aliphatic hydrocarbon such as hexane) is preferable. In such a solvent containing at least hydrocarbon, the ratio of hydrocarbon (for example, aliphatic hydrocarbon such as hexane) and other solvent is, for example, the former / the latter (volume ratio; 25 ° C.) = 10/90 to 99 / 1, preferably the former / the latter (volume ratio; 25 ° C.) = 30/70 to 98/2, more preferably the former / the latter (volume ratio; 25 ° C.) = 50/50 to 97/3.

The weight average molecular weight (Mw) of the polymer compound is, for example, about 1000 to 500000, preferably about 3000 to 50000, and the molecular weight distribution (Mw / Mn) is, for example, about 1.5 to 2.5. In addition, said Mn shows a number average molecular weight, and both Mn and Mw are values of polystyrene conversion.
Since the polymer compound of the present invention has high stability such as chemical resistance, is excellent in solubility in organic solvents, and is excellent in hydrolysis and solubility in water after hydrolysis, it has high functionality in various fields. Can be used as a polymer.

  Hereinafter, the present invention will be described in detail based on examples, but the present invention is not limited to the examples.

  A weight average molecular weight (Mw) and a number average molecular weight (Mn) show the standard polystyrene conversion value calculated | required by GPC measurement using a tetrahydrofuran solvent using the refractometer (RI). GPC was performed using three Showa Denko column KF-806Ls connected in series under conditions of a column temperature of 40 ° C., an RI temperature of 40 ° C., and a tetrahydrofuran flow rate of 0.8 ml / min. The degree of dispersion (Mw / Mn) was calculated from the measured values.

Production Example 1
Α-methyl-5-norbornene-2-acetic acid was produced according to the following reaction formula.

プロピオン酸ソーダ３０ｇ、ソーダミド（ＮａＮＨ_２）１０ｇ、２，５−ノルボルナジエン５０ｇをオートクレーブに仕込み、窒素で５０気圧に昇圧後、２００から２５０℃で４．５時間加熱した。その後、室温まで冷却し、圧力パージした。反応物は氷水２００ｇに添加して混合し、エチルエーテル２００ｇで抽出した。水層はろ過後塩酸で酸性としてエチルエーテル２００ｇで２回抽出した。抽出液は濃縮後、カラムクロマトグラフィーにて目的物を分離し、濃縮して次工程の反応に使用した。

30 g of sodium propionate, 10 g of sodamide (NaNH ₂ ) and 50 g of 2,5-norbornadiene were charged into an autoclave, and the pressure was increased to 50 atm with nitrogen, followed by heating at 200 to 250 ° C. for 4.5 hours. Then, it cooled to room temperature and pressure purged. The reaction product was added to 200 g of ice water, mixed, and extracted with 200 g of ethyl ether. The aqueous layer was filtered, acidified with hydrochloric acid, and extracted twice with 200 g of ethyl ether. The extract was concentrated, and the target product was separated by column chromatography, concentrated and used for the next reaction.

Example 1
2-Methyl-6-methacryloyloxy-4-oxatricyclo [5.2.1.0 ^5,9 ] decan-3-one was prepared according to the following reaction scheme.

α−メチル−５−ノルボルネン−２−酢酸６０ｇ（０．３６モル）を塩化メチレン５０１ｇに溶解させ、５℃以下に冷却しながら、ｍ−ＣＰＢＡ（ｍ−クロロ過安息香酸）１１５ｇをゆっくり投入した。４時間後、亜硫酸ナトリウム水溶液を加えて過剰の過酸化物を分解した後、炭酸水素ナトリウム水溶液で有機層を洗浄した。有機層［式（4a）で表される化合物を含む］に、ギ酸１５０ｇ、水３０３ｇを仕込み、５０℃まで昇温し、４時間撹拌を続けた。水層に生成物が無くなるまで酢酸エチルで抽出した。有機層を合わせ、濃縮することにより、２−メチル−６−ヒドロキシ−４−オキサトリシクロ［５．２．１．０^5,9］デカン−３−オン（粗生成物）を２３ｇ得た。

60 g (0.36 mol) of α-methyl-5-norbornene-2-acetic acid was dissolved in 501 g of methylene chloride, and 115 g of m-CPBA (m-chloroperbenzoic acid) was slowly added while cooling to 5 ° C. or lower. . After 4 hours, an aqueous sodium sulfite solution was added to decompose excess peroxide, and the organic layer was washed with an aqueous sodium hydrogen carbonate solution. Into the organic layer [including the compound represented by the formula (4a)] was charged 150 g of formic acid and 303 g of water, and the temperature was raised to 50 ° C. and stirring was continued for 4 hours. Extraction with ethyl acetate until no product in the aqueous layer. The organic layers were combined and concentrated to obtain 23 g of 2-methyl-6-hydroxy-4-oxatricyclo [5.2.1.0 ^5,9 ] decan-3-one (crude product).

23 g of the compound (crude product) obtained above was dissolved in 252 g of tetrahydrofuran (THF), 16.9 g of triethylamine and 0.2 g of hydroquinone were added, and 18.3 g of methacrylic acid chloride (3a) was cooled while cooling at 5 ° C. Was added dropwise. 300 ml of water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with an aqueous sodium hydrogen carbonate solution and water, the organic layer was concentrated, and the concentrate was crystallized with diisopropyl ether to give 2- 14 g of methyl-6- (meth) acryloyloxy-4-oxatricyclo [5.2.1.0 ^5,9 ] decan-3-one was obtained.
[Spectral data of 2-methyl-6- (meth) acryloyloxy-4-oxatricyclo [5.2.1.0 ^5,9 ] decan-3-one]
¹ H-NMR (CDCl ₃ ) δ: 1.05 (1H), 1.20 (3H), 1.59 (1H), 1.87 (1H), 1.94 (3H), 2.18 (1H), 2.40-2.50 (3H), 2.57 (1H ), 4.60 (1H), 4.75 (1H), 5.60 (1H), 6.12 (1H)
Example 2
Manufacture of high molecular compound for photoresist containing resin of the following structure

還流管、撹拌子、３方コック、温度計を備えた丸底フラスコに、窒素雰囲気下、プロピレングリコールモノメチルエーテルアセテート（ＰＧＭＥＡ）３５．７ｇ、及びプロピレングリコールモノメチルエーテル（ＰＧＭＥ）２３．８ｇを入れて温度を８０℃に保ち、撹拌しながら、２−メチル−６−メタクリロイルオキシ−４−オキサトリシクロ［５．２．１．０^5,9］デカン−３−オン１１．８２ｇ（４７．２ｍｍｏｌ）、１−ヒドロキシ−３−メタクリロイルオキシアダマンタン５．６５ｇ（２３．９ｍｍｏｌ）、１−（１−メタクリロイルオキシ−１−メチルエチル）アダマンタン１２．５４ｇ（４７．８ｍｍｏｌ）、ジメチル ２，２’−アゾビスイソブチレート（和光純薬工業製Ｖ−６０１）１．８０ｇ、ＰＧＭＥＡ６６．３ｇ、及びＰＧＭＥ４４．２ｇを混合したモノマー溶液を６時間かけて一定速度で滴下した。滴下終了後、さらに２時間撹拌を続けた。重合反応終了後、得られた反応溶液を孔径０．１μｍのフィルターで濾過した後、該反応溶液の７倍量のヘキサンと酢酸エチルの９：１（体積比；２５℃）混合液中に撹拌しながら滴下した。生じた沈殿物を濾別することにより、所望の樹脂２８．５ｇを得た。回収したポリマーをＧＰＣ分析したところ、Ｍｗ（重量平均分子量）が８６００、分散度（Ｍｗ/Ｍｎ）が１．９０であった。

In a nitrogen atmosphere, 35.7 g of propylene glycol monomethyl ether acetate (PGMEA) and 23.8 g of propylene glycol monomethyl ether (PGME) were placed in a round bottom flask equipped with a reflux tube, a stirring bar, a three-way cock, and a thermometer. While maintaining the temperature at 80 ° C., with stirring, 2-methyl-6-methacryloyloxy-4-oxatricyclo [5.2.1.0 ^5,9 ] decan-3-one 11.82 g (47.2 mmol) 1-hydroxy-3-methacryloyloxyadamantane 5.65 g (23.9 mmol), 1- (1-methacryloyloxy-1-methylethyl) adamantane 12.54 g (47.8 mmol), dimethyl 2,2′-azobis 1.80 g of isobutyrate (V-601 manufactured by Wako Pure Chemical Industries), 66.3 g of PGMEA, and A monomer solution mixed with 44.2 g of PGME was added dropwise at a constant rate over 6 hours. After completion of the dropwise addition, stirring was continued for another 2 hours. After completion of the polymerization reaction, the obtained reaction solution was filtered with a filter having a pore size of 0.1 μm, and then stirred in a 9: 1 (volume ratio; 25 ° C.) mixture of hexane and ethyl acetate in an amount 7 times that of the reaction solution. While dripping. The resulting precipitate was filtered off to obtain 28.5 g of the desired resin. When the collected polymer was analyzed by GPC, it was found that the Mw (weight average molecular weight) was 8600 and the dispersity (Mw / Mn) was 1.90.

Example 3
Manufacture of high molecular compound for photoresist containing resin of the following structure

実施例２において、モノマー成分として、２−メチル−６−メタクリロイルオキシ−４−オキサトリシクロ［５．２．１．０^5,9］デカン−３−オン１２．６２ｇ（５０．４ｍｍｏｌ）、１−ヒドロキシ−３−メタクリロイルオキシアダマンタン６．０３ｇ（２５．６ｍｍｏｌ）、２−（１−メタクリロイルオキシ−１−メチルエチル）ノルボルナン１１．３５ｇ（５１．１ｍｍｏｌ）を用いた以外は、実施例１と同様の操作を行ったところ、所望の樹脂２７．９ｇを得た。回収したポリマーをＧＰＣ分析したところ、重量平均分子量（Ｍｗ）が８８００、分子量分布（Ｍｗ／Ｍｎ）が１．８８であった。

In Example 2, as a monomer component, 12.62 g (50.4 mmol) of 2-methyl-6-methacryloyloxy-4-oxatricyclo [5.2.1.0 ^5,9 ] decan-3-one, 1 Similar to Example 1 except that 6.03-g (25.6 mmol) of 2-hydroxy-3-methacryloyloxyadamantane and 11.35 g (51.1 mmol) of 2- (1-methacryloyloxy-1-methylethyl) norbornane were used. As a result, 27.9 g of the desired resin was obtained. When the recovered polymer was analyzed by GPC, the weight average molecular weight (Mw) was 8800, and the molecular weight distribution (Mw / Mn) was 1.88.

Example 4
Manufacture of high molecular compound for photoresist containing resin of the following structure

実施例２において、モノマー成分として、２−メチル−６−メタクリロイルオキシ−４−オキサトリシクロ［５．２．１．０^5,9］デカン−３−オン１２．５８ｇ（５０．３ｍｍｏｌ）、１−ヒドロキシ−３−メタクリロイルオキシアダマンタン６．０１ｇ（２５．５ｍｍｏｌ）、１−（１−メタクリロイルオキシ−１−メチルエチル）−３−メチルシクロヘキサン１１．４１ｇ（５０．９ｍｍｏｌ）を用いた以外は、実施例１と同様の操作を行ったところ、所望の樹脂２７．４ｇを得た。回収したポリマーをＧＰＣ分析したところ、重量平均分子量（Ｍｗ）が９１００、分子量分布（Ｍｗ／Ｍｎ）が１．９５であった。

In Example 2, as a monomer component, 2-methyl-6-methacryloyloxy-4-oxatricyclo [5.2.1.0 ^5,9 ] decan-3-one 12.58 g (50.3 mmol), 1 Except that 6.01 g (25.5 mmol) of 1-hydroxy-3-methacryloyloxyadamantane and 11.41 g (50.9 mmol) of 1- (1-methacryloyloxy-1-methylethyl) -3-methylcyclohexane were used. When the same operation as in Example 1 was performed, 27.4 g of the desired resin was obtained. When the recovered polymer was analyzed by GPC, the weight average molecular weight (Mw) was 9100, and the molecular weight distribution (Mw / Mn) was 1.95.

Example 5
Manufacture of high molecular compound for photoresist containing resin of the following structure

実施例２において、モノマー成分として、２−メチル−６−メタクリロイルオキシ−４−オキサトリシクロ［５．２．１．０^5,9］デカン−３−オン１２．８９ｇ（５１．５ｍｍｏｌ）、１−ヒドロキシ−３−メタクリロイルオキシアダマンタン６．１６ｇ（２６．１ｍｍｏｌ）、１−（１−メタクリロイルオキシ−１−メチルエチル）シクロヘキサン１０．９６ｇ（５２．２ｍｍｏｌ）を用いた以外は、実施例１と同様の操作を行ったところ、所望の樹脂２６．７ｇを得た。回収したポリマーをＧＰＣ分析したところ、重量平均分子量（Ｍｗ）が９０００、分子量分布（Ｍｗ／Ｍｎ）が１．８６であった。

In Example 2, as the monomer component, 2-methyl-6-methacryloyloxy-4-oxatricyclo [5.2.1.0 ^5,9 ] decan-3-one 12.89 g (51.5 mmol), 1 Similar to Example 1 except that 6.16 g (26.1 mmol) of 1-hydroxy-3-methacryloyloxyadamantane and 10.96 g (52.2 mmol) of 1- (1-methacryloyloxy-1-methylethyl) cyclohexane were used. As a result, 26.7 g of the desired resin was obtained. When the collected polymer was analyzed by GPC, the weight average molecular weight (Mw) was 9000 and the molecular weight distribution (Mw / Mn) was 1.86.

Example 6
Manufacture of high molecular compound for photoresist containing resin of the following structure

実施例２において、モノマー成分として、２−メチル−６−メタクリロイルオキシ−４−オキサトリシクロ［５．２．１．０^5,9］デカン−３−オン１２．３７ｇ（４９．４ｍｍｏｌ）、１−ヒドロキシ−３−メタクリロイルオキシアダマンタン５．９１ｇ（２５．０ｍｍｏｌ）、２−メタクリロイルオキシ−２−メチルアダマンタン１１．７２ｇ（５０．１ｍｍｏｌ）を用いた以外は、実施例１と同様の操作を行ったところ、所望の樹脂２６．１ｇを得た。回収したポリマーをＧＰＣ分析したところ、重量平均分子量（Ｍｗ）が９２００、分子量分布（Ｍｗ／Ｍｎ）が１．９０であった。

In Example 2, 2-methyl-6-methacryloyloxy-4-oxatricyclo [5.2.1.0 ^5,9 ] decan-3-one 12.37 g (49.4 mmol), 1 The same operation as in Example 1 was performed except that 5.91 g (25.0 mmol) of 2-hydroxy-3-methacryloyloxyadamantane and 11.72 g (50.1 mmol) of 2-methacryloyloxy-2-methyladamantane were used. As a result, 26.1 g of the desired resin was obtained. When the collected polymer was analyzed by GPC, it was found that the weight average molecular weight (Mw) was 9200 and the molecular weight distribution (Mw / Mn) was 1.90.

Example 7
Manufacture of high molecular compound for photoresist containing resin of the following structure

実施例２において、モノマー成分として、２−メチル−６−メタクリロイルオキシ−４−オキサトリシクロ［５．２．１．０^5,9］デカン−３−オン１３．２１ｇ（５２．８ｍｍｏｌ）、１−ヒドロキシ−３−メタクリロイルオキシアダマンタン６．３１ｇ（２６．７ｍｍｏｌ）、１−メタクリロイルオキシ−１−エチルシクロヘキサン１０．４８ｇ（５３．５ｍｍｏｌ）を用いた以外は、実施例１と同様の操作を行ったところ、所望の樹脂２４．９ｇを得た。回収したポリマーをＧＰＣ分析したところ、重量平均分子量（Ｍｗ）が９６００、分子量分布（Ｍｗ／Ｍｎ）が２．００であった。

In Example 2, as a monomer component, 2-methyl-6-methacryloyloxy-4-oxatricyclo [5.2.1.0 ^5,9 ] decan-3-one 13.21 g (52.8 mmol), 1 The same operation as in Example 1 was performed except that 6.31 g (26.7 mmol) of 1-hydroxy-3-methacryloyloxyadamantane and 10.48 g (53.5 mmol) of 1-methacryloyloxy-1-ethylcyclohexane were used. As a result, 24.9 g of the desired resin was obtained. When the recovered polymer was analyzed by GPC, the weight average molecular weight (Mw) was 9600, and the molecular weight distribution (Mw / Mn) was 2.00.

Comparative Example 1
Manufacture of high molecular compound for photoresist containing resin of the following structure

実施例２において、モノマー成分として、５−メタクリロイルオキシ−２，６−ノルボルナンカルボラクトン１１．０６ｇ（４９．８ｍｍｏｌ）、１−ヒドロキシ−３−メタクリロイルオキシアダマンタン５．８８ｇ（２４．９ｍｍｏｌ）、１−（１−メタクリロイルオキシ−１−メチルエチル）アダマンタン１３．０６ｇ（４９．８ｍｍｏｌ）を用いた以外は、実施例２と同様の操作を行ったところ、所望の樹脂２８．０ｇを得た。回収したポリマーをＧＰＣ分析したところ、重量平均分子量（Ｍｗ）が８６００、分子量分布（Ｍｗ／Ｍｎ）が１．８７であった。

In Example 2, as monomer components, 5-methacryloyloxy-2,6-norbornanecarbolactone 11.06 g (49.8 mmol), 1-hydroxy-3-methacryloyloxyadamantane 5.88 g (24.9 mmol), 1- The same operation as in Example 2 was carried out except that 13.06 g (49.8 mmol) of (1-methacryloyloxy-1-methylethyl) adamantane was used, and 28.0 g of the desired resin was obtained. When the recovered polymer was analyzed by GPC, the weight average molecular weight (Mw) was 8600, and the molecular weight distribution (Mw / Mn) was 1.87.

Comparative Example 2
Manufacture of high molecular compound for photoresist containing resin of the following structure

実施例２において、モノマー成分として、５−メタクリロイルオキシ−２，６−ノルボルナンカルボラクトン１１．８５ｇ（５３．４ｍｍｏｌ）、１−ヒドロキシ−３−メタクリロイルオキシアダマンタン６．３０ｇ（２６．７ｍｍｏｌ）、２−（１−メタクリロイルオキシ−１−メチルエチル）ノルボルナン１１．８５ｇ（５３．４ｍｍｏｌ）を用いた以外は、実施例２と同様の操作を行ったところ、所望の樹脂２６．９ｇを得た。回収したポリマーをＧＰＣ分析したところ、重量平均分子量（Ｍｗ）が９２００、分子量分布（Ｍｗ／Ｍｎ）が１．９３であった。
比較例３
下記構造の樹脂を含むフォトレジスト用高分子化合物の製造

In Example 2, as monomer components, 5-methacryloyloxy-2,6-norbornanecarbolactone 11.85 g (53.4 mmol), 1-hydroxy-3-methacryloyloxyadamantane 6.30 g (26.7 mmol), 2- The same operation as in Example 2 was performed except that 11.85 g (53.4 mmol) of (1-methacryloyloxy-1-methylethyl) norbornane was used, and 26.9 g of a desired resin was obtained. When the recovered polymer was analyzed by GPC, the weight average molecular weight (Mw) was 9200, and the molecular weight distribution (Mw / Mn) was 1.93.
Comparative Example 3
Manufacture of high molecular compound for photoresist containing resin of the following structure

実施例２において、モノマー成分として、５−メタクリロイルオキシ−２，６−ノルボルナンカルボラクトン１１．８１ｇ（５３．２ｍｍｏｌ）、１−ヒドロキシ−３−メタクリロイルオキシアダマンタン６．２８ｇ（２６．６ｍｍｏｌ）、１−（１−メタクリロイルオキシ−１−メチルエチル）−３−メチルシクロヘキサン１１．９１ｇ（５３．２ｍｍｏｌ）を用いた以外は、実施例２と同様の操作を行ったところ、所望の樹脂２６．４ｇを得た。回収したポリマーをＧＰＣ分析したところ、重量平均分子量（Ｍｗ）が９１００、分子量分布（Ｍｗ／Ｍｎ）が１．９０であった。
比較例４
下記構造の樹脂を含むフォトレジスト用高分子化合物の製造

In Example 2, as monomer components, 5-methacryloyloxy-2,6-norbornanecarbolactone 11.81 g (53.2 mmol), 1-hydroxy-3-methacryloyloxyadamantane 6.28 g (26.6 mmol), 1- The same operation as in Example 2 was performed except that 11.91 g (53.2 mmol) of (1-methacryloyloxy-1-methylethyl) -3-methylcyclohexane was used, and 26.4 g of a desired resin was obtained. It was. When the collected polymer was analyzed by GPC, the weight average molecular weight (Mw) was 9100, and the molecular weight distribution (Mw / Mn) was 1.90.
Comparative Example 4
Manufacture of high molecular compound for photoresist containing resin of the following structure

実施例２において、モノマー成分として、５−メタクリロイルオキシ−２，６−ノルボルナンカルボラクトン１２．１１ｇ（５４．５ｍｍｏｌ）、１−ヒドロキシ−３−メタクリロイルオキシアダマンタン６．４４ｇ（２７．３ｍｍｏｌ）、１−（１−メタクリロイルオキシ−１−メチルエチル）シクロヘキサン１１．４５ｇ（５４．５ｍｍｏｌ）を用いた以外は、実施例２と同様の操作を行ったところ、所望の樹脂２６．２ｇを得た。回収したポリマーをＧＰＣ分析したところ、重量平均分子量（Ｍｗ）が９４００、分子量分布（Ｍｗ／Ｍｎ）が１．９８であった。

In Example 2, as monomer components, 5-methacryloyloxy-2,6-norbornanecarbolactone 12.11 g (54.5 mmol), 1-hydroxy-3-methacryloyloxyadamantane 6.44 g (27.3 mmol), 1- The same operation as in Example 2 was performed except that 11.45 g (54.5 mmol) of (1-methacryloyloxy-1-methylethyl) cyclohexane was used, to obtain 26.2 g of the desired resin. When the recovered polymer was analyzed by GPC, the weight average molecular weight (Mw) was 9400, and the molecular weight distribution (Mw / Mn) was 1.98.

Evaluation test (solvent solubility)
About each resin obtained in the said Examples 2-7 and Comparative Examples 1-4, PGMEA (propylene glycol monomethyl ether acetate) / PGME (propylene glycol monomethyl ether) = 6/4 (weight ratio) mixed solvent was added, and it was a polymer. The concentration was adjusted to 10% by weight. The obtained polymer solution was applied onto a silicon wafer by a spin coating method and subjected to a heat treatment at a temperature of 120 ° C. for 90 seconds to form a polymer layer having a thickness of about 0.4 μm, and then the uniformity of the film was confirmed. When the surface of the film did not form a uniform solution, striation occurred. Although Examples 2-7 were completely uniform surfaces, Comparative Examples 1-4 showed roughness and striations in the surface state.

Claims (8)

Formula (I)

(In the formula, R ^a represents a hydrogen atom, a halogen atom, or an alkyl group having 1 to 6 carbon atoms which may have a halogen atom, R ¹ represents a methyl group, A represents a methylene group, an oxygen atom, or A monomer for photoresist represented by a sulfur atom). Following formula (1)

(In the formula, R ^a represents a hydrogen atom, a halogen atom, or an alkyl group having 1 to 6 carbon atoms which may have a halogen atom, R ¹ represents a methyl group, A represents a methylene group, an oxygen atom, or A polymer compound for photoresists having a monomer unit represented by: The polymer compound further includes the following formulas (2a) to (2d):

(In the formula, ring Z represents an alicyclic hydrocarbon ring having 5 to 20 carbon atoms which may have a substituent. R ^b represents 1 to 1 carbon atoms which may have a hydrogen atom or a substituent. 6 represents an alkyl group of 6. R ^{2 to} R ⁴ are the same or different and each represents an optionally substituted alkyl group having 1 to 6 carbon atoms, and R ⁵ represents a substituent bonded to ring Z. The same or different, an oxo group, an alkyl group, a hydroxyl group that may be protected with a protecting group, a hydroxyalkyl group that may be protected with a protecting group, or a group that is protected with a protecting group A good carboxyl group, provided that at least one of m R ⁵ represents a —COOR ^d group, wherein R ^d is a tertiary hydrocarbon group or a tetrahydrofuranyl group which may have a substituent; , Tetrahydropyranyl group, or oxepanyl group, m is .R ^6, R ⁷ indicating a to 3 integers are the same or different, a hydrogen atom or a substituted showing also alkyl group having 1 to 6 carbon atoms .R ⁸ is hydrogen atom or an organic group 3. At least two monomer units selected from R ⁶ , R ⁷ and R ⁸ may be bonded to each other to form a ring together with adjacent atoms. High molecular compound for photoresist. The polymer compound is further represented by the following formula (3):

(In the formula, ring Y represents a bridged alicyclic hydrocarbon ring having 6 to 20 carbon atoms. R ^c represents a hydrogen atom or an optionally substituted alkyl group having 1 to 6 carbon atoms. R ⁹ is a substituent bonded to ring Y and is the same or different and is an oxo group, an alkyl group, a hydroxyl group which may be protected with a protecting group, or a hydroxyalkyl which may be protected with a protecting group Or a carboxyl group which may be protected by a protecting group, wherein n is the number of R ⁹ and represents an integer of 1 to 5). The high molecular compound for photoresists of 2 or 3.   The polymer compound for photoresists according to any one of claims 2 to 4, having a weight average molecular weight of 1,000 to 50,000.   The molecular weight distribution is 1.0 to 3.0, The polymer compound for photoresists according to any one of claims 2 to 4.   A photoresist composition comprising the polymer compound for photoresist according to claim 2 and at least a photoacid generator. A pattern is formed using the photoresist composition of Claim 7, The manufacturing method of the semiconductor characterized by the above-mentioned.