JP4901719B2 - 単分散SiO2粒子の製造方法 - Google Patents
単分散SiO2粒子の製造方法 Download PDFInfo
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- JP4901719B2 JP4901719B2 JP2007502215A JP2007502215A JP4901719B2 JP 4901719 B2 JP4901719 B2 JP 4901719B2 JP 2007502215 A JP2007502215 A JP 2007502215A JP 2007502215 A JP2007502215 A JP 2007502215A JP 4901719 B2 JP4901719 B2 JP 4901719B2
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- INJVFBCDVXYHGQ-UHFFFAOYSA-N n'-(3-triethoxysilylpropyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCN INJVFBCDVXYHGQ-UHFFFAOYSA-N 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- 230000000269 nucleophilic effect Effects 0.000 description 1
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 description 1
- MSRJTTSHWYDFIU-UHFFFAOYSA-N octyltriethoxysilane Chemical compound CCCCCCCC[Si](OCC)(OCC)OCC MSRJTTSHWYDFIU-UHFFFAOYSA-N 0.000 description 1
- 229960003493 octyltriethoxysilane Drugs 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 229940092253 ovalbumin Drugs 0.000 description 1
- 229940072417 peroxidase Drugs 0.000 description 1
- 108040007629 peroxidase activity proteins Proteins 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 108040000983 polyphosphate:AMP phosphotransferase activity proteins Proteins 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 102000004196 processed proteins & peptides Human genes 0.000 description 1
- 108090000765 processed proteins & peptides Proteins 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 239000012429 reaction media Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000035040 seed growth Effects 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000007928 solubilization Effects 0.000 description 1
- 238000005063 solubilization Methods 0.000 description 1
- 238000000527 sonication Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
- PXQLVRUNWNTZOS-UHFFFAOYSA-N sulfanyl Chemical group [SH] PXQLVRUNWNTZOS-UHFFFAOYSA-N 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000012581 transferrin Substances 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- SHIJTLJNEIRZOO-UHFFFAOYSA-N triethoxy(3-isothiocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=S SHIJTLJNEIRZOO-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- WUMSTCDLAYQDNO-UHFFFAOYSA-N triethoxy(hexyl)silane Chemical compound CCCCCC[Si](OCC)(OCC)OCC WUMSTCDLAYQDNO-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- FZMJEGJVKFTGMU-UHFFFAOYSA-N triethoxy(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OCC)(OCC)OCC FZMJEGJVKFTGMU-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
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- C09C1/30—Silicic acid
- C09C1/3081—Treatment with organo-silicon compounds
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Description
従って本発明は、テトラアルコキシシランおよび/または有機トリアルコキシシランの加水分解重縮合により球状SiO2粒子を製造する方法に関し、ここで加水分解重縮合は、水、1種または2種以上の可溶化剤および1種または2種以上のアミンを含む媒体中で行われ、そしてここで高度に単分散で無孔質の粒子を得る。
一般に、末端シリル化(蛍光)染料それ自体および必要な反応中間体の精製および特徴づけは、ここでは省略することができるが、ただし、これは原則として可能であり、慣用の手段および方法が用いられる。
テトラアルコキシシランおよび/または有機トリアルコキシシランおよび末端シリル化(蛍光)染料前駆体の共重縮合は、25℃〜78℃に温度調節され撹拌された反応装置内で、標準の方法により、同様に行うことができる。
本発明の方法により製造されたこれらの有機的に修飾されたSiO2粒子は、特に逆相クロマトグラフィにおける使用に好適である。
以下の例は、限定することなく本発明をさらに詳細に説明することを意図している。
一連の実験において種々のアミンを用いるが、本発明の方法におけるアミンのそれぞれの濃度の影響もまた試験する。このために、以下の反応条件を選択する:
エタノール(無水)50ml、および
脱イオン水18.7ml
からなる多数の透明混合物を、平行して磁気攪拌機を用いて攪拌しながら、30℃で暖める。続いて表1に示した異なるアミンの量を添加する。
反応式:
(OH−)
Si(OR)4 + 2H2O → SiO2 + 4ROH
により、テトラアルキルケイ酸1molあたり2molの水が必要である。
従来技術で常に用いられるアンモニア溶液の水性の性質により、反応に等モル量の水を加えることは不可能であった。アンモニア溶液の使用では、水は実質的に全ての場合において大幅に過剰に加えられ、これは付加的な水を加えない場合でも同様である。これは原則として、非常に少量のアンモニア溶液を添加する場合にのみ可能となったであろう。しかしこの場合、反応の性能は非常に不利である。
得られた反応生成物は、走査型電子顕微鏡により計測する。
Claims (29)
- テトラアルコキシシランおよび/または有機トリアルコキシシランの加水分解重縮合により球状SiO2粒子を製造する方法であって、
加水分解重縮合が、2〜25重量%の水、50〜70重量%の1種または2種以上の可溶化剤および0.1〜5重量%の1種または2種以上のアミンを含む媒体中で行われ、
1種または2種以上の可溶化剤が、アルコール、ケトン、ジアルキルスルホキシド、ピロリドン、アルキルニトリル、フランおよび/またはジオキサンからなる群から選択され、
アミンが、アルカノールアミン、ジアミンおよび/またはポリアミンであることを特徴とする、前記方法。 - 一次粒子のゾルを最初に製造し、反応範囲に制御された、対応するシランの連続計量添加によりさらなる核形成を防ぐような様式において、得られたSiO2粒子を続いて所望の粒径にすることを特徴とする、請求項1に記載の方法。
- アミンが、第一級、第二級および第三級有機アミンからなる群から選択されることを特徴とする、請求項1または2に記載の方法。
- アミンが、アミノエタノール、エチレンジアミンまたはジエチレントリアミンであることを特徴とする、請求項1〜3のいずれか一項に記載の方法。
- テトラアルコキシシランのアルコキシ基が、メトキシ、エトキシ、プロポキシ、ブトキシまたはペントキシ基であることを特徴とする、請求項1〜4のいずれか一項に記載の方法。
- テトラアルコキシシランのアルコキシ基が、エトキシ基であることを特徴とする、請求項1〜5のいずれか一項に記載の方法。
- 加水分解重縮合が、25〜78℃の間の温度で行われることを特徴とする、請求項1〜6のいずれか一項に記載の方法。
- 加水分解重縮合が、30〜75℃の間の温度で行われることを特徴とする、請求項1〜7のいずれか一項に記載の方法。
- 加水分解重縮合が、40〜55℃の間の温度で行われることを特徴とする、請求項1〜8のいずれか一項に記載の方法。
- 1種または2種以上の染料が、加水分解重縮合の間に付加的に加えられることを特徴とする、請求項1〜9のいずれか一項に記載の方法。
- 染料が、蛍光染料であることを特徴とする、請求項10に記載の方法。
- 染料が、一般式R1R2R3SiR4で表わされる末端シリル化(蛍光)染料であって、この式中、R1、R2およびR3は、同一または異なっており、そしてハロゲン原子、アルキル、アリール、アルコキシまたはシリルオキシ基を表わし、R4は、複合構造A1−Bm−Cn−A2を有し、式中、mおよびnは、0および1の値をとることができ、A1は、アルキル鎖またはヘテロ類似構造を示し、Bは、機能性配列を表わし、Cは、好適な様式でA2に結合する鎖または環構造を有する、二機能性有機配列を示し、ここでA2は、Cに、またはnが0である場合はBに、またはmおよびnが0である場合はA1に結合する可能性を、構造的に付与する発蛍光系または染料分子を表わす、前記染料であることを特徴とする、請求項10または11に記載の方法。
- A1が、1〜30個の鎖要素を有するアルキル鎖またはヘテロ類似構造を示すことを特徴とする、請求項12に記載の方法。
- R4の機能性配列Bが、カルボニル、オキシカルボニル、アミノカルボニルもしくはアミノチオカルボニル基、またはヘテロ原子を表わすことを特徴とする、請求項12または13に記載の方法。
- R4の機能性配列Bが、酸素、窒素もしくは硫黄を表わすことを特徴とする、請求項12または13に記載の方法。
- R4の二機能性配列Cが、炭素、窒素、酸素もしくは硫黄原子を介してA2に結合する、アルキレン単位または置換およびヘテロ類似アルキレン基を表わすことを特徴とする、請求項12〜15のいずれか一項に記載の方法。
- R4の二機能性配列Cが、炭素、窒素、酸素もしくは硫黄原子を介して、エステルもしくはアミドとしてA2に結合する、アルキレン単位または置換およびヘテロ類似アルキレン基を表わすことを特徴とする、請求項12〜16のいずれか一項に記載の方法。
- R4の二機能性配列Cが、ヒドロキシ酸またはアミノカルボン酸およびこれらのエステルまたはアミドの構造要素を表わすことを特徴とする、請求項12〜17のいずれか一項に記載の方法。
- アルコキシ基が、メトキシ、エトキシ、プロポキシ、ブトキシまたはペントキシ基であることを特徴とする、請求項12〜18のいずれか一項に記載の方法。
- アルコキシ基が、エトキシ基であることを特徴とする、請求項12〜19のいずれか一項に記載の方法。
- 請求項1の記載により製造したSiO2粒子からなる粉体の、クロマトグラフィにおける吸収材料としての、使用。
- 請求項1の記載により製造したSiO 2 粒子からなる粉体の、核酸およびタンパク質の単離および精製のための、使用。
- 請求項1の記載により製造したSiO 2 粒子からなる粉体の、ファゴサイトーシス解析における、使用。
- 請求項1の記載により製造したSiO 2 粒子からなる粉体の、診断アレイにおける成分としての、使用。
- 請求項1の記載により製造したSiO 2 粒子からなる粉体の、分子認識現象の研究における固体相としての、使用。
- 請求項1の記載により製造したSiO 2 粒子からなる粉体の、不均一系触媒プロセスにおける固体相としての、使用。
- 請求項1の記載により製造したSiO 2 粒子からなる粉体の、フォトニック結晶の成分としての、使用。
- 請求項1の記載により製造したSiO 2 粒子からなる粉体の、潤滑剤としての、使用。
- 請求項1の記載により製造したSiO 2 粒子からなる粉体の、研磨剤としての、使用。
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DE102004011110A DE102004011110A1 (de) | 2004-03-08 | 2004-03-08 | Verfahren zur Herstellung monodisperser SiO2-Partikel |
DE102004011110.3 | 2004-03-08 | ||
PCT/EP2005/001323 WO2005085135A1 (de) | 2004-03-08 | 2005-02-10 | VERFAHREN ZUR HERSTELLUNG MONODISPERSER SiO2-PARTIKEL |
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US8455255B2 (en) * | 2006-06-08 | 2013-06-04 | The University Of Tokushima | Method for production of novel nano silica particle and use of the nano silica particle |
EP2233437A4 (en) * | 2007-12-06 | 2016-07-27 | Univ Tokushima | NANOFUNCTIONAL SILICA PARTICLES AND METHOD FOR THE PRODUCTION THEREOF |
JP2009263484A (ja) * | 2008-04-24 | 2009-11-12 | Nippon Chem Ind Co Ltd | 半導体ウエハ研磨用コロイダルシリカおよびその製造方法 |
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JP5477192B2 (ja) | 2010-06-23 | 2014-04-23 | 富士ゼロックス株式会社 | シリカ粒子の製造方法 |
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TW201235299A (en) * | 2011-01-21 | 2012-09-01 | Dainippon Ink & Chemicals | Method for producing porous silica particles, resin composition for anti-reflection film and anti-reflection film |
JP2013241315A (ja) * | 2012-05-22 | 2013-12-05 | Hayakawa Rubber Co Ltd | 微粒子群及び微粒子群の製造方法 |
CN107486112B (zh) * | 2017-08-08 | 2020-01-21 | 浙江工商大学 | 一种不脱色的单分散彩色二氧化硅纳米微球的制备方法 |
KR102510479B1 (ko) * | 2017-08-31 | 2023-03-16 | (주)석경에이티 | 초미립 고순도 실리카 입자의 제조방법 |
CN110270316B (zh) * | 2018-12-11 | 2022-06-24 | 齐齐哈尔大学 | 脱色剂及其制备方法 |
EP3909612A1 (en) | 2020-05-12 | 2021-11-17 | Life Science Inkubator Betriebs GmbH & Co. KG | Composition of nanoparticles |
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- 2005-02-10 EP EP05707303A patent/EP1723076B1/de active Active
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WO2005085135A1 (de) | 2005-09-15 |
JP2007528341A (ja) | 2007-10-11 |
US20080241044A1 (en) | 2008-10-02 |
DE502005006135D1 (en) | 2009-01-15 |
DE102004011110A1 (de) | 2005-09-22 |
CN1930082B (zh) | 2010-09-29 |
ATE416146T1 (de) | 2008-12-15 |
CN1930082A (zh) | 2007-03-14 |
US8163260B2 (en) | 2012-04-24 |
TW200600454A (en) | 2006-01-01 |
KR20070019991A (ko) | 2007-02-16 |
EP1723076A1 (de) | 2006-11-22 |
EP1723076B1 (de) | 2008-12-03 |
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