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JP4808585B2 - Surface-treated metal material - Google Patents

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JP4808585B2
JP4808585B2 JP2006285555A JP2006285555A JP4808585B2 JP 4808585 B2 JP4808585 B2 JP 4808585B2 JP 2006285555 A JP2006285555 A JP 2006285555A JP 2006285555 A JP2006285555 A JP 2006285555A JP 4808585 B2 JP4808585 B2 JP 4808585B2
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JP2008101251A (en
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公隆 林
郁夫 菊池
一実 西村
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Nippon Steel Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an inexpensive chromate-free surface-treated metal material having excellent corrosion resistance and electrical conductivity. <P>SOLUTION: The surface-treated metal material has: a first layer composed of a zinc-cobalt plated film in which a coating film amount is 1.0 to 5.0 g/m<SP>2</SP>, and the content of cobalt in plating is 0.2 to 1.0 mass%; and a second layer formed on the first layer, and composed of a silicon-containing post-treated film in which a coating film amount is 0.05 to 0.5 g/m<SP>2</SP>, and the content of silicon in the coating film is 0.2 to 20 mass%. Alternatively in the above surface-treated metal material, the metal material is a galvanized steel sheet. <P>COPYRIGHT: (C)2008,JPO&amp;INPIT

Description

本発明は、表面処理金属材料に関し、より詳細には、耐食性および導電性に優れたクロメートフリー表面処理を施した金属材料に関する。   The present invention relates to a surface-treated metal material, and more particularly to a metal material subjected to a chromate-free surface treatment excellent in corrosion resistance and conductivity.

亜鉛系金属めっき鋼板、アルミニウム板等の金属材料は、自動車、建材並びに家電関係等の広い分野で使用されている。しかし、これらの金属材料に用いられる亜鉛やアルミニウムは、大気環境中で腐食して、白錆と言われる腐食生成物を生成させ、この腐食生成物が、金属材料の外観を低下させる欠点を有している。このような耐食性に関する課題は、特に家電分野において問題となる。一方、デジタル家電、精密機器、OA機器、白物家電等の汎用家電分野において、上記の金属材料を使用する際には、耐食性に加え、溶接性や電磁波シールド性の観点から、導電性が要求される。   Metal materials such as zinc-based metal-plated steel plates and aluminum plates are used in a wide range of fields such as automobiles, building materials, and home appliances. However, zinc and aluminum used in these metal materials corrode in the atmospheric environment to produce a corrosion product called white rust, and this corrosion product has a drawback of reducing the appearance of the metal material. is doing. Such a problem related to corrosion resistance is a problem particularly in the field of home appliances. On the other hand, in the field of general-purpose home appliances such as digital home appliances, precision equipment, OA equipment, white goods home appliances, when using the above metal materials, conductivity is required from the viewpoint of weldability and electromagnetic wave shielding properties in addition to corrosion resistance. Is done.

これまでに、金属材料表面に耐食性や導電性などを付与する技術として、金属材料表面に、クロム酸や重クロム酸、更にそれらの塩を主成分とする処理液を用いたクロメート処理方法や、リン酸塩処理方法や、各種シランカップリング剤単体による被覆処理方法や、有機樹脂皮膜の被覆方法等が知られており、そのいくつかの処理方法は、実用化されている。近年、RoHSやELV指令に代表されるように六価クロムの使用規制に始まり、現在、クロメート表面処理を施された金属材料から、クロメートフリー表面処理を施された金属材料へと、転換が進みつつある。   So far, as a technology to impart corrosion resistance, conductivity, etc. to the metal material surface, chromate treatment method using a treatment liquid mainly containing chromic acid, dichromic acid, and salts thereof on the metal material surface, A phosphate treatment method, a coating treatment method using various silane coupling agents alone, a coating method of an organic resin film, and the like are known, and some of these treatment methods have been put into practical use. In recent years, the use of hexavalent chromium has been started, as typified by the RoHS and ELV directives, and now there has been a shift from metal materials with chromate surface treatment to metal materials with chromate-free surface treatment. It's getting on.

上記各種処理方法において、主として無機成分を用いる技術に関し、耐食性、塗装密着性を改善する方法としては、希薄な水ガラス溶液やケイ酸ナトリウム溶液、またはそれらの混合液に、特定量の有機シランカップリング剤を添加した処理液を、鋼材に塗布乾燥する方法が開示されている(例えば、特許文献1参照。)。   In the above-mentioned various processing methods, mainly relating to the technique using an inorganic component, as a method for improving the corrosion resistance and coating adhesion, a dilute water glass solution, a sodium silicate solution, or a mixture thereof may contain a specific amount of organosilane cup. A method of applying and drying a treatment liquid to which a ring agent has been added to a steel material is disclosed (for example, see Patent Document 1).

上記で特にシランカップリング剤を主体に使用する技術としては、一時的な防食効果を付与するために、低濃度の有機官能シランおよび架橋剤を含有する水溶液による金属板の処理が示されており、架橋剤として有機シラン化合物を架橋することによって、稠密なシロキサン・フィルムを形成する方法が開示されている(例えば、特許文献2参照。)。   In particular, as a technique mainly using a silane coupling agent as described above, treatment of a metal plate with an aqueous solution containing a low concentration of an organofunctional silane and a crosslinking agent has been shown to provide a temporary anticorrosive effect. A method of forming a dense siloxane film by crosslinking an organosilane compound as a crosslinking agent has been disclosed (for example, see Patent Document 2).

更にまた、特定の樹脂化合物(A)と、第1〜3アミノ基及び第4アンモニウム塩基から選ばれる少なくとも1種のカチオン性官能基を有するカチオン性ウレタン樹脂(B)と、特定の反応性官能基を有する1種以上のシランカップリング剤(C)と、特定の酸化合物(E)とを含有し、かつカチオン性ウレタン樹脂(B)及びシランカップリング剤(C)の含有量が所定の範囲内である表面処理剤を用いて、耐食性に優れ、さらに耐指紋性、耐黒変性および塗装密着性に優れたクロムフリーの表面処理鋼板及びその製造方法が、開示されている(例えば、特許文献3参照。)。   Furthermore, the specific resin compound (A), the cationic urethane resin (B) having at least one cationic functional group selected from the first to third amino groups and the quaternary ammonium base, and the specific reactive function 1 or more types of silane coupling agents (C) which have a group, and specific acid compound (E), and content of cationic urethane resin (B) and silane coupling agent (C) is predetermined. A chromium-free surface-treated steel sheet having excellent corrosion resistance, fingerprint resistance, blackening resistance and paint adhesion using a surface treatment agent within the range and a method for producing the same have been disclosed (for example, patents) Reference 3).

しかしながら、これらの処理方法によって作製された皮膜を有する金属材料は、クロメート処理された金属材料同等以上の耐食性を発現させようとすると、上記処理皮膜厚みを厚くしなければならず、他方、クロメート処理された金属材料同等以上の導電性を発現させようとすると、上記処理皮膜厚みを薄くなければならないという、皮膜厚みに対して相反する性能の両立が、大きな技術課題であった。   However, the metal material having a film produced by these treatment methods has to increase the thickness of the treatment film in order to express the corrosion resistance equivalent to or higher than that of the chromated metal material. In order to develop conductivity equal to or higher than that of the metal material, the coexistence of the contradictory performance with respect to the coating thickness, which is that the thickness of the treatment coating must be thin, has been a major technical problem.

上記のごとく、いずれの方法においても、クロメート皮膜の代替として使用できるような表面処理剤を得られていないのが現状であり、製造コストメリットがあり、従来のクロメート処理された金属材料同等以上の耐食性および導電性を満足できるクロメートフリー表面処理を施した金属材料の開発が、強く要求されている。   As described above, in any method, the surface treatment agent that can be used as a substitute for the chromate film has not been obtained at present, and there is a manufacturing cost advantage, which is equal to or higher than the conventional chromate-treated metal material. There is a strong demand for the development of a metal material with a chromate-free surface treatment that can satisfy corrosion resistance and electrical conductivity.

他方、亜鉛(Zn)−コバルト(Co)めっきについての従来技術は、以下のようなものが開示されている。   On the other hand, the following is disclosed as a prior art about zinc (Zn) -cobalt (Co) plating.

亜鉛系めっき鋼板の上にZn−Coめっきする技術としては、自動車車体用途を目指し、耐水密着性を改善する方法として、リン酸亜鉛皮膜中にCoを添加させるためにCo含有率15〜30mass%のZn−Coめっきを用いる手法が開示されている(例えば、特許文献4参照。)。   As a technique for plating Zn-Co on a zinc-based plated steel sheet, as a method for improving water-resistant adhesion, aiming at automotive body applications, a Co content of 15 to 30 mass% is used to add Co to a zinc phosphate coating. A method using Zn-Co plating is disclosed (for example, see Patent Document 4).

上記と同様に、自動車車体用途を目指し、亜鉛系めっき鋼板の上にCo含有率3〜99mass%のZn−Coめっきを被覆する技術が示されており、Co含有率の下限は潤滑性、上限は耐チッピング性の発現限界で決まるとする方法が開示されている(例えば、特許文献5参照。)。   Similar to the above, a technique for coating Zn-Co plating with a Co content of 3 to 99 mass% on a zinc-based plated steel sheet for use in an automobile body is shown. The lower limit of the Co content is lubricity and the upper limit. Has been disclosed that is determined by the expression limit of chipping resistance (see, for example, Patent Document 5).

更にまた、主に自動車車体用途を目指し、有機複合被覆鋼板(亜鉛系めっき鋼板+クロメート皮膜+有機皮膜)の裸耐食性(無塗装状態での耐食性)と塗装後耐食性とを向上させるために、母材めっき層とクロメート皮膜層との間にフラッシュめっきと呼ばれる低付着量のめっき層を設け、このフラッシュめっき層を、デキストリンおよび/またはデキストランとコバルト化合物とを含有することを必須とする亜鉛系めっき浴からの電気Zn−Coめっきにより形成することが有効であるということが、示されている。フラッシュめっき層としては、Zn−Coめっき中デキストリンおよび/またはデキストランの含有率が0.05(塗装後耐食性下限)〜10(めっき外観起因による上限)mass%、かつ、Co含有率が0.01(塗装後耐食性下限)〜10(製造コストによる上限)mass%で付着量が0.5(塗装後耐食性下限)〜20(製造コストと加工性起因による上限)g/mであることが開示されている(例えば、特許文献6参照。)。 Furthermore, in order to improve the bare corrosion resistance (corrosion resistance in the unpainted state) and post-painting corrosion resistance of the organic composite coated steel sheet (zinc-based plated steel sheet + chromate film + organic film), mainly for automobile body applications, A zinc-based plating which is provided with a low adhesion amount plating layer called flash plating between a material plating layer and a chromate film layer, and this flash plating layer must contain dextrin and / or dextran and a cobalt compound. It has been shown that it is effective to form by electro-Zn-Co plating from a bath. As the flash plating layer, the content of dextrin and / or dextran in Zn-Co plating is 0.05 (lower corrosion resistance after coating) to 10 (upper limit due to plating appearance) mass%, and the Co content is 0.01. (corrosion resistance after painting limit) to 10 (upper limit due to manufacturing cost) the amount of deposition is 0.5 mass% (corrosion resistance after painting lower) to 20 discloses that (according to workability due and manufacturing cost limit) is g / m 2 (For example, refer to Patent Document 6).

これらの処理方法によって作製された皮膜を有する金属材料は、自動車車体用途を中心に設計されており、特に耐食性の観点からは、塩害地での鋼板の耐孔開き性や塗装後耐食性を重視した皮膜設計であるため、めっき中のCo含有率が3mass%以上、あるいは1mass%以下の微量Co含有率では、デキストリン等の有機添加物を同時にめっき中に含有しないと、耐食性が発現されない。しかしながら、めっき中のCo含有率が3mass%以上、あるいは1mass%以下の微量Co含有率で、かつデキストリン等の有機添加物を含有するようなめっきは、製造コストが高く、特にデキストリン等の有機添加物をめっき浴に添加すると、操業時に有機添加物の分解が起こるため、めっき液のコンタミが起こり、正常なめっきができなくなったり、めっき液の浴寿命が短くなったりという、いくつかの課題が発生することが知られている。   Metal materials with coatings produced by these treatment methods are designed mainly for automotive body applications, and in particular, from the viewpoint of corrosion resistance, emphasis was placed on the perforation resistance and post-painting corrosion resistance of steel sheets in salt damage areas. Because of the coating design, when the Co content in the plating is 3 mass% or more, or a trace Co content of 1 mass% or less, corrosion resistance is not exhibited unless an organic additive such as dextrin is contained in the plating at the same time. However, plating with a Co content of 3 mass% or more or 1 mass% or less of Co in the plating and containing organic additives such as dextrin is expensive to manufacture, and particularly organic additions such as dextrin When an object is added to the plating bath, organic additives are decomposed during operation, causing contamination of the plating solution, which prevents normal plating and shortens the bath life of the plating solution. It is known to occur.

特開昭58−15541号公報JP 58-15541 A 米国特許第5,292,549号明細書US Pat. No. 5,292,549 特開2003−105562号公報JP 2003-105562 A 特開昭60−215789号公報JP 60-215789 A 特開平03−158494号公報Japanese Patent Laid-Open No. 03-158494 特開平08−218193号公報JP 08-218193 A

そこで、本発明は、上記の現状に鑑み、廉価で耐食性および導電性に優れたクロメートフリー表面処理を施した金属材料を提供することを目的とするものである。   SUMMARY OF THE INVENTION In view of the above situation, an object of the present invention is to provide a metal material subjected to a chromate-free surface treatment that is inexpensive and excellent in corrosion resistance and conductivity.

本発明者らは、これらの従来技術の抱える問題点を解決するために鋭意検討を重ねた結果、金属材料の上に微量Co含有Zn−Coめっき皮膜を被覆し、更にその上にケイ素含有後処理皮膜を薄く被覆させることで、耐食性を担保しつつ導電性にも優れた皮膜を形成することができることを見出し、本発明を完成するに至った。   As a result of intensive studies in order to solve these problems of the prior art, the present inventors have coated a metal material with a trace amount of Co-containing Zn-Co plating film, and further on that after containing silicon. It has been found that a thin coating of the treatment film can form a film having excellent conductivity while ensuring corrosion resistance, and has completed the present invention.

本発明の技術が従来と大きく異なる点は、これまで着目されなかった微量Co含有領域のZn−Coめっき皮膜でも、ケイ素含有後処理皮膜と併用することで、格段の耐食性向上が起こり、このためケイ素含有後処理皮膜の薄膜化が可能となり、良好な導電性も同時に得ることができることを見出した点にある。   The point that the technology of the present invention is greatly different from the conventional one is that even in a trace amount of Co-containing region Zn-Co plating film, which has not been noticed so far, when used in combination with a silicon-containing post-treatment film, a significant improvement in corrosion resistance occurs. The silicon-containing post-treatment film can be made thinner, and good conductivity can be obtained at the same time.

すなわち、本発明は、皮膜量が1.0〜5.0g/mであり、めっき中のコバルト含有率が0.2〜1.0mass%である亜鉛−コバルトめっき皮膜からなる第一層と、第一層上に形成され、皮膜量が0.05〜0.5g/mであり、皮膜中のケイ素含有率が0.2〜20mass%であるケイ素含有後処理皮膜からなる第二層と、を有することを特徴とする表面処理金属材料である。 That is, the present invention provides a first layer composed of a zinc-cobalt plating film having a coating amount of 1.0 to 5.0 g / m 2 and a cobalt content in the plating of 0.2 to 1.0 mass%. A second layer comprising a silicon-containing post-treatment film formed on the first layer and having a film amount of 0.05 to 0.5 g / m 2 and a silicon content in the film of 0.2 to 20 mass%. And a surface-treated metal material.

本発明はまた、上記の金属材料が亜鉛系めっき鋼板であることを特徴とする表面処理金属材料である。   The present invention also provides a surface-treated metal material, wherein the metal material is a zinc-based plated steel sheet.

本発明のクロメートフリー表面処理金属材料は、上述した金属材料の上に微量Co含有Zn−Coめっき皮膜を被覆し、更にその上にケイ素含有後処理皮膜を薄く被覆させることにより、金属材料表面に、耐食性および導電性に優れた皮膜を形成することができる。   The chromate-free surface-treated metal material of the present invention is formed on the surface of the metal material by coating a trace amount of Co-containing Zn-Co plating film on the above-described metal material and further thinly coating a silicon-containing post-treatment film thereon. A film excellent in corrosion resistance and conductivity can be formed.

以下に、本発明を詳細に説明する。
本発明の第1の実施形態に係るクロメートフリー表面処理金属材料は、金属材料の上に微量Co含有Zn−Coめっき皮膜を被覆し、更にその上にケイ素含有後処理皮膜を薄く被覆させることで、耐食性を担保しつつ導電性にも優れた皮膜を形成するものである。
本実施形態はまた、上記の金属材料が亜鉛系めっき鋼板であることを特徴とする表面処理金属材料に関するものである。
The present invention is described in detail below.
The chromate-free surface-treated metal material according to the first embodiment of the present invention is obtained by coating a trace amount of Co-containing Zn-Co plating film on a metal material and further thinly coating a silicon-containing post-treatment film thereon. In addition, a film excellent in conductivity while forming corrosion resistance is formed.
The present embodiment also relates to a surface-treated metal material, wherein the metal material is a zinc-based plated steel sheet.

本実施形態に係るクロメートフリー表面処理金属材料の金属材料の表面に、低Co含有Zn−Coめっき皮膜を被覆し、極薄膜のケイ素含有後処理皮膜を被覆することで、更なる導電性と耐食性の格段の向上がなされる。この性能の発現機構については定かではないが、推定されうる発現機構について、以下に説明する。ただし、本実施形態は、この発現機構に限定されるものではない。金属材料の表面に、第一層としてZn−Coめっき皮膜を形成し、第二層としてケイ素含有後処理皮膜を形成することで、金属材料が優れた耐食性能を発揮するのは、以下の機構によると推定される。   The surface of the metal material of the chromate-free surface-treated metal material according to the present embodiment is coated with a low Co-containing Zn-Co plating film, and an ultra-thin silicon-containing post-treatment film is coated, thereby providing further conductivity and corrosion resistance. This is a significant improvement. Although the expression mechanism of this performance is not certain, the expression mechanism that can be estimated will be described below. However, this embodiment is not limited to this expression mechanism. By forming a Zn-Co plating film as the first layer on the surface of the metal material and forming a silicon-containing post-treatment film as the second layer, the metal material exhibits excellent corrosion resistance performance by the following mechanism. It is estimated that.

まず、Zn−Coめっき皮膜の上にケイ素含有後処理剤を塗布し、焼き付けを行う際に、Zn−Coめっき皮膜上のCo−OH(水酸基)と、ケイ素含有後処理皮膜上のSi(ケイ素)−OHとが、脱水縮合によりCo−O−Si結合を形成する。ポーリングの電気陰性度によると、Coは1.88、Siは1.90、Oは3.44、Znは1.65であり、CoとSiはほぼ等しい値であることから、Co−O−Si結合は、Si−O−Siで示されるシロキサン結合に相当する安定な結合状態となり、Zn−Coめっき皮膜/ケイ素含有後処理皮膜界面の強固な密着が起こるものと考えられる。   First, when a silicon-containing post-treatment agent is applied on the Zn-Co plating film and baked, Co-OH (hydroxyl group) on the Zn-Co plating film and Si (silicon) on the silicon-containing post-treatment film are used. ) -OH forms a Co-O-Si bond by dehydration condensation. According to Pauling's electronegativity, Co is 1.88, Si is 1.90, O is 3.44, Zn is 1.65, and Co and Si are almost equal values. It is considered that the Si bond becomes a stable bond state corresponding to the siloxane bond represented by Si—O—Si, and strong adhesion occurs at the Zn—Co plating film / silicon-containing post-treatment film interface.

界面の密着性が良いということは、水、塩分等の腐食因子が、界面へ侵入しづらくなるということであり、この界面の密着性の向上が、Zn−Coめっき皮膜の腐食抑制に大きく寄与しているものと考えられる。加えて、ケイ素含有後処理皮膜自体の腐食因子のバリア効果や、ケイ素含有後処理皮膜中のSi以外の無機塩、有機化合物の官能基が、めっき表面の−O、−OH基と水素結合やファンデルワールス力を介して架橋構造を形成していることも、腐食因子の侵入を抑制する観点から、Zn−Coめっき皮膜の腐食開始の遅延に寄与していると考えられる。   Good interface adhesion means that corrosion factors such as water and salt do not easily enter the interface, and this improved interface adhesion greatly contributes to corrosion inhibition of the Zn-Co plating film. It is thought that. In addition, the barrier effect of the corrosion factor of the silicon-containing post-treatment film itself, the inorganic salt other than Si in the silicon-containing post-treatment film, and the functional group of the organic compound, hydrogen bonding with -O, -OH group on the plating surface, The formation of a crosslinked structure via van der Waals force is also considered to contribute to the delay of the corrosion start of the Zn-Co plating film from the viewpoint of suppressing the invasion of corrosion factors.

更に、腐食因子が、Zn−Coめっき皮膜/ケイ素含有後処理皮膜界面に侵入し始めると、Zn−Coめっき皮膜の腐食が開始する。このとき、環境中から供給された水、塩化物イオンや炭酸などの腐食因子が腐食に関与し、めっきの腐食による亜鉛の腐食初期生成物である塩基性塩化亜鉛や塩基性炭酸亜鉛が、Zn−Coめっき皮膜/ケイ素含有後処理皮膜界面に堆積する。上記亜鉛の腐食初期生成物は、腐食因子のバリア効果を有しているが、大気環境にそのまま曝されると、すぐにバリア効果のない亜鉛の酸化物に変態する。しかし、めっき中にCoがあることによる腐食初期生成物の変態抑制作用と、上層にケイ素含有後処理皮膜があることによる腐食初期生成物の大気との遮蔽効果の相乗効果により、上記亜鉛の腐食初期生成物の変態抑制が起こるため、腐食初期生成物の腐食因子のバリア効果が、長期に持続されることになる。結果として、白錆発生が抑制されると推定される。   Furthermore, when the corrosion factor starts to enter the Zn—Co plating film / silicon-containing post-treatment film interface, the corrosion of the Zn—Co plating film starts. At this time, corrosion factors such as water, chloride ions and carbonic acid supplied from the environment are involved in corrosion, and basic zinc chloride and basic zinc carbonate, which are the initial corrosion products of zinc due to corrosion of plating, are changed to Zn. -Deposited at the Co plating film / silicon-containing post-treatment film interface. The zinc corrosion initial product has a barrier effect of a corrosion factor, but when exposed to the atmospheric environment as it is, it immediately transforms into a zinc oxide having no barrier effect. However, due to the synergistic effect of the transformation suppression action of the initial corrosion product due to the presence of Co in the plating and the shielding effect of the initial corrosion product due to the presence of the silicon-containing post-treatment film on the upper layer, the corrosion of the zinc Since the transformation suppression of the initial product occurs, the barrier effect of the corrosion factor of the initial corrosion product is maintained for a long time. As a result, it is estimated that white rust generation is suppressed.

本実施形態において、めっき成分にCoを選択した理由は、主に、電気陰性度がSiとほぼ同値であること加え、めっき中に微量含有させるだけで、腐食初期生成物の変態抑制作用が最も発現しやすい元素であることを見出したからである。併せて、この耐食性発現には、上層にケイ素含有後処理皮膜が必須である。本実施形態の皮膜構成により、良好な耐食性発現が得られることから、ケイ素含有後処理皮膜の薄膜化が可能となり、良好な導電性も同時に得ることができる。   In this embodiment, the reason why Co is selected as the plating component is mainly that the electronegativity is almost the same as that of Si, and only by adding a trace amount during plating, the transformation inhibiting action of the initial corrosion product is the most. This is because it has been found that the element is easily expressed. In addition, a silicon-containing post-treatment film is essential for the upper layer for the development of corrosion resistance. With the film configuration of this embodiment, good corrosion resistance can be obtained, so that the silicon-containing post-treatment film can be thinned, and good conductivity can be obtained at the same time.

上記のZn−Coめっき皮膜は、下限1.0g/m、上限5.0g/mの皮膜量で、かつ、下限0.2mass%、上限1.0mass%のめっき中Co含有率で形成されたものである。皮膜量および組成が下限1.0g/m未満かつ下限Co含有率0.2mass%未満であると、白錆が発生し易くなり、耐食性は低下する。この理由としては、主にZn−Coめっき皮膜量とCo含有率が少なく、Co−O−Si結合による界面密着力が低下し、かつCo溶出量も極めて少ないため、充分なめっき腐食初期生成物の保持効果が発揮できないことにより、めっきの腐食抑制効果が低下したためと考えられる。一方、上限皮膜量および組成の根拠として、製造コストの観点から5.0g/mの皮膜量、1.0mass%のCo含有率を上限値とした。安定した耐食性の確保と製造コストの最小化を図るためには、上記皮膜量下限は1.2g/m、Co含有率下限は0.22mass%であることがより好ましく、上記皮膜量上限は4.8g/m、Co含有率上限は0.98mass%であることがより好ましい。 The Zn-Co plating film is formed with a coating amount of a lower limit of 1.0 g / m 2 and an upper limit of 5.0 g / m 2 , and a Co content in the plating of a lower limit of 0.2 mass% and an upper limit of 1.0 mass%. It has been done. When the amount and composition of the coating is less than the lower limit of 1.0 g / m 2 and the lower limit Co content is less than 0.2 mass%, white rust is liable to occur and the corrosion resistance is lowered. This is mainly because the amount of Zn—Co plating film and Co content is small, the interfacial adhesion due to the Co—O—Si bond is reduced, and the amount of Co elution is very small. This is considered to be because the effect of suppressing the corrosion of the plating was reduced due to the inability to exhibit the holding effect. On the other hand, as the basis for the upper limit film amount and the composition, the film amount of 5.0 g / m 2 and the Co content of 1.0 mass% were set as the upper limit values from the viewpoint of manufacturing cost. In order to secure stable corrosion resistance and minimize the production cost, the lower limit of the coating amount is more preferably 1.2 g / m 2 , and the lower limit of Co content is preferably 0.22 mass%. More preferably, the upper limit of the Co content is 4.8 g / m 2 and 0.98 mass%.

上記Zn−Coめっきの亜鉛系メッキ鋼板へのめっき方法としては、電気めっき法、溶融めっき法、蒸着めっき法、置換めっき、溶融塩電解めっき法等を利用することが可能であり、所定のめっき組成およびめっき付着量が確保できれば、上記のめっき方法に限定されるわけではなく、いずれの方法を使用しても良い。   As a plating method for the Zn-Co plated zinc-based plated steel sheet, an electroplating method, a hot dipping method, a vapor deposition plating method, a displacement plating method, a molten salt electroplating method, etc. can be used. As long as the composition and the amount of plating can be secured, the method is not limited to the above plating method, and any method may be used.

本実施形態に係るケイ素含有後処理皮膜がZn−Coめっき皮膜を介して被覆される、複層皮膜の皮膜構成としては、Zn−Coめっき皮膜が、下限1.0g/m、上限5.0g/mの皮膜量で、めっき中Co含有率が下限0.2mass%、上限1.0mass%で形成され、かつ、ケイ素含有後処理皮膜が、下限0.05g/m、上限0.5g/mの皮膜量で、皮膜中ケイ素含有率が0.2〜20mass%で形成される。 As a film configuration of a multilayer film in which the silicon-containing post-treatment film according to the present embodiment is coated via a Zn—Co plating film, the Zn—Co plating film has a lower limit of 1.0 g / m 2 and an upper limit of 5. with a film of 0 g / m 2, the lower limit 0.2 mass% is plated in Co content, it is formed at the upper limit 1.0 mass%, and silicon-containing post-treatment coating is, the lower limit 0.05 g / m 2, the upper limit 0. It is formed with a coating content of 5 g / m 2 and a silicon content in the coating of 0.2 to 20 mass%.

Zn−Coめっき皮膜量が下限1.0g/mから上限5.0g/mの皮膜量で、かつめっき中Co含有率が下限0.2mass%から上限1.0mass%の範囲において、耐食性は、Co含有率なしに比べやや良好であるが、更にケイ素含有後処理皮膜が下限0.05g/m以上、かつ皮膜中ケイ素含有率が0.2mass%以上となることで、耐白錆性は格段と向上し、また上限0.3g/m以下、かつ皮膜中ケイ素含有率が20mass%以下の皮膜量となることで、導電性も良好となる。 Corrosion resistance when the amount of Zn-Co plating film is a film amount with a lower limit of 1.0 g / m 2 to an upper limit of 5.0 g / m 2 and the Co content during plating is within the range of a lower limit of 0.2 mass% to an upper limit of 1.0 mass%. Is slightly better than the case without Co content, but further, the silicon-containing post-treatment film has a lower limit of 0.05 g / m 2 or more, and the silicon content in the film is 0.2 mass% or more, thereby preventing white rust resistance. The property is remarkably improved, and the conductivity is also improved when the upper limit is 0.3 g / m 2 or less and the silicon content in the film is 20 mass% or less.

この理由としては、複層皮膜が、主にZn−Coめっき皮膜とケイ素含有後処理皮膜との界面におけるCo−O−Si結合形成に起因する強固な界面密着力による界面への腐食因子の侵入遮蔽効果と、めっき腐食開始後のめっき腐食初期生成物のCoによる変態抑制効果(化学的作用)と、に加え、極薄膜でもケイ素含有後処理皮膜の腐食因子のバリア効果およびめっき腐食初期生成物の界面保持効果(物理的作用)を有するため、耐食性が著しく向上することが考えられる。   The reason for this is that the multi-layer coating mainly penetrates into the interface due to the strong interfacial adhesion due to the formation of Co—O—Si bonds at the interface between the Zn—Co plating coating and the silicon-containing post-treatment coating. In addition to the shielding effect and the effect of suppressing transformation (chemical action) by Co of the initial product of plating corrosion after the start of plating corrosion, the barrier effect of the corrosion factor of silicon-containing post-treatment film and the initial product of plating corrosion Therefore, it is conceivable that the corrosion resistance is remarkably improved.

従って、ケイ素含有後処理皮膜単層の場合に比べ、Zn−Coめっき皮膜があることで耐食性が格段と向上するため、その分、良伝導性でないケイ素含有後処理皮膜の極薄膜化が可能となり、電磁波の不要輻射ノイズ漏れを防止するために必要とされる導電性も、飛躍的に向上できると考えられる。   Therefore, compared to the case of a single layer containing a silicon-containing post-treatment film, the presence of the Zn-Co plating film significantly improves the corrosion resistance. It is considered that the conductivity required to prevent leakage of unnecessary radiation noise of electromagnetic waves can be improved dramatically.

安定した耐食性と導電性の確保と製造コストの最小化を図るためには、Zn−Coめっき皮膜量の下限は1.2g/m、Co含有率の下限は0.22mass%であり、皮膜量の上限は4.8g/m、Co含有率上限は0.98mass%であることが好ましく、かつ、ケイ素含有後処理皮膜の下限が0.1g/m、ケイ素含有率の下限が0.3mass%で上限が0.45g/m、ケイ素含有率の上限が15mass%であることがより好ましい。 In order to ensure stable corrosion resistance and conductivity and to minimize the manufacturing cost, the lower limit of the amount of the Zn-Co plating film is 1.2 g / m 2 , and the lower limit of the Co content is 0.22 mass%. The upper limit of the amount is preferably 4.8 g / m 2 , the upper limit of the Co content is preferably 0.98 mass%, the lower limit of the silicon-containing post-treatment film is 0.1 g / m 2 , and the lower limit of the silicon content is 0 More preferably, the upper limit is 0.35 mass% and the upper limit is 0.45 g / m 2 , and the upper limit of the silicon content is 15 mass%.

上記ケイ素含有後処理皮膜は、例えば、シリカ、シランカップリング剤、シリコーン樹脂等のケイ素化合物を含有し、残部は、無機塩および有機化合物を含む。   The silicon-containing post-treatment film contains, for example, a silicon compound such as silica, a silane coupling agent, or a silicone resin, and the balance contains an inorganic salt and an organic compound.

シリカとしては、微粒子シリカおよびシリカゾルなど、特に限定されない。シリカ単独は勿論のこと、シリカにアルミナ等の無機化合物や金属化合物を混合した混合物であってもよい。   Silica is not particularly limited, such as fine particle silica and silica sol. Of course, it may be a mixture of silica and an inorganic compound such as alumina or a metal compound.

シランカップリング剤としては、例えば、ビニルメトキシシラン、ビニルエトキシシラン、ビニルトリクロルシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、2−(3,4エポキシシクロヘキシル)エチルトリメトキシシラン、3−グリシドキシプロピルトリメトキシシラン、3−グリシドキシプロピルメチルジエトキシシラン、3−グリシドキシプロピルトリエトキシシラン、3−グリシドキシプロピルトリメトキシシラン、3−グリシドキシプロピルメチルジメトキシシラン、N−2(アミノエチル)3−アミノプロピルメチルジメトキシシラン、N−2(アミノエチル)3−アミノプロピルトリメトキシシラン、3−アミノプロピルトリメトキシシラン、3−アミノプロピルトリエトキシシラン、3−メタクリロキシプロピルメチルジメトキシシラン、3−メタクリロキシプロピルトリメトキシシラン、3−メタクリロキシプロピルメチルジエトキシシラン、3−メタクリロキシプロピルトリエトキシシラン、3−メルカプトプロピルメチルジメトキシシラン、3−メルカプトプロピルトリメトキシシラン、p−スチリルトリメトキシシラン、3−アクリロキシプロピルトリメトキシシラン、N−フェニル−3−アミノプロピルトリメトキシシラン、3−ウレイドプロピルトリエトキシシラン、3−クロルプロピルトリメトキシシラン、ビス(トリエトキシシリルプロピル)テトラスルフィド、3−イソシアネートプロピルトリエトキシシラン、3−トリエトキシシリル−N−(1,3−ジメチル−ブチリデン)プロピルアミン、N−(ビニルベンジルアミン)―2−アミノエチル−3−アミノプロピルトリメトキシシラン等を例として挙げることができ、これらの1種を単独でまたは2種以上を混合して使用することができる。   Examples of the silane coupling agent include vinyl methoxy silane, vinyl ethoxy silane, vinyl trichloro silane, vinyl trimethoxy silane, vinyl triethoxy silane, 2- (3,4 epoxy cyclohexyl) ethyl trimethoxy silane, and 3-glycidoxy. Propyltrimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, 3-glycidoxypropyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, N-2 ( Aminoethyl) 3-aminopropylmethyldimethoxysilane, N-2 (aminoethyl) 3-aminopropyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-methacryloxy Propylmethyldimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropylmethyldiethoxysilane, 3-methacryloxypropyltriethoxysilane, 3-mercaptopropylmethyldimethoxysilane, 3-mercaptopropyltrimethoxysilane, p-styryltrimethoxysilane, 3-acryloxypropyltrimethoxysilane, N-phenyl-3-aminopropyltrimethoxysilane, 3-ureidopropyltriethoxysilane, 3-chloropropyltrimethoxysilane, bis (triethoxysilylpropyl) ) Tetrasulfide, 3-isocyanatopropyltriethoxysilane, 3-triethoxysilyl-N- (1,3-dimethyl-butylidene) propylamine, N- (vinylbenzylamino) ) -2-aminoethyl-3-aminopropyltrimethoxysilane may be mentioned as an example, these one may be used alone or in combination of two or more.

シリコーン樹脂は、いわゆる有機ケイ素化合物(オルガノポリシロキサン)であり、特に限定するものではない。   The silicone resin is a so-called organosilicon compound (organopolysiloxane) and is not particularly limited.

無機塩の種類としては、例えば、ケイ酸塩も含み、リン酸塩、炭酸塩、硫酸塩など特に限定されることはないが、無機塩中のカチオン成分は、例えば、亜鉛イオン、マグネシウムイオン、マンガンイオンが好ましい。   Examples of inorganic salts include, for example, silicates, and are not particularly limited, such as phosphates, carbonates, sulfates, etc., but cationic components in inorganic salts include, for example, zinc ions, magnesium ions, Manganese ions are preferred.

上記の無機塩の具体例として、例えば、リン酸マグネシウム、硫酸マグネシウム、酸化マグネシウム、炭酸マグネシウム、硝酸マグネシウム、酸塩化ジルコニウム、硫酸ジルコニウム、酢酸ジルコニウム、バナジン酸アンモニウム、オキシニ塩化バナジウム、三酸化バナジウム、五酸化バナジウム、オキシシュウ酸バナジウム、チッ化バナジウム、オキシ硫酸バナジウム、バナジン酸ナトリウム、硫酸アルミニウム、酸化アルミニウム、酸化チタン、塩化チタン、チタン酸バリウム、チタンフッ化水素酸、塩化マンガン、硫酸マンガン、炭酸マンガン、四三酸化マンガン、硝酸マンガン、酢酸マンガン、二酸化マンガン、五塩化ニオブ、オキシ塩酸ニオブ、五酸化ニオブ、シュウ酸水素ニオブ、ニオブ酸バリウム、モリブデン酸アンモニウム、モリブデン酸ナトリウム、三酸化モリブデン、三酸化タングステン、パラタングステン酸アンモニウム、メタタングステン酸アンモニウム、タングステン酸カリウム、タングステン酸カルシウム、塩化バリウム、炭酸バリウム、硝酸バリウム、酸化バリウム、硫酸バリウム、過酸化バリウム等を挙げることができるが、本実施形態に係る無機塩としては、特に限定されるわけではない。   Specific examples of the inorganic salt include, for example, magnesium phosphate, magnesium sulfate, magnesium oxide, magnesium carbonate, magnesium nitrate, zirconium oxychloride, zirconium sulfate, zirconium acetate, ammonium vanadate, vanadium oxydichloride, vanadium trioxide, five Vanadium oxide, vanadium oxyoxalate, vanadium nitride, vanadium oxysulfate, sodium vanadate, aluminum sulfate, aluminum oxide, titanium oxide, titanium chloride, barium titanate, titanium hydrofluoric acid, manganese chloride, manganese sulfate, manganese carbonate, Manganese tetraoxide, manganese nitrate, manganese acetate, manganese dioxide, niobium pentachloride, niobium oxyhydrochloride, niobium pentoxide, niobium hydrogen oxalate, barium niobate, ammonium molybdate Sodium molybdate, molybdenum trioxide, tungsten trioxide, ammonium paratungstate, ammonium metatungstate, potassium tungstate, calcium tungstate, barium chloride, barium carbonate, barium nitrate, barium oxide, barium sulfate, barium peroxide, etc. The inorganic salt according to this embodiment is not particularly limited.

また、成膜性向上の観点から、上記ケイ素含有後処理皮膜中に、有機化合物を含有させている。有機化合物としては、例えば、シリコーン樹脂も含みエポキシ系樹脂、フェノール系樹脂、ウレタン系樹脂、アクリル酸系樹脂が好ましく、上記無機塩と混合するか脱水縮合等の化学結合を用いて、複合化しても良い。有機化合物の有機系官能基としては、脂肪族および芳香族炭化水素系官能基であれば、特に限定されることはなく、上記無機塩と脱水縮合等の化学結合を用いて複合化されることが望ましい。成膜性を向上させるために、有機系官能基の末端にアミノ基、エポキシ基等の反応性の異なる単独または二種類以上の官能基を導入すると、更に好適である。   Further, from the viewpoint of improving the film formability, an organic compound is contained in the silicon-containing post-treatment film. As the organic compound, for example, an epoxy resin, a phenol resin, a urethane resin, and an acrylic resin including a silicone resin are preferable. The organic compound is mixed with the above inorganic salt or combined using a chemical bond such as dehydration condensation. Also good. The organic functional group of the organic compound is not particularly limited as long as it is an aliphatic and aromatic hydrocarbon functional group, and may be combined with the above inorganic salt using a chemical bond such as dehydration condensation. Is desirable. In order to improve the film formability, it is more preferable to introduce single or two or more kinds of functional groups having different reactivity such as amino group and epoxy group at the terminal of the organic functional group.

上記の有機化合物の具体例として、例えば、チタンアルコキシド、チタンキレート、チタンアシレート、水溶性チタン化合物等の有機チタン化合物、ポリエステル系樹脂、ポリウレタン系樹脂、ポリオレフィン系樹脂、アクリル系樹脂、ビニル系樹脂、エポキシ系樹脂、フェノール系樹脂等を挙げることができる。   Specific examples of the above organic compounds include organic titanium compounds such as titanium alkoxides, titanium chelates, titanium acylates, and water-soluble titanium compounds, polyester resins, polyurethane resins, polyolefin resins, acrylic resins, and vinyl resins. , Epoxy resins, phenol resins and the like.

上記ケイ素含有後処理皮膜は、耐食性向上の観点から、防錆処理剤に使用されうる防錆インヒビターを、適宜含有してもよい。防錆インヒビターとしては、特に限定されることはないが、例えば、亜鉛、ケイ素、リン、マグネシウム、ジルコニウム、硫黄、バナジウム、アルミニウム、コバルト、チタン、マンガン、ニオブ、モリブデン、バリウム、タングステンの単体またはこれらを含有する酸化物、フッ化物、窒化物等の化合物の単独または二種以上が配合されていることが好ましい。更に、必要に応じて、例えば、有機防錆剤、染料、界面活性剤、潤滑剤等の他の添加剤の単独または二種以上が配合されていてもよい。ここで、添加剤の材質等は、特に限定されるわけではない。   The silicon-containing post-treatment film may optionally contain a rust inhibitor that can be used in a rust inhibitor from the viewpoint of improving corrosion resistance. There are no particular restrictions on the rust inhibitor, but for example, zinc, silicon, phosphorus, magnesium, zirconium, sulfur, vanadium, aluminum, cobalt, titanium, manganese, niobium, molybdenum, barium, tungsten alone or these It is preferable that a single compound or a combination of two or more compounds such as oxides, fluorides, nitrides, and the like are mixed. Furthermore, if necessary, for example, one or more of other additives such as an organic rust preventive agent, a dye, a surfactant, and a lubricant may be blended. Here, the material and the like of the additive are not particularly limited.

上記ケイ素含有後処理皮膜を形成する処理液としては、上記シリカ、シランカップリング剤、シリコーン樹脂等のケイ素化合物、上記無機塩、上記有機化合物を主成分として、更に、必要に応じて防錆インヒビター、有機防錆剤、染料、界面活性剤、潤滑剤等の他の添加剤の単独または二種以上が配合されていてもよい。   As the treatment liquid for forming the silicon-containing post-treatment film, the silica, the silane coupling agent, a silicon compound such as a silicone resin, the inorganic salt, and the organic compound as a main component, and further, if necessary, a rust inhibitor In addition, one or two or more of other additives such as an organic rust inhibitor, a dye, a surfactant, and a lubricant may be blended.

上記ケイ素含有後処理剤によるZn−Coめっき上への処理方法としては、浸漬型処理、塗布型処理のいずれの方法によっても上記ケイ素含有後処理皮膜を形成させることが可能である。浸漬型処理としては、たとえば、Zn−Coめっきを被覆した亜鉛系めっき鋼板の脱脂、水洗を行った後に、上記ケイ素含有後処理液と接触させ、リンガーロール法やエアナイフ法等によって膜厚を制御した後に乾燥を行うことにより、上記ケイ素含有後処理皮膜を形成することができる。上記ケイ素含有後処理皮膜の皮膜量は、たとえばリンガーロール法であればロール押し付け圧、エアナイフ法ではエア圧の調整により、それぞれ制御が可能である。   The silicon-containing post-treatment film can be formed by any of immersion-type treatment and coating-type treatment as the treatment method on the Zn-Co plating with the silicon-containing post-treatment agent. As the immersion type treatment, for example, after degreasing and rinsing a zinc-based plated steel sheet coated with Zn-Co plating, it is brought into contact with the silicon-containing post-treatment liquid, and the film thickness is controlled by a ringer roll method, an air knife method, or the like. Then, the silicon-containing post-treatment film can be formed by drying. The coating amount of the silicon-containing post-treatment coating can be controlled by adjusting the roll pressing pressure in the Ringer roll method, and the air pressure in the air knife method, for example.

塗布型処理としては、例えば、Zn−Coめっきを被覆した亜鉛系めっき鋼板に、必要な皮膜量に応じた量の上記ケイ素含有後処理液を、ロールコート法により必要な塗布量に調整する方法がある。上記ケイ素含有後処理液をZn−Coめっきを被覆した亜鉛系めっき鋼板に塗布した後、乾燥炉等を用いて乾燥させることにより、皮膜を形成させる。   As a coating type treatment, for example, a method of adjusting the silicon-containing post-treatment liquid in an amount corresponding to a required coating amount to a required coating amount by a roll coating method on a zinc-based plated steel sheet coated with Zn-Co plating There is. After apply | coating the said silicon-containing post-processing liquid to the zinc-plated steel plate which coat | covered Zn-Co plating, it is dried using a drying furnace etc., and a membrane | film | coat is formed.

なお、上記のZn−Coめっき皮膜やケイ素含有後処理皮膜の付着量は、例えば皮膜形成前および皮膜形成後のめっき鋼板の質量をそれぞれ測定し、皮膜形成前後での質量差を被覆面積で除することで決定することができる。   The amount of the Zn-Co plating film or silicon-containing post-treatment film deposited is measured, for example, by measuring the mass of the plated steel sheet before and after the film formation, and dividing the mass difference before and after the film formation by the coating area. Can be determined.

また、上記のZn−Coめっき皮膜やケイ素含有後処理皮膜を形成するための塗布液は、例えば蒸留水に所定比率の成分を固形分濃度が所定範囲(例えば、10〜20質量%)になるように添加し、常温で均一分散するまで撹拌を行うことで製造することができる。   Moreover, the coating liquid for forming said Zn-Co plating membrane | film | coat and a silicon-containing post-processing membrane | film | coat becomes a predetermined range (for example, 10-20 mass%) for a solid content concentration, for example with the component of a predetermined ratio to distilled water. Thus, it can be manufactured by stirring until it is uniformly dispersed at room temperature.

また、上記のZn−Coめっき皮膜におけるCo含有率は、例えば以下のような方法を用いることで測定することができる。まず、所定面積の試料上のZn−Coめっきを、所定量の酸溶液で完全に溶解させた後、Zn−Coめっきが溶けた溶液を化学分析し、Zn、Co濃度(g/リットル)を求める。これより、溶液中に溶解したZn、Co量(g)=所定量の酸溶液(リットル)×Zn、Co濃度(g/リットル)の関係を用いて、溶液中に溶解したZn,Co量(g)を求める。続いて、得られた溶液中に溶解したZn、Co量(g)を試料面積(m)で除することで、単位面積あたりのZn,Co付着量(g/m)を求める。ここで、Co含有率(mass%)=Co付着量/(Zn付着量+Co付着量)×100の関係を用いることで、Co含留率を決定することができる。ここで、上記の化学分析を行う機器として、例えば原子吸光光度計(ICP)を用いることができる。 Moreover, Co content rate in said Zn-Co plating membrane | film | coat can be measured by using the following methods, for example. First, Zn—Co plating on a sample of a predetermined area is completely dissolved with a predetermined amount of acid solution, and then the solution in which the Zn—Co plating is dissolved is chemically analyzed to determine Zn and Co concentrations (g / liter). Ask. Thus, using the relationship of Zn and Co dissolved in the solution (g) = predetermined amount of acid solution (liter) × Zn and Co concentration (g / liter), the amounts of Zn and Co dissolved in the solution ( g). Subsequently, by dividing the Zn and Co amounts (g) dissolved in the obtained solution by the sample area (m 2 ), the Zn and Co adhesion amounts (g / m 2 ) per unit area are obtained. Here, the Co content rate can be determined by using the relationship of Co content rate (mass%) = Co adhesion amount / (Zn adhesion amount + Co adhesion amount) × 100. Here, for example, an atomic absorption photometer (ICP) can be used as an instrument for performing the above chemical analysis.

また、上記のケイ素含有後処理皮膜におけるケイ素含有率は、めっき鋼板への塗布前後の質量差を被覆面積で除して皮膜付着量とし、次に皮膜中のケイ素量をICP等の化学分析法で測定し被覆面積で除してケイ素付着量とすると、ケイ素含有率(mass%)=(ケイ素付着量/皮膜付着量)×100の式で算出することができる。   Further, the silicon content in the silicon-containing post-treatment film is obtained by dividing the mass difference before and after application to the plated steel sheet by the coating area to obtain the film adhesion amount, and then the silicon amount in the film is determined by a chemical analysis method such as ICP. Measured by the above and divided by the coating area to obtain the silicon adhesion amount, the silicon content (mass%) = (silicon adhesion amount / film adhesion amount) × 100 can be calculated.

本実施形態に係るクロメートフリー表面処理を施した金属材料に使用する亜鉛系めっき鋼板としては、特に限定されず、例えば、亜鉛めっき鋼板、亜鉛−ニッケルめっき鋼板、亜鉛−鉄めっき鋼板、亜鉛−クロムめっき鋼板、亜鉛−マンガンめっき鋼板、亜鉛−アルミニウムめっき鋼板、亜鉛−マグネシウムめっき鋼板等の亜鉛系の電気めっき、溶融めっき、蒸着めっき、置換めっき鋼板等の亜鉛又は亜鉛系合金めっき鋼板等を挙げることができる。勿論のことであるが、本実施形態に係る皮膜構成と機能を鑑みると、金属材料としては、鋼やアルミニウム、マグネシウムおよびその合金などZn−Coめっきが可能な金属材料ならば、全て発明の効果は有効である。   It does not specifically limit as a zinc-plated steel plate used for the metal material which gave the chromate free surface treatment which concerns on this embodiment, For example, a galvanized steel plate, a zinc-nickel plated steel plate, a zinc-iron plated steel plate, zinc-chromium List zinc-plated steel sheet, zinc-manganese-plated steel sheet, zinc-aluminum-plated steel sheet, zinc-magnesium-plated steel sheet, zinc-based electroplating, hot-dip plating, vapor deposition plating, displacement-plated steel sheet, etc. Can do. Of course, in view of the film configuration and function according to the present embodiment, the metal material can be any metal material capable of Zn-Co plating, such as steel, aluminum, magnesium and alloys thereof. Is valid.

本実施形態は、金属材料の片面または両面の表面に、第一層として皮膜量が1.0〜5.0g/mであり、めっき中Co含有率が0.2〜1.0mass%であるZn−Coめっき皮膜が形成され、第二層として皮膜量が0.05〜0.5g/mであり、皮膜中ケイ素含有率が0.2〜20mass%であるケイ素含有後処理皮膜が形成されることにより得られるものであることから、鋼板の全面を均一皮膜で覆うことができる。これにより、Zn−Coめっきのめっき表面とケイ素含有後処理皮膜の界面の密着力を向上させることが可能となり、汎用家電用途で具備すべき主たる性能要件である導電性と耐食性とを、同時に確保できる。 In this embodiment, the coating amount is 1.0 to 5.0 g / m 2 as the first layer on one or both surfaces of the metal material, and the Co content during plating is 0.2 to 1.0 mass%. A silicon-containing post-treatment film in which a certain Zn—Co plating film is formed, the film amount is 0.05 to 0.5 g / m 2 as the second layer, and the silicon content in the film is 0.2 to 20 mass%. Since it is obtained by forming, the whole surface of a steel plate can be covered with a uniform film. This makes it possible to improve the adhesion between the plating surface of the Zn-Co plating and the interface of the silicon-containing post-treatment film, and at the same time, ensure the conductivity and corrosion resistance, which are the main performance requirements to be possessed in general-purpose home appliance applications. it can.

以下に、本発明について実施例を掲げて更に詳しく説明するが、本発明はこれらの実施例のみに限定されるものではない。   Hereinafter, the present invention will be described in more detail with reference to examples, but the present invention is not limited to only these examples.

用いためっき鋼板を表1、Zn−Coめっき作製水準を表2、ケイ素含有後処理皮膜中ケイ素含有化合物の水準を表3−1、ケイ素含有後処理皮膜中無機塩および有機化合物の混合水準を表3−2にそれぞれ示す。更に、ケイ素含有後処理皮膜を構成するケイ素含有化合物と無機塩および有機化合物の混合物の組み合わせ水準を、表4−1、4−2に示す。   Table 1 shows the plated steel sheet used, Table 2 shows the Zn-Co plating production level, Table 3 shows the level of the silicon-containing compound in the silicon-containing post-treatment film, and shows the mixing level of the inorganic salt and organic compound in the silicon-containing post-treatment film. Each is shown in Table 3-2. Furthermore, the combination level of the mixture of the silicon-containing compound, the inorganic salt and the organic compound constituting the silicon-containing post-treatment film is shown in Tables 4-1 and 4-2.

Figure 0004808585
Figure 0004808585

Figure 0004808585
Figure 0004808585

Figure 0004808585
Figure 0004808585

Figure 0004808585

Figure 0004808585
Figure 0004808585

Figure 0004808585

これらの組み合わせによって、本実施例に示すクロメートフリー表面処理金属材料を作製し、導電性および耐食性を調査した。なお、各組成のZn−Coめっき皮膜は、表2の作製水準を用いて、所定時間の通電を行い作製した。また、各皮膜の付着量は、皮膜形成前後の質量差を被覆面積で除することで決定した。なお、表3−2に示したM1〜M17の塗布液の無機系成分と有機系成分との質量比等は、表3−2に記載の通りである。各種評価内容および基準は次の通りである。   With these combinations, the chromate-free surface-treated metal material shown in this example was produced, and the conductivity and corrosion resistance were investigated. In addition, the Zn-Co plating film of each composition was produced by energizing for a predetermined time using the production levels shown in Table 2. Moreover, the adhesion amount of each film was determined by dividing the mass difference before and after the film formation by the coating area. In addition, the mass ratio of the inorganic component and the organic component of the coating liquids M1 to M17 shown in Table 3-2 is as shown in Table 3-2. Various evaluation contents and criteria are as follows.

(導電性評価方法)
平滑で所定サイズの平板表面について、層間抵抗測定機を用いて、層間抵抗(JIS C2550に準ずる)を測定した。評価基準は以下の通りである。
(Conductivity evaluation method)
Interlayer resistance (according to JIS C2550) was measured on a smooth flat plate surface of a predetermined size using an interlayer resistance measuring machine. The evaluation criteria are as follows.

導電性(評価4点以上が合格)
評点5:1.0Ω未満
4:1.0Ω以上2.0Ω未満
3:2.0Ω以上3.0Ω未満
2:3.0Ω以上4.0Ω未満
1:4.0Ω以上
以上の評価結果を、表4−1、4−2に示した。
Conductivity (4 or more evaluations pass)
Score 5: Less than 1.0Ω 4: 1.0Ω or more and less than 2.0Ω
3: 2.0Ω or more and less than 3.0Ω
2: 3.0Ω or more and less than 4.0Ω
1: 4.0Ω or more
The above evaluation results are shown in Tables 4-1 and 4-2.

(耐食性評価方法)
平板を150mm(長手)×70mm(幅)サイズに切断し、板端面部と裏面部を市販の防錆テープでシーリングした後で、塩水噴霧試験SST(JIS Z2371)環境に仰角60°で放置し、3日後の腐食外観を下記の評点で評価した。評価基準は以下の通りである。百分率は、部位の錆発生面積率を表す。耐食性評価4点以上が合格である。
(Corrosion resistance evaluation method)
The flat plate is cut to a size of 150 mm (long) x 70 mm (width), and the end and back sides of the plate are sealed with a commercially available rust preventive tape, and then left in the salt spray test SST (JIS Z2371) environment at an elevation angle of 60 °. The corrosion appearance after 3 days was evaluated according to the following score. The evaluation criteria are as follows. The percentage represents the rust generation area ratio of the part. A corrosion resistance evaluation of 4 points or more is acceptable.

耐食性(評価4点以上が合格)
評点5:白錆発生なし
4:白錆発生50%未満
3:全面白錆発生
2:白錆発生多、赤錆発生微少
1:赤錆発生多
以上の評価結果を、表4−1、4−2に示した。
Corrosion resistance (4 or more evaluations are acceptable)
Score 5: No white rust generated 4: White rust generated less than 50% 3: White rust generated over the entire surface 2: White rust generated a lot, red rust generated a small amount It was shown to.

Figure 0004808585
Figure 0004808585

Figure 0004808585
Figure 0004808585

表4−1、4−2の評価結果に示す通り、本実施形態に係る製造方法で作製した鋼板(実施例No.1〜48)は、導電性と耐食性が良好であることがわかった。それに比較して、本実施形態に係る範囲を逸脱する場合(比較例No.1〜20)は、導電性および/または耐食性が不良であることがわかった。   As shown in the evaluation results of Tables 4-1 and 4-2, it was found that the steel plates (Example Nos. 1 to 48) produced by the production method according to this embodiment had good conductivity and corrosion resistance. In contrast, when deviating from the range according to the present embodiment (Comparative Examples No. 1 to 20), it was found that the conductivity and / or corrosion resistance was poor.

上記の結果より、本発明に係る表面処理金属材料は、金属材料表面にそれぞれ前出の構成からなる皮膜を所定量有することで、優れた導電性と耐食性を具備できることがわかった。   From the above results, it was found that the surface-treated metal material according to the present invention can have excellent conductivity and corrosion resistance by having a predetermined amount of the coating film having the above-described configuration on the surface of the metal material.

以上説明したように、本発明は、環境保全などの社会問題の対策案の一つであり、かつ、低皮膜厚みによる低製造コスト化を実現でき、実用上極めて有効な価値ある技術と言える。   As described above, the present invention is one of countermeasures for social problems such as environmental protection, and can realize a reduction in manufacturing cost due to a low film thickness, and can be said to be a valuable technique that is extremely effective in practical use.

以上、本発明の好適な実施形態について説明したが、本発明はかかる例に限定されないことは言うまでもない。当業者であれば、特許請求の範囲に記載された範疇内において、各種の変更例または修正例に想到し得ることは明らかであり、それらについても当然に本発明の技術的範囲に属するものと了解される。   As mentioned above, although preferred embodiment of this invention was described, it cannot be overemphasized that this invention is not limited to this example. It will be apparent to those skilled in the art that various changes and modifications can be made within the scope of the claims, and these are naturally within the technical scope of the present invention. Understood.

本発明のクロメートフリー表面処理金属材料は、上述した金属材料の上に微量Co含有Zn−Coめっき皮膜を被覆し、更にその上にケイ素含有後処理皮膜を薄く被覆させることにより、金属材料表面に耐食性および導電性に優れた皮膜を形成させることができる。かかる本発明は、環境保全などの社会問題の対策案の一つであり、かつ、低皮膜厚みによる低製造コスト化を実現でき実用上極めて有効な価値ある技術と言える。本発明は、デジタル家電、精密機器、OA機器、白物家電等の汎用家電分野での今後の波及効果が期待できる。   The chromate-free surface-treated metal material of the present invention is formed on the surface of the metal material by coating a trace amount of Co-containing Zn-Co plating film on the above-described metal material and further thinly coating a silicon-containing post-treatment film thereon. A film excellent in corrosion resistance and conductivity can be formed. The present invention is one of countermeasures for social problems such as environmental protection, and can be said to be a practically extremely effective and valuable technique that can realize a reduction in manufacturing cost due to a low film thickness. The present invention can be expected to have a future ripple effect in the field of general-purpose home appliances such as digital home appliances, precision equipment, OA equipment, and white goods home appliances.

Claims (2)

金属材料の片面または両面の表面に、
皮膜量が1.0〜5.0g/mであり、めっき中のコバルト含有率が0.2〜1.0mass%である亜鉛−コバルトめっき皮膜からなる第一層と、
前記第一層上に形成され、皮膜量が0.05〜0.5g/mであり、皮膜中のケイ素含有率が0.2〜20mass%であるケイ素含有後処理皮膜からなる第二層と、
を有することを特徴とする、表面処理金属材料。
On one or both surfaces of metal material,
A first layer composed of a zinc-cobalt plating film having a coating amount of 1.0 to 5.0 g / m 2 and a cobalt content during plating of 0.2 to 1.0 mass%;
A second layer comprising a silicon-containing post-treatment film formed on the first layer and having a film amount of 0.05 to 0.5 g / m 2 and a silicon content in the film of 0.2 to 20 mass%. When,
A surface-treated metal material characterized by comprising:
前記金属材料は、亜鉛系めっき鋼板であることを特徴とする、請求項1に記載の表面処理金属材料。   The surface-treated metal material according to claim 1, wherein the metal material is a zinc-based plated steel sheet.
JP2006285555A 2006-10-19 2006-10-19 Surface-treated metal material Active JP4808585B2 (en)

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