JP4630692B2 - レーザー加工方法 - Google Patents
レーザー加工方法 Download PDFInfo
- Publication number
- JP4630692B2 JP4630692B2 JP2005062145A JP2005062145A JP4630692B2 JP 4630692 B2 JP4630692 B2 JP 4630692B2 JP 2005062145 A JP2005062145 A JP 2005062145A JP 2005062145 A JP2005062145 A JP 2005062145A JP 4630692 B2 JP4630692 B2 JP 4630692B2
- Authority
- JP
- Japan
- Prior art keywords
- adhesive film
- semiconductor wafer
- dicing tape
- laser beam
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000003672 processing method Methods 0.000 title claims description 11
- 239000004065 semiconductor Substances 0.000 claims description 199
- 239000002313 adhesive film Substances 0.000 claims description 134
- 230000001681 protective effect Effects 0.000 claims description 17
- 238000000034 method Methods 0.000 description 53
- 238000005520 cutting process Methods 0.000 description 23
- 238000004519 manufacturing process Methods 0.000 description 19
- 238000003384 imaging method Methods 0.000 description 7
- 230000001678 irradiating effect Effects 0.000 description 6
- 238000003754 machining Methods 0.000 description 6
- 229920000098 polyolefin Polymers 0.000 description 4
- 230000011218 segmentation Effects 0.000 description 4
- 239000004925 Acrylic resin Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 239000009719 polyimide resin Substances 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910009372 YVO4 Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000007767 bonding agent Substances 0.000 description 1
- 244000309464 bull Species 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/10—Devices involving relative movement between laser beam and workpiece using a fixed support, i.e. involving moving the laser beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/27—Manufacturing methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/30—Organic material
- B23K2103/42—Plastics
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
- H01L2221/68336—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding involving stretching of the auxiliary support post dicing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/2919—Material with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8319—Arrangement of the layer connectors prior to mounting
- H01L2224/83191—Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on the semiconductor or solid-state body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/8385—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01006—Carbon [C]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01013—Aluminum [Al]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01015—Phosphorus [P]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01019—Potassium [K]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01074—Tungsten [W]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/06—Polymers
- H01L2924/0665—Epoxy resin
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/06—Polymers
- H01L2924/078—Adhesive characteristics other than chemical
- H01L2924/07802—Adhesive characteristics other than chemical not being an ohmic electrical conductor
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Dicing (AREA)
- Laser Beam Processing (AREA)
Description
該半導体ウエーハの保護部材側をチャックテーブルに載置し、該半導体ウエーハが貼着された該ダイシングテープを拡張し、該複数の半導体チップに分離した該分割溝の幅を拡大するテープ拡張工程と、
該テープ拡張工程の後、該半導体ウエーハの該保護部材側をチャックテーブルで保持し、該複数の半導体チップに分離した該分割溝の幅を拡大した状態で、該ダイシングテープ側から該分割溝に沿って該接着フィルムに該ダイシングテープは吸収しないが該接着フィルムは吸収する波長のレーザー光線を照射し、該接着フィルムを該分割溝に沿って溶断する接着フィルム溶断工程と、を含む、
ことを特徴とするレーザー加工方法が提供される。
図7に示す実施形態は、ダイシングテープの表面に予め接着フィルムが貼着された接着フィルム付きのダイシングテープを使用する。即ち、図7の(a)、(b)に示すように環状のダイシングフレーム15の内側開口部を覆うように外周部が装着されたダイシングテープ16の表面に貼着された接着フィルム14を個々の半導体チップに分離された半導体ウエーハ10の裏面10bに貼着する。このとき、80〜200°Cの温度で加熱しつつ接着フィルム14を半導体ウエーハ10の裏面10bに押圧して貼着する。なお、上記ダイシングテープ16は、図示の実施形態においては伸張可能な厚さが95μmのポリオレフィンシートかならっている。このような接着フィルム付きのダイシングテープは、株式会社リンテック社製の接着フィルム付きのダイシングテープ(LE5000)を用いることができる。
接着フィルム溶断工程は、上述した接着フィルム貼着工程およびダイシングテープ貼着工程が実施され、ダイシングテープ16の表面に接着フィルム14側が貼着された半導体ウエーハ10を、図11の(a)で示すように保護部材12側をチャックテーブル35の被加工物保持部材352上に載置する。そして、ダイシングテープ16が装着された環状のダイシングフレーム15をフレーム保持手段354の4個の保持アーム356上に載置し、4個のクランプ357によって環状のダイシングフレーム15を4個の保持アーム356に固定する。次に、移動手段358の複数のエアシリンダ359を作動し、フレーム保持手段354を図11の(a)で示す基準位置から図11の(b)で示す拡張位置に下降せしめる。この結果、伸長可能なダイシングテープ16は拡張されるので、ダイシングテープ16に貼着されている接着フィルム14も拡張され、接着フィルム14が貼着されている半導体ウエーハ10は分割溝103の幅が拡大せしめられ、各半導体チップ100間の間隔が拡大される(テープ拡張工程)。このようにしてテープ拡張工程を実施したならば、図示しない吸引手段を作動してチャックテーブル35の被加工物保持部材352に載置された半導体ウエーハ10を保護部材12を介して吸引保持する。このようにして半導体ウエーハ10を吸引保持したチャックテーブル35は、加工送り手段37の作動により案内レール31、31に沿って移動せしめられレーザー光線照射ユニット5に配設された撮像手段6の直下に位置付けられる。
レーザー光線の種類 ;固体レーザー(YVO4レーザー、YAGレーザー)
波長 :355nm
発振方法 :パルス発振
パルス幅 :12ns
集光スポット径 :φ9.2μm
繰り返し周波数 :50kHz
平均出力 :2W
加工送り速度 :500mm/秒
上述したようにダイシングフレーム15に装着された伸長可能なダイシングテープ16の上面に支持された複数個の半導体チップ100(裏面に貼着された接着フィルム14a側がダイシングテープ16の上面に貼着されている)は、図15および図16の(a)に示すようにダイシングフレーム15が円筒状のベース81の載置面811上に載置され、クランプ84によってベース81に固定される。次に、図16の(b)に示すように上記ダイシングテープ16における複数個の半導体チップ100が存在する領域161を支持した拡張手段82の拡張部材821を図示しない昇降手段によって図16(a)の基準位置から上方の図16の(b)に示す拡張位置まで移動する。この結果、伸長可能なダイシングテープ16は拡張されるので、ダイシングテープ16と半導体チップ100に装着されている接着フィルム14aとの間にズレが生じ密着性が低下するため、接着フィルム14aを貼着した半導体チップ100がダイシングテープ16から容易に離脱できる状態となるとともに、個々の半導体チップ100および該半導体チップ100に貼着された接着フィルム14a間には隙間が形成される。
図18に示すダイシングテープ貼着工程は、上述した分割溝表出工程および接着フィルム貼着工程が実施され接着フィルム14が裏面に貼着された半導体ウエーハ10の接着フィルム14側を、環状のダイシングフレーム15に装着されたダイシングテープ16の表面に貼着する。従って、半導体ウエーハ10は、表面10aが上側となる。
図21に示すダイシングテープ貼着工程は、上述した分割溝表出工程および接着フィルム貼着工程が実施され接着フィルム14が裏面に貼着された半導体ウエーハ10の表面10a側を、環状のダイシングフレーム15に装着されたダイシングテープ16の表面に貼着する。従って、半導体ウエーハ10の裏面に貼着され接着フィルム14が上側となる。
2:静止基台
3: チャックテーブル機構
35: チャックテーブル
354: フレーム保持手段
358:移動手段
36: 回転駆動手段
37:加工送り手段
38:第1の割り出し送り手段
4: レーザー光線照射ユニット支持機構
42:可動支持基台
43:第2の割り出し送り手段
5: レーザー光線照射ユニット
52: レーザー光線照射手段
522:集光器
6:撮像手段
8: ピックアップ装置
82:拡張手段
83:紫外線照射ランプ
10:半導体ウエーハ
100:半導体チップ
101: ストリート
102: デバイス
103:分割溝
11:切削装置
111: チャックテーブル
112:切削ブレード
113:切削手段
12:保護部材
13:研削装置
131: チャックテーブル
132: チャックテーブル
133: チャックテーブル
14:接着フィルム
15:ダイシングフレーム
16: ダイシングテープ
Claims (1)
- 複数の半導体チップに分離され表面に保護部材が貼着された半導体ウエーハの裏面にダイボンディング用の接着フィルムが貼着され、該半導体ウエーハの該接着フィルム側が環状のフレームに装着された伸張可能なダイシングテープに貼着されており、該接着フィルムを該複数の半導体チップに分離した分割溝に沿って溶断するレーザー加工方法であって、
該半導体ウエーハの保護部材側をチャックテーブルに載置し、該半導体ウエーハが貼着された該ダイシングテープを拡張し、該複数の半導体チップに分離した該分割溝の幅を拡大するテープ拡張工程と、
該テープ拡張工程の後、該半導体ウエーハの該保護部材側をチャックテーブルで保持し、該複数の半導体チップに分離した該分割溝の幅を拡大した状態で、該ダイシングテープ側から該分割溝に沿って該接着フィルムに該ダイシングテープは吸収しないが該接着フィルムは吸収する波長のレーザー光線を照射し、該接着フィルムを該分割溝に沿って溶断する接着フィルム溶断工程と、を含む、
ことを特徴とするレーザー加工方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005062145A JP4630692B2 (ja) | 2005-03-07 | 2005-03-07 | レーザー加工方法 |
US11/365,833 US20060197260A1 (en) | 2005-03-07 | 2006-03-02 | Laser processing method and laser beam processing machine |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005062145A JP4630692B2 (ja) | 2005-03-07 | 2005-03-07 | レーザー加工方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006245467A JP2006245467A (ja) | 2006-09-14 |
JP4630692B2 true JP4630692B2 (ja) | 2011-02-09 |
Family
ID=36943390
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005062145A Active JP4630692B2 (ja) | 2005-03-07 | 2005-03-07 | レーザー加工方法 |
Country Status (2)
Country | Link |
---|---|
US (1) | US20060197260A1 (ja) |
JP (1) | JP4630692B2 (ja) |
Families Citing this family (42)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006128211A (ja) * | 2004-10-26 | 2006-05-18 | Disco Abrasive Syst Ltd | ウエーハの分割装置 |
US20070111399A1 (en) * | 2005-11-14 | 2007-05-17 | Goida Thomas M | Method of fabricating an exposed die package |
JP2008073740A (ja) * | 2006-09-22 | 2008-04-03 | Disco Abrasive Syst Ltd | ビアホールの加工方法 |
JP4933233B2 (ja) * | 2006-11-30 | 2012-05-16 | 株式会社ディスコ | ウエーハの加工方法 |
JP5166899B2 (ja) * | 2007-02-13 | 2013-03-21 | 株式会社ディスコ | ウエーハの分割方法 |
JP2008213074A (ja) * | 2007-03-02 | 2008-09-18 | Disco Abrasive Syst Ltd | 駆動機構及び切削装置 |
JP4944642B2 (ja) * | 2007-03-09 | 2012-06-06 | 株式会社ディスコ | デバイスの製造方法 |
JP5048379B2 (ja) * | 2007-04-05 | 2012-10-17 | 株式会社ディスコ | ウェーハの加工方法 |
JP5144197B2 (ja) * | 2007-09-27 | 2013-02-13 | 株式会社ディスコ | レーザー加工装置および接着フィルム切断方法 |
KR101176431B1 (ko) | 2007-10-09 | 2012-08-30 | 히다치 가세고교 가부시끼가이샤 | 접착 필름이 부착된 반도체칩의 제조 방법, 이 제조 방법에 사용되는 반도체용 접착 필름, 및 반도체 장치의 제조 방법 |
JP2009123835A (ja) * | 2007-11-13 | 2009-06-04 | Disco Abrasive Syst Ltd | 半導体デバイスの製造方法 |
JP5203744B2 (ja) * | 2008-02-21 | 2013-06-05 | 株式会社ディスコ | ウエーハの裏面に装着された接着フィルムの破断方法 |
JP2009231779A (ja) * | 2008-03-25 | 2009-10-08 | Lintec Corp | 半導体装置の製造方法 |
JP5319993B2 (ja) * | 2008-09-10 | 2013-10-16 | 積水化学工業株式会社 | ダイシング−ダイボンディングテープ及び半導体チップの製造方法 |
US9409383B2 (en) * | 2008-12-22 | 2016-08-09 | Apple Inc. | Layer-specific energy distribution delamination |
WO2011096265A1 (ja) * | 2010-02-04 | 2011-08-11 | シャープ株式会社 | 転写方法および半導体装置の製造方法並びに半導体装置 |
JP4902812B2 (ja) * | 2010-02-12 | 2012-03-21 | 積水化学工業株式会社 | 粘接着剤層付き半導体チップの製造方法 |
JP5580701B2 (ja) | 2010-09-13 | 2014-08-27 | 日東電工株式会社 | ダイシング・ダイボンドフィルム |
JP5749489B2 (ja) * | 2010-12-27 | 2015-07-15 | 株式会社ディスコ | 光デバイスウエーハの加工方法 |
JP5992277B2 (ja) * | 2012-09-20 | 2016-09-14 | 株式会社ディスコ | 加工方法 |
JP6047353B2 (ja) * | 2012-09-20 | 2016-12-21 | 株式会社ディスコ | 加工方法 |
KR101432153B1 (ko) * | 2012-11-13 | 2014-08-22 | 삼성디스플레이 주식회사 | 광 투과 장치 및 이를 구비하는 어닐링 장치 |
JP6214901B2 (ja) * | 2013-04-04 | 2017-10-18 | 株式会社ディスコ | 切削装置 |
JP6054234B2 (ja) * | 2013-04-22 | 2016-12-27 | 株式会社ディスコ | ウエーハの加工方法 |
US9236351B2 (en) * | 2013-10-09 | 2016-01-12 | Taiwan Semiconductor Manufacturing Company Ltd. | Semiconductor wafer device |
JP6400938B2 (ja) * | 2014-04-30 | 2018-10-03 | ファスフォードテクノロジ株式会社 | ダイボンダ及びボンディング方法 |
JP6280459B2 (ja) * | 2014-06-27 | 2018-02-14 | 株式会社ディスコ | テープ拡張装置 |
US20160005653A1 (en) * | 2014-07-02 | 2016-01-07 | Nxp B.V. | Flexible wafer-level chip-scale packages with improved board-level reliability |
JP6553940B2 (ja) | 2015-05-15 | 2019-07-31 | 株式会社ディスコ | レーザー加工装置 |
JP6576172B2 (ja) * | 2015-09-03 | 2019-09-18 | 株式会社ディスコ | チャックテーブル |
JP6605946B2 (ja) * | 2015-12-24 | 2019-11-13 | 株式会社ディスコ | チップ収容トレイからチップをピックアップする方法 |
US20170287768A1 (en) * | 2016-03-29 | 2017-10-05 | Veeco Precision Surface Processing Llc | Apparatus and Method to Improve Plasma Dicing and Backmetal Cleaving Process |
CN106206397B (zh) * | 2016-08-05 | 2020-02-07 | 厦门市三安光电科技有限公司 | 用于半导体器件的薄膜及半导体器件的制作方法 |
JP7217585B2 (ja) * | 2017-04-13 | 2023-02-03 | 株式会社ディスコ | 分割方法 |
JP6912267B2 (ja) * | 2017-05-09 | 2021-08-04 | 株式会社ディスコ | レーザ加工方法 |
CN107195560A (zh) * | 2017-06-02 | 2017-09-22 | 深圳华创兆业科技股份有限公司 | Ic卡的激光封装系统及方法 |
JP7083573B2 (ja) * | 2018-04-09 | 2022-06-13 | 株式会社ディスコ | ウェーハの加工方法 |
JP2020024967A (ja) * | 2018-08-06 | 2020-02-13 | 株式会社ディスコ | ウェーハの加工方法 |
JP7191458B2 (ja) * | 2018-08-06 | 2022-12-19 | 株式会社ディスコ | ウェーハの加工方法 |
JP2020024968A (ja) * | 2018-08-06 | 2020-02-13 | 株式会社ディスコ | ウェーハの加工方法 |
KR20220026622A (ko) * | 2020-08-25 | 2022-03-07 | 주식회사 제우스 | 기판처리장치 및 기판처리방법 |
TWI821679B (zh) * | 2020-08-25 | 2023-11-11 | 南韓商杰宜斯科技有限公司 | 基板處理裝置及基板處理方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002118081A (ja) * | 2000-10-10 | 2002-04-19 | Toshiba Corp | 半導体装置の製造方法 |
JP2004273895A (ja) * | 2003-03-11 | 2004-09-30 | Disco Abrasive Syst Ltd | 半導体ウエーハの分割方法 |
JP2005019525A (ja) * | 2003-06-24 | 2005-01-20 | Disco Abrasive Syst Ltd | 半導体チップの製造方法 |
JP2005045149A (ja) * | 2003-07-25 | 2005-02-17 | Tokyo Seimitsu Co Ltd | エキスパンド方法 |
JP2005116739A (ja) * | 2003-10-07 | 2005-04-28 | Disco Abrasive Syst Ltd | 半導体チップの製造方法 |
JP2006093213A (ja) * | 2004-09-21 | 2006-04-06 | Hitachi Chem Co Ltd | 接着剤層付き半導体素子の製造方法 |
JP2006128577A (ja) * | 2004-11-01 | 2006-05-18 | Furukawa Electric Co Ltd:The | 半導体チップの製造方法及びそれに使用されるダイボンドダイシングテープ |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6235387B1 (en) * | 1998-03-30 | 2001-05-22 | 3M Innovative Properties Company | Semiconductor wafer processing tapes |
JP3816253B2 (ja) * | 1999-01-19 | 2006-08-30 | 富士通株式会社 | 半導体装置の製造方法 |
JP4042347B2 (ja) * | 2001-05-18 | 2008-02-06 | 新科實業有限公司 | 磁気ヘッドスライダの浮上面形状加工方法及び磁気ヘッドスライダの製造方法 |
US7535100B2 (en) * | 2002-07-12 | 2009-05-19 | The United States Of America As Represented By The Secretary Of The Navy | Wafer bonding of thinned electronic materials and circuits to high performance substrates |
US20050023260A1 (en) * | 2003-01-10 | 2005-02-03 | Shinya Takyu | Semiconductor wafer dividing apparatus and semiconductor device manufacturing method |
US6756562B1 (en) * | 2003-01-10 | 2004-06-29 | Kabushiki Kaisha Toshiba | Semiconductor wafer dividing apparatus and semiconductor device manufacturing method |
KR101204197B1 (ko) * | 2003-06-06 | 2012-11-26 | 히다치 가세고교 가부시끼가이샤 | 접착시트, 다이싱 테이프 일체형 접착시트 및 반도체장치의 제조방법 |
US7179722B2 (en) * | 2004-02-03 | 2007-02-20 | Disco Corporation | Wafer dividing method |
-
2005
- 2005-03-07 JP JP2005062145A patent/JP4630692B2/ja active Active
-
2006
- 2006-03-02 US US11/365,833 patent/US20060197260A1/en not_active Abandoned
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002118081A (ja) * | 2000-10-10 | 2002-04-19 | Toshiba Corp | 半導体装置の製造方法 |
JP2004273895A (ja) * | 2003-03-11 | 2004-09-30 | Disco Abrasive Syst Ltd | 半導体ウエーハの分割方法 |
JP2005019525A (ja) * | 2003-06-24 | 2005-01-20 | Disco Abrasive Syst Ltd | 半導体チップの製造方法 |
JP2005045149A (ja) * | 2003-07-25 | 2005-02-17 | Tokyo Seimitsu Co Ltd | エキスパンド方法 |
JP2005116739A (ja) * | 2003-10-07 | 2005-04-28 | Disco Abrasive Syst Ltd | 半導体チップの製造方法 |
JP2006093213A (ja) * | 2004-09-21 | 2006-04-06 | Hitachi Chem Co Ltd | 接着剤層付き半導体素子の製造方法 |
JP2006128577A (ja) * | 2004-11-01 | 2006-05-18 | Furukawa Electric Co Ltd:The | 半導体チップの製造方法及びそれに使用されるダイボンドダイシングテープ |
Also Published As
Publication number | Publication date |
---|---|
US20060197260A1 (en) | 2006-09-07 |
JP2006245467A (ja) | 2006-09-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4630692B2 (ja) | レーザー加工方法 | |
JP4944642B2 (ja) | デバイスの製造方法 | |
JP2009123835A (ja) | 半導体デバイスの製造方法 | |
JP4630717B2 (ja) | 接着フィルムの破断方法 | |
KR20090116621A (ko) | 디바이스의 제조 방법 | |
JP2010027857A (ja) | 半導体デバイスの製造方法 | |
JP6034219B2 (ja) | ウエーハの加工方法 | |
JP2004273895A (ja) | 半導体ウエーハの分割方法 | |
JP4342992B2 (ja) | レーザー加工装置のチャックテーブル | |
JP6110136B2 (ja) | ウエーハのレーザー加工方法およびレーザー加工装置 | |
JP2009182178A (ja) | デバイスの製造方法 | |
JP2008235650A (ja) | デバイスの製造方法 | |
JP2008235398A (ja) | デバイスの製造方法 | |
JP2006108273A (ja) | ウエーハの分割方法および分割装置 | |
JP5495869B2 (ja) | レーザー加工溝の確認方法 | |
JP2005116739A (ja) | 半導体チップの製造方法 | |
JP4439990B2 (ja) | レーザー加工方法 | |
JP2015015359A (ja) | ウエーハの加工方法 | |
JP5331417B2 (ja) | レーザー加工装置 | |
JP2010064125A (ja) | レーザー加工装置 | |
JP4777701B2 (ja) | 接着フィルムの分離方法 | |
JP5144197B2 (ja) | レーザー加工装置および接着フィルム切断方法 | |
JP2006245209A (ja) | 半導体チップの製造方法 | |
JP2016086089A (ja) | ウエーハの加工方法 | |
JP2008264805A (ja) | レーザー加工装置およびウエーハの裏面に装着された接着フィルムのレーザー加工方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20080214 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20100517 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100525 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100723 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20101102 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20101115 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131119 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4630692 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131119 Year of fee payment: 3 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |