Nothing Special   »   [go: up one dir, main page]

JP4629883B2 - Oxidation treatment apparatus for organic treatment liquid and scale removal method thereof - Google Patents

Oxidation treatment apparatus for organic treatment liquid and scale removal method thereof Download PDF

Info

Publication number
JP4629883B2
JP4629883B2 JP2001025904A JP2001025904A JP4629883B2 JP 4629883 B2 JP4629883 B2 JP 4629883B2 JP 2001025904 A JP2001025904 A JP 2001025904A JP 2001025904 A JP2001025904 A JP 2001025904A JP 4629883 B2 JP4629883 B2 JP 4629883B2
Authority
JP
Japan
Prior art keywords
organic
liquid
oxidation
scale
treatment apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001025904A
Other languages
Japanese (ja)
Other versions
JP2002224690A (en
Inventor
寛 中井
一丸 佐伯
英夫 西田
利之 空
守 宮川
薫 村岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinko Pantec Co Ltd
Original Assignee
Kobelco Eco Solutions Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobelco Eco Solutions Co Ltd filed Critical Kobelco Eco Solutions Co Ltd
Priority to JP2001025904A priority Critical patent/JP4629883B2/en
Publication of JP2002224690A publication Critical patent/JP2002224690A/en
Application granted granted Critical
Publication of JP4629883B2 publication Critical patent/JP4629883B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Treatment Of Water By Oxidation Or Reduction (AREA)

Description

【0001】
【発明の属する技術分野】
本発明は、種々の有機物を含む有機性被処理液を高温・高圧下における酸化、特に超臨界水酸化又は亜臨界水酸化によって分解浄化する有機性被処理液の酸化処理装置及びそのスケール除去方法に関するものである。
【0002】
【従来の技術】
例えばPCBなどの難分解性の有害有機物でも高温・高圧下、特に超臨界水中では迅速かつ効率よく分解されることを利用し、種々の有機物を含む有機性被処理液を超臨界水酸化や亜臨界水酸化(超臨界水酸化より効率が低いものであり、湿式酸化ともいう)によって分解浄化する有機性被処理液の酸化処理装置が開発されている。かかる従来の一般的な有機性被処理液の酸化処理装置は、反応器、加熱・加圧手段、排出手段及び熱交換器を主構成要素とする。
【0003】
この反応器は、高温・高圧下で有機性被処理液に酸化反応を起こさせる円筒状等の容器であり、縦型のものや横型のものがある。また加熱・加圧手段は、有機性被処理液を高温・高圧の適切な状態にして反応器に供給するものであり、具体的には有機性被処理液を貯留しておく原料タンク、原料タンク内の有機性被処理液を反応器へ高圧で圧送する高圧ポンプ、反応器から排出された高温の処理液との熱交換により有機性被処理液を加熱する熱交換器、有機性被処理液を所定の温度に制御する温度調節器等を装備する。排出手段は、酸化反応後の処理液を反応器から排出するものであり、具体的には反応器後の高温・高圧の処理液を冷却する冷却器、減圧するための減圧弁等を装備する。
【0004】
【発明が解決しようとする課題】
上記有機性被処理液の酸化処理装置において、処理対象である有機性被処理液中には種々の有機物、塩類等が含まれるため、反応器、熱交換器、有機性被処理液及び処理液を流通させる主配管などの内壁には有機物等の堆積やチャーの付着によりスケールが形成され、さらには閉塞を起こすおそれがある。特に、超臨界状態における塩類の溶解度は亜臨界状態と比較して著しく低いので、有機性被処理液の超臨界状態への状態変化にともなって塩類等を析出し、内壁にスケールを生じやすい。このスケールは、有機物やチャーなどに比べ、常温・常圧での通水では除去しにくい。
【0005】
かかるスケールを除去する方法として、従来、(a)上記酸化処理装置の運転を停止して反応器等の温度・圧力を常温・常圧まで低下させた後に、有機性被処理液に替えて硝酸、リン酸等を流通させ、化学的に内壁のスケールを洗浄する方法や、(b)同様に運転を完全に停止した後に、酸化処理装置の一部又は全部を定期的に分解し、高圧水等により洗浄する方法が採用されている。
【0006】
上記(a)の方法では、洗浄に用いる硝酸等はその取扱いに注意を要し、安全対策が必要であること、洗浄廃液の後処理が発生すること、酸化処理装置の運転を停止する必要があること、洗浄に用いる硝酸等の大きな腐食性により反応器、主配管等の耐久性を阻害してしまうこと等の不都合がある。一方、上記(b)の方法では、酸化処理装置の運転を完全に止めて分解するため、その作業が大掛かりであり、多大な費用が発生する等の不都合がある。
【0007】
本発明はこれらの不都合に鑑みてなされたものであり、運転中の温度・圧力を常温・常圧まで下げる必要はなく、また装置の耐久性を阻害せず、さらに安全かつ迅速に内壁に形成されたスケールの除去が可能な有機性被処理液の酸化処理装置及びそのスケール除去方法の提供を目的とするものである。
【0008】
【課題を解決するための手段】
本発明者は、塩類等の溶解度が超臨界状態に比べて亜臨界状態で著しく向上することに着目し、酸化処理装置の処理対象である有機性被処理液に切り替えて亜臨界状態の洗浄液を流通させることで、内壁に形成されたスケールが効果的に除去されることを見いだした。
【0009】
その結果、上記課題を解決するためになされた発明は、高温・高圧下で有機性被処理液を酸化反応により分解浄化する酸化処理装置のスケール除去方法であって、この酸化処理装置の処理対象である有機性被処理液を洗浄液に切り替え、この洗浄液を亜臨界状態として流通させることを特徴とする。
【0010】
当該酸化処理装置のスケール除去方法によれば、有機性被処理液を洗浄液に切り替え、この洗浄液を亜臨界状態にして流通させることから、亜臨界状態の洗浄液の格段に高い溶解度により内壁に形成されたスケールを容易かつ迅速に除去することができる。また、有機性被処理液の酸化処理装置は一般的には超臨界水酸化やこれよりやや低温・低圧の亜臨界水酸化により有機性被処理液を分解浄化するものであるため、当該スケール除去方法のように洗浄液を亜臨界状態にして流通させるのに温度・圧力をあまり変動させる必要はなく、その結果、スケール除去の作業時間の短縮化が図られ、また温度・圧力の昇降に必要なエネルギー及びコストの低減化が図られる。
【0011】
上記洗浄液を水とし、流通させる洗浄液の温度及び圧力を200℃、5MPa以上374℃、22MPa以下とするとよい。この水は取扱性及び溶解度が高いので、上記スケール除去に好適である。また、流通させる水の温度及び圧力を上記範囲とすることで、塩類等に対する溶解度を高め、酸化処理装置の運転時の温度・圧力からの昇降を低減し、当該スケール除去方法によるスケール除去作業に必要なエネルギー及びコストの低減化を促進することができる。
【0012】
有機性被処理液を加熱・加圧する上記酸化処理装置の加熱・加圧手段を用いて上記洗浄液を亜臨界状態に加熱・加圧するとよい。この手段によれば、洗浄液を亜臨界状態にするために既存の加熱・加圧手段を援用することができ、当該スケール除去方法のために別途加熱・加圧手段を付設する必要はなく、設備コストの上昇を抑えることができる。また、洗浄液を亜臨界状態にするために酸化処理装置の加熱・加圧手段を用いることから、酸化処理装置の運転中に有機性被処理液を洗浄液に単に切り替える操作と、酸化処理装置の加熱・加圧手段による少しの温度・圧力制御とによって、酸化処理装置の運転から連続してスケール除去作業を行うことができ、また、逆の操作によってスケール除去作業から連続して酸化処理装置の運転を行うことができる。そのため、当該手段によれば、スケール除去作業のための運転停止時間がさらに短縮され、稼働率の向上に寄与する。
【0013】
上記酸化処理装置における酸化反応としては超臨界水酸化又は亜臨界水酸化が好ましい。かかる超臨界水酸化(SCWO)や亜臨界水酸化によれば、種々の有機物を含有する有機性被処理液を迅速かつ完全に分解浄化することができるが、上述のように塩類の溶解度の差異により亜臨界状態から超臨界状態への状態変化にともなって塩類を析出し、内壁にスケールを生じやすいことから、当該スケール除去方法が有効である。
【0014】
また、上記課題を解決するためになされた装置の発明は、有機性被処理液を高温・高圧下での酸化反応により分解浄化する反応器と、この反応器に有機性被処理液を加熱・加圧して供給する加熱・加圧手段と、酸化反応後の処理液を反応器から排出する排出手段とを備える有機性被処理液の酸化処理装置であって、この有機性被処理液を洗浄液に切り替え、この洗浄液を亜臨界状態として流通させるスケール除去手段を備えることを特徴とする。
【0015】
当該有機性被処理液の酸化処理装置によれば、上記酸化処理装置のスケール除去方法と同様に、スケール除去手段によって、処理対象である有機性被処理液を洗浄液に切り替え、この洗浄液を亜臨界状態にして流通させることから、亜臨界状態の洗浄液の格段に高い溶解度により内壁に形成されたスケールを容易かつ迅速に除去することができる。また、当該有機性被処理液の酸化処理装置は、処理運転に連続してスケール除去作業が行え、温度・圧力をあまり変動させる必要はないため、スケール除去の作業時間の短縮化及びコストの低減化が図られる。
【0016】
さらに、上記酸化処理装置のスケール除去方法と同様の理由から、(a)上記スケール除去手段において、洗浄液を水とし、流通させる洗浄液の温度及び圧力を200℃、5MPa以上374℃、22MPa以下とするとよく、(b)上記スケール除去手段において、洗浄液を上記加熱・加圧手段により亜臨界状態に加熱・加圧するとよく、(c)上記高温・高圧下での酸化反応としては超臨界水酸化又は亜臨界水酸化が好ましい。
【0017】
なお、当該有機性被処理液の酸化処理装置において、スケールの形成を監視するスケール監視手段をさらに備えることが好ましい。かかるスケール監視手段により内壁へのスケール形成の有無及び度合いが監視できれば、上記スケール除去手段によってスケール除去を行う適切なタイミングや除去作業に要する時間がわかり、当該有機性被処理液の酸化処理装置の稼働率の向上及びスケール除去に要するコストの低減化をさらに促進することができる。
【0018】
このスケール監視手段としては、出入口の圧力を測定し、その圧力差によりスケール形成の有無及び度合いを判断する手段を採用するとよい。当該有機性被処理液の酸化処理装置におけるスケール除去手段によれば、有機性被処理液から切り替えた亜臨界状態の洗浄液を流通させることで酸化処理装置のほぼ全体を洗浄できるため、正確なスケール形成位置を検知する必要はなく、装置全体として所定レベル以上のスケールが形成されたか否かが検知できればよいことから、上記スケール監視手段としては出入口の圧力差の増加量を基準として機器全体のスケール形成の有無及び度合いを判断することで足りる。
【0019】
【発明の実施の形態】
以下、適宜図面を参照しつつ本発明の実施の形態を詳説する。図1は本発明の一実施形態に係る有機性被処理液の酸化処理装置を示す概略構成図である。
【0020】
図1の有機性被処理液の酸化処理装置1は、反応器2、高圧ポンプ3、熱交換器4、温度調節器5、酸化剤供給手段6、冷却器7、減圧器8及び気液分離槽9を備えており、加えてスケール除去手段10を備えていることを特徴とする。このうち高圧ポンプ3、熱交換器4及び温度調節器5が上記加熱・加圧手段に相当し、冷却器7、減圧器8及び気液分離槽9が上記排出手段に相当する。
【0021】
高圧ポンプ3は、原料タンク等に貯留された有機性被処理液Aを反応器2に圧送するものであり、例えばプランジャ型ポンプ、ダイヤフラム型ポンプ、スクリュー型ポンプなどが用いられる。
【0022】
熱交換器4は、反応器2から排出される処理液と有機性被処理液Aとを熱交換させ、高温・高圧の処理液により有機性被処理液Aを予熱するものである。この熱交換器4としては、耐高温及び耐高圧用の一般的な熱交換器が使用できるが、動作流体として高温・高圧でかつ濃度が高い液体を使用することを考慮すると、2重管式熱交換器が好適である。
【0023】
温度調節器5は、反応器2に送る有機性被処理液Aを所定の酸化反応温度に制御するためのものであり、加熱・冷却という相反する機能を必要とする。そのため、当該温度調節器5としては、加熱器及び冷却器の別々の機器が併設される場合と、両機能を併有する機器が設けられる場合がある。この温度調節器5における加熱手段及び冷却手段としては特に限定されるものではなく、一般的な手段を用いることができる。
【0024】
反応器2は、高温・高圧下(例えば、超臨界状態又は亜臨界状態)で有機性被処理液A中の有機物に酸化反応を生じさせ、分解・浄化するものである。この反応器2の種類は、特に限定されるものでなく、耐高温及び耐高圧用の一般的な反応器を使用することができるが、有機性被処理液Aを連続的に分解処理することを考慮すると、管型反応器が好適である。なお、反応器2内の温度・圧力としては、200℃〜650℃、5MPa〜30MPaが好ましく、400℃〜600℃、22MPa〜30MPaの超臨界水酸化が反応の迅速性及び完全性の面で特に好ましい。
【0025】
酸化剤供給手段6は、反応器2内で有機性被処理液A中の有機物に酸化反応を生じさせるために有機性被処理液Aに酸化剤を注入するものである。この酸化剤供給手段6で用いられる酸化剤としては、例えば酸素が用いられるが、有機物に対し酸化力を有する空気、過酸化水素水なども用いることができる。また、当該酸化剤供給手段6による酸化剤の供給個所としては、反応器2直前で有機性被処理液A中の有機物の分解に必要な全量を注入しても良いし、反応器2直前と反応器2の適当な位置に分けて供給してもよい。
【0026】
冷却器7は、反応器2から排出された高温・高圧の処理液を冷却するためのものであり、空気冷却器等の一般的な冷却器を使用することができる。なお、冷媒により冷却し廃熱を有効利用することも考えられる。
【0027】
減圧器8は、反応器2から排出された高温・高圧の処理液を減圧するためのものであり、一般的には減圧弁等が用いられる。
【0028】
気液分離槽9は、反応器2から排出された処理液を分解処理された清浄水Bと有機物の酸化反応により生成した二酸化炭素、窒素等の排出ガスCとに分離する槽である。
【0029】
上記構造の有機性被処理液の酸化処理装置1の機能を以下に説明する。まず、加熱・加圧手段の高圧ポンプ3、熱交換器4及び温度調節器5により加圧・加熱して有機性被処理液Aを反応器2に供給するとともに、酸化剤供給手段6により有機性被処理液A中に酸化剤を供給すると、反応器2内では有機性被処理液A中の有機物と酸化剤との酸化反応により有機物が酸化分解される。その後、反応器2から排出された処理液は排出手段の冷却器7、減圧器8及び気液分離槽9により冷却、減圧及び気液分離されて外部に排出される。このような工程を経て、有機物を含む有機性被処理液Aを分解・浄化するものである。
【0030】
当該有機性被処理液の酸化処理装置1は、反応器2、有機性被処理液A及び処理液の主配管などの内壁に形成されるスケールを除去するスケール除去手段10を備える。かかるスケール除去手段10は、当該酸化処理装置1の処理対象である有機性被処理液Aを洗浄液Dに切り替え、洗浄液Dを亜臨界状態にして流通させるものである。このスケール除去手段10において、洗浄液Dを亜臨界状態に加熱・加圧する手段としては、当該有機性被処理液の酸化処理装置1の高圧ポンプ3、熱交換器4、温度調節器5及び減圧弁8を用いるとよく、つまり有機性被処理液Aを分解浄化する運転状態のまま洗浄液Dに切り替え、高圧ポンプ3、熱交換器4、温度調節器5及び減圧弁8をわずかに制御することで洗浄液Dを亜臨界状態とすることができる。
【0031】
このスケール除去手段10によって流通させる亜臨界状態の洗浄液Dの具体的な温度及び圧力としては、洗浄液Dとして安全で取扱性が高い水(純水又は水道水)を用いた場合、200℃、5MPa以上374℃、22MPa以下が好ましく、300℃、15MPa以上374℃、22MPa以下が特に好ましい。これは、洗浄液Dの温度及び圧力が上記範囲より小さいと、酸化処理装置1の運転時の有機性被処理液Aの温度及び圧力との差が大きく、スケール除去作業時の降温・降圧及び運転再開時の昇温・昇圧に時間とエネルギーを必要とし、またスケール除去能力が低下してしまうことからであり、逆に、洗浄液Dの温度及び圧力が上記範囲を超えると、超臨界状態となって溶解度が低下し、スケール除去能力が低下することからである。
【0032】
例えば、当該酸化処理装置1が約550℃、26MPa程度の運転条件の超臨界水酸化により有機性被処理液Aを分解浄化する装置である場合、スケール除去手段10により洗浄液Dに切り替えた後の高圧ポンプ3による加圧条件はそのまま維持し、熱交換器4、温度調節器5による加熱条件は洗浄液Dが約350℃程度になるよう加熱するのが好ましい。これにより、当該酸化処理装置1の運転は継続しており、熱関係ではスケール除去作業及び運転再開のために室温への冷却及び超臨界温度への加熱が不要であり、また、圧力関係ではスケール除去作業及び運転再開のために無駄な降圧及び昇圧が不要である。従って、スケール除去作業に要する時間の短縮化及び費用の低減化が図られる。
【0033】
また、当該有機性被処理液の酸化処理装置1には、スケール形成の有無及び度合いを監視するスケール監視手段を備えるとよい。かかるスケール監視手段によりスケールの所定レベル以上の形成が検知された場合に、上記スケール除去手段10によりスケール除去作業を行い、次いで、スケール監視手段によりスケール除去が検知された場合に、スケール除去手段10によるスケール除去作業を終了し、その後、洗浄液Dから連続して有機性被処理液Aに切り替えて通常運転に移行する。このようにスケール監視手段を設けることで、スケール除去手段10によるスケール除去作業を行うタイミング及び作業時間の最適化を図ることができる。
【0034】
上記スケール監視手段としては、(1)内圧を測定する圧力計11を設置し、反応器2、熱交換器4、主配管等の機器の出入口の圧力を測定し、その圧力差の増加により判断する手段、(2)上記機器の外面温度を測定し、その経時変化により判断する手段、(3)流速により判断する手段等の種々の手段を採用することができるが、当該スケール除去手段10によれば酸化処理装置1全体のスケール除去が可能であり、スケール形成箇所を部分的に検知する必要がないため、監視が容易な上記(1)の出入口の圧力差によりスケール形成の有無及び度合いを判断する手段が好ましい。
【0035】
なお、本発明の有機性被処理液の酸化処理装置及びそのスケール除去方法は上記実施形態に限定されるものではなく、例えば、洗浄液Dを亜臨界状態に加熱・加圧する手段を別途設け、亜臨界状態として当該酸化処理装置1に流通させることも可能である。また、スケール除去手段10によるスケール除去作業時に気液分離槽9から排出される液を洗浄液Dに循環させてもよい。さらに、上記スケール監視手段を特に設けず、スケール除去手段10により定期的にスケール除去作業を行ってもよい。
【0036】
【発明の効果】
以上説明したように、本発明の有機性被処理液の酸化処理装置及びそのスケール除去方法によれば、反応器等の内壁に形成されたスケールを容易かつ迅速に除去することができる。また、酸化処理装置の運転中の温度・圧力をあまり変えずにスケール除去作業ができるため、エネルギー及びコストの低減化が図られる。
さらに、酸化処理装置の耐久性を阻害せず、安全かつ迅速に内壁に形成されたスケールの除去が可能である。
【図面の簡単な説明】
【図1】本発明の一実施形態に係る有機性被処理液の酸化処理装置を示す概略構成図である。
【符号の説明】
1 有機性被処理液の酸化処理装置
2 反応器
3 高圧ポンプ
4 熱交換器
5 温度調節器
6 酸化剤供給手段
7 冷却器
8 減圧器
9 気液分離槽
10 スケール除去手段
11 圧力計
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an oxidation treatment apparatus for an organic treatment liquid that decomposes and purifies an organic treatment liquid containing various organic substances by oxidation under high temperature and high pressure, in particular, supercritical water oxidation or subcritical water oxidation, and a scale removal method thereof. It is about.
[0002]
[Prior art]
For example, by utilizing the fact that even difficult-to-decompose harmful organic substances such as PCBs are decomposed quickly and efficiently at high temperatures and pressures, especially in supercritical water, organic processing liquids containing various organic substances can be converted into supercritical water oxidation or sublimation. An oxidation treatment apparatus for organic liquids to be decomposed and purified by critical water oxidation (which is less efficient than supercritical water oxidation and is also called wet oxidation) has been developed. Such a conventional general organic processing liquid oxidation treatment apparatus mainly comprises a reactor, a heating / pressurizing means, a discharging means, and a heat exchanger.
[0003]
This reactor is a cylindrical container or the like that causes an organic reaction liquid to undergo an oxidation reaction under high temperature and high pressure, and includes a vertical type and a horizontal type. The heating / pressurizing means supplies the organic processing liquid in an appropriate state of high temperature and high pressure to the reactor. Specifically, the raw material tank for storing the organic processing liquid, the raw material High-pressure pump that pumps the organic processing liquid in the tank to the reactor at high pressure, heat exchanger that heats the organic processing liquid by heat exchange with the high-temperature processing liquid discharged from the reactor, organic processing Equipped with a temperature controller that controls the liquid to a predetermined temperature. The discharge means discharges the treatment liquid after the oxidation reaction from the reactor. Specifically, the discharge means is equipped with a cooler for cooling the high-temperature and high-pressure treatment liquid after the reactor, a pressure reducing valve for reducing the pressure, and the like. .
[0004]
[Problems to be solved by the invention]
In the organic treatment liquid oxidation treatment apparatus, since the organic treatment liquid to be treated contains various organic substances, salts, etc., the reactor, the heat exchanger, the organic treatment liquid, and the treatment liquid A scale is formed on the inner wall of the main pipe or the like through which organic matter is circulated due to the accumulation of organic substances or the like and the adhesion of char, and there is a risk of clogging. In particular, since the solubility of the salt in the supercritical state is significantly lower than that in the subcritical state, the salt or the like is likely to precipitate with the change of the state of the organic liquid to be processed to the supercritical state, and scale is likely to be generated on the inner wall. This scale is difficult to remove by passing water at room temperature and pressure, compared to organic matter and char.
[0005]
As a method for removing such scale, conventionally, (a) after the operation of the oxidation treatment apparatus is stopped and the temperature / pressure of the reactor or the like is lowered to room temperature / normal pressure, the organic treatment liquid is replaced with nitric acid. A method of chemically washing the inner wall scale by circulating phosphoric acid or the like, and (b) similarly, after stopping the operation completely, periodically or partially decomposing the oxidation treatment apparatus, A method of cleaning by, for example, is employed.
[0006]
In the method (a) above, nitric acid used for cleaning needs to be handled with care, safety measures are required, post-processing of cleaning waste liquid occurs, and the operation of the oxidation processing device needs to be stopped. In addition, there is a disadvantage that the durability of the reactor, main piping and the like is hindered due to large corrosiveness such as nitric acid used for cleaning. On the other hand, in the method (b), since the operation of the oxidation treatment apparatus is completely stopped and disassembled, the work is large and there is a disadvantage that a great amount of cost is generated.
[0007]
The present invention has been made in view of these disadvantages, and it is not necessary to lower the temperature and pressure during operation to room temperature and normal pressure, and it does not impair the durability of the device, and more safely and quickly forms on the inner wall. It is an object of the present invention to provide an organic treatment liquid oxidation treatment apparatus capable of removing the scale and a scale removal method thereof.
[0008]
[Means for Solving the Problems]
The present inventor noticed that the solubility of salts and the like is significantly improved in the subcritical state as compared to the supercritical state, and switched to the organic liquid to be treated in the oxidation treatment apparatus to change the subcritical state cleaning liquid. It was found that the scale formed on the inner wall was effectively removed by the circulation.
[0009]
As a result, the invention made to solve the above-mentioned problems is a method for removing the scale of an oxidation treatment apparatus that decomposes and purifies an organic liquid to be treated by oxidation reaction under high temperature and high pressure. The organic treatment liquid is a cleaning liquid, and this cleaning liquid is circulated in a subcritical state.
[0010]
According to the scale removal method of the oxidation treatment apparatus, the organic liquid to be treated is switched to the cleaning liquid, and this cleaning liquid is circulated in a subcritical state, so that it is formed on the inner wall due to the remarkably high solubility of the cleaning liquid in the subcritical state. The scale can be removed easily and quickly. In addition, the oxidation treatment equipment for organic treatment liquid generally decomposes and purifies the organic treatment liquid by supercritical water oxidation or subcritical water oxidation at a slightly lower temperature and lower pressure. Unlike the method, it is not necessary to change the temperature and pressure so much to distribute the cleaning liquid in the subcritical state. As a result, the time required for scale removal is shortened, and the temperature and pressure are required to increase and decrease. Energy and cost can be reduced.
[0011]
The temperature and pressure of the cleaning liquid to be circulated are preferably 200 ° C., 5 MPa to 374 ° C., and 22 MPa or less. Since this water has high handleability and solubility, it is suitable for the scale removal. In addition, by setting the temperature and pressure of the water to be circulated within the above range, the solubility in salts and the like is increased, the rise and fall from the temperature and pressure during operation of the oxidation treatment apparatus is reduced, and the scale removal work by the scale removal method is performed. Reduction of required energy and cost can be promoted.
[0012]
The cleaning liquid may be heated and pressurized to a subcritical state using the heating / pressurizing means of the oxidation treatment apparatus that heats and pressurizes the organic processing liquid. According to this means, the existing heating / pressurizing means can be used to bring the cleaning liquid into a subcritical state, and it is not necessary to separately add heating / pressurizing means for the scale removal method. Increase in cost can be suppressed. In addition, since the heating / pressurizing means of the oxidation processing apparatus is used to bring the cleaning liquid into a subcritical state, an operation of simply switching the organic processing liquid to the cleaning liquid during operation of the oxidation processing apparatus and heating of the oxidation processing apparatus are performed.・ Scaling and removing the scale can be performed continuously from the operation of the oxidation treatment device by a little temperature / pressure control by the pressurizing means, and the oxidation treatment device can be operated continuously from the scale removal work by the reverse operation. It can be performed. Therefore, according to the means, the operation stop time for the scale removal work is further shortened, which contributes to the improvement of the operating rate.
[0013]
As the oxidation reaction in the oxidation treatment apparatus, supercritical water oxidation or subcritical water oxidation is preferable. According to such supercritical water oxidation (SCWO) and subcritical water oxidation, it is possible to quickly and completely decompose and purify organic processing liquids containing various organic substances. However, as described above, the difference in solubility of salts Therefore, the scale removal method is effective because salts are likely to be deposited along with the state change from the subcritical state to the supercritical state, and scale is easily formed on the inner wall.
[0014]
The invention of an apparatus for solving the above-mentioned problems includes a reactor for decomposing and purifying an organic processing liquid by an oxidation reaction at high temperature and high pressure, and heating and heating the organic processing liquid in the reactor. An organic treatment liquid oxidation treatment apparatus comprising heating / pressurization means for supplying under pressure and discharge means for discharging the treatment liquid after the oxidation reaction from the reactor, wherein the organic treatment liquid is washed And a scale removing means for circulating the cleaning liquid in a subcritical state.
[0015]
According to the oxidation treatment apparatus for the organic treatment liquid, similarly to the scale removal method of the oxidation treatment apparatus, the organic treatment liquid to be treated is switched to the cleaning liquid by the scale removing unit, and the cleaning liquid is subcritical. Since it is circulated in a state, the scale formed on the inner wall can be easily and quickly removed due to the remarkably high solubility of the cleaning liquid in the subcritical state. In addition, the organic treatment liquid oxidation treatment apparatus can perform scale removal work continuously in the processing operation, and it is not necessary to fluctuate temperature and pressure so much. Is achieved.
[0016]
Furthermore, for the same reason as the scale removal method of the oxidation treatment apparatus, (a) in the scale removal means, the cleaning liquid is water, and the temperature and pressure of the cleaning liquid to be circulated are 200 ° C., 5 MPa to 374 ° C., and 22 MPa or less. Well, (b) In the scale removing means, the cleaning liquid may be heated and pressurized to a subcritical state by the heating and pressurizing means, and (c) supercritical water oxidation or oxidation may be performed as the oxidation reaction at the high temperature and high pressure. Subcritical water oxidation is preferred.
[0017]
In addition, it is preferable that the oxidation treatment apparatus for the organic treatment liquid further includes a scale monitoring unit that monitors the formation of scale. If the scale monitoring means can monitor the presence and degree of scale formation on the inner wall, the appropriate timing for removing the scale by the scale removing means and the time required for the removal work can be known. It is possible to further promote the improvement of the operation rate and the reduction of the cost required for scale removal.
[0018]
As this scale monitoring means, it is preferable to adopt means for measuring the pressure at the entrance and exit, and determining the presence and degree of scale formation based on the pressure difference. According to the scale removal means in the oxidation treatment apparatus for the organic treatment liquid, since almost the entire oxidation treatment apparatus can be washed by circulating the subcritical cleaning liquid switched from the organic treatment liquid, an accurate scale can be obtained. It is not necessary to detect the formation position, and it is only necessary to detect whether or not a scale of a predetermined level or more has been formed as a whole apparatus. Therefore, the scale monitoring means is based on the increase in the pressure difference at the inlet / outlet as a reference. It is sufficient to determine the presence and degree of formation.
[0019]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings as appropriate. FIG. 1 is a schematic configuration diagram showing an organic treatment liquid oxidation treatment apparatus according to an embodiment of the present invention.
[0020]
The organic treatment liquid oxidation treatment apparatus 1 in FIG. 1 includes a reactor 2, a high-pressure pump 3, a heat exchanger 4, a temperature controller 5, an oxidant supply means 6, a cooler 7, a decompressor 8, and gas-liquid separation. A tank 9 is provided, and in addition, a scale removing means 10 is provided. Among these, the high pressure pump 3, the heat exchanger 4 and the temperature controller 5 correspond to the heating / pressurizing means, and the cooler 7, the decompressor 8 and the gas-liquid separation tank 9 correspond to the discharging means.
[0021]
The high-pressure pump 3 pumps the organic processing liquid A stored in a raw material tank or the like to the reactor 2, and for example, a plunger pump, a diaphragm pump, a screw pump, or the like is used.
[0022]
The heat exchanger 4 exchanges heat between the processing liquid discharged from the reactor 2 and the organic processing liquid A, and preheats the organic processing liquid A with a high-temperature and high-pressure processing liquid. As this heat exchanger 4, a general heat exchanger for high temperature resistance and high pressure resistance can be used, but in consideration of using a high-temperature / high-pressure and high-concentration liquid as a working fluid, a double pipe type A heat exchanger is preferred.
[0023]
The temperature controller 5 is for controlling the organic liquid A to be sent to the reactor 2 to a predetermined oxidation reaction temperature, and requires contradictory functions of heating and cooling. For this reason, as the temperature controller 5, there are a case where separate devices such as a heater and a cooler are provided, and a case where both devices are provided. The heating means and the cooling means in the temperature controller 5 are not particularly limited, and general means can be used.
[0024]
The reactor 2 is for decomposing and purifying an organic substance in the organic liquid A to be treated under high temperature and high pressure (for example, a supercritical state or a subcritical state). The type of the reactor 2 is not particularly limited, and a general reactor for high temperature resistance and high pressure resistance can be used, but the organic treatment liquid A is continuously decomposed. In view of the above, a tubular reactor is preferable. The temperature and pressure in the reactor 2 are preferably 200 ° C. to 650 ° C., 5 MPa to 30 MPa, and supercritical water oxidation at 400 ° C. to 600 ° C. and 22 MPa to 30 MPa is preferred in terms of rapidity and completeness of the reaction. Particularly preferred.
[0025]
The oxidant supply means 6 is for injecting an oxidant into the organic treatment liquid A in order to cause an oxidation reaction to the organic matter in the organic treatment liquid A in the reactor 2. As the oxidant used in the oxidant supply means 6, for example, oxygen is used, but air having an oxidizing power with respect to organic substances, hydrogen peroxide water, and the like can also be used. Further, as the supply point of the oxidant by the oxidant supply means 6, all the amount necessary for the decomposition of the organic matter in the organic liquid A to be treated may be injected immediately before the reactor 2, or immediately before the reactor 2. You may divide and supply to the suitable position of the reactor 2. FIG.
[0026]
The cooler 7 is for cooling the high-temperature and high-pressure processing liquid discharged from the reactor 2, and a general cooler such as an air cooler can be used. It is also conceivable to use waste heat effectively by cooling with a refrigerant.
[0027]
The decompressor 8 is for decompressing the high-temperature and high-pressure treatment liquid discharged from the reactor 2, and generally a decompression valve or the like is used.
[0028]
The gas-liquid separation tank 9 is a tank that separates the treated liquid discharged from the reactor 2 into clean water B that has been decomposed and discharged gases C such as carbon dioxide and nitrogen generated by the oxidation reaction of organic matter.
[0029]
The function of the organic treatment liquid oxidation treatment apparatus 1 having the above structure will be described below. First, the organic treatment liquid A is supplied to the reactor 2 by being pressurized and heated by the high-pressure pump 3 of the heating / pressurizing means, the heat exchanger 4 and the temperature controller 5, and organically by the oxidizing agent supplying means 6. When the oxidizing agent is supplied into the oxidizing liquid A, the organic substance is oxidized and decomposed in the reactor 2 by an oxidation reaction between the organic substance and the oxidizing agent in the organic processing liquid A. Thereafter, the processing liquid discharged from the reactor 2 is cooled, depressurized and gas-liquid separated by a cooler 7, a decompressor 8 and a gas-liquid separation tank 9 as discharge means, and discharged to the outside. Through such steps, the organic processing liquid A containing organic matter is decomposed and purified.
[0030]
The organic treatment liquid oxidation treatment apparatus 1 includes a scale removing means 10 for removing scales formed on the inner walls of the reactor 2, the organic treatment liquid A, the main pipe of the treatment liquid, and the like. The scale removing means 10 switches the organic liquid A to be processed by the oxidation treatment apparatus 1 to the cleaning liquid D, and distributes the cleaning liquid D in a subcritical state. In this scale removing means 10, as means for heating and pressurizing the cleaning liquid D to the subcritical state, the high pressure pump 3, the heat exchanger 4, the temperature regulator 5 and the pressure reducing valve of the organic treatment liquid oxidation treatment apparatus 1 are used. 8, that is, by switching to the cleaning liquid D while maintaining the operation state in which the organic processing liquid A is decomposed and purified, and slightly controlling the high pressure pump 3, the heat exchanger 4, the temperature controller 5 and the pressure reducing valve 8. The cleaning liquid D can be brought into a subcritical state.
[0031]
The specific temperature and pressure of the subcritical cleaning liquid D circulated by the scale removing means 10 are 200 ° C. and 5 MPa when safe and highly handleable water (pure water or tap water) is used as the cleaning liquid D. 374 ° C. and 22 MPa or less are preferable, and 300 ° C., 15 MPa and 374 ° C., and 22 MPa or less are particularly preferable. This is because if the temperature and pressure of the cleaning liquid D are smaller than the above ranges, the difference between the temperature and pressure of the organic processing liquid A during operation of the oxidation treatment apparatus 1 is large, and the temperature lowering / decreasing and operation during scale removal work are large. This is because time and energy are required for temperature increase and pressure increase at the time of restart, and scale removal ability is reduced. Conversely, when the temperature and pressure of the cleaning liquid D exceed the above range, a supercritical state is obtained. This is because the solubility decreases and the scale removal ability decreases.
[0032]
For example, when the oxidation treatment apparatus 1 is an apparatus for decomposing and purifying the organic liquid to be treated A by supercritical water oxidation under an operating condition of about 550 ° C. and about 26 MPa, after the scale removal means 10 switches to the cleaning liquid D The pressurizing condition by the high-pressure pump 3 is maintained as it is, and the heating condition by the heat exchanger 4 and the temperature controller 5 is preferably heated so that the cleaning liquid D is about 350 ° C. As a result, the operation of the oxidation treatment apparatus 1 is continued, and in the thermal relationship, cooling to the room temperature and heating to the supercritical temperature are not required for the scale removal work and the resumption of operation, and in the pressure relationship, the scale is reduced. Unnecessary step-down and step-up are not required for the removal operation and the restart of operation. Therefore, the time required for the scale removal operation can be shortened and the cost can be reduced.
[0033]
In addition, the organic treatment liquid oxidation treatment apparatus 1 may include scale monitoring means for monitoring the presence and degree of scale formation. When the scale monitoring unit detects the formation of a scale above a predetermined level, the scale removing unit 10 performs the scale removal operation, and when the scale monitoring unit detects the scale removal, the scale removing unit 10 Then, the scale removal operation is completed, and then the cleaning liquid D is continuously switched to the organic processing liquid A to shift to the normal operation. By providing the scale monitoring means in this way, it is possible to optimize the timing and work time for performing the scale removal work by the scale removal means 10.
[0034]
As the scale monitoring means, (1) a pressure gauge 11 for measuring the internal pressure is installed, the pressure at the inlet / outlet of the equipment such as the reactor 2, the heat exchanger 4 and the main pipe is measured, and the judgment is made by increasing the pressure difference. Various means such as (2) means for measuring the external surface temperature of the above-mentioned device and judging from the change over time, (3) means for judging from the flow velocity, etc. According to this, since the scale removal of the entire oxidation treatment apparatus 1 is possible and there is no need to partially detect the scale formation location, the presence / absence and degree of scale formation can be determined by the pressure difference at the inlet / outlet of (1) which is easy to monitor. Means for determining are preferred.
[0035]
The organic treatment liquid oxidation treatment apparatus and the scale removal method thereof according to the present invention are not limited to the above-described embodiment. For example, a means for heating and pressurizing the cleaning liquid D to a subcritical state is separately provided. It is also possible to circulate through the oxidation treatment apparatus 1 as a critical state. Further, the liquid discharged from the gas-liquid separation tank 9 during the scale removing operation by the scale removing means 10 may be circulated in the cleaning liquid D. Further, the scale monitoring means may be periodically performed by the scale removing means 10 without providing the scale monitoring means.
[0036]
【The invention's effect】
As described above, according to the organic treatment liquid oxidation treatment apparatus and scale removal method of the present invention, scales formed on the inner wall of a reactor or the like can be removed easily and quickly. In addition, since the scale removal operation can be performed without significantly changing the temperature and pressure during operation of the oxidation treatment apparatus, energy and cost can be reduced.
Furthermore, the scale formed on the inner wall can be removed safely and quickly without impairing the durability of the oxidation treatment apparatus.
[Brief description of the drawings]
FIG. 1 is a schematic configuration diagram showing an organic treatment liquid oxidation treatment apparatus according to an embodiment of the present invention.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Oxidation processing apparatus 2 of organic to-be-processed liquid 2 Reactor 3 High pressure pump 4 Heat exchanger 5 Temperature controller 6 Oxidant supply means 7 Cooler 8 Depressurizer 9 Gas-liquid separation tank 10 Scale removal means 11 Pressure gauge

Claims (8)

高温・高圧下で有機性被処理液を酸化反応により分解浄化する酸化処理装置のスケール除去方法であって、
この酸化処理装置の処理対象である有機性被処理液をに切り替え、水を温度200℃以上374℃以下、圧力5MPa以上22MPa以下の亜臨界状態として流通させることを特徴とする酸化処理装置のスケール除去方法。
A method for removing the scale of an oxidation treatment apparatus for decomposing and purifying an organic liquid to be treated by oxidation reaction under high temperature and high pressure,
An organic treatment liquid to be treated by this oxidation treatment apparatus is switched to water , and water is circulated in a subcritical state at a temperature of 200 ° C. to 374 ° C. and a pressure of 5 MPa to 22 MPa . Scale removal method.
上記酸化処理装置に有機性被処理液を加熱・加圧する加熱・加圧手段が備えられており、この加熱・加圧手段によってを亜臨界状態に加熱・加圧する請求項に記載の酸化処理装置のスケール除去方法。The oxidation treatment apparatus organic liquid to be treated is provided with a heating and pressurizing means for heating and pressurizing, the oxidation described by this heating and pressing means to claim 1, heating and pressurizing the water in a subcritical state A scale removal method for a processing apparatus. 上記酸化処理装置における酸化反応が超臨界水酸化又は亜臨界水酸化である請求項1又は請求項2に記載の酸化処理装置のスケール除去方法。The scale removal method for an oxidation treatment apparatus according to claim 1 or 2 , wherein the oxidation reaction in the oxidation treatment apparatus is supercritical water oxidation or subcritical water oxidation. 有機性被処理液を高温・高圧下での酸化反応により分解浄化する反応器と、
この反応器に有機性被処理液を加熱・加圧して供給する加熱・加圧手段と、酸化反応後の処理液を反応器から排出する排出手段とを備える有機性被処理液の酸化処理装置であって、
この有機性被処理液をに切り替え、水を温度200℃以上374℃以下、圧力5MPa以上22MPa以下の亜臨界状態として流通させるスケール除去手段を備えることを特徴とする有機性被処理液の酸化処理装置。
A reactor for decomposing and purifying organic processing liquid by oxidation reaction under high temperature and high pressure;
An apparatus for oxidizing organic processing liquid, comprising heating / pressurizing means for heating and pressurizing and supplying the organic processing liquid to the reactor, and discharge means for discharging the processing liquid after the oxidation reaction from the reactor Because
Oxidation of the organic processing liquid characterized by comprising scale removing means for switching the organic processing liquid to water and circulating the water in a subcritical state at a temperature of 200 ° C. to 374 ° C. and a pressure of 5 MPa to 22 MPa. Processing equipment.
上記スケール除去手段において、を上記加熱・加圧手段により亜臨界状態に加熱・加圧する請求項に記載の有機性被処理液の酸化処理装置。The organic treatment liquid oxidation treatment apparatus according to claim 4 , wherein in the scale removing means, water is heated and pressurized to a subcritical state by the heating and pressurizing means. 上記高温・高圧下での酸化反応が超臨界水酸化又は亜臨界水酸化である請求項4又は請求項に記載の有機性被処理液の酸化処理装置。Oxidizing apparatus of the organic liquid to be treated according to claim 4 or claim 5 oxidation reaction under the high temperature and high pressure is supercritical water or subcritical hydroxide. スケールの形成を監視するスケール監視手段をさらに備える請求項4乃至請求項のいずれか1項に記載の有機性被処理液の酸化処理装置。Oxidizing apparatus of the organic liquid to be treated according to any one of claims 4 to 6 further comprising a scale monitoring means for monitoring the formation of scale. 上記スケール監視手段が、出入口の圧力を測定し、その圧力差によりスケール形成の有無及び度合いを判断する請求項に記載の有機性被処理液の酸化処理装置。8. The organic treatment liquid oxidation treatment apparatus according to claim 7 , wherein the scale monitoring means measures the pressure at the entrance and exit, and determines the presence and degree of scale formation based on the pressure difference.
JP2001025904A 2001-02-01 2001-02-01 Oxidation treatment apparatus for organic treatment liquid and scale removal method thereof Expired - Fee Related JP4629883B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001025904A JP4629883B2 (en) 2001-02-01 2001-02-01 Oxidation treatment apparatus for organic treatment liquid and scale removal method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001025904A JP4629883B2 (en) 2001-02-01 2001-02-01 Oxidation treatment apparatus for organic treatment liquid and scale removal method thereof

Publications (2)

Publication Number Publication Date
JP2002224690A JP2002224690A (en) 2002-08-13
JP4629883B2 true JP4629883B2 (en) 2011-02-09

Family

ID=18890812

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001025904A Expired - Fee Related JP4629883B2 (en) 2001-02-01 2001-02-01 Oxidation treatment apparatus for organic treatment liquid and scale removal method thereof

Country Status (1)

Country Link
JP (1) JP4629883B2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5489317B2 (en) * 2011-03-27 2014-05-14 鹿島建設株式会社 Method and system for sludge methane fermentation using hydrothermal reaction
JP6016082B2 (en) * 2012-07-20 2016-10-26 株式会社リコー Fluid purification device
JP6250293B2 (en) * 2013-03-26 2017-12-20 中国電力株式会社 Biomass gasification system using supercritical water and its operation method
WO2020217506A1 (en) * 2019-04-26 2020-10-29 中国電力株式会社 Obstruction removal method
JP6789547B1 (en) * 2019-04-26 2020-11-25 中国電力株式会社 Blockage removal method

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06511190A (en) * 1991-06-28 1994-12-15 モデル・エンビロンメンタル・コーポレーシヨン Method and apparatus for oxidizing organic matter together with inorganic matter under supercritical water
JPH09511678A (en) * 1994-01-14 1997-11-25 アビティビ プライス インコーポレイテッド Supercritical water oxidation method for organic compounds
JPH11504254A (en) * 1994-12-21 1999-04-20 アビティビ プライス インコーポレイテッド Flow reversal supercritical reactor and method of operating the reactor
JP2000140611A (en) * 1998-11-06 2000-05-23 Shinko Pantec Co Ltd Heater
JP2000229236A (en) * 1999-02-09 2000-08-22 Japan Organo Co Ltd Scale removing method for supercritical hydroxylation device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06511190A (en) * 1991-06-28 1994-12-15 モデル・エンビロンメンタル・コーポレーシヨン Method and apparatus for oxidizing organic matter together with inorganic matter under supercritical water
JPH09511678A (en) * 1994-01-14 1997-11-25 アビティビ プライス インコーポレイテッド Supercritical water oxidation method for organic compounds
JPH11504254A (en) * 1994-12-21 1999-04-20 アビティビ プライス インコーポレイテッド Flow reversal supercritical reactor and method of operating the reactor
JP2000140611A (en) * 1998-11-06 2000-05-23 Shinko Pantec Co Ltd Heater
JP2000229236A (en) * 1999-02-09 2000-08-22 Japan Organo Co Ltd Scale removing method for supercritical hydroxylation device

Also Published As

Publication number Publication date
JP2002224690A (en) 2002-08-13

Similar Documents

Publication Publication Date Title
JP3273118B2 (en) High pressure processing equipment
JP6446861B2 (en) Fluid processing equipment
CA2869291A1 (en) Ozone-generating system and ozone generation method
JP4629883B2 (en) Oxidation treatment apparatus for organic treatment liquid and scale removal method thereof
JP6393965B2 (en) Wastewater treatment system
KR102024871B1 (en) Device for removing residual ozone gas
JP2016028804A (en) Fluid filtration device and fluid processing device
JP3345285B2 (en) How to start and stop supercritical water oxidation equipment
JP2017006856A (en) Fluid processing device
JP2007260557A (en) Ozone gas decomposition device and treatment system
JP2002224681A (en) Oxidation treatment method and equipment for organic liquid to be treated
JP2001104768A (en) Tubular reactor and oxidation treatment apparatus for to-be-treated organic liquid using the same
JP3302125B2 (en) Wastewater treatment method
JP2000334289A (en) Oxidation treatment of organic liquid to be treated and apparatus therefor
JP2004174298A (en) Hydrothermal reactor and its operation method
JPH11147093A (en) Control method of catalytic wet oxidizing treatment apparatus
JP2000135496A (en) Oxidative treatment of organic matter and device therefor
JPH10314764A (en) Method for control of catalyst wet type oxidation treating device
JP6016082B2 (en) Fluid purification device
JP2002292267A (en) Method and apparatus for oxidation-treatming organic liquid to be treated
KR100338323B1 (en) Apparatus for chemical treatment of exhaust gas from semiconductor manufacturing process
JPH0924244A (en) Exhaust ozone gas processing apparatus and method for its operation
JP2017109148A (en) Waste liquid treatment device for ammonium ion-containing waste liquid, method for controlling waste liquid treatment device, and waste liquid treatment method
JP2016112505A (en) Fluid treatment apparatus and method
JP2003326153A (en) Apparatus for feeding thick slurry and its starting method

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20071128

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100921

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101001

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20101019

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20101112

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131119

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131119

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131119

Year of fee payment: 3

LAPS Cancellation because of no payment of annual fees