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JP4624295B2 - Reflow apparatus and method - Google Patents

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JP4624295B2
JP4624295B2 JP2006107135A JP2006107135A JP4624295B2 JP 4624295 B2 JP4624295 B2 JP 4624295B2 JP 2006107135 A JP2006107135 A JP 2006107135A JP 2006107135 A JP2006107135 A JP 2006107135A JP 4624295 B2 JP4624295 B2 JP 4624295B2
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solder
vibration
heating unit
minute vibration
application
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章博 山本
彰男 古澤
憲一郎 末次
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Matsushita Electric Industrial Co Ltd
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Description

本発明は、被装着材(例えば回路基板等)に装着物(例えば電子部品)を半田付けするためのリフロー装置及び方法に関し、より詳しくは超音波振動を用いて半田付けを行うリフロー装置及び方法に関する。   The present invention relates to a reflow apparatus and method for soldering an attachment (for example, an electronic component) to a material to be mounted (for example, a circuit board), and more particularly, a reflow apparatus and method for performing soldering using ultrasonic vibration. About.

近年、デジタルカメラ、DVD再生機等の携帯電子機器の高機能化及び小型化が進んでいる。それに伴って、これらの機器に内蔵される基板も小型化され、薄型化が進んでいる。また、装置内に基板を配置する際の自由度を向上させるために、フィルム基板の採用も進んでいる。   In recent years, portable electronic devices such as digital cameras and DVD players have become highly functional and miniaturized. Along with this, substrates built into these devices are also miniaturized and are becoming thinner. Moreover, in order to improve the freedom degree when arrange | positioning a board | substrate in an apparatus, adoption of a film board is also advancing.

機器の高機能化に従い、基板に実装される電子部品の耐熱性は低下する傾向にある。例えばCCDモジュール、光ピックアップ等の電子部品の耐熱温度は、従来の電子部品の耐熱温度と比較して極端に低く、150℃以下となっている。   As the functionality of devices increases, the heat resistance of electronic components mounted on a substrate tends to decrease. For example, the heat resistance temperature of electronic components such as CCD modules and optical pickups is extremely low compared to the heat resistance temperature of conventional electronic components, and is 150 ° C. or lower.

さらに環境保護に対する意識の高まりから、鉛を含む半田の使用が見直されつつある。例えば欧州では、法規制により、鉛を含む半田の使用が制限されている。そこで、鉛を含む半田の代替材料として、鉛を含まない鉛フリー半田の研究が近年、盛んに行われている。しかし、鉛フリー半田の融点は、一般に200℃〜220℃であり、鉛を含む半田の融点よりも20〜40℃も高い。   Furthermore, the use of solder containing lead is being reconsidered due to increased awareness of environmental protection. For example, in Europe, the use of solder containing lead is restricted by laws and regulations. Therefore, research on lead-free solder containing no lead as a substitute material for solder containing lead has been actively conducted in recent years. However, the melting point of lead-free solder is generally 200 ° C. to 220 ° C., which is 20 to 40 ° C. higher than the melting point of solder containing lead.

鉛フリー半田を用いて電子部品を基板に実装する場合、従来から一般的に用いられているリフロー装置を用いると、基板全体が均一に加熱される。そのため、電子部品の温度は、鉛フリー半田の融点と同程度(200℃〜220℃)まで上昇する。耐熱温度が150℃以下の電子部品を基板に実装しようとすれば、電子部品が破損する恐れがあるため、耐熱温度が150℃以下の電子部品を、鉛フリー半田を用いて基板に実装することは困難である。   When an electronic component is mounted on a substrate using lead-free solder, the entire substrate is uniformly heated by using a reflow apparatus that has been generally used. Therefore, the temperature of the electronic component rises to the same extent (200 ° C. to 220 ° C.) as the melting point of lead-free solder. If an electronic component with a heat-resistant temperature of 150 ° C or lower is to be mounted on the substrate, the electronic component may be damaged. Therefore, mount an electronic component with a heat-resistant temperature of 150 ° C or lower on the substrate using lead-free solder. It is difficult.

そこで、耐熱温度の低い電子部品を基板に実装する場合に、電子部品と基板との熱容量の差を利用して、電子部品を載置した基板の裏面から、基板に急激に熱を加えることで、電子部品と基板との間に温度差を確保する方法が提案されている(特許文献1参照)。しかしながら、鉛フリー半田の融点は200℃以上であり、電子部品の耐熱温度(150℃以下)と比べてかなり高いため、上記方法により電子部品の耐熱温度を150℃以下に維持することは困難である。   Therefore, when mounting an electronic component with a low heat-resistant temperature on the board, by using the difference in heat capacity between the electronic component and the board, heat is suddenly applied to the board from the back side of the board on which the electronic component is placed. A method for ensuring a temperature difference between an electronic component and a substrate has been proposed (see Patent Document 1). However, since the melting point of lead-free solder is 200 ° C. or higher, which is considerably higher than the heat resistant temperature of electronic components (150 ° C. or lower), it is difficult to maintain the heat resistant temperature of electronic components to 150 ° C. or lower by the above method. is there.

一方、近年、融点が138℃と低温であるSn−58%Bi(ビスマスを58wt%含むスズ合金)半田も開発されている。しかしながら、Sn−58%Bi半田に多量に含まれるビスマスは、固く脆い性質を有し、半田の冷却時に半田内部で偏析する。よって、Sn−58%Bi半田を用いて電子部品を基板に実装すると、電子部品と基板との接合状態の信頼性が低くなる。   On the other hand, Sn-58% Bi (tin alloy containing 58 wt% bismuth) solder having a low melting point of 138 ° C. has recently been developed. However, bismuth contained in a large amount in Sn-58% Bi solder has a hard and brittle property and segregates inside the solder when the solder is cooled. Therefore, when an electronic component is mounted on a substrate using Sn-58% Bi solder, the reliability of the bonding state between the electronic component and the substrate is lowered.

そこで、溶解状態の半田を冷却する際に、半田に微小振動を印加してビスマスの偏析を抑制することにより、接合強度を確保する方法が提案されている(特許文献2参照)。また、半田に微小振動を印加する方法としては、超音波ホーンをプリント基板の一辺に接触させて振動を伝達させる方法が提案されている。   In view of this, a method has been proposed in which, when the molten solder is cooled, a minute vibration is applied to the solder to suppress segregation of bismuth, thereby ensuring bonding strength (see Patent Document 2). As a method for applying minute vibrations to solder, a method for transmitting vibrations by bringing an ultrasonic horn into contact with one side of a printed circuit board has been proposed.

さらに、超音波振動が基板に効率的に伝達されるように、図15に示すようなインピーダンスマッチング機構を備えたリフロー装置が提案されている(特許文献3参照)。図15の微小振動印加装置100は、微小振動発生装置101と、微小振動印加装置102と、インピーダンスマッチング機構103とを備える。インピーダンスマッチング機構103は、基板を保持する保持用部材103aとバネなどの付勢部材103bとを具備する。   Furthermore, a reflow apparatus having an impedance matching mechanism as shown in FIG. 15 has been proposed so that ultrasonic vibrations are efficiently transmitted to the substrate (see Patent Document 3). A micro vibration application device 100 of FIG. 15 includes a micro vibration generation device 101, a micro vibration application device 102, and an impedance matching mechanism 103. The impedance matching mechanism 103 includes a holding member 103a that holds a substrate and an urging member 103b such as a spring.

インピーダンスマッチング機構103は、リフロー装置に搬送されてくる装着物104を載置した被装着材105ごとに、その位置合わせを行う機能を有する。インピーダンスマッチング機構103が、付勢部材102bから被装着材105に印加される荷重をリアルタイムで微調整することにより、微小振動印加装置102における振動に対するインピーダンスと被装着材105における振動に対するインピーダンスとが一致し、微小振動印加装置102からの振動エネルギーが、被装着材105に効率的に伝達される。被装着材105は、リフロー工程が終わると、次の工程に移送される。   The impedance matching mechanism 103 has a function of aligning each mounted material 105 on which the mounting object 104 conveyed to the reflow apparatus is placed. The impedance matching mechanism 103 finely adjusts the load applied from the biasing member 102b to the mounted material 105 in real time, so that the impedance to the vibration in the minute vibration applying device 102 and the impedance to the vibration in the mounted material 105 are equal. Then, the vibration energy from the minute vibration applying device 102 is efficiently transmitted to the mounted material 105. The mounted material 105 is transferred to the next step after the reflow step.

特許第3529633号公報(特開2000−15431号公報)Japanese Patent No. 3529633 (Japanese Patent Laid-Open No. 2000-15431) 特許第3580731号公報(特開2000−351065号公報)Japanese Patent No. 3580731 (Japanese Patent Laid-Open No. 2000-351065) 特開2003−46228号公報JP 2003-46228 A

特許文献3に開示されるリフロー装置においては、被装着材105が重い金属パレットに載置され、微小振動印加装置102からの振動エネルギーが当該金属パレットを介して被装着材105に伝達される場合には、微小振動印加装置102からの振動エネルギーは被装着材105に伝達されにくく、リフロー中の溶融半田内で半田成分を均一に分散させることができないばかりか、摩耗や異音が発生するといった問題が生じる可能性がある。   In the reflow device disclosed in Patent Document 3, the mounted material 105 is placed on a heavy metal pallet, and vibration energy from the minute vibration applying device 102 is transmitted to the mounted material 105 via the metal pallet. For example, vibration energy from the minute vibration applying device 102 is not easily transmitted to the mounting material 105, and the solder component cannot be uniformly dispersed in the molten solder during reflow, and wear and noise are generated. Problems can arise.

従って、本発明の目的は、上記問題を解決することにあって、重い金属パレットに被装着材が載置されていても、当該金属パレットに均一に振動を印加して、リフロー中の溶融半田内で半田成分を均一に分散させることができるリフロー装置及び方法を提供することにある。   Accordingly, an object of the present invention is to solve the above-described problem, and even when a material to be mounted is placed on a heavy metal pallet, a uniform solder is applied to the metal pallet so as to melt molten solder during reflow. It is an object of the present invention to provide a reflow apparatus and method that can uniformly disperse solder components therein.

本発明の第態様によれば、装着物が半田にて接合される被装着材を搬入して半田を溶融してリフローを行う半田加熱部と、
上記半田加熱部内に搬入された上記被装着材と上記装着物とを接合する上記半田に対して印加可能な微小振動を発生させる微小振動発生装置と、
上記微小振動発生装置により発生された上記微小振動を、上記半田加熱部内の上記半田に対して上記被装着材の厚み方向の微小振動として印加する微小振動印加装置と、
を備えるリフロー装置であって、
上記微小振動印加装置は、上記微小振動発生装置に連結され、かつ、上記半田加熱部に搬入されかつ上記被装着材が載置される振動板と上記振動板の周囲を保持する保持枠とを有する被装着材支持部材の上記振動板に対して、上記被装着材の厚み方向の微小振動を上記半田に印加する印加部を有する、リフロー装置を提供する。
According to the first aspect of the present invention, a solder heating unit that carries in a reflow by carrying a material to be attached to which an attachment is bonded by solder and melting the solder;
A micro-vibration generating device that generates micro-vibration that can be applied to the solder that joins the mounted material carried into the solder heating unit and the mounted object;
A micro-vibration application device that applies the micro-vibration generated by the micro-vibration generator as micro-vibration in the thickness direction of the mounted material to the solder in the solder heating unit;
A reflow apparatus comprising:
The micro-vibration applying device includes a vibration plate connected to the micro-vibration generation device, carried into the solder heating unit, and on which the mounted material is placed, and a holding frame that holds the periphery of the vibration plate. against the diaphragm of the mounting member supporting member having a small vibration in the thickness direction of the object to be mounted member having application unit for applying the solder above, to provide a reflow apparatus.

本発明の第態様によれば、上記微小振動印加装置は、上記被装着材支持部材の上記保持枠の上面と当接可能な当接部材をさらに有して、上記印加部が上記振動板に対して上記被装着材の厚み方向の微小振動を上記半田に印加するとき、上記当接部材が上記被装着材支持部材の上記保持枠の上面と当接するように構成されている、第態様に記載のリフロー装置を提供する。 According to a second aspect of the present invention, the micro-vibration application device further includes a contact member that can contact the upper surface of the holding frame of the mounted material support member, and the application unit is the diaphragm. pair to when applying a small vibration in the thickness direction of the object to be mounted material on the solder above, the contact member is configured to contact with the upper face of the holding frame of the mating attachment member supporting member, the A reflow apparatus according to one aspect is provided.

本発明の第態様によれば、上記微小振動印加装置の上記印加部は、上記微小振動発生装置に連結され、かつ、上記被装着材支持部材の上記振動板上に載置された上記被装着材と上記装着物とを接合する上記半田に非接触で、上記被装着材の厚み方向の微小振動を伝達する微小振動用振動板を有する、第態様に記載のリフロー装置を提供する。 According to a third aspect of the present invention, the application unit of the micro-vibration application device is connected to the micro-vibration generation device and is mounted on the vibration plate of the mounted material support member. The reflow device according to the first aspect has a vibration plate for minute vibration that transmits minute vibrations in the thickness direction of the mounted material without contact with the solder that joins the mounting material and the mounting object.

本発明の第態様によれば、上記当接部材及び上記印加部を上記半田加熱部内の印加位置から上記半田加熱部外の退避位置との間で移動可能とする移動装置をさらに備え、
上記移動装置は、上記印加位置で、上記印加部が上記振動板に対して上記被装着材の厚み方向の微小振動を上記半田に印加するとともに、上記当接部材が上記被装着材支持部材の上記保持枠に当接した状態で、上記当接部材及び上記印加部を上記半田加熱部内の上記印加位置から上記半田加熱部外の上記退避位置に移動させる、第態様に記載のリフロー装置を提供する。
According to the fourth aspect of the present invention, the apparatus further includes a moving device that allows the contact member and the application unit to move between an application position in the solder heating unit and a retreat position outside the solder heating unit,
The mobile device is above application position, the application part is against the above vibrating plate is applied with a small vibration in the thickness direction of the object to be mounted material on the solder above, the contact member is the object mounting member supporting member The reflow device according to the second aspect, wherein the contact member and the application unit are moved from the application position in the solder heating unit to the retracted position outside the solder heating unit while being in contact with the holding frame. I will provide a.

本発明の第態様によれば、装着物が半田にて接合される被装着材を半田加熱部内に搬入して半田を溶融してリフローを行うとともに、微小振動発生装置で発生した微小振動を、上記半田加熱部内に搬入された上記被装着材と上記装着物とを接合する上記半田に対して、上記被装着材の厚み方向の微小振動として微小振動印加装置により印加し、
上記微小振動印加装置により上記被装着材の厚み方向の微小振動が上記半田に印加されつつ上記半田加熱部内から上記被装着材を搬出して上記溶融半田を冷却するようにした、リフロー方法であって、
上記被装着材を上記半田加熱部内に搬入するとき、振動板と上記振動板の周囲を保持する保持枠とを有する被装着材支持部材の上記振動板に上記被装着材を載置して上記半田加熱部内に搬入し、
上記微小振動印加装置により上記微小振動を印加するとき、上記半田加熱部内で、上記微小振動発生装置に連結された上記微小振動印加装置の印加部を上記振動板の下面に接触させて、上記被装着材の厚み方向の微小振動を上記半田に印加するようにした、リフロー方法を提供する。
According to the fifth aspect of the present invention, the material to be attached to which the attachment is to be joined by solder is carried into the solder heating part, the solder is melted and reflowed, and the minute vibration generated by the minute vibration generator is reduced. The solder that is carried into the solder heating unit is applied to the solder that joins the attachment with the attachment by a minute vibration application device as minute vibration in the thickness direction of the attachment,
A reflow method in which a minute vibration in a thickness direction of the attached material is applied to the solder by the minute vibration application device, and the attached material is taken out of the solder heating unit to cool the molten solder. And
When the mounted material is carried into the solder heating unit, the mounted material is placed on the vibration plate of the mounted material support member having a diaphragm and a holding frame that holds the periphery of the diaphragm. Bring it into the solder heating part,
When the minute vibration is applied by the minute vibration applying device, the application portion of the minute vibration applying device connected to the minute vibration generating device is brought into contact with the lower surface of the diaphragm in the solder heating unit, and the minute vibration in the thickness direction of the mounting member and adapted to apply the solder above, to provide a reflow method.

本発明の第態様によれば、装着物が半田にて接合される被装着材を半田加熱部内に搬入して半田を溶融してリフローを行うとともに、微小振動発生装置で発生した微小振動を、上記半田加熱部内に搬入された上記被装着材と上記装着物とを接合する上記半田に対して、上記被装着材の厚み方向の微小振動として微小振動印加装置により印加し、
上記微小振動印加装置により上記被装着材の厚み方向の微小振動が上記半田に印加されつつ上記半田加熱部内から上記被装着材を搬出して上記溶融半田を冷却するようにした、リフロー方法であって、
上記被装着材を上記半田加熱部内に搬入するとき、振動板と上記振動板の周囲を保持する保持枠とを有する被装着材支持部材の上記振動板に上記被装着材を載置して上記半田加熱部内に搬入し、
上記微小振動印加装置により上記微小振動を印加するとき、上記半田加熱部内で、上記微小振動発生装置に連結された上記微小振動印加装置の微小振動用振動板により、上記被装着材支持部材の上記振動板上に載置された上記被装着材と上記装着物とを接合する上記半田に非接触で、被装着材の厚み方向の微小振動を伝達するようにした、リフロー方法を提供する。
According to the sixth aspect of the present invention, the material to be attached to which the attachment is to be joined by solder is carried into the solder heating unit, the solder is melted and reflowed, and the minute vibration generated by the minute vibration generator is reduced. The solder that is carried into the solder heating unit is applied to the solder that joins the attachment with the attachment by a minute vibration application device as minute vibration in the thickness direction of the attachment,
A reflow method in which a minute vibration in a thickness direction of the attached material is applied to the solder by the minute vibration application device, and the attached material is taken out of the solder heating unit to cool the molten solder. And
When the mounted material is carried into the solder heating unit, the mounted material is placed on the vibration plate of the mounted material support member having a diaphragm and a holding frame that holds the periphery of the diaphragm. Bring it into the solder heating part,
When the minute vibration is applied by the minute vibration applying device, the vibration supporting plate of the minute vibration applying device connected to the minute vibration generating device is connected to the minute vibration generating device in the solder heating unit. without contact with the solder for bonding placed on the diaphragm on the said mating attachment member and the above mounting material and adapted to transmit a small vibration in the thickness direction of the mounting member, to provide a reflow method.

本発の第1、5、又は6態様によれば、上記微小振動発生装置により発生された上記微小振動を、上記半田加熱部内の上記半田に対して上記被装着材の厚み方向の微小振動として上記微小振動印加装置により印加するようにしたので、たとえ、重い金属パレットに被装着材(例えば、基板)が載置されていても、金属パレットの厚み方向に微小振動を印加する(言い換えれば、金属パレットをツールで叩くように金属パレットに微小振動を印加する)ことができて、金属パレットが均一に振動しやすくなり、上記リフロー中の溶融半田内で半田成分を均一に分散させることができる。これに対して、重い金属パレットの厚み方向と直交する表面沿いに微小振動を印加する場合には、重い金属パレットでは振動がしにくく、半田内で半田成分を均一に分散させることができないばかりか、摩耗や異音が発生するといった問題が生じる可能性があった。本発明の第1、5、又は6態様では、金属パレットの厚み方向に微小振動を印加するため、金属パレットが均一に振動しやすく、このような問題が生じることはない。 According to the first, 5, or 6 embodiment of the present onset bright, the micro-vibration generated by the micro-vibration generator, minute vibrations in the thickness direction of the object to be mounted member relative to the solder in the solder heating unit As described above, even if a material to be mounted (for example, a substrate) is placed on a heavy metal pallet, a minute vibration is applied in the thickness direction of the metal pallet (in other words, It is possible to apply a minute vibration to the metal pallet as if hitting the metal pallet with a tool), and the metal pallet becomes easy to vibrate uniformly, and the solder component can be uniformly dispersed in the molten solder during the reflow. it can. On the other hand, when minute vibration is applied along the surface perpendicular to the thickness direction of the heavy metal pallet, the heavy metal pallet is difficult to vibrate, and not only can the solder components not be uniformly dispersed in the solder. There is a possibility that problems such as wear and noise occur. In the first , fifth , or sixth aspects of the present invention, minute vibrations are applied in the thickness direction of the metal pallet, so that the metal pallet is likely to vibrate uniformly, and such a problem does not occur.

また、本発明の第態様においては、上記半田加熱部に搬入されかつ上記被装着材が載置される振動板と上記振動板の周囲を保持する保持枠とを有する被装着材支持部材の上記振動板に対して上記被装着材の厚み方向の微小振動を上記半田に印加する印加部又は微小振動用振動板を上記微小振動印加装置が備えることにより、上記被装着材の厚み方向の微小振動が上記振動板で共振して増幅されて上記振動板に載置される上記被装着材の半田に伝達されるため、上記微小振動が被装着材の半田により一層伝達されやすくなり、上記溶融半田内で半田成分をより均一に分散させることができる。 According to a third aspect of the present invention, there is provided a mounting material support member having a diaphragm that is carried into the solder heating unit and on which the mounting material is placed, and a holding frame that holds the periphery of the vibration plate. When the minute vibration application device includes an application unit for applying minute vibration in the thickness direction of the attached material to the solder or a vibration plate for minute vibration with respect to the vibration plate, the minute vibration in the thickness direction of the attached material is provided. Since vibration is resonated by the diaphragm and amplified and transmitted to the solder of the mounted material placed on the diaphragm, the minute vibration is more easily transmitted by the solder of the mounted material, and the melting Solder components can be more uniformly dispersed in the solder.

また、上記被装着材の厚み方向と直交する表面沿いに微小振動を効率良く印加する場合には、上記被装着材が載置されたパレットの下面のほぼ全面に微小振動印加部材を配置する必要があり、パレットに熱風を直接的に供給することができず、半田の加熱に時間がかかり、生産効率が低下することになる。これに対して、本発明の第3、5、又は6態様においては、上記被装着材の厚み方向に微小振動を印加するため、被装着材の下方又は上方の少なくとも一部に対して、接触するように又は非接触で対向するように印加部又は微小振動用振動板を配置すればよく、上記被装着材の下面のほぼ全面に微小振動印加部材を配置する必要がないため、パレットに熱風を直接的に供給することができて、半田の加熱を効率良く行うことができ、生産効率を向上させることができる。 Further, in the case where minute vibrations are efficiently applied along the surface perpendicular to the thickness direction of the mounted material, it is necessary to arrange a minute vibration applying member on almost the entire lower surface of the pallet on which the mounted material is placed. Therefore, hot air cannot be directly supplied to the pallet, and it takes time to heat the solder, resulting in a decrease in production efficiency. On the other hand, in the third , fifth , or sixth aspects of the present invention, in order to apply a minute vibration in the thickness direction of the mounted material, contact is made with respect to at least a part below or above the mounted material. It is only necessary to arrange the application part or the vibration plate for minute vibration so as to face each other in a non-contact manner, and it is not necessary to arrange the minute vibration application member on almost the entire lower surface of the mounted material. Can be supplied directly, the solder can be heated efficiently, and the production efficiency can be improved.

また、上記保持枠の上面が何らかの部材で支持されずに振動可能な状態で、上記印加部が上記振動板の下面に接触して微小振動を印加した場合、上記保持枠が上記被装着材の厚み方向に微小振動して上記半田に微小振動が効率良く伝達されないことがある。これに対して、本発明の第態様においては、上記微小振動印加装置は、上記被装着材支持部材の上記保持枠の上面と当接可能な当接部材をさらに有して、上記印加部が上記振動板に対して上記被装着材の厚み方向の微小振動を上記半田に印加するとき、上記当接部材が上記被装着材支持部材の上記保持枠と当接するように構成したので、上記当接部材により、上記保持枠が上記被装着材の厚み方向に微小振動して上記半田に微小振動が効率良く伝達されないことを防いで、より確実に微小振動を半田に伝達することができ、上記溶融半田内で半田成分をより均一に分散させることができる。 In addition, when the upper surface of the holding frame is capable of vibrating without being supported by any member and the application unit is in contact with the lower surface of the diaphragm and applies minute vibrations, the holding frame is attached to the mounted material. There is a case where the minute vibration is not transmitted efficiently to the solder due to the minute vibration in the thickness direction. On the other hand, in the second aspect of the present invention, the micro-vibration applying device further includes a contact member capable of contacting the upper surface of the holding frame of the mounted material support member, and the application unit There when in pairs on the diaphragm for applying a minute vibration in the thickness direction of the object to be mounted material on the solder above, since the contact member is configured to abut with the holding frame of the mating attachment member supporting member, The contact member prevents the holding frame from minutely vibrating in the thickness direction of the mounted material and prevents the minute vibration from being efficiently transmitted to the solder, and more reliably transmits the minute vibration to the solder. The solder component can be more uniformly dispersed in the molten solder.

また、上記半田加熱部内でのみ上記微小振動を印加するように構成した場合には、上記半田加熱部外に移動し上記微小振動を印加していないときに、上記半田成分が偏析してしまう恐れがある。また、上記半田加熱部外でのみ上記微小振動を印加するように構成した場合には、上記半田加熱部外に移動し上記微小振動を印加するまでの間に、上記半田成分が偏析してしまう恐れがある。これに対して、本発明の第態様においては、上記印加部が上記振動板に対して上記被装着材の厚み方向の微小振動を上記半田に印加するとともに、上記当接部材が上記被装着材支持部材の上記保持枠に当接した状態で、上記当接部材及び上記印加部を上記半田加熱部内の上記印加可能位置と上記半田加熱部外の上記退避位置との間で移動可能とする移動装置をさらに備えるようにしたので、上記半田は、上記半田加熱部内で溶融した状態で微小振動を印加されながら、上記半田加熱部外に移動し冷却される。したがって、上記半田成分が偏析する恐れがない。つまり、上記溶融半田内で上記半田成分をより均一に分散させることができる。 Further, in the case where the minute vibration is applied only in the solder heating portion, the solder component may be segregated when it moves outside the solder heating portion and the minute vibration is not applied. There is. Further, when the minute vibration is applied only outside the solder heating part, the solder component is segregated before moving to the outside of the solder heating part and applying the minute vibration. There is a fear. In contrast, in the fourth aspect of the present invention, the applying portion is against the above vibrating plate is applied with a small vibration in the thickness direction of the object to be mounted material on the solder above, the contact member is to be the The contact member and the application unit can be moved between the application position in the solder heating unit and the retracted position outside the solder heating unit in contact with the holding frame of the mounting material support member. Since the moving device is further provided, the solder moves to the outside of the solder heating unit and is cooled while being applied with minute vibrations while being melted in the solder heating unit. Therefore, there is no fear that the solder component is segregated. That is, the solder component can be more uniformly dispersed in the molten solder.

本発明の記述を続ける前に、添付図面において同じ部品については同じ参照符号を付している。
以下、本発明の最良の実施形態について、図面を参照しながら説明する。
Before continuing the description of the present invention, the same parts are denoted by the same reference numerals in the accompanying drawings.
DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, exemplary embodiments of the invention will be described with reference to the drawings.

《第1実施形態》
本発明の第1実施形態にかかるリフロー装置の構成を、図1〜図7を参照しながら説明する。図1は、本発明の第1実施形態にかかるリフロー装置を上面側から見た概略平面図である。図2は、本発明の第1実施形態にかかるリフロー装置を、基板搬送方向Xと直交する横方向から見た概略断面図である。図3は本発明の第1実施形態にかかるリフロー装置のパレットを示す斜視図であり、図4はそのパレットに電子部品を装着した基板を載置したときの断面図である。図5Aは、本発明の第1実施形態にかかるリフロー装置の、基板を載置したパレットに微小振動印加装置が備える印加ツールが微小振動を印加する状態を示す模式説明図であり、図5Bは微小振動印加装置が備える印加部によりパレットに印加された微小振動の伝わり方を示す模式説明図である。図6は、本発明の第1実施形態にかかるリフロー装置のパレットと微小振動印加装置が備える印加ツールを示す一部拡大断面図である。図7は、本発明の第1実施形態にかかるリフロー装置の、微小振動発生装置が発生させる微小振動の周波数及び半田に印加する微小振動の振幅の好ましい範囲を示すグラフである。
<< First Embodiment >>
The configuration of the reflow apparatus according to the first embodiment of the present invention will be described with reference to FIGS. FIG. 1 is a schematic plan view of the reflow apparatus according to the first embodiment of the present invention as viewed from the upper surface side. FIG. 2 is a schematic cross-sectional view of the reflow apparatus according to the first embodiment of the present invention as viewed from the lateral direction orthogonal to the substrate transport direction X. FIG. 3 is a perspective view showing a pallet of the reflow apparatus according to the first embodiment of the present invention, and FIG. 4 is a cross-sectional view when a substrate on which electronic components are mounted is placed on the pallet. FIG. 5A is a schematic explanatory view showing a state in which the application tool included in the micro-vibration application device applies micro vibrations to the pallet on which the substrate is placed in the reflow apparatus according to the first embodiment of the present invention, and FIG. It is a schematic explanatory drawing which shows how to transmit the minute vibration applied to the pallet by the application part with which a minute vibration application apparatus is provided. FIG. 6 is a partially enlarged cross-sectional view showing an application tool included in the pallet of the reflow device and the minute vibration application device according to the first embodiment of the present invention. FIG. 7 is a graph showing a preferable range of the frequency of the minute vibration generated by the minute vibration generator and the amplitude of the minute vibration applied to the solder in the reflow apparatus according to the first embodiment of the present invention.

本発明の第1実施形態にかかるリフロー装置は、装着物の一例である電子部品1が半田4(図4参照)にて接合される被装着材の一例である基板2が搬入され、当該基板2の半田4を溶融してリフローを行う半田加熱部10と、半田加熱部10内に搬入された基板2と電子部品1とを接合する半田に対して印加可能な微小振動を発生させる微小振動発生装置の一例である超音波振動子20と、超音波振動子20により発生された微小振動を、半田加熱部10内の半田に対して基板2の厚み方向の微小振動として印加する微小振動印加装置30とを備えている。   In the reflow apparatus according to the first embodiment of the present invention, a substrate 2 as an example of a material to be attached to which an electronic component 1 as an example of a mounted object is joined by solder 4 (see FIG. 4) is carried in, and the substrate 2, a solder heating unit 10 that melts and reflows the solder 4, and a micro-vibration that generates a micro-vibration that can be applied to the solder that joins the board 2 and the electronic component 1 carried into the solder heating unit 10. An ultrasonic vibrator 20 that is an example of a generator, and a minute vibration application that applies a minute vibration generated by the ultrasonic vibrator 20 as a minute vibration in the thickness direction of the substrate 2 to the solder in the solder heating unit 10. Device 30.

また、本発明の第1実施形態にかかるリフロー装置は、さらに、基板2が載置される被装着材支持部材の一例であるパレット3を基板搬送方向Xに搬送して、半田加熱部10階から半田加熱部10内に搬送し、半田加熱部10内で搬送するとともに、半田加熱部10内から半田加熱部10外へ移動されたパレット3を基板搬送方向Xの下流側へ搬送する搬送装置40と、微小振動印加装置30が備える印加部31及び当接部材の一例である一対の吸着部材32,32を連結して、当該印加部31及び一対の吸着部材32,32を半田加熱部10内の印加位置30Aと半田加熱部10外の退避位置30Bとの間で移動させる移動装置の一例である前後移動装置50と、各部及び各装置の動作を制御可能な制御装置60と、を備えている。   Further, the reflow apparatus according to the first embodiment of the present invention further conveys the pallet 3 as an example of the mounted material support member on which the substrate 2 is placed in the substrate conveyance direction X, and the 10th floor of the solder heating unit. To the solder heating unit 10, and transports in the solder heating unit 10, and also transports the pallet 3 moved from the solder heating unit 10 to the outside of the solder heating unit 10 to the downstream side in the substrate transport direction X. 40 and the application unit 31 included in the minute vibration application device 30 and a pair of suction members 32, 32 as an example of a contact member are connected, and the application unit 31 and the pair of suction members 32, 32 are connected to the solder heating unit 10. A back-and-forth moving device 50 that is an example of a moving device that moves between the application position 30A inside and the retreat position 30B outside the solder heating unit 10, and a control device 60 that can control the operation of each part and each device. ing.

半田加熱部10は、直方体形状の箱体で形成され、その内部に半田加熱室11が形成されている。半田加熱室11は、基板2を予め設定された温度まで昇温させる半田予熱工程を行う予熱ゾーン11aと、半田を溶融させるリフロー工程を行うリフローゾーン11bとに、仕切板12によって区画されている。半田予熱ゾーン11aの温度雰囲気は、ヒータやブロアを備える熱風供給装置71により供給される熱風により形成されている。リフローゾーン3bの温度雰囲気は、ヒータやブロアを備える熱風供給装置72により供給される熱風により形成されている。半田加熱部10の、基板搬送方向Xに対向する一対の面には、基板2が通過可能な、搬入口10a又は搬出口10bが夫々設けられており、搬入口10a及び搬出口10bと、予熱ゾーン11a及びリフローゾーン11bとを通るように搬送装置40が設けられている。リフローゾーン11b内で且つ基板搬送方向Xの下流側には、パレット3の先端部のエッジ3eを検出するエッジ検出部13が設けられている。エッジ検出部13は、パレット3の先端部のエッジ3eを検出すると、エッジ検出信号を制御装置60に発信する。   The solder heating unit 10 is formed as a rectangular parallelepiped box, and a solder heating chamber 11 is formed therein. The solder heating chamber 11 is partitioned by a partition plate 12 into a preheating zone 11a for performing a solder preheating process for raising the temperature of the substrate 2 to a preset temperature and a reflow zone 11b for performing a reflow process for melting solder. . The temperature atmosphere of the solder preheating zone 11a is formed by hot air supplied by a hot air supply device 71 including a heater and a blower. The temperature atmosphere in the reflow zone 3b is formed by hot air supplied by a hot air supply device 72 including a heater and a blower. A pair of surfaces facing the substrate transport direction X of the solder heating unit 10 are provided with a carry-in port 10a or a carry-out port 10b through which the substrate 2 can pass, respectively. A transfer device 40 is provided so as to pass through the zone 11a and the reflow zone 11b. An edge detector 13 that detects the edge 3e of the tip of the pallet 3 is provided in the reflow zone 11b and on the downstream side in the substrate transport direction X. When the edge detection unit 13 detects the edge 3 e at the tip of the pallet 3, it transmits an edge detection signal to the control device 60.

搬送装置40は、一例としてチェーンコンベア方式の搬送装置である。搬送装置40は、一対の搬入用レール41,41と、一対の半田加熱部搬送用レール42,42と、一対の搬出用レール43,43とを有している。搬送装置40は、各レール41〜43用に別々に設けられた駆動用モータ(図示せず)が正方向に駆動して、各レール41〜43に沿って夫々設けられたチェーン41a〜43aが基板搬送方向Xに送られることにより、基板2が載置されたパレット3を一対の搬入用レール41,41、一対の半田加熱部搬送用レール42,42、及び一対の搬出用レール43,43上で基板搬送方向Xに搬送できるように構成されている。なお、上記駆動用モータの駆動動作は、制御装置60により制御されている。   The conveyance device 40 is, for example, a chain conveyor type conveyance device. The transfer device 40 includes a pair of carry-in rails 41, 41, a pair of solder heating unit transfer rails 42, 42, and a pair of carry-out rails 43, 43. In the transport device 40, drive motors (not shown) separately provided for the rails 41 to 43 are driven in the forward direction, and chains 41a to 43a respectively provided along the rails 41 to 43 are provided. By being sent in the substrate transport direction X, the pallet 3 on which the substrate 2 is placed is moved into a pair of carry-in rails 41, 41, a pair of solder heating unit transport rails 42, 42, and a pair of carry-out rails 43, 43. It is comprised so that it can convey in the board | substrate conveyance direction X above. The driving operation of the driving motor is controlled by the control device 60.

パレット3は、図4に示すように、基板2が載置される矩形の振動板3aと、振動板3aの周囲を保持する矩形の保持枠3bとを有している。振動板3aは、例えば、ステンレス等の金属で形成され、その厚みは0.5mm程度で形成されている。振動板3aの上面には、例えばシリコンで形成された矩形の粘着シート3cが取り付けられている。基板2は、図3及び図4に示すように、粘着シート3cの上面に貼り付けられることでパレット3に離脱可能に保持される(図1の一点鎖線は基板2を示す)。保持枠3bは、例えば、ステンレス等の金属で形成され、その厚みは2.0mm程度で形成されている。振動板3aと保持枠3bとは、図3に示すように、複数のスポット溶接部3dで固定されている。各スポット溶接部3dの間隔を、超音波振動子20が発生させる超音波の振動周期の倍数に合わせると、振動板3aが共振しやすくなるので好ましい。   As shown in FIG. 4, the pallet 3 includes a rectangular diaphragm 3 a on which the substrate 2 is placed and a rectangular holding frame 3 b that holds the periphery of the diaphragm 3 a. The diaphragm 3a is made of, for example, a metal such as stainless steel and has a thickness of about 0.5 mm. A rectangular adhesive sheet 3c made of silicon, for example, is attached to the upper surface of the diaphragm 3a. As shown in FIGS. 3 and 4, the substrate 2 is detachably held on the pallet 3 by being affixed to the upper surface of the adhesive sheet 3c (the dashed line in FIG. 1 indicates the substrate 2). The holding frame 3b is made of, for example, a metal such as stainless steel and has a thickness of about 2.0 mm. As shown in FIG. 3, the diaphragm 3a and the holding frame 3b are fixed by a plurality of spot welds 3d. It is preferable to adjust the interval between the spot welds 3d to a multiple of the vibration period of the ultrasonic wave generated by the ultrasonic vibrator 20 because the vibration plate 3a is likely to resonate.

微小振動印加装置30は、図1及び図2に示すように、印加部31と、一対の吸着部材32,32と、例えばエアシリンダや油圧シリンダを用いた装置である上下移動装置33とを備えている。印加部31は、基板搬送方向Xに延在する大略棒状の超音波ホーン31aと、超音波ホーン31aの基板搬送方向Xの上流側の端部の上側に取り付けられた印加ツール31bを備えている。   As shown in FIGS. 1 and 2, the minute vibration application device 30 includes an application unit 31, a pair of suction members 32 and 32, and a vertical movement device 33 that is a device using, for example, an air cylinder or a hydraulic cylinder. ing. The application unit 31 includes a substantially rod-shaped ultrasonic horn 31a extending in the substrate conveyance direction X, and an application tool 31b attached to the upper side of the upstream end of the ultrasonic horn 31a in the substrate conveyance direction X. .

超音波ホーン31の基板搬送方向Xの中間部は、上下移動装置33に設けられた、昇降用モータ(図示せず)の駆動により上下動する昇降部材(図示せず)に固定されている。すなわち、超音波ホーン31aの印加ツール31bを取り付けている端部は固定されておらず、自由端になっている。超音波ホーン31の基板搬送方向Xの下流側の端部は、半田加熱部2内の熱が超音波振動子20に伝達されないように放熱する放熱フィン21を貫通して、直方体形状の超音波振動子20と連結されている。つまり、超音波ホーン31、放熱フィン21及び超音波振動子20は、基板搬送方向Xに平行な同軸上に設けられている。   An intermediate portion of the ultrasonic horn 31 in the substrate transport direction X is fixed to an elevating member (not shown) that is provided in the vertical movement device 33 and moves up and down by driving an elevating motor (not shown). That is, the end portion to which the application tool 31b of the ultrasonic horn 31a is attached is not fixed and is a free end. The end of the ultrasonic horn 31 on the downstream side in the board conveying direction X passes through the heat radiation fin 21 that radiates heat so that the heat in the solder heating unit 2 is not transmitted to the ultrasonic vibrator 20, and has a rectangular parallelepiped ultrasonic wave. The vibrator 20 is connected. That is, the ultrasonic horn 31, the radiation fins 21, and the ultrasonic transducer 20 are provided on the same axis parallel to the substrate transport direction X.

上下移動装置33は、上記昇降用モータを駆動して上記昇降部材を上下動させることで、上記昇降部材に固定された超音波ホーン31aと、超音波ホーン31aに連結された印加ツール31b、放熱フィン21及び超音波振動子20とを一体的に上下動させるように構成されている。上下移動装置33の下端部は、前後移動装置50の矩形の板状基台50aに連結されている。   The vertical movement device 33 drives the lifting motor to move the lifting member up and down, so that the ultrasonic horn 31a fixed to the lifting member, the application tool 31b connected to the ultrasonic horn 31a, the heat dissipation The fin 21 and the ultrasonic transducer 20 are configured to move up and down integrally. A lower end portion of the vertical movement device 33 is connected to a rectangular plate-shaped base 50 a of the front-back movement device 50.

一対の吸着部材32,32は、基板搬送方向Xの上流側の端部の下側に夫々、ゴム製などの大略円錐形状の吸着パット32a,32aを備えている。一対の吸着部材32,32の夫々の吸着パット32a,32aは、搬送装置40により半田加熱部2内で搬送される基板2と接触しないように、当該基板2より僅かに(例えば1mm)上方に離れて配置されている。また、一対の吸着部材32,32は、パレット3を吸着可能な吸引力を吸着パット32a,32aで発生させる吸引装置34と接続されている。一対の吸着部材32,32の夫々の基板搬送方向Xの下流側の部分は、パレット3の移動を妨げないように、搬送経路3Aの上方から、搬送経路3Aの上方から外れた位置まで折れ曲がり、さらにその位置で下方に向かって折れ曲がって前後移動装置50の板状基台50aに連結されている。   The pair of suction members 32, 32 are provided with suction pads 32a, 32a having a generally conical shape made of rubber or the like below the end portion on the upstream side in the substrate transport direction X, respectively. The suction pads 32a and 32a of the pair of suction members 32 and 32 are slightly above (for example, 1 mm) above the substrate 2 so as not to contact the substrate 2 transported in the solder heating unit 2 by the transport device 40. Are located apart. The pair of suction members 32 and 32 are connected to a suction device 34 that generates suction force capable of sucking the pallet 3 by the suction pads 32a and 32a. The downstream portions of the pair of suction members 32, 32 in the substrate transport direction X are bent from above the transport path 3A to a position outside the transport path 3A so as not to disturb the movement of the pallet 3. Further, it is bent downward at that position and connected to the plate-like base 50a of the forward / backward moving device 50.

前後移動装置50は、基板搬送方向Xに延在するネジ軸(図示せず)と、上記ネジ軸が回転することによりネジ軸上を移動可能なナット(図示せず)と、上記ナットに固定される板状基台50aと、上記ネジ軸を回転させる前後移動用モータ(図示せず)とを備えている。前後移動装置50は、上記前後移動用モータを正方向に駆動させることにより、上記ネジ軸を正方向に回転させ、上記ネジ軸上を、上記ナット及び上記ナットに固定される板状基台50aを基板搬送方向Xに移動させて、板状基台50aに連結された上下移動装置33及び一対の吸着部材32,32を基板搬送方向Xに移動させる。また、前後移動装置50は、上記前後移動用モータを逆方向に駆動させることにより、上記ネジ軸を逆方向に回転させ、上記ネジ軸上を上記ナット及び上記ナットに固定される板状基台50aを基板搬送方向Xと逆方向に移動させて、板状基台50aに連結された上下移動装置33及び一対の吸着部材32,32を基板搬送方向Xと逆方向に移動させる。なお、前後移動装置50の前後方向X1の移動動作は、制御装置60により制御されている。   The back-and-forth moving device 50 is fixed to the screw shaft (not shown) extending in the substrate transport direction X, a nut (not shown) movable on the screw shaft by rotating the screw shaft, and the nut. Plate-like base 50a, and a motor for moving back and forth (not shown) for rotating the screw shaft. The forward / backward moving device 50 rotates the screw shaft in the forward direction by driving the forward / backward movement motor in the forward direction, and the plate-like base 50a fixed on the nut and the nut on the screw shaft. Is moved in the substrate transport direction X, and the vertical movement device 33 and the pair of suction members 32, 32 connected to the plate-like base 50a are moved in the substrate transport direction X. The back-and-forth moving device 50 rotates the screw shaft in the reverse direction by driving the back-and-forth moving motor in the reverse direction, and the plate-like base fixed to the nut and the nut on the screw shaft. The vertical movement device 33 and the pair of suction members 32, 32 connected to the plate-like base 50a are moved in the direction opposite to the substrate transfer direction X by moving the 50a in the direction opposite to the substrate transfer direction X. The moving operation of the front-rear moving device 50 in the front-rear direction X1 is controlled by the control device 60.

前後移動装置50が微小振動印加装置30(つまり、印加部31、一対の吸着部材32,32及び上下移動装置33)を印加位置30Aに移動させたとき、印加部31の超音波ホーン31aは、半田加熱部用搬送レール42より下方で且つリフローゾーン11b内から搬出口10bを通って半田加熱部2外まで基板搬送方向Xに延在するように位置し、一対の吸着部材32,32は、半田加熱部用搬送レール42より上方で且つリフローゾーン11b内から搬出口10bを通って半田加熱部2外まで基板搬送方向Xに延在するように位置し、上下移動装置33は、半田加熱部2外で且つ基板搬送方向Xの下流側に位置するように構成されている。   When the back-and-forth movement device 50 moves the minute vibration application device 30 (that is, the application unit 31, the pair of adsorption members 32 and 32, and the vertical movement device 33) to the application position 30A, the ultrasonic horn 31a of the application unit 31 is The pair of suction members 32, 32 are positioned below the solder heating unit transport rail 42 and extend in the substrate transport direction X from the reflow zone 11b to the outside of the solder heating unit 2 through the carry-out port 10b. The vertical movement device 33 is located above the solder heating unit conveyance rail 42 and extends in the substrate conveyance direction X from the reflow zone 11b to the outside of the solder heating unit 2 through the carry-out port 10b. 2 and located downstream of the substrate transport direction X.

前後移動装置50が微小振動印加装置30を退避位置30Bに移動させたとき、印加部31及び一対の吸着部材32,32は、半田加熱部2外で且つ基板搬送方向Xの下流側に位置するように構成されている。つまり、微小振動印加装置30が退避位置30Bに位置するとき、印加部31の印加ツール31b及び一対の吸着部材32,32の夫々の吸着パット32a,32aは、半田加熱部2外で且つ基板搬送方向Xの下流側に位置するように構成されている。
なお、前後移動装置50は、印加ツール31bと一対の吸着部材32,32の夫々の吸着パット32a,32aとを、常時は印加位置30Aに、つまり半田加熱部10内に位置させるように構成されている。
When the back-and-forth moving device 50 moves the minute vibration applying device 30 to the retracted position 30B, the applying unit 31 and the pair of suction members 32 and 32 are located outside the solder heating unit 2 and downstream in the substrate transport direction X. It is configured as follows. That is, when the minute vibration application device 30 is located at the retracted position 30B, the application tool 31b of the application unit 31 and the suction pads 32a and 32a of the pair of suction members 32 and 32 are outside the solder heating unit 2 and transported to the substrate. It is configured to be located on the downstream side in the direction X.
The back-and-forth moving device 50 is configured to always position the application tool 31b and the suction pads 32a and 32a of the pair of suction members 32 and 32 at the application position 30A, that is, within the solder heating unit 10. ing.

印加部31の超音波ホーン31a及び印加ツール31bは、例えばアルミニウム合金やステンレス、チタンなどで形成されている。超音波ホーン31aは、微小振動発生装置20が発生させる微小振動の振幅を拡大させる機能を有する。印加ツール31bは、図5Aに示すように、電子部品1を装着した基板2が載置されたパレット3の振動板3aの下面に接触し、超音波振動子20により発生される微小振動を、超音波ホーン31aを介して伝達されることで、図5Bに示すように、基板2の厚み方向の微小振動を半田4に印加できるように構成されている。なお、印加ツール31bの振動板3aの下面との接触位置は、振動板3aの中央部にあることが好ましい。これにより、基板2の全体に均一に微小振動を印加しやすくなる。   The ultrasonic horn 31a and the application tool 31b of the application unit 31 are made of, for example, aluminum alloy, stainless steel, titanium, or the like. The ultrasonic horn 31a has a function of expanding the amplitude of the minute vibration generated by the minute vibration generator 20. As shown in FIG. 5A, the application tool 31b contacts the lower surface of the diaphragm 3a of the pallet 3 on which the substrate 2 on which the electronic component 1 is mounted is placed, and minute vibrations generated by the ultrasonic vibrator 20 are By being transmitted through the ultrasonic horn 31a, the minute vibration in the thickness direction of the substrate 2 can be applied to the solder 4 as shown in FIG. 5B. In addition, it is preferable that the contact position with the lower surface of the diaphragm 3a of the application tool 31b exists in the center part of the diaphragm 3a. Thereby, it becomes easy to apply a minute vibration uniformly to the whole substrate 2.

印加ツール31bは、図6に示すように、雄ねじ形状を有し、超音波ホーン31aの基板搬送方向Xの上流側の端部の上側に形成された雌ねじ部31dにねじ込まれている。
なお、パレット3の振動板3aと印加ツール31bとは直接接触すると互いにキズつく恐れがあるため、図6に示すように、印加ツール31bの頭部を覆うように、例えばポリイミドなどの樹脂で形成された保護部材の一例であるキャップ31bを取り付けてもよい。また、パレット3の振動板3aの下面に、例えばポリイミドなどの樹脂で形成された板状のキズ防止用保護部材3dを設けてもよい。この場合、キャップ31c及びキズ防止用保護部材3dの厚さは、例えば0.3mm程度で形成されるのが好ましい。
As shown in FIG. 6, the application tool 31b has a male screw shape, and is screwed into a female screw portion 31d formed on the upper side of the upstream end portion of the ultrasonic horn 31a in the substrate transport direction X.
In addition, since the diaphragm 3a of the pallet 3 and the application tool 31b may be scratched if they are in direct contact with each other, as shown in FIG. 6, it is formed of a resin such as polyimide so as to cover the head of the application tool 31b. You may attach the cap 31b which is an example of the made protective member. Further, a plate-like scratch-preventing protective member 3d made of a resin such as polyimide may be provided on the lower surface of the diaphragm 3a of the pallet 3. In this case, it is preferable that the cap 31c and the scratch-preventing protective member 3d have a thickness of, for example, about 0.3 mm.

上下移動装置33は、印加位置30Aに位置する状態で、制御装置60がエッジ検出部13のエッジ検出信号を受信して、制御装置60が上記昇降用モータを正方向に駆動させ、上記昇降部材を上昇させたとき、印加ツール31bを、図4に示すように、印加準備位置31Aから印加可能位置31Bに移動させるように構成されている。また、上下移動装置33は、退避位置30Bに位置する状態で、制御装置60が上記昇降用モータを逆方向に駆動させ、上記昇降部材を下降させることで、印加可能位置31Bから印加準備位置31Aに移動させるように構成されている。   In the state where the vertical movement device 33 is located at the application position 30A, the control device 60 receives the edge detection signal of the edge detection unit 13, and the control device 60 drives the lifting motor in the forward direction to move the lifting member. As shown in FIG. 4, the application tool 31b is moved from the application preparation position 31A to the application possible position 31B. In the state where the vertical movement device 33 is located at the retreat position 30B, the control device 60 drives the lifting motor in the reverse direction to lower the lifting member, so that the application preparation position 31A is changed from the application possible position 31B. It is configured to be moved.

また、上下移動装置33は、印加ツール31bを印加準備位置31Aから印加可能位置31Bに移動させる際に、印加ツール31bをパレット3の振動板3aの下面に接触させて、印加ツール31bでパレット3を半田加熱部搬送用レール42,42のチェーン42a,42a上から僅かに持ち上げ、一対の吸着部材32,32の夫々の吸着パット32a,32aにパレット3の保持枠3bの上面を吸着させることができるように構成されている。   Further, when moving the application tool 31b from the application preparation position 31A to the application possible position 31B, the vertical movement device 33 brings the application tool 31b into contact with the lower surface of the diaphragm 3a of the pallet 3, and the pallet 3 with the application tool 31b. Is slightly lifted from above the chains 42a and 42a of the solder heating part conveying rails 42 and 42, and the upper surfaces of the holding frames 3b of the pallet 3 are adsorbed to the adsorbing pads 32a and 32a of the pair of adsorbing members 32 and 32, respectively. It is configured to be able to.

一対の吸着部材32,32は、上下移動装置33より印加ツール31bがパレット3を半田加熱部搬送用レール42,42のチェーン42a,42a上から僅かに持ち上げて、当該パレット3の保持枠3bの上面に当接した状態で、吸引装置34がパレット3を吸着可能な吸引力を吸着パット32a,32aに発生させることにより、パレット3を吸着可能に構成されている。なお、吸着パット32a,32aは、保持枠3bの基板搬送方向Xの周縁部の中間部の上面で保持枠3bを吸着できるように構成されることが好ましい。また、吸着パット32a,32a及び印加ツール31bは、基板搬送方向Xに直交する同一線上に配置されることが好ましい。これにより、パレット3を吸着するバランスが取りやすくなるとともに、印加ツール31bより印加される微小振動が半田4に効果的に伝わりやすい。なお、吸引装置34の吸引動作は、制御装置60により制御されている。   The pair of adsorbing members 32 and 32 are moved upward and downward by the application tool 31b from the vertical movement device 33 to slightly lift the pallet 3 from above the chains 42a and 42a of the solder heating part transport rails 42 and 42, and the holding frame 3b of the pallet 3 is lifted. The suction device 34 is configured to be capable of sucking the pallet 3 by causing the suction pads 32a and 32a to generate a suction force capable of sucking the pallet 3 while the suction device 34 is in contact with the upper surface. The suction pads 32a and 32a are preferably configured so that the holding frame 3b can be sucked by the upper surface of the intermediate portion of the peripheral edge in the substrate transport direction X of the holding frame 3b. The suction pads 32a and 32a and the application tool 31b are preferably arranged on the same line orthogonal to the substrate transport direction X. As a result, it is easy to balance the adsorption of the pallet 3, and minute vibrations applied from the application tool 31 b are easily transmitted to the solder 4 effectively. The suction operation of the suction device 34 is controlled by the control device 60.

超音波振動子20は、例えば、電圧を与えると変形する性質を有するピエゾ素子であり、電圧が与えられることで、搬送装置40により半田加熱部10内に搬入された基板2と電子部品1とを接合する半田4に対して印加可能な微小振動を発生させる。超音波振動子20が発生させる微小振動の周波数が大きすぎると、半田4に大きな振幅を有する微小振動が印加されて半田4の表面が波打ち、電子部品1が基板2に対して傾いた状態で接合されることになる。一方、超音波振動子20が発生させる微小振動の周波数が小さすぎると、半田4に十分な大きさの振幅を有する微小振動が印加されず、半田成分を均一に分散させることができない。よって、図7に示すように、超音波振動子20が発生させる微小振動の周波数は20kHz〜40kHz、半田4に印加する微小振動の振幅は5μm〜15μmの範囲内で設定されるのが好ましい。具体的には、上記周波数は35kHz、上記振幅は5μmに設定すればよい。なお、超音波振動子20の微小振動発生動作は、制御装置60により制御されている。   The ultrasonic vibrator 20 is, for example, a piezo element having a property of being deformed when a voltage is applied. When the voltage is applied, the substrate 2 and the electronic component 1 carried into the solder heating unit 10 by the transfer device 40 are provided. A minute vibration that can be applied to the solder 4 that joins is generated. If the frequency of the minute vibration generated by the ultrasonic vibrator 20 is too large, a minute vibration having a large amplitude is applied to the solder 4, the surface of the solder 4 is waved, and the electronic component 1 is inclined with respect to the substrate 2. Will be joined. On the other hand, if the frequency of the minute vibration generated by the ultrasonic vibrator 20 is too small, the minute vibration having a sufficiently large amplitude is not applied to the solder 4 and the solder component cannot be uniformly dispersed. Therefore, as shown in FIG. 7, it is preferable that the frequency of the minute vibration generated by the ultrasonic transducer 20 is set within a range of 20 kHz to 40 kHz, and the amplitude of the minute vibration applied to the solder 4 is set within a range of 5 μm to 15 μm. Specifically, the frequency may be set to 35 kHz and the amplitude may be set to 5 μm. Note that the micro vibration generation operation of the ultrasonic transducer 20 is controlled by the control device 60.

また、半田加熱部10外の基板搬送方向Xの下流側で且つパレット3Aの搬送経路3Aの上方には、半田加熱室11内から搬出された基板2の半田4を冷却するための冷却装置22が設けられている。冷却装置22は、例えば冷風を供給するファンで構成することができる。なお、冷却装置22の冷却動作は、制御装置60により制御されている。   Further, a cooling device 22 for cooling the solder 4 of the substrate 2 carried out from the solder heating chamber 11 on the downstream side in the substrate conveyance direction X outside the solder heating unit 10 and above the conveyance path 3A of the pallet 3A. Is provided. The cooling device 22 can be configured by a fan that supplies cold air, for example. The cooling operation of the cooling device 22 is controlled by the control device 60.

制御装置60は、加熱処理する対象となる基板2の大きさや種類、部品の耐熱性、半田4の材料等に応じた、温度プロファイルや動作手順が記憶された記憶テーブルを有する記憶部(図示せず)を備えている。制御装置60は、その記憶部の記憶テーブルに基づいて、半田予熱ゾーン11a、リフローゾーン3bの夫々に対応する熱風を供給し、半田加熱部10内に半田予熱ゾーン11aの温度雰囲気を形成する熱風供給装置71及びリフローゾーン3bの温度雰囲気を形成する熱風供給装置72を制御するとともに、上記各部及び各装置の動作を制御して、基板2に電子部品1の半田4による接合を行う。   The control device 60 has a storage unit (not shown) having a storage table storing a temperature profile and an operation procedure according to the size and type of the substrate 2 to be heat-treated, the heat resistance of the components, the material of the solder 4, and the like. )). The control device 60 supplies hot air corresponding to each of the solder preheating zone 11a and the reflow zone 3b based on the storage table of the storage unit, and forms hot air that forms the temperature atmosphere of the solder preheating zone 11a in the solder heating unit 10. The hot air supply device 72 that forms the temperature atmosphere of the supply device 71 and the reflow zone 3b is controlled, and the operation of each of the above parts and each device is controlled to bond the electronic component 1 to the substrate 2 with the solder 4.

本発明の第1実施形態のリフロー装置は以上のように構成されている。
次に、本発明の第1実施形態のリフロー装置によるリフロー動作を、図1〜図4、図5A、図5B及び図8を参照しつつ説明する。図8は、本発明の第1実施形態のリフロー装置によるリフロー動作を示すフローチャートである。
The reflow apparatus of the first embodiment of the present invention is configured as described above.
Next, the reflow operation by the reflow apparatus according to the first embodiment of the present invention will be described with reference to FIGS. 1 to 4, 5 </ b> A, 5 </ b> B, and 8. FIG. 8 is a flowchart showing a reflow operation by the reflow apparatus according to the first embodiment of the present invention.

なお、初期状態において、制御装置60は、熱風供給装置71、72の駆動を制御して、半田予熱ゾーン11a、リフローゾーン3bの夫々に対応する熱風を供給させ、半田加熱部10内に半田予熱ゾーン11aの温度雰囲気及びリフローゾーン3bの温度雰囲気を形成しているものとする。また、前後移動装置50により、微小振動印加装置30は印加位置30Aし、印加ツール31bは印加準備位置31Aに位置するものとする。   In the initial state, the control device 60 controls driving of the hot air supply devices 71 and 72 to supply hot air corresponding to each of the solder preheating zone 11a and the reflow zone 3b, and solder preheating in the solder heating unit 10. It is assumed that the temperature atmosphere of the zone 11a and the temperature atmosphere of the reflow zone 3b are formed. Further, it is assumed that the minute vibration applying device 30 is located at the application position 30A and the application tool 31b is located at the application preparation position 31A by the back-and-forth moving device 50.

まず、制御装置60が、搬送装置40の搬入レール41,41用の駆動用モータ(図示せず)の駆動を制御して正方向に駆動させ、電子部品1を装着した基板2が粘着シート3c上に載置され且つ一対の搬入レール41,41に搬送されたパレット3を、一対の搬入レール41,41に沿って基板搬送方向Xに搬送し、搬入口10aを通過させて、半田加熱部2内の一対の半田加熱部搬送用レール42,42のチェーン42a,42a上に載置されるまで搬送する。   First, the control device 60 controls the drive of drive motors (not shown) for the carry-in rails 41 and 41 of the transport device 40 to drive in the forward direction, and the substrate 2 on which the electronic component 1 is mounted becomes the adhesive sheet 3c. The pallet 3 placed on and transported to the pair of carry-in rails 41 and 41 is transported along the pair of carry-in rails 41 and 41 in the board transport direction X, passed through the carry-in entrance 10a, and the solder heating unit 2 is transported until it is placed on the chains 42a, 42a of the pair of solder heating part transport rails 42, 42 in the rail 2.

次いで、制御装置60は、搬送装置40の半田加熱部搬送用レール42,42用の駆動用モータ(図示せず)の駆動を制御して正方向に駆動させて、一対の半田加熱部搬送用レール42,42に沿ってパレット3を搬送して、半田予熱ゾーン11aを通過させてリフローゾーン11bに搬送する。ここで、パレット3上に載置された基板2は、半田予熱ゾーン11aで予熱される。   Next, the control device 60 controls the drive of driving motors (not shown) for the solder heating unit transport rails 42 and 42 of the transport device 40 to drive in the forward direction, thereby transporting the pair of solder heating units. The pallet 3 is transported along the rails 42, 42, passes through the solder preheating zone 11a, and is transported to the reflow zone 11b. Here, the substrate 2 placed on the pallet 3 is preheated in the solder preheating zone 11a.

次いで、制御装置60が、上記半田加熱部搬送用レール42,42用の駆動用モータの駆動を制御してさらに正方向に駆動させ、一対の半田搬送用レール42,42に沿ってパレット3を搬送すると、リフローゾーン11b内に設けられたエッジ検出部13がパレット3の先端部のエッジ3eを検出し、制御装置60にエッジ検出信号を発信する。ここで、パレット3上に載置された基板2の半田4は、リフローゾーン11bの温度雰囲気により溶融される。次いで、制御装置60は、エッジ検出部13のエッジ検出信号を受信すると、上記半田加熱部搬送用レール42,42の駆動用モータの駆動を制御して停止させる(以上、ステップS1)。   Next, the control device 60 controls the driving of the driving motors for the solder heating unit transport rails 42 and 42 to drive in the forward direction, and the pallet 3 is moved along the pair of solder transport rails 42 and 42. When transported, the edge detection unit 13 provided in the reflow zone 11 b detects the edge 3 e at the tip of the pallet 3 and transmits an edge detection signal to the control device 60. Here, the solder 4 of the substrate 2 placed on the pallet 3 is melted by the temperature atmosphere of the reflow zone 11b. Next, when receiving the edge detection signal from the edge detection unit 13, the control device 60 controls the driving of the drive motors for the solder heating unit conveyance rails 42 and 42 to stop (step S1).

次いで、制御装置60は、上下移動装置33の昇降用モータ(図示せず)の駆動を制御して正方向に駆動させて、印加部31の超音波ホーン31aを上昇させ、印加ツール31bを印加準備位置31Aから印加可能位置31Bに移動させて振動板3aの下面に接触させ、印加ツール31bで基板2を載置したパレット3全体を半田加熱部搬送用レール42,42のチェーン42a,42a上から僅かに持ち上げ、一対の吸着部材32,32の夫々の吸着パット32a,32aにパレット3の保持枠3bの上面を当接させる(ステップS2)。このとき同時に、制御装置60は、吸引装置34の駆動を制御してパレット3を吸着可能な吸引力を吸着パット32a,32aで発生させ、吸着パット32a,32aでパレット3の保持枠3bの上面を吸着保持する。   Next, the control device 60 controls the drive of the lifting / lowering motor (not shown) of the vertical movement device 33 to drive in the forward direction to raise the ultrasonic horn 31a of the application unit 31 and apply the application tool 31b. The entire pallet 3 on which the substrate 2 is placed by the application tool 31b is moved onto the chains 42a and 42a of the solder heating unit transport rails 42 and 42 by moving from the preparation position 31A to the application possible position 31B and contacting the lower surface of the diaphragm 3a. The upper surface of the holding frame 3b of the pallet 3 is brought into contact with the suction pads 32a and 32a of the pair of suction members 32 and 32 (step S2). At the same time, the control device 60 controls the driving of the suction device 34 to generate suction force capable of sucking the pallet 3 by the suction pads 32a and 32a, and the upper surface of the holding frame 3b of the pallet 3 by the suction pads 32a and 32a. Adsorb and hold.

なお、制御装置60は、吸引装置34の駆動を制御してパレット3を吸着可能な吸引力を吸着パット32a,32aで発生させ、吸着パット32a,32aでパレット3の保持枠3bの上面を吸着保持したのち、上下移動装置33の昇降用モータ(図示せず)の駆動を制御して正方向に駆動させて、印加部31の超音波ホーン31aを上昇させてもよい。
また、制御装置60は、上下移動装置33の昇降用モータ(図示せず)の駆動を制御して正方向に駆動させて、印加部31の超音波ホーン31aを上昇させて、一対の吸着部材32,32の夫々の吸着パット32a,32aにパレット3の保持枠3bの上面を当接させたのち、吸引装置34の駆動を制御してパレット3を吸着可能な吸引力を吸着パット32a,32aで発生させ、吸着パット32a,32aでパレット3の保持枠3bの上面を吸着保持したさせてもよい。
The control device 60 controls the driving of the suction device 34 to generate suction force capable of sucking the pallet 3 by the suction pads 32a and 32a, and sucks the upper surface of the holding frame 3b of the pallet 3 by the suction pads 32a and 32a. After the holding, the ultrasonic horn 31a of the application unit 31 may be raised by controlling the drive of a lifting motor (not shown) of the vertical movement device 33 to drive in the forward direction.
In addition, the control device 60 controls the drive of a lifting motor (not shown) of the vertical movement device 33 to drive in the forward direction to raise the ultrasonic horn 31a of the application unit 31 and to make a pair of suction members After the upper surfaces of the holding frames 3b of the pallet 3 are brought into contact with the respective suction pads 32a, 32a of 32, 32, the suction pads 32a, 32a have a suction force capable of sucking the pallet 3 by controlling the driving of the suction device 34. The upper surface of the holding frame 3b of the pallet 3 may be sucked and held by the suction pads 32a and 32a.

次いで、制御装置60は、超音波振動子20の駆動を制御して微小振動を発生させる。このとき、超音波振動子20が発生させた微小振動は、超音波ホーン31aに伝達され、超音波ホーン31aでその振幅を拡大されて、印加ツール31bに伝達され、振動板3a及び粘着シート3cを介して基板2の半田4を基板2の厚み方向に微小振動させる。   Next, the control device 60 controls the driving of the ultrasonic transducer 20 to generate minute vibrations. At this time, the minute vibration generated by the ultrasonic transducer 20 is transmitted to the ultrasonic horn 31a, the amplitude thereof is enlarged by the ultrasonic horn 31a, and transmitted to the application tool 31b, and the vibration plate 3a and the adhesive sheet 3c. Then, the solder 4 of the substrate 2 is minutely vibrated in the thickness direction of the substrate 2.

次いで、制御装置60は、超音波振動子20の駆動を制御して微小振動を発生させ続けるとともに、印加ツール31bがパレット3の振動板3aの下面に当接して、一対の吸着部材32,32の夫々の吸着パット32a,32aがパレット3の保持枠3bの上面を吸着保持した状態で、前後移動装置50の前後移動用モータ(図示せず)の駆動を制御して正方向に駆動させて、板状基台50aを基板搬送方向Xに移動させ、一対の吸着部材32,32の夫々の吸着パット32a,32aと印加ツール31bとを印加位置30Aから退避位置30Bまで移動させる。この動作により、パレット3は、半田加熱部10内から搬出口10bを通過して、半田加熱部10外の一対の搬出用レール43,43に搬送される。   Next, the control device 60 controls the drive of the ultrasonic transducer 20 to continuously generate minute vibrations, and the application tool 31b comes into contact with the lower surface of the vibration plate 3a of the pallet 3 so that the pair of suction members 32 and 32 are in contact. With the respective suction pads 32a and 32a sucking and holding the upper surface of the holding frame 3b of the pallet 3, the front and rear movement motor (not shown) of the front and rear movement device 50 is controlled to drive in the forward direction. Then, the plate-like base 50a is moved in the substrate transport direction X, and the suction pads 32a and 32a and the application tool 31b of the pair of suction members 32 and 32 are moved from the application position 30A to the retreat position 30B. By this operation, the pallet 3 passes from the inside of the solder heating unit 10 through the carry-out port 10b and is conveyed to the pair of unloading rails 43, 43 outside the solder heating unit 10.

このとき、制御装置60は、冷却装置22の駆動を制御して、半田加熱部10内から搬出されてきたパレット3上の基板2の半田4を冷却する。これにより、基板2の溶融半田4内で半田成分が均一に分散されて冷却固化され、半田4により電子部品1と基板2とが接合される(以上、ステップS3)。   At this time, the control device 60 controls the driving of the cooling device 22 to cool the solder 4 of the substrate 2 on the pallet 3 carried out from the solder heating unit 10. As a result, the solder components are uniformly dispersed in the molten solder 4 of the substrate 2 and cooled and solidified, and the electronic component 1 and the substrate 2 are joined by the solder 4 (step S3).

またこのとき、吸着パット32a,32aと印加ツール31bとが退避位置30Bに到達する前に、制御装置60は、超音波振動子20の駆動を制御して微小振動の発生を停止させて、印加ツール31bによる基板2の半田4への微小振動の印加を停止させる(ステップS4)。なお、制御装置60は、基板2の溶融半田4内で半田成分が冷却固化されるまでの間に偏析しないように、基板2が半田加熱部2外に搬送されてから例えば5〜10秒間は基板2の半田4に基板2の厚み方向の微小振動が印加されるように、超音波振動子20の駆動を制御することが好ましい。   At this time, before the suction pads 32a and 32a and the application tool 31b reach the retreat position 30B, the control device 60 controls the driving of the ultrasonic transducer 20 to stop the generation of minute vibrations and apply the application. The application of minute vibrations to the solder 4 of the substrate 2 by the tool 31b is stopped (step S4). In addition, the control device 60 does not segregate until the solder component is cooled and solidified in the molten solder 4 of the substrate 2, for example, for 5 to 10 seconds after the substrate 2 is transported outside the solder heating unit 2. It is preferable to control the driving of the ultrasonic transducer 20 so that minute vibrations in the thickness direction of the substrate 2 are applied to the solder 4 of the substrate 2.

次いで、制御装置60は、上下移動装置33の上記昇降用モータの駆動を制御して逆方向に駆動させて印加部31の超音波ホーン31aを下降させ、印加ツール31bを印加可能位置31Bから印加準備位置31Aに移動させ、印加ツール31bとパレット3の振動板3aとの接触状態を解除するとともに、吸引装置34の駆動を制御してパレット3を吸着可能な吸引力の発生を停止させ、一対の吸着部材32,32の夫々の吸着パット32a,32aとパレット3の保持枠3bとの吸着状態(当接状態)を解除して、パレット3を搬出用レール43,43のチェーン43a,43a上に載置する(ステップS5)。   Next, the control device 60 controls the driving of the lifting / lowering motor of the vertical movement device 33 to drive in the reverse direction to lower the ultrasonic horn 31a of the application unit 31 and apply the application tool 31b from the application possible position 31B. It moves to the preparation position 31A, releases the contact state between the application tool 31b and the diaphragm 3a of the pallet 3, and controls the driving of the suction device 34 to stop the generation of the suction force that can attract the pallet 3. The suction state (contact state) between the suction pads 32a and 32a of the suction members 32 and 32 and the holding frame 3b of the pallet 3 is released, and the pallet 3 is placed on the chains 43a and 43a of the carry-out rails 43 and 43. (Step S5).

次いで、制御装置60は、搬送装置40の搬出用レール43,43用の駆動用モータ(図示せず)の駆動を制御して正方向に駆動させて、一対の排出用レール43,43に沿ってパレット3を基板搬送方向Xのさらに下流側へ搬送するとともに、前後移動装置50の上記前後移動用モータの駆動を制御して逆方向に駆動させて、板状基台50aを基板搬送方向Xと逆方向に移動させ、一対の吸着部材32,32の夫々の吸着パット32a,32aと印加ツール31bとを半田加熱部10外の退避位置30Bから半田加熱部10内の印加位置30Aに移動させる。これにより、印加ツール31bは半田加熱部10内の印加準備位置31Aに位置する(ステップS6)。   Next, the control device 60 controls the drive of drive motors (not shown) for the unloading rails 43 and 43 of the transport device 40 to drive in the forward direction, along the pair of discharge rails 43 and 43. The pallet 3 is transported further downstream in the substrate transport direction X, and the plate-like base 50a is driven in the reverse direction by controlling the driving of the front / rear moving motor of the front / rear moving device 50. The suction pads 32a, 32a of the pair of suction members 32, 32 and the application tool 31b are moved from the retracted position 30B outside the solder heating unit 10 to the application position 30A inside the solder heating unit 10. . Thereby, the application tool 31b is located in the application preparation position 31A in the solder heating part 10 (step S6).

以上のように本発明の第1実施形態のリフロー装置によるリフロー動作は行われる。なお、2枚以上の基板2をリフロー処理する場合には、上述したステップS1〜S6を繰り返せばよい。また、生産効率を向上させるために、一枚目の基板2にステップS6の動作を行いながら、2枚目の基板2にステップS1の動作を行う等、複数の基板2に各ステップS1〜S6の動作を同時並行的に行うようにしてもよい。   As described above, the reflow operation by the reflow apparatus of the first embodiment of the present invention is performed. In addition, what is necessary is just to repeat step S1-S6 mentioned above when reflow-processing the 2 or more board | substrate 2. Further, in order to improve the production efficiency, the steps S1 to S6 are performed on the plurality of substrates 2, for example, the operation of step S1 is performed on the second substrate 2 while the operation of step S6 is performed on the first substrate 2. These operations may be performed concurrently.

本発明の第1実施形態のリフロー装置によれば、超音波振動子20により発生された微小振動を、半田加熱部10内の半田4に対して基板2の厚み方向の微小振動として印加部31により印加するように構成したので、たとえ、パレット3が重い金属で形成され、そのパレット3に基板2が載置されていても、パレット3の厚み方向に微小振動を印加することができて、パレット3が均一に振動しやすくなり、リフロー中の溶融半田4内で半田成分を均一に分散させることができる。   According to the reflow apparatus of the first embodiment of the present invention, the application unit 31 converts the minute vibration generated by the ultrasonic transducer 20 into minute vibration in the thickness direction of the substrate 2 with respect to the solder 4 in the solder heating unit 10. Therefore, even if the pallet 3 is made of heavy metal and the substrate 2 is placed on the pallet 3, a minute vibration can be applied in the thickness direction of the pallet 3, The pallet 3 easily vibrates uniformly, and the solder components can be uniformly dispersed in the molten solder 4 during reflow.

また、本発明の第1実施形態のリフロー装置によれば、パレット3の振動板3aに対して、基板2の厚み方向の微小振動を半田4に印加する印加部31を微小振動印加装置30が備えることにより、基板2の厚み方向の微小振動が振動板3aで共振して増幅されて振動板3aに載置される基板2の半田4に伝達されるため、微小振動が基板2の半田4により一層伝達されやすくなり、溶融半田4内で半田成分をより均一に分散させることができる。   Further, according to the reflow device of the first embodiment of the present invention, the minute vibration applying device 30 includes the application unit 31 that applies the minute vibration in the thickness direction of the substrate 2 to the solder 4 with respect to the vibration plate 3 a of the pallet 3. Since the minute vibration in the thickness direction of the substrate 2 is resonated and amplified by the vibration plate 3a and transmitted to the solder 4 of the substrate 2 placed on the vibration plate 3a, the minute vibration is transmitted to the solder 4 of the substrate 2. Therefore, the solder component can be more uniformly dispersed in the molten solder 4.

また、本発明の第1実施形態のリフロー装置によれば、基板2の厚み方向に微小振動を印加するため、基板2の下方に対して、印加部31の一部が接触するように配置すればよく、基板2の下面のほぼ全面に配置する必要がないため、パレット3に熱風供給装置72の熱風を直接的に供給することができて、半田4の加熱を効率良く行うことができ、生産効率を向上させることができる。   Moreover, according to the reflow apparatus of 1st Embodiment of this invention, in order to apply a minute vibration to the thickness direction of the board | substrate 2, it arrange | positions so that a part of application part 31 may contact the downward direction of the board | substrate 2. FIG. Since it is not necessary to arrange almost all over the lower surface of the substrate 2, the hot air from the hot air supply device 72 can be directly supplied to the pallet 3, and the solder 4 can be efficiently heated. Production efficiency can be improved.

また、本発明の第1実施形態のリフロー装置によれば、パレット3の保持枠3bの上面と当接可能な一対の吸着部材32,32をさらに有して、印加部31の印加ツール31bが振動板3aの下面に接触して基板2の厚み方向の微小振動を半田4に印加するとき、一対の吸着部材32,32がパレット3の保持枠3bの上面と当接して吸着するように構成したので、より確実にパレット3自体の振動を防いで、より確実に微小振動を半田4に伝達することができ、溶融半田4内で半田成分をより均一に分散させることができる。   Moreover, according to the reflow apparatus of 1st Embodiment of this invention, it further has a pair of adsorption | suction members 32 and 32 which can contact | abut with the upper surface of the holding frame 3b of the pallet 3, and the application tool 31b of the application part 31 has it. When a minute vibration in the thickness direction of the substrate 2 is applied to the solder 4 in contact with the lower surface of the vibration plate 3a, the pair of adsorbing members 32, 32 are in contact with and adsorbed to the upper surface of the holding frame 3b of the pallet 3. Therefore, the vibration of the pallet 3 itself can be prevented more reliably, and the minute vibration can be transmitted to the solder 4 more reliably, and the solder components can be more uniformly dispersed in the molten solder 4.

また、本発明の第1実施形態のリフロー装置によれば、印加部31が振動板3aの下面に接触して基板2の厚み方向の微小振動を半田4に印加するとともに、一対の吸着部材32,32がパレット3の保持枠3bに当接して吸着した状態で、一対の吸着部材32,32及び印加部31を半田加熱部10内の印加位置30Aと半田加熱部10外の退避位置30Bとの間で移動可能とする前後移動装置50をさらに備えるようにしたので、前後移動装置50により、パレット3を半田加熱部10内の印加位置30Aから半田加熱部10外の退避位置30Bに移動させれば、半田4は、半田加熱部10内で溶融した状態で微小振動を印加されながら、半田加熱部10外に引き出されて冷却固化される。したがって、上記半田成分が冷却中でも偏析する恐れがない。つまり、溶融半田4内で半田成分をより均一に分散させて固化させることができる。   Further, according to the reflow apparatus of the first embodiment of the present invention, the application unit 31 contacts the lower surface of the vibration plate 3 a to apply minute vibrations in the thickness direction of the substrate 2 to the solder 4 and a pair of adsorption members 32. , 32 are in contact with and adsorbed to the holding frame 3b of the pallet 3, and the pair of adsorbing members 32, 32 and the application unit 31 are connected to the application position 30A in the solder heating unit 10 and the retreat position 30B outside the solder heating unit 10. The pallet 3 is moved from the application position 30A in the solder heating unit 10 to the retreat position 30B outside the solder heating unit 10 by the back and forth movement device 50. Then, the solder 4 is pulled out of the solder heating unit 10 and cooled and solidified while being applied with minute vibrations while being melted in the solder heating unit 10. Therefore, there is no possibility of segregation even when the solder component is cooled. That is, the solder component can be more uniformly dispersed and solidified in the molten solder 4.

なお、本発明の第1実施形態のリフロー装置では、微小振動印加装置30が印加可能位置30Aに位置するとき、超音波振動子20が半田加熱部10外に位置するとともに、印加部31が半田加熱部用搬送レール42,42より下方で且つリフローゾーン11b内から搬出口10bを通って半田加熱部2外まで延在して位置するように構成したが、本発明はこれに限定されない。   In the reflow device according to the first embodiment of the present invention, when the minute vibration applying device 30 is located at the application possible position 30A, the ultrasonic vibrator 20 is located outside the solder heating unit 10 and the application unit 31 is soldered. Although it has been configured so as to be positioned below the heating unit conveyance rails 42 and 42 and extend from the reflow zone 11b to the outside of the solder heating unit 2 through the carry-out port 10b, the present invention is not limited thereto.

例えば、図9に示すように、リフローゾーン11bにおいて、超音波振動子20を搬送装置40の半田加熱部用搬送レール42,42の下方に設けて、パレット3の振動板3aの下面に対して交差方向(例えば垂直方向)に、例えば大略三角柱形状や大略直方体形状の印加部31−1を線接触又は面接触させて微小振動を印加するように構成してもよい。なおこの場合、半田加熱部2内の熱が超音波振動子20に伝達されないように超音波振動子20及び放熱フィン21の周囲を断熱壁23等で覆い、基板2を加熱する熱風を形成する熱風供給加熱装置72は、その断熱壁23よりも周囲に設ける。   For example, as shown in FIG. 9, in the reflow zone 11 b, the ultrasonic transducer 20 is provided below the solder heating part transport rails 42, 42 of the transport device 40, and the lower surface of the vibration plate 3 a of the pallet 3. In the crossing direction (for example, the vertical direction), for example, the application unit 31-1 having a substantially triangular prism shape or a substantially rectangular parallelepiped shape may be configured to apply a minute vibration by line contact or surface contact. In this case, the surroundings of the ultrasonic vibrator 20 and the heat radiation fin 21 are covered with a heat insulating wall 23 or the like so that the heat in the solder heating unit 2 is not transmitted to the ultrasonic vibrator 20, and hot air for heating the substrate 2 is formed. The hot air supply heating device 72 is provided in the periphery of the heat insulating wall 23.

また、印加部31−1に代えて、例えば、図10に示すように、例えば大略円錐形状などの先細り形状に形成されて、パレット3の振動板3aの下面に微小面積(例えば20mm角以下)で接触可能に構成された印加部31−2を用いてもよい。このように構成することで、弱耐熱部品等の所望の電子部品1にのみ微小振動を印加することも可能である。なおこの場合、印加部31−2の印加軸31Aと所望の電子部品1の中心を上下方向に通る線1Aとの距離Lは、超音波振動子20が発生させる微小振動の半波長分(例えば35mm)の長さに設定されることが好ましい。また、印加部31−2の印加軸31A方向の長さは、超音波振動子20が発生させる微小振動の1波長分(例えば70mm)の長さに設定されることが好ましい。このように構成することにより、振動板3aが共振しやすくなり、微小振動を半田4に効率良く伝達することができる。   Further, instead of the application unit 31-1, for example, as shown in FIG. 10, it is formed in a tapered shape such as a substantially conical shape, and a small area (for example, 20 mm square or less) is formed on the lower surface of the diaphragm 3a of the pallet 3. The application unit 31-2 configured to be able to be touched with may be used. With this configuration, it is possible to apply a minute vibration only to a desired electronic component 1 such as a weak heat-resistant component. In this case, the distance L between the application axis 31A of the application unit 31-2 and the line 1A passing through the center of the desired electronic component 1 in the vertical direction is the half wavelength of the minute vibration generated by the ultrasonic transducer 20 (for example, 35 mm) is preferably set. In addition, the length of the application unit 31-2 in the direction of the application axis 31A is preferably set to a length corresponding to one wavelength (for example, 70 mm) of minute vibration generated by the ultrasonic transducer 20. With this configuration, the vibration plate 3 a can easily resonate, and minute vibrations can be efficiently transmitted to the solder 4.

また、本発明の第1実施形態のリフロー装置では、制御装置60がエッジ検出部13のエッジ検出信号を受信したとき、搬送装置40の半田加熱部搬送用レール42,42用の駆動用モータの駆動を一旦停止させたのち、上下移動装置33の印加ツール31bを上昇させて振動板3bの下面に接触させ、印加ツール31bでパレット3全体を半田加熱部搬送用レール42,42のチェーン42a,42a上から僅かに持ち上げて、吸着パット32a,32aにパレット3の保持枠3bを吸着させ、この状態で印加ツール31b及び吸着パット32a,32aを前後移動装置50により半田加熱部10外に移動させるように構成したが、本発明はこれに限定されない。   In the reflow device according to the first embodiment of the present invention, when the control device 60 receives the edge detection signal from the edge detection unit 13, the drive motors for the solder heating unit conveyance rails 42 and 42 of the conveyance device 40 are used. After the drive is temporarily stopped, the application tool 31b of the vertical movement device 33 is raised and brought into contact with the lower surface of the diaphragm 3b, and the entire pallet 3 is moved by the application tool 31b to the chains 42a, 42a, 42a of the solder heating unit transport rails 42, 42. The holding frame 3b of the pallet 3 is adsorbed to the adsorbing pads 32a and 32a by slightly lifting from the upper surface 42a. In this state, the application tool 31b and the adsorbing pads 32a and 32a are moved out of the solder heating unit 10 by the forward / backward moving device 50. Although configured as described above, the present invention is not limited to this.

例えば、制御装置60がエッジ検出部13のエッジ検出信号を受信したとき、搬送装置40の半田加熱部搬送用レール42,42用の駆動用モータを駆動させたまま、上下移動装置33により印加ツール31bを上昇させて振動板3bの下面に接触させ、印加ツール31bでパレット3を半田加熱部搬送用レール42,42のチェーン42a,42a上から僅かに持ち上げて、吸着パット32a,32aにパレット3の保持枠3bを当接させ、この状態で、搬送装置40により、半田加熱部10外に搬送してもよい。なおこの場合、パレット3の半田加熱部10外への搬送は搬送装置40が行うので、吸着パット32a,32aは、必ずしもパレット3bの保持枠3bを吸着するように構成しなくてもよいが、印加ツール31bを介して超音波ホーン31aの基板搬送方向Xの上流側にのみ下向きにパレット3の荷重がかかるので、超音波ホーン31aが撓まないように、剛性を高くしたり補強材等を用いて補強することが好ましい。   For example, when the control device 60 receives the edge detection signal of the edge detection unit 13, the application tool is applied by the vertical movement device 33 while driving the driving motors for the solder heating unit conveyance rails 42, 42 of the conveyance device 40. 31b is raised and brought into contact with the lower surface of the diaphragm 3b, and the pallet 3 is slightly lifted from the chains 42a and 42a of the solder heating unit transport rails 42 and 42 by the application tool 31b, and the pallet 3 is placed on the suction pads 32a and 32a. The holding frame 3b may be brought into contact, and in this state, it may be conveyed outside the solder heating unit 10 by the conveying device 40. In this case, since the transport device 40 transports the pallet 3 to the outside of the solder heating unit 10, the suction pads 32a and 32a do not necessarily have to be configured to suck the holding frame 3b of the pallet 3b. Since the load of the pallet 3 is applied downward only to the upstream side of the substrate conveying direction X of the ultrasonic horn 31a via the application tool 31b, the rigidity is increased or a reinforcing material or the like is applied so that the ultrasonic horn 31a does not bend. It is preferable to use and reinforce.

《第2実施形態》
本発明の第2実施形態にかかるリフロー装置の構成を、図11A及び図11Bを参照しながら説明する。図11Aは、本発明の第2実施形態にかかるリフロー装置の一部拡大断面図であり、図11Bは、半田4に印加される微小振動を説明する概略図である。本発明の第2実施形態にかかるリフロー装置は、微小振動印加装置がパレット3の振動板3aの下面に接触せず、半田4の上方から非接触で間接的に微小振動を半田4に印加するように構成した点で、本発明の第1実施形態にかかるリフロー装置と異なる。その他の点については同様であるので、以下には、本発明の第1実施形態にかかるリフロー装置と異なる点を主として説明し、同じ機能を有する部品には同じ符号を付し、重複する説明は省略する。
<< Second Embodiment >>
The configuration of the reflow apparatus according to the second embodiment of the present invention will be described with reference to FIGS. 11A and 11B. FIG. 11A is a partially enlarged cross-sectional view of the reflow apparatus according to the second embodiment of the present invention, and FIG. 11B is a schematic diagram illustrating minute vibrations applied to the solder 4. In the reflow device according to the second embodiment of the present invention, the minute vibration application device does not contact the lower surface of the diaphragm 3a of the pallet 3 and indirectly applies the minute vibration to the solder 4 without contact from above the solder 4. It differs from the reflow apparatus concerning 1st Embodiment of this invention by the point comprised in this way. Since the other points are the same, the following mainly describes differences from the reflow apparatus according to the first embodiment of the present invention, components having the same functions are denoted by the same reference numerals, and overlapping descriptions are omitted. Omitted.

本発明の第2実施形態にかかるリフロー装置は、図11Aに示すように、半田加熱部2のリフローゾーン11b内において搬送装置40の半田加熱部搬送用レール42,42より上方に、基板2と電子部品1とを接合する半田4に対して印加可能な微小振動を発生させる超音波振動子20と、超音波振動子20により発生された微小振動を、図11Bに示すように、基板2の厚み方向の微小振動として半田4に印加する印加部80と、を備えている。超音波振動子20は、半田加熱部2内の熱が伝達されないように、放熱フィン21を介して印加部80と接続されるとともにその周囲を断熱壁23で覆われ、リフローゾーン11bの温度雰囲気を形成する熱風供給加熱装置72は、その断熱壁23よりも周囲に設けられている。なお、本実施形態においては、印加部80により微小振動印加装置が構成されている。また、放熱フィン21は、断熱壁23により超音波振動子20に半田加熱部2内の熱が伝達されないようにすることができれば、必ずしも設けられなくても良い。   As shown in FIG. 11A, the reflow device according to the second embodiment of the present invention includes the substrate 2 and the solder heating unit transport rails 42, 42 of the transport device 40 in the reflow zone 11 b of the solder heating unit 2. As shown in FIG. 11B, the ultrasonic vibrator 20 that generates a fine vibration that can be applied to the solder 4 that joins the electronic component 1 and the fine vibration generated by the ultrasonic vibrator 20 And an application unit 80 that applies to the solder 4 as minute vibration in the thickness direction. The ultrasonic transducer 20 is connected to the application unit 80 via the heat radiation fin 21 so that heat in the solder heating unit 2 is not transmitted, and the periphery thereof is covered with a heat insulating wall 23, and the temperature atmosphere of the reflow zone 11 b The hot air supply and heating device 72 for forming is provided around the heat insulation wall 23. In the present embodiment, the application unit 80 constitutes a minute vibration application device. Further, the heat dissipating fins 21 are not necessarily provided as long as the heat in the solder heating unit 2 can be prevented from being transmitted to the ultrasonic vibrator 20 by the heat insulating wall 23.

印加部80は、図11Aに示すように、下部を、例えば大略円錐形状や大略多角錐形状等の先細り形状に形成され、上部を円筒形状に形成されて超音波振動子20と連結され、超音波振動子20が発生させる微小振動の振幅を拡大させる超音波ホーン81と、基板2と対向するように超音波ホーン81の下端部に取り付けられ、超音波ホーン81より伝達される基板2の厚み方向の微小振動を、半田4に非接触で伝達する矩形の微小振動用振動板82を備えている。   As shown in FIG. 11A, the application unit 80 has a lower portion formed in a tapered shape such as a substantially conical shape or a substantially polygonal pyramid shape, and an upper portion formed in a cylindrical shape and connected to the ultrasonic transducer 20, The thickness of the ultrasonic horn 81 that expands the amplitude of minute vibrations generated by the ultrasonic transducer 20 and the thickness of the substrate 2 that is attached to the lower end of the ultrasonic horn 81 so as to face the substrate 2 and is transmitted from the ultrasonic horn 81. A rectangular micro-vibration diaphragm 82 that transmits micro vibrations in the direction to the solder 4 in a non-contact manner is provided.

微小振動用振動板82の下面の面積は、基板1の上面全体に微小振動を印加可能にするため、基板1の上面の面積よりも大きく形成されている。微小振動用振動板82の下面から基板2に装着される電子部品1までの距離Hは、例えば2mm〜5mmの範囲に設定されている。
以上のように本発明の第2実施形態にかかるリフロー装置は構成されている。
The area of the lower surface of the minute vibration diaphragm 82 is formed larger than the area of the upper surface of the substrate 1 so that minute vibrations can be applied to the entire upper surface of the substrate 1. A distance H from the lower surface of the minute vibration diaphragm 82 to the electronic component 1 mounted on the substrate 2 is set in a range of 2 mm to 5 mm, for example.
As described above, the reflow apparatus according to the second embodiment of the present invention is configured.

本発明の第2実施形態のリフロー装置によれば、超音波振動子20により発生された微小振動を、半田加熱部10内の半田4に対して基板2の厚み方向の微小振動として印加部80の微小振動用振動板82により、半田4の上方から非接触で半田4に印加するように構成したので、たとえ、パレット3が重い金属で形成され、そのパレット3にどのような種類の基板2が載置されたとしても、基板2の厚み方向の微小振動を半田4に確実に印加することができて、リフロー中の溶融半田4内で半田成分を均一に分散させることができる。   According to the reflow apparatus of the second embodiment of the present invention, the minute vibration generated by the ultrasonic transducer 20 is applied as the minute vibration in the thickness direction of the substrate 2 to the solder 4 in the solder heating section 10. In this case, the pallet 3 is made of a heavy metal, and any kind of the substrate 2 is formed on the pallet 3. Can be applied to the solder 4 with certainty in the thickness direction of the substrate 2 and the solder components can be uniformly dispersed in the molten solder 4 during reflow.

また、本発明の第2実施形態のリフロー装置によれば、半田4の上方から非接触で微小振動を半田4に印加するように構成したので、パレット3の振動板3aを振動させなくとも、微小振動を半田4に伝達することができ、本発明の第1実施形態のリフロー装置のように当接部材(吸着部材32,32)を設けてパレット3の保持枠3bの上面に当接させなくても、半田4に微小振動を効率良く印加することができる。   Further, according to the reflow apparatus of the second embodiment of the present invention, since the minute vibration is applied to the solder 4 from the upper side of the solder 4, the vibration plate 3a of the pallet 3 is not vibrated. Minute vibrations can be transmitted to the solder 4, and contact members (adsorption members 32, 32) are provided to contact the upper surface of the holding frame 3b of the pallet 3 as in the reflow device of the first embodiment of the present invention. Even if it is not, minute vibrations can be efficiently applied to the solder 4.

また、本発明の第2実施形態のリフロー装置によれば、基板2の厚み方向に微小振動を印加するため、基板2の上方に対して非接触で対向するように微小振動用振動板82を配置すればよいので、パレット3にその下方からの熱風供給装置72の熱風を直接的に供給することができて、半田4の加熱を効率良く行うことができ、生産効率を向上させることができる。   Further, according to the reflow apparatus of the second embodiment of the present invention, the minute vibration diaphragm 82 is disposed so as to face the upper side of the substrate 2 in a non-contact manner in order to apply the minute vibration in the thickness direction of the substrate 2. Since it should just arrange | position, the hot air of the hot air supply apparatus 72 from the downward direction can be directly supplied to the pallet 3, the solder 4 can be heated efficiently, and production efficiency can be improved. .

また、本発明の第1実施形態のリフロー装置では、印加ツール31bが振動板3aの下面に接触するため、印加ツール31bが摩耗する可能性があるが、本発明の第2実施形態のリフロー装置によれば、微小振動用振動板82により半田4の上方から非接触で微小振動を半田4に印加するように構成したので、上記可能性を無くすことができる。   Moreover, in the reflow apparatus of 1st Embodiment of this invention, since the application tool 31b contacts the lower surface of the diaphragm 3a, the application tool 31b may be worn out, but the reflow apparatus of 2nd Embodiment of this invention. According to the above configuration, since the minute vibration is applied to the solder 4 in a non-contact manner from above the solder 4 by the vibration plate 82 for minute vibration, the above-described possibility can be eliminated.

なお、本発明の第2実施形態のリフロー装置では、微小振動用振動板82を基板2と対向するように超音波ホーン81の下端部に取り付けて、半田4の上方から非接触で微小振動を印加するように構成したが、本発明はこれに限定されない。例えば、微小振動用振動板82を用いず、超音波ホーン81に代えて、図12A及び図12Bに示すように、基板1に対して直線状に微小振動を印加できるように、半田4と対向する側に大略直線状の先端面を有するように形成された超音波ホーン81−1により、半田4の上方から非接触で微小振動を半田4に印加するように構成してもよい。なお、図12A及び図12Bでは、超音波ホーン81−1は、基板搬送方向Xに平行に大略直線状の先端面を有するように図示したが、基板搬送方向Xに交差方向(例えば直交方向)に大略直線状の先端面を有するように構成されてもよい。このように構成されることで、例えば、直線状に並んでいる複数の電子部品1と基板2とを接合する半田4に、一括して微小振動を印加することができる。   In the reflow device according to the second embodiment of the present invention, the vibration plate 82 for minute vibration is attached to the lower end portion of the ultrasonic horn 81 so as to face the substrate 2, and minute vibration is generated from above the solder 4 without contact. Although configured to apply, the present invention is not limited to this. For example, instead of using the vibration plate 82 for minute vibration, instead of the ultrasonic horn 81, as shown in FIGS. 12A and 12B, the substrate 1 is opposed to the solder 4 so that minute vibration can be applied linearly. An ultrasonic horn 81-1 formed so as to have a substantially straight tip surface on the side to be soldered may be configured to apply minute vibrations to the solder 4 from above the solder 4 without contact. 12A and 12B, the ultrasonic horn 81-1 is illustrated as having a substantially straight tip surface parallel to the substrate transport direction X. However, the ultrasonic horn 81-1 intersects the substrate transport direction X (for example, an orthogonal direction). It may be configured to have a generally straight tip surface. By being configured in this way, for example, minute vibrations can be collectively applied to the solder 4 that joins the plurality of electronic components 1 and the substrate 2 arranged in a straight line.

また、例えば、微小振動用振動板82を用いず、超音波ホーン81に代えて、図13A及び図13Bに示すように、例えば半田4と対向する側が大略尖った形状で形成されている超音波ホーン81−2により、半田4の上方から非接触で微小振動を印加するように構成してもよい。
このように構成することにより、弱耐熱部品や後付け部品などの所望の電子部品1と基板2とを接合する半田4にのみ、部分的に微小振動を印加することが可能となり、隣接する他の電子部品には印加しないようにすることができる。よって、基板2全体に微小振動を印加する装置に比べて、微小振動発生装置及び微小振動印加装置を小型化することができる。
Further, for example, instead of using the ultrasonic vibration horn 81 without using the vibration plate 82 for fine vibration, as shown in FIGS. 13A and 13B, for example, an ultrasonic wave having a generally sharp shape on the side facing the solder 4 is formed. The horn 81-2 may be configured to apply minute vibrations from above the solder 4 without contact.
With this configuration, it is possible to apply a minute vibration only to the solder 4 that joins a desired electronic component 1 such as a weak heat-resistant component or a retrofitted component and the substrate 2, and other adjacent components. It is possible to prevent application to electronic components. Therefore, the minute vibration generator and the minute vibration application device can be downsized as compared with the device that applies the minute vibration to the entire substrate 2.

また、本発明の第2実施形態のリフロー装置では、微小振動印加装置を構成する印加部80を、半田加熱部10のリフローゾーン11b内に固定的に設けたが、本発明はこれには限定されない。例えば、本発明の第1実施形態で説明した前後移動装置50に連結されて、半田加熱部10内から半田加熱部10外へ移動しながら、搬送装置40により基板搬送方向Xに搬送されるパレット3上の基板2の半田4に非接触で微小振動を印加するように構成されてもよい。   In the reflow device according to the second embodiment of the present invention, the application unit 80 constituting the minute vibration application device is fixedly provided in the reflow zone 11b of the solder heating unit 10, but the present invention is not limited to this. Not. For example, a pallet that is connected to the back-and-forth moving device 50 described in the first embodiment of the present invention and is transported in the substrate transport direction X by the transport device 40 while moving from the solder heating unit 10 to the outside of the solder heating unit 10. 3 may be configured to apply a minute vibration to the solder 4 of the substrate 2 on the substrate 3 in a non-contact manner.

以上、本発明の実施形態について説明してきたが、本発明は上記各実施形態に限定されるものではなく、様々な変形が可能である。
例えば、上記各実施形態においては、基板2の上面にのみ電子部品1が装着される片面基板について説明したが、本発明はこれに限定されない。例えば、基板2の下面に電子部品1−1が実装状態で半田付けされている両面基板2−1においても、本発明は適用することもできる。この場合、例えば、図14に示すように、パレット3の振動板3a及び粘着シート3cの夫々の中央部に、基板2の下面の電子部品1−1が接触しないとともに両面基板2−1の周囲を保持可能な開口を設けた振動板3a−1及び粘着シート3c−1を有するパレット3−1を用いることにより、上記基板2と同様にして、両面基板2−1の上面の電子部品1を半田付けすることが可能である。なおこの場合、両面基板2−1の下面と電子部品1−1とを接合する半田4−1は、両面基板2−1の上面と電子部品1とを接合する半田4よりも高い融点を有するものを用い、リフローゾーン11bの温度雰囲気は、半田4の融点よりも高く、半田4−1の融点よりも低いものとする。またこの場合、印加ツール31bの待機位置31A及び印加可能位置31Bは、振動板3aの中央部に開口を設けたため、図14に示すように、保持枠3bの近傍側に位置することとなる。
As mentioned above, although embodiment of this invention has been described, this invention is not limited to said each embodiment, A various deformation | transformation is possible.
For example, in each of the above embodiments, a single-sided substrate in which the electronic component 1 is mounted only on the upper surface of the substrate 2 has been described, but the present invention is not limited to this. For example, the present invention can also be applied to a double-sided board 2-1 in which the electronic component 1-1 is soldered to the lower surface of the board 2 in a mounted state. In this case, for example, as shown in FIG. 14, the electronic component 1-1 on the lower surface of the substrate 2 is not in contact with the central portions of the diaphragm 3a and the adhesive sheet 3c of the pallet 3, and the periphery of the double-sided substrate 2-1. The electronic component 1 on the upper surface of the double-sided substrate 2-1 can be obtained in the same manner as the substrate 2 by using the pallet 3-1 having the diaphragm 3a-1 and the adhesive sheet 3c-1 provided with openings capable of holding the substrate. Soldering is possible. In this case, the solder 4-1 that joins the lower surface of the double-sided substrate 2-1 and the electronic component 1-1 has a higher melting point than the solder 4 that joins the upper surface of the double-sided substrate 2-1 and the electronic component 1. The temperature atmosphere of the reflow zone 11b is higher than the melting point of the solder 4 and lower than the melting point of the solder 4-1. In this case, the standby position 31A and the applicable position 31B of the application tool 31b are located near the holding frame 3b as shown in FIG. 14 because an opening is provided in the center of the diaphragm 3a.

また、上記各実施形態のうちの任意の実施形態を適宜組み合わせることにより、それぞれの有する効果を奏するようにすることができる。   In addition, by appropriately combining arbitrary embodiments of the above-described embodiments, the effects possessed by them can be produced.

本発明のリフロー装置及び方法は、重い金属パレットに被装着材が載置されていても、当該金属パレットに均一に振動を与えて、リフロー中の溶融半田内で半田成分を均一に分散させることができるので、被装着材に装着物を超音波振動を用いて電子部品を半田付けするリフロー装置及び方法に有用である。   The reflow apparatus and method of the present invention uniformly disperse the solder components in the molten solder during reflow by uniformly applying vibration to the metal pallet even when the mounting material is placed on a heavy metal pallet. Therefore, the present invention is useful for a reflow apparatus and method for soldering an electronic component to an object to be mounted using ultrasonic vibration.

本発明の第1実施形態にかかるリフロー装置を上面側から見た概略平面図The schematic plan view which looked at the reflow apparatus concerning 1st Embodiment of this invention from the upper surface side. 本発明の第1実施形態にかかるリフロー装置を、基板搬送方向と直交する横方向から見た概略断面図1 is a schematic cross-sectional view of a reflow apparatus according to a first embodiment of the present invention, viewed from a lateral direction orthogonal to a substrate transport direction. 本発明の第1実施形態にかかるリフロー装置のパレットを示す斜視図The perspective view which shows the pallet of the reflow apparatus concerning 1st Embodiment of this invention. 本発明の第1実施形態にかかるリフロー装置のパレットに電子部品を装着した基板を載置したときの断面図Sectional drawing when the board | substrate which mounted the electronic component was mounted in the pallet of the reflow apparatus concerning 1st Embodiment of this invention. 本発明の第1実施形態にかかるリフロー装置の、基板を載置したパレットに微小振動印加装置が備える印加ツールが微小振動を印加する状態を示す模式説明図The schematic explanatory drawing which shows the state which the application tool with which a minute vibration application apparatus is equipped with on the pallet which mounted the board | substrate mounted the minute vibration of the reflow apparatus concerning 1st Embodiment of this invention. 本発明の第1実施形態にかかるリフロー装置の、微小振動印加装置が備える印加部によりパレットに印加された微小振動の伝わり方を示す模式説明図The schematic explanatory drawing which shows how to transmit the micro vibration applied to the pallet by the application part with which the micro vibration application apparatus is provided of the reflow apparatus concerning 1st Embodiment of this invention. 本発明の第1実施形態にかかるリフロー装置のパレットと微小振動印加装置が備える印加ツールを示す一部拡大断面図The partially expanded sectional view which shows the application tool with which the pallet of the reflow apparatus concerning 1st Embodiment of this invention and a micro vibration application apparatus are provided. 本発明の第1実施形態にかかるリフロー装置の、微小振動発生装置が発生させる微小振動の周波数及び半田に印加する微小振動の振幅の好ましい範囲を示すグラフThe graph which shows the preferable range of the frequency of the minute vibration which the minute vibration generator produces | generates, and the amplitude of the minute vibration applied to solder of the reflow apparatus concerning 1st Embodiment of this invention. 本発明の第1実施形態にかかるリフロー装置の動作を示すフローチャートThe flowchart which shows operation | movement of the reflow apparatus concerning 1st Embodiment of this invention. 本発明の第1実施形態にかかるリフロー装置の変形例を示す断面図Sectional drawing which shows the modification of the reflow apparatus concerning 1st Embodiment of this invention. 本発明の第1実施形態にかかるリフロー装置の他の変形例を示す断面図Sectional drawing which shows the other modification of the reflow apparatus concerning 1st Embodiment of this invention. 本発明の第2実施形態にかかるリフロー装置の一部拡大断面図The partially expanded sectional view of the reflow apparatus concerning 2nd Embodiment of this invention. 本発明の第2実施形態にかかるリフロー装置の、半田に印加される微小振動を説明する概略図Schematic explaining the minute vibration applied to solder of the reflow apparatus concerning 2nd Embodiment of this invention. 本発明の第2実施形態にかかるリフロー装置の変形例を示す断面図Sectional drawing which shows the modification of the reflow apparatus concerning 2nd Embodiment of this invention. 本発明の第2実施形態にかかるリフロー装置の変形例を示す概略斜視図The schematic perspective view which shows the modification of the reflow apparatus concerning 2nd Embodiment of this invention. 本発明の第2実施形態にかかるリフロー装置の他の変形例を示す断面図Sectional drawing which shows the other modification of the reflow apparatus concerning 2nd Embodiment of this invention. 本発明の第2実施形態にかかるリフロー装置の他の変形例を示す概略斜視図The schematic perspective view which shows the other modification of the reflow apparatus concerning 2nd Embodiment of this invention. 本発明のリフロー装置の変形例のパレットを示す概略断面図The schematic sectional drawing which shows the pallet of the modification of the reflow apparatus of this invention 従来例のリフロー装置に含まれる微小振動印加部を示す概略図Schematic showing a minute vibration application unit included in a conventional reflow apparatus

符号の説明Explanation of symbols

1 電子部品
2 基板
3 パレット
3a 振動板
3b 保持枠
3c 粘着シート
3d スポット溶接部
4 半田
10 半田加熱部
11 半田加熱室
11a 半田予熱ゾーン
11b リフローゾーン
12 仕切板
13 エッジ検出部
20 超音波振動子
21 放熱フィン
22 冷却装置
23 断熱壁
30 微小振動印加装置
31 印加部
31a 超音波ホーン
31b 印加ツール
32 吸着部材
32a 吸着パット
33 上下移動装置
34 吸引装置
40 基板搬送装置
41 搬入用レール
42 半田加熱部搬送用レール
43 搬出用レール
50 前後移動装置
60 制御装置
DESCRIPTION OF SYMBOLS 1 Electronic component 2 Board | substrate 3 Pallet 3a Vibration board 3b Holding frame 3c Adhesive sheet 3d Spot welding part 4 Solder 10 Solder heating part 11 Solder heating chamber 11a Solder preheating zone 11b Reflow zone 12 Partition plate 13 Edge detection part 20 Ultrasonic vibrator 21 Radiation fin 22 Cooling device 23 Heat insulation wall 30 Micro vibration application device 31 Application unit 31a Ultrasonic horn 31b Application tool 32 Adsorption member 32a Adsorption pad 33 Vertical movement device 34 Suction device 40 Substrate conveyance device 41 Loading rail 42 Solder heating unit conveyance Rail 43 Unloading rail 50 Forward / backward moving device 60 Control device

Claims (6)

装着物が半田にて接合される被装着材を搬入して半田を溶融してリフローを行う半田加熱部と、
上記半田加熱部内に搬入された上記被装着材と上記装着物とを接合する上記半田に対して印加可能な微小振動を発生させる微小振動発生装置と、
上記微小振動発生装置により発生された上記微小振動を、上記半田加熱部内の上記半田に対して上記被装着材の厚み方向の微小振動として印加する微小振動印加装置と、
を備えるリフロー装置であって、
上記微小振動印加装置は、上記微小振動発生装置に連結され、かつ、上記半田加熱部に搬入されかつ上記被装着材が載置される振動板と上記振動板の周囲を保持する保持枠とを有する被装着材支持部材の上記振動板に対して、上記被装着材の厚み方向の微小振動を上記半田に印加する印加部を有する、リフロー装置。
A solder heating unit that carries in a material to be attached to which the attachment is to be joined by solder, melts the solder, and performs reflow;
A micro-vibration generating device that generates micro-vibration that can be applied to the solder that joins the mounted material carried into the solder heating unit and the mounted object;
A micro-vibration application device that applies the micro-vibration generated by the micro-vibration generator as micro-vibration in the thickness direction of the mounted material to the solder in the solder heating unit;
A reflow apparatus comprising:
The micro-vibration applying device includes a vibration plate connected to the micro-vibration generation device, carried into the solder heating unit, and on which the mounted material is placed, and a holding frame that holds the periphery of the vibration plate. with respect to the diaphragm of the mounting member supporting member, having an applied portion to be applied to solder the minute vibration in the thickness direction of the object to be mounted material, reflow apparatus.
上記微小振動印加装置は、上記被装着材支持部材の上記保持枠の上面と当接可能な当接部材をさらに有して、上記印加部が上記振動板に対して上記被装着材の厚み方向の微小振動を上記半田に印加するとき、上記当接部材が上記被装着材支持部材の上記保持枠の上面と当接するように構成されている、請求項に記載のリフロー装置。 The fine vibration applying device includes the mating attachment member with the top surface capable of contacting the contact member of the holding frame of the support member further, the thickness of the object to be mounted material the application unit is against the above vibrating plate The reflow device according to claim 1 , wherein the contact member is configured to contact an upper surface of the holding frame of the mounted material support member when a minute vibration in a direction is applied to the solder. 上記微小振動印加装置の上記印加部は、上記微小振動発生装置に連結され、かつ、上記被装着材支持部材の上記振動板上に載置された上記被装着材と上記装着物とを接合する上記半田に非接触で、上記被装着材の厚み方向の微小振動を伝達する微小振動用振動板を有する、請求項に記載のリフロー装置。 The application unit of the minute vibration applying device is connected to the minute vibration generating device and joins the mounted material and the mounted object placed on the vibration plate of the mounted material supporting member. The reflow apparatus according to claim 1 , further comprising a vibration plate for minute vibration that transmits minute vibration in a thickness direction of the mounted material in a non-contact manner with the solder. 上記当接部材及び上記印加部を上記半田加熱部内の印加位置から上記半田加熱部外の退避位置との間で移動可能とする移動装置をさらに備え、
上記移動装置は、上記印加位置で、上記印加部が上記振動板に対して上記被装着材の厚み方向の微小振動を上記半田に印加するとともに、上記当接部材が上記被装着材支持部材の上記保持枠に当接した状態で、上記当接部材及び上記印加部を上記半田加熱部内の上記印加位置から上記半田加熱部外の上記退避位置に移動させる、請求項に記載のリフロー装置。
A moving device that allows the contact member and the application unit to move between an application position in the solder heating unit and a retreat position outside the solder heating unit;
The mobile device is above application position, the application part is against the above vibrating plate is applied with a small vibration in the thickness direction of the object to be mounted material on the solder above, the contact member is the object mounting member supporting member The reflow device according to claim 2 , wherein the contact member and the application unit are moved from the application position in the solder heating unit to the retracted position outside the solder heating unit while being in contact with the holding frame. .
装着物が半田にて接合される被装着材を半田加熱部内に搬入して半田を溶融してリフローを行うとともに、微小振動発生装置で発生した微小振動を、上記半田加熱部内に搬入された上記被装着材と上記装着物とを接合する上記半田に対して、上記被装着材の厚み方向の微小振動として微小振動印加装置により印加し、
上記微小振動印加装置により上記被装着材の厚み方向の微小振動が上記半田に印加されつつ上記半田加熱部内から上記被装着材を搬出して上記溶融半田を冷却するようにした、リフロー方法であって、
上記被装着材を上記半田加熱部内に搬入するとき、振動板と上記振動板の周囲を保持する保持枠とを有する被装着材支持部材の上記振動板に上記被装着材を載置して上記半田加熱部内に搬入し、
上記微小振動印加装置により上記微小振動を印加するとき、上記半田加熱部内で、上記微小振動発生装置に連結された上記微小振動印加装置の印加部を上記振動板の下面に接触させて、上記被装着材の厚み方向の微小振動を上記半田に印加するようにした、リフロー方法。
The material to be attached to which the attachment is to be joined by solder is carried into the solder heating unit, the solder is melted and reflowed, and the micro vibration generated by the micro vibration generator is carried into the solder heating unit. Applied to the solder for joining the mounted material and the mounted object by a minute vibration application device as a minute vibration in the thickness direction of the mounted material,
A reflow method in which a minute vibration in a thickness direction of the attached material is applied to the solder by the minute vibration application device, and the attached material is taken out of the solder heating unit to cool the molten solder. And
When the mounted material is carried into the solder heating unit, the mounted material is placed on the vibration plate of the mounted material support member having a diaphragm and a holding frame that holds the periphery of the diaphragm. Bring it into the solder heating part,
When the minute vibration is applied by the minute vibration applying device, the application portion of the minute vibration applying device connected to the minute vibration generating device is brought into contact with the lower surface of the diaphragm in the solder heating unit, and the minute vibration in the thickness direction of the mounting member and adapted to apply the solder above reflow process.
装着物が半田にて接合される被装着材を半田加熱部内に搬入して半田を溶融してリフローを行うとともに、微小振動発生装置で発生した微小振動を、上記半田加熱部内に搬入された上記被装着材と上記装着物とを接合する上記半田に対して、上記被装着材の厚み方向の微小振動として微小振動印加装置により印加し、
上記微小振動印加装置により上記被装着材の厚み方向の微小振動が上記半田に印加されつつ上記半田加熱部内から上記被装着材を搬出して上記溶融半田を冷却するようにした、リフロー方法であって、
上記被装着材を上記半田加熱部内に搬入するとき、振動板と上記振動板の周囲を保持する保持枠とを有する被装着材支持部材の上記振動板に上記被装着材を載置して上記半田加熱部内に搬入し、
上記微小振動印加装置により上記微小振動を印加するとき、上記半田加熱部内で、上記微小振動発生装置に連結された上記微小振動印加装置の微小振動用振動板により、上記被装着材支持部材の上記振動板上に載置された上記被装着材と上記装着物とを接合する上記半田に非接触で、被装着材の厚み方向の微小振動を伝達するようにしたリフロー方法。
The material to be attached to which the attachment is to be joined by solder is carried into the solder heating unit, the solder is melted and reflowed, and the micro vibration generated by the micro vibration generator is carried into the solder heating unit. Applied to the solder for joining the mounted material and the mounted object by a minute vibration application device as a minute vibration in the thickness direction of the mounted material,
A reflow method in which a minute vibration in a thickness direction of the attached material is applied to the solder by the minute vibration application device, and the attached material is taken out of the solder heating unit to cool the molten solder. And
When the mounted material is carried into the solder heating unit, the mounted material is placed on the vibration plate of the mounted material support member having a diaphragm and a holding frame that holds the periphery of the diaphragm. Bring it into the solder heating part,
When the minute vibration is applied by the minute vibration applying device, the vibration supporting plate of the minute vibration applying device connected to the minute vibration generating device is connected to the minute vibration generating device in the solder heating unit. It said without contact with the solder, the reflow method so as to transmit the minute vibration in the thickness direction of the mounting member for bonding the placed thereon above the mounting member and the mounting thereof to the vibration plate.
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