JP4690171B2 - Method for producing aluminum electrode foil for electrolytic capacitor - Google Patents
Method for producing aluminum electrode foil for electrolytic capacitor Download PDFInfo
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- JP4690171B2 JP4690171B2 JP2005306841A JP2005306841A JP4690171B2 JP 4690171 B2 JP4690171 B2 JP 4690171B2 JP 2005306841 A JP2005306841 A JP 2005306841A JP 2005306841 A JP2005306841 A JP 2005306841A JP 4690171 B2 JP4690171 B2 JP 4690171B2
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- 239000011888 foil Substances 0.000 title claims description 31
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims description 30
- 229910052782 aluminium Inorganic materials 0.000 title claims description 30
- 239000003990 capacitor Substances 0.000 title claims description 20
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 238000005530 etching Methods 0.000 claims description 57
- 238000000866 electrolytic etching Methods 0.000 claims description 38
- 238000000034 method Methods 0.000 claims description 22
- 238000011282 treatment Methods 0.000 claims description 20
- -1 chlorine ions Chemical class 0.000 claims description 18
- 150000002500 ions Chemical class 0.000 claims description 14
- 239000000460 chlorine Substances 0.000 claims description 8
- 229910052801 chlorine Inorganic materials 0.000 claims description 8
- 229910002651 NO3 Inorganic materials 0.000 claims description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 5
- 239000007788 liquid Substances 0.000 claims description 2
- 239000000243 solution Substances 0.000 description 16
- 238000004090 dissolution Methods 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 9
- 230000003247 decreasing effect Effects 0.000 description 9
- 239000000126 substance Substances 0.000 description 8
- 238000005868 electrolysis reaction Methods 0.000 description 5
- 230000009257 reactivity Effects 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000003487 electrochemical reaction Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Description
本発明は、電解コンデンサ用アルミニウム電極箔の製造方法に関するものである。さらに詳しくは、中高圧用の電解コンデンサ用アルミニウム電極箔に関するものである。 The present invention relates to a method for producing an aluminum electrode foil for electrolytic capacitors. More specifically, the present invention relates to an aluminum electrode foil for medium and high voltage electrolytic capacitors.
電解コンデンサに用いられるアルミニウム箔は、その有効表面積を拡大して静電容量を上げるために、電解エッチング（電気化学エッチング）や無電解エッチング（化学エッチング）、またはそれらの両方が行われる。このようなアルミニウム箔に対する表面積拡大の要求は、アルミニウムの資源有効利用や製品の更なる小形化を行っていくのに重要であり、その要求はますます強まっている。
電解エッチングは、反応を電気によって高度に制御しやすいという利点からエッチング箔の生産において現在主流に使われている手法であり、中高圧用の電解コンデンサ用アルミニウム電極箔を製造するためのエッチングは、前処理工程と、電気化学反応によりトンネル状のエッチングピットを形成、拡大させるエッチング工程とに大別される。そのうち、エッチング工程においては、表面積をより効率的に拡張することを目的に電解エッチング処理を多段に分けて行うことが提案されている（例えば、特許文献１、２、非特許文献１参照）。
Aluminum foil used for electrolytic capacitors is subjected to electrolytic etching (electrochemical etching), electroless etching (chemical etching), or both in order to increase the capacitance by increasing the effective surface area. Such a demand for increasing the surface area of aluminum foil is important for effective utilization of aluminum resources and further miniaturization of products, and the demand is increasing.
Electrolytic etching is a technique that is currently used in the production of etching foils because of the advantage that the reaction is highly easily controlled by electricity. Etching to produce aluminum electrode foils for medium and high voltage electrolytic capacitors is It is roughly divided into a pretreatment process and an etching process for forming and expanding tunnel-like etching pits by electrochemical reaction. Among them, in the etching process, it has been proposed to perform the electrolytic etching process in multiple stages for the purpose of more efficiently expanding the surface area (see, for example, Patent Documents 1 and 2 and Non-Patent Document 1).
このような多段のエッチング処理を行う場合、一般的には、初段の電解エッチング処理ではアルミニウム箔に多数のエッチングピットを形成するように電解条件が設定され、第二段目以降の電解エッチング処理ではエッチングピットの孔径を効率よく拡大されるように電解条件が設定される。
しかしながら、上記のエッチング方法では、電解エッチング処理を多段に行うといっても、初段の電解エッチング処理でエッチングピットを発生させた後、第二段目以降の電解エッチング処理を同一の電解条件（同一の液組成と同一の電流密度）で繰り返し行うだけであるため、箔表面付近で化学反応に起因する過度の溶解が発生してしまい、エッチング後の仕上がり厚さが薄くなるとともに、その分、エッチングピット長が短くなり、十分に高い静電容量を得ることができないという問題点がある。 However, in the above etching method, even if the electrolytic etching process is performed in multiple stages, after the etching pit is generated in the first stage electrolytic etching process, the electrolytic etching process in the second stage and thereafter is performed under the same electrolytic conditions (the same Therefore, excessive dissolution due to chemical reaction occurs near the foil surface, resulting in a reduced thickness after etching and a corresponding amount of etching. There is a problem that the pit length is shortened and a sufficiently high capacitance cannot be obtained.
以上の問題点に鑑みて、本発明の課題は、エッチング条件を適正化することにより、表面溶解を抑えながらエッチングピットの孔径を拡大して静電容量を向上することのできる電解コンデンサ用電極箔の製造方法を提供することにある。 In view of the above problems, an object of the present invention is to provide an electrode foil for an electrolytic capacitor that can increase the hole diameter of an etching pit and improve the capacitance while suppressing surface dissolution by optimizing etching conditions. It is in providing the manufacturing method of.
上記課題を解決するために、本発明では、アルミニウム箔に対して電解エッチングを多段に行う電解コンデンサ用アルミニウム電極箔の製造方法において、電解条件を変えて電解エッチング処理を三段以上行うとともに、第二段目以降の電解エッチング処理では塩素イオン、硝酸イオン、リン酸イオン、シュウ酸イオンのうち少なくとも１種以上のイオン種を含むエッチング液を用い、かつ、第二段目から最終段に向けて前記エッチング液中のイオン種の濃度を低下させ、第二段目から最終段に向けて電流密度を高くしていき、第二段目から最終段の電解エッチング処理では、前記エッチング液におけるイオン種の濃度を０．１０〜１．００ｍｏｌ／Ｌの範囲とするとともに、電流密度を１０〜１００ｍＡ／ｃｍ 2 の範囲とすることを特徴とする。 In order to solve the above problems, the present invention provides a method for producing an aluminum electrode foil for an electrolytic capacitor in which electrolytic etching is performed in multiple stages on an aluminum foil. In the second and subsequent electrolytic etching treatments, an etching solution containing at least one ion species of chlorine ions, nitrate ions, phosphate ions, and oxalate ions is used, and from the second stage to the final stage. said ion species concentration of the etching solution to lower a Ki have higher current density toward the final stage from the second stage, the electrolytic etching of the final stage from the second stage, the ion species in the etchant the concentration with the range of 0.10~1.00mol / L, and characterized by a range of current density of 10 to 100 / cm 2 That.
本発明では、第二段目以降の電解エッチング処理ではイオン種の濃度が低くなるので、化学反応性が徐々に低下し、表面付近の化学溶解が減少する一方、第二段目以降の電解エッチング処理では電流密度を徐々に高くしたため、孔径拡大が進行する。それ故、本発明によれば、表面溶解を抑えながらエッチングピットの孔径を拡大することができるので、静電容量を向上させることができる。 In the present invention, since the concentration of ionic species is low in the electrolytic etching treatment after the second stage, the chemical reactivity is gradually reduced, and the chemical dissolution near the surface is reduced, while the electrolytic etching after the second stage is performed. In the treatment, the current density is gradually increased, so that the pore diameter increases. Therefore, according to the present invention, since the hole diameter of the etching pit can be enlarged while suppressing surface dissolution, the capacitance can be improved.
また、第二段目から最終段の電解エッチング処理では、第二段目から最終段に向けて電流密度を高くしていく比率を第二段目から最終段に向けて前記エッチング液中のイオン種の濃度を低下させる比率の逆数と等しくすることが好ましい。
このように構成すると、化学反応性が徐々に低下する分、電解によるエッチングが進行しやすくなるので、表面溶解を抑えながらエッチングピットの孔径を効率よく拡大することができ、静電容量をより向上させることができる。
In addition, in the electrolytic etching treatment from the second stage to the final stage, the ratio of increasing the current density from the second stage to the final stage is changed to the ions in the etching solution from the second stage to the final stage. Preferably it is equal to the reciprocal of the ratio that reduces the seed concentration.
When configured in this manner, the chemical reactivity is gradually reduced, so that the etching by electrolysis progresses easily. Therefore, the hole diameter of the etching pit can be efficiently expanded while suppressing the surface dissolution, and the capacitance is further improved. Can be made.
本発明では、第二段目以降の電解エッチング処理ではイオン種の濃度が低くなるので、化学反応性が徐々に低下し、表面付近の化学溶解が減少する一方、第二段目以降の電解エッチング処理では電流密度を徐々に高くしたため、孔径拡大が進行する。それ故、本発明によれば、表面溶解を抑えながらエッチングピットの孔径を拡大することができるので、エッチング後の仕上がり厚さが厚くなり、その分、エッチングピット長が長くなり、静電容量を向上させることができる。 In the present invention, since the concentration of ionic species is low in the electrolytic etching treatment after the second stage, the chemical reactivity is gradually reduced, and the chemical dissolution near the surface is reduced, while the electrolytic etching after the second stage is performed. In the treatment, the current density is gradually increased, so that the pore diameter increases. Therefore, according to the present invention, the hole diameter of the etching pit can be enlarged while suppressing surface dissolution, so that the finished thickness after etching becomes thicker, and the etching pit length becomes longer, and the capacitance is reduced. Can be improved.
本発明を適用した電解コンデンサ用アルミニウム電極箔の製造方法は、中高圧用の電解コンデンサ用アルミニウム電極箔に適した方法であり、アルミニウム箔に対して電解エッチング処理を多段に行ってエッチング箔を得る。その際、電解条件を変えて電解エッチング処理を三段以上行うとともに、第二段目以降の電解エッチング処理では塩素イオン、硝酸イオン、リン酸イオン、シュウ酸イオンのうち少なくとも１種以上のイオン種を含むエッチング液を用い、かつ、第二段目から最終段に向けてエッチング液中のイオン種の濃度を低下させ、第二段目から最終段に向けて電流密度を高くしていく。
すなわち、初段の電解エッチング処理ではアルミニウム箔に多数のエッチングピットを形成するように電解条件が設定され、第二段目以降の電解エッチング処理ではエッチングピットの孔径を効率よく拡大されるように電解条件が設定される。しかも、第二段目以降の電解エッチング処理では、表面付近での溶解を抑えながら、エッチングピットの孔径を効率よく拡大するように設定されている。
The method for producing an aluminum electrode foil for electrolytic capacitors to which the present invention is applied is a method suitable for an aluminum electrode foil for electrolytic capacitors for medium and high pressures, and an etching foil is obtained by performing electrolytic etching treatment on the aluminum foil in multiple stages. . At that time, the electrolytic etching process is performed in three or more stages while changing the electrolytic conditions, and in the second and subsequent electrolytic etching processes, at least one ion species of chlorine ions, nitrate ions, phosphate ions, and oxalate ions is used. The concentration of ionic species in the etching solution is decreased from the second stage toward the final stage, and the current density is increased from the second stage toward the final stage.
That is, the electrolytic conditions are set so that a large number of etching pits are formed on the aluminum foil in the first stage electrolytic etching treatment, and the electrolytic pit conditions are effectively expanded in the second and subsequent electrolytic etching processes. Is set. In addition, in the electrolytic etching treatment in the second and subsequent stages, the hole diameter of the etching pit is set to be efficiently expanded while suppressing dissolution near the surface.
ここで、第二段目から最終段の電解エッチング処理では、エッチング液におけるイオン種の濃度を０．１０〜１．００ｍｏｌ／Ｌの範囲とするとともに、電流密度を１０〜１００ｍＡ／ｃｍ2の範囲とし、かつ、第二段目から最終段に向けて電流密度を高くしていく比率を第二段目から最終段に向けてエッチング液中のイオン種の濃度を低下させる比率の逆数と等しくすることが好ましい。 Here, in the electrolytic etching treatment from the second stage to the final stage, the concentration of ionic species in the etching solution is in the range of 0.10 to 1.00 mol / L, and the current density is in the range of 10 to 100 mA / cm 2 . In addition, the ratio of increasing the current density from the second stage to the final stage is made equal to the reciprocal of the ratio of decreasing the concentration of ionic species in the etching solution from the second stage to the final stage. It is preferable.
本発明では、第二段目以降の電解エッチング処理ではイオン種の濃度が低くなるので、化学反応性が徐々に低下し、表面付近の化学溶解が減少する一方、第二段目以降の電解エッチング処理では電流密度を徐々に高くしたため、孔径拡大が進行する。それ故、本発明によれば、表面溶解を抑えながらエッチングピットの孔径を拡大することができるので、静電容量を向上させることができる。 In the present invention, since the concentration of ionic species is low in the electrolytic etching treatment after the second stage, the chemical reactivity is gradually reduced, and the chemical dissolution near the surface is reduced, while the electrolytic etching after the second stage is performed. In the treatment, the current density is gradually increased, so that the pore diameter increases. Therefore, according to the present invention, since the hole diameter of the etching pit can be enlarged while suppressing surface dissolution, the capacitance can be improved.
以下、実施例に基づいて、本発明をより詳細に説明する。以下に説明する製造条件はいずれも、中高圧用の電解コンデンサ用アルミニウム電極箔に適した方法である。 Hereinafter, based on an Example, this invention is demonstrated in detail. The manufacturing conditions described below are all suitable methods for medium- and high-voltage aluminum electrode foils for electrolytic capacitors.
本実施例では、まず、アルミニウム純度９９．９９％、厚さ１１０μｍ、結晶方位（１００）の表面占有率９８％の高純度アルミニウム原箔を準備する。次に、アルミニウム箔を、前処理として、３０℃の５％水酸化ナトリウム水溶液で３０秒間洗浄した後、水洗浄する。 In this example, first, a high-purity aluminum raw foil having an aluminum purity of 99.99%, a thickness of 110 μm, and a surface occupancy of 98% in a crystal orientation (100) is prepared. Next, as a pretreatment, the aluminum foil is washed with a 5% aqueous sodium hydroxide solution at 30 ° C. for 30 seconds and then washed with water.
次に、電解条件を変えて電解エッチング処理を三段以上行う。これらの電解エッチング処理のうち、いずれの実施例においても、第一段目の電解エッチング処理の条件については、液温８０℃、硫酸４．０ｍｏｌ／Ｌ、塩化アルミニウム０．５０ｍｏｌ／Ｌのエッチング液中で、電流密度１５０ｍＡ／ｃｍ2、電気量２０Ｃ／ｃｍ2の電解条件とする。このような条件は、アルミニウム箔に多数のエッチングピットを形成するように設定されたものである。 Next, electrolytic etching is performed in three or more stages while changing the electrolytic conditions. Among these electrolytic etching treatments, in any of the examples, the conditions for the first-stage electrolytic etching treatment are as follows: an etching solution having a liquid temperature of 80 ° C., sulfuric acid 4.0 mol / L, and aluminum chloride 0.50 mol / L. In particular, the electrolysis conditions were a current density of 150 mA / cm 2 and an electric quantity of 20 C / cm 2 . Such conditions are set so as to form a large number of etching pits in the aluminum foil.
そして、第二段目以降の電解エッチング処理では、各実施例１〜３０、従来例、および比較例１〜２４の電解エッチング条件を表１、２に示すように設定する。すなわち、実施例１〜３０では、第二段目から最終段に向けてエッチング液中の前記イオン種の濃度を低下させ、第二段目から最終段に向けて電流密度を高くしてある。
また、第二段目から最終段の電解エッチング処理では、エッチング液におけるイオン種の濃度を０．１０〜１．００ｍｏｌ／Ｌの範囲とし、電流密度を１０〜１００ｍＡ／ｃｍ2の範囲としてある。
さらに、第二段目から最終段に向けて電流密度を高くしていく比率を第二段目から最終段に向けて前記エッチング液中のイオン種の濃度を低下させる比率の逆数と等しくしてある。例えば、実施例１〜５では、第二段目から第三段目にかけて、電流密度が２．０倍になっている一方、塩素イオンの濃度は０．５倍になっている。また、実施例６〜９では、第二段目から第三段目にかけて、電流密度が１．３３倍になっている一方、塩素イオンの濃度は０．７５倍になっている。
なお、いずれの例でも、第二段目から最後段の電解エッチング処理における総電気量は２５Ｃ／ｃｍ2となる電解時間である。
In the second and subsequent electrolytic etching processes, the electrolytic etching conditions of Examples 1 to 30, the conventional example, and Comparative Examples 1 to 24 are set as shown in Tables 1 and 2. That is, in Examples 1 to 30, the concentration of the ion species in the etching solution is decreased from the second stage to the final stage, and the current density is increased from the second stage to the final stage.
In the second to final electrolytic etching treatment, the concentration of ion species in the etching solution is in the range of 0.10 to 1.00 mol / L, and the current density is in the range of 10 to 100 mA / cm 2 .
Further, the ratio of increasing the current density from the second stage to the final stage is made equal to the reciprocal of the ratio of decreasing the concentration of ionic species in the etching solution from the second stage to the final stage. is there. For example, in Examples 1 to 5, while the current density is 2.0 times from the second stage to the third stage, the concentration of chlorine ions is 0.5 times. Moreover, in Examples 6-9, while the current density is 1.33 times from the second stage to the third stage, the concentration of chlorine ions is 0.75 times.
In any example, the total amount of electricity in the electrolytic etching process from the second stage to the last stage is an electrolysis time of 25 C / cm 2 .
なお、今回の評価では、比較のため、従来例に係る条件、および比較例１〜２４に係る条件でも電解コンデンサ用アルミニウムエッチング箔を製造した。かかる従来例および比較例に係る条件は、表１、２に示すとおりである。
ここで、比較例１〜１４は、第二段目から最終段に向けて電流密度を高くしていく比率を第二段目から最終段に向けて前記エッチング液中のイオン種の濃度を低下させる比率の逆数と等しくしてあるが、第二段目から最終段のいずれかにおいて、イオン種の濃度が０．１０〜１．００ｍｏｌ／Ｌの範囲を外れる場合、電流密度が１０〜１００ｍＡ／ｃｍ２の範囲を外れる場合のいずれかまたは両者について、比較したものである。
また、比較例１５〜２２は、第二段目から最終段に向けて、イオン種の濃度および電流密度がともに低下する場合、比較例２３、２４は第二段目から最終段に向けてイオン種の濃度は低下しているが、電流密度は微増するか、または第三段でピークになる場合について、比較したものである。
In addition, in this evaluation, the aluminum etching foil for electrolytic capacitors was manufactured also for the conditions which concern on the conditions which concern on a prior art example, and the conditions which concern on Comparative Examples 1-24 for a comparison. Conditions according to the conventional example and the comparative example are as shown in Tables 1 and 2.
Here, in Comparative Examples 1 to 14, the ratio of increasing the current density from the second stage to the final stage is decreased from the second stage to the final stage, and the concentration of ionic species in the etching solution is decreased. Is equal to the reciprocal of the ratio to be applied, but in any of the second to final stages, if the concentration of the ion species is outside the range of 0.10 to 1.00 mol / L, the current density is 10 to 100 mA / The comparison is made for either or both of cases out of the cm 2 range.
In Comparative Examples 15 to 22, when both the concentration of ion species and the current density decrease from the second stage toward the final stage, Comparative Examples 23 and 24 indicate ions from the second stage toward the final stage. Although the concentration of the seed is decreasing, the current density is slightly increased, or the case where it peaks at the third stage is compared.
このようにして得た電解コンデンサ用アルミニウムエッチング箔について、温度が６０℃で濃度が０．７５ｍｏｌ／Ｌの硝酸アルミニウム水溶液で１分間洗浄した後、１００ｇ／Ｌのホウ酸水溶液で２５０Ｖの化成処理を行った。そして、計測した静電容量の結果を表１、２に示す。また、表１、２には、各電解コンデンサ用アルミニウムエッチング箔の仕上がり厚さ（エッチング後、化成前の厚さ）を計測した結果も示してある。 The aluminum etching foil for electrolytic capacitors thus obtained was washed with an aluminum nitrate aqueous solution having a temperature of 60 ° C. and a concentration of 0.75 mol / L for 1 minute, and then subjected to a chemical conversion treatment at 250 V with a 100 g / L boric acid aqueous solution. went. Tables 1 and 2 show the results of the measured capacitance. Tables 1 and 2 also show the results of measuring the finished thickness (thickness after etching and before formation) of the aluminum etching foil for electrolytic capacitors.
表１に示すように、実施例１〜２４に係るエッチング条件（第三段目まで）で製造した電解コンデンサ用アルミニウムエッチング箔は、従来例と比較して、仕上がり厚さ（エッチング後の厚さ）が厚く、かつ、静電容量が高いことが確認できた。 As shown in Table 1, the aluminum etching foil for electrolytic capacitors manufactured under the etching conditions (up to the third stage) according to Examples 1 to 24 has a finished thickness (thickness after etching) as compared with the conventional example. ) Was thick and the capacitance was high.
また、表２に示すように、実施例２５〜３０に係るエッチング条件（第四段目まで）で製造した電解コンデンサ用アルミニウムエッチング箔も、実施例１〜２４と同様、従来例と比較して、仕上がり厚さ（エッチング後の厚さ）が厚く、かつ、静電容量が高いことが確認できた。 Moreover, as shown in Table 2, the aluminum etching foil for electrolytic capacitors manufactured under the etching conditions (up to the fourth stage) according to Examples 25 to 30 was also compared with the conventional example, as in Examples 1 to 24. It was confirmed that the finished thickness (thickness after etching) was large and the capacitance was high.
これに対して、表２から分かるように、電解条件を変えて電解エッチング処理を三段以上行うが、第二段目以降のエッチング条件が、本発明の条件から外れた比較例１５〜２２に係る条件（第二段目から最終段に向けてイオン種の濃度が低下し、電流密度が低下若しくは微増するか、またはピークを形成する場合）で、製造した電解コンデンサ用アルミニウムエッチング箔は、従来例と比較して、仕上がり厚さ（エッチング後の厚さ）が薄く、かつ、静電容量が低いことが確認できた。
また、比較例１〜１４に係る条件（第二段目から最終段に向けて電流密度を高くしていく比率を第二段目から最終段に向けてエッチング液中のイオン種の濃度を低下させる比率の逆数と等しくしてあるが、イオン種の濃度および／または電流密度が本発明の条件を外れる場合）で製造したものは、比較例１５〜２２と比較して、静電容量は同等以上であり、仕上がり厚さは同等の結果であったが、実施例１〜２４より劣る結果であった。
On the other hand, as can be seen from Table 2, the electrolytic etching treatment is performed in three or more stages while changing the electrolytic conditions, but the etching conditions in the second and subsequent stages are comparative examples 15 to 22 that deviate from the conditions of the present invention. Under such conditions (when the concentration of ionic species decreases from the second stage to the final stage, the current density decreases or slightly increases, or peaks are formed), the manufactured aluminum etching foil for electrolytic capacitors is conventionally Compared with the example, it was confirmed that the finished thickness (thickness after etching) was thin and the capacitance was low.
Further, the conditions according to Comparative Examples 1 to 14 (the ratio of increasing the current density from the second stage to the final stage is decreased from the second stage to the final stage, and the concentration of ionic species in the etching solution is decreased. In the case where the concentration of ionic species and / or the current density deviates from the conditions of the present invention, the capacitance is the same as that of Comparative Examples 15 to 22. Although it was above and the finishing thickness was the same result, it was a result inferior to Examples 1-24.
〔その他の実施例〕
なお、上記実施例は、いずれもエッチング液中のイオン種として塩素イオンを用いた例であったが、塩素イオン以外の硝酸イオン、リン酸イオン、シュウ酸イオンをイオン種として含むエッチング液を用いた場合、あるいは塩素イオン、硝酸イオン、リン酸イオン、シュウ酸イオンをイオン種として二種以上含むエッチング液を用いた場合でも、同様な傾向が得られた。
[Other Examples]
In the above examples, chlorine ions were used as ion species in the etching solution. However, an etching solution containing nitrate ions, phosphate ions, and oxalate ions other than chlorine ions as ion species was used. The same tendency was obtained even in the case of using an etching solution containing two or more chlorine ions, nitrate ions, phosphate ions, and oxalate ions as ion species.
Claims (2)
電解条件を変えて前記電解エッチング処理を三段以上行うとともに、第二段目以降の電解エッチング処理では塩素イオン、硝酸イオン、リン酸イオン、シュウ酸イオンのうち少なくとも１種以上のイオン種を含むエッチング液を用い、かつ、
第二段目から最終段に向けて前記エッチング液中のイオン種の濃度を低下させる一方、第二段目から最終段に向けて電流密度を高くしていき、
第二段目から最終段の電解エッチング処理では、前記エッチング液におけるイオン種の濃度を０．１０〜１．００ｍｏｌ／Ｌの範囲とするとともに、電流密度を１０〜１００ｍＡ／ｃｍ 2 の範囲とすることを特徴とする電解コンデンサ用アルミニウム電極箔の製造方法。 In the method for manufacturing an aluminum electrode foil for electrolytic capacitors, in which electrolytic etching treatment is performed in multiple stages on the aluminum foil,
The electrolytic etching process is performed in three or more stages while changing the electrolytic conditions, and the second and subsequent electrolytic etching processes include at least one ion species of chlorine ions, nitrate ions, phosphate ions, and oxalate ions. Using an etchant, and
While lowering the ionic species concentration in the etching liquid toward the final stage from the second stage, Ki has a high current density for the final stage from the second stage,
In the electrolytic etching treatment from the second stage to the final stage, the concentration of ionic species in the etching solution is in the range of 0.10 to 1.00 mol / L, and the current density is in the range of 10 to 100 mA / cm 2. The manufacturing method of the aluminum electrode foil for electrolytic capacitors characterized by the above-mentioned.
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