JP4508354B2 - Scanning exposure apparatus and scanning exposure method - Google Patents
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
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Description
【０００１】
【発明の属する技術分野】
本発明は、液晶パネル生産用の走査露光装置および走査露光方法に関するものである。
【０００２】
【従来の技術】
従来の液晶パネル生産用の走査露光装置においては、マスク等の原版に描画された液晶パネルパターンと基板上に既に露光されている液晶パネルとの位置合わせのための測定は、走査方向（Ｙ方向）上の原版と液晶パネルの中心付近および両端部付近において液晶パネルより走査方向に直交する方向（Ｘ方向）外側に配置した複数の位置合わせマークに対してそれぞれ測定を行った後に、各々の測定値から位置補正および倍率補正を行いながら、原版の液晶パネルパターン像を基板上の液晶パネルに露光処理していた。
【０００３】
【発明が解決しようとする課題】
近年、液晶パネルの生産コストの低減やより付加価値の高い大型液晶パネルへの生産の移行に伴い、露光装置においても生産性が重要視されるとともに、露光する液晶パネルサイズも徐々に大きくなってきている。
【０００４】
しかしながら、従来の液晶パネル用の露光装置では、マスク等の原版に描画された液晶パネルパターン像と基板上に既に露光されている液晶パネルとの位置合わせを行うための位置合わせマークを、走査方向（Ｙ方向）上の液晶パネルの中央付近の（Ｘ方向）両側部に配置しなければならないことから、液晶パネルの大型化にとって障害となっていた。
【０００５】
また、原版の液晶パネルパターンと基板上の液晶パネルとの位置合わせのための測定を、1 枚の液晶パネルについて、多数部分で行うことは、生産性を落とす要因の一つとして挙げられていた。
【０００６】
そこで、本発明は、前述した従来技術の有する未解決の課題に鑑みてなされたものであって、走査方向と直交する方向において大型の液晶パネルの露光を可能にするとともに生産性を向上させることができる液晶パネル生産用の走査露光装置および走査露光方法を提供することを目的とするものである。
【０００７】
【課題を解決するための手段】
上記目的を達成するため、本発明の走査露光装置は、矩形のパターン領域を含む矩形の面を有する原版を保持する原版ステージと、前記原版ステージを移動させる第１の駆動手段と、矩形の液晶パネル領域を含む矩形の面を有する基板を保持する基板ステージと、前記基板ステージを移動させる第２の駆動手段と、整形された露光光で前記パターン領域を照明する照明光学系と、前記原版ステージに保持された原版に配された原版マークと、前記基板ステージに保持された基板に配された、前記原版マークに対応する基板マークとを検出する検出光学系とを有し、前記検出光学系の検出結果に基づいて前記パターン領域と前記液晶パネル領域との位置ずれ量および倍率誤差を求め、該求められた位置ずれ量および倍率誤差に基づき、前記第１の駆動手段と前記第２の駆動手段とにより前記原版ステージと前記基板ステージとを同期して走査しながら前記パターン領域を介して前記液晶パネル領域を露光する液晶パネル生産用の走査露光装置において、
前記走査の方向において前記パターン領域を挟む第１の領域および第２の領域それぞれに前記走査の方向と直交する方向において前記パターン領域の範囲内に原版マークを有し且つ前記直交する方向において前記パターン領域の外側には原版マークを有しない原版と、前記走査の方向において前記液晶パネル領域を挟む第３の領域および第４の領域それぞれに前記直交する方向において前記液晶パネル領域の範囲内に前記原版マークに対応する基板マークを有し且つ前記直交する方向において前記液晶パネル領域の外側には基板マークを有しない基板とに対し、前記原版マークと前記基板マークとを前記検出光学系の検出対象として、前記第１の駆動手段により前記原版ステージを移動させ且つ前記第２の駆動手段により前記基板ステージを移動させることにより、互いに対応する原版マークと基板マークとの複数の組を順次前記検出光学系により検出することを特徴とする。
【０００８】
さらに、本発明の走査露光方法は、矩形のパターン領域を含む矩形の面を有する原版を保持する原版ステージと、矩形の液晶パネル領域を含む矩形の面を有する基板を保持する基板ステージと、整形された露光光で前記パターン領域を照明する照明光学系と、前記原版ステージに保持された原版に配された原版マークと、前記基板ステージに保持された基板に配された、前記原版マークに対応する基板マークとを検出する検出光学系とを用い、該検出の結果に基づいて前記パターン領域と前記液晶パネル領域との位置ずれ量および倍率誤差を求め、該求められた位置ずれ量および倍率誤差に基づき、前記原版ステージと前記基板ステージとを同期して走査しながら前記パターン領域を介して前記液晶パネル領域を露光する液晶パネル生産用の走査露光方法において、
前記走査の方向において前記パターン領域を挟む第１の領域および第２の領域それぞれに前記走査の方向と直交する方向において前記パターン領域の範囲内に原版マークを有し且つ前記直交する方向において前記パターン領域の外側には原版マークを有しない原版と、前記走査の方向において前記液晶パネル領域を挟む第３の領域および第４の領域それぞれに前記走査の方向と直交する方向において前記液晶パネル領域の範囲内に前記原版マークに対応する基板マークを有し且つ前記直交する方向において前記液晶パネル領域の外側には基板マークを有しない基板とに対し、前記原版マークと前記基板マークとを前記検出光学系の検出対象として、前記原版ステージを移動させ且つ前記基板ステージを移動させることにより、互いに対応する原版マークと基板マークとの複数の組を順次該検出光学系により検出することを特徴とする。
【０００９】
【作用】
本発明によれば、マスク等の原版と基板の走査方向の両端面側のみに設けられた位置合わせマークを測定することにより原版と基板の液晶パネルの位置ずれ量と倍率誤差を求め、両者の位置ずれ量と倍率誤差を補正しながら原版と基板を走査方向に駆動して走査露光することによって、原版と基板の中心付近の位置合わせマークの配置を不要にし、かつ走査方向上の原版と基板上の液晶パネルの中央付近の位置ずれ量や倍率誤差の測定が省略されることにより、走査方向に直交する方向に液晶パネルを広げることが可能となり、大型の液晶パネルの生産を可能にする。さらに、原版と基板上の液晶パネルの中央付近の位置ずれ量と倍率誤差の測定の省略に伴い、原版と基板上の液晶パネルの位置合わせに要する所要時間を短縮することができ、全体としての露光処理時間を短くすることができ、生産性の向上を図ることができる。
【００１０】
【発明の実施の形態】
本発明の実施の形態を図面に基づいて説明する。
【００１１】
図１は、本発明の液晶パネル生産用の走査露光装置の構成を概略的に図示する概略構成図であり、図２の（ａ）および（ｂ）は、本発明の液晶パネル生産用の走査露光装置における液晶パネルパターンが描画されているマスク（原版）と既に前工程で液晶パネルが露光されている基板をそれぞれ模式的に示す平面図である。
【００１２】
図１において、１は照明光学系で、露光光源と露光光源から発せられる特定波長の露光光を露光位置にある原版であるマスクＭに対して整形して照射する光学系を有している。２は液晶パネルパターンＭｏ（図２の（ａ）参照）が描画されているマスクＭを保持してＸＹθ方向に移動可能で走査方向（Ｙ方向）に走査露光機能を有する原版ステージであるマスクステージ、３はマスクＭに描画された液晶パネルパターンＭｏをガラス基板等の基板Ｐ上に投影する凸凹面鏡を組み合わせて構成するミラー投影光学系、４は基板Ｐを保持してＸＹθ方向に移動可能で走査方向（Ｙ方向）に走査露光機能を有する基板ステージ、５はマスクステージ２を搭載するマスクステージ支持台５ａや基板ステージ４を搭載する基板ステージ支持台５ｂ等を備える露光装置本体である。また、６は、マスクＭや基板Ｐ上の位置合わせマークＭｍ（Ｍｍ１ 、Ｍｍ２ ）、Ｐｍ（Ｐｍ１ 、Ｐｍ２ ）（図２の（ａ）および（ｂ）参照）を検出し、その検出結果を主制御手段１２に送信する観察光学系であり、７はマスクＭに描画された液晶パネルパターンＭｏを基板Ｐに転写するパターン像を走査方向（Ｙ方向）と直交する方向（Ｘ方向）に光学的に拡大あるいは縮小させるＸ方向倍率制御系である。なお、転写されるパターン像の走査方向（Ｙ方向）の拡大あるいは縮小に関しては、マスクステージ２と基板ステージ４の速度差により拡大あるいは縮小させる構成とする。
【００１３】
また、露光装置本体５のマスクステージ支持台５ａ上に搭載されたマスクステージ２は、マスクＭをＸＹθ方向に移動可能に保持し、走査方向（Ｙ方向）にはマスクＹ軸駆動モータ９により駆動され、図１において実線で示す位置と一点鎖線で示す位置との間を移動し、マスクステージ２のＹ方向の位置はマスクＹ軸制御レーザ干渉計８により計測される。一方、露光装置本体５の基板ステージ支持台５ｂ上に搭載された基板ステージ４は、基板ＰをＸＹθ方向に移動可能に保持し、走査方向（Ｙ方向）には基板Ｙ軸駆動モータ１１により駆動され、図１において実線で示す位置と一点鎖線で示す位置との間を移動し、基板ステージ４のＹ方向の位置は基板Ｙ軸制御レーザ干渉計１０により計測される。
【００１４】
主制御手段１２は、露光に係わる制御およびマスクステージ２や基板ステージ４の動作シーケンスの制御を行うとともに、マスクＭや基板Ｐ上のそれぞれの位置合わせマークＭｍ、Ｐｍを検出する観察光学系（検出光学系）６の検出結果に基づいて両者の位置合わせマークＭｍ、Ｐｍの相対的な位置ずれや倍率誤差等を求めて適宜記憶保管し、適宜位置合わせマークＭｍ、Ｐｍの相対位置ずれおよび倍率誤差等に関する情報を駆動制御手段１３に送信する。駆動制御手段１３は、主制御手段１２の指令を基に、さらに、マスクＹ軸制御レーザ干渉計８や基板Ｙ軸制御レーザ干渉計１０により計測されるマスクステージ２と基板ステージ４のそれぞれの位置データに基づいて、各ステージ２、４を駆動するマスクＹ軸駆動モータ９と基板Ｙ軸駆動モータ１１をそれぞれ制御する。
【００１５】
また、マスクステージ２上に固定されるガラス質のマスクＭには、図２の（ａ）に示すように、基板Ｐ上の液晶パネルＰｏ上に転写する液晶パネルパターンＭｏが描画され、走査方向（Ｙ方向）の両端面側にそれぞれ複数（図においては２個）の位置合わせマークＭｍ１ 、Ｍｍ１ （Ｙ方向（＋）側）；Ｍｍ２ 、Ｍｍ２ （Ｙ方向（−）側）が配置される。また、基板ステージ４上に固定されるガラス製の基板Ｐには、図２の（ｂ）に示すように、液晶パネルＰｏが既に前工程で露光されており、基板Ｐの走査方向（Ｙ方向）の両端面側に、原版マークであるマスクＭの位置合わせマークＭｍ１ 、Ｍｍ１ ；Ｍｍ２ 、Ｍｍ２ にそれぞれ対応するように複数（図においては２個）の基板マークである位置合わせマークＰｍ１ 、Ｐｍ１ （Ｙ方向（＋）側）；Ｐｍ２ 、Ｐｍ２ （Ｙ方向（−）側）が配置されている。
【００１６】
次に、以上のように位置合わせマークＭｍ、Ｐｍがそれぞれ配置されているマスクＭと基板Ｐの位置合わせおよび液晶パネルパターンの露光動作について説明する。
【００１７】
液晶パネルパターンＭｏが描画されているマスクＭをマスクステージ２上に搭載するとともに既に前工程で液晶パネルＰｏが露光されている基板Ｐを基板ステージ４上に搭載し、マスクステージ２と基板ステージ４のそれぞれの第１の駆動手段であるマスクＹ軸駆動モータ９および第２の駆動手段である基板Ｙ軸駆動モータ１１を駆動させ、マスクＭと基板Ｐのそれぞれの一方の端面側（Ｙ方向（＋）側）に設けられている位置合わせマークＭｍ１ とＰｍ１ が観察光学系６によって観察できる位置（例えば、図１に実線で示す位置）へマスクステージ２と基板ステージ４をそれぞれ移動させる。この移動終了後、観察光学系６を用いて、マスクＭと基板Ｐの位置合わせマークＭｍ１ 、Ｐｍ１ を観察検出し、その検出結果に基づいて、主制御手段１２にてマスクＭと基板Ｐの位置合わせマークＭｍ１ 、Ｐｍ１ の相対的な位置ずれおよび倍率誤差（すなわち、液晶パネルパターンＭｏと液晶パネルＰｏの相対的な位置ずれ量および倍率誤差）を求める。
【００１８】
次いで、マスクステージ２と基板ステージ４のそれぞれのマスクＹ軸駆動モータ９と基板Ｙ軸駆動モータ１１を駆動させ、マスクＭと基板Ｐのそれぞれの他方の端面側（Ｙ方向（−）側）に設けられている位置合わせマークＭｍ２ とＰｍ２ が観察光学系６によって観察できる位置（例えば、図１に一点鎖線で示す位置）へマスクステージ２と基板ステージ４を移動させる。この移動終了後、前述と同様に、観察光学系６を用いて、位置合わせマークＭｍ２ 、Ｐｍ２ を観察検出し、その検出結果に基づいて、主制御手段１２にてマスクＭと基板Ｐの位置合わせマークＭｍ２ とＰｍ２ の相対的な位置ずれおよび倍率誤差（すなわち、液晶パネルパターンＭｏと液晶パネルＰｏの相対的な位置ずれ量および倍率誤差）を求める。
【００１９】
その後、駆動制御手段１３は、露光動作に際して、主制御手段１２にて求めた位置合わせマークＭｍ、Ｐｍの位置ずれ量および倍率誤差を補正しながら、各ステージ２、４のマスクＹ軸駆動モータ９と基板Ｙ軸駆動モータ１１をそれぞれ駆動させる。併せて照明光学系１から露光光を照射することにより、マスクＭに描画されている液晶パネルパターンＭｏを基板Ｐ上に既に前工程で露光されている液晶パネルＰｏ上に正確に重ね合わせて走査露光する。
【００２０】
このように、マスクＭと基板Ｐの走査方向（Ｙ方向）の両端面側のみに設けられた位置合わせマークＭｍ、Ｐｍの検出によりマスクＭと基板Ｐの液晶パネルの位置ずれ量および倍率誤差の求め、求められた位置ずれ量と倍率誤差を補正しながら走査露光することにより、マスクＭと基板Ｐの中央付近に位置合わせマークを配置することを不要にすることができ、走査方向（Ｙ方向）に直交する方向（Ｘ方向）に液晶パネルを広げることが可能となり、大型の液晶パネルの露光を可能にする。さらに、マスクＭと基板Ｐの中央付近の位置合わせマークの配置を不要とすることにより、走査方向上のマスクＭと基板Ｐの中央付近での位置合わせを省略することができ、位置合わせに要する時間が短縮され、全体としての露光処理時間も短縮され、生産性を向上させることができる。
【００２１】
また、前述した実施例では、走査方向上の位置合わせマークを走査方向に移動させて測定するようにしているが、観察光学系の検出装置を走査方向上に２つ並べて配置することにより、基板とマスクのＹ方向両端面側の位置合わせマークを同時に検出することができるようにし、基板ステージをＸ方向にステップ移動させて順次位置合わせマークの位置ずれ量や倍率誤差を測定するように構成することも可能である。
【００２２】
【発明の効果】
以上説明したように、本発明によれば、走査方向に直交する方向において大型の液晶パネルの露光を可能にするとともに生産性を向上させることができる。
【図面の簡単な説明】
【図１】 本発明の走査露光装置の構成を概略的に図示する概略構成図である。
【図２】 本発明の走査露光装置における液晶パネルパターンが描画されているマスク（原版）と既に液晶パネルが露光されている基板をそれぞれ模式的に示す平面図である。
【符号の説明】
Ｍ マスク（原版）
Ｍｏ 液晶パネルパターン
Ｍｍ１ （マスク（＋）側の）位置合わせマーク
Ｍｍ２ （マスク（−）側の）位置合わせマーク
Ｐ 基板
Ｐｏ 液晶パネル
Ｐｍ１ （基板（＋）側の）位置合わせマーク
Ｐｍ２ （基板（−）側の）位置合わせマーク
１ 照明光学系
２ マスクステージ
３ ミラー投影光学系
４ 基板ステージ
５ 露光装置本体
６ 観察光学系
７ Ｘ方向倍率制御系
８ マスクＹ軸制御レーザ干渉計
９ マスクＹ軸駆動モータ
１０ 基板Ｙ軸制御レーザ干渉計
１１ 基板Ｙ軸駆動モータ
１２ 主制御手段
１３ 駆動制御手段[0001]
BACKGROUND OF THE INVENTION
The present invention relates to run 査 exposure apparatus and run 査 exposure method for a liquid crystal panel production.
[0002]
[Prior art]
In conventional run 査 exposure apparatus for liquid crystal panel production is measured for alignment of the liquid crystal panel that has already been exposed to the liquid crystal panel pattern on the substrate drawn on the original such as a mask, the scanning direction (Y After measuring each of a plurality of alignment marks arranged outside the liquid crystal panel in the direction orthogonal to the scanning direction (X direction) near the center and both ends of the original plate and the liquid crystal panel The liquid crystal panel pattern image of the original was exposed to the liquid crystal panel on the substrate while performing position correction and magnification correction from the measured values.
[0003]
[Problems to be solved by the invention]
In recent years, along with the reduction in production cost of liquid crystal panels and the shift to production of large liquid crystal panels with higher added value, productivity has become more important in exposure apparatuses, and the size of liquid crystal panels to be exposed has gradually increased. ing.
[0004]
However, in a conventional exposure apparatus for a liquid crystal panel, an alignment mark for aligning a liquid crystal panel pattern image drawn on an original plate such as a mask and a liquid crystal panel already exposed on a substrate is provided in a scanning direction. Since it must be arranged on both sides (X direction) near the center of the liquid crystal panel on the (Y direction), it has been an obstacle to increase the size of the liquid crystal panel.
[0005]
In addition, it was cited as one of the factors that reduced productivity that the measurement for aligning the liquid crystal panel pattern of the original plate and the liquid crystal panel on the substrate was performed in many parts for one liquid crystal panel. .
[0006]
Therefore, the present invention has been made in view of the above-mentioned unsolved problems of the prior art, and enables exposure of a large liquid crystal panel in a direction orthogonal to the scanning direction and improves productivity. it is an object to provide a run 査 exposure apparatus and run 査 exposure method for a liquid crystal panel production can.
[0007]
[Means for Solving the Problems]
To achieve the above object, the scanning exposure apparatus of the present invention, the original stage for holding a precursor having a rectangular plane including the rectangular pattern area, and the first drive means Before moving the original stage, rectangular a substrate stage for holding a substrate having a rectangular plane including a liquid crystal panel region, and a second driving means Before moving the substrate stage, an illumination optical system for illuminating the pattern region in the shaped exposure light, wherein has a master mark arranged on the original held by an original stage, arranged on the substrate held by the substrate stage, and a detection optical system for detecting the substrate mark corresponding to the original mark, the detection obtain the position displacement amount and the magnification error between the pattern region and the liquid crystal panel area based on the detection result of the optical system, based on the positional deviation amount and the magnification error obtained the said first In the scanning exposure apparatus for liquid crystal panel production for exposing the liquid crystal panel region through the pattern region while scanning in synchronism with said substrate stage and said original plate stage by said drive means the second driving means ,
In the first region and the second region has an original plate mark within the pattern region in the direction orthogonal to the direction of the scan, each and direction the perpendicular to the direction of the scanning sandwiching the pattern region and original no original mark on the outside of the pattern area, within the range of the liquid crystal panel region in the third region and the fourth region said orthogonal directions to each sandwiching the liquid crystal panel region in the direction of the scan the contrast and the substrate having no substrate mark on the outside of the liquid crystal panel area in a direction and said orthogonal having a substrate mark corresponding to the original mark, detecting said substrate mark and the original mark of the detecting optical system as a target, the substrate stage by the first 且 one said second drive means moving the original stage by driving means The Rukoto is moving, and detects the sequence the detection optics a plurality of sets of the original mark and the substrate mark corresponding to each other.
[0008]
Further, the scanning exposure method of the present invention includes an original stage for holding an original having a rectangular surface including a rectangular pattern region, a substrate stage for holding a substrate having a rectangular surface including a rectangular liquid crystal panel region, and shaping. an illumination optical system for illuminating the pattern area with an exposure light, and the original mark arranged on the original held by the original stage, arranged on the substrate held by the substrate stage, corresponding to the original mark using a detection optical system for detecting a substrate mark, obtains the positional shift amount and magnification error between the pattern region and the liquid crystal panel area based on a result of the detection, the positional deviation amount and the determined based on the magnification error, the through the pattern region while synchronously scanning the original stage and said substrate stage for a liquid crystal panel production for exposing the liquid crystal panel region In 査露 light method,
The first region and the second in the area direction orthogonal to the direction of the scan, each having an original version marks within the scope of the pattern area and the direction of the orthogonal sandwiching the pattern region in the direction of the scan said liquid crystal panel and the original having no original mark on the outside, in the third region and the fourth region direction perpendicular to the direction of the scan for each sandwiching the liquid crystal panel region in the direction of the scanning of the pattern area in to a substrate having no substrate mark on the outside of the liquid crystal panel area in a direction and the orthogonal having a substrate mark corresponding to the original mark within the region, said and said substrate mark and the original mark as a detection target of the detection optical system, by Rukoto to move 且 one said substrate stage moving the original stage, correspond to each other And detecting by sequentially said detecting optical system a plurality of sets of the plate mark and the substrate mark.
[0009]
[Action]
According to the present invention, by measuring the alignment marks provided only on both side surfaces in the scanning direction of the original plate such as a mask and the substrate, the positional deviation amount and the magnification error of the liquid crystal panel of the original plate and the substrate are obtained. By scanning and exposing the original and the substrate in the scanning direction while correcting the positional deviation amount and the magnification error, it is not necessary to arrange the alignment marks near the center of the original and the substrate, and the original and the substrate in the scanning direction By omitting the measurement of the positional deviation amount and the magnification error near the center of the upper liquid crystal panel, the liquid crystal panel can be widened in the direction orthogonal to the scanning direction, thereby enabling the production of a large liquid crystal panel . Furthermore, with the omission of the measurement of the displacement and magnification error near the center of the liquid crystal panel on the original plate and the substrate, the time required for alignment of the liquid crystal panel on the original plate and the substrate can be shortened. Exposure processing time can be shortened, and productivity can be improved.
[0010]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described with reference to the drawings.
[0011]
Figure 1 is a schematic block diagram illustrating a schematic configuration of a scanning exposure light device for a liquid crystal panel production of the present invention, shown in FIG. 2 (a) and (b), the liquid crystal panel production of the present invention is a plan view showing already pre-process the mask (original) of the liquid crystal panel patterns are drawn a substrate which the liquid crystal panel is exposed, respectively schematically in run 査 exposure apparatus.
[0012]
In Figure 1, 1 is illuminated by the optical system, and possess an optical system for irradiating shapes the exposure light of a specific wavelength emitted from the exposure light source as an exposure light source with respect to the mask M is a precursor in the exposure position. Reference numeral 2 denotes a mask stage which is an original stage which holds a mask M on which a liquid crystal panel pattern Mo (see FIG. 2A) is drawn and is movable in the XYθ direction and has a scanning exposure function in the scanning direction (Y direction). Reference numeral 3 denotes a mirror projection optical system configured by combining a convex-concave mirror that projects the liquid crystal panel pattern Mo drawn on the mask M onto a substrate P such as a glass substrate, and 4 can hold the substrate P and move in the XYθ direction. A
[0013]
The mask stage 2 mounted on the mask stage support 5a of the exposure apparatus
[0014]
The main control means 12 controls the exposure and controls the operation sequence of the mask stage 2 and the substrate stage 4, and also observes the alignment marks Mm and Pm on the mask M and the substrate P (detection optical system (detection)). Optical system) Based on the detection result of 6, the relative misalignment and magnification error of both alignment marks Mm and Pm are obtained and stored appropriately, and the relative misalignment and magnification error of alignment marks Mm and Pm are appropriately stored. Etc. are transmitted to the drive control means 13. The drive control means 13 is further provided with the respective positions of the mask stage 2 and the substrate stage 4 measured by the mask Y-axis control laser interferometer 8 and the substrate Y-axis
[0015]
A glassy mask M fixed on the mask stage 2 is drawn with a liquid crystal panel pattern Mo to be transferred onto the liquid crystal panel Po on the substrate P, as shown in FIG. A plurality (two in the figure) of alignment marks Mm 1 and Mm 1 (Y direction (+) side); Mm 2 and Mm 2 (Y direction (−) side) are provided on both end surfaces in the (Y direction). Be placed. Further, as shown in FIG. 2B, the glass substrate P fixed on the substrate stage 4 has already been exposed to the liquid crystal panel Po in the previous process, and the scanning direction of the substrate P (Y direction). ) On both end surfaces of the mask M, which is the original mark, alignment marks which are a plurality of (two in the figure) substrate marks so as to respectively correspond to the alignment marks Mm 1 , Mm 1 ; Mm 2 , Mm 2 . Pm 1 and Pm 1 (Y direction (+) side); Pm 2 and Pm 2 (Y direction (−) side) are arranged.
[0016]
Next, the alignment of the mask M on which the alignment marks Mm and Pm are arranged as described above and the substrate P and the exposure operation of the liquid crystal panel pattern will be described.
[0017]
The mask M on which the liquid crystal panel pattern Mo is drawn is mounted on the mask stage 2, and the substrate P on which the liquid crystal panel Po has been exposed in the previous process is mounted on the substrate stage 4, and the mask stage 2 and the substrate stage 4 are mounted. first drive means mask Y-axis drive motor 9 and the second drives the substrate Y-axis drive motor 11 is a driving means which is, each one end surface of the mask M and the substrate P (Y direction respectively ( The mask stage 2 and the substrate stage 4 are moved to positions where the alignment marks Mm 1 and Pm 1 provided on the (+) side) can be observed by the observation optical system 6 (for example, positions indicated by solid lines in FIG. 1). After the movement, the observation optical system 6 is used to observe and detect the alignment marks Mm 1 and Pm 1 of the mask M and the substrate P, and based on the detection result, the main control means 12 uses the mask M and the substrate P. The relative displacement and magnification error of the alignment marks Mm 1 and Pm 1 (that is, the relative displacement and magnification error between the liquid crystal panel pattern Mo and the liquid crystal panel Po) are obtained.
[0018]
Next, the mask Y-axis drive motor 9 and the substrate Y-axis drive motor 11 of each of the mask stage 2 and the substrate stage 4 are driven to move to the other end face side (Y direction (−) side) of each of the mask M and the substrate P. The mask stage 2 and the substrate stage 4 are moved to a position where the provided alignment marks Mm 2 and Pm 2 can be observed by the observation optical system 6 (for example, a position indicated by a one-dot chain line in FIG. 1). After the movement, as described above, the alignment marks Mm 2 and Pm 2 are observed and detected using the observation optical system 6, and the main control means 12 determines whether the mask M and the substrate P are in accordance with the detection result. The relative displacement and magnification error between the alignment marks Mm 2 and Pm 2 (that is, the relative displacement and magnification error between the liquid crystal panel pattern Mo and the liquid crystal panel Po) are obtained.
[0019]
Thereafter, the drive control means 13 corrects the positional deviation amount and magnification error of the alignment marks Mm and Pm obtained by the main control means 12 during the exposure operation, and the mask Y-axis drive motor 9 of each stage 2, 4. each Ru drives the substrate Y-axis drive motor 11 and. At the same time, by irradiating exposure light from the illumination optical system 1, the liquid crystal panel pattern Mo drawn on the mask M is accurately superimposed on the liquid crystal panel Po that has already been exposed in the previous process and scanned. Exposure.
[0020]
As described above, by detecting the alignment marks Mm and Pm provided only on both end surfaces in the scanning direction (Y direction) of the mask M and the substrate P, the positional deviation amount and magnification error of the liquid crystal panel of the mask M and substrate P are detected. By obtaining and performing scanning exposure while correcting the obtained positional deviation amount and magnification error, it is not necessary to place an alignment mark near the center of the mask M and the substrate P, and the scanning direction (Y direction) ) Can be expanded in a direction (X direction) orthogonal to () to enable exposure of a large liquid crystal panel. Further, by eliminating the need for the alignment mark in the vicinity of the center of the mask M and the substrate P, the alignment in the vicinity of the center of the mask M and the substrate P in the scanning direction can be omitted, and the alignment is required. The time is shortened, the overall exposure processing time is shortened, and the productivity can be improved.
[0021]
In the above-described embodiments, measurement is performed by moving the alignment mark in the scanning direction in the scanning direction, but by arranging two detectors of the observation optical system side by side in the scanning direction, the substrate And the alignment marks on both end faces of the mask in the Y direction can be detected simultaneously, and the substrate stage is moved stepwise in the X direction to measure the positional deviation amount and magnification error of the alignment marks sequentially. It is also possible.
[0022]
【The invention's effect】
As described above, according to the present invention, it is possible to make increase productivity as well as to allow exposure of Oite large LCD panels in a direction perpendicular to the run査direction.
[Brief description of the drawings]
FIG. 1 is a schematic configuration diagram schematically illustrating the configuration of a scanning exposure apparatus of the present invention.
FIG. 2 is a plan view schematically showing a mask (original plate) on which a liquid crystal panel pattern is drawn and a substrate on which a liquid crystal panel has already been exposed in the scanning exposure apparatus of the present invention.
[Explanation of symbols]
M mask (original version)
Mo liquid crystal panel pattern Mm 1 (on the mask (+) side) alignment mark Mm 2 (on the mask (−) side) alignment mark P substrate Po liquid crystal panel Pm 1 (on the substrate (+) side) alignment mark Pm 2 Alignment mark (on substrate (−) side) 1 Illumination optical system 2 Mask stage 3 Mirror projection optical system 4
Claims (4)
前記走査の方向において前記パターン領域を挟む第１の領域および第２の領域それぞれに前記走査の方向と直交する方向において前記パターン領域の範囲内に原版マークを有し且つ前記直交する方向において前記パターン領域の外側には原版マークを有しない原版と、前記走査の方向において前記液晶パネル領域を挟む第３の領域および第４の領域それぞれに前記直交する方向において前記液晶パネル領域の範囲内に前記原版マークに対応する基板マークを有し且つ前記直交する方向において前記液晶パネル領域の外側には基板マークを有しない基板とに対し、前記原版マークと前記基板マークとを前記検出光学系の検出対象として、前記第１の駆動手段により前記原版ステージを移動させ且つ前記第２の駆動手段により前記基板ステージを移動させることにより、互いに対応する原版マークと基板マークとの複数の組を順次前記検出光学系により検出する、
ことを特徴とする走査露光装置。Substrate holding the original stage for holding a precursor having a rectangular plane including the rectangular pattern area, and the first drive means Before moving the original stage, a substrate having a rectangular plane including the rectangular liquid crystal panel region of a stage, a second driving means Before moving the substrate stage, an illumination optical system for illuminating the pattern region in the shaped exposure light, and the original mark arranged on the original held by the original stage, arranged on the substrate held by the substrate stage, wherein and a detecting optical system for detecting the substrate mark corresponding to the original mark, the liquid and the pattern area based on the detection result of the detecting optical system obtain the position displacement amount and the magnification error of the crystal panel area, based on the positional deviation amount and the magnification error obtained it said, the original scan and the first driving means by said second driving means In the scanning exposure apparatus for liquid crystal panel production for exposing the liquid crystal panel region through the pattern region while synchronously scanning the chromatography di and said substrate stage,
In the first region and the second region has an original plate mark within the pattern region in the direction orthogonal to the direction of the scan, each and direction the perpendicular to the direction of the scanning sandwiching the pattern region and original no original mark on the outside of the pattern area, within the range of the liquid crystal panel region in the third region and the fourth region said orthogonal directions to each sandwiching the liquid crystal panel region in the direction of the scan the contrast and the substrate having no substrate mark on the outside of the liquid crystal panel area in a direction and said orthogonal having a substrate mark corresponding to the original mark, detecting said substrate mark and the original mark of the detecting optical system as a target, the substrate stage by the first 且 one said second drive means moving the original stage by driving means The Rukoto is moving, is detected by sequentially said detecting optical system a plurality of sets of the original mark and the substrate mark corresponding to each other,
A scanning exposure apparatus.
ことを特徴とする請求項１に記載の走査露光装置。A plurality of original marks arranged in the ranges of the first region and the second region, and a plurality of substrate marks arranged in the ranges of the third region and the fourth region, respectively. And a detection target of the detection optical system,
The scanning exposure apparatus according to claim 1, wherein:
前記走査の方向において前記パターン領域を挟む第１の領域および第２の領域それぞれに前記走査の方向と直交する方向において前記パターン領域の範囲内に原版マークを有し且つ前記直交する方向において前記パターン領域の外側には原版マークを有しない原版と、前記走査の方向において前記液晶パネル領域を挟む第３の領域および第４の領域それぞれに前記走査の方向と直交する方向において前記液晶パネル領域の範囲内に前記原版マークに対応する基板マークを有し且つ前記直交する方向において前記液晶パネル領域の外側には基板マークを有しない基板とに対し、前記原版マークと前記基板マークとを前記検出光学系の検出対象として、前記原版ステージを移動させ且つ前記基板ステージを移動させることにより、互いに対応する原版マークと基板マークとの複数の組を順次該検出光学系により検出する、
ことを特徴とする走査露光方法。An original stage for holding an original having a rectangular surface including a rectangular pattern region, a substrate stage for holding a substrate having a rectangular surface including a rectangular liquid crystal panel region, and illuminating the pattern region with shaped exposure light an illumination optical system for the original mark arranged on the original held by the original stage, arranged on the substrate held by the substrate stage, a detection optical system for detecting the substrate mark corresponding to the original mark using the door, on the basis of the result of the detection obtain the position displacement amount and the magnification error between the pattern region and the liquid crystal panel region, based on the positional deviation amount and the magnification error obtained said, the said original stage in the scanning exposure method for a liquid crystal panel production for exposing the liquid crystal panel region through the pattern region while scanning the substrate stage synchronously,
The first region and the second in the area direction orthogonal to the direction of the scan, each having an original version marks within the scope of the pattern area and the direction of the orthogonal sandwiching the pattern region in the direction of the scan said liquid crystal panel and the original having no original mark on the outside, in the third region and the fourth region direction perpendicular to the direction of the scan for each sandwiching the liquid crystal panel region in the direction of the scanning of the pattern area in to a substrate having no substrate mark on the outside of the liquid crystal panel area in a direction and the orthogonal having a substrate mark corresponding to the original mark within the region, said and said substrate mark and the original mark as a detection target of the detection optical system, by Rukoto to move 且 one said substrate stage moving the original stage, correspond to each other Sequentially detected by said detecting optical system a plurality of sets of the plate mark and the substrate mark,
The scanning exposure method characterized by the above-mentioned.
ことを特徴とする請求項３に記載の走査露光方法。A plurality of original marks arranged in the ranges of the first region and the second region, and a plurality of substrate marks arranged in the ranges of the third region and the fourth region, respectively. And a detection target of the detection optical system,
The scanning exposure method according to claim 3.
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| JP4401834B2 (en) | 2004-03-23 | 2010-01-20 | 株式会社アドテックエンジニアリング | Exposure apparatus and alignment method |
| US8055099B2 (en) * | 2006-04-05 | 2011-11-08 | Sharp Kabushiki Kaisha | Exposure method and exposure device |
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