JP4404634B2 - N−メチル−2−ピロリドン(nmp)を連続的に製造するための方法 - Google Patents
N−メチル−2−ピロリドン(nmp)を連続的に製造するための方法 Download PDFInfo
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- JP4404634B2 JP4404634B2 JP2003554641A JP2003554641A JP4404634B2 JP 4404634 B2 JP4404634 B2 JP 4404634B2 JP 2003554641 A JP2003554641 A JP 2003554641A JP 2003554641 A JP2003554641 A JP 2003554641A JP 4404634 B2 JP4404634 B2 JP 4404634B2
- Authority
- JP
- Japan
- Prior art keywords
- process according
- gbl
- nmp
- pyrrolidone
- methyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 title claims abstract description 103
- 238000000034 method Methods 0.000 title claims abstract description 35
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 claims abstract description 82
- 238000006243 chemical reaction Methods 0.000 claims abstract description 26
- 239000007791 liquid phase Substances 0.000 claims abstract description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 24
- 238000004821 distillation Methods 0.000 claims description 16
- 239000000203 mixture Substances 0.000 claims description 12
- 239000007788 liquid Substances 0.000 claims description 9
- 239000007795 chemical reaction product Substances 0.000 claims description 5
- GEWWCWZGHNIUBW-UHFFFAOYSA-N 1-(4-nitrophenyl)propan-2-one Chemical compound CC(=O)CC1=CC=C([N+]([O-])=O)C=C1 GEWWCWZGHNIUBW-UHFFFAOYSA-N 0.000 claims description 3
- 238000010924 continuous production Methods 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 229910052791 calcium Inorganic materials 0.000 claims description 2
- 239000003054 catalyst Substances 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims description 2
- 229910052700 potassium Inorganic materials 0.000 claims description 2
- 229910052708 sodium Inorganic materials 0.000 claims description 2
- 239000007787 solid Substances 0.000 claims 1
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 abstract description 39
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 239000000243 solution Substances 0.000 description 6
- 239000007858 starting material Substances 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000012705 nitroxide-mediated radical polymerization Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000002912 waste gas Substances 0.000 description 2
- 238000010626 work up procedure Methods 0.000 description 2
- BCNBMSZKALBQEF-UHFFFAOYSA-N 1,3-dimethylpyrrolidin-2-one Chemical compound CC1CCN(C)C1=O BCNBMSZKALBQEF-UHFFFAOYSA-N 0.000 description 1
- AXSSJSFXWMOTEN-UHFFFAOYSA-N 1,4-dimethylpyrrolidin-2-one Chemical compound CC1CN(C)C(=O)C1 AXSSJSFXWMOTEN-UHFFFAOYSA-N 0.000 description 1
- SJZRECIVHVDYJC-UHFFFAOYSA-N 4-hydroxybutyric acid Chemical compound OCCCC(O)=O SJZRECIVHVDYJC-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- DHERNFAJQNHYBM-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1.O=C1CCCN1 DHERNFAJQNHYBM-UHFFFAOYSA-N 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000012429 reaction media Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/18—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having one double bond between ring members or between a ring member and a non-ring member
- C07D207/22—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D207/24—Oxygen or sulfur atoms
- C07D207/26—2-Pyrrolidones
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/18—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having one double bond between ring members or between a ring member and a non-ring member
- C07D207/22—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D207/24—Oxygen or sulfur atoms
- C07D207/26—2-Pyrrolidones
- C07D207/263—2-Pyrrolidones with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms
- C07D207/267—2-Pyrrolidones with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to the ring nitrogen atom
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Pyrrole Compounds (AREA)
Description
a)NMPの低い空時収量
b)合成中における多量の水の添加による、特に、蒸留による反応生成物混合物の後処理における高いエネルギーコスト、
c)GBLに対するモノメチルアミンのモル過剰量によって、反応生成物混合物の後処理および未反応のモノメチルアミンの回収における高い技術的費用が生じることによる高い資本経費およびエネルギーコスト、および
d)反応を、WO99/52867で記載されたような、多くの反応工程でおこなう場合の、高い資本経費および操作コストを伴う高い技術的費用。
使用される反応器は、好ましくは、堅型の細型高圧反応器で、この場合、これは、熱交換器の後方に側管で、圧力調節のための圧抜き弁を備えている。供給流は、好ましくは、反応器出口であらかじめ加熱され、したがって、本発明によって定義される反応温度は、反応器中で放出される熱を用いて調整することができる。反応器は、好ましくは逆混合を防止し、かつ、プラグフローの確立を改善するための複数個のシーブトレイを備えている(有効な撹拌容器カスケード)。シーブトレイの数は、たとえば、10〜40個、好ましくは20〜30個であってもよい。
(l反応器=lでの反応器容量、複数個の反応器を使用する場合には、すべての反応器容量のl)
得られた反応器生成物は、反応器から蒸留カラムK1への供給物として連続的に圧抜きされ、その際、反応器からの搬出物のすべてまたは一部分は、最初に熱交換器W2(前記参照)を通過させることによってメチルアミンを加熱し、かつ工程中で冷却される。
純度は、一般には>99質量%、好ましくは>99.5質量%、特に好ましくは>99.8%であった。
温度: 360℃
圧力: 90バール(N2による維持された圧力)
空間速度: GBL1.4kg/(l反応器・h)
GBl:MMAのモル比 1:1.1
廃ガス 20Nl/l
[Nl=標準リットル=STPでの変換される容量;反応器を通しての空間速度 1lの反応器容積および1時間当たりのGBLのKg]。
*)DMP=1,3−ジメチル−2−ピロリドンおよび1,4−ジメチル−2−ピロリドン(α−およびβ−メチル−GBLから形成されるものであって、この場合、これらは、それぞれ使用されたGBL中の不純物として存在する)。
Claims (14)
- γ−ブチロラクトン(GBL)とモノメチルアミン(MMA)とを、液相で反応させることによって、N−メチル−2−ピロリドン(NMP)を連続的に製造するための方法において、GBLおよびMMAを、1:1.08〜1:1.3のモル比で使用し、かつ340〜380℃の温度で、かつ70〜120バールの絶対圧で、1段階で反応させ、該反応後に、反応生成物から最初に水およびモノメチルアミンを金属Na、K、Li、BaまたはCaの水酸化物の存在下で留去し、その後にN−メチル−2−ピロリドンを留去することを特徴とする、N−メチル−2−ピロリドン(NMP)を連続的に製造するための方法。
- 反応を、350℃〜380℃で実施する、請求項1に記載の方法。
- 反応を、80〜110バールの絶対圧で実施する、請求項1または2に記載の方法。
- GBLおよびMMAを、1:1.08〜1:1.2のモル比で使用する、請求項1から3までのいずれか1項に記載の方法。
- 反応を、堅型管式反応器中で実施する、請求項1から4までのいずれか1項に記載の方法。
- 反応をアップフロー様式で実施する、請求項5に記載の方法。
- モノメチルアミンとGBLとを、管式反応器中に、2個の液体噴射器を介して反応器底部に別個に供給する、請求項5または6に記載の方法。
- 反応を、触媒の不在下で実施する、請求項1から7までのいずれか1項に記載の方法。
- 供給混合物が、10質量%未満の水を含有する、請求項1から8までのいずれか1項に記載の方法。
- N−メチル−2−ピロリドンを、蒸留カラムの側面引き抜きから、液体流として単離する、請求項1から9までのいずれか1項に記載の方法。
- N−メチル−2−ピロリドンを、>98%の選択率で製造するための、請求項1から10までのいずれか1項に記載の方法。
- N−メチル−2−ピロリドンを、≧99.5%の純度で製造するための、請求項1から11までのいずれか1項に記載の方法。
- N−メチル−2−ピロリドンを、APHA−色数≦20で製造するための、請求項1から12までのいずれか1項に記載の方法。
- N−メチル−2−ピロリドンを、≧1kg NMP/(h・l反応器)の空時収量で製造するための、請求項1から13までのいずれか1項に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10156885 | 2001-11-20 | ||
PCT/EP2002/012804 WO2003053924A1 (de) | 2001-11-20 | 2002-11-15 | Verfahren zur kontinuierlichen herstellung von n-methyl-2-pyrrolidon (nmp) |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006503793A JP2006503793A (ja) | 2006-02-02 |
JP4404634B2 true JP4404634B2 (ja) | 2010-01-27 |
Family
ID=7706318
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003554641A Expired - Fee Related JP4404634B2 (ja) | 2001-11-20 | 2002-11-15 | N−メチル−2−ピロリドン(nmp)を連続的に製造するための方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US7227029B2 (ja) |
EP (1) | EP1448519B1 (ja) |
JP (1) | JP4404634B2 (ja) |
KR (1) | KR100930153B1 (ja) |
CN (1) | CN100447132C (ja) |
AT (1) | ATE518832T1 (ja) |
AU (1) | AU2002352013A1 (ja) |
WO (1) | WO2003053924A1 (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB0412875D0 (en) * | 2004-06-09 | 2004-07-14 | Davy Process Techn Ltd | Process |
DE102004060654A1 (de) * | 2004-12-16 | 2006-07-06 | Basf Ag | Verfahren zur Reinigung eines Apparates von Ablagerungen aus einem Verfahren zur Rückgewinnung von NMP |
TWI315426B (en) * | 2005-05-10 | 2009-10-01 | Chi Mei Optoelectronics Corp | Method for fabricating liquid crystal display |
WO2007131929A1 (de) * | 2006-05-16 | 2007-11-22 | Basf Se | Verfahren zur kontinuierlichen herstellung von n-ethyl-2-pyrrolidon (nep) |
KR101125853B1 (ko) * | 2009-07-29 | 2012-03-28 | 에스케이종합화학 주식회사 | N-메틸 피롤리돈의 제조방법 |
US9255069B2 (en) | 2012-11-22 | 2016-02-09 | Basf Se | Process for purifying N-alkylpyrrolidones |
US9834491B2 (en) * | 2013-03-20 | 2017-12-05 | Cj Cheiljedang Corporation | Method for producing bio-based homoserine lactone and bio-based organic acid from O-acyl homoserine produced by microorganisms |
CN108026041B (zh) | 2015-07-31 | 2021-08-13 | 科学与工业研究委员会 | 用于选择性生产n-甲基-2-吡咯烷酮(nmp)的改进方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2964535A (en) | 1957-07-22 | 1960-12-13 | Monsanto Chemicals | Purification of nu-methyl pyrrolidone |
DE1795007B2 (de) | 1968-07-27 | 1975-01-23 | Basf Ag, 6700 Ludwigshafen | Verfahren zur kontinuierlichen Herstellung von gamma-Butyrolactam |
US3775431A (en) * | 1970-12-30 | 1973-11-27 | Mobil Oil Corp | Pyrrolidones from ypsilon-butyrolactones using a zeolite catalyst |
US3975499A (en) | 1974-06-05 | 1976-08-17 | Fmc Corporation | Sodium carbonate monohydrate crystallization |
BE1012013A6 (fr) * | 1998-04-09 | 2000-04-06 | Pantochim Sa | Procede de production de n-methylpyrrolidone. |
JP4036580B2 (ja) | 1998-11-24 | 2008-01-23 | 三菱化学株式会社 | N−アルキル−2−ピロリドンの製造方法 |
-
2002
- 2002-11-15 WO PCT/EP2002/012804 patent/WO2003053924A1/de active Application Filing
- 2002-11-15 EP EP02787689A patent/EP1448519B1/de not_active Expired - Lifetime
- 2002-11-15 US US10/495,358 patent/US7227029B2/en not_active Expired - Lifetime
- 2002-11-15 CN CNB028230795A patent/CN100447132C/zh not_active Expired - Fee Related
- 2002-11-15 KR KR1020047007603A patent/KR100930153B1/ko not_active IP Right Cessation
- 2002-11-15 AU AU2002352013A patent/AU2002352013A1/en not_active Abandoned
- 2002-11-15 JP JP2003554641A patent/JP4404634B2/ja not_active Expired - Fee Related
- 2002-11-15 AT AT02787689T patent/ATE518832T1/de active
Also Published As
Publication number | Publication date |
---|---|
AU2002352013A1 (en) | 2003-07-09 |
EP1448519A1 (de) | 2004-08-25 |
ATE518832T1 (de) | 2011-08-15 |
EP1448519B1 (de) | 2011-08-03 |
JP2006503793A (ja) | 2006-02-02 |
US7227029B2 (en) | 2007-06-05 |
CN1871213A (zh) | 2006-11-29 |
CN100447132C (zh) | 2008-12-31 |
WO2003053924A1 (de) | 2003-07-03 |
KR20040058298A (ko) | 2004-07-03 |
US20050010057A1 (en) | 2005-01-13 |
KR100930153B1 (ko) | 2009-12-07 |
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