JP4480408B2 - Coating composition for silver plating and method for producing the same - Google Patents
Coating composition for silver plating and method for producing the same Download PDFInfo
- Publication number
- JP4480408B2 JP4480408B2 JP2004020875A JP2004020875A JP4480408B2 JP 4480408 B2 JP4480408 B2 JP 4480408B2 JP 2004020875 A JP2004020875 A JP 2004020875A JP 2004020875 A JP2004020875 A JP 2004020875A JP 4480408 B2 JP4480408 B2 JP 4480408B2
- Authority
- JP
- Japan
- Prior art keywords
- mass
- silver plating
- parts
- coating composition
- acrylate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 229910052709 silver Inorganic materials 0.000 title claims description 75
- 239000004332 silver Substances 0.000 title claims description 75
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 title claims description 73
- 238000007747 plating Methods 0.000 title claims description 68
- 239000008199 coating composition Substances 0.000 title claims description 36
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 238000000034 method Methods 0.000 claims description 32
- 150000001875 compounds Chemical class 0.000 claims description 26
- -1 silane compound Chemical class 0.000 claims description 26
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 20
- 229910000077 silane Inorganic materials 0.000 claims description 19
- 239000000178 monomer Substances 0.000 claims description 15
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 14
- 239000011203 carbon fibre reinforced carbon Substances 0.000 claims description 11
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 claims description 9
- 239000000126 substance Substances 0.000 claims description 9
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 8
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 claims description 8
- MHCLJIVVJQQNKQ-UHFFFAOYSA-N ethyl carbamate;2-methylprop-2-enoic acid Chemical compound CCOC(N)=O.CC(=C)C(O)=O MHCLJIVVJQQNKQ-UHFFFAOYSA-N 0.000 claims description 7
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 claims description 3
- KFBZMTTVQSMDGF-UHFFFAOYSA-N [C].[C].[O].[O] Chemical compound [C].[C].[O].[O] KFBZMTTVQSMDGF-UHFFFAOYSA-N 0.000 claims 1
- 150000001723 carbon free-radicals Chemical class 0.000 claims 1
- 230000003301 hydrolyzing effect Effects 0.000 claims 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 90
- 239000011248 coating agent Substances 0.000 description 28
- 238000000576 coating method Methods 0.000 description 25
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 24
- 239000000758 substrate Substances 0.000 description 13
- 239000000203 mixture Substances 0.000 description 12
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 238000006460 hydrolysis reaction Methods 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- 239000007864 aqueous solution Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- HIVQCJOGAHNXBO-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] propanoate Chemical compound CCC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C HIVQCJOGAHNXBO-UHFFFAOYSA-N 0.000 description 5
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 4
- 230000032683 aging Effects 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 4
- 230000007062 hydrolysis Effects 0.000 description 4
- 239000003999 initiator Substances 0.000 description 4
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- GTELLNMUWNJXMQ-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical class OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCC(CO)(CO)CO GTELLNMUWNJXMQ-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000008119 colloidal silica Substances 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 150000004756 silanes Chemical class 0.000 description 3
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 3
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 2
- RZVINYQDSSQUKO-UHFFFAOYSA-N 2-phenoxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC1=CC=CC=C1 RZVINYQDSSQUKO-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- LOSLJXKHQKRRFN-UHFFFAOYSA-N 2-trimethoxysilylethanethiol Chemical compound CO[Si](OC)(OC)CCS LOSLJXKHQKRRFN-UHFFFAOYSA-N 0.000 description 2
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical class C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 2
- 229920000298 Cellophane Polymers 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 2
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 2
- 239000003377 acid catalyst Substances 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 230000001588 bifunctional effect Effects 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 229940015043 glyoxal Drugs 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 2
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- 229910001961 silver nitrate Inorganic materials 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 239000001119 stannous chloride Substances 0.000 description 2
- 235000011150 stannous chloride Nutrition 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- ICCCRCJXHNMZPJ-UHFFFAOYSA-N (2,2-dimethyl-3-prop-2-enoyloxypropyl) 2,2-dimethyl-3-prop-2-enoyloxypropanoate Chemical compound C=CC(=O)OCC(C)(C)COC(=O)C(C)(C)COC(=O)C=C ICCCRCJXHNMZPJ-UHFFFAOYSA-N 0.000 description 1
- MXFQRSUWYYSPOC-UHFFFAOYSA-N (2,2-dimethyl-3-prop-2-enoyloxypropyl) prop-2-enoate Chemical class C=CC(=O)OCC(C)(C)COC(=O)C=C MXFQRSUWYYSPOC-UHFFFAOYSA-N 0.000 description 1
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- STFXXRRQKFUYEU-UHFFFAOYSA-N 16-methylheptadecyl prop-2-enoate Chemical compound CC(C)CCCCCCCCCCCCCCCOC(=O)C=C STFXXRRQKFUYEU-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- PUGOMSLRUSTQGV-UHFFFAOYSA-N 2,3-di(prop-2-enoyloxy)propyl prop-2-enoate Chemical compound C=CC(=O)OCC(OC(=O)C=C)COC(=O)C=C PUGOMSLRUSTQGV-UHFFFAOYSA-N 0.000 description 1
- FTALTLPZDVFJSS-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl prop-2-enoate Chemical compound CCOCCOCCOC(=O)C=C FTALTLPZDVFJSS-UHFFFAOYSA-N 0.000 description 1
- UHJNUFLFKAZWLN-UHFFFAOYSA-N 2-(2-hydroxyethoxy)-2-phenoxyethanol;prop-2-enoic acid Chemical compound OC(=O)C=C.OCCOC(CO)OC1=CC=CC=C1 UHJNUFLFKAZWLN-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- WMYINDVYGQKYMI-UHFFFAOYSA-N 2-[2,2-bis(hydroxymethyl)butoxymethyl]-2-ethylpropane-1,3-diol Chemical compound CCC(CO)(CO)COCC(CC)(CO)CO WMYINDVYGQKYMI-UHFFFAOYSA-N 0.000 description 1
- YIJYFLXQHDOQGW-UHFFFAOYSA-N 2-[2,4,6-trioxo-3,5-bis(2-prop-2-enoyloxyethyl)-1,3,5-triazinan-1-yl]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCN1C(=O)N(CCOC(=O)C=C)C(=O)N(CCOC(=O)C=C)C1=O YIJYFLXQHDOQGW-UHFFFAOYSA-N 0.000 description 1
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- POYODSZSSBWJPD-UHFFFAOYSA-N 2-methylprop-2-enoyloxy 2-methylprop-2-eneperoxoate Chemical compound CC(=C)C(=O)OOOC(=O)C(C)=C POYODSZSSBWJPD-UHFFFAOYSA-N 0.000 description 1
- CEXQWAAGPPNOQF-UHFFFAOYSA-N 2-phenoxyethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOC1=CC=CC=C1 CEXQWAAGPPNOQF-UHFFFAOYSA-N 0.000 description 1
- ROPDSOYFYJCSTC-UHFFFAOYSA-N 2-phenoxyundecyl prop-2-enoate Chemical compound CCCCCCCCCC(COC(=O)C=C)OC1=CC=CC=C1 ROPDSOYFYJCSTC-UHFFFAOYSA-N 0.000 description 1
- DVNPFNZTPMWRAX-UHFFFAOYSA-N 2-triethoxysilylethanethiol Chemical compound CCO[Si](CCS)(OCC)OCC DVNPFNZTPMWRAX-UHFFFAOYSA-N 0.000 description 1
- WUGOQZFPNUYUOO-UHFFFAOYSA-N 2-trimethylsilyloxyethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCO[Si](C)(C)C WUGOQZFPNUYUOO-UHFFFAOYSA-N 0.000 description 1
- UZEBPNPRXOYGRA-UHFFFAOYSA-N 2-tripropoxysilylethanethiol Chemical compound CCCO[Si](CCS)(OCCC)OCCC UZEBPNPRXOYGRA-UHFFFAOYSA-N 0.000 description 1
- MBNRBJNIYVXSQV-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propane-1-thiol Chemical compound CCO[Si](C)(OCC)CCCS MBNRBJNIYVXSQV-UHFFFAOYSA-N 0.000 description 1
- FLWMEHLBSCPGGE-UHFFFAOYSA-N 3-[dimethoxy(3-sulfanylpropyl)silyl]propane-1-thiol Chemical compound SCCC[Si](OC)(CCCS)OC FLWMEHLBSCPGGE-UHFFFAOYSA-N 0.000 description 1
- DQMRXALBJIVORP-UHFFFAOYSA-N 3-[methoxy(dimethyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(C)CCCS DQMRXALBJIVORP-UHFFFAOYSA-N 0.000 description 1
- XDCGSTLSPDXKSP-UHFFFAOYSA-N 3-[methoxy-bis(3-sulfanylpropyl)silyl]propane-1-thiol Chemical compound SCCC[Si](OC)(CCCS)CCCS XDCGSTLSPDXKSP-UHFFFAOYSA-N 0.000 description 1
- VZWVCGZPKYRUAR-UHFFFAOYSA-N 3-[methyl(dipropoxy)silyl]propane-1-thiol Chemical compound CCCO[Si](C)(CCCS)OCCC VZWVCGZPKYRUAR-UHFFFAOYSA-N 0.000 description 1
- FQMIAEWUVYWVNB-UHFFFAOYSA-N 3-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OC(C)CCOC(=O)C=C FQMIAEWUVYWVNB-UHFFFAOYSA-N 0.000 description 1
- CYUZOYPRAQASLN-UHFFFAOYSA-N 3-prop-2-enoyloxypropanoic acid Chemical compound OC(=O)CCOC(=O)C=C CYUZOYPRAQASLN-UHFFFAOYSA-N 0.000 description 1
- DECHJJJXDGPZHY-UHFFFAOYSA-N 3-tripropoxysilylpropane-1-thiol Chemical compound CCCO[Si](CCCS)(OCCC)OCCC DECHJJJXDGPZHY-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- XOJWAAUYNWGQAU-UHFFFAOYSA-N 4-(2-methylprop-2-enoyloxy)butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCOC(=O)C(C)=C XOJWAAUYNWGQAU-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 1
- NDWUBGAGUCISDV-UHFFFAOYSA-N 4-hydroxybutyl prop-2-enoate Chemical compound OCCCCOC(=O)C=C NDWUBGAGUCISDV-UHFFFAOYSA-N 0.000 description 1
- LMAFAQBMCIYHQS-UHFFFAOYSA-N 4-trimethoxysilylbutane-1-thiol Chemical compound CO[Si](OC)(OC)CCCCS LMAFAQBMCIYHQS-UHFFFAOYSA-N 0.000 description 1
- JRYUZCLLNMIMQM-UHFFFAOYSA-N 4-tripropoxysilylbutane-1-thiol Chemical compound CCCO[Si](OCCC)(OCCC)CCCCS JRYUZCLLNMIMQM-UHFFFAOYSA-N 0.000 description 1
- DXPPIEDUBFUSEZ-UHFFFAOYSA-N 6-methylheptyl prop-2-enoate Chemical compound CC(C)CCCCCOC(=O)C=C DXPPIEDUBFUSEZ-UHFFFAOYSA-N 0.000 description 1
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- FOGPUYQJHBRRGZ-UHFFFAOYSA-N C(C=C)(=O)O.COC=CC Chemical compound C(C=C)(=O)O.COC=CC FOGPUYQJHBRRGZ-UHFFFAOYSA-N 0.000 description 1
- DQIXHGYTAMVXNS-UHFFFAOYSA-N C(C=C)(=O)OCC(C)O.C1(C2C(C(=O)O1)CCC=C2)=O Chemical compound C(C=C)(=O)OCC(C)O.C1(C2C(C(=O)O1)CCC=C2)=O DQIXHGYTAMVXNS-UHFFFAOYSA-N 0.000 description 1
- CQZSHNXRJKOXNO-UHFFFAOYSA-N C(C=C)(=O)OCC(C)O.C1(C2C(C(=O)O1)CCCC2)=O Chemical compound C(C=C)(=O)OCC(C)O.C1(C2C(C(=O)O1)CCCC2)=O CQZSHNXRJKOXNO-UHFFFAOYSA-N 0.000 description 1
- VYXPAGCFZXCCMR-UHFFFAOYSA-N C(C=C)(=O)OCC(CCCC)CC.C1(C=2C(C(=O)O1)=CC=CC2)=O Chemical compound C(C=C)(=O)OCC(CCCC)CC.C1(C=2C(C(=O)O1)=CC=CC2)=O VYXPAGCFZXCCMR-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- LCXXNKZQVOXMEH-UHFFFAOYSA-N Tetrahydrofurfuryl methacrylate Chemical compound CC(=C)C(=O)OCC1CCCO1 LCXXNKZQVOXMEH-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- LFOXEOLGJPJZAA-UHFFFAOYSA-N [(2,6-dimethoxybenzoyl)-(2,4,4-trimethylpentyl)phosphoryl]-(2,6-dimethoxyphenyl)methanone Chemical compound COC1=CC=CC(OC)=C1C(=O)P(=O)(CC(C)CC(C)(C)C)C(=O)C1=C(OC)C=CC=C1OC LFOXEOLGJPJZAA-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- SUJXBUNMDOEWOG-UHFFFAOYSA-N [2-hydroxy-3-[6-(2-hydroxy-3-prop-2-enoyloxypropoxy)hexoxy]propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(O)COCCCCCCOCC(O)COC(=O)C=C SUJXBUNMDOEWOG-UHFFFAOYSA-N 0.000 description 1
- KNSXNCFKSZZHEA-UHFFFAOYSA-N [3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical class C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C KNSXNCFKSZZHEA-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- FHLPGTXWCFQMIU-UHFFFAOYSA-N [4-[2-(4-prop-2-enoyloxyphenyl)propan-2-yl]phenyl] prop-2-enoate Chemical class C=1C=C(OC(=O)C=C)C=CC=1C(C)(C)C1=CC=C(OC(=O)C=C)C=C1 FHLPGTXWCFQMIU-UHFFFAOYSA-N 0.000 description 1
- QWYSJTTWCUXHQO-UHFFFAOYSA-N [F].OC(=O)C=C Chemical compound [F].OC(=O)C=C QWYSJTTWCUXHQO-UHFFFAOYSA-N 0.000 description 1
- GUCYFKSBFREPBC-UHFFFAOYSA-N [phenyl-(2,4,6-trimethylbenzoyl)phosphoryl]-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C(=O)C1=C(C)C=C(C)C=C1C GUCYFKSBFREPBC-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- VEBCLRKUSAGCDF-UHFFFAOYSA-N ac1mi23b Chemical compound C1C2C3C(COC(=O)C=C)CCC3C1C(COC(=O)C=C)C2 VEBCLRKUSAGCDF-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- BAPJBEWLBFYGME-UHFFFAOYSA-N acrylic acid methyl ester Natural products COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 1
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 1
- WQZGKKKJIJFFOK-VFUOTHLCSA-N beta-D-glucose Chemical compound OC[C@H]1O[C@@H](O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-VFUOTHLCSA-N 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- QUZSUMLPWDHKCJ-UHFFFAOYSA-N bisphenol A dimethacrylate Chemical class C1=CC(OC(=O)C(=C)C)=CC=C1C(C)(C)C1=CC=C(OC(=O)C(C)=C)C=C1 QUZSUMLPWDHKCJ-UHFFFAOYSA-N 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- KQAHMVLQCSALSX-UHFFFAOYSA-N decyl(trimethoxy)silane Chemical compound CCCCCCCCCC[Si](OC)(OC)OC KQAHMVLQCSALSX-UHFFFAOYSA-N 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 description 1
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- ZZNQQQWFKKTOSD-UHFFFAOYSA-N diethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)C1=CC=CC=C1 ZZNQQQWFKKTOSD-UHFFFAOYSA-N 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 1
- YQGOWXYZDLJBFL-UHFFFAOYSA-N dimethoxysilane Chemical compound CO[SiH2]OC YQGOWXYZDLJBFL-UHFFFAOYSA-N 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 150000004662 dithiols Chemical class 0.000 description 1
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000008103 glucose Substances 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- 239000005048 methyldichlorosilane Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000005054 phenyltrichlorosilane Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 150000003378 silver Chemical class 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- YPNVIBVEFVRZPJ-UHFFFAOYSA-L silver sulfate Chemical compound [Ag+].[Ag+].[O-]S([O-])(=O)=O YPNVIBVEFVRZPJ-UHFFFAOYSA-L 0.000 description 1
- 229910000367 silver sulfate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical group S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 1
- MUTNCGKQJGXKEM-UHFFFAOYSA-N tamibarotene Chemical compound C=1C=C2C(C)(C)CCC(C)(C)C2=CC=1NC(=O)C1=CC=C(C(O)=O)C=C1 MUTNCGKQJGXKEM-UHFFFAOYSA-N 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- WEAZWKYSTGLBSQ-UHFFFAOYSA-N tributylsilyl 2-methylprop-2-enoate Chemical compound CCCC[Si](CCCC)(CCCC)OC(=O)C(C)=C WEAZWKYSTGLBSQ-UHFFFAOYSA-N 0.000 description 1
- LFXJGGDONSCPOF-UHFFFAOYSA-N trichloro(hexyl)silane Chemical class CCCCCC[Si](Cl)(Cl)Cl LFXJGGDONSCPOF-UHFFFAOYSA-N 0.000 description 1
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 1
- WUMSTCDLAYQDNO-UHFFFAOYSA-N triethoxy(hexyl)silane Chemical compound CCCCCC[Si](OCC)(OCC)OCC WUMSTCDLAYQDNO-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Paints Or Removers (AREA)
Description
本発明はコーティング膜の硬度と銀メッキ膜との密着性、透明性に優れる紫外線硬化性の銀メッキ用コーティング組成物及びその製造方法に関する。 The present invention relates to an ultraviolet curable coating composition for silver plating, which is excellent in the hardness of the coating film, the adhesion between the silver plating film and the transparency, and a method for producing the same.
銀鏡反応を利用する化学メッキ法は、従来からよく知られた方法であり、簡易な方法により銀メッキ膜が得られることから、種々の薬剤、方法の改良が重ねられている。例えば、基材に積層されたアンダーコート層と呼ばれるプライマー層と、銀鏡反応によりプライマー層に積層された銀メッキ層と、銀メッキ層に積層されたトップコート層の3層構造とすることで、意匠性の高い銀メッキ積層体を得る方法が開示されている。(例えば、特許文献1、特許文献2参照)
しかしながら、この様な方法により得られる銀メッキ積層体は、各層間の密着性が不充分であり、また、トップコート層の硬度も不充分であるため、限られた用途しか適用できないという問題があった。更に、アンダーコート層、トップコート層の硬化に時間を要することから、製造効率も悪いという問題があった。
The chemical plating method using the silver mirror reaction is a well-known method from the past. Since a silver plating film can be obtained by a simple method, various chemicals and methods have been improved. For example, by having a three-layer structure of a primer layer called an undercoat layer laminated on a base material, a silver plating layer laminated on the primer layer by a silver mirror reaction, and a top coat layer laminated on the silver plating layer, A method for obtaining a silver-plated laminate with high designability is disclosed. (For example, see Patent Document 1 and Patent Document 2)
However, the silver-plated laminate obtained by such a method has a problem that the adhesion between the layers is insufficient and the hardness of the topcoat layer is insufficient, so that only limited applications can be applied. there were. Furthermore, since it takes time to cure the undercoat layer and the topcoat layer, there is a problem that the production efficiency is also poor.
この様な状況の中で、被膜の硬度と硬化速度の問題に関しては、紫外線硬化性の樹脂を使用する方法が提案されている。例えば、紫外線硬化性樹脂にコロイド状シリカを配合する方法により、高い硬度の被膜を得る方法が開示されている。(例えば、特許文献3参照)
しかし、特許文献3記載の方法によれば、紫外線硬化性樹脂中でコロイド状シリカが凝集し、これによって硬化被膜にヘーズを生じ易いという問題がある。
In such a situation, a method using an ultraviolet curable resin has been proposed for the problem of the hardness and the curing speed of the coating. For example, a method of obtaining a high hardness film by a method of blending colloidal silica with an ultraviolet curable resin is disclosed. (For example, see Patent Document 3)
However, according to the method described in Patent Document 3, there is a problem that colloidal silica aggregates in the ultraviolet curable resin, thereby causing haze in the cured coating.
この様な問題を解決するため、紫外線によって硬化する多官能性化合物にメルカプトシランで表面修飾されたコロイド状シリカを配合した紫外線硬化性の被膜用組成物を得る方法が開示されている。(例えば、特許文献4参照)
この方法によれば、このメルカプトシラン修飾コロイド状シリカは、表面のメルカプト基によって多官能性化合物との相溶性が改善される為、硬化塗膜の硬度、透明性が向上するということを明らかにしている。
しかし、この技術は主に塗膜の耐磨耗性と透明性を改善するものであり、塗膜とメッキ膜等の金属との密着性を改善する技術に関しては提案されていない。更に、引用文献4の技術を銀メッキ用のコーティング組成物として適用しても、銀メッキ膜からの剥れ即ち、密着性は改善されない。また、そのコーティング組成物の外観に関しても、やや白味を帯びた銀メッキ膜となるので好ましくない。
In order to solve such problems, a method for obtaining an ultraviolet curable coating composition in which colloidal silica surface-modified with mercaptosilane is blended with a polyfunctional compound that is cured by ultraviolet rays is disclosed. (For example, see Patent Document 4)
According to this method, this mercaptosilane-modified colloidal silica has been found to improve the hardness and transparency of the cured coating because the compatibility with the polyfunctional compound is improved by the mercapto group on the surface. ing.
However, this technique mainly improves the abrasion resistance and transparency of the coating film, and no technique has been proposed for improving the adhesion between the coating film and a metal such as a plating film. Furthermore, even if the technique of the cited document 4 is applied as a coating composition for silver plating, peeling from the silver plating film, that is, adhesion is not improved. Also, the appearance of the coating composition is not preferable because the silver plating film is slightly white.
前述のような問題を解消するため即ち、銀メッキ用コーティング膜の密着性、硬度に優れ、また膜形成時の硬化速度が速く、美観の優れた銀メッキ膜が得られ、銀メッキ用のアンダーコート層、トップコート層の何れにも適用できる銀メッキ用のコーティング組成物を得ることを目的に、本発明者らは鋭意検討を重ねた。 In order to solve the above-mentioned problems, that is, the adhesion and hardness of the coating film for silver plating are excellent, the curing rate at the time of film formation is high, and a silver plating film with excellent aesthetics can be obtained. In order to obtain a coating composition for silver plating that can be applied to both the coat layer and the top coat layer, the present inventors have made extensive studies.
その結果、テトラアルコキシシランまたはその部分縮合物と、メルカプト基を有するシラン化合物と、少なくとも一つ以上の炭素−炭素二重結合を有するラジカル重合性化合物との反応により得られる樹脂組成物が、前述の課題を解決する優れた銀メッキ用のコーティング組成物として使用できることを見出し、係る知見に基づき本発明を完成させたものである。 As a result, the resin composition obtained by the reaction of tetraalkoxysilane or a partial condensate thereof, a silane compound having a mercapto group, and a radical polymerizable compound having at least one carbon-carbon double bond is described above. It has been found that the present invention can be used as an excellent coating composition for silver plating that solves the above problem, and the present invention has been completed based on such knowledge.
即ち、本発明は、下記一般式(化1)で表されるテトラアルコキシシランまたはその部分縮合物(a)とメルカプト基を有するシラン化合物(b)とを反応させた後、これに少なくとも一つ以上の炭素−炭素二重結合を有するラジカル重合性化合物(c)を添加する、または(a)と(b)をそれぞれ、または共に加水分解反応させた後、これに(c)を添加することを特徴とする銀メッキ用コーティング組成物の製造方法に関する。
That is, in the present invention, after reacting a tetraalkoxysilane represented by the following general formula (Chemical Formula 1) or a partial condensate thereof (a) with a silane compound (b) having a mercapto group, at least one of them is reacted. Add the radically polymerizable compound (c) having the above carbon-carbon double bond , or hydrolyze (a) and (b), or together, and then add (c) to this. The manufacturing method of the coating composition for silver plating characterized by these .
更に本発明は、上記製造方法によって得られる銀メッキ用コーティング組成物に関する。
Furthermore, this invention relates to the coating composition for silver plating obtained by the said manufacturing method .
本発明の銀メッキ用コーティング組成物は、ラジカル重合性化合物(c)に、テトラアルコキシシランまたはその部分縮合物(a)とメルカプト基を有するシラン化合物(b)の両方が反応していることで、コーティング膜の密着性が格段に優れたものとなる。また、この銀メッキ用コーティング組成物をアンダーコート層として用いた場合には、シリカゾルを使用したような場合と比べ、テトラアルコキシシランまたはその部分縮合物(a)の使用は、銀メッキ膜との密着性を向上させ、より優れた美観を有する銀メッキ膜を作成することができる。
また、本発明の銀メッキ用コーティング組成物は、膜の密着性、硬度に優れ、膜形成時の硬化速度が速く、膜の透明性に優れることから、銀メッキ用のアンダーコート層、トップコート層の何れにも適用できるという利点を有する。
The coating composition for silver plating of the present invention is such that both the tetraalkoxysilane or its partial condensate (a) and the silane compound (b) having a mercapto group react with the radical polymerizable compound (c). The adhesion of the coating film is remarkably excellent. In addition, when this silver plating coating composition is used as an undercoat layer, the use of tetraalkoxysilane or a partial condensate thereof (a) is more effective than the case where a silica sol is used. The silver plating film which improves adhesiveness and has the more outstanding aesthetics can be created.
In addition, since the coating composition for silver plating of the present invention is excellent in film adhesion and hardness, has a fast curing speed during film formation, and is excellent in film transparency, the undercoat layer and top coat for silver plating It has the advantage that it can be applied to any of the layers.
本発明組成物の第1の成分は、テトラアルコキシシランまたはその部分縮合物(a)であり、下記一般式(化2)で表される化合物である。 The first component of the composition of the present invention is tetraalkoxysilane or a partial condensate (a) thereof, which is a compound represented by the following general formula (Formula 2).
この様なテトラアルコキシシランまたはその部分縮合物としては、例えば、テトラメトキシシラン、テトラエトキシシラン、テトラプロポキシシラン、テトラブトキシシラン等が挙げられる。また、テトラアルコキシシランの部分縮合物としては、例えば、シリケート40(多摩化学工業(株)製)、Mシリケート51(多摩化学工業(株)製)等が挙げられる。また、本発明では、これらの中から選ばれる化合物の1種または複数種を組合せて使用することもできる。
更に、本発明ではこれらテトラアルコキシシランまたはその部分縮合物の内、テトラアルコキシシランの部分縮合物であるシリケート40またはMシリケート51の使用が、反応性、コーティング膜強度の面で最も好適である。
Examples of such tetraalkoxysilane or a partial condensate thereof include tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, and tetrabutoxysilane. Examples of the partial condensate of tetraalkoxysilane include silicate 40 (manufactured by Tama Chemical Industry Co., Ltd.), M silicate 51 (manufactured by Tama Chemical Industry Co., Ltd.), and the like. In the present invention, one or more compounds selected from these may be used in combination.
Further, in the present invention, of these tetraalkoxysilanes or partial condensates thereof, use of silicate 40 or M silicate 51, which is a partial condensate of tetraalkoxysilane, is most preferable in terms of reactivity and coating film strength.
次に、本発明組成物の第2成分は、メルカプト基を有するシラン化合物(b)であり、下記一般式(化3)で表されるものを使用することが好ましい。 Next, the 2nd component of this invention composition is a silane compound (b) which has a mercapto group, and it is preferable to use what is represented by the following general formula (Formula 3).
この一般式(化3)で表されるシラン化合物(b)としては、例えば、3-メルカプトプロピルトリメトキシシラン、3-メルカプトプロピルトリエトキシシラン、3-メルカプトプロピルトリプロポキシシラン、3-メルカプトプロピルメチルジメトキシシラン、3-メルカプトプロピルメチルジエトキシシラン、3-メルカプトプロピルメチルジプロポキシシラン、3-メルカプトプロピルジメチルメトキシシラン、4-メルカプトブチルトリメトキシシラン、4-メルカプトブチルトリエトキシラン、4-メルカプトブチルトリプロポキシシラン、2-メルカプトエチルトリメトキシシラン、2-メルカプトエチルトリエトキシシラン、2-メルカプトエチルトリプロポキシシラン、ビス(3-メルカプトプロピル)ジメトキシシラン、トリス(3-メルカプトプロピル)メトキシシラン等が挙げられる。また、これらの化合物は、化合物の1種または複数種を組合せて使用することもできる。
本発明ではこれらシラン化合物の内、3-メルカプトプロピルトリメトキシシラン、3-メルカプトプロピルトリエトキシシランの使用が、反応性、コーティング膜強度の面で最も好適である。
Examples of the silane compound (b) represented by the general formula (Chemical Formula 3) include 3-mercaptopropyltrimethoxysilane, 3-mercaptopropyltriethoxysilane, 3-mercaptopropyltripropoxysilane, and 3-mercaptopropylmethyl. Dimethoxysilane, 3-mercaptopropylmethyldiethoxysilane, 3-mercaptopropylmethyldipropoxysilane, 3-mercaptopropyldimethylmethoxysilane, 4-mercaptobutyltrimethoxysilane, 4-mercaptobutyltriethoxylane, 4-mercaptobutyltri Propoxysilane, 2-mercaptoethyltrimethoxysilane, 2-mercaptoethyltriethoxysilane, 2-mercaptoethyltripropoxysilane, bis (3-mercaptopropyl) dimethoxysilane, tris (3-mercaptopropyl) methoxy Silane etc. are mentioned. Moreover, these compounds can also be used combining 1 type or multiple types of a compound.
In the present invention, among these silane compounds, use of 3-mercaptopropyltrimethoxysilane and 3-mercaptopropyltriethoxysilane is most preferable in terms of reactivity and coating film strength.
次に、本発明の第3の成分は、少なくとも一つ以上の炭素−炭素二重結合を有するラジカル重合性化合物(c)である。この化合物の一分子内の炭素−炭素二重結合の数は一つ以上であるが、この二重結合数が増えるに従い、反応により形成される膜の硬度は高くなる反面、膜が脆くなる傾向にある。
従って、炭素−炭素二重結合の数は、3〜6であることが最も好ましい。
しかし、形成する膜に柔軟性を付与するためには、炭素−炭素二重結合の数が1〜2のラジカル重合性化合物を併用すればよい。
Next, the third component of the present invention is a radical polymerizable compound (c) having at least one or more carbon-carbon double bonds. Although the number of carbon-carbon double bonds in one molecule of this compound is one or more, the hardness of the film formed by the reaction increases as the number of double bonds increases, but the film tends to become brittle. It is in.
Therefore, the number of carbon-carbon double bonds is most preferably 3-6.
However, in order to impart flexibility to the film to be formed, a radical polymerizable compound having 1 to 2 carbon-carbon double bonds may be used in combination.
この様なラジカル重合性化合物としては、アクリレートモノマー、メタクリレートモノマー、エポキシアクリレートオリゴマー、エポキシメタクリレートオリゴマー、ウレタンアクリレートオリゴマー、ウレタンメタクリレートオリゴマー、シリコーンアクリレートオリゴマー、シリコーンメタクリレートオリゴマー等が挙げられる。
しかし、これらラジカル重合性化合物の中で、アクリレートモノマー、メタクリレートモノマー、ウレタンアクリレートオリゴマー、ウレタンメタクリレートオリゴマーの使用が、本発明コーティング組成物の性能を発揮する上で最も好適である。
アクリレートモノマーとメタクリレートモノマーは、炭素−炭素二重結合、ウレタンアクリレートオリゴマー、ウレタンメタクリレートオリゴマーは、炭素−炭素二重結合とウレタン結合を有するが、これ以外に種々の官能基、結合をさらに有していてもよい。この様な種々の官能基、結合としては、例えば、水酸基、カルボキシル基、フェニル基、チオール基、リン酸基、エポキシ基、ハロゲン、エーテル結合、エステル結合等が挙げられる。
Examples of such radically polymerizable compounds include acrylate monomers, methacrylate monomers, epoxy acrylate oligomers, epoxy methacrylate oligomers, urethane acrylate oligomers, urethane methacrylate oligomers, silicone acrylate oligomers, and silicone methacrylate oligomers.
However, among these radically polymerizable compounds, the use of an acrylate monomer, a methacrylate monomer, a urethane acrylate oligomer, and a urethane methacrylate oligomer is most suitable for exerting the performance of the coating composition of the present invention.
The acrylate monomer and methacrylate monomer have carbon-carbon double bonds, urethane acrylate oligomers, and urethane methacrylate oligomers have carbon-carbon double bonds and urethane bonds, but additionally have various functional groups and bonds. May be. Examples of such various functional groups and bonds include a hydroxyl group, a carboxyl group, a phenyl group, a thiol group, a phosphate group, an epoxy group, a halogen, an ether bond, and an ester bond.
本発明で使用できるアクリレートモノマー、メタクリレートモノマー、ウレタンアクリレートオリゴマー、ウレタンメタクリレートオリゴマーの一例を以下に示す。
アクリレートモノマーとしては、2-エチルへキシルアクリレート、ラウリルアクリレート、イソオクチルアクリレート、イソステアリルアクリレート、シクロへキシルアクリレート、トリシクロデカニルアクリレート、トリシクロデカニルオキシエチルアクリレート、イソボロニルアクリレート、エチルカルビトールアクリレート、2-エチルヘキシルカルビトールアクリレート、メトキシプロピレンモノアクリレート、テトラヒドロフルフリルアクリレート、2-ヒドロキシエチルアクリレート、2-ヒドロキシプロピルアクリレート、4-ヒドロキシブチルアクリレート、ベンジルアクリレート、2-フェノキシエチルアクリレート、2-フェノキシジエチレングリコールアクリレート、ノニルフェノキシエチルアクリレート、2-ヒドロキシ-3-フェノキシエチルアクリレート、無水フタル酸-2-エチルへキシルアクリレート付加物、無水テトラヒドロフタル酸-2-ヒドロキシプロピルアクリレート付加物、無水ヘキサヒドロフタル酸-2-ヒドロキシプロピルアクリレート付加物、1,3-ブタンジオールジアクリレート、1,4-ブタンジアクリレート、エチレングリコールジアクリレート、ポリエチレングリコールジアクリレート、エトキシ化ビスフェノールAジアクリレート、エトキシ化ビスフェノールFジアクリレート、エトキシ化1,6-へキサンジオールジアクリレート、プロポキシ化1,6-へキサンジオールジアクリレート、エトキシ化ネオペンチルグリコールジアクリレート、ネオペンチルグリコールジアクリレート、トリシクロデカンジメタノールジアクリレート、1,6-ヘキサンジイルビス[オキシ(2-ヒドロキシプロパン-1,3ジイル)]ジアクリレート、[2-[1,1-ジメチル-2-アクリロイロキシエチル]-5-エチル-1,3-ジオキサン-5-イル]メチルアクリレート、3-[2,2-ジメチル-1-オキソ-3-アクリロイロキシプロポキシ]-2,2-ジメチルプロピルアクリレート、トリス(2-ヒドロキシエチル)イソシアヌレ−トトリアクリレート、エトキシ化トリメチロールプロパントリアクリレート、ペンタエリスリトールトリアクリレート、エトキシ化トリメチロールプロパントリアクリレート、トリメチロールプロパントリアクリレート、プロポキシ化トリメチロールプロパントリアクリレート、エトキシ化トリメチロールプロパントリアクリレート、プロポキシ化グリセリルトリアクリレート、ペンタエリスリトールテトラアクリレート、ジトリメチロールプロパンテトラアクリレート、ジペンタエリスリトールヒドロキシペンタアクリレート、エトキシ化ペンタエリスリトールテトラアクリレート、ジペンタエリスリトールペンタアクリート、ジペンタエリスリトールトリアクリート、ジペンタエリスリトールヘキサアクリート、2-イソシアン酸エチルアクリレート、イミドアクリレート、ビスフェノールSジチオールアクリレート、テトラブロモビスフェノールAアクリレート、フッ素アクリレート、トリスアクリロイロキシエチルフォスファート、3-アクリロイロキシプロパン酸、3-(テトラメトキシシリル)プロピルアクリレート等が挙げられる。
Examples of acrylate monomers, methacrylate monomers, urethane acrylate oligomers and urethane methacrylate oligomers that can be used in the present invention are shown below.
As acrylate monomers, 2-ethylhexyl acrylate, lauryl acrylate, isooctyl acrylate, isostearyl acrylate, cyclohexyl acrylate, tricyclodecanyl acrylate, tricyclodecanyloxyethyl acrylate, isobornyl acrylate, ethyl carbitol Acrylate, 2-ethylhexyl carbitol acrylate, methoxypropylene monoacrylate, tetrahydrofurfuryl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 4-hydroxybutyl acrylate, benzyl acrylate, 2-phenoxyethyl acrylate, 2-phenoxydiethylene glycol Acrylate, nonylphenoxyethyl acrylate, 2-hydroxy-3-phenoxye Tyl acrylate, phthalic anhydride-2-ethylhexyl acrylate adduct, tetrahydrophthalic anhydride-2-hydroxypropyl acrylate adduct, hexahydrophthalic anhydride-2-hydroxypropyl acrylate adduct, 1,3-butanediol di Acrylate, 1,4-butane diacrylate, ethylene glycol diacrylate, polyethylene glycol diacrylate, ethoxylated bisphenol A diacrylate, ethoxylated bisphenol F diacrylate, ethoxylated 1,6-hexanediol diacrylate, propoxylated 1, 6-hexanediol diacrylate, ethoxylated neopentyl glycol diacrylate, neopentyl glycol diacrylate, tricyclodecane dimethanol diacrylate, 1,6-hexanediylbis [oxy (2-hydroxy Propane-1,3diyl)] diacrylate, [2- [1,1-dimethyl-2-acryloyloxyethyl] -5-ethyl-1,3-dioxane-5-yl] methyl acrylate, 3- [2 , 2-dimethyl-1-oxo-3-acryloyloxypropoxy] -2,2-dimethylpropyl acrylate, tris (2-hydroxyethyl) isocyanurate triacrylate, ethoxylated trimethylolpropane triacrylate, pentaerythritol triacrylate, Ethoxylated trimethylolpropane triacrylate, trimethylolpropane triacrylate, propoxylated trimethylolpropane triacrylate, ethoxylated trimethylolpropane triacrylate, propoxylated glyceryl triacrylate, pentaerythritol tetraacrylate, ditrimethylolpropane tetra Chryrate, dipentaerythritol hydroxypentaacrylate, ethoxylated pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol triacrylate, dipentaerythritol hexaacrylate, 2-isocyanate ethyl acrylate, imide acrylate, bisphenol S dithiol acrylate, tetra Examples thereof include bromobisphenol A acrylate, fluorine acrylate, trisacryloyloxyethyl phosphate, 3-acryloyloxypropanoic acid, and 3- (tetramethoxysilyl) propyl acrylate.
また、メタクリレートモノマーとしては、テトラヒドロフルフリルメタクリレート、シクロへキシルメタクリレート、ラウリルメタクリレート、2-フェノキシエチルメタクリレート、ポリプロピレングリコールモノメタクリレート、エチレングリコールジメタクリレート、1,4-ブタンジオールジメタクリレート、ネオペンチルジメタクリレート、エトキシ化ビスフェノールAジメタクリレート、トリメチロールプロパントリメタクリレート、トリブチルシリルメタクリレート、2-(トリメチルシロキシ)エチルメタクリレート、メタクリルアミド等が挙げられる。 Further, as the methacrylate monomer, tetrahydrofurfuryl methacrylate, cyclohexyl methacrylate, lauryl methacrylate, 2-phenoxyethyl methacrylate, polypropylene glycol monomethacrylate, ethylene glycol dimethacrylate, 1,4-butanediol dimethacrylate, neopentyl dimethacrylate, Examples include ethoxylated bisphenol A dimethacrylate, trimethylolpropane trimethacrylate, tributylsilyl methacrylate, 2- (trimethylsiloxy) ethyl methacrylate, and methacrylamide.
ウレタンアクリレートオリゴマーとしては、荒川化学工業(株)製品の商品名、ビームセット502H、ビームセット504H、ビームセット505A-6、ビームセット551B(以上2官能)、ビームセット550B(3官能)、ビームセット575CB、ビームセット575(以上6官能)等を挙げることができる。また、化薬サートマー(株)からも入手可能であり、その商品名を挙げると、CN-983、CN-985、CN-963、CN-9893、CN-9788、CN-964、CN-965、CN-966、CN9178、CN-961、CN-962、CN-980、CN-973、CN-9783、CN-977、CN-978、CN-9782(以上2官能)、CN-970、CN-971、CN-972(以上3官能)、CN-968、CN-975(以上6官能)等である。 As urethane acrylate oligomers, trade names of Arakawa Chemical Industries, Ltd., Beam Set 502H, Beam Set 504H, Beam Set 505A-6, Beam Set 551B (above bifunctional), Beam Set 550B (trifunctional), Beam Set 575CB, beam set 575 (more than 6 functionalities), and the like. In addition, it is also available from Kayaku Sartomer Co., Ltd., and its trade name is CN-983, CN-985, CN-963, CN-9893, CN-9788, CN-964, CN-965, CN-966, CN9178, CN-961, CN-962, CN-980, CN-973, CN-9783, CN-977, CN-978, CN-9782 (above bifunctional), CN-970, CN-971 CN-972 (above trifunctional), CN-968, CN-975 (above trifunctional), and the like.
ウレタンメタクリレートオリゴマーとしては、化薬サートマー(株)製品の商品名、SB-401、SB-402、SB-404、SB-500(以上6官能)、SB-510、SB-520(以上3官能)等を挙げることができる。
上記の様なアクリレートモノマー、メタクリレートモノマー、ウレタンアクリレートオリゴマー、ウレタンメタクリレートオリゴマーは、一種類のみでも使用できるが、複数種類を組み合わせて使用することもできる。
As urethane methacrylate oligomers, Kayaku Sartomer Co., Ltd. product names, SB-401, SB-402, SB-404, SB-500 (above 6 functionals), SB-510, SB-520 (above trifunctional) Etc.
The acrylate monomer, methacrylate monomer, urethane acrylate oligomer, and urethane methacrylate oligomer as described above can be used alone or in combination of a plurality of types.
また、銀メッキ処理は、あらゆる素材に対して行なうことができ、更に、あらゆる環境で使用できることが望まれるが、本発明で使用するラジカル重合性化合物(c)の選択、組み合わせによりコーティング膜に、各素材、環境に適した性能を付与することができる。 In addition, the silver plating treatment can be performed on any material, and further, it is desired that it can be used in any environment, but by selecting and combining the radical polymerizable compound (c) used in the present invention, Performance suitable for each material and environment can be given.
本発明の銀メッキ用コーティング組成物において、テトラアルコキシシラン、またはその部分縮合物(a)とメルカプト基を有するシラン化合物(b)と少なくとも一つ以上の炭素−炭素二重結合を有するラジカル重合性化合物(c)の使用割合は、特に限定されないが、テトラアルコキシシラン、またはその部分縮合物(a)100質量部に対し、メルカプト基を有するシラン化合物(b)を3〜100質量部、ラジカル重合性化合物(c)を15〜470質量部とすることが好ましい。
即ち、メルカプト基を有するシラン化合物(b)が3質量部を下廻ると、或いは100質量部を上廻ると、いずれも銀メッキ膜との密着性が得られにくいものとなる。
また、ラジカル重合性化合物(c)が15質量部を下廻ると、コーティング膜の柔軟性が低下しコーティング膜に割れが発生しやすくなる。また反対に、470質量部を上廻ると、銀メッキ膜との密着性が得られにくくなる。
更により好ましい使用割合としては、テトラアルコキシシランまたはその部分縮合物(a)100質量部に対し、メルカプト基を有するシラン化合物(b)を5〜50質量部、ラジカル重合性化合物(c)を40〜350質量部である。
In the coating composition for silver plating of the present invention, tetraalkoxysilane or a partial condensate thereof (a), a silane compound (b) having a mercapto group, and radical polymerization having at least one carbon-carbon double bond The proportion of the compound (c) used is not particularly limited, but 3 to 100 parts by mass of a silane compound (b) having a mercapto group and radical polymerization with respect to 100 parts by mass of a tetraalkoxysilane or a partial condensate (a) thereof. The active compound (c) is preferably 15 to 470 parts by mass.
That is, when the silane compound (b) having a mercapto group is less than 3 parts by mass or more than 100 parts by mass, it becomes difficult to obtain adhesion with the silver plating film.
On the other hand, when the amount of the radical polymerizable compound (c) is less than 15 parts by mass, the flexibility of the coating film is lowered and the coating film is likely to be cracked. On the other hand, if it exceeds 470 parts by mass, it becomes difficult to obtain adhesion with the silver plating film.
As a more preferred use ratio, 5 to 50 parts by mass of the silane compound (b) having a mercapto group and 40 radically polymerizable compounds (c) with respect to 100 parts by mass of the tetraalkoxysilane or its partial condensate (a). -350 parts by mass.
本発明のコーティング組成物は、テトラアルコキシシランまたはその部分縮合物(a)と、メルカプト基を有するシラン化合物(b)と、ラジカル重合性化合物(c)を必須原料として使用するものであり、これらを反応、硬化させることによりその性能を発揮する。その製造方法については特に限定されないが、テトラアルコキシシランまたはその部分縮合物(a)とメルカプト基を有するシラン化合物(b)をそれぞれ、または共に加水分解反応させた後、これにラジカル重合性化合物(c)を加え、これを塗布し、紫外線照射することで反応、硬化させる方法が、最良のコーティング組成物を得ることができ、より好適である。 The coating composition of the present invention uses tetraalkoxysilane or a partial condensate thereof (a), a silane compound (b) having a mercapto group, and a radical polymerizable compound (c) as essential raw materials. It exhibits its performance by reacting and curing. The production method is not particularly limited, but the tetraalkoxysilane or the partial condensate thereof (a) and the silane compound (b) having a mercapto group are subjected to hydrolysis reaction respectively or together, and then a radical polymerizable compound ( The method of adding c), applying this, and reacting and curing by irradiating with ultraviolet rays is more preferable because the best coating composition can be obtained.
この様に、テトラアルコキシシランまたはその部分縮合物(a)と、メルカプト基を有するシラン化合物(b)を加水分解反応させるとシラノール基を生成し、それが比較的不安定であるため徐々に縮合反応を起こすが、本発明においてこのような縮合反応を起こしても何ら問題はない。
更に、テトラアルコキシシランまたはその部分縮合物(a)と、メルカプト基を有するシラン化合物(b)との加水分解反応では、触媒として酸触媒を用いる。この様な酸触媒としては、例えば、塩酸、フッ化水素酸、硫酸、硝酸、リン酸、ギ酸、酢酸、アクリル酸、メタクリル酸、p-トルエンスルホン酸等を使用することができる。
In this way, when a tetraalkoxysilane or its partial condensate (a) and a silane compound (b) having a mercapto group are subjected to a hydrolysis reaction, a silanol group is formed, which is gradually unstable because it is relatively unstable. Although a reaction is caused, there is no problem even if such a condensation reaction is caused in the present invention.
Furthermore, an acid catalyst is used as a catalyst in the hydrolysis reaction of tetraalkoxysilane or a partial condensate thereof (a) and a silane compound (b) having a mercapto group. As such an acid catalyst, for example, hydrochloric acid, hydrofluoric acid, sulfuric acid, nitric acid, phosphoric acid, formic acid, acetic acid, acrylic acid, methacrylic acid, p-toluenesulfonic acid and the like can be used.
本発明の銀メッキ用コーティング組成物の製造過程では、液の粘度と安定性を適切に保持するなどの目的で溶媒を使用する。この様な溶媒としては、水との相溶性を有する溶媒が好適であり、例を挙げると、メタノール、エタノール、n-プロパノール、i-プロパノール、n-ブタノール等のアルコール類、酢酸エチル、酢酸ブチル等のエステル類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、テトラヒドロフラン、ジオキサン、ジエチルエーテル等のエーテル類、メチルセロソルブ、エチルセロソルブ、ブチルセロソルブ等のセロソルブ類等が挙げられる。
また、これらの溶媒は複数を併用して使用してもよい。
或いは、少量であればキシレン、トルエン等の水と全く相溶性のない溶媒を、上記の溶媒と併用して使用することもできる。
In the production process of the silver plating coating composition of the present invention, a solvent is used for the purpose of appropriately maintaining the viscosity and stability of the liquid. As such a solvent, a solvent having compatibility with water is preferable. For example, alcohols such as methanol, ethanol, n-propanol, i-propanol, and n-butanol, ethyl acetate, and butyl acetate are used. And esters such as acetone, methyl ethyl ketone and methyl isobutyl ketone, ethers such as tetrahydrofuran, dioxane and diethyl ether, and cellosolves such as methyl cellosolve, ethyl cellosolve and butyl cellosolve.
A plurality of these solvents may be used in combination.
Alternatively, if the amount is small, a solvent which is not completely compatible with water such as xylene and toluene can be used in combination with the above-mentioned solvent.
本発明の銀メッキ用コーティング組成物は、前述の必須三成分が含まれる原料を反応させることにより本発明の目的とする性能を発揮するが、これら三成分以外に、テトラアルコキシシランまたはその部分縮合物(a)とメルカプト基を有するシラン化合物(b)以外のシラン化合物を含んでいてもよい。
例えば、この様なシラン化合物としては、メチルトリメトキシシラン、ジメチルジメトキシシラン、フェニルトリメトキシシラン、ジフェニルジメトキシシラン、メチルトリエトキシシラン、ジメチルジエトキシシラン、フェニルトリエトキシシラン、ジフェニルジエトキシシラン、ヘキシルトリメトキシシラン、へキシルトリエトキシシラン、デシルトリメトキシシラン、トリフルオロプロピルトリメトキシシラン等のアルコキシシラン、メチルトリクロロシラン、メチルジクロロシラン、ジメチルジクロロシラン、トリメチルクロロシラン、フェニルトリクロロシラン、ジフェニルジクロロシラン等のクロロシラン等が挙げられる。これらは、加水分解して使用してもよく、テトラアルコキシシラン、またはその部分縮合物(a)メルカプト基を有するシラン化合物(b)と共に加水分解することも可能である。
The coating composition for silver plating of the present invention exhibits the target performance of the present invention by reacting the raw materials containing the above-mentioned essential three components. In addition to these three components, tetraalkoxysilane or a partial condensation thereof Silane compounds other than the product (a) and the silane compound (b) having a mercapto group may be included.
For example, such silane compounds include methyltrimethoxysilane, dimethyldimethoxysilane, phenyltrimethoxysilane, diphenyldimethoxysilane, methyltriethoxysilane, dimethyldiethoxysilane, phenyltriethoxysilane, diphenyldiethoxysilane, hexyltri Chlorosilanes such as methoxysilane, hexyltriethoxysilane, decyltrimethoxysilane, trifluoropropyltrimethoxysilane, and other alkoxysilanes, methyltrichlorosilane, methyldichlorosilane, dimethyldichlorosilane, trimethylchlorosilane, phenyltrichlorosilane, and diphenyldichlorosilane Etc. These may be used after being hydrolyzed, or can be hydrolyzed together with tetraalkoxysilane or a partial condensate thereof (a) a silane compound (b) having a mercapto group.
更に、本発明のコーティング組成物は、その反応時に予め原料中に光重合開始剤を添加しておき反応を行うことが望ましい。この様な光重合開始剤は、市販のものを使用することができ、例えば、2,2-ジメトキシ-1,2-ジフェニルエタン-1-オン、1-ヒドロキシシクロへキシルフェニルケトン、2-ヒドロキシ-2-メチル-1-フェニルプロパン-1-オン、ベンゾフェノン、1-[4-(2-ヒドロキシエトキシ)-フェニル]-2-メチル-1-プロパン-1-オン、2-メチル-1-[4-(メチルチオ)フェニル]-2-モルフォリノプロパン-1-オン、2-ベンジル-2-ジメチルアミノ-1-(4-モルフォリノフェニル)-ブタン-1-オン、ビス(2,4,6-トリメチルベンゾイル)-フェニルフォスフィンオキサイド、ビス(2,6-ジメトキシベンゾイル)-2,4,4-トリメチルペンチルフォスフィンオキサイド、2,4,6-トリメチルベンゾイルジフェニルフォスフィンオキサイド等が挙げられる。 Furthermore, the coating composition of the present invention is preferably reacted by adding a photopolymerization initiator to the raw material in advance during the reaction. As such a photopolymerization initiator, a commercially available one can be used, for example, 2,2-dimethoxy-1,2-diphenylethane-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy -2-methyl-1-phenylpropan-1-one, benzophenone, 1- [4- (2-hydroxyethoxy) -phenyl] -2-methyl-1-propan-1-one, 2-methyl-1- [ 4- (Methylthio) phenyl] -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one, bis (2,4,6 -Trimethylbenzoyl) -phenylphosphine oxide, bis (2,6-dimethoxybenzoyl) -2,4,4-trimethylpentylphosphine oxide, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, and the like.
更には、本発明の銀メッキ用コーティング組成物には、必要に応じて紫外線吸収剤、酸化防止剤、重合禁止剤等の安定化剤、レベリング剤、消泡剤、増粘剤、沈降防止剤、顔料、分散剤、帯電防止剤、防曇剤、銀の腐食抑制用インヒビター、酸、アルカリ及び塩類などから選ばれる硬化触媒等を適宜使用してもよい。
本発明の銀メッキ用コーティング組成物は、種々の方法で作成された銀メッキ膜に適用できる。例えば、銀メッキ方法として、蒸着メッキ、電解メッキ、無電解メッキ等が挙げられる。
Furthermore, the coating composition for silver plating of the present invention includes a stabilizer such as an ultraviolet absorber, an antioxidant, a polymerization inhibitor, a leveling agent, an antifoaming agent, a thickening agent, and an anti-settling agent as necessary. Further, a curing catalyst selected from a pigment, a dispersant, an antistatic agent, an antifogging agent, an inhibitor for inhibiting corrosion of silver, an acid, an alkali, a salt, and the like may be appropriately used.
The silver plating coating composition of the present invention can be applied to silver plating films prepared by various methods. For example, examples of the silver plating method include vapor deposition plating, electrolytic plating, and electroless plating.
ところで、本発明のコーティング組成物を得るための硬化時間は、強い紫外線を照射することで非常に短時間とすることができる。この硬化の速さを活かし、銀メッキ積層体を短時間で作成可能にするためには、銀メッキ工程についても短時間で行うことが望ましい。上記の銀メッキ方法の中で、無電解メッキは、簡易な方法であり、瞬時に銀を基材に析出させることが可能であるため特に好ましい。 By the way, the curing time for obtaining the coating composition of the present invention can be very short by irradiating with strong ultraviolet rays. In order to make use of this curing speed and to make a silver-plated laminate in a short time, it is desirable that the silver plating process is also performed in a short time. Among the silver plating methods described above, electroless plating is a simple method, and is particularly preferable because silver can be instantly deposited on a substrate.
無電解銀メッキ法を例に挙げて説明を行うと、無電解銀メッキの方法は、例えば、銀メッキを行う基材を塩化第一錫と塩酸を含有する水溶液で処理し(活性化処理工程)、基材を良く水洗した後、アンモニア含有銀塩水溶液と還元剤溶液とを基材上で混合するように添加することにより銀を基材に析出させる。使用する銀塩としては、硝酸銀、塩化銀、硫酸銀等を挙げることができ、還元剤としては、ホルムアルデヒド、ブドウ糖、グリオキサール、ヒドロキノン等の水溶液が好適に使用される。また、アンモニア含有銀塩水溶液には、水酸化テトラメチルアンモニウム、2-アミノエタノール、2,2'-イミノジエタノール、2,2',2''-ニトリロトリエタノール等のアミン類を添加することができる。 The electroless silver plating method will be described by taking an example of the electroless silver plating method. For example, the electroless silver plating method is performed by treating a substrate on which silver plating is performed with an aqueous solution containing stannous chloride and hydrochloric acid (activation processing step). ) After thoroughly washing the substrate with water, silver is precipitated on the substrate by adding an ammonia-containing silver salt aqueous solution and a reducing agent solution so as to be mixed on the substrate. Examples of the silver salt to be used include silver nitrate, silver chloride, and silver sulfate. As the reducing agent, aqueous solutions of formaldehyde, glucose, glyoxal, hydroquinone, and the like are preferably used. In addition, amines such as tetramethylammonium hydroxide, 2-aminoethanol, 2,2'-iminodiethanol, 2,2 ', 2' '-nitrilotriethanol can be added to the ammonia-containing silver salt aqueous solution. .
一般に銀メッキ膜は耐磨耗性が低く、大気中で酸化あるいは硫化され易いため、その保護膜として銀メッキ膜上にトップコートが行われる。更に、銀メッキ膜と基材との密着性が得られない場合や基材の傷を消すような目的で、アンダーコートと呼ばれるプライマー層を形成し、その上に銀メッキを行なうことが多い。
本発明の銀メッキ用コーティング組成物は、基材及び銀との密着性が共に良く、耐磨耗性に優れ、銀メッキを高光沢とすることが可能であり、アンダーコート、トップコートの両方に適用することができる。
例えば、本発明のコーティング組成物をアンダーコート層として種々の基材上に形成し、この上に銀メッキを施し、次いで更にこの上に本発明のコーティング組成物をトップコート層として形成させることにより銀メッキ積層体を得ることができ、この積層体は、意匠性に優れ、更に耐磨耗性、密着性等の銀メッキの保護能力にも優れるという特徴がある。
In general, since a silver plating film has low wear resistance and is easily oxidized or sulfided in the air, a top coat is applied on the silver plating film as a protective film. Further, in many cases, a primer layer called an undercoat is formed and silver plating is performed on the primer layer for the purpose of eliminating adhesion between the silver plating film and the substrate or for removing scratches on the substrate.
The coating composition for silver plating of the present invention has good adhesion to the base material and silver, has excellent wear resistance, and can make the silver plating highly glossy. Both undercoat and topcoat Can be applied to.
For example, the coating composition of the present invention is formed on various substrates as an undercoat layer, silver-plated thereon, and then the coating composition of the present invention is further formed thereon as a topcoat layer. A silver-plated laminate can be obtained, and this laminate is characterized by excellent design properties and excellent silver plating protection capabilities such as wear resistance and adhesion.
本発明コーティング組成物をアンダーコートに適用する場合、コーティング膜を形成させる対象となる基材としては、特に限定されるものではないが、各種の合成樹脂が好ましい。
このような合成樹脂としては、塩化ビニル、エポキシ、ABS、ポリカーボネート、ポリプロピレン等が挙げられる。
また、本発明組成物のトップコート層への適用は、本発明組成物を銀メッキ膜上で行なうものであり、この場合には本発明組成物は基材の種類には全く関係なく使用できる。
When the coating composition of the present invention is applied to the undercoat, the base material on which the coating film is to be formed is not particularly limited, but various synthetic resins are preferable.
Examples of such a synthetic resin include vinyl chloride, epoxy, ABS, polycarbonate, and polypropylene.
In addition, the application of the composition of the present invention to the topcoat layer is carried out on the silver plating film. In this case, the composition of the present invention can be used regardless of the type of the substrate. .
本発明の銀メッキ用コーティング組成物は、前述の各種基材上、または銀メッキ膜上にスピンコート法、ディップコート法、スプレーコート法、フローコート法、バーコード法、グラビアコート法等の方法で塗布し、使用した溶媒を揮散させた後、紫外線を照射して硬化させることにより得ることができる。 The silver plating coating composition of the present invention is a method such as spin coating method, dip coating method, spray coating method, flow coating method, bar code method, gravure coating method on the above-mentioned various substrates or silver plating films. It can be obtained by coating with, volatilizing the solvent used, and then curing by irradiating with ultraviolet rays.
以下に本発明の実施例を挙げて更に説明を行うが、本発明はこれらに限定されるものではない。また、実施例に於いて%は特に断らない限り全て質量%を示す。 Hereinafter, the present invention will be further described with reference to examples, but the present invention is not limited thereto. In the examples, “%” means “% by mass” unless otherwise specified.
[実施例1〜6]
シリケート40(多摩化学工業(株)製)90質量部と3-メルカプトプロピルトリメトキシシラン10質量部とエタノール20質量部を混合し、0.4%塩酸を20質量部加え、室温にて30分間撹拌した。これにエタノールをさらに150質量部加え、48時間室温で熟成させることで加水分解を行った。
[Examples 1 to 6]
90 parts by mass of silicate 40 (manufactured by Tama Chemical Co., Ltd.), 10 parts by mass of 3-mercaptopropyltrimethoxysilane and 20 parts by mass of ethanol were added, 20 parts by mass of 0.4% hydrochloric acid was added, and the mixture was stirred at room temperature for 30 minutes. . 150 mass parts of ethanol was further added to this, and it hydrolyzed by making it age | cure | ripen at room temperature for 48 hours.
この加水分解物5質量部に対し、光重合開始剤入りウレタンアクリレートオリゴマーであるビームセット575CB(荒川化学工業(株)製)を1質量部加え、さらにエタノールを1質量部加えたもの(実施例1)、加水分解物5質量部に対し、ビームセット575CBを8.2質量部加え、さらにエタノールを8.2質量部加えたもの(実施例2)、加水分解物5質量部に対し、ジペンタエリスリトールペンタアクリレート(アクリレートモノマー)のKAYARAD D-310(日本化薬(株)製)を1質量部とエタノールを1質量部を加えたもの(実施例3)、加水分解物5質量部に対し、KAYARAD D-310(日本化薬(株)製)を0.7質量部と、ネオペンチルグリコールジアクリレートであるNPGDA(日本化薬(株)製)を0.3質量部と、エタノールを1質量部、更に光重合開始剤であるIRGACURE 184(チバ・スペシャリティー・ケミカルズ(株)製)を0.004質量部加えたもの(実施例4)、加水分解物5質量部に対し、ビームセット575CB 0.7質量部と2-フェノキシエチルアクリレートを0.3質量部とエタノールを1質量部加えたもの(実施例5)、加水分解物5質量部に対し、KAYARAD D-310を1質量部とエタノールを1質量部とIRGACURE 184(チバ・スペシャリティー・ケミカルズ(株)製)を0.004質量部と、さらに銀の腐食抑制剤としてベンゾチアゾールチオール0.072質量部を加えたもの(実施例6)、をそれぞれ製造した。 1 part by weight of beam set 575CB (manufactured by Arakawa Chemical Co., Ltd.), which is a urethane acrylate oligomer containing a photopolymerization initiator, is added to 5 parts by weight of this hydrolyzate, and 1 part by weight of ethanol is added (Example) 1) Addition of 8.2 parts by mass of beam set 575CB to 5 parts by mass of hydrolyzate, and further addition of 8.2 parts by mass of ethanol (Example 2), dipentaerythritol pentaacrylate to 5 parts by mass of hydrolyzate (Acrylate monomer) KAYARAD D-310 (manufactured by Nippon Kayaku Co., Ltd.) and 1 part by weight of ethanol (Example 3), 5 parts by weight of hydrolyzate, KAYARAD D- 310 parts (manufactured by Nippon Kayaku Co., Ltd.), 0.7 parts by mass of NPGDA (manufactured by Nippon Kayaku Co., Ltd.), neopentyl glycol diacrylate, 1 part by mass of ethanol, and a photopolymerization initiator IRGACURE 184 (Ciba Special) Lithium Chemicals Co., Ltd.) (0.004 parts by mass) (Example 4), 5 parts by mass of the hydrolyzate, 0.7 parts by weight of beam set 575CB, 0.3 parts by mass of 2-phenoxyethyl acrylate and 1 ethanol 1 part by weight of KAYARAD D-310, 1 part by weight of ethanol and IRGACURE 184 (manufactured by Ciba Specialty Chemicals Co., Ltd.) with respect to 5 parts by weight of the hydrolyzate (Example 5) 0.004 parts by mass and a silver corrosion inhibitor added with 0.072 parts by mass of benzothiazole thiol (Example 6) were produced.
これら実施例1〜6のコーティング組成物をそれぞれ3×3cm2のABS樹脂基材にスピンコート法で塗布し、60℃の乾燥機中に入れ乾燥させた。これに高圧水銀灯を用いて紫外線を照射し(紫外線積算量:3000mJ/cm2)、アンダーコート層を形成させた。これらアンダーコート層を形成させた基材上に、銀鏡反応により銀メッキ膜を形成させた。
尚、銀鏡反応による銀メッキ膜の形成方法は次の通りである。2%塩化第一錫と0.9質量部の塩酸を含有する塩化錫水溶液に、アンダーコート層を形成させた基材を浸けコート層表面の活性化処理を行った。これをよく水洗した後、2%硝酸銀水溶液と4%アンモニア水溶液を1:1で混合した溶液に浸し、そこに5%グリオキサール水溶液を添加することで上記アンダーコート層上に銀メッキ膜を形成させた。
Each of these coating compositions of Examples 1 to 6 was applied to a 3 × 3 cm 2 ABS resin substrate by a spin coating method, and was put in a dryer at 60 ° C. and dried. This was irradiated with ultraviolet rays using a high-pressure mercury lamp (integrated amount of ultraviolet rays: 3000 mJ / cm 2 ) to form an undercoat layer. A silver plating film was formed by a silver mirror reaction on the substrate on which the undercoat layer was formed.
In addition, the formation method of the silver plating film by silver mirror reaction is as follows. The surface of the coat layer was activated by immersing the base material on which the undercoat layer was formed in a tin chloride aqueous solution containing 2% stannous chloride and 0.9 parts by mass of hydrochloric acid. After thoroughly washing it with water, it is immersed in a 1: 1 mixture of a 2% aqueous silver nitrate solution and a 4% aqueous ammonia solution, and a 5% glyoxal aqueous solution is added thereto to form a silver plating film on the undercoat layer. It was.
次いでこの銀メッキ膜上にトップコート層を形成させた。尚、トップコート層は、それぞれアンダーコート層と同一のコーティング剤を使用し、また塗布方法、硬化条件も同一条件で行った。この様な方法により、ABS樹脂基材上にコーティング組成物―銀膜―コーティング組成物の3層構造の銀メッキ積層体を作成した。 Next, a top coat layer was formed on the silver plating film. The top coat layer used the same coating agent as the undercoat layer, and the coating method and curing conditions were the same. By such a method, a silver plating laminate having a three-layer structure of coating composition-silver film-coating composition was prepared on an ABS resin substrate.
[実施例7]
シリケート40の35質量部と、3-メルカプトプロピルトリメトキシシラン1質量部と、エタノール7.2質量部を混合し、0.4%塩酸を7.2質量部加え、室温にて30分間撹拌した。これにエタノールをさらに50質量部加え、48時間室温で熟成させることで加水分解を行った。
この加水分解物5質量部に対し、ビームセット575CBを1質量部加え、さらにエタノールを2質量部加えたものを製造した。このコーティング剤を用いて、実施例1〜6と同様に銀メッキ積層体を作成した。
[Example 7]
35 parts by mass of silicate 40, 1 part by mass of 3-mercaptopropyltrimethoxysilane and 7.2 parts by mass of ethanol were mixed, 7.2 parts by mass of 0.4% hydrochloric acid was added, and the mixture was stirred at room temperature for 30 minutes. 50 mass parts of ethanol was further added to this, and it hydrolyzed by making it age | cure | ripen at room temperature for 48 hours.
1 part by weight of beam set 575CB was added to 5 parts by weight of this hydrolyzate, and 2 parts by weight of ethanol was further produced. Using this coating agent, a silver plating laminate was prepared in the same manner as in Examples 1-6.
[実施例8]
シリケート40の8質量部と、3-メルカプトプロピルトリメトキシシラン1質量部と、メチルトリメトキシシラン1質量部とエタノール2質量部を混合し、0.4%塩酸を2.0質量部加え、室温にて30分間撹拌した。これにエタノールをさらに15質量部加え、48時間室温で熟成させることで加水分解を行った。
この加水分解物5質量部に対し、アクリレートモノマーであるKAYARAD D-310(日本化薬製)を1質量部とIRGACURE 184を0.004質量部加えたものを製造した。このコーティング剤を用いて、実施例1〜6と同様に銀メッキ積層体を作成した。
[Example 8]
8 parts by mass of silicate 40, 1 part by mass of 3-mercaptopropyltrimethoxysilane, 1 part by mass of methyltrimethoxysilane and 2 parts by mass of ethanol were added, and 2.0 parts by mass of 0.4% hydrochloric acid was added. Stir. An additional 15 parts by mass of ethanol was added thereto, and hydrolysis was performed by aging at room temperature for 48 hours.
A product obtained by adding 1 part by mass of KAYARAD D-310 (manufactured by Nippon Kayaku) and 0.004 parts by mass of IRGACURE 184 to 5 parts by mass of the hydrolyzate was produced. Using this coating agent, a silver plating laminate was prepared in the same manner as in Examples 1-6.
[実施例9]
シリケート40の9質量部に、エタノール2質量部を混合し、0.4%塩酸の1.8質量部を加え、室温にて30分間撹拌した。これにエタノールをさらに14質量部加え、48時間室温で熟成させることで加水分解を行った(A)。
3-メルカプトプロピルトリメトキシシラン1質量部とエタノール1質量部を混合し、0.4%塩酸の0.2質量部を加え、室温にて30分間撹拌した。これにエタノールをさらに1質量部加え、48時間室温で熟成させることで加水分解を行った(B)。
上記の加水分解物(A)4.5質量部に対し、加水分解物(B)0.5質量部とビームセット575CBの1質量部を加え、さらにエタノールを1質量部加えたものを製造した。このコーティング剤を用いて、実施例1〜6と同様に銀メッキ積層体を作成した。
[Example 9]
2 parts by mass of ethanol was mixed with 9 parts by mass of silicate 40, 1.8 parts by mass of 0.4% hydrochloric acid was added, and the mixture was stirred at room temperature for 30 minutes. 14 mass parts of ethanol was further added to this, and it hydrolyzed by making it age | cure | ripen at room temperature for 48 hours (A).
1 part by mass of 3-mercaptopropyltrimethoxysilane and 1 part by mass of ethanol were mixed, 0.2 part by mass of 0.4% hydrochloric acid was added, and the mixture was stirred at room temperature for 30 minutes. 1 mass part of ethanol was further added to this, and it hydrolyzed by making it age | cure | ripen at room temperature for 48 hours (B).
To 4.5 parts by mass of the hydrolyzate (A), 0.5 parts by mass of the hydrolyzate (B) and 1 part by mass of the beam set 575CB were added, and 1 mass part of ethanol was further added. Using this coating agent, a silver plating laminate was prepared in the same manner as in Examples 1-6.
[実施例10]
シリケート40の9質量部と、メルカプトエチルトリメトキシシラン1質量部と、エタノール2質量部を混合し、0.4%塩酸の2.0質量部を加え、室温にて30分間撹拌した。これにエタノールをさらに15質量部加え、48時間室温で熟成させることで加水分解を行った。
この加水分解物5質量部に対し、ビームセット575CBを1質量部とエタノールを1質量部加えたものを製造した。このコーティング剤を用いて、実施例1〜6と同様に銀メッキ積層体を作成した。
[Example 10]
9 parts by mass of silicate 40, 1 part by mass of mercaptoethyltrimethoxysilane, and 2 parts by mass of ethanol were mixed, 2.0 parts by mass of 0.4% hydrochloric acid was added, and the mixture was stirred at room temperature for 30 minutes. An additional 15 parts by mass of ethanol was added thereto, and hydrolysis was performed by aging at room temperature for 48 hours.
A product obtained by adding 1 part by mass of beam set 575CB and 1 part by mass of ethanol to 5 parts by mass of the hydrolyzate was produced. Using this coating agent, a silver plating laminate was prepared in the same manner as in Examples 1-6.
[比較例1〜2]
ビームセット575CBの1質量部に、エタノールを1質量部加えたもの(比較例1)、KAYARAD D-310の1質量部にIRGACURE184を0.03質量部とエタノールを1質量部加えたもの(比較例2)を用いて、それぞれ実施例1〜6と同様に銀メッキ積層体を作成した。
[Comparative Examples 1-2]
1 part by weight of beam set 575CB with 1 part by weight of ethanol (Comparative Example 1), 1 part by weight of KAYARAD D-310 with 0.03 parts by weight of IRGACURE184 and 1 part by weight of ethanol (Comparative Example 2) ) Was used to prepare silver-plated laminates in the same manner as in Examples 1 to 6, respectively.
[比較例3]
シリケート40の10質量部にエタノール2質量部を混合し、0.4%塩酸を1.8質量部加え、室温にて30分間撹拌した。これにエタノールをさらに15質量部加え、48時間室温で熟成させることで加水分解を行った。この加水分解物5質量部にビームセット575CBの1.1質量部とエタノールの1.1質量部加え、これを用いて、実施例1〜6と同様に銀メッキ積層体を作成した。
[Comparative Example 3]
2 parts by mass of ethanol was mixed with 10 parts by mass of silicate 40, 1.8 parts by mass of 0.4% hydrochloric acid was added, and the mixture was stirred at room temperature for 30 minutes. An additional 15 parts by mass of ethanol was added thereto, and hydrolysis was performed by aging at room temperature for 48 hours. 1.1 parts by mass of beam set 575CB and 1.1 parts by mass of ethanol were added to 5 parts by mass of this hydrolyzate, and a silver-plated laminate was prepared in the same manner as in Examples 1-6.
[比較例4]
3-メルカプトプロピルトリメトキシシラン2質量部に、0.4%塩酸を0.3質量部加え、室温にて30分間撹拌した後、48時間室温で熟成させることで加水分解を行った。この加水分解物1質量部にビームセット575CBを5質量部とエタノールを5質量部加えたものを用いて、実施例1〜6と同様に銀メッキ積層体を作成した。
[Comparative Example 4]
Hydrolysis was performed by adding 0.3 parts by mass of 0.4% hydrochloric acid to 2 parts by mass of 3-mercaptopropyltrimethoxysilane, stirring at room temperature for 30 minutes, and then aging at room temperature for 48 hours. A silver-plated laminate was prepared in the same manner as in Examples 1 to 6, using 1 part by mass of this hydrolyzate and 5 parts by mass of beam set 575CB and 5 parts by mass of ethanol.
[比較例5]
シリカゾルIPA-ST(SiO2固形分30%、日産化学工業(株)製)10質量部に、3-メルカプトプロピルトリメトキシシラン1質量部を混合し、0.4%塩酸を0.3質量部加え、室温にて30分間撹拌した。これにエタノールをさらに13質量部加え、48時間室温で熟成させることで加水分解を行った。この加水分解物5.5質量部にビームセット575CBを1質量部とエタノールを1質量部加えたものを用いて、実施例1〜6と同様に銀メッキ積層体を作成した。
[Comparative Example 5]
10 parts by mass of silica sol IPA-ST (SiO 2 solid content 30%, manufactured by Nissan Chemical Industries, Ltd.) is mixed with 1 part by mass of 3-mercaptopropyltrimethoxysilane, and 0.3 parts by mass of 0.4% hydrochloric acid is added to room temperature. And stirred for 30 minutes. 13 mass parts of ethanol was further added to this, and it hydrolyzed by making it age | cure | ripen at room temperature for 48 hours. A silver-plated laminate was prepared in the same manner as in Examples 1 to 6, using 5.5 parts by mass of the hydrolyzate and 1 part by mass of Beam Set 575CB and 1 part by mass of ethanol.
これら実施例及び比較例で得た銀メッキ積層体を使用し、コーティング組成物の性能評価(被膜密着性、被膜硬度、銀メッキ外観、コーティング膜の外観)試験を行った。尚、それぞれの性能評価は以下の方法で行った。評価結果を表1に示した。 Using the silver-plated laminates obtained in these Examples and Comparative Examples, the performance evaluation (coating adhesion, coating hardness, silver plating appearance, coating film appearance) test of the coating composition was performed. In addition, each performance evaluation was performed with the following method. The evaluation results are shown in Table 1.
<被膜密着性>
供試積層体表面に、剃刀を用い1mm間隔で縦横それぞれ11本の切れ目を付け、100個の碁盤の目状とした。この表面にセロハンテープをよく密着させた。次いで、セロハンテープをメッキ面に対して垂直に急激にはがし、その際に被膜が剥離せずに残存したマス目の数を算定した。算定結果から残存数(X)をX/100で表した。
<Coating adhesion>
On the surface of the test laminate, razors were used to make 11 cuts at 1 mm intervals in both vertical and horizontal directions to form 100 grids. A cellophane tape was closely adhered to this surface. Next, the cellophane tape was abruptly peeled perpendicularly to the plated surface, and the number of cells remaining without peeling of the coating was calculated. From the calculation results, the remaining number (X) was expressed as X / 100.
<被膜硬度>
鉛筆の円筒状の芯をそのまま残し、木部だけを削り取った鉛筆芯を、銀メッキ面に対して45度の方向に750gの荷重で押し当てた。荷重を加えた状態で鉛筆芯を押しつけ動かした。被膜に傷が付くか否かを以って芯硬度により被膜硬度を判定した。
<Coating hardness>
The pencil lead with the cylindrical core left behind was left as it was, and the pencil lead from which only the wood part was shaved was pressed against the silver-plated surface at a load of 750 g in a direction of 45 degrees. With the load applied, the pencil lead was pressed and moved. The film hardness was determined by the core hardness based on whether or not the film was damaged.
<銀メッキ外観>
目視により、銀メッキ層形成後の銀メッキ膜の光沢、ムラ、色目等を観察し、○(良)、△(やや不良)、×(不良)で評価した。
<Silver plating appearance>
The gloss, unevenness, color, etc. of the silver plating film after the formation of the silver plating layer were visually observed, and evaluated with ○ (good), Δ (slightly bad), and x (bad).
<コーティング膜の外観>
目視により、コーティング組成物によるアンダーコート層形成後のコーティング膜の外観を観察し、○(良)、△(やや不良)、×(不良)で評価した。
<Appearance of coating film>
The appearance of the coating film after forming the undercoat layer with the coating composition was visually observed, and evaluated with ○ (good), Δ (slightly bad), and × (poor).
Claims (6)
After reacting a tetraalkoxysilane represented by the following general formula (Chemical Formula 1) or a partial condensate thereof (a) with a silane compound (b) having a mercapto group, it is reacted with at least one carbon-carbon dioxygen. Silver plating characterized by adding a radically polymerizable compound (c) having a heavy bond , or by hydrolyzing (a) and (b), or together, and then adding (c) thereto Method for manufacturing coating composition.
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