JP4381670B2 - Reactor - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a reaction apparatus, and in particular, a reaction apparatus having a fine flow path. In place Is preferred.
[0002]
[Prior art]
As a conventional gas-liquid mixing and dissolving apparatus, as disclosed in Japanese Patent Application Laid-Open No. 2001-129377, a gas-liquid mixing and dissolving apparatus that has a good gas-to-liquid dissolution ratio, can shorten the dissolution time, and can be miniaturized. A substantially cylindrical dissolution tank having an inflow port formed in a substantially upper central portion and a discharge port formed in a lower side, and a liquid and a downward flow from the inflow port of the dissolution tank. A gas-liquid mixture mixed with gas is ejected, turbulent bubble vortices are generated inside the dissolution tank, the bubbles formed inside the dissolution tank are refined, and the gas stays inside the dissolution tank. And a jetting means for forming a state in which fine bubbles are generated in substantially the entire liquid, and for dissolving the gas in the liquid. As a means for ejecting the gas-liquid mixture, a pump that pressurizes the liquid and ejects it from the inlet of the dissolution tank, and a gas pressurized by the compressor is stirred and mixed with the liquid pressurized by the pump. Thus, a gas-liquid mixture is formed, and this gas-liquid mixture is ejected from the inlet of the dissolution tank.
[0003]
[Problems to be solved by the invention]
However, the conventional gas-liquid mixing reaction apparatus stirs and mixes the gas pressurized by the pump with the liquid pressurized by the pump to form a gas-liquid mixture, and this gas-liquid mixture is put into the dissolution tank. Since bubbles are generated and turbulent bubble vortices are generated inside the dissolution tank so as to make the bubbles formed inside the dissolution tank fine, bubbles with non-uniform sizes are generated. . As a result, there has been a problem that the gas-liquid mixing ratio in the gas-liquid mixing reactor cannot be stably obtained and the gas-liquid mixing speed becomes slow.
[0004]
An object of the present invention is to provide a reaction apparatus capable of obtaining a stable gas-liquid mixing ratio and increasing the reaction rate.
[0006]
[Means for Solving the Problems]
In order to achieve the above-described object, the reaction apparatus of the present invention includes a liquid introduction channel into which a liquid is introduced, and a fine liquid in which liquid is introduced in the same direction from the liquid introduction channel, and each is provided in parallel. A plurality of liquid supply channels having a channel cross-sectional area, a gas introduction channel into which a gas is introduced, and a plurality of liquid supply channels are provided in parallel corresponding to each of the plurality of liquid supply channels. A gas supply channel having a fine channel cross-sectional area into which gas is introduced in a direction and a plurality of liquid supply channels provided in parallel corresponding to each of the liquid supply channel and the liquid from the liquid supply channel Combine the gas from the supply channel Along the flow path direction A plurality of two-phase flow paths having a fine channel cross-sectional area that generates a two-phase flow in which a liquid and a gas alternate; and a plurality of two-phase flow paths communicating with the respective outlets of the plurality of two-phase flow paths A reaction channel in which the liquid and gas from the channel react, a liquid discharge channel for discharging the liquid that has reacted with the gas in the reaction channel, and a gas separated in the reaction channel A gas discharge channel.
[0009]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, a plurality of embodiments of the present invention And reference examples Will be described with reference to the drawings. Each example And reference examples The same reference numerals in the drawings indicate the same or equivalent.
[0010]
A reactor according to a first embodiment of the present invention will be described with reference to FIGS.
[0011]
First, the structure of the reaction apparatus of a present Example is demonstrated.
[0012]
The reaction apparatus 60 includes an apparatus main body 50, pumps 31 to 34, and pipes 41 to 44. The apparatus main body 50 constitutes a main part of the reaction apparatus 60. The pumps 31 to 34 are provided for supplying or discharging liquid or gas to the apparatus main body 50. The on / off operation of the pumps 31 to 34, the rotational speed, and the like are controlled by a control device (not shown). The pipes 41 to 44 are configured to connect the outside of the apparatus and the communication ports of the apparatus body 50 via pumps 31 to 34.
[0013]
The pump 32 and the pipe 42 are provided as pressurizing means for pressurizing and supplying the liquid to the apparatus main body 50 from the outside of the apparatus. The pump 33 and the pipe 43 are provided as pressurizing means for pressurizing and supplying the gas to the apparatus main body 50 from the outside of the apparatus. The pump 31 and the pipe 41 are provided as means for discharging gas from the apparatus main body 50 to the outside of the apparatus. The pump 34 and the pipe 44 are provided as means for discharging liquid from the apparatus main body 50 to the outside of the apparatus.
[0014]
The apparatus main body 50 is formed of a multi-layer structure in which a plurality of substrates are stacked and joined. Specifically, the apparatus main body 50 is a three-layer structure including a glass substrate 51, a silicon substrate 52, and a glass substrate 53. The glass substrate 51, the silicon substrate 52 and the glass substrate 53 have their flow paths and distribution ports processed into a predetermined shape using a micromachining technique. The apparatus main body 50 is composed of microcapsules made of a thin rectangular parallelepiped having an outer dimension of about 15 mm in width, 20 mm in height, and 1.5 mm in depth.
[0015]
A gas discharge port 21 and a liquid injection port 22 are formed through the lower portion of the glass substrate 51. One side of the gas discharge port 21 communicates with the gas suction pump 31, and the other side communicates with the gas discharge channel 6. One side of the liquid inlet 22 communicates with a liquid pressurizing pump 32, and the other side communicates with the liquid introduction channel 14. The pump 32 can be increased to a predetermined pressure or adjusted to a predetermined flow rate by a control device.
[0016]
The silicon substrate 52 is processed with flow paths from both the front and rear sides using a micromachining technique. On one side (front side) of the silicon substrate 52, a liquid introduction channel 14, a liquid supply channel 1, a gas supply channel 2, a gas-liquid two-phase channel 3 and a bubble reaction channel 4 are arranged from the bottom to the top. In addition, a gas discharge channel 6 is formed on the sides of these. On the other side (rear side) of the silicon substrate 52, the liquid discharge channel 13 and the gas introduction channel 12 are formed independently in the vertical direction. The liquid discharge channel 13 is communicated with the bubble reaction channel 4 via the liquid communication channel 5. The gas introduction channel 12 communicates with the gas supply channel 2 via the gas communication channel 10. Thus, the liquid communication channel 5 and the gas communication channel 10 function as holes that communicate the front and rear channels.
[0017]
The lower part of the liquid introduction channel 14 is communicated with the liquid inlet 22, and the upper part is communicated with the lower part of the liquid supply channel 1. A plurality of liquid supply channels 1 communicate with the liquid introduction channel 14. A gas supply channel 2 communicates with an upper portion of each liquid supply channel 1. The gas-liquid two-phase flow path 3 extends upward from a gas-liquid confluence portion, which is a communication portion between the liquid supply flow path 1 and the gas supply flow path 2, and communicates with the lower part of the bubble reaction flow path 4. Accordingly, a plurality of two-phase flow generation units including the liquid supply channel 1, the gas supply channel 2, and the gas-liquid two-phase channel 3 are provided in parallel between the liquid introduction channel 14 and the bubble reaction channel 4. . The bubble reaction channel 4 is formed vertically long. The upper part of the bubble reaction channel 4 communicates with the liquid communication channel 5 and the gas discharge channel 6. The lower end of the liquid communication channel 5 is positioned below the lower end of the gas discharge channel 6, and the vertical dimension of the liquid communication channel 5 is set larger than the vertical dimension of the gas discharge channel 6. The gas discharge channel 6 extends from the upper part to the lower part of the silicon substrate 52.
[0018]
The liquid supply channel 1, the gas supply channel 2, and the gas-liquid two-phase channel 3 have a channel cross-sectional area of 1 × 10. ^-7 m ² It is formed with the following microchannels. The lower limit value of the cross-sectional area of the flow path is a value at which a flow path can be manufactured. In this embodiment, the liquid supply channel 1 and the gas-liquid two-phase channel 3 have the same channel cross-sectional area, and the gas supply channel 2 has a smaller channel cross-sectional area. In addition, although the cross-sectional shape of the liquid supply flow path 1, the gas supply flow path 2, and the gas-liquid two-phase flow path 3 is rectangular, a trapezoid, a parallelogram, an ellipse, etc. may be sufficient. The angle formed by the gas-liquid two-phase flow path 3 and the liquid supply flow path 1 and the angle formed by the gas-liquid two-phase flow path 3 and the gas flow path 1 may be arbitrary as long as the angle satisfies an operation described later.
[0019]
The shape in which the gas supply channel 2 is open to the liquid supply channel 1 is longer than the direction in which the liquid flows cross. The opening shape is a rectangle that is easy to manufacture, but may be a trapezoid, a parallelogram, an ellipse, or the like if it is not necessary to consider the ease of manufacturing.
[0020]
The liquid discharge channel 13 extends downward from the liquid communication channel 5 to be communicated with and reaches the center of the silicon substrate 52. The central portion of the liquid discharge channel 13 is communicated with the liquid discharge port 24. The gas introduction channel 12 extends downward from the gas communication channel 10 to be communicated with each other, and is integrated into one at the lower part. The gathered portion of the gas introduction channel 12 is communicated with the gas inlet 23.
[0021]
Glass Substrate 5 3 A liquid discharge port 24 and a gas injection port 23 are formed through the upper and lower portions. One side of the liquid discharge port 24 communicates with the pump 34, and the other side communicates with the liquid discharge channel 13. One side of the gas inlet 23 is in communication with the pump 33, and the other side is in communication with the gas introduction channel 12. The pump 33 can be increased to a predetermined pressure or adjusted to a predetermined flow rate by a control device.
[0022]
Next, operation | movement of the reaction apparatus 60 mentioned above is demonstrated.
[0023]
In order to perform the gas-liquid reaction by the reaction device 60, the control device is operated and the pumps 31 to 34 are operated. As a result, the liquid for the gas-liquid reaction is introduced from the outside of the apparatus into the liquid introduction channel 14 via the pipe 42 and the liquid inlet 22, and further separated from the liquid introduction channel 14 into the plurality of liquid supply channels 1. Supplied by flowing. In addition, a gas for gas-liquid reaction is introduced from the outside of the apparatus into the gas introduction channel 12 through the pipe 43 and the gas inlet 23, and further divided into a plurality of gas communication channels 10 from the divided gas introduction channel 12. To the gas supply channel 2.
[0024]
The liquid supplied to the liquid supply channel 1 and the gas supplied to the gas supply channel 2 are merged to form a two-phase flow as shown in FIG. The bubble reaction channel 4 is reached. The two-phase flow of the gas-liquid two-phase flow path 3 is a state in which a minute amount of liquid and a minute amount of gas are alternated. Such a two-phase flow state can be generated by configuring with a fine liquid supply path 1, a fine gas supply path 2, and a fine gas-liquid two-phase flow path. In order to generate such a two-phase flow state more reliably, it is possible to control the pump 32 and the pump 33 by the control device. That is, when the liquid injection pressure into the liquid supply flow path 1 is increased, the volume of the gas flowing through the gas-liquid two-phase flow path 3 is decreased. Conversely, when the gas injection pressure into the gas supply flow path 2 is increased, the gas-liquid flow is increased. Since the volume of the gas flowing through the two-phase channel 3 increases, the volume of the gas flowing through the gas-liquid two-phase channel 3 can be adjusted and the two-phase flow can be generated by controlling both pressures. The same effect can be obtained by adjusting not only the pressure but also the flow rate. It is also possible to generate a two-phase flow by experimentally determining the cross-sectional areas of the flow paths 1 to 3 while keeping the pumps 32 and 33 constant.
[0025]
When each gas flows through the gas-liquid two-phase flow path 3, the reaction between the gas and the liquid is started. That is, a part of the gas (the gas at the boundary with the liquid) reacts with the surrounding liquid. And since the two-phase flow production | generation part which consists of the liquid supply flow path 1, the gas supply flow path 2, and the gas-liquid two-phase flow path 3 is formed in the fine flow path, the gas in a two-phase flow is produced | generated very small. . As a result, the gas-liquid reaction rate in the gas-liquid two-phase channel 3 and the bubble reaction channel 4 is increased. Since the fine liquid supply channel 1, the gas supply channel 2, and the gas-liquid two-phase channel 3 are uniformly formed using the micromachining technology, the gas-liquid supply, the gas-liquid reaction, and the two-phase flow can be formed. It is performed stably.
[0026]
In particular, the shape in which the gas supply channel 2 is open to the liquid supply channel 1 is substantially longer than the length in the direction in which the liquid flows in the direction in which the liquid flows. The gas flowing out from the liquid supply channel 1 can be reduced. That is, since the surface tension of the bubbles remaining at the outlet of the flow path 2 is reduced, the gas inflow volume at the junction can be set smaller. Also from this point, the gas-liquid reaction rate in the gas-liquid two-phase channel 3 and the bubble reaction channel 4 can be increased.
[0027]
Further, since the cross-sectional area of the gas supply channel 2 is smaller than that of the liquid supply channel 1, the gas flowing out from the gas supply channel 2 to the liquid supply channel 1 can be reduced. Also from this point, the gas-liquid reaction rate in the gas-liquid two-phase channel 3 and the bubble reaction channel 4 can be increased.
[0028]
The gas flowing out from the gas-liquid two-phase channel 3 to the bubble reaction channel 4 is extruded into the liquid in the bubble reaction channel 4 as fine bubbles. Since these fine bubbles are extruded from the gas-liquid two-phase flow channel 3 which is a fine flow channel in a two-phase flow state in which the liquid and the gas are alternated, the two-phase flow gas becomes uniform and extremely fine bubbles. Are extruded sequentially. When the volume of the two-phase flow gas is set to be particularly small, the gas extruded from the gas-liquid two-phase flow path 3 is easily pushed out, and finer bubbles are pushed into the bubble reaction flow path 4. Will be. The fine bubbles rise in the liquid in the bubble reaction channel 4 and react with the liquid while staying in the liquid in the bubble reaction channel 4.
[0029]
Since the bubbles extruded from the gas-liquid two-phase flow path 3 are uniform and fine, the reaction with the liquid in the bubble reaction flow path 4 is performed stably and rapidly. That is, in the case of a large bubble, the bubble immediately rises in the bubble reaction channel 4 and the contact time with the liquid is shortened and the specific surface area to be contacted is small, so the gas-liquid reaction rate per bubble volume is slow. turn into. On the other hand, in the case of small bubbles, since the bubbles slowly rise in the bubble reaction channel 4 and the contact time with the liquid becomes long and the specific surface area becomes large, the gas-liquid reaction rate per bubble volume is high. Become. And even if the contact time with the liquid of bubbles becomes long, since the bubbles are made uniform, a stable gas-liquid reaction ratio can be obtained. Therefore, when analyzing the liquid subjected to the gas-liquid reaction in this way, the analysis accuracy is remarkably improved.
[0030]
And since the several two-phase flow production | generation part is provided with respect to the bubble reaction flow path 4, the production | generation number of the bubbles per unit volume in the bubble reaction flow path 4 increases. As a result, the amount of gas-liquid reaction in the bubble reaction channel 4 is increased, and the gas-liquid reaction efficiency of the reaction device 60 is improved. In addition, the amount of gas-liquid reaction in the gas-liquid two-phase flow path 3 of the two-phase flow generation unit is increased, and the gas-liquid reaction efficiency of the reaction device 60 is also improved from this point.
[0031]
Moreover, since the fine liquid supply channel 1, the gas supply channel 2, and the gas-liquid two-phase channel 3 are uniformly formed using the micromachining technology, the gas-liquid supply, gas-liquid reaction, and two-phase flow are controlled. Formation is stable.
[0032]
In addition, when producing bubbles having a diameter of 100 μm or less, the cross-sectional area of the flow paths 1 to 3 is 1 × 10. ^-8 m ² This is possible by setting the following to 0.25 × 10 ^-8 m ² By making the following, the diameter of the bubbles can be reduced to half or less. By setting the channel cross-sectional area in this way, the gas-liquid reaction rate in the gas-liquid two-phase channel 3 and the bubble reaction channel 4 can be remarkably increased. Note that the lower limit value of the cross-sectional area of the flow path is a value at which a flow path can be manufactured.
[0033]
The fine bubbles rise to the interface between the liquid and the gas reservoir, and are separated from the liquid together with the gas reservoir. Since the gas in the gas reservoir is also in contact with the liquid, the reaction of both occurs, but the reaction rate is small because the specific surface area of the interface is smaller than that of the fine bubbles.
[0034]
The gas separated from the liquid is guided downward through the gas discharge passage 6 by the suction action of the pump 31, and is further discharged to the outside of the apparatus through the gas discharge port 21 and the pipe 41. On the other hand, the liquid in the upper part of the bubble reaction channel 4 that has reacted with the gas is guided downward through the liquid communication channel 5 and the liquid discharge channel 13 by the suction action of the pump 34, and further passes through the liquid outlet 24 and the pipe 44. It is discharged out of the device.
[0035]
The bubble reaction channel 4 is formed in a vertically long shape, the lower end portion of the liquid communication channel 5 is positioned below the lower end portion of the gas discharge channel 6, and the vertical dimension of the liquid communication channel 5 is the upper and lower dimensions of the gas discharge channel 6. Since it is set to be larger than the dimension, the separated gas and liquid are surely discharged. That is, even if the supply amount of liquid and gas, the reaction amount, or the like changes, such a configuration can reliably absorb this change.
[0036]
In addition, when gas and liquid are automatically separated and taken out by the supply action of the pump 32 and the pump 33, it is not necessary to provide the pump 31 and the pump 34.
[0037]
The discharged gas and liquid are guided to an analyzer and the like, and a predetermined analysis is performed. That is, the reaction device 60 is used when analyzing a component contained in a gas by dissolving it in a specific liquid or when analyzing a component contained in a liquid dispersed in a specific gas. These two methods of use are particularly useful when the reagent used is expensive or when the amount of the substance to be inspected is very small. Furthermore, the reaction device 60 can be applied when producing a chemical produced by reacting a liquid and a gas, and can be applied when changing components present in the gas using an enzyme contained in the liquid.
[0038]
The apparatus main body 50 is used as a vertical type in this embodiment, but can also be used as a horizontal type. The horizontal apparatus main body 50 is effective when the installation height is limited. When used as a horizontal type, it is necessary to provide a flow path for supplying gas and a flow path for discharging gas on the upper side of the liquid flow path.
[0039]
Further, in the present embodiment, the flow path of the apparatus main body 50 is processed by using a micromachining technique, but can also be processed by using a semiconductor manufacturing technique. By forming the flow path using a semiconductor manufacturing technique, mass production at low cost becomes easy. Furthermore, the apparatus main body 50 may be manufactured using a resin in which a flow path on a silicon substrate manufactured using a micromachining technique is transferred.
[0040]
In addition, the flow path of the apparatus main body 50 is formed in the silicon substrate 52 in this embodiment, but the flow path may be formed in the glass substrate 51 and the glass substrate 53, and further, the glass substrate 51 and the silicon substrate 52. In addition, the flow path may be formed by being shared by the glass substrate 53.
[0041]
Next, the reaction apparatus of 2nd Example of this invention is demonstrated using FIG. The second embodiment is different from the first embodiment as described below, and is basically the same as the first embodiment in other points.
[0042]
In the second embodiment, the gas-liquid two-phase channel 3 is formed so that the channel length is longer than the bubble reaction channel 4. In general gas-liquid reaction, as shown in the first embodiment, it is more efficient to shorten the length of the gas-liquid two-phase channel 3 and lengthen the bubble reaction channel 4. However, depending on physical properties such as the viscosity of the liquid, the reaction performed in the gas-liquid two-phase flow path 3 may be more efficient. In such a case, the second embodiment is effective.
[0043]
Next, a reaction apparatus according to a third embodiment of the present invention will be described with reference to FIG. The third embodiment is different from the first embodiment as described below, and is basically the same as the first embodiment in other points.
[0044]
In the third embodiment, a plurality of apparatus main bodies 50 are connected in parallel. Specifically, the pumps 31 to 34 are common to each apparatus main body 50, and the pipes 41 to 44 on the apparatus main body 50 side of each pump 31 to 34 are branched and connected to the apparatus main body 50. In this way, the apparatus main body 50 is connected in parallel, so that the processing amount can be increased several times. Therefore, it is possible to easily obtain reaction apparatuses 60 having different throughputs using the same apparatus main body 50. In addition, when the processing amount of each apparatus main body 50 varies and the bubble generation efficiency decreases, a flow rate adjusting valve is provided in each pipe 42 between the pump 32 and each inlet 22, and each pump 33 and each note. It is desirable to improve the bubble generation efficiency by adjusting the processing amount of each apparatus body 50 by providing a flow rate adjusting valve in each pipe 43 between the inlet 23.
[0045]
Next, the reaction apparatus of 4th Example of this invention is demonstrated using FIG. The fourth embodiment is different from the first embodiment as described below, and the other points are basically the same as those of the first embodiment.
[0046]
In the fourth embodiment, a plurality of apparatus main bodies 50a, 50b, 50c are connected in series. Specifically, the pipes 42a and 43a are connected to the first apparatus main body 50a, the pipe 44a of the apparatus main body 50a is connected to the pipe 42b of the second apparatus main body 50b, and the pipe 41a of the apparatus main body 50a is connected to the pipe 43b. It is connected to the. As a result, the liquid and gas that have undergone the gas-liquid reaction in the first apparatus main body 50a are supplied to the second apparatus main body 50b. Furthermore, the pipe 44b of the apparatus main body 50b is connected to the pipe 42c of the third apparatus main body 50c, and the pipe 41b of the apparatus main body 50b is connected to the pipe 43c of the apparatus main body 50c. Thereby, the liquid and gas in which the gas-liquid reaction was performed in the 2nd apparatus main body 50b are supplied to the 3rd apparatus main body 50c. Then, the liquid and gas subjected to the gas-liquid reaction in the third device main body 50c are taken out from the pipe 44c and the pipe 41c.
[0047]
Thus, by connecting the apparatus main body 50 in series, the gas-liquid reaction time is remarkably increased, and the gas-liquid reaction rate is remarkably increased. Therefore, it is possible to easily obtain a reaction apparatus 60 having a different gas-liquid reaction rate by using a plurality of the same apparatus main bodies 50a to 50c.
[0048]
Next, the reaction apparatus of 5th Example of this invention is demonstrated using FIG. The fifth embodiment is different from the fourth embodiment as described below, and is otherwise the same as the fourth embodiment.
[0049]
In this fifth embodiment, a plurality of apparatus main bodies 50a, 50b, 50c are connected in series, but the direction of liquid flow is opposite to that of the fourth embodiment. In the fifth embodiment, a high gas-liquid reaction rate can be obtained as in the fourth embodiment. By properly using the fourth and fifth embodiments, restrictions on the arrangement of liquid and gas pipes can be improved.
[0050]
Next, the present invention reference An example mixing system will be described with reference to FIGS.
[0051]
First, the overall configuration and operation of this mixing system will be described with reference to FIGS. The mixing device 160 is detachably attached to a dedicated holder 61. At least one of the mixing device 160 and the holder 61 has an elastic portion and is detachably attached, so that the attached state is securely held and can be easily detached. Thus, when a malfunction occurs in the mixing device 160, it can be easily replaced with a spare part. In addition, two or more types of mixing devices (not shown) having different structures are prepared, and the micro-mixing device can be replaced manually or automatically as necessary to obtain the desired product. Yes.
[0052]
The holder 61 is connected to a plurality of pipes 80 to 84, and the plurality of pipes 80 to 84 includes inlet pipes 80 to 82 and outlet pipes 83 and 84. One side of the inlet pipe 80 communicates with a liquid inlet 125 described later, one side of the inlet pipe 81 communicates with a liquid inlet 122 described later, and one side of the inlet pipe 82 communicates with a fluid inlet 123 described later. One side of the outlet pipe 83 is connected to a liquid discharge port 124 described later, and one side of the outlet pipe 84 is connected to a fluid discharge port 121 described later.
[0053]
Here, the connection between the mixing device 160 and the dedicated holder 161 will be described with reference to FIG. The dedicated holder 161 is assembled by holder forming parts 201, 202, 203 and an elastic body 200. The mixing device 160 is sandwiched between the holder forming parts 202 and 203 via the elastic body 200. Further, the holder forming components 202 and 203 are connected to the holder forming component 201 through the elastic body 200.
[0054]
Further, the flow paths 180, 181, 182, 183, 184 in the dedicated holder 161 are connected to the inlet pipes 80, 81, 82 and the outlet pipes 83, 84, and the connection pipes 280, 281 are respectively provided inside the dedicated holder. , 282, 283, and 284.
[0055]
Since the holder forming parts 201, 202, 203 and the mixing device 160 have a structure in which force is applied in the direction of the arrow in the figure, the elastic body 200 is deformed, so the flow path in the dedicated holder 161 has an airtight structure. In order to become, it is cut off from the outside. Therefore, the fluid supplied from the inlet pipes 80, 81, 82 is supplied to the mixing device 160 by the dedicated holder 161 and is discharged through the outlet pipes 83, 84.
[0056]
In addition, the shape of the elastic body used here may be a sheet shape or an O-ring shape.
[0057]
The other side of the inlet pipe 80 and the inlet pipe 81 is connected to pipes 85 and 86 connected to the plurality of containers 62 and 63 via the flow rate adjusting valve 91, and the other side of the inlet pipe 82 is connected to the plurality of containers 62 and 63. The pipes 85 and 86 are connected to each other via a flow rate adjusting valve 92. The inlet pipe 80 is provided in parallel with the inlet pipe 81, and a flow rate adjusting valve 95 is provided at an intermediate portion. The flow rate adjusting valves 91, 92, and 95 are controlled to be opened and closed and opened by a control device (not shown). The pipe 81, the pipe 85, the flow rate adjusting valve 91, and the pump 93 constitute a first pressurizing unit for the two-phase flow generating unit, and the pipe 82, the pipe 85, the flow rate adjusting valve 92, and the gas cylinder 63 are used for the two-phase flow generating unit. A second pressurizing means is configured.
[0058]
The plurality of containers 62 and 63 in which the fluid is stored include a container 62 in which the liquid used for mixing is stored and a container 63 in which the gas used for mixing is stored. A plurality of containers 62 are formed, and a pipe 85 is connected to each. These pipes 85 have a flow rate adjusting valve 91 and are connected so as to concentrate on the pipe 81 (and the pipe 80), and have a flow rate adjusting valve 92 and are connected to the pipe 82 in a concentrated manner. A pump 93 for supplying the liquid in the container 62 is provided between the flow rate adjusting valves 91 and 92 and the container 62 (in other words, on the outlet side of the container 62). A plurality of containers 63 are formed, and a pipe 86 is connected to each. These containers 63 are constituted by gas cylinders, and the gas accommodated in the containers 63 flows out by the pressure of the enclosed gas.
[0059]
The other side of the outlet pipe 83 is connected to the container 64, and the other side of the outlet pipe 84 is connected to the container 65 via the flow rate adjustment valve 94. The flow rate adjusting valve 94 is controlled to be opened and closed by a control device.
[0060]
When the selected flow rate adjusting valve 91 is opened by the operation of the control device, the liquid gas in the container 62 corresponding to the flow rate adjusting valve 91 reaches the holder 61 through the pipe 81 (when the flow rate adjusting valve 95 is open). Also reaches the holder 61 through the pipe 80) and is further supplied to the mixing device 160. Further, when the selected flow rate adjustment valve 92 is opened by the operation of the control device, the liquid or gas in the containers 62 and 63 corresponding to the flow rate adjustment valve 92 (referred to as fluid when these are collectively referred to). It reaches the holder 61 through the pipe 82 and is further supplied to the mixing device 160. In order to supply the liquid from the container 62, the corresponding pumps 93 must be operated simultaneously. In this way, mixing of liquid and gas or liquid and liquid is started in the mixing device 160.
[0061]
When there is only one kind of target product resulting from this mixing, the flow rate control valve 94 is closed, and everything is collected in the container 64 through the pipe 83 and provided as a product. In addition, when there are two types of products resulting from the above mixing, the flow rate control valve 94 is opened, and each of them flows separately into the pipe 83 and the pipe 84, collects the necessary products, and collects the desired products. Can be obtained.
[0062]
Depending on the type of liquid or gas to be mixed, the flow rate adjusting valve 95 is opened to supply the liquid from the liquid inlet 125 to the mixing channel 104, and the liquid flows at the outlet of the communication channel 115. It has become. That is, when the two-phase fluid pushed out from the communication channel 115 to the mixing channel 104 is an object in which liquid bubbles or bubbles stagnate in the mixing channel 104, the liquid is supplied from the liquid inlet 125. As a result, liquid bubbles or bubbles can be prevented from being immediately combined in the mixing channel 104.
[0063]
A specific configuration and operation of the mixing device 160 will be described with reference to FIGS.
[0064]
The mixing device 160 includes a device main body 150 constituting a main part. The apparatus main body 150 is formed of a multi-layer structure in which a plurality of substrates are stacked and joined. Specifically, the apparatus main body 150 is a three-layer structure including a glass substrate 151, a silicon substrate 152, and a glass substrate 153. The flow paths and distribution ports of the glass substrate 151, the silicon substrate 152, and the glass substrate 153 are processed into a predetermined shape using a micromachining technique. The apparatus main body 150 is composed of microcapsules made of a thin rectangular parallelepiped having an outer dimension of about 15 mm wide × 20 mm high × 1.5 mm deep.
[0065]
A fluid discharge port 121 is formed through the lower portion of the glass substrate 151. One side of the fluid discharge port 121 communicates with the pipe 84, and the other side communicates with the fluid discharge channel 106. A liquid inlet 122 is formed below the glass substrate 153. One side of the first liquid inlet 122 communicates with the pipe 81, and the other side communicates with the liquid introduction channel 114. The pump 93 described above can be increased to a predetermined pressure or adjusted to a predetermined flow rate by a control device. Further, a second liquid inlet 125 is formed through the center of the glass substrate 153 so as to penetrate therethrough. One side of the second liquid inlet 125 is communicated with the pipe 80, and the other side is below the mixing channel 104, specifically below the communication channel 115 between the two-phase channel 103 and the mixing channel 104. It is communicated to.
[0066]
In the silicon substrate 152, the flow path is processed from both the front and rear sides using a micromachining technique. On one side (front side) of the silicon substrate 152, a liquid introduction flow path 114, a liquid supply flow path 101, a fluid supply flow path 102, and a two-phase flow path 103 are arranged upward from the bottom, and a liquid discharge flow path. 113 are arranged independently at the top. On the other side (rear side) of the silicon substrate 152, the fluid introduction channel 112 and the mixing channel 104 are formed independently in the vertical direction. A fluid discharge channel 106 is formed on the side of the mixing channel 104. The liquid discharge channel 113 communicates with the mixing channel 104 through the communication channel 105. The fluid introduction channel 112 communicates with the fluid supply channel 102 via the communication channel 110. Thus, the communication flow path 105 and the communication flow path 110 function as holes that connect the front and rear flow paths.
[0067]
The lower part of the liquid introduction channel 114 is communicated with the first liquid inlet 122, and the upper part is communicated with the lower part of the liquid supply channel 101. A plurality of liquid supply channels 101 communicate with the liquid introduction channel 114. A fluid supply channel 102 communicates with the upper portion of each liquid supply channel 101. The two-phase flow path 103 extends upward from a fluid confluence portion, which is a communication portion between the liquid supply flow path 101 and the fluid supply flow path 102, and communicates with the lower portion of the mixing flow path 104. Accordingly, a plurality of two-phase flow generation units including the liquid supply channel 101, the fluid supply channel 102, and the two-phase channel 103 are provided in parallel between the liquid introduction channel 114 and the mixing channel 104. The mixing channel 104 is formed in a vertically long shape. The upper part of the mixing channel 104 communicates with the communication channel 105 and the fluid discharge channel 106. The lower end portion of the communication flow path 105 is positioned below the lower end portion of the fluid discharge flow path 106, and the vertical dimension of the communication flow path 105 is set larger than the vertical dimension of the fluid discharge flow path 106. The fluid discharge channel 106 extends from the upper part to the lower part of the silicon substrate 152.
[0068]
The liquid supply channel 101, the fluid supply channel 102, and the two-phase channel 103 have a channel cross-sectional area of 1 × 10. ^-7 m ² It is formed with the following microchannels. The lower limit value of the cross-sectional area of the flow path is a value at which a flow path can be manufactured. Book reference In the example, the liquid supply channel 101 and the two-phase channel 103 have the same channel cross-sectional area, and the fluid supply channel 102 has a smaller channel cross-sectional area.
[0069]
Further, the shape in which the fluid supply channel 102 is open to the liquid supply channel 101 is longer than the direction in which the liquid flows intersect. The opening shape is a rectangle that is easy to manufacture.
[0070]
The liquid discharge channel 113 extends below the communication channel 105 to be communicated with and reaches the upper center of the silicon substrate 152. A central upper portion of the liquid discharge channel 113 communicates with the liquid discharge port 124. On the other hand, the fluid introduction flow path 112 extends downward from the communication flow path 110 to be communicated with each other, and is unified at the lower part. The gathered portion of the fluid introduction channel 112 is communicated with the fluid inlet 123.
[0071]
A liquid discharge port 124 is formed through the center upper portion of the silicon substrate 151. One side of the liquid discharge port 124 is connected to the pipe 83, and the other side is connected to the liquid discharge channel 113. A fluid inlet 123 is formed through the lower portion of the silicon substrate 153. One side of the fluid inlet 123 communicates with the pipe 82, and the other side communicates with the fluid introduction channel 112.
[0072]
The operation of the mixing device 160 will be described.
[0073]
In order to mix the liquid and the fluid by the mixing device 160, the operation of the pump 93 and the flow rate adjusting valve corresponding to the containers 62 and 63 in which the liquid or gas to be mixed is stored by operating the control device. 91 is opened (including flow rate adjustment). Thereby, one liquid to be mixed is introduced from the container 62 into the liquid introduction channel 114 via the pipe 81 and the first liquid inlet 122, and a plurality of liquid supply channels from the liquid introduction channel 114. 101 is divided and supplied. The other liquid or gas to be mixed is introduced from the container 63 or the container 62 into the fluid introduction passage 112 divided into a plurality of parts through the pipe 82 and the fluid inlet 123, and further from these fluid introduction passages 112. The fluid is supplied to the fluid supply channel 102 through the communication channel 110.
[0074]
One liquid supplied to the liquid supply flow channel 101 and the other liquid or gas supplied to the fluid supply flow channel 102 are merged to form a two-phase flow through the two-phase flow channel 103, and further, a mixed flow The road 104 is reached. The two-phase flow in the two-phase flow path 103 is a state in which a minute amount of one liquid and a minute amount of the other liquid or gas are alternated. Such a two-phase flow state can be generated by configuring the fine liquid supply channel 101, the fine fluid supply channel 102, and the fine two-phase channel 103. In order to generate such a two-phase flow state more reliably, it is possible to control the pump 93 and the flow rate adjusting valves 91 and 92 by the control device. That is, when the injection pressure of one liquid is increased or the injection flow rate is increased, the volume of the other liquid or gas flowing through the two-phase flow path 103 decreases, and conversely, the injection pressure of the other liquid or gas is increased or the injection flow rate is increased. If the number is increased, the volume of the other liquid or gas flowing through the two-phase flow path 103 is increased. Therefore, by controlling these, the volume of the other liquid or gas flowing through the two-phase flow path 103 is adjusted and the two-phase flow is increased. Can be generated.
[0075]
When the other liquid or gas flows through the two-phase flow path 103, mixing with one liquid is started. Depending on the type of both liquids or gases to be mixed, the other liquid or gas is physically mixed with one liquid and the other liquid or gas is reacted and mixed with one liquid. There are some cases. In the latter case, a part of the other liquid or gas reacts with the other surrounding liquid and is mixed.
[0076]
And since the two-phase flow generation part which consists of the liquid supply flow path 101, the fluid supply flow path 102, and the two-phase flow path 103 is formed with the fine flow path, the other liquid or gas in a two-phase flow is produced | generated very small. Is done. This increases the mixing speed between the fluids in the two-phase channel 103 and the mixing channel 104. In addition, since the fine liquid supply channel 101, the fluid supply channel 102, and the two-phase channel 103 are uniformly formed using the micromachining technology, the fluid supply, the fluid mixing, and the formation of the two-phase flow are stabilized. Done.
[0077]
In particular, the shape in which the fluid supply channel 102 is open to the liquid supply channel 101 is substantially longer than the length in the direction in which the fluid flows in the direction in which the fluid flows. The other liquid or gas flowing out from the liquid supply channel 101 can be reduced. That is, since the surface tension of the other liquid or bubble remaining at the outlet of the flow path 2 is reduced, the inflow volume of the other liquid or gas at the junction can be set smaller. Also from this point, the mixing speed between the fluids in the two-phase channel 103 and the mixing channel 104 can be increased.
[0078]
Furthermore, since the cross-sectional area of the fluid supply channel 102 is smaller than that of the liquid supply channel 101, the other liquid or gas that joins the fluid supply channel 102 to the liquid supply channel 101 can be made smaller. Also from this point, the mixing speed between the two fluids in the two-phase channel 103 and the mixing channel 104 can be increased.
[0079]
The other liquid or gas that flows out from the two-phase channel 103 to the mixing channel 104 via the communication channel 115 is extruded into the liquid in the mixing channel 104 as fine liquid bubbles or bubbles. Since these fine liquid bubbles or bubbles are extruded in a two-phase flow state alternately with one liquid from the two-phase flow path 103 which is a fine flow path, they are sequentially extruded in a uniform and extremely fine state. In the case where the volume of the other liquid or gas in the two-phase flow is set to be particularly small, the other liquid or gas extruded from the two-phase flow path 103 is easily extruded, and fine liquid bubbles or Air bubbles are pushed out into the mixing channel 104. The fine liquid bubbles or bubbles rise in the liquid in the mixing channel 104 and mix with the liquid while staying in the liquid in the mixing channel 104.
[0080]
Since the liquid bubbles or bubbles extruded from the two-phase flow path 103 are uniform and fine, mixing with the liquid in the mixing flow path 104 is performed stably and rapidly. That is, in the case of a large liquid bubble or bubble, the liquid bubble or bubble immediately rises in the mixing channel 104 to shorten the contact time with the liquid and reduce the specific surface area to be contacted. The reaction rate becomes slow. On the other hand, in the case of small liquid bubbles or bubbles, the liquid bubbles or bubbles slowly rise in the mixing channel 104 and the contact time with the liquid becomes longer and the specific surface area becomes larger. The mixing speed becomes faster. And even if the contact time with the liquid of a liquid bubble or a bubble becomes long, since the liquid bubble or a bubble is equalized, the stable mixing ratio is obtained. Therefore, when analyzing the mixed liquid in this way, the analysis accuracy is remarkably improved.
[0081]
When the liquid and the liquid are mixed and then taken out as a light liquid and a heavy liquid, the flow rate adjusting valve 95 is opened, the light liquid is taken out from the fluid discharge port 121, and the heavy liquid is discharged from the liquid discharge flow. It is taken out from the road 113. When the gas and the liquid are taken out after mixing the gas and the liquid, the flow rate adjusting valve 95 is opened, the gas is taken out from the fluid discharge port 121, and the liquid is taken out from the liquid discharge channel 113. . When the liquid and the liquid are mixed and taken out as one type of liquid, the flow rate adjusting valve 95 is closed and the liquid is taken out only from the liquid discharge channel 113.
[0082]
When the other liquid or gas flowing out from the two-phase flow path 103 to the mixing flow path 104 is of a type that tends to stagnate when being extruded as fine liquid bubbles or bubbles in the liquid of the mixing flow path 104 As described above, the flow rate adjusting valve 95 is also opened by the control device, and the same liquid as the liquid supplied to the liquid introduction channel 114 is supplied from the liquid inlet 125 to the mixing channel 104. The liquid in the mixing channel 104 is applied with a fluid force from the liquid inlet 125 to the liquid outlet 124 via the outlet of the communication channel 115. As a result, the liquid bubbles or bubbles pushed out to the mixing channel 104 are flowed to the liquid discharge port 124 side without stagnation, and are prevented from being immediately coupled to each other.
[0083]
And since the some two phase flow production | generation part is provided with respect to the mixing flow path 104, the production | generation number of the liquid bubble or bubble per unit volume in the mixing flow path 104 increases. As a result, the amount of mixing in the mixing channel 104 is increased, and the mixing efficiency of the mixing device 160 is improved. In addition, the amount of mixing in the two-phase flow path 103 of the two-phase flow generating unit is increased, and the mixing efficiency of the mixing device 160 is improved from this point.
[0084]
In addition, since the fine liquid supply channel 101, the fluid supply channel 102, and the two-phase channel 103 are uniformly formed by using micromachining technology, supply of liquid or gas, liquid and gas, or liquid and liquid And the formation of a two-phase flow is performed stably.
[0085]
In addition, when producing | generating the liquid bubble or bubble of diameter 100 micrometers or less, the cross-sectional area of the flow paths 1-3 is 1 * 10. ^-8 m ² This is possible by setting the following to 0.25 × 10 ^-8 m ² By making the following, the diameter of the liquid bubbles or bubbles can be reduced to half or less. By setting the channel cross-sectional area in this way, the mixing speed in the two-phase channel 103 and the mixing channel 104 can be remarkably increased. Note that the lower limit value of the cross-sectional area of the flow path is a value at which a flow path can be manufactured.
[0086]
The fine liquid bubbles or bubbles rise to the interface between the liquid and the fluid reservoir, and together with the liquid or gas in the fluid reservoir, are separated from the liquid below the fluid reservoir.
[0087]
The liquid or gas in the fluid pool is guided downward through the fluid discharge channel 106 and further taken out to the container 65 through the fluid discharge port 121 and the pipe 84. However, when the liquid or gas in the fluid pool is taken out, the flow rate adjustment valve 94 is opened as described above.
[0088]
On the other hand, the liquid in the mixing channel 104 mixed with the liquid bubbles or bubbles is guided to the liquid outlet 124 through the communication channel 105 and the liquid discharge channel 113, and is discharged to the container 64 through the pipe 83.
[0089]
The mixing flow path 104 is formed in a vertically long shape, the lower end portion of the communication flow path 105 is positioned below the lower end portion of the fluid discharge flow path 106, and the vertical dimension of the communication flow path 105 is larger than the vertical dimension of the fluid discharge flow path 106. Since it is set, the separated liquid or gas and the liquid are surely discharged. That is, even if the supply amount or mixing amount of liquid or gas and liquid changes, such a configuration can reliably absorb this change.
[0090]
The liquid discharged from the liquid discharge port 124 is guided to the container 64, and the liquid or gas discharged from the fluid discharge port 121 is guided to the container 65, which is a mixture for analysis, chemicals, cosmetics, nutrients. Etc., and other mixtures. In other words, the mixing device 160 is used to analyze a component contained in a gas by dissolving it in a specific liquid, or to disperse and analyze a component contained in a liquid in a specific gas. These two methods of use are particularly useful when the reagent used is expensive or when the amount of the substance to be inspected is very small. The mixing device 160 can be applied when producing a chemical produced by reacting a liquid and a gas, and can be applied when changing a component present in the gas using an enzyme contained in the liquid. Furthermore, the mixing device 160 is used for manufacturing cosmetics, nutrients, and the like by mixing liquids or liquids or mixing liquids and gases.
[0091]
The device body 150 is a book reference In the example, it is used as a vertical type, but it can also be used as a horizontal type. The horizontal apparatus main body 150 is effective when there is a restriction on the installation height. When used as a horizontal type, it is necessary to provide a flow path for supplying gas and a flow path for discharging gas on the upper side of the liquid flow path.
[0092]
Further, the flow path of the apparatus main body 150 is the main flow path. reference In the example, processing is performed using micromachining technology, but processing using semiconductor manufacturing technology is also possible. By forming the flow path using a semiconductor manufacturing technique, mass production at low cost becomes easy. Furthermore, the apparatus main body 150 may be manufactured using a resin in which a flow path on a silicon substrate manufactured using a micromachining technique is transferred.
[0093]
Further, the flow path of the apparatus main body 150 is the main flow path. reference In the example, it is formed on the silicon substrate 52, but a flow path may be formed on the glass substrate 151 and the glass substrate 153, and further, the flow path is shared by the glass substrate 151, the silicon substrate 152, and the glass substrate 153. It may be formed.
[0094]
Also book reference In the example, only one mixing device 160 is used, but a plurality of mixing devices 160 are used to perform parallel processing as in the third embodiment or in series as in the fourth or fifth embodiment. Processing may be performed. Further, a plurality of these parallel processing and serial processing may be combined to sequentially mix three or more kinds of materials.
[0095]
Also book reference In the example, three liquid containers 62 and three gas cylinders 63 are shown. However, in the present invention, it is not necessary to stick to this number and combination, and the minimum necessary number is two. One piece and one gas cylinder 63 or two liquid containers 62 may be used. In addition, five pipes connected to the holder 61 are shown in the figure. However, in the present invention, it is not necessary to be particular about this number, and the minimum required number is three lines, two inlet pipes and one outlet pipe. Or more.
[0096]
Further, the fluid flowing through the pipe connected to the dedicated holder 61 does not need to be one type, and a plurality of flow rate adjusting valves 91 or 92 are opened, and the flow rate is adjusted to an arbitrary value and led to the mixing device. Also good.
[0097]
Next, the reaction apparatus of 7th Example of this invention is demonstrated using FIG.14 and FIG.15. FIG. 14 is a cross-sectional view of the reactor main body corresponding to the AA cross section of FIG. 1 of the seventh embodiment of the present invention. FIG. 15 is a cross-sectional view of the reactor main body corresponding to the BB cross section of FIG. 1 of the seventh embodiment of the present invention.
[0098]
The seventh embodiment is basically the same as the first embodiment except for the following points. In the seventh embodiment, the liquid discharge passage 13 and the liquid discharge port 24 of the first embodiment are the gas discharge passage 13 and the gas discharge port 24, and the gas discharge passage 6 of the first embodiment is the liquid discharge passage. 6. The liquid communication channel 5 disposed between the bubble reaction channel 4 and the gas discharge channel 13 is the gas communication channel 5. A gas-liquid separator 54 is disposed in the gas communication path 5. As described above, the seventh embodiment has the gas and liquid discharge systems formed in reverse to the first embodiment.
[0099]
Since the gas-liquid separator 54 is formed of silicon and the surface is covered with a water-repellent film, the gas phase passes through but obstructs the passage of the liquid. For this reason, inclusion of droplets in the gas phase portion can be effectively suppressed. As the gas-liquid separator 54, for example, when the differential pressure before and after the gas-liquid separator 54 is 0.01 MPa, the liquid used is water and the contact angle with the water-repellent film is 100 degrees, the pores are 20 μm or less. A porous membrane in which is mainly formed is used. If the differential pressure before and after the gas-liquid separator 54 is even smaller, or if the contact angle between the liquid to be used and the water repellent film is large, the diameter of the pores may be further increased. Furthermore, the shape of the pores used here need not be a cylinder, but may be a quadrangular prism having a similar cross-sectional area.
[0100]
The gas separated from the liquid through the gas-liquid separator 54 is guided downward through the gas discharge channel 13 by the suction action of the pump, and is further discharged to the outside of the apparatus through the gas discharge port 24. On the other hand, the liquid in the upper part of the bubble reaction channel 4 that has reacted with the gas is guided downward through the gas discharge channel 6 by the suction action of the pump, and is further discharged out of the apparatus through the gas discharge port.
[0101]
A fine slit can be used as the gas-liquid separator 54. The long side of the cross section of the fine width slit is disposed perpendicular to the direction of travel of the bubble reaction channel 4, and the length is substantially equal to the channel width of the bubble reaction channel 4. The length of the short side of the fine slit is, for example, 10 μm or less when the differential pressure before and after the gas-liquid separator 54 is 0.01 MPa, the liquid used is water and the contact angle with the water-repellent film is 100 degrees. Is preferable. If the differential pressure before and after the gas-liquid separator 54 is even smaller, or if the contact angle between the liquid to be used and the water repellent film is large, the length of the short side of the fine slit may be increased. . Further, when the flow rate of the gas passing through the fine width slit is large, the fine width slit may be arranged in parallel to increase the processing amount per unit time.
[0102]
Further, by extending the water-repellent film of the gas-liquid separator 54 to a part of the upstream bubble reaction channel 4, the contact frequency of the liquid with the gas-liquid separator 54 is reduced, so that the gas-liquid separation performance is improved. You can also.
[0103]
【The invention's effect】
As is clear from the above description, according to the present invention, it is possible to provide a reaction apparatus that can obtain a stable gas-liquid mixing ratio and increase the reaction rate.
[Brief description of the drawings]
FIG. 1 is an exploded structural view showing a reactor according to a first embodiment of the present invention.
FIG. 2 is a cross-sectional view of a reactor main body corresponding to the line AA in FIG.
FIG. 3 is a cross-sectional view of a reaction apparatus main body corresponding to the line BB in FIG.
4 is an enlarged view of a portion C in FIG. 1. FIG.
FIG. 5 is a configuration diagram in which a glass substrate is omitted from a reactor according to a second embodiment of the present invention.
FIG. 6 is a configuration diagram of a reaction apparatus according to a third embodiment of the present invention.
FIG. 7 is a configuration diagram of a reaction apparatus according to a fourth embodiment of the present invention.
FIG. 8 is a configuration diagram of a reaction apparatus according to a fifth embodiment of the present invention.
FIG. 9 reference It is a block diagram of an example mixing system.
10 is an enlarged cross-sectional view of a holder portion used in the mixing system of FIG.
FIG. 11 is a front configuration diagram of a mixing device used in the mixing system of FIG. 9;
12 is a cross-sectional view taken along the line CC of FIG.
13 is a cross-sectional view taken along the line DD of FIG.
FIG. 14 is a cross-sectional view of a reactor main body according to a seventh embodiment of the present invention corresponding to the AA cross section of FIG.
15 is a cross-sectional view of a reactor main body according to a seventh embodiment of the present invention corresponding to the BB cross section of FIG.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 ... Liquid supply flow path, 2 ... Gas supply flow path, 3 ... Gas-liquid two-phase flow path, 4 ... Bubble reaction flow path, 5 ... Liquid communication flow path, 6 ... Gas discharge flow path, 10 ... Gas communication flow path , 12 ... Gas introduction channel, 13 ... Liquid discharge channel, 14 ... Liquid introduction channel, 21 ... Gas outlet, 22 ... Liquid inlet, 23 ... Gas inlet, 24 ... Liquid outlet, 31-34 ... Pumps, 41 to 44 ... pipes, 50 ... device main body, 51 ... glass substrate, 52 ... silicon substrate, 53 ... glass substrate, 60 ... reactor, 61 ... holder.

Claims (6)

A liquid introduction channel through which liquid is introduced;
A liquid supply channel having a plurality of fine channel cross-sectional areas in which liquid is introduced in the same direction from the liquid introduction channel, each provided in parallel;
A gas introduction channel through which gas is introduced;
A gas supply channel provided in parallel corresponding to each of the plurality of liquid supply channels, and having a fine channel cross-sectional area in which gas is introduced in the same direction from the gas introduction channel;
Corresponding to each of the plurality of liquid supply flow paths, the liquid from the liquid supply flow path and the gas from the gas supply flow path are merged to form a liquid and a gas along the flow path direction. A two-phase flow path having a plurality of fine flow path cross-sectional areas that generate a two-phase flow alternating between,
A reaction channel that communicates with an outlet of each of the plurality of two-phase channels, and in which liquid and gas from the plurality of two-phase channels react;
A liquid discharge channel for discharging the liquid that has reacted with the gas in the reaction channel;
A reaction apparatus comprising a gas discharge channel for discharging the gas separated in the reaction channel. 2. The reaction apparatus according to claim 1 , wherein a cross-sectional area of the gas supply channel is smaller than a cross-sectional area of the liquid supply channel. The reactor according to claim 1 or 2 ,
The reaction apparatus according to claim 1, wherein a length of a liquid flowing in an opening of the gas supply flow path that joins the liquid supply flow path is substantially longer than a length in a direction crossing the opening. A reactor according to any one of claims 1 to 3, the length of each of the plurality of two-phase flow path, a reaction apparatus characterized by longer than a length of the reaction channel. A reactor according to any one of claims 1 to 3, the reactor being characterized in that established the gas-liquid separator between said reaction flow path and the liquid discharge flow path. A reactor according to any one of claims 1 to 5, wherein the plurality of liquid supply channel, each of the plurality of the gas supply channel and the two-phase flow path, the flow path cross-sectional area of 1 × 10 A reactor characterized by being formed at ^-7 m ² or less.

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