JP3985495B2 - Electrodeionization equipment - Google Patents
Electrodeionization equipment Download PDFInfo
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- JP3985495B2 JP3985495B2 JP2001325286A JP2001325286A JP3985495B2 JP 3985495 B2 JP3985495 B2 JP 3985495B2 JP 2001325286 A JP2001325286 A JP 2001325286A JP 2001325286 A JP2001325286 A JP 2001325286A JP 3985495 B2 JP3985495 B2 JP 3985495B2
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- 238000009296 electrodeionization Methods 0.000 title claims description 29
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 50
- 229910003460 diamond Inorganic materials 0.000 claims description 20
- 239000010432 diamond Substances 0.000 claims description 20
- 239000003011 anion exchange membrane Substances 0.000 claims description 10
- 238000005341 cation exchange Methods 0.000 claims description 10
- 239000012528 membrane Substances 0.000 claims description 10
- 238000011033 desalting Methods 0.000 claims description 8
- 229910052731 fluorine Inorganic materials 0.000 description 10
- 239000011737 fluorine Substances 0.000 description 10
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 8
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 8
- 238000005260 corrosion Methods 0.000 description 7
- 230000007797 corrosion Effects 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 5
- -1 fluorine ions Chemical class 0.000 description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 3
- 229910052796 boron Inorganic materials 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000000149 penetrating effect Effects 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000005115 demineralization Methods 0.000 description 2
- 230000002328 demineralizing effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000003014 ion exchange membrane Substances 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910001200 Ferrotitanium Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000002242 deionisation method Methods 0.000 description 1
- 238000010612 desalination reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/4604—Treatment of water, waste water, or sewage by electrochemical methods for desalination of seawater or brackish water
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/469—Treatment of water, waste water, or sewage by electrochemical methods by electrochemical separation, e.g. by electro-osmosis, electrodialysis, electrophoresis
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
- C02F1/46104—Devices therefor; Their operating or servicing
- C02F1/46109—Electrodes
- C02F2001/46133—Electrodes characterised by the material
- C02F2001/46138—Electrodes comprising a substrate and a coating
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/46—Apparatus for electrochemical processes
- C02F2201/461—Electrolysis apparatus
- C02F2201/46105—Details relating to the electrolytic devices
- C02F2201/46115—Electrolytic cell with membranes or diaphragms
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A20/00—Water conservation; Efficient water supply; Efficient water use
- Y02A20/124—Water desalination
Landscapes
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Chemical Vapour Deposition (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
Description
【0001】
【発明の属する技術分野】
本発明は、陰極板と陽極板との間に、複数のアニオン交換膜とカチオン交換膜とを交互に配列して濃縮室と脱塩室とを形成してなる電気脱イオン装置に係り、詳しくは、フッ素濃度の高い被処理水も処理することができる電気脱イオン装置に関する。
【0002】
【従来の技術】
半導体や液晶等を製造する電子産業分野の工場では、水の有効利用率を高めるために、洗浄水として使用した後の使用済み超純水(以下「回収水」と称す場合がある。)を回収、処理して再利用することが行われている。
【0003】
この回収水の脱イオン処理に電気脱イオン装置を用いることが特開2001−170658号に記載されている。
【0004】
【発明が解決しようとする課題】
回収水中にはフッ素イオンが含有されているため、電気脱イオン装置の陽極板近傍に腐食性の強いフッ酸(HF)が濃縮し、陽極板が腐食し易い。
【0005】
上記特開2001−170658号では、被処理水をフッ素吸着除去装置に通水してフッ素を除去した後、電気脱イオン装置に通水するようにしているが、フッ素を十分に除去し得るフッ素吸着除去装置が必要である。
【0006】
本発明は、フッ素濃度の高い被処理水であっても、フッ素吸着除去装置を用いることなく、あるいは簡易な構成のフッ素除去装置を用いるだけで、十分に処理することができる電気脱イオン装置を提供することを目的とする。
【0007】
【課題を解決するための手段】
本発明の電気脱イオン装置は、陰極板と陽極板との間に、複数のアニオン交換膜とカチオン交換膜とを交互に配列して濃縮室と脱塩室とを形成してなる電気脱イオン装置において、少なくとも該陽極板の水と接する面がダイヤモンドよりなることを特徴とするものである。
【0008】
かかる電気脱イオン装置は、少なくとも陽極板の水と接する面がダイヤモンドよりなるため、フッ酸により腐食を受けることがなく、高濃度フッ酸イオン含有水であっても長期にわたり安定して処理することができる。
【0009】
本発明では、陽極板だけでなく陰極板の水と接する面もダイヤモンドにて構成してもよい。また、陽極板や陰極板の全体をダイヤモンドにて構成してもよい。
【0010】
このダイヤモンドとしてはCVD法(Chemical Vapor Deposition)法により製作されるCVDダイヤモンドが好適である。
【0011】
本発明の電気脱イオン装置では、該陰極板及び陽極板のうちの少なくとも一方に電極水の通水路を設けてもよい。
【0012】
陰極板及び陽極板自体に電極水を通水可能な通水路を設けることにより、電極水を通水するための陰極室及び陽極室を省略することができ、陰極室及び陽極室を設けることによる電気抵抗の発生を解消することができる。また、陰極板及び陽極板に電極水を通水して、電解により発生したガスを排出することができる。
この場合、陰極板はアニオン交換膜に、また陽極板はカチオン交換膜に接していることが好ましい。
【0013】
また、陰極板及び陽極板は、厚み方向に貫通する多数の開口を有した孔明き板を複数枚積層してなり、隣接する孔明き板の孔同士が部分的に重なり合うことにより電極水の通水路が形成された構成とすることが好ましい。
【0014】
【発明の実施の形態】
以下、図面を参照して実施の形態について説明する。
【0015】
図1は実施の形態に係る電気脱イオン装置の構造を示す模式的な断面図である。図示の通り、この電気脱イオン装置にあっては、電極板(陽極板11、陰極板12)の間に複数のアニオン交換膜13及びカチオン交換膜14を交互に配列して濃縮室15と脱塩室16とを交互に形成し、脱塩室16にイオン交換樹脂、イオン交換繊維もしくはグラフト交換体等からなるアニオン交換体及びカチオン交換体を混合もしくは複層状に充填している。脱塩室16に被処理水が流通され、濃縮室には濃縮水が流通される。また、濃縮室15と陽極板11及び陰極板12との間の陽極室17及び陰極室18にはそれぞれ電極水が通水される。被処理水が脱塩室16を流れる間にイオンが濃縮室15に透通し、脱塩処理水(脱イオン水)が脱塩室16から取り出される。
【0016】
この実施の形態では、陽極板11及び陰極板12はいずれも、導電性の基板の水と接する面にホウ素(B)をドープしたCVDダイヤモンド薄膜を成膜したものである。このCVDダイヤモンド薄膜は、耐食性がきわめて高く、また緻密である。そのため、フッ酸濃度の高い水と接触しても腐食することがなく、基板の腐食も防止する。
【0017】
この基板としては、耐食性の金属よりなる板;耐食性の金属で表面をメッキした金属板;炭素板などが好適である。耐食性の金属としては、白金等の貴金属、チタン、ステンレスなどが例示される。なお、CVDダイヤモンドの膜厚を著しく大きくすることにより陽極板及び陰極板の全体をCVDダイヤモンド製とすることも可能である。
【0018】
ダイヤモンドにホウ素をドープすることによりその比抵抗を低下させることができる。ただし、ホウ素のドープは必須ではない。
【0019】
CVDダイヤモンド薄膜を有する電極板を製造するには、例えば、真空槽内に放電管を設けると共に、この放電管の周囲を囲む隔壁を設け、かつ放電管と隔壁との空間を真空排気し、放電管に対向して基板を設け、プラズマ放電により、基板上にダイヤモンド薄膜を形成するプラズマCVD成膜方法によればよい。
【0020】
本発明では、陽極板11及び陰極板12の少なくとも一方が電極水の通水路を有するものであってもよい。例えば、上記の基板の代りに耐食性金属製のメッシュ又は耐食性金属のメッキを施したメッシュの表面にダイヤモンド薄膜を成膜したものであってもよい。
【0021】
また、図2,3に示す電気脱イオン装置のように、タイヤモンド薄膜で被覆された孔明き板を複数枚被層したものであってもよい。
【0022】
図2はこの電気脱イオン装置の構造を示す模式的な断面図である。図3はこの電気脱イオン装置の電極板(陰極板、陽極板)の構成を示す図であって、図3(a),(b)は電極板を構成する孔明き板を示す平面図、図3(c)は図3(a)のC−C線に沿う断面の拡大図、図3(d)は図3(b)のD−D線に沿う断面図の拡大図、図3(e)は電極板の断面の拡大図である。
【0023】
この電気脱イオン装置は、陽極板21と陰極板22との間に複数のアニオン交換膜13とカチオン交換膜14を交互に配列し、濃縮室15と脱塩室16とを交互に形成したものであり、最も陽極板21に近いカチオン交換膜14は、陽極板21に接して設けられている。また、最も陰極板22に近いアニオン交換膜13は陰極板22に接して設けられている。
【0024】
この電気脱イオン装置において、陽極板21及び陰極板22は電極水の通水路を有するため、陽極室及び陰極室を省略した構成としても陽極板21及び陰極板22に電極水を通水して電解により発生するガスを排出することができる。
【0025】
なお、脱イオン水の生産機構は従来の電気脱イオン装置と同様であり、被処理水中のイオンが脱塩室16からアニオン交換膜13又はカチオン交換膜14を透過して隣接する濃縮室15に移動することにより、脱塩室16から脱イオン水が生産され、濃縮室15からは、イオンが濃縮された濃縮水が排出される。
【0026】
この陽極板21及び陰極板22(以下「電極板」と称す場合がある。)の構成について、図3を参照して説明する。この電極板は、厚み方向に貫通する多数の開口を有した孔明き板を複数枚積層して構成し、隣接する孔明き板の孔同士が部分的に重なり合うことにより、電極水の通水路が形成されたものである。この孔明き板の表面にはダイヤモンド薄膜が成膜されている。
【0027】
図3(a),(b)では、厚さ方向に貫通する多数の菱形の開口1A,2Aが形成された孔明き板1,2を積層し、孔明き板1,2の孔1A,2Aが重なり合った部分から、順次電極水が移動できる構成としている。
【0028】
孔明き板1の開口1Aと孔明き板2の開口2Aとは、孔明き板1と孔明き板2とを重ね合わせたときに、互いに位置がずれ、一部のみが重なるような位相で設けられており、図3(e)に示す如く、この孔明き板1と孔明き板2とを重ねると、開口1Aと開口2Aの重なり部分を通って、電極水は、孔明き板1の開口1A→孔明き板2の開口2A→孔明き板1の開口1A→孔明き板2の開口2A→…の順で上から下へ順次孔明き板1の開口1Aと孔明き板2の開口2Aとを交互に通過して流れるようになる。
【0029】
この開口の形成割合が過度に大きいと電気抵抗が大きくなるため、開口の形成割合は電極水の通水路を確保することができる範囲である程度小さくすることが望ましい。特に、イオン交換膜(アニオン交換膜又はカチオン交換膜)と接する電極板面の開口の総面積(全部の開口の面積の合計)は、電極板の面積(開口を含む面積)に対して50%以下、特に30%以下であることが好ましい。
【0030】
また、1個当たりの開口の面積は、1〜5mm2であることが好ましい。この面積範囲であれば、電極水が効率的に流れ、ガスも効率的に排出される。
【0031】
図3では、孔明き板の開口として菱形形状のものを示したが、開口の形状は何らこれに限定されず、電極水が重なり合い部分を経て少なくとも一方向へ流れるような形状であれば、円形、楕円形、その他の多角形や、星形等の異形形状であっても良い。また、開口の大きさや形状は必ずしもすべて同一である必要はなく、大きさ及び/又は形状の異なる開口を組み合わせて設けたものであっても良い。
【0032】
図3では、孔明き板を2枚積層した電極板を示したが、3枚以上の孔明き板を積層して電極板を構成しても良い。また、イオン交換膜と反対側の面には無孔板を設けても良く、このような無孔板を設けることにより、電気脱イオン装置の組み立てに際し、電極板を締め付けるプレートと電極板との間の水のシール性を高めることができる。
【0033】
【発明の効果】
以上の通り、本発明の電気脱イオン装置によると、フッ素イオンや塩素イオンなどの腐食性の強いイオンを高濃度に含む被処理水であっても、電極に腐食を生じさせることなく長期にわたり安定して脱イオン処理することができる。
【図面の簡単な説明】
【図1】本発明の電気脱イオン装置の実施の形態を示す模式的な断面図である。
【図2】本発明の電気脱イオン装置の別の実施の形態を示す模式的な断面図である。
【図3】図2の電気脱イオン装置の電極板(陰極板、陽極板)の構成を示す図であって、図3(a),(b)は電極板を構成する孔明き板を示す平面図、図3(c)は図3(a)のC−C線に沿う断面の拡大図、図3(d)は図3(b)のD−D線に沿う断面図の拡大図、図3(e)は電極板の断面の拡大図である。
【符号の説明】
1,2 孔明き板
1A,2A 開口
11,21 陽極板
12,22 陰極板
13 アニオン交換膜
14 カチオン交換膜
15 濃縮室
16 脱塩室
17 陽極室
18 陰極室[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an electrodeionization apparatus in which a plurality of anion exchange membranes and cation exchange membranes are alternately arranged between a cathode plate and an anode plate to form a concentration chamber and a desalting chamber. Relates to an electrodeionization apparatus capable of treating water to be treated having a high fluorine concentration.
[0002]
[Prior art]
In factories in the electronics industry that manufacture semiconductors, liquid crystals, etc., used ultrapure water (hereinafter sometimes referred to as “recovered water”) after being used as cleaning water in order to increase the effective utilization rate of water. It is collected, processed and reused.
[0003]
JP-A-2001-170658 describes that an electrodeionization apparatus is used for the deionization treatment of the recovered water.
[0004]
[Problems to be solved by the invention]
Since the recovered water contains fluorine ions, highly corrosive hydrofluoric acid (HF) is concentrated near the anode plate of the electrodeionization apparatus, and the anode plate is easily corroded.
[0005]
In the above Japanese Patent Laid-Open No. 2001-170658, water to be treated is passed through a fluorine adsorption / removal device to remove fluorine, and then passed to an electrodeionization device, but fluorine that can sufficiently remove fluorine. An adsorption removal device is required.
[0006]
The present invention provides an electrodeionization apparatus capable of sufficiently treating water to be treated with a high fluorine concentration without using a fluorine adsorption removal apparatus or simply using a fluorine removal apparatus having a simple configuration. The purpose is to provide.
[0007]
[Means for Solving the Problems]
The electrodeionization apparatus of the present invention is an electrodeionization ion which is formed by alternately arranging a plurality of anion exchange membranes and cation exchange membranes between a cathode plate and an anode plate to form a concentration chamber and a demineralization chamber. The apparatus is characterized in that at least the surface of the anode plate in contact with water is made of diamond.
[0008]
Such an electrodeionization apparatus is such that at least the surface of the anode plate in contact with water is made of diamond, so that it is not corroded by hydrofluoric acid, and even high concentration hydrofluoric acid ion-containing water can be treated stably over a long period of time. Can do.
[0009]
In the present invention, not only the anode plate but also the surface of the cathode plate in contact with water may be made of diamond. Moreover, you may comprise the whole anode plate or cathode plate with a diamond.
[0010]
As this diamond, CVD diamond manufactured by a CVD method (Chemical Vapor Deposition) method is suitable.
[0011]
In the electrodeionization apparatus of the present invention, a water passage for electrode water may be provided on at least one of the cathode plate and the anode plate.
[0012]
By providing the cathode plate and the anode plate with a water passage through which the electrode water can flow, the cathode chamber and the anode chamber for passing the electrode water can be omitted, and by providing the cathode chamber and the anode chamber. Generation of electrical resistance can be eliminated. Moreover, the electrode water can be passed through the cathode plate and the anode plate, and the gas generated by electrolysis can be discharged.
In this case, the cathode plate is preferably in contact with the anion exchange membrane and the anode plate is in contact with the cation exchange membrane.
[0013]
Further, the cathode plate and the anode plate are formed by laminating a plurality of perforated plates having a large number of openings penetrating in the thickness direction, and the holes of the adjacent perforated plates are partially overlapped to allow the passage of electrode water. A configuration in which a water channel is formed is preferable.
[0014]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, embodiments will be described with reference to the drawings.
[0015]
FIG. 1 is a schematic cross-sectional view showing the structure of an electrodeionization apparatus according to an embodiment. As shown in the figure, in this electrodeionization apparatus, a plurality of
[0016]
In this embodiment, both the anode plate 11 and the cathode plate 12 are obtained by forming a CVD diamond thin film doped with boron (B) on the surface of a conductive substrate in contact with water. This CVD diamond thin film has extremely high corrosion resistance and is dense. Therefore, even when it comes into contact with water having a high hydrofluoric acid concentration, it does not corrode and prevents the substrate from corroding.
[0017]
As this substrate, a plate made of a corrosion-resistant metal; a metal plate whose surface is plated with a corrosion-resistant metal; a carbon plate and the like are suitable. Examples of the corrosion-resistant metal include noble metals such as platinum, titanium, and stainless steel. It is possible to make the whole of the anode plate and the cathode plate made of CVD diamond by remarkably increasing the film thickness of CVD diamond.
[0018]
The specific resistance can be lowered by doping boron into diamond. However, boron doping is not essential.
[0019]
In order to manufacture an electrode plate having a CVD diamond thin film, for example, a discharge tube is provided in a vacuum chamber, a partition wall surrounding the discharge tube is provided, and a space between the discharge tube and the partition wall is evacuated and discharged. A plasma CVD film forming method may be used in which a substrate is provided facing the tube and a diamond thin film is formed on the substrate by plasma discharge.
[0020]
In the present invention, at least one of the anode plate 11 and the cathode plate 12 may have a water passage for electrode water. For example, instead of the above substrate, a diamond thin film may be formed on the surface of a mesh made of a corrosion resistant metal or a mesh plated with a corrosion resistant metal.
[0021]
Further, as in the electrodeionization apparatus shown in FIGS. 2 and 3, a plurality of perforated plates covered with a tiremond thin film may be laminated.
[0022]
FIG. 2 is a schematic cross-sectional view showing the structure of this electrodeionization apparatus. FIG. 3 is a diagram showing a configuration of an electrode plate (cathode plate, anode plate) of this electrodeionization apparatus, and FIGS. 3A and 3B are plan views showing a perforated plate constituting the electrode plate, 3 (c) is an enlarged view of a cross section taken along the line CC of FIG. 3 (a), FIG. 3 (d) is an enlarged view of a cross sectional view taken along the line DD of FIG. 3 (b), and FIG. e) is an enlarged view of a cross section of the electrode plate.
[0023]
In this electrodeionization apparatus, a plurality of
[0024]
In this electrodeionization apparatus, the anode plate 21 and the cathode plate 22 have electrode water passages. Therefore, even if the anode chamber and the cathode chamber are omitted, the electrode water is passed through the anode plate 21 and the cathode plate 22. Gas generated by electrolysis can be discharged.
[0025]
The production mechanism of deionized water is the same as that of the conventional electrodeionization apparatus, and ions in the water to be treated permeate from the
[0026]
The configuration of the anode plate 21 and the cathode plate 22 (hereinafter sometimes referred to as “electrode plate”) will be described with reference to FIG. This electrode plate is formed by laminating a plurality of perforated plates having a large number of openings penetrating in the thickness direction, and the holes of the adjacent perforated plates are partially overlapped, thereby providing a water passage for electrode water. It is formed. A diamond thin film is formed on the surface of the perforated plate.
[0027]
3A and 3B, the
[0028]
The
[0029]
If the formation ratio of the openings is excessively large, the electrical resistance increases. Therefore, it is desirable to reduce the formation ratio of the openings to some extent within a range in which the water passage for the electrode water can be secured. In particular, the total area (total area of all openings) of the electrode plate surface in contact with the ion exchange membrane (anion exchange membrane or cation exchange membrane) is 50% of the electrode plate area (area including the openings). Hereinafter, it is particularly preferably 30% or less.
[0030]
Moreover, it is preferable that the area of the opening per piece is 1-5 mm < 2 >. If it is this area range, electrode water will flow efficiently and gas will also be discharged | emitted efficiently.
[0031]
In FIG. 3, the opening of the perforated plate is shown as a rhombus, but the shape of the opening is not limited to this, and the opening is circular as long as the electrode water flows in at least one direction through the overlapping portion. It may be an elliptical shape, other polygonal shapes, or an irregular shape such as a star shape. Also, the sizes and shapes of the openings are not necessarily the same, and openings having different sizes and / or shapes may be provided in combination.
[0032]
Although FIG. 3 shows an electrode plate in which two perforated plates are stacked, the electrode plate may be configured by stacking three or more perforated plates. In addition, a non-porous plate may be provided on the surface opposite to the ion exchange membrane, and by providing such a non-porous plate, when assembling the electrodeionization apparatus, the plate and the electrode plate for fastening the electrode plate It is possible to improve the sealing performance of the water.
[0033]
【The invention's effect】
As described above, according to the electrodeionization apparatus of the present invention, even in water to be treated containing highly corrosive ions such as fluorine ions and chlorine ions at a high concentration, the electrodes are stable for a long time without causing corrosion. And can be deionized.
[Brief description of the drawings]
FIG. 1 is a schematic cross-sectional view showing an embodiment of an electrodeionization apparatus of the present invention.
FIG. 2 is a schematic cross-sectional view showing another embodiment of the electrodeionization apparatus of the present invention.
3 is a diagram showing the configuration of electrode plates (cathode plates, anode plates) of the electrodeionization apparatus of FIG. 2, and FIGS. 3 (a) and 3 (b) show perforated plates constituting the electrode plates. FIG. 3C is an enlarged view of a cross section taken along line CC in FIG. 3A, FIG. 3D is an enlarged view of a cross sectional view taken along line DD in FIG. FIG. 3E is an enlarged view of a cross section of the electrode plate.
[Explanation of symbols]
1, 2
Claims (4)
Priority Applications (1)
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JP2001325286A JP3985495B2 (en) | 2001-10-23 | 2001-10-23 | Electrodeionization equipment |
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JP2001325286A JP3985495B2 (en) | 2001-10-23 | 2001-10-23 | Electrodeionization equipment |
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JP3985495B2 true JP3985495B2 (en) | 2007-10-03 |
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JP3893397B2 (en) * | 2005-03-14 | 2007-03-14 | ペルメレック電極株式会社 | Anode for electrolysis and method for electrolytic synthesis of fluorine-containing material using the anode for electrolysis |
EP1847634B1 (en) | 2006-01-20 | 2011-03-16 | Toyo Tanso Co., Ltd. | Electrolytic apparatus for producing fluorine or nitrogen trifluoride |
CN101563741B (en) * | 2006-10-23 | 2011-11-30 | 阿克逊动力国际公司 | Hybrid energy storage device and method of making same |
US8202653B2 (en) | 2006-10-23 | 2012-06-19 | Axion Power International, Inc. | Electrode with reduced resistance grid and hybrid energy storage device having same |
US7881042B2 (en) | 2006-10-26 | 2011-02-01 | Axion Power International, Inc. | Cell assembly for an energy storage device with activated carbon electrodes |
CN106574381B (en) * | 2015-02-02 | 2018-12-25 | 株式会社东芝 | Electrode unit and the electrolysis unit for having used the electrode unit |
CN106673143B (en) * | 2017-01-24 | 2023-08-25 | 苏州新纽顿环保科技有限公司 | Electrodialysis device and filtration equipment |
CN106630043B (en) * | 2017-01-24 | 2023-07-14 | 苏州新纽顿环保科技有限公司 | Filter |
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