JP3957470B2 - Substrate processing equipment - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a processing apparatus which can readily obtain processing history, and an apparatus and method for accumulating information which can readily accumulate such a treatment history. SOLUTION: This apparatus includes a treatment apparatus body 101, equipped with a plurality of treatment units that perform prescribed treatment for a workpiece W and a conveying device that conveys the workpiece between the treatment units, a first control unit 103, which controls the whole processing apparatus including the conveying device, a second control unit, which controls the plurality of treatment units, an information accumulating unit 106, which takes a signal sent between the first control unit 103 and the second control unit 104 and accumulates its information, a detection means 107 for detecting the amount of information in the information accumulating unit 160, and information deleting mechanism 108, which compares a detection value of the detecting means 107 and the amount of information for subsequent treatment and deletes information of the information accumulating unit 106, when the free capacity of the information accumulating unit 106 is less than a prescribed value.

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a substrate processing apparatus for performing a predetermined process on a target substrate, more particularly, to a substrate processing apparatus including a first controller and a second controller for controlling the substrate processing apparatus.
[0002]
[Prior art]
In the manufacture of semiconductor devices, a film forming process for forming a predetermined film on a semiconductor wafer as a substrate to be processed, a photolithography process for forming a pattern on the predetermined film, and etching a predetermined film according to the pattern Various processes such as an etching process are used, and a processing apparatus such as a film forming apparatus, a resist coating and developing apparatus, and an etching apparatus is used for each process of these processes.
[0003]
Of these processing apparatuses, a resist coating and developing apparatus that performs a photolithography process will be described as an example. In such a photolithography process, the cleaned semiconductor wafer is first subjected to a hydrophobic treatment in an adhesion processing unit, cooled in a cooling unit, and then coated with a photoresist film in a resist coating unit. To do. The semiconductor wafer on which the photoresist film is formed is pre-baked by a hot plate unit that performs heat treatment, then cooled by a cooling unit, and a predetermined pattern is exposed by an exposure apparatus. Subsequently, the exposed semiconductor wafer is subjected to a post-exposure baking process using a hot plate unit, then cooled by a cooling unit, and a developing solution is applied by a developing unit to develop an exposure pattern. Finally, a post-baking process is performed in the hot plate unit to enhance thermal transformation for polymerization and adhesion between the semiconductor wafer and the pattern. The above-described resist coating and developing apparatus performs a process excluding the exposure process in such a series of processing steps, and is configured by integrating a plurality of processing units for performing each process. Each unit has a transfer device capable of carrying in and out the wafer.
[0004]
Such control of the resist coating and developing apparatus is performed by, for example, a first control unit that performs processing recipes, management of a transfer device, communication with a host computer, and the like in each processing unit according to a command from the first control unit. This is performed by a second control unit that controls each process.
[0005]
In the apparatus control as described above, the first control unit outputs information necessary for processing of each processing unit to the second control unit, and the second control unit includes information from the sensors necessary for control. Elements of each processing unit are controlled by information from the first control unit, and control information at that time is transmitted from the first control unit to the host computer.
[0006]
[Problems to be solved by the invention]
By the way, in the control as described above, information necessary for control is prepared and information after control is also managed, but recently, more accurate control of each process is directed, A quicker response to equipment troubles is desired. For this reason, not only information after control but also measurement data such as temperature in actual processing, alarm data, drive system data, etc. are obtained. It is desired to grasp the history in detail.
[0007]
However, in order to grasp such a history in a conventional processing apparatus, it is necessary to prepare a measuring device or the like for each data for which the history is to be grasped, which is complicated. Further, the processing elements for which the history should be grasped are enormous, and it is extremely impractical to attach such a measuring device or the like for each processing element.
[0008]
The present invention has been made in view of such circumstances, and an object of the present invention is to provide a substrate processing apparatus capable of easily grasping a processing history.
[0009]
[Means for Solving the Problems]
In order to solve the above-described problems, the present invention provides a substrate processing apparatus main body including a plurality of processing units that perform predetermined processing on a substrate to be processed and a transfer device that transfers the substrate to be processed between the processing units. ,
A first control unit that controls the substrate processing apparatus main body including the transfer device, and individually controls the plurality of processing units based on a command signal output from the first control unit. A control box having a second control unit that outputs a signal including information necessary for grasping a processing history in the processing unit to the first control unit;
A hub interposed in a signal communication line between the first control unit and the second control unit;
A signal connected to the hub and transferred between the first control unit and the second control unit is acquired via the hub, and processing in the plurality of processing units included in the acquired signal is performed. An information storage unit that stores information necessary for grasping the history of
The information is connected to the first control unit and the information storage unit, and includes information necessary for grasping information from the first control unit and processing histories in the plurality of processing units. A host computer that analyzes information by processing information stored in the storage unit; and
Detecting means for detecting the amount of information in the information storage unit at a predetermined timing;
An information erasing mechanism that compares the detection value of the detection means with the amount of information of the next process and erases the predetermined information of the information storage unit when the free space of the information storage unit is less than a predetermined value;
A substrate processing apparatus is provided.
[0010]
As a result of repeated studies to solve the above-described problems, the present invention takes out a signal output from the control mechanism, particularly a signal transmitted and received between the first control unit and the second control unit. By taking out, it is possible to easily obtain information necessary for grasping the history of processing without using a special measuring instrument, and the amount of information obtained in this way becomes enormous, and the free space of the information storage unit is reduced. Such information may not be stored when the number is reduced. However, by detecting the free space of the information storage unit at a predetermined timing and deleting the predetermined information when the free space is low, the information is stored. The inventors have come up with the idea that it can be easily prevented from being accumulated, and have completed the present invention. That is, the signal output from the control mechanism, particularly information exchanged between the first control unit and the second control unit, is necessary for grasping the processing history such as detection information for processing. Since it contains information, it is very easy to grasp the processing history without using any special measuring instrument by taking it out and storing it in the information storage unit. By detecting the information and appropriately deleting the predetermined information, it is possible to prevent the information itself from being stored and to grasp the processing history with certainty.
[0011]
More specifically, when controlling the substrate processing apparatus main body and a conveying device for conveying a substrate to be processed among a plurality of processing units and the processing units to carry out the predetermined process for the substrate to be processed, the transport The first control unit that controls the entire substrate processing apparatus including the apparatus and the second control unit that controls the plurality of processing units are used, and exchanged between the first control unit and the second control unit. The signal is stored in the information storage unit . In this case, since the second control unit outputs the detection information of each processing unit to the first control unit, the operation history of the processing in the processing unit can be easily obtained by capturing signals exchanged between them. Can grasp.
[0012]
In this case, when the free space of the information storage unit is smaller than a predetermined value, the history information of the information storage unit is deleted in order of old information so that at least the amount of information of the next processing becomes a free space that can be stored. Can be. The timing for detecting the amount of information in the information storage unit may be any of the substrate to be processed, each substrate of the substrate to be processed, and each lot.
[0013]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below in detail with reference to the accompanying drawings.
1 to 4 show an overall configuration of a resist coating and developing apparatus according to an embodiment of the present invention. FIG. 1 is a schematic perspective view, FIG. 2 is a schematic plan view, FIG. 3 is a schematic front view, and FIG. It is a schematic side view.
[0014]
The resist coating and developing apparatus 100 includes a substrate processing apparatus main body (hereinafter referred to as “apparatus main body”) 101 and a control / data storage section 102 that controls the apparatus main body 101 and stores information. Apparatus main body 101, or unloaded or loaded into the said apparatus externally plurality example 25 sheets units target substrate such as a semiconductor wafer (hereinafter simply referred to as "wafer") W to the wafer cassette CR, and from the device , A cassette station 10 for loading / unloading the wafer W to / from the wafer cassette CR, and various single-wafer processing units for performing predetermined processing on the wafer W one by one in the coating and developing process at predetermined positions. A configuration in which a multi-stage processing station 12 and an interface unit 14 for transferring the wafer W between the processing station 12 and an exposure apparatus (not shown) provided adjacent to the processing station 12 are integrally connected. Have. The control / data storage section 102 is provided below the cassette station 10.
[0015]
The cassette station 10 includes a wafer transfer mechanism 22 having a display unit 16, a cassette mounting table 20, and a wafer transfer arm 22a that is movable in the X, Y, and Z directions and rotatable in the θ direction. On the cassette mounting table 20, a plurality of, for example, four wafer cassettes CR can be mounted.
[0016]
The processing station 12 includes a first processing unit group G ₁ , a second processing unit group G _{2 in} which liquid processing units that perform predetermined processing by placing a wafer W on a spin chuck in a cup CP, and a wafer. A third processing unit group G ₃ , a fourth processing unit group G _4, and a vertical transfer type main wafer transfer mechanism 24, in which heat treatment units for performing predetermined processing by placing W on the mounting table SP are arranged in multiple stages. It is configured.
[0017]
As shown in FIG. 4, the main wafer transfer mechanism 24 is equipped with a wafer transfer device 90 on the inside of a cylindrical support 91 so as to be movable up and down in the vertical direction (Z direction). The cylindrical support 91 can be rotated by a rotational driving force of a motor (not shown), and the wafer transfer device 90 can also be rotated integrally with the cylindrical support 91.
[0018]
The wafer transfer device 90 includes a plurality of holding members (tweezers) 93 that can move in the front-rear direction of the transfer base 92, and the holding members 93 realize the transfer of the wafer W between the processing units.
[0019]
In the first processing unit group G _1, a developing unit for developing the wafer surface by the liquid processing units such as spin coating the resist coating unit for coating a resist film (COT), the circuit pattern after exposure (DEV) is 2 It is stacked on the stage. Second processing even unit group _{G 2,} a resist coating unit (COT) and a developing unit (DEV) are two-tiered.
[0020]
In the third processing unit group G ₃ and the fourth processing unit group G ₄ , as a thermal processing unit, for example, a cooling unit (COL) for cooling the wafer W to a predetermined temperature, and before applying a photoresist to the wafer W, An adhesion unit (AD) for hydrophobizing this, an alignment unit (ALIM) for adjusting the position of the wafer W, an extension unit (EXT) for transferring the wafer W between the stations, and a wafer W A hot plate unit (HP) or the like that performs heat treatment at a predetermined temperature is stacked in eight stages.
[0021]
The front portion of the interface over the face portion 14 is disposed pickup cassette CR portability, peripheral exposure device 28 is disposed in the rear portion, the wafer transfer mechanism 26 is provided at the center portion. The wafer transfer mechanism 26 has a wafer transfer arm 26a. The wafer transfer arm 26a moves in the X direction and the Z direction, and can access the cassette CR and the peripheral exposure device 28. Further, the wafer transfer arm 26a is rotatable in θ direction, the extension unit (EXT) belonging to the fourth processing multistage unit of the unit group G ₄ of the processing station 12 side, the adjacent exposure device side A wafer transfer table (not shown) can also be accessed.
[0022]
Next, the control / data storage section 102 will be described with reference to FIG. FIG. 5 is a block diagram showing the configuration of the control / data storage section 102. The control / data storage section 102 includes a control box 105 including a first controller 103 and a second controller 104, and a data storage box that captures and stores signals exchanged between the first controller 103 and the second controller 104. 106, a detector 107 for detecting the data amount and free capacity of the data storage box 106 at a predetermined timing, and a predetermined value in the data storage box 106 when the free capacity of the data storage box 106 is smaller than the data amount of the next processing. A data erasing mechanism 108 for erasing the data.
[0023]
The first controller 103 in the control box 105 controls the entire apparatus main body 101, and mainly performs recipe management, wafer transfer management, and display screen management. The first controller 103 is connected to the host computer 118 and communicates with the host computer 118. Then, a command is given to the second controller 104 based on the data related to these.
[0024]
The second controller 104 in the control box 105 controls each processing unit of the apparatus main body 101, and is connected to sensors, driving members, and the like via a plurality of I / O boards. Measurement data such as temperature and humidity, alarm data, detection data, and the like are output to the first controller 103, and elements such as a drive system of each processing unit are controlled based on commands from the first controller 103 and sensor information.
[0025]
The signal line 109 connected to the first controller 103 and the signal line 110 connected to the second controller 104 are connected to the HUB 112, and the HUB 112 and the data storage box 106 are connected by a signal line 113. Therefore, at least a part of signals exchanged between the first controller 103 and the second controller 104 can be taken into the data storage box 106 via the HUB 112 and stored. Signal acquisition at this time is performed, for example, every 2 seconds.
[0026]
In addition, a plurality of additional sensors (additional detection units) 111 are provided for detecting signals that are not exchanged between the first controller 103 and the second controller 104, for example, drive signals given to drive members such as valves, These additional sensors 111 are connected to the data storage box 106 via signal lines 114. Therefore, the information of this additional sensor 111 can be taken into the data storage box 106 and stored. Signal acquisition at this time can be performed at intervals of 2 seconds or less, for example.
[0027]
The first controller 103 is connected to the HUB 116 via the signal line 115 and is connected to the host computer 118 via the HUB 116 signal line 117, and transmits information of the first controller 103 to the host computer 118. . Further, a signal line 119 extending from the data storage box 106 is connected to the HUB 116, and storage information in the data storage box 106 is also transmitted to the host computer 118 via the HUB 116. Therefore, the host computer 118 can analyze information by processing information from the first controller 103 and information from the data storage box 106.
[0028]
As shown in FIG. 6, the data storage box 106 includes a device body interface 121 that receives signals transmitted and received by the first controller 103 and the second controller 104, a device body agent 122 that processes the signals, and an additional sensor 111. An additional sensor interface 123 for taking in information, an additional sensor agent 124 for processing the signal, and exchange of data between the apparatus body agent 122 and the additional sensor agent 124 to further process and store data. The storage data manager 125 to perform, the database management software 126, a database storage unit 127 that stores a database for data storage, and a storage data storage unit 128 that stores storage data. .
[0029]
The detector 107 detects the amount of data stored in the stored data storage unit 128 of the data storage box 106 at a predetermined timing based on a command from the first controller 103. This timing may be, for example, every time processing of one wafer W is finished, every time processing of wafers W in one cassette is finished, or processing of one lot of wafers W. May be completed each time.
[0030]
On the other hand, in the data erasing mechanism 108, the amount of information of the next processing corresponding to the detection timing of the detector 107 from the first controller 103, for example, when the detection timing is every one wafer W, the next one sheet. When the amount of wafer processing information and detection timing of each cassette is one cassette, the amount of wafer processing information for the next cassette is input. When the detection timing is one lot, the amount of wafer processing information for one lot is input. Further, the detection result from the detector 107 is input. Based on these pieces of information, the data erasure mechanism 108 erases the predetermined information in the accumulated data storage unit 128 when the free capacity of the accumulated data storage unit 128 of the data accumulation box 106 is less than a predetermined value. The predetermined value at this time may be the information amount of the next process or may be a value larger than the information amount of the next process. In addition, as a method for erasing information at this time, for example, erasing can be performed in the order of oldest information in the history of the stored data storage unit 128.
[0031]
In the resist coating and developing apparatus 100 configured as described above, unprocessed wafers W are unloaded from the wafer cassette CR one by one by the wafer transfer mechanism 22 and loaded into the alignment unit (ALIM). Next, the wafer W positioned here is unloaded by the main wafer transfer mechanism 24, loaded into an adhesion unit (AD), and subjected to an adhesion process. After the completion of the adhesion process, the wafer W is unloaded by the main wafer transfer mechanism 24 and transferred to a cooling unit (COL) where it is cooled. Then, resist coating the wafer W is transferred into the resist coating unit (COT), further by performing the pre-baking treatment at hot plate unit (HP), via the extension cooling (EXTCOL), interns face portion 14 To the adjacent exposure apparatus. Further, it transports the wafer W subjected to the exposure processing by the exposure apparatus, interns face portion 14 by the wafer transfer mechanism 26, through the extension unit (EXT) to the processing station 12. In the processing station 12, the wafer W is transferred to the hot plate unit (HP) by the main wafer transfer mechanism 24 to perform post-exposure processing, and further transferred to the developing unit (DEV) for development processing, and then the hot plate unit. (HP) Post-baking is performed, and after cooling in the cooling unit (COL), it is conveyed to the cassette station 10 via the extension unit (EXT). The wafer transfer mechanism 22 stores the wafer W that has been subjected to the predetermined processing as described above in the wafer cassette CR.
[0032]
Such a series of processes is controlled by the control box 105 of the control / data storage section 102 as described above. Then, at least a part of a signal exchanged between the first controller 103 and the second controller 104 of the control box 105 is captured and stored in the data storage box 106 via the HUB 112, for example, every 2 seconds. At this time, the signal is processed by the apparatus main body agent 122 and stored data manager 125 via the first apparatus body interferents over scan 121 from HUB 112, it is stored in the storage data storage unit 128.
[0033]
On the other hand, information from the additional sensor 111 is captured and accumulated in the data accumulation box 106 in a cycle of 2 seconds or less, for example. At this time, the signal is processed by an additional sensor agent 124 and stored data manager 125 via the additional sensor interferon over scan 123, is stored in the storage data storage unit 128 as well.
[0034]
The database stored in the database storage unit 127 and the data stored in the stored data storage unit 128 are processed by the predetermined database management software 126 and output to the host computer 118 via the HUB 116.
[0035]
Among such accumulated data, for example, measurement data such as temperature and humidity are necessary throughout the process, and therefore are continuously accumulated every certain cycle. Other than that, for example, it is accumulated for each wafer, for each lot, and for each process, and is accumulated in time series. Therefore, the history of processing can be grasped from the data accumulated in the data accumulation box 106. As the data storage timing, the storage can be started from the time when the wafer W is loaded into the processing unit, or the storage can be started after the processing of the processing unit is started. In addition, data can be accumulated only once at the start or completion of a lot. Similarly, the processing of wafer W can be started (taken out from the carry-in side cassette) or completed (transferred to the carry-out side cassette). In this case, data can be stored only once.
[0036]
As data sampled and stored in the data storage box 106, the following five items are exemplified as typical examples.
(1) Measurement data such as temperature, humidity, atmospheric pressure, etc. (2) Data of alarm that is issued when trouble occurs during processing (3) Dispensing data of processing liquid in liquid processing unit such as coating processing unit (COT) (4) ) Drive system data such as cylinder (5) Wafer transfer and processing unit processing information
[0037]
Among the above, since the measurement data of (1) is controlled by the second controller 104 and is normally output from the second controller 104 to the first controller 103, the measurement data between the first controller 103 and the second controller 104 is used. The data is stored in the data storage box 106 via the HUB 112. However, in the case of measurement data that is not used for normal control, it can be detected by the additional sensor 111 and stored directly in the data storage box 106.
[0038]
Since the alarm data (2) is normally issued by each processing unit, the alarm is received by the second controller 104 and output from the second controller 104 to the first controller 103. Therefore, this data can be captured and stored in the data storage box 106 via the HUB 112. By accumulating this data, it is possible to grasp a very detailed history such as when an alarm is issued, where in which processing unit, what kind of processing, and when an alarm is issued.
[0039]
With respect to the dispense data of (3), as shown in FIG. 7, when the discharge of the processing liquid from the nozzle 131 is controlled by opening and closing the air operation valve 133 via the pipe 132, the I / O from the second controller 104. An ON / OFF signal is output to the solenoid valve 134 for opening and closing the air operation valve 133 via the board 130. An additional sensor 111 is connected to the control line 135, and the ON / OFF signal is connected to the additional sensor. It is possible to store the data in the data storage box 106 detected by 111. Since such data is normally not exchanged between the first controller 103 and the second controller 104, the data is directly stored in the data storage box 106 from the additional sensor 111 in this way. 103 and the second controller 104 can be exchanged, and in this case, the data can be stored in the data storage box 106 via the HUB 112. By accumulating such data, it is possible to grasp all the time at which the air operation valve 133 is opened or closed. For example, it is possible to grasp the history by associating the data with the actual dispense data. .
[0040]
A typical example of the drive system of (4) is an air cylinder used for raising and lowering the wafer, and the control at that time is controlled from the second controller 104 to the I / O board as shown in FIG. A control signal is output to either the first solenoid valve (SOL1) 144 or the second solenoid valve (SOL2) 145 via 140 to start the movement of the piston 141a of the air cylinder 141, and the first position sensor The detection signal of either (sensor 1) 142 or second position sensor (sensor 2) 143 is output to the second controller 104 via the I / O board 140, and the piston 141a of the air cylinder 141 is based on the signal. This is done by stopping the movement. At this time, the additional sensor 111 is connected to the signal lines 146 and 147 of the first and second position sensors 142 and 143 and the control lines 148 and 149 of the first and second solenoid valves 144 and 145, respectively. The detection signals of the first and second position sensors 142 and 143 and the opening and closing signals of the first and second solenoid valves 144 and 145 can be detected by the additional sensor 111 and the data can be stored in the data storage box 106. . As a result, the history of the operation timing of the air cylinder 141 can be grasped, and for example, the variation in the operation timing for each air cylinder, which could not be grasped until now, can be grasped. Therefore, it is possible to finely adjust the operation timing.
[0041]
As shown in FIG. 9, the data that is actually accumulated includes time series of the opening / closing timings of the first and second solenoid valves 144, 145 and the ON / OFF timings of the first and second position sensors 142, 143. This is what we grasped. That is, when the first solenoid valve (SOL1) 144 is opened, the piston 141a starts to rise, and when the first position sensor (sensor 1) 142 is activated (ON), the piston 141a stops rising. To do. Next, when the first solenoid valve (SOL1) 144 is closed and the second solenoid valve (SOL2) 145 is opened, the lowering of the piston 141a is started, and the second position sensor (sensor 2) 143 is moved. When the operation (ON) is performed, the lowering of the piston 141a stops.
[0042]
Since such drive system data is not usually exchanged between the first controller 103 and the second controller 104, the data is directly stored in the data storage box 106 from the additional sensor 111 in this way. Data can be exchanged between the first controller 103 and the second controller 104, and in this case, the data can be stored in the data storage box 106 via the HUB 112.
[0043]
Regarding the wafer transport and processing unit processing information in (5), the wafer transport management information of the first controller 103, the loading / unloading information of each processing unit in the second controller 104, and the processing information of each processing unit are among these. Since the data is transferred, the data is taken out via the HUB 112 and stored in the data storage box 106. The stored wafer transfer information includes information such as the start of loading of wafers into each processing unit and the end of unloading. Further, the processing information of each processing unit to be accumulated includes information such as the start and end of processing in each processing unit.
[0044]
In this way, signals exchanged between the first controller 103 and the second controller 104 are taken out via the HUB 112 at a predetermined timing and stored in the data storage box 106, so that data is automatically stored during processing. Data can be stored, and data necessary for grasping the processing history can be easily obtained without using a special measuring instrument. That is, data exchanged between the first controller 103 and the second controller 104 is necessary for grasping the processing history such as detection data for processing, alarm data, processing data, wafer transfer data, and the like. Since the data is included, it is very easy to grasp the processing history by taking it out and storing it in the data storage box 106.
[0045]
In addition, as described above, the additional sensor 111 is used to detect data that is not exchanged between the first controller 103 and the second controller 104 and store the data in the data storage box 106. Data can be made more diverse, and processing history can be grasped with higher accuracy.
[0046]
Thus, the information stored in the data storage box 106 is enormous, and the data storage amount of the data storage box 106 exceeds its capacity in a relatively short period of time, so that important data may not be stored. . Therefore, in order to store the processing data effectively, it is necessary to delete the predetermined data from the data storage box 106 at a predetermined timing.
[0047]
Therefore, in the present embodiment, the data erasure mechanism 108 erases the data in the accumulated data storage unit 128 of the data accumulation box 106 according to the flow shown in FIG.
[0048]
First, a detection timing command is issued from the first controller 103 to the detector 107 (ST1). The timing at this time may be, for example, every time processing of one wafer W is completed, every time processing of wafers W in one cassette is completed, or one lot of wafers W It may be every time when the process is completed.
[0049]
Next, the free space of the accumulated data storage unit 128 of the data accumulation box 106 is detected by the detector 107 at any of the above timings (ST2).
[0050]
On the other hand, in the data erasing mechanism 108, the amount of information of the next processing corresponding to the detection timing of the detector 107 from the first controller 103, for example, when the detection timing is every one wafer W, the next one sheet. When the amount of wafer processing information and detection timing of each cassette is one cassette, the amount of wafer processing information for the next cassette is input. When the detection timing is one lot, the amount of wafer processing information for one lot is input. Further, a detection result from the detector 107 is input, and based on these pieces of information, whether or not the free space of the stored data storage unit 128 of the data storage box 106 is less than a predetermined value, for example, the amount of information for the next processing It is determined whether it is less than the information amount + α of the next processing or itself (ST3).
[0051]
If the free space in the stored data storage unit 128 is less than a predetermined value, predetermined information in the stored data storage unit 128, for example, the oldest data in the history is deleted (ST4). The erasure amount at this time is set to an amount at which at least the free capacity of the accumulated data storage unit 128 is larger than the information amount of the next processing. On the other hand, if it is determined in ST3 that the free space in the stored data storage unit 128 is greater than or equal to the predetermined value, the data is not erased.
[0052]
After erasing data in this way, data for the next process is accumulated (ST5). After the accumulation of the predetermined data is completed, the free space of the accumulated data storage unit 128 is detected again in ST2.
[0053]
In this way, the detector 107 detects the free space in the stored data storage unit 128 of the data storage box 106 at a predetermined timing and automatically deletes the predetermined data in the stored data storage unit 128. It is possible to prevent the information itself from being stored in the stored data storage unit 128. Therefore, it is possible to reliably grasp the processing history.
[0054]
In addition, this invention is not limited to the said embodiment, A various change is possible within the range of the thought of this invention. For example, in the above embodiment, the data exchanged between the first controller 103 and the second controller 104 is captured and stored in the data storage box 106, but the data from the first controller 103 is captured and stored. Alternatively, the data from the second controller 104 may be imported, the data from the first controller 103, the data from the second controller 104, and the exchange between the first controller 103 and the second controller 104. it may be earthenware pots by storing incorporate two or more of the data to be. Further, it is not always necessary to have two controllers, and it is only necessary to capture and accumulate signals output from the control mechanism. Further, the data from the additional sensor 111 is directly stored in the data storage box 106. However, if all the information is exchanged between the first controller 103 and the second controller 104, the additional sensor 111 is used. 111 is not necessarily required.
[0055]
Further, in the above embodiment, when erasing data by the data erasing mechanism, an example of erasing data in the order of oldest data has been shown. However, the present invention is not limited to this. For example, only specific information on each wafer ( substrate to be processed) is displayed. It may be deleted.
[0056]
Furthermore, in the above embodiment, the case where the present invention is applied to a resist coating and developing apparatus has been described. However, in consideration of the idea of the present invention, the present invention can be applied not only to a resist coating and developing apparatus but also to any substrate processing apparatus.
[0057]
【The invention's effect】
As described above, according to the present invention, a special signal can be obtained by extracting a signal output from the control mechanism, particularly by extracting a signal exchanged between the first control unit and the second control unit. Information necessary for grasping the processing history can be easily obtained without using a measuring instrument. That is, the signal output from the control mechanism, particularly information exchanged between the first control unit and the second control unit, is necessary for grasping the processing history such as detection information for processing. Since the information is included, it is very easy to grasp the processing history without using any special measuring instrument by taking it out and storing it in the information storage unit. In addition, since information in the information storage unit is detected at a predetermined timing and the predetermined information is appropriately deleted, it is possible to prevent the information itself from being stored and to reliably grasp the history of processing.
[Brief description of the drawings]
FIG. 1 is a schematic perspective view showing the overall configuration of a resist coating and developing apparatus according to an embodiment of the present invention.
FIG. 2 is a schematic plan view showing the overall configuration of a resist coating and developing apparatus according to an embodiment of the present invention.
FIG. 3 is a schematic front view showing an overall configuration of a resist coating and developing apparatus according to an embodiment of the present invention.
FIG. 4 is a schematic side view showing the overall configuration of a resist coating and developing apparatus according to an embodiment of the present invention.
FIG. 5 is a block diagram showing the configuration of a control / data storage section of the resist coating and developing apparatus according to an embodiment of the present invention.
6 is a block diagram showing a configuration of a data accumulation box in the control / data accumulation section of FIG. 5;
FIG. 7 is a schematic diagram showing an example of data accumulation when processing liquid is discharged in the resist coating and developing apparatus according to an embodiment of the present invention.
FIG. 8 is a schematic diagram showing an example of air cylinder operation control and data accumulation in a resist coating and developing apparatus according to an embodiment of the present invention.
FIG. 9 is a timing chart showing data accumulated by the configuration of FIG. 8;
FIG. 10 is a flowchart showing a flow of erasing information in a stored data storage unit of a data storage box.
[Explanation of symbols]
100; resist coating and developing apparatus ( substrate processing apparatus)
101; apparatus main body ( substrate processing apparatus main body)
102; Control and data storage section 103; First controller (first control unit)
104; second controller (second control unit)
105; Control box 106; Data storage box (information storage device)
107; Detector (detection means)
108; data erasing mechanism (information erasing mechanism)
112, 114; HUB
111; Additional sensor (additional detector)
118; Host computer

Claims (4)

A substrate processing apparatus main body and a conveying device for conveying a substrate to be processed among a plurality of processing units and the processing units to carry out the predetermined process for the substrate to be processed,
A first control unit that controls the substrate processing apparatus main body including the transfer device, and individually controls the plurality of processing units based on a command signal output from the first control unit . A control box having a second control unit that outputs a signal including information necessary for grasping a processing history in the processing unit to the first control unit ;
A hub interposed in a signal communication line between the first control unit and the second control unit;
A signal connected to the hub and transferred between the first control unit and the second control unit is acquired via the hub, and processing in the plurality of processing units included in the acquired signal is performed. An information storage unit that stores information necessary to grasp the history of
The information is connected to the first control unit and the information storage unit, and includes information necessary for grasping information from the first control unit and processing histories in the plurality of processing units. A host computer that analyzes information by processing information stored in the storage unit; and
Detecting means for detecting the amount of information in the information storage unit at a predetermined timing;
An information erasing mechanism that compares the detection value of the detection means with the amount of information of the next process and erases the predetermined information of the information storage unit when the free space of the information storage unit is less than a predetermined value; A substrate processing apparatus comprising: The substrate processing apparatus main body includes an additional detection unit that detects information that is not exchanged between the first control unit and the second control unit in the processing unit, and the information storage unit includes: The substrate processing apparatus according to claim 1 , wherein a signal from the additional detection unit is captured and the information is accumulated. The said information storage part accumulate | stores at least 1 sort (s) among measurement information, alarm information, the operation information in the said process part, and the to-be-processed substrate conveyance information by the said conveying apparatus, The Claim 1 or Claim 2 characterized by the above-mentioned. Substrate processing equipment. The information erasing mechanism erases at least the information amount of the next process in the order of old information in the history of the information storage unit when the free space of the information storage unit is smaller than the information amount of the next process. The substrate processing apparatus according to any one of claims 1 to 3 , wherein the substrate processing apparatus is characterized.

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