JP3548416B2 - Substrate processing equipment - Google Patents

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a substrate processing apparatus that performs a predetermined process on a thin substrate such as a semiconductor wafer or a glass substrate for a liquid crystal display panel.
[0002]
[Prior art]
2. Description of the Related Art Conventionally, in a manufacturing process of a precision electronic substrate using a semiconductor wafer, a glass substrate for a liquid crystal display panel, or the like, various surface treatments are performed by immersing the substrate in a processing liquid. In such a surface treatment, a chemical solution tank storing a chemical solution such as an etching solution, and a washing tank storing pure water as a rinsing solution are provided. After the substrate is subjected to a chemical solution treatment, a rinsing process is further performed to wash away the chemical solution and particles attached to the substrate in a washing tank.
[0003]
FIG. 5 is a schematic diagram showing a schematic configuration of a main part in a conventional substrate processing apparatus.
[0004]
In FIG. 5, a substrate processing apparatus 51 is an apparatus for processing a plurality of substrates at a time, and is a loading / unloading section (not shown) for transferring a predetermined number of substrates set in a cassette to and from the outside of the apparatus. And a transfer unit 52 that receives and conveys the substrate from the carry-in / out unit (not shown) and transfers the substrate to the carry-in / out unit (not shown), and receives the substrate from the carry unit 52 and performs predetermined processing on the substrate. And a processing unit 53 for transferring the processed substrate to the transport unit 52.
[0005]
The transfer unit 52 includes two transfer robots 52a and 52b that are respectively provided in the upper and lower transfer paths and move in the direction in which the processing units 53 are provided (X direction). These transfer robots 52a and 52b are respectively provided via shaft members 54a (FIG. 6) extending in the direction (X direction) perpendicular to the paper surface of FIG. 5 (Y direction) of FIG. Each of the holding plates 54 has a pair of attached holding plates 54, and a plurality of substrates 55 in a standing posture are arranged in the Y direction by holding grooves (not shown) inside the pair of holding plates 54. Both end surfaces are sandwiched from both sides, and are received and held by the holding grooves.
[0006]
Further, each processing unit 53 includes a chemical solution tank 56 for storing a chemical solution such as an etching solution, a water washing tank 57 for washing the chemical solution or particles attached to the substrate 55 processed by the chemical solution tank 56, and a chemical solution tank for storing the chemical solution. A chemical tank 58, a washing tank 59 for washing a chemical or particles attached to the substrate 55 treated by the chemical tank 58, and a drying tank 60 for drying the substrate 55 washed in the washing tank 59. Have. By sequentially immersing a plurality of substrates 55 collectively in the chemical solution tank 56, the washing tank 57, the chemical solution tank 58, and the washing tank 59, a series of various processes such as a chemical solution process and a water washing process are performed on the substrate 55. The substrate 55 after the processing is dried.
[0007]
Further, a lifter device 61 is disposed in each of the processing tanks of the chemical solution tanks 56 and 58 and the washing tanks 57 and 59. Each lifter device 61 can mount a plurality of substrates 55 and process the same. It is configured to be vertically movable between the inside of the tank and the substrate delivery position. An outer member 62 is provided in each of the processing tanks of the chemical solution tanks 56 and 58 and the washing tanks 57 and 59, and upper surfaces of the outer member 62 and the drying tank 60 are respectively provided. An opening / closing door 63 that can open and close the substrate introduction port is provided so as to face the upper opening port of the processing tank. Each of these opening / closing doors 63 is normally closed, and is configured to open on both sides in conjunction with the lowering of the lifter device 61 into the processing tank. It is configured to open.
[0008]
An exhaust duct 64 is opened at an appropriate position of each of the outer shell members 62, and the exhaust duct 64 is connected to an exhaust pump 66 via a flow control valve 65. The exhaust duct 64, the flow control valve 65, and the exhaust pump 66 constitute an exhaust unit. The exhaust of the outer member 62 by the exhaust unit causes the opening / closing door 63 of the substrate introduction port of the outer member 62 to open. When the external air flows in from the substrate introduction port, the diffusion of fumes (atmosphere containing an acid or an alkali) from the chemical solution tanks 56 and 58 to the outside through the substrate introduction port is prevented. ing.
[0009]
Further, as shown in FIG. 6, the lifter device 61 and, for example, the transfer robot 52b move a plurality of processing tanks arranged side by side (in the X direction in FIG. 5 perpendicular to the plane of FIG. 6) in their width direction. They are arranged facing each other across both sides. Similarly, the lifter device 61 and, for example, the transfer robot 52a are opposed to each other by sandwiching a plurality of processing tanks arranged side by side (in the X direction in FIG. 5 perpendicular to the plane of FIG. 6) from both sides in the width direction thereof. It is arranged in the state where it did.
[0010]
With the above configuration, first, the transport robot 52b receives the substrate from the loading / unloading section (not shown) and transports the substrate to the substrate delivery position above the chemical solution tank 56 of each processing unit 53 along the disposition direction (X direction). I do. At this time, as shown in FIG. 6, the pair of holding plates 54 of the transfer robot 52b sandwich the both side end surfaces of the plurality of substrates 55 in the upright posture from both sides by the plurality of holding grooves inside them. We hold and hold. On the other hand, the lifter device 61 of the chemical solution tank 56 rises, and the plurality of substrates held by the transfer robot 52b are transferred to the plurality of holding grooves provided above the three holding arms 61a provided below the lifter device 61. Receive from below. Thereafter, the pair of holding plates 54 of the transfer robot 52b are rotated so as to be in the vertical directions as indicated by solid lines, respectively, to release the holding of the transfer robot 52b on the plurality of substrates 55, and the plurality of plates on the lifter device 61 are released. The delivery of the substrate 55 is completed.
[0011]
Next, the lifter device 61 is lowered toward the inside of the chemical solution tank 56 with the plurality of substrates held by the plurality of holding grooves above the three holding arms 61a. In conjunction with this lowering, the opening / closing door 63 of the outer member 62 rises and opens on both sides as shown by phantom lines, and the holding arm 61 a holding the plurality of substrates 55 is immersed in the chemical from the upper opening of the chemical tank 56. The plurality of substrates 55 are subjected to a predetermined chemical solution treatment by being left for a predetermined time. At this time, the opening / closing door 63 is closed, and the chemical solution tank 56 is substantially sealed by the outer shell member 62. The inside of the outer shell member 62 is exhausted by an exhaust pump 66 via an exhaust duct 64.
[0012]
Further, after a predetermined time, the lifter device 61 raises the plurality of substrates 55 after the chemical treatment, and the opening / closing door 63 stands up and opens on both sides as shown by phantom lines so as to interlock with the substrates, and opens the upper portion of the chemical solution tank 56. The holding arm 61 a holding the plurality of substrates 55 is raised from the mouth to the substrate delivery position above the chemical solution tank 56. At the substrate transfer position, the transfer robot 52b is on standby with the pair of holding plates 54 arranged vertically, and after the holding arm 61a holding the plurality of substrates 55 arrives at the substrate transfer position, a pair of By rotating the lower sides of the holding plates 54 inward, the both end surfaces of the plurality of substrates 55 are sandwiched from both sides, respectively, and received and held by the holding grooves of the pair of holding plates 54.
[0013]
Further, after the lifter device 61 is retracted downward together with the holding arm 61a to transfer the substrate 55 to the pair of holding plates 54, the transfer robot 52b cleans the plurality of substrates 55 with the water cleaning solution positioned next to the chemical solution tank 56. The substrate is conveyed along the disposition direction (X direction) to the substrate transfer position above the tank 57. At this time, the pair of holding plates 54 of the transfer robot 52b respectively hold and hold the both side end surfaces of the plurality of substrates 55 in the standing posture from the both sides by the plurality of holding grooves inside them. . On the other hand, the lifter device 61 of the washing tank 57 rises, and the plurality of substrates held by the transfer robot 52b are held by the plurality of holding grooves above three holding arms 61a provided below the lifter device 61. 55 is received from below. Thereafter, the pair of holding plates 54 of the transfer robot 52b are rotated so that their longitudinal directions are vertical, and the holding of the transfer robot 52b on the plurality of substrates 55 is released, and the lifter device 61 of the washing tank 57 is released. The delivery of the plurality of substrates 55 to is completed.
[0014]
Further, the lifter device 61 of the washing tank 57 descends into the washing tank 57 with the plurality of substrates 55 held by the plurality of holding grooves above the three holding arms 61a. At the same time, the transfer robot 52b in an empty state after the transfer of the substrate 55 moves along the disposition direction (X direction) to the substrate transfer position with respect to the carry-in / out section (not shown). In preparation for delivery of the substrate 55.
[0015]
The opening / closing door 63 of the outer member 62 is opened in conjunction with the lowering of the lifter device 61, and the holding arm 61 a holding the plurality of substrates 55 is immersed in the pure water from the upper opening of the washing tank 57 so that the plurality of substrates 55 is washed with water. During this washing process, the opening / closing door 63 is closed, and the inside of the outer member 62 of the washing tank 57 is sealed.
[0016]
Further, after a predetermined time, the lifter device 61 raises the plurality of substrates 55 after the rinsing process, opens the opening / closing door 63 in conjunction therewith, and holds the plurality of substrates 55 from the upper opening of the rinsing tank 57. The arm 61a is raised to the upper substrate transfer position for the transfer robot 52a above the washing tank 57. At the board transfer position, the transfer robot 52a is on standby with the longitudinal direction of the pair of holding plates 54 set to the vertical direction, and after the holding arm 61a holding the plurality of boards 55 arrives at the board transfer position. By rotating the lower sides of the pair of holding plates 54 inward, the two end surfaces of the plurality of substrates 55 are sandwiched from both sides and received and held in the respective holding grooves, thereby holding the plurality of substrates 55. Perform delivery.
[0017]
Thereafter, the transport robot 52a transports the plurality of substrates 55 to the drying tank 60 and performs a drying process on the plurality of substrates 55 in the drying tank 60. Further, the transfer robot 52b repeats the same operation as above while delivering the plurality of substrates 55 to and from the lifter device 61 of each processing tank, and performs a series of processing by the chemical liquid tank 56 and the washing tank 57. Is transported.
[0018]
Further, the transfer robot 52a, which has received the plurality of substrates 55 after the drying process from the lifter device 61 of the drying tank 60, moves along the direction of disposition (X direction) to a substrate transfer position with respect to a carry-in / out section (not shown). The plurality of processed substrates 55 are transported, and the plurality of processed substrates 55 are delivered to the loading / unloading section.
[0019]
[Problems to be solved by the invention]
However, in the above-described conventional configuration, when the lifter device 61 moves up or down in a state where the plurality of substrates 55 are placed on the respective processing tanks, the opening and closing door 63 of the substrate introduction port of the outer member 62 interlocks therewith. At this time, the fumes from the chemical solution tanks 56 and 58 are prevented from diffusing to the substrate transport line including the transfer positions of the transfer robots 52a and 52b and the lifter device 61 through the substrate introduction ports. Exhaust means is provided for exhausting the atmosphere in each of the outer members 62 that respectively cover the 56 and 58 and the washing tanks 57 and 59 so that air enters the inside at a wind speed that does not allow fumes to diffuse from the substrate introduction port. I have. The exhaust capability of the exhaust means requires a considerably large amount of exhaust air / time, requires a large amount of driving power, and has a problem that the exhaust means itself becomes large and bulky.
[0020]
By the way, if the fumes spread to the substrate transfer line, the fumes will also clean the clean substrate after the rinsing process, which will cause a lot defect of the device and cause corrosion of the fumes to cause parts failure of the mechanical structure, It pollutes the clean air in the clean room.
[0021]
SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned conventional problem and to provide a power-saving and space-saving substrate processing apparatus by further reducing the size of an exhaust unit.
[0022]
[Means for Solving the Problems]
A substrate processing apparatus of the present invention is a substrate processing apparatus that performs a predetermined process on one or a plurality of substrates, a chemical processing unit that is arranged in a predetermined direction and performs a chemical process on the substrate, and a chemical processing unit. A plurality of processing units including a rinsing processing unit that performs rinsing processing on the substrate that has been subjected to the chemical liquid processing, and a substrate for transporting the substrate between at least the chemical processing unit and the rinsing processing unit of the plurality of processing units. A transport path installed above the chemical processing section and the rinsing section, transport means for transporting the substrate between at least the chemical processing section and the rinsing section in the transport path, and a space in the transport path and above the transport path; An opening is provided above the transport path to separate the atmosphere from the position, and an opening is formed to allow movement of the transport unit between the upper position and the transport path. A separating member; And an exhaust means for exhausting the atmosphere in serial in the transport path, the opening of the substrate conveying of the separating member, the in the separation member, and is formed at a position corresponding to the upper portion of the washing section.
[0023]
With this configuration, the transport path through which fumes from the chemical solution diffuse is covered with the separating member, and at a position corresponding to one processing unit so that the fumes of the chemical solution are not easily diffused outward from the opening of the separating member. Since only the opening is provided and the opening is made as small as possible, even if the exhaust capacity of the exhaust means is significantly reduced, the diffusion of fumes to the outside of the separation member can be prevented, so the exhaust means is made more compact. A possible, power-saving, space-saving, and quieter substrate processing apparatus is provided. Therefore, the fumes are not diffused to the outside of the separating member by the exhaust means having a smaller exhaust capacity, and the clean substrate after the water washing process is not contaminated as in the conventional case, and causes a device lot defect. Inconveniences such as causing a mechanical component failure due to fume corrosion and polluting clean air in a clean room are also eliminated.
[0024]
Further, the plurality of processing units in the substrate processing apparatus of the present invention include a chemical processing unit that performs a chemical processing on the substrate, and a rinsing processing unit that performs a rinsing process on the substrate. The opening is formed in the separation member at a position corresponding to the upper side of the washing section.
[0025]
With this configuration, the fume concentration is highest at the upper position of the chemical processing unit where the substrate with the chemical is taken out of the substrate processing area, and the opening is formed at the separation member above the washing unit that is far from the position where the fume concentration is high. In this case, the fumes coming out of the chemical solution are not easily diffused to the outside, and the exhaust means having a smaller exhaust capacity can be used.
[0026]
Preferably, the substrate processing apparatus of the present invention further includes a shutter unit that can be opened and closed with respect to the opening for transporting the substrate of the separation member.
[0027]
According to this configuration, an opening for transporting the substrate is required for the separating member. However, if a shutter means for opening and closing the opening of the separating member is provided, the separating means for separating fumes coming out of the chemical solution by an exhausting means having a smaller exhausting capacity. Spreading to the outside can be prevented.
[0028]
More preferably, the exhaust means in the substrate processing apparatus of the present invention is provided with an exhaust port near the chemical processing section in the processing section.
[0029]
With this configuration, if the fume concentration is highest at the position above the chemical processing section and an exhaust port is provided near the chemical processing section, the exhaust means can efficiently exhaust an atmosphere with a high fume concentration from the exhaust port. As a result, it is possible to further reduce the fume concentration even with an exhaust means having a smaller exhaust capacity.
[0030]
Further, preferably, the exhaust means in the substrate processing apparatus of the present invention switches between a high exhaust output and a low exhaust output in accordance with an open position and a closed position of a shutter means which can be opened and closed with respect to the substrate transfer opening of the separation member. A control unit for performing control is provided.
[0031]
With this configuration, when the opening of the separation member is opened by the shutter means, the fumes in the conveyance path are exhausted at a high exhaust output, and when the opening of the separation member is closed by the shutter means, the fumes in the conveyance path are exhausted at a low exhaust output. Can be switched so as to exhaust air, so that when the shutter means is closed, power consumption can be reduced and a small driving sound (quiet sound) can be obtained, and when the shutter means is opened, fumes diffuse to the outside of the separating member significantly. Can be suppressed.
[0032]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, embodiments of a substrate processing apparatus according to the present invention will be described with reference to the drawings, but the present invention is not limited to the embodiments described below.
[0033]
FIG. 1 is a perspective view showing a schematic configuration of a main part of a substrate processing apparatus according to an embodiment of the present invention. FIG. 2 is a schematic configuration view of a main part of the substrate processing apparatus of FIG. .
[0034]
In FIG. 1, a substrate processing apparatus 1 is an apparatus that collectively processes a plurality of substrates 2 such as wafers, and carries out unloading by transferring a predetermined number of substrates 2 set in a cassette 3 to and from the outside of the apparatus. A loading section 4 and a substrate processing unit 5 which receives and transports the unprocessed substrate 2 from the loading / unloading section 4, performs predetermined processing on the substrate 2, transports the processed substrate 2 and delivers it to the loading / unloading section 4; have.
[0035]
The loading / unloading unit 4 includes a cassette mounting table 6 on which a plurality of substrates 2 loaded (or immediately before unloading) are temporarily arranged and placed in a state where the substrates 2 are set in the cassette 3, and both upper end brim portions 3 a of the cassette 3. The two cassette holding arms 7 protruding in a cantilever shape, which respectively receive and hold the cassette 3 from below, are movable in the cassette arrangement direction of the cassette mounting table 6, and take in and hold the cassette 3 with the cassette holding arm 7. The cassette 3 is configured to be movable up and down in order to mount the cassette 3 thereon, and to be rotatable around an axis parallel to the vertical direction (a support shaft for supporting the mounting member of the cassette holding arm 7). Transfer robot 8, and a protrusion 1 that pushes up only a plurality of substrates 2 in the cassette 3 placed from the cassette mounting table 6 by the transfer robot 8 and transfers it to the transport mechanism 9. When, and a cassette cleaning unit 11 for cleaning the empty cassette 3 placed from the push-up unit 10 by the transfer robot 8. The transfer robot 8 transports and places the cassette 3 from the cassette mounting table 6 to a predetermined position of the protrusion 10, and pushes up only the plurality of substrates 2 from the cassette 3 at the protrusion 10 and transfers it to the transfer mechanism 9. The subsequent empty cassette 3 is transferred to the cassette cleaning unit 11, and the plurality of processed substrates 2 are transferred from the transport mechanism 9 to the protruding portion 10 of the empty cassette 3 cleaned by the cassette cleaning unit 11. In order to be collected in the cassette 3, it is transported again to a predetermined position where the protruding portion 10 is positioned and made to stand by.
[0036]
Further, as shown in FIG. 2, the substrate processing unit 5 includes a plurality of substrate processing areas 17 in each tank outer member 16 (inside the processing unit) covering the plurality of processing tanks 12 to 15, and a plurality of these substrate processing areas 17. Two second substrate transfer areas 18 and 19 provided above the processing area 17 and having a second transfer path for transferring between the substrate processing areas 17, and a substrate is provided for each of the second substrate transfer areas 18 and 19. The first substrate transport area 20 having a first transport path for transporting the second substrate transport area 2, and separating members (atmosphere blocking members) for separating and separating the second substrate transport areas 18, 19 and the first substrate transport area 20, respectively. ) Is provided with each transport area outer member 21. At the upper position of the transfer area outer member 21 corresponding to (opposing to) the upper opening of one processing tank (in this embodiment, the washing tank), the second substrate transfer area 18 and the first substrate transfer area 20 are located. Each opening 22 capable of transporting a plurality of substrates 2 between the second substrate transport area 19 and the first substrate transport area 20 is provided. Further, an exhaust unit 23 is provided for exhausting the atmosphere in each of the substrate processing areas 17 and the second substrate transfer areas 18 and 19. As described above, the outer first clean substrate transfer area 20 partitioned by the transfer area outer member 21 and the second substrate inside the transfer area outer member 21 in which fumes are diffused by taking the plurality of substrates 2 in and out of the chemical solution. The transfer areas 18 and 19 and the substrate processing area 17 for actually processing a plurality of substrates 2 are divided into three areas, and the atmosphere in the substrate processing area 17 and the second substrate transfer areas 18 and 19 is evacuated by an exhaust unit 23. , The diffusion of fumes into the first substrate transfer area 20, which is a substrate transfer line, is more reliably prevented.
[0037]
That is, in the present embodiment, the plurality of processing tanks 12 to 15 wash out the chemical liquid tank 12 storing the chemical liquid such as an etching liquid and the chemical liquid and particles attached to the substrate 2 which has been processed by the chemical liquid tank 12. It comprises a washing tank 13, a chemical tank 14 in which a chemical solution is stored, and a washing tank 15 for washing away the chemical solution, particles, and the like attached to the substrate 2 processed by the chemical solution tank 14. One of the transfer area outer members 21 covers the tank outer member 16 covering the chemical solution tank 12 and the tank outer member 16 covering the washing tank 13 and between the respective tank outer members 16 (between the processing units). ) Is also configured to cover the second substrate transfer area 18 where the substrate can be transferred. The other of the transfer area outer members 21 covers the tank outer member 16 that covers the chemical solution tank 14 and the tank outer member 16 that covers the washing tank 15, and the substrate can be transferred between the respective tank outer members 16. The second substrate transfer area 19 is also covered. Furthermore, on the upper surface of each tank outer member 16 corresponding to (opposing to) each upper opening of the chemical solution tanks 12 and 14 and the washing tanks 13 and 15, each substrate introduction port through which a plurality of substrates 2 can be introduced. 24 are provided respectively. A plurality of substrates 2 are introduced into only the upper surface of each transfer area outer member 21 corresponding (facing) to each of the substrate introduction ports 24 on the washing tanks 13 and 15 side of these substrate introduction ports 24. Each possible opening 22 is provided. On the other hand, the substrate introduction ports 24 are respectively disposed above the upper open ports of the chemical solution tanks 12 and 14 so as to oppose the respective upper open ports, and further, the respective transport area outer members 21 above the above are not provided with the respective apertures. . This is because not only the transfer area outer member 21 separates the areas, but also the communication area (opening area) between the second substrate transfer areas 18 and 19 and the first substrate transfer area 20 is made smaller, and the first substrate transfer area is reduced. The atmosphere in the substrate processing area 17 and the second substrate transport areas 18 and 19 is reduced to such an extent that the diffusion of the fumes into the first substrate transport area 20 is prevented while the fumes are prevented from diffusing into the first substrate transport area 20. This is because the exhaust is performed, and the amount of exhaust can be significantly reduced as compared with the related art.
[0038]
Further, a drying tank 25 for drying the substrate 2 having been subjected to the water washing treatment in the water washing tank 15 is provided adjacent to the water washing tank 15. A plurality of substrates 2 are collectively immersed sequentially in each processing tank in the chemical solution tank 12, the washing tank 13, and the like, so that a plurality of various processes such as a chemical solution treatment and a water washing process are performed on the plurality of substrates 2, and after the treatment, The plurality of substrates 2 are dried in a drying tank 25. The drying tank 25 may be configured to be supplied with hot air for drying at a predetermined temperature (which may be heated by a heater or the like) or may be dried under reduced pressure using IPA (isopropyl alcohol). Good.
[0039]
Further, a plate-shaped opening / closing door 26 which slides each opening 22 to open and close, and an opening / closing drive means (not shown) for driving the opening / closing door 26 to open and close according to the substrate transfer, are transported. It is provided on the upper surface of the area outer member 21. The opening / closing door 26 and the opening / closing drive means constitute shutter means, and can be opened and closed with respect to the substrate transfer opening 22. In addition, each inlet opening / closing door 27 that opens and closes the substrate inlet 24 of each tank outer member 16 and an inlet opening / closing drive unit (not shown) that drives these inlet opening / closing doors 27 to open and close according to the substrate conveyance. ) And are disposed on the upper surface of each tank outer member 16. The reason why each inlet / outlet door 27 is provided in each of the outer shell members 16 is not only to prevent fume diffusion but also to suppress evaporation of volatile components contained in the liquid as much as possible. The opening / closing door 26 is provided to prevent fumes from diffusing from the second substrate transfer areas 18 and 19 to the first substrate transfer area 20 where high cleanliness is required. It is. From this point of view, each of the opening / closing doors 26 and each of the introduction opening / closing doors 27 are closed except when the plurality of substrates 2 are distributed. Further, an inlet opening / closing door 28 for opening and closing the substrate inlet is also provided on the upper surface of the drying tank 25.
[0040]
In this embodiment, the opening / closing door 26 slides a predetermined distance along the upper surface of the transport area outer member 21 and horizontally moves to open and close the opening 22. The substrate introduction port 24 is opened and closed by being rotationally driven on both sides in a double-opening manner. These opening / closing drive means and introduction port opening / closing drive means may be constituted by, for example, an air cylinder (not shown). In this case, the tip of the rod of the air cylinder is attached to the opening / closing door 26, and the opening 22 is opened and closed by the expansion and contraction of the rod by a predetermined stroke. The inlet opening / closing door 27 is composed of two doors. One end of each arm is fixed to each of the doors, and each arm (not shown) is rotatably supported at the center of the arm. At the other end, the rod end of the air cylinder is attached, and the inlet opening / closing door 27 is opened and closed by opening / closing the inlet opening / closing door 27 on both sides via an arm (not shown) by expansion and contraction of the rod by a predetermined stroke. It is supposed to. As described above, when the inlet opening / closing door 27 is opened for both sides to open and close each door, two air cylinders may be provided for driving each door.
[0041]
Further, the transfer mechanism 9 is configured by a transfer robot, and has a pair of holding plates 29 that can move in the direction in which the plurality of processing tanks 12 to 15 are arranged (X direction) and can hold the plurality of substrates 2. I have. The pair of holding plates 29 are respectively fixed to respective shaft members 30 (FIG. 3) extending in a direction (Y direction in FIG. 3) orthogonal to the paper surface of FIG. Are connected to the transport mechanism main body 9a so as to be rotatable in opposite directions about the respective rotation centers. Further, a plurality of holding grooves (not shown) capable of holding the plurality of substrates 2 in an upright (vertical) posture at predetermined intervals are formed in the opposed inner sides of the pair of holding plates 29, respectively. ing. With the lower end portions of the pair of holding plates 29 approaching each other in the inside, a plurality of substrates 2 are arranged in the Y direction, and their both end surfaces are sandwiched from both sides, respectively, and received and held by the holding grooves.
[0042]
Further, lifter devices 31 for transporting a plurality of substrates 2 are provided in the chemical solution tank 12 and the washing tank 13 and in the chemical solution tank 14 and the washing tank 15, respectively. As shown in FIG. 3, each of the lifter devices 31 has three holding grooves 32a, each holding a plurality of substrates 2 from below in each of the holding grooves 32a, and holding the substrates 2 in an upright posture. An arm 32, a movable holding plate 33 in which the three holding arms 32 are connected in an L-shape at a lower end portion, and a movable member 34 fixed to the back surface of the upper end portion of the movable holding plate 33 and capable of moving up and down and moving horizontally. And a driving means (not shown) for moving the movable member 34 up and down and horizontally. Each of the drying tanks 25 is also provided with a lifter device 35 for transporting a plurality of substrates 2. The lifter device 35 has the same configuration as the lifter device 31.
[0043]
The drive means (not shown) of each of these lifter devices 31 and 35 moves the movable member 34 along a guide member (not shown) such as a rail in the vertical direction along a guide member (not shown) such as a rail. And a vertical drive unit for moving the movable member 34 attached to the wire or belt by driving a pulley or a roll for driving a wire or belt with a motor. Good. Further, the pinion and the rack may be driven by a motor to move the movable member 34 up and down, or the ball screw and the motor may be used to move the movable member 34 up and down. Various driving systems are conceivable. Further, the driving means (not shown) of each lifter device 31 has a horizontal drive unit for moving the movable member 34 in a horizontal direction together with the vertical drive unit along a guide member (not shown) such as a rail. Various drive systems such as a ball screw can be considered in the same manner as described above.
[0044]
The inlet opening / closing door 27 is configured to open in conjunction with the lowering of each lifter device 31 into the processing tank, and the inlet opening / closing door 27 is configured to open in conjunction with the ascent from the processing tank. Have been. The opening / closing door 26 is configured to open in conjunction with the lowering of each lifter device 31 into the second substrate transfer area 18 or the second substrate transfer area 19, and the second substrate transfer area 18 is opened. The opening / closing door 26 is configured to open in conjunction with a rise from the inside or the second substrate transfer area 19. Further, the inlet opening / closing door 28 is configured to open in conjunction with the lowering of the lifter device 35 into the drying tank 25, and the inlet opening / closing door 28 is opened in conjunction with the ascent from the drying tank 25. It is configured as follows. That is, the opening / closing door 26 and the inlet / outlet opening / closing doors 27 and 28 are opened only when the plurality of substrates 2 pass, and the others are closed.
[0045]
Further, the exhaust port of each exhaust duct 37 is opened in a rectangular shape in the width direction of the processing tank on the upper side wall (the height position of the processing tank opening port in FIG. 2) of each tank outer member 16. The exhaust ports of the exhaust ducts 37 are connected to an exhaust pump 39 via a flow control valve 38. Further, the exhaust ports of the exhaust ducts 37 are formed in the side walls of the transfer area outer members 21 respectively covering the second substrate transfer areas 18 and 19 in a rectangular shape over the width direction of the lifter device 31. The exhaust ports of the exhaust ducts 37 are open, and the exhaust ports of the exhaust ducts 37 are also connected to an exhaust pump 39 via a flow control valve 38. The exhaust port of each of the transfer area outer members 21 is disposed on the innermost side wall of each of the second substrate transfer areas 18 at a position near and above the chemical solution tanks 12 and 14. The exhaust unit 23 is configured by the exhaust duct 37, the flow control valve 38, and the exhaust pump 39, and inside each tank outer member 16 (substrate processing area 17) and inside each transport area outer member 21 (second substrate transport area). 18), the opening / closing door 26 of each transport area outer member 21 is opened, and the substrate introduction port opening / closing door 27 of each outer member 16 is opened by exhaustion from the exhaust port provided by the exhaust means 23 provided at an appropriate position (18). However, when external air flows in through the opening 22 and the substrate introduction port 24, the fumes from the chemical solution tanks 12 and 14 and the plurality of substrates 2 with the chemical solution pass through the opening 22 and the substrate introduction port 24. (Atmosphere in which an acid or an alkali is mixed) is prevented from diffusing to the outside.
[0046]
In addition, the exhaust unit 23 exhausts the opening / closing door 26 that constitutes a shutter unit that can be opened / closed with respect to the substrate transport opening 22 of each transport area outer member 21 as a separating member according to the open position and the closed position. Control means (not shown) for switching the output of the pump 39 between the high exhaust output and the low exhaust output may be provided. That is, when the shutter means closes the opening 22, the control means controls the output of the exhaust pump 39 to a low exhaust output by detecting the opening with a limit switch (not shown) or the like. When the shutter means opens the opening 22 such as when transferring a substrate, such as when transferring a substrate, the opening is detected by a limit switch or the like, and the output of the exhaust pump 39 is controlled to a high exhaust output so that fumes are cleaned. It is also possible to configure so as not to diffuse to the first substrate transfer area side.
[0047]
Further, as shown in FIGS. 3 to 5, the lifter device 31 and the transport mechanism 9 are disposed on the same side with respect to a plurality of processing tanks 12 to 15, 25 arranged side by side. I have. In this case, each of the lifter device 31 and the transfer mechanism 9 has a cantilever structure in which a substrate holding portion (a holding plate 29 and three holding arms 32) protrudes forward (in a direction orthogonal to the transfer direction). I have.
[0048]
Further, a transfer area outer member 40 for preventing fume diffusion that covers the first substrate transfer area 20 above each transfer area outer member 21 is provided. A space portion of a substrate transfer line (first transfer path) for transferring a plurality of substrates 2 in the direction (X direction) in which the substrates 15 and 25 are arranged is configured. An opening 41 is formed on the side wall of the transfer area outer member 40 to allow the movement of the plurality of substrates 2 held by the pair of holding plates 29 of the transfer mechanism 9 and the opening and closing of the opening 41. Opening and closing door 42 is configured to be slidable along the side wall of the transfer area outer member 40. The opening / closing door 42 is normally closed, and is opened / closed by opening / closing drive means (not shown) so as to be opened only when the transport mechanism 9 passes through the opening 41. The opening / closing drive unit includes, for example, a door opening / closing cylinder, a detection unit that detects the transport mechanism 9, and an electromagnetic valve that switches to drive the cylinder when the transport mechanism 9 is detected by the detection unit. I have.
[0049]
The operation of the above configuration will be described below.
[0050]
First, the transport mechanism 9 receives the substrate 2 from the loading / unloading unit (not shown) and moves the substrate 2 to the substrate transfer position above the opening 22 of the first substrate transport area 18 where the first processing unit is located. Is transported along the transport path direction (X direction). At this board transfer position, as shown in FIG. 2, the pair of holding plates 29 of the transport mechanism 9 are respectively provided with a plurality of holding grooves on their inner sides to respectively hold both end surfaces of the plurality of boards 2 in the standing posture from both sides. It is sandwiched and received and held. On the other hand, the lifter device 31 is raised to the substrate transfer position, and the plurality of holding grooves on the upper side of the three holding arms 32 provided below the lifter device 31 are held by the transfer mechanism 9. The substrate 2 is received from below. Thereafter, the pair of holding plates 29 of the transport mechanism 9 are respectively rotated so as to be in the vertical directions, and the holding of the transport mechanism 9 on the plurality of substrates 2 is released. The delivery of the plurality of substrates 2 to is completed.
[0051]
Next, when the lifter device 31 starts to descend while the plurality of substrates 2 are held by the plurality of holding grooves on the three holding arms 32, the opening / closing door of the transport area outer member 21 interlocks with the lowering. 26 is opened, and the lifter device 31 enters the second substrate transfer area 18 together with the plurality of substrates 2 through the opening 22. In the second substrate transport area 18, the lifter device 31, together with the plurality of substrates 2, horizontally moves to a position above the chemical processing section, and then starts descending into the chemical processing section having the chemical tank 12. In conjunction with this lowering, the substrate introduction port opening / closing door 27 of the tank outer member 16 opens, and three holding arms 32 holding a plurality of substrates 2 enter the substrate processing area 17 through the substrate introduction port 24, and further, The holding arm 32 holding the substrate 2 is immersed in the chemical solution from the upper opening of the chemical solution tank 12 and left for a predetermined time in that state to perform a predetermined chemical treatment on the surface of the plurality of substrates 2.
[0052]
During the transfer of the substrate in the series of second substrate transfer areas 18 and the processing of the chemical solution, the opening 22 of the transfer area outer member 21 is closed by the opening / closing door 26, and the chemical solution tank 12 and the washing tank 13 The substrate introduction port 24 of each of the tank outer shell members 16 is also closed by the substrate introduction port opening / closing door 27 except when the substrate is introduced into the substrate processing area 17. In addition, the exhaust means 23 may always exhaust air with a constant exhaust capacity. In this case, the exhaust means 23 is also externally opened when the opening 22 and the substrate introduction ports 24 are opened (when the substrate is transported between the areas). Must have high exhaust capacity without fume diffusion. Therefore, when the opening 22 and each of the substrate introduction ports 24 are opened, the exhaust pump 39 is driven at a high exhaust output to exhaust the internal atmosphere, and when one of the opening 22 and each of the substrate introduction ports 24 is opened, the medium is discharged. The exhaust pump 39 is driven by the exhaust output to exhaust the internal atmosphere. When the opening 22 and the substrate introduction port 24 are closed (when transferring the substrate in the area and processing the substrate), the exhaust pump 39 is exhausted with a low exhaust output. May be a three-stage power-saving drive. When at least one of the opening 22 and each of the substrate introduction ports 24 is opened, the exhaust pump 39 is driven with a high exhaust output to exhaust the internal atmosphere, and when the opening 22 and the substrate introduction port 24 are closed (in the area). At the time of substrate transfer and substrate processing), exhaust may be performed at a low exhaust output, and the exhaust pump 39 may be driven in two stages of power saving.
[0053]
Further, after the chemical solution treatment after a predetermined time, the lifter device 31 raises the holding arm 32 holding the substrate 2, and the opening / closing door 27 opens on both sides as shown by the phantom line so as to interlock with the lift arm 32. The holding arm 32 holding the substrate 2 is lifted from the upper opening through the substrate introduction port 24 to above the chemical solution tank 12, and is horizontally moved horizontally to a position above the washing processing section having the washing tank 13. Thereafter, the lifter device 31 lowers the plurality of substrates 2 having the chemical solution on the surface of the substrate 2 together with the holding arm 32 after the chemical solution treatment, and interlocks with this lowering to the substrate introduction opening / closing door 27 of the tank outer member 16. Is opened, and the holding arm 32 holding the plurality of substrates 2 is introduced into the substrate processing area 17 of the washing tank 13 through the substrate introduction port 24. In the substrate processing area 17, the lifter device 31 performs a water washing process in which the plurality of substrates 2 are immersed in the chemical solution from the upper open port of the washing tank 13 to wash out the chemical solution attached to the surfaces of the plurality of substrates 2.
[0054]
As described above, during the transfer of the substrate in the second substrate transfer area 18 or during the washing process, the opening 22 of the transfer area outer member 21 is closed by the opening / closing door 26, and the chemical tank 12 and The substrate introduction ports 24 of the respective tank outer members 16 on the washing tank 13 are also closed by the respective substrate introduction port opening / closing doors 27 except when the substrates are introduced into the respective substrate processing areas 17. In addition, during the transfer of the substrate in the series of second substrate transfer areas 18 from the chemical solution tank 12, the exhaust pump 39 is driven at a high exhaust output so as to exhaust fumes from the plurality of substrates 2 with the chemical solution. The internal atmosphere may be exhausted.
[0055]
Further, after the rinsing process after a predetermined time, the lifter device 31 raises the holding arm 32 holding the substrate 2, opens the opening / closing door 27 on both sides in conjunction with the lifting arm 32, and introduces the substrate from the upper opening of the rinsing tank 13. The holding arm 32 holding the substrate 2 is raised through the opening 24, and further, the opening / closing door 26 is opened so as to interlock with the rise, and the holding arm 32 holding the substrate 2 through the opening 22 of the transfer area outer member 21 is moved. Raise to the board delivery position.
[0056]
At the substrate transfer position in the first processing unit covered by the transfer area outer member 21, the pair of holding plates 29 of the transfer mechanism 9 are standing by in a vertical position, and the holding arm 32 holding the substrate 2 is moved. After arriving between the pair of holding plates 29, the lower sides of the pair of holding plates 29 are rotated inward, respectively, so that both end surfaces of the plurality of substrates 2 are sandwiched from both sides, and each holding groove is held by each holding groove. Receive and hold each.
[0057]
Further, after the lifter device 31 is retracted downward together with the holding arm 32, the pair of holding plates 29 of the transfer mechanism 9 hold the plurality of substrates 2 and transfer the second substrate transfer unit having the next second processing unit. The transfer path in the first substrate transfer area 20 is transferred along the transfer path direction (X direction) to the substrate transfer position above the opening 22 of the area 19. At this time, the pair of holding plates 29 of the transport mechanism 9 hold and hold the both side end faces of the plurality of substrates 2 in the standing posture from both sides by the plurality of holding grooves inside them. On the other hand, the lifter device 31 of the second processing unit ascends and is held by the pair of holding plates 29 in the plurality of holding grooves on the upper side of the three holding arms 32 provided below. The plurality of substrates 2 are received from below. Thereafter, the pair of holding plates 29 are rotated so as to be vertical, respectively, to release the holding of the pair of holding plates 29 on the plurality of substrates 2, and the second holding plate 29 of the transport mechanism 9 is moved from the pair of holding plates 29 Delivery of the plurality of substrates 2 to the lifter device 31 of the processing unit is completed.
[0058]
Further, the plurality of substrates 2 transferred to the lifter device 31 of the second processing unit are introduced into the second substrate transfer area 19 by the lifter device 31. On the other hand, the empty transport mechanism 9 returns to the loading / unloading section, receives the substrate 2, and transports the plurality of substrates 2 to the substrate transfer position above the opening 22 of the transport area outer member 21 of the first first processing unit. Then, the plurality of substrates 2 are transferred to the lifter device 31 so as to be introduced into the second substrate transfer area 19.
[0059]
Further, as described above, the plurality of substrates 2 introduced into the second substrate transfer areas 18 and 19 respectively transfer the respective substrates in the first processing unit and the second processing unit, open and close the door, and exhaust the air. Are performed in the same manner as the above-described operations for the chemical solution treatment and the water washing process in the first processing unit.
[0060]
Further, the lifter device 31 of the second processing unit raises the plurality of substrates 2 after the rinsing process after a predetermined time, opens the opening / closing door 27 in conjunction therewith, and opens the substrate from the upper opening of the rinsing tank 15. The holding arm 32 holding the substrate 2 is raised through the introduction port 24, the opening / closing door 26 is opened so as to interlock with the rise, and the holding arm 32 holding the substrate 2 through the opening 22 of the transfer area outer member 21 is moved to the second position. 2 to the substrate delivery position of the processing unit. At the board transfer position, the transport mechanism 9 waits for the pair of holding plates 29 in the vertical posture, and causes the holding arm 32 holding the substrate 2 to arrive at the board transfer position between the pair of holding plates 29. Then, the lower ends of the pair of holding plates 29 are rotated inward, and the both end surfaces of the plurality of substrates 2 are sandwiched from both sides and received and held by the respective holding grooves to transfer the substrates 2. Delivery to the mechanism 9 is performed.
[0061]
Thereafter, the pair of holding plates 29 of the transport mechanism 9 deliver the plurality of substrates 2 having been processed by the second processing unit to the lifter device 35 of the drying tank 25. Further, a plurality of substrates 2 on which the processing of the first processing unit has been completed are received from the lifter device 31 of the first processing unit to the pair of holding plates 29 and the pair of holding plates 29 are used to receive the second processing unit. The plurality of substrates 2 are delivered to the lifter device 31. Further, the plurality of substrates 2 delivered to the lifter device 31 of the second processing unit are introduced into the second substrate transport area 19, and the transport mechanism 9 returns to the loading / unloading unit to receive the substrate 2, and The substrate 2 is transported to the substrate transfer position above the opening 22 of the first processing unit, and the plurality of substrates 2 are transferred to the lifter device 31 of the first processing unit. On the other hand, the plurality of substrates 2 are lowered together with the holding arm 32 by the lifter device 31 of the drying processing unit, and in conjunction with the lowering, the opening / closing door 28 is opened, and the plurality of substrates 2 are introduced into the drying tank 25 to perform the drying process. Done.
[0062]
In this manner, the plurality of substrates 2 introduced into the second substrate transfer areas 18 and 19 and the drying processing unit respectively include the first processing unit and the second processing unit, and the substrate transfer and door in the drying processing unit. Each operation such as opening / closing and exhaust is performed.
[0063]
Further, the plurality of substrates 2 after the drying process are raised again from the inside of the drying tank 25 to the substrate transfer position above the drying tank 25 by the lifter device 35 and transferred between the pair of holding plates 29 of the transfer mechanism 9. The plurality of substrates 2 after the drying process are transported along the disposition direction (X direction) of each processing unit to the substrate delivery position with respect to the loading / unloading unit (not shown). The plurality of processed substrates 2 are delivered.
[0064]
As described above, the pair of holding plates 29 of the transport mechanism 9 deliver the plurality of substrates 2 that have been processed by the second processing unit to the lifter device 35 of the drying tank 25, and also transfer the plurality of substrates 2 of the first processing unit. The plurality of substrates 2 that have been processed by the first processing unit are received from the lifter device 31 and the plurality of substrates 2 are transferred from the pair of holding plates 29 to the lifter device 31 of the second processing unit. Further, the plurality of substrates 2 delivered to the lifter device 31 of the second processing unit are introduced into the second substrate transport area 19, and the transport mechanism 9 returns to the loading / unloading section to receive the plurality of substrates 2. The substrate 2 is transferred to the substrate transfer position above the opening 22 of the first processing unit, and the plurality of substrates 2 are transferred to the lifter device 31 of the first processing unit. The above operations are sequentially repeated as described above, and a predetermined process is performed on the plurality of substrates 2.
[0065]
As described above, the second substrate transfer areas 18 and 19 on each processing unit side where the fume from the chemical solution diffuses are respectively covered with the transfer area outer members 21 as separating members, and the transfer area outer members 21 The openings 22 are provided only at positions corresponding to the washing tanks 13 and 14, respectively, so that the fumes of the chemical do not easily diffuse into the outer first substrate transfer area 20 from the openings 22. Even if the exhaust capacity of the means 23 is significantly reduced (for example, reduced by 80%), diffusion of fumes into the first substrate transport area 20 outside each transport area outer member 21 can be prevented. However, it is possible to make the substrate processing apparatus more compact, power-saving, space-saving, and quieter.
[0066]
In addition, since the shutter means for opening and closing the substrate transfer opening 22 of each transfer area outer member 21 is provided, even if the exhaust means 23 has a smaller exhaust capacity, each transfer area outer member of the fume discharged from the chemical solution is provided. 21 can be prevented from spreading outside (in the first substrate transfer area 20).
[0067]
Further, the fume density is highest at a position above the chemical processing section in the second substrate transfer areas 18 and 19 from which the plurality of substrates 2 with the chemicals are taken out of the substrate processing area 17, and from the position where the fume density is high. Since the opening 22 is provided in each of the transfer area outer members 21 above the remote washing section, the fumes coming out of the chemical liquid are less likely to be diffused into the outer first substrate transfer area 20 and the exhaust capacity is smaller. It can be done by means 23.
[0068]
Further, the fume concentration is highest at the position above the chemical processing section in the second substrate transfer areas 18 and 19, and the exhaust port of the exhaust means 23 is provided near the chemical processing section. An atmosphere having a high fume concentration can be efficiently exhausted, and the exhaust means 23 having a smaller exhaust capacity can further reduce the fume concentration.
[0069]
Further, when the opening 22 of the transfer area outer member 21 is opened by the shutter means, the fumes in the transfer area outer member 21 (the second substrate transfer areas 18 and 19) are exhausted with a high exhaust output, and the transfer area outer member 21 is discharged. When the opening 22 is closed by the shutter means, it is possible to switch so as to exhaust the fumes in the transfer area outer member 21 (the second substrate transfer areas 18 and 19) with a low exhaust output. This makes it possible to reduce the driving noise (silent sound), and further suppress the diffusion of fumes into the first substrate transfer area 20 outside the transfer area outer member 21 when the shutter means is opened.
[0070]
In this embodiment, the atmosphere in the substrate processing area 17 and the second substrate transfer areas 18 and 19 is configured to be exhausted through the exhaust duct 37 of the exhaust unit 23, and the exhaust pump 39 of the exhaust unit 23 exhausts the atmosphere. The output control is performed in accordance with the opening and closing of the opening 22 and each of the substrate introduction ports 24, and when the substrate is transported in the series of second substrate transport areas 18 and 19 from the chemical baths 12 and 14 to the washing baths 13 and 15, In order to exhaust the fumes from the plurality of substrates 2 provided with a mark, the exhaust output was increased. However, the present invention is not limited to this, and the chemical liquid tanks 12 and 14, the washing tanks 13 and 15, the second substrate transfer areas 18 and 19 For example, different exhaust means may be provided, and the exhaust means may be subjected to exhaust output control as described above. In this case, the fumes themselves are different in the exhaust output control in the substrate processing areas 17 of the chemical solution tanks 12 and 14 and the washing tanks 13 and 15, and the exhaust output control corresponding thereto (for example, the exhaust output is low when the fume concentration is low). Good), it is possible to control different exhaust means. In the exhaust output control in the substrate processing area 17 and the second substrate transfer areas 18 and 19, the highest exhaust output is obtained when the opening / closing door 26 and the substrate introduction opening / closing door 27 are opened. The output is gradually reduced to the extent that there is no diffusion, and when the gas is taken out of the chemical baths 12 and 14 into the second substrate transport areas 18 and 19 by the exhaust output control in the second substrate transport areas 18 and 19. Each of the different exhaust means can be controlled so that the exhaust output is set to be the highest, and thereafter the output is gradually reduced to such an extent that there is no fume diffusion.
[0071]
Further, in the present embodiment, in a batch type substrate processing apparatus that processes a plurality of substrates 2 at a time, the substrate transfer area on each processing unit side is covered with a separating member, and the separating member is provided with an opening as small as possible. Although the case where the present invention is applied has been described, the present invention is also applicable to a substrate processing apparatus of a single plate type for processing the substrates 2 one by one.
[0072]
【The invention's effect】
As described above, according to the first aspect of the present invention, the substrate transport area on each processing unit side where the fumes from the chemical solution or the like are diffused is covered with the separating member, and the fumes such as the chemical solution are removed from the opening of the separating member. An opening is provided only at a position corresponding to one processing unit so that it is difficult to diffuse to the outside, and the opening is made as small as possible. Since the diffusion of the gas can be prevented, the size of the exhaust means can be reduced, the power consumption can be reduced, the space can be saved, and the substrate processing apparatus can be made quieter.
[0073]
Further, the fume concentration is highest at a position above the chemical processing unit where the substrate with the chemical is taken out from the substrate processing area, and an opening is provided in the separation member above the washing unit apart from the position where the fume concentration is high. With this configuration, the fumes discharged from the chemical liquid are not easily diffused to the outside, so that the exhaust means having a smaller exhaust capacity can be used.
[0074]
Further, according to the second aspect of the present invention, since the shutter means for opening and closing the opening for transporting the substrate of the separation member is provided, the exhaust means having a smaller exhaust capacity can separate the fumes coming out of the chemical solution or the like from the separation member. Can be prevented.
[0075]
Further, according to the third aspect of the present invention, since the fume density is highest at the position above the chemical processing section and the exhaust port is provided near the chemical processing section, the atmosphere with the high fume density from the exhaust port by the exhaust means. Can be efficiently exhausted, and the fume concentration can be further reduced even with an exhausting means having a smaller exhausting ability.
[0076]
Further, according to the fourth aspect of the present invention, when the opening of the separation member is opened by the shutter means, the fume inside the separation member is exhausted with a high exhaust output, and when the opening of the separation member is closed by the shutter means, the fume is low. Since the fumes in the separation member can be switched to be exhausted by the exhaust output, when the shutter is closed, power can be saved and a small driving noise (silent) can be obtained. Diffusion can be further suppressed.
[Brief description of the drawings]
FIG. 1 is a perspective view illustrating a schematic main configuration of a substrate processing apparatus according to an embodiment of the present invention.
FIG. 2 is a schematic main part configuration diagram of a section AA of the substrate processing apparatus of FIG.
FIG. 3 is a perspective view illustrating a schematic configuration of a substrate delivery state between the lifter device and a transport mechanism in FIG. 2;
FIG. 4 is a side view illustrating a schematic configuration of a substrate delivery state between the lifter device and a transport mechanism in FIG. 2;
FIG. 5 is a schematic diagram showing a schematic configuration of a main part in a conventional substrate processing apparatus.
FIG. 6 is a side view showing a schematic configuration of a substrate transfer state between the lifter device and the transfer robot in FIG. 5;
[Explanation of symbols]
1 Substrate processing equipment
2 substrate
5 Substrate processing unit
9 Transport mechanism
12,14 Chemical bath
13,15 Rinse tank
16 Outer shell member
17 Substrate processing area
18, 19 Second board transfer area
20 First substrate transfer area
21,40 Conveyor area outer member
22, 41 opening
23 Exhaust means
24 Substrate inlet
25 Drying tank
26 Opening door
27, 28 Inlet opening / closing door
29 Holding plate
31, 35 Lifter device
32 Holding arm
37 Exhaust duct
38 Flow control valve
39 Exhaust pump
42 Door

Claims (4)

In a substrate processing apparatus that performs a predetermined process on one or a plurality of substrates,
Arranged in a predetermined direction, a plurality of processing units including a chemical processing unit that performs a chemical processing on the substrate, and a washing processing unit that performs a washing process on the substrate that has been subjected to the chemical processing by the chemical processing unit,
In order to transport the substrate between at least the chemical processing section and the rinsing processing section of the plurality of processing sections, a transport path installed above the chemical processing section and the rinsing processing section ,
Transport means for transporting the substrate between at least the chemical processing section and the rinsing processing section in the transport path,
In order to separate the atmosphere between the space of the transport path and a position above the transport path, the transport unit is disposed above the transport path, and moves the transport unit between the upper position and the transport path. A separating member formed with an opening to allow,
Exhaust means for exhausting the atmosphere in the transport path ,
The substrate processing apparatus according to claim 1, wherein an opening for transporting the substrate of the separating member is formed at a position of the separating member corresponding to a position above the washing section . 2. The substrate processing apparatus according to claim 1, further comprising shutter means that can be opened and closed with respect to the substrate transport opening of the separation member. The substrate processing apparatus according to claim 1, wherein:
The substrate processing apparatus , wherein the exhaust unit is provided with an exhaust port near a chemical solution processing unit in the processing unit. The substrate processing apparatus according to claim 1,
The exhaust means includes control means for performing switching control between high exhaust output and low exhaust output in accordance with an open position and a closed position of a shutter means capable of opening and closing with respect to the substrate transfer opening of the separation member. Characteristic substrate processing equipment.

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