JP3449537B2 - Liquid crystal display - Google Patents
Liquid crystal displayInfo
- Publication number
- JP3449537B2 JP3449537B2 JP13590699A JP13590699A JP3449537B2 JP 3449537 B2 JP3449537 B2 JP 3449537B2 JP 13590699 A JP13590699 A JP 13590699A JP 13590699 A JP13590699 A JP 13590699A JP 3449537 B2 JP3449537 B2 JP 3449537B2
- Authority
- JP
- Japan
- Prior art keywords
- liquid crystal
- electrode
- pixel electrode
- display device
- crystal display
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Liquid Crystal (AREA)
- Thin Film Transistor (AREA)
Description
【0001】[0001]
【発明の属する技術分野】本発明は、横方向電界方式の
アクテイブマトリクス型の液晶表示装置に関し、特に、
表示面への加重によって生じる表示不良が抜重後も長時
間視認される加重痕と呼ばれる不良の低減に関するもの
である。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a horizontal electric field type active matrix liquid crystal display device, and more particularly,
The present invention relates to a reduction in a display defect caused by a load on a display surface, which is called a load mark that is visually recognized for a long time even after weight removal.
【0002】[0002]
【従来の技術】近年、例えば特開平8- 254712号
公報で開示されているように、アクティブマトリクス型
の液晶表示装置において、液晶に印加する電界の方向を
基板に対して平行な方向とする横方向電界方式が、主に
超広視野角を得る手法として用いられている。この方式
を採用すると、視角方向を変化させた際のコントラスト
の変化、階調レベルの反転がほとんど無くなることが明
らかにされている( 参考文献:M.Oh-e, 他,Asia Displa
y'95,pp.577-580)。図10は、従来の一般的な横方向電
界方式の液晶表示装置の画素部を示す平面図である。図
において、2は絶縁性基板上に形成された複数本の走査
信号線であるゲート配線で、複数本の映像信号線である
ソース配線12と互いに交差している。4は保持容量共
通配線、6はゲート配線2及びソース配線12の各交点
に設けられた薄膜トランジスタの半導体膜、9は保持容
量共通配線4上にゲート絶縁膜を介して設けられた保持
容量電極、10は薄膜トランジスタに接続され、ソース
配線12と平行に設けられた複数本の電極よりなる櫛状
の画素電極、11は画素電極10の複数本の電極と平行
且つ交互に配置された複数本の電極よりなる櫛状の対向
電極、14はドレイン電極、16はコンタクトホールを
それぞれ示している。2. Description of the Related Art In recent years, as disclosed in, for example, Japanese Patent Laid-Open No. 8-254712, in an active matrix type liquid crystal display device, the direction of the electric field applied to the liquid crystal is set to a direction parallel to the substrate. The directional electric field method is mainly used as a method for obtaining an ultra wide viewing angle. When this method is adopted, it has been clarified that there is almost no change in contrast and gradation level inversion when the viewing angle direction is changed (reference: M. Oh-e, et al., Asia Displa.
y'95, pp.577-580). FIG. 10 is a plan view showing a pixel portion of a conventional general horizontal electric field type liquid crystal display device. In the figure, reference numeral 2 denotes a gate wiring which is a plurality of scanning signal lines formed on an insulating substrate and intersects with a source wiring 12 which is a plurality of video signal lines. 4 is a storage capacitor common line, 6 is a semiconductor film of a thin film transistor provided at each intersection of the gate line 2 and source line 12, 9 is a storage capacitor electrode provided on the storage capacitor common line 4 via a gate insulating film, Reference numeral 10 denotes a comb-shaped pixel electrode including a plurality of electrodes connected to the thin film transistor and provided in parallel with the source wiring 12. Reference numeral 11 denotes a plurality of electrodes arranged in parallel and alternately with the plurality of electrodes of the pixel electrode 10. Is a counter electrode, and 14 is a drain electrode, and 16 is a contact hole.
【0003】[0003]
【発明が解決しようとする課題】このような横方向電界
方式の液晶表示装置において、表示面への加重により、
加重箇所の周囲に液晶の配向異常による表示不良が発生
し、抜重後もその表示不良が長時間視認される加重痕と
呼ばれる現象が発生するという問題がある。加重痕の発
生原理を図11〜図14を用いて説明する。図11は液
晶への電圧印加なしの状態、図12は液晶への電圧印加
有の状態、図13は液晶への電圧印加有で且つ加重有の
状態、図14は液晶への電圧印加有で且つ抜重後の状態
での液晶分子の配列を示している。液晶への電圧印加な
しの状態では、図11に示すように液晶はラビング等の
液晶配向方法により決められた配向方向に並んでおり、
液晶に電圧が印加されると液晶は電界の方向に配列す
る。このとき図12に示すように画素電極10端部や対
向電極11端部では電界の方向が変化するため、液晶が
逆回転する領域が生じ、正回転する領域との境界に配向
不良領域22が生じる。電圧印加状態でかつ定圧状態で
はこの配向不良領域は電極端部付近にしか生じないた
め、ほとんど視認されない。しかし、電圧印加状態にお
いて表示面に加重があると、図13に示すように画素電
極10端部の配向不良領域22と対向電極11端部の配
向不良領域22が広がる現象が生じ、配向不良領域22
が視認されてしまう。この配向不良領域22は、抜重後
は大部分が初期状態に戻るが、一部では図14に示すよ
うに長時間残存し視認され、表示品位を著しく低下させ
る。In such a lateral electric field type liquid crystal display device, due to the weight applied to the display surface,
There is a problem that a display defect occurs due to an abnormal alignment of the liquid crystal around the weighted portion, and a phenomenon called a load mark occurs in which the display defect is visually recognized for a long time even after the weight is removed. The principle of generation of weighted marks will be described with reference to FIGS. 11 to 14. 11 is a state in which no voltage is applied to the liquid crystal, FIG. 12 is a state in which a voltage is applied to the liquid crystal, FIG. 13 is a state in which a voltage is applied to the liquid crystal and weighting is applied, and FIG. 14 is a state in which a voltage is applied to the liquid crystal. In addition, the alignment of the liquid crystal molecules in the state after the unloading is shown. In the state in which no voltage is applied to the liquid crystal, the liquid crystal is aligned in the alignment direction determined by the liquid crystal alignment method such as rubbing as shown in FIG.
When a voltage is applied to the liquid crystal, the liquid crystal is aligned in the direction of the electric field. At this time, as shown in FIG. 12, since the direction of the electric field changes at the end portion of the pixel electrode 10 and the end portion of the counter electrode 11, a region in which the liquid crystal rotates in the reverse direction occurs, and an alignment defect region 22 is formed at the boundary with the region in which the liquid crystal rotates in the normal direction. Occurs. In the state where a voltage is applied and the pressure is constant, this poorly-aligned region is generated only near the end of the electrode, and therefore is hardly visible. However, when there is a load on the display surface in the voltage applied state, as shown in FIG. 13, there occurs a phenomenon in which the misalignment region 22 at the end of the pixel electrode 10 and the misalignment region 22 at the end of the counter electrode 11 expand, and the misalignment region occurs. 22
Will be seen. Most of the misalignment region 22 returns to the initial state after the weight is removed, but some of the misalignment region 22 remains visible for a long time as shown in FIG. 14 and the display quality is significantly deteriorated.
【0004】また、図11〜図14では、液晶の配向方
向がソース配線12に対し反時計周りの場合について示
したが、液晶の配向方向がソース配線12に対して時計
周りの場合について図15〜図17に示す。図15は液
晶への電圧印加有の状態、図16は液晶への電圧印加有
でかつ加重有の状態、図17は液晶への電圧印加有で且
つ抜重後の状態での液晶分子の配列を示している。この
ように、ソース配線12に対し液晶の配向方向が時計周
りの場合の配向異常領域22の発生箇所は、反時計周り
の場合の発生箇所とソース配線12に対し線対称とな
る。上記のような加重痕を低減する方法としては、ラビ
ング角度を大きくする手法が一般に知られている。しか
しながら、横方向電界方式ではコントラストが高い視野
角方向はラビング角方向すなわち液晶の配向方向及びそ
れと直角となる方向であるため、ラビング角を大きくす
ると表示装置の上下左右方向の視野角特性が低下すると
いう問題がある。また、ラビング角度の増加に伴い駆動
電圧が大きくなるため、低電圧駆動が困難になるという
問題も生じる。11 to 14 show the case where the orientation direction of the liquid crystal is counterclockwise with respect to the source wiring 12, the case where the orientation direction of the liquid crystal is clockwise with respect to the source wiring 12 is shown in FIG. ~ Shown in FIG. FIG. 15 shows a state in which a voltage is applied to the liquid crystal, FIG. 16 shows a state in which a voltage is applied to the liquid crystal and weighting, and FIG. 17 shows an arrangement of liquid crystal molecules in a state in which a voltage is applied to the liquid crystal and after weighting. Shows. As described above, the location where the abnormal alignment region 22 is generated when the liquid crystal is oriented clockwise with respect to the source wiring 12 is line-symmetric with respect to the location where the liquid crystal is oriented counterclockwise with respect to the source wiring 12. A method of increasing the rubbing angle is generally known as a method of reducing the above-mentioned weighted marks. However, in the horizontal electric field method, the viewing angle direction with high contrast is the rubbing angle direction, that is, the alignment direction of the liquid crystal and the direction perpendicular to the rubbing angle direction. Therefore, when the rubbing angle is increased, the viewing angle characteristics of the display device in the vertical and horizontal directions deteriorate. There is a problem. Further, since the driving voltage increases as the rubbing angle increases, there is a problem that low voltage driving becomes difficult.
【0005】本発明は、上記のような問題点を解消する
ためになされたもので、表示面への加重により生じる表
示不良が抜重後も長時間視認される加重痕と呼ばれる不
良を低減し、広視野角で良好な表示特性を有し、且つ製
造が簡易で低コストな横方向電界方式の液晶表示装置を
得ることを目的とする。The present invention has been made in order to solve the above problems, and reduces a display defect caused by a load on a display surface, which is called a load mark that is visually recognized for a long time even after weight removal, An object of the present invention is to obtain a horizontal electric field type liquid crystal display device which has a wide viewing angle, good display characteristics, is easy to manufacture, and is low in cost.
【0006】[0006]
【課題を解決するための手段】この発明による液晶表示
装置は、対向配置された一対の基板と、上記基板間に挟
持された液晶層と、上記一方の基板に形成され互いに交
差する複数本の走査信号線及び複数本の映像信号線と、
上記走査信号線及び上記映像信号線の交点に対応して設
けられた薄膜トランジスタと、上記薄膜トランジスタに
接続された複数本の電極よりなる画素電極と、上記画素
電極の複数本の電極に沿って延びる複数本の電極よりな
る対向電極とを備え、上記画素電極及び対向電極間に電
圧を印加し基板面にほぼ平行な電界を上記液晶層に印加
する液晶表示装置において、上記画素電極の複数本の電
極のうちの少なくとも1つの電極の少なくとも上記薄膜
トランジスタから離れた側の画素電極先端部と、上記対
向電極の複数本の電極のうちの少なくとも1つの電極の
少なくとも上記薄膜トランジスタに近い側の対向電極先
端部は、基板面とほぼ平行な方向の間隙を介して他方の
電極と対向しており、これらの画素電極先端部と対向電
極先端部にそれぞれ屈曲部を設け、これらの屈曲部はそ
れぞれその根本部に続いて形成されており、またそれぞ
れの屈曲部と根本部との屈曲点を原点としその根本部の
延長線をY軸として想定したXY平面に関して、上記屈
曲部と上記液晶層の配向方向線が異なる象限に位置して
いることを特徴とするものである。SUMMARY OF THE INVENTION The liquid crystal display device that by the present invention, the pair and the pair of substrates direction disposed, and a liquid crystal layer sandwiched between said substrates, each other physician is formed on one substrate above A plurality of scanning signal lines and a plurality of video signal lines intersecting with,
A thin film transistor kicked set <br/> to correspond to the intersection of the scanning signal lines and the video signal line, and the picture element electrode ing from multiple several electrodes connected to said thin film transistors, a plurality of the pixel electrodes I than double several electrodes extending along the electrode
A that pair counter electrode, the liquid crystal display device to be applied to the liquid crystal layer substantially parallel electric field to the substrate surface by applying a voltage between the pixel electrode and the counter electrode, electrodeposition plurality of the pixel electrodes
At least the thin film of at least one electrode of a pole
The pixel electrode tip on the side away from the transistor and the above pair
Of at least one of the plurality of electrodes
At least the counter electrode tip near the thin film transistor
The edge part of the other side is separated by a gap in the direction almost parallel to the substrate surface.
It faces the electrodes, and the counter electrode is
Bends are provided at the pole tips, and these bends are
Each is formed following its root, and again
The bending point between the bent part and the root part is the origin and the
Regarding the XY plane assuming the extension line as the Y axis,
If the curved line and the alignment line of the liquid crystal layer are located in different quadrants,
It is characterized by being present.
【0007】また、この発明による液晶表示装置は、上
記画素電極先端部に対応する上記対向電極の少なくとも
1つの電極に上記画素電極先端部に設けられた屈曲部と
ほぼ平行な屈曲部を形成し、また上記対向電極先端部に
対応する上記画素電極の少なくとも1つの電極に上記対
応電極先端部に設けられた屈曲部とほぼ平行な屈曲部を
形成したことを特徴とするものである。In the liquid crystal display device according to the present invention , at least the counter electrode corresponding to the tip of the pixel electrode is provided.
A bent portion provided at the tip of the pixel electrode on one electrode
Forming a substantially parallel bent portion, and forming a pair of electrodes on at least one of the pixel electrodes corresponding to the tip of the counter electrode .
Substantially parallel bent portion and the bent portion provided in response electrode tip
It is characterized by being formed .
【0008】また、この発明による液晶表示装置は、上
記根本部の延長線と上記屈曲部との角度は、0°より大
きく、90°より小さいことを特徴とするものである。
さらにまた、この発明による液晶表示装置は、 上記根
本部の延長線と上記屈曲部との角度は、5°より大き
く、45°より小さいことを特徴とするものである。Further, the liquid crystal display device according to the present invention is
The angle between the extension line of the root part and the bent part is larger than 0 °.
It is characterized by being smaller than 90 ° .
Furthermore , the liquid crystal display device according to the present invention is
The angle between the extension line of the main part and the bent part is larger than 5 °.
And is smaller than 45 ° .
【0009】[0009]
【発明の実施の形態】実施の形態1
以下に、本発明の実施の形態を図面に基づいて説明す
る。図1は、本発明の実施の形態1における横方向電界
方式の液晶表示装置の画素部を示す平面図、図2は図1
に示す液晶表示装置の製造方法を示す断面図である。図
において、1はガラス基板等の絶縁性基板、2は絶縁性
基板1上に形成されたCr等の金属よりなる複数本の走
査信号線であるゲート配線で、複数本の映像信号線であ
るソース配線12と互いに交差している。3はCr等の
金属よりなるゲート電極、4はCr等の金属よりなる保
持容量共通配線、5はゲート配線2及び保持容量共通配
線4を覆うように形成された窒化シリコン等よりなるゲ
ート絶縁膜、6はゲート配線2及びソース配線12の各
交点に設けられた薄膜トランジスタを構成するノンドー
プ非晶質シリコン等よりなる半導体膜、7は半導体膜6
に接続して形成され且つその膜の一部である能動態領域
の上部をエッチング等で取り除いた領域8を有するP等
の不純物をSi等の半導体膜にドープしたコンタクト
膜、9は保持容量共通配線4上にゲート絶縁膜5を介し
て設けられた保持容量電極、10は薄膜トランジスタに
接続され、ソース配線12と平行に設けられた複数本の
電極よりなる櫛状の画素電極で、Cr等の金属またはI
TO(Indium Tin oxide) 等の透明性導電膜等より形成
されている。11は画素電極10の複数本の電極と平行
且つ交互に配置された複数本の電極よりなる櫛状の対向
電極、10a、11aは画素電極10及び対向電極11
の先端部にそれぞれ設けられたソース配線12に対する
液晶の配向方向と反対の方向に屈曲した屈曲部、13は
コンタクト膜7に接するように形成されソース配線12
に接続されたソース電極、14はコンタクト膜7に接す
るように形成されたドレイン電極、15はデバイス全体
を覆うように窒化Si膜等で形成された層間絶縁膜、1
6はコンタクトホール、17はゲート配線2と同一の材
料を用い絶縁性基板1上に形成された第一の配線、18
はソース配線12と同一の材料を用い絶縁性基板1上に
形成された第二の配線、19はコンタクトホールを介し
第一の配線17と第二の配線18を接続する画素電極1
0と同一の材料よりなる第三の配線、21は変換部をそ
れぞれ示している。BEST MODE FOR CARRYING OUT THE INVENTION Embodiment 1 Hereinafter, an embodiment of the present invention will be described with reference to the drawings. 1 is a plan view showing a pixel portion of a horizontal electric field type liquid crystal display device according to Embodiment 1 of the present invention, and FIG.
FIG. 6 is a cross-sectional view showing the method of manufacturing the liquid crystal display device shown in FIG. In the figure, 1 is an insulating substrate such as a glass substrate, 2 is a gate wiring which is a plurality of scanning signal lines made of a metal such as Cr formed on the insulating substrate 1, and a plurality of video signal lines. The source wirings 12 intersect with each other. 3 is a gate electrode made of a metal such as Cr, 4 is a storage capacitor common wiring made of a metal such as Cr, 5 is a gate insulating film made of silicon nitride or the like formed so as to cover the gate wiring 2 and the storage capacitor common wiring 4. , 6 is a semiconductor film made of non-doped amorphous silicon or the like forming a thin film transistor provided at each intersection of the gate line 2 and the source line 12, and 7 is a semiconductor film 6
A contact film in which a semiconductor film such as Si is doped with an impurity such as P, which has a region 8 formed by being connected to the upper part of the active region which is a part of the film and removed by etching or the like, and 9 is a storage capacitor common wiring A storage capacitor electrode 10 provided on the gate electrode 4 via a gate insulating film 5 is a comb-shaped pixel electrode composed of a plurality of electrodes connected to a thin film transistor and provided in parallel with the source wiring 12. Or I
It is made of a transparent conductive film such as TO (Indium Tin oxide). Reference numeral 11 denotes a comb-shaped counter electrode composed of a plurality of electrodes arranged in parallel and alternately with the plurality of electrodes of the pixel electrode 10, and reference numerals 10a and 11a denote the pixel electrode 10 and the counter electrode 11.
The source wiring 12 is provided at the tip end of each of the source wirings 12 and the bent portion 13 is bent in the direction opposite to the liquid crystal alignment direction with respect to the source wiring 12.
Connected to the source electrode, 14 is a drain electrode formed in contact with the contact film 7, and 15 is an interlayer insulating film formed of a silicon nitride film or the like so as to cover the entire device,
Reference numeral 6 is a contact hole, 17 is a first wiring formed on the insulating substrate 1 using the same material as the gate wiring 2, and 18
Is a second wiring formed of the same material as the source wiring 12 on the insulating substrate 1, and 19 is the pixel electrode 1 connecting the first wiring 17 and the second wiring 18 through a contact hole.
A third wiring made of the same material as that of 0 and a conversion portion 21 are respectively shown.
【0010】本実施の形態における液晶表示装置は、一
定の距離を隔て対向配置された一対の基板間に液晶層が
挟持され、一方の基板上にソース配線12と平行に設け
られた複数本の電極よりなる櫛状の画素電極10と、画
素電極10の複数本の電極と平行且つ交互に配置された
複数本の電極よりなる櫛状の対向電極11を備え、画素
電極10及び対向電極11間に電圧を印加し基板面にほ
ぼ平行な電界を液晶層に印加する横方向電界方式の液晶
表示装置であり、画素電極10の薄膜トランジスタから
離れた側の画素電極先端部と対向電極11の薄膜トラン
ジスタに近い側の対向電極先端部は、基板面とほぼ平行
な方向に他方の電極に間隙を介して対向しており、この
画素電極先端部と対向電極先端部にそれぞれ、屈曲部1
0a、11aを設けたものである。この屈曲部10a、
11aは、画素電極10、対向電極11の電極のソース
配線12と平行な根本部に続いて形成される。液晶層の
配向方向線は図1に示す通り、上記根本部の延長方向線
に関して、その反時計方向側に角度θ1だけ傾いて配置
されている。屈曲部10a、11aは、根本部の延長線
に関して、上記液晶の配向方向線と反対側に、すなわ
ち、その時計方向側に角度θeだけ傾いて位置してい
る。結果として、それぞれの屈曲部11a、11aと根
本部10c、11cとの屈曲点を原点としその根本部1
0c、11cの延長線をY軸として想定したXY平面に
関して、屈曲部と液晶の配向方向線とが異なる象限に位
置している。 In the liquid crystal display device according to the present embodiment, a liquid crystal layer is sandwiched between a pair of substrates opposed to each other with a certain distance, and a plurality of liquid crystal layers provided in parallel with the source wiring 12 on one substrate. Between the pixel electrode 10 and the counter electrode 11, there are provided a comb-shaped pixel electrode 10 made of an electrode and a comb-shaped counter electrode 11 made of a plurality of electrodes arranged in parallel and alternately with the plurality of electrodes of the pixel electrode 10. the electric field substantially parallel to an applied substrate surface voltage is a liquid crystal display device of transverse electric field type applied to the liquid crystal layer, a thin film transistor of the pixel electrode 10 in
The thin film transistor between the tip of the pixel electrode on the remote side and the counter electrode 11
The tip of the counter electrode near the transistor is almost parallel to the substrate surface.
The other electrode in the opposite direction with a gap in between,
To the pixel electrode tip and opposed electrode tips, flexion curved portion 1
0a and 11a are provided. This bent portion 10a,
11a is the source of the pixel electrode 10 and the counter electrode 11
It is formed following the root portion parallel to the wiring 12. Of the liquid crystal layer
The orientation line is the extension line of the root as shown in Fig. 1.
With respect to the counterclockwise direction, tilted by an angle θ1
Has been done. The bent portions 10a and 11a are extension lines of the root portion.
Regarding the above, on the side opposite to the alignment line of the liquid crystal,
Then, it is positioned at an angle of θe on the clockwise side.
It As a result, each bend 11a, 11a and root
The origin is the bending point with the main parts 10c and 11c, and the root part 1
On the XY plane assuming the extension line of 0c and 11c as the Y axis
Therefore, the bend and the liquid crystal alignment direction line are located in different quadrants.
It is location.
【0011】本実施の形態における液晶表示装置のプロ
セスフローを図2に従って説明する。まず、図2(a)
に示すように、絶縁性基板1上にCr、Al、Ti、T
a、Mo、W、Ni、Cu、Au、Ag等やそれらを主
成分とする合金、またはITO等の透光性を有する導電
膜、またはそれらの多層膜等をスパッタ法や蒸着法等に
より成膜し、写真製版・加工によりゲート配線2、ゲー
ト電極3、保持容量共通配線4及び変換部21における
第一の配線17等を形成する。次に、図2(b)に示す
ように、窒化シリコン等よりなるゲート絶縁膜5を形成
し、さらに非晶質Si、多結晶poly‐Si等よりなる半
導体膜6、n型のTFTの場合はP等の不純物を高濃度
にドーピングしたn+ 非晶質Si、n+ 多結晶poly‐S
i等よりなるコンタクト膜7を、連続的に例えばプラズ
マCVD、常圧CVD、減圧CVD法で成膜する。次い
で、コンタクト膜7と半導体膜6を島状に加工する。A process flow of the liquid crystal display device according to this embodiment will be described with reference to FIG. First, FIG. 2 (a)
, Cr, Al, Ti, T on the insulating substrate 1
a, Mo, W, Ni, Cu, Au, Ag or the like, an alloy containing them as a main component, a transparent conductive film such as ITO, or a multilayer film thereof is formed by a sputtering method or a vapor deposition method. The film is formed, and the gate wiring 2, the gate electrode 3, the storage capacitor common wiring 4, the first wiring 17 in the conversion portion 21, and the like are formed by photolithography and processing. Next, as shown in FIG. 2B, a gate insulating film 5 made of silicon nitride or the like is formed, and further, a semiconductor film 6 made of amorphous Si or polycrystalline poly-Si, and an n-type TFT are used. Is n + amorphous Si, n + polycrystalline poly-S, which is heavily doped with impurities such as P.
The contact film 7 made of i or the like is continuously formed by, for example, plasma CVD, atmospheric pressure CVD, or low pressure CVD. Next, the contact film 7 and the semiconductor film 6 are processed into an island shape.
【0012】次に、図2(c)に示すように、Cr、A
l、Ti、Ta、Mo、W、Ni、Cu、Au、Ag等
やそれらを主成分とする合金、またはITO等の透光性
を有する導電膜、またはそれらの多層膜等をスパッタ法
や蒸着法で成膜後、写真製版と微細加工技術によりソー
ス配線12、ソース電極13、ドレイン電極14、保持
容量電極9及び第二の配線18等を形成する。さらに、
ソース電極13及びドレイン電極14あるいはそれらを
形成したホトレジストをマスクとしてコンタクト膜7を
エッチングし、チャネル領域から取り除く。次いで、図
2(d)に示すように、窒化シリコンや酸化シリコン、
無機絶縁膜または有機樹脂等からなる層間絶縁膜15を
成膜し、写真製版とそれに続くエッチングによりコンタ
クトホール16を形成する。最後に、図2(e)に示す
ように、Cr、Al、Ti、Ta、Mo、W、Ni、C
u、Au、Ag等やそれらを主成分とする合金、または
ITO等の透光性を有する導電膜、またはそれらの多層
膜等を成膜後、パターニングすることで画素電極10、
対向電極11及び第三の配線19を形成する。この時、
図1に示すように、画素電極10及び対向電極11の先
端部に、ソース配線12に対する液晶の配向方向と反対
の方向に屈曲した屈曲部10a、11aを設ける。な
お、屈曲部10a、11aの角度θe は、0゜<θe <
90゜で効果を得ることは可能であるが、5°<θe <
45゜で設計すれば製造上のバラツキ等により電極先端
形状が変化しても、0゜<θe <90゜を越えたり、他
方の電極とのショートを抑えることができる。図1にお
いて、θ1 は液晶分子の配列方向とソース配線12のな
す角度である。Next, as shown in FIG. 2 (c), Cr, A
l, Ti, Ta, Mo, W, Ni, Cu, Au, Ag, etc., alloys containing them as a main component, translucent conductive films such as ITO, or multilayer films thereof are sputtered or vapor-deposited. After film formation by the method, the source wiring 12, the source electrode 13, the drain electrode 14, the storage capacitor electrode 9, the second wiring 18 and the like are formed by photolithography and fine processing technology. further,
The contact film 7 is etched using the source electrode 13 and the drain electrode 14 or the photoresist on which the drain electrode 14 is formed as a mask, and removed from the channel region. Then, as shown in FIG. 2D, silicon nitride or silicon oxide,
An interlayer insulating film 15 made of an inorganic insulating film or an organic resin is formed, and a contact hole 16 is formed by photolithography and subsequent etching. Finally, as shown in FIG. 2 (e), Cr, Al, Ti, Ta, Mo, W, Ni, C
The pixel electrode 10 is formed by patterning after forming u, Au, Ag or the like, an alloy containing them as a main component, a light-transmitting conductive film such as ITO, or a multilayer film thereof,
The counter electrode 11 and the third wiring 19 are formed. At this time,
As shown in FIG. 1, bent portions 10 a and 11 a that are bent in a direction opposite to the alignment direction of the liquid crystal with respect to the source wiring 12 are provided at the tip ends of the pixel electrode 10 and the counter electrode 11. The angle θe of the bent portions 10a and 11a is 0 ° <θe <
It is possible to obtain the effect at 90 °, but 5 ° <θe <
If it is designed at 45 °, even if the shape of the electrode tip changes due to manufacturing variations or the like, 0 ° <θe <90 ° can be exceeded or a short circuit with the other electrode can be suppressed. In FIG. 1, θ 1 is the angle formed by the source wiring 12 and the alignment direction of the liquid crystal molecules.
【0013】以上の工程により、本実施の形態における
横方向電界方式の液晶表示装置を構成するTFT基板を
作製することができる。さらに、このTFT基板と対向
基板の間に液晶を挟持し、シール材にて接合する。この
ときラビング、光配向等の方法により液晶分子をθ1 の
角度で配向させる。なお、液晶を配向させる方法は、既
知のどのような方法を用いてもよい。さらに、ゲート配
線2、ソース配線12、保持容量共通配線4にそれぞれ
ゲート線駆動回路、ソース線駆動回路、保持容量共通配
線用電源を接続することにより液晶表示装置を作製す
る。なお、本実施の形態では、画素電極10及び対向電
極11の両方の先端部に、ソース配線12に対する液晶
の配向方向と反対の方向に屈曲した屈曲部10a、11
aを設けたが、これは加重痕による液晶の配向異常領域
の消失は屈曲部より生じるので、画素電極10先端及び
対向電極11先端の両端に屈曲部を設ける方が消失時間
の短縮ができるためである。一方屈曲部では平行部と電
界の向きが異なるため全白表示時に透過率が減少する場
合がある。この場合画素電極10及び対向電極11のい
ずれか一方の先端部に設けることもできる。また、図3
に示すように、液晶分子の配向方向θl'が図1に示すθ
l とソース配線12に対して反対となった場合、屈曲部
10a、11aの角度θe'もθe と反対方向にし、1゜
<θe'<90゜であればよい。さらに、図4に示すよう
に、対向電極11には、画素電極10先端に設けられた
屈曲部10aと隣り合う位置に、屈曲部10aと同方向
に同じ角度で突出した突起部11bを設けても良い。同
様に、画素電極10には、対向電極11先端に設けられ
た屈曲部11aと隣り合う位置に、屈曲部11aと同方
向に同じ角度で突出した突起部10bを設けても良い。Through the above steps, the TFT substrate constituting the lateral electric field type liquid crystal display device according to the present embodiment can be manufactured. Further, a liquid crystal is sandwiched between the TFT substrate and the counter substrate and bonded with a sealing material. At this time, the liquid crystal molecules are aligned at an angle of θ1 by a method such as rubbing or photo-alignment. Any known method may be used to align the liquid crystal. Further, a gate line driving circuit, a source line driving circuit, and a storage capacitor common wiring power supply are connected to the gate wiring 2, the source wiring 12, and the storage capacitor common wiring 4, respectively, to manufacture a liquid crystal display device. In the present embodiment, the bent portions 10 a and 11 bent at the tips of both the pixel electrode 10 and the counter electrode 11 are bent in the direction opposite to the alignment direction of the liquid crystal with respect to the source wiring 12.
Although a is provided, this is because the disappearance of the abnormal alignment region of the liquid crystal due to the weighted trace occurs from the bent portion. Therefore, the disappearance time can be shortened by providing the bent portions at both ends of the pixel electrode 10 tip and the counter electrode 11 tip. Is. On the other hand, in the bent portion, the direction of the electric field is different from that in the parallel portion, so that the transmittance may decrease when displaying all white. In this case, it may be provided at the tip of either one of the pixel electrode 10 and the counter electrode 11. Also, FIG.
As shown in Fig. 1, the orientation direction θl 'of the liquid crystal molecules is
When l is opposite to the source line 12, the angle θe ′ of the bent portions 10a and 11a is also opposite to θe, and 1 ° <θe ′ <90 ° is sufficient. Further, as shown in FIG. 4, the opposing electrode 11 is provided with a protruding portion 11b that protrudes at the same angle in the same direction as the bent portion 10a at a position adjacent to the bent portion 10a provided at the tip of the pixel electrode 10. Is also good. Similarly, the pixel electrode 10 may be provided with a protruding portion 10b protruding in the same direction as the bent portion 11a at the same angle at a position adjacent to the bent portion 11a provided at the tip of the counter electrode 11.
【0014】本実施の形態によれば、画素電極10及び
対向電極11先端部の電界の向きを液晶が回転すべき方
向に制御できるため、加重により逆回転方向に回転して
いた液晶を速やかに正回転方向に戻すことが可能とな
る。このため表示面への加重により生じる表示不良が抜
重後も長時間視認される加重痕と呼ばれる不良を速やか
に減少でき、表示品位が向上する。また、表示面への加
重防止のための保護板設置が不要になるため、液晶表示
装置の製造コストの低減が図られる。なお、本実施の形
態では、画素電極10と対向電極11がいずれも最上層
に形成された構造について述べたが、画素電極10及び
対向電極11上にSiNあるいはSiO2等の絶縁膜が
形成される場合や、画素電極10と対向電極11が絶縁
膜を介して別層に設置されている場合においても同様の
効果が得られる。According to the present embodiment, the direction of the electric field at the tip of the pixel electrode 10 and the counter electrode 11 can be controlled in the direction in which the liquid crystal should rotate. It is possible to return to the normal rotation direction. Therefore, the display defect caused by the load on the display surface, which is visually recognized for a long time even after the weight removal, called a load mark, can be promptly reduced, and the display quality is improved. Further, since it is not necessary to install a protective plate for preventing the display surface from being weighted, the manufacturing cost of the liquid crystal display device can be reduced. Although the structure in which the pixel electrode 10 and the counter electrode 11 are both formed in the uppermost layer has been described in the present embodiment, an insulating film such as SiN or SiO2 is formed on the pixel electrode 10 and the counter electrode 11. In that case, the same effect can be obtained even when the pixel electrode 10 and the counter electrode 11 are provided in different layers via an insulating film.
【0015】実施の形態2.図5は、本発明の実施の形
態2における液晶表示装置の画素部を示す平面図であ
る。なお、図中、同一、相当部分には同一符号を付し、
説明を省略する。本実施の形態では、上記実施の形態1
と同様に、画素電極10及び対向電極11の先端部に、
ソース配線12に対する液晶の配向方向と反対の方向に
屈曲した屈曲部10a、11aを設け、さらに、画素電
極10及び対向電極11の櫛状の複数本の電極の凹部
を、隣り合う対向電極11または画素電極10の先端に
設けられた屈曲部11a、10aと平行に屈曲させたも
のである。すなわち、凹部の角度θe2も、屈曲部10
a、11aの角度θe と同様に0゜<θe2<90゜で効
果を得ることは可能であるが、5°<θe 2 <45゜で
設計すれば製造上のバラツキ等により電極先端形状が変
化しても、0゜<θe 2 <90゜を越えたり、他方の電
極とのショートを抑えることができる。図5では、画素
電極10先端の屈曲部10a及びこれに対向する対向電
極11の凹部、対向電極11先端部の屈曲部11a及び
これに対向する画素電極10の凹部の全てを1゜<θe
<90゜、1゜<θe2<90゜とした場合を示してい
る。図において、θ1 は液晶分子の配列方向とソース配
線12のなす角度である。なお、θ1 の方向がソース配
線12方向に対して図5に示す方向と反対になった場
合、θe 、θe2の方向も反対向きにすればよい。本実施
の形態における液晶表示装置のその他の構成、製造方法
については、上記実施の形態1と同様であるので説明を
省略する。本実施の形態においても、上記実施の形態1
と同様に、表示品位の向上及び製造コストの低減等の効
果が得られる。Embodiment 2. FIG. 5 is a plan view showing a pixel portion of the liquid crystal display device according to Embodiment 2 of the present invention. In the figure, the same or corresponding parts are designated by the same reference numerals,
The description is omitted. In the present embodiment, the first embodiment described above
Similarly to the above, at the tips of the pixel electrode 10 and the counter electrode 11,
Bent portions 10a and 11a that are bent in a direction opposite to the alignment direction of the liquid crystal with respect to the source wiring 12 are provided, and further, the recessed portions of the plurality of comb-shaped electrodes of the pixel electrode 10 and the counter electrode 11 are provided to the adjacent counter electrode 11 or The pixel electrode 10 is bent in parallel with bent portions 11a and 10a provided at the tip of the pixel electrode 10. That is, the angle θe2 of the concave portion is also the bending portion 10
Similar to the angle θe of a and 11a, it is possible to obtain the effect at 0 ° <θe2 <90 °, but if designed at 5 ° <θe2 <45 °, the shape of the electrode tip will change due to manufacturing variations. However, even if 0 ° <θe 2 <90 ° is exceeded, a short circuit with the other electrode can be suppressed. In FIG. 5, the bent portion 10a at the tip of the pixel electrode 10 and the concave portion of the counter electrode 11 facing the bent portion 10a, the bent portion 11a at the tip of the counter electrode 11 and the concave portion of the pixel electrode 10 facing the bent portion are all 1 ° <θe.
It shows the case where <90 °, 1 ° <θe2 <90 °. In the figure, .theta.1 is the angle formed by the source wiring 12 and the alignment direction of the liquid crystal molecules. When the direction of θ1 is opposite to the direction shown in FIG. 5 with respect to the direction of the source wiring 12, the directions of θe and θe2 may also be opposite. The other configuration and manufacturing method of the liquid crystal display device according to the present embodiment are the same as those in the above-described first embodiment, and therefore description thereof is omitted. Also in the present embodiment, the above-mentioned first embodiment
Similar to the above, effects such as improvement in display quality and reduction in manufacturing cost can be obtained.
【0016】実施の形態3.図6は、本発明の実施の形
態3における液晶表示装置の画素部を示す平面図であ
る。図において、20は画素電極10及び対向電極11
の先端部に絶縁膜を介して設けられた、Cr等の金属ま
たはITO等の透光性を有する導電膜よりなる導体であ
る。なお、図中、同一、相当部分には同一符号を付し、
説明を省略する。本実施の形態における液晶表示装置の
プロセスフローは、上記実施の形態1と同様であるの
で、説明を省略する(図2参照)。ただし、導体20
は、画素電極10及び対向電極11と絶縁膜を介して設
置すればよいので、ゲート配線2あるいはソース配線1
2と同時に形成する。あるいはゲート配線2またはソー
ス配線12の材料が非透明性材料の場合、導体20をゲ
ート配線2あるいはソース配線12の形成の前後にIT
O等の透光性を有する導電膜により形成してもよい。こ
のとき、導体20と画素電極10( または対向電極1
1) のなす角θe 3 が、0゜<θe 3 <90゜で効果を
得ることは可能であるが、5°<θe 3 <45゜で設計
すれば製造上のバラツキ等により電極先端形状が変化し
ても、0゜<θe 3<90゜を越えたり、他方の電極と
のショートを抑えることができる。Embodiment 3. FIG. 6 is a plan view showing a pixel portion of a liquid crystal display device according to Embodiment 3 of the present invention. In the figure, 20 is a pixel electrode 10 and a counter electrode 11.
Is a conductor formed of a light-transmitting conductive film such as a metal such as Cr or ITO, which is provided at the tip of the insulating film via an insulating film. In the figure, the same or corresponding parts are designated by the same reference numerals,
The description is omitted. The process flow of the liquid crystal display device according to the present embodiment is the same as that of the above-described first embodiment, and thus the description is omitted (see FIG. 2). However, the conductor 20
Need only be installed via the insulating film with the pixel electrode 10 and the counter electrode 11, so that the gate wiring 2 or the source wiring 1
Form at the same time as 2. Alternatively, when the material of the gate wiring 2 or the source wiring 12 is a non-transparent material, the conductor 20 is used before and after the formation of the gate wiring 2 or the source wiring 12.
It may be formed of a light-transmitting conductive film such as O. At this time, the conductor 20 and the pixel electrode 10 (or the counter electrode 1
It is possible to obtain the effect when the angle θe 3 formed by 1) is 0 ° <θe 3 <90 °, but if the design is made 5 ° <θe 3 <45 °, the shape of the electrode tip will be different due to manufacturing variations. Even if it changes, it is possible to exceed 0 ° <θe 3 <90 ° and to prevent a short circuit with the other electrode.
【0017】また、導体20の形状は、図7に示すよう
な三角形としてもよい。すなわち、導体20は、少なく
とも一辺がソース配線12に対する液晶の配向方向と反
対の方向に傾斜しているパターン形状であればよい。ま
た、液晶の配向方向がソース配線12方向に対し図6ま
たは図7と反対の場合には、θe3の方向も反対向きに1
°<θe3<90゜とすればよい。本実施の形態において
も、上記実施の形態1及び2と同様に、表示品位の向
上、製造コストの低減等の効果が得られる。また、導体
20をITO等の透光性を有する導電膜で形成した場合
は開口率の低下を生じない。The conductor 20 may have a triangular shape as shown in FIG. That is, the conductor 20 may have a pattern shape in which at least one side is inclined in the direction opposite to the alignment direction of the liquid crystal with respect to the source wiring 12. Further, when the orientation of the liquid crystal is opposite to the direction of the source wiring 12 as shown in FIG. 6 or 7, the direction of θe3 is also opposite 1.
The angle should be <θe3 <90 °. Also in the present embodiment, similar to Embodiments 1 and 2, effects such as improvement in display quality and reduction in manufacturing cost can be obtained. Further, when the conductor 20 is formed of a transparent conductive film such as ITO, the aperture ratio does not decrease.
【0018】実施の形態4.図8は、本発明の実施の形
態4における液晶表示装置の画素部を示す平面図であ
る。図において、16aは、画素電極10先端に設けら
れた導体20と画素電極10を電気的に接続するコンタ
クトホール、16bは対向電極11先端に設けられた導
体20と対向電極11を電気的に接続するコンタトホー
ルである。なお、図中、同一、相当部分には同一符号を
付し、説明を省略する。本実施の形態では、上記実施の
形態3で示した導体20を、コンタクトホール16a、
16bを介して画素電極10の先端部及び対向電極11
の先端部と接続するようにしたものである。この点以外
の構成及びプロセスフローは上記実施の形態3と同様で
あるので、説明を省略する。本実施の形態においても、
上記実施の形態1〜実施の形態3と同様に、表示品位の
向上、製造コストの低減等の効果が得られる。また、導
体20をITO等の透光性を有する導電膜で形成した場
合は開口率の低下を生じない。Embodiment 4. FIG. 8 is a plan view showing a pixel portion of a liquid crystal display device according to Embodiment 4 of the present invention. In the figure, 16a is a contact hole for electrically connecting the conductor 20 provided at the tip of the pixel electrode 10 and the pixel electrode 10, and 16b is electrically connecting the conductor 20 provided at the tip of the counter electrode 11 and the counter electrode 11. It is a contact hole. In the drawings, the same or corresponding parts are designated by the same reference numerals, and the description thereof will be omitted. In the present embodiment, the conductor 20 shown in the third embodiment is replaced by the contact hole 16a,
16b and the end portion of the pixel electrode 10 and the counter electrode 11
It is designed to be connected to the tip of the. The configuration and the process flow other than this point are the same as those in the third embodiment, and therefore the description thereof will be omitted. Also in this embodiment,
Similar to the above-described first to third embodiments, effects such as improvement in display quality and reduction in manufacturing cost can be obtained. Further, when the conductor 20 is formed of a transparent conductive film such as ITO, the aperture ratio does not decrease.
【0019】実施の形態5.図9は、本発明の実施の形
態5における液晶表示装置の画素部を示す平面図であ
る。図において、16cは、対向電極11の凹部に設け
られた導体20と対向電極11を電気的に接続するコン
タクトホール、16dは画素電極10の凹部に設けられ
た導体20と対向電極10を電気的に接続するコンタク
トホールである。なお、図中、同一、相当部分には同一
符号を付し、説明を省略する。本実施の形態では、上記
実施の形態3で示した導体20を、コンタクトホール1
6c、16dを介して対向電極11及び画素電極10の
凹部と接続するようにしたものである。この点以外の構
成及びプロセスフローは上記実施の形態3と同様である
ので、説明を省略する。本実施の形態においても、上記
実施の形態1〜実施の形態4と同様に、表示品位の向
上、製造コストの低減等の効果が得られる。また、導体
20をITO等の透光性を有する導電膜で形成した場合
は開口率の低下を生じない。Embodiment 5. FIG. 9 is a plan view showing a pixel portion of a liquid crystal display device according to Embodiment 5 of the present invention. In the figure, 16 c is a contact hole for electrically connecting the conductor 20 provided in the recess of the counter electrode 11 and the counter electrode 11, and 16 d is an electrical connection between the conductor 20 provided in the recess of the pixel electrode 10 and the counter electrode 10. Is a contact hole connected to. In the drawings, the same or corresponding parts are designated by the same reference numerals, and the description thereof will be omitted. In the present embodiment, the conductor 20 shown in the third embodiment is replaced with the contact hole 1
The concave portions of the counter electrode 11 and the pixel electrode 10 are connected via 6c and 16d. The configuration and the process flow other than this point are the same as those in the third embodiment, and therefore the description thereof will be omitted. Also in the present embodiment, as in the above-described first to fourth embodiments, effects such as improvement in display quality and reduction in manufacturing cost can be obtained. Further, when the conductor 20 is formed of a transparent conductive film such as ITO, the aperture ratio does not decrease.
【0020】なお、上記実施の形態1〜実施の形態5で
述べた効果は、横方向電界方式の液晶表示装置であれ
ば、TFT構造、駆動方式、表示装置の大小、画素数、
液晶の種類を問わず同様の効果を得ることができる。The effects described in the first to fifth embodiments are the same as those of the liquid crystal display device of the lateral electric field type, that is, the TFT structure, the driving system, the size of the display device, the number of pixels,
The same effect can be obtained regardless of the type of liquid crystal.
【0021】以上のように、本発明によれば、画素電極
先端部及び対向電極先端部の電界の向きを液晶分子が回
転すべき方向に制御することができ、加重により逆回転
方向に回転していた液晶分子を速やかに正回転方向に戻
すことが可能となったため、表示面への荷重により生じ
る表示不良が抜重後も長時間視認される加重痕と呼ばれ
る不良を速やかに減少でき表示品位が向上する。さら
に、表示面への加重防止のための保護板設置が不要にな
るため、液晶表示装置の製造コストの低減が図られる効
果がある。As described above, according to the present invention, the pixel electrode
It is possible to control the direction of the electric field at the tip and the tip of the counter electrode in the direction in which the liquid crystal molecules should rotate, and it is possible to quickly return the liquid crystal molecules rotating in the reverse rotation direction to the forward rotation direction by the load. As a result, a display defect caused by a load on the display surface, called a load mark that is visually recognized for a long time even after weight removal, can be promptly reduced, and the display quality can be improved. Further, since it is unnecessary to install a protective plate for preventing the display surface from being weighted, there is an effect that the manufacturing cost of the liquid crystal display device can be reduced.
【図1】 本発明の実施の形態1における液晶表示装置
の画素部を示す平面図である。FIG. 1 is a plan view showing a pixel portion of a liquid crystal display device according to a first embodiment of the present invention.
【図2】 本発明の実施の形態1における液晶表示装置
の製造方法を示す断面図である。FIG. 2 is a cross-sectional view showing the method of manufacturing the liquid crystal display device in the first embodiment of the present invention.
【図3】 本発明の実施の形態1における他の液晶表示
装置の画素部を示す平面図である。FIG. 3 is a plan view showing a pixel portion of another liquid crystal display device according to Embodiment 1 of the present invention.
【図4】 本発明の実施の形態1における他の液晶表示
装置の画素部を示す平面図である。FIG. 4 is a plan view showing a pixel portion of another liquid crystal display device according to Embodiment 1 of the present invention.
【図5】 本発明の実施の形態2における液晶表示装置
の画素部を示す平面図である。FIG. 5 is a plan view showing a pixel portion of a liquid crystal display device according to a second embodiment of the present invention.
【図6】 本発明の実施の形態3における液晶表示装置
の画素部を示す平面図である。FIG. 6 is a plan view showing a pixel portion of a liquid crystal display device according to a third embodiment of the present invention.
【図7】 本発明の実施の形態3における他の液晶表示
装置の画素部を示す平面図である。FIG. 7 is a plan view showing a pixel portion of another liquid crystal display device according to Embodiment 3 of the present invention.
【図8】 本発明の実施の形態4における液晶表示装置
の画素部を示す平面図である。FIG. 8 is a plan view showing a pixel portion of a liquid crystal display device according to a fourth embodiment of the present invention.
【図9】 本発明の実施の形態5における液晶表示装置
の画素部を示す平面図である。FIG. 9 is a plan view showing a pixel portion of a liquid crystal display device according to a fifth embodiment of the present invention.
【図10】 従来の一般的な横方向電界方式の液晶表示
装置の画素部を示す平面図である。FIG. 10 is a plan view showing a pixel portion of a conventional general horizontal electric field type liquid crystal display device.
【図11】 従来の液晶表示装置の問題点である加重痕
の発生原理を説明する図である。FIG. 11 is a diagram illustrating a principle of generating a weighted mark, which is a problem of the conventional liquid crystal display device.
【図12】 従来の液晶表示装置の問題点である加重痕
の発生原理を説明する図である。FIG. 12 is a diagram illustrating a principle of generating a weighted mark, which is a problem of the conventional liquid crystal display device.
【図13】 従来の液晶表示装置の問題点である加重痕
の発生原理を説明する図である。FIG. 13 is a diagram illustrating a principle of generating a weighted mark, which is a problem of a conventional liquid crystal display device.
【図14】 従来の液晶表示装置の問題点である加重痕
の発生原理を説明する図である。FIG. 14 is a diagram illustrating a principle of generating a weighted mark, which is a problem of the conventional liquid crystal display device.
【図15】 従来の液晶表示装置の問題点である加重痕
の発生原理を説明する図である。FIG. 15 is a diagram illustrating a principle of generation of a weighted mark, which is a problem of the conventional liquid crystal display device.
【図16】 従来の液晶表示装置の問題点である加重痕
の発生原理を説明する図である。FIG. 16 is a diagram illustrating a principle of generating a weighted mark, which is a problem of the conventional liquid crystal display device.
【図17】 従来の液晶表示装置の問題点である加重痕
の発生原理を説明する図である。FIG. 17 is a diagram illustrating a principle of generating a weighted mark, which is a problem of a conventional liquid crystal display device.
1 絶縁性基板、2 ゲート配線、3 ゲート電極、4
保持容量共通配線、5 ゲート絶縁膜、6 半導体
膜、7 コンタクト膜、9 保持容量電極、10 画素
電極、10a 屈曲部、10b 突起部、11 対向電
極、11a 屈曲部、11b 突起部、12 ソース配
線、13 ソース電極、14 ドレイン電極、15 層
間絶縁膜、16、16a、16b、16c、16d コ
ンタクトホール、17 第一の配線、18 第二の配
線、19 第三の配線、20 導体、21 変換部、2
2 配向異常領域。1 insulating substrate, 2 gate wiring, 3 gate electrode, 4
Storage capacitor common wiring, 5 gate insulating film, 6 semiconductor film, 7 contact film, 9 storage capacitor electrode, 10 pixel electrode, 10a bent portion, 10b protruding portion, 11 counter electrode, 11a bent portion, 11b protruding portion, 12 source wiring , 13 source electrode, 14 drain electrode, 15 interlayer insulating film, 16, 16a, 16b, 16c, 16d contact hole, 17 first wiring, 18 second wiring, 19 third wiring, 20 conductor, 21 converter Two
2 Alignment abnormal area.
Claims (4)
間に挟持された液晶層と、上記一方の基板に形成され互
いに交差する複数本の走査信号線及び複数本の映像信号
線と、上記走査信号線及び上記映像信号線の交点に対応
して設けられた薄膜トランジスタと、上記薄膜トランジ
スタに接続された複数本の電極よりなる画素電極と、上
記画素電極の複数本の電極に沿って延びる複数本の電極
よりなる対向電極とを備え、上記画素電極及び対向電極
間に電圧を印加し基板面にほぼ平行な電界を上記液晶層
に印加する液晶表示装置において、上記画素電極の複数
本の電極のうちの少なくとも1つの電極の少なくとも上
記薄膜トランジスタから離れた側の画素電極先端部と、
上記対向電極の複数本の電極のうちの少なくとも1つの
電極の少なくとも上記薄膜トランジスタに近い側の対向
電極先端部は、基板面とほぼ平行な方向の間隙を介して
他方の電極と対向しており、これらの画素電極先端部と
対向電極先端部にそれぞれ屈曲部を設け、これらの屈曲
部はそれぞれその根本部に続いて形成されており、また
それぞれの屈曲部と根本部との屈曲点を原点としその根
本部の延長線をY軸として想定したXY平面に関して、
上記屈曲部と上記液晶層の配向方向線が異なる象限に位
置していることを特徴とする液晶表示装置。1. A pair of substrates arranged to face each other, a liquid crystal layer sandwiched between the substrates, a plurality of scanning signal lines and a plurality of video signal lines formed on the one substrate and intersecting each other, A thin film transistor provided corresponding to an intersection of the scanning signal line and the video signal line, a pixel electrode formed of a plurality of electrodes connected to the thin film transistor, and a plurality of extending along the plurality of electrodes of the pixel electrode. A plurality of electrodes of the pixel electrode, wherein the liquid crystal display device includes a counter electrode composed of a plurality of electrodes, and applies a voltage between the pixel electrode and the counter electrode to apply an electric field substantially parallel to a substrate surface to the liquid crystal layer. Of at least one electrode of the pixel electrode at least on the side away from the thin film transistor,
At least one electrode of the plurality of electrodes of the counter electrode at least the counter electrode tip portion on the side closer to the thin film transistor is opposed to the other electrode via a gap in a direction substantially parallel to the substrate surface, Bent portions are provided at the pixel electrode tip portion and the counter electrode tip portion, respectively, and these bent portions are respectively formed following the root portions thereof, and the bending point between each of the bent portions and the root portion is the origin. Regarding the XY plane assuming the extension line of the root part as the Y axis,
A liquid crystal display device, wherein the bending direction and the alignment direction line of the liquid crystal layer are located in different quadrants.
電極の少なくとも1つの電極に上記画素電極先端部に設
けられた屈曲部とほぼ平行な屈曲部を形成し、また上記
対向電極先端部に対応する上記画素電極の少なくとも1
つの電極に上記対応電極先端部に設けられた屈曲部とほ
ぼ平行な屈曲部を形成したことを特徴とする請求項1記
載の液晶表示装置。2. The facing corresponding to the tip of the pixel electrode.
At least one of the electrodes is provided on the tip of the pixel electrode.
Form a bent part that is almost parallel to the bent part.
At least one of the pixel electrodes corresponding to the tip of the counter electrode
One of the liquid crystal display device of the electrodes to claim 1, wherein the forming a substantially parallel bent portion and the bent portion provided on the corresponding electrode tip.
度は、0°より大きく、90°より小さいことを特徴と
する請求項1または2記載の液晶表示装置。3. The liquid crystal display device according to claim 1, wherein an angle between the extension line of the root portion and the bent portion is larger than 0 ° and smaller than 90 °.
度は、5°より大きく、45°より小さいことを特徴と
する請求項1または2記載の液晶表示装置。4. The liquid crystal display device according to claim 1, wherein an angle between the extension line of the root portion and the bent portion is larger than 5 ° and smaller than 45 °.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13590699A JP3449537B2 (en) | 1999-05-17 | 1999-05-17 | Liquid crystal display |
TW89115323A TW500948B (en) | 1999-05-17 | 2000-07-31 | Liquid crystal display device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13590699A JP3449537B2 (en) | 1999-05-17 | 1999-05-17 | Liquid crystal display |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001103689A Division JP3300336B2 (en) | 2001-04-02 | 2001-04-02 | Liquid crystal display |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2000330123A JP2000330123A (en) | 2000-11-30 |
JP3449537B2 true JP3449537B2 (en) | 2003-09-22 |
Family
ID=15162603
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13590699A Expired - Lifetime JP3449537B2 (en) | 1999-05-17 | 1999-05-17 | Liquid crystal display |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP3449537B2 (en) |
TW (1) | TW500948B (en) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4603560B2 (en) * | 2001-02-23 | 2010-12-22 | Nec液晶テクノロジー株式会社 | Horizontal electric field type active matrix liquid crystal display device and electronic device |
KR101297247B1 (en) * | 2005-11-25 | 2013-08-19 | 엘지디스플레이 주식회사 | In plane switching mode liquid crystal display device |
JP4997624B2 (en) * | 2006-03-14 | 2012-08-08 | Nltテクノロジー株式会社 | Horizontal electric field type liquid crystal display device |
JP2007279634A (en) * | 2006-04-12 | 2007-10-25 | Nec Lcd Technologies Ltd | In-plane switching type liquid crystal display device |
JP5713204B2 (en) * | 2006-08-11 | 2015-05-07 | Nltテクノロジー株式会社 | Liquid crystal display |
JP5266578B2 (en) * | 2008-07-22 | 2013-08-21 | Nltテクノロジー株式会社 | Horizontal electric field type liquid crystal display device |
JP2010145871A (en) * | 2008-12-19 | 2010-07-01 | Sony Corp | Liquid crystal panel and electronic device |
JP5344253B2 (en) * | 2010-01-19 | 2013-11-20 | Nltテクノロジー株式会社 | Horizontal electric field type liquid crystal display device |
JP5695946B2 (en) | 2011-03-17 | 2015-04-08 | 株式会社ジャパンディスプレイ | Liquid crystal display |
JP5458059B2 (en) * | 2011-06-02 | 2014-04-02 | 株式会社ジャパンディスプレイ | Liquid crystal panel and electronic equipment |
CN103185992B (en) * | 2011-12-30 | 2015-06-17 | 上海天马微电子有限公司 | Pixel structure of liquid crystal display device and liquid crystal display device |
JP5851317B2 (en) * | 2012-04-10 | 2016-02-03 | 株式会社ジャパンディスプレイ | Liquid crystal display |
JP6029410B2 (en) | 2012-10-01 | 2016-11-24 | 株式会社ジャパンディスプレイ | Liquid crystal display |
CN104375341A (en) * | 2014-11-18 | 2015-02-25 | 深圳市华星光电技术有限公司 | Array substrate and liquid crystal display panel |
CN106556951A (en) * | 2015-09-30 | 2017-04-05 | 群创光电股份有限公司 | Display device |
CN114063355B (en) | 2022-01-18 | 2022-05-10 | 惠科股份有限公司 | Array substrate and display panel |
-
1999
- 1999-05-17 JP JP13590699A patent/JP3449537B2/en not_active Expired - Lifetime
-
2000
- 2000-07-31 TW TW89115323A patent/TW500948B/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TW500948B (en) | 2002-09-01 |
JP2000330123A (en) | 2000-11-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US11698555B2 (en) | Display device | |
JP3449537B2 (en) | Liquid crystal display | |
US6459464B1 (en) | Liquid crystal display device with reduced weighting trace defects | |
US6566686B2 (en) | Thin-film transistor display devices | |
US7615784B2 (en) | Thin film transistor array panel and manufacturing method thereof | |
KR101492106B1 (en) | Liquid crystal display device and manufacturing method thereof | |
KR101237011B1 (en) | Liquid crystal display | |
US7910931B2 (en) | Thin film transistor substrate having a contact hole that does not expose a step portion | |
KR20020021296A (en) | Liquid crystal display with wide viewing angle | |
KR100931875B1 (en) | Thin film transistor and method for manufacturing same | |
US7973865B2 (en) | Thin film transistor display plate and liquid crystal display having the same | |
JP2003307741A (en) | Liquid crystal display apparatus and manufacturing method therefor | |
US7615782B2 (en) | Thin film transistor substrate and liquid crystal display panel having sub-pixels | |
US7492418B2 (en) | Liquid crystal display device with particular metal layer configuration of TFT and fabricating method thereof | |
JP3774855B2 (en) | Liquid crystal display device and manufacturing method. | |
KR20160014846A (en) | Thin film transistor array panel and manufacturing method thereof | |
US6515728B1 (en) | Multi-domain liquid crystal display device | |
JP3300336B2 (en) | Liquid crystal display | |
JP2005275054A (en) | Liquid crystal display and its manufacturing method | |
JP3819590B2 (en) | Liquid crystal display element, liquid crystal display apparatus using the element, and reflective liquid crystal display apparatus | |
US20020080293A1 (en) | In-plane switching mode liquid crystal display device and method for manufacturing the same | |
US20030227579A1 (en) | Liquid crystal display | |
JPH028821A (en) | Active matrix substrate | |
KR100756302B1 (en) | Liquid crystal display device | |
JP4316909B2 (en) | Liquid crystal display |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080711 Year of fee payment: 5 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313532 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080711 Year of fee payment: 5 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090711 Year of fee payment: 6 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100711 Year of fee payment: 7 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100711 Year of fee payment: 7 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110711 Year of fee payment: 8 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110711 Year of fee payment: 8 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120711 Year of fee payment: 9 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120711 Year of fee payment: 9 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130711 Year of fee payment: 10 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
EXPY | Cancellation because of completion of term |