Nothing Special   »   [go: up one dir, main page]

JP3076146B2 - Unloader device - Google Patents

Unloader device

Info

Publication number
JP3076146B2
JP3076146B2 JP14385192A JP14385192A JP3076146B2 JP 3076146 B2 JP3076146 B2 JP 3076146B2 JP 14385192 A JP14385192 A JP 14385192A JP 14385192 A JP14385192 A JP 14385192A JP 3076146 B2 JP3076146 B2 JP 3076146B2
Authority
JP
Japan
Prior art keywords
glass substrate
nitrogen
substrate
unloader device
cassette
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP14385192A
Other languages
Japanese (ja)
Other versions
JPH05330859A (en
Inventor
泰幸 佐藤
Original Assignee
鹿児島日本電気株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 鹿児島日本電気株式会社 filed Critical 鹿児島日本電気株式会社
Priority to JP14385192A priority Critical patent/JP3076146B2/en
Publication of JPH05330859A publication Critical patent/JPH05330859A/en
Application granted granted Critical
Publication of JP3076146B2 publication Critical patent/JP3076146B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Liquid Crystal (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Surface Treatment Of Glass (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明はアンローダ装置に関し、
特に静電気防止機構を有するアンローダ装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an unloader device,
Particularly, the present invention relates to an unloader device having an antistatic mechanism.

【0002】[0002]

【従来の技術】液晶用TFT基板製造工程において、ガ
ラス基板(以下、基板と記す)に対し洗浄,成膜,エッ
チング,はくり等の処理が行なわれるが、これらの基板
の乾燥は、洗浄乾燥装置により、エアーナイフという高
圧空気を基板に吹き付け水分を飛ばして乾燥させる手段
が一般的である。乾燥された基板はアンローダ装置に搬
入され、フォークによりアンローダ装置のカセットに納
められる。
2. Description of the Related Art In a manufacturing process of a TFT substrate for a liquid crystal, a glass substrate (hereinafter, referred to as a substrate) is subjected to processes such as cleaning, film formation, etching, and peeling. In general, an air knife, which is a means for blowing high-pressure air onto a substrate to blow off moisture and dry the substrate, is used. The dried substrate is carried into the unloader device and stored in a cassette of the unloader device by a fork.

【0003】[0003]

【発明が解決しようとする課題】前述のような構成のア
ンローダ装置において、洗浄乾燥装置内のエアーナイフ
により水滴を吹き飛ばす際、窒素と基板とが接触,摩擦
を繰り返す為基板表面上に静電気が発生する。静電気除
去の目的でアンローダ装置にはテーブル下部よりアース
がとられているが、基板自身は絶縁体である為除電する
ことは困難であった。この為、基板上に作られた素子の
絶縁破壊や素子特性の劣化を起こすという問題点があっ
た。
In the unloader having the above-mentioned structure, when water drops are blown off by an air knife in the washing and drying apparatus, static electricity is generated on the surface of the substrate due to repeated contact and friction between nitrogen and the substrate. I do. Although the unloader device is grounded from the lower part of the table for the purpose of removing static electricity, it was difficult to remove static electricity because the substrate itself was an insulator. For this reason, there has been a problem that an element formed on the substrate causes dielectric breakdown and deterioration of element characteristics.

【0004】また、雰囲気中のパーティクル吸着により
回路パターンの欠陥を起こすことにより製造歩留りの低
下の原因になるという問題点もあった。
Further, there is another problem that a defect in a circuit pattern is caused by adsorption of particles in an atmosphere, which causes a reduction in a manufacturing yield.

【0005】本発明の目的は、基板上の素子の絶縁破壊
や素子特性の劣化がなく、製造歩留の高いアンローダ装
置を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide an unloader device having a high production yield without causing dielectric breakdown of elements on a substrate and deterioration of element characteristics.

【0006】[0006]

【課題を解決するための手段】本発明は、ガラス基板を
搬送するフォークと、このフォークにより搬送されて前
記ガラス基板を収納するカセットとを有するアンローダ
装置において、前記カセットの挿入部に窒素を所定純度
に調整して出力するフィルタと、該フィルタの出口に
記ガラス基板面に平行して設けられコロナ放電により
記窒素をイオン化し窒素イオンを発生させる針状の金属
電極が挿入されたイオンバーとを設け、このイオンバー
から前記窒素イオンが吹き付けられて前記ガラス基板を
除電すると同時にゴミの付着を防止したことを特徴とす
る。
According to the present invention, there is provided an unloader apparatus having a fork for carrying a glass substrate and a cassette for carrying the glass substrate carried by the fork. a filter for outputting the adjusted purity, before the outlet of the filter
Before the corona discharge provided in parallel to the serial glass substrate surface
An ion bar into which a needle-shaped metal electrode for ionizing the nitrogen to generate nitrogen ions is provided, and the nitrogen ions are sprayed from the ion bar to remove electricity from the glass substrate and to prevent adhesion of dust. It is characterized by.

【0007】[0007]

【実施例】次に、本発明の実施例について図面を参照し
て説明する。
Next, embodiments of the present invention will be described with reference to the drawings.

【0008】図1は本発明の一実施例の概略の構成を示
す斜視図である。
FIG. 1 is a perspective view showing a schematic configuration of an embodiment of the present invention.

【0009】図1に示すように、窒素3は流路中に設け
られたフィルタ4により所定の純度に調整されイオンバ
ー5へ導かれる。イオンバー5には針状の金属電極が挿
入されている。イオンバー5には±20kV程度の交流
電圧を印加し、コロナ放電により窒素イオンを発生させ
ることにより窒素3の導電率を3桁以上高くすることが
できる。イオンバー5は、カセット6の基板1の入口に
セットされイオン化された窒素3を基板1表面及びカセ
ット6に吹き付け10秒間で0.5kV程度まで電位を
下げ、静電気を速やかに除電できる。
As shown in FIG. 1, nitrogen 3 is adjusted to a predetermined purity by a filter 4 provided in the flow path, and is guided to an ion bar 5. A needle-shaped metal electrode is inserted into the ion bar 5. By applying an AC voltage of about ± 20 kV to the ion bar 5 and generating nitrogen ions by corona discharge, the conductivity of the nitrogen 3 can be increased by three digits or more. The ion bar 5 is set at the entrance of the substrate 1 of the cassette 6 and sprays ionized nitrogen 3 onto the surface of the substrate 1 and the cassette 6 to lower the potential to about 0.5 kV in 10 seconds, thereby quickly eliminating static electricity.

【0010】[0010]

【発明の効果】以上説明したように、本発明のアンロー
ダ装置は、カセットに入る基板にイオンバーによりイオ
ン化された窒素を吹き付けることにより静電気を速やか
に除電する為、静電気による素子の破壊,劣化及びパー
ティクルの付着を防止でき製造歩留を向上できるという
効果を有する。
As described above, in the unloader device of the present invention, static electricity is quickly removed by spraying nitrogen ionized by an ion bar onto a substrate entering a cassette. This has the effect of preventing the adhesion of particles and improving the production yield.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例の概略の構成を示す斜視図で
ある。
FIG. 1 is a perspective view showing a schematic configuration of an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 基板 2 フォーク 3 窒素 4 フィルタ 5 イオンバー 6 カセット 7 装置電源 8 アンローダ装置 9 洗浄,乾燥装置 DESCRIPTION OF SYMBOLS 1 Substrate 2 Fork 3 Nitrogen 4 Filter 5 Ion bar 6 Cassette 7 Device power supply 8 Unloader device 9 Cleaning and drying device

フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H01L 21/304,21/68 G02F 1/13 - 1/1368 Continued on the front page (58) Fields surveyed (Int.Cl. 7 , DB name) H01L 21 / 304,21 / 68 G02F 1/13-1/1368

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 ガラス基板を搬送するフォークと、この
フォークにより搬送されて前記ガラス基板を収納するカ
セットとを有するアンローダ装置において、前記カセッ
トの挿入部に窒素を所定純度に調整して出力するフィル
タと、該フィルタの出口に前記ガラス基板面に平行して
設けられコロナ放電により前記窒素をイオン化し窒素イ
オンを発生させる針状の金属電極が挿入されたイオンバ
ーとを設け、このイオンバーから前記窒素イオンが吹き
付けられて前記ガラス基板を除電すると同時にゴミの付
着を防止したことを特徴とするアンローダ装置。
1. An unloader device having a fork for carrying a glass substrate and a cassette for carrying the glass substrate carried by the fork, wherein a filter for adjusting nitrogen to a predetermined purity at an insertion portion of the cassette and outputting the same. And the outlet of the filter in parallel with the glass substrate surface
And an ion bar into which a needle-shaped metal electrode for ionizing the nitrogen by corona discharge to generate nitrogen ions is provided, and the nitrogen ions are sprayed from the ion bar to remove electricity from the glass substrate and simultaneously remove dust. An unloader device characterized by preventing adhesion.
JP14385192A 1992-06-04 1992-06-04 Unloader device Expired - Fee Related JP3076146B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14385192A JP3076146B2 (en) 1992-06-04 1992-06-04 Unloader device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14385192A JP3076146B2 (en) 1992-06-04 1992-06-04 Unloader device

Publications (2)

Publication Number Publication Date
JPH05330859A JPH05330859A (en) 1993-12-14
JP3076146B2 true JP3076146B2 (en) 2000-08-14

Family

ID=15348440

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14385192A Expired - Fee Related JP3076146B2 (en) 1992-06-04 1992-06-04 Unloader device

Country Status (1)

Country Link
JP (1) JP3076146B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005097018A (en) * 2003-09-22 2005-04-14 Air Water Inc Production method for hardly charged glass substrate, and hardly charged glass substrate obtained thereby

Also Published As

Publication number Publication date
JPH05330859A (en) 1993-12-14

Similar Documents

Publication Publication Date Title
US11675264B2 (en) Reticle cleaning system
JP3537843B2 (en) Clean room ionizer
JP3076146B2 (en) Unloader device
US6127289A (en) Method for treating semiconductor wafers with corona charge and devices using corona charging
JP3121520B2 (en) Local clean space
JPS59181619A (en) Reactive-ion etching device
JP3184676B2 (en) Substrate transfer device
JP2887392B2 (en) Corona discharge treatment method for resin film
JP3508183B2 (en) Substrate transfer device
JP2541857B2 (en) Ion generator and static elimination equipment for charged articles in clean space using the same
JP2000216228A (en) Substrate fixing stage
KR100421171B1 (en) Method for removing particulate contaminant on the surface of substrate and Apparatus for removing thereof
JPH06231897A (en) Static electricity erasing method and device therefor
JPH09306882A (en) Particle on substrate removing device and method
JPH07169821A (en) Device for marking on substrate
JPH04316325A (en) Plasma processing system
JPH06267899A (en) Etching device
KR20010038334A (en) Dust cleaning process and dust cleaning apparatus
JPS62172323A (en) Rubbing method for liquid crystal display plate
JPH07201486A (en) Static eliminating method and device
JP2004305918A (en) Plasma treatment method and plasma treatment apparatus used therefor
JPH065379A (en) Circuit board cleansing device
KR20070063968A (en) Ionizer with air knife device
JPH0851098A (en) Semiconductor treatment device
JPH0786221A (en) Dust removing device for semiconductor substrate

Legal Events

Date Code Title Description
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20000516

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313113

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080609

Year of fee payment: 8

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090609

Year of fee payment: 9

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100609

Year of fee payment: 10

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100609

Year of fee payment: 10

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110609

Year of fee payment: 11

LAPS Cancellation because of no payment of annual fees