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JP3049864B2 - Optical information recording medium - Google Patents

Optical information recording medium

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Publication number
JP3049864B2
JP3049864B2 JP3225721A JP22572191A JP3049864B2 JP 3049864 B2 JP3049864 B2 JP 3049864B2 JP 3225721 A JP3225721 A JP 3225721A JP 22572191 A JP22572191 A JP 22572191A JP 3049864 B2 JP3049864 B2 JP 3049864B2
Authority
JP
Japan
Prior art keywords
recording
crystallization
thin film
layer
disk
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP3225721A
Other languages
Japanese (ja)
Other versions
JPH0562249A (en
Inventor
憲一 長田
鋭二 大野
昇 山田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Industrial Co Ltd filed Critical Panasonic Corp
Priority to JP3225721A priority Critical patent/JP3049864B2/en
Publication of JPH0562249A publication Critical patent/JPH0562249A/en
Application granted granted Critical
Publication of JP3049864B2 publication Critical patent/JP3049864B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Optical Recording Or Reproduction (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、レーザ光線を用いた情
報記録再生装置に用いる光学情報記録媒体、とりわけ書
き換え可能な相変化光ディスクに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical information recording medium used for an information recording / reproducing apparatus using a laser beam, and more particularly to a rewritable phase change optical disk.

【0002】[0002]

【従来の技術】信号を記録,再生、及び消去可能な光デ
ィスクとして、記録薄膜材料にカルコゲン化物を用いた
相変化型の光ディスクが知られている。一般には、記録
薄膜材料が結晶状態の場合を未記録状態とし、レーザ照
射で急熱急冷して非晶質状態にすることで信号を記録す
る。又、急熱徐冷で再び結晶状態となり、記録信号は消
去される。
2. Description of the Related Art As an optical disk capable of recording, reproducing and erasing signals, a phase-change optical disk using a chalcogenide as a recording thin film material is known. Generally, a signal is recorded by setting the recording thin film material in a crystalline state to an unrecorded state and rapidly heating and quenching by laser irradiation to make the recording thin film amorphous. In addition, the crystal becomes a crystalline state again by rapid heating and slow cooling, and the recorded signal is erased.

【0003】記録薄膜材料としては、例えばTe,In,
Sb,Se等を主成分とする非晶質−結晶間で相変化する
材料、或は異なる2種類の結晶構造の間で可逆的に相変
化をおこす物質を用いることが一般的である。
As recording thin film materials, for example, Te, In,
It is common to use a material which is mainly composed of Sb, Se and the like and which changes phase between an amorphous and a crystal, or a substance which reversibly changes phase between two different types of crystal structures.

【0004】保護層材料としては、例えば、Al2O3,
SiO2,SiO,Ta2O5,MoO3,WO3,ZnS,Zr
O2,AlN,BN,SiNx,TiN,ZrN,PbF2,M
gF2等の誘電体或はこれらの適当な組み合わせが知られ
ている。
As a material for the protective layer, for example, Al 2 O 3,
SiO2, SiO, Ta2 O5, MoO3, WO3, ZnS, Zr
O2, AlN, BN, SiNx, TiN, ZrN, PbF2, M
Dielectrics such as gF2 or suitable combinations thereof are known.

【0005】一方、光ディスクの記録フォーマットは、
CLV(Constant Linear Velocity)方式、CAV(Co
nstant Angular Velocity)方式、及びM−CAV(Mod
ified CAV)方式が一般的である。特にCAV方式,M
−CAV方式はスピンドル・モータの回転数が一定で、
CLV方式に比べてアクセスタイムが短いという利点を
もつ。
On the other hand, the recording format of an optical disc is
CLV (Constant Linear Velocity) method, CAV (Co
nstant Angular Velocity) method and M-CAV (Mod
Unified CAV) is common. Especially CAV method, M
-In the CAV method, the rotation speed of the spindle motor is constant,
There is an advantage that the access time is shorter than the CLV method.

【0006】相変化光ディスクにCAV方式、或はM−
CAV方式で記録する場合、レーザ照射位置における線
速度は、ディスクの内周よりも外周の方が速くなる。す
なわち、ディスク上の1点をレーザ光線がよぎる時間
は、内周よりも外周の方が短くなる。それ故、内外周と
もに良好な記録・消去特性を得るために、記録半径に応
じて記録・消去パワーやレーザ照射パルス幅を適当に選
ぶことが一般的である。
[0006] CAV method or M-type
When recording by the CAV method, the linear velocity at the laser irradiation position is faster on the outer circumference than on the inner circumference of the disc. That is, the time for the laser beam to cross one point on the disk is shorter on the outer circumference than on the inner circumference. Therefore, in order to obtain good recording / erasing characteristics for both the inner and outer circumferences, it is general to appropriately select the recording / erasing power and the laser irradiation pulse width according to the recording radius.

【0007】[0007]

【発明が解決しようとする課題】相変化光ディスクにC
AV方式、或はM−CAV方式で記録する場合、記録半
径に応じて記録・消去パワーやレーザ照射パルス幅を適
当に選んだとしても、記録・消去の繰り返し特性は、記
録半径によって異なる。すなわち、内周に相当する線速
度で繰り返し特性が高くなるように構造を調整したディ
スクでは、外周では内周に比べて繰り返し特性が悪くな
る。逆に外周に相当する線速度で繰り返し特性が高くな
るように構造を調整したディスクでは、内周では外周に
比べて繰り返し特性が悪くなる。
SUMMARY OF THE INVENTION A phase change optical disk has C
In the case of recording by the AV method or the M-CAV method, the repetition characteristics of recording / erasing differ depending on the recording radius even if the recording / erasing power and the laser irradiation pulse width are appropriately selected according to the recording radius. In other words, in a disk whose structure is adjusted so that the repetition characteristics become higher at a linear velocity corresponding to the inner periphery, the repetition characteristics are worse on the outer periphery than on the inner periphery. Conversely, in a disk whose structure is adjusted so that the repetition characteristics become higher at a linear velocity corresponding to the outer periphery, the repetition characteristics are worse at the inner periphery than at the outer periphery.

【0008】本発明は、記録領域の内外周を問わず良好
な記録・消去の繰り返し特性を有する光学情報記録媒体
を提供することを目的としている。
It is an object of the present invention to provide an optical information recording medium having good recording / erasing repetition characteristics regardless of the inner and outer peripheries of a recording area.

【0009】[0009]

【課題を解決するための手段】本発明は、上記課題を解
決するために、相変化型光学情報記録媒体の記録薄膜に
接して結晶化抑制層、或は結晶化促進層の何れかを備
え、記録薄膜界面の単位面積あたりの、記録薄膜と結晶
化抑制層の接触面積、または記録薄膜と結晶化促進層の
接触面積の何れかが、記録薄膜形成領域の半径方向で変
化するようにしたものである。この時、結晶化抑制層を
設ける場合には、記録薄膜界面の単位面積あたりの、記
録薄膜と結晶化抑制層の接触面積を、記録薄膜形成領域
の外周側から内周側に向かって大きくなるようにする
とが好ましく、結晶化促進層を設ける場合には、記録薄
膜界面の単位面積あたりの、記録薄膜と結晶化促進層の
接触面積を、記録薄膜形成領域の内周側から外周側に向
かって大きくなるようにすることが好ましい
According to the present invention, there is provided a crystallization suppressing layer or a crystallization promoting layer in contact with a recording thin film of a phase change type optical information recording medium.
The recording thin film and crystal per unit area of the recording thin film interface
Contact area of the crystallization suppression layer, or between the recording thin film and the crystallization promoting layer.
Either of the contact areas changes in the radial direction of the recording thin film formation area.
It is obtained so as to reduction. At this time, when the crystallization suppression layer is provided, the contact area between the recording thin film and the crystallization suppression layer per unit area of the recording thin film interface increases from the outer peripheral side to the inner peripheral side of the recording thin film formation region. this is so
When a crystallization promoting layer is provided, the contact area between the recording thin film and the crystallization promoting layer per unit area of the recording thin film interface is increased from the inner peripheral side to the outer peripheral side of the recording thin film forming region. Preferably .

【0010】[0010]

【作用】相変化型光学情報記録媒体の記録薄膜に接して
結晶化抑制層、或は結晶化促進層を備え、かつ、結晶化
抑制層を設ける場合には、記録薄膜界面の単位面積あた
りの、記録薄膜と結晶化抑制層の接触面積を、記録薄膜
形成領域の外周側から内周側に向かって大きくし、結晶
化促進層を設ける場合には、記録薄膜界面の単位面積あ
たりの、記録薄膜と結晶化促進層の接触面積を、記録薄
膜形成領域の内周側から外周側に向かって大きくするこ
とにより、記録領域の内外周を問わず、良好な記録・消
去の繰り返し特性が得られる。
When a crystallization suppressing layer or a crystallization promoting layer is provided in contact with a recording thin film of a phase-change type optical information recording medium, and a crystallization suppressing layer is provided, a unit area per unit area of a recording thin film interface is provided. In the case where the contact area between the recording thin film and the crystallization suppressing layer is increased from the outer peripheral side to the inner peripheral side of the recording thin film forming region and the crystallization promoting layer is provided, the recording per unit area of the recording thin film interface is performed. By increasing the contact area between the thin film and the crystallization promoting layer from the inner peripheral side to the outer peripheral side of the recording thin film forming region, good recording / erasing repetition characteristics can be obtained regardless of the inner and outer periphery of the recording region. .

【0011】[0011]

【実施例】以下図面に基づいて本発明を説明する。BRIEF DESCRIPTION OF THE DRAWINGS FIG.

【0012】本発明の記録媒体の代表的な構造例を図1
に示す。記録,再生、及び消去を行うレーザ光は基板1
の側から入射させる。
FIG. 1 shows a typical structural example of the recording medium of the present invention.
Shown in The laser beam for recording, reproducing and erasing is applied to the substrate 1
From the side.

【0013】基板1としては、PMMA,ポリカーボネ
ート等の樹脂或はガラス等、表面の平滑なものを用い
る。光ディスクの場合、通常基板平面9はレーザ光を導
くためにスパイラル又は同心円状のトラックで覆われて
いる。
As the substrate 1, a resin having a smooth surface such as a resin such as PMMA or polycarbonate or glass is used. In the case of an optical disk, the substrate plane 9 is usually covered with spiral or concentric tracks for guiding laser light.

【0014】保護層2,4の材料は、物理的・化学的に
安定、すなわち記録材料の融点よりも、融点及び軟化温
度が高く、かつ記録材料と相固溶しないことが望まし
い。例えば、Al2O3,SiOx,Ta2O5,MoO3,WO
3,ZrO2,ZnS,AlNx,BN,SiNx,TiN,Zr
N,PbF2,MgF2等の誘電体或はこれらの適当な組み
合わせからなる。保護層は誘電体は透明である必要はな
い。例えば可視光線及び赤外線に対して光吸収性をもつ
ZnTeで形成してもよい。又、保護層2,4を異なる材
料で形成すると、熱的及び光学的なディスク設計の自由
度が大きくなる利点がある。もちろん同一材料で形成し
てもよい。
The material of the protective layers 2 and 4 is preferably physically and chemically stable, that is, has a higher melting point and softening temperature than the melting point of the recording material, and does not form a solid solution with the recording material. For example, Al2 O3, SiOx, Ta2 O5, MoO3, WO
3, ZrO2, ZnS, AlNx, BN, SiNx, Tin, Zr
It is made of a dielectric material such as N, PbF2, MgF2, or an appropriate combination thereof. The protective layer need not be transparent in the dielectric. For example, it may be formed of ZnTe having a light absorbing property for visible light and infrared light. Further, when the protective layers 2 and 4 are formed of different materials, there is an advantage that the degree of freedom of thermal and optical disc design is increased. Of course, they may be formed of the same material.

【0015】記録薄膜3は、結晶状態と非晶質状態との
間で可逆的に構造変化をおこす物質、例えばTe又はI
n,Se等を主成分とする相変化材料からなる。よく知ら
れた相変化材料の主成分としては、Te-Sb-Ge,Te-
Ge,Te-Ge-Sn,Te-Ge-Sn-Au,Sb-Te,Sb-S
e-Te,In-Te,In-Se,In-Se-Tl,In-Sb,In-
Sb-Se,In-Se-Te等が挙げられる。
The recording thin film 3 is made of a material that reversibly changes its structure between a crystalline state and an amorphous state, for example, Te or I.
It is made of a phase change material containing n, Se and the like as main components. The main components of well-known phase change materials are Te-Sb-Ge, Te-
Ge, Te-Ge-Sn, Te-Ge-Sn-Au, Sb-Te, Sb-S
e-Te, In-Te, In-Se, In-Se-Tl, In-Sb, In-
Sb-Se, In-Se-Te, and the like.

【0016】結晶化制御層(結晶化抑制層,或は結晶化
促進層)5は記録薄膜3及び保護層2(或は4)の間に
不連続に形成され、非晶質状態の記録薄膜をレーザ光線
の照射によって結晶化させる場合、結晶化過程を制御す
る役目を担う。記録薄膜は、保護層にも結晶化制御層に
も接している。
The crystallization control layer (crystallization suppression layer or crystallization promoting layer) 5 is formed discontinuously between the recording thin film 3 and the protective layer 2 (or 4), and is formed in an amorphous state. In the case where is crystallized by irradiation of a laser beam, it plays a role of controlling the crystallization process. The recording thin film is in contact with both the protective layer and the crystallization control layer.

【0017】ここで、単位面積当り、記録薄膜界面に接
する割合が大きくなるほど、記録薄膜の結晶化が困難に
なり、長い時間のレーザ照射時間でないと結晶化ができ
ないような(結晶化制御)層を、保護層と比較して、結
晶化抑制層と呼ぶ。
Here, as the rate of contact with the interface of the recording thin film per unit area increases, the crystallization of the recording thin film becomes more difficult, and the crystallization cannot be performed unless the laser irradiation time is long (crystallization control). Is referred to as a crystallization suppressing layer as compared with the protective layer.

【0018】又、単位面積当り、記録薄膜界面に接する
割合が大きくなるほど、記録薄膜の結晶化が容易にな
り、より短い時間のレーザ照射時間で結晶化が可能とな
るような(結晶化制御)層を保護層と比較して、結晶化
促進層と呼ぶ。
Further, as the ratio of contact with the recording thin film interface per unit area increases, the crystallization of the recording thin film becomes easier, and crystallization can be performed with a shorter laser irradiation time (crystallization control). The layer is referred to as a crystallization promoting layer, as compared to the protective layer.

【0019】結晶化抑制層は、記録薄膜界面の単位面積
あたりの、記録薄膜と結晶化抑制層の接触面積が、記録
薄膜形成領域の外周側から内周側に向かって大きくなる
ように形成し、また結晶化促進層は、記録薄膜界面の単
位面積あたりの、記録薄膜と結晶化促進層の接触面積
が、記録薄膜形成領域の内周側から外周側に向かって大
きくなるように形成する。この結果、ディスクの内外周
(線速度の大小)を問わず、良好な消去特性,及び記録
・消去の繰り返し特性が得られる。
The crystallization suppression layer is formed such that the contact area between the recording thin film and the crystallization suppression layer per unit area of the recording thin film interface increases from the outer peripheral side to the inner peripheral side of the recording thin film forming region. The crystallization promoting layer is formed such that the contact area between the recording thin film and the crystallization promoting layer per unit area of the interface of the recording thin film increases from the inner peripheral side to the outer peripheral side of the recording thin film forming region. As a result, good erasing characteristics and repetition characteristics of recording / erasing can be obtained regardless of the inner and outer circumferences of the disk (linear velocity).

【0020】結晶化抑制層,或は結晶化促進層5の構成
材料及び成膜条件は、保護層、及び記録薄膜3の組合せ
によって変わってくるが、例えば、Al2O3,SiOx,
Ta2O5,ZrO2等の酸化物、AlNx,BN,NbN,S
iNx等の窒化物、B,C等の元素、或はこれらの適当な
組合せからなる。
The constituent materials and film forming conditions of the crystallization suppressing layer or the crystallization promoting layer 5 vary depending on the combination of the protective layer and the recording thin film 3. For example, Al2 O3, SiOx,
Oxides such as Ta2 O5, ZrO2, AlNx, BN, NbN, S
It is composed of a nitride such as iNx, an element such as B or C, or an appropriate combination thereof.

【0021】反射層6は、Au,Al,Ni,Fe,Cr等
の金属元素、或はこれらの合金からなり、記録薄膜への
光吸収効率を高める働きをする。しかし、例えば記録薄
膜3の膜厚を厚くして光吸収効率を高める工夫をするこ
とによって、反射層6を設けない構成とすることも可能
である。或は、記録薄膜と保護層を交互に複数回積み重
ねた構成とすることにより、記録薄膜1層あたりの膜厚
が薄くても、全体として光吸収効率を高めることもでき
る。
The reflection layer 6 is made of a metal element such as Au, Al, Ni, Fe, or Cr, or an alloy thereof, and functions to increase the light absorption efficiency of the recording thin film. However, it is also possible to adopt a configuration in which the reflective layer 6 is not provided, for example, by increasing the thickness of the recording thin film 3 to improve the light absorption efficiency. Alternatively, by adopting a configuration in which the recording thin film and the protective layer are alternately stacked a plurality of times, the light absorption efficiency can be increased as a whole even if the film thickness per recording thin film is small.

【0022】保護基板8は、樹脂をスピンコートした
り、基板と同様の樹脂板、ガラス板、或は金属板等を接
着剤7を用いて貼り合わせることによって形成する。さ
らには、2組の記録媒体を中間基板或は反射層を内側に
して接着剤を用いて貼り合わせることにより、両面から
記録,再生、消去可能な構造としてもよい。
The protective substrate 8 is formed by spin-coating a resin or by bonding a resin plate, a glass plate, a metal plate, or the like similar to the substrate using an adhesive 7. Furthermore, a structure in which recording, reproduction, and erasing can be performed from both surfaces may be performed by bonding two sets of recording media using an adhesive with the intermediate substrate or the reflective layer inside.

【0023】記録薄膜,保護層,結晶化制御層は、通
常、電子ビーム蒸着法,スパタリング法,イオンプレー
ティング法,CVD法,レーザスパタリング法等によっ
て形成される。
The recording thin film, protective layer, and crystallization control layer are usually formed by an electron beam evaporation method, a sputtering method, an ion plating method, a CVD method, a laser sputtering method, or the like.

【0024】以下に 具体的な例をもって本発明を詳述
する。 (実施例1)記録薄膜としてGe2Sb2Te5組成を選んで
サンプルディスクを作成し、異なる線速度で記録・消去
特性を調べた。Ge2Sb2Te5組成は、良好な記録・消去
特性、及び繰り返し特性が得られる材料として知られて
いる(特開昭62-209742号公報)。
Hereinafter, the present invention will be described in detail with specific examples. (Example 1) A sample disk was prepared by selecting a Ge 2 Sb 2 Te 5 composition as a recording thin film, and recording / erasing characteristics were examined at different linear velocities. The Ge 2 Sb 2 Te 5 composition is known as a material capable of obtaining good recording / erasing characteristics and repetition characteristics (JP-A-62-209742).

【0025】図1(a)にディスク構造を示す。基板1
の材質は8インチ径のガラスとし、記録領域はφ80〜
φ200とする。基板1上に、組成がZnS-20mol%Si
2の保護層2、窒化ケイ素(Si34)からなる結晶化
抑制層5、Ge2Sb2Te5記録薄膜3、ZnS-20mol%Si
2保護層4、Au反射層6を順次積層する。記録薄膜3
の膜厚は50nmとした。保護層2、4の膜厚は、光学的
に最適な特性が得られるように決定した。具体的には基
板1側の膜厚が150nm、記録薄膜3上には200nm設
けた。反射層6材料には金(Au)を用い、膜厚は20n
mとした。各層の形成はスパタリング法により行った。
FIG. 1A shows a disk structure. Substrate 1
Is 8 inch diameter glass and the recording area is φ80 ~
φ200. On the substrate 1, the composition is ZnS-20mol% Si.
O 2 protective layer 2, crystallization suppressing layer 5 made of silicon nitride (Si 3 N 4 ), Ge 2 Sb 2 Te 5 recording thin film 3, ZnS-20 mol% Si
An O 2 protective layer 4 and an Au reflective layer 6 are sequentially laminated. Recording thin film 3
Was 50 nm in thickness. The thicknesses of the protective layers 2 and 4 were determined so as to obtain optically optimal characteristics. Specifically, the film thickness on the substrate 1 side was 150 nm, and the film thickness on the recording thin film 3 was 200 nm. The reflection layer 6 is made of gold (Au) and has a thickness of 20 n.
m. Each layer was formed by a sputtering method.

【0026】結晶化抑制層5は最大でも膜厚が2nmで、
記録領域の内周側(φ80〜φ90)では、保護層2界
面の80%以上を結晶化抑制層5が覆い、外周側に寄る
ほど、結晶化抑制層5自身の連続性は低下する。記録領
域の外周側(φ190〜φ200)では、保護層2界面
の20%以下を結晶化抑制層5が覆うようにした。具体
的には、内周で開口率が大きくなっているスリットを用
いて結晶化抑制層5を形成し、ディスク径方向の結晶化
抑制層5の連続具合いを制御した。結晶化抑制層5を形
成した段階で、表面状態をSTM(走査型トンネル顕微
鏡)を用いて観察した。
The crystallization suppression layer 5 has a maximum thickness of 2 nm,
On the inner peripheral side (φ80 to φ90) of the recording area, the crystallization suppressing layer 5 covers 80% or more of the interface of the protective layer 2, and the continuity of the crystallization suppressing layer 5 itself decreases toward the outer peripheral side. On the outer peripheral side (φ190 to φ200) of the recording area, the crystallization suppression layer 5 covers 20% or less of the interface of the protective layer 2. Specifically, the crystallization suppression layer 5 was formed using a slit having a large aperture ratio on the inner periphery, and the continuity of the crystallization suppression layer 5 in the disk radial direction was controlled. At the stage when the crystallization suppression layer 5 was formed, the surface state was observed using an STM (scanning tunnel microscope).

【0027】図2に保護層2を覆う結晶化抑制層5の分
布状態を示す。図2の(a)は記録領域の外周側(φ1
95付近)における結晶化抑制層5の分布状態を表して
いる。この図に示すように、結晶化抑制層5は外周側で
は不連続的に疎に形成されている。図2の(b)は記録
領域の内周側(φ85付近)における結晶化抑制層5の
分布状態を表している。この図に示すように、結晶化抑
制層5(斜線部分)は内周側では連続的に密に形成され
ている。上記構成のディスクを2400rmpで回転させ、φ
195の領域と、φ85の領域において記録・消去特性
を調べた。レーザービーム(波長:830nm)とディスク
の相対速度はそれぞれ24.5m/s、10.7m/sとなる。記録・
消去信号の周波数は8MHz、5MHzとし、10万回
重ね書き(オーバーライト記録)した。この時、繰り返
した後においてもC/Nが50dB以上、消去率が25dB
以上を保つことのできた記録・消去パワーの組み合わせ
図3の表に丸印で示している。図3の(a)は記録媒
体の外周側(φ195)における結果であり、(b)は
内周側(φ85)における結果を表している。C/Nが
50dB以上、消去率が25dB以上という値はディジタル
記録として十分に実用的な値である。図3から、本実施
例の記録媒体では、内外周を問わず、広いパワー範囲
、良好な記録・消去の繰り返し特性が得られているこ
とがわかる。
FIG. 2 shows a distribution state of the crystallization suppressing layer 5 covering the protective layer 2. FIG. 2A shows the outer peripheral side of the recording area (φ1
95)).
I have. As shown in this figure, the crystallization suppression layer 5 is
Are discontinuously and sparsely formed. FIG. 2 (b) is a record.
Of the crystallization suppression layer 5 on the inner peripheral side of the region (around φ85)
This shows the distribution state. As shown in FIG.
The control layer 5 (shaded area) is continuously and densely formed on the inner peripheral side.
ing. Rotate the disk with the above configuration at 2400 rpm, φ
The recording / erasing characteristics were examined in the area of 195 and the area of φ85. The relative speeds of the laser beam (wavelength: 830 nm) and the disk are 24.5 m / s and 10.7 m / s, respectively. Record
The frequency of the erase signal was set to 8 MHz and 5 MHz, and overwriting was performed 100,000 times (overwrite recording). At this time, even after repetition, the C / N is 50 dB or more, and the erasure rate is 25 dB.
Combinations of the recording / erasing powers that could maintain the above are shown by circles in the table of FIG. FIG. 3A shows a recording medium.
It is the result on the outer peripheral side of the body (φ195), and (b)
The result on the inner circumference side (φ85) is shown . A value of C / N of 50 dB or more and an erasing rate of 25 dB or more are sufficiently practical values for digital recording. From FIG. 3, this implementation
The example recording medium has a wide power range
It can be seen that good recording / erasing repetition characteristics were obtained.

【0028】さらに、結晶化抑制層が、記録薄膜と、反
射層側の保護層の間になるように形成したディスク、及
び、結晶化抑制層が、記録薄膜を挟んで両側にくるよう
形成したディスクについても、上記同様の記録・消去特
性を調べた。
Further, a disk in which the crystallization suppressing layer was formed between the recording thin film and the protective layer on the reflection layer side, and a crystallization suppressing layer was formed on both sides of the recording thin film. The same recording / erasing characteristics as described above were also examined for the disc.

【0029】その結果、いずれの場合も、内外周を問わ
ず、広いパワー範囲で、良好な記録・消去の繰り返し特
性が得られていることがわかった。
As a result, in each case, it was found that good recording / erasing repetition characteristics were obtained in a wide power range regardless of the inner and outer circumferences.

【0030】実施例1で設けた結晶化抑制層の効果を確
かめるために、結晶化抑制層を持たないディスクを作成
し、実施例1と同じ条件で記録・消去特性を調べた。サ
ンプルディスクの構造は、結晶化抑制層を形成しない点
以外では、実施例1と全く同じである。実施例1の結晶
化抑制層は十分に薄いので、両ディスクは、光学的構造
・熱的構造は等価とみなせる。
In order to confirm the effect of the crystallization suppressing layer provided in Example 1, a disk having no crystallization suppressing layer was prepared, and the recording / erasing characteristics were examined under the same conditions as in Example 1. The structure of the sample disk is exactly the same as that of Example 1 except that the crystallization suppression layer is not formed. Since the crystallization suppressing layer of Example 1 is sufficiently thin, both disks can be regarded as having equivalent optical and thermal structures.

【0031】図4に、φ195の領域と、φ85の領域
において、10万回記録・消去を繰り返した後において
もC/Nが50dB以上、消去率が25dB以上を保つ、記
録・消去パワーの組合せをそれぞれ示す。図4と図3
(実施例1)を比較すると、次のことが言える。
FIG. 4 shows a combination of recording / erasing powers in which the C / N is maintained at 50 dB or more and the erasing rate is maintained at 25 dB or more even after recording / erasing is repeated 100,000 times in the area of φ195 and the area of φ85. Are respectively shown. 4 and 3
Comparing (Example 1), the following can be said.

【0032】・外周ではともに良好な繰り返し特性を示
す。 ・内周では、結晶化抑制層がないと、良好な繰り返し特
性を示すパワー範囲が狭くなる。特に、低記録パワー側
の繰り返し特性が低下する。
Good repetition characteristics are exhibited at the outer periphery. -In the inner periphery, without the crystallization suppressing layer, the power range showing good repetition characteristics becomes narrow. In particular, the repetition characteristics on the low recording power side deteriorate.

【0033】レーザ照射部のTEM観察を行なった結
果、低線速度で記録・消去を行なう場合、結晶化抑制層
が存在する場合には、低記録パワーでも大きな記録マー
ク(非晶質マーク)が形成されるのに対し、結晶化抑制
層が存在しない場合には、より大きな記録パワーでない
と、十分な大きさの記録マークを形成できないことがわ
かった。
As a result of TEM observation of the laser irradiated portion, when recording / erasing is performed at a low linear velocity, a large recording mark (amorphous mark) is produced even at a low recording power when a crystallization suppressing layer is present. On the other hand, it was found that when the crystallization suppressing layer was not present, a sufficiently large recording mark could not be formed unless the recording power was higher.

【0034】内周側で、より広い面積で記録薄膜に接す
る結晶化抑制層は、 ・記録薄膜の結晶化過程において、結晶核を形成しにく
くする、或は ・結晶化後の結晶成長速度を抑制する ことにより、線速度の遅い内周でも、十分な記録特性が
確保できるようになり、その結果、記録・消去の繰り返
し特性も向上する。ここで、重要なことは、結晶化抑制
層の存在が、ディスクの光学的構造、及び熱的構造をほ
とんど変えることなく、線速度に応じて結晶化特性を制
御することにある。
The crystallization suppressing layer, which is in contact with the recording thin film in a larger area on the inner peripheral side, makes it difficult to form crystal nuclei during the crystallization process of the recording thin film, or to reduce the crystal growth rate after crystallization. By suppressing this, sufficient recording characteristics can be ensured even at the inner circumference where the linear velocity is low, and as a result, the recording / erasing repetition characteristics are also improved. What is important here is that the presence of the crystallization suppressing layer controls the crystallization characteristics according to the linear velocity without substantially changing the optical structure and the thermal structure of the disk.

【0035】(実施例2)実施例1では、結晶化抑制層
を用いたディスクについて説明した。次に、実施例3で
は、結晶化促進層を用いたディスクについて説明する。
ここでは、記録薄膜としてGe4Sb5Te10組成を選ぶ。
Ge4Sb5Te10は、Ge2Sb2Te5組成に比べると結晶化
速度が幾分遅いが、良好な記録・消去特性、及び繰り返
し特性を示す(特開昭62-209742号公報)。
(Embodiment 2) In Embodiment 1, a disk using a crystallization suppressing layer was described. Next, in a third embodiment, a disk using a crystallization promoting layer will be described.
Here, a Ge 4 Sb 5 Te 10 composition is selected as the recording thin film.
Ge 4 Sb 5 Te 10 has a slightly slower crystallization rate than the Ge 2 Sb 2 Te 5 composition, but exhibits good recording / erasing characteristics and repetition characteristics (Japanese Patent Application Laid-Open No. 62-209742).

【0036】図1(b)にディスク構造を示す。基板1
の材質はφ130のガラスとし、記録領域はφ60〜φ
128とする。基板1上に、窒化ケイ素(Si34)保
護層、酸化タンタル(Ta25)からなる結晶化促進層
10、Ge4Sb5Te10記録薄膜3、Si34保護層、Au
反射層6を順次積層する。記録薄膜3の膜厚は30nmと
した。保護層の膜厚は、光学的に最適な特性が得られる
ように決定した。具体的には基板1側の膜厚が150n
m、記録薄膜3上には100nm設けた。反射層6材料に
は金(Au)を用い、膜厚は20nmとした。各層の形成
はスパタリング法により行った。
FIG. 1B shows a disk structure. Substrate 1
Is made of glass of φ130, and the recording area is φ60-φ.
128. A silicon nitride (Si 3 N 4 ) protective layer, a crystallization promoting layer 10 made of tantalum oxide (Ta 2 O 5 ), a Ge 4 Sb 5 Te 10 recording thin film 3, a Si 3 N 4 protective layer, and an Au
The reflection layers 6 are sequentially laminated. The thickness of the recording thin film 3 was 30 nm. The thickness of the protective layer was determined so as to obtain optically optimal characteristics. Specifically, the film thickness on the substrate 1 side is 150 n
m, 100 nm on the recording thin film 3. The reflective layer 6 was made of gold (Au) and had a thickness of 20 nm. Each layer was formed by a sputtering method.

【0037】結晶化促進層10は最大でも膜厚が2nm
で、記録領域の外周側(φ120〜φ128)では、保
護層界面の80%以上を結晶化促進層10が覆い、内周
側に寄るほど、結晶化促進層10自身の連続性は低下す
る。記録領域の内周側(φ60〜φ70)では、保護層
界面の20%以下を結晶化促進層10が覆うようにし
た。具体的には、外周で開口率が大きくなっているスリ
ットを用いて結晶化促進層10を形成し、ディスク径方
向の結晶化促進層10の連続具合いを制御した。結晶化
促進層10を形成した段階で、表面状態をSTMを用い
て観察した。図5に保護層を覆う結晶化促進層10の分
布状態を示す。
The maximum thickness of the crystallization promoting layer 10 is 2 nm.
On the outer peripheral side (φ120 to φ128) of the recording area, the crystallization promoting layer 10 covers 80% or more of the interface of the protective layer, and the continuity of the crystallization promoting layer 10 itself decreases as it approaches the inner peripheral side. On the inner circumference side (φ60 to φ70) of the recording area, the crystallization promoting layer 10 covers 20% or less of the interface of the protective layer. Specifically, the crystallization-promoting layer 10 was formed using a slit having a large aperture ratio on the outer periphery, and the degree of continuity of the crystallization-promoting layer 10 in the disk radial direction was controlled. At the stage when the crystallization promoting layer 10 was formed, the surface state was observed using STM. FIG. 5 shows a distribution state of the crystallization promoting layer 10 covering the protective layer.

【0038】図5の(a)は記録領域の外周側(φ12
5付近)における結晶化促進層10の分布状態を表して
いる。この図に示すように、結晶化促進層10(斜線部
分)は外周側では連続的に蜜に形成されている。図5の
(b)は記録領域の内周側(φ65付近)における結晶
化促進層10の分布状態を表している。この図に示すよ
うに、結晶化促進層10は内周側では非連続的に疎に形
成されている。上記構成のディスクを1800rpmで回転さ
せ、φ65の領域と、φ125の領域において記録・消
去特性を調べた。レーザービーム(波長:830nm)とデ
ィスクの相対速度はそれぞれ6.5m/s、11.8m/sとなる。
記録・消去信号の周波数は5MHz、3MHzとし、1
0万回重ね書き(オーバーライト記録)した。この時、
繰り返した後においてもC/Nが50dB以上、消去率が
25dB以上を保つことのできた記録・消去パワーの組み
合わせを図6の表に丸印で示している。図6の(a)は
記録媒体の外周側(φ125)における結果であり、
(b)は内周側(φ65)における結果を表している
C/Nが50dB以上、消去率が25dB以上という値はデ
ィジタル記録として十分に実用的な値である。図6か
ら、本実施例の記録媒体では、内外周を問わず、広いパ
ワー範囲で、良好な記録・消去の繰り返し特性が得られ
ていることがわかる。
FIG . 5A shows the outer peripheral side of the recording area (φ12
5)).
I have. As shown in this figure, the crystallization promoting layer 10 (shaded area)
Is continuously formed on the outer peripheral side. In FIG.
(B) shows a crystal on the inner circumference side (around φ65) of the recording area.
3 shows a distribution state of the activation promoting layer 10. As shown in this figure
Thus, the crystallization promoting layer 10 is discontinuously and sparsely formed on the inner peripheral side.
Has been established. The disk having the above configuration was rotated at 1800 rpm, and the recording / erasing characteristics were examined in the area of φ65 and the area of φ125. The relative speeds of the laser beam (wavelength: 830 nm) and the disk are 6.5 m / s and 11.8 m / s, respectively.
The frequency of the recording / erasing signal is 5 MHz, 3 MHz, and 1
Overwriting (overwrite recording) was performed 100,000 times. At this time,
Combinations of recording / erasing powers that can maintain the C / N at 50 dB or more and the erasing rate at 25 dB or more even after the repetition are indicated by circles in the table of FIG. (A) of FIG.
This is the result on the outer peripheral side (φ125) of the recording medium,
(B) shows the result on the inner circumference side (φ65) .
The values of C / N of 50 dB or more and the erasure rate of 25 dB or more are sufficiently practical values for digital recording. Fig. 6
Thus, it can be seen that in the recording medium of this example , good recording / erasing repetition characteristics were obtained in a wide power range regardless of the inner and outer circumferences.

【0039】さらに、結晶化促進層10が、記録薄膜3
と、反射層6側の保護層の間になるように形成したディ
スク、及び、結晶化促進層10が、記録薄膜3を挟んで
両側にくるよう形成したディスクについても、上記同様
の記録・消去特性を調べた。その結果、いずれの場合
も、内外周を問わず、広いパワー範囲で、良好な記録・
消去の繰り返し特性が得られていることがわかった。
Further, the crystallization promoting layer 10 comprises the recording thin film 3
And a disk formed so as to be between the protective layer on the reflective layer 6 side and a disk formed so that the crystallization promoting layer 10 is on both sides of the recording thin film 3 in the same manner as described above. The characteristics were investigated. As a result, in any case, good recording and
It was found that erasing repetition characteristics were obtained.

【0040】実施例2で設けた結晶化促進層10の効果
を確かめるために、結晶化促進層10を持たないディス
クを作成し、実施例2と同じ条件で記録・消去特性を調
べた。サンプルディスクの構造は、結晶化促進層10を
形成しない点以外では、実施例3と全く同じである。実
施例2の結晶化促進層10は十分に薄いので、両ディス
クは、光学的構造・熱的構造は等価とみなせる。図7
に、φ65の領域と、φ125の領域において、10万
回記録・消去を繰り返した後においてもC/Nが50dB
以上、消去率が25dB以上を保つ、記録・消去パワーの
組合せをそれぞれ示す。図7と図6(実施例2)を比較
すると、次のことが言える。
In order to confirm the effect of the crystallization promoting layer 10 provided in Example 2, a disk having no crystallization promoting layer 10 was prepared, and the recording / erasing characteristics were examined under the same conditions as in Example 2. The structure of the sample disk is exactly the same as that of Example 3 except that the crystallization promoting layer 10 is not formed. Since the crystallization promoting layer 10 of the second embodiment is sufficiently thin, both disks can be considered to have equivalent optical and thermal structures. FIG.
In the area of φ65 and the area of φ125, the C / N is still 50 dB even after recording / erasing is repeated 100,000 times.
The combinations of the recording and erasing powers at which the erasing rate is maintained at 25 dB or more are described above. 7 and 6 (Example 2), the following can be said.

【0041】・内周ではともに良好な繰り返し特性を示
す。 ・外周では、結晶化促進層10がないと、良好な繰り返
し特性を示すパワー範囲が 狭くなる。特に、低消去パ
ワー側の繰り返し特性が低下する。
Good repetition characteristics are exhibited at the inner circumference. -In the outer periphery, without the crystallization promoting layer 10, the power range showing good repetition characteristics becomes narrow. In particular, the repetition characteristics on the low erase power side deteriorate.

【0042】レーザ照射部のTEM(透過型電子顕微
鏡)観察を行なった結果、高線速度で消去を行なう場
合、結晶化促進層10が存在する場合には、低消去パワ
ーでも十分結晶化(消去)できるのに対し、結晶化促進
層10が存在しない場合には、より大きな消去パワーで
ないと、結晶化が十分な大きさの記録マークを形成でき
ないことがわかった。
As a result of TEM (transmission electron microscope) observation of the laser irradiation part, when erasing is performed at a high linear velocity, and when the crystallization promoting layer 10 is present, sufficient crystallization (erasing) is performed even with a low erasing power. On the other hand, when the crystallization accelerating layer 10 was not present, it was found that crystallization could not form a sufficiently large recording mark unless the erasing power was higher.

【0043】外周側で、より広い面積で記録薄膜に接す
る結晶化促進層は、 ・記録薄膜の結晶化過程において、結晶核を形成しやす
くする、或は ・結晶化後の結晶成長速度を促進する ことにより、線速度の速い外周でも、十分な消去特性が
確保できるようになり、その結果、記録・消去の繰り返
し特性も向上する。ここで、重要なことは、結晶化促進
層の存在が、ディスクの光学的構造、及び熱的構造をほ
とんど変えることなく、線速度に応じて結晶化特性を制
御することにある。
The crystallization-promoting layer, which is in contact with the recording thin film over a larger area on the outer peripheral side, makes it easier to form crystal nuclei in the process of crystallization of the recording thin film, or to increase the crystal growth rate after crystallization. By doing so, sufficient erasing characteristics can be ensured even at the outer periphery where the linear velocity is high, and as a result, the repetition characteristics of recording / erasing are improved. What is important here is that the presence of the crystallization promoting layer controls the crystallization characteristics according to the linear velocity without substantially changing the optical structure and the thermal structure of the disk.

【0044】[0044]

【発明の効果】相変化型光学情報記録媒体の記録薄膜に
接して結晶化抑制層、或は結晶化促進層を備え、かつ、
結晶化抑制層を設ける場合には、記録薄膜界面の単位面
積あたりの、記録薄膜と結晶化抑制層の接触面積を、記
録薄膜形成領域の外周側から内周側に向かって大きく
し、結晶化促進層を設ける場合には、記録薄膜界面の単
位面積あたりの、記録薄膜と結晶化促進層の接触面積
を、記録薄膜形成領域の内周側から外周側に向かって大
きくすることにより、記録領域の内外周を問わず、良好
な記録・消去の繰り返し特性が得られる。
According to the present invention, a crystallization suppressing layer or a crystallization promoting layer is provided in contact with a recording thin film of a phase change type optical information recording medium, and
When the crystallization suppression layer is provided, the contact area between the recording thin film and the crystallization suppression layer per unit area of the interface of the recording thin film is increased from the outer peripheral side to the inner peripheral side of the recording thin film forming region, and the crystallization is suppressed. When the accelerating layer is provided, the contact area between the recording thin film and the crystallization accelerating layer per unit area of the interface of the recording thin film is increased from the inner peripheral side to the outer peripheral side of the recording thin film forming area, thereby increasing the recording area. Irrespective of the inner and outer peripheries, good recording / erasing repetition characteristics are obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(a)は本発明の実施例1の光学情報記録媒体
の構造を示す断面図 (b)は本発明の実施例2の光学情報記録媒体の構造を
示す断面図
FIG. 1A is a cross-sectional view illustrating a structure of an optical information recording medium according to a first embodiment of the present invention. FIG. 1B is a cross-sectional view illustrating a structure of an optical information recording medium according to a second embodiment of the present invention.

【図2】(a)はφ195付近の結晶化抑制層の分布状
態を走査型トンネル顕微鏡で観察した図 (b)はφ85付近の結晶化抑制層の分布状態を走査型
トンネル顕微鏡で観察した図
FIG. 2 (a) is a view of a distribution state of a crystallization suppression layer near φ195 observed with a scanning tunneling microscope, and FIG. 2 (b) is a view of a distribution state of a crystallization suppression layer near φ85 observed with a scanning tunneling microscope.

【図3】(a)は結晶化抑制層を有するディスクのφ1
95付近の記録・消去パワーの組合せに対するサイクル
特性を示す図 (b)は結晶化抑制層を有するディスクのφ85付近の
記録・消去パワーの組合せに対するサイクル特性を示す
FIG. 3A shows φ1 of a disk having a crystallization suppression layer.
FIG. 9B shows a cycle characteristic for a combination of recording / erasing powers around 95. FIG. 10B shows a cycle characteristic for a combination of recording / erasing powers near φ85 of a disk having a crystallization suppression layer.

【図4】(a)は結晶化抑制層を持たないディスクのφ
195付近の記録・消去パワーの組合せに対するサイク
ル特性を示す図 (b)は結晶化抑制層を持たないディスクのφ85付近
の記録・消去パワーの組合せに対するサイクル特性を示
す図
FIG. 4 (a) shows the φ of a disk without a crystallization suppression layer.
FIG. 4B shows the cycle characteristics for a combination of recording / erasing powers around 195. FIG. 5B shows the cycle characteristics for a combination of recording / erasing powers near φ85 of a disk having no crystallization suppression layer.

【図5】(a)はφ125付近の結晶化促進層の分布状
態を走査型トンネル顕微鏡で観察した図 (b)はφ65付近の結晶化促進層の分布状態を走査型
トンネル顕微鏡で観察した図
FIG. 5 (a) is a view of a distribution state of a crystallization promoting layer near φ125 observed by a scanning tunneling microscope. FIG. 5 (b) is a view of a distribution state of a crystallization promotion layer near φ65 observed by a scanning tunneling microscope.

【図6】(a)は結晶化促進層を有するディスクのφ1
25付近の記録・消去パワーの組合せに対するサイクル
特性を示す図 (b)は結晶化促進層を有するディスクのφ65付近の
記録・消去パワーの組合せに対するサイクル特性を示す
FIG. 6 (a) shows φ1 of a disk having a crystallization promoting layer.
FIG. 4B shows the cycle characteristics for a combination of recording and erasing powers near 25, and FIG. 6B shows the cycle characteristics for a combination of recording and erasing powers near φ65 of a disk having a crystallization promoting layer.

【図7】(a)は結晶化促進層を持たないディスクのφ
195付近の記録・消去パワーの組合せに対するサイク
ル特性を示す図 (b)は結晶化促進層を持たないディスクのφ85付近
の記録・消去パワーの組合せに対するサイクル特性を示
す図
FIG. 7 (a) shows the φ of a disk having no crystallization promoting layer.
FIG. 7B shows the cycle characteristics for a combination of recording / erasing powers around 195. FIG. 9B shows the cycle characteristics for a combination of recording / erasing powers near φ85 of a disk having no crystallization promoting layer.

【符号の説明】[Explanation of symbols]

1 基板 2 保護層 3 記録薄膜 4 保護層 5 結晶化抑制層 6 反射層 7 接着層 8 保護基板 9 基板平面 10 結晶化促進層 DESCRIPTION OF SYMBOLS 1 Substrate 2 Protective layer 3 Recording thin film 4 Protective layer 5 Crystallization suppressing layer 6 Reflective layer 7 Adhesive layer 8 Protective substrate 9 Substrate plane 10 Crystallization promoting layer

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平2−42654(JP,A) 特開 昭61−292239(JP,A) (58)調査した分野(Int.Cl.7,DB名) G11B 7/24 533 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-2-42654 (JP, A) JP-A-61-292239 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) G11B 7/24 533

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 ディスク状基板と、前記ディスク状基板
上に形成され、レーザ光線の照射により相変化を生じて
光学特性の異なる状態へと可逆的に移り得る記録薄膜
と、前記記録薄膜に接して前記記録薄膜の結晶化を抑制
する結晶化抑制層とを備えてなる光学情報記録媒体であ
って、単位面積あたりの、前記記録薄膜と前記結晶化抑
制層との接触面積が、光学情報記録媒体の外周側から内
周側に向かって連続的に大きくなることを特徴とする光
学情報記録媒体。
1. A disk-shaped substrate, a recording thin film formed on the disk-shaped substrate and capable of undergoing a phase change by irradiation with a laser beam and reversibly shifting to a state having different optical characteristics, the contact area between the an optical information recording medium comprising a suppressing crystallization suppressing layer crystallization of the recording thin film, per unit area, the recording thin film and the crystallization inhibiting layer Te is, the optical information recording From the outer circumference of the media to the inner
An optical information recording medium characterized by being continuously increasing toward the circumferential side .
【請求項2】 ディスク状基板と、前記ディスク状基板
上に形成され、レーザ光線の照射により相変化を生じて
光学特性の異なる状態へと可逆的に移り得る記録薄膜
と、前記記録薄膜に接して前記記録薄膜の結晶化を促進
する結晶化促進層とを備えてなる光学情報記録媒体であ
って、単位面積あたりの、前記記録薄膜と前記結晶化促
進層との接触面積が、光学記録情報媒体の内周側から外
周側に向かって連続的に大きくなることを特徴とする
学情報記録媒体。
2. A disk-shaped substrate, and said disk-shaped substrate
Formed on the surface and undergoes a phase change
Recording thin film capable of reversibly moving to a state with different optical properties
Promotes crystallization of the recording thin film in contact with the recording thin film
An optical information recording medium comprising a crystallization promoting layer
Thus, the recording thin film and the crystallization promoting
The area of contact with the coating layer is
An optical information recording medium, which continuously increases toward the circumferential side .
JP3225721A 1991-09-05 1991-09-05 Optical information recording medium Expired - Fee Related JP3049864B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3225721A JP3049864B2 (en) 1991-09-05 1991-09-05 Optical information recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3225721A JP3049864B2 (en) 1991-09-05 1991-09-05 Optical information recording medium

Publications (2)

Publication Number Publication Date
JPH0562249A JPH0562249A (en) 1993-03-12
JP3049864B2 true JP3049864B2 (en) 2000-06-05

Family

ID=16833778

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3225721A Expired - Fee Related JP3049864B2 (en) 1991-09-05 1991-09-05 Optical information recording medium

Country Status (1)

Country Link
JP (1) JP3049864B2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6143468A (en) * 1996-10-04 2000-11-07 Mitsubishi Chemical Corporation Optical information recording medium and optical recording method
JP3185890B2 (en) * 1997-04-16 2001-07-11 旭化成株式会社 Method for manufacturing optical information recording medium and optical information recording medium manufactured by this method
US6477135B1 (en) 1998-03-26 2002-11-05 Matsushita Electric Industrial Co., Ltd. Optical information recording medium and method for recording and reproduction information thereon
US6511788B1 (en) * 1999-02-12 2003-01-28 Sony Corporation Multi-layered optical disc
CA2377619A1 (en) * 2000-04-20 2001-11-01 Koninklijke Philips Electronics N.V. Optical recording medium and use of such optical recording medium
JP2002117577A (en) * 2000-10-03 2002-04-19 Tdk Corp Optical recording medium and optical information recording method
JP5225372B2 (en) * 2008-04-01 2013-07-03 株式会社東芝 Information recording / reproducing device

Also Published As

Publication number Publication date
JPH0562249A (en) 1993-03-12

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