JP2993263B2 - Plasma display panel - Google Patents
Plasma display panelInfo
- Publication number
- JP2993263B2 JP2993263B2 JP4647892A JP4647892A JP2993263B2 JP 2993263 B2 JP2993263 B2 JP 2993263B2 JP 4647892 A JP4647892 A JP 4647892A JP 4647892 A JP4647892 A JP 4647892A JP 2993263 B2 JP2993263 B2 JP 2993263B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- plasma display
- display panel
- transparent electrode
- insulating layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Gas-Filled Discharge Tubes (AREA)
Description
【発明の詳細な説明】
【0001】
【産業上の利用分野】本発明は、情報表示端末や平面形
テレビなどに用いられるプラズマディスプレイパネルに
関し、特に高精細、高輝度プラズマディスプレイパネル
の構造に関する。
【0002】
【従来の技術】プラズマディスプレイパネルにはNeの
発光色を利用するモノクロパネルと、蛍光体の発光色を
利用するカラーパネルとがある。本発明はいずれにも共
通する技術であるが、ここではカラープラズマディスプ
レイパネルを例に採る。
【0003】カラープラズマディスプレイパネルはガス
放電によって発生した紫外線によって蛍光体を励起発光
させ可視光を得て表示動作させるディスプレイである
が、放電方式によりAC型とDC型に分類できる。AC
型の中でも反射型AC面放電型が輝度、発光効率、寿命
の点で優れているのでこれを例に採る。図4に従来の反
射型AC面放電プラズマディスプレイパネルの平面図を
示す。図3に図4のb−b′における従来の反射型AC
面放電プラズマディスプレイパネルの断面図を示す。図
3に於て、前面基板30上に透明電極31が形成されて
いる。この隣合う透明電極31の間に通常数十kHzか
ら数百kHzのパルス状AC電圧を印加し表示放電を得
るのであるが、透明電極31に例えばSnO2 を用いる
と、シート抵抗が通常数十Ω/□と高いために、特に大
型パネルや高精細パネルでは電極抵抗が数十kΩにな
り、電圧パルスが十分に立ち上がらず駆動が困難にな
る。そこで透明電極31の上に金属バス電極32を形成
し電極の抵抗値を下げる。金属バス電極32は例えばA
lの薄膜で形成する。金属バス電極32のパターンニン
グはフォトリソグラフィーを用いる。この上から絶縁層
33で被覆する。絶縁層33は例えば低融点鉛ガラスの
厚膜である。絶縁層33の上に保護層34を形成する。
保護層34は例えばMgOの薄膜、もしくは厚膜で形成
する。
【0004】一方、後面基板39には書き込み電極38
を形成し、これを絶縁層37で被覆し、更に各画素にな
る部分に各画素の発光色の蛍光体36を塗布する。これ
に前述の前面基板30を隔壁35を介して張り合わせ気
密封止し内部に放電可能なガス、例えばHeとXeの混
合ガスを250torr程度封入する。隣合う透明電極
31の間にパルス状の交流電圧を印加するとガス放電が
おきプラズマ40が生成される。ここで発生した紫外光
41で蛍光体36を励起し可視光52を前面基板30を
通して得る。
【0005】
【発明が解決しようとする課題】上述のような構造のカ
ラープラズマディスプレイパネルでは、金属バス電極は
通常Al等の薄膜のフォトリソグラフィーで形成される
が、この際次のような問題が生じる。一般に、異種金属
と接合させたものを電解液中に漬けた場合、電気化学反
応が生じる。この場合の異種金属とは透明電極と金属バ
ス電極で、電解液はレジスト現像液やエッチング液であ
る。例えばSnO2 とAl薄膜の場合、Alが電解液中
に溶けだすと水素発生反応が起き、続いてSnO2 が還
元され、結果として電極が腐食される。この反応を抑え
ることは困難である。従って、腐食によって金属バス電
極の断線が生じ歩留まりが大幅に低下する。これを防ぐ
ためには金属バス電極の線幅を太くする必要がある。し
かし、放電セルの開口率を下げない様にするために、金
属バス電極は隔壁の下に隠れる必要があり、できるだけ
細い線幅で形成しなくてはならないが、実際は困難なの
で隔壁の幅は金属バス電極の線幅によって制限され太く
せざるをえない。すると放電セルの開口率が落ちてしま
う。しかるに放電セルの開口率は、放電特性やパネルの
面平均輝度に大きく影響するために、どうしても線幅の
細い金属バス電極を歩留まり良く形成できる方法が必要
であった。
【0006】
【課題を解決するための手段】本発明は、透明絶縁基板
上に形成された透明電極群と前記透明電極上に形成した
金属電極とを有するプラズマディスプレイパネルに於い
て、前記透明電極と前記金属電極の間に絶縁層を形成
し、かつ前記絶縁層の膜厚を前記透明電極と前記金属電
極との間を容量結合によってパルス電圧をほとんどロス
無く伝達可能な厚さにしたことを特徴とする。
【0007】
【作用】レジスト現像や金属バス電極をエッチングで形
成する際に生じる電気化学反応は、透明電極と金属バス
電極の間に薄い絶縁膜を挟み込むことによって、局所電
池作用による電流を抑える。これにより、レジスト現像
や金属バス電極のエッチング中に生じる電極の腐食を防
ぐことが出来た。なお、透明電極と金属バス電極は薄い
絶縁膜を介して容量で結合する。絶縁膜の厚さは十分に
薄いので静電容量は大きい。従って、金属バス電極と透
明電極の間に絶縁層を挿入しても、放電に必要な電流を
充分流すことが出来た。
【0008】
【実施例】次に本発明の実施例を図面を参照して説明す
る。ここでは従来例で説明した反射型AC面放電プラズ
マディスプレイパネルを例に取って説明するが、SnO
2系やITO、ZnO系の透明電極を用い、この抵抗値
を下げるために透明電極上に金属バス電極を形成するプ
ラズマディスプレイパネル全てに共通する発明である。
図2に本発明の一実施例の平面図を示す。図1に図2の
a−a′断面図を示す。図1に於て、基本的構造は従来
例で説明した図3と同じであるが、透明電極2の上に絶
縁層3を形成した点が異なる。この絶縁層3は例えばA
l2 O3 薄膜を300オングストローム程度蒸着する。
この上に形成する金属バス電極4のパターンニングは、
例えばAl等の薄膜をフォリソグラフィーか、Ag等の
厚膜をフォトリソグラフィーで行う。透明電極2と金属
バス電極4の間に絶縁層3を挟むことで、レジスト現像
時やエッチング時の電気化学反応による電極の腐食が防
げる。従って、断線の心配がなくなり、線幅を細くする
ことが可能になり、また歩留まりも大幅に向上した。透
明電極2と金属バス電極4の間のコンタクトは容量結合
による。絶縁層3の厚さは例えば300オングストロー
ムで、放電を発生させる隣合う透明電極2の間の距離が
例えば200μmである。これらの静電容量に大きな差
があるため、金属バス電極4に印加されたパルス電圧
は、ほとんど隣合う透明電極2の間にかかる。従って直
流に対しては絶縁されていても、AC型PDPの場合、
絶縁層3によって絶縁される金属バス電極4と透明電極
2の間の静電容量が充分に大きければ、ほとんどロス無
く駆動が可能となる。
【0009】なお、絶縁層3としてはAl2 O3 の他に
もSiO2 等の酸化物や、あるいは窒化物等の透光性を
有する物質の薄膜を用いることが出来る。また膜厚が充
分薄ければ低融点鉛ガラス等の厚膜でも良い。膜厚は本
発明の効果を奏し、且つ駆動電圧の上昇が実用的に問題
とならない範囲で選ぶことが出来る。
【0010】また、これまで透明電極とバス電極の間に
絶縁層を挟むとしてきたが、絶縁層は完全な絶縁物であ
る必要は必ずしも無く、高抵抗の物質であれば実質的に
は問題なく、同様の効果が得られる。
【0011】
【発明の効果】以上述べたように本発明のプラズマディ
スプレイパネルにより、透明電極の抵抗を下げる金属バ
ス電極を、電気化学反応による電極の腐食を防ぎながら
形成することが可能なプラズマディスプレイパネルを作
ることが出来た。Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma display panel used for an information display terminal or a flat panel television, and more particularly to a structure of a high definition and high brightness plasma display panel. 2. Description of the Related Art There are two types of plasma display panels: a monochrome panel that uses the emission color of Ne and a color panel that uses the emission color of a phosphor. Although the present invention is a technology common to both, here, a color plasma display panel is taken as an example. A color plasma display panel is a display that excites and emits a phosphor with ultraviolet rays generated by gas discharge to obtain visible light and performs a display operation, and can be classified into an AC type and a DC type according to a discharge method. AC
Among the molds, the reflection type AC surface discharge type is excellent in terms of luminance, luminous efficiency and life, so this is taken as an example. FIG. 4 is a plan view of a conventional reflective AC surface discharge plasma display panel. FIG. 3 shows a conventional reflection type AC shown by bb 'in FIG.
1 shows a sectional view of a surface discharge plasma display panel. In FIG. 3, a transparent electrode 31 is formed on a front substrate 30. A display discharge is obtained by applying a pulsed AC voltage of usually several tens of kHz to several hundreds of kHz between the adjacent transparent electrodes 31. When, for example, SnO 2 is used for the transparent electrode 31, the sheet resistance is usually several tens of kHz. Since the resistance is as high as Ω / □, especially in a large panel or a high-definition panel, the electrode resistance becomes several tens of kΩ, and the voltage pulse does not sufficiently rise and driving becomes difficult. Therefore, a metal bus electrode 32 is formed on the transparent electrode 31 to reduce the resistance value of the electrode. The metal bus electrode 32 is, for example, A
1 thin film. The patterning of the metal bus electrode 32 uses photolithography. The insulating layer 33 is covered from above. The insulating layer 33 is a thick film of, for example, low melting point lead glass. The protective layer 34 is formed on the insulating layer 33.
The protective layer 34 is formed of, for example, an MgO thin film or a thick film. On the other hand, a write electrode 38 is provided on a rear substrate 39.
Is formed, and this is covered with an insulating layer 37. Further, a phosphor 36 of the emission color of each pixel is applied to a portion to be each pixel. The above-mentioned front substrate 30 is adhered to the above through a partition wall 35 and hermetically sealed, and a dischargeable gas, for example, a mixed gas of He and Xe is sealed therein at about 250 torr. When a pulsed AC voltage is applied between adjacent transparent electrodes 31, gas discharge occurs and plasma 40 is generated. The phosphor 36 is excited by the ultraviolet light 41 generated here, and visible light 52 is obtained through the front substrate 30. In the color plasma display panel having the above-described structure, the metal bus electrode is usually formed by photolithography of a thin film of Al or the like. Occurs. Generally, when a substance bonded to a dissimilar metal is immersed in an electrolytic solution, an electrochemical reaction occurs. In this case, the dissimilar metals are a transparent electrode and a metal bus electrode, and the electrolytic solution is a resist developing solution or an etching solution. For example, in the case of SnO 2 and an Al thin film, when Al starts to dissolve in the electrolytic solution, a hydrogen generation reaction occurs, followed by reduction of SnO 2 , resulting in corrosion of the electrode. It is difficult to suppress this reaction. Accordingly, the metal bus electrode is disconnected due to corrosion, and the yield is greatly reduced. In order to prevent this, it is necessary to increase the line width of the metal bus electrode. However, in order not to lower the aperture ratio of the discharge cells, the metal bus electrode needs to be hidden under the partition, and must be formed with a line width as narrow as possible. It is limited by the line width of the bus electrode and must be thick. Then, the aperture ratio of the discharge cells decreases. However, since the aperture ratio of the discharge cell greatly affects the discharge characteristics and the average surface luminance of the panel, a method capable of forming a metal bus electrode with a small line width with a high yield is required. [0006] The present invention provides a plasma display panel having a transparent electrode group formed on a transparent insulating substrate and a metal electrode formed on the transparent electrode. Forming an insulating layer between the transparent electrode and the metal electrode ; and forming an insulating layer between the transparent electrode and the metal electrode.
Pulse voltage is almost lost by capacitive coupling between poles
It is characterized by having a thickness that can be transmitted without any change. The electrochemical reaction that occurs when developing the resist or forming the metal bus electrode by etching suppresses the current caused by the local battery action by sandwiching a thin insulating film between the transparent electrode and the metal bus electrode. As a result, it was possible to prevent the electrode from being corroded during the development of the resist or the etching of the metal bus electrode. The transparent electrode and the metal bus electrode are coupled by a capacitor via a thin insulating film. The capacitance is large because the thickness of the insulating film is sufficiently small. Therefore, even if an insulating layer was inserted between the metal bus electrode and the transparent electrode, a sufficient current required for discharge could be passed. Next, an embodiment of the present invention will be described with reference to the drawings. Here, the reflection type AC surface discharge plasma display panel described in the conventional example will be described as an example.
This invention is common to all plasma display panels that use a two- system, ITO, or ZnO-based transparent electrode and form a metal bus electrode on the transparent electrode to reduce the resistance.
FIG. 2 shows a plan view of one embodiment of the present invention. FIG. 1 is a sectional view taken along the line aa 'of FIG. In FIG. 1, the basic structure is the same as that of FIG. 3 described in the conventional example, except that the insulating layer 3 is formed on the transparent electrode 2. This insulating layer 3 is made of, for example, A
l 2 O 3 thin film is deposited about 300 angstroms.
The patterning of the metal bus electrode 4 formed thereon is performed as follows.
For example, a thin film of Al or the like is formed by photolithography, or a thick film of Ag or the like is formed by photolithography. By interposing the insulating layer 3 between the transparent electrode 2 and the metal bus electrode 4, corrosion of the electrode due to an electrochemical reaction during resist development or etching can be prevented. Therefore, there is no fear of disconnection, the line width can be reduced, and the yield is greatly improved. The contact between the transparent electrode 2 and the metal bus electrode 4 is based on capacitive coupling. The thickness of the insulating layer 3 is, for example, 300 angstroms, and the distance between adjacent transparent electrodes 2 for generating discharge is, for example, 200 μm. Since there is a large difference between these capacitances, the pulse voltage applied to the metal bus electrode 4 is applied between the adjacent transparent electrodes 2. Therefore, even if it is insulated against direct current, in the case of AC type PDP,
If the capacitance between the metal bus electrode 4 and the transparent electrode 2 that are insulated by the insulating layer 3 is sufficiently large, driving can be performed with almost no loss. As the insulating layer 3, a thin film of a light-transmitting substance such as an oxide such as SiO 2 or a nitride other than Al 2 O 3 can be used. If the film thickness is sufficiently small, a thick film such as a low melting point lead glass may be used. The film thickness can be selected in such a range that the effect of the present invention is exhibited and that the increase in the driving voltage does not cause a practical problem. Although an insulating layer has been sandwiched between the transparent electrode and the bus electrode, the insulating layer does not necessarily have to be a perfect insulator, and a high-resistance substance has substantially no problem. The same effect can be obtained. As described above, the plasma display panel of the present invention can form a metal bus electrode for lowering the resistance of a transparent electrode while preventing corrosion of the electrode due to an electrochemical reaction. I was able to make a panel.
【図面の簡単な説明】 【図1】本発明の一実施例の断面図である。 【図2】本発明の一実施例の平面図である。 【図3】従来例の断面図である 【図4】従来例の平面図である。 【符号の説明】 1,30 前面基板 2,31 透明電極 3,5,9,33,37 絶縁層 4,32 金属バス電極 6,34 保護層 7,35 隔壁 8,36 蛍光体 10,38 書き込み電極 11,39 後面基板 12,40 プラズマ 13,41 紫外光 14,42 可視光 15,43 放電セル[Brief description of the drawings] FIG. 1 is a sectional view of one embodiment of the present invention. FIG. 2 is a plan view of one embodiment of the present invention. FIG. 3 is a sectional view of a conventional example. FIG. 4 is a plan view of a conventional example. [Explanation of symbols] 1,30 Front substrate 2,31 transparent electrode 3,5,9,33,37 insulating layer 4,32 metal bus electrode 6,34 protective layer 7,35 partition wall 8,36 phosphor 10,38 Writing electrode 11,39 Rear substrate 12,40 plasma 13,41 UV light 14,42 visible light 15,43 discharge cell
Claims (1)
上に形成した金属電極とを有するプラズマディスプレイ
パネルに於いて、前記透明電極と前記金属電極との間に
絶縁膜を形成し、かつ前記絶縁層の膜厚が300オング
ストローム程度のAl 2 O 3 薄膜からなり前記透明電極と
前記金属電極との間に容量接合によってパルス電圧をほ
とんどロス無く伝達可能であることを特徴とするプラズ
マディスプレイパネル。(57) Claims: In a plasma display panel having a transparent electrode group formed on a transparent insulating substrate and a metal electrode formed on the transparent electrode, a portion between the transparent electrode and the metal electrode is provided . An insulating film is formed on the substrate, and the thickness of the insulating layer is 300 angstroms.
A plasma display panel, which is a little loss without transmission available-pulse voltage by capacitive junction between the transparent electrode and the metal electrode made of Al 2 O 3 thin film of about Strom.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4647892A JP2993263B2 (en) | 1992-03-04 | 1992-03-04 | Plasma display panel |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4647892A JP2993263B2 (en) | 1992-03-04 | 1992-03-04 | Plasma display panel |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH05250992A JPH05250992A (en) | 1993-09-28 |
JP2993263B2 true JP2993263B2 (en) | 1999-12-20 |
Family
ID=12748308
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4647892A Expired - Fee Related JP2993263B2 (en) | 1992-03-04 | 1992-03-04 | Plasma display panel |
Country Status (1)
Country | Link |
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JP (1) | JP2993263B2 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6281628B1 (en) | 1998-02-13 | 2001-08-28 | Lg Electronics Inc. | Plasma display panel and a driving method thereof |
JP2002042661A (en) | 2000-07-24 | 2002-02-08 | Nec Corp | Plasma display panel and method of manufacturing the same |
JP2003132805A (en) * | 2001-08-14 | 2003-05-09 | Sony Corp | Plasma display device |
WO2007099603A1 (en) * | 2006-02-28 | 2007-09-07 | Fujitsu Hitachi Plasma Display Limited | Plasma display panel |
JP2011134581A (en) * | 2009-12-24 | 2011-07-07 | Advanced Pdp Development Corp | Plasma display panel |
-
1992
- 1992-03-04 JP JP4647892A patent/JP2993263B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH05250992A (en) | 1993-09-28 |
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