JP2021032628A - 顕微鏡画像測定装置及び顕微鏡画像測定方法 - Google Patents
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Abstract
Description
測定対象物の表面に白色落射光を照射して前記表面の拡大像を得る顕微鏡と、前記拡大像の分光画像を得る分光カメラと、前記分光画像を波長毎に抽出して画像測定処理を行う画像処理部とを備え、前記顕微鏡は、波長毎に異なる焦点位置の像を前記分光カメラの撮像面に結像し、前記画像処理部は、測定箇所のコントラストが最も高い波長の分光画像を抽出してエッジ検出を行うことを特徴とする顕微鏡画像測定装置。
10:顕微鏡,10P:光軸,20:分光カメラ,30:画像処理部,
11:対物レンズ,12:白色光源,
13:ミラー,14,16:ハーフミラー,
15:モニターカメラ,17:チューブレンズ,
21:グレーティング素子(回折格子),
22:2次元カメラ.22a:撮像面,
23:スリット,24:リレーレンズ系,
31:分光画像保存部,32:分光画像抽出部,33:エッジ検出部,
34:パターン検出部,35:距離測定部,100:基板,101:透明層,
E1〜E3:エッジ,P1,P2:パターン,
W:測定対象物,Wa:表面
Claims (8)
- 測定対象物の表面に白色落射光を照射して前記表面の拡大像を得る顕微鏡と、
前記拡大像の分光画像を得る分光カメラと、
前記分光画像を波長毎に抽出して画像測定処理を行う画像処理部とを備え、
前記顕微鏡は、波長毎に異なる焦点位置の像を前記分光カメラの撮像面に結像し、
前記画像処理部は、測定箇所のコントラストが最も高い波長の分光画像を抽出してエッジ検出を行うことを特徴とする顕微鏡画像測定装置。 - 前記画像処理部は、異なる波長の分光画像で検出されたエッジ間の距離測定を行うことを特徴とする請求項1記載の顕微鏡画像測定装置。
- 前記画像処理部は、一つの波長の分光画像で検出されたエッジ点を連ねたパターンと他の波長の分光画像で検出されたエッジ点を連ねたパターンの相対位置を比較することを特徴とする請求項1記載の顕微鏡画像測定装置。
- 測定対象物の表面に白色落射光を照射して顕微鏡にて前記表面の拡大像を得ると共に、分光カメラにて前記拡大像の分光画像を得る工程と、
前記分光画像を波長毎に抽出して画像測定処理を行う工程とを備え、
前記顕微鏡は、波長毎に異なる焦点位置の像を前記分光カメラの撮像面に結像し、
前記画像測定処理では、測定箇所のコントラストが最も高い波長の分光画像を抽出してエッジ検出を行うことを特徴とする顕微鏡画像測定方法。 - 前記画像測定処理では、異なる波長の分光画像で検出されたエッジ間の距離測定を行うことを特徴とする請求項4記載の顕微鏡画像測定方法。
- 前記画像測定処理では、一つの波長の分光画像で検出されたエッジ点を連ねたパターンと他の波長の分光画像で検出されたエッジ点を連ねたパターンの相対位置を比較することを特徴とする請求項4記載の顕微鏡画像測定方法。
- 前記測定対象物は、表面の段差が前記顕微鏡の焦点深度以上の深さを有する基板であることを特徴とする請求項4〜6のいずれか1項記載の顕微鏡画像測定方法。
- 前記測定対象物は、前記顕微鏡の焦点深度以上の層間毎に測定対象のパターンを有する多層膜基板であることを特徴とする請求項4〜6のいずれか1項記載の顕微鏡画像測定方法。
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JP2019151061A JP2021032628A (ja) | 2019-08-21 | 2019-08-21 | 顕微鏡画像測定装置及び顕微鏡画像測定方法 |
US17/636,205 US11935259B2 (en) | 2019-08-21 | 2020-06-22 | Microscope image measuring device and microscope image measuring method |
KR1020227004502A KR20220046575A (ko) | 2019-08-21 | 2020-06-22 | 현미경 화상 측정 장치 및 현미경 화상 측정 방법 |
PCT/JP2020/024370 WO2021033416A1 (ja) | 2019-08-21 | 2020-06-22 | 顕微鏡画像測定装置及び顕微鏡画像測定方法 |
CN202080058120.0A CN114270134B (zh) | 2019-08-21 | 2020-06-22 | 显微镜图像测定装置及显微镜图像测定方法 |
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07229720A (ja) * | 1994-02-21 | 1995-08-29 | Nec Corp | 3次元形状測定装置 |
JPH10221607A (ja) * | 1997-02-04 | 1998-08-21 | Olympus Optical Co Ltd | 共焦点顕微鏡 |
JPH10293834A (ja) * | 1997-04-18 | 1998-11-04 | Rohm Co Ltd | 画像取得装置および合焦位置設定方法 |
JPH11132716A (ja) * | 1997-10-27 | 1999-05-21 | Sony Corp | フォトリソグラフィ工程における重ね合わせ精度測定方法、及びフォトリソグラフィ工程における重ね合わせ精度測定マーク |
JP2006337701A (ja) * | 2005-06-01 | 2006-12-14 | Olympus Corp | 走査型共焦点レーザ顕微鏡 |
JP2008014646A (ja) * | 2006-07-03 | 2008-01-24 | Olympus Corp | 基板検査方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101583895B (zh) * | 2007-01-19 | 2012-09-05 | 株式会社尼康 | 焦点检测装置和显微镜 |
US8649607B1 (en) * | 2010-01-25 | 2014-02-11 | Stc.Unm | Spectral ratio contrast for edge detection in spectral images |
JP5867194B2 (ja) * | 2012-03-13 | 2016-02-24 | 株式会社島津製作所 | 顕微鏡 |
JP2015166763A (ja) * | 2014-03-03 | 2015-09-24 | エバ・ジャパン 株式会社 | 顕微鏡装置および解析方法 |
CN106104261B (zh) * | 2014-03-07 | 2019-04-26 | 新日铁住金株式会社 | 表面性状指标化装置、表面性状指标化方法以及程序 |
JP6599698B2 (ja) | 2015-08-31 | 2019-10-30 | 株式会社ミツトヨ | 画像測定装置及びその制御プログラム |
JP6462823B2 (ja) | 2017-10-24 | 2019-01-30 | 株式会社キーエンス | 画像検査装置 |
US10621704B2 (en) * | 2017-12-13 | 2020-04-14 | Instituto Potosino de Investigación Cientifica y Tecnologica | Automated quantitative restoration of bright field microscopy images |
-
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- 2019-08-21 JP JP2019151061A patent/JP2021032628A/ja active Pending
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2020
- 2020-06-22 WO PCT/JP2020/024370 patent/WO2021033416A1/ja active Application Filing
- 2020-06-22 US US17/636,205 patent/US11935259B2/en active Active
- 2020-06-22 KR KR1020227004502A patent/KR20220046575A/ko not_active Application Discontinuation
- 2020-06-22 CN CN202080058120.0A patent/CN114270134B/zh active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07229720A (ja) * | 1994-02-21 | 1995-08-29 | Nec Corp | 3次元形状測定装置 |
JPH10221607A (ja) * | 1997-02-04 | 1998-08-21 | Olympus Optical Co Ltd | 共焦点顕微鏡 |
JPH10293834A (ja) * | 1997-04-18 | 1998-11-04 | Rohm Co Ltd | 画像取得装置および合焦位置設定方法 |
JPH11132716A (ja) * | 1997-10-27 | 1999-05-21 | Sony Corp | フォトリソグラフィ工程における重ね合わせ精度測定方法、及びフォトリソグラフィ工程における重ね合わせ精度測定マーク |
JP2006337701A (ja) * | 2005-06-01 | 2006-12-14 | Olympus Corp | 走査型共焦点レーザ顕微鏡 |
JP2008014646A (ja) * | 2006-07-03 | 2008-01-24 | Olympus Corp | 基板検査方法 |
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CN114270134B (zh) | 2024-11-29 |
CN114270134A (zh) | 2022-04-01 |
WO2021033416A1 (ja) | 2021-02-25 |
KR20220046575A (ko) | 2022-04-14 |
US20220284614A1 (en) | 2022-09-08 |
US11935259B2 (en) | 2024-03-19 |
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