JP2020525395A - 二酸化ケイ素および金属酸化物を製造するための液体原材料の噴霧蒸発 - Google Patents
二酸化ケイ素および金属酸化物を製造するための液体原材料の噴霧蒸発 Download PDFInfo
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- JP2020525395A JP2020525395A JP2019572602A JP2019572602A JP2020525395A JP 2020525395 A JP2020525395 A JP 2020525395A JP 2019572602 A JP2019572602 A JP 2019572602A JP 2019572602 A JP2019572602 A JP 2019572602A JP 2020525395 A JP2020525395 A JP 2020525395A
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- liquid raw
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- silicon
- silicon dioxide
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- 239000002994 raw material Substances 0.000 title claims abstract description 39
- 229910044991 metal oxide Inorganic materials 0.000 title claims abstract description 32
- 150000004706 metal oxides Chemical class 0.000 title claims abstract description 32
- 238000001704 evaporation Methods 0.000 title claims abstract description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 72
- 239000000377 silicon dioxide Substances 0.000 title claims description 32
- 235000012239 silicon dioxide Nutrition 0.000 title claims description 26
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- 229910052738 indium Inorganic materials 0.000 claims description 2
- 229910052749 magnesium Inorganic materials 0.000 claims description 2
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- ZOYFEXPFPVDYIS-UHFFFAOYSA-N trichloro(ethyl)silane Chemical compound CC[Si](Cl)(Cl)Cl ZOYFEXPFPVDYIS-UHFFFAOYSA-N 0.000 claims description 2
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
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- 230000003068 static effect Effects 0.000 description 4
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- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- LGQXXHMEBUOXRP-UHFFFAOYSA-N tributyl borate Chemical compound CCCCOB(OCCCC)OCCCC LGQXXHMEBUOXRP-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
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- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
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- C—CHEMISTRY; METALLURGY
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- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/14—Methods for preparing oxides or hydroxides in general
- C01B13/34—Methods for preparing oxides or hydroxides in general by oxidation or hydrolysis of sprayed or atomised solutions
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
- C01G23/07—Producing by vapour phase processes, e.g. halide oxidation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
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- Oxygen, Ozone, And Oxides In General (AREA)
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Abstract
Description
まず、オクタメチルシクロテトラシロキサン(D4)を、200リットルのバットに入れ、12.5kg/hの一定の搬送速度のギアポンプにより、熱媒油で加熱した管コイルへと搬送(図1、D)し、D4を150℃に予熱した。このように予熱したオクタメチルシクロテトラシロキサンを、この場合約2.8baraの背圧を生み出す0.7mmの内径を有するSCHLICK(Hollow−Cone Mod. 121)から一相ノズル(図1、E)に送る。ノズルの上流に設置されたフィルタ(図1、C)により、固体粒子が存在してもノズルが詰まらないことが保証される。一相ノズルにより微細に分布した予熱したD4を、295℃に予熱した空気流と混合する(図1、2)。液体オクタメチルシクロテトラシロキサンをこの予熱した空気に噴霧すると、80mmの直径および4.2メートルの長さを有する下流のパイプライン(バーナー管)(図1、A)中のD4が完全に蒸発し、ガス混合物が形成される。Sulzer製の下流のスタティックミキサー(計量添加ありのMischer CompaXTM)(図1、F)内で、6.25m3(STP)/hの水素(図1、3)を(一次H2)中で混合する。全成分を良好に混合することで、下流の反応域(図1、B)における原材料の完全かつ均質な転化が促進される。そのように生成されたガス混合物は、バーナーに供給され、51m/s(標準条件下)または99m/s(動作条件)の出口速度の計算値で、直径32mmのバーナーの口(図1、G)から出て、反応域(図1、B)に送られる。火炎を安定化させるために、いわゆる周辺炎を生成する。この目的のために、さらに3m3(STP)/hの水素が、ギャップ幅が1.5mmの同心環状ギャップから流出し、拡散パイロット火炎において燃える。高温の反応生成物は、55m3(STP)/hの外部から導入された空気(図1、6)により反応域に引き込まれる。反応後に生成される気体/固体混合物を200℃未満に冷却し、その後、フィルターシステムに空気圧式に供給する。ここで、形成された発熱性酸化物(10kg/h)を主気体流から分離し、バンカーに搬送する。この実験の成果に関するさらなる詳細は、表2に見ることができる。
例1と同様に、四塩化ケイ素(テトラクロロシラン、SiCl4)を、発熱性二酸化ケイ素を製造するための原材料として使用する。この実験の成果に関する詳細は、表2に見ることができる。
例1と同様に、四塩化チタン(TiCl4)を、発熱性二酸化チタンを製造するための原材料として使用する。この実験の成果に関する詳細は、表2に見ることができる。
Claims (15)
- 以下の工程:
a) 少なくとも1種のケイ素化合物および/または金属化合物を含む液体原材料をガスと混合して噴霧することでエアロゾルを形成する工程;
b) 工程a)で得られた前記エアロゾルから、これを完全に蒸発させることにより気体状反応混合物を形成する工程;
c) 工程b)で得られた前記気体状反応混合物を酸素の存在下で二酸化ケイ素および/または金属酸化物に転化する工程
を含む、二酸化ケイ素および/または金属酸化物を製造する方法。 - 工程a)で形成された前記エアロゾルが、2mm以下の数値平均粒径を有する液滴を含むことを特徴とする、請求項1記載の方法。
- 使用される前記液体原材料の量(kg)に対する工程a)およびb)で使用されるガス容積(標準立方メートル)の比が、0.1〜100m3(STP)/kgであることを特徴とする、請求項1または2記載の方法。
- 工程a)および/またはb)で使用される前記ガスが酸素を含むことを特徴とする、請求項1から3までのいずれか1項記載の方法。
- 前記液体原材料を工程a)の実施前に50〜500℃の温度に予熱することを特徴とする、請求項1から4までのいずれか1項記載の方法。
- 工程a)および/またはb)で使用される前記ガスを50〜400℃の温度に予熱することを特徴とする、請求項1から5までのいずれか1項記載の方法。
- 工程a)で使用される前記液体原材料は、工程a)の実施前に、圧力が少なくとも1.5barであり、工程b)で得られる前記ガス混合物は、圧力が1.2bar以下であることを特徴とする、請求項1から6までのいずれか1項記載の方法。
- 工程c)で使用される前記気体状反応混合物は、温度が、この混合物の露点温度より少なくとも10℃高いことを特徴とする、請求項1から7までのいずれか1項記載の方法。
- 前記液体原材料を少なくとも1つのノズルを通して噴霧することを特徴とする、請求項1から8までのいずれか1項記載の方法。
- 工程a)およびb)が同時に行われることを特徴とする、請求項1から9までのいずれか1項記載の方法。
- 気体状燃料を工程a)〜c)で少なくとも1回使用することを特徴とする、請求項1から10までのいずれか1項記載の方法。
- 前記金属酸化物が、金属成分として、Al、Ce、Fe、Mg、In、Ti、Sn、Y、Znおよび/またはZrの少なくとも1種の元素を含むことを特徴とする、請求項1から11までのいずれか1項記載の方法。
- 二酸化ケイ素を製造するためにケイ素化合物を使用することを特徴とする、請求項1から11までのいずれか1項記載の方法。
- 前記ケイ素化合物が、テトラアルコキシオルトシリケート、シラン、シリコーンオイル、ポリシロキサンおよび環状ポリシロキサン、シラザン、ならびにこれらの混合物から成る群より選択される非ハロゲン化化合物であることを特徴とする、請求項13記載の方法。
- 前記ケイ素化合物が、四塩化ケイ素、ジクロロシラン、トリクロロシラン、メチルトリクロロシラン、ジメチルジクロロシラン、メチルジクロロシラン、ジブチルジクロロシラン、エチルトリクロロシラン、プロピルトリクロロシランおよびこれらの混合物から成る群より選択される塩素化化合物であることを特徴とする、請求項13記載の方法。
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EP17179702.0A EP3424883A1 (de) | 2017-07-05 | 2017-07-05 | Sprühverdampfung eines flüssigen rohstoffes zur herstellung von siliciumdioxid und metalloxiden |
PCT/EP2018/067265 WO2019007782A1 (en) | 2017-07-05 | 2018-06-27 | EVAPORATION BY SPRAYING A LIQUID RAW MATERIAL FOR THE PREPARATION OF SILICON DIOXIDE AND METAL OXIDES |
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EP3565784B1 (de) | 2017-01-09 | 2020-11-11 | Evonik Operations GmbH | Verfahren zur herstellung metalloxiden mittels spraypyrolyse |
EP3495321A1 (de) | 2017-12-07 | 2019-06-12 | Evonik Degussa GmbH | Herstellung von pulverförmigen, porösen kristallinen metallsilikaten mittels flammensprühpyrolyse |
US20190217393A1 (en) | 2018-01-12 | 2019-07-18 | Hammond Group, Inc. | Methods for processing metal-containing materials |
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