JP2020060798A - Light source device, exposure device, lamp, maintenance method and device manufacturing method - Google Patents

Abstract

To provide a light source device capable of suppressing reduction of operation rate.SOLUTION: One aspect of the light source device has an installation part to which a lamp can be attached, and a gas supply port for supplying gas for cooling a cable connected for supplying power to the lamp.SELECTED DRAWING: Figure 2

Description

  The present invention relates to a light source device, an exposure device, a lamp, a maintenance method, and a device manufacturing method.

  The exposure apparatus used in the photolithography process irradiates the mask with the exposure light emitted from the light source device, and exposes the substrate through the pattern of the mask. The following patent documents disclose an example of a technique relating to a light source device that emits light emitted from a lamp.

JP, 2004-296125, A JP, 2007-335106, A

  When the temperature of the member forming the light source device rises excessively, it may be thermally deformed or damaged and the desired performance may not be exhibited, and as a result, the operating rate of the light source device may decrease. Further, even when the work (maintenance work, restoration work, replacement work, etc.) when the performance of the light source device is deteriorated cannot be smoothly executed, the operation rate of the light source device may be decreased. As a result, the operating rate of the exposure apparatus and the device productivity may be reduced.

  It is an object of an aspect of the present invention to provide a light source device and an exposure device that can suppress a decrease in operating rate. Moreover, the aspect of this invention aims at providing the device manufacturing method which can suppress the fall of productivity.

  According to a first aspect of the present invention, there is provided a light source device which emits light emitted from a lamp, wherein an opening in which at least a part of the lamp is arranged and the light is provided around the opening. There is provided a light source device including: a reflecting mirror having a concave reflecting surface that reflects light; and a reflecting surface air supply unit that guides gas to at least the reflecting surface near the opening.

  According to a second aspect of the present invention, there is provided a light source device for emitting light emitted from a lamp, comprising: a cable connected to a base portion of the lamp; and at least a part of the cable irradiated with the light. A light source device including a cable air supply unit that guides gas is provided.

  According to a third aspect of the present invention, there is provided a light source device which emits light emitted from a lamp, wherein an opening in which at least a part of the lamp is arranged and the light is provided around the opening. A reflecting mirror having a concave reflecting surface that reflects light, a flange portion connected to an edge portion of the exit of the reflecting mirror from which the light reflected by the reflecting surface is emitted, and arranged around the reflecting mirror. A holding member for holding the reflecting mirror, which integrally includes a holding body portion whose one end is connected to the flange portion and a plate portion connected to the other end of the holding body portion, the flange portion and the holding portion. A light-blocking member arranged in at least a part of the periphery of the back surface of the reflecting mirror opposite to the reflecting surface in the internal space of the holding member formed by the main body portion and the plate portion. A device is provided.

  According to a fourth aspect of the present invention, there is provided a light source device that emits light emitted from a lamp, the holding device having an insertion port into which a base portion of the lamp is inserted, and detachably holding the base portion. Mechanism, a housing member having an entrance / exit, capable of accommodating the holding mechanism that holds the lamp, and a first state in which the holding mechanism is provided and the holding mechanism fixes the lamp and the fixation of the lamp is released. And a movable range of the operation lever that is movable so as to change from one of the second states to the other, and a movable range of the operation lever that is moved together with the holding mechanism in a state where the mouthpiece portion is inserted into the insertion opening. A light source device including a regulation mechanism is provided.

  According to a fifth aspect of the present invention, there is provided a light source device for emitting light emitted from a lamp, the reflector having a reflecting surface arranged at least at a part of the periphery of the lamp, and having a doorway, A housing member that accommodates the lamp and the reflecting mirror; and a drawer member that is movable below the lamp and the reflecting mirror via the doorway and that can collect foreign matter in the internal space of the housing member. A light source device is provided.

  According to a sixth aspect of the present invention, a first support mechanism that supports the pattern holding member on which a pattern is formed, a second support mechanism that supports the photosensitive substrate, and any one of the first to fifth aspects. And an illumination device that exposes the photosensitive substrate through the pattern by irradiating the pattern holding member with the light emitted from the light source device.

  According to a seventh aspect of the present invention, using the exposure apparatus of the sixth aspect, the pattern is transferred onto the photosensitive substrate, and the photosensitive substrate on which the pattern is transferred is developed to form the pattern. A device manufacturing method is provided that includes forming a transfer pattern layer having a corresponding shape on the photosensitive substrate, and processing the photosensitive substrate via the transfer pattern layer.

  According to the aspects of the present invention, there is provided an illumination device and an exposure device capable of suppressing a decrease in operating rate. Further, according to the aspect of the present invention, there is provided a device manufacturing method capable of suppressing a decrease in productivity.

It is a schematic block diagram which shows an example of the exposure apparatus which concerns on this embodiment. It is a schematic block diagram which shows an example of the light source device which concerns on this embodiment. It is a figure which shows the holding member which concerns on this embodiment. It is a figure which shows the support member which concerns on this embodiment. It is the figure which looked at a holding member and a support member concerning this embodiment from the upper part. It is the schematic diagram which looked at the 1st air supply part and reflection surface which concern on this embodiment from the upper part. It is a schematic diagram which shows the 2nd air supply part and cable which concern on this embodiment. It is a figure which shows an example of the holding mechanism which concerns on this embodiment. It is a figure which shows an example of the holding mechanism which concerns on this embodiment. It is a figure which shows an example of the holding mechanism which concerns on this embodiment. It is a figure which shows the wire member which concerns on this embodiment. It is a figure for demonstrating an example of operation | movement of the light source device which concerns on this embodiment. It is a figure for explaining the stopper mechanism concerning this embodiment. It is a figure for demonstrating an example of operation | movement of the light source device which concerns on this embodiment. It is a figure for demonstrating an example of operation | movement of the light source device which concerns on this embodiment. 6 is a flowchart for explaining an example of a device manufacturing process.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. In the following description, an XYZ rectangular coordinate system is set, and the positional relationship of each part will be described with reference to this XYZ rectangular coordinate system. A predetermined direction in the horizontal plane is an X-axis direction, a direction in the horizontal plane orthogonal to the X-axis direction is a Y-axis direction, and a direction orthogonal to each of the X-axis direction and the Y-axis direction (that is, a vertical direction) is a Z-axis direction. Further, rotation (tilt) directions around the X axis, the Y axis, and the Z axis are defined as θX, θY, and θZ directions, respectively.

  FIG. 1 is a schematic configuration diagram showing an example of an exposure apparatus EX according to this embodiment. In FIG. 1, an exposure apparatus EX includes a mask stage 14 that is movable while supporting a mask M on which a pattern is formed, a substrate stage 15 that is movable while supporting a substrate P, and an exposure light EL emitted from a lamp 1. Of the exposure light EL emitted from the light source device 20, the illumination device IL that illuminates the mask M with the exposure light EL, and the mask M that is illuminated with the exposure light EL. A projection optical system PL for projecting a pattern image onto the substrate P and a control device 16 for controlling the operation of the entire exposure apparatus EX are provided.

  The mask M includes a reticle on which a device pattern projected on the substrate P is formed, and has a light-transmissive plate such as a glass plate and a light-shielding pattern formed on the plate with a light-shielding material such as chrome. . The pattern formed on the light-transmissive plate is not limited to the light-shielding pattern and may be at least one of the phase pattern and the dimming pattern. Further, in the present embodiment, a transmissive mask is used as the mask M, but a reflective mask may be used.

  The substrate P includes a photosensitive substrate for manufacturing a device, and has a base material such as a semiconductor wafer or a glass plate, and a photosensitive film formed on the base material. The photosensitive film is, for example, a film of a photosensitive material applied to a base material.

  The light source device 20 includes a lamp 1 that generates exposure light EL, a holding mechanism 21 that holds the lamp 1, a reflecting mirror 2 that is arranged at least at a part of the periphery of the lamp 1, and at least the lamp 1 and the reflecting mirror 2. A housing member (lamp house) 22 for housing is provided. In the present embodiment, the lamp 1 is a discharge lamp. The lamp 1 may be an incandescent lamp. The reflecting mirror 2 has a concave reflecting surface 2R that reflects the exposure light EL emitted from the lamp 1. In the present embodiment, the reflecting mirror 2 is an elliptical mirror, and the reflecting surface 2R is a spheroidal surface (a surface formed by rotating a part of an ellipse around its axis). The reflecting surface 2R of the reflecting mirror 2 may be a paraboloid of revolution or a spherical surface. In the following description, the reflecting mirror 2 will be appropriately referred to as an elliptic mirror 2.

The illumination device IL includes a dichroic mirror 3, a shutter 4, a collimator lens 5, a wavelength selection filter 6, an optical integrator 7, a field lens 8, a half mirror 9, a relay lens 10, a blind device 11, a condenser lens 12, a bending mirror 13, and the like. Is equipped with. The illuminator IL can irradiate a predetermined illumination area with the exposure light EL.
The illumination device IL illuminates a part of the mask M arranged in the illumination area with the exposure light EL having a uniform illuminance distribution.

  The light source device 20 may include the dichroic mirror 3. For example, the dichroic mirror 3 may be arranged inside the housing member 22.

  The mask stage 14 is movable with respect to the illumination area while supporting the mask M. The mask stage 14 can be moved in three directions of an X axis, a Y axis, and a θZ direction by the operation of a drive system 14D such as a linear motor.

  The projection optical system PL can irradiate a predetermined projection area with the exposure light EL. The projection optical system PL projects the image of the pattern of the mask M on a part of the substrate P arranged in the projection area at a predetermined projection magnification. The projection optical system PL of this embodiment is a reduction system whose projection magnification is, for example, 1/4, 1/5, 1/8, or the like. The projection optical system PL may be either a unity magnification system or a magnifying system. Further, the projection optical system PL may be a refraction system that does not include a reflection optical element, a reflection system that does not include a refraction optical element, or a catadioptric system that includes a reflection optical element and a refraction optical element. Further, the projection optical system PL may form either an inverted image or an erect image.

  The substrate stage 15 is movable with respect to the projection area while supporting the substrate P. The substrate stage 15 is movable in six directions of X axis, Y axis, Z axis, θX, θY, and θZ directions by the operation of a drive system 15D such as a linear motor.

  The positional information of the mask stage 14 and the substrate stage 15 is measured by the interferometer systems 14L and 15L, respectively. When the exposure process of the substrate P is performed or when a predetermined measurement process is performed, the mask stage 14 (mask M) and the substrate stage 15 (substrate P) of the mask stage 14 (mask M) are measured based on the measurement results of the interferometer systems 14L and 15L. Position control is executed.

  The illuminator IL illuminates the mask M supported by the mask stage 14 with the exposure light EL, and exposes the substrate P supported by the substrate stage 15 through the pattern of the mask M. The projection optical system PL projects an image of the pattern of the mask M supported by the mask stage 14 onto the substrate P supported by the substrate stage 15. The illuminator IL exposes the substrate P via the projection optical system PL.

  FIG. 2 is a diagram showing the configuration of the light source device 20 according to the present embodiment. As shown in FIG. 2, the light source device 20 includes a lamp 1, an elliptic mirror 2, a holding mechanism 21 for holding the lamp 1, a holding member 23 for holding the elliptic mirror 2, and a supporting member for supporting the holding member 23. 24, a housing member 22 capable of accommodating the lamp 1, the elliptic mirror 2, the holding mechanism 21, the holding member 23, and the support member 24, and a drawer member 25 capable of collecting foreign matter in the internal space 22H of the housing member 22. I have it.

  The lamp 1 comprises a super high pressure mercury lamp having a cathode and an anode. The lamp 1 emits light by evaporating the mercury enclosed in the arc tube. The lamp 1 has a first base portion 1A and a second base portion 1B. The first base portion 1A is provided on the anode side, and the second base portion 1B is provided on the cathode side. The first and second cap portions 1A and 1B are metal members such as molybdenum. The lamp 1 receives electric power via the first and second base portions 1A and 1B. The first base portion 1A is connected to the cable 26. The second mouthpiece portion 1B is connected to the holding mechanism 21. At least a part of the cable 26 is arranged at a position where the exposure light EL emitted from the lamp 1 or the exposure light EL reflected by the reflection surface 2R is emitted.

  The elliptical mirror 2 has an opening 2A in which at least a part of the lamp 1 is arranged, and a reflecting surface 2R which is provided around the opening 2A and reflects the exposure light EL emitted from the lamp 1. The exposure light EL reflected by the reflection surface 2R is emitted from the emission port 2B of the elliptic mirror 2. The exit 2B is larger than the opening 2A and is arranged at a position close to the second focus of the elliptical mirror 2. The elliptical mirror 2 has a base material formed of glass or the like and a dielectric conductive film formed on the surface of the base material. The reflecting surface 2R is formed of a dielectric conductive film. The dielectric conductive film is formed on the base material by a vapor deposition method. Of the light emitted from the lamp 1, light having a specific wavelength (exposure light EL) is reflected by the reflecting surface 2R, and light other than the specific wavelength passes through the elliptical mirror 2.

  FIG. 3 is a diagram showing the holding member 23. As shown in FIGS. 2 and 3, the holding member 23 is disposed around the elliptic mirror 2 and a flange portion 27 connected to the edge portion of the emission port 2B of the elliptic mirror 2, and the upper end is connected to the flange portion 27. And a plate portion 29 connected to the lower end of the holding body portion 28. The flange portion 27, the holding body portion 28, and the plate portion 29 are integrated. The flange portion 27 is fixed to the edge portion of the ejection port 2B. The plate portion 29 supports the lower portion of the elliptical mirror 2.

  In addition, the holding member 23 includes an internal space 30 formed by the flange portion 27, the holding main body portion 28, and the plate portion 29, and a back surface 2S of the elliptic mirror 2 on the opposite side of the reflection surface 2R in the internal space 30. It has the light shielding member 31 arrange | positioned at least one part of circumference | surroundings. In the present embodiment, the light blocking member 31 includes first and second light blocking members 31A and 31B arranged around the back surface 2S of the elliptic mirror 2. Each of the first and second light blocking members 31A and 31B is a tubular member that surrounds the elliptical mirror 2. The first light blocking member 31A is smaller than the second light blocking member 31B, and is supported by the holding body 28 and the elliptic mirror 2 in the internal space 30. The second light blocking member 31B is supported by the holding body 28 and the plate 29 so as to face the back surface 2S of the elliptic mirror 2 in the internal space 30. The holding body 28 is arranged around the second light shielding member 31B. The holding body portion 28 is not limited to a tubular shape, and has a structure in which an opening is appropriately provided on the side surface of the tube, a frame structure (for example, a bar-shaped frame is arranged in a cylindrical surface shape, a mesh structure, or the like). ) Or the like.

  4 is a view showing the support member 24, and FIG. 5 is a view of the support member 24 and the holding member 23 supported by the support member 24 as seen from above. As shown in FIGS. 2, 4 and 5, the support member 24 is arranged at least at a part of the periphery of the holding member 23. The support member 24 has a first portion 24A that supports the holding member 23 and a second portion 24B that supports the holding mechanism 21. The first portion 24A is formed with a plate member 32 having an upper surface 32T that supports the flange portion 27, and an internal space 33 that is connected to the lower surface of the plate member 32 and in which at least a portion of the holding member 23 is arranged. And a member 34. The second portion 24B has a second member 37 that is connected to the lower surface of the first member 34 and has a space 36 in which at least a part of the holding mechanism 21 is arranged.

  The plate member 32 has a gas inflow port 38 arranged in at least a part of the upper surface 32T, a gas outflow port 39, and an internal flow path 40 connecting the gas inflow port 38 and the gas outflow port 39. As shown in FIG. 5, the outer shape of the upper surface 32T is a quadrangle, and the gas inlet 38 is formed in the vicinity of each of the four corners of the upper surface 32T and in a predetermined region on the −X side with respect to the flange portion 27. There is. The gas that has flowed in from the gas inlet 38 flows through the internal flow path 40 and flows out from the gas outlet 39.

  As shown in FIG. 2, the light source device 20 is irradiated with the exposure light EL, and at least the first air supply unit (reflection surface air supply unit) 41 that guides the gas to the reflective surface 2R of the elliptic mirror 2 near the opening 2A. A second air supply portion (cable air supply portion) 42 that guides gas to at least a part of the cable 26, and a third air supply portion (back surface air supply portion) 43 that guides gas to the back surface 2S of the elliptic mirror 2. ing.

  The first air supply unit 41 includes a first air supply port 41A and a tube member 41T. The first air supply port 41A is arranged at a position facing the reflecting surface 2R. The first air supply port 41A is arranged at the tip of the tube member 41T. The first air supply port 41A is connected to a gas supply device (not shown) via an internal flow path of the tube member 41T. The gas supply device supplies a clean, temperature-controlled gas to the first air supply unit 41. The first air supply unit 41 guides the clean, temperature-adjusted gas from the first air supply port 41A to the reflecting surface 2R near the opening 2A.

  FIG. 6 is a schematic view of the first air supply port 41A, the tube member 41T, and the reflection surface 2R as seen from above. As shown in FIGS. 2 and 6, in the present embodiment, two first air supply ports 41A and tube members 41T are arranged. The two first air supply ports 41A are arranged symmetrically with respect to the center of the opening 2A. The first air supply port 41A guides the gas supplied from the gas supply device toward the reflecting surface 2R and causes the gas to flow along the reflecting surface 2R.

  The second air supply unit 42 includes a second air supply port 42A and a tube member 42T. The second air supply port 42A is arranged at a position facing the outer surface of the cable 26. The second air supply port 42A is arranged at the tip of the tube member 42T. The second air supply port 42A is connected to a gas supply device (not shown) via the internal flow path of the tube member 42T. The gas supply device supplies a clean and temperature-adjusted gas to the second air supply unit 42. The second air supply unit 42 guides the clean, temperature-controlled gas from the second air supply port 42A to the outer surface of the cable 26.

  FIG. 7 is a schematic diagram showing the second air supply port 42A, the tube member 42T, and the cable 26. In the present embodiment, the cable 26 is a wiring portion capable of supplying electric power to the first base portion 1A as disclosed in US Patent Application Publication No. 2008/0218049 and International Publication No. 2008/026709. 26A and a tube portion 26B in which a flow path through which the gas supplied to the first mouthpiece portion 1A flows is formed. The gas flowing through the tube portion 26B is supplied to the first mouthpiece portion 1A and cools the first mouthpiece portion 1A. The second air supply unit 42 guides the gas supplied from the gas supply device to at least a part of the cable 26 to which the exposure light EL is irradiated.

  The third air supply unit 43 is arranged on at least a part of the holding member 23 that can face the back surface 2S. The third air supply section 43 is arranged in the holding body section 28. As shown in FIG. 2, the gas outlet 39 is arranged near the third air supply unit 43. Since the holding member 23 is supported by the support member 24, the position of the third air supply unit 43 and the position of the gas outlet 39 coincide with each other. The gas outlet 39 supplies the gas flowing from the gas inlet 38 and flowing through the internal flow path 40 to the third air supply unit 43. The third air supply unit 43 guides at least a part of the gas from the gas outlet 39 to the back surface 2S.

The light blocking member 31 guides the gas guided from the third air supply unit 43 along the back surface 2S.
As shown in FIGS. 2 and 3, the first light blocking member 31A holds the internal space 30 so as to face the third air supply portion 43 and not to block the third air supply portion 43. It is arranged between the main body 28 and the elliptical mirror 2. In the present embodiment, the upper end of the first surface 311 of the first light shielding member 31A facing the third air supply unit 43 is connected to the inner surface of the holding body 28 near the upper end of the third air supply unit 43, and The lower end of the surface 311 is arranged at a position apart from the third air supply portion 43 (inner surface of the holding body portion 28).

The second light shielding member 31B is arranged between the holding body 28 and the plate 29 in the internal space 30 so as to face the back surface 2S and not to block the third air supply portion 43. .
In the present embodiment, the upper end of the second surface 312 of the second light shielding member 31B facing the first surface 311 with a gap is connected to the inner surface of the holding body 28 near the lower end of the third air supply unit 43, The lower end of the second surface 312 is connected to the upper surface of the plate portion 29.

  The holding member 23 is arranged at a position different from that of the third air supply unit 43, and has an exhaust port 44 for discharging at least a part of the gas introduced from the third air supply unit 43. The exhaust port 44 discharges at least a part of the gas in the internal space 30 into which the gas is guided from the third air supply unit 43, from the internal space 30. In the present embodiment, the exhaust port 44 is arranged in the plate portion 29. The exhaust port 44 is arranged in a part of the plate portion 29 between the back surface 2S of the elliptic mirror 2 and the second surface 312 of the second light shielding member 31B.

  As shown in FIG. 2, the housing member 22 has an air supply port 45 that guides external gas into the internal space 22H. In the present embodiment, at least one of the air supply ports 45 is formed in the upper plate of the housing member 22. The housing member 22 also has an exhaust port (not shown) for discharging the gas in the internal space 22H to the outside. For example, as disclosed in Japanese Unexamined Patent Application Publication No. 2004-296125, a fan device is arranged near the exhaust port in the internal space 22H. By operating the fan device, external gas is introduced into the internal space 22H of the housing member 22 through the air supply port 45. At least a part of the gas introduced from the air supply port 45 flows into the gas inflow port 38 and is supplied to the third air supply unit 43 via the internal flow path 40 and the gas outflow port 39. The third air supply unit 43 guides the gas to the back surface 2S. The gas guided by the light shielding member 31 and flowing through the inner space 30 along the back surface 2S is discharged from the exhaust port 44. At least a part of the gas discharged from the exhaust port 44 is discharged to the outside of the housing member 22 from the exhaust port in which the fan device is arranged.

  Next, the holding mechanism 21 will be described. The holding mechanism 21 has an insertion opening 46 into which the second base portion 1B of the lamp 1 is inserted, and includes the holding mechanism 21 that detachably holds the second base portion 1B. As described above, the holding mechanism 21 is supported by the support member 24 (second portion).

  8, 9, and 10 are views showing an example of the holding mechanism 21. The holding mechanism 21 includes a cylindrical member 47 having an insertion opening 46 into which the second base portion 1B at the lower end of the lamp 1 is inserted, a movable member 48 arranged around the cylindrical member 47 and movable in the Z-axis direction, A compression coil spring 50 arranged around the guide member 49, a connecting member 51 arranged at the lower end of the compression coil spring 50 and applying a force in the −Z direction generated by the compression coil spring 50 to the moving member 48, A roller 52 that opposes the pressed surface 1BT of the second mouthpiece 1B when the member 48 moves in the −Z direction, and retracts to a position that does not oppose the pressed surface 1BT when the moving member 48 moves in the + Z direction. The arm 53 is provided, a switching link mechanism 54 that applies a driving force toward the + Z direction to the moving member 48, and a rotating lever 55 that operates the switching link mechanism 54. By operating the rotation lever 55 provided on the holding mechanism 21, the holding mechanism 21 releases the first state in which the lamp 1 (second base portion 1B) is fixed and the lamp 1 (second base portion 1B) is fixed. It is possible to change from one of the second states to the other. FIG. 10 (A) shows the first state in which the lamp 1 is fixed, and FIG. 10 (B) shows the second state in which the fixing of the lamp 1 is released. The holding mechanism 21 that detachably holds the second base portion 1B of the lamp 1 is disclosed in US Patent Application Publication No. 2008/0218049 and International Publication No. 2008/026709.

  FIG. 11 is a schematic diagram of the light source device 20 viewed from the −Y side. As shown in FIG. 11, the light source device 20 includes a wire member 56 having one end connected to the housing member 22 and the other end connected to the rotation lever 55. A force can be applied to the rotary lever 55 via the wire member 56.

  FIG. 12 is a diagram showing an example of the operation of the light source device 20. In the present embodiment, the housing member 22 has an opening 22K on the −X side. The opening 22K is sufficiently large. As shown in FIG. 12, the support member 24, the holding mechanism 21 supported by the support member 24, the lamp 1, the holding member 23, and the elliptical mirror 2 can pass through the opening 22K. That is, the opening 22K functions as a doorway. The housing member 22 includes a door member capable of closing the opening 22K. When the support member 24 is arranged inside the housing member 22, the opening 22K is closed by the door member.

  As shown in FIG. 2, the light source device 20 is provided in the housing member 22, and a guide mechanism 57 that guides the supporting member 24 in the X-axis direction with respect to the housing member 22 so that the supporting member 24 passes through the opening 22K. Have. The guide mechanism 57 is arranged inside the housing member 22. When the support member 24 is taken out from the inside of the housing member 22 through the opening 22K, or when the support member 24 is put into the inside of the housing member 22 through the opening 22K, the support member 24 is guided by the guide mechanism 57. You can move while.

  The light source device 20 also includes a stopper mechanism 58 that fixes the position of the support member 24 housed in the housing member 22. The stopper mechanism 58 includes a stopper member 58A that is provided on the housing member 22 and is capable of contacting the convex member 24T disposed on the support member 24, and a support mechanism 58B that rotatably supports the stopper member 58A. The support mechanism 58B is arranged on the inner surface of the housing member 22 in the vicinity of the opening 22K.

  FIG. 13 is a diagram showing an example of the operation of the stopper mechanism 58. As shown in FIG. 13 (A), when the support member 24 is accommodated in the housing member 22, the stopper member 58A rotates so as to face the convex member 24T and comes into contact with the convex member 24T, whereby the support member 24 The position of is fixed. As a result, the support member 24 is prevented from coming out of the housing member 22 through the opening 22K. Further, as shown in FIG. 13B, the stopper member 58A rotates so as not to face the convex member 24T, so that the support member 24 can pass through the opening 22K and come out of the housing member 22. it can.

  FIG. 14 shows an example of the operation of moving the support member 24 from the outside to the inside of the housing member 22. When the support member 24 is housed in the housing member 22, the support member 24 moves inside the housing member 22 with the second mouthpiece portion 1B inserted in the insertion opening 46 of the holding mechanism 21. The holding mechanism 21 is supported by the support member 24 and moves into the housing member 22 together with the support member 24. Further, the rotary lever 55 provided in the holding mechanism 21 also moves inside the housing member 22 together with the holding mechanism 21.

  The wire member 56 having one end connected to the housing member 22 and the other end connected to the rotary lever 55 regulates the movable range of the rotary lever 55 that is moved together with the holding mechanism 21. The wire member 56 moves in the X-axis direction of the rotary lever 55 that is moved together with the holding mechanism 21 when the support member 24 that supports the holding mechanism 21 moves from the opening 22K to the inside of the housing member 22 (+ X direction). Regulate possible range.

  For example, as shown in FIG. 14 (A), the second base portion 1B is inserted into the insertion opening 46, and the holding mechanism 21 is in the second state (the holding mechanism 21 releases the fixation of the lamp 1). ), When the support member 24 moves inside the housing member 22, the movable range of the rotary lever 55 with respect to the X-axis direction (the movable range from the opening 22K to the + X direction) is regulated by the wire member 56. To be done. In the present embodiment, as shown in FIG. 14B, the wire member 56 is related to the X-axis direction so that the moving distance of the rotary lever 55 from the opening 22K in the X-axis direction does not exceed the predetermined distance L1. The movable range of the rotary lever 55 is restricted. The wire member 56 operates the rotating lever 55 so that the moving distance of a predetermined portion of the rotating lever 55 (for example, the tip of the rotating lever 55) does not exceed the predetermined distance L1. Thereby, as shown in FIG. 14C, the rotating lever 55 causes the wire member 56 to bring the holding mechanism 21 into the first state (the second mouthpiece portion 1B is fixed to the holding mechanism 21). )Operate.

Thus, when the predetermined portion of the rotary lever 55 enters the opening 22K by the predetermined distance L1 or more in the state where the second mouthpiece portion 1B is inserted into the insertion opening 46, the wire member 56 has the second mouthpiece portion 1B. The rotary lever 55 can be actuated so that is fixed to the holding mechanism 21.
As a result, even when the support member 24 is housed in the housing member 22 in a state where the second mouthpiece portion 1B is not fixed to the holding mechanism 21, with the movement of the support member 24 (holding mechanism 21), The rotation lever 55 can be operated so that the second mouthpiece portion 1B is fixed to the holding mechanism 21. Therefore, it is possible to suppress the occurrence of a problem such that power is supplied to the lamp 1 in a state where the second base portion 1B is not fixed to the holding mechanism 21.

  The pullout member 25 can pass through the opening 22K. The pull-out member 25 is movable below the lamp 1 and the elliptic mirror 2. The drawer member 25 is movable below the lamp 1 and the elliptical mirror 2 via the opening 22K. As shown in FIG. 2, in the present embodiment, the pullout member 25 is movable below the support member 24. The housing member 22 has a guide mechanism that guides the drawer member 25 in the X-axis direction with respect to the housing member 22 so as to pass through the opening 22K. When the drawer member 25 is taken out from the inside of the housing member 22 through the opening 22K, or when the drawer member 25 is put into the inside from the outside of the housing member 22 through the opening 22K, the drawer member 25 is guided by the guide mechanism. You can move.

  The drawer member 25 has an opening 25K in the upper part. The pull-out member 25 can collect foreign matter in the internal space 22H of the housing member 22. The pull-out member 25 can collect foreign matter generated from at least one of the lamp 1 and the elliptic mirror 2, for example. When at least one of the lamp 1 and the elliptic mirror 2 is damaged, the foreign matter generated from the lamp 1 and the elliptic mirror 2 is collected by the pull-out member 25 arranged below by the action of gravity. Thereby, the foreign matter can be collected smoothly. Further, in the present embodiment, the guide member 59 that guides the foreign matter in the internal space 22H of the housing member 22 to the opening 25K of the drawer member 25 is arranged in the internal space 22H of the housing member 22. The guide member 59 is arranged on at least a part of the periphery of the support member 24. The gap between the lower end of the guide member 59 and the pullout member 25 is sufficiently small. As a result, the foreign material can be collected by the pull-out member 25 while suppressing the scattering of the foreign material.

  Next, an example of the operation of the light source device 20 will be described. Electric power is supplied to the lamp 1 in order to emit the exposure light EL from the light source device 20. At least a part of the light generated from the lamp 1 is reflected by the reflecting surface 2R of the elliptic mirror 2 and supplied to the illuminator IL. Further, the fan device is driven, and gas flows from the air supply port 45 into the internal space 22H of the housing member 22. Further, the first air supply unit 41 guides the gas to the reflection surface 2R, and the second air supply unit 42 guides the gas to the cable 26.

  The reflecting surface 2R near the opening 2A is arranged at a position close to the lamp 1, and is heated by the light emitted from the lamp 1, so that the temperature may rise excessively. In the present embodiment, since the first air supply unit 41 guides the gas to the reflecting surface 2R near the opening 2A, the elliptic mirror 2 can be cooled by the gas. Therefore, it is possible to prevent an excessive temperature rise of the elliptic mirror 2 near the opening 2A.

  In the present embodiment, the first air supply port 41A of the first air supply unit 41 is arranged at a position facing the reflection surface 2R and does not substantially guide gas to the lamp 1. The optimum temperature of the lamp 1 for the lamp 1 to emit a desired light is different from the heat resistant temperature of the elliptical mirror 2 (dielectric conductive film). In general, the optimum temperature of the lamp 1 is higher than the heat resistant temperature of the elliptical mirror 2. In the present embodiment, the first air supply unit 41 does not substantially guide the gas to the lamp 1 but guides the gas to the reflecting surface 2R, so that the elliptic mirror 2 can be favorably operated while suppressing the temperature decrease of the lamp 1. Can be cooled.

At least a part of the cable 26 is arranged at a position where the exposure light EL is irradiated, and the cable 26 is heated by the exposure light EL, and there is a possibility that the temperature will rise excessively. In the present embodiment, since the second air supply unit 42 guides the gas to at least a part of the cable 26 to which the exposure light EL is irradiated, the cable 26 can be cooled by the gas. Therefore, it is possible to prevent an excessive temperature rise of the cable 26. In the present embodiment, the cable 26 includes a tube portion 26B through which gas for cooling the first mouthpiece portion 1A flows.
If the cable 26 is heated, the temperature of the gas supplied to the first mouthpiece portion 1A rises, which may make it difficult to cool the first mouthpiece portion 1A. In the present embodiment, since the cable 26 is cooled by the gas guided by the second air supply unit 42, it is possible to prevent the temperature of the gas supplied to the first mouthpiece unit 1A from rising.

  At least a part of the gas guided to the internal space 22H from the air supply port 45 of the housing member 22 flows into the gas inflow port 38. The gas flowing into the gas inflow port 38 is supplied to the third air supply unit 43 via the internal flow path 40 and the gas outflow port 39. The third air supply unit 43 guides the gas to the back surface 2S of the elliptical mirror 2. Thereby, the elliptical mirror 2 can be cooled. The gas introduced from the third air supply unit 43 into the internal space 30 and flowing through the internal space 30 is exhausted from the exhaust port 44. The fan device is driven with a predetermined drive amount so that the gas introduced from the air supply port 45 into the internal space 22H of the housing member 22 does not lower the lamp 1 below the optimum temperature.

  In the present embodiment, the light blocking member 31 (31A, 31B) functions as a guide member that guides the gas from the third air supply unit 43 along the back surface 2S, and can be satisfactorily guided to the back surface 2S. . The first light shielding member 31A is arranged so as to face the third air supply unit 43. Therefore, it is possible to prevent foreign matter in the internal space 22H from entering the third air supply portion 43. For example, when at least one of the lamp 1 and the elliptical mirror 2 is damaged and a foreign matter is generated, it is possible to prevent the foreign matter from entering the third air supply unit 43.

  Further, since the foreign matter in the internal space 22H of the housing member 22 is collected by the drawer member 25, the drawer member 25 can be pulled out and the foreign matter can be collectively processed. It can run smoothly.

  Further, in this embodiment, the elliptical mirror 2, the holding member 23, and the light blocking member 31 are integrated (unitized) to form an elliptic mirror unit. Since the elliptical mirror unit is easy to handle and easy to replace, maintenance work, replacement work, etc. can be smoothly performed. Further, since the elliptical mirror 2 is arranged in the internal space 30 of the holding member 23, even if the elliptic mirror 2 is damaged, the holding member 23 can suppress the scattering of foreign matter caused by the damage.

  Further, as described with reference to FIG. 14 and the like, in the present embodiment, the rotary lever 55 that is moved together with the support member 24 and the holding mechanism 21 in the state where the second mouthpiece portion 1B is inserted into the insertion opening 46. Since the wire member 56 that regulates the movable range (movable range) of the wire member 56 is provided, even if the holding mechanism 21 is housed in the housing member 22 without fixing the second mouthpiece portion 1B, By the action of 56, the second base portion 1B can be fixed by the holding mechanism 21.

  Next, an example of the replacement work of the lamp 1 will be described. The replacement work of the lamp 1 is performed by, for example, an operator.

  First, a procedure for taking out the lamp 1 arranged inside the housing member 22 will be described. The power supply to the lamp 1 (first and second base portions 1A and 1B) is stopped and the lamp 1 is turned off. For example, the operation of the power supply device connected to the lamp 1 is stopped, and the power supply to the lamp 1 is stopped. It is desirable not only to stop the operation of the power supply apparatus but also to operate the breaker (wiring circuit breaker) to cut off the power supply from the power company to the power supply apparatus. After a lapse of a first time (for example, 30 minutes) from turning off the lamp 1, the door member is operated to open the opening 22K, and one end of the cable 26 is removed from the first cap portion 1A. The other end of the cable 26 is also disconnected from the connector provided on the housing member 22. In this embodiment, the cable 26 can be removed without using a tool.

  Next, the stopper member 58A is operated to release the fixing by the stopper mechanism 58 to the support member 24. The fixing to the support member 24 can be released only by operating the stopper member 58A without using a tool. Then, the support member 24 is exposed to the outside of the housing member 22 through the opening 22K. Since the guide mechanism 57 is provided, the support member 24 can be moved smoothly.

  After the support member 24 is exposed to the outside of the housing member 22, the rotary lever 55 is operated to release the fixing of the holding mechanism 21 to the second cap portion 1B (lamp 1). The fixing to the second mouthpiece portion 1B can be released only by operating the rotary lever 55 without using a tool.

  Then, the lamp 1 is removed from the holding mechanism 21. In this embodiment, heat-resistant gloves are prepared, and the heat-resistant gloves can be used to remove the lamp 1 from the holding mechanism 21.

  Next, a procedure of attaching the new lamp 1 to the holding mechanism 21 and disposing it inside the housing member 22 will be described. After inserting the second base portion 1B of the new lamp 1 into the insertion opening 46 of the holding mechanism 21, the rotary lever 55 is operated to fix the second base portion 1B (lamp 1) by the holding mechanism 21. The second mouthpiece portion 1B can be fixed by the holding mechanism 21 only by operating the rotary lever 55 without using a tool.

  Then, the support member 24 is put into the housing member 22 through the opening 22K. Since the guide mechanism 57 is provided, the support member 24 can be moved smoothly. Further, in the present embodiment, since the wire member 56 is provided, as described with reference to FIG. 14, the support member 24 is fixed in the state where the second mouthpiece portion 1B is not fixed to the holding mechanism 21. Even when it is housed in the housing member 22, the second cap portion 1B can be fixed by the holding mechanism 21 as the support member 24 (holding mechanism 21) moves.

  After moving the support member 24 into the housing member 22, the stopper member 58A is operated to fix the position of the support member 24 by the stopper mechanism 58. The support member 24 can be fixed by the stopper mechanism 58 without using a tool. Then, one end of the cable 26 is connected to the first base portion 1A, and the other end is connected to a connector provided on the housing member 22. The cable 26 can be connected without the use of tools. If one end of the cable 26 is not properly connected to the first mouthpiece portion 1A, a gap is formed between the one end of the cable 26 and the first mouthpiece portion 1A. It is possible to confirm whether or not it is properly connected to the first base portion 1A. Similarly, it can be confirmed whether or not the other end of the cable 26 and the connector provided on the housing member 22 are properly connected.

  After attaching the cable 26, the door member is operated to close the opening 22K. Then, power is supplied to the lamp 1 to light the lamp 1. With the above, the replacement work of the lamp 1 is completed. In this embodiment, the replacement work of the lamp 1 can be performed without using a tool.

  In this embodiment, the elapsed time after the lamp 1 is turned off is measured. In the present embodiment, the control device 16 measures the elapsed time after the lamp 1 is turned off. The power supply device may measure. For example, in the case where the lamp 1 is not replaced, if the time from turning off the lamp 1 to lighting (relighting) the lamp 1 is short, the lamp 1 may be deteriorated or damaged. To prevent the lamp 1 from being damaged by turning on the lamp 1 after checking whether the elapsed time after the lamp 1 is turned off exceeds a predetermined second time (for example, 15 minutes). You can Further, in the present embodiment, the exposure apparatus EX includes a display device such as a flat panel display, and can display the elapsed time after the lamp 1 is turned off on the display device.

  As described above, according to the present embodiment, it is possible to suppress the excessive temperature rise of the elliptical mirror 2, the cable 26, etc. while maintaining the optimum temperature of the lamp 1. Therefore, the light source device 20 can exhibit desired performance and can suppress a decrease in the operating rate of the light source device 20.

  Further, according to the present embodiment, when the performance of the light source device 20 is deteriorated due to damage of the lamp 1, the elliptic mirror 2, or the like, maintenance work for allowing the light source device 20 to exhibit desired performance, It is possible to perform restoration work and replacement work smoothly with good workability. Therefore, it is possible to suppress a decrease in the operating rate of the light source device 20.

  In the above embodiment, the case where the restricting mechanism that restricts the movable range of the rotating lever 55 includes the wire member 56 has been described as an example. However, as shown in FIG. 15, for example, as shown in FIG. A fixed convex member 56B may be provided. The convex member 56B is fixed to the inner surface of the housing member 22 on the −Y side and projects to the + Y side. The convex member 56B is arranged at a position at a predetermined distance L1 from the opening 22K. When the support member 24 moves from the opening 22K to the inside of the housing member 22 (+ X direction), the rotation lever 55B that is moved together with the holding mechanism 21 is restricted in the movable range in the X-axis direction by the convex member 56B. .

  For example, when the holding mechanism 21 is in the second state as shown in FIG. 15A, when the support member 24 moves inside the housing member 22, as shown in FIG. 55B contacts the convex member 56B. With the rotation lever 55B and the convex member 56B in contact with each other, the support member 24 moves in the + X direction, so that as shown in FIG. Operates to the first state.

  In the above-described embodiment, the exposure apparatus EX includes a plurality of projection optical systems PL and projects the image of the pattern of the mask M onto the substrate P while synchronously moving the mask M and the substrate P in a predetermined scanning direction. A so-called multi-lens type scan exposure apparatus may be used.

  The substrate P of the above-described embodiment is not limited to a glass substrate for a display device, but a semiconductor wafer for manufacturing a semiconductor device, a ceramic wafer for a thin film magnetic head, or an original plate of a mask or reticle used in an exposure apparatus ( Synthetic quartz, silicon wafer) or the like is applied.

  The exposure apparatus EX is a step-and-scan type scanning exposure apparatus (scanning stepper) that moves the mask M and the substrate P synchronously and scans and exposes the substrate P with the exposure light EL that passes through the pattern of the mask M. In addition, the present invention is applicable to a step-and-repeat type projection exposure apparatus (stepper) in which the pattern of the mask M is collectively exposed while the mask M and the substrate P are stationary and the substrate P is sequentially moved. You can

  The present invention also relates to a twin stage type exposure having a plurality of substrate stages as disclosed in US Pat. No. 6,341,007, US Pat. No. 6,208,407, US Pat. No. 6,262,796 and the like. It can also be applied to devices.

  The present invention also provides a substrate stage for holding a substrate, such as disclosed in US Pat. No. 6,897,963, European Patent Application Publication No. 1713113, and the like. It can also be applied to an exposure apparatus provided with a formed reference member and / or a measurement stage on which various photoelectric sensors are mounted. Further, it is possible to employ an exposure apparatus including a plurality of substrate stages and a measurement stage.

  The type of the exposure apparatus EX is not limited to the exposure apparatus for manufacturing a liquid crystal display element or a display, and an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern on the substrate P, a thin film magnetic head, an image sensor (CCD). , A micromachine, a MEMS, a DNA chip, or an exposure apparatus for manufacturing a reticle, a mask, or the like.

  In each of the above-described embodiments, the position information of each stage is measured using an interferometer system including a laser interferometer, but the present invention is not limited to this, and for example, a scale (diffraction grating) provided in each stage. You may use the encoder system which detects.

  In the above-described embodiment, the light-transmissive mask in which a predetermined light-shielding pattern (or phase pattern / dimming pattern) is formed on the light-transmissive substrate is used, but instead of this mask, for example, US Pat. As disclosed in Japanese Patent No. 6778257, a variable shaped mask (also called an electronic mask, active mask, or image generator) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed. ) May be used. Further, a pattern forming apparatus including a self-luminous image display element may be provided instead of the variable shaping mask including the non-luminous image display element.

  The exposure apparatus EX of the above-described embodiment is manufactured by assembling various subsystems including the constituent elements recited in the claims of the present application so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. To be done. Before and after this assembly, adjustments to achieve optical precision for various optical systems, adjustments to achieve mechanical precision for various mechanical systems, and various electrical systems to ensure these various types of precision are made. Are adjusted to achieve electrical accuracy. The process of assembling the exposure apparatus from the various subsystems includes mechanical connection, electrical circuit wiring connection, air pressure circuit pipe connection, and the like between the various subsystems. It goes without saying that there is an individual assembly process for each subsystem before the assembly process from these various subsystems to the exposure apparatus. When the process of assembling the various subsystems into the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies of the exposure apparatus as a whole. It is desirable that the exposure apparatus be manufactured in a clean room where the temperature and cleanliness are controlled.

  As shown in FIG. 16, a microdevice such as a semiconductor device has a step 201 of designing a function / performance of the microdevice, a step 202 of manufacturing a mask (reticle) based on the design step, and a substrate which is a base material of the device. Step 203 of manufacturing the substrate, exposing the substrate with exposure light from the pattern of the mask and transferring the pattern to the substrate P, developing the substrate on which the pattern is transferred, and corresponding the pattern according to the above-described embodiment. A substrate processing step 204 including forming a transfer pattern layer having a shape on the substrate and processing the substrate through the transfer pattern layer; a device assembly step (including a processing process such as a dicing process, a bonding process, a packaging process) It is manufactured through 205, inspection step 206 and the like.

  The requirements of the above-described embodiments and modifications can be combined as appropriate. In addition, some components may not be used. Further, as far as legally permitted, the disclosures of all publications and US patents relating to the exposure apparatus and the like cited in the above-described embodiments and modifications are incorporated by reference and made a part of the description of the text.

  DESCRIPTION OF SYMBOLS 1 ... Lamp, 1A ... 1st base part, 1B ... 2nd base part, 2 ... Reflecting mirror, 2A ... Opening part, 2B ... Ejection port, 2R ... Reflecting surface, 2S ... Back surface, 14 ... Mask stage, 15 ... Substrate Stage, 20 ... Light source device, 21 ... Holding mechanism, 22 ... Housing member, 22H ... Internal space, 22K ... Opening, 23 ... Holding member, 25 ... Drawer member, 26 ... Cable, 27 ... Flange section, 28 ... Holding body section , 29 ... Plate part, 30 ... Internal space, 32T ... Top surface, 31 ... Light blocking member, 31A ... First light blocking member, 31B ... Second light blocking member, 38 ... Gas inlet, 39 ... Gas outlet, 40 ... Internal flow Passage 41: first air supply section 42: second air supply section 43: third air supply section 44: exhaust port 46: insertion port 55: rotary lever 56: wire member 57: guide mechanism , 58 ... Stopper mechanism, EL ... Exposure light, IL ... Akira apparatus, M ... mask, P ... substrate, PL ... projection optical system

Claims (1)

A mounting part where the lamp can be attached and detached,
A light source device that supplies a gas that cools a cable connected to supply power to the lamp.

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