JP2019072360A - Cleaning system and cleaning method, and information processing device, method of controlling the same, and program - Google Patents

Abstract

To provide a gas cleaning system having a proper cleaning ability.SOLUTION: A cleaning system has a production device that produces cleaning liquid, a cleaning device that cleans a gas with cleaning liquid, and a sensor that acquires contamination information of the gas. The cleaning system stores a parameter for producing cleaning liquid with the cleaning device, identifies a parameter for producing cleaning liquid corresponding to the contamination information acquired with the sensor, and controls so that the production device produces cleaning liquid with the identified parameter for producing cleaning liquid.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a cleaning system and a cleaning method capable of providing an appropriate cleaning capability in a gas cleaning system, an information processing apparatus, a control method thereof, and a program.

  With increasing environmental awareness, when operating an apparatus or facility that generates odor, it is essential to take measures to reduce the odor. As a method of reducing the odor in the exhaust, a method is known in which the odor component in the exhaust is dissolved in water by washing the exhaust with water or a treatment liquid. There is also known a method of improving the odor reduction efficiency by using a treatment liquid having a deodorizing action at this time. For example, Patent Document 1 discloses a deodorizing device that reduces the odor in the air by spraying hypochlorous acid water on the air fed into the inside and exhausts the air in which the odor is reduced. ing.

Unexamined-Japanese-Patent No. 2012-100717

  For example, the exhaust generated from the compost layer does not always maintain a constant odor concentration. Sometimes it is a high concentration odor, sometimes it is a low concentration odor, and it is not constant.

  According to the structure of Patent Document 1, when cleaning the gas, it is not possible to adjust the cleaning capability in consideration of the concentration of the gas to be cleaned. That is, in the structure of Patent Document 1, since the cleaning ability is fixed, the cleaning ability must be maintained in a state higher than necessary, and there is a problem that the cost for cleaning the gas becomes high.

  Therefore, an object of the present invention is to provide a mechanism capable of providing an appropriate cleaning capability in a gas cleaning system.

  In order to achieve the above object, the cleaning system of the present invention is a cleaning system including a generating device for generating a cleaning solution, a cleaning device for cleaning a gas with the cleaning solution, and a sensor for acquiring contamination information of the gas. Storing means for storing parameters for generating the cleaning solution by the cleaning device, specifying means for specifying a parameter for generating the cleaning solution corresponding to the contamination information acquired by the sensor, and And a control unit configured to control the generation device to generate the cleaning liquid at a parameter for generating the cleaning liquid specified by a specific unit.

  According to the present invention, it is possible to provide an appropriate cleaning capability in a gas cleaning system.

It is a schematic diagram which shows an example of the system configuration | structure figure of the washing | cleaning system in this embodiment. It is a schematic diagram which shows an example of the hardware constitutions of the deodorizing apparatus 200. As shown in FIG. FIG. 2 is a schematic view showing an example of a hardware configuration of the information processing apparatus 100. FIG. 3 is a schematic view showing an example of a functional configuration of the information processing apparatus 100. It is a flowchart explaining the flow of a detailed process in a 1st embodiment. 6 is a data table showing an example of a setting value table 600. It is a flowchart explaining the flow of a detailed process in a 2nd embodiment. It is a data table which shows an example of the setting value table 800. It is a flowchart explaining the flow of a detailed process in 3rd Embodiment. 6 is a data table showing an example of a setting value table 1000. It is a flowchart explaining the flow of a detailed process in a 4th embodiment. 6 is a data table showing an example of a setting value table 1200. It is a schematic diagram which shows an example of the hardware constitutions of the deodorizing apparatus 200 in 2nd Embodiment.

  Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. The embodiment described below shows an example when the present invention is specifically implemented, and is only a specific example of the configuration described in the claims. In particular, the cleaning device, the cleaning system, and the cleaning method according to the present invention are not limited to devices, systems, and methods whose main purpose is to deodorize a gas to be deodorized. The cleaning apparatus, the cleaning system, and the cleaning method according to the present invention are for cleaning gas, and can be used for various purposes other than deodorization. For example, the cleaning apparatus, the cleaning system, and the cleaning method according to the present invention can also be used for the removal of bacteria in a gas. Therefore, the cleaning device, the cleaning system, and the cleaning method according to the present invention include devices, systems and methods which are mainly intended for purposes other than deodorization but can be used for deodorization. Hereinafter, an embodiment of the present invention will be described with an example of a (wet) deodorizing device, a deodorizing system, and a deodorizing method mainly intended to deodorize a gas to be deodorized.

  FIG. 1 is a system configuration diagram showing an example of the configuration of a deodorizing system (corresponding to a cleaning system) that controls the physical amount of the cleaning solution. The deodorizing system includes an information processing apparatus 100 that controls the cleaning system, a generating apparatus 400 that generates a cleaning liquid, and a deodorizing apparatus 200 that deodorizes an odor using the cleaning liquid. In the present embodiment, in the production apparatus 400, hypochlorous acid water, which is a cleaning liquid, is generated using a carbon dioxide gas mixing method. The carbon dioxide gas mixing method is a method of mixing sodium hypochlorite, carbon dioxide and water to produce hypochlorous acid water. The hypochlorous acid water may be produced by another method. The generating device 400 is connected to the deodorizing device 200, and the cleaning liquid 410 generated by the generating device 400 flows into the deodorizing device 200. The cleaning unit of the deodorizing apparatus 200 is provided with a sensor. The sensor will be described in detail in FIG. The gas 500 to be deodorized is supplied via the inflow port 101, and the gas 500 to be deodorized is deodorized by the cleaning unit in the deodorizing apparatus 200. The cleaning solution 410 overflowed by the deodorizing apparatus 200 is drained out through the outlet 103.

  This is the end of the description of the system configuration of the control system shown in FIG. The above-described system configuration is an example, and can be changed as appropriate according to the purpose and application.

  Next, the hardware configuration of the deodorizing apparatus 200 according to the present embodiment will be described using FIG.

Embodiment 1
The wet deodorizing apparatus according to the first embodiment includes an inlet, a cleaning unit, an outlet, a cleaning solution supply unit, and an air bubble supply unit. FIG. 2: (A) (B) is schematic which shows the structure of an example of the wet deodorizing apparatus which concerns on Embodiment 1, respectively. The wet deodorizing apparatus according to the present embodiment will be described below with reference to FIGS.

  FIG. 2 (A) shows a deodorizing apparatus 200A according to the present embodiment, and FIG. 2 (B) shows a deodorizing apparatus 200B according to the present embodiment. A gas to be cleaned (deodorization target) flows into the deodorizing devices 200 A and 200 B via the inlet 101, and the gas flowing in is deodorized by washing with the cleaning liquid 122 and flows out via the outlet 103. In the present specification, the gas to be cleaned is referred to as a first gas.

  From the inflow port 101, the gas to be deodorized flows into the interior of the deodorizing devices 200A and 200B. For example, a pump (not shown) can be used to send the gas to be deodorized to the inlet 101. Here, the pump for sending the gas to the inlet 101 may be disposed either inside or outside the deodorizing devices 200A, 200B. The type of gas to be deodorized is not particularly limited. The high deodorizing performance of the deodorizing apparatuses 200A and 200B according to the present embodiment is suitable for deodorizing a gas having a high odor concentration. For example, as a gas to be deodorized, there may be mentioned a gas produced by fermentation of an organic substance, including the exhaust from a container for storing food waste or human waste. A specific example of the object to be deodorized includes the exhaust from compost (compost producing apparatus).

  The odor component to be removed is not particularly limited. Here, as an example of the odor component in the compost, a basic component such as ammonia or trimethylamine, a sulfide component such as methyl mercaptan, an aldehyde component such as acetaldehyde, or a carboxylic acid component such as propionic acid It can be mentioned. The deodorizing devices 200A, 200B according to the present embodiment are particularly suitable for reducing the ammonia concentration. For example, in one embodiment, the ammonia concentration of the gas to be deodorized is 100 ppm or more when cooled by the cooler, and is 3000 ppm or more when not cooled by the cooler. Further, the gas to be deodorized to flow in from the inflow port 101 may be a gas after being processed by another device such as a deodorizing device.

  The cleaning unit 120 cleans the gas to be deodorized, which has flowed into the deodorizing devices 200A and 200B, with the first cleaning solution 122. The cleaning unit 120 has a contact unit 121 where the gas to be deodorized contacts the first cleaning solution 122, and a portion where the first cleaning solution 122 is stored. In one embodiment, the first cleaning liquid 122 is stored in the lower part of the deodorizing devices 200A, B, so the washing unit 120 is also located in the lower part of the deodorizing devices 200A, B.

  FIG. 1C is an enlarged view of one of the contact portions 121 of FIG. 2A. A process of mixing the gas to be deodorized and the first cleaning solution 122 will be described using FIG. 1 (C). First, the gas to be deodorized moves toward the flow path narrowing portion 123 by being accelerated by the pump. In the example of FIG. 2A, the gas to be deodorized passes through the flow path narrowing portion 123 provided in the contact portion 121 and in close proximity to the liquid surface of the first cleaning liquid 122. At this time, since the flow of the gas to be deodorized is accelerated, it occurs after the vortex with the first cleaning liquid 122 passes through the passage narrowing portion. Therefore, the gas to be deodorized and the first cleaning liquid 122 are efficiently mixed, and the gas to be deodorized is cleaned. Thus, the cleaning unit 120 can mix the gas to be deodorized and the first cleaning solution 122, and can also stir the gas to be deodorized and the first cleaning solution 122 in one embodiment. . In the example of FIG. 2A, the cleaning unit 120 includes two contact parts 121 having a flow path narrowing part, but the number of the contact parts 121 is not particularly limited. For example, if it is desired to further improve the deodorizing efficiency, the deodorizing devices 200A and 200B may be provided with three or more contact portions (flow path narrowing portions). Moreover, the deodorizing devices 200A and 200B can be made smaller than in the case of including a plurality of contact portions by setting the number of the contact portions 121 to one.

  In the example shown in FIG. 2B, the gas to be deodorized passes through the inside of the first cleaning liquid 122 at the contact portion 121, and the gas to be deodorized is cleaned at this time. In the example of FIGS. 2A and 2B, the level of the liquid surface of the first cleaning liquid 122 is uneven due to the pressure of the gas to be deodorized flowing from the inflow port 101. The height of the liquid surface of the first cleaning liquid 122 is set to be higher than the inlet 153 and the outlet 154 and lower than the outlet 180. Further, the height of the liquid surface of the first cleaning liquid 122 during cleaning is close to the flow path narrowing portion 123. That is, by discharging the first cleaning liquid 122 by the outlet 180, it is possible to suppress the water level from becoming too high, and it becomes possible to discharge the first cleaning liquid 122 used for cleaning. . By maintaining the water level higher than the inlet 153 and the outlet 154, bubbles can be supplied to the first cleaning solution 122.

  However, the configuration of the cleaning unit 120 is not limited to this. For example, in the cleaning unit 120, the first cleaning solution 122 may be sprayed. In this case, the gas to be deodorized is cleaned when it passes through the mist of the first cleaning solution 122. Further, in the cleaning unit 120, the gas to be deodorized that has flowed in from the inflow port 101 may be bubbled into the first cleaning solution 122, and in this case also, the gas to be deodorized can be cleaned by the first cleaning solution 122.

  From the outlet 103, the gas after being cleaned by the first cleaning solution 122 flows out. The gas flowing out of the outlet 103 may be released to the atmosphere or may be further processed by another device such as a deodorizing device. Thus, the gas after being discharged from the outlet 103 is reduced in odor component to be deodorized as compared with the gas to be deodorized before flowing into the inlet 101. Specifically, when the odor to be deodorized is an odor from compost, the ammonia concentration is at least reduced by the cleaning processing by the deodorizing devices 200A and 200B.

  Next, the internal structure of the deodorizing devices 200A and 200B will be described. The inside of deodorizing apparatus 200A, B is divided into several divisions. The deodorizing devices 200A and 200B have an inflow section 131, and the inflow section 131 is provided with an inflow port 101. The inflow section 131 is a portion on the upstream side of the cleaning unit 120 where the cleaning with the first cleaning liquid 122 is performed, that is, a section between the inlet 101 and the cleaning unit 120. In addition, the deodorizing devices 200A, 200B have an outflow section 141, and the outflow section 141 is provided with an outlet 103. The outflow section 141 is a portion on the downstream side of the cleaning unit 120 where the cleaning with the first cleaning solution 122 is performed, that is, a section between the cleaning unit 120 and the outlet 103.

  The cleaning solution supply units 130 and 140 supply a second cleaning solution different from the first cleaning solution 122. The cleaning liquid supplies 130 and 140 can supply the second supply liquid so as to be mixed with the first cleaning liquid 122 used for cleaning in the cleaning section 120. Here, in at least one of the cleaning solution supply units 130 and 140 between the inlet 101 and the cleaning unit 120 or between the cleaning unit 120 and the outlet 103, the gas to be deodorized is cleaned with the second cleaning solution. The second cleaning solution can be supplied as it is. For example, the cleaning liquid supply units 130 and 140 can be used as the second cleaning liquid in a space between the inlet 101 and the cleaning unit 120 (ie, the inflow section 131) and a space between the cleaning unit 120 and the outlet 103. It can be sprayed on at least one of (i.e. the outflow compartment 141). The amount and presence of the spray are controlled by a valve that controls the spray.

  As an example, as illustrated in FIG. 2A, the deodorizing apparatus 200A sprays the first cleaning liquid supply unit 130 that sprays the second cleaning liquid to the inflow section 131 and the second cleaning liquid to spray the outflow section 141. And the second cleaning liquid supply unit 140. The first cleaning liquid supply unit 130 sprays the second cleaning liquid on the gas flow path from the inflow port 101 to the cleaning unit 120. In addition, the first cleaning liquid supply unit 130 sprays the second cleaning liquid on the gas flow path from the cleaning unit 120 to the outlet 103. However, as in the deodorizing apparatus 200B shown in FIG. 2B, a configuration may be employed in which the second cleaning liquid supply unit 140 is provided and the first cleaning liquid supply unit 130 is not provided. In addition, it is not essential that the cleaning liquid supply units 130 and 140 spray the second cleaning liquid. For example, a configuration may be adopted in which the gas to be deodorized passes through the inside of the second cleaning liquid as bubbles.

  The washing liquid supply units 130 and 140 are provided so that the second washing liquid after washing the gas to be deodorized is mixed with the first washing liquid used for washing in the washing unit 120. For example, as shown in FIGS. 2A and 2B, the deodorizing apparatuses 200A and 200B can have a single cleaning tank having the inlet 101, the cleaning unit 120, and the outlet 103. Then, the cleaning liquid supply units 130 and 140 are arranged such that the liquid level of the first cleaning liquid 122 in the cleaning unit 120 is lower than the second cleaning liquid supply position (that is, the positions of the cleaning liquid supply units 130 and 140). be able to.

  The sensors 110 and 111 are sensors capable of measuring the concentration of the odor of the gas 500. In the present embodiment, although a sensor for measuring the concentration of ammonia is described as an example, the present invention is not limited to this, and a sensor for measuring the concentration of other odorous components may be used. It may be a sensor that measures. A sensor 110 is provided near the inlet 101 and can measure the concentration of ammonia in the gas 500 before cleaning. A sensor 111 is provided near the outlet 103 and can measure the concentration of ammonia in the gas 500 before cleaning.

  The cleaning liquid supply units 130 and 140 can supply the second cleaning liquid supplied from the outside of the device instead of supplying the first cleaning liquid 122 stored in the deodorizing devices 200A and 200B. According to such a configuration, since the cleaning liquid supply units 130 and 140 can supply fresh cleaning liquid, and can use the fresh cleaning liquid to clean the gas to be deodorized, the odor can be reduced better. Here, the fresh cleaning liquid refers to a cleaning liquid that has not been used to clean the gas to be deodorized in the deodorizing devices 200A and 200B. For example, the fresh cleaning solution may be a cleaning solution substantially free of the odor component contained in the gas to be deodorized. In addition, the fresh washing solution may be washing water substantially free of components other than the washing solution itself. However, the fresh cleaning solution may be the cleaning solution after it has been used to clean the gas in another deodorizing device, as long as it is supplied from the outside of the device and has not been used for cleaning in this device. By using such a configuration in combination with the cleaning unit 120 that cleans the gas to be deodorized using the first cleaning solution 122, the odor removal capability can be improved. In particular, the second cleaning liquid supply unit 140 can remove odor better by further cleaning the gas after being cleaned using the first cleaning liquid 122 with fresh cleaning liquid. As described above, since the fresh second cleaning solution is supplied to be mixed with the first cleaning solution 122 used for cleaning in the cleaning unit 120, the component to be cleaned in the first cleaning solution 122 is further reduced. can do. In addition, in the case of the configuration having the outlet 180 described later, the first cleaning liquid 122 is appropriately discharged, so that it is possible to clean with a more fresh cleaning liquid.

  Hereinafter, the first cleaning solution 122 and the second cleaning solution will be further described. The second cleaning solution is not particularly limited. For example, the second cleaning solution may be water. In addition, the second washing solution may be a weakly acidic or acidic aqueous solution having a pH of less than 7 so as to improve the ability to remove a basic odor component such as ammonia. Furthermore, in order to improve the deodorizing efficiency, the second cleaning solution may be an aqueous solution containing a deodorizing agent. The type of deodorizing agent is not particularly limited, and may be, for example, an oxidizing agent, an antibacterial agent, or a microorganism. As an example of an oxidizing agent, ozone or hypochlorous acid etc. are mentioned. Examples of antibacterial agents include chitosan or catechin.

  In one embodiment, an aqueous solution containing hypochlorous acid or hypochlorite ion is used as the second cleaning solution. In this case, the pH of the second washing solution is not particularly limited, but the pH of the second washing solution can be 7 or less so as to improve the activity. In addition, from the viewpoint of stability, the pH of the second washing solution can be 5 or more. An aqueous solution containing hypochlorous acid or hypochlorite ion having a pH of 5 or more and 7 or less is known as hypochlorous acid water. From the viewpoint of deodorizing performance, the chlorine concentration in the second cleaning liquid can be 100 ppm or more, or can be 1000 ppm or more. On the other hand, from the economical point of view, the chlorine concentration in the second cleaning liquid may be 10 ppm or more, and may be 500 ppm or less.

  The second cleaning solution may be hypochlorous acid water containing hypochlorous acid and hydrogen carbonate ion. Such hypochlorous acid water has stable pH because of its buffering action, so its properties are also stable. Such hypochlorous acid water can be obtained by mixing and diluting sodium hypochlorite and carbon dioxide gas in water. However, hypochlorous acid water obtained by other methods such as electrolysis of water or mixing of sodium hypochlorite and dilute hydrochloric acid can also be used as the second cleaning liquid.

  The first cleaning solution 122 is mixed with a second cleaning solution after being used to clean the gas to be deodorized. Thus, in one embodiment, the composition of the first cleaning liquid 122 is different than the second cleaning liquid. For example, the odor component concentration of the first cleaning liquid 122 can be higher than that of the second cleaning liquid. As an example, when hypochlorous acid water is used as the cleaning solution, the first cleaning solution 122 and the second cleaning solution have different pH values. That is, the second washing solution, which is a fresh washing solution, is closer to the ideal pH range of hypochlorous water spray than the first washing solution 122 used for washing. Therefore, the second cleaning liquid has a pH value of the hypochlorite sprinkler closer to the acidic side or the alkaline side depending on the component to be deodorized. In addition, the deodorizing agent concentration (for example, chlorine concentration) of the second cleaning solution can be higher than that of the first cleaning solution.

  The liquid property of the first cleaning solution 122 can be adjusted using a method of adding a cleaning solution, a method of supplying air bubbles described later, or the like. In one embodiment, an aqueous solution containing hypochlorous acid or hypochlorite ion is used as the first cleaning solution. In this case, the pH of the first washing solution is not particularly limited, but the pH of the first washing solution can be 7 or less so as to improve the activity. Further, from the viewpoint of stability, the pH of the first cleaning solution can be 5 or more. From the viewpoint of deodorizing performance, the chlorine concentration in the first cleaning liquid can be 100 ppm or more, or can be 1000 ppm or more. On the other hand, from the viewpoint of economy, the chlorine concentration in the first cleaning solution may be 10 ppm or more and 500 ppm or less.

  The bubble supply unit 150 mixes bubbles of the second gas different from the gas to be cleaned (the gas to be deodorized or the first gas) into the first cleaning liquid 122. The bubble supply unit 150 can mix the bubbles of the gas supplied from the outside of the deodorizing devices 200A and 200B as the bubbles of the second gas. Since the contact area of the first cleaning liquid 122 and the gas to be deodorized in the cleaning unit 120 is increased by the function of the bubble supply unit 150, the cleaning efficiency is improved. In one embodiment, the bubble supply unit 150 supplies nanobubbles to the first cleaning solution 122 to further improve the cleaning efficiency. Nanobubbles refer to bubbles having an average bubble diameter of less than 1 μm. The first cleaning solution 122 can also be activated by using nanobubbles. In addition, generation of sludge in the first cleaning solution 122 can also be suppressed by using nano bubbles. The function of the bubble supply unit 150 is not limited to the function of supplying nanobubbles as long as the function of increasing the contact area between the first cleaning liquid 122 and the gas to be deodorized is provided. In one embodiment, the bubble supply unit 150 may supply microbubbles or millibubbles to the first cleaning liquid 122 or may supply bubbles mixed with these.

  The type of gas supplied by the bubble supply unit 150 is not particularly limited. For example, the bubble supply unit 150 may supply air. On the other hand, the bubble supply unit 150 can mix a gas having the function of adjusting the liquid property of the first cleaning liquid 122 into the first cleaning liquid 122. Examples of such gases include acid gases such as carbon dioxide. By adjusting the liquid property of the first cleaning solution 122, the removal efficiency of the odor component can be improved. For example, although the first cleaning solution 122 absorbs a basic component, its pH increases, but the acid component is used to lower the pH of the first cleaning solution 122 to improve the removal efficiency of the basic component. it can. In addition, when hypochlorous acid water is used as the first cleaning solution 122 or the second cleaning solution, the deodorizing activity can be improved by reducing the pH of the first cleaning solution 122 using an acid gas. In addition, the bubble supply unit 150 can mix a gas having a deodorizing action into the first cleaning solution 122. As an example of such a gas, ozone etc. are mentioned. That is, when the gas to be deodorized contains ammonia and the hypochlorous acid water is used for the first cleaning solution 122, it is preferable to use an acid gas for the bubbles. In such a configuration, it is possible to increase the gas-liquid contact while suppressing the pH of the first cleaning liquid 122 after the deodorizing treatment.

  The specific configuration of the bubble supply unit 150 is not particularly limited. FIGS. 2A and 2B show an example of a specific configuration of the bubble supply unit 150. FIG. In these examples, the bubble supply unit 150 includes a circulation passage 151 including an inlet 153 and an outlet 154, and a discharge unit 152 for mixing the bubbles into the first cleaning liquid 122 in the circulation passage 151. There is. The first cleaning liquid 122 stored in the cleaning unit 120 flows from the cleaning unit 120 into the circulation path 151 via the inlet 153 which is a connection portion between the circulation path 151 and the cleaning unit 120. Further, from the circulation path 151, the first cleaning fluid that has flowed in is supplied again to the cleaning unit 120 via the outlet 154 which is a connection portion between the circulation path 151 and the cleaning unit 120. According to such a configuration, the first cleaning liquid 122 can be agitated.

  Deodorizing apparatus 200A, B may have the further structure. For example, the deodorizing apparatuses 200A and 200B may have the input unit 170 for inputting the first cleaning liquid 122. Further, the deodorizing devices 200A and 200B may have an outlet 180 through which the first cleaning liquid 122 flows out. In one embodiment, the amount of first cleaning fluid 122 is limited by outlet 180. That is, even if the second cleaning liquid is mixed, the amount of the first cleaning liquid 122 is kept constant because the first cleaning liquid 122 flows out from the outlet 180 as an overflow. Furthermore, the deodorizing devices 200A and 200B may have a discharge port 190 at the bottom. The sludge accumulated in the deodorizing devices 200A, B can be discharged through the discharge port 190. Furthermore, as shown to FIG. 2 (B), in order to improve gas-liquid contact efficiency, you may provide the filler 195 in the location which the 2nd washing | cleaning liquid is sprayed and the gas of deodorizing object passes.

  Next, the deodorizing method according to an embodiment will be described. Although this deodorizing method can be realized, for example, using the wet deodorizing device according to the first embodiment described above, it is also possible to use another wet deodorizing device.

  First, the gas to be deodorized is guided to the cleaning unit that performs cleaning with the first cleaning solution (step S10). For example, the gas to be deodorized can be introduced into the cleaning unit 120 from the inlet 101. Next, bubbles of a gas different from the gas to be deodorized are mixed with the first cleaning liquid (step S20). For example, the bubble supply unit 150 can mix bubbles in the first cleaning liquid 122. Then, the gas after being cleaned by the first cleaning solution 122 is led out of the cleaning unit (step S30). For example, the gas cleaned in the cleaning unit 120 can be led to the outlet 103.

  Further, this deodorizing method is a process of supplying the second cleaning solution so as to be mixed with the first cleaning solution 122 used for cleaning in the cleaning unit 120, which is a second cleaning solution different from the first cleaning solution 122. Have a step to do. This process is called process A. This step can be performed, for example, in at least one of step S10 and step S30. For example, in at least one of step S10 and step S30, the first cleaning liquid is mixed with the first cleaning liquid after the introduced gas is washed with the second cleaning liquid and the introduced gas is washed. A second cleaning solution different in composition from the cleaning solution can be supplied. For example, the first cleaning liquid supply unit 130 can supply the second cleaning liquid so as to clean the gas introduced from the inlet 101 to the cleaning unit 120. Further, the second cleaning liquid supply unit 140 can supply the second cleaning liquid so as to clean the gas introduced from the cleaning unit 120 to the outlet 103.

Modification of Embodiment 1
In order to achieve the purpose of the configuration according to the first embodiment to improve the deodorizing ability of the deodorizing device, it is not necessary to adopt all of the configurations shown in the first embodiment. Hereinafter, modifications of the first embodiment will be described.

[Modification 1]
The wet deodorizing apparatus according to one embodiment includes at least one of the above-described inlet 101, cleaning unit 120, outlet 103, and cleaning liquid supply unit 130 and cleaning liquid supply unit 140. According to such a configuration, the combination of the cleaning unit 120 and the cleaning liquid supply units 130 and 140 improves the deodorizing ability. The deodorizing method using such a wet type deodorizing apparatus can be realized by performing step S10 and step S30 of FIG. 4A and performing the process A in at least one of step S10 and step S30.

[Modification 2]
The wet deodorizing apparatus according to one embodiment includes the above-described inlet 101, the cleaning unit 120, the outlet 103, and the bubble supply unit 150. Here, the cleaning unit 120 cleans the gas to be deodorized with the first cleaning liquid 122 by mixing the gas to be deodorized flowing from the inflow port 101 with the first cleaning liquid 122. According to such a configuration, the contact area is increased when the gas to be deodorized is mixed with the first cleaning liquid 122 due to the air bubbles mixed in the first cleaning liquid 122, so the deodorizing ability is improved. . A deodorizing method using such a wet deodorizing apparatus can be realized by performing step S10, step S20, and step S30 of FIG. 4 (A). It is not essential to perform process A

[Modification 3]
The wet deodorizing apparatus according to one embodiment includes the above-described inlet 101, the cleaning unit 120, the outlet 103, and the bubble supply unit 150. Here, the bubble supply unit 150 mixes the bubbles of the gas having the function of adjusting the liquid property of the first cleaning liquid 122 or having the deodorizing function into the first cleaning liquid 122. According to such a configuration, as described above, the deodorizing ability can be improved. A deodorizing method using such a wet deodorizing apparatus can be realized by performing step S10, step S20, and step S30 of FIG. 4 (A). It is not essential to perform process A.

  This is the end of the description of the hardware configuration of the deodorizing devices 200A and 200B shown in FIG.

  Next, the hardware configuration of the information processing apparatus 100 illustrated in FIG. 1 will be described with reference to FIG.

  As shown in FIG. 3, the information processing apparatus 100 includes a central processing unit (CPU) 201, a random access memory (RAM) 202, a read only memory (ROM) 203, an input controller 205, and a video controller 206 via a system bus 204. A memory controller 207, a communication I / F controller 208, and the like are connected.

  The CPU 201 centrally controls the devices and controllers connected to the system bus 204.

  In addition, the ROM 203 or the external memory 211 (corresponding to a storage unit) implements a function that is executed by a BIOS (Basic Input / Output System) or an OS (Operating System), which is a control program of the CPU 201, and each server or PC. The various programs etc. which are needed in order to carry out later are stored. Also, information necessary for practicing the present invention is stored. The external memory may be a database.

  A RAM 202 (corresponding to a storage unit) functions as a main memory, a work area, and the like of the CPU 201. The CPU 201 loads programs necessary for execution of processing from the ROM 203 or the external memory 211 to the RAM 202 and executes the loaded programs to realize various operations.

  The input controller 205 also controls input from a keyboard (KB) 209 and a pointing device such as a mouse (not shown).

  The video controller 206 controls display on a display such as the display 210. The display may be a display such as a liquid crystal display. These are used by the administrator as needed.

  The memory controller 207 is an external storage device (hard disk (HD)) for storing a boot program, various applications, font data, user files, editing files, various data, etc., a flexible disk (FD), or PCMCIA (Personal Computer). Memory Card International Association) Control access to an external memory 211 (corresponding to storage means) such as a Compact Flash (registered trademark) memory or the like connected via an adapter to a card slot.

  The communication I / F controller 208 connects to and communicates with external devices via a network, and executes communication control processing in the network. For example, communication using TCP / IP (Transmission Control Protocol / Internet Protocol) is possible. In this embodiment, although it is connected communicably with the production | generation apparatus 400 and the deodorizing apparatus 200 via a network, you may make it connect with a wired cable etc. FIG.

  The CPU 201 can display the image on the display 210 by executing, for example, an outline font rasterization process on a display information area in the RAM 202. Further, the CPU 201 enables user instruction by a mouse cursor (not shown) or the like on the display 210.

  Various programs to be described later for realizing the present invention are stored in the external memory 211, and are executed by the CPU 201 by being loaded into the RAM 202 as necessary.

  This is the end of the description of the hardware configuration of the information processing apparatus 100 shown in FIG. The above configuration is an example, and may be appropriately changed according to the purpose or application.

  Next, an example of a functional configuration of the information processing apparatus 100 will be described using FIG. 4.

  The information processing apparatus 100 includes a sensor information acquisition unit 301, a determination unit 302, a notification unit 303, and a storage control unit 304.

  The sensor information acquisition unit 301 is a functional unit that acquires sensor information acquired by the sensor from the sensors 110 and 111.

  The determination unit 302 is a functional unit that determines, based on the sensor information acquired by the sensor information acquisition unit 301, whether the sensor information satisfies a predetermined condition. The notification unit 303 is a functional unit that instructs the generation device 400 or the deodorizing device 200 according to the determination of the determination unit 302. The storage control unit 304 is a functional unit that controls to store the content of the instruction for the generation device 400 and the deodorizing device 200, which is an instruction corresponding to the sensor information.

  This is the end of the description of an example of the functional configuration shown in FIG.

  Next, the contents of processing in the present embodiment will be described using the flowchart of FIG.

  In step S501, the CPU 201 of the information processing apparatus 100 acquires a measurement value (corresponding to contamination information) of the concentration of the ammonia odor contained in the gas 500 measured by the sensor from the sensor 110.

  In step S502, the CPU 201 of the information processing apparatus 100 reads the setting value table 600. For example, it is a setting value table 600 shown in FIG. In the setting value table 600, an odor concentration 601, a hypochlorous acid water concentration 602, a hypochlorous acid water flow rate 603, and a carbon dioxide gas flow rate 604 are stored in association with each other. The odor concentration 601 indicates a standard value of the concentration of odor. The hypochlorous acid water concentration 602 is a parameter related to the concentration of hypochlorous acid water to be generated by the generator 400, corresponding to the odor concentration 601. The hypochlorous acid water flow rate 603 is a parameter of the flow rate of the hypochlorous acid water generated by the generation device 400, which corresponds to the odor concentration 601. The carbon dioxide gas flow rate 604 is a parameter that corresponds to the odor concentration 601 and is related to the flow rate of carbonic acid gas of hypochlorous acid water used for generation in the generator. As shown in FIG. 6, the higher the odor concentration 601 of the gas 500 to be deodorized, the higher the detergency of the hypochlorous acid water, so that each parameter (the hypochlorous acid water concentration 602, the hypochlorous acid concentration 602) An acid water flow rate 603 and a carbon dioxide gas flow rate 604) are stored in the setting value table 600 in association with each other. It should be noted that all of the parameters are not essential components, and at least one parameter may be associated. Also, the data table of FIG. 6 is an example and is not limited to this.

  In step S503, the CPU 201 of the information processing apparatus 100 determines whether the measured value of the odor concentration acquired in step S501 is within the conditions. If it is determined that the conditions are satisfied, the process proceeds to step S506; otherwise, the process proceeds to step S504. For example, if it is a measured value of the odor concentration which is 300 ppm and is less than 300 ppm as a threshold value for judging whether it is in a predetermined range, processing will be advanced to Step S506. If the odor concentration is 300 ppm or more, the process proceeds to step S504. This threshold is an example and is not limited to this.

  In step S504, the CPU 201 of the information processing apparatus 100 refers to the odor concentration 601 to identify the setting value corresponding to the measured value of the odor concentration of the gas 500 acquired in step S501. For example, when the measured value acquired in step S501 is 1400 ppm, the hypochlorous acid water concentration 602 is 80 as the parameter corresponding to the odor concentration 601 in the setting value table 600 of FIG. The acid water flow rate can be specified as 4, and the carbon dioxide gas flow rate 604 can be specified as 5.

  In step S505, the CPU 201 of the information processing device 100 notifies the generation device 400 of the setting value (parameter) specified in step S504.

  In step S506, the CPU 201 of the information processing apparatus 100 determines whether or not the cleaning process is to be continued, and if it is determined that the cleaning process is not to be continued, the process ends and it is determined that the cleaning process is to be continued. The process returns to step S501.

  In step S511, the generating device 400 receives the setting value notified in step S505.

  In step S512, the generating apparatus 400 generates the cleaning liquid with the setting value (parameter) notified in step S511. For example, when the set values received in step S511 are 80 for hypochlorous acid water concentration 602, 4 for hypochlorous acid water flow, and 5 for carbon dioxide gas flow 604, these parameters are used to set the next value It produces chlorous acid water. In this manner, when the concentration or flow rate of the hypochlorous acid water that is the cleaning liquid is determined according to the concentration of the odor acquired by the odor sensor and generated, the odor temporarily becomes high However, it is possible to set appropriate parameters without spending time and effort of the user, and it is possible to supply hypochlorous acid water having enhanced detergency only when necessary, and to achieve cost reduction.

  In this embodiment, in order to measure the concentration of the odor of the gas before cleaning, it is controlled to acquire sensor information from the sensor 110, but from the sensor 110 which can measure the concentration of the odor of the gas after cleaning You may control to acquire. The sensor information may be acquired from each of the sensor 110 and the sensor 110 to change the cleaning ability of the cleaning liquid generated by the generating device 400. By thus measuring the concentration of the odor of each of the gas 500 before cleaning and the gas 500 after cleaning, the odor of the gas 500 after cleaning is changed by changing the cleaning ability of the cleaning liquid generated by the generation device 400. Component residues can be reduced.

  This is the end of the description of the detailed process in the first embodiment. As described above, according to the present embodiment, the cleaning ability of the cleaning liquid generated by the generating device 400 can be changed based on the measured value (sensor information) of the odor concentration acquired from the sensor 110 or the sensor 111. As a result, the amount of cleaning fluid used by the deodorizing device 200 can be reduced, and the amount of cleaning waste fluid discharged from the deodorizing device can be reduced, and an appropriate cleaning capability can be achieved according to the concentration of the odor of the gas to be deodorized. Not only can the cost of the cleaning solution be reduced.

Second Embodiment
Next, a second embodiment will be described. In the first embodiment, in accordance with the concentration of the odor of the gas 500, the parameters for generating the cleaning liquid generated by the generating device 400 are changed. In the second embodiment, unlike the first embodiment, the parameters for generating the cleaning liquid generated by the generator 400 are changed according to the temperature of the gas 500. The system configuration and the functional configuration are the same as those of the first embodiment, and thus the description thereof is omitted. The different part of the processing from the first embodiment will be described, and the description of the part having the same processing will be omitted.

  In the second embodiment, a hardware configuration diagram of the deodorizing apparatus 200 will be described by taking FIG. 13 as an example. As shown in FIG. 13, the sensor 110 is provided at a position where the temperature of the gas 500 before cleaning can be measured. The sensor 110 is a temperature sensor capable of measuring the temperature of a gas. Since the temperature of the gas 500 after cleaning is lowered by the cleaning solution, the temperature of the gas 500 before cleaning is measured. Ammonia, which is an example of the odor component, tends to increase the concentration of ammonia as the temperature increases, so changing the parameters for the generation of the cleaning solution based on the temperature makes the cleaning solution more appropriate. There is an effect that can be supplied to the cleaning device.

  The detailed process flow of the second embodiment will be described below with reference to the flowchart of FIG.

  In step S701, the CPU 201 of the information processing apparatus 100 acquires the measurement value of the temperature of the gas 500 measured by the sensor from the sensor 110.

  In step S702, the CPU 201 of the information processing apparatus 100 reads the setting value table 800. For example, it is a setting value table 800 shown in FIG. In the setting value table 800, an odor temperature 801, a hypochlorous acid water concentration 602, a hypochlorous acid water flow rate 603, and a carbon dioxide gas flow rate 604 are stored in association with each other. The odor temperature 801 indicates the reference value of the odor temperature. As shown in FIG. 8, the higher the odor temperature 801 of the gas 500 to be deodorized, the higher the detergency of hypochlorous acid water. An acid water flow rate 603 and a carbon dioxide gas flow rate 604) are stored in the setting value table 800 in association with each other. It should be noted that all of the parameters are not essential components, and at least one parameter may be associated. Also, the data table of FIG. 6 is an example and is not limited to this.

  In step S703, the CPU 201 of the information processing apparatus 100 determines whether the measured value of the odor temperature acquired in step S701 is within the condition. If it is determined that the conditions are met, the process proceeds to step S506; otherwise, the process proceeds to step S704. For example, if it is a measurement value of a temperature which is 15 ° C. and less than 15 ° C. as the threshold value for determining whether or not the condition is inside, the process proceeds to step S 506. If the measured value is a temperature of 15 ° C. or more, the process proceeds to step S704. This threshold is an example and is not limited to this.

  In step S704, the CPU 201 of the information processing apparatus 100 refers to the odor temperature 801 to specify the set value corresponding to the measurement value of the temperature of the gas 500 acquired in step S701. For example, when the measured value acquired in step S701 is 43 ° C., the hypochlorous acid water concentration 602 is 120 as the parameter corresponding to the odor temperature 801 of the setting value table 800 of FIG. The chlorite water flow rate 603 can be specified as 5, and the carbon dioxide gas flow rate 604 can be specified as 5.

  The contents of the processing in steps S505, S506, S511, and S512 are the same as those in the first embodiment, and thus the description thereof is omitted.

  This is the end of the description of the second embodiment. As described above, according to the present embodiment, the cleaning ability of the cleaning liquid generated by the generating device 400 can be changed based on the measurement value (sensor information) of the temperature of the gas acquired from the sensor 110. This is because the concentration of temperature odor is correlated, and as a result, the amount of cleaning fluid used by the deodorizing device 200 can be reduced, and the amount of cleaning waste fluid discharged from the deodorizing device can be reduced. Not only can it be possible to provide an appropriate cleaning capacity depending on the concentration of the odor of the gas to be deodorized, but also the cost of the cleaning solution can be reduced.

Third Embodiment
Next, a third embodiment will be described. In the first embodiment, in accordance with the concentration of the odor of the gas 500, the parameters for generating the cleaning liquid generated by the generating device 400 are changed. In the third embodiment, unlike the first embodiment, the mode for cleaning the gas 500 in the cleaning device is changed according to the concentration of the odor of the gas 500. The system configuration, the hardware configuration, and the functional configuration are the same as those of the first embodiment, and thus the description thereof is omitted. The different part of the processing from the first embodiment will be described, and the description of the part having the same processing will be omitted. The mode for cleaning the gas 500 by the cleaning device is controlled according to the concentration of the odor, thereby providing an appropriate cleaning power according to the intensity of the odor contained in the gas 500, and the cost for the cleaning. Can also be reduced.

  The detailed process flow of the third embodiment will be described below with reference to the flowchart of FIG.

  The process of steps S401 to S403 is the same as the process flow of the first embodiment, and thus the description thereof is omitted.

  In step S 901, the CPU 201 of the information processing apparatus 100 reads the setting value table 1000. For example, it is a setting value table 1000 shown in FIG. In the setting value table 800, the odor concentration 601 and the spray mode 1001 are stored in association with each other. The odor concentration 601 is as described above, and the description is omitted. The spray mode 1001 is a mode indicating whether or not the cleaning liquid is sprayed in the cleaning liquid supply units 130 and 140. When the spray mode 1001 is ON, the deodorizing device 200 opens the valve for controlling the spray to spray the cleaning solution. In the present embodiment, although the presence or absence of the spray is controlled, the amount of the spray may be controlled to be increased according to the concentration of the odor acquired by the sensor 110. That is, as long as the deodorizing apparatus 200 can be operated to enhance the deodorizing ability according to the concentration of the odor of the gas 500, another mode may be used. In the present embodiment, the deodorizing mode of the deodorizing apparatus 200 is described as the spraying mode, but the mode does not necessarily have to be the spraying mode. For example, the number of times of cleaning may be increased. You may improve the deodorizing ability.

  In step S902, the CPU 201 of the information processing apparatus 100 specifies the spray mode 1001 corresponding to the measurement value with reference to the odor concentration 601. For example, when the measured value is 1200 ppm, referring to the odor concentration 601 of the setting value table 1000 of FIG. 10, it is possible to specify that the corresponding spray mode 1001 is ON.

  In step S 903, the CPU 201 of the information processing device 100 notifies the deodorizing device 200 of the spray mode 1001 identified in step S 902.

  In step S904, the deodorizing apparatus 200 receives the spray mode 1001 notified in step S903.

  In step S905, according to the spray mode 1001 received in step S904, the spray of the cleaning liquid in the cleaning liquid supply units 130 and 140 is controlled. That is, when the spray mode 1001 is ON, the deodorizing apparatus 200 opens the valve for controlling the spray and sprays the cleaning liquid to increase the number of places where the gas 500 is cleaned. Has the effect of being able to When the spray mode 1001 is OFF, the deodorizing device 200 closes the valve for controlling the spray to reduce the consumption of hypochlorous acid water.

  This is the end of the description of the third embodiment. As described above, according to the present embodiment, when the odor concentration 601 of the gas 500 to be cleaned is high, the cleaning ability of the deodorizing apparatus 200 is increased to meet the contamination state of the gas 500 to be cleaned. It can provide appropriate cleaning power. In addition, if necessary, consumption of hypochlorous acid water can be reduced

Fourth Embodiment
Next, a fourth embodiment will be described. In the second embodiment, in accordance with the temperature of the odor of the gas 500, the parameters for generating the cleaning liquid generated by the generating device 400 are changed. In the fourth embodiment, unlike the second embodiment, the mode for cleaning the gas 500 in the cleaning device is changed according to the temperature of the odor of the gas 500. The system configuration, the hardware configuration, and the functional configuration of the second embodiment are the same as those of the second embodiment, and thus the description thereof is omitted. The different part of the processing from the first embodiment will be described, and the description of the part having the same processing will be omitted. According to the temperature of the odor, the mode for cleaning the gas 500 by the cleaning device is controlled to provide appropriate cleaning power according to the intensity of the odor contained in the gas 500, and the cost for cleaning Can also be reduced.

  The detailed process flow of the fourth embodiment will be described below using the flowchart shown in FIG.

  The contents of the process from step S701 to step S704 are the same as those in the second embodiment, and therefore the description thereof is omitted.

  In step S1101, the CPU 201 of the information processing apparatus 100 reads the setting value table 1200. For example, it is a setting value table 1200 shown in FIG. In the setting value table 1200, the odor temperature 801 and the spray mode 1001 are stored in association with each other. The odor temperature 801 is as described above, and the description is omitted. The spray mode 1001 is a mode indicating whether or not the cleaning liquid is sprayed in the cleaning liquid supply units 130 and 140. When the spray mode 1001 is ON, the deodorizing device 200 opens the valve for controlling the spray to spray the cleaning solution. In the present embodiment, although the presence or absence of the spray is controlled, the amount of the spray may be controlled to be increased according to the temperature of the odor acquired by the sensor 110. That is, as long as the deodorizing apparatus 200 can be operated to enhance the deodorizing ability according to the temperature of the odor of the gas 500, other modes may be used. In the present embodiment, the deodorizing mode of the deodorizing apparatus 200 is described as the spraying mode, but the mode does not necessarily have to be the spraying mode. For example, the number of times of cleaning may be increased. You may improve the deodorizing ability.

  In step S1102, the CPU 201 of the information processing apparatus 100 specifies the spray mode 1001 corresponding to the measurement value with reference to the odor temperature 801. For example, when the measured value is 48 ° C., the corresponding spray mode 1001 can be identified as ON by referring to the odor temperature 801 of the setting value table 1200 of FIG.

  In step S1103, the CPU 201 of the information processing apparatus 100 notifies the deodorizing apparatus 200 of the spray mode 1001 identified in step S1102.

  In step S1104, the deodorizing apparatus 200 receives the spray mode 1001 notified in step S1103.

  In step S1105, according to the spray mode 1001 received in step S1104, the spray of the cleaning liquid in the cleaning liquid supply units 130 and 140 is controlled. That is, when the spray mode 1001 is ON, the deodorizing apparatus 200 opens the valve for controlling the spray and sprays the cleaning liquid to increase the number of places where the gas 500 is cleaned. Has the effect of being able to When the spray mode 1001 is OFF, the deodorizing device 200 closes the valve for controlling the spray to reduce the consumption of hypochlorous acid water as the cleaning liquid.

  This is the end of the description of the fourth embodiment. As described above, according to the present embodiment, when the odor temperature 801 of the gas 500 to be cleaned is high, the cleaning ability of the deodorizing apparatus 200 is increased to meet the contamination state of the gas 500 to be cleaned. It can provide appropriate cleaning power. In addition, the consumption of hypochlorous acid water can be reduced, if necessary.

  As described above, according to the present invention, it is possible to provide an appropriate cleaning capability in a gas cleaning system.

  The deodorizing apparatus 200 may use the wet deodorizing apparatus according to the first embodiment, or may use another deodorizing apparatus. For example, as shown in FIG. 13, the deodorizing device 200 may be provided with only the sensor 110 without providing the sensor 111.

  As mentioned above, some examples of composition of a wet deodorization system concerning this embodiment were introduced. However, the wet deodorizing system according to the present embodiment is not limited to the above configuration. That is, the wet deodorizing system according to the present embodiment can include one or more arbitrary number of cooling devices and one or more arbitrary number of deodorizing devices. For example, in the configuration of FIG. 3, only the first deodorizing device 200 may be used as the deodorizing device, and the cleaning liquid in the first deodorizing device may be supplied to the cooling device to cool the gas to be deodorized. Further, in the configuration of FIG. 3, a further third deodorizing device may be used as the deodorizing device. The configuration of each of the cooling device and the deodorizing device is not particularly limited, and the wet deodorizing device according to the first embodiment can be adopted as one or more of the cooling device and the deodorizing device. Moreover, the wet deodorizing apparatus which concerns on one or more Embodiment 1 which has a mutually different structure is also employable. For example, the first deodorizing device 200 may have the configuration shown in FIG. 2 (B), and the second deodorizing device 220 may have the configuration shown in FIG. 2 (A).

  Further, it is obvious that combinations of the first to fourth embodiments are also within the scope of the present invention.

  The present invention is also applicable to, for example, an embodiment as a system, an apparatus, a method, a program, a storage medium, etc. Specifically, the present invention may be applied to a system composed of a plurality of devices. The present invention may be applied to an apparatus consisting of two devices. Note that the present invention includes one that directly or remotely supplies a program of software that implements the functions of the above-described embodiments to a system or an apparatus. The present invention also includes the case where the information processing apparatus of the system or apparatus achieves the same by reading and executing the supplied program code.

  Therefore, the program code itself installed in the information processing apparatus to realize the functional processing of the present invention by the information processing apparatus also implements the present invention. That is, the present invention also includes a computer program itself for realizing the functional processing of the present invention.

  In that case, as long as it has the function of a program, it may be in the form of an object code, a program executed by an interpreter, script data supplied to an OS, or the like.

  Examples of recording media for supplying the program include a flexible disk, a hard disk, an optical disk, a magneto-optical disk, an MO, a CD-ROM, a CD-R, and a CD-RW. There are also magnetic tapes, non-volatile memory cards, ROMs, DVDs (DVD-ROMs, DVD-Rs) and the like.

  In addition, as a program supply method, a browser on a client computer is used to connect to an Internet home page. Then, the program can be supplied by downloading the computer program of the present invention itself or a compressed file including an automatic installation function from the home page to a recording medium such as a hard disk.

  The present invention can also be realized by dividing the program code constituting the program of the present invention into a plurality of files and downloading each file from different home pages. That is, the present invention also includes a WWW server which causes a plurality of users to download program files for realizing the functional processing of the present invention by the information processing apparatus.

  In addition, the program of the present invention is encrypted, stored in a storage medium such as a CD-ROM, and distributed to users, and the user who has cleared predetermined conditions downloads key information that decrypts encryption from the homepage via the Internet. Let Then, it is possible to execute the program encrypted by using the downloaded key information and install it in the information processing apparatus.

  Also, the information processing apparatus executes the read program to realize the functions of the above-described embodiment. In addition, an OS or the like operating on the information processing apparatus performs a part or all of the actual processing based on the instruction of the program, and the functions of the above-described embodiment may be realized by the processing.

  Furthermore, the program read from the recording medium is written to a memory provided in a function expansion board inserted in the information processing apparatus or a function expansion unit connected to the information processing apparatus. Thereafter, based on the instruction of the program, a CPU or the like provided in the function expansion board or the function expansion unit performs part or all of the actual processing, and the function of the above-described embodiment is also realized by the processing.

  The embodiments described above merely show examples of implementation in practicing the present invention, and the technical scope of the present invention should not be interpreted in a limited manner by these. That is, the present invention can be implemented in various forms without departing from the technical concept or the main features thereof.

200: deodorizing device, 300: cooling device, 410: cleaning solution, 500: gas to be deodorized

Claims (12)

A cleaning system comprising: a generation device for generating a cleaning solution; a cleaning device for cleaning a gas with the cleaning solution; and a sensor for acquiring information on contamination of the gas,
Storage means for storing parameters for generating the cleaning fluid by the cleaning device;
Specifying means for specifying a parameter for generating the cleaning solution corresponding to the contamination information acquired by the sensor;
A control unit configured to control the generation device to generate the cleaning liquid at a parameter for generating the cleaning liquid specified by the specifying unit. The cleaning system according to claim 1, wherein the sensor is provided at an inlet through which the gas flows into the cleaning device. The cleaning system according to claim 1 or 2, wherein the sensor is provided at an outlet from which the gas after being cleaned by the cleaning device flows out. The cleaning system according to any one of claims 1 to 3, wherein the parameter is a parameter related to the flow rate of the cleaning solution. The said parameter is a parameter regarding the density | concentration of the said washing | cleaning liquid. The washing | cleaning system of any one of the Claims 1 thru | or 4 characterized by these. The cleaning system according to any one of claims 1 to 5, wherein the parameter is a parameter related to a flow rate of carbon dioxide gas. The cleaning system according to any one of claims 1 to 6, wherein the cleaning solution is an aqueous solution containing a deodorizing agent. The cleaning system according to any one of claims 1 to 7, wherein the cleaning solution is an aqueous solution containing hypochlorous acid or hypochlorite ion. A cleaning system including a generation device for generating a cleaning solution, a cleaning device for cleaning a gas with the cleaning solution, and a sensor for acquiring information on contamination of the gas, the parameter for generating the cleaning solution by the cleaning device A control method of the cleaning system, comprising storage means for storing the information.
A specifying step of specifying a parameter for generating the cleaning solution corresponding to the contamination information acquired by the sensor;
A control step of controlling the generation device to generate the cleaning liquid by the parameter for generating the cleaning liquid specified in the specific step. An information processing apparatus capable of communicating with a generation device that generates a cleaning liquid, a cleaning device that cleans a gas with the cleaning liquid, and a sensor that acquires contamination information of the gas,
Storage means for storing parameters for generating the cleaning fluid by the cleaning device;
Specifying means for specifying a parameter for generating the cleaning solution corresponding to the contamination information acquired by the sensor;
An information processing apparatus comprising: control means for controlling the generation device to generate the cleaning liquid by the parameter for generating the cleaning liquid specified by the specifying means. An information processing apparatus capable of communicating with a generating device that generates a cleaning liquid, a cleaning device that cleans a gas with the cleaning liquid, and a sensor that acquires contamination information of the gas, the cleaning device generating the cleaning liquid A control method of an information processing apparatus including storage means for storing parameters, the control method comprising:
A specifying step of specifying a parameter for generating the cleaning solution corresponding to the contamination information acquired by the sensor;
A control step of controlling the generation device to generate the cleaning liquid based on the parameter for generating the cleaning liquid specified in the identifying step.   A program causing a computer to function as each means of the information processing apparatus according to claim 9.

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