JP2018173463A - Hologram structure - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a hologram structure that has a high forgery prevention function and security function, and has an excellent design property.SOLUTION: The present invention relates to a hologram structure that has a reflection-type Fourier transform hologram region and a transmission-type Fourier transform hologram region, where the reflection-type Fourier transform hologram region is a region to transform reflected light into a first optical image, the reflected light being light made incident from a point source and reflected on a concavo-convex surface of a first hologram layer having the concavo-convex surface on its surface, and the transmission-type Fourier transform hologram region is a region to transform transmitted light into a second optical image, the transmitted light being light made incident from the point source and transmitted through a second hologram layer arranged in a pattern.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a hologram structure having excellent anti-counterfeiting properties and design properties.

  In recent years, hologram structures have been widely used for anti-counterfeit applications because of their comparatively difficult replication and beautiful appearance. There are various types of such hologram structures depending on a method of recording an original image as interference fringes, a principle of displaying an optical image by a hologram, and the like. For example, an embossed hologram, a volume hologram, an electronic hologram, a Fourier transform hologram that is a computer-generated hologram, and the like can be given.

  By using such a hologram structure, authenticity can be identified, and a forgery prevention function and a security function can be improved. Attempts have also been made to impart design properties using an optical image displayed by a hologram structure. For example, Patent Document 1 discloses an optical structure for authenticity including a plurality of micro optical unit areas.

Japanese Patent No. 487964

  Conventionally, various hologram structures have been proposed, but further improvement of the forgery prevention function and security function and the provision of superior design properties are required. The main object of the present invention is to provide a hologram structure having a high anti-counterfeiting function and a security function and having an excellent design.

  The present invention relates to a hologram structure having a reflection type Fourier transform hologram region and a transmission type Fourier transform hologram region, wherein the reflection Fourier transform hologram region has a concave surface on the surface of light incident from a point light source. The reflected light reflected by the concavo-convex surface of one hologram layer is a region that converts the reflected light into a first light image. The transmission Fourier transform hologram region is a second region in which light incident from a point light source is arranged in a pattern. Provided is a hologram structure characterized in that it is a region for converting transmitted light transmitted through a hologram layer into a second light image.

  According to the present invention, since the hologram structure has the reflection type Fourier transform hologram region, it can reflect the light from the point light source and display the first light image, and the transmission type Fourier transform hologram region. By having it, the light from the point light source can be transmitted and the second light image can be displayed. Therefore, it is possible to obtain a hologram structure that is capable of displaying a predetermined light image according to the irradiation direction of the point light source and that is excellent in anti-counterfeiting and design properties.

  In the present invention, it is preferable that the second hologram layer is disposed on the uneven surface side of the first hologram layer. The uneven surface of the first hologram layer has a function of reflecting the light from the point light source to display the first light image. At this time, the second hologram layer is disposed on the uneven surface side of the first hologram layer. Therefore, the light from the point light source is easily reflected by the difference in refractive index between the first hologram layer and the second hologram layer. Therefore, it is possible to display a clearer first light image.

  In the present invention, it is preferable that the reflective Fourier transform hologram region and the transmission Fourier transform hologram region have regions that overlap in plan view. Since the reflection type Fourier transform hologram region and the transmission type Fourier transform hologram region have regions that overlap in plan view, the forgery prevention property can be further improved.

  In the present invention, it is preferable that a diffraction grating region for displaying a diffraction pattern is further provided, and the diffraction grating region is located in a region that does not overlap the reflection Fourier transform hologram region in plan view. By further including a diffraction grating region for displaying a diffraction pattern, it is possible to further improve the forgery prevention property. Moreover, it is possible to display a diffraction pattern and to exhibit excellent design properties.

  In the present invention, it is preferable that the first hologram layer has an adhesive layer on the uneven surface side and is used as a hologram seal. A high anti-counterfeiting function, a security function, and an excellent design can be imparted to the adherend to which the hologram seal is attached.

  In the present invention, the first hologram layer has a heat seal layer on the uneven surface side, the first hologram layer has a peelable layer on the opposite side of the uneven surface, and the easy peel layer It is preferable that a peeling substrate is provided on the surface opposite to the first hologram layer and used as a hologram transfer foil. It is possible to impart a high anti-counterfeiting function, a security function, and an excellent design to the adherend to which the hologram transfer foil is attached.

  In the present invention, it is preferably used as an information recording medium. The hologram structure of the present invention can be used as an information recording medium having a high anti-counterfeiting function and a security function and having an excellent design.

  The present invention produces an effect that a hologram structure having excellent anti-counterfeiting properties and design properties can be provided.

It is a schematic sectional drawing which shows an example of the hologram structure of this invention. It is explanatory drawing for demonstrating the hologram structure of this invention. It is explanatory drawing for demonstrating the hologram structure of this invention. It is explanatory drawing for demonstrating the hologram structure of this invention. It is the schematic plan view and schematic sectional drawing which show an example of the hologram structure of this invention. It is a schematic sectional drawing which shows an example of the 1st hologram layer in this invention. It is explanatory drawing for demonstrating the hologram structure of this invention. It is a schematic sectional drawing which shows the other example of the hologram structure of this invention. It is a schematic sectional drawing which shows an example of the 2nd hologram layer in this invention. It is explanatory drawing for demonstrating the hologram structure of this invention. It is explanatory drawing for demonstrating the 1st usage condition of the hologram structure of this invention. It is explanatory drawing for demonstrating the 2nd usage condition of the hologram structure of this invention. It is explanatory drawing for demonstrating the 3rd usage condition of the hologram structure of this invention.

  Hereinafter, the hologram structure of the present invention will be described.

  The hologram structure of the present invention is a member having a reflection Fourier transform hologram region and a transmission Fourier transform hologram region, and the reflection Fourier transform hologram region has an uneven surface on the surface when light incident from a point light source is present. A region where the reflected light reflected by the uneven surface of the first hologram layer is converted into a first light image, and the transmission Fourier transform hologram region is arranged such that light incident from a point light source is arranged in a pattern The member is a region that converts the transmitted light that has passed through the second hologram layer into a second light image.

  Hereinafter, the hologram structure of the present invention will be described with reference to the drawings. However, the present invention can be implemented in many different modes, and should not be construed as being limited to the description of the embodiments described below. In addition, the drawings may be schematically represented with respect to the width, thickness, shape, and the like of each part as compared with the embodiments for the sake of clarity of explanation, but are merely examples, and the interpretation of the present invention is not limited thereto. It is not limited. In addition, in the present specification and each drawing, elements similar to those described above with reference to the previous drawings are denoted by the same reference numerals, and detailed description may be omitted as appropriate.

  FIG. 1 is a schematic sectional view showing an example of the hologram structure of the present invention. As illustrated in FIG. 1, a hologram structure 100 of the present invention includes a first hologram layer 1a having a concavo-convex surface on the surface, and a second hologram arranged in a pattern on one surface side of the first hologram layer 1a. And a hologram layer 1b. Further, the hologram structure 100 shown in FIG. 1 includes an adhesive layer 2 disposed on a surface of the second hologram layer 1b opposite to the concave and convex surface of the first hologram layer 1a, and a second hologram layer 1b of the adhesive layer 2. It is an example which has the separator 3 arrange | positioned on the surface on the opposite side, and the transparent base material 4 arrange | positioned on the surface on the opposite side to the uneven | corrugated surface of the 1st hologram layer 1a.

  The second hologram layer 1b is arranged in a pattern on the uneven surface side of the first hologram layer 1a. For this reason, in the region where the second hologram layer 1b is not provided between the first hologram layer 1a and the adhesive layer 2, the adhesive layer 2 is usually disposed so as to fill the uneven surface of the first hologram layer 1a.

2A, 2B, 3A, and 3B are explanatory views for explaining the hologram structure of the present invention. As shown in FIG. 2A, the original image on which a predetermined pattern is drawn is subjected to Fourier transform to obtain a first hologram layer 1a having a reflective Fourier transform hologram region in which a Fourier transform image 10 ′ is recorded. be able to. As shown in FIG. 2 (b), the reflection-type Fourier transform hologram area is a light L ₁₀ incident from the point light source, is reflected on the uneven surface formed on the surface of the first holographic layer 1a, FIG. 2 (a ) To the first light image 10 as shown in FIG. Further, as shown in FIG. 3A, the second hologram layer 1b having a transmission type Fourier transform hologram region in which the Fourier transform image 20 ′ is recorded by performing Fourier transform on the original image on which the predetermined pattern is drawn. Can be obtained. As shown in FIG. 3 (b), transmission Fourier transform hologram layer 1b is a light L ₂₀ incident from the point light source, by shielding a pattern by the second hologram layer 1b, as shown in FIG. 3 (a) The second light image 20 can be converted. In addition, about the code | symbol which is not demonstrated in FIG. 2 (a), (b) and FIG. 3 (a), (b), since it can be made the same as that of FIG. 1 (a), (b) mentioned above, The description here is omitted.

  According to the present invention, since the hologram structure has the reflection type Fourier transform hologram region, it can reflect the light from the point light source and display the first light image, and the transmission type Fourier transform hologram region. By having it, the light from the point light source can be transmitted and the second light image can be displayed. Therefore, when the point light source is irradiated from the side visually recognized by the observer, the light from the point light source is reflected by the reflective Fourier transform hologram region and enters the eyes of the observer. Therefore, the observer can visually recognize the first light image. On the other hand, when the point light source is irradiated from the side opposite to the side visually recognized by the observer, the light from the point light source passes through the transmission type Fourier transform hologram region and enters the observer's eyes. Therefore, the observer can visually recognize the second light image. Thus, the hologram structure of the present invention can display a predetermined optical image according to the irradiation direction of the observer. Therefore, for example, when it is not known that the first light image or the second light image is displayed, it is difficult to visually recognize the first light image or the second light image. It can exhibit anti-counterfeiting properties and is suitable for authenticity determination. Moreover, the hologram structure of the present invention can display the first light image and the second light image. Therefore, for example, by making the pattern displayed by the first light image and the second light image corresponding to the pattern displayed by the first light image and the second light image. Thus, a higher anti-counterfeit property can be exhibited, and a hologram structure suitable for authenticity determination can be obtained.

  In addition, according to the present invention, since there are two types of hologram areas, a reflection type Fourier transform hologram area formed by the first hologram layer and a transmission type Fourier transform hologram area formed by the second hologram layer, one hologram area is temporarily destroyed. Even in such a case, authenticity determination or the like can be performed by using the other hologram region.

  Hereinafter, the hologram structure of the present invention will be described in detail.

1. Configuration The hologram structure of the present invention has a reflection type Fourier transform hologram region and a transmission type Fourier transform hologram region.

  Hereinafter, the reflective Fourier transform hologram region and the transmission Fourier transform hologram region in the hologram structure of the present invention will be described.

(1) Reflective Fourier Transform Hologram Region The reflective Fourier transform hologram region in the present invention is the first reflected light reflected from the concavo-convex surface of the first hologram layer having the concavo-convex surface on the surface. This is an area to be converted into a light image.

  The reflection type Fourier transform hologram region in the present invention diffracts light incident from a point light source in a plurality of directions by the uneven structure on the surface of the first hologram layer, and converts it into a desired first light image based on the original image. be able to. That is, the reflection type Fourier transform hologram region in the present invention functions as a Fourier transform lens. The above function may be described as a Fourier transform lens function.

  The planar view size of the reflection type Fourier transform hologram region can be appropriately adjusted according to the use of the hologram structure of the present invention, and is not particularly limited. The specific planar view size of the reflection type Fourier transform hologram region is preferably in the range of, for example, 5 mm square to 50 mm square, and more preferably in the range of 5 mm square to 30 mm square, particularly 5 mm. It is preferable to be within a range of no less than 15 mm square. When the planar view size of the reflection type Fourier transform hologram region is the lower limit, the first light image converted by the reflection type Fourier transform hologram region is easily visible. Further, the anti-counterfeiting property can be improved by the reflection type Fourier transform hologram region, and an excellent design property can be obtained. On the other hand, when the planar view size of the reflection type Fourier transform hologram region is the above upper limit, the hologram structure of the present invention can be manufactured at low cost. In addition, it is possible to easily form a print layer for displaying a predetermined image in combination with the first optical image converted by the reflective Fourier transform hologram region.

  Here, the planar view size of the reflective Fourier transform hologram region being 5 mm square or more means that the reflective Fourier transform hologram region has a planar view shape including at least a 5 mm square range. Therefore, for example, when the reflection type Fourier transform hologram region is a rectangle, the short side length is 5 mm or more. On the other hand, when the reflection type Fourier transform hologram region is a square, It means that the length of one side is 5 mm or more.

Reflection Fourier transform hologram area in the present invention include, for example, as shown in FIG. 4 (a), may be an area where the first light image 20 by a single Fourier transform hologram area R ₁ is displayed, FIG. as shown in 4 (b), it may be an area where the first light image 20 is displayed by the Fourier transform hologram area R ₂ large format an enlarged Fourier transform hologram area R ₁ arrayed to. Incidentally, FIG. 4 (a), the first light image 20 shown in (b), for a single Fourier transform hologram area R ₁ or Fourier transform hologram area R ₂ of the large-sized, and reflects light from the point light source It shows the pattern that appears. In the present invention, the reflection type Fourier transform hologram region is preferably a large Fourier transform region. The first light image converted by the reflective Fourier transform hologram region can be enlarged, and the visibility can be further improved.

Reflection Fourier transform hologram area in the present invention, for example as described in FIG. 4 (a), when a single Fourier transform hologram area R ₁ is an area for displaying the first light image 20, of the single plan view size of the Fourier transform hologram area R ₁ is preferably a size that can be formed with high accuracy. Specifically, for example, it is preferably within a range of 0.25 mm square to 5 mm square. In addition, the planar view size of the single Fourier-transform hologram area here refers to the size of the smallest square including the single Fourier-transform hologram area. Therefore, for example, when the single Fourier transform hologram region is a square having a side of 1 mm, the planar view size is 1 mm square, and the single Fourier transform hologram region is a circular shape having a diameter of 1 mm. The size in plan view in some cases is 1 mm square.

  In the present invention, the planar view shape of the single Fourier transform hologram region constituting the reflection type Fourier transform hologram region can be appropriately selected according to the use of the hologram structure of the present invention. Specific planar view shapes of a single Fourier transform hologram region include, for example, rectangular shapes such as squares and rectangles, polygonal shapes such as trapezoidal shapes, triangular shapes, pentagonal shapes, hexagonal shapes, circular shapes, elliptical shapes, stars Examples of the shape include a heart shape and the like, but a rectangular shape is preferable from the viewpoint that it can be easily formed.

In the present invention, as shown in FIG. 4 (a), when the reflection-type Fourier transform hologram area is a single Fourier transform hologram area R _1, the plan view shape of the reflection-type Fourier transform hologram area, This corresponds to the planar view shape of the single Fourier transform hologram region described above. On the other hand, as shown in FIG. 4B, when the reflection type Fourier transform hologram region is a large Fourier transform hologram region R _{2 in} which a plurality of single Fourier transform hologram regions R ₁ are arranged, the reflection type Fourier transform hologram The shape of the region in plan view can be appropriately selected according to the application of the hologram structure of the present invention. The specific planar view shape of the reflection type Fourier transform hologram region can be the same as the planar view shape of the single Fourier transform hologram region described above, and thus description thereof is omitted here.

  The reflection type Fourier transform hologram region in the present invention may be a region that overlaps a transmission type Fourier transform hologram region described later in plan view. In the present invention, the entire reflection Fourier transform hologram region may overlap the transmission Fourier transform hologram region described later in plan view, or a part of the reflection Fourier transform hologram region may be described later. It may overlap with the Fourier transform hologram region in plan view. FIG. 5A shows a Fourier transform image 20 ′ for displaying a second light image in a part of the reflection Fourier transform hologram area in which a Fourier transform image 10 ′ for displaying the first light image is recorded. FIG. 2 is a schematic plan view showing a hologram structure 100 that overlaps with a transmission type Fourier transform hologram region in which is recorded in plan view. 5B is a cross-sectional view taken along the line AA in FIG. 5A, FIG. 5C is a cross-sectional view taken along the line BB in FIG. 5A, and FIG. ) Is a cross-sectional view taken along line CC of FIG. Here, FIG. 5B shows an example in which the adhesive layer 2 is disposed on the uneven surface side of the first hologram layer 1a. For example, the entire surface on the uneven surface side of the first hologram layer 1a is covered. 2nd hologram layer 1b may be arrange | positioned. In this case, the 2nd hologram layer 1b can function as a reflective layer for reflecting light suitably in the uneven surface of the 1st hologram layer 1a in a reflection type Fourier-transform hologram area. In addition, about the code | symbol shown in FIG.5 (b)-(d), since it can be the same as that of FIG. 1 mentioned above, description here is abbreviate | omitted.

  In the present invention, for example, as shown in FIG. 5A, the ratio of the reflection Fourier transform hologram area A in the hologram structure 100 occupied in plan view can display a desired first light image. It is sufficient to have a ratio of about, and can be adjusted as appropriate according to the use of the hologram structure. For example, it is preferably 25% or more, and more preferably 50% or more. As shown in FIG. 5A, when a part of the reflection type Fourier transform hologram region A has a region C that overlaps a transmission type Fourier transform hologram region B described later in plan view, the total reflection type Fourier transform is performed. When the hologram area A is 100%, the ratio of the area C where the reflection type Fourier transform hologram area A and the transmission type Fourier transform hologram area B overlap in plan view is preferably, for example, 5% or more. It is preferably 25% or more, and particularly preferably 50% or more. In the present invention, the ratio of the region where the reflection type Fourier transform hologram region and the transmission type Fourier transform hologram region overlap in the planar view in the total reflection type Fourier transform hologram region is within the predetermined range described above. It is possible to further improve the anti-counterfeiting property of the structure. In the hologram structure, for example, a Fourier transform image 10 ′ shown in FIG. 2A for displaying the first light image, and a Fourier transform image 20 shown in FIG. 3A for displaying the second light image, for example. The following effects can be achieved by overlapping 'and in plan view. That is, for example, by making the pattern displayed by the first light image and the second light image corresponding to each of the patterns displayed by the first light image and the second light image, for example, the pattern that makes one meaning by the pattern displayed by the first light image and the second light image Thus, a higher anti-counterfeit property can be exhibited, and a hologram structure suitable for authenticity determination can be obtained.

(A) First Hologram Layer In the reflection type Fourier transform hologram region in the present invention, the light incident from the point light source is reflected by the irregular surface of the first hologram layer having the irregular surface on the surface as the first optical image. Can be converted. That is, the reflection type Fourier transform hologram region has the first hologram layer.

  The first hologram layer in the present invention only needs to be formed at least in the reflection type Fourier transform hologram region, but is usually a cross-sectional view taken along line AA in FIG. 5A and FIG. As shown in FIG. 5C, which is a sectional view taken along the line BB of FIG. 5A, and FIG. 5D, which is a sectional view taken along the line CC of FIG. Instead, the first hologram layer 1a is continuously formed also in a transmission Fourier transform hologram region described later. Here, “successively formed” is sufficient if the first hologram layer is formed without interruption, and a single first hologram layer may be disposed as a single unit. May be arranged in parallel. In the present invention, the former is preferable from the viewpoint of production.

  As described above, the first hologram layer in the present invention is not a member formed only in the reflection type Fourier transform hologram region, but whether or not the first hologram layer is a reflection type Fourier transform hologram region in the region having the first hologram layer. This can be confirmed by checking whether the surface of the first hologram layer is uneven or not. In other words, in the present invention, a region having an uneven surface in the first hologram layer corresponds to a reflective Fourier transform hologram region.

  In the reflection type Fourier transform hologram region, the concavo-convex structure forming the concavo-convex surface formed on the surface of the first hologram layer is a Fourier transform image multi-valued based on the data of the original image displayed as the first optical image. It is. Such a concavo-convex structure is usually composed of a large number of convex or concave portions that are curved or straight and extend in parallel in a specific direction, as shown in FIG.

  Examples of a method for obtaining a reflective Fourier transform hologram region by forming an uneven structure on the surface of the first hologram layer in the present invention include the following methods. That is, a master original having a concavo-convex structure corresponding to a Fourier transform image is formed. Next, a method of applying a resin material such as an ultraviolet curable resin on a base material such as polyethylene terephthalate to form a coating film, and then transferring the concavo-convex structure of the master original plate described above to the coating film is a method. Can be mentioned. In addition, when the uneven | corrugated pattern of a master original plate is transcribe | transferred only once, a single Fourier-transform hologram area can be obtained. On the other hand, when the uneven pattern of the master original is transferred a plurality of times, a large Fourier transform hologram region having a desired size in which a single Fourier transform hologram region is arranged can be obtained.

  Moreover, as a formation method of the master original plate mentioned above, the following methods are mentioned, for example. That is, a Fourier transform image is formed by calculation based on the image data of the original image. Next, the data obtained by converting the data of the Fourier transform image into a binary value or more is converted into electron beam drawing data, and the electron beam drawing data is arranged to a desired range. Specifically, a predetermined number of electron beam drawing data are arranged in the vertical and horizontal directions, respectively. Next, a method of creating a master original using an electron beam drawing apparatus based on the arranged electron beam drawing data can be mentioned.

  In the present invention, for example, when a master original plate is created by converting binarized data of Fourier transform image data into electron beam drawing data, the concavo-convex structure obtained using the master original plate is shown in FIG. As shown to a), it becomes a two-step uneven | corrugated shape. On the other hand, when the data obtained by quaternizing the data of the Fourier transform image is converted into electron beam drawing data to create a master original, the concavo-convex structure obtained using the master original is as shown in FIG. It becomes a four-step uneven shape. In addition, even if it is the case of quaternarization, it may have a 1 step | paragraph or uneven | corrugated shape partially. In the present invention, when the data of the Fourier transform image is multi-valued, it is preferably set to four or more values. In other words, it is preferable that the uneven structure on the surface of the first hologram layer has four or more steps. This is because the first light image having a more complicated pattern can be displayed. In addition, about the code | symbol which is not demonstrated in FIG. 6 (a), (b), since it can be made the same as that of FIG. 1 mentioned above, description here is abbreviate | omitted.

  In the present invention, when the uneven structure on the surface of the first hologram layer has four or more steps, the first light image observed by the light reflected by the uneven surface of the first hologram layer becomes one image. On the other hand, when the concavo-convex structure on the surface of the first hologram layer has two steps, the first light image observed by the light reflected by the concavo-convex surface of the first hologram layer has a mirror image relationship centered on the 0th order light. It becomes one image.

  The grating pitch of the concavo-convex structure formed on the surface of the first hologram layer is preferably such that light incident from the point light source can be converted into a desired first light image. A specific lattice pitch of the concavo-convex structure is, for example, preferably in the range of 1.0 μm or more and 80.0 μm or less. Note that the lattice pitch of the concavo-convex structure refers to, for example, the distance indicated by the symbol P in FIGS. 6A and 6B.

Here, as shown in FIG. 7, light is irradiated from a point light source disposed at a height T ₁ to a reflection type Fourier transform region in which a Fourier transform image 10 ′ is recorded in the hologram structure 100. when the observer observes the reflection type Fourier transform hologram area from the T _2, for the viewer to observe the entire image of the first optical image in the entire area of the Fourier transform hologram regions, the grating pitch, the following equation It is preferable to design based on (1).
P = nλ / (sin θ1 + sin θ2) (1)
In the above formula (1), λ is the wavelength of the diffracted light, P is the grating pitch of the concavo-convex structure, θ1 is the incident angle when the light reaches from the point light source to the end of the reflective Fourier transform hologram region, and θ2 is The diffraction angle for the diffracted light to reach the observer from the end of the reflection type Fourier transform hologram region, and n is the order of diffraction.

A specific calculation example of the lattice pitch described above will be described. When the reflection Fourier transform hologram region has a square shape with a side of 15 mm, T ₁ is 50 mm, T ₂ is 300 mm, and the wavelength of the diffracted light is 550 nm, sin θ2 is 0.025, and sin θ1 is 0. 148 is calculated. Then, the grating pitch P necessary for the observer to observe the entire image of the first light image in the entire area of the reflection type Fourier transform hologram area can be calculated as 3179 nm at the shortest. Further, when the reflection type Fourier transform hologram region is a square shape having a side of 15 mm, T ₁ is 1990 mm, T ₂ is 2000 mm, and the wavelength of diffracted light is 550 nm, sin θ2 is 0.00374, and sin θ1 is Calculated as 0.00377. Then, the grating pitch P necessary for the observer to observe the entire image of the first optical image in the entire area of the reflection type Fourier transform hologram area can be calculated as 73236 nm at the shortest. Further, when the reflection type Fourier transform hologram region is a square shape having a side of 10 mm, T1 is 60 mm, T2 is 60 mm, and the wavelength of diffracted light is 550 nm, sin θ2 is 0.083, and sin θ1 is 0.8. 083 is calculated. Then, the grating pitch P necessary for the observer to observe the entire image of the first optical image in the entire area of the reflection type Fourier transform hologram area can be calculated as 3313 nm at the shortest.

  The height difference of the concavo-convex structure on the surface of the first hologram layer is not particularly limited as long as the incident light can be converted into a desired first light image. A specific height difference of the concavo-convex structure can be, for example, in a range of 0.01 μm or more and 1.5 μm or less, and preferably in a range of 0.05 μm or more and 1.0 μm or less. When the height difference of the concavo-convex structure is within the above range, it is possible to stably convert incident light into a desired first light image. Here, the difference in level of the concavo-convex structure refers to the distance from the surface of the highest convex part to the surface of the deepest concave part in the concavo-convex structure, and is represented by, for example, the symbol D in FIGS. Distance.

  The first hologram layer in the present invention is preferably made of a material capable of forming a concavo-convex structure on the surface as a reflective Fourier transform hologram region and exhibiting a desired Fourier transform lens function. Moreover, it is preferable that the 1st hologram layer in this invention is comprised from the material which shows a predetermined refractive index. Since the refractive index of a 1st hologram layer can be suitably selected according to the use etc. of the hologram structure of this invention, it is not specifically limited. Moreover, the wavelength used as the reference | standard of the refractive index of a 1st hologram layer can be suitably selected, for example from the range of 400 nm or more and 750 nm or less, and is not specifically limited. In the present invention, the refractive index at a wavelength of 555 nm is preferably in the range of 1.3 to 2.0, and particularly preferably in the range of 1.33 to 1.8. The refractive index of the first hologram layer can be measured using, for example, a spectroscopic ellipsometer.

  Examples of the material of the first hologram layer in the present invention include a resin material used for forming a general relief hologram. Specific examples of the resin material include a thermosetting resin, a thermoplastic resin, an ultraviolet curable resin, and an ionizing radiation curable resin.

  The first hologram layer in the present invention may contain other materials as necessary in addition to the materials described above. Other materials include, for example, photopolymerization initiators, polymerization inhibitors, deterioration inhibitors, plasticizers, lubricants, colorants such as dyes and pigments, extenders and fillers such as resins to prevent blocking, interfaces, etc. Examples thereof include additives such as an activator, an antifoaming agent, a leveling agent, and a thixotropic agent.

The thickness of the first hologram layer in the present invention is preferably such that the first hologram layer has a self-supporting property. The specific thickness is preferably in the range of 0.05 mm to 5 mm, for example, and more preferably in the range of 0.1 mm to 3 mm. On the other hand, when the first hologram layer does not have a self-supporting property and is formed on a transparent substrate to be described later, the thickness of the first hologram layer is, for example, in the range of 0.1 μm to 50 μm. Among them, it is preferable that the thickness is in the range of 0.5 μm or more and 20 μm or less. Here, the thickness of the first hologram layer refers to, for example, the distance indicated by the symbol D _1a shown in FIGS.

(B) 1st optical image The reflection type Fourier-transform hologram area in this invention reflects the light which injected from the point light source on the uneven surface formed in the surface of the 1st hologram layer, and converts it into a 1st optical image. It is an area.

  The pattern of the first light image displayed by the reflective Fourier transform hologram region in the present invention can be, for example, a pattern, a line drawing, a character, a figure, a symbol, etc., and is appropriately selected according to the use of the hologram structure. be able to. In the present invention, the first light image displayed by the reflection type Fourier transform hologram region may be the same pattern as the second light image displayed by the transmission type Fourier transform hologram region, which will be described later. It may be.

In the present invention, for example as shown in FIG. 2 (b), when irradiating the point light source from the transparent substrate 4 side of the hologram structure 100, the light L ₁₀ is reflected on the uneven surface of the first holographic layer 1a. Thereby, the observer on the transparent base material 4 side can visually recognize the first light image which is a star-shaped pattern indicated by reference numeral 10 in FIG. Although not shown, for example, even when the point light source is irradiated from the separator 3 side in FIG. 2B, the light from the point light source is emitted from the second hologram layer on the uneven surface of the first hologram layer 1a. Reflects in an area not covered by 1b. Therefore, the observer can visually recognize the first light image to some extent from the separator 3 side, depending on the refractive index difference between the first hologram layer 1a and the member in contact with the surface of the first hologram layer 1a. It becomes possible. In the present invention, from the viewpoint of displaying the first light image more clearly, as shown in FIG. 2B, a point light source is irradiated from the transparent substrate 4 side, and an observer is viewed from the transparent substrate 4 side. However, it is preferable to visually recognize the first light image 10. The light emitted from the point light source can be sufficiently reflected by the uneven surface formed on the surface of the first hologram layer in the reflective Fourier transform hologram region. Therefore, the light emitted from the point light source can be sufficiently contributed to the display of the first light image.

  For example, as shown in FIG. 8B, when a second hologram layer 1b described later is disposed on a surface opposite to the concave and convex surface of the first hologram layer 1a, the first hologram layer 1b is usually first. A high refractive index layer 14 is formed at the interface between the hologram layer 1 a and the adhesive layer 2. In the case of such a hologram structure, it is preferable that the first light image is irradiated by a point light source from the separator 3 side and visually recognized by the observer from the separator 3 side. This is because the light from the point light source can be reflected by the refractive index difference between the first hologram layer 1 a and the high refractive index layer 14. 8B, even when the point light source is irradiated from the transparent substrate 4 side, the light from the point light source forms the second hologram layer 1b. The light is incident on the concave and convex surface of the first hologram layer 1a from the opening area that is not, and is reflected. Therefore, although depending on the size of the opening region where the second hologram layer 1b is not formed, the observer can visually recognize the first light image to some extent from the transparent substrate 4 side. In the present invention, from the viewpoint of displaying the first light image more clearly, it is preferable that the observer visually recognizes the point light source from the separator 3 side as described above. When the point light source is irradiated from the transparent substrate 4 side, light enters the first hologram layer 1a from the opening region where the second hologram layer 1b is not formed. Therefore, depending on the size of the opening region This is because the amount of light incident on the first hologram layer 1a may be limited. Note that the detailed description of FIG. 8B will be described in the section “(2) Transmission Fourier Transform Hologram Region” described later, and therefore description thereof is omitted here.

(C) Others In the present invention, examples of the point light source that irradiates light to the reflection type Fourier transform hologram region include a laser light source. The wavelength of the point light source is not particularly limited, and it is preferable that the reflection type Fourier transform hologram region can exhibit the Fourier transform lens function well. In the present invention, the wavelength of the point light source may be monochromatic light of one wavelength, light including multiple wavelengths, or white light.

(2) Transmission Fourier Transform Hologram Region In the transmission Fourier transform hologram region in the present invention, light incident from a point light source is shielded in a pattern by the second hologram layer disposed on one surface side of the first hologram layer. This is the area to be converted into the second light image.

  The transmission type Fourier transform hologram region in the present invention is a region in which light incident from a point light source converts transmitted light transmitted through a second hologram layer arranged in a pattern into a second light image. That is, the transmission type Fourier transform hologram region in the present invention functions as a Fourier transform lens. The above function may be described as a Fourier transform lens function.

  The transmission type Fourier transform hologram region in the present invention is a region where a Fourier transform image 20 ′ in which the second hologram layer is formed in a pattern shape is recorded, for example, as shown in FIG. The transmission type Fourier transform hologram region in the present invention may be a region where the second light image is displayed by a single Fourier transform hologram region, like the reflection type Fourier transform hologram region described above. It may be an area where the second light image is displayed by a large Fourier transform hologram area obtained by arranging and enlarging a plurality of conversion hologram areas.

  The specific description of the size and shape of the transmission Fourier transform hologram region in plan view may be the same as that described in the above-mentioned section “(1) Reflection type Fourier transform hologram region”. Since it is possible, the description here is omitted.

  The transmission type Fourier transform hologram region in the present invention may be a region overlapping the above-described reflection type Fourier transform hologram region in plan view. In the present invention, the entire surface of the transmission Fourier transform hologram region may overlap the reflection Fourier transform hologram region described above in plan view, or a part of the transmission Fourier transform hologram region may be the reflection type described above. It may overlap with the Fourier transform hologram region in plan view. FIG. 5A shows a part of a transmission Fourier transform hologram area in which a Fourier transform image 20 ′ for displaying a second light image is recorded, a Fourier transform image 10 ′ for displaying the first light image. FIG. 2 is a schematic plan view showing a hologram structure 100 that overlaps with a reflection type Fourier transform hologram area in which is recorded in plan view.

  In the present invention, for example, as shown in FIG. 5A, the ratio of the transmission Fourier transform hologram region B in the hologram structure 100 occupied in a plan view can display a desired second light image. It is sufficient to have a ratio of about, and can be adjusted as appropriate according to the use of the hologram structure. For example, it is preferably 25% or more, and more preferably 50% or more. Further, as shown in FIG. 5A, when a part of the transmission Fourier transform hologram region B has a region C that overlaps the reflection Fourier transform hologram region A in plan view, the total transmission Fourier transform is performed. When the hologram area B is 100%, the ratio of the area C where the transmission Fourier transform hologram area B and the reflection Fourier transform hologram area A overlap in plan view is preferably within a predetermined range. In addition, about the said ratio, it can be made to be the same as that of the ratio when the total reflection type Fourier-transform hologram area | region A described in the term of the said "(1) reflection type Fourier-transform hologram area" is 100%. Therefore, the description here is omitted. In the present invention, the ratio of the region where the transmission Fourier transform hologram region and the reflection Fourier transform hologram region overlap in plan view in the total transmission Fourier transform hologram region is within the predetermined range described above. It is possible to further improve the anti-counterfeiting property of the structure. In the hologram structure, for example, a Fourier transform image 20 ′ shown in FIG. 3A for displaying the second light image, and a Fourier shown in FIG. 2A for displaying the first light image, for example. This is because the converted image 10 ′ overlaps in plan view, so that a more complicated configuration can be obtained and imitation can be difficult.

(B) Second Hologram Layer The second hologram layer in the present invention is a member arranged in a pattern on one surface side of the first hologram layer.

  8A and 8B are schematic cross-sectional views showing examples of the hologram structure of the present invention. In the present invention, as shown in FIG. 8 (a), the second hologram layer 1b may be arranged on the uneven surface side of the first hologram layer 1a, or as shown in FIG. 8 (b), You may arrange | position the 2nd hologram layer 1b in the surface on the opposite side to the uneven | corrugated surface of the 1st hologram layer 1a. In the present invention, it is particularly preferable that the second hologram layer 1b is disposed on the uneven surface side of the first hologram layer 1a as shown in FIG. When the hologram structure 100 of the present invention is observed from the transparent substrate 4 side, the uneven structure formed on the surface of the first hologram layer is blocked by the second hologram layer in the reflective Fourier transform hologram region. It can be fully observed. Further, the second hologram layer arranged in a pattern can be sufficiently observed in the transmission Fourier transform hologram region. Therefore, by observing the hologram structure of the present invention from one surface, when the light from the point light source is reflected, the first light image converted by the reflection type Fourier transform hologram region can be observed. When the light from the light source is transmitted, the second light image converted by the transmission type Fourier transform hologram region can be observed.

  On the other hand, as shown in FIG. 8B, when the second hologram layer 1b is disposed on the surface opposite to the concave and convex surface of the first hologram layer 1a, the first hologram layer 1a and the first hologram layer 1a A high refractive index layer 14 is formed between a member in contact with the concavo-convex surface side of one hologram layer 1a. By doing so, in the concavo-convex structure formed on the surface of the first hologram layer 1a due to the difference in refractive index between the first hologram layer 1a and the high refractive index layer 14, the transparent substrate 4 side or the separator 3 side It is possible to sufficiently reflect the light emitted from the light source. As a result, the first optical image can be favorably observed in the reflective Fourier transform hologram region. Further, in the case of observing the second light image in the transmissive Fourier transform hologram region in the hologram structure 100 shown in FIG. 8B, the light is irradiated from the light source on the transparent substrate 4 side and observed from the separator 3 side. Alternatively, the light may be irradiated from a light source on the separator 3 side and observed from the transparent substrate 4 side. From the viewpoint of observing the second light image, the irradiation direction of light from the light source and the observation direction are not particularly limited. In addition, since the preferable aspect when observing a 1st optical image using the hologram structure 100 shown in FIG.8 (b) was described in the said "(1) reflection type Fourier-transform hologram area | region", it is here. Is omitted. Moreover, since the reference numerals not described in FIGS. 8A and 8B can be the same as those in FIG. 1 described above, description thereof is omitted here.

  In the transmission type Fourier transform hologram region, the second hologram layer disposed on one surface side of the first hologram layer is multi-valued Fourier transform based on the data of the original image displayed as the second light image. It is a statue. The second hologram layer is a member that can block light incident from a point light source in a pattern. In other words, the second hologram layer is a member having a light shielding property and arranged in a pattern. As shown in FIG. 3A, such a second hologram layer is generally composed of a large number of curved or linear patterns extending in parallel in a specific direction.

  As a method for obtaining a transmission type Fourier transform hologram region by arranging the second hologram layer in a pattern according to the present invention, the second hologram layer is transmitted to one surface side of the first hologram layer and light from a point light source is transmitted. Any method may be used as long as it is arranged in a pattern so that a desired second light image can be displayed, and can be appropriately selected according to the material used for the second hologram layer. Specifically, for example, a method of forming the second hologram layer in a pattern using a laser drawing method, a demeta printing method, a resist printing method, a mask vapor deposition method, a sputtering method, an ion plating method, or the like can be given. In the present invention, it is particularly preferable to form the second hologram layer using a laser drawing method. Since variable pattern formation can be performed, it is suitable for forming a hologram structure having high anti-counterfeiting properties and excellent design.

  In the present invention, the pitch of the second hologram layer formed in a pattern is preferably such that light incident from the point light source can be converted into a desired second light image. The specific pitch of the second hologram layer can be the same as the grating pitch described in the section “(1) Reflective Fourier transform hologram region (a) First hologram layer”. Description is omitted. In addition, the pitch of the 2nd hologram layer formed in pattern means the distance shown with the code | symbol P of FIG. 9, for example.

  The second hologram layer has a function of shielding light incident from the point light source in a pattern. Therefore, the thickness of the second hologram layer is preferably a thickness that can sufficiently block light incident from the point light source, and is appropriately determined according to the type of material used for the second hologram layer and the manufacturing method. You can choose. In the present invention, for example, the thickness of the second hologram layer is preferably in the range of 0.01 to 50 μm, and more preferably in the range of 0.03 to 20 μm. Note that the thickness of the second hologram layer refers to, for example, a distance indicated by a symbol D in FIG.

  In the present invention, light incident from a point light source is shielded in a pattern by the second hologram layer and converted into a second light image. Here, “shielding” includes not only the case of completely shielding the light incident from the point light source but also the case of shielding the light to such an extent that it can be converted into the second light image. Specifically, the visible light transmittance of the second hologram layer is preferably 90% or less, more preferably 70% or less, and particularly preferably 50% or less. In addition, the visible light transmittance of a 2nd hologram layer can be measured with the test method of the total light transmittance of the plastic-transparent base material based on JISK7361-1.

  In the present invention, it is preferable that the second hologram layer has reflectivity for reflecting light incident from a point light source. For example, as shown in FIG. 1, the second hologram layer 1b is arranged on the concave and convex surface side of the first hologram layer 1a, and the point light source is irradiated from the transparent substrate 4 side as shown in FIG. 2 (b). And when an observer observes a 1st light image from the transparent base material 4 side, it is because a 1st light image can be visually recognized more clearly. This is presumably because the light incident from the point light source is effectively reflected by the second hologram layer 1b that follows so as to cover the uneven surface of the first hologram layer 1a. As the specific reflectivity of the second hologram layer, for example, the reflectance is preferably 5% or more, more preferably 10% or more, and particularly preferably 15% or more. In addition, the reflectance of a 2nd hologram layer can be measured based on JISK7375, for example.

  The material of the second hologram layer in the present invention may be any material that can convert the light incident from the point light source into a desired second light image by shielding it in a pattern. Among these, a material having a predetermined light-shielding property as described above is preferable, and a material having both the predetermined light-shielding property and reflectivity as described above is particularly preferable. Specific examples include aluminum, silver, gold, nickel, copper, chromium, titanium, titanium nitride, titanium carbide, nickel chromium, stainless steel, brass, and the like. In the present invention, aluminum is particularly preferably used from the viewpoints of reflectivity and light shielding properties.

(C) Second Light Image The transmission type Fourier transform hologram region in the present invention is a region where light incident from a point light source is shielded in a pattern by the second hologram layer and converted into a second light image.

  The pattern of the second light image displayed by the transmission Fourier transform hologram region in the present invention can be, for example, a pattern, a line drawing, a character, a figure, a symbol, or the like, and is appropriately selected according to the use of the hologram structure. be able to. In the present invention, the second light image displayed by the transmission type Fourier transform hologram region may be the same pattern as the first light image displayed by the reflection type Fourier transform hologram region described above, and the patterns are different from each other. It may be.

  In the present invention, for example, as shown in FIG. 3 (b), by irradiating a point light source from the separator 3 side of the hologram structure 100, the observer on the transparent substrate 4 side can see FIG. 3 (a). It is possible to visually recognize the second light image that is the face pattern indicated by reference numeral 20. Although not shown, for example, even when the point light source is irradiated from the transparent substrate 4 side in FIG. 3B, the light from the point light source is shielded in a pattern by the second hologram layer 1b. . Therefore, the observer can visually recognize the second light image from the separator 3 side.

  For example, as shown in FIG. 8B, when the second hologram layer 1b is arranged on the surface opposite to the concave and convex surface of the first hologram layer 1a, the second light image is The point light source may be irradiated from the separator 3 side and the observer may visually recognize from the transparent substrate 4 side, or the point light source may be irradiated from the transparent substrate 4 side and the observer visually recognized from the separator 3 side. May be. In the present invention, from the viewpoint of displaying the first light image more clearly, it is preferable that the point light source is irradiated from the transparent substrate 4 side and the observer visually recognizes from the separator 3 side. The reason for this can be the same as that described in the section “(1) Reflective Fourier Transform Hologram Region (b) First Optical Image”, and the description is omitted here.

(D) Others In the present invention, examples of the point light source that irradiates light to the transmission Fourier transform hologram region include a laser light source. The wavelength of the point light source is not particularly limited, and it is preferable that the reflection type Fourier transform hologram region can exhibit the Fourier transform lens function well. In the present invention, the wavelength of the point light source may be monochromatic light of one wavelength, light including multiple wavelengths, or white light.

(3) Diffraction grating region The diffraction grating region in the present invention is a region for displaying a diffraction pattern. The diffraction grating region is located in a region that does not overlap the reflection type Fourier transform hologram region in plan view. Here, the diffraction grating region includes a relief hologram region.

  The diffraction grating region refers to a region where a plurality of pixels having a diffraction grating pattern are gathered. FIG. 10A is a schematic plan view showing an example of a diffraction grating pattern. As shown in FIG. 10 (a), the hologram structure 100 of the present invention includes at least a reflection Fourier transform hologram region A, a transmission Fourier transform hologram region B, or a region C where they overlap, Although it has the area | region where a 2nd light image is displayed, you may have the diffraction grating area | region where the diffraction grating pattern 30 which displays a diffraction grating pattern gathered as needed. This is because the anti-counterfeiting property can be further improved and a hologram structure having excellent design properties can be obtained. As shown in FIG. 10B, in the diffraction grating pattern 30, a grating line 31 having a predetermined line width d is arranged in a closed region 32 having a size corresponding to one pixel. The lattice lines 31 are arranged at a predetermined pitch p and a predetermined angle θ. Although not shown, the diffraction grating region is preferably formed on the same plane as the reflective Fourier transform hologram region. Specifically, the diffraction grating pattern is preferably arranged on the same plane as the first hologram layer in the present invention. At this time, in the first hologram layer, the concave and convex surface side for forming the reflective Fourier transform hologram region and the surface side where the diffraction grating pattern is recorded in the diffraction grating pattern are designed to be the same surface. It is preferable to do.

  The line width d, pitch p, and angle θ of the grating lines in the diffraction grating pattern can be appropriately set to dimension values that cause diffraction in the light irradiated to the diffraction grating region. In the diffraction grating region, a predetermined diffraction pattern can be displayed by collecting a plurality of types of diffraction grating patterns with various line widths d, pitches p, angles θ, and the like. In addition, various dimension values, arrangements, and the like of the diffraction grating pattern are appropriately determined in accordance with pixel values assigned to a large number of pixels constituting the original image in the original image to be displayed by the diffraction grating region. The various dimension values of the diffraction grating pattern are determined based on the image data of the original image captured by the computer.

  The diffraction grating pattern constituting the diffraction grating region can be the same as a general diffraction grating pattern. Specifically, the diffraction grating pattern in the present invention is the same as the general diffraction grating pattern disclosed in Japanese Patent Application Laid-Open No. 2008-191540, Japanese Patent Application Laid-Open No. 2000-304912, Japanese Patent Application Laid-Open No. 2008-077042, and the like. can do. Therefore, detailed description here is omitted.

  The diffraction grating region in the present invention is located in a region that does not overlap with the reflection type Fourier transform hologram region in plan view. This is due to the following. That is, normally, the diffraction grating pattern constituting the diffraction grating region has an uneven structure on the surface. Then, it becomes difficult to dispose a diffraction grating region having a concavo-convex structure on the surface in a region overlapping the reflection Fourier transform hologram region having a concavo-convex structure on the surface of the first hologram layer in plan view. As described above, the diffraction grating region in the present invention is located in a region that does not overlap in plan view with the reflection type Fourier transform hologram region, but the diffraction grating region and transmission type Fourier transform hologram region have regions in plan view. You may do it.

  Examples of the diffraction grating pattern displayed by the diffraction grating region in the present invention include patterns, line drawings, characters, figures, symbols, and the like. In addition, these diffraction grating patterns are combined with the first light image converted by the reflection type Fourier transform hologram area and the second light image pattern converted by the transmission type Fourier transform hologram area. It may be designed to do. In this case, the forgery prevention property can be further improved.

  The diffraction grating pattern in the present invention may be a planar diffraction grating pattern capable of reproducing a pattern in a plane, a three-dimensional diffraction grating pattern capable of reproducing a pattern in three dimensions, or a planar diffraction grating pattern. And a combination of both three-dimensional diffraction grating patterns. When the diffraction grating pattern is a plane diffraction grating pattern or a three-dimensional diffraction grating pattern, a hologram structure having more excellent design can be obtained.

  Examples of the method for displaying the plane diffraction grating pattern include the following methods. That is, there is a method of displaying with diffraction grating patterns having the same amplitude of diffracted light. Here, as a method of making the amplitude of the diffracted light approximately the same, for example, it can be the same as the method described in Japanese Patent No. 4949838, and therefore description thereof is omitted here.

  A planar diffraction grating pattern can be displayed by spreading a diffraction grating pattern having the same area of the grating lines. In addition, as to the area of the grating line, the area of the grating line having a grating line should be reproducible as long as the plane diffraction grating pattern is reproducible. It can be set as appropriate according to the presence or absence of such.

  As a method for forming a three-dimensional diffraction grating pattern, there is a method in which a diffraction grating pattern having a large amplitude of diffracted light is arranged on the center side from the end side of the diffraction grating pattern. By doing so, it is possible to reproduce the diffraction grating pattern so as to appear three-dimensionally when the reference light is irradiated. Here, as a method of arranging the diffraction grating pattern so that the amplitude of the diffracted light is larger on the center side than on the end side, for example, the method described in Japanese Patent No. 49844938 can be used. Therefore, the description here is omitted.

  The ratio of the diffraction grating area in a plan view with respect to the reflection Fourier transform hologram area and the transmission Fourier transform hologram area described above is preferably such that a desired diffraction grating pattern can be displayed by the diffraction grating area. . In addition, the first light image and the second light image displayed by the reflection type Fourier transform hologram region and the transmission type Fourier transform hologram region described above, and the diffraction grating pattern displayed by the diffraction grating region are sufficiently visible. It is preferable that the ratio is such that it can be obtained. When the diffraction grating pattern is a planar diffraction grating pattern, the ratio of the diffraction grating area to the reflection Fourier transform hologram area and the transmission Fourier transform hologram area described above is, for example, within a range of 1/4 to 3/2. Preferably, it is preferably in the range of 1/2 or more and 1 or less, particularly preferably in the range of 5/8 or more and 7/8 or less. On the other hand, when the diffraction grating pattern is a three-dimensional diffraction grating pattern, the ratio of the diffraction grating area to the reflection Fourier transformation hologram area and the transmission Fourier transformation hologram area described above is, for example, within a range of 1/3 or more and 3 or less. It is preferable that it is within a range of 2/3 or more and 2 or less, and particularly preferably within a range of 1 or more and 5/3 or less. In the above ratio, “to the above-described reflection type Fourier transform hologram region and transmission type Fourier transform hologram region” means to the total region of the above reflection type Fourier transform hologram region and the transmission type Fourier transform hologram region. is there.

  The planar view size of the diffraction grating pattern can be appropriately set according to the displayed diffraction grating pattern, and is not particularly limited. For example, it can be in the range of 5 μm square to 100 μm square. When the planar view size of the diffraction grating pattern is within the above range, a high-definition diffraction grating pattern can be displayed. Further, it is possible to conceal the presence of individual diffraction grating patterns that display a diffraction grating pattern, and to improve anti-counterfeiting.

  The plan view shape of the diffraction grating pattern can be appropriately selected according to the reproduced diffraction grating pattern, and is not particularly limited. For example, since it can be the same as the planar view shape of the single Fourier transform hologram region described in the section “(1) Reflective Fourier transform hologram region”, description thereof is omitted here.

  As a method for forming the diffraction grating pattern, a method similar to a publicly known method can be generally adopted, and thus description thereof is omitted here.

  The reference light used for reproducing the diffraction grating pattern is not particularly limited, and the same reference light used for a general hologram can be used. Specifically, light including visible light can be used as the reference light. For example, the reference light can use the same light as the point light source used to display the first light image and the second light image converted by the reflection Fourier transform hologram region and the transmission Fourier transform hologram region described above. . By doing so, the diffraction grating pattern can be displayed simultaneously with the display of the first light image or the second light image. The reference light is not limited to a point light source, and may be parallel light or the like.

(4) Other Configurations The hologram structure of the present invention is a member having the above-described reflective Fourier transform hologram region and transmission Fourier transform hologram region, but may have other configurations as necessary. .
Hereinafter, other configurations used in the hologram structure of the present invention will be described.

(A) Transparent base material The hologram structure of the present invention may have a transparent base material on the surface opposite to the side on which the concave-convex structure of the first hologram layer is formed. By having a transparent base material, the thermal strength or mechanical strength of the hologram structure of the present invention can be increased.

  Here, “having a transparent substrate on the surface opposite to the side on which the concavo-convex structure of the hologram layer is formed” means that the surface on the side opposite to the side on which the concavo-convex structure of the hologram layer is formed is directly The aspect in which the transparent base material is arrange | positioned via the other member is included on the surface on the opposite side to the aspect in which the uneven | corrugated structure of the hologram layer was formed.

  The transparent substrate in the present invention preferably has a visible light transmittance of 80% or more, and more preferably 90% or more. When the visible light transmittance of the transparent substrate is within the above range, the first hologram layer and the first hologram layer and the first hologram layer are disposed through the transparent substrate when light is irradiated from the side where the transparent substrate of the hologram structure is disposed. Light can be sufficiently transmitted up to two hologram layers. On the other hand, when light is irradiated from the opposite side of the hologram structure on which the transparent base material is disposed, the second light image converted by the transmission type Fourier transform hologram region is displayed through the transparent base material. Can do. In addition, about the visible light transmittance | permeability of a transparent base material, it can measure with the test method of the total light transmittance of the plastic-transparent base material based on JISK7361-1.

  The transparent substrate in the present invention preferably has a relatively low haze value. As a specific haze value of the transparent substrate, for example, it is preferably within a range of 0.01% or more and 5% or less, and particularly preferably within a range of 0.01% or more and 3% or less. In the range of 0.01% to 1.5%, it is preferable. When the haze value of the transparent substrate is within the above range, the first light image and the second light image can be favorably displayed through the transparent substrate. In addition, about the haze value of a transparent base material, it can measure based on JISK7136, for example.

  As a material for the transparent substrate in the present invention, it is preferable to select a material having a predetermined visible light transmittance and haze value as described above. Specific examples thereof include resin films such as polyethylene terephthalate, polycarbonate, acrylic resin, cycloolefin resin, polyester resin, polystyrene resin, and acrylic styrene resin, and glass such as quartz glass, Pyrex (registered trademark), and synthetic quartz plate. In the present invention, it is preferable to use a resin film from the viewpoint of light weight and low risk of breakage and the like, and it is more preferable to select polycarbonate from the viewpoint of birefringence.

  The transparent substrate in the present invention may contain an ultraviolet absorber, a heat ray absorber, and the like. Deterioration of the hologram layer can be suppressed by hitting the hologram structure with ultraviolet rays or heat rays.

  The thickness of the transparent substrate in the present invention is preferably such a thickness that it can have rigidity and strength that can support the first hologram layer and the second hologram layer. For example, the thickness of the transparent substrate is preferably in the range of 0.005 mm to 5 mm, and more preferably in the range of 0.01 mm to 1 mm. Moreover, about the shape of a transparent base material, it can change suitably according to the usage form etc. of the hologram structure of this invention.

  The transparent substrate in the present invention may be subjected to a surface treatment in order to improve the adhesion with other members. Examples of the surface treatment for the transparent substrate include corona treatment.

(B) Adhesive layer The hologram structure of the present invention may have, for example, an adhesive layer on at least one of the surfaces. In this invention, the hologram structure of this invention can be affixed on a predetermined position by having an adhesive layer on any one surface of the hologram structure. Further, by having adhesive layers on both sides of the hologram structure, the hologram structure can be embedded in, for example, a card formed from a resin such as polycarbonate, a page of personal information in a passport, or the like. FIG. 1 shows an example in which the separator 3 is disposed on the surface of the adhesive layer 2 that is the outermost layer.

  Here, “the hologram structure of the present invention may have an adhesive layer on either surface” refers to the following aspect. Specifically, in the hologram layer, an adhesive layer may be provided on the surface of the first hologram layer opposite to the side where the uneven structure is formed. Further, an adhesive layer may be provided on the surface of the first hologram layer on which the uneven structure is formed, that is, on the uneven surface side of the first hologram layer. In the latter case, an adhesive layer may be formed so as to fill the concavo-convex structure of the hologram layer. At this time, there is a predetermined refractive index difference between the first hologram layer and the adhesive layer. It is preferable. This is because the concavo-convex structure of the first hologram layer can reflect light from the point light source and can be favorably converted into the first light image.

  In addition, although “not shown in the figure, an uneven layer structure of the first hologram layer is formed” that “an adhesive layer may be provided on the surface opposite to the side where the uneven structure of the first hologram layer is formed”. An adhesive layer may be formed on the surface opposite to the formed side, or an adhesive layer may be formed on the surface opposite to the side on which the uneven structure of the first hologram layer is formed via a transparent substrate. It means that it may be formed. Next, “an adhesive layer may be provided on the surface of the first hologram layer on which the concavo-convex structure is formed” means, for example, as shown in FIG. 1, the concavo-convex structure of the first hologram layer 1a. It indicates that the adhesive layer 2 may be formed on the surface on the side where the is formed.

  In the present invention, for example, as shown in FIG. 1, when the adhesive layer 2 is provided on the surface of the first hologram layer 1 a on which the concavo-convex structure is formed, there is a predetermined gap between the first hologram layer and the adhesive layer. Is necessary. Here, the “predetermined refractive index difference” is, for example, a refractive index difference that allows the light from the point light source to be scattered by the concavo-convex structure of the first hologram layer and display a desired first light image. Preferably there is.

  The adhesive layer in the present invention preferably has high transparency. Specifically, the visible light transmittance is preferably 80% or more, and more preferably 90% or more. When the visible light transmittance of the adhesive layer is within the above range, light shielding by the adhesive layer can be suppressed. The visible light transmittance of the adhesive layer can be measured by, for example, a test method for the total light transmittance of a plastic-transparent material in accordance with JIS K7361-1.

  The adhesive layer in the present invention preferably has a relatively low haze value. The specific haze value of the adhesive layer is, for example, preferably in the range of 0.01% to 5%, more preferably in the range of 0.01% to 3%, particularly 0. It is preferable to be within the range of 0.01% or more and 1.5% or less. When the haze value of the adhesive layer is within the above range, light shielding by the adhesive layer can be suppressed. The haze value of the adhesive layer can be measured according to, for example, JIS K7136.

  The adhesive layer in the present invention may be an adhesive layer having adhesiveness, or a re-peeling adhesive layer having both adhesive properties and re-peeling properties. When the adhesive layer in the present invention is an adhesive layer, the members constituting the hologram structure of the present invention are firmly bonded to each other, or the hologram structure is firmly bonded to the adherend. be able to. On the other hand, when the adhesive layer in the present invention is a re-peeling adhesive layer, the hologram structure of the present invention can be bonded to a desired member. Such a re-peeling adhesion layer can easily repeat adhesion and peeling without leaving a mark due to an adhesive or the like on the adherend, and can minimize the influence on the adherend.

  The adhesive layer in the present invention may contain an ultraviolet absorber or an infrared absorber as necessary. By including an ultraviolet absorber or an infrared absorber in the adhesive layer, the hologram structure of the present invention can be prevented from being deteriorated by irradiation with ultraviolet rays or infrared rays. Moreover, the adhesive layer in the present invention may contain a tackifier, a tackifier, and the like.

  The thickness of the adhesive layer in the present invention can be appropriately adjusted according to the use of the hologram structure of the present invention, and is not particularly limited. The specific thickness of the adhesive layer is, for example, preferably in the range of 1 μm to 500 μm, and more preferably in the range of 2 μm to 50 μm. When the thickness of the adhesive layer is within the above range, light shielding by the adhesive layer can be suppressed.

  The method for forming the adhesive layer is not particularly limited as long as the adhesive layer can be disposed at a desired position. For example, a method of forming an adhesive layer by directly applying a coating liquid for forming an adhesive layer that constitutes the adhesive layer at a desired position and drying it. Examples of the application method of the coating liquid for forming the adhesive layer include various coating methods such as Mayer bar, gravure coat, gravure reverse coat, kiss reverse coat, three-roll reverse coat, slit reverse die coat, comma coat, and knife coat. Can be mentioned.

(C) Separator In the present invention, when the outermost layer of the hologram structure has an adhesive layer, it is preferable to dispose the separator on the surface of the adhesive layer that is the outermost layer. In other words, when the outermost layer of the hologram structure is a member having no adhesiveness, it is not necessary to dispose a separator in particular. By having the separator, it is possible to prevent foreign matters and the like from adhering to the surface of the adhesive layer. Further, when the hologram structure is formed in a long shape and wound in a roll shape, it is possible to prevent the overlapping hologram structures from adhering to each other.

  The separator in the present invention is not particularly limited as long as it is a member that can protect the adhesive layer and can be easily peeled off from the adhesive layer. Examples of such a separator include a resin layer made of polyethylene terephthalate, polyethylene naphthalate, polyphenylene sulfide, and the like.

  About the thickness of the separator in this invention, it can adjust suitably according to the kind, application, etc. of the hologram structure of this invention, and it does not specifically limit.

  It is preferable that the separator in the present invention is subjected to a peeling treatment for facilitating a peeling operation with the adhesive layer on the surface in contact with the adhesive layer. Examples of the peeling treatment include silicone treatment and alkyd treatment.

(D) High Refractive Index Layer In the present invention, a high refractive index layer may be provided on the uneven surface side of the first hologram layer as necessary.

  The high refractive index layer in the present invention can be formed of, for example, a resin composition for forming a high refractive index layer containing high refractive index particles such as zirconium oxide, diantimony pentoxide, and antimony-doped tin oxide and a binder resin. . The high refractive index layer may be formed of a single polymer having a high refractive index, and zirconium oxide and pentoxide formed by a vapor deposition method such as chemical vapor deposition (CVD) or physical vapor deposition (PVD). A thin film such as diantimony may be used. In the present invention, it is particularly preferable to form the high refractive index layer with a high refractive index layer forming resin composition containing high refractive index particles and a binder resin.

Examples of the high refractive index particles used in the high refractive index layer include zinc oxide (ZnO; 1.90), titanium oxide (TiO ₂ ; 2.3 to 2.7), and cerium oxide (CeO ₂ ; 1.95). ), Indium tin oxide (ITO; 1.95), antimony-doped tin oxide (ATO; 1.80), yttrium oxide (Y ₂ O ₃ ; 1.87), zirconium oxide (ZrO ₂ ; 2.0), five Antimony oxide (Sb ₂ O ₅ ; 1.79) is preferably mentioned, and can be appropriately selected depending on the application. In addition, the numerical value in the said parenthesis shows a refractive index.

  The average particle size of the high refractive index particles is preferably in the range of, for example, 5 nm to 200 nm, more preferably in the range of 5 nm to 100 nm, and particularly in the range of 10 nm to 80 nm. It is preferable. This is because when the average particle diameter of the high refractive index particles is within the above range, a dispersed state of the high refractive index particles can be obtained without impairing the light transmittance of the high refractive index layer. In the present invention, as long as the average particle diameter is within the above range, the high refractive index particles may be chained.

  The high refractive index particles may be surface-treated as necessary. Examples of the surface treatment include a treatment for modifying the surface of the high refractive index particles using a silane coupling agent. By performing such treatment, the affinity with the binder resin is improved, the high refractive index particles can be uniformly dispersed, and aggregation of the high refractive index particles can be suppressed. Accordingly, it is possible to suppress a decrease in light transmittance of the high refractive index layer due to the formation of large particles derived from aggregation, and a decrease in the coating property and coating strength of the resin composition for forming a high refractive index layer.

  The binder resin for dispersing the high refractive index particles, other additives, and other detailed explanations can be the same as the contents disclosed in, for example, Japanese Patent Application Laid-Open No. 2017-021293. Is omitted.

(E) Interlayer Adhesive Layer The hologram structure of the present invention may have an interlayer adhesive layer for adhering the layers of the members constituting the hologram structure.

  As such an interlayer adhesive layer, for example, a known adhesive layer such as a two-component curable adhesive layer, an ultraviolet curable adhesive layer, a thermosetting adhesive layer, or a hot melt adhesive layer may be used. it can.

  Since the thickness of the interlayer adhesive layer in the present invention can be appropriately adjusted according to the size of each member constituting the hologram structure, description thereof is omitted here.

  The interlayer adhesive layer in the present invention preferably has a predetermined transparency when it overlaps the reflective Fourier transform hologram region or the transmission Fourier transform hologram region in plan view. In addition, about specific transparency, since it can be made to be the same as that of the transparency of the contact bonding layer described by the term of the said "(b) contact bonding layer", description here is abbreviate | omitted.

(F) Print layer The hologram structure of the present invention may have a print layer. As used herein, the “printing layer” refers to a layer on which information is printed using ink or the like. By having the printed layer, the design of the hologram structure of the present invention can be further improved.

  The material of the print layer is not particularly limited as long as it can be printed by various printing methods. Examples include polycarbonates, polyesters, cellulose derivatives, norbornene resins, polyvinyl chlorides, polyvinyl acetates, acrylic resins, urethane resins, polypropylenes, polyethylenes, styrenes, and the like. Moreover, as an ink used for a printing layer, the ink normally used for various printing methods, such as inkjet printing, screen printing, offset printing, gravure printing, flexographic printing, is mentioned.

  As a method for forming a printing layer, for example, lithographic printing, intaglio printing, relief printing, stencil basic printing method, flexographic printing, resin relief printing, gravure offset printing, octopus printing, inkjet printing, transfer printing, electrostatic printing, Examples include ultraviolet curable printing, baking printing, and waterless offset printing.

  The printed layer in the present invention is a member that imparts designability to the hologram structure. For example, the print layer is preferably a member that displays information different from the first light image and the second light image described above. Information displayed by the printing layer can be appropriately selected according to the use of the hologram structure of the present invention, and is not particularly limited. For example, characters, symbols, marks, illustrations, characters and other patterns, company names, Various character information such as product name, sales point, catch phrase, handling explanation, etc. can be mentioned.

  In the present invention, the arrangement position of the printing layer is preferably a position that does not hinder the display of the first light image and the second light image. Specifically, the printed layer may be disposed on the surface side where the uneven structure of the first hologram layer is formed, or may be disposed on the side opposite to the surface where the uneven structure of the first hologram layer is formed. good. For example, when the hologram structure of the present invention has a configuration as shown in FIG. 1 and the print layer is arranged on the surface side where the uneven structure of the first hologram layer is formed, the print layer is You may arrange | position between 1 hologram layer and a 2nd 2nd hologram layer, or may arrange | position to the surface on the opposite side to the 1st hologram layer of a 2nd hologram layer.

(G) Arbitrary Configuration The hologram structure of the present invention may have, for example, an ultraviolet absorbing layer, an infrared absorbing layer, an antireflection layer, or the like on the transparent substrate described above. By having such an arbitrary configuration, the hologram structure of the present invention can be used as various filters. In addition, since generally well-known things can be used about an ultraviolet absorption layer, an infrared absorption layer, an antireflection layer, etc., description here is abbreviate | omitted.

2. Usage Mode of Hologram Structure The hologram structure of the present invention has the following usage mode. An example of the usage mode of the hologram structure will be described separately for the first usage mode, the second usage mode, and the third usage mode.

(1) First Usage Mode The hologram structure according to the present aspect has an adhesive layer on the uneven surface side of the first hologram layer, and is used as a hologram seal.

  For example, as shown in FIG. 1 described above, the hologram structure of this aspect can be used as a hologram seal by having the adhesive layer 2 on the uneven surface side of the first hologram layer 1a. Specifically, the first hologram layer 1a has an adhesive layer 2 as the outermost layer of the so-called hologram structure, that is, the surface of the second hologram layer 1b opposite to the first hologram layer 1a. Is preferred.

When the hologram structure of this aspect is used as a hologram seal, the hologram seal is attached to an adherend via an adhesive layer. The adherend at this time may have transparency at least in a region overlapping the transmission Fourier transform hologram region in plan view or may not have transparency. As shown in FIG. 11 (a), when the hologram seal 100a is attached to the adherend 200 having transparency in a region overlapping at least the transmission Fourier transform hologram region in plan view, the transparent substrate 4 side The first light image can be displayed by reflecting the light L ₁₀ from the point light source, and the second light image can be displayed by transmitting the light L ₂₀ by the point light source through the adherend 200. it can. On the other hand, as shown in FIG. 11 (b), the hologram seal 100a, when stuck to the adherend 200 has no transparency, by reflecting light L ₁₀ by the point light source from the transparent substrate 4 side Although the first light image can be displayed, it is difficult to transmit the light L ₂₀ from the point light source through the adherend 200. Therefore, in this case, as shown in FIG. 11C, it is preferable to peel off the hologram seal 100a from the adherend 200 to display the second light image. Reference numerals not described in FIGS. 11A to 11C can be the same as those in FIG. 1 described above, and thus description thereof is omitted here.

  In this aspect, when the adherend does not have transparency, it is possible to perform authenticity determination using a hologram sticker, and it is possible to further improve the anti-counterfeiting property. Specifically, since the second optical image can be displayed for the first time when the hologram sticker is peeled from the adherend and transmitted through the point light source, the hologram sticker transmits the second optical image. It is possible to conceal the presence of the type Fourier transform hologram region, and to further improve the anti-counterfeiting property.

  In addition, the hologram structure of this aspect may have the configuration described in the section “1. Configuration (4) Other configuration” as necessary.

  The adhesive layer used in this embodiment can be the same as the contents described in the above-mentioned section “1. Configuration (4) Other configuration (b) Adhesive layer”, and thus description thereof is omitted here.

  As a specific application when the hologram structure of this embodiment is used as a hologram seal, for example, it is attached to a ticket, a branded product, a quality control number label of a product, and the like for authenticity determination.

(2) Second Usage Mode The hologram structure according to this aspect has a heat seal layer on the uneven surface side of the first hologram layer, and an easy peeling layer on a surface opposite to the uneven surface of the first hologram layer. And a peeling substrate is provided on the surface of the peelable layer opposite to the first hologram layer, and is used as a hologram transfer foil.

  The hologram structure of this aspect can be used as a hologram transfer foil 100b as shown in FIG. 12, for example. For example, the hologram transfer foil 100b has the heat seal layer 5 on the position that is the outermost layer on the concave-convex surface side of the first hologram layer 1a, that is, the surface of the second hologram layer 1b opposite to the first hologram layer 1a. The first hologram layer 1a has the peelable layer 6 on the surface opposite to the concave / convex surface, and the peelable layer 6 has the peelable substrate 7 on the surface opposite to the first hologram layer 1a.

  In addition, the hologram structure of this aspect may have the configuration described in the section “1. Configuration (4) Other configuration” as necessary.

  Hereinafter, the structure used for the hologram structure of this embodiment will be described.

(A) Heat-seal layer The heat-seal layer in this aspect has a function which affixes a hologram structure to a to-be-adhered body.

  The heat seal layer in this aspect is not particularly limited as long as the hologram structure can be attached to the adherend, and the material thereof is not particularly limited. Specific examples of the material for the heat seal layer include a heat seal layer containing a thermoplastic resin disclosed in Japanese Patent Application Laid-Open No. 2014-16422.

(B) Peeling substrate The peeling substrate in this embodiment is a member that supports the hologram structure. Moreover, the base material for peeling in this aspect is a member peeled from a hologram structure, after attaching a hologram structure to a to-be-adhered body using the heat seal layer mentioned above.

  The base material for peeling may have transparency and does not need to have transparency. In addition, about the material, thickness, etc. of the base material for peeling, it is the same as that of the material and thickness of the transparent base material described in the above-mentioned "1. Configuration (4) Other configuration (a) Transparent base material", for example. Therefore, the description is omitted here.

(C) Easy peeling layer The easy peeling layer in this aspect easily peels the peeling substrate from the hologram structure after the hologram structure is attached to the adherend via the heat seal layer. It is a member for.

  The easy-peeling layer in this embodiment can be the same as the re-peeling adhesive layer described in the section “1. Configuration (4) Other Configuration (b) Adhesive Layer”, for example.

  The arrangement position of the easily peelable layer in plan view in the plan view is not particularly limited as long as the easily peelable layer can exhibit a desired function. The peelable layer may be disposed on the entire surface of the substrate for peeling in plan view, or may be disposed in a pattern.

(3) Third Usage Mode The hologram structure according to this mode is used as an information recording medium.

  The hologram structure of this aspect can be used as an information recording medium 100c, for example, as shown in FIG. For example, the information recording medium 100c has a back surface side protective layer on the uneven surface side of the first hologram layer 1a, that is, the surface opposite to the first hologram layer 1a of the second hologram layer 1b via the interlayer adhesive layer 8. 9a, the intermediate substrate 11 is provided on the surface opposite to the concave and convex surface of the first hologram layer 1a, and the interlayer adhesion is performed on the surface of the intermediate substrate 11 opposite to the first hologram layer 1a. A surface-side protective layer 9b is provided through the layer 8.

  Specific applications when the hologram structure of this embodiment is used as an information recording medium include, for example, credit cards, cash cards, point cards and other cards, employee ID cards, ID cards such as driver's licenses, passbooks and passports. Etc. In this aspect, the member that overlaps the hologram structure in plan view has a predetermined transparency. This is because the first optical image or the second optical image is displayed by irradiating the hologram structure with light from the light source.

  In addition, the hologram structure of this aspect may have the configuration described in the section “1. Configuration (4) Other configuration” as necessary. Moreover, as shown in FIG. 13, you may have an intermediate | middle base material, a back surface side protective layer, a surface side protective layer, etc.

  Hereinafter, the structure used for the hologram structure of this embodiment will be described.

(A) Front-side protective layer and back-side protective layer The front-side protective layer and the back-side protective layer in this embodiment are usually transparent at least in a region overlapping with the reflective Fourier transform hologram region and the transmission Fourier transform hologram region in plan view. It is a member having properties.

  Examples of the material used for the front surface side protective layer and the back surface side protective layer in this embodiment include polycarbonate. In addition, about the specific material, thickness, etc. which are used for a surface side protective layer and a back surface side protective layer, the transparent base material described in the above-mentioned "1. Configuration (4) Other configuration (a) Transparent base material" section. The material and thickness are the same as those in FIG.

  The front surface side protective layer and the back surface side protective layer in this embodiment have a function of protecting the hologram structure. Therefore, the front surface side protective layer and the back surface side protective layer are preferably formed so as to cover the entire surface of the hologram structure in plan view.

(B) Intermediate base material The intermediate base material in this embodiment is a member for supporting the hologram structure, the surface-side protective layer, and the like. Such an intermediate base material may be a member that also serves as the transparent base material described in the above section “1. Configuration (4) Other configuration (a) Transparent base material”.

  Examples of the material used for the intermediate substrate in this embodiment include polyethylene terephthalate. In addition, about the specific material, thickness, etc. used for an intermediate | middle base material, it is the same as the material and thickness of the transparent base material described in the above-mentioned "1. Configuration (4) Other configuration (a) Transparent base material" section. Therefore, the description here is omitted.

  The intermediate base material in this embodiment is usually formed so as to cover the entire surface of the hologram structure in plan view.

(C) Other structure As another structure in this aspect, the information recording layer which records information is mentioned, for example. Examples of the information recording layer include a printed layer on which information is recorded by printing, a magnetic layer on which information is recorded by magnetism, an IC chip layer including an integrated circuit (IC) chip, and the like. In addition, a functional layer such as an antenna layer including an antenna may be included.

  The other configurations described above can be appropriately arranged at positions that do not hinder the display of the first light image and the second light image by the hologram structure of this aspect.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has any configuration that has substantially the same configuration as the technical idea described in the claims of the present invention and that exhibits the same effects. Are included in the technical scope.

[Example]
(Formation of master master)
A photomask blank plate (Mask Blanks manufactured by ULVAC DEPOSITING CO., LTD.) In which a surface low-reflection chromium thin film was laminated on a synthetic quartz substrate was prepared. A dry etching resist was spin-coated with a spinner on the chromium thin film of the photomask blank plate. As a resist for dry etching, ZEP7000 manufactured by Nippon Zeon Co., Ltd. was used and formed to have a thickness of 400 nm. The resist layer was exposed to a pattern created by a computer in advance using an electron beam drawing apparatus (MEBES 4500: manufactured by ETEC) to easily dissolve the exposed portion of the resist resin. Thereafter, the developer was sprayed (spray development) to remove the easily soluble portion, and a resist pattern was formed. The pattern lattice pitch was 3179 nm.
Subsequently, by using the formed resist pattern, a portion of the chromium thin film not covered with the resist was etched away by dry etching to expose the quartz substrate. Next, the exposed quartz substrate was etched to form a recess in the quartz substrate. Thereafter, the resist thin film was dissolved and removed to obtain a master original plate having a concave portion formed by etching the quartz substrate and a convex portion in which the quartz substrate and the chromium thin film remained without being etched. Moreover, the size of the master original plate was 150 mm × 150 mm square.

(Formation of reflection type Fourier transform hologram area)
A 100 μm thick polyethylene terephthalate film (A4300 manufactured by Toyobo Co., Ltd.) was prepared as a transparent substrate. On this transparent substrate, a composition for forming a hologram layer (UV curable acrylate resin: refractive index 1.52, measurement wavelength 633 nm) was dropped to form a coating film of the above composition. Subsequently, the master original plate which has an unevenness | corrugation was mounted on the said coating film, and it pressed. Next, the coating film was cured by irradiating actinic radiation while the master original plate was placed. Thereafter, the master original plate was peeled off to form a first hologram layer having an uneven surface obtained by inverting the uneven shape of the master original plate. Thereafter, stacking, pressing, curing, and peeling of the master original plate were repeated to form a 15 mm square reflective Fourier transform hologram region having a plurality of single Fourier transform hologram regions. The thickness of the first hologram layer having the reflection type Fourier transform hologram region is 2 μm.

(Formation of transmission Fourier transform hologram area)
Subsequently, water-soluble ink was printed on the Al layer surface using the gravure printing plate cylinder in which the Fourier-transform pattern different from the reflection type Fourier-transform hologram area was formed. The water-soluble ink used here is SL No14 Clear (modified) manufactured by Oike Advanced Film Co., Ltd. Next, an Al layer having a thickness of 100 nm was formed on the entire surface of the first hologram layer on the uneven surface side by a sputtering method. Next, when the surface of the Al layer was washed with water, the water-soluble ink melted away, and the Al layer adhering to the water-soluble ink film was also removed together. Thus, the 2nd hologram layer in which Al layer was formed in pattern shape was formed.

[Evaluation]
When a point light source is arranged on the transparent base material side of the hologram structure of the present invention obtained and visually observed from the transparent base material side, Fourier transform is performed in the 15 mm square reflective Fourier transform hologram region. A predetermined image by one hologram layer, that is, the first light image could be observed with good visibility. Further, when a point light source was arranged on the second hologram layer side and observed through the transparent base material side, a predetermined image by the second hologram layer, that is, a second light image could be observed with good visibility.

DESCRIPTION OF SYMBOLS 1a ... 1st hologram layer 1b ... 2nd hologram layer 2 ... Adhesive layer 3 ... Separator 4 ... Transparent base material 5 ... Heat seal layer 6 ... Peeling easy layer 7 ... Peeling layer 8 ... Interlayer adhesive layer 9a ... Back surface side protective layer 9b DESCRIPTION OF SYMBOLS ... Surface side protective layer 10 ... 1st optical image 20 ... 2nd optical image 10 ', 20' ... Fourier transform image 11 ... Intermediate base material 100 ... Hologram structure 100a ... Hologram seal 100b ... Hologram transfer foil 100c ... Information recording medium

Claims (7)

A hologram structure having a reflection type Fourier transform hologram region and a transmission type Fourier transform hologram region,
The reflection type Fourier transform hologram region is a region where light incident from a point light source converts reflected light reflected by the uneven surface of the first hologram layer having an uneven surface on the surface into a first light image,
The transmission type Fourier transform hologram region is a region in which light incident from a point light source is a region for converting transmitted light transmitted through a second hologram layer arranged in a pattern into a second light image. Structure.   2. The hologram structure according to claim 1, wherein the second hologram layer is disposed on a concavo-convex surface side of the first hologram layer.   The hologram structure according to claim 1, wherein the reflection type Fourier transform hologram region and the transmission type Fourier transform hologram region have regions that overlap in plan view. It further has a diffraction grating area for displaying a diffraction pattern,
The hologram structure according to any one of claims 1 to 3, wherein the diffraction grating region is located in a region that does not overlap the reflection type Fourier transform hologram region in plan view. Having an adhesive layer on the uneven surface side of the first hologram layer;
The hologram structure according to any one of claims 1 to 4, wherein the hologram structure is used as a hologram seal. A heat seal layer on the concave and convex surface side of the first hologram layer;
The first hologram layer has an easy peeling layer on the surface opposite to the uneven surface,
Having a peeling substrate on the surface of the peelable layer opposite to the first hologram layer;
The hologram structure according to any one of claims 1 to 4, wherein the hologram structure is used as a hologram transfer foil.   The hologram structure according to any one of claims 1 to 4, wherein the hologram structure is used as an information recording medium.