JP2018041768A - Manufacturing method of sealing structure, sealing material, and cured product - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a manufacturing method of a sealing structure capable of obtaining a sealing structure having a smooth surface excellent in smoothness and having a laser marking property without using an additive which is a laser marking material.SOLUTION: The manufacturing method of a sealing structure includes a sealing step of sealing an electronic component 10 with a resin layer 20a of a sealing material 1 including a metal layer 30 and the resin layer 20a. The metal layer 30 has a surface having a surface roughness (Ra) of 10 μm or less. The resin layer 20a is disposed on a surface opposite to the surface of the metal layer 30.SELECTED DRAWING: Figure 3

Description

  The present invention relates to a method for manufacturing a sealing structure, a sealing material, and a cured product.

  As electronic devices become lighter, thinner, and smaller, semiconductor devices are becoming smaller and thinner. A form of using a semiconductor device that is almost the same size as a semiconductor element or a mounting form (package-on-package) in which a semiconductor device is stacked on the semiconductor device has been actively performed. Thinning is expected to progress further.

  As miniaturization of semiconductor elements progresses and the number of terminals increases, it becomes difficult to provide all external connection terminals (external connection terminals) on the semiconductor elements. For example, when the external connection terminals are forcibly provided, the pitch between the terminals is reduced and the height of the terminals is reduced, and it is difficult to ensure connection reliability after the semiconductor device is mounted. Therefore, many new mounting methods have been proposed in order to realize miniaturization and thinning of semiconductor devices.

  For example, after rearranging a semiconductor element manufactured by dividing a semiconductor wafer into pieces with an appropriate interval, the semiconductor element is sealed using a solid or liquid sealing resin, and the semiconductor element is sealed There have been proposed a mounting method in which an external connection terminal can be further provided on a resin to be used, and a semiconductor device manufactured using the same (for example, see Patent Documents 1 to 3 below).

  Usually, sealing of electronic components such as semiconductor elements is often performed in the final stage of manufacturing an electronic component device such as a semiconductor device. In the mounting method in this case, the process for forming the wiring for arranging the external connection terminal and the external connection terminal is performed on the sealed molded product produced by sealing the electronic component.

Japanese Patent No. 3616615 JP 2001-244372 A Japanese Patent Laid-Open No. 2001-127095

  In the conventional mounting methods such as Patent Documents 1 to 3 described above, when an electronic component such as a semiconductor element is cured and then cured, only the resin portion undergoes thermosetting shrinkage, and the inorganic filler that does not cause thermosetting shrinkage is the surface. The surface may be exposed and unevenness may occur on the surface. When the surface of the sealing structure has irregularities, it is expected that the surface appearance after laser marking is deteriorated. Furthermore, it is difficult to accurately produce a package structure such as a POP in which packages are stacked on the package. In order to eliminate the above problems, polishing the surface of the sealing structure after sealing is an essential process. In addition, for the purpose of imparting laser marking properties to the surface of the sealing structure, it is necessary to include an originally unnecessary material for sealing, such as a pigment or a dye, in the sealing material. For example, when a pigment such as carbon black, which is a conductive particle, is added, the insulating property of the encapsulant may not be maintained due to the addition of the conductive particle, resulting in problems such as a decrease in reliability. Is expected. In addition, when a dye such as an organic compound is added, decomposition due to heat occurs, and depending on the use environment, there is a possibility of causing a problem that the laser marking property cannot be exhibited. Therefore, development of a new sealing material is demanded.

  The present invention has been made in view of the above problems, and it is possible to obtain a sealing structure having a smooth surface excellent in smoothness and having laser marking properties without using an additive which is a laser marking material. An object of the present invention is to provide a method for manufacturing a sealed structure. Moreover, this invention aims at providing the sealing material which can be used for the manufacturing method of the said sealing structure, and the hardened | cured material of the resin layer of the said sealing material.

  A manufacturing method of a sealing structure according to the present invention includes a sealing step of sealing a first electronic component with the resin layer of a sealing material including a metal layer and a resin layer, and the metal layer has a rough surface. (Ra) has a surface of 10 μm or less, and the resin layer is disposed on the surface of the metal layer opposite to the surface.

  According to the manufacturing method of the sealing structure according to the present invention, since the metal layer of the sealing material imparts smoothness and can be applied as a laser marking material, it has a smooth surface excellent in smoothness and laser marking. A sealing structure having laser marking properties can be obtained without using additives (pigments, dyes, etc.) that are materials. According to such a manufacturing method of a sealing structure, there is no need to perform a polishing process after sealing in order to impart smoothness, and laser marking properties can be achieved without adding a laser marking material to the resin layer. Can be granted.

  By the way, in the conventional mounting method, a plurality of electronic component devices may be obtained by dicing a sealing structure obtained by sealing a plurality of electronic components. Therefore, the more electronic components that are rearranged, the more electronic component devices that can be manufactured in a single process. In view of this, studies have been conducted to enlarge the sealing structure. At present, for example, since a semiconductor manufacturing apparatus is used for wiring formation, the sealing structure is formed into a wafer shape, and the diameter of the wafer shape tends to increase. Furthermore, the use of a sealing structure body as a panel is also being studied so that a printed wiring board manufacturing apparatus or the like that can be further enlarged and is cheaper than a semiconductor manufacturing apparatus can be used.

  For the sealing of the electronic component, there is a case where mold forming is performed by molding a liquid or solid resin with a mold. Transfer molding may be used in which the pellet-shaped resin is melted and sealed by pouring the resin into a mold. However, since transfer molding is performed by pouring molten resin, when filling a large area, an unfilled portion may occur. Therefore, in recent years, compression molding has started to be performed in which molding is performed after a resin is previously supplied to a mold or an object to be sealed (electronic component). In compression molding, since resin is directly supplied to a mold or an object to be sealed, there is an advantage that an unfilled portion is less likely to occur even when sealing a large area.

  In compression molding, liquid or solid resin is used as in transfer molding. However, when the object to be sealed is enlarged, a liquid flow or the like is generated with a liquid resin, and it becomes difficult to uniformly supply the object to be sealed. Moreover, since it is necessary to supply resin uniformly on a to-be-sealed body, granule or powder resin may be used as solid resin instead of the conventional pellet-shaped resin. However, it is difficult to uniformly supply a granule or powder resin onto a mold or an object to be sealed. Moreover, resin which is a granule or powder becomes a dust generation source, and there is a concern that the apparatus or the clean room is contaminated.

  Also, in molding, since the resin is molded in the mold, it is essential to increase the size of the mold in order to increase the size of the sealing structure. However, increasing the size of the mold requires a high mold accuracy, which raises the technical difficulty level and significantly increases the mold manufacturing cost.

  On the other hand, in the manufacturing method of the sealing structure according to the present invention, the electronic component is sealed using the resin layer of the sealing material including the resin layer disposed on the one surface of the metal layer. Resin can be uniformly supplied onto the body (electronic component) and dust generation can be reduced. Moreover, in the manufacturing method of the sealing structure which concerns on this invention, the sealing molding by the lamination which does not require a metal mold | die as well as mold shaping | molding, and a press can be performed.

  A plurality of the first electronic components may be provided.

  The manufacturing method of the sealing structure according to the present invention may further include a step of laser marking the metal layer after the sealing step.

  The manufacturing method of the sealing structure according to the present invention may further include a step of arranging a second electronic component on the opposite side of the metal layer from the resin layer after the sealing step.

  The manufacturing method of the sealing structure according to the present invention may further include a step of dicing the structure including the first electronic component, the resin layer, and the metal layer after the sealing step.

  The sealing material according to the present invention includes a metal layer having a surface with a surface roughness (Ra) of 10 μm or less, and a resin layer disposed on a surface opposite to the surface of the metal layer, The resin layer is used to seal electronic components.

  According to the encapsulant according to the present invention, the metal layer of the encapsulant imparts smoothness and can be applied as a laser marking material, so that it has a smooth surface excellent in smoothness and is an addition of a laser marking material A sealing structure having laser marking properties can be obtained without using an agent (pigment, dye, etc.). According to such a sealing material, it is not necessary to perform a polishing process after sealing in order to impart smoothness, and laser marking properties can be imparted without adding a laser marking material to the resin layer. it can.

  In the method for manufacturing a sealing structure and the sealing material according to the present invention, the content of the inorganic filler in the resin layer is preferably 55% by mass or more. By the way, as described above, in the conventional mounting method, when an electronic component such as a semiconductor element is sealed and cured, only the resin portion undergoes thermosetting shrinkage, and the inorganic filler that does not cause thermosetting shrinkage is exposed on the surface. Although the surface may be uneven, this phenomenon is particularly remarkable when the content of the inorganic filler is 55% by mass or more. On the other hand, according to the manufacturing method and the sealing material of the sealing structure according to the present invention, since the metal layer of the sealing material imparts smoothness, the content of the inorganic filler is 55% by mass or more. Even if it exists, the sealing structure which has the smooth surface excellent in smoothness can be obtained.

  The cured product according to the present invention is a cured product of the resin layer of the sealing material according to the present invention.

  ADVANTAGE OF THE INVENTION According to this invention, it is a manufacturing method of the sealing structure which has a smooth surface excellent in smoothness, and can obtain the sealing structure which has laser marking property, without using the additive which is a laser marking material. Can be provided. Moreover, according to this invention, the hardened | cured material of the sealing material which can be used for the manufacturing method of the said sealing structure, and the resin layer of the said sealing material can be provided. Furthermore, according to this invention, the sealing structure which can be obtained with the manufacturing method of the said sealing structure can be provided.

  ADVANTAGE OF THE INVENTION According to this invention, the application of the sealing material to sealing of an electronic component can be provided. ADVANTAGE OF THE INVENTION According to this invention, the application of the sealing material to manufacture of a sealing structure can be provided.

It is a schematic cross section showing an embodiment of a sealing structure. It is a schematic cross section showing an embodiment of a sealing structure. It is a schematic cross section for demonstrating one Embodiment of the manufacturing method of a sealing structure. It is a schematic cross section for demonstrating one Embodiment of the manufacturing method of a sealing structure. It is a schematic cross section for demonstrating one Embodiment of the manufacturing method of a sealing structure. It is a schematic cross section for demonstrating other embodiment of the manufacturing method of a sealing structure.

  In this specification, the terms “layer” and “film” include a structure formed in part in addition to a structure formed in the entire surface when observed as a plan view. Is done. In the present specification, numerical ranges indicated using “to” indicate ranges including the numerical values described before and after “to” as the minimum value and the maximum value, respectively. In the numerical ranges described stepwise in the present specification, the upper limit value or lower limit value of a numerical range of a certain step may be replaced with the upper limit value or lower limit value of the numerical range of another step. In the numerical range described in this specification, the upper limit value or the lower limit value of the numerical range may be replaced with the values shown in the examples. “A or B” only needs to include either A or B, and may include both. The materials exemplified in the present specification can be used singly or in combination of two or more unless otherwise specified. In the present specification, the content of each component in the composition is the sum of the plurality of substances present in the composition unless there is a specific indication when there are a plurality of substances corresponding to each component in the composition. Means quantity.

  In the present specification, the surface roughness (Ra, arithmetic average roughness) is, for example, a VSI contact mode, 50 times using a surface roughness measuring device (Bruker AEX, trade name: wyko NT9100). Measurement is performed under the conditions of a lens and a measurement range of 121 μm × 92 μm, and an average value of 10 points selected at random can be obtained.

  Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. The dimensional ratio in each drawing does not necessarily match the actual dimensional ratio. The present invention is not necessarily limited to the following embodiments, and modifications may be made as appropriate without departing from the spirit of the present invention.

<Sealing structure>
FIG.1 and FIG.2 is a schematic cross section which shows the sealing structure which concerns on this embodiment. Sealed structures (sealed molded products, electronic component devices) 100a, 100b, 100c, 100d, and 100e according to the present embodiment include an electronic component (first electronic component, first layer electronic component) 10, and A sealing part (cured resin product) 20 that seals the electronic component 10 and metal layers 30 and 30 a disposed on the sealing part 20 are provided. The metal layer 30 is an unpatterned metal layer, and the metal layer 30a is a metal pattern having a predetermined pattern shape.

  The sealing structure 100 a includes a plurality of electronic components 10, and the sealing unit 20 seals the plurality of electronic components 10. The metal layer 30 of the sealing structure 100 a is disposed on the entire surface of the sealing unit 20. The sealing structure 100b has a structure including, as the metal layer 30a, a metal pattern obtained by patterning the metal layer 30 of the sealing structure 100a. The metal layer 30a of the sealing structure 100b is disposed on a part of the sealing portion 20. The sealing structure 100c has a structure further including an electronic component (second electronic component, second-layer electronic component) 40 on the opposite side of the sealing layer 20 of the metal layer 30a of the sealing structure 100b. doing. The sealing structure 100 d has a structure obtained by dicing the sealing structure 100 c for each electronic component 10, and includes a single electronic component 10 and an electronic component 40. The sealing structure 100e has a structure different from the sealing structure 100d in that the electronic component 40 is not provided.

  Examples of the electronic component 10 and the electronic component 40 include a semiconductor element; a semiconductor wafer; an integrated circuit; a semiconductor device; a filter such as a SAW filter; and a passive component such as a sensor. A semiconductor element obtained by separating a semiconductor wafer may be used. The sealing structure (electronic component device) according to the present embodiment may be a semiconductor device including a semiconductor element or a semiconductor wafer as an electronic component; a printed wiring board or the like. The thickness of the electronic component may be, for example, 1 to 1000 μm, or 100 to 800 μm.

  The metal pattern may be a wiring pattern. The metal pattern may be a connection terminal (external connection terminal, electronic component connection terminal, etc.), or a pattern for supporting the connection terminal. The thickness of the metal layer will be described later in the description of the sealing material.

  The plurality of electronic components 10 may be of the same type or different types. The plurality of electronic components 40 may be of the same type or different types. The electronic component 10 and the electronic component 40 may be of the same type or different types.

  The sealing structure is not limited to the above embodiment. For example, the constituent material of the sealing part that seals the electronic component may be a semi-cured or uncured resin instead of the cured resin (for example, FIG. 4A described later).

  The sealing structure according to the present embodiment may further include an intermediate layer between the sealing portion and the metal layer. The sealing structure according to the present embodiment may further include a resin layer, a metal layer, or the like on the side opposite to the sealing portion 20 of the electronic component 10. The sealing structure according to the present embodiment further includes a sealing portion that seals the electronic component 40, a metal layer (an unpatterned metal layer or a metal pattern) disposed on the sealing portion, and the like. May be. An electronic component may be further provided on the sealing structure including the electronic component 40.

<Method for producing sealing structure>
In the manufacturing method of the sealing structure (sealed molded product, electronic component device) according to the present embodiment, the electronic component (first electronic component) is sealed by the resin layer of the sealing material including the metal layer and the resin layer. A sealing step for stopping. The metal layer has a surface (smooth surface) having a surface roughness (Ra) of 10 μm or less. The resin layer is disposed on the surface of the metal layer opposite to the smooth surface. The sealing step may be, for example, a step of heating and melting the resin layer and applying pressure to seal the electronic component with the resin layer.

  The manufacturing method of the sealing structure which concerns on this embodiment may be provided with the process of arrange | positioning a sealing material so that a resin layer may oppose an electronic component before a sealing process. The manufacturing method of the sealing structure according to the present embodiment may include a step of curing the resin layer after the sealing step. The manufacturing method of the sealing structure which concerns on this embodiment may be equipped with the laser marking process which laser-marks a metal layer after a sealing process. The manufacturing method of the sealing structure which concerns on this embodiment may be equipped with the patterning process of patterning a metal layer and obtaining a metal pattern after a sealing process. The laser marking process may be performed before or after the patterning process. The manufacturing method of the sealing structure according to the present embodiment may include a step of arranging an electronic component (second electronic component) on the side opposite to the resin layer of the metal layer after the sealing step. The manufacturing method of the sealing structure according to the present embodiment includes a step of dicing the sealing structure (structure) including the electronic component (first electronic component), the resin layer, and the metal layer after the sealing step. You may have. A plurality of sealing structures can be obtained by dicing a structure including a plurality of electronic components for each electronic component.

  3 to 5 are schematic cross-sectional views for explaining the manufacturing method of the sealing structure according to this embodiment. Hereinafter, the manufacturing method of the sealing structure which concerns on this embodiment is demonstrated using FIGS.

  In the manufacturing method of the sealing structure according to the present embodiment, first, as illustrated in FIG. 3A, the sealing material 1 according to the present embodiment is prepared. The sealing material 1 includes a metal layer 30 and a resin layer 20 a disposed on the metal layer 30. The sealing material 1 is used for sealing an electronic component with the resin layer 20a. The resin layer 20 a only needs to be provided on at least a part of the metal layer 30, and may be provided on the entire surface of the metal layer 30. The resin layer 20a has a film shape, for example. The resin layer 20a is integrated with, for example, a metal layer 30 used as a carrier when forming the resin layer 20a into a film. The sealing material will be further described later.

  Next, as shown in FIG. 3B, after preparing a laminate including a substrate 50 and a temporary fixing layer 60 disposed on the substrate 50, a plurality of electronic components 10 are mounted on the temporary fixing layer 60. Deploy. Subsequently, the sealing material 1 is disposed so that the resin layer 20 a faces the electronic component 10. The resin layer 20a is heated and melted, and pressure is applied to seal the electronic component 10 with the resin layer 20a. Thereby, as shown to Fig.4 (a), a sealing structure provided with the resin layer 20a which seals the some electronic component 10 is obtained. Examples of the method for sealing the electronic component 10 with the resin layer 20a include laminating, pressing, transfer molding, compression molding, and the like.

  The heating temperature in the sealing step is not particularly limited as long as the resin layer 20a is melted, and may be, for example, 40 to 200 ° C. The pressure in a sealing process is not specifically limited, It can adjust according to the size of an electronic component, a density, etc. The pressure may be, for example, 0.01 to 10 MPa. The pressurization time is not particularly limited, and may be, for example, 5 to 600 seconds.

  Next, as shown in FIG. 4B, the sealing layer 100a is obtained by curing the resin layer 20a to obtain a sealing portion (resin cured layer, cured product of the resin layer 20a) 20. The resin layer 20a may be heat-cured or photocured. The curing treatment can be performed, for example, in the atmosphere or under an inert gas. The heating temperature for thermosetting is not particularly limited, and may be, for example, 60 to 300 ° C. The curing time is not particularly limited, and may be, for example, 10 to 600 minutes.

  Next, if necessary, laser marking (visibility) can be obtained by laser marking the metal layer 30.

  Next, the metal layer 30 of the sealing structure 100a is patterned to obtain the metal layer (metal pattern) 30a as shown in FIG. 4C, thereby obtaining the sealing structure 100b. The patterning method is not particularly limited, and examples thereof include a wet etching method and a dry etching method.

  Next, as illustrated in FIG. 5A, the sealing structure 100 c is obtained by disposing the electronic component 40 on the opposite side of the metal layer 30 a from the sealing portion 20. Before the electronic component 40 is arranged, the metal layer 30a may be subjected to a plating process or the like.

  Next, as shown in FIG. 5B, the sealing structure (structure) 100c including the electronic component 10, the sealing portion (resin cured layer) 20, the metal layer 30a, and the electronic component 40 is diced. For example, by forming the cut portion 70a with the dicing blade 70 in the sealing portion 20 of the sealing structure 100c, the electronic structure 10 can be separated into individual pieces to obtain the sealing structure 100d.

  Thereafter, the electronic component 40 of the sealing structure 100 d may be sealed with the resin layer 20 a of the sealing material 1. In this embodiment, it is possible to repeatedly perform sealing of electronic components, formation of a metal layer (metal pattern or the like), lamination of electronic components, and the like.

  The manufacturing method of a sealing structure is not limited to the said embodiment. For example, the manufacturing method of the sealing structure according to the present embodiment may include a step of obtaining a metal pattern as a metal layer before the sealing step. Specifically, the step of patterning the metal layer 30 may be performed before the electronic component 10 is sealed. In other words, the electronic component 10 may be sealed using a sealing material having a metal pattern (such as a wiring pattern) as the metal layer 30.

  Dicing of the sealing structure may be performed before the step of arranging the electronic component 40 or the step of patterning the metal layer 30. For example, as illustrated in FIG. 6, a cut portion 70 a is formed by a dicing blade 70 in a sealing portion 20 of a sealing structure (structure) including an electronic component 10, a sealing portion (resin cured layer) 20, and a metal layer 30 a. By forming, it can divide into every electronic component 10, and can obtain the sealing structure 100e.

  In the above embodiment, a plurality of electronic components are sealed with a resin layer and then dicing is performed for each electronic component to obtain a sealing structure, but a single electronic component is sealed with a resin layer to provide a sealing structure. You may get a body. When a semiconductor wafer is used as an electronic component, after the semiconductor wafer is sealed with a resin layer to form a sealing portion, the semiconductor wafer sealed with the sealing portion by separating the semiconductor wafer together with the sealing portion You may obtain the sealing structure provided with an element.

<Encapsulant and cured product>
The sealing material and hardened | cured material which concern on this embodiment are demonstrated. The sealing material according to the present embodiment includes a metal layer having a surface (smooth surface) having a surface roughness (Ra) of 10 μm or less, and a resin layer disposed on the surface of the metal layer opposite to the smooth surface. And comprising. The sealing material which concerns on this embodiment is used in order to seal an electronic component with a resin layer. The hardened | cured material which concerns on this embodiment is a hardened | cured material of the resin layer of the sealing material which concerns on this embodiment, and hardens | cures the resin layer of a sealing material.

  According to the sealing material according to the present embodiment, since the metal layer has smoothness, the surface polishing process after sealing the electronic component can be made unnecessary. In addition, since the metal layer can be applied as a laser marking layer, it is possible to eliminate the need for adding unnecessary additives such as pigments and dyes that are not essential for sealing to the resin layer. Moreover, according to the sealing material which concerns on this embodiment, while being able to supply the resin uniformly on a to-be-sealed body (electronic component), dust generation can be reduced.

  As the metal layer 30, a metal foil can be used. Examples of the metal of the metal foil include copper and aluminum. As a commercially available metal foil, Fukuda Metal Foil Powder Industry Co., Ltd., trade names: CFT9L-UR-18, CFT9L-UR-35; Nihon Electrolysis Co., Ltd., trade names: YGP-12, YGP-18, YGP- 35R etc. are mentioned.

  The thickness of the metal layer 30 is preferably 2 μm or more, more preferably 5 μm or more, and even more preferably 10 μm or more from the viewpoint of excellent handling properties after the resin layer is formed. The thickness of the metal layer 30 is preferably 200 μm or less, more preferably 100 μm or less, and even more preferably 50 μm or less, from the viewpoint of easy storage in a roll shape.

  The surface roughness (Ra) of the smooth surface (S surface: Shinney surface) of the metal layer 30 is 10 μm or less from the viewpoint of ensuring excellent surface smoothness. The surface roughness (Ra) of the metal layer 30 is preferably 5 μm or less, more preferably 3 μm or less, still more preferably 1 μm or less, and particularly preferably less than 1 μm, from the viewpoint of ensuring further excellent surface smoothness.

  The thickness of the resin layer 20a included in the sealing material 1 is 10 μm or more from the viewpoint of obtaining excellent smoothness by embedding unevenness on the surface opposite to the smooth surface (surface in contact with the resin layer) in the metal layer 30. It may be 20 μm or more. The thickness of the resin layer 20a may be 500 μm or less or may be 250 μm or less from the viewpoint that the drying property in the thickness direction can be made uniform. In addition, the thickness of the sealing part 20 after hardening in the sealing structure may be the same as the thickness of the resin layer 20a.

  The constituent material of the resin layer 20a is not particularly limited as long as it is a resin usually used for sealing electronic components. The resin layer 20a is preferably a layer made of a curable resin composition. The curable resin composition may be either thermosetting or photocurable.

  As a thermosetting resin composition, the resin composition containing (A) thermosetting component and (B) inorganic filler is mentioned, for example.

  Thermosetting components include thermosetting resins (epoxy resins, phenoxy resins, cyanate resins, thermosetting polyimides, melamine resins, urea resins, unsaturated polyesters, alkyd resins, phenol resins, polyurethanes, etc.), curing agents, etc. Can be mentioned. (A) The thermosetting component contains, for example, (a1) an epoxy resin and (a2) a curing agent.

  The (a1) epoxy resin can be used without particular limitation as long as it has two or more glycidyl groups in one molecule. As epoxy resins, bisphenol A type epoxy resin, bisphenol AP type epoxy resin, bisphenol AF type epoxy resin, bisphenol B type epoxy resin, bisphenol BP type epoxy resin, bisphenol C type epoxy resin, bisphenol E type epoxy resin, bisphenol F type Epoxy resin, bisphenol G type epoxy resin, bisphenol M type epoxy resin, bisphenol S type epoxy resin, bisphenol P type epoxy resin, bisphenol PH type epoxy resin, bisphenol TMC type epoxy resin, bisphenol Z type epoxy resin, bisphenol S type epoxy resin (Hexanediol bisphenol S diglycidyl ether, etc.), novolac phenol type epoxy resin, biphenyl type epoxy resin, Phthalene type epoxy resins, dicyclopentadiene type epoxy resins, bixylenol type epoxy resins (such as bixylenol diglycidyl ether), hydrogenated bisphenol A type epoxy resins (such as hydrogenated bisphenol A glycidyl ether), dibasic acid modification of these resins Examples thereof include diglycidyl ether type epoxy resins and aliphatic epoxy resins. (A1) An epoxy resin can be used individually by 1 type or in combination of 2 or more types.

  Commercially available epoxy resins include naphthalene type epoxy resins such as “HP-4710”, “Epiclon HP-4032”, and “EXA-4750” manufactured by DIC Corporation; “NC-7000” (manufactured by Nippon Kayaku Co., Ltd.) Naphthalene skeleton-containing polyfunctional solid epoxy resin) and other naphthalene type epoxy resins; Nippon Kayaku Co., Ltd. "EPPN-502H" (trisphenol epoxy resin) and other phenols and aromatic aldehydes having a phenolic hydroxyl group Condensate epoxidized product (Trisphenol type epoxy resin); Dicyclopentadiene aralkyl type epoxy resin such as “Epicron HP-7200H” (dicyclopentadiene skeleton-containing polyfunctional solid epoxy resin) manufactured by DIC Corporation; Nippon Kayaku Co., Ltd. “NC-3000H” manufactured by company (containing biphenyl skeleton) Biphenyl aralkyl epoxy resins such as functional solid epoxy resins; “Epicron N660” and “Epicron N690” manufactured by DIC Corporation; Novolac epoxy resins such as “EOCN-104S” manufactured by Nippon Kayaku Co., Ltd .; Nissan Chemical Industries Tris (2,3-epoxypropyl) isocyanurate such as “TEPIC” manufactured by Corporation; “Epicron 860”, “Epicron 900-IM”, “Epicron EXA-4816” and “Epicron EXA-4822” manufactured by DIC Corporation "Araldite AER280" manufactured by Asahi Ciba Co., Ltd .; "Epototo YD-134" manufactured by Tohto Kasei Co., Ltd .; "JER834" and "JER872" manufactured by Mitsubishi Chemical Corporation; "ELA-134" manufactured by Sumitomo Chemical Co., Ltd. "Epicor made by Yuka Shell Epoxy Co., Ltd." "807", "Epicoat 815", "Epicoat 825", "Epicoat 827", "Epicoat 828", "Epicoat 834", "Epicoat 1001", "Epicoat 1004", "Epicoat 1007" and "Epicoat 1009"; Dow Chemical “DER-330”, “DER-301”, and “DER-361” manufactured by Tosei Kasei Co., Ltd .; bisphenol A type epoxy resins such as “YD8125” and “YDF8170” manufactured by Tohto Kasei Co., Ltd .; “JER806” manufactured by Mitsubishi Chemical Corporation Bisphenol F type epoxy resin such as “Epiclon N-740” manufactured by DIC Corporation; aliphatic epoxy resin such as “Nadecor DLC301” manufactured by Nagase ChemteX Corporation. These epoxy resins can be used alone or in combination of two or more.

  (A1) The content of the epoxy resin is preferably 10 to 50% by mass based on the total mass of the resin composition (excluding solvents such as organic solvents) from the viewpoint of excellent embedding of electronic components, More preferably, it is 10-40 mass%, and it is still more preferable that it is 10-35 mass%.

  The (a2) curing agent can be used without particular limitation as long as it has two or more functional groups that react with a glycidyl group in one molecule. (A2) As a hardening | curing agent, a phenol resin, an acid anhydride, etc. are mentioned. (A2) A hardening | curing agent can be used individually by 1 type or in combination of 2 or more types.

  The phenol resin is not particularly limited as long as it has two or more phenolic hydroxyl groups in one molecule, and a known phenol resin can be used. Examples of phenol resins include resins obtained by condensation or co-condensation of phenols and / or naphthols and aldehydes under an acidic catalyst, biphenyl skeleton type phenol resins, paraxylylene-modified phenol resins, metaxylylene / paraxylylene-modified phenol resins. Melamine-modified phenol resin, terpene-modified phenol resin, dicyclopentadiene-modified phenol resin, cyclopentadiene-modified phenol resin, polycyclic aromatic ring-modified phenol resin, xylylene-modified naphthol resin, and the like. Examples of phenols include phenol, cresol, xylenol, resorcinol, catechol, bisphenol A, bisphenol F, and the like. Examples of naphthols include α-naphthol, β-naphthol, dihydroxynaphthalene and the like. Examples of aldehydes include formaldehyde, acetaldehyde, propionaldehyde, benzaldehyde, salicylaldehyde and the like.

  Commercially available phenol resins include “Phenolite LF2882”, “Phenolite LF2822”, “Phenolite TD-2090”, “Phenolite TD-2149”, “Phenolite VH-4150” manufactured by Dainippon Ink and Chemicals, Inc. And “Phenolite VH4170”; “XLC-LL” and “XLC-4L” manufactured by Mitsui Chemicals, Inc .; “SN-100”, “SN-300”, and “SN-395” manufactured by Nippon Steel & Sumikin Chemical Co., Ltd. And “SN-400”; “SK Resin HE910” manufactured by Air Water Co., Ltd .; “PAPS-PN2” manufactured by Asahi Organic Materials Co., Ltd .; “DL-92” manufactured by Meiwa Kasei Co., Ltd., and the like.

  (A2) The content of the curing agent is 5 to 50% by mass based on the total mass of the resin composition (excluding solvents such as organic solvents) from the viewpoint of excellent curability of the thermosetting resin. Preferably, it is 10-50 mass%, More preferably, it is 10-40 mass%, It is still more preferable that it is 10-35 mass%.

  (A1) Ratio of epoxy resin glycidyl group equivalent (epoxy equivalent) and (a2) functional group (for example, phenolic hydroxyl group) reacting with glycidyl group of curing agent (for example, hydroxyl group equivalent) ((a1) epoxy The equivalent of the glycidyl group of the resin / (a2) the equivalent of the functional group that reacts with the glycidyl group of the curing agent) is preferably 0.7 to 2.0, more preferably 0.8 to 1.8. Preferably, it is 0.9-1.7. In these cases, unreacted (a1) epoxy resin and / or unreacted (a2) curing agent hardly remains, and desired cured film properties are easily obtained.

  (A) The thermosetting component may contain (a3) a curing accelerator. (A3) There is no restriction | limiting in particular as a hardening accelerator. (A3) The curing accelerator is preferably at least one selected from the group consisting of amine-based curing accelerators and phosphorus-based curing accelerators. In particular, as the (a3) curing accelerator, an amine-based curing accelerator is preferable from the viewpoint of abundant derivatives and a viewpoint that a desired active temperature can be easily obtained, and an imidazole compound, an aliphatic amine, and an alicyclic group. At least one selected from the group consisting of amines is more preferable, and imidazole compounds are more preferable. (A3) A hardening accelerator can be used individually by 1 type or in combination of 2 or more types.

  The content of (a3) curing accelerator is preferably 0.01 to 5% by mass, more preferably 0.1 to 3% by mass, based on the total amount of (a1) epoxy resin and (a2) curing agent. 0.3-1.5 mass% is still more preferable. (A3) When the content of the curing accelerator is 0.01% by mass or more, a sufficient curing acceleration effect is easily obtained. (A3) When the content of the curing accelerator is 5% by mass or less, curing is unlikely to proceed during the process of manufacturing the sealing material (for example, coating and drying) or during storage of the sealing material. It is easy to prevent cracking of the resin layer and molding defects accompanying an increase in melt viscosity.

  The curable resin composition of the present embodiment preferably contains a resin that is liquid at 25 ° C. The content of the liquid resin is that the total mass of the resin composition (from the viewpoint of easily drying the solvent during coating and from the viewpoint of easily imparting flexibility to the film, since the liquid resin substitutes for the solvent) 5 to 50% by mass is preferable, 10 to 50% by mass is more preferable, 10 to 40% by mass is further preferable, and 10 to 35% by mass is particularly preferable.

  (B) As an inorganic filler, a conventionally well-known inorganic filler can be used and it is not limited to a specific thing. (B) As a constituent material of the inorganic filler, for example, barium sulfate; barium titanate; silicas such as amorphous silica, crystalline silica, fused silica, and spherical silica; talc; clay; magnesium carbonate; calcium carbonate; Examples thereof include aluminum; aluminum hydroxide; silicon nitride; aluminum nitride. (B) The constituent material of the inorganic filler has a relatively small thermal expansion coefficient, as well as a viewpoint of easily obtaining a dispersibility improving effect in the resin and a sedimentation suppressing effect in the varnish by surface modification or the like. From the viewpoint of easily obtaining desired cured film properties, silicas are preferable. (B) An inorganic filler can be used individually by 1 type or in combination of 2 or more types.

  (B) The inorganic filler may be surface-modified. The method for surface modification is not particularly limited. Surface modification using a silane coupling agent is preferable from the viewpoint of simple treatment, rich types of functional groups, and easy provision of desired characteristics.

  Examples of the silane coupling agent include alkyl silane, alkoxy silane, vinyl silane, epoxy silane, amino silane, acrylic silane, methacryl silane, mercapto silane, sulfide silane, isocyanate silane, sulfur silane, styryl silane, alkyl chloro silane, and the like. Among the commercially available inorganic fillers, examples of the inorganic filler surface-modified with a silane coupling agent include “SC5500-SXE” and “SC2500-SXJ” manufactured by Admatechs Co., Ltd. A silane coupling agent can be used individually by 1 type or in combination of 2 or more types.

  Specific examples of the silane coupling agent include methyltrimethoxysilane, dimethyldimethoxysilane, trimethylmethoxysilane, methyltriethoxysilane, methyltriphenoxysilane, ethyltrimethoxysilane, n-propyltrimethoxysilane, diisopropyldimethoxysilane, and isobutyl. Trimethoxysilane, diisobutyldimethoxysilane, isobutyltriethoxysilane, n-hexyltrimethoxysilane, n-hexyltriethoxysilane, cyclohexylmethyldimethoxysilane, n-octyltriethoxysilane, n-dodecylmethoxysilane, phenyltrimethoxysilane, Diphenyldimethoxysilane, triphenylsilanol, methyltrichlorosilane, dimethyldichlorosilane, trimethylchlorosilane, n Octyldimethylchlorosilane, tetraethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3- (2-aminoethyl) aminopropyltrimethoxysilane, 3- (2-aminoethyl) aminopropylmethyldimethoxy Silane, 3-phenylaminopropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropyltriethoxysilane, 3-glycidoxypropylmethyldiethoxy Silane, bis (3- (triethoxysilyl) propyl) disulfide, bis (3- (triethoxysilyl) propyl) tetrasulfide, vinyltriacetoxysilane, vinyltrimethoxysilane, vinyltriethoxy Silane, vinyltriisopropoxysilane, allyltrimethoxysilane, diallyldimethylsilane, 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropylmethyldimethoxysilane, 3-methacryloxypropyltriethoxysilane, 3-mercaptopropyltrimethoxy Examples include silane, 3-mercaptopropylmethyldimethoxysilane, 3-mercaptopropyltriethoxysilane, N- (1,3-dimethylbutylidene) -3-aminopropyltriethoxysilane, aminosilane (phenylaminosilane and the like), and the like. These silane coupling agents can be used alone or in combination of two or more.

  (B) The average particle diameter of the inorganic filler is not particularly limited, but is preferably 0.01 to 50 μm, more preferably 0.1 to 25 μm, and still more preferably 0.3 to 10 μm. (B) When the average particle diameter of an inorganic filler is 0.01 micrometer or more, aggregation of an inorganic filler is suppressed easily and an inorganic filler can be fully fully disperse | distributed easily. (B) When the average particle diameter of an inorganic filler is 50 micrometers or less, sedimentation (for example, sedimentation in a varnish) of an inorganic filler can be suppressed easily and it is easy to form a homogeneous resin layer.

  (B) The content of the inorganic filler is preferably 88% by mass or less, more preferably 85% by mass or less, and more preferably 80% by mass or less based on the total mass of the resin composition (excluding solvents such as organic solvents). Further preferred. In these cases, good fluidity can be secured while realizing low warpage of the sealing structure, and good adhesive strength between the metal layer and the resin layer in the sealing material can be obtained. In addition, the effect of easily suppressing the cracking of the resin layer in the drying process during the production of the sealing material, the effect of improving the adhesion between the resin layer and the metal layer, and sealing the object to be sealed The effect which becomes easy can be acquired suitably. (B) The content of the inorganic filler is 55% by mass or more from the viewpoint of easily preventing the warpage of the sealing structure due to the difference in thermal expansion coefficient between the sealed body and the sealing portion. Preferably, 62 mass% or more is more preferable, and 68 mass% or more is still more preferable. From these viewpoints, the content of the (B) inorganic filler is preferably 55 to 88% by mass, more preferably 62 to 85% by mass, and still more preferably 68 to 80% by mass.

  The resin composition of this embodiment may contain (C) elastomer (flexible agent) as needed. (C) By using an elastomer, warping after sealing (for example, the warping amount of the sealing structure) and cracking of the resin in the sealing structure can be effectively reduced.

  Examples of the elastomer (C) include thermoplastic elastomers such as silicone, styrene, olefin, urethane, polyester, polyether, polyamide, and polybutadiene; NR (natural rubber), NBR (acrylonitrile-butadiene) Rubber), rubber particles such as acrylic rubber, urethane rubber and silicone powder; methyl methacrylate-styrene-butadiene copolymer (MBS), methyl methacrylate-silicone copolymer, methyl methacrylate-butyl acrylate copolymer, etc. And rubber particles having a core-shell structure. (C) The elastomer is preferably at least one selected from the group consisting of styrene butadiene particles, silicone powder, silicone oil and silicone oligomer from the viewpoint of excellent dispersibility and solubility. (C) An elastomer can be used individually by 1 type or in combination of 2 or more types.

  (C) There is no restriction | limiting in particular in the average particle diameter of an elastomer. (C) The average particle diameter of the elastomer is preferably 50 μm or less from the viewpoint of excellent embedding between electronic components (for example, embedding for eWLB use). (C) The average particle diameter of the elastomer is preferably 0.1 μm or more from the viewpoint of excellent dispersibility.

  (C) You may use a commercial item as an elastomer. (C) As a commercial product of elastomer, for example, “B series”, “M series” and “FM series” (all trade names) of KANE ACE (“KANE ACE” is a registered trademark) manufactured by Kaneka Corporation; Examples include “KMP series” manufactured by Shin-Etsu Chemical Co., Ltd. Some commercially available (C) elastomers are dispersed in advance in a liquid resin (for example, a liquid epoxy resin) instead of the elastomer alone, but can be used without any problem. Examples of such commercially available products include “MX-136” and “MX-965” manufactured by Kaneka Corporation.

  The resin composition of this embodiment may contain (D) an organic solvent. (D) The organic solvent may be an organic solvent derived from the varnish that remains without being removed in the drying step during the production (such as coating) of the sealing material.

  (D) As an organic solvent, a conventionally well-known organic solvent can be used. (D) As an organic solvent, the solvent which can melt | dissolve components other than (B) inorganic filler can be used. Examples of the organic solvent (D) include aliphatic hydrocarbons, aromatic hydrocarbons, terpenes, halogens, esters, ketones, alcohols, aldehydes and the like.

  The specific (D) organic solvent is selected from the group consisting of esters, ketones and alcohols from the viewpoint of low environmental burden and from the viewpoint of easily dissolving the (a1) epoxy resin and (a2) curing agent. At least one of these is preferred. Among these, ketones are preferable from the viewpoint of easily dissolving the (a1) epoxy resin and the (a2) curing agent. Among the ketones, at least one selected from the group consisting of acetone, methyl ethyl ketone and methyl isobutyl ketone is preferable from the viewpoint of low volatility at room temperature and easy removal during drying.

  (D) The content of the organic solvent is preferably 0.2 to 1.5% by mass and more preferably 0.3 to 1% by mass with respect to the total mass of the resin composition (including solvents such as organic solvents). preferable. (D) When the content of the organic solvent is 0.2% by mass or more, the epoxy resin composition becomes brittle and defects such as cracking of the resin occur, and the minimum melt viscosity becomes high and the sealed object is embedded. It can prevent that property falls. (D) When the content of the organic solvent is 1.5% by mass or less, the adhesiveness of the resin composition becomes too strong and the handling property is lowered, and the volatilization of the organic solvent at the time of thermosetting the resin layer It is possible to easily prevent problems such as foaming.

  The resin composition of the present embodiment may further contain other additives as long as the effects of the present invention are not impaired. Specific examples of such additives include pigments, dyes, mold release agents, antioxidants, surface tension adjusting agents and the like.

  The sealing material 1 can be stored in a flat plate form, for example. The sealing material 1 can be wound around a cylindrical core or the like and stored in a roll form.

  The sealing material 1 may further include an intermediate layer between the resin layer 20 a and the metal layer 30. The sealing material 1 may further include a protective layer for the purpose of protecting the resin layer 20a on the opposite side of the resin layer 20a from the metal layer 30. Thereby, the handleability is improved. In addition, foreign matters can be prevented from being mixed into the resin layer 20a, and a problem that the resin layer 20a sticks to the back surface of the metal layer 30 when it is wound can be avoided.

  As the protective layer, a polymer film, a metal foil, or the like can be used. Examples of the polymer film include a polyolefin film such as a polyethylene film, a polypropylene film, and a polyvinyl chloride film; a polyester film such as a polyethylene terephthalate film; a polycarbonate film; an acetylcellulose film; and a tetrafluoroethylene film. Examples of the metal foil include copper foil and aluminum foil.

<Method for producing sealing material>
Even if the manufacturing method of the sealing material 1 is equipped with the process of apply | coating a resin composition on the metal layer 30, and forming the coating film, and the process of heat-drying a coating film and forming the resin layer 20a, for example. Good. The application method is not particularly limited, and examples thereof include die coating and comma coating. Examples of the heat drying method include hot air blowing.

  The coating film may be formed using a resin composition containing a solvent such as an organic solvent as a varnish. The varnish can be prepared, for example, by mixing (A) a thermosetting component, (B) an inorganic filler, (D) an organic solvent, and optional components used as necessary. The mixing method of each component is not particularly limited, and a mill, a mixer, a stirring blade or the like can be used. (D) The organic solvent can be used to prepare the varnish by dissolving the thermosetting component (A) contained in the resin composition, or to assist in preparing the varnish, Most can be removed in the drying process.

  (B) The inorganic filler may be preliminarily dispersed as necessary. For example, you may use the slurry obtained by disperse | distributing (B) inorganic filler in a solvent (for example, (D) organic solvent). Examples of the dispersion treatment method include a method using a nanomizer that advances dispersion by high-speed shearing force, a method (B) of pulverizing an inorganic filler using a spherical medium called beads (a method using a bead mill), and the like. Examples of commercially available silica slurries include “SC2050-MTK” manufactured by Admatechs Co., Ltd.

  EXAMPLES Hereinafter, although an Example demonstrates this invention in more detail, this invention is not limited to these Examples at all.

<Contained components of varnish>
The following component was used as a component of the resin composition (varnish).

(Epoxy resin)
a11: Bisphenol F type epoxy resin (manufactured by Mitsubishi Chemical Corporation, trade name: JER806, epoxy equivalent: 160) (component that is liquid at 25 ° C.)
a12: Polyfunctional solid epoxy resin containing naphthalene skeleton (manufactured by DIC Corporation, trade name: EXA-4750, epoxy equivalent: 182) (component not liquid at 25 ° C.)
a13: Naphthalene skeleton-containing polyfunctional solid epoxy resin (manufactured by DIC Corporation, trade name: HP-4710, epoxy equivalent: 170) (component not liquid at 25 ° C.)

(Elastomer-containing epoxy resin)
a14: butadiene elastomer particle-containing bisphenol F type liquid epoxy resin (manufactured by Kaneka Corporation, trade name: MX-136, liquid epoxy resin content: 75 mass%, elastomer particle content: 25 mass%, average of elastomer particles Particle size: 0.1 μm) (component containing resin that is liquid at 25 ° C.)
a15: Liquid epoxy resin containing silicone elastomer particles (mixture of bisphenol F type liquid epoxy resin and bisphenol A type liquid epoxy resin. Made by Kaneka Corporation, trade name: MX-965, content of liquid epoxy resin: 75% by mass, elastomer Particle content: 25% by mass) (component containing resin in liquid form at 25 ° C.)

(Curing agent)
a21: Phenol novolak (Asahi Organic Materials Co., Ltd., trade name: PAPS-PN2, phenolic hydroxyl group equivalent: 104) (component not liquid at 25 ° C.)
a22: Naphthalene all-novolak (manufactured by NS
a23: Phenol novolak (Maywa Kasei Co., Ltd., trade name: DL-92, phenolic hydroxyl group equivalent: 103) (component not liquid at 25 ° C.)

(Curing accelerator)
a3: Imidazole (manufactured by Shikoku Kasei Kogyo Co., Ltd., trade name: 2P4MZ) (component that is not liquid at 25 ° C.)

(Inorganic filler)
B1: Silica particles (manufactured by Admatechs Co., Ltd., trade name: SC2500-SXJ, phenylaminosilane treatment, average particle size: 0.5 μm)
B2: Aluminum oxide particles (manufactured by Sumitomo Chemical Co., Ltd., trade name: AA-1.5, average particle size: 1.5 μm)

(Organic solvent)
D: Methyl ethyl ketone

<Preparation of varnish>
A varnish (varnish-like resin composition) having the composition shown in Table 1 was prepared as follows.

  100 g of component D was placed in a 10 L polyethylene container. Next, after adding 750.8g of component B1 to the container, the component B1 was disperse | distributed with the stirring blade, and the dispersion liquid was obtained. To this dispersion, 90.1 g of component a11, 31 g of component a13, 24 g of component a14, 9 g of component a15 and 93.1 g of component a21 were added and stirred. After confirming that component a21 was dissolved, 1.9 g of component a3 was added, and the mixture was further stirred for 1 hour. The obtained mixture was filtered through nylon # 200 mesh (opening diameter: 75 μm). The filtrate was collected to obtain varnish A.

  689.6 g of component B2 is used as the inorganic filler, 130.5 g of component a11, 37.1 g of component a12 and 17.1 g of component a13 are used as the epoxy resin, and 123.5 g of component a22 is used as the curing agent. Varnish B having the composition shown in Table 1 was prepared in the same manner as Varnish A except that 2.3 g of component a3 was used as a curing accelerator and no elastomer-containing epoxy resin was used.

  802.2 g of component B2 is used as the inorganic filler, 96.1 g of component a11 and 24 g of component a13 are used as the epoxy resin, 76.1 g of component a23 is used as the curing agent, and 1.5 g of curing accelerator is used. Varnish C having the composition shown in Table 1 was prepared in the same manner as varnish A except that component a3 was used and the elastomer-containing epoxy resin was not used.

<Examples 1-3>
(Preparation of sealing material A)
The coating film was obtained after applying the varnish A to C on a copper foil (trade name: YGP-35R, copper foil thickness: 35 μm) using a coating machine to obtain a coating film. It was made to dry and the resin layer was formed on copper foil. Application and drying were performed under the following conditions. The thickness of the resin layer after drying was 200 μm. Sealing material A was obtained by disposing a 50 μm thick protective layer (polyethylene terephthalate film) on the opposite side of the resin layer from the copper foil. In each of the following measurements, the measurement was performed after the protective layer was peeled off.
Coating machine: Die coater manufactured by Hirano Techseed Co., Ltd. Coating head method: Die coating and drying speed: 1 m / min Drying conditions (temperature / furnace length): 60 ° C./3.3 m, 90 ° C./3.3 m, 110 ° C./3 .3m

(Preparation of encapsulant B)
A sealing material B was prepared in the same manner as the sealing material A except that the coating and drying speed was changed to 5 m / min. The thickness of the resin layer after drying was 20 μm.

(Evaluation)
(1) Surface roughness (Ra)
The sealing material A was laminated on the MCL under the following lamination conditions so that the resin layer of the sealing material A was in contact with the 50 mm square size MCL (thickness: 500 μm). Next, the resin layer was thermally cured under the following curing conditions to obtain a cured resin body. Subsequently, the surface roughness (Ra) of the surface (copper foil) of the cured resin body was measured using a surface roughness measuring device (Bruker Ax Co., Ltd., trade name: wyko NT9100). The measurement results are shown in Table 1.

[Lamination condition]
Laminator device: manufactured by Meiki Seisakusho Co., Ltd., vacuum pressure laminator MVLP-500
Lamination temperature: 90 ° C
Lamination pressure: 0.5 MPa
Vacuuming time: 30 seconds Laminating time: 40 seconds

[Curing conditions]
Oven: manufactured by ESPEC CORP., SAFETY OVEN SPH-201
Oven temperature: 140 ° C
Time: 120 minutes

(2) Laser Marking Properties Sealing material A was laminated to MCL under the following laminating conditions so that the resin layer of sealing material A was in contact with 50 mm square size MCL (thickness: 500 μm). Next, the resin layer was thermally cured under the following curing conditions to obtain a cured resin body. Subsequently, laser marking was performed on the copper foil on the cured resin body using a laser marking device (trade name: YAG laser marker MD-H, manufactured by Keyence Corporation). The case where the characters after marking could be identified visually was evaluated as “◯”, and the case where the characters after marking could not be identified visually was evaluated as “x”. The measurement results are shown in Table 1.

[Lamination condition]
Laminator device: manufactured by Meiki Seisakusho Co., Ltd., vacuum pressure laminator MVLP-500
Lamination temperature: 90 ° C
Lamination pressure: 0.5 MPa
Vacuuming time: 30 seconds Laminating time: 40 seconds

[Curing conditions]
Oven: manufactured by ESPEC CORP., SAFETY OVEN SPH-201
Oven temperature: 140 ° C
Time: 120 minutes

(3) Adhesiveness between copper foil and cured resin layer The encapsulant B was laminated to the silicon wafer under the following laminating conditions so that the resin layer of the encapsulant B was in contact with the silicon wafer (thickness: 775 μm). Next, after fixing the silicon wafer to the SUS plate, the resin layer was thermally cured under the following curing conditions. Subsequently, three Mylar tapes having a width of 5 mm were attached to the surface of the copper foil so as to have a length of 5 cm or more, and a part of the copper foil was removed by etching. Next, the adhesive strength between the copper foil and the cured resin layer was measured under the following conditions. When the adhesive strength between the copper foil and the cured resin layer is good, the wiring can be easily prevented from peeling off from the sealing structure during the process of forming the wiring. The measurement results are shown in Table 1.

[Lamination condition]
Laminator device: manufactured by Meiki Seisakusho Co., Ltd., vacuum pressure laminator MVLP-500
Lamination temperature: 110 ° C
Lamination pressure: 0.5 MPa
Vacuuming time: 30 seconds Laminating time: 40 seconds

[Curing conditions]
Oven: manufactured by ESPEC CORP., SAFETY OVEN SPH-201
Oven temperature: 140 ° C
Time: 60 minutes

[Measurement conditions for adhesive strength]
Adhesive strength measuring device: EZTest / CE, manufactured by Shimadzu Corporation
Pulling speed: 5cm / min

<Comparative Examples 1-3>
(Preparation of sealing material C)
A sealing material C was prepared in the same manner as the sealing material A except that the copper foil was changed to a PET film (Honshu Denshi Co., Ltd., trade name: 38RL-07NS, PET film thickness: 38 μm). . The thickness of the resin layer after drying was 200 μm. In each of the following measurements, the measurement was performed after the protective layer was peeled off.

(Preparation of sealing material D)
A sealing material D was prepared in the same manner as the sealing material C except that the coating and drying speed was changed to 5 m / min. The thickness of the resin layer after drying was 20 μm.

(Evaluation)
The sealing material C was used in place of the sealing material A, and the resin layer was thermally cured to obtain a cured resin body and the surface of the cured resin body (resin layer after curing) after peeling the PET film. The surface roughness (Ra) was measured in the same manner as in Example except that the surface roughness (Ra) was measured. Also, the sealing material D was used in place of the sealing material A, and the resin layer was thermally cured to obtain a cured resin body, and after the PET film was peeled off, the surface of the cured resin body (resin layer after curing) The laser marking property was evaluated in the same manner as in the example except that laser marking was applied to. The measurement results are shown in Table 1.

  In Table 1, the content of each component indicates the content based on the total mass (excluding the solvent) of the resin composition. Content (mass%) of component B4 shows content (mass%) of the silica particle in a silica slurry. The ratio (mass%) of the liquid resin indicates the ratio (mass%) of the liquid resin in the total mass (excluding the solvent) of the resin composition. The ratio (mass%) of the inorganic filler indicates the ratio (mass%) of the inorganic filler to the total mass (excluding the solvent) of the resin composition.

  DESCRIPTION OF SYMBOLS 1 ... Sealing material 10, 40 ... Electronic component, 20 ... Sealing part, 20a ... Resin layer, 30, 30a ... Metal layer, 50 ... Board | substrate, 60 ... Temporary fixing layer, 70 ... Dicing blade, 70a ... Notch part , 100a, 100b, 100c, 100d, 100e ... sealing structure.

Claims (9)

A sealing step of sealing the first electronic component with the resin layer of the sealing material including a metal layer and a resin layer;
The metal layer has a surface having a surface roughness (Ra) of 10 μm or less;
The manufacturing method of the sealing structure by which the said resin layer is arrange | positioned at the surface on the opposite side to the said surface of the said metal layer.   The manufacturing method of the sealing structure of Claim 1 whose content of the inorganic filler in the said resin layer is 55 mass% or more.   The manufacturing method of the sealing structure of Claim 1 or 2 with which the said 1st electronic component is plurality.   The manufacturing method of the sealing structure as described in any one of Claims 1-3 further equipped with the process of carrying out the laser marking of the said metal layer after the said sealing process.   The sealing structure according to any one of claims 1 to 4, further comprising a step of arranging a second electronic component on the opposite side of the metal layer from the resin layer after the sealing step. Production method.   The sealing structure according to any one of claims 1 to 5, further comprising a step of dicing the structure including the first electronic component, the resin layer, and the metal layer after the sealing step. Manufacturing method. A metal layer having a surface with a surface roughness (Ra) of 10 μm or less;
A resin layer disposed on a surface opposite to the surface of the metal layer,
The sealing material used in order to seal an electronic component with the said resin layer.   The sealing material according to claim 7, wherein the content of the inorganic filler in the resin layer is 55% by mass or more.   Hardened | cured material of the said resin layer of the sealing material of Claim 7 or 8.

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