JP2014195830A - Flux for lead-free solder for clearance resist, and lead-free solder paste for clearance resist - Google Patents
Flux for lead-free solder for clearance resist, and lead-free solder paste for clearance resist Download PDFInfo
- Publication number
- JP2014195830A JP2014195830A JP2014006250A JP2014006250A JP2014195830A JP 2014195830 A JP2014195830 A JP 2014195830A JP 2014006250 A JP2014006250 A JP 2014006250A JP 2014006250 A JP2014006250 A JP 2014006250A JP 2014195830 A JP2014195830 A JP 2014195830A
- Authority
- JP
- Japan
- Prior art keywords
- component
- flux
- acid
- lead
- free solder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 238000009835 boiling Methods 0.000 claims abstract description 18
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Landscapes
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Abstract
Description
本発明は、クリアランスレジスト用鉛フリーはんだ向けフラックスおよびクリアランスレジスト用鉛フリーはんだペーストに関する。 The present invention relates to a flux for lead-free solder for clearance resist and a lead-free solder paste for clearance resist.
はんだ用フラックスは、例えばIC、コンデンサ、抵抗などの電子部品をプリント基板等に表面実装する際に用いる材料である。表面実装では、例えばスクリーン印刷やディスペンサーによりプリント基板上にはんだペーストを供給し、その上に電子部品を載置し、ついで当該基板をはんだ金属の融点以上にリフロー等することによって、電子部品が実装基板の電極上に接合される。 The soldering flux is a material used for surface mounting electronic parts such as ICs, capacitors, and resistors on a printed board or the like. In surface mounting, for example, electronic components are mounted by supplying solder paste onto a printed circuit board by screen printing or a dispenser, placing an electronic component on the printed circuit board, and then reflowing the substrate above the melting point of the solder metal. Bonded onto the electrode of the substrate.
ところで、現在主流の鉛フリーはんだ(Sn−Ag−Cu系、Sn−Cu系等)は、従前主流であった鉛共晶はんだ(Sn−Pb系等)と比較して融点が高く、酸化し易いため、これを用いたはんだペーストを銅や金、スズなどの基板電極上で溶融させると、電極周囲にソルダボールが多数発生することがある。そこで、斯界ではプリヒート温度を調節したり、窒素雰囲気中ではんだ付けを行なったりしており、特に後者方法は有用な手段とされている。しかし、近年は製造コストを考慮して大気雰囲気中でリフローを行なう傾向にあり、ソルダボールが以前に増して発生し易い状況となっていた。 By the way, the current mainstream lead-free solder (Sn—Ag—Cu system, Sn—Cu system, etc.) has a higher melting point than the mainstream lead eutectic solder (Sn—Pb system, etc.) and is oxidized. For this reason, when a solder paste using this is melted on a substrate electrode such as copper, gold, or tin, many solder balls may be generated around the electrode. Therefore, in this field, the preheating temperature is adjusted or soldering is performed in a nitrogen atmosphere, and the latter method is particularly useful. However, in recent years, there has been a tendency to perform reflow in an air atmosphere in consideration of manufacturing costs, and solder balls have been more likely to occur than before.
また近年、電化製品がいっそう小型化するにつれ、はんだペーストには実装基板上の微小な電極パターンに対応した実装性能が強く要求されている。さらに、電極パターンが微小化するにつれ近年では部品のチップ立ち抑制や接合強度向上の観点から、導体ランドの外周部にソルダレジストが形成される従来のオーバーレジスト構造(図2)から、ランドの外周部にソルダレジストが形成されていないクリアランスレジスト構造(図3)を使用する傾向にある。なお、クリアランスレジスト方式については、例えば特許文献1がある程度詳しい。 In recent years, as electrical appliances are further reduced in size, solder paste is strongly required to have mounting performance corresponding to a minute electrode pattern on a mounting board. Furthermore, as the electrode pattern becomes smaller, in recent years, from the conventional overresist structure in which a solder resist is formed on the outer periphery of the conductor land (FIG. 2), from the viewpoint of suppressing the chip standing of components and improving the bonding strength, the outer periphery of the land There is a tendency to use a clearance resist structure (FIG. 3) in which no solder resist is formed on the part. Regarding the clearance resist system, for example, Patent Document 1 is detailed to some extent.
クリアランスレジスト構造においてはオーバレジスト構造とは異なり、リフロー時に加熱して粘性が低下したはんだペーストから液状のフラックスが導体ランド外に流れ出し易い傾向にあり、この際はんだ粒子の表面に形成された酸化皮膜が還元されず、はんだ溶融不良(濡れ不良)を起こしてしまうという課題がある(特許文献2を参照。)。さらに、リフロー雰囲気が大気の場合ではこの不良はより顕著となる。 Unlike the over-resist structure, the clearance resist structure tends to cause liquid flux to easily flow out of the conductor land from the solder paste that has been heated during reflow to reduce its viscosity. At this time, the oxide film formed on the surface of the solder particles Is not reduced, and there is a problem that a solder melting defect (wetting defect) occurs (see Patent Document 2). Furthermore, this defect becomes more prominent when the reflow atmosphere is air.
本発明は、大気雰囲気下でもクリアランスレジスト上の電極における鉛フリーはんだ金属の濡れ性を高めることが可能なフラックスを提供することを主たる課題とする。 The main object of the present invention is to provide a flux capable of enhancing the wettability of lead-free solder metal in an electrode on a clearance resist even in an air atmosphere.
本発明者らは鋭意検討した結果、所定のベース樹脂、溶剤および活性剤を配合したものがクリアランスレジスト用鉛フリーはんだペースト向けのフラックスとして奏功することを見出した。 As a result of intensive studies, the present inventors have found that a compound containing a predetermined base resin, a solvent and an activator is effective as a flux for a lead-free solder paste for a clearance resist.
すなわち本発明は、ロジン系ベース樹脂(A)(以下、(A)成分という。)、溶剤(B)(以下、(B)成分という。)、活性剤(C)(以下、(C)成分という。)、チキソトロピック剤(D)(以下、(D)成分という。)および酸化防止剤(E)(以下、(E)成分という。)を含み、かつ(A)成分がα,β不飽和カルボン酸変性ロジン(a1)(以下、(a1)成分という。)を含み、かつ(B)成分が沸点275℃以下のプロピレングリコール系エーテル(b1)(以下、(b1)成分という。)であり、かつ(C)成分が一般式(1):HOOC−R−COOH(式中、Rは炭素数2〜4の炭化水素基を示す。)で表される二塩基酸(c1)(以下、(c1)成分という。)であることを特徴とする、クリアランスレジスト用鉛フリーはんだペースト向けフラックス(以下、単にフラックスということがある。)、ならびに当該フラックスと鉛フリーはんだ粉末を含有するクリアランスレジスト用鉛フリーはんだペースト(以下、単に鉛フリーはんだペーストということがある。)、に関する。 That is, the present invention relates to rosin-based base resin (A) (hereinafter referred to as component (A)), solvent (B) (hereinafter referred to as component (B)), activator (C) (hereinafter referred to as component (C). ), Thixotropic agent (D) (hereinafter referred to as component (D)) and antioxidant (E) (hereinafter referred to as component (E)), A propylene glycol ether (b1) (hereinafter referred to as component (b1)) having a saturated carboxylic acid-modified rosin (a1) (hereinafter referred to as component (a1)) and a component (B) having a boiling point of 275 ° C. or lower. And a dibasic acid (c1) represented by the general formula (1): HOOC-R-COOH (wherein R represents a hydrocarbon group having 2 to 4 carbon atoms) , (C1) component)) for clearance resists Flux for lead-free solder paste (hereinafter sometimes referred to simply as flux), and lead-free solder paste for clearance resist containing the flux and lead-free solder powder (hereinafter sometimes simply referred to as lead-free solder paste) , Regarding.
本発明のフラックスによれば、大気雰囲気下でもクリアランスレジスト上の電極における鉛フリーはんだ金属の十分な濡れ性を確保できる。また、このフラックスは残渣を洗浄除去する必要が特に無いため、特に無洗浄タイプの実装基板に適している。また、本発明のフラックスを用いて得られる鉛フリーはんだペーストはスクリーン印刷適性にも優れる。 According to the flux of the present invention, sufficient wettability of the lead-free solder metal on the electrode on the clearance resist can be ensured even in an air atmosphere. Further, since this flux does not require any residue to be removed, it is particularly suitable for a non-cleaning type mounting substrate. Moreover, the lead-free solder paste obtained by using the flux of the present invention is excellent in screen printing suitability.
(A)成分は、本発明の効果を得るうえで、(a1)成分を必須要件とする。(a1)成分をなすα,β不飽和カルボン酸としては、例えば、アクリル酸およびメタクリル酸等のα,β不飽和モノカルボン酸や、マレイン酸、無水マレイン酸およびフマル酸等のα,β不飽和シジカルボン酸が挙げられる。また、(a1)成分をなすロジン類としては、例えば、ガムロジンやウッドロジン等の原料ロジン類、原料ロジンのその精製物(精製ロジン類)、それらの水素化物(水添ロジン)、それらの不均化物(不均化ロジン)等が挙げられ、特に精製ロジン類が好ましい。(a1)成分としては、α,β不飽和モノカルボン酸変性ロジンが、特に水添アクリル酸変性ロジンが好ましい。 In order to obtain the effect of the present invention, the component (A) has the component (a1) as an essential requirement. Examples of the α, β unsaturated carboxylic acid constituting the component (a1) include α, β unsaturated monocarboxylic acids such as acrylic acid and methacrylic acid, and α, β unsaturated acids such as maleic acid, maleic anhydride and fumaric acid. Saturated sidicarboxylic acid is mentioned. The rosins constituting the component (a1) include, for example, raw rosins such as gum rosin and wood rosin, purified rosins (purified rosins), hydrides thereof (hydrogenated rosins), and their disproportionates. In particular, purified rosins are preferred. As the component (a1), α, β unsaturated monocarboxylic acid-modified rosin is preferable, and hydrogenated acrylic acid-modified rosin is particularly preferable.
また、(a1)成分とともに、前記原料ロジン類、精製ロジン類、水添ロジン類(但し、(a1)成分を除く。)、不均化ロジン類、重合ロジン類、これらロジン類とポリオールとのエステル(ロジンエステル類)を併用できる。該ポリオールとしては、グリセリンやペンタエリスリトール等が挙げられる。これらのなかでも水添ロジン類(但し、α,β不飽和カルボン酸変性ロジンに相当するものを除く。)および/または不均化ロジン類は鉛フリーはんだ金属の酸化膜除去作用に優れ、その濡れ性を高めるため好ましい。 In addition to the component (a1), the raw material rosins, purified rosins, hydrogenated rosins (excluding the component (a1)), disproportionated rosins, polymerized rosins, and a combination of these rosins and polyols Esters (rosin esters) can be used in combination. Examples of the polyol include glycerin and pentaerythritol. Among these, hydrogenated rosins (except for those corresponding to α, β unsaturated carboxylic acid-modified rosins) and / or disproportionated rosins are excellent in removing oxide film of lead-free solder metal. This is preferable for improving wettability.
(B)成分は、本発明の効果を得るうえで、(b1)成分を必須要件とする。(b1)成分は、沸点275℃以下、具体的には沸点200〜275℃程度、好ましくは200〜250℃程度の高沸点溶剤であり、例えば、ブチルプロピレントリグリコール(沸点274℃)メチルプロピレントリグリコール(沸点242℃)やフェニルプロピレングリコール(沸点243℃)、ブチルプロピレンジグリコール(沸点231℃)、プロピルプロピレンジグリコール(沸点212℃)などを例示できる。これらのなかでもクリアランスレジスト上における濡れ性の点よりメチルプロピレントリグリコール、ブチルプロピレンジグリコール、フェニルプロピレングリコールおよびブチルプロピレントリグリコールからなる群より選ばれる少なくとも1種が、特にメチルプロピレントリグリコール、ブチルプロピレンジグリコールおよびフェニルプロピレングリコールからなる群より選ばれる少なくとも1種が好ましい。なお、プロピレングリコール系エーテル以外の溶剤を使用したり、プロピレングリコール系エーテルであってもより高沸点のものを使用したりすると、部品搭載時にクリアランスレジスト上ではんだの未溶融が発生しやすくなる。 The component (B) has the component (b1) as an essential requirement for obtaining the effects of the present invention. The component (b1) is a high boiling point solvent having a boiling point of 275 ° C. or lower, specifically about 200 to 275 ° C., preferably about 200 to 250 ° C., for example, butyl propylene triglycol (boiling point 274 ° C.) methylpropylene tri Examples include glycol (boiling point 242 ° C.), phenylpropylene glycol (boiling point 243 ° C.), butyl propylene diglycol (boiling point 231 ° C.), propyl propylene diglycol (boiling point 212 ° C.), and the like. Among these, at least one selected from the group consisting of methylpropylene triglycol, butylpropylene diglycol, phenylpropylene glycol and butylpropylene triglycol from the viewpoint of wettability on the clearance resist, particularly methylpropylene triglycol and butylpropylene At least one selected from the group consisting of diglycol and phenylpropylene glycol is preferred. If a solvent other than the propylene glycol ether is used, or a propylene glycol ether having a higher boiling point is used, unmelting of the solder is likely to occur on the clearance resist when the component is mounted.
(C)成分は、本発明の効果を得るうえで、(c1)成分を必須要件とする。(c1)成分は、一般式(1):HOOC−R−COOH(式中、Rは炭素数2〜4の炭化水素基を示す。)で表される化合物であり、具体例としては、例えば、コハク酸、グルタル酸およびアジピン酸等のアルキレン系脂肪族二塩基酸、ならびに/または、フマル酸、マレイン酸、無水マレイン酸、ペンテンジカルボン酸、ヘキセンジカルボン酸およびアセチレンジカルボン酸等のアルケニレン系脂肪族二塩基酸が挙げられ、これらのなかでもクリアランスレジスト上における濡れ性の点より、特にコハク酸、グルタル酸およびアジピン酸ならびにフマル酸およびマレイン酸からなる群より選ばれる少なくとも1種が好ましい。なお、Rが1であったり、5を超えたりする二塩基酸を用いても本発明の効果は得がたい。 The component (C) has the component (c1) as an essential requirement for obtaining the effects of the present invention. The component (c1) is a compound represented by the general formula (1): HOOC-R-COOH (wherein R represents a hydrocarbon group having 2 to 4 carbon atoms). Alkylene aliphatic dibasic acids such as succinic acid, glutaric acid and adipic acid, and / or alkenylene aliphatics such as fumaric acid, maleic acid, maleic anhydride, pentenedicarboxylic acid, hexenedicarboxylic acid and acetylenedicarboxylic acid Among these, dibasic acids are mentioned, and among these, at least one selected from the group consisting of succinic acid, glutaric acid and adipic acid, fumaric acid and maleic acid is preferable from the viewpoint of wettability on the clearance resist. Note that it is difficult to obtain the effect of the present invention even when a dibasic acid having R of 1 or more than 5 is used.
なお、(C)成分には必要に応じて(c1)成分以外の活性剤を含めることができる。そのようなものとしては、例えば、シュウ酸、スベリン酸、アゼライン酸、セバシン酸、ドデカン二酸、ダイマー酸、イタコン酸等の飽和又は不飽和の脂肪族二塩基酸類;trans−2,3−ジブロモ−1,4−ブテンジオールやcis−2,3−ジブロモ−1,4−ブテンジオール、1−ブロモ−2−ブタノール、1−ブロモ−2−プロパノール、3−ブロモ−1−プロパノール、3−ブロモ−1,2−プロパンジオール、1,4−ジブロモ−2−ブタノール、1,3−ジブロモ−2−プロパノール、2,3−ジブロモ−1−プロパノール等のブロモアルコール類;3−ブロモプロピオン酸、2−ブロモ吉草酸、5−ブロモ−n−吉草酸、2−ブロモイソ吉草酸、2,3−ジブロモコハク酸、2−ブロモコハク酸、2,2−ジブロモアジピン酸等のブロモジカルボン酸類;カプリン酸、ラウリン酸、ミリスチン酸、パルミチン酸、ステアリン酸、ステアリン酸、オレイン酸、リノール酸等の飽和又は不飽和の脂肪族一塩基酸類;ベンゾイル安息香酸、安息香酸、ヒドロキシ安息香酸、ピコリン酸、フランカルボン酸等の芳香環又は複素環を有する一塩基酸類;ジブロモサリチル酸等のブロモヒドロキシカルボン酸類;エチルアミン臭素酸塩やジエチルアミン臭素酸塩、ジエチルアミン塩化水素酸塩、メチルアミン臭素酸塩等のアミン系ブロモ化合物;1−ブロモ−3−メチル−1−ブテンや1,4−ジブロモブテン、1−ブロモ−1−プロペン、2,3−ジブロモプロペン、1,2−ジブロモ−1−フェニルエタン、1,2−ジブロモスチレン、4−ステアロイルオキシベンジルブロマイド、4−ステアリルオキシベンジルブロマイド、4−ステアリルベンジルブロマイド、4−ブロモメチルベンジルステアレート、4−ステアロイルアミノベンジルブロマイド、2,4−ビスブロモメチルべンジルステアレート、4−パルミトイルオキシベンジルブロマイド、4−ミリストイルオキシベンジルブロマイド、4−ラウロイルオキシべンジルブロマイド、4−ウンデカノイルオキシベンジルブロマイド等の活性水素非含有ブロモ化合物;ステアリルアミンやジステアリルアミン、ジブチルアミン等のハロゲン原子非含有アミン類などを例示でき、これらは1種を単独で、又は2種以上を組み合わせて使用できる。 In addition, (C) component can contain activators other than (c1) component as needed. Examples thereof include saturated or unsaturated aliphatic dibasic acids such as oxalic acid, suberic acid, azelaic acid, sebacic acid, dodecanedioic acid, dimer acid and itaconic acid; trans-2,3-dibromo -1,4-butenediol, cis-2,3-dibromo-1,4-butenediol, 1-bromo-2-butanol, 1-bromo-2-propanol, 3-bromo-1-propanol, 3-bromo Bromo alcohols such as -1,2-propanediol, 1,4-dibromo-2-butanol, 1,3-dibromo-2-propanol, 2,3-dibromo-1-propanol; 3-bromopropionic acid, 2 -Bromovaleric acid, 5-bromo-n-valeric acid, 2-bromoisovaleric acid, 2,3-dibromosuccinic acid, 2-bromosuccinic acid, 2,2-dibromoazi Brominated dicarboxylic acids such as acids; saturated or unsaturated aliphatic monobasic acids such as capric acid, lauric acid, myristic acid, palmitic acid, stearic acid, stearic acid, oleic acid, linoleic acid; benzoylbenzoic acid, benzoic acid Monobasic acids having aromatic or heterocyclic rings such as hydroxybenzoic acid, picolinic acid, furancarboxylic acid; bromohydroxycarboxylic acids such as dibromosalicylic acid; ethylamine bromate, diethylamine bromate, diethylamine hydrochloride, methyl Amine-based bromo compounds such as amine bromate; 1-bromo-3-methyl-1-butene, 1,4-dibromobutene, 1-bromo-1-propene, 2,3-dibromopropene, 1,2-dibromo -1-phenylethane, 1,2-dibromostyrene, 4-stearoyloxybenzene Bromide, 4-stearyloxybenzyl bromide, 4-stearylbenzyl bromide, 4-bromomethylbenzyl stearate, 4-stearoylaminobenzyl bromide, 2,4-bisbromomethylbenzyl stearate, 4-palmitoyloxybenzyl bromide, Active hydrogen-free bromo compounds such as 4-myristoyloxybenzyl bromide, 4-lauroyloxybenzyl bromide, 4-undecanoyloxybenzyl bromide; Halogen atom-free amines such as stearylamine, distearylamine, and dibutylamine Etc., and these can be used alone or in combination of two or more.
(D)成分としては、各種公知のものを特に制限なく使用できるが、特に鉛フリーはんだペーストの印刷適性の点より、特にポリアミド系チキソトロピック剤及び/又は動植物系チキソトロピック剤が好ましい。ポリアミド系チキソトロピック剤としてはステアリン酸アミドや12−ヒドロキシステアリン酸エチレンビスアミド等が、また、動植物系チキソトロピック剤成分としては硬化ひまし油や蜜ロウ、カルナバワックス等を例示でき、これらは1種を単独で、又は2種以上を組み合わせて使用できる。 As the component (D), various known ones can be used without particular limitation, but polyamide thixotropic agents and / or animal and plant thixotropic agents are particularly preferable from the viewpoint of printability of the lead-free solder paste. Examples of the polyamide thixotropic agent include stearic acid amide and 12-hydroxystearic acid ethylene bisamide, and examples of the animal and plant type thixotropic agent component include hardened castor oil, beeswax, carnauba wax, and the like. Or in combination of two or more.
(E)成分としては、具体的には、例えば、ペンタエリスリチル−テトラキス〔3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート〕、トリエチレングリコール−ビス〔3−(3−t−ブチル−5−メチル−4−ヒドロキシフェニル)プロピオネート〕、1,6−ヘキサンジオール−ビス−〔3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート〕、2,4−ビス−(n−オクチルチオ)−6−(4−ヒドロキシ−3,5−ジ−t−ブチルアニリノ)−1,3,5−トリアジン、2,2−チオ−ジエチレンビス〔3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート〕、オクタデシル−3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート、N,N’−ヘキサメチレンビス(3,5−ジ−t−ブチル−4−ヒドロキシ−ヒドロシンアミド)、3,5−ジ−t−ブチル−4−ヒドロキシベンジルフォスフォネート−ジエチルエステル、1,3,5−トリメチル−2,4,6−トリス(3,5−ジ−t−ブチル−4−ヒドロキシベンジル)ベンゼンのヒンダードフェノール系酸化防止剤;2,6−ジ−t−ブチル−p−クレゾール、2,4−ジメチル−6−t−ブチル−フェノール、スチレネートフェノール、2,4−ビス[(オクチルチオ)メチル]−o−クレゾール等の他のフェノール系酸化防止剤;トリフェニルフォスファイト、トリエチルフォスファイト、トリラウリルトリチオフォスファエト、トリス(トリデシル)フォスファイト等のリン系酸化防止剤;系酸化防止剤としてジラウリルチオジプロピオネート、ジラウリルサルファイド、2−メルカプトベンゾイミダゾール、ラウリルステアリルチオジプロピオネート等の硫黄系酸化防止剤などを例示でき、これらは1種を単独で、又は2種以上を組み合わせて使用できる。これらの中でも、濡れ性やフラックス残渣の色調等の点よりヒンダードフェノール系酸化防止剤が好ましい。フラックス残渣の色調がよいとはんだ接合部の目視検品(濡れ広がりの確認等)が容易になり、また、洗浄の必要もなくなる。 Specific examples of the component (E) include pentaerythrityl-tetrakis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate], triethylene glycol-bis [3- ( 3-tert-butyl-5-methyl-4-hydroxyphenyl) propionate], 1,6-hexanediol-bis- [3- (3,5-di-tert-butyl-4-hydroxyphenyl) propionate], 2 , 4-Bis- (n-octylthio) -6- (4-hydroxy-3,5-di-t-butylanilino) -1,3,5-triazine, 2,2-thio-diethylenebis [3- (3 , 5-di-t-butyl-4-hydroxyphenyl) propionate], octadecyl-3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate, N, N ′ Hexamethylenebis (3,5-di-t-butyl-4-hydroxy-hydrocinamide), 3,5-di-t-butyl-4-hydroxybenzylphosphonate-diethyl ester, 1,3,5- Hindered phenolic antioxidants of trimethyl-2,4,6-tris (3,5-di-t-butyl-4-hydroxybenzyl) benzene; 2,6-di-t-butyl-p-cresol, 2 , 4-Dimethyl-6-t-butyl-phenol, styrenatephenol, 2,4-bis [(octylthio) methyl] -o-cresol, and other phenolic antioxidants; triphenyl phosphite, triethyl phosphite , Trilauryl trithiophosphato, tris (tridecyl) phosphite and other phosphorus antioxidants; Sulfur antioxidants such as luthiodipropionate, dilauryl sulfide, 2-mercaptobenzimidazole, lauryl stearyl thiodipropionate can be exemplified, and these can be used alone or in combination of two or more. . Among these, a hindered phenol antioxidant is preferable from the viewpoint of wettability and color tone of the flux residue. When the color tone of the flux residue is good, visual inspection (confirmation of wetting spread, etc.) of the solder joint becomes easy, and cleaning is not necessary.
本発明のフラックスにおける(A)成分〜(F)成分の含有量は特に限定されないが、通常は以下の通りである。
(A)成分:通常25〜50重量%程度、好ましくは35〜45重量%
(B)成分:通常20〜70重量%程度、好ましくは25〜55重量%
(C)成分:通常3〜15重量%程度、好ましくは5〜7重量%
(D)成分:通常0〜20重量%程度、好ましくは2.5〜10重量%
(E)成分:通常0〜10重量%程度、好ましくは2〜8重量%
Although content of (A) component-(F) component in the flux of this invention is not specifically limited, Usually, it is as follows.
Component (A): Usually about 25 to 50% by weight, preferably 35 to 45% by weight
Component (B): Usually about 20 to 70% by weight, preferably 25 to 55% by weight
Component (C): Usually about 3 to 15% by weight, preferably 5 to 7% by weight
Component (D): Usually about 0 to 20% by weight, preferably 2.5 to 10% by weight
Component (E): Usually about 0 to 10% by weight, preferably 2 to 8% by weight
本発明の鉛フリーはんだペーストは、本発明のフラックスと鉛フリーはんだ粉末を含有する組成物である。また、それぞれの使用量は特に限定されないが、通常、前者が5〜30重量%程度、後者が70〜95重量%程度である。 The lead-free solder paste of the present invention is a composition containing the flux of the present invention and lead-free solder powder. Moreover, although the usage-amount of each is not specifically limited, Usually, the former is about 5 to 30 weight% and the latter is about 70 to 95 weight%.
鉛フリーはんだ粉末としては、鉛を含有しないものであれば各種公知のものを特に制限なく使用できるが、Snをベースとする鉛フリーはんだ粉末、例えばSn−Ag系、Sn−Cu系、Sn−Sb系、Sn−Zn系、Sn−Bi系の鉛フリーはんだ粉末が好ましい。また、鉛フリーはんだ粉末は、Ag、Al、Au、Bi、Co、Cu、Fe、Ga、Ge、In、Ni、P、Pt、Sb、Znの1種又は2種以上の元素がドープされたものであってよい。鉛フリーはんだ粉末の具体例としては、Sn95Sb5、Sn99.3Cu0.7、Sn97Cu3、Sn92Cu6Ag2、Sn99Cu0.7Ag0.3、Sn95Cu4Ag1、Sn97Ag3、Sn96.3Ag3.7、Sn42−Bi58等を例示できる。また、鉛フリーはんだ粉末の平均粒子径は特に限定されないが、通常は1〜50μm程度、好ましくは15〜40μmである。また、粉末の形状も特に限定されず、球形や不定形であってもよい。なお、球形とは、好ましくは、粉末の縦横のアスペクト比が1.2以内であることを意味する。 As the lead-free solder powder, various known ones can be used without particular limitation as long as they do not contain lead, but Sn-based lead-free solder powders such as Sn-Ag series, Sn-Cu series, Sn-- Sb-based, Sn-Zn-based, and Sn-Bi-based lead-free solder powders are preferred. The lead-free solder powder is doped with one or more elements of Ag, Al, Au, Bi, Co, Cu, Fe, Ga, Ge, In, Ni, P, Pt, Sb, and Zn. It may be a thing. Specific examples of the lead-free solder powder include Sn95Sb5, Sn99.3Cu0.7, Sn97Cu3, Sn92Cu6Ag2, Sn99Cu0.7Ag0.3, Sn95Cu4Ag1, Sn97Ag3, Sn96.3Ag3.7, Sn42-Bi58 and the like. Moreover, although the average particle diameter of lead-free solder powder is not specifically limited, Usually, about 1-50 micrometers, Preferably it is 15-40 micrometers. Further, the shape of the powder is not particularly limited, and may be spherical or irregular. The spherical shape preferably means that the aspect ratio of the powder is within 1.2.
以下に本発明を実施例により更に具体的に説明する。ただし、本発明の技術的範囲がこれら実施例に限定されるものではない。また実施例中、「%」及び「部」は特に断りのない限り「重量%」、「重量部」を意味する。 Hereinafter, the present invention will be described more specifically with reference to examples. However, the technical scope of the present invention is not limited to these examples. In the examples, “%” and “part” mean “% by weight” and “part by weight” unless otherwise specified.
<フラックスの調製>
実施例1
市販の水添アクリル酸変性ロジン(商品名「KE−604」、荒川化学工業(株)製)を44.5部、市販のメチルプロピレントリグリコール(日本乳化剤(株)社製)を44部、コハク酸(SA)を5部、ポリアミド系チキソトロピック剤(商品名「MA−WAX−O」、川研ファインケミカル(株)社製)を6部、及び酸化防止剤(商品名「Irganox1010」、チバ・ジャパン(株)製)を0.5部、加熱下に良く混合し、フラックスを調製した。
<Preparation of flux>
Example 1
44.5 parts of commercially available hydrogenated acrylic acid-modified rosin (trade name “KE-604”, manufactured by Arakawa Chemical Industries, Ltd.), 44 parts of commercially available methylpropylene triglycol (manufactured by Nippon Emulsifier Co., Ltd.), 5 parts of succinic acid (SA), 6 parts of polyamide thixotropic agent (trade name “MA-WAX-O”, manufactured by Kawaken Fine Chemical Co., Ltd.), and antioxidant (trade name “Irganox 1010”), Ciba -Japan Co., Ltd.) was mixed well under heating to prepare a flux.
実施例2〜12、比較例1〜7
実施例1の原料を表1、表2に示す部数で加熱下に良く混合し、フラックスを調製した。
Examples 2-12, Comparative Examples 1-7
The raw materials of Example 1 were mixed well under heating in the parts shown in Tables 1 and 2 to prepare a flux.
<濡れ性の確認:はんだペースト態様>
市販の鉛フリーはんだ粉末(96.5Sn/3Ag/0.5Cu、三井金属(株)製、粒径20〜38μm、通常品)を89g、実施例1のフラックスを順に89重量%および11重量%となるようソフナーにて混練し、はんだペーストを調製した。次いでこのはんだペーストを厚み100μmのステンシルマスクを用いて、クリアランスレジスト構造を有するパターンに印刷した後、0603コンデンサーをマウンターにて搭載し、大気雰囲気下において、図1に示す温度プロファイルにてリフローを行った。リフロー後、部品上のはんだの濡れ性を以下の基準で目視判断した。また、実施例2〜12及び比較例1〜7のフラックスについても同様にはんだの濡れ性を目視判断した。
<Confirmation of wettability: Aspect of solder paste>
89 g of commercially available lead-free solder powder (96.5Sn / 3Ag / 0.5Cu, manufactured by Mitsui Kinzoku Co., Ltd., particle size 20-38 μm, normal product), and the flux of Example 1 in order of 89 wt% and 11 wt% A solder paste was prepared by kneading with a softener. Next, this solder paste is printed on a pattern having a clearance resist structure using a stencil mask having a thickness of 100 μm, and then a 0603 capacitor is mounted on a mounter, and reflow is performed in an air atmosphere with a temperature profile shown in FIG. It was. After reflow, the wettability of the solder on the part was visually judged according to the following criteria. Moreover, the wettability of the solder was similarly judged visually about the flux of Examples 2-12 and Comparative Examples 1-7.
(濡れ性の程度)
◎:部品に接合しているはんだにおいて、未溶融はんだが全くない。
○:一部未溶融はんだが確認できる。
×:全てのはんだに未溶融が発生している。
(Degree of wettability)
A: There is no unmelted solder in the solder bonded to the part.
○: Partially unmelted solder can be confirmed.
X: All the solders are not melted.
なお、図2は、比較例1のフラックスを用いたはんだペーストを、オーバーレジスト構造を有するパターンの上でリフローしたときの写真であり、はんだ粉末が溶融していることがわかる。 FIG. 2 is a photograph of the solder paste using the flux of Comparative Example 1 when reflowed on a pattern having an over resist structure, and it can be seen that the solder powder is melted.
一方、図3は、比較例1のフラックスを用いたはんだペーストを、クリアランスレジスト構造を有するパターンの上でリフローしたときの写真であり、はんだ粉末がほぼ未溶融のままであることが確認できる。 On the other hand, FIG. 3 is a photograph when the solder paste using the flux of Comparative Example 1 is reflowed on the pattern having the clearance resist structure, and it can be confirmed that the solder powder remains almost unmelted.
他方、図4は、実施例1のフラックスを用いたはんだペーストを、オーバーレジスト構造を有するパターンの上でリフローしたときの写真であり、未溶融はんだが全くないことが確認できる。 On the other hand, FIG. 4 is a photograph when the solder paste using the flux of Example 1 is reflowed on a pattern having an over resist structure, and it can be confirmed that there is no unmelted solder.
また、図5は、実施例1のフラックスを用いたはんだペーストを、クリアランスレジスト構造を有するパターンの上でリフローしたときの写真であり、同じく未溶融はんだが全くないことが確認できる。 Moreover, FIG. 5 is a photograph when the solder paste using the flux of Example 1 is reflowed on the pattern having the clearance resist structure, and it can be confirmed that there is no unmelted solder.
*1・・・市販の水添ロジン(商品名「CRW−300」、荒川化学工業(株)製)
*2・・・メチルプロピレントリグリコール(商品名「MFTG」、日本乳化剤(株)社製、沸点242℃)
*3・・・ブチルプロピレンジグリコール(商品名「BFDG」、日本乳化剤(株)社製、沸点231℃)
*4・・・フェニルプロピレングリコール(商品名「PhFG」、日本乳化剤(株)社製、沸点243℃)
*5・・・ブチルプロピレントリグリコール(商品名「BFTG」、日本乳化剤(株)社製、沸点274℃)
*6・・・コハク酸(東京化成工業(株)社製)
*7・・・グルタル酸(東京化成工業(株)社製)
*8・・・アジピン酸(東京化成工業(株)社製)
*9・・・フマル酸(東京化成工業(株)社製)
* 1 ... Commercial hydrogenated rosin (trade name “CRW-300”, manufactured by Arakawa Chemical Industries, Ltd.)
* 2 ... Methyl propylene triglycol (trade name “MFTG”, manufactured by Nippon Emulsifier Co., Ltd., boiling point 242 ° C.)
* 3 ... Butyl propylene diglycol (trade name “BFDG”, manufactured by Nippon Emulsifier Co., Ltd., boiling point 231 ° C.)
* 4 ・ ・ ・ Phenylpropylene glycol (trade name “PhFG”, Nippon Emulsifier Co., Ltd., boiling point 243 ° C.)
* 5 ... Butylpropylene triglycol (Brand name "BFTG", Nippon Emulsifier Co., Ltd., boiling point 274 ° C)
* 6 Succinic acid (manufactured by Tokyo Chemical Industry Co., Ltd.)
* 7 ... Glutaric acid (manufactured by Tokyo Chemical Industry Co., Ltd.)
* 8 ... Adipic acid (manufactured by Tokyo Chemical Industry Co., Ltd.)
* 9 ... Fumaric acid (manufactured by Tokyo Chemical Industry Co., Ltd.)
*10・・・ヘキシルジグリコール(商品名「HeDG」、日本乳化剤(株)社製、沸点259℃)
*11・・・2−エチルヘキシルジグリコール(商品名「EHDG」、日本乳化剤(株)社製、沸点272℃)
*12・・・2−ヘキシルデカノール(商品名「エヌジェコール160BR」、新日本理化(株)社製、沸点195−215℃)
*13・・・シュウ酸(東京化成工業(株)社製)
*14・・・スベリン酸(東京化成工業(株)社製)
*15・・・ドデカン二酸(東京化成工業(株)社製)
*16・・・比較例2のフラックスはCRW−300の析出が顕著であり、均質なはんだペーストの調製が困難であったため、濡れ性は評価しなかった。
* 10: Hexyl diglycol (trade name “HeDG”, Nippon Emulsifier Co., Ltd., boiling point 259 ° C.)
* 11 ... 2-ethylhexyl diglycol (trade name “EHDG”, manufactured by Nippon Emulsifier Co., Ltd., boiling point 272 ° C.)
* 12 ... 2-hexyldecanol (trade name “Engecol 160BR”, manufactured by Shin Nippon Rika Co., Ltd., boiling point 195-215 ° C.)
* 13 ... Oxalic acid (manufactured by Tokyo Chemical Industry Co., Ltd.)
* 14 ... Suberic acid (manufactured by Tokyo Chemical Industry Co., Ltd.)
* 15 ... Dodecanedioic acid (manufactured by Tokyo Chemical Industry Co., Ltd.)
* 16: In the flux of Comparative Example 2, precipitation of CRW-300 was remarkable, and it was difficult to prepare a homogeneous solder paste, so wettability was not evaluated.
Claims (11)
(A)成分:25〜50重量%
(B)成分:20〜70重量%
(C)成分:3〜15重量%
(D)成分:0〜20重量%
(E)成分:0〜10重量%
The flux in any one of Claims 1-9 whose content of (A) component, (B) component and (C) component, and (D) component and (E) component is as follows.
(A) component: 25-50 weight%
(B) component: 20 to 70% by weight
Component (C): 3 to 15% by weight
(D) component: 0 to 20% by weight
(E) component: 0 to 10% by weight
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Cited By (5)
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CN105033508A (en) * | 2015-07-31 | 2015-11-11 | 安徽江威精密制造有限公司 | Soldering flux material composite and soldering flux preparing method |
WO2016199747A1 (en) * | 2015-06-12 | 2016-12-15 | 荒川化学工業株式会社 | Flux for lead-free solder, and lead-free solder paste |
JP2017035731A (en) * | 2015-08-10 | 2017-02-16 | 荒川化学工業株式会社 | Flux for lead-free solder paste, and lead-free solder paste |
US10388603B2 (en) | 2015-10-30 | 2019-08-20 | Murata Manufacturing Co., Ltd. | Thin film element and method for manufacturing the same |
KR20220137994A (en) * | 2020-03-18 | 2022-10-12 | 센주긴조쿠고교 가부시키가이샤 | Flux and Solder Paste |
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JP2004202518A (en) * | 2002-12-24 | 2004-07-22 | Nof Corp | Flux composition for soldering, solder paste, and method for soldering |
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016199747A1 (en) * | 2015-06-12 | 2016-12-15 | 荒川化学工業株式会社 | Flux for lead-free solder, and lead-free solder paste |
CN105033508A (en) * | 2015-07-31 | 2015-11-11 | 安徽江威精密制造有限公司 | Soldering flux material composite and soldering flux preparing method |
JP2017035731A (en) * | 2015-08-10 | 2017-02-16 | 荒川化学工業株式会社 | Flux for lead-free solder paste, and lead-free solder paste |
US10388603B2 (en) | 2015-10-30 | 2019-08-20 | Murata Manufacturing Co., Ltd. | Thin film element and method for manufacturing the same |
KR20220137994A (en) * | 2020-03-18 | 2022-10-12 | 센주긴조쿠고교 가부시키가이샤 | Flux and Solder Paste |
CN115279544A (en) * | 2020-03-18 | 2022-11-01 | 千住金属工业株式会社 | Flux and solder paste |
KR102562193B1 (en) | 2020-03-18 | 2023-08-02 | 센주긴조쿠고교 가부시키가이샤 | Flux and Solder Paste |
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