JP2014154700A - Exposure device, exposure method, method of manufacturing device, program, and recording medium - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an exposure device in which occurrence of exposure failure can be suppressed.SOLUTION: An exposure device exposes a substrate with exposure light through liquid. The exposure device includes an optical member having an emission surface for emitting exposure light, a first liquid immersion member having a first member arranged around the optical path of the exposure light at least partially, and a second member arranged to face an object at least partially under the first member, and movable for the first member, and can form a first liquid immersion space of a first liquid above the object movable under the optical member, and a second liquid immersion member arranged on the outside of the first liquid immersion member for the optical path, and can form a second liquid immersion space of a second liquid above the object movable under the optical member, separately from the first liquid immersion space.

Description

  The present invention relates to an exposure apparatus, an exposure method, a device manufacturing method, a program, and a recording medium.

 As an exposure apparatus used in a photolithography process, for example, an immersion exposure apparatus that exposes a substrate with exposure light via a liquid as disclosed in the following patent document is known.

U.S. Pat. No. 7,864,292

 In the immersion exposure apparatus, for example, if the liquid flows out of a predetermined space or remains on an object such as a substrate, an exposure failure may occur. As a result, a defective device may occur.

   An object of an aspect of the present invention is to provide an exposure apparatus and an exposure method that can suppress the occurrence of exposure failure. Another object of the present invention is to provide a device manufacturing method, a program, and a recording medium that can suppress the occurrence of defective devices.

  According to the first aspect of the present invention, there is provided an exposure apparatus for exposing a substrate with exposure light through a first liquid, an optical member having an exit surface from which the exposure light is emitted, and a periphery of the optical path of the exposure light A first member disposed on at least a part of the first member, and at least a part of the first member disposed below the first member so that an object can be opposed to the first member. A first immersion member capable of forming a first immersion space for the first liquid on an object movable below the optical member, and disposed outside the first immersion member with respect to the optical path and moved below the optical member. There is provided an exposure apparatus comprising: a second immersion member capable of forming a second immersion space for the second liquid on the possible object away from the first immersion space.

  According to the second aspect of the present invention, there is provided an exposure apparatus that exposes a substrate with exposure light through a first liquid, an optical member having an exit surface from which the exposure light is emitted, and an optical path around the exposure light A first member disposed on at least a part of the first member, an at least part of the first member disposed below the first member so that the object can be opposed to the first member, and a second member movable with respect to the first member, and the first member. A first liquid supply unit that supplies the first liquid, and a first liquid recovery unit that is disposed on the second member and collects the first liquid, and is disposed on an object that is movable below the optical member. A first immersion member capable of forming a first immersion space for one liquid; a third member connected to the second member and having a recovery flow path through which the first liquid recovered from the first liquid recovery unit flows; An exposure apparatus comprising: a suppression device that suppresses a temperature change of one or both of the second member and the third member. It is.

  According to the third aspect of the present invention, there is provided an exposure apparatus that exposes a substrate with exposure light through a first liquid, an optical member having an exit surface from which the exposure light is emitted, and the periphery of the optical path of the exposure light And a first member having a first liquid supply part for supplying the first liquid, and a first liquid recovery part for recovering the first liquid disposed at least at a part of the periphery of the first member. And a second member that is disposed so that the object can be opposed to the first member and the lower part of the recovery member and is movable with respect to the first member, and below the optical member. There is provided an exposure apparatus comprising: a first immersion member capable of forming a first immersion space for a first liquid on a movable object.

  According to a fourth aspect of the present invention, there is provided a device manufacturing method comprising: exposing a substrate using the exposure apparatus according to any one of the first to third aspects; and developing the exposed substrate. Is provided.

  According to a fifth aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light via a first liquid between an emission surface of an optical member and the substrate, wherein at least one around an optical path of the exposure light. A second member that is movable relative to the first member, and is arranged so that an object that is movable at least partially below the first member and is movable below the optical member is opposed to the first member. Forming a first liquid immersion space of the first liquid on the substrate using the first liquid immersion member, and exposing the substrate with exposure light emitted from the emission surface through the first liquid in the first liquid immersion space. , Moving the second member relative to the first member in at least part of the substrate exposure, and a second immersion member disposed outside the first immersion member relative to the optical path To move the second liquid away from the first immersion space on the movable object below the optical member. The exposure method comprising forming a second liquid immersion space, is provided.

  According to a sixth aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light via a first liquid between an emission surface of an optical member and the substrate, wherein at least one around the optical path of the exposure light. A first member disposed in the portion, an at least partly disposed below the first member and an object movable below the optical member so as to face the second member, and a second member movable relative to the first member; Using a first liquid immersion member that is disposed on one member and that has a first liquid supply part that supplies a first liquid, and a first liquid recovery part that is disposed on a second member and collects the first liquid, Forming a first immersion space for the first liquid on the substrate, exposing the substrate with exposure light emitted from the exit surface through the first liquid in the first immersion space, and exposing the substrate. Moving the second member relative to the first member, at least in part, the second member, and the second member; The exposure method comprising: a suppressing one or both temperature variation of the third member having a recovery passage first liquid recovered from the first liquid recovery unit is connected to flow is provided.

  According to a seventh aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light through a first liquid between an emission surface of an optical member and the substrate, wherein at least one around an optical path of the exposure light. A first member having a first liquid supply part that is disposed in the first part and that supplies the first liquid, and a first liquid recovery part that is disposed at least partially around the first member and that collects the first liquid. A first member having a member, and a second member which is disposed below one or both of the first member and the recovery member so that an object movable under the optical member can be opposed to the first member and the recovery member, and is movable with respect to the first member. Using the immersion member, forming a first immersion space for the first liquid on the substrate, and exposing the substrate with exposure light emitted from the exit surface through the first liquid in the first immersion space. And at least part of the exposure of the substrate, the second member relative to the first member, and The exposure method comprising a moving one or both of the yield member, is provided.

  According to an eighth aspect of the present invention, there is provided a device manufacturing method comprising: exposing a substrate using the exposure method according to any one of the fifth to seventh aspects; and developing the exposed substrate. Is provided.

  According to a ninth aspect of the present invention, there is provided a program for causing a computer to execute control of an immersion exposure apparatus that exposes a substrate with exposure light via a first liquid between an emission surface of an optical member and the substrate. The first member disposed at least part of the periphery of the optical path of the exposure light and the object movable at least partially below the first member and below the optical member are disposed so as to face each other. Forming a first liquid immersion space for the first liquid on the substrate using a first liquid immersion member having a second member movable relative to the substrate, and via the first liquid in the first liquid immersion space. Exposing the substrate with exposure light emitted from the exit surface, moving the second member relative to the first member and at least part of the exposure of the substrate, and the first immersion member relative to the optical path Can be moved under the optical member using the second immersion member arranged outside Such on the object, away from the first immersion space, a program to be executed and forming a second liquid immersion space of the second liquid, it is provided.

  According to a tenth aspect of the present invention, there is provided a program for causing a computer to execute control of an immersion exposure apparatus that exposes a substrate with exposure light via a first liquid between an emission surface of an optical member and the substrate. The first member disposed at least part of the periphery of the optical path of the exposure light and the object movable at least partially below the first member and below the optical member are disposed so as to face each other. A second member that is movable relative to the first member, a first liquid supply unit that is disposed on the first member and that supplies the first liquid, a first liquid recovery unit that is disposed on the second member and that collects the first liquid, Forming a first liquid immersion space of the first liquid on the substrate using the first liquid immersion member having the above, and exposure light emitted from the emission surface through the first liquid in the first liquid immersion space. Exposing the substrate, and at least part of the exposure of the substrate relative to the first member Moving the second member, and changing the temperature of one or both of the second member and the third member having a recovery channel connected to the second member and through which the first liquid recovered from the first liquid recovery unit flows. There is provided a program for executing the control.

  According to an eleventh aspect of the present invention, there is provided a program for causing a computer to execute control of an immersion exposure apparatus that exposes a substrate with exposure light via a first liquid between an emission surface of an optical member and the substrate. A first member having a first liquid supply part that is disposed at least around the optical path of the exposure light and that supplies the first liquid; and disposed at least at a part of the periphery of the first member. A recovery member having a first liquid recovery portion for recovering the liquid, and an object movable below the optical member and disposed below the one or both of the first member and the recovery member so as to face each other and move relative to the first member Forming a first immersion space for the first liquid on the substrate using a first immersion member having a possible second member, and an exit surface through the first liquid in the first immersion space Exposure of the substrate with exposure light emitted from the In Ku and a part program to be executed and to move one or both of the second member and the recovery member relative to the first member, it is provided.

  According to a twelfth aspect of the present invention, there is provided a computer-readable recording medium on which a program according to any one of the ninth to eleventh aspects is recorded.

  According to the aspect of the present invention, it is possible to suppress the occurrence of exposure failure. Moreover, according to the aspect of this invention, generation | occurrence | production of a defective device can be suppressed.

It is a figure which shows an example of the exposure apparatus which concerns on 1st Embodiment. It is a sectional side view which shows an example of the liquid immersion member which concerns on 1st Embodiment. FIG. 3 is a side sectional view showing a part of the liquid immersion member according to the first embodiment. FIG. 6 is a diagram illustrating an example of the operation of the liquid immersion member according to the first embodiment. It is the figure which looked at the liquid immersion member concerning a 1st embodiment from the lower part. It is a figure for demonstrating an example of operation | movement of the exposure apparatus which concerns on 1st Embodiment. FIG. 6 is a diagram for explaining an example of the operation of the liquid immersion member according to the first embodiment. It is a figure for demonstrating an example of operation | movement of the exposure apparatus which concerns on 1st Embodiment. FIG. 6 is a diagram for explaining an example of the operation of the liquid immersion member according to the first embodiment. FIG. 6 is a diagram for explaining an example of the operation of the liquid immersion member according to the first embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 1st Embodiment. It is a figure for demonstrating an example of operation | movement of the liquid immersion member which concerns on 2nd Embodiment. It is a figure for demonstrating an example of operation | movement of the liquid immersion member which concerns on 3rd Embodiment. It is a figure for demonstrating an example of operation | movement of the liquid immersion member which concerns on 4th Embodiment. It is a figure which shows an example of a liquid immersion member. It is a sectional side view which shows an example of the liquid immersion member which concerns on 5th Embodiment. FIG. 10 is a side sectional view showing a part of a liquid immersion member according to a fifth embodiment. It is a figure which shows an example of operation | movement of the liquid immersion member which concerns on 5th Embodiment. It is the figure which looked at the liquid immersion member which concerns on 5th Embodiment from the downward direction. FIG. 10 is a perspective view of a liquid immersion member according to a fifth embodiment. It is a figure which shows an example of the exposure apparatus which concerns on 6th Embodiment. It is a figure which shows an example of the exposure apparatus which concerns on 6th Embodiment. It is a figure which shows an example of the suppression apparatus which concerns on 6th Embodiment. It is a figure which shows an example of the suppression apparatus which concerns on 7th Embodiment. It is a figure which shows an example of the suppression apparatus which concerns on 7th Embodiment. It is a sectional side view which shows an example of the liquid immersion member which concerns on 8th Embodiment. It is a sectional side view which shows a part of liquid immersion member which concerns on 8th Embodiment. It is a figure which shows an example of operation | movement of the liquid immersion member which concerns on 8th Embodiment. It is a figure which shows an example of operation | movement of the liquid immersion member which concerns on 8th Embodiment. It is a figure which shows an example of operation | movement of the liquid immersion member which concerns on 8th Embodiment. It is a figure which shows an example of a liquid immersion member. It is a figure which shows an example of a liquid immersion member. It is a figure which shows an example of a substrate stage. It is a flowchart for demonstrating an example of the manufacturing method of a device.

 Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. In the following description, an XYZ orthogonal coordinate system is set, and the positional relationship of each part will be described with reference to this XYZ orthogonal coordinate system. A predetermined direction in the horizontal plane is defined as an X-axis direction, a direction orthogonal to the X-axis direction in the horizontal plane is defined as a Y-axis direction, and a direction orthogonal to each of the X-axis direction and the Y-axis direction (that is, a vertical direction) is defined as a Z-axis direction. Further, the rotation (inclination) directions around the X axis, Y axis, and Z axis are the θX, θY, and θZ directions, respectively.

<First Embodiment>
A first embodiment will be described. FIG. 1 is a schematic block diagram that shows an example of an exposure apparatus EX according to the first embodiment. The exposure apparatus EX of the present embodiment is an immersion exposure apparatus that exposes a substrate P with exposure light EL through a liquid LQ. In the present embodiment, the immersion space LS1 is formed so that the optical path K of the exposure light EL irradiated to the substrate P is filled with the liquid LQ. The immersion space refers to a portion (space, region) filled with liquid. The substrate P is exposed with the exposure light EL through the liquid LQ in the immersion space LS1. In the present embodiment, water (pure water) is used as the liquid LQ.

   The exposure apparatus EX of the present embodiment is an exposure apparatus provided with a substrate stage and a measurement stage as disclosed in, for example, US Pat. No. 6,897,963 and European Patent Application Publication No. 1713113.

   In FIG. 1, an exposure apparatus EX measures a mask stage 1 that can move while holding a mask M, a substrate stage 2 that can move while holding a substrate P, and exposure light EL without holding the substrate P. A movable measuring stage 3 mounted with a measuring member (measuring instrument) C, a measuring system 4 for measuring the position of the substrate stage 2 and the measuring stage 3, and an illumination system IL for illuminating the mask M with the exposure light EL , A projection optical system PL that projects an image of the pattern of the mask M illuminated by the exposure light EL onto the substrate P, a first immersion member 500 that forms an immersion space LS1 of the liquid LQ, and an immersion space of the liquid LQ A second immersion member 600 that forms LS2, a control device 6 that controls the operation of the entire exposure apparatus EX, and a storage device 7 that is connected to the control device 6 and stores various types of information related to exposure are provided.

   The exposure apparatus EX includes a reference frame 8A that supports various measurement systems including the projection optical system PL and the measurement system 4, an apparatus frame 8B that supports the reference frame 8A, and a reference frame 8A and an apparatus frame 8B. And an anti-vibration device 10 that is disposed between the device frame 8B and suppresses transmission of vibration from the device frame 8B to the reference frame 8A. The vibration isolator 10 includes a spring device and the like. In the present embodiment, the vibration isolator 10 includes a gas spring (for example, an air mount). One or both of a detection system that detects the alignment mark of the substrate P and a detection system that detects the position of the surface of an object such as the substrate P may be supported by the reference frame 8A.

 In addition, the exposure apparatus EX includes a chamber apparatus 9 that adjusts the environment (at least one of temperature, humidity, pressure, and cleanness) of the space CS in which the exposure light EL travels. The chamber device 9 includes an air conditioner 9S that supplies the gas Gs to the space CS. The air conditioner 9S supplies the gas Gs whose temperature, humidity, and cleanness are adjusted to the space CS.

 In the space CS, at least the projection optical system PL, the first liquid immersion member 500, the second liquid immersion member 600, the substrate stage 2, and the measurement stage 3 are arranged. In the present embodiment, the mask stage 1 and at least a part of the illumination system IL are also arranged in the space CS.

   The mask M includes a reticle on which a device pattern projected onto the substrate P is formed. The mask M includes a transmission type mask having a transparent plate such as a glass plate and a pattern formed on the transparent plate using a light shielding material such as chromium. A reflective mask can also be used as the mask M.

   The substrate P is a substrate for manufacturing a device. The substrate P includes, for example, a base material such as a semiconductor wafer and a photosensitive film formed on the base material. The photosensitive film is a film of a photosensitive material (photoresist). Further, the substrate P may include another film in addition to the photosensitive film. For example, the substrate P may include an antireflection film or a protective film (topcoat film) that protects the photosensitive film.

The illumination system IL irradiates the illumination area IR with the exposure light EL. The illumination area IR includes a position where the exposure light EL emitted from the illumination system IL can be irradiated. The illumination system IL illuminates at least a part of the mask M arranged in the illumination region IR with the exposure light EL having a uniform illuminance distribution. As the exposure light EL emitted from the illumination system IL, for example, far ultraviolet light (DUV light) such as bright lines (g line, h line, i line) and KrF excimer laser light (wavelength 248 nm) emitted from a mercury lamp, ArF Excimer laser light (wavelength 193 nm), vacuum ultraviolet light (VUV light) such as F ₂ laser light (wavelength 157 nm), or the like is used. In the present embodiment, ArF excimer laser light, which is ultraviolet light (vacuum ultraviolet light), is used as the exposure light EL.

   The mask stage 1 can move while holding the mask M. The mask stage 1 is moved by the operation of a drive system 11 including a flat motor as disclosed in US Pat. No. 6,452,292, for example. In the present embodiment, the mask stage 1 can be moved in six directions of the X-axis, Y-axis, Z-axis, θX, θY, and θZ directions by the operation of the drive system 11. The drive system 11 may not include a planar motor. The drive system 11 may include a linear motor.

   The projection optical system PL irradiates the projection area PR with the exposure light EL. The projection region PR includes a position where the exposure light EL emitted from the projection optical system PL can be irradiated. The projection optical system PL projects an image of the pattern of the mask M at a predetermined projection magnification onto at least a part of the substrate P arranged in the projection region PR. In the present embodiment, the projection optical system PL is a reduction system. The projection magnification of the projection optical system PL is ¼. The projection magnification of the projection optical system PL may be 1/5 or 1/8. Note that the projection optical system PL may be either an equal magnification system or an enlargement system. In the present embodiment, the optical axis of the projection optical system PL is parallel to the Z axis. Projection optical system PL may be any of a refractive system that does not include a reflective optical element, a reflective system that does not include a refractive optical element, or a catadioptric system that includes a reflective optical element and a refractive optical element. The projection optical system PL may form either an inverted image or an erect image.

   The projection optical system PL includes a terminal optical element 13 having an emission surface 12 from which the exposure light EL is emitted. The exit surface 12 emits the exposure light EL toward the image plane of the projection optical system PL. The last optical element 13 is an optical element closest to the image plane of the projection optical system PL among the plurality of optical elements of the projection optical system PL. The projection region PR includes a position where the exposure light EL emitted from the emission surface 12 can be irradiated. In the present embodiment, the emission surface 12 faces the −Z direction. The exposure light EL emitted from the emission surface 12 travels in the −Z direction. The exit surface 12 is parallel to the XY plane. The exit surface 12 facing the −Z direction may be a convex surface or a concave surface. The exit surface 12 may be inclined with respect to the XY plane, or may include a curved surface. In the present embodiment, the optical axis AX of the last optical element 13 is parallel to the Z axis.

 With respect to the direction parallel to the optical axis of the last optical element 13, the exit surface 12 side is the -Z side, and the entrance surface side is the + Z side. Regarding the direction parallel to the optical axis of the projection optical system PL, the image plane side of the projection optical system PL is the −Z side, and the object plane side of the projection optical system PL is the + Z side.

   The substrate stage 2 is movable in an XY plane including a position (projection region PR) where the exposure light EL from the emission surface 12 can be irradiated while holding the substrate P. The measurement stage 3 is movable in an XY plane including a position (projection region PR) where the exposure light EL from the emission surface 12 can be irradiated with the measurement member (measuring instrument) C mounted. Each of the substrate stage 2 and the measurement stage 3 is movable on the guide surface 14G of the base member 14. The guide surface 14G and the XY plane are substantially parallel.

  The substrate stage 2 includes, for example, a first holding unit that releasably holds the substrate P as disclosed in US Patent Application Publication No. 2007/0177125, US Patent Application Publication No. 2008/0049209, and the like. It has a 2nd holding part which is arranged around a holding part and holds cover member T so that release is possible. The first holding unit holds the substrate P so that the surface (upper surface) of the substrate P and the XY plane are substantially parallel to each other. The upper surface of the substrate P held by the first holding unit and the upper surface of the cover member T held by the second holding unit are arranged substantially in the same plane. Regarding the Z-axis direction, the distance between the emission surface 12 and the upper surface of the substrate P held by the first holding portion is substantially the same as the distance between the emission surface 12 and the upper surface of the cover member T held by the second holding portion. equal. Note that the distance between the emission surface 12 and the upper surface of the substrate P is substantially equal to the distance between the emission surface 12 and the upper surface of the cover member T with respect to the Z-axis direction. And the distance between the emission surface 12 and the upper surface of the cover member T is, for example, within 10% of the distance (so-called working distance) between the emission surface 12 and the upper surface of the substrate P when the substrate P is exposed. Including. Note that the upper surface of the substrate P held by the first holding unit and the upper surface of the cover member T held by the second holding unit may not be arranged in the same plane. For example, the position of the upper surface of the substrate P and the position of the upper surface of the cover member T may be different with respect to the Z-axis direction. For example, there may be a step between the upper surface of the substrate P and the upper surface of the cover member T. Note that the upper surface of the cover member T may be inclined with respect to the upper surface of the substrate P, or the upper surface of the cover member T may include a curved surface.

  The substrate stage 2 and the measurement stage 3 are moved by the operation of a drive system 15 including a planar motor as disclosed in US Pat. No. 6,452,292, for example. The drive system 15 includes a mover 2 </ b> C disposed on the substrate stage 2, a mover 3 </ b> C disposed on the measurement stage 3, and a stator 14 </ b> M disposed on the base member 14. Each of the substrate stage 2 and the measurement stage 3 can move in six directions on the guide surface 14G in the X axis, Y axis, Z axis, θX, θY, and θZ directions by the operation of the drive system 15. Note that the drive system 15 may not include a planar motor. The drive system 15 may include a linear motor.

 The measurement system 4 includes an interferometer system. The interferometer system includes a unit that irradiates the measurement mirror of the substrate stage 2 and the measurement mirror of the measurement stage 3 with measurement light and measures the positions of the substrate stage 2 and the measurement stage 3. Note that the measurement system may include an encoder system as disclosed in, for example, US Patent Application Publication No. 2007/0288121. Note that the measurement system 4 may include only one of the interferometer system and the encoder system.

  When executing the exposure process of the substrate P or when executing a predetermined measurement process, the control device 6 determines the substrate stage 2 (substrate P) and the measurement stage 3 (measurement member) based on the measurement result of the measurement system 4. The position control of C) is executed.

  Next, the first liquid immersion member 500 and the second liquid immersion member 600 according to this embodiment will be described. The liquid immersion member may be referred to as a nozzle member. FIG. 2 is a cross-sectional view of the first liquid immersion member 500 and the second liquid immersion member 600 that are parallel to the XZ plane. FIG. 3 is an enlarged view of a part of FIG. FIG. 4 is a diagram illustrating an example of the operation of the first liquid immersion member 500. FIG. 5 is a view of the first liquid immersion member 500 and the second liquid immersion member 600 as viewed from the lower side (−Z side).

  The first immersion member 500 forms an immersion space LS1 for the liquid LQ on an object that can move below the last optical element 13.

  The second immersion member 600 forms an immersion space LS2 for the liquid LQ on an object that can move below the last optical element 13. The second immersion member 600 is separated from the immersion space LS1, and forms the immersion space LS2.

 An object that can move below the last optical element 13 can move in the XY plane including the position facing the exit surface 12. The object can face the emission surface 12 and can be arranged in the projection region PR. The object is movable below the first liquid immersion member 500 and can be opposed to the first liquid immersion member 500. The object can move below the second liquid immersion member 600 and can face the second liquid immersion member 600. In the present embodiment, the object is at least one of the substrate stage 2 (for example, the cover member T of the substrate stage 2), the substrate P held on the substrate stage 2 (first holding unit), and the measurement stage 3. Including one.

  In the following description, it is assumed that the object is the substrate P. As described above, the object may be at least one of the substrate stage 2 and the measurement stage 3, or may be an object different from the substrate P, the substrate stage 2, and the measurement stage 3.

 The outer surface 13F of the last optical element 13 is disposed around the exit surface 12. The outer surface 13F is a non-emission surface that does not emit the exposure light EL. The exposure light EL passes through the emission surface 12 and does not pass through the outer surface 13F.

  The last optical element 13 does not move substantially. The last optical element 13 is substantially stationary.

 The first liquid immersion member 500 is disposed at least partly around the optical path of the exposure light EL. The second liquid immersion member 600 is disposed outside the first liquid immersion member 500 with respect to the optical path of the exposure light EL.

 The optical path of the exposure light EL includes the optical path KL of the exposure light EL in the terminal optical element 13 (the optical path KL of the exposure light EL traveling through the terminal optical element 13). The optical path of the exposure light EL includes the optical path K of the exposure light EL emitted from the emission surface 12. That is, in this embodiment, the concept of the optical path of the exposure light EL may include the optical path KL of the exposure light EL in the last optical element 13. The optical path of the exposure light EL may be a concept including the optical path K of the exposure light EL between the emission surface 12 and the substrate P (object).

  In the present embodiment, the first liquid immersion member 500 is an annular member. The first immersion member 500 is disposed around the optical path of the exposure light EL. A part of the first liquid immersion member 500 is disposed around the last optical element 13 (optical path KL). A part of the first liquid immersion member 500 is disposed around the optical path K of the exposure light EL emitted from the emission surface 12.

 The second liquid immersion member 600 is disposed outside the first liquid immersion member 500 with respect to the optical path of the exposure light EL (the optical axis AX of the terminal optical element 13). In the present embodiment, a plurality of second liquid immersion members 600 are arranged around the first liquid immersion member 500.

  In the present embodiment, two second liquid immersion members 600 are arranged in the space around the first liquid immersion member 500. In the present embodiment, the second liquid immersion member 600 is disposed on each of one side (+ X side) and the other side (−X side) of the first liquid immersion member 500 with respect to the X-axis direction.

  The immersion space LS1 is formed so that the optical path K of the exposure light EL emitted from the exit surface 12 of the last optical element 13 is filled with the liquid LQ. At least a part of the immersion space LS1 is formed in a space between the last optical element 13 and the substrate P (object). At least a part of the immersion space LS1 is formed in a space between the first immersion member 500 and the substrate P (object).

 In the exposure of the substrate P, the immersion space LS1 is formed by the first immersion member 500 so that the optical path K of the exposure light EL between the exit surface 12 of the last optical element 13 and the substrate P is filled with the liquid LQ. The When the substrate P is irradiated with the exposure light EL, the immersion space LS1 is formed so that only a partial region of the surface of the substrate P including the projection region PR is covered with the liquid LQ.

 The immersion space LS1 may be formed so as to straddle two objects. For example, the immersion space LS1 may be formed so as to straddle the cover member T of the substrate stage 2 and the substrate P. The immersion space LS1 may be formed so as to straddle the substrate stage 2 and the measurement stage 3.

  The immersion space LS2 is formed in a space between the second immersion member 600 and the substrate P (object).

  The immersion space LS2 is formed in at least a part of the period in which the immersion space LS1 is formed. The immersion space LS2 is formed in at least a part of a period during which the exposure light EL is irradiated onto the substrate P through the liquid LQ in the immersion space LS1. The immersion space LS1 and the immersion space LS2 are formed at the same time.

 The immersion space LS2 may be formed so as to straddle two objects. For example, the immersion space LS2 may be formed so as to straddle the cover member T of the substrate stage 2 and the substrate P. The immersion space LS2 may be formed so as to straddle the substrate stage 2 and the measurement stage 3.

  The first liquid immersion member 500 will be described.

  The first liquid immersion member 500 is arranged such that the substrate P (object) can be opposed to the first member 21 arranged at least at a part of the periphery of the last optical element 13 and at least partly below the first member 21. The second member 22 is provided.

  The first immersion member 500 includes a liquid supply unit 31 that supplies the liquid LQ for forming the immersion space LS1, a liquid recovery unit 24 that recovers at least part of the liquid LQ in the immersion space LS1, And a liquid recovery part 27 that recovers at least a part of the liquid LQ in the immersion space LS1.

  The second member 22 is a movable member that can move. At least a part of the second member 22 is disposed below at least a part of the periphery of the optical path K of the exposure light EL emitted from the emission surface 12 below the first member 21. The second member 22 is movable outside the optical path of the exposure light EL. The second member 22 is movable (movable) with respect to the last optical element 13. The second member 22 is movable (movable) with respect to the first member 21. The relative position between the second member 22 and the last optical element 13 changes. The relative position between the second member 22 and the first member 21 changes.

  The first member 21 is an annular member. A part of the first member 21 is disposed around the last optical element 13 (optical path KL). A part of the first member 21 is disposed around the optical path K. The first member 21 is disposed so as not to contact the terminal optical element 13. The first member 21 does not move substantially. The first member 21 is substantially stationary.

  The second member 22 is an annular member. The second member 22 includes a portion 221 at least partially disposed below the first member 21 and a portion 222 disposed outside the portion 221 with respect to the optical path of the exposure light EL. The portion 221 is disposed around the optical path K. The part 221 has a plate shape. The portion 222 is disposed around the first member 21. The second member 22 is disposed so as not to contact the terminal optical element 13 and the first member 21. The second member 22 moves so as not to contact the terminal optical element 13 and the first member 21.

 The first member 21 is disposed at a position farther from the substrate P (object) than the portion 221. At least a part of the portion 221 is disposed between the first member 21 and the substrate P (object). At least a part of the portion 221 is disposed between the terminal optical element 13 and the substrate P (object). The portion 221 may not be disposed between the terminal optical element 13 and the substrate P (object).

  The first member 21 has a lower surface 23 facing in the −Z direction, an inner surface 28 facing the outer surface 13F of the terminal optical element 13 with a gap, and an optical path of the exposure light EL (the optical axis AX of the terminal optical element 13). And an outer surface 29 facing outward.

 The second member 22 has an upper surface 25 facing the + Z direction, a lower surface 26 facing the −Z direction, and an inner surface 30 that faces the outer surface 29 with a gap.

 The portion 221 of the second member 22 can face the lower surface 23. At least a part of the upper surface 25 faces the lower surface 23 with a gap. At least a part of the upper surface 25 faces the emission surface 12 with a gap. Note that the upper surface 25 may not face the emission surface 12.

 The substrate P (object) can face the lower surface 26. At least a part of the upper surface of the substrate P faces the lower surface 26 with a gap. At least a part of the upper surface of the substrate P faces the emission surface 12 with a gap.

 In the Z-axis direction, the dimension of the gap between the upper surface of the substrate P (object) and the emission surface 12 is larger than the dimension of the gap between the upper surface and the lower surface 26 of the substrate P.

  A first space SP <b> 1 is formed between the lower surface 23 and the upper surface 25. A second space SP2 is formed between the lower surface 26 and the upper surface of the substrate P (object). A third space SP3 is formed between the outer surface 13F and the inner surface 28.

 The lower surface 23 of the first member 21 can hold the liquid LQ with the second member 22 (part 221). The lower surface 23 of the first member 21 includes a non-recovery region where the liquid LQ cannot be recovered and a recovery region which is disposed outside the non-recovery region with respect to the optical path of the exposure light EL and can recover the liquid LQ. The recovery area of the lower surface 23 includes a liquid recovery unit 24.

 The upper surface 25 of the second member 22 (part 221) can hold the liquid LQ with the first member 21. The upper surface 25 of the second member 22 is a non-recovery area where the liquid LQ cannot be recovered.

 The lower surface 26 of the second member 22 can hold the liquid LQ with the substrate P (object). The lower surface 26 of the second member 22 includes a non-recovery region where the liquid LQ cannot be recovered and a recovery region which is disposed outside the non-recovery region with respect to the optical path of the exposure light EL and can recover the liquid LQ. The recovery area of the lower surface 26 includes a liquid recovery part 27.

  Each of the inner side surface 28, the outer side surface 29, and the inner side surface 30 is a non-recovery area where the liquid LQ cannot be recovered.

  In the present embodiment, the lower surface 23 of the first member 21 is substantially parallel to the XY plane. The upper surface 25 of the portion 221 is also substantially parallel to the XY plane. The lower surface 26 of the portion 221 is also substantially parallel to the XY plane. That is, the lower surface 23 and the upper surface 25 are substantially parallel. The upper surface 25 and the lower surface 26 are substantially parallel.

  The first member 21 has an opening 34 through which the exposure light EL emitted from the emission surface 12 can pass. The second member 22 has an opening 35 through which the exposure light EL emitted from the emission surface 12 can pass. At least a part of the last optical element 13 is disposed inside the opening 34. A lower surface 23 is disposed around the lower end of the opening 34. An upper surface 25 is disposed around the upper end of the opening 35. A lower surface 26 is disposed around the lower end of the opening 35.

 The dimension of the opening 34 in the XY plane is larger than the dimension of the opening 35. The dimension of the opening 34 is larger than the dimension of the opening 35 with respect to the X-axis direction. The dimension of the opening 34 is larger than the dimension of the opening 35 with respect to the Y-axis direction. In the present embodiment, the first member 21 is not disposed directly below the emission surface 12. A part of the second member 22 (part 221) is disposed immediately below the emission surface 12.

 The dimension of the opening 34 may be smaller than the dimension of the opening 35. The dimension of the opening 34 may be substantially equal to the dimension of the opening 35.

  The first member 21 is supported by the apparatus frame 8B via the support member 21S. The first member 21 does not move substantially. The first member 21 is substantially stationary. The relative position between the first member 21 and the last optical element 13 does not substantially change. The first member 21 may be supported by the reference frame 8A via a support member.

  The second member 22 is supported by the apparatus frame 8B via the support member 22S. The support member 22S is connected to the second member 22 outside the first member 21 with respect to the optical path of the exposure light EL. Note that the second member 22 may be supported by the reference frame 8A via a support member.

  The second member 22 is movable in the XY plane perpendicular to the optical axis of the last optical element 13. The second member 22 is movable substantially parallel to the XY plane. As shown in FIG. 4, in the present embodiment, the second member 22 is movable at least in the X-axis direction. Note that the second member 22 may be movable in at least one direction of the Y axis, the Z axis, θX, θY, and θZ in addition to the X axis direction.

 The portion 221 of the second member 22 is movable below the first member 21. The portion 221 of the second member 22 is movable between the first member 21 and the substrate P (object).

 As the second member 22 moves in the XY plane, the dimension of the gap between the outer surface 29 of the first member 21 and the inner surface 30 of the second member 22 changes. In other words, the size of the space between the outer surface 29 and the inner surface 30 changes as the second member 22 moves in the XY plane. For example, in the example shown in FIG. 4, the second member 22 moves in the −X direction, whereby the dimension of the gap between the outer surface 29 and the inner surface 30 on the + X side with respect to the last optical element 13 becomes smaller (outer side). The space between the side surface 29 and the inner side surface 30 is reduced). The movement of the second member 22 in the + X direction increases the size of the gap between the outer surface 29 and the inner surface 30 on the + X side with respect to the last optical element 13 (between the outer surface 29 and the inner surface 30). Space becomes larger). In the present embodiment, the movable range (movable range) of the second member 22 is determined so that the first member 21 (outer surface 29) and the second member 22 (inner surface 30) do not contact each other.

  The second member 22 is moved by the driving device 32. The driving device 32 can move the second member 22 relative to the first member 21. The drive device 32 is controlled by the control device 6.

 In the present embodiment, the driving device 32 moves the support member 22S. When the support member 22S is moved by the drive device 32, the second member 22 moves. The drive device 32 includes, for example, a motor, and moves the second member 22 using Lorentz force.

 The drive device 32 is supported by the device frame 8B via the support member 32S. The second member 22 is supported by the device frame 8B via the support member 22S, the drive device 32, and the support member 32S. Even if vibration is generated by the movement of the second member 22, the vibration isolator 10 suppresses the vibration from being transmitted to the reference frame 8A.

 The liquid supply unit 31 is disposed on the first member 21. The liquid supply unit 31 includes an opening (liquid supply port) disposed on the inner surface 28 of the first member 21. The liquid supply part 31 is arrange | positioned so that the outer surface 13F may be opposed. The liquid supply unit 31 supplies the liquid LQ to the third space SP3 between the outer surface 13F and the inner surface 28. In the present embodiment, the liquid supply unit 31 is disposed on each of the + X side and the −X side with respect to the optical path K (terminal optical element 13).

 The liquid supply part (liquid supply port) 31 is connected to the liquid supply device 31S via a supply flow path 31R formed inside the first member 21. The liquid supply device 31S can supply the liquid supply unit 31 with the clean and temperature-adjusted liquid LQ. The liquid supply unit 31 supplies the liquid LQ from the liquid supply device 31S in order to form the immersion space LS1.

  The liquid recovery unit 24 is disposed on the first member 21. The liquid recovery unit 24 includes an opening (liquid recovery port) disposed on the lower surface 23 of the first member 21. The liquid recovery unit 24 is disposed so as to face the upper surface 25. The liquid recovery unit 24 recovers the liquid LQ from the first space SP1 between the lower surface 23 and the upper surface 25.

 The liquid recovery unit 24 is connected to the liquid recovery device 24C via a recovery flow path 24R formed inside the first member 21. The liquid recovery device 24C can connect the liquid recovery unit 24 and the vacuum system. The liquid recovery unit 24 can recover at least a part of the liquid LQ in the first space SP1. At least a part of the liquid LQ in the first space SP1 can flow into the recovery channel 24R via the liquid recovery unit 24.

 In the present embodiment, the liquid recovery unit 24 includes a porous member 36, and the liquid recovery port includes a hole of the porous member 36. In the present embodiment, the porous member 36 includes a mesh plate. The porous member 36 has a lower surface that can be opposed to the upper surface 25, an upper surface that faces the recovery flow path 24R, and a plurality of holes that connect the lower surface and the upper surface. The liquid recovery unit 24 recovers the liquid LQ through the hole of the porous member 36. The liquid LQ in the first space SP1 recovered from the liquid recovery unit 24 (hole of the porous member 36) flows into the recovery flow path 24R, flows through the recovery flow path 24R, and is recovered by the liquid recovery device 24C.

  In the present embodiment, substantially only the liquid LQ is recovered via the liquid recovery unit 24, and the recovery of gas is limited. The control device 6 controls the pressure (first space SP1 on the lower surface side of the porous member 36 so that the liquid LQ in the first space SP1 passes through the hole of the porous member 36 and flows into the recovery flow path 24R and does not pass the gas. And the pressure on the upper surface side (pressure in the recovery flow path 24R) are adjusted. An example of a technique for recovering only the liquid through the porous member is disclosed in, for example, US Pat. No. 7,292,313.

  The gas may be collected (sucked) together with the liquid LQ through the porous member 36. The porous member 36 may not be provided on the first member 21. That is, the fluid (one or both of the liquid LQ and the gas) in the first space SP1 may be recovered without passing through the porous member.

  The liquid recovery unit 27 is disposed on the second member 22. The liquid recovery unit 27 includes an opening (liquid recovery port) disposed on the lower surface 26 of the second member 22. The liquid recovery part 27 is arranged so that the upper surface of the substrate P (object) can be opposed. The liquid recovery unit 27 recovers the liquid LQ from the second space SP2 between the lower surface 26 and the upper surface of the substrate P (object).

 The liquid recovery unit 27 is connected to the liquid recovery device 27C via a recovery flow path 27R formed inside the second member 22. The liquid recovery device 27C can connect the liquid recovery unit 27 and the vacuum system. The liquid recovery part 27 can recover at least a part of the liquid LQ in the second space SP2. At least a part of the liquid LQ in the second space SP2 can flow into the recovery channel 27R via the liquid recovery unit 27.

 In the present embodiment, the liquid recovery unit 27 includes a porous member 37, and the liquid recovery port includes a hole of the porous member 37. In the present embodiment, the porous member 37 includes a mesh plate. The porous member 37 has a lower surface on which the upper surface of the substrate P (object) can be opposed, an upper surface facing the recovery flow path 27R, and a plurality of holes connecting the lower surface and the upper surface. The liquid recovery unit 27 recovers the liquid LQ through the hole of the porous member 37. The liquid LQ in the second space SP2 recovered from the liquid recovery part 27 (hole of the porous member 37) flows into the recovery flow path 27R, flows through the recovery flow path 27R, and is recovered by the liquid recovery device 27C.

  In the present embodiment, the gas is recovered together with the liquid LQ via the liquid recovery unit 27. That is, the liquid recovery unit 27 performs gas-liquid mixed recovery. Note that only the liquid LQ may be substantially recovered through the liquid recovery unit 27, and the recovery of the gas may be limited. The porous member 37 may not be provided on the second member 22. That is, the fluid (one or both of the liquid LQ and the gas) in the second space SP2 may be recovered without passing through the porous member.

  The recovery channel 27R is disposed outside the inner side surface 30 with respect to the optical path of the exposure light EL. The recovery flow path 27R is disposed above the liquid recovery unit 27. By moving the second member 22, the liquid recovery unit 27 and the recovery flow path 27 </ b> R of the second member 22 move outside the outer surface 29 of the first member 21.

  In the present embodiment, the liquid recovery unit 24 and the liquid recovery unit 27 are disposed outside the liquid supply unit 31 with respect to the radial direction with respect to the optical axis AX of the last optical element 13. The liquid recovery unit 27 is disposed outside the liquid recovery unit 24 with respect to the radiation direction of the last optical element 13 with respect to the optical axis AX.

  The liquid recovery unit 27 is disposed outside the first member 21 with respect to the optical path of the exposure light EL (the optical axis AX of the terminal optical element 13). The liquid recovery unit 27 is disposed outside the first space SP1 with respect to the optical path of the exposure light EL (the optical axis AX of the terminal optical element 13).

  An opening 40 is formed between the inner edge of the lower surface 23 and the upper surface 25. The optical path space SPK including the optical path K between the emission surface 12 and the substrate P (object) and the first space SP1 between the lower surface 23 and the upper surface 25 are connected via the opening 40. The optical path space SPK includes a space between the exit surface 12 and the substrate P (object) and a space between the exit surface 12 and the upper surface 25. The opening 40 is disposed so as to face the optical path K. The third space SP3 between the outer surface 13F and the inner surface 28 is connected to the first space SP1 through the opening 40.

  At least a part of the liquid LQ from the liquid supply unit 31 is supplied to the first space SP <b> 1 between the lower surface 23 and the upper surface 25 through the opening 40. At least a part of the liquid LQ supplied from the liquid supply unit 31 to form the immersion space LS1 is supplied onto the substrate P (object) facing the emission surface 12 through the opening 34 and the opening 35. . Thereby, the optical path K is filled with the liquid LQ. At least a part of the liquid LQ from the liquid supply unit 31 is supplied to the second space SP2 between the lower surface 26 and the upper surface of the substrate P (object).

  In the present embodiment, the movement of the liquid LQ from one of the first space SP1 on the upper surface 25 side and the second space SP2 on the lower surface 26 side is suppressed. The first space SP <b> 1 and the second space SP <b> 2 are partitioned by the second member 22. The liquid LQ in the first space SP1 can move to the second space SP2 through the opening 35. The liquid LQ in the first space SP1 cannot move to the second space SP2 without passing through the opening 35. The liquid LQ existing in the first space SP1 outside the opening 35 with respect to the optical path K cannot move to the second space SP2. The liquid LQ in the second space SP2 can move to the first space SP1 through the opening 35. The liquid LQ in the second space SP2 cannot move to the first space SP1 without passing through the opening 35. The liquid LQ present in the second space SP2 outside the opening 35 with respect to the optical path K cannot move to the first space SP1. That is, in the present embodiment, the first liquid immersion member 500 does not have a flow path that fluidly connects the first space SP1 and the second space SP2 other than the opening 35.

  In the present embodiment, the liquid recovery unit 27 recovers the liquid LQ from the second space SP2, and does not recover the liquid LQ from the first space SP1. The liquid recovery unit 24 recovers the liquid LQ from the first space SP1, and does not recover the liquid LQ from the second space SP2.

 The liquid LQ that has moved outside the first space SP1 (outside the outer surface 29) with respect to the optical path of the exposure light EL is prevented from moving onto the substrate P (second space SP2) by the inner surface 30. .

  In the present embodiment, the recovery operation of the liquid LQ from the liquid recovery unit 27 is executed in parallel with the supply operation of the liquid LQ from the liquid supply unit 31, whereby the one-side terminal optical element 13 and the first optical element 13 are arranged. An immersion space LS1 is formed with the liquid LQ between the immersion member 500 and the other substrate P (object).

  In the present embodiment, the recovery operation of the fluid from the liquid recovery unit 24 is executed in parallel with the supply operation of the liquid LQ from the liquid supply unit 31 and the recovery operation of the fluid from the liquid recovery unit 27. .

  In the present embodiment, a part of the interface LG of the liquid LQ in the immersion space LS1 is formed between the second member 22 and the substrate P (object). A part of the interface LG of the liquid LQ in the immersion space LS1 is formed between the first member 21 and the second member 22. A part of the interface LG of the liquid LQ in the immersion space LS1 is formed between the last optical element 13 and the first member 21.

  In the following description, the interface LG of the liquid LQ formed between the first member 21 and the second member 22 is appropriately referred to as a first interface LG1. The interface LG formed between the second member 22 and the substrate P (object) is appropriately referred to as a second interface LG2. The interface LG formed between the last optical element 13 and the first member 21 is appropriately referred to as a third interface LG3.

  In the present embodiment, the first interface LG <b> 1 is formed between the lower surface and the upper surface 25 of the liquid recovery unit 24. The second interface LG2 is formed between the lower surface of the liquid recovery unit 27 and the upper surface of the substrate P (object).

  In the present embodiment, the first interface LG1 is formed between the lower surface and the upper surface 25 of the liquid recovery unit 24, and the liquid LQ of the first space SP1 is outside the liquid recovery unit 24 (for example, the inner surface 29 and the inner surface 29). The movement to the space between the side surfaces 30 is suppressed. There is no liquid LQ in the space between the outer side surface 29 and the inner side surface 30. A space between the outer side surface 29 and the inner side surface 30 is a gas space.

 A space between the outer side surface 29 and the inner side surface 30 is connected to the space CS. In other words, the space between the outer surface 29 and the inner surface 30 is open to the atmosphere. When the pressure in the space CS is atmospheric pressure, the space between the outer surface 29 and the inner surface 30 is opened to the atmosphere. Therefore, the second member 22 can move smoothly. Note that the pressure in the space CS may be higher or lower than the atmospheric pressure.

  The first space SP1 is connected to the space CS via a space between the outer side surface 29 and the inner side surface 30. The first space SP1 is open to the atmosphere. The second space SP2 is also connected to the space CS and opened to the atmosphere. The third space SP3 is also connected to the space CS and opened to the atmosphere.

  As shown in FIG. 2, in a state where the second member 22 is disposed at the origin where the optical axis AX of the last optical element 13 and the center of the opening 35 substantially coincide with each other, the entire lower surface 23 and the second member 22 are arranged. Is opposed to the upper surface 25. Further, in a state where the second member 22 is disposed at the origin, a part of the emission surface 12 and the upper surface 25 of the second member 22 face each other. Further, in a state where the second member 22 is disposed at the origin, the liquid recovery unit 24 and the upper surface 25 of the second member 22 face each other.

  In the present embodiment, the center of the opening 34 and the center of the opening 35 substantially coincide with each other when the second member 22 is disposed at the origin.

  Next, an example of the operation of the second member 22 will be described. The second member 22 is movable in cooperation with the movement of the substrate P (object). The second member 22 is movable independently of the substrate P (object). The second member 22 is movable in parallel with at least part of the movement of the substrate P (object).

 The second member 22 is movable in a state where the immersion space LS1 is formed. The second member 22 is movable in a state where the liquid LQ exists in the first space SP1 and the second space SP2.

  The second member 22 may be moved in parallel with at least a part of the period in which the exposure light EL is emitted from the emission surface 12. The second member 22 may be moved in parallel with at least a part of the period in which the exposure light EL is emitted from the emission surface 12 in a state where the immersion space LS1 is formed.

 The second member 22 may be moved in parallel with at least a part of the period during which the substrate P (object) moves. The second member 22 may be moved in parallel with at least a part of the period during which the substrate P (object) moves in the state where the immersion space LS1 is formed.

 The second member 22 may be moved in the moving direction of the substrate P (object). For example, the second member 22 may be moved in the moving direction of the substrate P in at least a part of the period in which the substrate P is moved. For example, when the substrate P is moved in one direction (for example, + X direction) in the XY plane, the second member 22 moves in one direction (+ X direction) in the XY plane in synchronization with the movement of the substrate P. May be. The second member 22 may be moved so as to follow the substrate P (object).

 The second member 22 may move when the second member 22 and the substrate P (object) do not face each other. For example, the second member 22 may move when no object is present below the second member 22. The second member 22 may move when the liquid LQ is not present in the space between the second member 22 and the substrate P (object). For example, the second member 22 may move when the immersion space LS1 is not formed.

  The second member 22 moves based on, for example, the moving condition of the substrate P (object). The control device 6 moves the second member 22 in parallel with at least a part of the movement of the substrate P (object) based on, for example, the movement condition of the substrate P (object). The control device 6 supplies the liquid LQ from the liquid supply unit 31 and collects the liquid LQ from the liquid recovery unit 27 and the liquid recovery unit 24 so that the immersion space LS1 is continuously formed. 22 is moved.

 In this embodiment, the 2nd member 22 is movable so that relative movement with respect to the board | substrate P (object) may become small. The second member 22 is movable so that the relative movement between the second member 22 and the substrate P (object) is smaller than the relative movement between the first member 21 and the substrate P (object). For example, the second member 22 may move in synchronization with the substrate P (object).

 The relative movement includes at least one of a relative speed and a relative acceleration. For example, in the state in which the immersion space LS1 is formed, that is, in the state in which the liquid LQ is present in the second space SP2, the second member 22 has a lower relative speed with respect to the substrate P (object). You may move on. Further, the second member 22 is configured such that the relative acceleration with respect to the substrate P (object) becomes small in the state where the immersion space LS1 is formed, that is, in the state where the liquid LQ exists in the second space SP2. You may move on. Further, the second member 22 is in a state where the immersion space LS1 is formed, that is, in a state where the liquid LQ is present in the second space SP2, the relative speed with respect to the substrate P (object) is the first speed. You may move so that it may become smaller than the relative speed of the member 21 and the board | substrate P (object). The second member 22 has a relative acceleration with respect to the substrate P (object) in a state where the immersion space LS1 is formed, that is, in a state where the liquid LQ exists in the second space SP2. You may move so that it may become smaller than the relative acceleration of the member 21 and the board | substrate P (object).

  The second member 22 is movable in the moving direction of the substrate P (object), for example. For example, when the substrate P (object) moves in the + X direction (or −X direction), the second member 22 can move in the + X direction (or −X direction). In addition, when the substrate P (object) moves in the + Y direction (or -Y direction) while moving in the + X direction, the second member 22 is movable in the + X direction. Further, when the substrate P (object) moves in the + Y direction (or −Y direction) while moving in the −X direction, the second member 22 is movable in the −X direction. That is, in the present embodiment, when the substrate P (object) moves in a certain direction including a component in the X-axis direction, the second member 22 moves in the X-axis direction. For example, the second member 22 may move in the X-axis direction in parallel with at least part of the movement of the substrate P (object) in a certain direction including the component in the X-axis direction.

 Note that the second member 22 may be movable in the Y-axis direction. When the substrate P (object) moves in a certain direction including a component in the Y-axis direction, the second member 22 may move in the Y-axis direction. For example, the second member 22 is set so that the relative speed with respect to the substrate P (object) decreases in parallel with at least a part of the movement of the substrate P (object) in a certain direction including the component in the Y-axis direction. It may move in the axial direction.

  Next, the second liquid immersion member 600 will be described.

  The second liquid immersion member 600 is disposed outside the first liquid immersion member 500 with respect to the optical path of the exposure light EL (the optical axis AX of the last optical element 13). The first liquid immersion member 500 and the second liquid immersion member 600 are different members. The second immersion member 600 is separated from the first immersion member 500. The second liquid immersion member 600 is disposed at a part of the periphery of the first liquid immersion member 500.

  The second liquid immersion member 600 has a lower surface 41 to which the substrate P (object) can face. The second liquid immersion member 600 can hold the liquid LQ with the substrate P (object). The lower surface 41 facing the substrate P (object) can hold the liquid LQ with the substrate P (object). The immersion space LS2 is formed by the liquid LQ that is held between the second immersion member 600 and the substrate P (object). By holding the liquid LQ between the second liquid immersion member 600 on one side and the substrate P on the other side, the liquid immersion space LS2 is formed in a part of the periphery of the liquid immersion space LS1.

  The immersion space LS2 is smaller than the immersion space LS1. The size of the immersion space includes the volume of the liquid that forms the immersion space. The size of the immersion space includes the weight of the liquid that forms the immersion space. The size of the immersion space includes, for example, the area of the immersion space in a plane parallel to the surface (upper surface) of the substrate P (in the XY plane). The size of the immersion space includes, for example, the dimension of the immersion space in a predetermined direction (for example, the X-axis direction or the Y-axis direction) in a plane (in the XY plane) parallel to the surface (upper surface) of the substrate P. . In the present embodiment, the immersion space LS2 is smaller than the immersion space LS1 in a plane parallel to the surface (upper surface) of the substrate P (in the XY plane).

  In the present embodiment, the position (height) of the lower surface 26 of the first liquid immersion member 500 (second member 22) and the position (height) of the lower surface 41 of the second liquid immersion member 600 in the Z-axis direction are substantially equal. Are equal.

 Note that the lower surface 26 may be disposed at a position lower than the lower surface 41. Note that the lower surface 26 may be disposed at a position higher than the lower surface 41.

  In the present embodiment, the second liquid immersion member 600 is a movable member that can move. The second liquid immersion member 600 is movable in the space around the first liquid immersion member 500. The second liquid immersion member 600 is movable outside the first liquid immersion member 500. The second liquid immersion member 600 is movable (movable) with respect to the last optical element 13. The second liquid immersion member 600 is movable (movable) with respect to the first liquid immersion member 500. The relative position between the second liquid immersion member 600 and the last optical element 13 can be changed. The relative position of the second liquid immersion member 600 and the first liquid immersion member 500 can be changed.

  The second liquid immersion member 600 is supported by the apparatus frame 8B via the support member 600S. The support member 600S is connected to the second liquid immersion member 600 outside the first liquid immersion member 500 with respect to the optical path of the exposure light EL. The second liquid immersion member 600 may be supported by the reference frame 8A via a support member.

  The second immersion member 600 can move in the XY plane perpendicular to the optical axis AX of the last optical element 13. The second liquid immersion member 600 is movable substantially parallel to the upper surface of the substrate P (object) with the lower surface 41 facing.

 The second immersion member 600 is movable in the Z-axis direction substantially parallel to the optical axis AX of the last optical element 13. The second liquid immersion member 600 is movable so that the lower surface 41 approaches the upper surface of the opposing substrate P (object) or away from the upper surface of the substrate P (object).

 Note that the second liquid immersion member 600 may be movable in six directions of the X axis, the Y axis, the Z axis, θX, θY, and θZ.

  The second liquid immersion member 600 is moved by the driving device 42. The driving device 42 can move the second liquid immersion member 600 with respect to the first liquid immersion member 500. The drive device 42 is controlled by the control device 6.

 In the present embodiment, the driving device 42 moves the support member 600S. When the support member 600S is moved by the driving device 42, the second liquid immersion member 600 is moved. The drive device 42 includes, for example, a motor, and moves the second liquid immersion member 600 using Lorentz force.

 The drive device 42 is supported by the device frame 8B via the support member 42S. The second liquid immersion member 600 is supported by the device frame 8B via the support member 600S, the drive device 42, and the support member 42S. Even if vibration is generated by the movement of the second immersion member 600, the vibration isolator 10 suppresses the vibration from being transmitted to the reference frame 8A.

  The second immersion member 600 includes a liquid supply unit 43 that supplies the liquid LQ for forming the immersion space LS2, and a liquid recovery unit 44 that recovers at least a part of the liquid LQ in the immersion space LS2. Yes.

  The liquid supply unit 43 can face the upper surface of the substrate P (object). The liquid supply unit 43 is disposed so as to face the space SP4 on the lower surface 41 side. The space SP4 includes a space between the lower surface 41 and the upper surface of the substrate P (object) that the lower surface 41 faces.

 The liquid supply unit 43 includes an opening (liquid supply port) disposed on the lower surface 41 of the second liquid immersion member 600. The liquid supply unit 43 supplies the liquid LQ to the space SP4 between the lower surface 41 and the upper surface of the substrate P (object).

 The liquid supply part (liquid supply port) 43 is connected to the liquid supply device 43S via a supply flow path 43R formed inside the second liquid immersion member 600. The liquid supply device 43S can supply the liquid LQ that is clean and temperature-adjusted to the liquid supply unit 43. The liquid supply unit 43 supplies the liquid LQ from the liquid supply device 43S in order to form the immersion space LS2.

  The liquid recovery unit 44 can face the upper surface of the substrate P (object). The liquid recovery part 44 is disposed so as to face the space SP4.

 The liquid recovery part 44 includes an opening (liquid recovery port) disposed on the lower surface 41 of the second liquid immersion member 600. The liquid recovery unit 44 recovers the liquid LQ from the space SP4 between the lower surface 41 and the upper surface of the substrate P (object). The liquid recovery unit 44 (liquid recovery port) is disposed on the lower surface 41 so as to surround the liquid supply unit 43 (liquid supply port).

 The liquid recovery unit 44 is connected to the liquid recovery device 44C via a recovery channel 44R formed inside the second liquid immersion member 600. The liquid recovery device 44C can connect the liquid recovery unit 44 and the vacuum system. The liquid recovery part 44 can recover at least a part of the liquid LQ in the space SP4. At least a part of the liquid LQ in the space SP4 can flow into the recovery channel 44R via the liquid recovery unit 44.

  In the present embodiment, the gas is recovered together with the liquid LQ via the liquid recovery unit 44. That is, the liquid recovery unit 44 performs gas-liquid mixed recovery.

 The liquid recovery unit 44 may include a porous member. Only the liquid LQ may be substantially recovered through the porous member, and the recovery of the gas may be limited.

  In the present embodiment, the recovery operation of the liquid LQ from the liquid recovery unit 44 is executed in parallel with the supply operation of the liquid LQ from the liquid supply unit 43, and thus the second liquid immersion member 600 on one side is A liquid immersion space LS2 is formed with the liquid LQ between the other substrate P (object).

  In the present embodiment, the interface LG4 of the liquid LQ in the immersion space LS2 is formed between the second immersion member 600 and the substrate P (object).

  The space SP4 is connected to the space CS and opened to the atmosphere.

  Next, an example of the operation of the second liquid immersion member 600 will be described. The second liquid immersion member 600 is movable in cooperation with the movement of the substrate P (object). The second liquid immersion member 600 is movable independently of the substrate P (object). The second liquid immersion member 600 is movable in parallel with at least a part of the movement of the substrate P (object).

 The second immersion member 600 is movable in a state where the immersion space LS2 is formed.

 The second immersion member 600 may be moved in parallel with at least a part of the period during which the substrate P (object) moves. The second immersion member 600 may be moved in parallel with at least a part of the period during which the substrate P (object) moves in the state where the immersion space LS2 is formed.

 The second liquid immersion member 600 may be moved in the moving direction of the substrate P (object). For example, the second liquid immersion member 600 may be moved in the moving direction of the substrate P during at least a part of the period in which the substrate P is moved. For example, when the substrate P is moved in one direction (for example, + X direction) in the XY plane, the second liquid immersion member 600 is synchronized with the movement of the substrate P in one direction (+ X direction) in the XY plane. May be moved. The second liquid immersion member 600 may be moved so as to follow the substrate P (object).

 The second liquid immersion member 600 may move when the second liquid immersion member 600 and the substrate P (object) do not face each other. For example, the second liquid immersion member 600 may move when no object is present below the second liquid immersion member 600. The second liquid immersion member 600 may move when the liquid LQ is not present in the space between the second liquid immersion member 600 and the substrate P (object). For example, the second liquid immersion member 600 may move when the liquid immersion space LS2 is not formed.

  The second immersion member 600 moves based on, for example, the movement condition of the substrate P (object). The control device 6 moves the second liquid immersion member 600 in parallel with at least a part of the movement of the substrate P (object) based on, for example, the movement condition of the substrate P (object). The control device 6 moves the second immersion member 600 while supplying the liquid LQ from the liquid supply unit 43 and collecting the liquid LQ from the liquid recovery unit 44 so that the immersion space LS2 is continuously formed. To do.

 In the present embodiment, the second liquid immersion member 600 is movable so that relative movement with the substrate P (object) is small. The second liquid immersion member 600 is movable so that the relative movement between the second liquid immersion member 600 and the substrate P (object) is smaller than the relative movement between the first liquid immersion member 500 and the substrate P (object). For example, the second liquid immersion member 600 may move in synchronization with the substrate P (object).

 The relative movement includes at least one of a relative speed and a relative acceleration. For example, the second immersion member 600 may move so that the relative speed with respect to the substrate P (object) becomes small in a state where the immersion space LS2 is formed. Further, the second immersion member 600 may move so that the relative acceleration with the substrate P (object) becomes small in a state where the immersion space LS2 is formed.

 Further, the second immersion member 600 has a relative speed between the substrate I (object) and the first immersion member 500 and the substrate P (object) in a state where the immersion space LS2 is formed. May be moved so as to be smaller. In addition, the second immersion member 600 has a relative acceleration between the substrate P (object) and the first immersion member 500 and the substrate P (object) in a state where the immersion space LS2 is formed. May be moved so as to be smaller.

  For example, the second liquid immersion member 600 is movable in the moving direction of the substrate P (object). For example, when the substrate P (object) moves in the + X direction (or −X direction), the second liquid immersion member 600 can move in the + X direction (or −X direction). In addition, when the substrate P (object) moves in the + Y direction (or -Y direction) while moving in the + X direction, the second immersion member 600 is movable in the + X direction. Further, when the substrate P (object) moves in the + Y direction (or -Y direction) while moving in the −X direction, the second liquid immersion member 600 is movable in the −X direction. That is, in the present embodiment, when the substrate P (object) moves in a certain direction including a component in the X axis direction, the second liquid immersion member 600 moves in the X axis direction. For example, the second liquid immersion member 600 may move in the X-axis direction in parallel with at least part of the movement of the substrate P (object) in a certain direction including the component in the X-axis direction.

 Note that the second liquid immersion member 600 may be movable in the Y-axis direction. When the substrate P (object) moves in a certain direction including a component in the Y-axis direction, the second liquid immersion member 600 may move in the Y-axis direction. For example, in parallel with at least part of the movement of the substrate P (object) in a certain direction including the component in the Y-axis direction, the second immersion member 600 is set so that the relative speed with respect to the substrate P (object) decreases. May move in the Y-axis direction.

  Next, a method for exposing the substrate P using the above-described exposure apparatus EX will be described.

 In the following description, in order to form the immersion space LS1, the liquid LQ is supplied from the liquid supply unit 31, and the liquid LQ is recovered from each of the liquid recovery unit 24 and the liquid recovery unit 27. .

  In order to form the immersion space LS1, for example, the liquid LQ may be supplied from the liquid supply unit 31, the liquid LQ may be recovered from the liquid recovery unit 27, and the liquid LQ may not be recovered from the liquid recovery unit 24.

  At the substrate replacement position away from the first and second liquid immersion members 500 and 600, a process of loading (loading) the substrate P before exposure into the substrate stage 2 (first holding unit) is performed. The measurement stage 3 faces the last optical element 13 and the first and second liquid immersion members 500 and 600 in at least a part of the period in which the substrate stage 2 is separated from the first and second liquid immersion members 500 and 600. Placed in.

 The control device 6 supplies the liquid LQ from the liquid supply unit 31 and recovers the liquid LQ from the liquid recovery unit 24 and the liquid recovery unit 27 to form the immersion space LS1 on the measurement stage 3.

  Further, the control device 6 supplies the liquid LQ from the liquid supply unit 43 and recovers the liquid LQ from the liquid recovery unit 44 to form the immersion space LS <b> 2 on the measurement stage 3.

  After the substrate P before exposure is loaded onto the substrate stage 2 and the measurement process using the measurement stage 3 is completed, the control device 6 performs the final optical element 13, the first and second liquid immersion members 500 and 600, and the substrate stage 2. The substrate stage 2 is moved so as to face (substrate P).

 From the liquid recovery unit 24 and the liquid recovery unit 27 in parallel with the supply of the liquid LQ from the liquid supply unit 31 with the last optical element 13 and the first liquid immersion member 500 facing the substrate stage 2 (substrate P). When the liquid LQ is collected, an immersion space LS1 is formed between the last optical element 13 and the first immersion member 500 and the substrate stage 2 (substrate P) so that the optical path K is filled with the liquid LQ. It is formed.

 In addition, in a state where the second liquid immersion member 600 and the substrate stage 2 (substrate P) face each other, the recovery of the liquid LQ from the liquid recovery unit 44 is performed in parallel with the supply of the liquid LQ from the liquid supply unit 43. Thus, an immersion space LS2 is formed between the second immersion member 600 and the substrate stage 2 (substrate P) so that the space SP4 is filled with the liquid LQ.

 The control device 6 starts the exposure process for the substrate P. The control device 6 emits the exposure light EL from the illumination system IL in a state where the immersion space LS1 is formed on the substrate P. The illumination system IL illuminates the mask M with the exposure light EL. The exposure light EL from the mask M is irradiated onto the substrate P through the projection optical system PL and the liquid LQ in the immersion space LS1 between the emission surface 12 and the substrate P. Thereby, the substrate P is exposed with the exposure light EL emitted from the emission surface 12 through the liquid LQ in the immersion space LS1 between the emission surface 12 of the last optical element 13 and the substrate P, and the pattern of the mask M Are projected onto the substrate P.

  In the exposure of the substrate P, the immersion space LS2 is formed together with the immersion space LS1. At least in the exposure of the substrate P, the immersion space LS2 continues to be formed.

  The exposure apparatus EX of the present embodiment is a scanning exposure apparatus (so-called scanning stepper) that projects an image of the pattern of the mask M onto the substrate P while synchronously moving the mask M and the substrate P in a predetermined scanning direction. In the present embodiment, the scanning direction (synchronous movement direction) of the substrate P is the Y-axis direction, and the scanning direction (synchronous movement direction) of the mask M is also the Y-axis direction. The control device 6 moves the substrate P in the Y-axis direction with respect to the projection region PR of the projection optical system PL, and in the illumination region IR of the illumination system IL in synchronization with the movement of the substrate P in the Y-axis direction. On the other hand, the substrate P is irradiated with the exposure light EL through the projection optical system PL and the liquid LQ in the immersion space LS on the substrate P while moving the mask M in the Y-axis direction.

  FIG. 6 is a diagram illustrating an example of the substrate P held on the substrate stage 2. In the present embodiment, a plurality of shot areas S that are exposure target areas are arranged in a matrix on the substrate P. The control device 6 moves the substrate P held by the first holding unit in the Y-axis direction (scanning direction) with respect to the exposure light EL emitted from the exit surface 12 of the last optical element 13, and then exits the exit surface. Each of the plurality of shot regions S of the substrate P is sequentially exposed with the exposure light EL emitted from the emission surface 12 through the liquid LQ in the immersion space LS1 between the substrate 12 and the substrate P.

 For example, in order to expose one shot region S of the substrate P, the control device 6 performs exposure light EL (projection optical system PL of the projection optical system PL) emitted from the emission surface 12 in a state in which the immersion spaces LS1 and LS2 are formed. The substrate P is moved in the Y-axis direction with respect to the projection region PR), and the mask M is moved in the Y-axis direction with respect to the illumination region IR of the illumination system IL in synchronization with the movement of the substrate P in the Y-axis direction. While moving, the shot region S is irradiated with the exposure light EL through the projection optical system PL and the liquid LQ in the immersion space LS1 on the substrate P. Thereby, an image of the pattern of the mask M is projected onto the shot area S, and the shot area S is exposed with the exposure light EL emitted from the emission surface 12.

 After the exposure of the shot area S is completed, the control device 6 moves the substrate P in the XY plane with the immersion spaces LS1 and LS2 formed in order to start the exposure of the next shot area S. It moves in the direction intersecting the Y axis (for example, the X axis direction, or the direction inclined with respect to the X axis and Y axis directions in the XY plane), and moves the next shot area S to the exposure start position. Thereafter, the control device 6 starts exposure of the shot area S.

  The control device 6 performs shots on the position (projection region PR) irradiated with the exposure light EL from the emission surface 12 in the state where the immersion spaces LS1 and LS2 are formed on the substrate P (substrate stage 2). The operation of exposing the shot area while moving the area in the Y-axis direction, and after the exposure of the shot area, with the immersion spaces LS1 and LS2 formed on the substrate P (substrate stage 2), the following In a direction crossing the Y-axis direction in the XY plane (for example, the X-axis direction or a direction inclined with respect to the X-axis and Y-axis directions in the XY plane) so that the shot area is arranged at the exposure start position. Each of the plurality of shot areas of the substrate P is sequentially exposed while repeating the operation of moving the substrate P.

  In the following description, in order to expose the shot area, a position (projection area) where the exposure light EL from the emission surface 12 is irradiated in a state where the immersion space LS1 is formed on the substrate P (substrate stage 2). The operation of moving the substrate P (shot region) in the Y-axis direction with respect to (PR) is appropriately referred to as a scan movement operation. Further, after the exposure of a certain shot area is completed, the exposure of the next shot area is started in the XY plane while the immersion space LS1 is formed on the substrate P (substrate stage 2). The operation of moving the substrate P is appropriately referred to as a step movement operation.

  In the present embodiment, the immersion space LS2 is formed simultaneously with the immersion space LS1 in each of the scan movement operation and the step movement operation.

  In the present embodiment, the scan movement operation includes an operation in which the substrate P moves in the Y-axis direction from a state in which a certain shot region S is arranged at the exposure start position to a state in which the shot area S is arranged at the exposure end position. In the step movement operation, the substrate P intersects with the Y-axis direction in the XY plane from a state where a certain shot area S is arranged at the exposure end position to a state where the next shot area S is arranged at the exposure start position. Includes movement in the direction.

  The exposure start position includes the position of the substrate P when one end of the shot area S in the Y-axis direction passes through the projection area PR for exposure of the shot area S. The exposure end position includes the position of the substrate P when the other end portion in the Y-axis direction of the shot area S irradiated with the exposure light EL passes through the projection area PR.

 The exposure start position of the shot area S includes a scan movement operation start position for exposing the shot area S. The exposure start position of the shot area S includes a step movement operation end position for arranging the shot area S at the exposure start position.

 The exposure end position of the shot area S includes a scan movement operation end position for exposing the shot area S. The exposure end position of the shot area S includes a step movement operation start position for placing the next shot area S at the exposure start position after the exposure of the shot area S is completed.

  In the following description, a period during which the scan movement operation is performed for exposure of a certain shot area S is appropriately referred to as a scan movement period. In the following description, a period during which the step movement operation is performed for the start of exposure of the next shot area S from the end of exposure of a certain shot area S is appropriately referred to as a step movement period.

  The scan movement period includes an exposure period from the start of exposure of a certain shot area S to the end of exposure. The step movement period includes a movement period of the substrate P from the end of exposure of a certain shot area S to the start of exposure of the next shot area S.

  In the scan movement operation, the exposure light EL is emitted from the emission surface 12. In the scan movement operation, the exposure light EL is irradiated to the substrate P (object). In the step movement operation, the exposure light EL is not emitted from the emission surface 12. In the step movement operation, the exposure light EL is not irradiated onto the substrate P (object).

 The control device 6 sequentially exposes each of the plurality of shot regions S of the substrate P while repeating the scan movement operation and the step movement operation. The scan movement operation is a constant speed movement mainly in the Y-axis direction. The step movement operation includes acceleration / deceleration movement. For example, the step movement operation from the end of exposure of a certain shot area S to the start of exposure of the next shot area S includes one or both of acceleration / deceleration movement in the Y-axis direction and acceleration / deceleration movement in the X-axis direction.

 In at least a part of the scan movement operation and the step movement operation, at least a part of the immersion space LS1 (immersion space LS2) may be formed on the substrate stage 2 (cover member T). In at least a part of the scan movement operation and the step movement operation, the immersion space LS1 (immersion space LS2) may be formed so as to straddle the substrate P and the substrate stage 2 (cover member T). When the substrate P is exposed while the substrate stage 2 and the measurement stage 3 are close to or in contact with each other, the immersion space LS1 (immersion space LS2) is the substrate stage in at least a part of the scan movement operation and the step movement operation. 2 (cover member T) and the measurement stage 3 may be formed.

  The control device 6 moves the substrate P (substrate stage 2) by controlling the drive system 15 based on the exposure conditions of the plurality of shot regions S on the substrate P. The exposure conditions for the plurality of shot areas S are defined by, for example, exposure control information called an exposure recipe. The exposure control information is stored in the storage device 7.

  The exposure conditions (exposure control information) include arrangement information of the plurality of shot areas S (positions of the plurality of shot areas S on the substrate P). The exposure condition (exposure control information) includes dimension information (dimension information about the Y-axis direction) of each of the plurality of shot regions S.

 Based on the exposure conditions (exposure control information) stored in the storage device 7, the control device 6 sequentially exposes each of the plurality of shot regions S while moving the substrate P under a predetermined movement condition. The movement condition of the substrate P (object) includes at least one of movement speed, acceleration, movement direction, movement distance, and movement locus in the XY plane.

  As an example, when sequentially exposing each of the plurality of shot regions S, the control device 6 causes the projection region PR of the projection optical system PL and the substrate P to be relative to each other along the movement locus indicated by the arrow Sr in FIG. The projection region PR is irradiated with the exposure light EL while moving the substrate stage 2 so as to move, and the plurality of shot regions S are sequentially exposed with the exposure light EL via the liquid LQ. The controller 6 sequentially exposes each of the plurality of shot areas S while repeating the scan movement operation and the step movement operation.

  In the present embodiment, the second member 22 moves in at least a part of the exposure processing of the substrate P. For example, the second member 22 moves in parallel with at least a part of the step movement operation of the substrate P (substrate stage 2) in a state where the immersion space LS1 is formed. For example, the second member 22 moves in parallel with at least a part of the scanning movement operation of the substrate P (substrate stage 2) in a state where the immersion space LS1 is formed. In parallel with the movement of the second member 22, the exposure light EL is emitted from the emission surface 12.

 For example, when the substrate P (substrate stage 2) performs a step movement operation, the second member 22 has a relative movement (relative speed, relative acceleration) with respect to the substrate P (substrate stage 2). You may move so that it may become smaller than relative movement (relative speed, relative acceleration) with the substrate stage 2).

  In addition, when the substrate P (substrate stage 2) performs a scanning movement operation, the second member 22 has a relative movement (relative speed, relative acceleration) with respect to the substrate P (substrate stage 2). You may move so that it may become smaller than relative movement (relative speed, relative acceleration) with (substrate stage 2).

 Note that the second member 22 does not have to move during the scan movement operation. That is, the second member 22 may not move in parallel with the emission of the exposure light EL from the emission surface 12.

  FIG. 7 is a schematic diagram illustrating an example of the operation of the second member 22. FIG. 7 is a view of the second member 22 as viewed from above.

 In the present embodiment, the second member 22 moves in the X-axis direction. As described above, the second member 22 may move in the Y-axis direction, or may move in any direction within the XY plane including the component in the X-axis direction (or Y-axis direction). .

  The 2nd member 22 moves the movable range (movable range) prescribed | regulated regarding the X-axis direction. The movable range of the second member 22 is determined so that the exposure light EL from the emission surface 12 passes through the opening 34 and the opening 35 and the second member 22 does not contact the first member 21.

 In at least a part of the period during which the substrate P (object) moves, the second member 22 moves in the X-axis direction as shown in FIGS. 7A to 7E. FIG. 7A shows a state in which the second member 22 is arranged at the position Jr of the most + X side end of the movable range. FIG. 7C shows a state in which the second member 22 is arranged at the center position Jm of the movable range. FIG. 7E shows a state in which the second member 22 is disposed at the position Js at the end on the most −X side of the movable range.

  In the following description, the position Jr of the second member 22 shown in FIG. 7A is appropriately referred to as a first end position Jr, and the position Jm of the second member 22 shown in FIG. The position Jm is referred to as a position Jm, and the position Js of the second member 22 shown in FIG. 7E is appropriately referred to as a second end position Js.

 FIG. 7B shows a state in which the second member 22 is disposed at a position Jrm between the first end position Jr and the center position Jm. FIG. 7D shows a state in which the second member 22 is disposed at a position Jsm between the second end position Js and the center position Jm.

 In the present embodiment, the state in which the second member 22 is disposed at the center position Jm is a state in which the center of the opening 35 of the second member 22 and the optical axis AX of the terminal optical element 13 substantially coincide. including. The position of the second member 22 where the center of the opening 35 coincides with the optical axis AX may be referred to as the origin.

 The dimension of the movable range of the second member 22 includes the distance between the first end position Jr and the second end position Js in the X-axis direction.

 The control device 6 can change the position of the second member 22 with respect to the terminal optical element 13 (projection region PR). The control device 6 can move the second member 22 between two positions selected from the position Jr, the position Jrm, the position Jm, the position Jsm, and the position Js. The control device 6 can stop the second member 22 at at least one of the position Jr, the position Jrm, the position Jm, the position Jsm, and the position Js.

 The moving distance of the second member 22 between the position Jr and the position Jm is longer than the moving distance of the second member 22 between the position Jrm and the position Jm. The moving distance of the second member 22 between the position Js and the position Jm is longer than the moving distance of the second member 22 between the position Jsm and the position Jm.

  The control device 6 can move the second member 22 under a predetermined movement condition. The movement condition of the second member 22 includes at least one of the movement speed, acceleration, movement direction, movement distance, and movement locus of the second member 22 in the XY plane. The control device 6 can control at least one of the movement speed, acceleration, movement direction, movement distance, and movement locus in the XY plane of the second member 22.

  FIG. 8 schematically illustrates an example of the movement trajectory of the substrate P when the shot area Sa, the shot area Sb, and the shot area Sc are sequentially exposed while performing step movement on the substrate P including a component in the + X direction. FIG. The shot areas Sa, Sb, and Sc are arranged in the X-axis direction.

  As shown in FIG. 8, when the shot areas Sa, Sb, and Sc are exposed, from the state where the projection area PR is disposed at the position d1 of the substrate P under the last optical element 13, + Y with respect to the position d1. The path Tp1 to the state arranged at the position d2 adjacent to the side, the path Tp2 from the state arranged at the position d2 to the state arranged at the position d3 adjacent to the + X side with respect to the position d2, to the position d3 The path Tp3 from the state of being arranged to the state of being arranged at the position d4 adjacent to the −Y side relative to the position d3, and the position d5 adjacent to the position d4 from the state of being arranged at the position d4 The substrate P sequentially moves along the path Tp4 to the state disposed at the position d5 and the path Tp5 from the state disposed at the position d5 to the state disposed at the position d6 adjacent to the + Y side with respect to the position d5. To. The positions d1, d2, d3, d4, d5, and d6 are positions in the XY plane.

  At least a part of the path Tp1 is a straight line parallel to the Y axis. At least a part of the path Tp3 is a straight line parallel to the Y axis. At least a part of the path Tp5 includes a straight line parallel to the Y axis. The path Tp2 includes a curve passing through the position d2.5. The path Tp4 includes a curve passing through the position d4.5. The position d1 includes the start point of the path Tp1, and the position d2 includes the end point of the path Tp1. The position d2 includes the start point of the path Tp2, and the position d3 includes the end point of the path Tp2. The position d3 includes the start point of the path Tp3, and the position d4 includes the end point of the path Tp3. The position d4 includes the start point of the path Tp4, and the position d5 includes the end point of the path Tp4. The position d5 includes the start point of the path Tp5, and the position d6 includes the end point of the path Tp5. The path Tp1 is a path along which the substrate P moves in the −Y direction. The path Tp3 is a path along which the substrate P moves in the + Y direction. The path Tp5 is a path along which the substrate P moves in the −Y direction. The path Tp2 and the path Tp4 are paths along which the substrate P moves in a direction whose main component is the −X direction.

  When the substrate P moves along the path Tp1 in the state where the immersion spaces LS1 and LS2 are formed, the exposure light EL is irradiated to the shot region Sa via the liquid LQ in the immersion space LS1. When the substrate P moves along the path Tp3 in a state where the immersion spaces LS1 and LS2 are formed, the exposure light EL is irradiated to the shot region Sb through the liquid LQ in the immersion space LS1. When the substrate P moves along the path Tp5 in the state in which the immersion spaces LS1 and LS2 are formed, the exposure light EL is irradiated to the shot region Sc through the liquid LQ in the immersion space LS1. When the substrate P moves along the path Tp2 and the path Tp4, the exposure light EL is not irradiated.

 Each of the movement of the substrate P along the path Tp1, the movement along the path Tp3, and the movement along the path Tp5 includes a scanning movement operation. Each of the operation of moving the substrate P along the path Tp2 and the operation of moving along the path Tp4 includes a step movement operation.

  That is, each of the period during which the substrate P moves along the path Tp1, the period during which the path Tp3 moves, and the period during which the substrate P moves along the path Tp5 is a scan movement period (exposure period). Each of the period during which the substrate P moves along the path Tp2 and the period during which the substrate P moves along the path Tp4 is a step movement period.

 9 and 10 are schematic diagrams illustrating an example of the operation of the second member 22 when the shot areas Sa, Sb, and Sc are exposed. 9 and 10 are views of the second member 22 as viewed from above.

 When the substrate P is at the position d1, as shown in FIG. 9A, the second member 22 is disposed at the position Js with respect to the projection region PR (the optical path AT of the exposure light EL).

 When the substrate P is at the position d2, as shown in FIG. 9B, the second member 22 is disposed at the position Jr with respect to the projection region PR (the optical path AT of the exposure light EL). That is, during the scan movement operation from the position d1 to the position d2 of the substrate P, the second member 22 moves in the + X direction opposite to the step movement direction (−X direction) of the substrate P. During the scanning movement operation of the substrate P from the position d1 to the position d2, the second member 22 moves from the position Js to the position Jr through the position Jsm, the position Jm, and the position Jrm. In other words, when the substrate P moves along the path Tp1, the second member 22 moves in the + X direction so as to change from the state shown in FIG. 9A to the state shown in FIG. 9B.

 When the substrate P is at the position d2.5, as shown in FIG. 9C, the second member 22 is disposed at the position Jm with respect to the projection region PR (the optical path AT of the exposure light EL).

 When the substrate P is at the position d3, as shown in FIG. 9D, the second member 22 is disposed at the position Js with respect to the projection region PR (the optical path AT of the exposure light EL). That is, during the step movement operation from the position d2 to the position d3 of the substrate P, the second member 22 moves in the −X direction, which is the same as the step movement direction (−X direction) of the substrate P. During the step movement operation of the substrate P from the position d2 to the position d3, the second member 22 moves from the position Jr to the position Jm via the position Jrm, the position Jm, and the position Jsm. In other words, when the substrate P moves along the path Tp2, the second member 22 changes from the state shown in FIG. 9B to the state shown in FIG. 9D through the state shown in FIG. 9C. Move in the -X direction.

 When the substrate P is at the position d4, as shown in FIG. 10A, the second member 22 is disposed at the position Jr with respect to the projection region PR (the optical path AT of the exposure light EL). In other words, during the scan movement operation from the position d3 to the position d4 of the substrate P, the second member 22 moves in the + X direction opposite to the step movement direction (−X direction) of the substrate P. During the scan movement operation of the substrate P from the position d3 to the position d4, the second member 22 moves from the position Js to the position Jr through the position Jsm, the position Jm, and the position Jrm. In other words, when the substrate P moves along the path Tp3, the second member 22 moves in the + X direction so as to change from the state shown in FIG. 9D to the state shown in FIG.

 When the substrate P is at the position d4.5, as shown in FIG. 10B, the second member 22 is disposed at the position Jm with respect to the projection region PR (the optical path AT of the exposure light EL).

 When the substrate P is at the position d5, as shown in FIG. 10C, the second member 22 is disposed at the position Js with respect to the projection region PR (the optical path AT of the exposure light EL). That is, during the step movement operation from the position d4 to the position d5 of the substrate P, the second member 22 moves in the −X direction, which is the same as the step movement direction (−X direction) of the substrate P. During the step movement operation of the substrate P from the position d4 to the position d5, the second member 22 moves from the position Jr to the position Jm through the position Jrm, the position Jm, and the position Jsm. In other words, when the substrate P moves along the path Tp4, the second member 22 changes from the state shown in FIG. 10A to the state shown in FIG. 10C through the state shown in FIG. 10B. Move in the -X direction.

 When the substrate P is at the position d6, as shown in FIG. 10D, the second member 22 is disposed at the position Jr with respect to the projection region PR (the optical path AT of the exposure light EL). That is, during the scanning operation movement from the position d5 to the position d6 of the substrate P, the second member 22 moves in the + X direction opposite to the step movement direction (−X direction) of the substrate P. During the scanning movement operation of the substrate P from the position d5 to the position d6, the second member 22 moves from the position Js to the position Jr through the position Jsm, the position Jm, and the position Jrm. In other words, when the substrate P moves along the path Tp5, the second member 22 moves in the + X direction so as to change from the state shown in FIG. 10C to the state shown in FIG.

  That is, in the present embodiment, the second member 22 moves in the −X direction so that the relative movement with the substrate P becomes small in at least a part of the period in which the substrate P moves along the path Tp2. In other words, the second member 22 has the −X direction so that the relative speed with respect to the X axis direction becomes small during at least part of the period during which the substrate P includes the −X direction component during the step movement operation. Move to. Similarly, the second member 22 moves in the −X direction so that the relative speed with respect to the substrate P in the X-axis direction becomes small during at least a part of the period in which the substrate P moves along the path Tp4.

  In the present embodiment, the second member 22 moves in the + X direction at least during a period in which the substrate P moves along the path Tp3. Thereby, after the movement of the path Tp3 of the substrate P, the exposure light EL can pass through the openings 34 and 35 even if the second member 22 moves in the −X direction in the movement of the path Tp4. Contact with the second member 22 is suppressed. The same applies when the substrate P moves along the paths Tp1 and Tp5.

 That is, when the substrate P repeats the scan movement operation and the step movement operation including the component in the −X direction, the second member 22 is moved from the position Jr so that the relative speed with respect to the substrate P decreases during the step movement operation. The second member 22 returns from the position Js to the position Jr so that the second member 22 can move again in the −X direction in the next step movement operation during the scan movement operation. That is, since the second member 22 moves in the + X direction during at least a part of the period during which the substrate P performs the scanning movement operation, the size of the second opening 28 is minimized, and the first member 21 and the second member Contact with the member 22 is suppressed.

  In the present embodiment, even when the second member 22 is disposed at the first end position Jr (second end position Js), at least a part of the liquid recovery unit 27 faces the substrate P (object). Keep doing. Thereby, for example, in the step movement operation, the liquid recovery unit 43 can recover the liquid LQ on the substrate P (object).

 In the example described with reference to FIGS. 9 and 10, the second member 22 is disposed at the second end position Js when the substrate P is at the positions d1, d3, and d5. When the substrate P is at the positions d1, d3, and d5, the second member 22 may be disposed at the central position Jm, or at the position Jsm between the central position Jm and the second end position Js. May be.

 In the example described with reference to FIGS. 9 and 10, the second member 22 is disposed at the first end position Jr when the substrate P is at the positions d2, d4, and d6. When the substrate P is at the positions d2, d4, and d6, the second member 22 may be disposed at the central position Jm or at a position Jrm between the central position Jm and the first end position Jr. May be.

  Further, when the substrate P is at the positions d2.5 and d4.5, the second member 22 may be disposed at a position different from the central position Jm. That is, when the board | substrate P exists in position d2.5, d4.5, the 2nd member 22 may be arrange | positioned at the position Jsm between the center position Jm and the 2nd edge part position Js, for example, It may be arranged at a position Jrm between the position Jm and the first end position Jr.

 Note that the second member 22 may stop or move in the same −X direction as the step movement direction (−X direction) of the substrate P in at least a part of the scan movement period of the substrate P. .

 Note that the second member 22 may stop during at least a part of the step movement period of the substrate P or move in the −X direction opposite to the step movement direction (−X direction) of the substrate P. Also good.

  That is, in a part of the movement period of the substrate P (scan movement period and step movement period), the second member 22 has a relative speed between the substrate P (object) and the first member 21 and the substrate P (object). It may move so as to be smaller than the relative speed, and may stop during a part of the movement period of the substrate P or move so as to increase the relative speed.

  As described above, in the present embodiment, one or both of the second member 22 and the substrate P (object) are moved while the immersion space LS1 is formed. According to the present embodiment, even when the substrate P (object) moves at high speed in the XY plane in a state where the immersion space LS1 is formed, at least one of the periods during which the substrate P (object) moves. In the portion, the second member 22 moves so that the relative movement (relative speed, relative acceleration) with respect to the substrate P (object) becomes small. As a result, the liquid LQ is prevented from flowing out from the space between the first liquid immersion member 500 and the object, or the liquid LQ is left on the object.

  In the present embodiment, the immersion space LS2 is formed by the second immersion member 600. In the present embodiment, in the state in which the immersion space LS1 is formed, at least part of the period during which one or both of the second member 22 and the substrate P (object) are moved, outside the immersion space LS1. The immersion space LS2 is formed.

 Therefore, as shown in FIG. 11, even if the liquid LQ flows out of the space between the first liquid immersion member 500 and the substrate P (object), the liquid LQ is captured in the liquid immersion space LS2. Thereby, the outflow of the liquid LQ to the outside of the space SP4 is suppressed.

  That is, the second liquid immersion member 600 is immersed in such a manner that at least a part of the liquid LQ flowing out from the space between the first liquid immersion member 500 and the substrate P (object) is captured in the liquid immersion space LS2. A space LS2 is formed.

 The liquid immersion space LS2 stops the liquid LQ that has leaked from the space between the first liquid immersion member 500 (second member 22) and the substrate P (object) without being completely recovered by the liquid recovery unit 27. The liquid LQ that flows out of the space between the first immersion member 500 (second member 22) and the substrate P (object) is integrated with the liquid LQ in the immersion space LS2 in the space SP4. Further, the liquid LQ that has flowed outside the space between the first liquid immersion member 500 (second member 22) and the substrate P (object) is recovered from the liquid recovery part 44 of the second liquid immersion member 600. The liquid recovery unit 44 recovers the liquid LQ that has flowed out of the space between the first liquid immersion member 500 (second member 22) and the substrate P (object) together with the liquid LQ in the liquid immersion space LS2.

  In the present embodiment, the immersion space LS2 is smaller than the immersion space LS1. Therefore, the substrate P (object) satisfies a predetermined permissible condition for maintaining the immersion space LS1 of the liquid LQ in the space between the first immersion member 500 (second member 22) and the substrate P (object). Even when moving in the XY plane under no conditions, the liquid LQ in the immersion space LS2 is suppressed from flowing out of the space SP4.

 As described above, according to the present embodiment, the first liquid immersion member 500 includes the first member 21 and the second member 22 that is movable at least partially below the first member 21. Even if the substrate P (object) moves at high speed in the XY plane in the state where the immersion space LS1 is formed, for example, the liquid LQ flows out of the space between the first immersion member 500 and the object, It is possible to prevent the liquid LQ from remaining on the substrate P (object). In addition, generation of bubbles (gas portion) in the liquid LQ in the immersion space LS1 is also suppressed.

  That is, in the present embodiment, the liquid immersion space LS1 is formed by moving the second member 22 so that the relative movement (relative speed, relative acceleration) with respect to the substrate P (object) becomes small. Even if the substrate P (object) moves at a high speed, the liquid LQ can be prevented from flowing out, the liquid LQ remaining on the substrate P (object), or the generation of bubbles in the liquid LQ.

  In the present embodiment, since the second liquid immersion member 600 that forms the liquid immersion space LS2 apart from the liquid immersion space LS1 is provided in at least a part of the periphery of the liquid immersion space LS1, the first liquid immersion member Even if the liquid LQ flows out from a space (for example, the second space SP2) between the substrate 500 (the object) and the substrate P (object), the liquid LQ that has flowed out can be captured in the immersion space LS2.

 Therefore, the occurrence of defective exposure and the occurrence of defective devices can be suppressed.

Second Embodiment
A second embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 12 shows an example of the operation of the second liquid immersion member 600 according to this embodiment. As shown in FIG. 12, the second immersion member 600 may move in the Z-axis direction in the state where the immersion space LS2 is formed. As the second liquid immersion member 600 moves in the Z-axis direction, the dimension (distance) in the Z-axis direction of the gap between the lower surface 41 of the second liquid immersion member 600 and the upper surface of the substrate P (object) changes. When the immersion space LS2 is formed, the dimension (distance) in the Z-axis direction of the gap between the lower surface 41 of the second immersion member 600 and the upper surface of the substrate P (object) changes. The pressure of the liquid LQ of LS2 changes. When the dimension (distance) in the Z-axis direction of the gap between the lower surface 41 of the second immersion member 600 and the upper surface of the substrate P (object) decreases, the pressure of the liquid LQ in the immersion space LS2 increases. When the dimension (distance) in the Z-axis direction of the gap between the lower surface 41 of the second immersion member 600 and the upper surface of the substrate P (object) increases, the pressure of the liquid LQ in the immersion space LS2 decreases.

 The control device 6 can adjust the pressure of the liquid LQ in the immersion space LS2 by controlling the drive device 42 and moving the second immersion member 600 in the Z-axis direction. When increasing the pressure of the liquid LQ in the immersion space LS2, the control device 6 reduces the dimension (distance) of the gap between the lower surface 41 of the second immersion member 600 and the upper surface of the substrate P (object). The position of the second liquid immersion member 600 with respect to the Z-axis direction is adjusted. When the pressure of the liquid LQ in the liquid immersion space LS2 is low, the control device 6 increases the dimension (distance) of the gap between the lower surface 41 of the second liquid immersion member 600 and the upper surface of the substrate P (object). The position of the second immersion member 600 in the axial direction is adjusted.

  The control device 6 may adjust the position of the second liquid immersion member 600 in the Z-axis direction (distance between the lower surface 41 and the upper surface of the object) based on, for example, the moving condition of the substrate P (object).

 For example, when the substrate P (object) moves at a high speed in the state where the immersion space LS2 is formed between the second immersion member 22 and the substrate P (object), the control device 6 performs the second operation. The position of the second liquid immersion member 600 in the Z-axis direction may be adjusted so that the distance between the lower surface 41 of the liquid immersion member 600 and the upper surface of the substrate P (object) is reduced. This suppresses the liquid LQ from flowing out of the space SP4.

 Further, the position of the second liquid immersion member 600 in the Z-axis direction is adjusted so that the distance between the lower surface 41 of the second liquid immersion member 600 and the upper surface of the substrate P (object) is increased. The liquid LQ that has flowed out of the space between the immersion member 500 and the substrate P (object) can be smoothly captured in the immersion space LS2. For example, when there is a possibility that the liquid (liquid droplet) LQ having a large size may move (leak) outward from the second space SP2 between the first liquid immersion member 500 and the substrate P (object). By increasing the distance between the lower surface 41 of the liquid immersion member 600 and the upper surface of the substrate P (object), the leaked liquid (droplet) LQ is suppressed from colliding with the outer surface of the second liquid member 600. Thereby, the leaked liquid (droplet) LQ can be smoothly captured in the immersion space LS2. Further, when the second liquid immersion member 600 and the substrate P (object) relatively move in the XY plane, the distance between the lower surface 41 of the second liquid immersion member 600 and the upper surface of the substrate P (object) is increased. This suppresses an increase in the velocity gradient (shear stress) of the liquid LQ in the space SP4. That is, the force exerted by the liquid LQ on the second liquid immersion member 600 and the substrate P (object) is suppressed. Therefore, the second liquid immersion member 600 and the substrate P (object) can smoothly move relative to each other in the XY plane.

  In addition, the control device 6 uses, for example, the second liquid in the Z-axis direction based on the condition of the upper surface of the object that contacts the liquid LQ in the immersion space LS2 (upper surface structure, shape, contact angle of the upper surface with respect to the liquid LQ, etc. The position of the immersion member 600 (the distance between the lower surface 41 and the upper surface of the object) may be adjusted.

 For example, when a groove (gap) is formed in the object, or when the upper surface of the object is lyophilic with respect to the liquid LQ (when the contact angle is small), the control device 6 uses the second immersion member 600. The position of the second liquid immersion member 600 in the Z-axis direction may be adjusted so that the distance between the lower surface 41 of the substrate and the upper surface of the substrate P (object) becomes small. This suppresses the liquid LQ from flowing out of the space SP4.

  As described above, also in this embodiment, the liquid LQ flowing out from the space LQ between the first liquid immersion member 500 and the substrate P (object) can be captured in the liquid immersion space LS2. Moreover, the outflow of the liquid LQ from the space SP4 can also be suppressed. Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

  In the present embodiment, the control device 6 may adjust the position of the second liquid immersion member 600 in the XY plane based on, for example, the moving condition of the substrate P (object), or the first in the XY plane. The two-immersion member 600 may be moved.

<Third Embodiment>
A third embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 13 is a diagram illustrating an example of the operation of the second liquid immersion member 600 according to the present embodiment. FIG. 13 is a view of the first and second liquid immersion members 500 and 600 viewed from the lower surface side.

 In the present embodiment, an example in which the second liquid immersion member 600 moves in the XY plane will be described.

 Similar to the above-described embodiment, one or both of the second member 22 and the substrate P (object) are moved while the immersion space LS1 is formed. The immersion space LS2 is formed in at least a part of a period during which one or both of the second member 22 and the substrate P (object) are moved.

  In the state in which the immersion space LS1 is formed, the second immersion member 600 has at least a part of the liquid LQ flowing out from the space between the first immersion member 500 and the substrate P (object) as the immersion space. An immersion space LS2 is formed so as to be captured by LS2.

 In the present embodiment, the formation condition of the immersion space LS2 is determined based on one or both of the movement condition of the second member 22 and the movement condition of the substrate P (object).

  The movement condition of the second member 22 includes at least one of the movement speed, acceleration, movement direction, movement distance, and movement locus of the second member 22 in the XY plane.

  The movement condition of the substrate P (object) includes at least one of the movement speed, acceleration, movement direction, movement distance, and movement locus in the XY plane of the substrate P (object).

 The formation condition of the immersion space LS2 includes at least one of the formation position, formation range, and presence / absence of the formation of the immersion space LS2.

  For example, when the second member 22 and the substrate P (object) are stationary, the liquid LQ flows from the space between the first liquid immersion member 500 and the substrate P (object) as shown in FIG. Does not leak. The second liquid immersion member 600 is disposed at the reference position.

  For example, when the second member 22 moves in the + Y direction while moving in the −X direction while the substrate P is stationary, as shown in FIG. 13B, the immersion space LS1 is in the XY plane. , Move to the + X side and the −Y side with respect to the center of the second member 22. That is, the second member 22 and the immersion space LS1 relatively move so that the interface LG2 of the liquid LQ approaches the + X side and −Y side edges of the second member 22. In other words, the second member 22 and the immersion space LS1 relatively move so that the liquid LQ flows out from the + X side and −Y side edges of the second member 22. Further, for example, when the substrate P (object) moves in the -Y direction while moving in the + X direction while the second member 22 is stationary, as shown in FIG. The relative position of 22 and the immersion space LS1 changes.

  For example, when the second member 22 moves in the −Y direction while moving in the + X direction while the substrate P is stationary, as shown in FIG. 13C, the immersion space in the XY plane. LS1 moves to the −X side and the + Y side with respect to the center of the second member 22. That is, the second member 22 and the immersion space LS1 relatively move so that the interface LG2 of the liquid LQ approaches the −X side and + Y side edges of the second member 22. In other words, the second member 22 and the immersion space LS1 move relative to each other so that the liquid LQ flows out from the −X side and + Y side edges of the second member 22. Further, for example, when the substrate P (object) moves in the + Y direction while moving in the −X direction while the second member 22 is stationary, as shown in FIG. The relative position of 22 and the immersion space LS1 changes.

  That is, based on the moving direction of the second member 22 in the XY plane, at least one of the outflow position and the outflow direction of the liquid LQ from the space between the first liquid immersion member 500 and the substrate P (object) changes. . Further, at least one of the outflow position and the outflow direction of the liquid LQ from the space between the first liquid immersion member 500 and the substrate P (object) changes based on the moving direction of the substrate P (object) in the XY plane. To do.

  Further, at least one of the outflow position and the outflow direction of the liquid LQ from the space between the first liquid immersion member 500 and the substrate P (object) changes based on the movement locus of the second member 22 in the XY plane. . Further, at least one of the outflow position and the outflow direction of the liquid LQ from the space between the first liquid immersion member 500 and the substrate P (object) changes based on the movement locus of the substrate P (object) in the XY plane. To do.

 Further, the outflow position, outflow direction, and outflow amount of the liquid LQ from the space between the first liquid immersion member 500 and the substrate P (object) based on the moving speed or acceleration of the second member 22 in the XY plane. At least one of them changes. Further, the outflow position, outflow direction, and outflow of the liquid LQ from the space between the first liquid immersion member 500 and the substrate P (object) based on the moving speed or acceleration of the substrate P (object) in the XY plane. At least one of the quantities varies.

 That is, the outflow position of the liquid LQ from the space between the first liquid immersion member 500 and the substrate P (object) based on one or both of the movement condition of the second member 22 and the movement condition of the substrate P (object). At least one of the outflow direction and the outflow amount is determined.

  Therefore, the control device 6 determines whether or not the space from the space between the first immersion member 500 and the substrate P (object) is based on one or both of the movement condition of the second member 22 and the movement condition of the substrate P (object). At least one of the outflow position, outflow direction, and outflow amount of the liquid LQ can be estimated (estimated).

 The movement condition of the second member 22 and the movement condition of the substrate P (object) are defined by the exposure recipe (exposure control information). That is, the movement condition of the second member 22 and the movement condition of the substrate P (object) are known information. Therefore, the control device 6 determines whether the first immersion member 500 and the substrate P (object) are based on one or both of the movement conditions of the second member 22 and the movement conditions of the substrate P (object), which are known information. At least one of the outflow position, outflow direction, and outflow amount of the liquid LQ from the space between them can be estimated (estimated).

 At least one of the outflow position, outflow direction, and outflow amount of the liquid LQ based on one or both of the movement condition of the second member 22 and the movement condition of the substrate P (object) can be obtained using, for example, simulation. It can also be obtained by experiment. That is, the relationship between one or both of the movement condition of the second member 22 and the movement condition of the substrate P (object) and at least one of the outflow position, outflow direction, and outflow amount of the liquid LQ is determined in advance by simulation or experiment. Can be sought. The information is stored in the storage device 7. The control device 6 determines the first immersion member 500 and the substrate based on the information in the storage device 7 and one or both of the movement condition of the second member 22 and the movement condition of the substrate P (object) determined by the exposure recipe. At least one of the outflow position, outflow direction, and outflow amount of the liquid LQ from the space with P (object) can be obtained (estimated).

  The control device 6 uses the liquid from the space between the first immersion member 500 and the substrate P (object), which is inferred from one or both of the movement condition of the second member 22 and the movement condition of the substrate P (object). The formation condition of the immersion space LS2 is determined based on information on at least one of the LQ outflow position, outflow direction, and outflow amount.

  For example, as shown in FIG. 13B, one or both of the second member 22 and the substrate P (object) move so that the liquid LQ flows out from the + X side and −Y side edges of the second member 22. In this case, the control device 6 determines the conditions for forming the immersion space LS2 such that the flowing liquid LQ is captured in the immersion space LS2.

 In the example shown in FIG. 13B, the second immersion member 600 moves in the XY plane so that the immersion space LS2 is formed at the + X side and −Y side edges of the second member 22. The second immersion member 600 moves so as to capture the liquid LQ flowing out from the space between the first immersion member 500 and the substrate P (object) in the immersion space LS2. The position of the second immersion member 600 is determined so that the liquid LQ flowing out from the + X side and −Y side edges of the second member 22 is captured in the immersion space LS2.

  Further, as shown in FIG. 13C, one or both of the second member 22 and the substrate P (object) move so that the liquid LQ flows out from the −X side and + Y side edges of the second member 22. In this case, the control device 6 determines the conditions for forming the immersion space LS2 such that the flowing liquid LQ is captured in the immersion space LS2.

 In the example shown in FIG. 13C, the second liquid immersion member 600 moves in the XY plane so that the liquid immersion space LS <b> 2 is formed at the −X side and + Y side edges of the second member 22. The second immersion member 600 moves so as to capture the liquid LQ flowing out from the space between the first immersion member 500 and the substrate P (object) in the immersion space LS2. The position of the second liquid immersion member 600 is determined so that the liquid LQ flowing out from the −X side and + Y side edges of the second member 22 is captured in the liquid immersion space LS2.

 Thereby, even if the liquid LQ flows out of the space between the first liquid immersion member 500 and the substrate P (object), the liquid LQ that has flowed out is captured in the liquid immersion space LS2.

  The example in which the formation position of the immersion space LS2 is determined so that the liquid LQ flowing out from the space between the first immersion member 500 and the substrate P (object) is captured in the immersion space LS2 has been described above. .

  The control device 6 may determine the formation range of the immersion space LS2 so that the liquid LQ flowing out from the space between the first immersion member 500 and the substrate P (object) is captured in the immersion space LS2. Good.

 For example, the immersion space LS2 may be increased by increasing the supply amount of the liquid LQ from the liquid supply unit 43. The amount of liquid LQ recovered from the liquid recovery unit 44 may be reduced to increase the immersion space LS2. Thereby, the formation range of the immersion space LS2 is increased.

 Further, the liquid LQ supply amount from the liquid supply unit 43 may be reduced to reduce the immersion space LS2. The amount of liquid LQ recovered from the liquid recovery unit 44 may be increased to reduce the immersion space LS2. Thereby, the formation range of the immersion space LS2 is reduced.

 Alternatively, the plurality of second liquid immersion members 600 may be arranged adjacent to each other, and the plurality of second liquid immersion members 600 may form the liquid immersion space LS2. Thereby, the formation range of the immersion space LS2 is increased.

  Further, the control device 6 determines whether or not the immersion space LS2 is formed so that the liquid LQ flowing out from the space between the first immersion member 500 and the substrate P (object) is captured in the immersion space LS2. It may be determined.

  For example, as shown in FIG. 13B, when the liquid LQ flows out from the + X side and −Y side edges of the second member 22, the edge of the plurality (two) of second liquid immersion members 600. The liquid immersion space LS <b> 2 may be formed by a part of the second liquid immersion member 600 arranged in the area, and the liquid immersion space LS <b> 2 may not be formed in the part of the second liquid immersion member 600.

  As described above, also in this embodiment, the outflow of the liquid LQ can be suppressed. Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

<Fourth embodiment>
A fourth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 14 is a diagram illustrating an example of the operation of the second liquid immersion member 600 according to the present embodiment. FIG. 14 is a view of the first and second liquid immersion members 500 and 600 viewed from the lower surface side.

 The second immersion member 600 may form the immersion space LS2 so that the liquid LQ existing on the upper surface of the substrate P (object) is captured by the immersion space LS2 outside the immersion space LS1. . The second immersion member 600 may move outside the immersion space LS1 so as to capture the liquid LQ present on the upper surface of the substrate P (object) in the immersion space LS2.

 For example, as shown in FIG. 14, the liquid LQ may remain on the upper surface of the substrate P (object) away from the immersion space LS1. For example, a drop of liquid LQ may exist (residual) on the upper surface of the substrate P (object). The control device 6 may move the second immersion member 600 in order to capture (remove) the liquid LQ present on the upper surface of the substrate P (object) in the immersion space LS2.

  The control device 6 determines the movement conditions of the second member 22 and the substrate P (object) so that the liquid LQ existing on the upper surface of the substrate P (object) is captured by the immersion space LS2 outside the immersion space LS1. The formation conditions of the immersion space LS2 may be determined based on one or both of the movement conditions. The control device 6 separates the liquid LQ existing on the upper surface of the substrate P (object) away from the immersion space LS1, which is estimated from one or both of the movement condition of the second member 22 and the movement condition of the substrate P (object). The formation conditions of the immersion space LS2 may be determined based on the information regarding the position of the liquid immersion space LS2.

  That is, the control device 6 determines the second immersion member 600 based on the information regarding the position of the remaining liquid LQ, which is estimated from one or both of the movement condition of the second member 22 and the movement condition of the substrate P (object). The position of the second liquid immersion member 600 may be determined.

 Information on the remaining position of the liquid LQ based on one or both of the moving condition of the second member 22 and the moving condition of the substrate P (object) can be obtained by, for example, preliminary experiments or simulations. By storing the information in the storage device 7, the control device 6 controls the second immersion member 600 based on the information in the storage device 7 so that the liquid LQ is captured in the immersion space LS2. The position of the second liquid immersion member 600 can be determined. Thereby, the residue and outflow of the liquid LQ are suppressed.

  Further, the control device 6 may determine the formation range of the immersion space LS2 so that the liquid LQ remaining on the substrate P (object) is captured in the immersion space LS2, or the formation of the immersion space LS2. The presence or absence of may be determined.

  As described above, in the present embodiment, the liquid LQ existing (residual) on the substrate P (object) can be captured. Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

  In the present embodiment, a detection device that detects the liquid LQ that has flowed out of the space between the first liquid immersion member 500 and the substrate P (object) may be provided. For example, the detection device is disposed around the first liquid immersion member 500 and emits detection light toward the substrate (object), and a light receiving unit that receives the detection light reflected by the substrate P (object). And may be provided. The detection device can detect whether or not the liquid LQ has flowed out of the space between the first liquid immersion member 500 and the substrate P (object) based on the change in the amount of light received by the light receiving unit. The control device 6 can acquire information on at least one of the position and direction in which the liquid LQ flows out from the space between the first liquid immersion member 500 and the substrate P (object) based on the detection result of the detection device. is there.

  Based on the detection result of the detection device, the control device 6 is configured so that the liquid LQ flowing out from the space between the first liquid immersion member 500 and the substrate P (object) is captured in the liquid immersion space LS2. The two-immersion member 600 is moved. This suppresses the liquid LQ from remaining on the substrate P (object).

  Further, the control device 6 may detect the liquid LQ existing (residual) on the upper surface of the substrate P (object) away from the immersion space LS1 by the detection device. Also in this case, the control device 6 captures the liquid LQ existing (residual) on the upper surface of the substrate P (object) away from the immersion space LS1 in the immersion space LS2 based on the detection result of the detection device. As described above, the second liquid immersion member 600 can be moved.

  In the first to fourth embodiments described above, as shown in FIG. 15, four second liquid immersion members 600 may be arranged in the space around the first liquid immersion space 500. In the space around the first liquid immersion member 500, three second liquid immersion members 600 may be arranged, any number of five or more may be arranged, or only one is arranged. May be.

<Fifth Embodiment>
A fifth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

 FIG. 16 is a cross-sectional view parallel to the YZ plane of the first liquid immersion member 500B and the second liquid immersion member 600 according to this embodiment. FIG. 17 is a cross-sectional view of the first liquid immersion member 500B and the second liquid immersion member 600 parallel to the XZ plane. FIG. 18 is an enlarged view of a part of FIG. FIG. 19 is a view of the first liquid immersion member 500B and the second liquid immersion member 600 as viewed from the lower side (−Z side). FIG. 20 is a perspective view of the first liquid immersion member 500B.

  The liquid immersion member 500B is disposed in at least a part of the periphery of the optical path K of the exposure light EL below the first member 210 and the first member 210 disposed in the periphery of the terminal optical element 13. A second member 220 movable with respect to the one member 210, a liquid supply unit 330 capable of supplying the liquid LQ for forming the immersion space LS1, and a liquid recovery unit 230 capable of recovering the liquid LQ are provided. .

 The first member 210 is an annular member disposed around the terminal optical element 13. The second member 220 is an annular member disposed around the optical path K of the exposure light EL. The first member 210 has an opening 340 through which the exposure light EL from the emission surface 12 can pass. The second member 220 has an opening 350 through which the exposure light EL from the emission surface 12 can pass.

  The first member 210 has a lower surface 240 facing the −Z direction. The second member 220 has an upper surface 250 facing the + Z direction and a lower surface 260 facing the −Z direction. The substrate P (object) can face the lower surface 260. The upper surface 250 faces the lower surface 240 with a gap. In the present embodiment, at least a part of the upper surface 250 faces the emission surface 12 with a gap. Note that the upper surface 250 may not face the emission surface 12.

 The liquid supply unit 330 is disposed inside the liquid recovery unit 230 with respect to the radial direction with respect to the optical axis AX (optical path K) of the last optical element 13. The liquid supply unit 330 is disposed on the first member 210. In the present embodiment, the liquid supply unit 330 includes an opening (liquid supply port) disposed in the first member 210.

 In the present embodiment, the liquid supply part 330 (liquid supply port) is disposed so as to face the outer surface 13F. The liquid supply unit 330 supplies the liquid LQ to the third space SP3. The liquid supply unit 330 may be disposed on the second member 220, or may be disposed on both the first member 210 and the second member 220.

 In the present embodiment, the liquid recovery unit 230 is disposed on the first member 210. The liquid recovery unit 230 includes an opening (liquid recovery port) disposed in the first member 210.

  The lower surface 240 includes a non-recovery region where the liquid LQ cannot be recovered and a recovery region which is disposed outside the non-recovery region with respect to the radial direction with respect to the optical axis AX (optical path K) and can recover the liquid LQ. The recovery area of the lower surface 240 includes the liquid recovery unit 230.

 The substrate P (object) can face at least a part of the liquid recovery unit 230. At least a part of the second member 220 faces the liquid recovery unit 230.

 The liquid recovery unit 230 can recover at least a part of the liquid LQ from the first space SP1 that the upper surface 250 faces and the second space SP2 that the lower surface 260 faces. The first space SP1 includes a space between the lower surface 240 and the upper surface 250. The second space SP2 includes a space between the lower surface 260 and the upper surface of the substrate P (object).

 Note that the second member 220 may not face the liquid recovery unit 230. Note that the liquid recovery unit 230 may be disposed on a member different from the first member 210 and the second member 220.

 In the present embodiment, the liquid recovery unit 230 includes a porous member 380. The liquid LQ on the substrate P (object) is collected through the holes of the porous member 380. The hole (opening) of the porous member 380 functions as an opening (liquid recovery port) for recovering the liquid LQ. In the present embodiment, the porous member 380 includes a mesh plate.

  In parallel with the supply operation of the liquid LQ from the liquid supply unit 330, the recovery operation of the liquid LQ from the liquid recovery unit 230 is executed, so that the terminal optical element 13 and the liquid immersion member 500B on one side and the other side A liquid immersion space LS1 is formed between the substrate P (object) and the liquid LQ.

  The second member 220 is moved by the driving device 270. The driving device 270 includes, for example, a motor, and moves the second member 220 using Lorentz force. The driving device 270 moves the second member 220 at least in the X-axis direction. The driving device 270 may move the second member 220 in six directions of the X axis, the Y axis, the Z axis, θX, θY, and θZ.

  In the present embodiment, the support member 280 is connected to at least a part of the second member 220. In the present embodiment, the driving device 270 moves the support member 280. When the support member 280 is moved by the driving device 270, the second member 220 is moved.

 In the present embodiment, the support member 280 is disposed on each of the + Y side and the −Y side with respect to the optical path K (the optical axis AX of the terminal optical element 13).

 The arrangement of the plurality of support members 280 is not limited to the + Y side and the −Y side. For example, it may be arranged on each of the + X side and the −X side, or may be arranged on each of the + Y side, the −Y side, the + X side, and the −X side.

  In the present embodiment, the first member 210 has an inner surface 300 that faces the outer surface 13F of the last optical element 13, and an upper surface 310 that is disposed around the upper end of the inner surface 300.

  In the present embodiment, the plurality of support members 280 are movably disposed in the plurality of holes 320 provided in the first member 210. In the present embodiment, holes 320 are provided on the + Y side and the −Y side with respect to the optical path K, respectively. Each of the holes 320 penetrates the first member 210 so as to connect the upper space and the lower space of the first member 210 in the Z-axis direction. The space above the first member 210 includes a third space SP3 between the last optical element 13 and the first member 210. The space below the first member 210 includes a first space SP <b> 1 between the first member 210 and the second member 220. The space below the first member 210 may include a second space SP2 between the second member 220 and the substrate P (object).

 In the present embodiment, each of the holes 320 is formed so as to connect the inner surface 300 of the first member 210 and the lower surface 240 (non-recovery region of the lower surface 240). As shown in FIG. 20, each of the holes 320 extends in the X-axis direction, and the support member 280 disposed in the hole 320 is movable in the X-axis direction. When the support member 280 is moved in the X-axis direction by the driving device 270, the second member 220 is moved in the X-axis direction.

 Note that at least one of the holes 320 in which the support member 280 is disposed may be formed so as to connect the upper surface 310 and the lower surface 240 of the first member 210.

  In the present embodiment, the second member 220 and the support member 280 do not contact the first member 210. A gap is formed between the first member 210 and the second member 220, and a gap is formed between the first member 210 and the support member 280. The driving device 270 can move the second member 220 and the support member 280 so that the second member 220 and the support member 280 do not contact the first member 210.

  The second liquid immersion member 600 is disposed in a space around the first liquid immersion member 500B. As shown in FIG. 19, in the present embodiment, four second liquid immersion members 600 are arranged in a space around the first liquid immersion member 500B. Note that one, two, or three second liquid immersion members 600 may be disposed in the space around the first liquid immersion member 500B, or any number of five or more may be disposed. .

  Similar to the above-described embodiment, the second liquid immersion member 600 is movable. Since the second liquid immersion member 600 has been described in the above-described embodiment, the description thereof is omitted.

  Also in this embodiment, the liquid immersion space LS2 formed by the second liquid immersion member 600 can capture the liquid LQ that has flowed out of the space between the first liquid immersion member 500B and the substrate P (object). . Further, the immersion space LS2 can capture the liquid LQ existing (residual) on the substrate P (object). Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

  In the first to fifth embodiments described above, the liquid LQ in the immersion space LS1 and the immersion space LS2 are the same type of liquid. The liquid forming the immersion space LS2 may be of a different type from the liquid forming the immersion space LS1. That is, the liquid supplied from the liquid supply unit 31 of the first liquid immersion member 500 and the liquid supplied from the liquid recovery unit 43 of the second liquid immersion member 600 may be the same type of liquid or different types of liquid. It may be liquid.

  The cleanliness of the liquid forming the immersion space LS1 and the cleanliness of the liquid forming the immersion space LS2 may be the same or different. For example, the cleanness of the liquid LQ supplied from the liquid supply unit 43 of the second liquid immersion member 600 may be lower than the cleanness of the liquid LQ supplied from the liquid supply unit 31 of the first liquid immersion member 500. . In this case, the liquid supplied from the liquid supply unit 43 and the liquid supplied from the liquid supply unit 31 may be the same type of liquid or different types of liquid.

  The temperature of the liquid forming the immersion space LS1 and the temperature of the liquid forming the immersion space LS2 may be the same or different. For example, the temperature of the liquid LQ supplied from the liquid supply unit 43 of the second liquid immersion member 600 may be lower than the temperature of the liquid LQ supplied from the liquid supply unit 31 of the first liquid immersion member 500, It may be high. In this case, the liquid supplied from the liquid supply unit 43 and the liquid supplied from the liquid supply unit 31 may be the same type of liquid or different types of liquid.

<Sixth Embodiment>
A sixth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  In the present embodiment, a support device 50 that supports the first liquid immersion member 500 described in the first embodiment and the like will be described. In the following description, the first liquid immersion member 500 is appropriately referred to as a liquid immersion member 500. In the present embodiment, the second liquid immersion member 600 may or may not be provided.

  21 and 22 are plan views showing examples of the liquid immersion member 500 and the support device 50 according to the present embodiment. FIG. 21 is a view seen from the + Z side, and FIG. 22 is a view seen from the −Z side.

  As described in the above-described embodiment, the liquid immersion member 500 includes the first member 21 disposed around the optical path of the exposure light EL, and the substrate P (object) at least partially below the first member 21. A second member 22 that is disposed so as to be able to face and is movable with respect to the first member 21, a liquid supply unit 31 that is disposed on the first member 21 and that supplies the liquid LQ, and is disposed on the first member 21, and is liquid A liquid recovery unit 24 that recovers LQ and a liquid recovery unit 27 that is disposed on the second member 22 and recovers the liquid LQ are provided.

  The support device 50 includes a first support member 51 that supports the first member 21 and a second support member 52 that supports the second member 22. The support device 50 includes a support frame 53 that supports the first support member 51 and a moving frame 54 that supports the second support member 52.

 The first support member 51 is connected to the first member 21. The first support member 51 is disposed so as to surround the first member 21.

  The support frame 53 is connected to the first support member 51. The support frame 53 supports the first member 21 via the first support member 51.

 The second support member 52 is connected to the second member 22. The second support member 52 is connected to a part of the second member 22 on the + Y side with respect to the center of the opening 35. The second support member 52 is connected to the second member 22 outside the first member 21 with respect to the optical path K.

 The moving frame 54 is connected to the second support member 52. The moving frame 54 supports the second member 22 via the second support member 52.

  The first member 21 and the second member 22 do not contact each other. The first support member 51 and the second support member 52 do not contact each other.

  The support device 50 includes a prevention device 55 that suppresses vibration of the first member 21. The vibration isolator 55 suppresses the vibration of the first member 21 accompanying the movement of the second member 22, for example. The vibration isolator 55 is controlled by the control device 6.

 At least a part of the vibration isolator 55 is supported by the apparatus frame 8B. At least a part of the vibration isolator 55 is disposed between the support frame 53 and the apparatus frame 8B. At least a part of the vibration isolator 55 is disposed below the support frame 53.

  In the present embodiment, the vibration isolator 55 suppresses the vibration of the support frame 53 and suppresses the vibration of the first member 21 supported by the support frame 53.

  In the present embodiment, the support device 50 includes a drive device 56 that moves the second member 22. The second member 22 is moved by the driving device 56. The driving device 56 includes, for example, a motor, and can move the second member 22 using Lorentz force. The driving device 56 can move the second member 22 relative to the first member 21. The driving device 56 is controlled by the control device 6.

 In the present embodiment, at least a part of the driving device 56 is supported by the device frame 8B. At least a part of the driving device 56 is disposed on the device frame 8B.

  In the present embodiment, the driving device 56 moves the moving frame 54. When the moving frame 54 is moved by the driving device 56, the second support member 52 is moved. When the second support member 52 is moved by the driving device 56, the second member 22 is moved.

 In the present embodiment, the support frame 53 is supported by the device frame 8B. The support frame 53 is supported by the device frame 8B via the vibration isolator 55. The vibration isolator 55 supports the first member 21 via the support frame 53 and the first support member 51. The first member 21 is supported by the vibration isolator 55 via the first support member 51 and the support frame 53. The device frame 8 </ b> B supports the first member 21 via the vibration isolation device 55, the support frame 53, and the first support member 51.

  In the present embodiment, the moving frame 54 is supported by the device frame 8B. The moving frame 54 is supported by the device frame 8B via the driving device 56. The drive device 56 supports the second member 22 via the moving frame 54 and the second support member 52. The second member 22 is supported by the driving device 56 via the second support member 52 and the moving frame 54. The device frame 8B supports the second member 22 via the drive device 56, the moving frame 54, and the second support member 52.

 In the present embodiment, the apparatus frame 8B includes a reference frame 8A that supports the projection optical system PL, a support frame 53 that supports the first member 21, a vibration isolation device 55, and a moving frame 54 that supports the second member 22. The drive device 56) is supported.

 In the present embodiment, the first support member 51 may be regarded as a part of the first member 21. In the present embodiment, the second support member 52 may be regarded as a part of the second member 22.

  In the present embodiment, the driving device 56 is disposed on the −X side with respect to the optical axis of the last optical element 13. In the present embodiment, the moving frame 54 is a rod member that is long in the X-axis direction. In the present embodiment, the driving device 56 is connected to the end portion on the −X side of the moving frame 54. The second support member 52 is connected to the + X side end of the moving frame 54.

 The support device 50 includes a guide device 57 that guides the second member 22. The guide device 57 guides the second member 22 in the X-axis direction. At least a part of the guide device 57 is disposed between the first support member 51 (first member 21) and the second support member 52 (second member 22).

  The second member 22 is guided in the X-axis direction by the guide device 57. The movement of the second member 22 in the Y axis, Z axis, θX, θY, and θZ directions is limited.

  FIG. 23 is a cross-sectional view of the second support member 52. FIG. 23 corresponds to an AA arrow view in FIG.

  The second support member 52 has a recovery channel 60 through which the liquid LQ recovered from the liquid recovery unit 27 of the second member 22 flows. The recovery channel 60 is formed inside the second support member 52. The liquid LQ recovered from the liquid recovery unit 27 flows into the recovery channel 60 via the recovery channel 27R of the second member 22. At least a part of the liquid LQ in the recovery channel 60 is recovered by the liquid recovery device 27C.

  In the present embodiment, the exposure apparatus EX includes a suppression device 61 that suppresses a temperature change in one or both of the second member 22 and the second support member 52. In the present embodiment, the suppression device 61 includes an air conditioner 9S of the chamber device 9. The air conditioner 9S can adjust the temperature of the space CS in which the second member 22 and the second support member 52 are arranged. The space CS is a space outside the second member 22 and the second support member 52.

  In the present embodiment, the second support member 52 includes a flow channel 62 disposed adjacent to the recovery flow channel 60 and an opening 63 that connects the flow channel 62 and the space CS. The flow path 62 is formed inside the second support member 52. In the present embodiment, the opening 63 is formed on each of the upper surface and the lower surface of the second support member 52.

  In the present embodiment, at least a part of the gas Gs in the space CS flows into the flow path 62 through the opening 63. Thereby, the temperature change of at least one of the 2nd member 22 and the 2nd support member 52 is suppressed. Further, the temperature change of the space CS around the second support member 52 is suppressed. Moreover, the temperature change of the member arrange | positioned around the 2nd supporting member 52 is suppressed.

  When the liquid LQ flows through the recovery channel 60, the temperature of the second support member 52 may change. When the liquid LQ flows through the recovery flow path 60, the temperature of the second support member 52 may be lower or higher than the reference temperature (target temperature).

  In the present embodiment, at least a part of the gas Gs supplied from the air conditioner 9S flows into the flow path 62 adjacent to the recovery flow path 60. The air conditioner 9S can supply the temperature-adjusted gas Gs to the space CS. The gas Gs whose temperature has been adjusted by the air conditioner 9 </ b> S flows into the flow path 62 through the opening 63.

  The gas Gs in the space CS is sucked into the flow path 62 through the opening 63, so that the gas flow (from the space around the second support member 52 toward the flow path 62 in the space around the second support member 52 ( Airflow) is forcibly generated. That is, forced convection is generated in the space around the second support member 52. In other words, an air flow (forced convection) is generated so that the gas around the second support member 52 (the gas in contact with the outer surface of the second support member 52) flows into the flow path 62 through the opening 63. . Thereby, the gas around the second support member 52 (the gas in contact with the outer surface of the second support member 52) is suppressed from diffusing in the space CS.

  For example, when the temperature of the second support member 52 decreases due to the liquid LQ flowing through the recovery channel 60, the temperature of the gas around the second support member 52 (the gas in contact with the outer surface of the second support member 52). May be reduced. In the present embodiment, the forced convection suppresses the gas around the second support member 52 (the gas in contact with the outer surface of the second support member 52) from diffusing in the space CS. Therefore, gas that may have changed in temperature (temperature decrease) diffuses in the space CS, or the temperature of members around the second support member 52 (such as the second member 22 and a member different from the second member 22) increases. Change (decrease) is suppressed. The same applies when the temperature of the second support member 52 rises.

  In the present embodiment, the second support member 52 moves in the space CS. Thereby, the gas Gs in the space CS is promoted to flow into the flow path 62 through the opening 63.

  A suction port (suction unit, suction device) capable of sucking gas may be disposed in the flow path 62 so that the gas Gs in the space CS flows into the flow path 62 through the opening 63. The suction port is connected to a vacuum system. The pressure in the flow path 62 decreases due to the suction operation of the suction port. Thereby, the gas Gs in the space CS flows into the flow path 62 through the opening 63. The gas that has flowed into the flow path 62 through the opening 63 may be discharged to the outside of the flow path 62 (outside of the space CS, outside of the exposure apparatus EX) through the suction port.

 In addition, when the gas Gs temperature-adjusted by the air conditioner 9S flows into the flow path 62 through the opening 63, the temperature change of the second support member 52 is suppressed, or the temperature of the second support member 52 is adjusted. Can also be expected.

  As described above, according to the present embodiment, the temperature change of one or both of the second member 22 and the second support member 52 is suppressed. Therefore, the occurrence of defective exposure due to temperature changes and the occurrence of defective devices are suppressed.

<Seventh embodiment>
A seventh embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 24 is a diagram illustrating an example of a suppressing device 61B that suppresses a temperature change of the liquid immersion member 500 according to the present embodiment. The liquid immersion member 500 has the same structure as the first liquid immersion member 500 described in the first embodiment and the like.

 In the present embodiment, the suppressing device 61 </ b> B includes a temperature adjusting device 65 disposed at least at a part around the second member 22.

  In the present embodiment, the temperature adjustment device 65 is disposed between the first member 21 and the second member 22. In the present embodiment, the temperature adjustment device 65 is disposed on the inner surface 30 of the second member 22.

  The recovery flow path 27 </ b> R of the second member 22 is disposed adjacent to the space between the outer side surface 29 of the first member 21 and the inner side surface 30 of the second member 22. The recovery channel 27R is disposed in the portion 222 of the second member 22. Portion 222 has an inner surface 30.

 There is a possibility that the temperature of the second member 22 (part 222) may change due to the liquid LQ flowing through the recovery flow path 27R. When the liquid LQ flows through the recovery flow path 27R, the temperature of the second member 22 (part 222) may be lower or higher than the reference temperature (target temperature).

  In the present embodiment, the temperature adjustment device 65 is disposed at least at a part around the second member 22 (part 222). The temperature adjustment device 65 may include, for example, a sheet-like heating device or a cooling device. The temperature adjustment device 65 may include a Peltier element.

  The temperature change of the second member 22 can be suppressed by adjusting the temperature of the second member 22 (part 222) using the temperature adjustment device 65, for example. Moreover, the temperature change of the 1st member 21 arrange | positioned in at least one part of the circumference | surroundings of the 2nd member 22 is suppressed by adjusting the temperature of the 2nd member 22. FIG. Moreover, the temperature change of the 2nd supporting member 52 arrange | positioned in at least one part of the circumference | surroundings of the 2nd member 22 is suppressed by adjusting the temperature of the 2nd member 22. FIG. Further, by adjusting the temperature of the portion 222, the temperature change of the portion 221 disposed at least at a part around the portion 222 is suppressed. Moreover, the temperature change of the space CS around the second member 22 is suppressed by adjusting the temperature of the second member 22.

  The temperature adjustment device 65 may be disposed on the first member 21 or may be disposed on the second support member 52. For example, by arranging the temperature adjustment device 65 on the second support member 52, the temperature change of the second support member 52 is suppressed. Moreover, the temperature change of the 1st member 21 arrange | positioned in at least one part of the circumference | surroundings of the 2nd support member 52 is suppressed by adjusting the temperature of the 2nd support member 52. FIG. Further, by adjusting the temperature of the second support member 52, temperature changes of the moving frame 54 and the like disposed at least at a part around the second support member 52 are suppressed. Moreover, the temperature change of the space CS around the second support member 52 is suppressed by adjusting the temperature of the second support member 52.

  In the present embodiment, the second member 22 is provided with a notch 64 between the portion 221 and the portion 222. The notch 64 may be referred to as a recess 64. The heat transfer between the part 221 and the part 222 is suppressed by the notch part 64. That is, the notch 64 reduces the connecting portion 64C between the portion 221 and the portion 222. Thereby, the heat transfer between the part 221 and the part 222 is suppressed.

 For example, recovery of the liquid LQ from the liquid recovery unit 27 may change the temperature of the portion 222 where the liquid recovery unit 27 is disposed. When the temperature of the portion 222 decreases due to the recovery of the liquid LQ from the liquid recovery unit 27, the temperature of the portion 221 may change (decrease) due to the temperature change (temperature decrease) of the portion 222. The portion 221 holds the liquid LQ with the substrate P (object). Therefore, when the temperature of the portion 221 changes (decreases), the temperature of the liquid LQ in the immersion space LS1 may change (decrease), or the temperature of the substrate P (object) may change (decrease). The same applies when the temperature of the portion 222 increases. When the temperature of the portion 222 increases, the temperature of the portion 221 increases, and as a result, the temperature of the liquid LQ in the immersion space LS1 may increase, or the temperature of the substrate P (object) may increase. .

  In the present embodiment, the connection portion 64 </ b> C between the portion 221 and the portion 222 is small due to the cutout portion 64. Therefore, even if the temperature of the part 222 changes, the temperature change of the part 221 is suppressed. That is, the heat transfer path between the portion 221 and the portion 222 is reduced by the notch 64. Therefore, the influence of the temperature change of the portion 222 is suppressed from being exerted on the portion 221. Similarly, even if the temperature of the portion 221 changes, the temperature change of the portion 222 is suppressed.

  Instead of the temperature adjustment device 65 or together with the temperature adjustment device 65, a heat insulating part (heat insulating material) 651 may be disposed at least at a part around the second member 22. Heat transfer from the second member 22 (part 222) is suppressed by the heat insulating portion 651. That is, heat transfer from the second member 22 (part 222) to the space around the second member 22 (part 222) is suppressed. Further, heat transfer from the second member 22 (part 222) to a member arranged at least at a part around the second member 22 (part 222) is suppressed. Thereby, even if the temperature of the second member 22 (part 222) changes (for example, decreases), the members (for example, the first member 21, The temperature change of the second support member 52 and the like is suppressed.

  As described above, according to the present embodiment, the temperature change of one or both of the second member 22 and the second support member 52 is caused by the suppressing device 61B including one or both of the temperature adjusting device 65 and the heat insulating portion 651. Can be suppressed. Therefore, the occurrence of defective exposure due to temperature changes and the occurrence of defective devices are suppressed.

  As illustrated in FIG. 25, a suppressing device 61B including one or both of the temperature adjusting device 65 and the heat insulating portion 651 may be disposed between the second member 22 and the substrate P (object). In the example illustrated in FIG. 25, at least a part of the suppressing device 61 </ b> B is disposed on the lower surface 26 of the second member 22. In the example illustrated in FIG. 25, the suppressing device 61 </ b> B is disposed on at least a part of the periphery of the liquid recovery unit 27 on the lower surface 26.

  In the example shown in FIG. 25, even if the temperature of the liquid recovery unit 27 or the vicinity of the liquid recovery unit 27 changes, the temperature of the surrounding member (space) is suppressed from changing. For example, in the example shown in FIG. 25, even if the temperature of the second member 22 changes, the temperature change of the substrate P (object) facing the second member 22 is suppressed.

  In the example illustrated in FIG. 25, the part 221 and the part 222 are connected via a heat insulating part 652. Heat transfer between the portion 221 and the portion 222 is suppressed by the heat insulating portion 652. Therefore, for example, even if the temperature of the part 222 where the liquid recovery part 27 is arranged changes due to the recovery of the liquid LQ from the liquid recovery part 27, the temperature of the part 221 is caused by the temperature change of the part 222. Is suppressed from changing. Similarly, even if the temperature of the portion 221 changes, the temperature change of the portion 222 is suppressed.

<Eighth Embodiment>
An eighth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

 FIG. 27 is a cross-sectional view parallel to the YZ plane of the liquid immersion member 500C according to the present embodiment. FIG. 28 is a cross-sectional view of the liquid immersion member 500C parallel to the XZ plane.

  In the present embodiment, the second liquid immersion member 600 described in the above embodiment may or may not be provided.

  The liquid immersion member 500C is disposed around the optical path of the exposure light EL, and is disposed on at least a part of the first member 21C having the liquid supply unit 31C that supplies the liquid LQ and the first member 21C, and the liquid LQ. The recovery member 222C having the liquid recovery part 27C for recovering the substrate P and the substrate P (object) are disposed so as to be opposed to each other below one or both of the first member 21C and the recovery member 222C, and are movable relative to the first member 21C. Second member 221C. The liquid immersion member 500C can form an immersion space LS1 for the liquid LQ on the substrate P (object) that is movable below the last optical element 13.

 The first member 21 </ b> C is an annular member disposed around the last optical element 13. The first member 21C is disposed around the last optical element 13 with a gap therebetween. The first member 21C has an opening 34C through which the exposure light EL from the emission surface 12 can pass.

 The first member 21C has a lower surface 23C facing the −Z direction. The lower surface 23C includes a non-recovery region where the liquid LQ cannot be recovered and a recovery region which is disposed outside the non-recovery region with respect to the radial direction with respect to the optical axis AX of the last optical element 13 and can recover the liquid LQ.

  The first member 21C includes a liquid recovery unit 24C that can recover the liquid LQ. The recovery region of the lower surface 23C includes a liquid recovery unit 24C. The liquid recovery unit 24C includes a porous member 36C. The liquid recovery port of the liquid recovery unit 24C includes a hole of the porous member 36C.

  The recovery member 222C is an annular member disposed around the first member 21C. The recovery member 222C is disposed around the first member 21C via a gap. The outer side surface 29C of the first member 21C and the inner side surface 30C of the recovery member 222C are opposed to each other through a gap.

  The recovery member 222C has a lower surface 70C that faces the −Z direction. The lower surface 70C includes a recovery area where the liquid LQ can be recovered. The recovery area of the lower surface 70C includes the liquid recovery part 27C. The liquid recovery unit 27C includes a porous member 37C. The liquid recovery port of the liquid recovery unit 27C includes a hole of the porous member 37C.

 The second member 221C is an annular member disposed around the optical path K of the exposure light EL. The second member 221C can face the lower surface 23C through a gap. The second member 221C has an opening 35C through which the exposure light EL from the emission surface 12 can pass. The second member 221C can face the liquid recovery part 27C through a gap.

 The second member 221C has an upper surface 25C that can face the lower surface 23C and a lower surface 26C that can face the substrate P (object). The upper surface 25C of the second member 221C and a part of the lower surface 70C of the recovery member 222C can face each other through a gap. The lower surface 70C of the recovery member 222C is disposed above the upper surface 25C of the second member 221C.

 The substrate P (object) can face the lower surface 26C of the second member 221C. The substrate P (object) can face the lower surface 70C of the recovery member 222C. The substrate P (object) can face at least a part of the liquid recovery unit 27C. The liquid recovery unit 27C is disposed so that the substrate P (object) can face the liquid recovery unit 27C.

  In the present embodiment, the lower surface 23C of the first member 21C and the lower surface 70C of the recovery member 222C are disposed at substantially the same height. In the present embodiment, the lower surface 23C and the lower surface 70C are disposed substantially in the same plane.

  In the present embodiment, at least a part of the inner side surface 30C may be liquid repellent with respect to the liquid LQ. The contact angle of the inner surface 30C with respect to the liquid LQ may be 90 degrees or more, 100 degrees or more, 110 degrees or more, or 120 degrees or more. For example, the inner side surface 30C may be formed on the surface of a film that is liquid repellent with respect to the liquid LQ. The liquid repellent film may be a synthetic resin film containing fluorine. The liquid repellent film may contain, for example, PFA (Tetrafluoroethylene-perfluoroalkylvinylether copolymer) or PTFE (Polytetrafluoroethylene).

  In the present embodiment, at least a part of the upper surface 25C may be liquid repellent with respect to the liquid LQ. The contact angle of the upper surface 25C with respect to the liquid LQ may be 90 degrees or more, 100 degrees or more, 110 degrees or more, or 120 degrees or more. For example, the upper surface 25C may be formed of a surface of a film that is liquid repellent with respect to the liquid LQ. The liquid repellent film may be a synthetic resin film containing fluorine. The liquid repellent film may contain, for example, PFA (Tetrafluoroethylene-perfluoroalkylvinylether copolymer) or PTFE (Polytetrafluoroethylene).

  Thereby, at least a part of the liquid LQ in the second space SP2c between the lower surface 26C and the upper surface of the substrate P (object) passes through the gap between the outer edge of the second member 221C and the lower surface 70C of the recovery member 222C. Thus, the flow into the first space SP1c side on the upper surface 25C side is suppressed.

 The liquid supply part 31C is disposed inside the liquid recovery part 24C and the liquid recovery part 27C with respect to the radial direction with respect to the optical axis AX (optical path K) of the last optical element 13.

 In the present embodiment, the liquid supply part 31C is disposed so as to face the outer surface 13F. The liquid supply unit 31C supplies the liquid LQ to the third space SP3c between the outer surface 13F of the last optical element 13 and the first member 21C.

 The liquid recovery unit 24C recovers the liquid LQ from the first space SP1c between the lower surface 23C and the upper surface 25C. At least a part of the second member 221C faces the liquid recovery part 24C.

 The liquid recovery part 27C can recover at least part of the liquid LQ from the first space SP1c facing the upper surface 25C and the second space SP2c facing the lower surface 26C. The second space SP2c includes a space between the lower surface 26C and the upper surface of the substrate P (object).

  In parallel with the operation of supplying the liquid LQ from the liquid supply unit 31C, the operation of recovering the liquid LQ from the liquid recovery unit 27C is executed, so that the terminal optical element 13 and the liquid immersion member 500C on one side and the other side A liquid immersion space LS1 is formed between the substrate P (object) and the liquid LQ.

  In the present embodiment, the recovery operation of the liquid LQ from the liquid recovery unit 24C is performed in parallel with the supply operation of the liquid LQ from the liquid supply unit 31C and the recovery operation of the liquid LQ from the liquid recovery unit 27C. As a result, the immersion space LS1 is formed.

  The first member 21C does not substantially move. The first member 21C is substantially stationary.

  The second member 221C is movable with respect to the first member 21C. The second member 221C is moved by the driving device 270C. The drive device 270C includes, for example, a motor, and moves the second member 221C using Lorentz force. The driving device 270C moves the second member 221C at least in the X-axis direction. Note that the driving device 270C may move the second member 221C in six directions of X axis, Y axis, Z axis, θX, θY, and θZ.

  In the present embodiment, the support member 280C is connected to at least a part of the second member 221C. In the present embodiment, the driving device 270C moves the support member 280C. When the support member 280C is moved by the driving device 270C, the second member 221C is moved.

 In the present embodiment, the support member 280C is disposed on each of the + Y side and the −Y side with respect to the optical path K (the optical axis AX of the terminal optical element 13).

 The arrangement of the plurality of support members 280C is not limited to the + Y side and the −Y side. For example, it may be arranged on each of the + X side and the −X side, or may be arranged on each of the + Y side, the −Y side, the + X side, and the −X side.

  In the present embodiment, the first member 21C has an inner surface 300C that faces the outer surface 13F of the terminal optical element 13, and an upper surface 310C that is disposed around the upper end of the inner surface 300C.

  In the present embodiment, the plurality of support members 280C are movably disposed in the plurality of holes 320C provided in the first member 21C. In the present embodiment, holes 320 </ b> C are provided on each of the + Y side and the −Y side with respect to the optical path K. Each of the holes 320C passes through the first member 21C so as to connect the upper space and the lower space of the first member 21C in the Z-axis direction. The upper space of the first member 21C includes a space that the upper surface 310C faces. The space above the first member 21C may include a third space SP3c between the last optical element 13 and the first member 21C. The space below the first member 21C includes a first space SP1c between the first member 21C and the second member 221C. The space below the first member 21C may include a second space SP2c between the second member 221C and the substrate P (object).

 In the present embodiment, each of the holes 320C is formed so as to connect the upper surface 310C and the lower surface 71C of the first member 21C. The support member 280C disposed in the hole 320C is movable in the X-axis direction. When the support member 280C is moved in the X-axis direction by the driving device 270C, the second member 221C is moved in the X-axis direction.

  In the present embodiment, the second member 221C and the support member 280C do not contact the first member 21C. A gap is formed between the first member 21C and the second member 221C, and a gap is formed between the first member 21C and the support member 280C. The driving device 270C can move the second member 221C and the support member 280C so that the second member 221C and the support member 280C do not contact the first member 21C.

  The recovery member 222C is movable with respect to the first member 21C. The recovery member 222C is moved by the driving device 270D. The drive device 270D includes, for example, a motor, and moves the recovery member 222C using Lorentz force. The drive device 270D moves the recovery member 222C at least in the X-axis direction. Note that the driving device 270D may move the recovery member 222C in six directions of the X axis, the Y axis, the Z axis, θX, θY, and θZ.

  In the present embodiment, the support member 280D is connected to at least a part of the recovery member 222C. In the present embodiment, the driving device 270D moves the support member 280D. When the support member 280D is moved by the driving device 270D, the recovery member 222C is moved.

  The second member 221C is movable in a state where the immersion space LS1 is formed.

  The second member 221C is movable so that the relative speed with respect to the substrate P (object) becomes small. The second member 221C is movable so that the relative speed between the second member 221C and the substrate P (object) is smaller than the relative speed between the first member 21C and the substrate P (object). The second member 221C is movable so that the relative speed with respect to the substrate P (object) is reduced in a state where the immersion space LS1 is formed.

  The second member 221C is movable so that the relative acceleration with respect to the substrate P (object) becomes small. The second member 221C is movable so that the relative acceleration between the second member 221C and the substrate P (object) is smaller than the relative acceleration between the first member 21C and the substrate P (object). The second member 221C is movable so that the relative acceleration with respect to the substrate P (object) becomes small in a state where the immersion space LS1 is formed.

 For example, when the substrate P moves under the movement condition described with reference to FIG. 8, the control device 6 moves the second member 221 </ b> C under the movement condition described with reference to FIGS. 9 and 10. Thereby, the liquid LQ is prevented from flowing out of the space between the liquid immersion member 500C and the substrate P (object), or the liquid LQ is left on the substrate P (object).

  The recovery member 222C is movable in a state where the immersion space LS1 is formed. The collection member 222C is movable under different movement conditions than the second member 221C. The control device 6 can control one or both of the drive device 270C and the drive device 270D so that the recovery member 222C and the second member 221C move under different movement conditions with respect to the first member 21C.

  For example, the control device 6 can move the recovery member 222C so that the liquid LQ in the immersion space LS1 does not flow out of the space between the recovery member 222C and the substrate P (object).

 The control device 6 can move the recovery member 222C based on, for example, the moving condition of the second member 221C so that the liquid LQ does not flow out of the space between the recovery member 222C and the substrate P (object).

 The control device 6 can move the recovery member 222C based on, for example, the movement condition of the substrate P (object) so that the liquid LQ does not flow out of the space between the recovery member 222C and the substrate P (object).

 For example, based on both the moving condition of the second member 221C and the moving condition of the substrate P (object), the control device 6 prevents the liquid LQ from flowing out from the space between the recovery member 222C and the substrate P (object). The recovery member 222C can be moved.

  The movement condition of the second member 221C includes at least one of movement speed, acceleration, movement direction, and movement locus in the XY plane.

  The moving condition of the collection member 222C includes at least one of a moving speed, an acceleration, a moving direction, and a moving locus in the XY plane.

  The movement condition of the substrate P (object) includes at least one of movement speed, acceleration, movement direction, and movement locus in the XY plane.

  28, 29, and 30 are diagrams illustrating an example of the operation of the liquid immersion member 500C. The control device 6 can move one or both of the second member 221C and the recovery member 222C with respect to the first member 21C in at least part of the exposure of the substrate P.

  As shown in FIG. 28, the control device 6 can move the second member 221C. The control device 6 can move the second member 221C while the recovery member 222C is substantially stationary. In the example shown in FIG. 28, the second member 221C moves in the X-axis direction. Note that the second member 221C may move in the Y-axis direction. The second member 221C may move in a direction non-parallel to the X axis and the Y axis in the XY plane.

  As shown in FIG. 29, the control device 6 can move the collection member 222C. The control device 6 can move the recovery member 222C while the second member 221C is substantially stationary. In the example shown in FIG. 29, the recovery member 222C moves in the X-axis direction. Note that the recovery member 222C may move in the Y-axis direction. The recovery member 222C may move in a direction non-parallel to the X axis and the Y axis in the XY plane.

  As shown in FIG. 30, the control device 6 can move the second member 221C and the recovery member 222C simultaneously. The control device 6 may move the collection member 222C during a part of the period during which the second member 221C moves. The control device 6 may move the second member 221C during a part of the period during which the collection member 222C moves. The control device 6 may move the recovery member 222C (second member 221C) during the entire period in which the second member 221C (recovery member 222C) moves.

  The control device 6 may change the moving speed of the second member 221C and the moving speed of the recovery member 222C. For example, the control device 6 moves the second member 221C in a certain direction in the XY plane at a first speed, and moves the recovery member 222C in a certain direction in the XY plane at a second speed different from the first speed. Also good.

  The control device 6 may make the acceleration of the second member 221C different from the acceleration of the recovery member 222C. For example, the control device 6 moves the second member 221C in a certain direction in the XY plane with a first acceleration, and moves the recovery member 222C in a certain direction in the XY plane with a second acceleration different from the first acceleration. Also good.

  The control device 6 may change the moving direction of the second member 221C and the moving direction of the recovery member 222C. For example, the control device 6 may move the recovery member 222C in the Y-axis direction while moving the second member 221C in the X-axis direction. The control device 6 may move the recovery member 222C in the −X direction while moving the second member 221C in the + X direction.

  The control device 6 may make the movement distance of the second member 221C different from the movement distance of the recovery member 222C. For example, the control device 6 moves the second member 221C by a first distance in a certain direction in the XY plane, and moves the recovery member 222C by a second distance different from the first distance in a certain direction in the XY plane. Also good.

  As described above, in the present embodiment, among the liquid immersion member 500C, the second member 221C disposed at the position closest to the substrate P (object) and the recovery member 222C having the liquid recovery part 27C are respectively provided. It is movable. The control device 6 controls the second member 221C based on the movement condition of the substrate P (object) so that the liquid LQ in the immersion space LS1 does not flow out of the space between the immersion member 500C and the substrate P (object). Each of the movement conditions and the movement conditions of the recovery member 222C can be determined optimally. Accordingly, the outflow and remaining of the liquid LQ are suppressed, and the occurrence of defective exposure and the generation of defective devices are suppressed.

  In the present embodiment, the recovery member 222C having the liquid recovery part 27C is separated from the first member 21C having the liquid supply part 31C that supplies the liquid LQ. Therefore, even if the temperature of the liquid recovery part 27C (recovery member 222C) changes (for example, decreases) due to the recovery of the liquid LQ, the temperature of the first member 21C is suppressed from changing. In addition, the temperature of the liquid LQ supplied from the liquid supply unit 31C is suppressed from changing.

 Further, in the present embodiment, the recovery member 222C having the liquid recovery part 27C is separated from the second member 221C disposed at the position closest to the substrate P (object) in the liquid immersion member 500C. Therefore, even if the temperature of the liquid recovery part 27C (recovery member 222C) changes (for example, decreases) due to the recovery of the liquid LQ, the temperature of the second member 221C is suppressed from changing. Moreover, it is suppressed that the temperature of the board | substrate P (object) changes.

 In the first to eighth embodiments described above, the first member (such as 21) may be movable. The first member (21 etc.) may move with respect to the last optical element 13. The first member (21 etc.) may move in at least one of the six directions of X axis, Y axis, Z axis, θX, θY, and θZ. For example, in order to adjust the positional relationship between the terminal optical element 13 and the first member (21 or the like), or to adjust the positional relationship between the first member (21 or the like) and the second member (22 or the like), The first member (21 etc.) may be moved. Further, the first member (21 or the like) may be moved in parallel with at least a part of the movement of the substrate P (object). For example, the distance may be shorter than the second member (22 or the like) in the XY plane. Further, the first member (21 etc.) may move at a lower speed than the second member (22 etc.). Further, the first member (21 etc.) may move at a lower acceleration than the second member (22 etc.).

 In each of the above-described embodiments, a first temperature adjustment device that adjusts the temperature of the first member (21 or the like) may be disposed. The first temperature adjustment device may include a Peltier element disposed on the outer surface of the first member (21 or the like), for example. The first temperature adjusting device may include a supply device that supplies a temperature adjusting fluid (one or both of liquid and gas) to a flow path formed inside the first member (21 or the like). In addition, the 2nd temperature control apparatus which adjusts the temperature of 2nd member (22 etc.) may be arrange | positioned. The second temperature adjustment device may include a Peltier element disposed on the outer surface of the second member (22, etc.), and a temperature adjusting fluid is supplied to the flow path formed inside the second member (22, etc.). A supply device may be included.

 In each of the above-described embodiments, the liquid supply amount from the liquid supply unit (31 or the like) may be adjusted based on the movement condition of the second member (22 or the like). Further, the liquid supply amount from the liquid supply unit (31 etc.) may be adjusted based on the position of the second member (22 etc.). For example, the amount of liquid supplied from the liquid supply unit (31 or the like) when the second member (22 or the like) is disposed at at least one of the first end position and the second end position is the second member (22 or the like). ) May be adjusted so as to be larger than the liquid supply amount from the liquid supply unit (31 or the like) when it is disposed at the center position. Further, when the second member (22 or the like) moves from the second end position to the first end position, the liquid supply amount from the liquid supply section (31 or the like) disposed on the + X side with respect to the optical path K May be larger than the liquid supply amount from the liquid supply unit (31 or the like) arranged on the −X side. Further, when the second member (22 or the like) moves from the first end position to the second end position, the liquid supply from the liquid supply section (31 or the like) disposed on the −X side with respect to the optical path K. The amount may be larger than the liquid supply amount from the liquid supply unit (31 or the like) arranged on the + X side. By doing so, generation of bubbles in the liquid LQ is suppressed.

  In each of the above-described embodiments, the second member (22 or the like) is moved in the step direction (step 22) in the step movement operation of the substrate P in order to suppress the liquid LQ remaining or flowing out due to the step movement operation of the substrate P. X axis direction), but the relative speed with respect to the substrate P (object) in the scan direction (Y axis direction) is reduced in at least one of the scan movement operation and the step movement operation of the substrate P. The second member (22 etc.) may be moved in the scanning direction (Y-axis direction).

  In each of the above-described embodiments, as shown in FIG. 31, at least a part of the first member (21 or the like) may face the exit surface 12 of the last optical element 13. In the example shown in FIG. 31, the first member 21 has an upper surface 440 disposed around the opening 34. An upper surface 440 is disposed around the upper end of the opening 34. A lower surface 23 is disposed around the lower end of the opening 34. A part of the upper surface 440 faces the emission surface 12. In the example shown in FIG. 31, a part of the upper surface 25 of the second member (22 or the like) is also opposed to the emission surface 12.

  As shown in FIG. 32, the lower surface 23 of the first member 21 may be disposed on the + Z side with respect to the emission surface 12. The position (height) of the lower surface 23 in the Z-axis direction and the position (height) of the exit surface 12 may be substantially equal. The lower surface 23 of the first member may be disposed on the −Z side with respect to the emission surface 12.

  In each of the above-described embodiments, the first liquid immersion member 500 does not have a flow path that fluidly connects the first space SP1 and the second space SP2 other than the opening 35. For example, an opening (hole) that fluidly connects the first space SP1 and the second space SP2 may be formed outside the opening 35 with respect to the optical path K.

  In each of the above-described embodiments, the first member 21 may be provided with a suction port that sucks at least one of the liquid LQ and the gas from the space between the first member 21 and the last optical element 13.

  In each of the above-described embodiments, a supply port that supplies the liquid LQ to the first space SP1 may be provided in at least one of the first member 21 and the second member 22. For example, a supply port for supplying the liquid LQ may be provided on the lower surface 23 of the first member 21 between the opening 34 and the liquid recovery unit 24.

  In each of the above-described embodiments, the control device 6 includes a computer system including a CPU and the like. The control device 6 includes an interface capable of executing communication between the computer system and an external device. The storage device 7 includes a memory such as a RAM, and a recording medium such as a hard disk and a CD-ROM. The storage device 7 is installed with an operating system (OS) that controls the computer system, and stores a program for controlling the exposure apparatus EX.

  Note that an input device capable of inputting an input signal may be connected to the control device 6. The input device includes an input device such as a keyboard and a mouse, or a communication device that can input data from an external device. Further, a display device such as a liquid crystal display may be provided.

  Various information including programs recorded in the storage device 7 can be read by the control device (computer system) 6. In the storage device 7, liquid immersion exposure is performed in which the control device 6 exposes the substrate with the exposure light through the liquid filled in the optical path of the exposure light between the exit surface of the optical member from which the exposure light is emitted and the substrate. A program for executing control of the apparatus is recorded.

  According to the above-described embodiment, the program recorded in the storage device 7 causes the control device 6 to have a first member disposed at least partly around the optical path of the exposure light, and at least partly below the first member. A first liquid that is disposed on the substrate using a first liquid immersion member having a second member that is movable with respect to the first member and that is movable so as to face an object that is movable below the optical member. Forming the immersion space; exposing the substrate with exposure light emitted from the exit surface via the first liquid in the first immersion space; and at least part of the exposure of the substrate to the first member. The first liquid is moved on the object movable below the optical member by moving the second member relative to the optical member and using the second liquid immersion member disposed outside the first liquid immersion member with respect to the optical path. Forming a second immersion space for the second liquid away from the immersion space; It may be.

  Further, according to the above-described embodiment, the program recorded in the storage device 7 causes the control device 6 to have a first member disposed at least at a part around the optical path of the exposure light, and at least a part of the first member. An object movable below the optical member is disposed below the optical member, a second member movable with respect to the first member, and a first liquid supply unit disposed on the first member and supplying the first liquid And forming a first liquid immersion space for the first liquid on the substrate using a first liquid immersion member that is disposed on the second member and has a first liquid recovery part that recovers the first liquid. , Exposing the substrate with exposure light emitted from the exit surface through the first liquid in the first immersion space, and moving the second member relative to the first member in at least part of the exposure of the substrate The second member and the second member connected to the second member. And suppressing the temperature change either or both of the third member having a recovery passage through which a first fluid which is, may be executed.

  In addition, the program recorded in the storage device 7 includes a first liquid supply unit that is arranged in at least part of the periphery of the optical path of the exposure light and supplies the first liquid to the control device 6 according to the above-described embodiment. A first member having a collecting member, a collecting member having a first liquid collecting portion that is disposed at least partially around the first member and collects the first liquid, and optical under one or both of the first member and the collecting member. A first liquid of the first liquid on the substrate using a first liquid immersion member having a second member movable relative to the first member and arranged so that an object movable under the member can be opposed to the first member. Forming the immersion space, exposing the substrate with exposure light emitted from the exit surface through the first liquid in the first immersion space, and at least part of the exposure of the substrate with respect to the first member Move one or both of the second member and the recovery member It and may be allowed to run.

  By reading the program stored in the storage device 7 into the control device 6, various devices of the exposure apparatus EX such as the substrate stage 2, the measurement stage 3, and the first liquid immersion member 500 cooperate with each other. Various processes such as immersion exposure of the substrate P are executed in the state where the immersion space LS1 is formed.

  In each of the above-described embodiments, the optical path K on the exit surface 12 side (image surface side) of the terminal optical element 13 of the projection optical system PL is filled with the liquid LQ. The projection optical system in which the optical path on the incident side (object surface side) of the last optical element 13 is also filled with the liquid LQ, as disclosed in Japanese Patent Publication No. 2004/019128.

  In each of the above-described embodiments, the liquid LQ is water, but a liquid other than water may be used. The liquid LQ is transmissive to the exposure light EL, has a high refractive index with respect to the exposure light EL, and forms a film such as a photosensitive material (photoresist) that forms the surface of the projection optical system PL or the substrate P. A stable material is preferred. For example, the liquid LQ may be a fluorinated liquid such as hydrofluoroether (HFE), perfluorinated polyether (PFPE), or fomblin oil. Further, the liquid LQ may be various fluids such as a supercritical fluid.

  In each of the above-described embodiments, the substrate P includes a semiconductor wafer for manufacturing a semiconductor device. For example, the substrate P is used in a glass substrate for a display device, a ceramic wafer for a thin film magnetic head, or an exposure apparatus. A mask or reticle master (synthetic quartz, silicon wafer) or the like may also be included.

  In each of the above-described embodiments, the exposure apparatus EX is a step-and-scan type scanning exposure apparatus (scanning stepper) that scans and exposes the pattern of the mask M by moving the mask M and the substrate P synchronously. However, for example, a step-and-repeat projection exposure apparatus (stepper) that performs batch exposure of the pattern of the mask M while the mask M and the substrate P are stationary and sequentially moves the substrate P stepwise may be used.

  In addition, the exposure apparatus EX transfers a reduced image of the first pattern onto the substrate P using the projection optical system while the first pattern and the substrate P are substantially stationary in the step-and-repeat exposure. Thereafter, with the second pattern and the substrate P substantially stationary, an exposure apparatus (stitch method) that collectively exposes a reduced image of the second pattern on the substrate P by partially overlapping the first pattern using a projection optical system. (Batch exposure apparatus). Further, the stitch type exposure apparatus may be a step-and-stitch type exposure apparatus in which at least two patterns are partially overlapped and transferred on the substrate P, and the substrate P is sequentially moved.

  Further, the exposure apparatus EX combines two mask patterns as disclosed in, for example, US Pat. No. 6,611,316 on the substrate via the projection optical system, and 1 on the substrate by one scanning exposure. An exposure apparatus that double-exposes two shot areas almost simultaneously may be used. Further, the exposure apparatus EX may be a proximity type exposure apparatus, a mirror projection aligner, or the like.

  In each of the above-described embodiments, the exposure apparatus EX is a twin stage type having a plurality of substrate stages as disclosed in US Pat. No. 6,341,007, US Pat. No. 6,208,407, US Pat. No. 6,262,796, and the like. The exposure apparatus may be used. For example, as shown in FIG. 33, when the exposure apparatus EX includes two substrate stages 2001 and 2002, an object that can be arranged to face the emission surface 12 is one substrate stage and one substrate stage. At least one of the substrate held by the first holding unit, the other substrate stage, and the substrate held by the first holding unit of the other substrate stage.

  The exposure apparatus EX may be an exposure apparatus that includes a plurality of substrate stages and measurement stages.

  The exposure apparatus EX may be an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern on the substrate P, an exposure apparatus for manufacturing a liquid crystal display element or a display, a thin film magnetic head, an image sensor (CCD). An exposure apparatus for manufacturing a micromachine, a MEMS, a DNA chip, or a reticle or mask may be used.

  In the above-described embodiment, a light-transmitting mask in which a predetermined light-shielding pattern (or phase pattern / dimming pattern) is formed on a light-transmitting substrate is used. A variable shaped mask (also called an electronic mask, an active mask, or an image generator) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed, as disclosed in No. 6778257 It may be used. Further, a pattern forming apparatus including a self-luminous image display element may be provided instead of the variable molding mask including the non-luminous image display element.

  In each of the above embodiments, the exposure apparatus EX includes the projection optical system PL. However, the components described in the above embodiments are applied to an exposure apparatus and an exposure method that do not use the projection optical system PL. May be. For example, an exposure apparatus and an exposure method for forming an immersion space between an optical member such as a lens and a substrate and irradiating the substrate with exposure light via the optical member are described in the above embodiments. Elements may be applied.

  The exposure apparatus EX exposes a line-and-space pattern on the substrate P by forming interference fringes on the substrate P as disclosed in, for example, WO 2001/035168. (Lithography system).

  The exposure apparatus EX of the above-described embodiment is manufactured by assembling various subsystems including the above-described components so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. After the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  As shown in FIG. 34, a microdevice such as a semiconductor device includes a step 201 for designing a function / performance of the microdevice, a step 202 for producing a mask (reticle) based on the design step, and a substrate which is a base material of the device. Substrate processing step 204, including substrate processing (exposure processing) including exposing the substrate with exposure light from the pattern of the mask and developing the exposed substrate according to the above-described embodiment, It is manufactured through a device assembly step (including processing processes such as a dicing process, a bonding process, and a packaging process) 205, an inspection step 206, and the like.

  Note that the requirements of the above-described embodiments can be combined as appropriate. Some components may not be used. In addition, as long as permitted by law, the disclosure of all published publications and US patents related to the exposure apparatus and the like cited in the above embodiments and modifications are incorporated herein by reference.

  DESCRIPTION OF SYMBOLS 2 ... Substrate stage, 3 ... Measurement stage, 5 ... Liquid immersion member, 6 ... Control apparatus, 7 ... Memory | storage device, 12 ... Ejection surface, 13 ... Terminal optical element, 21 ... 1st member, 22 ... 2nd member, 23 DESCRIPTION OF SYMBOLS ... Lower surface, 24 ... Liquid recovery part, 25 ... Upper surface, 26 ... Lower surface, 27 ... Liquid recovery part, 29 ... Outer side surface, 30 ... Inner side surface, 31 ... Liquid supply part, 32 ... Drive apparatus, 34 ... Opening, 35 ... Opening, EL ... exposure light, EX ... exposure device, IL ... illumination system, K ... light path, LQ ... liquid, LS ... immersion space, P ... substrate.

Claims (53)

An exposure apparatus that exposes a substrate with exposure light through a first liquid,
An optical member having an exit surface from which the exposure light is emitted;
A first member disposed at least at a part of the periphery of the optical path of the exposure light; and at least a part of the first member disposed below the first member so as to be able to face the first member and movable relative to the first member. A first immersion member capable of forming a first immersion space for the first liquid on an object movable below the optical member;
A second immersion space for the second liquid is provided on an object that is disposed outside the first immersion member with respect to the optical path and is movable below the optical member, away from the first immersion space. An exposure apparatus comprising: a second immersion member that can be formed.   The first liquid immersion member is disposed on the first member, and is disposed on the second member, a first liquid supply unit that supplies the first liquid for forming the first liquid immersion space, and The exposure apparatus according to claim 1, further comprising: a first liquid recovery unit that recovers at least a part of the first liquid in the first immersion space.   The second liquid immersion member collects at least a part of the second liquid in the second liquid immersion space and a second liquid supply unit that supplies the second liquid for forming the second liquid immersion space. The exposure apparatus according to claim 1, further comprising: a second liquid recovery unit that performs the operation.   The exposure apparatus according to claim 1, wherein the second member is moved in a state where the first immersion space is formed.   The exposure apparatus according to claim 1, wherein the second member is moved so that a relative speed with respect to the object is reduced.   The said 2nd member is moved so that the relative speed of the said 2nd member and the said object may become smaller than the relative speed of the said 1st member and the said object. The exposure apparatus described.   The exposure apparatus according to claim 1, wherein the second member is moved so that a relative acceleration with the object is reduced.   The said 2nd member is moved so that the relative acceleration of the said 2nd member and the said object may become smaller than the relative acceleration of the said 1st member and the said object. The exposure apparatus described.   The exposure apparatus according to claim 1, wherein the second immersion member is moved in a state where the second immersion space is formed.   The exposure apparatus according to claim 1, wherein the second immersion member is moved so that a relative speed with respect to the object is reduced.   The said 2nd immersion member moves so that the relative speed of the said 2nd immersion member and the said object may become smaller than the relative speed of the said 1st immersion member and the said object. The exposure apparatus according to any one of the above.   The exposure apparatus according to claim 1, wherein the second liquid immersion member is moved so that a relative acceleration with the object is reduced.   The said 2nd immersion member moves so that the relative acceleration of the said 2nd immersion member and the said object may become smaller than the relative acceleration of the said 1st immersion member and the said object. The exposure apparatus according to any one of the above.   The exposure apparatus according to claim 1, wherein the first immersion space and the second immersion space are formed simultaneously. In a state where the first immersion space is formed, one or both of the second member and the object are moved,
The exposure apparatus according to any one of claims 1 to 14, wherein the second immersion space is formed in at least a part of a period during which one or both of the second member and the object are moved.   The exposure apparatus according to any one of claims 1 to 15, wherein a forming condition of the second immersion space is determined based on one or both of a moving condition of the second member and a moving condition of the object.   The exposure apparatus according to any one of claims 1 to 16, wherein a position of the second liquid immersion member is determined based on one or both of a moving condition of the second member and a moving condition of the object.   The exposure apparatus according to claim 1, wherein the second liquid immersion member is moved based on one or both of the movement condition of the second member and the movement condition of the object.   The second liquid immersion member is arranged such that at least a part of the first liquid flowing out from the first space between the first liquid immersion member and the object is captured in the second liquid immersion space. The exposure apparatus according to any one of claims 1 to 18, wherein the second immersion space is formed.   The second liquid immersion member is disposed outside the first liquid immersion space so that the first liquid existing on the upper surface of the object is captured by the second liquid immersion space. The exposure apparatus according to claim 1, wherein the exposure apparatus is formed. An exposure apparatus that exposes a substrate with exposure light through a first liquid,
An optical member having an exit surface from which the exposure light is emitted;
A first member disposed at least at a part of the periphery of the optical path of the exposure light; and at least a part of the first member disposed below the first member so as to be able to face the first member and movable relative to the first member. Two members, a first liquid supply unit that is disposed on the first member and supplies the first liquid, and a first liquid recovery unit that is disposed on the second member and collects the first liquid. A first immersion member capable of forming a first immersion space for the first liquid on an object movable below the optical member;
A third member connected to the second member and having a recovery channel through which the first liquid recovered from the first liquid recovery unit flows;
An exposure apparatus comprising: a suppression device that suppresses a temperature change in one or both of the second member and the third member. The third member includes a flow path disposed adjacent to the recovery flow path, and an opening connecting the flow path and the external space of the third member,
The suppression device includes an air conditioner that adjusts the temperature of the external space of the third member,
The exposure apparatus according to claim 21, wherein at least part of the gas in the external space flows into the flow path through the opening.   23. The exposure apparatus according to claim 21, wherein the suppression device includes a temperature adjustment device that adjusts the temperature of one or both of the second member and the third member.   The exposure apparatus according to any one of claims 21 to 23, wherein the suppressing device suppresses heat transfer from the second member.   25. The exposure apparatus according to claim 24, wherein the suppression device includes a heat insulating portion disposed at least at a part of the periphery of the second member. A support member for supporting the second member;
The exposure apparatus according to any one of claims 21 to 25, wherein the third member includes the support member. An exposure apparatus that exposes a substrate with exposure light through a first liquid,
An optical member having an exit surface from which the exposure light is emitted;
A first member disposed in at least a part of the periphery of the optical path of the exposure light and having a first liquid supply part for supplying the first liquid; and disposed in at least a part of the periphery of the first member; A recovery member having a first liquid recovery part that recovers one liquid, and the object is disposed so as to be opposed to one or both of the first member and the recovery member, and is movable with respect to the first member An exposure apparatus comprising: a second member; and a first immersion member capable of forming a first immersion space for the first liquid on an object movable below the optical member.  28. The exposure apparatus according to claim 27, wherein the recovery member is movable with respect to the first member.   The exposure apparatus according to claim 27 or 28, wherein the recovery member and the second member move under different movement conditions with respect to the first member.  30. The exposure apparatus according to any one of claims 27 to 29, wherein a lower surface of the recovery member that can face the object is disposed above a lower surface of the second member.   The exposure apparatus according to claim 30, wherein the upper surface of the second member and a part of the lower surface of the recovery member face each other with a gap therebetween.   32. The exposure apparatus according to claim 30 or 31, wherein the first liquid recovery part is disposed so that the object can face the first liquid recovery part.   The exposure apparatus according to any one of claims 21 to 32, wherein the second member is moved in a state where the first immersion space is formed.   The exposure apparatus according to any one of claims 21 to 33, wherein the second member is moved so that a relative speed with the object is reduced.   The said 2nd member is moved so that the relative speed of the said 2nd member and the said object may become smaller than the relative speed of the said 1st member and the said object. The exposure apparatus described.   36. The exposure apparatus according to any one of claims 21 to 35, wherein the second member is moved so that a relative acceleration with the object is reduced.   The said 2nd member is moved so that the relative acceleration of the said 2nd member and the said object may become smaller than the relative acceleration of the said 1st member and the said object. The exposure apparatus described.   The exposure apparatus according to any one of claims 1 to 37, wherein the first member is substantially stationary. The first member has a first opening through which exposure light can pass,
The exposure apparatus according to any one of claims 1 to 38, wherein the second member has a second opening through which exposure light can pass. The object includes the substrate;
In a state where the first immersion space is formed, the substrate moves in the plane substantially perpendicular to the optical axis of the optical member and then moves in the second path,
In the first path, the movement of the substrate includes movement in a second direction substantially parallel to the second axis in the plane;
In the second path, the movement of the substrate includes movement in a third direction substantially parallel to a third axis perpendicular to the second axis in the plane,
40. The exposure apparatus according to any one of claims 1 to 39, wherein the second member moves in the third direction during at least a part of a period during which the substrate moves along the second path.   The exposure light is irradiated to the shot region of the substrate through the liquid in the immersion space when the substrate moves along the first path, and the exposure light is not irradiated when moved along the second path. Item 41. The exposure apparatus according to Item 40. The substrate moves along the third path after moving along the second path,
In the third path, the movement of the substrate includes movement in a third direction opposite to the first direction;
42. The exposure apparatus according to claim 40, wherein the second member moves in a fourth direction opposite to the second direction during at least a part of a period during which the substrate moves in the third path.   43. At least a part of the second member moves in a direction substantially parallel to the optical axis of the optical member during at least a part of the period in which the second member moves in the fourth direction. Exposure equipment.   44. The exposure apparatus according to any one of claims 1 to 43, wherein the object includes a substrate stage that moves while holding the substrate. Exposing the substrate using the exposure apparatus according to any one of claims 1 to 44;
Developing the exposed substrate. A device manufacturing method. An exposure method for exposing the substrate with exposure light through a first liquid between an emission surface of the optical member and the substrate,
A first member disposed in at least a part of the periphery of the optical path of the exposure light, and an object movable at least a part below the first member and below the optical member so as to face each other; Forming a first immersion space for the first liquid on the substrate using a first immersion member having a second member movable with respect to one member;
Exposing the substrate with the exposure light emitted from the exit surface through the first liquid in the first immersion space;
Moving the second member relative to the first member in at least a portion of the exposure of the substrate;
Using a second immersion member disposed outside the first immersion member with respect to the optical path, on the object movable below the optical member, away from the first immersion space, Forming a second immersion space of two liquids. An exposure method for exposing the substrate with exposure light through a first liquid between an emission surface of the optical member and the substrate,
A first member disposed in at least a part of the periphery of the optical path of the exposure light, and an object movable at least a part below the first member and below the optical member so as to face each other; A second member movable with respect to one member; a first liquid supply portion disposed on the first member for supplying the first liquid; and a second liquid disposed on the second member for recovering the first liquid. Forming a first immersion space for the first liquid on the substrate using a first immersion member having one liquid recovery unit;
Exposing the substrate with the exposure light emitted from the exit surface through the first liquid in the first immersion space;
Moving the second member relative to the first member in at least a portion of the exposure of the substrate;
Suppressing a temperature change in one or both of the second member and the third member connected to the second member and having a recovery flow path through which the first liquid recovered from the first liquid recovery unit flows; An exposure method comprising: An exposure method for exposing the substrate with exposure light through a first liquid between an emission surface of the optical member and the substrate,
A first member disposed in at least a part of the periphery of the optical path of the exposure light and having a first liquid supply part for supplying the first liquid; and disposed in at least a part of the periphery of the first member; A recovery member having a first liquid recovery part for recovering one liquid, and an object movable below the optical member below one or both of the first member and the recovery member so as to face each other; Forming a first immersion space for the first liquid on the substrate using a first immersion member having a second member movable relative to the one member;
Exposing the substrate with the exposure light emitted from the exit surface through the first liquid in the first immersion space;
An exposure method comprising: moving at least one of the second member and the recovery member relative to the first member in at least a part of the exposure of the substrate. Exposing the substrate using the exposure method according to any one of claims 46 to 48;
Developing the exposed substrate. A device manufacturing method. A program that causes a computer to execute control of an immersion exposure apparatus that exposes the substrate with exposure light via a first liquid between an emission surface of an optical member and the substrate,
A first member disposed in at least a part of the periphery of the optical path of the exposure light, and an object movable at least a part below the first member and below the optical member so as to face each other; Forming a first immersion space for the first liquid on the substrate using a first immersion member having a second member movable with respect to one member;
Exposing the substrate with the exposure light emitted from the exit surface through the first liquid in the first immersion space;
Moving the second member relative to the first member in at least a portion of the exposure of the substrate;
Using a second immersion member disposed outside the first immersion member with respect to the optical path, on the object movable below the optical member, away from the first immersion space, Forming a second liquid immersion space of two liquids. A program that causes a computer to execute control of an immersion exposure apparatus that exposes the substrate with exposure light via a first liquid between an emission surface of an optical member and the substrate,
A first member disposed in at least a part of the periphery of the optical path of the exposure light, and an object movable at least a part below the first member and below the optical member so as to face each other; A second member movable with respect to one member; a first liquid supply portion disposed on the first member for supplying the first liquid; and a second liquid disposed on the second member for recovering the first liquid. Forming a first immersion space for the first liquid on the substrate using a first immersion member having one liquid recovery unit;
Exposing the substrate with the exposure light emitted from the exit surface through the first liquid in the first immersion space;
Moving the second member relative to the first member in at least a portion of the exposure of the substrate;
Suppressing a temperature change in one or both of the second member and the third member connected to the second member and having a recovery flow path through which the first liquid recovered from the first liquid recovery unit flows; A program that executes A program that causes a computer to execute control of an immersion exposure apparatus that exposes the substrate with exposure light via a first liquid between an emission surface of an optical member and the substrate,
A first member disposed in at least a part of the periphery of the optical path of the exposure light and having a first liquid supply part for supplying the first liquid; and disposed in at least a part of the periphery of the first member; A recovery member having a first liquid recovery part for recovering one liquid, and an object movable below the optical member below one or both of the first member and the recovery member so as to face each other; Forming a first immersion space for the first liquid on the substrate using a first immersion member having a second member movable relative to the one member;
Exposing the substrate with the exposure light emitted from the exit surface through the first liquid in the first immersion space;
A program for executing one or both of the second member and the recovery member with respect to the first member in at least a part of the exposure of the substrate.   53. A computer-readable recording medium on which the program according to any one of claims 50 to 52 is recorded.

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