JP2013180519A - Surface-treated film formed with concealment pattern and method for producing the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a surface-treated film which is the surface-treated film built into a display and in which a concealing layer has a thickness not recognized as irregularities from an observer side.SOLUTION: In a surface-treated film having at least a concealing layer on a transparent substrate, a part surrounded by the concealing layer on the same surface as the transparent substrate where the concealing layer is formed, is interpolated by a transparent resin layer in the surface-treated film. The surface-treated film has a flat layer on the layer including the concealing layer and the transparent resin layer.

Description

  The present invention relates to a surface treatment film applied to a display screen of a display such as an LCD, PDP, CRT, projection display, or EL display.

  In recent years, various techniques have been proposed in order to improve the design of the outer edge of the image display portion of the display, that is, the so-called frame portion.

  As the background, wiring for driving the display is provided on the frame portion, and it is necessary to hide the wiring from the observer. For this reason, there are currently proposed a method of hiding the wiring with a housing, a method of hiding with a printed layer formed for the purpose of hiding the frame portion, and the like. (For example, see Patent Document 1)

KR101027796B1

On the other hand, in the method of concealing the frame portion with the printed layer, the thickness of the concealing layer can be observed regardless of whether the concealing layer is printed directly on the surface-treated film or when it is printed on another film and laminated. There was a problem that it was recognized as unevenness from the side, and the design was lost.
The present invention has been made in view of the above circumstances, and even when the concealing layer in the method of concealing the frame portion with the printing layer is directly printed on the surface-treated film, it is printed on another film. An object of the present invention is to provide a surface-treated film in which the thickness of the concealing layer is not recognized as unevenness from the observer side even when laminating.

  The present invention has been made to solve the above-described problems, and provides a surface-treated film in which the unevenness of the concealing layer printed on the frame portion is eliminated, and a method for producing the same.

  Specifically, in order to solve the above-described problems, the invention according to claim 1 includes a surface treatment film having at least a concealing layer on a transparent substrate, the same surface as the surface of the transparent substrate on which the concealing layer is formed. A surface treatment film is provided, wherein a transparent resin layer is formed in a portion surrounded by the concealing layer.

  According to a second aspect of the present invention, there is provided the surface-treated film according to the first aspect, wherein a flat layer is provided on the layer composed of the concealing layer and the transparent resin layer.

  The invention according to claim 3 is characterized in that end portions of the concealing layer and the transparent resin layer are overlapped, and the width of the overlap portion of the concealing layer and the transparent resin layer is 100 μm or more and 300 μm or less. The surface treatment film according to claim 1 or 2 is provided.

  The invention according to claim 4 is the surface-treated film according to any one of claims 1 to 3, further comprising a hard coat layer, wherein the hard coat layer is a concealing layer of a transparent substrate and Provided is a hard coat film formed on the outermost surface on the side where the transparent resin layer is formed or on the surface opposite to the surface where the concealing layer and the transparent resin layer are formed.

  The invention according to claim 5 is the surface-treated film according to any one of claims 1 to 3, further comprising a hard coat layer and a low refractive index layer as a concealing layer and a transparent resin layer of a transparent substrate. Is formed on the surface side opposite to the surface on which the concealing layer and the transparent resin layer are formed, and the low refractive index layer is formed on the surface side of the hard coat layer. An antireflection film is provided.

  According to a sixth aspect of the present invention, there is provided a method for producing a surface-treated film, the step of applying a concealing layer-forming coating liquid containing a thermosetting material and a pigment on a transparent substrate, and forming the coating film. A step of heating the film to form a concealing layer, a step of applying a transparent resin layer-forming coating liquid containing a thermosetting material on a transparent substrate to form a coating film, and heating the transparent coating film to form a transparent resin The manufacturing method of the surface treatment film characterized by including the process of forming a layer is provided.

  The invention according to claim 7 is a method for producing a surface-treated film, the step of applying a transparent resin layer-forming coating liquid containing a thermosetting material on a transparent substrate to form a coating film, and the coating film Forming a transparent resin layer by heating the coating, forming a coating film by applying a concealing layer forming coating liquid containing a thermosetting material and a pigment on a transparent substrate, and heating and concealing the coating film The manufacturing method of the surface treatment film characterized by including the process of forming a layer is provided.

  The invention according to claim 8 includes a step of applying a transparent resin layer-forming coating liquid containing a thermosetting material on a transparent substrate to form a coating film and heating the coating film to form a transparent resin layer; The concealment is performed by repeating a process of forming a coating layer by applying a coating solution for forming a masking layer containing a thermosetting material and a pigment on the transparent substrate, and heating the coating film to form a masking layer at least twice. The method for producing a surface-treated film according to claim 6 or 7, wherein a layer and the transparent resin layer are formed.

  The invention according to claim 9 is a frame plate having a rectangular convex portion and a rectangular concave portion inside the rectangular convex portion, and a hollow plate having a rectangular convex portion, wherein The length of the long side of the concave part and the length of the long side of the convex part of the hollow plate are shorter by 100 to 600 μm at the both ends of the convex part of the frame plate. The frame plate and the hollow plate are characterized in that the length of the short side of the convex portion of the hollow plate is shorter by 100 to 600 μm at both ends of the convex portion of the frame plate.

  According to this invention, the surface treatment film by which the unevenness | corrugation by the thickness of a concealing layer was planarized by the transparent resin layer is provided.

Explanatory drawing of the cross section of the surface treatment film which concerns on this invention Explanatory drawing of the section of the hard coat film concerning the present invention Explanatory drawing of the cross section of the antireflection film which concerns on this invention Explanatory drawing of the printing plate of the concealing layer and transparent resin layer concerning this invention Explanatory drawing of the manufacturing method by the overcoating of the concealing layer and transparent resin layer concerning this invention Explanatory drawing of the overlap part of the concealing layer and transparent resin layer concerning this invention Explanatory drawing of what laminated the surface treatment film concerning this invention on the antireflection film

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. In addition, about embodiment below, it is an example and is not limited to these.

In FIG. 1, the cross-sectional schematic diagram of the surface treatment film which concerns on embodiment based on this invention was shown. As shown in FIG. 1, the surface-treated film 11 of the present invention is on the same surface as the surface of the transparent base material on which at least one surface of the transparent base material 12 is covered with the masking layer 13 and the masking layer. A transparent resin layer 14 is provided to cover a portion surrounded by the hiding layer. The concealing layer 12 is formed by applying a coating liquid on the transparent substrate 12 using a coating liquid containing at least a thermosetting material and a pigment, and curing the thermosetting material by heating. The transparent resin layer 14 uses a coating liquid containing at least a thermosetting material, applies the coating liquid to a portion surrounded by the concealing layer 13 on the transparent substrate 12, and heats the thermosetting material. Is formed by curing.
Moreover, in the surface treatment film of this invention, the surface of the transparent base material provided with the concealment layer 13 and the transparent resin layer 14, or the surface of the transparent base material 12 provided with the concealment layer 13 and the transparent resin layer 14 By providing the hard coat layer 22 on the surface of the transparent substrate opposite to the hard coat film 21 (FIG. 2), and providing the low refractive index layer 32 on the hard coat layer 22 of the hard coat film. On the transparent substrate opposite to the surface of the transparent substrate provided with the antireflection film 31 (FIG. 3), the masking layer and the transparent resin layer, or the surface of the transparent substrate provided with the masking layer and the transparent resin layer By providing an antiglare hard coat layer, an antiglare film or the like can be obtained.

  In the surface-treated film of the present invention, the thickness of the masking layer is determined by the concentration of the pigment contained in the masking layer forming coating solution. The concealing layer has a thickness of 2 μm or more and 5 μm or less and a light transmittance of less than 10%.

  In the surface treatment film of the present invention, the difference between the thickness of the concealing layer and the thickness of the transparent resin layer is within 0.5 μm. If the difference between the thickness of the concealing layer and the thickness of the transparent resin layer exceeds 0.5 μm, the thickness of the concealing layer is recognized as unevenness from the observer side when the surface treatment film is incorporated into the display. Is damaged.

  In the surface treatment film of the present invention, the line width of the concealing layer is 0.5 cm or more and 10.0 cm or less. When the line width of the concealing layer is less than 0.5 cm, the wiring for driving the display cannot be sufficiently concealed even in a small display such as a mobile display. On the other hand, when the line width of the concealing layer exceeds 10.0 cm, the frame portion of the display becomes large and the design is inferior.

  As shown in FIG. 1, in the surface treatment film of the present invention, it is desirable to provide a flat layer 15 on the layer composed of the concealing layer 13 and the transparent resin layer 14. By providing the flat layer 15, the elimination of unevenness by the concealing layer 13 is further promoted, and when the surface treatment film is incorporated in the display, the thickness of the concealing layer is not recognized as unevenness from the observer side, and the design is excellent It becomes.

  Next, the cross-sectional schematic diagram of the hard coat film which concerns on embodiment based on this invention at FIG. 2 was shown. In the surface treatment film of the present invention, as shown in FIG. 2, the surface of the transparent base material provided with the concealing layer 13 and the transparent resin layer 14 or the transparent base material provided with the concealing layer and the transparent resin layer. The hard coat film 21 can be obtained by providing the hard coat layer 22 on the surface of the transparent substrate opposite to the surface. The hard coat layer is a coating liquid containing at least an ionizing radiation curable material and a quaternary ammonium salt material, and is on the concealing layer and the transparent resin layer or on the side opposite to the surface on which the concealing layer and the transparent resin layer are provided. It is formed by applying a coating liquid on a transparent substrate and curing the ionizing radiation curable material with ionizing radiation.

  Next, FIG. 3 shows a schematic cross-sectional view of an antireflection film according to an embodiment of the present invention. In the surface treatment film of the present invention, as shown in FIG. 3A, an antireflection film can be obtained by providing a low refractive index layer 32 on the hard coat film shown in FIG. The low refractive index layer is formed by applying a coating liquid on the hard coat layer using a coating liquid containing at least an ionizing radiation curable material and low refractive index particles, and curing the ionizing radiation curable material with ionizing radiation. Is done.

  In the antireflection film, as shown in FIG. 3B, a layer comprising a transparent substrate 12, a hard coat layer 22, a concealing layer 13 and a transparent resin layer 14, a flat layer 15, a low refractive index. The layers 32 may be laminated in this order, or as shown in FIG. 3C, a layer comprising the flat layer 15, the concealing layer 13 and the transparent resin layer 14, the transparent substrate 12, the hard coat layer 22, and the low refraction. The rate layers 32 may be stacked in this order. Furthermore, in the antireflection film having a plurality of hard coat layers and a plurality of low refractive index layers, the layer composed of the concealing layer and the transparent resin layer may be laminated at any position as long as it is not the outermost surface.

  In these cases, it is desirable to provide another layer on the concealing layer 13 and the transparent resin layer 14 via the flat layer 15. By providing the flat layer, the elimination of unevenness due to the concealing layer is further promoted, and when the hard film or the antireflection film is incorporated in the display, the thickness of the concealing layer is not recognized as unevenness from the observer side, and the design is It will be excellent.

  Similarly to the example shown above, in the surface-treated film, an antiglare film can be obtained by combining an antiglare hard coat layer. Similarly, an antiglare film can be obtained by combining the surface-treated film with an antiglare hard coat layer and a low refractive index layer.

  The surface treatment film, hard coat film and antireflection film of the present invention will be described in more detail.

  As the transparent substrate used in the surface-treated film of the present invention, a cellulose film such as a triacetyl cellulose film can be suitably used. Low birefringence, excellent optical properties such as transparency, refractive index, and dispersion, as well as various physical properties such as impact resistance, heat resistance, and durability, and can be suitably used for liquid crystal display devices. . Furthermore, in the embodiment in which the hard coat layer is directly formed on the transparent substrate, the cellulose-based film is easily dissolved or swollen by the solvent when the coating liquid for forming the hard coat layer is applied on the transparent substrate. Therefore, it is possible to effectively prevent the occurrence of interference unevenness due to the film thickness of the hard coat layer formed when the hard coat layer is formed on the transparent substrate.

  In addition, various stabilizers, ultraviolet absorbers, plasticizers, lubricants, colorants, antioxidants, flame retardants, and the like may be added to the transparent substrate. The thickness of the transparent substrate is not particularly limited, but is preferably in the range of 20 μm or more and 200 μm or less. Furthermore, when the transparent substrate is a triacetylcellulose film, the heat of the transparent substrate is preferably in the range of 40 μm to 80 μm.

  As the concealing layer provided on the transparent substrate of the present invention, a concealing layer forming coating solution containing at least a thermosetting material and a pigment is applied by a wet film forming method, and is applied onto the transparent substrate or the hard coat layer. It can be formed by forming a film, drying the coating film, and heating and curing the coating film.

  The thermosetting material contained in the coating liquid for forming the concealing layer includes acrylic resin materials, epoxy resin materials, amino-alkyd resin materials, melamine resin materials, urethane resin materials, polyester resin materials, vinyl resins. A resin material or the like can be used. It is also desirable to use a chlorinated vinyl vinyl acetate copolymer of a vinyl resin material. This is because the optical properties such as transparency are excellent.

  The color of the pigment contained in the coating solution for forming the concealing layer is not particularly limited, but is preferably black. This is because the concealability of the concealing layer can be improved. Here, carbon black, lamp black, bone black, graphite, iron black, etc. are used as the black pigment. Other colors excellent in hiding properties include white or silver, and in the case of white, white ink made of titanium oxide white pigment or the like, and in the case of silver, silver ink made of aluminum paste or the like is used.

  As the transparent resin layer provided on the transparent substrate of the present invention, a coating solution for forming a transparent resin layer containing at least a thermosetting material is applied by a wet film forming method, and applied onto the transparent substrate or the hard coat layer. It can be formed by forming a film, drying the coating film, and heating and curing the coating film.

  Thermosetting materials contained in the coating liquid for forming the transparent resin layer include acrylic resin materials, epoxy resin materials, amino-alkyd resin materials, melamine resin materials, urethane resin materials, polyester resin materials, vinyl A resin material or the like can be used. The thermosetting material used for the transparent resin layer is preferably the same as the thermosetting material used for the concealing layer. This is because the optical properties such as transparency are excellent and the adhesiveness with the concealing layer is also excellent.

  As a wet film forming method for applying the coating solution for forming the concealing layer and the transparent resin layer, the dip coating method, the spin coating method, the flow coating method, the spray coating method, the roll coating method, the gravure roll coating method, the air Doctor coating method, blade coating method, wire doctor coating method, knife coating method, reverse coating method, transfer roll coating method, micro gravure coating method, kiss coating method, cast coating method, slot orifice coating method, calendar coating method, die coating It can be formed by applying to at least one side of the transparent substrate 11 by a method or the like. The microgravure coating method is preferably used because it is particularly necessary to form a thin and uniform layer. In addition, when it becomes necessary to form a thick layer, a die coating method can be used.

  Although there is no particular limitation on the printing press, it is preferable to use a two-color to seven-color printing press when performing the overcoating of the concealing layer and the transparent resin layer as will be described later. By performing continuous printing, it becomes easy to align when performing the overcoating of a concealing layer and a transparent resin layer, which will be described later, and the concealing layer, the transparent resin layer, and the flat layer can be formed in one pass, so that productivity is achieved. Can be improved.

  As a plate used for a printing machine, a frame plate 41 for forming a concealing layer and a hollow plate 44 for forming a transparent resin layer are used. As shown in FIG. 4, the frame plate and the hollow plate have at least one rectangular convex portion 42, and the frame plate further has a rectangular concave portion 43 inside the convex portion 42. .

  As for the length of the long side of the concave part of the frame plate and the length of the long side of the convex part of the hollow plate, the convex part of the frame plate is preferably shorter by 100 μm to 600 μm at both ends. Similarly, the length of the short side of the concave portion of the frame plate and the length of the short side of the convex portion of the hollow plate are preferably 100 μm to 600 μm shorter at both ends. Depending on the printing method such as the micro gravure coating method, when the coating film is formed, the edge of the coating film of the concealing layer and the transparent resin layer spreads. If the length of the long side of the convex part and the length of the short side of the concave part of the frame plate are the same as the length of the short side of the convex part of the hollow plate, the concealing layer and the transparent resin layer overlap each other. This is because the film thickness of the concealing layer and the transparent resin layer is exceeded and irregularities are formed on the surface of the surface treatment film.

  Moreover, as a drying method of the coating film formed on a transparent base material or a hard-coat layer, it can carry out by ventilation drying, hot air drying, heat drying, and these combinations.

  Next, the coating film formed on the transparent substrate or hard coat layer is cured by heating. The heating temperature at this time is desirably 60 ° C. or higher and 100 ° C. or lower. This is because when the heating temperature is less than 60 ° C., curing becomes insufficient, and when the heating temperature exceeds 100 ° C., the transparent substrate or the like may be damaged.

  In the concealing layer and the transparent resin layer of the present invention, each layer-forming coating solution may be applied, dried and thermally cured a plurality of times, and the same layer may be repeatedly applied. Thereby, a desired film thickness can be more systematically realized in the concealing layer and the transparent resin layer. Further, the number of times of overcoating is not particularly limited, but is preferably 3 times or less from the viewpoint of preventing the manufacturing method from becoming complicated.

  The order of forming the concealing layer and the transparent resin layer is not particularly limited. As described above, in the case where three times of overcoating are performed, the concealing layer, the transparent resin layer, and the concealing layer are performed as shown in FIG. , Transparent resin layer, hiding layer, transparent resin layer may be formed in this order, or as shown in FIG. 5B, the hiding layer, hiding layer, hiding layer, transparent resin layer, transparent resin layer, transparent resin layer are arranged in this order. It may be formed.

  Moreover, in the concealing layer and the transparent resin layer of the surface treatment film in the present invention, it is desirable that the end portions of the concealing layer and the transparent resin layer overlap as shown in FIG. This occurs because the end portions of the coating layers of the concealing layer and the transparent resin layer are widened when forming the coating layers of the concealing layer and the transparent resin layer depending on the printing method such as the micro gravure coating method. At this time, it is desirable that the width of the overlapping portion of the concealing layer and the transparent resin layer is 100 μm or more and 300 μm or less. When the width of the overlap part is less than 100 μm, the film thickness of the overlap part becomes thinner than the film thickness of the concealing layer and the transparent resin layer, and the unevenness becomes large. Further, when the width of the overlap portion is 300 μm or more, the thickness of the overlap portion becomes thicker than the thickness of the concealing layer and the transparent resin layer, and the unevenness becomes large. Here, the width 63 of the overlap portion is such that the first layer of either the concealment layer or the transparent resin layer is in contact with the transparent substrate or the hard coat layer, and the other second layer is the first layer. The distance of the edge part 62 which contacts this layer.

  In addition, for example, as shown in FIG. 5A, there is a case where a concealing layer, a transparent resin layer, a concealing layer, a transparent resin layer, a concealing layer, and a transparent resin layer are sequentially applied to form a concealing layer and a transparent resin layer. As shown in FIG. 6B, the width 66 of the overlap portion between the second and subsequent concealing layers and the transparent resin layer is such that the first layer of either the concealing layer or the transparent resin layer is the other one. The distance between the end portion 64 in contact with the first layer of the second layer and the end portion 65 in contact with the second layer of the other second layer is referred to as the distance.

  In the flat layer provided on the layer composed of the masking layer and the transparent resin layer of the present invention, a coating solution for forming a flat layer containing at least a thermosetting material is applied by a wet film forming method, and the masking layer and the transparent layer are coated. It can be formed by forming a coating film on a layer composed of a resin layer, drying the coating film, and heating and curing the coating film.

  The thermosetting materials contained in the flat layer forming coating liquid include acrylic resin materials, epoxy resin materials, amino-alkyd resin materials, melamine resin materials, urethane resin materials, polyester resin materials, and vinyl resins. A resin material or the like can be used. The thermosetting material used for the transparent resin layer is preferably the same as the thermosetting material used for the concealing layer and the transparent resin layer. This is because the adhesion between the layer composed of the concealing layer and the transparent resin layer and the flat layer becomes good.

  In the hard coat film and the antireflection film of the present invention, a hard coat layer (hereinafter referred to as a transparent substrate or the like) is formed on a transparent substrate, a layer composed of a concealing layer and a transparent resin layer, or a flat layer. It is formed. The hard coat layer is formed by applying a coating liquid for forming a hard coat layer containing at least an ionizing radiation curable material and a quaternary ammonium salt material by a wet film forming method to form a coating film on a transparent substrate. It can be formed by drying and irradiating the coating film with ionizing radiation.

  An acrylic material can be used as the ionizing radiation curable material contained in the hard coat layer forming coating solution. The acrylic material is synthesized from a monofunctional or polyfunctional (meth) acrylate compound such as acrylic acid or methacrylic acid ester of polyhydric alcohol, diisocyanate and polyhydric alcohol, and hydroxyester of acrylic acid or methacrylic acid. Such a polyfunctional urethane (meth) acrylate compound can be used. In addition to these, polyether resins having an acrylate functional group, polyester resins, epoxy resins, alkyd resins, spiroacetal resins, polybutadiene resins, polythiol polyene resins, and the like can be used as acrylic materials.

  In the present invention, “(meth) acrylate” refers to both “acrylate” and “methacrylate”. For example, “urethane (meth) acrylate” indicates both “urethane acrylate” and “urethane methacrylate”.

  Examples of the monofunctional (meth) acrylate compound include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl ( (Meth) acrylate, t-butyl (meth) acrylate, glycidyl (meth) acrylate, acryloylmorpholine, N-vinylpyrrolidone, tetrahydrofurfuryl acrylate, cyclohexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, isobornyl (meth) ) Acrylate, isodecyl (meth) acrylate, lauryl (meth) acrylate, tridecyl (meth) acrylate, cetyl (meth) acrylate, stearyl (meth) acrylate, benzyl (Meth) acrylate, 2-ethoxyethyl (meth) acrylate, 3-methoxybutyl (meth) acrylate, ethyl carbitol (meth) acrylate, phosphoric acid (meth) acrylate, ethylene oxide modified phosphoric acid (meth) acrylate, phenoxy (meta) ) Acrylate, ethylene oxide modified phenoxy (meth) acrylate, propylene oxide modified phenoxy (meth) acrylate, nonylphenol (meth) acrylate, ethylene oxide modified nonylphenol (meth) acrylate, propylene oxide modified nonylphenol (meth) acrylate, methoxydiethylene glycol (meth) Acrylate, methoxypolyethylene glycol (meth) acrylate, methoxypropylene glycol (meth) acrylate 2- (meth) acryloyloxyethyl-2-hydroxypropyl phthalate, 2-hydroxy-3-phenoxypropyl (meth) acrylate, 2- (meth) acryloyloxyethyl hydrogen phthalate, 2- (meth) acryloyloxypropyl hydrogen Phthalate, 2- (meth) acryloyloxypropyl hexahydrohydrogen phthalate, 2- (meth) acryloyloxypropyl tetrahydrohydrogen phthalate, dimethylaminoethyl (meth) acrylate, trifluoroethyl (meth) acrylate, tetrafluoropropyl (meth) acrylate , Hexafluoropropyl (meth) acrylate, octafluoropropyl (meth) acrylate, octafluoropropyl (meth) acrylate, 2 -Adamantane derivatives mono (meth) acrylates such as adamantyl acrylate having a monovalent mono (meth) acrylate derived from adamantane and adamantanediol.

  Examples of the bifunctional (meth) acrylate compound include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, butanediol di (meth) acrylate, hexanediol di (meth) acrylate, and nonanediol di (meth). ) Acrylate, ethoxylated hexanediol di (meth) acrylate, propoxylated hexanediol di (meth) acrylate, diethylene glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate, tripropylene glycol di (meth) acrylate, polypropylene glycol di (Meth) acrylate, neopentyl glycol di (meth) acrylate, ethoxylated neopentyl glycol di (meth) acrylate, tripropylene glycol Ruji (meth) acrylate, di (meth) acrylate, such as hydroxypivalic acid neopentyl glycol di (meth) acrylate.

  Examples of the trifunctional or higher functional (meth) acrylate compound include trimethylolpropane tri (meth) acrylate, ethoxylated trimethylolpropane tri (meth) acrylate, propoxylated trimethylolpropane tri (meth) acrylate, and tris 2-hydroxy. Ethyl isocyanurate tri (meth) acrylate, tri (meth) acrylate such as glycerin tri (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol tri (meth) acrylate, ditrimethylolpropane tri (meth) acrylate, etc. Trifunctional (meth) acrylate compounds, pentaerythritol tetra (meth) acrylate, ditrimethylolpropane tetra (meth) acrylate, dipentaerythritol te Trifunctional or higher polyfunctionality such as la (meth) acrylate, dipentaerythritol penta (meth) acrylate, ditrimethylolpropane penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, ditrimethylolpropane hexa (meth) acrylate ( Examples thereof include a (meth) acrylate compound and a polyfunctional (meth) acrylate compound obtained by substituting a part of these (meth) acrylates with an alkyl group or ε-caprolactone.

  Among acrylic materials, polyfunctional urethane acrylates can be suitably used because the desired molecular weight and molecular structure can be designed and the physical properties of the formed hard coat layer can be easily balanced. . The urethane acrylate is obtained by reacting a polyhydric alcohol, a polyvalent isocyanate, and a hydroxyl group-containing acrylate.

  The quaternary ammonium salt material contained in the coating liquid for forming the hard coat layer has a structure of -N + X- and is electrically conductive in the hard coat layer by having a quaternary nitrogen atom (-N +) and an anion (X-). To express. In this case, examples of X- include Cl-, Br-, I-, F-, HSO4-, SO42-, NO3-, PO43-, HPO42-, H2PO4-, SO3-, OH-, and the like.

  Among these, as the quaternary ammonium salt material, an acrylic material containing a quaternary ammonium cation as a functional group in the molecule can be preferably used. Examples of the acrylic material containing a quaternary ammonium cation in the molecule as a functional group include polyfunctional or polyfunctional polyfunctional alcohols such as acrylic acid or methacrylic acid ester containing a quaternary ammonium cation in the molecule as a functional group ( A polyfunctional urethane (meth) acrylate compound synthesized from a (meth) acrylate compound, a diisocyanate and a polyhydric alcohol, a hydroxyester of acrylic acid or methacrylic acid, or the like can be used. Besides these, as ionizing radiation type materials, polyether resins having an acrylate functional group, polyester resins, epoxy resins, alkyd resins, spiroacetal resins, polybutadiene resins, polythiol polyene resins, and the like can be used. .

  Specifically, light ester DQ-100 (manufactured by Kyoeisha Chemical Co., Ltd.) or the like can be used as an acrylic material containing a quaternary ammonium cation as a functional group in the molecule.

  By using an acrylic material containing a quaternary ammonium cation as a functional group in the molecule, a low refractive index layer can be stably formed on the hard coat layer. When a hard coat layer is formed using a material having a quaternary ammonium cation and not having an acrylic group and / or methacryl group and an acrylic material not having a quaternary ammonium cation, a quaternary ammonium cation is included. The material may segregate on the surface, which may cause the low refractive index layer forming coating solution to be repelled when the low refractive index layer forming coating solution is applied onto the hard coat layer. In addition, the formed low refractive index layer may be whitened. By using an acrylic material containing a quaternary ammonium cation in the molecule, the acrylic material containing a quaternary ammonium cation in the molecule can form a matrix and prevent surface segregation.

  By forming a hard coat layer using a quaternary ammonium salt material, an antistatic function can be imparted to the hard coat layer. Forming a hard coat layer using a quaternary ammonium salt material among conductive materials to form a hard coat layer having antistatic properties using only a conductive material such as metal particles or metal oxide particles; In comparison, a decrease in the total light transmittance can be prevented, and further, occurrence of interference unevenness can be suppressed.

  In the present invention, the coating liquid for forming the hard coat layer is characterized by using a coating liquid containing at least an ionizing radiation curable material and a quaternary ammonium salt material. When an acrylic material containing a quaternary ammonium cation as a functional group in the molecule is used, an ionizing radiation curable material having no quaternary ammonium cation is added to the coating liquid as necessary. The acrylic material containing a quaternary ammonium cation in the molecule as a functional group may be a single material that serves both as an ionizing radiation curable material and a quaternary ammonium salt material.

  When a hard coat layer is formed by curing with ultraviolet rays as ionizing radiation on a coating film made of a coating liquid for forming a hard coat layer, a photopolymerization initiator is added to the coating liquid. The photopolymerization initiator is preferably added in the range of 0.5 to 10.0 parts by weight with respect to 100 parts by weight of the solid content of the hard coat layer forming coating solution. When the ionizing radiation curable material is cured by ultraviolet rays, if the photopolymerization initiator is less than 0.5 parts by weight with respect to 100 parts by weight of the hard coat layer forming material, the polymerization reaction becomes insufficient and the resin is not effective. The hardness of the hard coat layer is lowered. Moreover, when a photoinitiator exceeds 10.0 weight part with respect to 100 weight part of hard-coat layer forming materials, the polymerization degree of resin after photopolymerization will become low, As a result, a hard-coat layer will become weak. As a result, the scratch resistance of the surface is weakened.

  Examples of the photopolymerization initiator include 2,2-ethoxyacetophenone, 1-hydroxycyclohexyl phenyl ketone, dibenzoyl, benzoin, benzoin methyl ether, benzoin ethyl ether, p-chlorobenzophenone, p-methoxybenzophenone, Michler ketone, acetophenone, 2 -Chlorothioxanthone and the like. You may use these individually or in combination of 2 or more types.

  Moreover, a photosensitizer and a photosensitizer can be used for the hard coat layer forming coating solution. Examples of the photosensitizer include tertiary amines such as triethylamine, triethanolamine and 2-dimethylaminoethanol, alkylphosphine such as triphenylphosphine, and thioethers such as β-thiodiglycol. These may be used alone or in combination of two or more.

  Moreover, it is preferable to add 0.05-5.0 weight part of fluorine-type leveling agents with respect to 100 weight part of hard-coat layer forming materials to the coating liquid for hard-coat layer formation. As the fluorine leveling agent, a compound having a perfluoroalkyl group or a fluorinated alkenyl group in the main chain or side chain can be used. The perfluoroalkyl group has a structure of CnF2n + 1 (n = natural number) and functions as a hydrophobic / oleophobic group. Therefore, since it has the characteristic of orderly arranging on the surface, it can function as a leveling material that covers the surface with a small amount. At this time, by combining with a lipophilic group, it is possible to further increase the effect as a leveling material. Specifically, as the fluorine-based leveling agent, BYK-340 manufactured by Big Chemie Japan Co., Ltd., Fantent 222F manufactured by Neos Co., F470 manufactured by DIC Co., V-8FM manufactured by Osaka Organic Chemical Industry Co., Ltd., and the like can be used. It is not limited to these.

  The hard coat layer-forming coating solution may contain an antifoaming agent, an antioxidant, an ultraviolet absorber, a light stabilizer, a polymerization inhibitor and the like for further performance improvement.

  The prepared coating liquid for forming a hard coat layer is applied on a transparent substrate or the like by a wet film formation method, a coating film is formed on the transparent substrate or the like, the coating film is dried, A hard coat layer can be formed by irradiating the coating film with ionizing radiation and curing. At this time, as a coating method, the wet film formation method exemplified when applying the coating solution for forming the concealing layer and the coating solution for forming the transparent resin layer can be used. Further, as the drying method, the method exemplified in the method for forming the concealing layer and the transparent resin layer can be used.

  As a method for curing the coating film, for example, ultraviolet irradiation or an electron beam trading company can be used. In the case of ultraviolet irradiation, a high pressure mercury lamp, a halogen lamp, a xenon lamp, a fusion lamp, or the like can be used. In addition, it is preferable that the ultraviolet irradiation amount at the time of ultraviolet irradiation is 100 mJ / cm <2> or more and 800 mJ / cm <2> or less.

  The thickness of the hard coat layer to be formed is sufficient if it is 3 μm or more, but it is preferably in the range of 5 μm to 10 μm from the viewpoint of coating accuracy and handling. This is because if the thickness exceeds 10 μm, the substrate may be warped, distorted, or broken due to curing shrinkage. Furthermore, it is very preferable for the hard coat layer that the film thickness is in the range of 5 μm to 7 μm.

  Next, the low refractive index layer will be described. In the antireflection film of the present invention, the low refractive index layer is formed by a wet film formation method. The coating liquid for forming the low refractive index layer contains at least an ionizing radiation curable material and low refractive index particles. A coating solution for forming a low refractive index layer is applied onto the hard coat layer by a wet film formation method, a coating film is formed on the hard coat layer, the coating film is dried, and the coating film is irradiated with ionizing radiation. It can be formed by curing.

  As a method for forming the low refractive index layer, a wet film forming method in which a coating solution for forming a low refractive index layer is applied to the surface of the hard coat layer to form an antireflection layer, a vacuum deposition method, a sputtering method, or a CVD method. The vacuum film forming method for forming the antireflection layer in vacuum is classified as follows. In the antireflection film of the present invention, an antireflection film is formed by a wet film formation method using an ionizing radiation curable material and a low refractive index forming coating solution containing low refractive index particles. A prevention film can be produced.

  At this time, the film thickness (d) of the low refractive index layer is such that the optical film thickness (nd) obtained by multiplying the film thickness (d) by the refractive index (n) of the low refractive index layer is 1 of the wavelength of visible light. Designed to be equal to / 4. As the low refractive index layer, a layer in which low refractive index particles are dispersed in a binder matrix can be used.

As low refractive index particles, LiF, MgF, 3NaF.AlF or AlF (all
Low refractive index particles made of a low refractive material such as refractive index 1.4) or Na3AlF6 (cryolite, refractive index 1.33) can be used. Moreover, the particle | grains which have a space | gap inside a particle | grain can be used suitably. In the case of particles having voids inside the particles, the voids can be made to have a refractive index of air (≈1), so that they can be low refractive index particles having a very low refractive index. Specifically, porous silica particles or low refractive index silica particles having voids inside can be used.

The low refractive index particles used in the low refractive index layer of the present invention preferably have a particle size of 1 nm to 100 nm. When the particle diameter exceeds 100 nm, light is remarkably reflected by Rayleigh scattering, and the low refractive index layer tends to be whitened and the transparency of the antireflection film tends to be lowered. On the other hand, when the particle size is less than 1 nm, problems such as non-uniformity of particles in the low refractive index layer due to aggregation of particles occur.

  The low refractive index forming coating liquid contains an ionizing radiation curable material. As the ionizing radiation curable material, the acrylic materials exemplified as the ionizing radiation curable material contained in the hard coat layer forming coating liquid can be used.

  In addition, a solvent and various additives can be added to the coating liquid for low refractive index layer formation as needed. Solvents include aromatic hydrocarbons such as toluene, xylene, cyclohexane and cyclohexylbenzene, hydrocarbons such as n-hexane, dibutyl ether, dimethoxymethane, dimethoxyethane, diethoxyethane, propylene oxide, dioxane, dioxolane, and trioxane. , Ethers such as tetrahydrofuran, anisole and phenetole, and ketones such as methyl isobutyl ketone, methyl butyl ketone, acetone, methyl ethyl ketone, diethyl ketone, dipropyl ketone, diisobutyl ketone, cyclopentanone, cyclohexanone, methylcyclohexanone, and methylcyclohexanone , Ethyl formate, propyl formate, n-pentyl formate, methyl acetate, ethyl acetate, methyl propionate, ethyl propionate , Esters such as n-pentyl acetate and γ-ptyrolactone, cellosolves such as methyl cellosolve, cellosolve, butyl cellosolve, cellosolve acetate, alcohols such as methanol, ethanol, isopropyl alcohol, water, etc. It is appropriately selected in consideration of appropriateness and the like. Moreover, a surface adjusting agent, a leveling agent, a refractive index adjusting agent, an adhesion improver, a photosensitizer, etc. can be added to the coating liquid as additives.

  When an ionizing radiation curable material is used as the binder matrix and the low refractive index layer is formed by irradiating with ultraviolet rays, a photopolymerization initiator is added to the coating liquid. As a photoinitiator, the photoinitiator illustrated as a photoinitiator contained in the coating liquid for hard-coat layer formation can be used.

  The prepared coating solution for forming a low refractive index layer is applied onto the hard coat layer to form a coating film, and the coating film is dried as necessary, and then subjected to ionizing radiation such as ultraviolet rays and electron beams. By irradiation, a curing reaction of the ionizing radiation curable material can be performed to form a binder matrix, and a low refractive index layer can be formed. At this time, as a coating method, the wet film formation method exemplified when applying the coating liquid for forming the hard coat layer can be used. Furthermore, the method illustrated by the formation method of the hard-coat layer can be used also about the drying method and the hardening method.

  Moreover, as shown in FIG. 7, in the said hard coat film and the said antireflection film, the surface treatment film in this invention is affixed through the adhesive layer 71 on the conventional hard coat film and the conventional antireflection film. You may produce by combining.

<Adjustment example 1>
(Concealment layer forming coating solution)
Using 5 parts by weight of commercially available carbon black as a black pigment and 15 parts by weight of commercially available vinyl chloride / vinyl acetate copolymer, this was dissolved in 80 parts by weight of a solvent consisting of commercially available 2- (2 ethoxyethoxy) ethyl acetate and cyclohexanone. Thus, a coating solution for forming a concealing layer was prepared.
<Adjustment example 2>
(Coating liquid for forming transparent resin layer)
Using 20 parts by weight of a commercially available vinyl chloride / vinyl acetate copolymer, this was dissolved in 80 parts by weight of a solvent composed of commercially available 2- (2 ethoxyethoxy) ethyl acetate and cyclohexanone to prepare a coating solution for forming a transparent resin layer.
<Adjustment example 3>
(Flat layer forming coating solution)
Using 20 parts by weight of a commercially available vinyl chloride / vinyl acetate copolymer, this was dissolved in 80 parts by weight of a solvent comprising commercially available 2- (2 ethoxyethoxy) ethyl acetate and cyclohexanone to prepare a coating solution for forming a flat layer.
<Adjustment example 4>
(Coating liquid for forming hard coat layer)
10 parts by weight of light ester DQ100 (made by Kyoeisha Chemical Co., Ltd.), an acrylic material containing a quaternary ammonium cation, 25 parts by weight of dipentaerythritol triacrylate, 25 parts by weight of pentaerythritol tetraacrylate, 50 parts by weight of urethane acrylate, Irgacure 184 ( Using 5 parts by weight of Ciba Specialty Chemicals (photopolymerization initiator), this was dissolved in methyl ethyl ketone to prepare hard coat layer forming coating solution 2.
<Adjustment example 5>
(Coating liquid for forming low refractive index layer)
Porous silica fine particle dispersion (average particle size 50 nm, solid content 20%, solvent: methyl isobutyl ketone) 14.94 parts by weight, EO-modified dipentaerythritol hexaacrylate (trade name: DPEA-12, manufactured by Nippon Kayaku Co., Ltd.) 1 .99 parts by weight, polymerization initiator (Ciba Specialty Chemicals Co., Ltd., trade name: Irgacure 184) 0.07 parts by weight, TSF4460 (trade name, manufactured by GE Toshiba Silicone Co., Ltd .: alkyl polyether modified silicone oil) ) 0.20 part by weight was diluted with 82 parts by weight of methyl isobutyl ketone as a solvent to prepare a coating solution for forming a low refractive index layer.
<Example 1>
(Surface treatment film 1)
A coating solution for forming a concealing layer is applied to one side of a triacetylcellulose film (Fuji Film: film thickness 80 μm), dried in an oven at 80 ° C. for 60 seconds, dried, and then heated to 80 ° C./0.5 using a heating device. A concealing layer having a dry film thickness of 4.5 μm was formed by heating in seconds (Step 1). Next, a coating solution for forming a transparent resin layer is applied to a portion surrounded by the above-described concealing layer of a triacetyl cellulose film (Fuji film: film thickness 80 μm), dried in an oven at 80 ° C. for 60 seconds, dried, A transparent resin layer having a dry film thickness of 4.5 μm was formed by heating at 80 ° C. for 0.5 seconds using a heating device (step 2). The difference between the long side and the short side of the concave portion of the frame plate used in this example and the long side and the short side of the convex portion of the hollow plate was 300 μm. At this time, the width of the overlap portion between the concealing layer and the transparent resin layer was 150 μm.
<Example 2>
(Surface treatment film 2)
Performing step 1 and step 2 in the above order is step 3, and using a six-color printing machine, step 3 is repeated three times in succession so that the concealing layer and the transparent resin layer are applied three times each. Formed. The difference between the long side and the short side of the concave portion of the frame plate used in this example and the long side and the short side of the convex portion of the hollow plate was 300 μm. At this time, the width of the overlap portion between the concealing layer and the transparent resin layer was 130 μm in the first layer, the second layer, and the third layer.
<Example 3>
(Surface treatment film 3)
Using a 7-color printing machine, the above step 1 was repeated three times in succession, and then the above step 2 was repeated three times in succession to form a concealing layer and a transparent resin layer by three repeated coatings. The difference between the long side and the short side of the concave portion of the frame plate used in this example and the long side and the short side of the convex portion of the hollow plate was 300 μm. At this time, the width of the overlapping portion of the concealing layer and the transparent resin layer was 210 μm.
<Example 4>
(Surface treatment film 4)
A concealing layer and a transparent resin layer formed by the method described in Example 1, wherein the long side and the short side of the concave portion of the frame plate used in this example and the long side and the short side of the convex portion of the hollow plate Each difference was 400 μm, and the width of the overlap portion of the concealing layer and the transparent resin layer was 110 μm.
<Example 5>
(Surface treatment film 5)
The flat layer forming coating solution is applied to the layer composed of the concealing layer and the transparent resin layer formed in Example 1, dried in an oven at 80 ° C. for 60 seconds, dried, and then dried at 80 ° C./0.5 using a heating device. A flat layer having a dry film thickness of 4.3 μm was formed by heating in seconds.
<Example 6>
(Surface treatment film 6)
The flat layer-forming coating solution is applied to the layer composed of the concealing layer and the transparent resin layer formed in Example 2 with a 7-color printing machine, dried in an oven at 80 ° C. for 60 seconds, and after drying, using a heating device. A flat layer having a dry film thickness of 4.6 μm was formed by heating at 80 ° C. for 0.5 seconds.
<Example 7>
(Surface treatment film 7)
A flat layer was formed on the layer made of the concealing layer and the transparent resin layer formed in Example 3. The formation method is the same as in Example 6.
<Example 8>
(Hard coat film 1)
The coating liquid 1 for forming a hard coat layer is applied on the layer composed of the concealing layer and the transparent resin layer formed in Example 1, and dried in an oven at 80 ° C. for 60 seconds. After drying, the oxygen concentration is 0.1% by volume. A transparent hard coat layer having a dry film thickness of 5 μm was formed by irradiating ultraviolet rays at an irradiation dose of 200 mJ / m 2 using an ultraviolet irradiation device (Fusion UV System Japan, light source H bulb) in the atmosphere of
<Example 9>
(Hard coat film 2)
A hard coat layer was formed on the surface opposite to the surface of the transparent substrate provided with the layer composed of the concealing layer and the transparent resin layer of the surface-treated film formed in Example 1. The formation method is the same as in Example 8.
<Example 10>
(Hard coat film 3)
The surface of the transparent substrate on the side where the hard coat layer of the hard coat film formed with the hard coat layer is formed on one side of the triacetyl cellulose film (Fuji Film: film thickness 80 μm) in the same manner as in Example 8. The surface on which the concealing layer and the transparent resin layer of the surface-treated film of Example 1 were formed was attached to the surface via an adhesive layer.
<Example 11>
(Antireflection film 1)
A hard coat layer is formed in the same manner as in Example 8 on the layer comprising the concealing layer and the transparent resin layer of the surface-treated film of Example 1, and further a low refractive index layer is formed on the hard coat layer. The coating solution was applied so that the film thickness after drying was 100 nm. Using a UV irradiation device (Fusion UV System Japan, light source H bulb), UV irradiation was performed at an irradiation dose of 200 mJ / m 2 and cured to form a low refractive index layer.
<Example 12>
(Antireflection film 2)
A hard coat layer is formed on one side of a triacetylcellulose film (Fuji Film: film thickness: 80 μm) in the same manner as in Example 8, and a concealing layer and a transparent layer are formed on the hard coat layer in the same manner as in Example 1. A resin layer was formed, and a low refractive index layer was formed on the layer composed of the concealing layer and the transparent resin layer by the same method as in Example 11.
<Example 13>
(Antireflection film 3)
On the surface of the transparent substrate opposite to the surface on which the concealing layer and the transparent resin layer of the surface-treated film of Example 1 are formed, a hard coat layer is formed in the same manner as in Example 8, and then A low refractive index layer was formed on the hard coat layer in the same manner as in Example 11.
<Example 14>
(Antireflection film 4)
A hard coat layer is formed on one side of a triacetyl cellulose film (Fuji Film: film thickness 80 μm) in the same manner as in Example 8, and then low refraction in the same manner as in Example 11 on the hard coat layer. The surface in which the concealing layer and the transparent resin layer of the surface-treated film of Example 1 are formed on the surface of the transparent base material on the side where the low refractive index layer is not formed of the antireflection film on which the refractive index layer is formed via an adhesive layer Was pasted.
<Comparative Example 1>
(Surface treatment film 1)
Only the concealing layer was formed by the method of Example 1 on one side of a triacetylcellulose film (Fuji Film: film thickness 80 μm).
<Comparative example 2>
(Surface treatment film 2)
A concealing layer and a transparent resin layer formed by the method described in Example 1, wherein the long side and the short side of the concave portion of the frame plate used in this example and the long side and the short side of the convex portion of the hollow plate The difference between each was 50 μm, and the width of the overlap portion between the concealing layer and the transparent resin layer was 420 μm.
<Comparative Example 3>
(Surface treatment film 3)
A concealing layer and a transparent resin layer formed by the method described in Example 1, wherein the long side and the short side of the concave portion of the frame plate used in this example and the long side and the short side of the convex portion of the hollow plate Each difference was 700 μm, and an overlap portion between the concealing layer and the transparent resin layer was not observed.

  In the surface treatment film, hard coat film, and antireflection film according to Examples 1 to 14, the surface irregularities of the film were not confirmed by visual observation, and the design was excellent. On the other hand, in the surface treatment film according to Comparative Example 1, irregularities on the surface of the film were confirmed by visual observation, and the design was inferior to the surface treatment film, hard coat film, and antireflection film according to Examples 1 to 14. there were. In addition, in the surface-treated films according to Comparative Examples 2 and 3, the film surface unevenness by visual observation is slightly seen, but compared with the surface-treated film, hard coat film, antireflection film according to Examples 1 to 14, the design is inferior, Compared with the surface-treated film according to Comparative Example 1, the design was excellent.

  The invention according to the present application can be used industrially as a technique for improving the design of the outer edge of the image display portion of the display, that is, the so-called frame portion.

DESCRIPTION OF SYMBOLS 11 ... Surface treatment film 12 ... Transparent base material 13 ... Concealing layer 14 ... Transparent resin layer 15 ... Flat layer 21 ... Hard coat film 22 ... Hard coat layer 31 ... Antireflection film 32 ... Low refractive index layer 41 ... Frame plate 42 ... Convex part 43 ... Concave part 44 ... Hollow plate 61 ... First layer first layer end 62 ... First layer second layer end 63 ... First concealment layer and transparent resin layer over Width of the wrap part 64 ... end part 65 of the first layer of the second layer ... end part 66 of the second layer of the second layer ... width 71 of the overlap part of the second concealing layer and the transparent resin layer ... Adhesion layer

Claims (9)

  In the surface-treated film having at least a concealing layer on the transparent substrate, a transparent resin layer is formed on the same surface as the surface of the transparent substrate on which the concealing layer is formed and in a portion surrounded by the concealing layer. A surface treatment film characterized by comprising:   The surface treatment film according to claim 1, further comprising a flat layer on the layer composed of the concealing layer and the transparent resin layer.   The end portions of the concealing layer and the transparent resin layer are overlapped, and the width of the overlapping portion of the concealing layer and the transparent resin layer is 100 μm or more and 300 μm or less. The surface treatment film as described.   The surface-treated film according to any one of claims 1 to 3, further comprising a hard coat layer, wherein the hard coat layer has a concealing layer and a transparent resin layer formed on a transparent substrate. A hard coat film, wherein the hard coat film is formed on the outermost surface or the surface opposite to the surface on which the concealing layer and the transparent resin layer are formed.   It is a surface treatment film in any one of Claim 1 thru | or 3, Comprising: The hard coat layer and the low-refractive-index layer are the side of the surface in which the concealing layer and transparent resin layer of a transparent base material are formed, or An antireflection film having a surface opposite to a surface on which a concealing layer and a transparent resin layer are formed, wherein the low refractive index layer is formed on the surface side of the hard coat layer.   A method for producing a surface-treated film, comprising a step of applying a concealing layer forming coating liquid containing a thermosetting material and a pigment on a transparent substrate to form a coating layer, and heating the coating layer to form a concealing layer A step of applying a transparent resin layer-forming coating liquid containing a thermosetting material on a transparent substrate to form a coating film, and a step of heating the coating film to form a transparent resin layer. A method for producing a surface-treated film.   A method for producing a surface-treated film, the step of applying a transparent resin layer-forming coating liquid containing a thermosetting material on a transparent substrate to form a coating film, and heating the coating film to form a transparent resin layer A step of applying a concealing layer forming coating liquid containing a thermosetting material and a pigment on a transparent substrate to form a coating film, and a step of heating the coating film to form a concealing layer. A method for producing a surface-treated film.   Applying a transparent resin layer-forming coating liquid containing a thermosetting material on a transparent substrate to form a coating film and heating the coating film to form a transparent resin layer; and thermosetting type on the transparent substrate The concealing layer and the transparent resin layer are formed by repeating a process of forming a concealing layer by applying a concealing layer-forming coating liquid containing a material and a pigment to form a coating film and heating the coating film to form the concealing layer at least twice. The manufacturing method of the surface treatment film of Claim 6 or Claim 7 characterized by the above-mentioned.   A frame plate having a rectangular convex portion and having a rectangular concave portion inside the rectangular convex portion and a hollow plate having a rectangular convex portion, the length of the long side of the concave portion of the frame plate and the hollow plate The length of the long side of the convex part of the plate is 100 μm to 600 μm shorter at both ends of the convex part of the frame plate, the length of the short side of the concave part of the frame plate and the convex part of the hollow plate A frame plate and a hollow plate characterized in that the length of the short side is shorter by 100 to 600 μm at each of the convex portions of the frame plate at both ends.