JP2012211965A - Electrochromic element and method for manufacturing the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a high-contrast electrochromic element and a method for manufacturing the same.SOLUTION: An electrochromic element 10 of the present invention comprises: a first electrode 13; a second electrode 14; an electrolytic layer 16; and an electrochromic composition layer 15. The electrochromic composition layer 15 is arranged on the first electrode 13, and the electrolytic layer 16 is arranged on the electrochromic composition layer 15, while the second electrode 14 is arranged on the lateral faces of at least one of the electrolytic layer 16 and the electrochromic composition layer 15, so that electric voltage can be applied to the electrolytic layer 16 and the electrochromic composition layer 15, in between the first electrode 13 and the second electrode 14.

Description

  The present invention relates to an electrochromic device and a manufacturing method thereof.

  In general, a display device (electrochromic element) using an electrochromism (CE) method in which a color is changed by an electrochemical reaction is formed using a pair of transparent electrodes parallel to the display surface. An example of this display device is shown in the longitudinal sectional view of FIG. As shown in FIG. 8, a cell 101 corresponding to one pixel of the display device is divided by a partition wall 108. The cell 101 is a pair of opposing transparent electrodes between a first transparent conductive film 104 formed on the transparent insulating base material 102 and a second transparent conductive film 103 formed on the base base material 109. In this structure, the electrolyte layer 106 and the electrochromic composition layer 105 are sandwiched. When an electric field is applied between the two transparent conductive films, an electric field is injected into the electrochromic composition layer 105 through the electrolyte layer 106 and a colored state is obtained. In addition, when the electric field is removed from the electrochromic composition layer 105, the color disappears (colorless and transparent). In the EC method, an uncolored cell is colorless and transparent. Therefore, when it is desired to make an uncolored portion white, for example, as shown in FIG. 8, a base substrate 109 and a second transparent conductive film are used. A white layer 107 is provided between In each cell, wiring (for example, the Y coordinate wiring 111 shown in FIG. 8 and the X coordinate wiring not shown in FIG. 8) is formed in a matrix, and corresponds to the X coordinate / Y coordinate of the cell to be colored. A desired cell can be colored by energizing the wiring.

  Further, as an electrochromic element, for example, an element having a structure in which a region where a line-shaped first electrode and a line-shaped second electrode intersect three-dimensionally is a cell has been proposed (for example, see Patent Document 1). .

JP 2008-32911 A

  In the display device (electrochromic element) shown in FIG. 8, it is necessary to dispose electrodes on the display surface. For this reason, in such a structure, a transparent conductive film is used for at least one of the pair of electrodes. However, since the transparent conductive film does not transmit light completely, there is a problem that the contrast is lowered and the screen becomes dark.

  Therefore, an object of the present invention is to provide a high-contrast electrochromic device and a method for manufacturing the same.

In order to achieve the above object, the electrochromic device of the present invention comprises:
Including a first electrode, a second electrode, an electrolyte layer, and an electrochromic composition layer;
The electrochromic composition layer is laminated on the first electrode,
The electrolyte layer is laminated on the electrochromic composition layer,
The second electrode is disposed on at least one side of the electrolyte layer and the electrochromic composition layer;
A voltage can be applied to the electrolyte layer and the electrochromic composition layer between the first electrode and the second electrode.

In addition, the method for producing the electrochromic device of the present invention includes:
An electrochromic composition layer forming step of forming an electrochromic composition layer on the first electrode;
An electrolyte layer forming step of forming an electrolyte layer on the electrochromic composition layer;
A voltage can be applied to the electrolyte layer and the electrochromic composition layer on at least one side surface of the electrolyte layer and the electrochromic composition layer between the first electrode and the second electrode. And a second electrode forming step of forming a second electrode.

  ADVANTAGE OF THE INVENTION According to this invention, a high contrast electrochromic element and its manufacturing method can be provided.

FIG. 1 is a longitudinal sectional view showing a configuration of an example (Embodiment 1) of an electrochromic element of the present invention. FIG. 2 is a cross-sectional view of the electrochromic element shown in FIG. FIG. 3 is a cross-sectional view showing another example of the second electrode in the first embodiment. FIG. 4 is a longitudinal sectional view showing still another example of the second electrode in the first embodiment. FIG. 5A is a plan view showing a configuration of another example (Embodiment 2) of the electrochromic element of the present invention. FIG. 5B is a longitudinal sectional view of the electrochromic element shown in FIG. 5A viewed in the BB direction. 6A is a plan view showing another example of the electrochromic composition layer in Embodiment 2. FIG. 6B is a longitudinal sectional view of the electrochromic element shown in FIG. 6A viewed in the CC direction. FIG. 7A is a diagram illustrating one step in the method of manufacturing the electrochromic device according to the second embodiment. (A) is a top view explaining 1 process, (b) is the longitudinal cross-sectional view seen in the DD direction of the process shown to (a). FIG. 7B is a diagram for explaining other steps of the method for manufacturing the electrochromic device of the second embodiment. (A) is a top view explaining another process, (b) is the longitudinal cross-sectional view seen in the EE direction of the process shown to (a). FIG. 7C is a diagram illustrating still another process of the method for manufacturing an electrochromic element according to Embodiment 2. (A) is a top view explaining another process further, (b) is the longitudinal cross-sectional view seen in the FF direction of the process shown to (a). FIG. 7D is a diagram illustrating still another process of the method for manufacturing an electrochromic device according to the second embodiment. (A) is a top view explaining another process further, (b) is the longitudinal cross-sectional view seen in the GG direction of the process shown to (a). FIG. 7E is a diagram illustrating still another process of the method for manufacturing an electrochromic element according to Embodiment 2. (A) is a top view explaining another process further, (b) is the longitudinal cross-sectional view seen in the HH direction of the process shown to (a). FIG. 7F is a diagram illustrating still another process of the method for manufacturing an electrochromic device according to the second embodiment. (A) is a top view explaining another process further, (b) is the longitudinal cross-sectional view seen in the II direction of the process shown to (a). FIG. 7G is a diagram illustrating still another process of the method for manufacturing an electrochromic device according to the second embodiment. (A) is a top view explaining another process further, (b) is the longitudinal cross-sectional view seen in the JJ direction of the process shown to (a). FIG. 7H is a diagram illustrating still another process of the method for manufacturing an electrochromic element according to the second embodiment. (A) is a top view explaining another process further, (b) is the longitudinal cross-sectional view seen in the KK direction of the process shown to (a). FIG. 8 is a longitudinal sectional view showing a configuration of an electrochromic element related to the present invention.

  In the present invention, the term “on top” is not limited to a state in which the top surface is in direct contact unless otherwise specified, and includes a state in which other components or the like are present and not in direct contact with each other. In the present invention, “on the first electrode” is on the display surface side of the first electrode in the electrochromic device. The “on the electrochromic composition layer” is the display surface side of the electrochromic composition layer in the electrochromic device.

  In the present invention, the “on the side surface” is not limited to a state in which the side surface is in direct contact unless otherwise specified, and includes a state in which other components are present and not in direct contact with each other.

  In the present invention, “lamination” is not limited to a state in which layers are laminated in direct contact with each other unless otherwise specified, and other components exist between the layers, This includes the case where they are stacked in a non-contact state.

  Next, embodiments of the present invention will be described in detail with reference to the drawings. However, the present invention is not limited by the following description. In addition, in the following FIGS. 1-7, the same code | symbol is attached | subjected to the same part. In the drawings, for convenience of explanation, the structure of each part may be simplified as appropriate, and the dimensional ratio of each part may be different from the actual one.

[Embodiment 1]
1 and 2 show the configuration of the electrochromic device of this embodiment. FIG. 1 is a longitudinal sectional view showing the configuration of the electrochromic element of the present embodiment. FIG. 2 is a cross-sectional view of the electrochromic element shown in FIG.

(1) Overall Configuration As shown in FIGS. 1 and 2, the electrochromic element 10 of this embodiment includes a first electrode 13, a second electrode 14, an electrochromic composition layer 15, and an electrolyte layer 16. And as a major component. An electrochromic composition layer 15 is laminated on the first electrode 13, and an electrolyte layer 16 is laminated on the electrochromic composition layer 15. The second electrode 14 is formed so as to surround the entire side surface of the electrolyte layer 16. In FIG. 1, the display surface side of the electrochromic element 10 of the present embodiment is the electrolyte layer 16 side.

(2) Electrochromic composition layer The electrochromic composition layer 15 includes a coloring material (electrochromic material) having the property of being discolored by electrochemical oxidation or reduction. As the electrochromic material, conventionally known materials can be used, and examples thereof include inorganic materials and organic materials. Examples of the inorganic material include a conductive polymer, a transition metal oxide, a transition metal complex, and a transition metal salt. Examples of the transition metal oxide include a WO3 type material. Examples of the transition metal complex include Prussian blue type materials. If there are a plurality of colors of the electrochromic material, for example, color display is possible by separately coating the electrochromic material for each electrochromic element.

(3) Electrolyte Layer The electrolyte layer 16 is a layer that contains an electrolyte and supplies the electrolyte to the electrochromic composition layer 15. The electrolyte is not particularly limited and can be appropriately selected according to the selection of the electrochromic material. Examples of the electrolyte include lithium salt, potassium salt, sodium salt and the like. The form of the electrolyte layer 16 is not particularly limited, and may be, for example, a solid, a liquid, or a gel body.

(4) 1st electrode The 1st electrode 13 is an electrode arrange | positioned on the opposite side to the said display surface side. The 1st electrode 13 can be suitably selected according to the request | requirement of a manufacturing process or an electrical property, for example. The material for forming the first electrode 13 is not particularly limited, and a conventionally known material can be used.

(5) Second Electrode The second electrode 14 is an electrode formed so as to surround the entire side surface of the electrolyte layer 16 as described above. The material for forming the second electrode 14 is not particularly limited as long as it can be used as an electrical wiring. The second electrode 14 can be, for example, a metal foil film by sputtering or vapor deposition, or a metal film by plating. The second electrode 14 may be formed by printing using, for example, a conductive paste containing a resin and a conductive filler. In the conductive paste, the resin is not particularly limited, and examples thereof include epoxy, phenol, acrylic, polyester, polyurethane, and silicone. The conductive filler is not particularly limited, and examples thereof include silver, gold, copper, nickel, palladium, platinum carriers, and alloys thereof, preferably copper, copper alloy, nickel, nickel alloy and the like are silver. It is coated with. The said conductive filler may be used individually by 1 type, and may use multiple types together. The filler shape of the conductive filler is not particularly limited, and for example, a particulate shape, a spherical shape, a flake shape, a needle shape, or a combination thereof is preferable. The particulate conductive filler can be referred to as conductive particles. Examples of the conductive particles include metal particles. The particle diameter of the metal particles is preferably, for example, 5 μm or less because, for example, if the particle diameter is too large, the printability deteriorates. The metal particles do not have to have a single particle size distribution peak. For example, the metal particles may contain both micron-order metal particles and metal fine particles of 100 nm or less. A nano-sized metal has a property of being fused at a low temperature. For example, the resistance can be reduced by making the contact between conductive particles a metal bond by this fusion. Examples of the conductive particles include conductive carbon particles, carbon fibers, and carbon nanotubes in addition to the metal particles.

(6) Operation | movement of an electrochromic element The electrochromic element 10 of this embodiment operate | moves as follows, for example. That is, first, the second electrode 14 and the first electrode 13 are connected to a power supply device (not shown). Next, a voltage is applied between the second electrode 14 and the first electrode 13 so that the second electrode 14 has a positive potential with respect to the first electrode 13. By applying the voltage, an electric field is injected into the electrochromic material included in the electrochromic composition layer 15 to be colored. In this state, a voltage is applied between the second electrode 14 and the first electrode 13 so that the second electrode 14 has a negative potential with respect to the first electrode 13. By the application, an electric field is released from the electrochromic material, for example, a decolored state (colorless and transparent) is obtained.

  In the electrochromic element 10 of the present embodiment, as described above, the first electrode 13 is disposed on the side opposite to the display surface side, and the second electrode 14 is formed on the side surface of the electrolyte layer 16. Has been. Therefore, the display surface does not have a configuration that prevents light transmission, such as a transparent electrode. For this reason, the electrochromic element 10 of this embodiment has high contrast. Further, since an expensive transparent electrode such as ITO is not used on the display surface side, for example, an electrochromic element can be manufactured at low cost. Moreover, even if an input device such as a touch panel using a transparent conductive film is arranged on the display surface of the electrochromic element 10 of the present embodiment, for example, a decrease in contrast can be suppressed.

  In the electrochromic element 10 of the present embodiment, the second electrode 14 is formed on the side surface of the electrolyte layer 16 as described above. For this reason, for example, unlike the electrochromic element (lateral electric field type) described in JP-A-2006-030829 and JP-A-2006-323191, a space for arranging the second electrode is not required. Therefore, the electrochromic element 10 of this embodiment can be reduced in size, for example. As a result, the electrochromic element 10 of the present embodiment can cope with, for example, higher definition of display in a display device.

(7) Other Forms In the electrochromic element 10 of the present embodiment, the second electrode 14 is formed so as to surround the entire side surface of the electrolyte layer 16 as described above. Such a configuration is preferable because the area of the second electrode 14 can be increased, but the present invention is not limited to this. For example, as shown in the cross-sectional views of FIGS. 3A and 3B, the second electrode 14 may be formed only on a part of the side surface of the electrolyte layer 16. Moreover, if a voltage can be applied to the electrolyte layer 16 and the electrochromic composition layer 15 between the first electrode 13 and the second electrode 14, for example, a longitudinal sectional view of FIG. Thus, in addition to the side surface of the electrolyte layer 16, it may be formed on the side surface of the electrochromic composition layer 15, or in addition to the side surface of the electrolyte layer 16 as shown in the longitudinal sectional view of FIG. The electrochromic composition layer 15 may be formed on the upper surface. Even in these forms, the effect of the present invention that the contrast is high can be obtained.

[Embodiment 2]
The electrochromic element of this embodiment is an example of a reflective nonvolatile display element. 5A and 5B show the configuration of the electrochromic device of this embodiment. FIG. 5A is a plan view showing a configuration of a part of the electrochromic element of the present embodiment. FIG. 5B is a longitudinal sectional view of the electrochromic element shown in FIG. 5A viewed in the BB direction.

(1) Overall Configuration As shown in FIGS. 5A and 5B, the electrochromic device of this embodiment is conductive or white on a base substrate 23 provided with a conductive layer (first electrode) on the surface. The layer 27 and the electrochromic composition layer 25 are laminated in the above order. An electrolyte layer 26 is sandwiched between the base substrate 23 and the transparent insulating substrate 22 disposed so as to face the base substrate 23. Each pixel 21 is formed by the insulating partition wall 28 (first insulating layer). In FIG. 5A, for the convenience of explanation, the transparent insulating base material 22 is indicated by a two-dot chain line (hereinafter, the same applies to FIGS. 6A and 7H). An X coordinate wiring 31 and a Y coordinate wiring 30 are formed inside the first insulating layer 28. The intersection of the X coordinate wiring 31 and the Y coordinate wiring 30 is insulated by the second insulating layer 29. A cell electrode (second electrode) 24 is formed on the side surface of the first insulating layer 28. A TFT 32 is formed on the first insulating layer 28 as a switch for controlling ON / OFF of the cell electrode 24.

  In the electrochromic device of this embodiment, the conductive layer (first electrode) 23, the cell electrode (second electrode) 24, the electrochromic composition layer 25, and the electrolyte layer 26 are, for example, shown in the first embodiment. The same thing as each structural member can be used.

(2) Base substrate The material for forming the base substrate 23 is not particularly limited. For example, in the case of a configuration in which a conductor is formed on an insulating substrate, the insulating substrate may be, for example, glass epoxy, Substrate materials such as paper phenol, resin films such as polyimide, PET, and PEN, glass, paper, and the like can be selected. When using a thermosetting material when forming the conductive layer (first electrode), the white layer 27, and the electrochromic composition layer 25 formed on the surface of the insulating substrate, for example, Select a material that has heat resistance to cure (curing) conditions.

(3) White layer The white layer 27 functions as a reflective layer when the electrochromic composition layer 25 is in a decolored state. The material for forming the white layer 27 is, for example, white so as to function as a reflective layer, and is a material that insulates the conductor of the base substrate 23, the cell electrode 24, the X coordinate wiring 31, and the Y coordinate wiring 30. On the other hand, if the thickness of the electrochromic composition layer 25 and the white layer 27 is thick, the insulating property becomes too high, and no current flows from the cell electrode 24 to the conductor of the base substrate 23. For this reason, the white layer 27 is preferably formed thin or a porous layer obtained by firing, for example, titanium oxide nanoparticles. Since the white layer 27 has the above-described structure, the electrolyte layer 26 inside the cell electrode 24 enters a porous state, and a current can flow between the cell electrode 24 and the conductor of the base substrate 23. . In this case, an electrochromic material contained in the electrochromic composition layer 25 may be put in part or all of the hole. By doing in this way, the adhesiveness of the electrochromic composition layer 25 and the white layer 27 can be improved, for example. In addition, since the surface area of the electrochromic composition layer 25 is increased and the electric field can be injected quickly, for example, the speed of decoloring (coloring and / or decoloring) can be improved as a result.

(4) 1st insulating layer The 1st insulating layer 28 should just insulate between the cell electrode 24 and the X coordinate wiring 31 and the Y coordinate wiring 30, and the formation material is an epoxy, an acryl, a phenol, for example, Examples thereof include silicone, polyester, polyurethane, polyimide, polyamide and the like. The said forming material may be used individually by 1 type, and may use 2 or more types together. When the pasted resin is printed and applied, for example, it is preferable to contain insulating fine particles such as silica and alumina in the resin. By appropriately adjusting the viscosity using such fine particles, for example, sagging of the paste during printing can be suppressed. In the printing, in order to increase the opening area of the cell, it is preferable to apply the paste as thinly as possible within an insulating range.

(5) Second Insulating Layer The second insulating layer 29 insulates the X coordinate wiring 31 and the Y coordinate wiring 30. The material for forming the second insulating layer 29 is not particularly limited, and for example, the same material as the material for forming the first insulating layer 28 can be used. The method for forming the second insulating layer 29 is not particularly limited, and for example, a method similar to the method for forming the first insulating layer 28 can be used.

(6) Transparent insulating base material The transparent insulating base material 22 can use resin films, such as transparent polyimide, PET, PEN, or glass, for example. When thermosetting materials are used as the transparent insulating base material 22, for example, materials having heat resistance to the curing (curing) conditions of these materials are selected.

(7) X-coordinate wiring The material for forming the X-coordinate wiring 31 is not particularly limited, and for example, the same material as that for forming the second electrode described above can be used. Also, the method for forming the X coordinate wiring 31 is not particularly limited, and for example, a method similar to the method for forming the second electrode described above can be used.

(8) Y Coordinate Wiring The material for forming the Y coordinate wiring 30 is not particularly limited, and for example, the same material as that for the second electrode described above can be used. Also, the method for forming the Y coordinate wiring 30 is not particularly limited, and for example, a method similar to the method for forming the second electrode described above can be used.

(9) TFT (Thin Film Transistor)
The method of forming the TFT 32 is not particularly limited. For example, a method of forming silicon, a metal oxide, an organic semiconductor, or the like using sputtering, or a carbon nanotube (CNT) having properties of an organic semiconductor or a semiconductor is dispersed. For example, a method of applying the applied ink by printing can be used. In an electrochromic device, the coloring speed is determined by the amount of injected electric field. For this reason, a TFT capable of flowing a relatively large current is preferable. Therefore, when the TFT 32 is formed by a printing method, it is preferable to form the TFT 32 using a CNT ink capable of forming a TFT that can flow more current than the organic semiconductor. In order to form the TFT 32 on the first insulating layer 28, one of the side parallel to the X coordinate or the side parallel to the Y coordinate of the first insulating layer 28 is equal to the size of the TFT 32 in advance. It is preferable to keep it thick.

(10) Manufacturing Method Next, with reference to FIGS. 7A to 7H, a manufacturing method of the electrochromic device of the present embodiment will be described. However, the manufacturing method described below is an example, and the present invention is not limited by this example. 7A to 7H, (a) is a plan view for explaining each process, and (b) is a longitudinal sectional view as viewed in the direction of the sectional line shown in (a).

  First, as shown in FIG. 7A, the X coordinate wiring 31 and the Y coordinate wiring 30 are collectively formed in a lattice pattern on the transparent insulating substrate 22. As the transparent insulating base material 22, for example, a resin film such as polyimide, PET, PEN, or glass can be used. When thermosetting materials are used as the transparent insulating base material 22, for example, materials having heat resistance to the curing (curing) conditions of these materials are selected. Since the intersection of the X coordinate wiring 31 and the Y coordinate wiring 30 needs to be insulated, in FIG. 7A, the intersection of the X coordinate wiring 31 and the Y coordinate wiring 30 is disconnected. When both the wirings are formed by printing using the above-described conductive resin, the printing method is not particularly limited. For example, screen printing using a stencil is capable of thick film and relatively fine printing. Is preferable because it is possible. For the printing method, for example, in addition to screen printing, letterpress printing, intaglio printing, their offset printing, inkjet method, and the like can be used.

  Next, as shown in FIG. 7B, the first insulating layer 28 is formed so as to cover the surfaces of the X coordinate wiring 31 and the Y coordinate wiring 30. The method for forming the first insulating layer 28 is not particularly limited, and examples thereof include a photolithography method using a photosensitive resin and a printing method using an insulating paste. When the printing method is used, the printing method is not particularly limited, and for example, the same printing method as described above can be used. The first insulating layer 28 only needs to be able to insulate between the cell electrode 24 and the X coordinate wiring 31 and the Y coordinate wiring 30, and the formation material thereof is, for example, epoxy, acrylic, phenol, silicone, polyester, polyurethane, polyimide And polyamide. The said forming material may be used individually by 1 type, and may use 2 or more types together. When the pasted resin is printed and applied, for example, it is preferable to contain insulating fine particles such as silica and alumina in the resin. By appropriately adjusting the viscosity using such fine particles, for example, sagging of the paste during printing can be suppressed. In the printing, in order to increase the opening area of the cell, it is preferable to apply the paste as thinly as possible within an insulating range.

  Subsequently, as shown in FIG. 7C, a conductive member to be the cell electrode 24 is formed so as to further cover the surface of the first insulating layer 28. The method for forming the conductive member is not particularly limited, and any conductive material may be used, for example, as long as it can be used as electrical wiring. For example, a metal foil film by sputtering or vapor deposition or a metal film by plating can be used. The conductive member may be formed by a printing method using, for example, a conductive paste containing a resin and a conductive filler. The conductive paste is as described above. The printing method is not particularly limited, and it is preferable to reduce the coating thickness within a range in which a desired current can flow in order to increase the cell opening area.

  Subsequently, as shown in FIG. 7D, the tip of the portion on which the X coordinate wiring 31, the Y coordinate wiring 30, the first insulating layer 28, and the cell electrode 24 are laminated (printed) on the transparent insulating substrate 22. The surface of the X coordinate wiring 31, the Y coordinate wiring 30, the first insulating layer 28, and the cell electrode 24 is exposed. Thereby, the cell electrodes 24 are individually separated by the first insulating layer 28. The method for removing the printed portion is not particularly limited, and for example, machining such as polishing or grinding, laser, chemical mechanical polishing (CMP), or the like can be used.

  As described above, as shown in FIG. 7E, the second insulating layer 29 is formed at the intersection of the exposed X coordinate wiring 31 and Y coordinate wiring 30. Subsequently, as shown in FIG. 7F, wirings are connected so as to connect the disconnected X coordinate wirings 31 to complete the X coordinate wiring 31 and the Y coordinate wiring 30. In this example, the wiring is formed so that the X coordinate wiring 31 is disconnected. However, the present invention is not limited to this, and for example, a pattern that disconnects the Y coordinate wiring 30 may be used. The method for forming the second insulating layer 29 is not particularly limited, and as with the first insulating layer 28, for example, a photolithography method using a photosensitive resin, a printing method using an insulating paste, and the like can be given.

  After the formation of the second insulating resin 29, as shown in FIG. 7G, the first insulating layer is used as a switch for passing a current to the cell electrode 24 when the X coordinate wiring 31 and the Y coordinate wiring 30 are turned on. A TFT 32 is formed on 28. The method of forming the TFT 32 is not particularly limited. For example, a method of forming silicon, a metal oxide, an organic semiconductor, or the like using sputtering, or a carbon nanotube (CNT) having properties of an organic semiconductor or a semiconductor is dispersed. For example, a method of applying the applied ink by printing can be used. In an electrochromic device, the coloring speed is determined by the amount of injected electric field. For this reason, a TFT capable of flowing a relatively large current is preferable. Therefore, when the TFT 32 is formed by a printing method, it is preferable to form the TFT 32 using a CNT ink capable of forming a TFT that can flow more current than the organic semiconductor. In order to form the TFT 32 on the first insulating layer 28, one of the side parallel to the X coordinate or the side parallel to the Y coordinate of the first insulating layer 28 is previously thickened by the size of the TFT 32. It is preferable to keep it. In this example, as shown in FIG. 7G, the first insulating layer 28 on the side parallel to the X coordinate wiring 31 is formed thick, and the TFT 32 is formed on the first insulating layer 28.

  Then, as shown in FIG. 7H, the transparent insulating base material 22 prepared up to FIG. 7G is pasted on the base base material 23 on which the white layer 27 and the electrochromic composition layer 25 are formed in advance so as to sandwich the electrolyte layer 26. Match. In this way, the electrochromic device of this embodiment can be manufactured. The material for forming the base substrate 23 is not particularly limited. For example, in the case where a conductor is formed on an insulating base material, the insulating base material may be a substrate material such as glass epoxy or paper phenol. , Polyimide, PET, PEN and other resin films, glass, paper and the like. In the case of using a thermosetting material when forming the conductive layer, the white layer 27, and the electrochromic composition layer 25 formed on the surface of the insulating substrate, for example, with respect to the curing (curing) conditions of these materials. Select a material with heat resistance. The electrochromic composition layer 25 may include an electrochromic material that is colored by injection of an electric field, and an organic material, an inorganic material, or the like can be used. Examples of the inorganic material include WO3 type and Prussian blue type. If there are a plurality of colors of the electrochromic material, for example, color display can be performed by coating different coloring materials for each cell. The material for forming the white layer 27 is, for example, white so as to function as a reflective layer, and is a material that insulates the conductor of the base substrate 23, the cell electrode 24, the X coordinate wiring 31, and the Y coordinate wiring 30. On the other hand, if the thickness of the electrochromic composition layer 25 and the white layer 27 is thick, the insulating property becomes too high, and no current flows from the cell electrode 24 to the conductor of the base substrate 23. For this reason, the white layer 27 is preferably formed thin or a porous layer obtained by firing, for example, titanium oxide nanoparticles. Since the white layer 27 has the above-described structure, the electrolyte layer 26 inside the cell electrode 24 enters a porous state, and a current can flow between the cell electrode 24 and the conductor of the base substrate 23. . In this case, an electrochromic material contained in the electrochromic composition layer 25 may be put in part or all of the hole. By doing in this way, the adhesiveness of the electrochromic composition layer 25 and the white layer 27 can be improved, for example. In addition, since the surface area of the electrochromic composition layer 25 is increased and the electric field can be injected quickly, for example, the speed of decoloring (coloring and / or decoloring) can be improved as a result.

  According to the method for manufacturing an electrochromic element of this embodiment, for example, a high-contrast, high-reflection reflective nonvolatile display device (electrochromic element) that has been difficult in the past can be more easily manufactured. However, the method for manufacturing the electrochromic device of the present invention is not limited to this example.

(11) Other Embodiments As described above, the electrochromic device according to the present embodiment can be used for color display by preparing a plurality of colors of electrochromic material. Specifically, for example, as shown in FIGS. 6A and 6B, electrochromic composition layers 25 a and 25 b including coloring materials (electrochromic materials) having different colors are applied to each cell 21. By doing in this way, a coloring material can be separately applied for every cell 21, for example, a color display is also attained.

  As described above, according to the present invention, it is possible to provide an electrochromic element with high contrast and, for example, high reflection. Therefore, the electrochromic element of the present invention can be applied to applications such as a nonvolatile display device. However, its use is not limited and can be applied to a wide range of fields.

  A part or all of the above embodiment can be described as in the following supplementary notes, but is not limited to the following.

(Appendix 1)
Including a first electrode, a second electrode, an electrolyte layer, and an electrochromic composition layer;
The electrochromic composition layer is laminated on the first electrode,
The electrolyte layer is laminated on the electrochromic composition layer,
The second electrode is disposed on at least one side of the electrolyte layer and the electrochromic composition layer;
An electrochromic element, wherein a voltage can be applied to the electrolyte layer and the electrochromic composition layer between the first electrode and the second electrode.

(Appendix 2)
In addition, including an insulating partition,
The electrochromic device according to appendix 1, wherein the insulating partition is disposed on an outer periphery of the second electrode.

(Appendix 3)
In addition, including a transparent insulating substrate,
The electrochromic device according to appendix 1 or 2, wherein the transparent insulating base material is disposed on the electrolyte layer.

(Appendix 4)
The insulating partition is disposed in contact with the electrochromic composition layer and the transparent insulating substrate;
The electrochromic device according to appendix 3, wherein the electrolyte layer is disposed in a region surrounded by the electrochromic composition layer, the transparent insulating base material, and the insulating partition.

(Appendix 5)
In addition, it contains a white layer,
The electrochromic device according to any one of appendices 1 to 4, wherein the white layer is disposed between the first electrode and the electrochromic composition layer.

(Appendix 6)
The electrochromic device according to any one of appendices 1 to 5, wherein the second electrode is disposed on a side surface of the electrolyte layer and a side surface of the electrochromic composition layer.

(Appendix 7)
In addition, including coloring control wiring,
The electrochromic element according to any one of appendices 2 to 6, wherein the coloring control wiring is disposed inside the insulating partition wall and can control coloring of the electrochromic element.

(Appendix 8)
Furthermore, a coloring control element is included,
The coloring control wiring includes a first coloring control wiring and a second coloring control wiring,
The first coloring control wiring and the second coloring control wiring are electrically connected to the coloring control element;
The coloring control element is electrically connected to the second electrode;
The coloring control element can control the coloring of the electrochromic element by receiving signals from both the first coloring control wiring and the second coloring control wiring and passing a current through the second electrode. The electrochromic device according to appendix 7, wherein

(Appendix 9)
The white layer is a porous layer containing titanium oxide;
9. The electrochromic device according to any one of appendices 5 to 8, wherein at least one of an electrolyte and an electrochromic material is contained in at least a part of the holes formed in the porous layer.

(Appendix 10)
10. The electrochromic device according to any one of appendices 1 to 9, wherein the second electrode is disposed on all or part of at least one side surface of the electrolyte layer and the electrochromic composition layer. .

(Appendix 11)
11. The electrochromic device according to any one of appendices 1 to 10, wherein the electrochromic composition layer includes a Prussian blue type electrochromic material.

(Appendix 12)
12. The electrochromic device according to any one of appendices 3 to 11, wherein the transparent insulating substrate includes at least one selected from the group consisting of polyimide, PET, PEN, and glass.

(Appendix 13)
13. The electrochromic device according to any one of appendices 7 to 12, wherein the second electrode and the coloring control wiring are formed from a sintered body of a transparent resin or metal nanoparticles.

(Appendix 14)
The coloring control element is a transistor;
14. The electrochromic device according to any one of appendices 8 to 13, wherein the transistor includes a carbon nanotube as a semiconductor material.

(Appendix 15)
An electrochromic composition layer forming step of forming an electrochromic composition layer on the first electrode;
An electrolyte layer forming step of forming an electrolyte layer on the electrochromic composition layer;
A voltage can be applied to the electrolyte layer and the electrochromic composition layer on at least one side surface of the electrolyte layer and the electrochromic composition layer between the first electrode and the second electrode. And a second electrode forming step of forming a second electrode. A method for manufacturing an electrochromic device.

(Appendix 16)
Furthermore, an insulating partition forming step of forming an insulating partition on the outer periphery of the second electrode;
On the electrolyte layer, a transparent insulating base material placement step of placing a transparent insulating base material,
A coloring control wiring arrangement step of arranging a first coloring control wiring and a second coloring control wiring for controlling the coloring of the electrochromic element inside the insulating partition,
A coloring control element capable of controlling the coloring of the electrochromic element by receiving a signal from both the first coloring control wiring and the second coloring control wiring and passing a current through the second electrode. The method for producing an electrochromic element according to claim 15, further comprising a coloring control element connecting step of electrically connecting to the second electrode.

DESCRIPTION OF SYMBOLS 10 Electrochromic element 13 1st electrode 14 2nd electrode 15, 25, 25a, 25b Electrochromic composition layer 16, 26 Electrolyte layer 21 Pixel (cell)
22 Transparent insulating base material 23 Base base material (first electrode)
24 Cell electrode (second electrode)
27 White layer 28 First insulating layer (insulating partition)
29 Second insulating layer 30 Y coordinate wiring (source wiring)
31 X coordinate wiring (gate wiring)
32 TFT (coloring control element)
101 Cell 102 Transparent Insulating Base Material 103 Second Transparent Conductive Film 104 First Transparent Conductive Film 105 Electrochromic Composition Layer 106 Electrolyte Layer 107 White Layer 108 Partition 109 Base Base 111 Y Coordinate Wiring

Claims (10)

Including a first electrode, a second electrode, an electrolyte layer, and an electrochromic composition layer;
The electrochromic composition layer is laminated on the first electrode,
The electrolyte layer is laminated on the electrochromic composition layer,
The second electrode is disposed on at least one side of the electrolyte layer and the electrochromic composition layer;
An electrochromic element, wherein a voltage can be applied to the electrolyte layer and the electrochromic composition layer between the first electrode and the second electrode. In addition, including an insulating partition,
The electrochromic device according to claim 1, wherein the insulating partition is disposed on an outer periphery of the second electrode. In addition, including a transparent insulating substrate,
The electrochromic device according to claim 1, wherein the transparent insulating substrate is disposed on the electrolyte layer. The insulating partition is disposed in contact with the electrochromic composition layer and the transparent insulating substrate;
The electrochromic device according to claim 3, wherein the electrolyte layer is disposed in a region surrounded by the electrochromic composition layer, the transparent insulating base material, and the insulating partition. In addition, it contains a white layer,
The electrochromic device according to any one of claims 1 to 4, wherein the white layer is disposed between the first electrode and the electrochromic composition layer. 6. The electrochromic device according to claim 1, wherein the second electrode is disposed on a side surface of the electrolyte layer and a side surface of the electrochromic composition layer. In addition, including coloring control wiring,
The electrochromic element according to any one of claims 2 to 6, wherein the coloring control wiring is disposed inside the insulating partition wall and can control coloring of the electrochromic element. Furthermore, a coloring control element is included,
The coloring control wiring includes a first coloring control wiring and a second coloring control wiring,
The first coloring control wiring and the second coloring control wiring are electrically connected to the coloring control element;
The coloring control element is electrically connected to the second electrode;
The coloring control element can control the coloring of the electrochromic element by receiving signals from both the first coloring control wiring and the second coloring control wiring and passing a current through the second electrode. The electrochromic device according to claim 7. An electrochromic composition layer forming step of forming an electrochromic composition layer on the first electrode;
An electrolyte layer forming step of forming an electrolyte layer on the electrochromic composition layer;
A voltage can be applied to the electrolyte layer and the electrochromic composition layer on at least one side surface of the electrolyte layer and the electrochromic composition layer between the first electrode and the second electrode. And a second electrode forming step of forming a second electrode. A method for manufacturing an electrochromic device. Furthermore, an insulating partition forming step of forming an insulating partition on the outer periphery of the second electrode;
On the electrolyte layer, a transparent insulating base material placement step of placing a transparent insulating base material,
A coloring control wiring arrangement step of arranging a first coloring control wiring and a second coloring control wiring for controlling the coloring of the electrochromic element inside the insulating partition,
A coloring control element capable of controlling the coloring of the electrochromic element by receiving a signal from both the first coloring control wiring and the second coloring control wiring and passing a current through the second electrode. The method for manufacturing an electrochromic element according to claim 9, further comprising a coloring control element connecting step of electrically connecting to the second electrode.

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