JP2010266887A - Retardation plate, and display - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a retardation plate which is manufactured by a simple process, and prevents a decline in light use efficiency. <P>SOLUTION: In the retardation plate 10, a retardation layer 12 is formed in contact with a surface of a substrate 11 in which groove regions 11A and 11B are alternately patterned in stripe shape. The groove regions 11A and 11B include a plurality of grooves 111a and 111b extending in directions d1 and direction d2, respectively. The retardation layer 12 includes retardation regions 12a and 12b corresponding to the groove regions 11A and 11B. In the retardation regions 12a and 12b, liquid crystal molecules 120 are aligned along the extending directions d1 and d2 of the grooves, respectively. The groove regions 11A and 11B each have a periodic structure, and the periodic structure includes a width of 2 to 10% in the pitch of ruggedness, and includes a width of 3 to 8° in the angle of the ruggedness. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a retardation plate using a liquid crystal material and a display device including the same.

  In recent years, a display capable of three-dimensional display has been developed. As a three-dimensional display method, for example, there is a method of displaying an image for the right eye and an image for the left eye on a display screen and observing the image with polarized glasses (for example, Patent Document 1). reference). This method is realized by arranging a patterned retardation plate on the front surface of a display capable of two-dimensional display, for example, a cathode ray tube, a liquid crystal display, or a plasma display. In such a phase difference plate, it is necessary to pattern retardation and optical axes at the pixel level of the display in order to control the polarization state of light incident on the left and right eyes, respectively.

  For example, Patent Documents 1 and 2 disclose a method of manufacturing a retardation plate as described above by partially patterning a liquid crystal material or a retardation material using a photoresist or the like. However, such a method has a problem that the number of process steps is large and it is difficult to manufacture at low cost. Therefore, Patent Document 3 discloses a method for producing a retardation plate by performing patterning using a photo-alignment film. Specifically, after forming a photo-alignment film on the substrate, the photo-alignment film is patterned using polarized ultraviolet rays. After that, a polymerizable liquid crystal material (hereinafter referred to as a liquid crystal monomer) is applied on the patterned photo-alignment film to align liquid crystal molecules in a desired direction. Thereafter, a phase difference plate is produced by irradiating ultraviolet rays to polymerize the liquid crystalline monomer. In liquid crystal displays, a method of patterning by subjecting a polyimide alignment film to rubbing is often used.

USP 5,676,975 USP 5,327,285 Japanese Patent No. 3881706

  However, in the method using the photo-alignment film of Patent Document 3 or the method of rubbing the polyimide alignment film, light absorption or coloring occurs in the alignment film, resulting in a decrease in transmittance and a decrease in utilization efficiency. There was a problem. Further, the method using the photo-alignment film has a problem that the number of process steps is increased because it is necessary to perform partial irradiation using polarized ultraviolet rays at the time of patterning.

  The present invention has been made in view of such problems, and an object thereof is to provide a retardation plate that can be manufactured by a simple process and can suppress a decrease in light utilization efficiency, and a display including the retardation plate. To provide an apparatus.

  The retardation plate of the present invention includes a substrate having a plurality of grooves extending in a specific direction on the surface, and a polymerizable liquid crystal material provided in contact with the surface of the substrate and aligned along the extending direction of the plurality of grooves And a retardation layer including the same. In addition, the board | substrate in this invention is a plate-shaped or film-shaped base material, and the structure which laminated | stacked another resin layer etc. on such a base material may be sufficient. In the retardation plate of the present invention, the pattern formed by the plurality of grooves has a periodic structure. Here, the periodic structure has, for example, a spread of 2 to 10% at the pitch of the unevenness and a spread of 3 to 8 ° at the angle of the unevenness.

  In the retardation plate of the present invention, the polymerizable liquid crystal material is oriented along the extending direction of the plurality of grooves provided on the surface of the substrate, so that the optical axis is formed based on the extending direction of the grooves. The phase difference characteristic is exhibited. Here, when the retardation layer is provided in contact with the substrate surface, that is, near the interface between the retardation layer and the substrate, no photo-alignment film or rubbing alignment film is provided. The optical loss at is reduced.

  The display device of the present invention includes a light source, a display cell that performs display based on light from the light source, a first polarizer provided on the light source side of the display cell, and a second polarizer provided on the display side. The retardation plate of the present invention is provided on the light exit side of at least one of the first polarizer and the second polarizer.

  A method of manufacturing a retardation plate according to a reference example includes a step of forming a plurality of grooves extending in a specific direction on a surface of a substrate, and a liquid crystal material having a polymerization property on the surface of the substrate formed with the plurality of grooves. And a step of polymerizing a liquid crystal material. In the method for producing a retardation plate of the present invention, the pattern formed by the plurality of grooves has a periodic structure. Here, the periodic structure has, for example, a spread of 2 to 10% at the pitch of the unevenness and a spread of 3 to 8 ° at the angle of the unevenness.

  In the method of manufacturing a retardation plate according to the reference example, a liquid crystal material having a polymerizable property is applied to the surface of a substrate on which a plurality of grooves are formed, so that liquid crystal molecules are based on the extending direction of the grooves depending on the shape of the grooves. Orient. Thereafter, the liquid crystal material is polymerized to fix the alignment state of the liquid crystal molecules.

  According to the retardation plate of the present invention and the retardation plate manufacturing method according to the reference example, a retardation layer is provided in contact with the substrate surface having a plurality of grooves, that is, a photo-alignment film or an alignment film for rubbing is used. The polymerizable liquid crystal material is aligned by the grooves on the substrate. Thereby, compared with the case where the above alignment films are used, the optical loss near the interface between the substrate and the retardation layer can be reduced. Therefore, it is possible to manufacture with a simple process and to suppress a decrease in light utilization efficiency. Further, according to the display device of the present invention, since the retardation plate is provided on the light source side or the display side of the display cell, the retardation plate is a stereoscopic retardation plate using, for example, polarized glasses, When used as a viewing angle compensation film, bright display can be performed.

It is a figure showing schematic structure of the phase difference plate which concerns on one Embodiment of this invention. It is sectional drawing of the modification of the phase difference plate of FIG. It is a schematic diagram for demonstrating the detailed structure of the phase difference plate shown in FIG. It is a schematic diagram for demonstrating the detailed structure of the phase difference plate shown in FIG. It is a figure explaining the manufacturing method of the board | substrate shown in FIG. It is sectional drawing of the board | substrate manufactured by the method of FIG. It is a figure showing schematic structure of the apparatus which manufactures the board | substrate shown in FIG. It is sectional drawing of the board | substrate manufactured by the method of FIG. It is a figure explaining the manufacturing method of the phase difference plate using the board | substrate manufactured by the method of FIG. 5 or FIG. It is a figure showing schematic structure of the phase difference plate which concerns on a comparative example. It is a figure explaining the manufacturing method of the phase difference plate shown in FIG. It is a figure showing the manufacturing method following the process of FIG. 11 in order of a process. 6 is a top view of a substrate in a retardation plate according to Modification Example 1. FIG. 10 is a cross-sectional view illustrating a schematic configuration of a retardation plate according to Modification 2. FIG. It is a figure explaining the manufacturing method of the phase difference plate shown in FIG. It is a figure showing the manufacturing method following the process of FIG. 15 in order of a process. 10 is a cross-sectional view illustrating a schematic configuration of a retardation plate according to Modification 3. FIG. It is a figure explaining the manufacturing method of the phase difference plate shown in FIG. 10 is a cross-sectional view illustrating a schematic configuration of a retardation plate according to Modification 4. FIG. 10 is a cross-sectional view illustrating a schematic configuration of a retardation film according to Modification Example 5. FIG. 10 is a schematic diagram illustrating a planar configuration of a mold used in a method for manufacturing a retardation film according to Modification 6. FIG. It is a figure explaining an example of the manufacturing method of the type | mold shown in FIG. It is a figure explaining the other example of the manufacturing method of the type | mold shown in FIG. It is a figure explaining the type | mold manufacturing method which concerns on the modification 7. FIG. It is a figure showing the relationship of the rotating shaft of the flat plate of FIG. 24, and a grindstone. It is a figure explaining the manufacturing method of the type | mold which concerns on the modification 8. FIG. It is a figure showing the relationship of the rotating shaft of the roll and grindstone of FIG. It is a figure showing the schematic structure of the grindstone used at the time of manufacture of the type | mold which concerns on the modification 9. It is a figure explaining the type | mold manufacturing method which concerns on the modification 9. FIG. It is a figure showing intensity distribution of the beam spot of the ultrashort pulse laser used at the time of manufacture of a type concerning modification 10. It is a figure showing an example of the scanning procedure of the beam spot of FIG. FIG. 31 is a diagram illustrating another example of the beam spot scanning procedure of FIG. 30. It is a figure showing an example of the apparatus used at the time of manufacture of the type | mold which concerns on the modification 10. It is a figure showing the other example of the apparatus used at the time of manufacture of the type | mold which concerns on the modification 10. FIG. It is a figure showing an example of the scanning procedure of the beam spot in the apparatus of FIG. It is a figure showing the other example of the scanning procedure of the beam spot in the apparatus of FIG. It is a figure showing the uneven | corrugated shape of the pattern area | region formed using the ultrashort pulse laser. It is a figure showing the uneven | corrugated shape of the pattern area | region formed using electron beam drawing etc. It is a figure showing the orientation of the liquid crystal molecule formed on the unevenness | corrugation of FIG. It is a figure showing the orientation of the liquid crystal molecule formed on the unevenness | corrugation of FIG. It is a figure showing the diffraction by the unevenness | corrugation of FIG. 37, FIG. It is a figure showing the DFT analysis result of the diffracted light in the unevenness | corrugation of FIG. It is a figure showing the DFT analysis result of the diffracted light in the unevenness | corrugation of FIG. 10 is a cross-sectional view illustrating a schematic configuration of a display device according to application example 1. FIG. FIG. 45 is a schematic diagram illustrating a stacked structure of the display device illustrated in FIG. 44. 12 is a schematic diagram illustrating a retardation plate and a polarizer according to another example of Application Example 1. FIG. 12 is a cross-sectional view illustrating a schematic configuration of a display device according to application example 2. FIG. FIG. 48 is a schematic diagram illustrating a stacked structure of the display device illustrated in FIG. 47. 14 is a cross-sectional view illustrating a schematic configuration of a display device according to application example 3. FIG. FIG. 4 is an enlarged view of the surface of a mold used for transfer in Example 2. 6 is a diagram illustrating a schematic configuration of an apparatus for manufacturing a retardation plate according to Example 4. FIG.

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. The description will be given in the following order.

1. Embodiment (example in which the optical axis of the retardation region forms + 45 ° and −45 ° with the stripe direction)
2. Modification 1 (example in which the optical axis of the retardation region forms 0 ° and + 90 ° with the stripe direction)
3. Modification 2 (example in which retardation of retardation region is changed by liquid crystal material)
4). Modification 3 (example in which retardation of retardation region is changed by liquid crystal material and thickness)
5). Modification 4 (example in which a retardation layer is formed only in a partial region of the substrate surface)
6). Modification 5 (example in which the optical axis of the retardation region is formed only in one direction within the substrate surface)
7). Modification 6 (Example in which the groove of the transfer mold is formed by superimposing a metal thin plate having grinding marks on the end face)
8). Modified example 7 (example in which the groove of the transfer mold is formed by processing with an inclined and rotated grindstone)
9. Modification 8 (Example in which a groove of a transfer mold is formed by processing with a cutting tool)
10. Modification 9 (Example in which the groove of the transfer mold is formed by pressure transfer of the groove)
11. Modification 10 (Example of forming a transfer mold groove using an ultrashort pulse laser)
12 Application example 1 (3D display)
13. Application example 2 (display for two-dimensional display)
14 Application Example 3 (Semi-transmissive 2D display)
15. Example 1 (Example of forming a groove using a resist layer formed by electron beam drawing)
16. Example 2 (Example in which a groove is formed using a flat plate formed by an ultrashort pulse laser)
17. Example 3 (Example in which a groove is formed using a substrate made of a material different from that in Example 2)
18. Example 4 (Example of forming a groove using a die roll formed by an ultrashort pulse laser)
19. Example 5 (Example in which a groove is formed using a substrate made of a material different from that in Example 2)

[Configuration of Retardation Plate 10]
FIG. 1A illustrates an example of a cross-sectional configuration of a retardation plate 10 according to an embodiment of the present invention. FIG. 1B shows the substrate 11 of FIG. 1A viewed from the front side. In the retardation plate 10, the groove regions 11 </ b> A and 11 </ b> B are patterned on the surface of the substrate 11, and the retardation layer 12 is formed in contact with the surface of the substrate 11.

  The substrate 11 is made of a thermoplastic material such as plastic, specifically, polymethyl methacrylate, polycarbonate, polystyrene, or the like. In addition, when the retardation plate 10 is used for three-dimensional display by the polarized glasses method described later, it is preferable that the retardation of the substrate 11 is as small as possible. Therefore, an amorphous cycloolefin polymer, an alicyclic acrylic resin, It is preferably composed of a norbornene resin. The thickness of the substrate 11 is, for example, 30 μm to 500 μm. In the present embodiment, unlike the conventional case where liquid crystal molecules are aligned using an alignment film, heat treatment at a high temperature is not required, so that the plastic is easier to process and less expensive than glass materials. Materials can be used.

  The substrate 11 may have, for example, a single layer structure or a multilayer structure. When the substrate 11 has a multilayer structure, the substrate 11 has a two-layer structure in which a resin layer 32 is formed on the surface of a base material 31 as shown in FIG. Here, the resin layer 32 is different from the photo-alignment film and the polyimide alignment film of Patent Document 3 described above, and hardly absorbs light or colors in the resin layer 32. 2 illustrates the case where the above-described groove regions 11A and 11B are patterned on the resin layer 32 formed on the outermost layer of the substrate 11. FIG.

  The groove regions 11A and 11B are alternately arranged on the surface of the substrate 11 in a stripe shape, for example. These stripe widths are, for example, the same width as the pixel pitch in a display device (described later). Among these, the groove region 11A is an array of a plurality of grooves 111a, and the plurality of grooves 111a extend along the same direction d1. In the groove region 11B, a plurality of grooves 111b are arranged, and the plurality of grooves 111b extend along the same direction d2. The directions d1 and d2 are orthogonal to each other. However, in the present embodiment, the directions d1 and d2 form angles of −45 ° and + 45 ° with respect to the stripe direction S of the groove regions 11A and 11B, respectively.

  The retardation layer 12 is configured by alternately arranging striped retardation regions 12a and 12b. These phase difference regions 12a and 12b are provided to face the groove regions 11A and 11B, respectively, and have different phase difference characteristics. Specifically, in the retardation region 12a, the extending direction d1 of the groove 111a in the groove region 11A is an optical axis, and in the retardation region 12b, the extending direction d2 of the groove 111b in the groove region 11B is an optical axis. A predetermined retardation value is set. In the present embodiment, the phase difference regions 12a and 12b have different optical axis directions, and the absolute values of retardation are equal to each other.

  Here, with reference to FIG. 3 and FIG. 4 (A), (B), the detailed structure of groove area | region 11A, 11B and the phase difference layer 12 is demonstrated. However, FIG. 3 is a perspective view schematically showing an example of a state near the interface between the groove region 11A and the phase difference region 12a. 4A is a top view of the vicinity of the interface of FIG. 3, and FIG. 4B is a cross-sectional view. Since the groove region 11A and the groove region 11B have the same configuration except for the extending directions of the grooves 111a and 111b, the groove region 11A will be described as an example here.

  In the groove region 11A, the cross-sectional shape of each groove 111a is, for example, V-shaped. In other words, the cross-sectional shape of the entire groove region 11A is a sawtooth shape. Such a shape of the groove 111a is collectively formed by, for example, transfer using a mold described later.

  The retardation layer 12 is configured to include, for example, a polymerized polymer liquid crystal material. That is, in the retardation layer 12, the alignment state of the liquid crystal molecules 120 is fixed. As the polymer liquid crystal material, a material selected according to a phase transition temperature (liquid crystal phase-isotropic phase), a refractive index wavelength dispersion characteristic, a viscosity characteristic, a process temperature, and the like of the liquid crystal material is used. However, it is preferable from a viewpoint of transparency that it has an acryloyl group or a methacryloyl group as a polymerization group. Further, it is preferable to use a material having no methylene spacer between the polymerizable functional group and the liquid crystal skeleton. This is because the alignment treatment temperature during the process can be lowered. The thickness of the retardation layer 12 is, for example, 0.1 μm to 10 μm. When the retardation layer 12 includes a polymerized polymer liquid crystal material, the retardation layer 12 does not need to be configured only with the polymerized polymer liquid crystal material. An unpolymerized liquid crystal monomer may be contained. The unpolymerized liquid crystalline monomer contained in the retardation layer 12 is aligned in the same direction as the alignment direction of the liquid crystal molecules 120 existing around it by an alignment process (heating process) described later. This is because it has the same orientation characteristics as the above-mentioned orientation characteristics.

  In the vicinity of the interface between the groove region 11A and the retardation region 12a, the major axes of the liquid crystal molecules 120 are aligned along the extending direction d1 of the groove 111a. The upper liquid crystal molecules 120 (not shown) are also aligned along the direction d1 so as to follow the alignment direction of the lower liquid crystal molecules 120. That is, the orientation of the liquid crystal molecules 120 is controlled by the shape of the groove 111a extending in the direction d1 in the groove region 11A, and the optical axis of the retardation region 12a is set.

  Moreover, in the said phase difference layer 12, the retardation value of the phase difference layer 12 is set by adjusting the constituent material and thickness of phase difference area | region 12a, 12b. The retardation value of the retardation layer 12 is preferably set in consideration of the retardation of the substrate 11 when the substrate 11 has a retardation. In the present embodiment, the retardation regions 12a and 12b are made of the same material and thickness, and as described above, the absolute values of retardation are equal to each other.

[Manufacturing Method of Retardation Plate 10]
Next, a method for manufacturing the retardation plate 10 will be described. First, the case where the substrate 11 is manufactured by a thermal transfer method will be described, and then the case where the substrate 11 is manufactured by a so-called 2P molding method (Photo Polymerization: molding method using photocuring) will be described. Then, the method of manufacturing the phase difference plate 10 using the board | substrate 11 manufactured by these methods is demonstrated.

  FIG. 5 shows a process of manufacturing the substrate 11 by the thermal transfer method. As shown in FIG. 5, the groove regions 11 </ b> A and 11 </ b> B are patterned on the surface of the substrate 11. The substrate 11 at this time may have a single-layer structure or a multilayer structure (for example, a two-layer structure in which a resin layer is formed on the surface of a base material). At this time, for example, the groove regions 11A and 11B are collectively formed by transfer using the mold roll 112 on which the reverse pattern of the groove regions 11A and 11B is formed. That is, the substrate 11 made of the above-described material is heated to the vicinity of the glass transition temperature, the mold roll 112 is pressed against the surface of the heated substrate 11, and then cooled and released. Regions 11A and 11B are formed. As a result, as shown in FIG. 6, the groove regions 11 </ b> A and 11 </ b> B are alternately formed in a stripe pattern on the surface of the substrate 11.

  Examples of the material of the mold roll 112 include metal materials such as NiP, copper (Cu), and stainless steel, and quartz, silicon, silicon carbide, sapphire, diamond, and the like. The mold roll 112 is formed by forming a reverse pattern on the surface of a base material made of such a material, for example, using a cutting tool or various lithography methods, and then winding the base material around the roll. In the case of cutting by cutting tool, NiP is preferably used as the material of the mold roll 112. Further, as the transfer mold, the roll-shaped mold roll 112 as in the present embodiment may be used, but a flat-plate mold may be used. However, mass productivity can be improved by using a roll-shaped mold.

  FIG. 7 shows an example of an apparatus for manufacturing the substrate 11 by the 2P molding method. In the 2P molding method, for example, a resin material that is cured by ultraviolet rays or an electron beam is applied on a base material to form a resin layer, and a mold having a reverse pattern of the groove region is pressed onto the formed resin layer. Thereafter, the resin layer is cured by irradiating energy rays such as ultraviolet rays and electron beams, thereby transferring the pattern of the mold onto the surface of the resin layer. Below, the structure of the manufacturing apparatus shown in FIG. 7 and the manufacturing method of the board | substrate 11 using this manufacturing apparatus are demonstrated.

7 includes an unwinding roll 200, guide rolls 220, 230, 250, 260, a nip roll 240, a mold roll 112, a winding roll 270, a discharger 280, and an ultraviolet irradiator 290. It is equipped with. Here, the unwinding roll 200 is obtained by winding a film-like base material 31 concentrically and supplying the base material 31. The base material 31 unwound from the unwinding roll 200 flows in the order of the guide roll 220, the guide roll 230, the nip roll 240, the mold roll 112, the guide roll 250, and the guide roll 260, and finally is wound by the winding roll 270. It has come to be taken. The guide rolls 220 and 230 are for guiding the base material 31 supplied from the unwinding roll 200 to the nip roll 240. The nip roll 240 presses the substrate 31 supplied from the guide roll 230 against the mold roll 112. The mold roll 112 is arranged with a predetermined gap from the nip roll 240. On the peripheral surface of the mold roll 112, reverse patterns of the groove regions 11A and 11B are formed. The guide roll 250 is for peeling off the substrate 31 wound around the mold roll 112. The guide roll 260 is for guiding the substrate 31 peeled off by the guide roll 250 to the take-up roll 270. The discharger 280 is provided through a predetermined gap between a portion of the substrate 31 supplied from the unwinding roll 200 and in contact with the guide roll 230. The discharger 280 is configured to drop a composition 32 </ b> A in which an additive such as a photopolymerization initiator is added to a liquid resin material that is cured by ultraviolet rays or an electron beam, if necessary, onto the substrate 31. The ultraviolet irradiator 290 irradiates the portion of the substrate 31 supplied from the unwinding roll 200 after passing through the nip roll 240 and the portion in contact with the mold roll 112 with ultraviolet rays. Yes.

  The board | substrate 11 is formed using the manufacturing apparatus of such a structure. Specifically, first, the base material 31 unwound from the unwinding roll 200 is guided to the guide roll 230 via the guide roll 220, and then the composition 32 </ b> A is dropped from the discharger 280 onto the base material 31. . The composition 32 </ b> A dropped from the discharger 280 is pressed against the peripheral surface of the mold roll 112 by the nip roll 240 through the substrate 31. As a result, the composition 32A comes into contact with the peripheral surface of the mold roll 112 without a gap, and the uneven shape formed on the peripheral surface of the mold roll 112 is transferred to the composition 32A.

  Thereafter, the composition 32 </ b> A is irradiated with ultraviolet UV from the ultraviolet irradiator 290. Thereby, since the liquid crystalline monomer contained in the composition 32A is polymerized, the liquid crystalline monomer becomes a polymer liquid crystal aligned in the extending direction of the concavo-convex shape formed on the peripheral surface of the mold roll 112. Finally, after the substrate 31 is peeled off from the mold roll 112 by the guide roll 250, the substrate 31 is taken up by the take-up roll 270 through the guide roll 260. In this way, the substrate 11 having the resin layer 32 containing the polymerized polymer liquid crystal material on the surface of the base material 31 is formed.

  In the case where the base material 31 is a material that does not transmit ultraviolet UV, the mold roll 112 is made of a material that transmits ultraviolet UV (for example, quartz), and ultraviolet rays from the inside of the mold roll 112 to the composition 32A. You may make it irradiate UV.

  Next, a method for manufacturing the retardation film 10 using the substrate 11 manufactured by the above-described method will be described.

  FIGS. 9A and 9B show a process of manufacturing the retardation film 10 using the substrate 11. 9A and 9B illustrate the case where the substrate 11 manufactured by the 2P molding method is used. As shown in FIG. 9A, a liquid crystal layer 12-1 containing a liquid crystalline monomer is formed on the surface of the substrate 11 on which the groove regions 11A and 11B are patterned by, for example, a roll coater. At this time, as the liquid crystal layer 12-1, a polymer compound having no methylene spacer between the polymerizable functional group and the liquid crystal skeleton is used to exhibit a nematic phase near room temperature. Can be lowered.

  At this time, a solvent for dissolving the liquid crystalline monomer, a polymerization initiator, a polymerization inhibitor, a surfactant, a leveling agent, and the like can be used as necessary for the liquid crystal layer 12-1. Although it does not specifically limit as a solvent, It is preferable to use the thing with the high solubility of a liquid crystalline monomer, low vapor pressure at room temperature, and being hard to evaporate at room temperature. Examples of the solvent that hardly evaporates at room temperature include 1-methoxy-2-acetoxypropane (PGMEA), toluene, methyl ethyl ketone (MEK), and methyl isobutyl ketone (MIBK). This is because if a solvent that easily evaporates at room temperature is used, the evaporation rate of the solvent after coating and forming the liquid crystal layer 12-1 is too high, and the orientation of the liquid crystalline monomer formed after the evaporation of the solvent tends to be disturbed. Because. This disorder tends to be unable to be improved even by performing an alignment treatment (described later) that is gradually cooled after heating to a temperature equal to or higher than the phase transition temperature between the liquid crystal phase and the isotropic phase.

  Subsequently, alignment treatment (heating treatment) of the liquid crystalline monomer of the liquid crystal layer 12-1 applied to the surface of the substrate 11 is performed. This heat treatment is performed at a temperature higher than the phase transition temperature of the liquid crystalline monomer and, when a solvent is used, at a temperature higher than the temperature at which the solvent dries, for example, 50 ° C to 130 ° C. However, it is important to control the heating rate, holding temperature, time, cooling rate, and the like. For example, when the liquid crystal layer 12-1 in which a liquid crystalline monomer having a phase transition temperature of 52 ° C. is dissolved in 1-methoxy-2-acetoxypropane (PGMEA) so that the solid content is 30% by weight, First, the solvent is heated to a temperature at which the solvent is dried at a temperature equal to or higher than the phase transition temperature (52 ° C.) of the liquid crystalline monomer, for example, about 70 ° C., and held for several minutes.

  Here, the coating of the liquid crystalline monomer in the previous step causes shear stress to act on the interface between the liquid crystalline monomer and the substrate, resulting in flow orientation (flow orientation) and force orientation (external force orientation), and liquid crystal molecules are not intended. May be oriented in the direction. The heat treatment is performed in order to temporarily cancel the alignment state of the liquid crystalline monomer that has been aligned in such an unintended direction. Thereby, in the liquid crystal layer 12-1, the solvent is dried to become only the liquid crystalline monomer, and the state is an isotropic phase.

  Then, it is gradually cooled at a temperature slightly lower than the phase transition temperature (52 ° C.), for example, 47 ° C. at about 1 to 5 ° C./min. Thus, by lowering the temperature to a temperature equal to or lower than the phase transition temperature, the liquid crystalline monomer is aligned according to the pattern of the groove regions 11A and 11B formed on the surface of the substrate 11. That is, the liquid crystalline monomer is aligned along the extending directions d1 and d2 of the grooves 111a and 111b.

  Subsequently, as shown in FIG. 9B, the liquid crystalline monomer is polymerized by, for example, irradiating ultraviolet rays UV to the liquid crystal layer 12-1 after the alignment treatment. At this time, the treatment temperature is generally near room temperature, but the temperature may be raised to a temperature equal to or lower than the phase transition temperature in order to adjust the retardation value. Moreover, not only ultraviolet rays UV but heat, an electron beam, etc. may be used. However, the process can be simplified by using ultraviolet rays UV. Thereby, the alignment state of the liquid crystal molecules 120 is fixed along the directions d1 and d2, and the retardation regions 12a and 12b are formed. Thus, the phase difference plate 10 shown in FIG. 2 is completed.

  Next, operations and effects of the retardation film 10 and the manufacturing method thereof will be described.

[Operation of retardation plate 10]
In the phase difference plate 10, when light enters the phase difference regions 12 a and 12 b from the back surface side of the substrate 11 or the surface side of the phase difference layer 12, the polarization state is based on the phase difference characteristics of the phase difference regions 12 a and 12 b. As a result, an outgoing light with a changed can be obtained. At this time, the retardation regions 12a and 12b are composed of the same material and thickness, and the liquid crystal molecules 120 in each region are aligned along the extending directions d1 and d2 of the grooves 111a and 111b, respectively. Therefore, the phase difference regions 12a and 12b exhibit phase difference characteristics in which the optical axes are the directions d1 and d2, respectively, and the retardation values are equal to each other.

  Here, as a comparative example, a retardation plate 100 patterned with retardation characteristics using an alignment film will be described with reference to FIGS. In the phase difference plate 100, alignment films 102A and 102B are alternately provided in a stripe pattern on a substrate 101, and a phase difference layer 103 is formed on the alignment films 102A and 102B. The alignment films 102A and 102B have alignment control directions d1 and d2 orthogonal to each other. In the phase difference layer 103, phase difference regions 103a and 103b having different phase difference characteristics are formed corresponding to the patterns of the alignment films 102A and 102B. Examples of the alignment films 102A and 102B include a rubbed horizontal polyimide alignment film, a vertical polyimide alignment film, oblique vapor deposition SiO, a photo alignment film, and an LB film. When such alignment films 102A and 102B are used, these alignment films 102A and 102B cause light absorption and coloring, resulting in a decrease in transmittance, resulting in a light loss and a decrease in light utilization efficiency. End up.

  In contrast, in the present embodiment, the phase difference layer 12 is in contact with the surface of the substrate 11. That is, since the alignment film that generates light absorption or coloring is not provided near the interface between the retardation layer 12 and the substrate 11, light loss caused by such an alignment film is eliminated.

  When the retardation plate 10 having the retardation characteristics as described above is used in combination with a polarizer, for example, the angles formed by the optical axis of the polarizer and the directions d1 and d2 are 45 °, respectively. It arrange | positions so that it may become.

  The retardation plate 10 is suitable as a retardation plate for use in, for example, a three-dimensional display that performs stereoscopic viewing using polarized glasses.

[Operation of manufacturing method of retardation plate 10]
Moreover, in the manufacturing method of the phase difference plate 10, the liquid crystalline monomer is applied at the interface with the surface of the substrate 11 by coating the liquid crystal layer 12-1 on the surface of the substrate 11 on which the groove regions 11A and 11B are formed. By the action, the grooves 111a and 111b are oriented along the extending direction. Thereafter, the alignment state of the liquid crystal molecules is fixed by polymerizing the liquid crystal layer 12-1.

  Here, as a comparative example, with reference to FIGS. 11A to 11C and FIGS. 12A and 12B, a method for manufacturing the retardation film 100 shown in FIGS. explain. As the alignment films 102A and 102B, a case where a photo-alignment film is used among the alignment films will be described as an example.

  First, as shown in FIG. 11A, a photo-alignment film 102 is formed on a substrate 101 made of a glass material and dried. Subsequently, as illustrated in FIG. 11B, the alignment film 102B is formed by irradiating only the selective region with the polarized ultraviolet light UV1 using the photomask 104. After that, as shown in FIG. 11C, the alignment film 102A is formed by irradiating the entire surface with polarized ultraviolet light UV2. Thereby, the alignment films 102 </ b> A and 102 </ b> B are patterned on the substrate 101.

  Subsequently, as shown in FIG. 12A, a liquid crystal layer 103-1 containing a liquid crystalline monomer is applied and formed on the patterned alignment films 102A and 102B. Thereafter, heat treatment is performed at a predetermined temperature in order to stabilize the alignment of the liquid crystalline monomer. Finally, as shown in FIG. 12B, the phase difference plate 100 is manufactured by irradiating ultraviolet rays UV to polymerize the liquid crystalline monomer.

  However, in the manufacturing method using such alignment films 102A and 102B, partial irradiation using polarized ultraviolet rays UV1 and UV2 is required for patterning the alignment films 102A and 102B. That is, since the patterning is performed by the single wafer method, the number of process steps increases. Further, the method using the polarized ultraviolet irradiation device is difficult to increase in size and is expensive.

  On the other hand, in the present embodiment, a plastic material is used for the substrate 11, and the pattern of the groove regions 11A and 11B is transferred by pressing a mold against the surface of the substrate 11. Therefore, the groove regions 11A and 11B can be easily formed in a lump, so that the number of processes can be reduced as compared with the case where the alignment film is used. Further, in this embodiment, when thermal transfer is used, it is not necessary to use an ultraviolet irradiation device, so that it can be easily increased in size and manufactured at low cost.

  In addition, after the liquid crystal layer 12-1 is applied and formed on the surface of the substrate 11, the orientation of the liquid crystalline monomer can be controlled more accurately by performing a heat treatment at a temperature equal to or higher than the phase transition temperature of the liquid crystalline monomer. it can. However, since this heat treatment is performed at a relatively low temperature as described above, even when a plastic material is used as the substrate 11, deformation and warpage are unlikely to occur. Thus, by using a plastic material for the substrate 11, workability is improved and the cost is reduced, so that mass production is also possible.

  Incidentally, an alignment film used for a normal liquid crystal display or the like, for example, a rubbed polyimide alignment film, requires a very strong anchoring force. This is because in the field of display, it is necessary to display liquid crystal molecules by tilting them by applying a voltage, and to return to the original liquid crystal alignment state when no voltage is applied. And in order to provide such a strong anchoring force, it is necessary to heat a polyimide alignment film at the baking temperature of 200 degreeC or more. For this reason, when a thermoplastic resin such as a plastic material is used for the substrate, the substrate is deformed or warped. In addition, the deformation or warpage of the substrate may cause problems in the subsequent rubbing process.

  On the other hand, in the retardation plate 10 of the present embodiment, since the liquid crystalline monomer is finally polymerized with ultraviolet rays or the like, a strong anchoring force as in the above display is unnecessary. That is, it is sufficient to have an anchoring force enough to maintain the alignment state until UV curing. Therefore, as described above, since the heat treatment may be performed at a relatively low temperature corresponding to the phase transition temperature of the liquid crystalline monomer or the temperature at which the solvent is dried, there is no particular problem even if a plastic material is used.

  As described above, in the present embodiment, the retardation layer 12 is provided in contact with the surface of the substrate 11 on which the groove regions 11A and 11B are formed, and the substrate is used without using a photo-alignment film or a rubbing alignment film. The liquid crystal molecules 120 are aligned by the groove regions 11 </ b> A and 11 </ b> B on the surface of 11. Thereby, optical loss near the interface between the substrate 11 and the retardation layer 12 can be reduced. Therefore, it is possible to manufacture with a simple process and to suppress a decrease in light utilization efficiency.

  In the present embodiment, when the substrate 11 has a single layer structure, the light use efficiency can be maximized. In the present embodiment, even when the substrate 11 has a two-layer structure in which the resin layer 32 is formed on the surface of the base material 31, light absorption and coloring hardly occur in the resin layer 32. The decrease in efficiency can be minimized.

  Next, a modification of the present embodiment will be described with reference to the drawings. Below, the same code | symbol is attached | subjected about the component similar to the phase difference plate 10 of the said embodiment, and description is abbreviate | omitted suitably. In addition, the modifications 1-5 are modifications about the structure of the phase difference plate 10, and the modifications 6-10 are the modifications about the manufacturing method of the phase difference plate 10. FIG. In addition, although the case where the thing of the single layer structure was used as the board | substrate 11 was illustrated in the modifications 1-5, the thing of a multilayer structure (for example, 2 layer structure in which the resin layer was formed in the surface of a base material) Of course, it is possible to use.

(Modification 1)
FIG. 13 shows the substrate 13 of the phase difference plate according to Modification 1 as viewed from the front side. In the present modification, the configuration is the same as that of the retardation plate 10 of the above embodiment except for the configuration of the groove regions 13A and 13B formed on the surface of the substrate 13.

  The groove regions 13A and 13B are alternately arranged on the surface of the substrate 13, for example, in a stripe shape. The groove region 13A is constituted by a plurality of grooves 130a extending along the same direction d3, and the groove region 13B is constituted by a plurality of grooves 130b extending along the same direction d4. The directions d3 and d4 are orthogonal to each other. However, in this modification, the directions d3 and d4 form angles of 0 ° and 90 ° with respect to the stripe direction S of the groove regions 13A and 13B, respectively. The cross-sectional shape of each of the grooves 130a and 130b is, for example, V-shaped like the grooves 111a and 111b of the above-described embodiment.

  A phase difference layer having a phase difference region (not shown) having different phase difference characteristics is formed corresponding to the groove regions 13A and 13B. That is, the phase difference regions having the optical axes in the directions d3 and d4 are alternately formed in stripes in contact with the surface of the substrate 13. Also in this modification, the retardation layer is made of the same liquid crystal material as the retardation layer 12 of the above embodiment, and each retardation region is also made of the same material and thickness. Thereby, in each phase difference region, retardation values are equal to each other, and phase difference characteristics having optical axes in directions d3 and d4 are exhibited.

  Moreover, when manufacturing the retardation plate of this modification, in the step of forming the groove regions 13A and 13B, a mold roll on which the reverse pattern of the groove regions 13A and 13B is formed is pressed against the surface of the substrate 13. The other steps are the same as those of the retardation plate 10 of the above embodiment.

  As in this modification, the extending directions d3 and d4 of the grooves 130a and 130b in the groove regions 13A and 13B may be parallel to or orthogonal to the stripe direction S. As described above, the extending direction of the grooves in each groove region only needs to be orthogonal to each other, and the angle formed with the stripe direction S is not particularly limited. Note that when the retardation plate of this modification is used in combination with a polarizer, the angle between these directions d3 and d4 and the transmission axis direction of the polarizer is 45 °.

(Modification 2)
FIG. 14 illustrates a cross-sectional structure of a retardation plate according to Modification 2. In the present modification, the configuration is the same as that of the retardation plate 10 of the above embodiment except for the configuration of the retardation layer 14.

  The retardation layer 14 includes, for example, a polymerized polymer liquid crystal material. That is, in the retardation layer 14, the alignment state of the liquid crystal molecules 120 is fixed. As the polymer liquid crystal material, the same material as that of the retardation layer 12 of the above embodiment can be used. However, in this modification, the retardation layer 14 is configured such that the absolute values of the retardations of the retardation regions 14a and 14b are different from each other. Specifically, the retardation region 14a is configured by a single layer film of the second liquid crystal layer 141, while the retardation region 14b is configured by a laminated film of the first liquid crystal layer 140 and the second liquid crystal layer 141. Yes. The first liquid crystal layer 140 and the second liquid crystal layer 141 contain different liquid crystal materials.

  The retardation plate can be manufactured, for example, as follows. First, as shown in FIG. 15A, after a liquid crystal layer 140-1 containing a liquid crystalline monomer is applied and formed on the entire surface of the groove regions 11A and 11B, the photomask 110 is used to face the groove region 11B. Only the region to be irradiated is irradiated with ultraviolet rays UV. Also in this modification, after the liquid crystal layer 140-1 is applied and formed, it is heated to a temperature equal to or higher than the phase transition temperature of the liquid crystal layer 140-1 as the above-described alignment treatment before the ultraviolet ray UV irradiation. Process. Thereby, the liquid crystal layer 140-1 is polymerized only in the region (phase difference region 14b) facing the groove region 11B. Thereafter, as shown in FIG. 15B, by cleaning the surface of the substrate 11, the first liquid crystal layer 140 is formed only in a region (retardation region 14b) facing the groove region 11B.

Subsequently, as shown in FIG. 16A, a liquid crystal layer 141-1 containing a liquid crystalline monomer is applied and formed on the entire surface of the substrate 11 on which the first liquid crystal layer 140 is formed, and then the alignment treatment as described above. Then, a process of heating to a temperature equal to or higher than the phase transition temperature of the liquid crystal layer 141-1 is performed. Thereafter, as shown in FIG. 16B, the entire surface of the substrate 11 is irradiated with ultraviolet rays UV, whereby the liquid crystal layer 141-1 is polymerized and the second liquid crystal layer 141 is formed. Thus, the retardation plate shown in FIG. 14 is completed.

  In this modification, in the retardation regions 14a and 14b formed in contact with the surface of the substrate 11, optical axes are formed in the directions d1 and d2 by the groove regions 11A and 11B, respectively. Therefore, an effect equivalent to that of the above embodiment can be obtained. On the other hand, since the materials of the phase difference regions 14a and 14b are different from each other, the respective retardation values are different from each other. As described above, the liquid crystal materials may be different from each other for each phase difference region. Thereby, it becomes possible to arbitrarily adjust the retardation value of each phase difference region.

(Modification 3)
FIG. 17 illustrates a cross-sectional structure of a retardation film according to Modification 3. In the present modification, the configuration is the same as that of the retardation plate 10 of the above embodiment except for the configuration of the retardation layer 15.

  The retardation layer 15 is made of a material equivalent to the retardation layer 12 of the above embodiment. However, in this modification, the phase difference regions 15a and 15b are constituted by liquid crystal layers 151 and 150 having different materials and thicknesses, respectively. Such a phase difference plate can be manufactured as follows, for example. First, as shown in FIG. 18A, after the liquid crystal layer 150 is formed only in the region (retardation region 15b) facing the groove region 11B in the same manner as in the second modification, the liquid crystal monomer is included. The liquid crystal layer 151-1 is applied and formed on the entire surface of the substrate 11. After that, the heat treatment as the alignment treatment described above is performed. Subsequently, as shown in FIG. 18B, using the photomask 110, only the region facing the groove region 11A (phase difference region 15a) is irradiated with ultraviolet rays UV. Finally, by cleaning the surface of the substrate 11, the liquid crystal layer 151 is formed only in the retardation region 15a, and the retardation plate shown in FIG. 17 is completed.

  As in this modification, in the retardation layer 15, the retardation regions 15a and 15b may be made of different materials and thicknesses. Even with such a configuration, it is possible to obtain the same effect as that of the above-described embodiment, and it is possible to arbitrarily adjust the retardation value of each phase difference region.

(Modification 4)
FIG. 19 illustrates a cross-sectional structure of a retardation plate according to Modification 4. In the present modification, the configuration is the same as that of the retardation plate 10 of the above embodiment except for the configuration of the retardation layer 16.

  The retardation layer 16 is made of a material equivalent to the retardation layer 12 of the above embodiment. However, in this modification, the liquid crystal layer is formed only in a selective region on the substrate 11, for example, the retardation region 16b. In such a phase difference plate, a liquid crystal layer containing a liquid crystalline monomer is applied and formed on the entire surface of the substrate 11, and then the heat treatment as the alignment treatment described above is performed, so that the region facing the groove region 11B (retardation region 16b). It can be manufactured by irradiating only ultraviolet UV.

  As in this modification, in the retardation layer 16, a liquid crystal layer may be partially formed only in the retardation region 16b. Even with such a configuration, it is possible to obtain substantially the same effect as the above-described embodiment.

(Modification 5)
FIG. 20A shows a cross-sectional structure of the retardation film 20 according to the fifth modification. FIG. 20B shows the substrate 17 as seen from the front side. In the retardation plate 20, the groove region 17 </ b> A is patterned on the surface of the substrate 17, and the retardation layer 18 is formed in contact with the surface of the substrate 17. However, in this modification, the groove region 17A is formed over the entire surface of the substrate 17. The groove region 17A is configured by a plurality of grooves 170a extending along one direction d1.

  Thus, on the surface of the substrate 17, the groove region does not necessarily have to be patterned in a stripe shape. The retardation plate described in the above embodiment has already been described as being suitable as, for example, a component of a 3D display. However, the retardation plate 20 of the present modification is not limited to the 3D display as described above. It can be suitably used as a viewing angle compensation film (for example, an A plate described later) of a normal display for two-dimensional display.

(Modification 6)
FIG. 21 schematically shows a planar configuration of a mold 210 used when transferring the pattern of each groove region to a substrate in the method of manufacturing a retardation film according to Modification 6. For example, pattern areas 210A and 210B are alternately arranged on the surface of the mold 210. The pattern areas 210A and 210B are respectively provided with irregularities that are inverted patterns of the groove areas 11A and 11B of the phase difference plate 10, and the extending directions d1 and d2 of the convex (concave) portions are orthogonal to each other. . In this modification, the pattern areas 210A and 210B of such a mold 210 are formed by a combination of divided molds.

  For example, as shown in FIG. 22A, a plurality of thin metal plates 310A whose thickness is equal to the width of the pattern region 210A and a plurality of thin metal plates 310B whose thickness is equal to the width of the pattern region 210B are prepared. A pattern region 210A is formed on one end surface of the metal thin plate 310A, and a pattern region 210B is formed on one end surface of the metal thin plate 310B. Next, as shown in FIG. 22B, the thin metal plates 310A and the thin metal plates 310B are alternately overlapped so that the pattern regions 210A and 210B are arranged in the same plane. In this way, the mold 210 according to this modification can be manufactured.

  The metal thin plates 310A and 310B can be manufactured as follows, for example. First, as shown in FIG. 23A, a laminate 312 is prepared in which a plurality of thin metal plates 311 having a thickness equal to the width of the pattern region 210A are overlapped with each other. At this time, for example, a SUS thin plate having a thickness of 0.3 mm is used as the metal thin plate 311, and the number of the metal thin plates 311 included in the stacked body 312 is ten. Next, as shown in FIG. 23B, the laminated body 312 is sandwiched and fixed by the steel material 320 from both sides, and then, as shown by an arrow A in FIG. On the other hand, the grinding wheel is moved so that the trace is + 45 °, and a grinding mark is made. Further, as shown by an arrow B in FIG. 23B, the grinding wheel is moved so as to make grinding traces with respect to the other side surface of the stacked body 312 so that the line is −45 °. At this time, alumina abrasive grains of about # 1000 to # 3000 are used as grinding wheels. After the grinding process, among the plurality of thin metal plates 311 included in the laminate 312, the even-numbered ones are rotated without changing the even-numbered ones. Specifically, as shown in FIG. 23C, the surface (pattern region 210A) on which grinding traces are made so that the lines are −45 ° and the grinding is performed so that the lines are 45 °. The odd-numbered thin metal plates 311 are rotated so that the surface with the marks (pattern region 210B) is in the same plane. When the retardation plate 10 was manufactured using the mold 210 thus manufactured, it was confirmed that the liquid crystal molecules 120 were aligned in the direction of the grinding lines.

(Modification 7)
In the retardation plate manufacturing method according to the modified example 7, the pattern areas 210A and 210B of the mold 210 shown in FIG. 21 are formed by using processing marks at the time of processing with fixed abrasive grains or loose abrasive grains.

  For example, as shown in FIG. 24, the unprocessed flat plate 350 is slid in one direction D1, and the disc-shaped grindstone 340 is rotated about an axis AX2 parallel to the normal line of the grindstone 340. At this time, as shown in FIG. 25A, the grindstone 340 is tilted so that the central axis AX2 intersects the direction D1 at + 45 °, and the abrasive grain surface formed on the peripheral surface of the grindstone 340 is Grinding marks are made by pressing against the upper surface of the flat plate 350 (the unpolished region). 25B, the grindstone 340 is tilted so that the central axis AX2 intersects the direction D1 at −45 °, and the upper surface of the flat plate 350 formed on the circumferential surface of the grindstone 340. Grinding marks are made by pressing against (unpolished area). At this time, alumina abrasive grains of about # 1000 to # 3000 are used as grinding wheels. When the retardation plate 10 was manufactured using the mold 210 thus manufactured, it was confirmed that the liquid crystal molecules 120 were aligned in the direction of the grinding lines.

  Moreover, when forming pattern area | region 210A, 210B in a roll, what is necessary is just as follows, for example. That is, as shown in FIG. 26, the unprocessed roll 330 is rotated about the central axis AX1 of the roll 330, and the disc-shaped grindstone 340 is centered on the axis AX2 parallel to the normal line of the grindstone 340. Rotate as At this time, as shown in FIG. 27A, the grindstone 340 is tilted so that the central axis AX2 intersects the central axis AX1 at + 45 °, and is formed on the peripheral surface of the grindstone 340. Is pressed against the peripheral surface of the roll 330 (of which the unpolished region), grinding marks are made. In addition, as shown in FIG. 27B, the grindstone surface formed on the peripheral surface of the grindstone 340 by tilting the grindstone 340 so that the central axis AX2 intersects the central axis AX1 at −45 °. Is pressed against the peripheral surface of the roll 330 (of which the unpolished region), grinding marks are made. At this time, the width of the grain surface of the grindstone 340 may be a width corresponding to the width of the pattern regions 210A and 210B. The retardation film 10 can be manufactured using the mold 210 thus manufactured.

(Modification 8)
In the retardation plate manufacturing method according to Modification 8, the pattern areas 210A and 210B of the mold 210 shown in FIG. 21 are formed by cutting with a cutting tool. By cutting the surface of the mold material with a cutting tool, fine grooves on the order of submicron are processed. For pattern formation, grooves having different angles are formed in regions corresponding to the pattern regions 210A and 210B on the surface of the mold material. For example, a groove having a pitch of 250 nm and a V-shaped cross section is formed on the Ni-P plated surface. When the retardation plate 10 was manufactured using the mold 210 thus manufactured, it was confirmed that the liquid crystal molecules 120 were aligned in the groove direction.

(Modification 9)
In the retardation plate manufacturing method according to the modified example 9, the pressure of the mold in which the pattern regions 210A and 210B of the mold 210 shown in FIG. 21 are formed with grooves having the same uneven shape as the unevenness of the pattern regions 210A and 210B. Formed by transcription.

  For example, as shown in FIG. 28A, a disk-shaped mold 360 is prepared in which a plurality of grooves 361 extending in a direction intersecting at 45 ° with respect to the extending direction of the peripheral surface is formed. Next, as shown in FIG. 29, the unprocessed roll 330 is rotated about the central axis AX1 of the roll 330, and the disk-shaped mold 360 is moved to an axis AX3 parallel to the normal line of the mold 360. Rotate as center. At this time, the mold 360 is rotated so that the axis AX3 is parallel to the central axis AX1 and the peripheral speeds of the mold 360 and the roll 330 are the same. Then, the groove 360 of the mold 360 is pressure-transferred to the roll 330 by pressing the mold 360 against the peripheral surface (of the unpolished region) of the roll 330.

  Further, as shown in FIG. 28B, a disk-shaped mold 370 is prepared in which a plurality of grooves 371 extending in a direction intersecting at −45 ° with respect to the extending direction of the peripheral surface is formed. . Next, as shown in FIG. 29, the unprocessed roll 330 is rotated about the central axis AX1 of the roll 330, and the disk-shaped mold 370 is moved to the axis AX3 parallel to the normal line of the mold 370. Rotate as center. At this time, the mold 370 is rotated so that the axis AX3 is parallel to the central axis AX1 and the peripheral speeds of the mold 370 and the roll 330 are the same. Then, the groove 371 of the mold 370 is pressure-transferred to the roll 330 by pressing the mold 370 against the peripheral surface (of the unpolished region) of the roll 330.

  The phase difference plate 10 can be manufactured by using the roll 330 having the pattern areas 210A and 210B manufactured as described above.

(Modification 10)
In the retardation plate manufacturing method according to the modified example 10, the pattern areas 210A and 210B of the mold 210 shown in FIG. 21 are made of, for example, a metal such as SUS, Ni, Cu, Al, Fe or the like with a pulse width of 1 pico. It is formed by drawing a pattern using an ultrashort pulse laser of a second (10-12 seconds) or less, so-called femtosecond laser.

  At this time, by appropriately setting the laser wavelength, repetition frequency, pulse width, beam spot shape, polarization, laser intensity applied to the sample, laser scanning speed, etc., pattern regions 210A and 210B having desired irregularities are formed. be able to. The polarization of the laser beam is linearly polarized, and the polarization direction angle is set to a direction orthogonal to the extending directions d1 and d2 of the convex (concave) portions.

  The wavelength of the laser used for laser processing is, for example, 800 nm. However, the wavelength of the laser used for laser processing may be 400 nm or 266 nm. The repetition frequency is preferably larger in consideration of the processing time, but processing is possible even when the repetition frequency is 1000 Hz or 2000 Hz. The pulse width is preferably shorter, and is preferably about 200 femtoseconds (10-15 seconds) to 1 picosecond (10-12 seconds). The beam spot of the laser irradiated on the mold is preferably rectangular. The beam spot can be shaped by using, for example, an aperture or a cylindrical lens (see FIGS. 33 and 34).

  Further, the intensity distribution of the beam spot is preferably as uniform as possible, for example, as shown in FIG. This is because it is desired to make the in-plane distribution such as the depth of the unevenness formed in the mold as uniform as possible. As shown in FIG. 30, when the beam spot size is Lx, Ly, and the laser scanning direction is the y direction, Lx is determined by the width of the pattern region to be processed. For example, as shown in FIG. 31, the size of Lx may be approximately the same as that of the pattern region 210A, or as shown in FIG. 32, the size of Lx is approximately half of the pattern region 210A, and the scanning is performed twice. The pattern region 210A may be formed. In addition, the size of Lx may be 1 / N (N is a natural number) of the pattern area 210A, and the pattern area 210A may be formed by N scans. Ly can be appropriately determined depending on the stage speed, laser intensity, repetition frequency, and the like, and is, for example, about 30 to 500 μm.

  Details of the method of manufacturing the mold 210 will be described. FIG. 33 and FIG. 34 show an example of an optical device used in laser processing. FIG. 33 shows an example of an optical arrangement in the case of producing a flat plate mold, and FIG. 34 shows an example of an optical apparatus in the case of producing a roll-shaped mold.

  The laser body 400 is IFRIT (trade name) manufactured by Cyber Laser Corporation. The laser wavelength is 800 nm, the repetition frequency is 1000 Hz, and the pulse width is 220 fs. The laser body 400 emits laser light linearly polarized in the vertical direction. Therefore, in the present apparatus, linear polarization in a desired direction is obtained by rotating the polarization direction using the wave plate 410 (λ / 2 wave plate). Further, in this apparatus, a part of the laser light is extracted using the aperture 420 having a square opening. This is because the intensity distribution of the laser beam is a Gaussian distribution, and only the vicinity of the center is used to obtain a laser beam having a uniform in-plane intensity distribution. Further, in this apparatus, the laser beam is narrowed down using two orthogonal cylindrical lenses 430 so as to obtain a desired beam size.

  When processing the flat plate 350, the linear stage 440 is moved at a constant speed. For example, as shown in FIG. 35, it is possible to first scan only the pattern area 210A in order, and then scan the pattern area 210B in order. The numbers in parentheses in FIG. 35 indicate the scanning order. When such a scanning method is used, it is not necessary to change the angle of the wave plate 410 while scanning the pattern region 210A and while scanning the pattern region 210B. For this reason, the processing of the pattern region 210A is completed, and when the processing of the pattern region 210B is started next, it is only necessary to change the angle of the wave plate 410.

  For example, as shown in FIG. 36, the pattern area 210A and the pattern area 210B may be scanned alternately. When such a scanning method is used, the wave plate 410 is used to change the direction of polarization when the processing moves from the pattern region 210A to the pattern region 210B and when the processing moves from the pattern region 210B to the pattern region 210A. It is necessary to change the angle.

  When processing the roll 330, instead of moving the linear stage 440, the roll 330 may be rotated. The laser beam scanning procedure for processing the roll 330 is the same as the laser beam scanning procedure for processing the flat plate 350.

  Next, the conditions of the actually processed laser beam will be described.

(1) When the width of each of the pattern areas 210A and 210B is 530 μm, SUS304 is used as a mold material, the beam size Lx is 530 μm, the beam size Ly is 30 μm, the power is 156 mW, and the stage speed is 3 mm / s. It was. When scanning the pattern area 210A, the polarization direction of the laser was set to the direction d1, and when scanning the pattern area 210B, the polarization direction of the laser was set to the direction d2. The d1 direction was −45 ° with respect to the extending direction of the pattern regions 210A and 210B, and the d2 direction was + 45 ° with respect to the extending direction of the pattern regions 210A and 210B.

  Thereby, a pattern region 210A having a 530 μm width having a concave (convex) extending direction in the + 45 ° direction and a pattern region 210B having a concave (convex) extending direction in the −45 ° direction are alternately arranged. An ordered mold could be made. Under the same conditions, SUS420J2 and NiP were also processed, but the mold could be produced in the same manner. Note that NiP plated on SUS was used.

(2) When the width of each of the pattern regions 210A and 210B is 270 μm SUS304 is used as a mold material, the beam size Lx is 270 μm, the beam size Ly is 220 μm, the power is 200 mW, and the stage speed is 6 mm / s. It was. When scanning the pattern area 210A, the polarization direction of the laser was set to the direction d1, and when scanning the pattern area 210B, the polarization direction of the laser was set to the direction d2. The d1 direction was −45 ° with respect to the extending direction of the pattern regions 210A and 210B, and the d2 direction was + 45 ° with respect to the extending direction of the pattern regions 210A and 210B.

  Thereby, a pattern region 210A having a 270 μm width having a concave (convex) extending direction in the + 45 ° direction and a pattern region 210B having a concave (convex) extending direction in the −45 ° direction are alternately arranged. An ordered mold could be made.

  The unevenness of the mold produced by the above method had a pitch of the periodic structure of about 700 nm and a depth of about 50 to 250 nm.

  The steps other than the step of performing transfer using the mold 210 manufactured using the femtosecond laser are the same as those in the above embodiment. Hereinafter, the operation and effect of this modification will be described in comparison with the case of using general lithography.

  In the above-described embodiment, bite cutting and lithography are mentioned as the pattern forming method of the mold, but generally, lithography using an electron beam, a two-beam interference method, or the like is used. Among these, lithography using an electron beam is a method in which a resist is applied to the surface of a mold, a pattern is drawn by irradiating the electron beam, and a desired pattern is formed through a development process, an etching process, and the like. It is. In the lithography using the two-beam interference method, interference fringes are generated by irradiating two laser beams with interference, and a pattern is formed by lithography using the interference fringes.

  However, in lithography using an electron beam, in order to draw a pattern having a fine periodic structure with an area of 5 mm square, a long time of 12 hours is required even when a high-performance apparatus is used. On the other hand, in the two-beam interferometry, although the time required for one drawing is about several tens of seconds, the area of the periodic structure that can be drawn at one time is determined by the beam diameter of the laser light, and is about several mm square. And very small. For this reason, in order to form a non-reflective periodic structure having an area of several centimeters square, it is necessary to draw several millimeter square patterns by connecting them many times while changing the irradiation position. For this reason, a pattern mismatch is likely to occur at the joining portion. Further, in the two-beam interference method, since the period of the grating formed by the interference fringes is easily influenced by the incident angles of the two lights, it is necessary to suppress the fluctuation of the incident angles. For this reason, the optical system must be strictly adjusted to accurately set the optical path of each laser beam, and the apparatus configuration becomes complicated.

  On the other hand, in the present modification, the pattern areas 210A and 210B of the mold 210 are drawn by controlling the beam spot shape using a femtosecond laser, so that the pattern areas 210A and 210B can be collectively collected by one irradiation. Can be formed. In addition, when a femtosecond laser is used, a convex (concave) portion is formed so as to extend along a direction orthogonal to the polarization direction, so that the groove direction of the retardation plate can be easily adjusted by controlling the polarization. Can be set. Therefore, it is advantageous for simplification of the manufacturing process. Moreover, it becomes easy to cope with an increase in area of the mold.

  Incidentally, the pattern regions 210A and 210B formed by the femtosecond laser in this modification have a certain periodic structure as shown in FIGS. 37A and 37B. Has a slight fluctuation in the direction. That is, the pattern areas 210A and 210B of this modification have a fluctuating periodic structure. On the other hand, the pattern regions 210A and 210B formed by other methods such as electron beam drawing do not have fluctuation as shown in FIGS. 38 (A) and (B).

  When the pattern on which the pattern areas 210A and 210B having fluctuations are formed and the transfer is performed on the substrate, the uneven shape having the fluctuation is also transferred to the substrate. When a liquid crystal layer is formed on this surface, for example, as shown in FIGS. 39A and 39B, the liquid crystal layer is formed on the uneven shape (groove 111a) having fluctuation. In addition, the case where the type | mold which does not produce fluctuation in uneven | corrugated shape (groove | channel 111a) was used was shown to FIG. 40 (A) and (B).

  In the case where the unevenness has a periodic structure (including the case where there is a certain degree of fluctuation), if the refractive index of the liquid crystal molecules 120 and the substrate 11 are different, a part of the incident light is diffracted. In the following, a comparison is made between the case where there is fluctuation in the uneven shape (groove 111a) in this diffraction and the case where there is no fluctuation. As shown in FIG. 41B, when there is no fluctuation in the uneven shape (groove 111a), the incident light is diffracted only in one specific direction by the periodic structure having no fluctuation. Diffraction has a wavelength dependence, and the diffraction angle changes depending on the wavelength of incident light, so that the diffracted light appears to be iridescent. On the other hand, in this modified example, as shown in FIG. 41A, since the uneven shape (groove 111a) fluctuates, the diffracted light appears in a blurred form in a certain angle range due to the fluctuating periodic structure. . For this reason, the diffracted light of incident light does not appear clearly.

  This means that when the phase difference plate is used in a display device, for example, when external light such as a fluorescent lamp is incident, the difference in the influence of diffracted light appears significantly. That is, when there is no fluctuation in the uneven shape (groove 111a), the display screen looks rainbow when external light such as a fluorescent lamp is reflected. On the other hand, when the uneven shape (groove 111a) fluctuates, the diffracted light is blurred and the display screen is not colored rainbow even when external light such as a fluorescent lamp is reflected. Therefore, it is preferable that the uneven shapes of the pattern regions 210A and 210B have fluctuations in the period and the direction of the unevenness.

Next, consider how much fluctuation is desirable. Here, the photographic data in the pattern area 210A is analyzed by DFT (Discrete Fourier Transform) and quantified according to how wide the spatial frequency area is. 42A and 42B show the DFT analysis results when the uneven shape (groove 111a) is fluctuated. 43A and 43B show the DFT analysis results in the case where there is no fluctuation in the uneven shape (groove 111a). In order to quantify the DFT image, fitting was performed with the following Gaussian function in the vicinity of the spatial frequency where the power spectral density (PSD) of the DFT image is maximum.

  Here, f is a spatial frequency and θ is an angle. f0 is the spatial frequency at which PSD is maximized, and θ0 is the angle at which PSD is maximized. fW and θW are quantities indicating the spread in the vicinity of the peak. Based on this Gaussian function, when the pitch of the unevenness and the spread of the angle of the unevenness are obtained, if there is fluctuation, the spread of the pitch is about 2 to 10%, and the spread of the angle is about 3 to 8 °. On the other hand, when there is no fluctuation, the pitch spread is as small as about 0 to 2%, and the angle spread is also small as about 0 to 1 °.

  Next, application example 1 of the phase difference plate according to the above-described embodiment and modification examples 1 to 4, and application examples 2 and 3 of the phase difference plate 20 according to modification example 5 will be described. In Application Example 1, the configuration of the retardation film 10 illustrated in FIG. 1 will be described as an example.

(Application example 1)
FIG. 44 illustrates a cross-sectional structure of the display device 1 according to Application Example 1. FIG. 45 is a schematic diagram illustrating a stacked structure of the display device 1. The display device 1 displays a two-dimensional image based on, for example, a right-eye image signal and a left-eye image signal, and observes these two-dimensional images using polarized glasses. This is a 3D display that realizes stereoscopic viewing.

In the display device 1, for example, a plurality of pixels of three primary colors of red (R: Red), green (G: Green), and blue (B: Blue) are arranged in a matrix, and the polarizer 22 is sequentially arranged from the backlight 21 side. , A drive substrate 23, a liquid crystal layer 24, a counter substrate 25, and a polarizer 26. The retardation plate 10 is attached to the light exit side of the polarizer 26 so that, for example, the retardation layer 12 side faces the polarizer 26. In such a configuration, the optical axis directions of the retardation regions 12 a and 12 b in the retardation layer 12 are arranged so as to form an angle of 45 ° with respect to the transmission axis of the polarizer 26. Further, the groove regions 11A and 11B of the phase difference plate 10 correspond to the even and odd lines of the display pixel region, respectively, and the stripe widths of the groove regions 11A and 11B are equal to the pixel pitch.

As the backlight 21, for example, an edge light type using a light guide plate or a direct type is used. For example, a CCFL (Cold Cathode Fluorescent) is used.
Lamp: cold cathode fluorescent lamp), LED (Light Emitting Diode: light emitting diode), and the like.

  The drive substrate 23 is a substrate in which a pixel drive element such as a TFT (Thin Film Transistor) is formed on the surface of a transparent substrate 23a such as glass. The counter substrate 25 is obtained by forming a color filter layer 25b corresponding to the three primary colors on the surface of a transparent substrate 25a such as glass.

The liquid crystal layer 24 is made of a liquid crystal material such as a nematic liquid crystal, a smectic liquid crystal, or a cholesteric liquid crystal, for example, VA (Vertical
Alignment) mode liquid crystal. An alignment film (not shown) for controlling the alignment of liquid crystal molecules in the liquid crystal layer 24, for example, a polyimide alignment film, is provided between the liquid crystal layer 24 and the drive substrate 23 and the counter substrate 25. Yes.

  The polarizers 22 and 26 transmit polarized light that vibrates in a specific direction, and absorb or reflect polarized light that vibrates in a direction orthogonal thereto. These polarizers 22 and 26 are arranged so that their transmission axes are orthogonal to each other. Here, the polarizer 22 selectively transmits the polarization component in the horizontal direction, and the polarizer 26 selectively transmits the polarization component in the vertical direction.

  In such a display device 1, when the light emitted from the backlight 21 is incident on the polarizer 22, only the horizontal polarization component is transmitted, is transmitted through the drive substrate 23, and is incident on the liquid crystal layer 24. This incident light is modulated and transmitted through the liquid crystal layer 24 based on the image signal. The light transmitted through the liquid crystal layer 24 is extracted as red, green, and blue light for each of the three primary colors by the color filter 25 b of the counter substrate 25, and then only the polarization component in the vertical direction is output by the polarizing plate 26. Transparent. Then, the polarization component transmitted through the polarizing plate 26 is converted into a predetermined polarization state for each of the retardation regions 12 a and 12 b by the retardation layer 12 in the retardation plate 10, and is emitted from the substrate 11 side. The light emitted from the phase difference plate 10 in this way is recognized as a three-dimensional stereoscopic image by an observer wearing polarized glasses. At this time, as described above, since the alignment film is not formed on the phase difference plate 10, generation of light loss due to the phase difference plate 10 is suppressed, and light utilization efficiency is increased. Therefore, brighter display than before can be realized.

  When the retardation plate according to the above-described modification 1 is applied to the display device 1 as described above, for example, as shown in FIG. 46, the transmission axis is at an angle of 45 ° with the horizontal direction. The set polarizer 27 is used. Thereby, the transmission axis direction of the polarizer 27 and the optical axis direction of each phase difference region of the phase difference plate are arranged so as to form an angle of 45 °.

  Moreover, since the phase difference plate 10 is bonded together on the front surface of the display apparatus 1, it will be arrange | positioned at the outermost surface of a display. For this reason, it is preferable to provide an antireflection layer or an antiglare layer (both not shown) on the back surface of the substrate 11 in order to improve contrast in a bright place. Furthermore, the vicinity of the boundary between the phase difference patterns may be covered with a black pattern. With this configuration, it is possible to suppress the occurrence of crosstalk between phase difference patterns.

(Application example 2)
FIG. 47 illustrates a cross-sectional structure of the display device 2 according to Application Example 2. FIG. 48 is a schematic diagram illustrating a stacked structure of the display device 2. The display device 2 is a display for two-dimensional display such as a liquid crystal television or a personal computer, for example, and uses the retardation plate 20 as a viewing angle compensation film. The display device 2 includes a polarizer 22, a drive substrate 23, a liquid crystal layer 24, a counter substrate 25, and a polarizer 26 in order from the backlight 21 side, and a modified example on the light emission side of the polarizer 22. The phase difference plate 20 which concerns on 5 is arrange | positioned. As described above, the retardation plate 20 is obtained by uniformly aligning the polymerizable liquid crystal in the retardation layer 18 in the extending direction of the groove (A plate). In this case, the phase difference plate 20 is disposed such that the angle between the extending direction of the groove, that is, the optical axis direction and the transmission axis direction of the polarizer 22 is 0 °.

  Here, as the viewing angle compensation film used for the display as described above, in addition to the A plate, a C plate or the like can be used. In addition, for example, a retardation plate in which biaxiality is imparted to the retardation layer by irradiating polarized ultraviolet rays can be used. However, when VA mode liquid crystal is used for the liquid crystal layer 24, it is desirable to use the A plate, the C plate, or both.

  In the retardation plate as the C plate, the retardation layer has, for example, a chiral nematic phase (cholesteric phase), and the optical axis direction thereof coincides with the normal direction of the substrate surface. In this C plate, liquid crystal molecules aligned along the extending direction of the groove form a helical structure having a helical axis in the normal direction of the substrate surface by introducing a chiral agent or the like. Thus, a configuration in which the orientation of liquid crystal molecules changes in the thickness direction of the retardation layer may be employed. In other words, the extending direction of the groove and the optical axis direction of the retardation plate may be different from each other. This is because the optical anisotropy as a retardation plate is finally determined depending on the alignment state of the liquid crystal molecules in the thickness direction.

  In such a display device 2, when the light emitted from the backlight 21 enters the polarizer 22, only the horizontally polarized component is transmitted and enters the phase difference plate 20. The light transmitted through the phase difference plate 20 is sequentially transmitted through the drive substrate 23, the liquid crystal layer 24, the counter substrate 25, and the polarizer 26, and is emitted from the polarizer 26 as a vertically polarized component. Thereby, a two-dimensional display is performed. Here, since the phase difference plate 20 is arranged, the phase difference of the liquid crystal when viewed from the oblique direction is compensated, and the light leakage and coloring in the oblique direction at the time of black display can be reduced. That is, the phase difference plate 20 can be used as a viewing angle compensation film. At this time, since the alignment film is not formed on the phase difference plate 20, generation of light loss due to the phase difference plate 20 is suppressed, and light utilization efficiency is increased. Therefore, brighter display than before can be realized.

  The retardation plate 20 as such a viewing angle compensation film may be disposed between the polarizer 22 and the drive substrate 23 in the display device 1 for 3D display according to Application Example 1 described above. Good. In addition, the configuration in which the angle formed by the optical axis direction d1 of the phase difference plate 20 and the transmission axis direction of the polarizer 22 is set to 0 ° has been described as an example, but the angle formed by these directions. Is not limited to 0 °. For example, when a circularly polarizing plate is used as the polarizer 22, the angle between the optical axis direction d 1 of the phase difference plate 20 and the transmission axis direction of the polarizer 22 is 45 °.

(Application example 3)
FIG. 49 illustrates a cross-sectional structure of the display device 3 according to Application Example 3. The display device 3 is, for example, a transflective two-dimensional display. In the display device 3, a retardation plate 20 as a viewing angle compensation film is formed between the drive substrate 23 and the counter substrate 25 together with liquid crystal layers 33A and 33B for display modulation. Specifically, the reflective layer 34 is provided in a selective region on the drive substrate 23, and the phase difference plate 20 is formed in a region facing the reflective layer 34 on the counter substrate 25 side. A liquid crystal layer 33 </ b> B is sealed between the drive substrate 23 and the retardation plate 20. On the other hand, a liquid crystal layer 33A is sealed in another region between the drive substrate 23 and the counter substrate 25. The liquid crystal layers 33A and 33B modulate light by applying a voltage, and have phase differences of λ / 2 and λ / 4, respectively. A backlight 21 and a polarizer 22 are disposed below the drive substrate 23, and a polarizer 26 (none of which is shown in FIG. 49) is disposed above the counter substrate 25.

  Thus, the structure which arrange | positions the phase difference plate 20 as a viewing angle compensation film inside a liquid crystal cell, ie, an in-cell structure, may be sufficient.

Example 1
Next, examples of the phase difference plate 10 of the above embodiment will be described. The retardation plate 10 was actually produced under the following conditions. First, a shape corresponding to the groove regions 11A and 11B was formed on a silicon substrate with a stripe width of 1 mm by electron beam drawing using an electron beam resist. The groove pitch in each groove region was 200 nm. Using the resist pattern thus formed, an Ni master was created by electroforming. The Ni master was subjected to a mold release treatment, and the groove regions 11A and 11B were transferred to the surface of the substrate 11 while heating the Ni master and the substrate 11 at 160 ° C. using the amorphous cycloolefin polymer film as the substrate 11.

  Thereafter, a liquid crystal monomer (UCL-017-030 manufactured by Dainippon Ink & Chemicals, Inc.) is dissolved in a solvent (PGMEA) at a concentration of 30% by weight, and a solution to which a polymerization initiator is added is applied to the surface of the substrate 11. did. Subsequently, the temperature of the substrate 11 coated with the liquid crystalline monomer is increased to 80 ° C., held at this temperature for 3 minutes to change the liquid crystalline monomer to an isotropic phase state, and then a speed of about 3 ° C./min. The temperature was gradually lowered to room temperature. Finally, after returning to room temperature, the UV monomer was irradiated to polymerize the liquid crystalline monomer.

  As a result of observation with a polarizing microscope, the liquid crystal molecules 120 were aligned in the groove directions d1 and d2. The retardation of the polymerized liquid crystal layer was 140 nm. Furthermore, as a result of observing the created phase difference pattern by inserting a λ / 4 plate into a polarizing microscope, the sample had a shutter function when rotated.

(Example 2)
Further, as Example 2, a retardation film 60 was manufactured using a mold 210 formed using the femtosecond laser described in Modification Example 10. At this time, mirror-finished SUS with a thickness of 1 mm was used as the mold 210, and a ZEONOR film (ZF14: manufactured by Nippon Zeon Co., Ltd.) was used as the base material. Further, when transferring the groove pattern to the base material, first, after releasing the mold 210, a UV curable acrylic resin liquid (TB3042: manufactured by ThreeBond Co., Ltd.) is developed to form a base made of ZEONOR film. The acrylic resin was cured by UV irradiation from the substrate side. After that, the substrate on which the fine groove is transferred is peeled off from the mold 210, and the surface of the formed groove is removed from the AFM (Atomic).
When observed using a Force Microscope, it was confirmed that a submicron-order groove was formed. FIG. 50 shows an enlarged part of the actually formed pattern region. Next, a liquid crystal monomer solution (RMS03-001C: manufactured by Merck & Co., Inc.) was applied onto the substrate on which the grooves were formed by spin coating, and then heated at 55 ° C. for 2 minutes, and further UV-treated in a nitrogen atmosphere. The phase difference plate 60 was obtained by irradiating.

(Example 3)
Further, as Example 3, a retardation film 61 was manufactured using a base material different from the base material used in Example 2. As the substrate, a triacetyl cellulose (TAC) film (FT-80SZ, manufactured by Panac Co., Ltd.) was used. In addition, about the materials and molds other than the base material, the same ones used in Example 2 were used. Further, the same manufacturing method as that used in Example 2 was used. In Example 3, when the surface of the groove formed on the substrate was observed using an AFM, it was confirmed that a submicron-order groove was formed.

  As a result of observing the obtained retardation plates 60 and 61 with a polarizing microscope, liquid crystal molecules were aligned along the groove directions d1 and d2 in both cases, and both of the retardations were 135 nm. Also, as a result of observing the created phase difference pattern by inserting a λ / 4 plate into a polarizing microscope, both had a shutter function when the sample was rotated.

Example 4
As Example 4, the phase difference plate 62 was produced by the roll process shown in FIGS. 7 and 51 using the mold roll 112 formed using the femtosecond laser described in Modification 11. At this time, a mirror-finished Φ100 mm, 150 mm wide SUS roll was used as the mold roll 112, and a 140 mm wide ZEONOR roll film (ZF14: manufactured by Nippon Zeon Co., Ltd.) was used as the substrate. When transferring the groove pattern to the substrate, first, the mold roll 112 was subjected to a release treatment, and then a UV curable acrylic resin liquid (TB3042: manufactured by ThreeBond Co., Ltd.) was developed. Subsequently, UV irradiation was performed at an energy of 1500 mJ / cm 2 (wavelength 365 nm) from the substrate surface while sealing the UV curable acrylic resin liquid with a substrate made of ZEONOR film at a film formation rate of 0.6 m / min. went. After that, the substrate on which the fine grooves were transferred was peeled from the mold roll 112 and wound. When the surface of the groove formed on the substrate was observed using an AFM, it was confirmed that a groove of submicron order was formed. Next, as shown in FIG. 51, the base material (substrate 11) on which this groove was formed was sent out from the unwinding roll 400. Subsequently, the liquid crystal monomer solution 410 (RMS 03-001C: manufactured by Merck & Co., Inc., 30) was formed on the base material by a roll die coating method so that the dry film thickness was about 0.8 μm.
wt%) was discharged from the discharger 420 and applied. Thereafter, the substrate was passed through a dryer 430 with the film forming speed maintained at 1.0 m / min, and the liquid crystal monomer solution 410 was dried under the conditions of a drying temperature of 100 ° C. and a drying zone of 1 m. Then, after UV irradiation is performed from the ultraviolet irradiator 440 toward the liquid crystal monomer solution 410 under the conditions of energy of 1500 mJ / cm 2 (wavelength 365 nm) and nitrogen atmosphere, the substrate is wound up by the winding roll 450. In this way, a retardation plate 62 was obtained.

(Example 5)
Further, as Example 5, a retardation plate 63 was manufactured using a base material different from the base material used in Example 4. As the substrate, a triacetyl cellulose (TAC) film (FT-80SZ, manufactured by Panac Co., Ltd.) was used. In addition, about the materials and molds other than the base material, the same ones used in Example 2 were used. In addition, the same manufacturing method as that used in Example 4 was used. In Example 5, when the surface of the groove formed on the substrate was observed using AFM, it was confirmed that a submicron-order groove was formed.

  As a result of observing the obtained retardation plates 62 and 63 with a polarizing microscope, liquid crystal molecules were aligned along the groove directions d1 and d2 in both cases, and both of the retardations were 132 nm. Also, as a result of observing the created phase difference pattern by inserting a λ / 4 plate into a polarizing microscope, both had a shutter function when the sample was rotated. In Examples 4 and 5, since the retardation plate was produced by a roll process, the retardation plate could be produced more efficiently than in Examples 2 and 3. Moreover, in Examples 2-5, the ZEONOR film and TAC film used as a base material, and the acrylic resin used as a resin layer on a base material differ from the photo-alignment film and the polyimide alignment film of the said patent document 3. Since the material hardly absorbs light or colors, the decrease in light utilization efficiency is small.

  As described above, the present invention has been described with the embodiment and the modification. However, the present invention is not limited to the above-described embodiment and the like, and various modifications can be made. For example, in the above-described embodiment and the like, the case where the cross-sectional shape of the groove is V-shaped has been described as an example. However, the cross-sectional shape of the groove is not limited to V-shaped, and other shapes such as a circular shape and a polygonal shape are used. It may be a shape. Moreover, the shape of each groove | channel does not necessarily need to be the same, You may make it change the depth of a groove | channel, a magnitude | size, etc. for every area | region on a board | substrate.

  Moreover, in the said embodiment etc., in the groove | channel area | region, although demonstrated taking the example of the structure which arranged the several groove | channel densely without the gap, it is not limited to this, A predetermined space | interval is provided between each groove | channel. You may do it. Further, the configuration in which the groove is provided on the entire surface has been described as an example, but the groove may be provided only in a local region on the substrate in accordance with a required phase difference characteristic.

  Alternatively, a resin dissolved in a solvent or the like may be developed on a mold and then patterned by evaporating the solvent or the like. Further, a substrate made of a plastic material may be formed by melt extrusion using a mold having a reverse pattern of the groove region. Alternatively, after applying another material for pattern formation on the substrate, the glass substrate can be pressed from above to pattern the substrate.

  1, 2, 3 ... Display device, 10, 20 ... Retardation plate, 11 ... Substrate, 11A, 11B, 13A, 13B, 17A ... Groove region, 12 ... Retardation layer, 12a, 12b, 14a, 14b, 15a, 15b, 16a, 16b ... retardation region, 21 ... backlight, 22, 26 ... polarizer, 23 ... driving substrate, 24 ... liquid crystal layer, 25 ... counter substrate, 31 ... base material, 32 ... resin layer.

Claims (12)

A substrate having on its surface a plurality of grooves extending in a specific direction;
A retardation layer that is provided in contact with the surface of the substrate and includes a liquid crystal material that is aligned and polymerized along the extending direction of the plurality of grooves, and
The pattern formed by the plurality of grooves has a periodic structure;
The periodic structure has a spread of 2 to 10% in the pitch of the unevenness and a spread of 3 to 8 in the angle of the unevenness. The plurality of grooves include a plurality of first grooves extending in a first direction and a plurality of second grooves extending in a second direction orthogonal to the first direction,
The first groove region composed of the plurality of first grooves and the second groove region composed of the plurality of second grooves are each in a stripe shape and alternately arranged. Phase difference plate. Provided with a polarizer that transmits a selectively polarized component on the back side of the substrate or the front side of the retardation layer,
The phase difference plate according to claim 1, wherein an angle formed by a transmission axis direction of the polarizer and an extending direction of the groove is 45 °. The phase difference plate according to claim 2, wherein a vicinity of a boundary between the first groove region and the second groove region is covered with a black pattern. The phase difference plate according to claim 1, further comprising an antireflection layer or an antiglare layer on a back surface of the substrate. The retardation plate according to claim 1, wherein a depth of the periodic structure is 50 to 250 nm. A light source;
A display cell for performing display based on light from the light source;
A first polarizer provided on the light source side of the display cell, and a second polarizer provided on the display side;
A retardation plate disposed on the light exit side of at least one of the first polarizer and the second polarizer; and
The retardation plate is
A substrate having on its surface a plurality of grooves extending in a specific direction;
A retardation layer that is provided in contact with the surface of the substrate and includes a liquid crystal material that is aligned and polymerized along the extending direction of the plurality of grooves, and
The pattern formed by the plurality of grooves has a periodic structure;
The periodic structure has a spread of 2 to 10% in the pitch of the unevenness, and a spread of 3 to 8 ° in the angle of the unevenness. The retardation plate is disposed on the light exit side of the second polarizer,
The plurality of grooves include a plurality of first grooves extending in a first direction and a plurality of second grooves extending in a second direction orthogonal to the first direction,
The first groove region composed of the plurality of first grooves and the second groove region composed of the plurality of second grooves are each in a stripe shape and alternately arranged,
The display device according to claim 7, wherein an angle formed by a transmission axis direction of the second polarizer and an extending direction of the first groove and the second groove is 45 °. The retardation film is disposed on a light emission side of the first polarizer, and an angle formed between a transmission axis direction of the first polarizer and an extending direction of the groove is 0 ° or 45 °. Item 9. The display device according to item 7 or 8. The display device according to claim 8, wherein a vicinity of a boundary between the first groove region and the second groove region is covered with a black pattern. The display device according to claim 7, further comprising an antireflection layer or an antiglare layer on a back surface of the substrate. The display device according to claim 7, wherein a depth of the periodic structure is 50 to 250 nm.

Images