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JP2010107470A - Dispersion interferometer, and method of measuring physical quantity of measuring object - Google Patents

Dispersion interferometer, and method of measuring physical quantity of measuring object Download PDF

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JP2010107470A
JP2010107470A JP2008282085A JP2008282085A JP2010107470A JP 2010107470 A JP2010107470 A JP 2010107470A JP 2008282085 A JP2008282085 A JP 2008282085A JP 2008282085 A JP2008282085 A JP 2008282085A JP 2010107470 A JP2010107470 A JP 2010107470A
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JP4925139B2 (en
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Takeshi Akiyama
毅志 秋山
Kazuo Kawabata
一男 川端
Shigeki Okajima
茂樹 岡島
Kazuya Nakayama
和也 中山
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National Institute of Natural Sciences
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a dispersion interferometer usable for actual time control, and capable of removing an influence of a high-frequency noise, reducing a measurement error caused by signal intensity change, and heightening accuracy, by extracting a phase from a signal intensity ratio of a fundamental wave and a double harmonic which are Fourier components of a modulated signal. <P>SOLUTION: A nonlinear crystal element 10 of this dispersion interferometer changes a part of laser light (fundamental wave W1) into a double harmonic W2. A photoelastic element 12 generates phase modulation in the fundamental wave W1 as much as a modulated angle frequency ω<SB>m</SB>portion. A nonlinear crystal element 14 changes the fundamental wave W1 transmitted through plasma 30 into the double harmonic W2. A wavelength selection filter 16 allows selectively transmission of the double harmonic W2. The interferometer determines an intensity ratio between a fundamental wave component of the modulated angle frequency ω<SB>m</SB>and a double harmonic component in an interference signal, and calculates a line average electron density which is a physical quantity of the plasma 30 based on the intensity ratio and a phase variation. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、ディスパーション(Dispersion)干渉計に関し、特に、波長分散を持つ媒質の屈折率計測を行う産業分野に資するディスパーション干渉計及び被測定物の物理量の計測方法にする。   The present invention relates to a dispersion interferometer, and more particularly, to a dispersion interferometer that contributes to the industrial field for measuring the refractive index of a medium having wavelength dispersion and a method for measuring a physical quantity of an object to be measured.

従来、一般的なヘテロダイン干渉計を使用したプラズマの密度計測の方法は下記の通りである。
図3に示すように光源100から出射された振幅sinωtを有する直線偏光のレーザ光は、ハーフミラーM10を介して周波数シフタ110Aに入射されて、sin(ω+ω)tにシフトされ、ハーフミラーM20、ミラーM30、プラズマ120、ミラーM40、ハーフミラーM50を介して検出器130に入射する。
Conventionally, a plasma density measurement method using a general heterodyne interferometer is as follows.
As shown in FIG. 3, the linearly polarized laser beam having the amplitude sinω 0 t emitted from the light source 100 is incident on the frequency shifter 110A via the half mirror M10, and is shifted to sin (ω 0 + ω p ) t. , And enters the detector 130 via the half mirror M20, the mirror M30, the plasma 120, the mirror M40, and the half mirror M50.

この光路を通過したレーザ光は、周波数シフタ110Aにより、振幅がsin{(ω+ω)t+φ}となる。なお、ωは基本角周波数であり、ωは周波数シフタ110Aによるシフト角周波数、tは時間、φはレーザ光がプラズマ120を通過することにより、レーザ光に生ずる位相シフト量(位相差)である。 The laser beam that has passed through this optical path has an amplitude of sin {(ω 0 + ω p ) t + φ} by the frequency shifter 110A. Note that ω 0 is a basic angular frequency, ω p is a shift angular frequency by the frequency shifter 110A, t is time, and φ is a phase shift amount (phase difference) generated in the laser light when the laser light passes through the plasma 120. It is.

又、周波数シフタ110Aを通過した一部のレーザ光は、ハーフミラーM20、ミラーM100、ハーフミラーM90を介して検出器140に入射する。
又、ハーフミラーM10、ミラーM60を介して周波数シフタ110Bに入射したレーザ光は、周波数シフタ110Bによりsin(ω+ω)tにシフトされて、一部がハーフミラーM70、ミラーM80、ハーフミラーM90を介して検出器140に入射する。なお、ωは周波数シフタ110Bによるシフト角周波数である。又、周波数シフタ110Bによりsin(ω+ω)tにシフトされた、レーザ光の残りはハーフミラーM70、ハーフミラーM50を介して検出器130に入射する。
A part of the laser light that has passed through the frequency shifter 110A is incident on the detector 140 via the half mirror M20, the mirror M100, and the half mirror M90.
The laser light incident on the frequency shifter 110B via the half mirror M10 and the mirror M60 is shifted to sin (ω 0 + ω L ) t by the frequency shifter 110B, and a part thereof is the half mirror M70, the mirror M80, and the half mirror. The light enters the detector 140 via M90. Note that ω L is a shift angular frequency by the frequency shifter 110B. Further, the remainder of the laser light shifted to sin (ω 0 + ω L ) t by the frequency shifter 110B is incident on the detector 130 via the half mirror M70 and the half mirror M50.

検出器130では、プラズマ120を介して入射したレーザ光と、周波数シフタ110Bを介して入射したsin(ω+ω)tの振幅のレーザ光に基づいてヘテロダイン方式で測定信号を得る。この測定信号中、AC成分はAcos{(ωL−ω)t+φ}である。なお、ここではAは振幅である。 In the detector 130, a measurement signal is obtained by a heterodyne method based on the laser light incident through the plasma 120 and the laser light having an amplitude of sin (ω 0 + ω L ) t incident through the frequency shifter 110B. In this measurement signal, the AC component is Acos {(ω L −ω p ) t + φ}. Here, A is the amplitude.

又、検出器140では、周波数シフタ110Aで周波数シフトされて入射したレーザ光と、周波数シフタ110Bを介して入射したsin(ω+ω)tの振幅のレーザ光に基づいてヘテロダイン方式で参照信号Acos{(ωL−ω)t}を得る。 In the detector 140, the reference signal is output in a heterodyne manner based on the laser light incident after being frequency-shifted by the frequency shifter 110A and the laser light incident through the frequency shifter 110B and having an amplitude of sin (ω 0 + ω L ) t. Acos {(ω L −ω p ) t} is obtained.

上記のように得られた測定信号と、参照信号に基づき位相計によって位相シフト量(位相差)φを下式により取得して、プラズマ120の線平均電子密度nを算出するようにしている。 A measuring signal obtained as described above, the phase shift by the phase meter based on the reference signal (phase difference) phi was obtained by the following equation, and to calculate the linear average electron density n e of the plasma 120 .

Figure 2010107470
(なお、λは波長、Lはプラズマ中での光路長である。)
この干渉計では、時間・密度分解能が高い利点があり、実時間計測が容易である利点がある。
Figure 2010107470
(Note that λ is the wavelength, and L is the optical path length in the plasma.)
This interferometer has the advantage of high time / density resolution and the advantage of easy real-time measurement.

しかし、レーザ光として赤外領域の短波長レーザを用いると、プラズマ中の屈折率勾配がもたらすレーザ光の屈折変位量を抑えられるが、φに含まれる機械振動がもたらす光路長変化Δdによる位相変化量2πΔd/λが無視できなくなり、大きな計測誤差となる。機械振動を抑制するためには、大がかりな除振設備や、振動補正のため異なる波長の干渉計を併設する必要があり、システムが複雑になる問題があり、又、補正しきれない成分が残る場合もあって、位相分解能が低下する。   However, if a short wavelength laser in the infrared region is used as the laser light, the refractive displacement of the laser light caused by the refractive index gradient in the plasma can be suppressed, but the phase change caused by the optical path length change Δd caused by the mechanical vibration included in φ. The quantity 2πΔd / λ cannot be ignored, resulting in a large measurement error. In order to suppress mechanical vibrations, it is necessary to install large-scale vibration isolation equipment and interferometers with different wavelengths for vibration correction, which causes problems that make the system complex, and components that cannot be corrected remain. In some cases, the phase resolution is reduced.

それに対して、ディスパーション干渉計は、波長分散を持つ媒質を対象として干渉計測を行うものであり、通常の干渉計測では、問題となる機械振動による測定誤差が少ないことが特徴である。   On the other hand, a dispersion interferometer performs interference measurement on a medium having wavelength dispersion, and is characterized by a small measurement error due to mechanical vibration which is a problem in normal interference measurement.

従来のディスパーション干渉計としては、特許文献1が公知である(図4(a)参照)。同図に示すようにこのディスパーション干渉計は、プラズマ120の電子密度を計測するために、直線偏光のレーザ光(周波数ωを有する基本波W1)を非線形結晶素子200に透過させて、その一部を基本波W1と偏光方向が直交する2倍高調波W2に変化させ、共通の光路上にあるプラズマ120に前記基本波W1と2倍高調波W2を通過させる。   Patent Document 1 is known as a conventional dispersion interferometer (see FIG. 4A). As shown in the figure, this dispersion interferometer transmits a linearly polarized laser beam (fundamental wave W1 having a frequency ω) to the nonlinear crystal element 200 in order to measure the electron density of the plasma 120. The portion is changed to the second harmonic W2 whose polarization direction is orthogonal to the fundamental wave W1, and the fundamental wave W1 and the second harmonic W2 are passed through the plasma 120 on the common optical path.

そして、プラズマ120を通過した基本波W1と2倍高調波W2を非線形結晶素子220に入射して通過させて、前記基本波W1の一部を基本波W1と偏光方向が直交する2倍高調波W2に変化させて、波長選択フィルタ230に出射させる。なお、非線形結晶素子220ではプラズマ120を透過した2倍高調波成分から4倍高調波が発生するが、変換効率の観点からその変化は無視できる。波長選択フィルタ230では、2倍高調波W2以外の他の波長を除去して、検出器240に2倍高調波W2を出射する。検出器240では、2倍高調波の干渉信号が検出される。   Then, the fundamental wave W1 and the second harmonic wave W2 that have passed through the plasma 120 are incident on the nonlinear crystal element 220 and passed therethrough, and a part of the fundamental wave W1 is a second harmonic wave whose polarization direction is orthogonal to the fundamental wave W1. The wavelength is changed to W2 and emitted to the wavelength selection filter 230. In the non-linear crystal element 220, the fourth harmonic is generated from the second harmonic component transmitted through the plasma 120, but the change is negligible from the viewpoint of conversion efficiency. The wavelength selection filter 230 removes wavelengths other than the second harmonic W2, and emits the second harmonic W2 to the detector 240. The detector 240 detects a second harmonic interference signal.

ここで、非線形結晶素子200で発生した2倍高調波W2は、基本波W1と同じ光路となるため、基本波W1と同じ機械振動Δdを受けることになる。具体的には、図4(a)に示すように基本波W1はωΔd/cの位相変化を受け、2倍高調波W2は、2ωΔd/cの位相変化を受ける。なお、cは、光速である。   Here, since the second harmonic W2 generated in the nonlinear crystal element 200 has the same optical path as the fundamental wave W1, it receives the same mechanical vibration Δd as the fundamental wave W1. Specifically, as shown in FIG. 4A, the fundamental wave W1 undergoes a phase change of ωΔd / c, and the double harmonic W2 undergoes a phase change of 2ωΔd / c. Note that c is the speed of light.

又、プラズマ120中では、基本波W1と2倍高調波W2は波長分散に応じた位相変化を受ける。具体的には、図4(a)に示すように基本波W1はプラズマ120によりcL/ωの位相変化を受け、2倍高調波W2は、プラズマ120によりcL/2ωの位相変化を受ける。なお、nはプラズマ120の線平均電子密度、cは定数である。 Further, in the plasma 120, the fundamental wave W1 and the second harmonic W2 are subjected to a phase change according to chromatic dispersion. Specifically, as shown in FIG. 4A, the fundamental wave W1 is subjected to a phase change of c p n e L / ω by the plasma 120, and the second harmonic W2 is converted to c p n e L / by the plasma 120. Receiving 2ω phase change. Incidentally, n e is the linear average electron density of the plasma 120, the c p is a constant.

そして、検出器240で検出された2倍高調波W2の干渉信号の位相成分は、下記の通りとなる。
2(ωt+ωΔd/c+cpneL/ω)-(2ωt+2ωΔd/c+cpneL/2ω)=(3/2)cpneL/ω
なお、上記式の左辺の第1項の括弧内は、非線形結晶素子220で2倍高調波W2となった基本波W1の位相成分であり、これを2倍したものが非線形結晶素子220で発生した2倍高調波W2の位相成分である。括弧中には、機械振動による位相変化分ωΔd/cが含まれる。又、第2項は、非線形結晶素子200で2倍高調波となった2倍高調波の位相成分であり、機械振動による位相変化分2ωΔd/cが含まれる。なお、式中、Lはプラズマ120の中での光路長である。
Then, the phase component of the interference signal of the second harmonic W2 detected by the detector 240 is as follows.
2 (ωt + ωΔd / c + c p n e L / ω)-(2ωt + 2ωΔd / c + c p n e L / 2ω) = (3/2) c p n e L / ω
The parentheses in the first term on the left side of the above formula are the phase components of the fundamental wave W1 that has become the second harmonic W2 in the nonlinear crystal element 220, and the doubled component is generated in the nonlinear crystal element 220. The phase component of the second harmonic W2. The parenthesis includes a phase change ωΔd / c due to mechanical vibration. The second term is a phase component of the second harmonic that has become the second harmonic in the nonlinear crystal element 200, and includes a phase change 2ωΔd / c due to mechanical vibration. In the formula, L is the optical path length in the plasma 120.

又、干渉信号は、下記のように表わされる。
A+Bcos{(3/2)cpneL/ω}
ここで、
A=I+I、B=2√(I
であり、I,Iはそれぞれ2倍高調波強度である。ここではAはDC成分(直流成分)であり、Bは振幅強度である。
The interference signal is expressed as follows.
A + Bcos {(3/2) c p n e L / ω}
here,
A = I 1 + I 2 , B = 2√ (I 1 I 2 )
And I 1 and I 2 are double harmonic intensities, respectively. Here, A is a DC component (direct current component), and B is an amplitude intensity.

このようにして取得された干渉信号は、それぞれの2倍高調波で機械振動成分が同一のため、干渉したときに機械振動成分はキャンセルされ、干渉信号の位相にはプラズマによる位相変化のみが残ることになる。従って、このように得られた干渉信号に基づいて、線平均電子密度nを算出することができる。 The interference signals acquired in this way have the same mechanical vibration component at their respective second harmonics. Therefore, when the interference occurs, the mechanical vibration component is canceled and only the phase change due to the plasma remains in the phase of the interference signal. It will be. Therefore, based on the interference signal obtained in this way, it is possible to calculate the linear average electron density n e.

上記のディスパーション干渉計では、機械振動の影響が少ないため、大がかりな除振設備や他の波長の干渉計の併設が不要となる。又、短波長レーザの使用により、屈折変位量が小さくなる等の利点がある。   In the above-described dispersion interferometer, since the influence of mechanical vibration is small, it is not necessary to install a large-scale vibration isolation facility or an interferometer of another wavelength. Further, the use of a short wavelength laser has the advantage that the amount of refractive displacement is reduced.

しかし、位相差を精度良く抽出するためには、測定信号強度に比例する干渉信号中のDC成分のAと、振幅強度Bを精度良く評価する必要がある。このため、プラズマ120の放電終了後、位相物体(図示しない)を非線形結晶素子200,220間に挿入して、一周期以上の位相変化を与えて、A,Bを評価するが、屈折やレーザ出力変動によるプラズマ放電中の測定信号の変動やノイズの影響を除去できず、精度に問題がある。   However, in order to extract the phase difference with high accuracy, it is necessary to accurately evaluate the DC component A and the amplitude strength B in the interference signal proportional to the measurement signal strength. For this reason, after the discharge of the plasma 120 is completed, a phase object (not shown) is inserted between the nonlinear crystal elements 200 and 220 to give a phase change of one cycle or more, and A and B are evaluated. Measurement signal fluctuations during plasma discharge due to output fluctuations and the influence of noise cannot be removed, and there is a problem in accuracy.

そこで、特許文献1を改良した非特許文献1のディスパーション干渉計も提案されている。この非特許文献1でのディスパーション干渉計の位相抽出法について図4(b)を参照して説明する。なお、説明の便宜上、図4(a)と同一又は相当する構成については、同一符号を付す。   Therefore, a dispersion interferometer of Non-Patent Document 1 improved from Patent Document 1 has also been proposed. The phase extraction method of the dispersion interferometer in Non-Patent Document 1 will be described with reference to FIG. For the sake of convenience of explanation, the same or corresponding components as those in FIG.

例えば、波長9.57μmの炭酸ガスレーザを、タイプI(発生する2倍高調波の偏光方向が、基本波W1の偏光方向と直交するタイプ)の非線形結晶素子200(例えば、ZnGeP2)に通す。 For example, a carbon dioxide laser having a wavelength of 9.57 μm is passed through a nonlinear crystal element 200 (for example, ZnGeP 2 ) of type I (a type in which the polarization direction of the generated second harmonic is orthogonal to the polarization direction of the fundamental wave W1).

前記レーザ光(基本波W1)の一部は2倍高調波W2に変換され、該基本波W1と共に伝播する。
次に、駆動信号として角周波数ωの変調用高圧正弦波VEOM sin(ωt)を印加した電気光学素子250に前記基本波W1と2倍高調波W2を透過させる。この際、電気光学素子250に印加する電界と前記基本波W1の偏光方向が平行になるようにする。
A part of the laser beam (fundamental wave W1) is converted to a second harmonic W2 and propagates together with the fundamental wave W1.
Next, the fundamental wave W1 and the second harmonic W2 are transmitted through the electro-optic element 250 to which the modulation high-voltage sine wave V EOM sin (ω m t) having the angular frequency ω m is applied as the drive signal. At this time, the electric field applied to the electro-optic element 250 and the polarization direction of the fundamental wave W1 are made parallel.

上記のように2倍高調波W2を電気光学素子250に透過させることにより、2倍高調波W2の位相成分にのみ位相変調g・sin(ωt)が与えられる。なお、ここでは、g=πとなるように変調電圧を決めておく。 By transmitting the second harmonic W2 to the electro-optic element 250 as described above, the phase modulation g · sin (ω m t) is given only to the phase component of the second harmonic W2. Here, the modulation voltage is determined so that g = π.

上記のように2倍高調波成分に位相変調を付与したレーザ光、及び基本波のレーザ光を、測定対象であるプラズマ120に入射する。
プラズマ120中では、波長分散に応じた位相変化を受ける。
As described above, the laser beam obtained by applying phase modulation to the second harmonic component and the fundamental laser beam are incident on the plasma 120 to be measured.
In the plasma 120, it undergoes a phase change according to wavelength dispersion.

プラズマ透過後のレーザ光(基本波及び2倍高調波)を、再度非線形結晶素子220(例えば、ZnGeP2)に通し、基本波成分の一部を2倍高調波成分に変換する。
次に、2倍高調波成分のみを透過させる波長選択フィルタ230に前記レーザ光を通過させて、他の波長成分を除去する。
The laser light (fundamental wave and second harmonic) after plasma transmission is passed through the nonlinear crystal element 220 (for example, ZnGeP 2 ) again, and a part of the fundamental wave component is converted into a second harmonic component.
Next, the laser light is passed through a wavelength selection filter 230 that transmits only the second harmonic component, and other wavelength components are removed.

前記波長選択フィルタ230を透過した2倍高調波の干渉信号強度Udet Interference signal intensity U det of the second harmonic transmitted through the wavelength selection filter 230

Figure 2010107470
を、変調角周波数ωより十分速い周波数サンプリングで検出する。この干渉信号の位相成分には、プラズマ120の分散による位相変化
Figure 2010107470
And detected at a sufficiently fast frequency sampling than the modulation angular frequency omega m. The phase component of this interference signal has a phase change due to dispersion of the plasma 120.

Figure 2010107470
が含まれている。なお、干渉信号を以下では説明の便宜上、変調信号ということがある。
Figure 2010107470
It is included. In the following description, the interference signal may be referred to as a modulation signal for convenience of explanation.

そこで、電気光学素子250に印加している駆動信号を、干渉信号強度Udetの検出と同期して検出(サンプリング)する。
プラズマ放電終了後、検出したデータの解析を行う。
Therefore, the drive signal applied to the electro-optic element 250 is detected (sampled) in synchronization with the detection of the interference signal intensity U det .
After the plasma discharge is completed, the detected data is analyzed.

g=πとなるように変調電圧を決めているため、   Since the modulation voltage is determined so that g = π,

Figure 2010107470
は、一周期変化する。このため、I+I、2√(I)を、変調の1周期の間で一定だと仮定すれば、I+I、2√(I)が求められる。
Figure 2010107470
Changes for one cycle. Therefore, I 1 + I 2, 2√ the (I 1 I 2), assuming that it is constant during one period of the modulation, I 1 + I 2, 2√ (I 1 I 2) is obtained.

式(2)の干渉信号(変調信号)から、DC(直流)成分I+Iを差し引き、変調信号を振幅強度2√(I)で規格化した信号(以下、規格化信号という) A signal obtained by subtracting a DC (direct current) component I 1 + I 2 from the interference signal (modulated signal) in Expression (2) and normalizing the modulated signal with an amplitude intensity of 2√ (I 1 I 2 ) (hereinafter referred to as a normalized signal) )

Figure 2010107470
を得る。
Figure 2010107470
Get.

前述したように電気光学素子250に印加している駆動信号は、干渉信号強度Udetの検出と同期してサンプリングしているため、位相変調がゼロになる時間、すなわち、電気光学素子250への印加電圧がゼロになる時刻t As described above, since the drive signal applied to the electro-optical element 250 is sampled in synchronization with the detection of the interference signal intensity U det , the time when the phase modulation becomes zero, that is, the signal to the electro-optical element 250 is Time t 0 when applied voltage becomes zero

Figure 2010107470
を、このサンプリングしたデータから求める。
Figure 2010107470
Is obtained from the sampled data.

求めた時刻tにおいて、前記規格化信号から分散による位相変化を求める。 At time t 0 obtained, we obtain the phase change due to dispersion from the normalized signal.

Figure 2010107470
そして、上記式(7)により測定したいプラズマ120の線平均電子密度n
Figure 2010107470
Then, the line average plasma 120 to be measured by the above equation (7) the electron density n e

Figure 2010107470
を得る。
Figure 2010107470
Get.

図5(a)は、電気光学素子250に印加するsin(ωt)の時間的変化を示すグラフである。図5(b)は、干渉信号の時間的変化を示すグラフである。なお、図5(b)では、説明の便宜上、干渉信号の直流成分は除くとともに、−πsin(ωmt)の代わりにπsin(ωmt)を使用している。又、φは式(7)に相当するものである。 FIG. 5A is a graph showing a temporal change in sin (ω m t) applied to the electro-optic element 250. FIG. 5B is a graph showing a temporal change of the interference signal. In FIG. 5 (b), the convenience of description, in conjunction with the DC component is excluded of the interference signal, using πsin (ω m t) instead of -πsin (ω m t). Φ corresponds to the equation (7).

上記の位相変調型ディスパーション干渉計は、干渉信号中のA(=I+I)及び振幅強度B(=2√(I))をプラズマ放電中に評価でき、前述の特許文献1の干渉計よりも信号強度変化の影響を考慮できる利点がある。
米国特許第5642195号明細書 ピー・エイ・バグリイアンスキ(P.A.Bagryansky)他、「ディスパーション インターフェロメータ ベースド オン ア CO2 レーザ フォ テキサトール アンド バーニング プラズマ エクスプリメンツ(Dispersion interferometer based on a CO2 laser for TEXTOR and burning plasma experiments)」,Review of Scientific Instruments 77,053501(2006).
The above phase modulation type dispersion interferometer can evaluate A (= I 1 + I 2 ) and amplitude intensity B (= 2√ (I 1 I 2 )) in the interference signal during plasma discharge. There is an advantage that the influence of the signal intensity change can be taken into consideration than the interferometer of 1.
US Pat. No. 5,642,195 PA Bagryansky et al., “Dispersion interferometer based on a CO2 laser for TEXTOR and burning plasma experiments”, Review of Scientific Instruments 77, 053501 (2006).

しかし、非特許文献1の干渉計の場合、一周期2π/ωの間は振幅強度Bは変化しないという仮定に基づくため、高周波ノイズの影響は除去できない問題がある。又、信号処理が複雑となり、特に、実時間計測に適用する場合には処理回路の開発が必要となる。 However, if the interferometer in Non-Patent Document 1, during one period 2 [pi / omega m is because it is based on the assumption that the amplitude intensity B is not changed, the influence of high frequency noise is a problem that can not be removed. In addition, signal processing becomes complicated, and in particular, when it is applied to real-time measurement, it is necessary to develop a processing circuit.

本発明の目的は変調信号のフーリエ成分である基本波、2倍高調波の信号強度比から位相抽出を行うことにより、高周波ノイズの影響を無くすとともに信号強度変化による測定誤差を低減し高精度化することができ、実時間制御での利用が可能なディスパーション干渉計を提供することにある。   The object of the present invention is to extract the phase from the signal intensity ratio of the fundamental wave and the second harmonic wave, which is the Fourier component of the modulation signal, thereby eliminating the influence of high frequency noise and reducing the measurement error due to the change in signal intensity, thereby improving the accuracy. It is an object of the present invention to provide a dispersion interferometer that can be used in real-time control.

又、本発明の他の目的は、変調信号のフーリエ成分である基本波、2倍高調波の信号強度比から位相抽出を行うことにより、高周波ノイズの影響を無くすとともに信号強度変化による測定誤差を低減し高精度化することができ、実時間制御での利用が可能な被測定物の物理量の計測方法を提供することにある。   Another object of the present invention is to eliminate the influence of high-frequency noise and reduce measurement errors due to changes in signal intensity by extracting the phase from the signal intensity ratio of the fundamental wave and the second harmonic, which are the Fourier components of the modulation signal. An object of the present invention is to provide a method for measuring a physical quantity of an object to be measured that can be reduced and highly accurate and can be used in real-time control.

上記問題点を解決するために、請求項1に記載の発明は、基本波となる直線偏光のレーザ光を透過させて、一部のレーザ光を前記基本波と偏光方向が直交する第1の2倍高調波に変える第1非線形結晶素子と、位相変調を付与する駆動信号が印加されることにより、前記第1非線形結晶素子を介して入射した前記基本波と第1の2倍高調波のうちいずれか一方にのみ前記位相変調を発生させて、基本波及び第1の2倍高調波を共に被測定物に出射する位相変調手段と、前記被測定物を透過した基本波と第1の2倍高調波を入射して、前記基本波を該基本波と偏光方向が直交する第2の2倍高調波に変える第2非線形結晶素子と、前記第2非線形結晶素子を通過した第1の2倍高調波と第2の2倍高調波を選択的に透過させる波長選択フィルタと、前記波長選択フィルタを透過した第1の2倍高調波と第2の2倍高調波の干渉信号を取得する干渉信号取得手段と、前記干渉信号に含まれる前記被測定物による位相変化量に基づいて前記被測定物に関する物理量を計測する計測手段を備えたディスパーション干渉計において、前記計測手段は、前記干渉信号における変調角周波数の基本波と2倍高調波の強度比を求め、該強度比と、前記位相変化量に基づいて前記被測定物に関する物理量を算出することを特徴とするディスパーション干渉計を要旨とするものである。   In order to solve the above-mentioned problems, the invention according to claim 1 is configured to transmit a linearly polarized laser beam serving as a fundamental wave, and to transmit a part of the laser beam with a polarization direction orthogonal to the fundamental wave. By applying a first nonlinear crystal element to be converted to a second harmonic and a drive signal for applying phase modulation, the fundamental wave and the first second harmonic that have entered through the first nonlinear crystal element are applied. Phase modulation means for generating the phase modulation only in one of them and emitting both the fundamental wave and the first second harmonic to the object to be measured; the fundamental wave transmitted through the object to be measured; A second harmonic crystal element that receives a second harmonic wave and changes the fundamental wave into a second second harmonic wave whose polarization direction is orthogonal to the fundamental wave; and a first nonlinear crystal element that has passed through the second nonlinear crystal element. A wavelength selective filter that selectively transmits the second harmonic and the second harmonic. An interference signal acquisition means for acquiring an interference signal of the first second harmonic and the second second harmonic transmitted through the wavelength selection filter, and a phase change amount due to the object to be measured included in the interference signal. In the dispersion interferometer provided with a measurement means for measuring a physical quantity related to the object to be measured based on the intensity, the measurement means obtains an intensity ratio between the fundamental wave and the second harmonic of the modulation angular frequency in the interference signal, and the intensity A dispersion interferometer is characterized in that a physical quantity related to the object to be measured is calculated based on the ratio and the phase change amount.

請求項2の発明は、請求項1において、前記計測手段は、前記駆動信号に基づく参照信号に基づいて、前記干渉信号に含まれる、前記位相変調における基本波と2倍高調波の各振幅強度を算出し、両振幅強度に基づいて前記強度比を求めることを特徴とする。   According to a second aspect of the present invention, in the first aspect, the measuring means includes amplitudes of fundamental waves and second harmonics in the phase modulation, which are included in the interference signal, based on a reference signal based on the driving signal. And calculating the intensity ratio based on both amplitude intensities.

請求項3の発明は、請求項1又は請求項2において、前記位相変調手段が、光弾性素子又は電気光学素子であることを特徴とする。
請求項4の発明は、請求項1乃至請求項3のうちいずれか1項において、前記被測定物が、プラズマであり、前記物理量が、該プラズマの電子密度であることを特徴とする。
According to a third aspect of the present invention, in the first or second aspect, the phase modulation means is a photoelastic element or an electro-optical element.
According to a fourth aspect of the present invention, in any one of the first to third aspects, the object to be measured is a plasma, and the physical quantity is an electron density of the plasma.

請求項5の発明は、請求項1乃至請求項3のうちいずれか1項において、前記被測定物が、透過膜であり、前記物理量が、該透過膜の厚さであることを特徴とする。
請求項6の発明は、第1非線形結晶素子に対して、基本波となる直線偏光のレーザ光を透過させて、一部のレーザ光を前記基本波と偏光方向が直交する第1の2倍高調波に変える第1段階と、位相変調手段に対して、前記第1非線形結晶素子を通過した基本波と、前記第1の2倍高調波を入射して、位相変調を付与する駆動信号を印加することにより前記基本波と前記第1の2倍高調波のいずれか一方にのみ前記位相変調を発生させ、透過した基本波と第1の2倍高調波を被測定物に共に出射する第2段階と、第2非線形結晶素子に対して、前記被測定物を透過した基本波と第1の2倍高調波を入射して、前記基本波を該基本波と偏光方向が直交する第2の2倍高調波に変える第3段階と、波長選択フィルタにより、前記第2非線形結晶素子を通過した第1の2倍高調波と第2の2倍高調波を選択的に透過させる第4段階と、干渉信号取得手段により、前記波長選択フィルタを透過した第1の2倍高調波と第2の2倍高調波の干渉信号を取得する第5段階と、計測手段により、前記干渉信号に含まれる前記被測定物による位相変化量に基づいて前記被測定物に関する物理量を計測するに当たり、前記干渉信号における変調角周波数の基本波と2倍高調波の強度比を求め、該強度比と、前記位相変化量に基づいて前記被測定物に関する物理量を算出する第6段階を有することを特徴とする被測定物の物理量の計測方法を要旨とするものである。
According to a fifth aspect of the present invention, in any one of the first to third aspects, the object to be measured is a permeable membrane, and the physical quantity is a thickness of the permeable membrane. .
The invention according to claim 6 allows the first nonlinear crystal element to transmit linearly polarized laser light as a fundamental wave, and transmits a part of the laser light to the fundamental wave and the polarization direction orthogonal to the fundamental wave. A first signal to be converted into a harmonic, a fundamental signal that has passed through the first nonlinear crystal element, and a drive signal that imparts phase modulation to the phase modulation means by applying the first double harmonic; When applied, the phase modulation is generated only in one of the fundamental wave and the first second harmonic, and the transmitted fundamental wave and the first second harmonic are emitted together to the object to be measured. In a second step, a fundamental wave transmitted through the object to be measured and a first second harmonic wave are incident on the second nonlinear crystal element, and the fundamental wave is secondly polarized with a polarization direction orthogonal to the fundamental wave. The second nonlinear crystal element by a third step of changing to a second harmonic of the wavelength and a wavelength selective filter A fourth stage for selectively transmitting the first second harmonic and the second second harmonic that have passed, and the first second harmonic transmitted through the wavelength selection filter and the second harmonic by the interference signal acquisition means; In the fifth step of acquiring the interference signal of the second harmonic of 2 and the measurement means, when measuring the physical quantity related to the object to be measured based on the phase change amount by the object to be measured included in the interference signal, A sixth step of obtaining an intensity ratio between a fundamental wave and a second harmonic of a modulation angular frequency in an interference signal, and calculating a physical quantity related to the object to be measured based on the intensity ratio and the phase change amount; The gist of the method is to measure the physical quantity of an object to be measured.

請求項1の発明によれば、変調信号のフーリエ成分である基本波、2倍高調波の信号強度比から位相抽出を行うことにより、高周波ノイズの影響を無くすとともに信号強度変化による測定誤差を低減し高精度化することができ、実時間制御での利用が可能なディスパーション干渉計を提供できる。   According to the first aspect of the present invention, the phase extraction is performed from the signal intensity ratio of the fundamental wave and the second harmonic wave, which are the Fourier components of the modulation signal, thereby eliminating the influence of the high frequency noise and reducing the measurement error due to the signal intensity change. However, it is possible to provide a dispersion interferometer that can be highly accurate and can be used in real-time control.

請求項2の発明によれば、駆動信号を参照信号として該参照信号に基づいて、干渉信号に含まれる、変調角周波数の基本波と2倍高調波の各振幅強度を算出し、両振幅強度に基づいて前記強度比を求めることにより、容易に請求項1の効果を実現できる。   According to the second aspect of the present invention, the amplitude intensity of the fundamental wave and the second harmonic wave of the modulation angular frequency included in the interference signal is calculated based on the reference signal using the drive signal as a reference signal, and both amplitude intensities are calculated. By obtaining the intensity ratio based on the above, the effect of claim 1 can be easily realized.

請求項3の発明によれば、位相変調手段が、光弾性素子又は電気光学素子により構成されていることにより、請求項1又は請求項2の作用効果を容易に実現できる。
請求項4の発明によれば、被測定物であるプラズマの電子密度の計測において、信号強度変化による測定誤差を低減し高精度化することができ、実時間制御での利用が可能となる。
According to the third aspect of the invention, since the phase modulation means is constituted by a photoelastic element or an electro-optical element, the function and effect of the first or second aspect can be easily realized.
According to the fourth aspect of the present invention, in measuring the electron density of plasma, which is an object to be measured, the measurement error due to the change in signal intensity can be reduced and the accuracy can be improved, and it can be used in real-time control.

請求項5の発明によれば、透過膜の厚さの計測において、信号強度変化による測定誤差を低減し高精度化することができ、実時間制御での利用が可能となる。
請求項6の発明によれば、変調信号のフーリエ成分である基本波、2倍高調波の信号強度比から位相抽出を行うことにより、高周波ノイズの影響を無くすとともに信号強度変化による測定誤差を低減し高精度化することができ、実時間制御での利用が可能な被測定物の物理量の計測方法を提供できる。
According to the invention of claim 5, in the measurement of the thickness of the permeable membrane, the measurement error due to the change in signal intensity can be reduced and the accuracy can be increased, and it can be used in real-time control.
According to the invention of claim 6, by extracting the phase from the signal intensity ratio of the fundamental wave and the second harmonic wave which are the Fourier components of the modulation signal, the influence of the high frequency noise is eliminated and the measurement error due to the signal intensity change is reduced. However, it is possible to provide a method for measuring a physical quantity of an object to be measured that can be highly accurate and can be used in real-time control.

以下、本発明をプラズマの線平均電子密度を計測するためのディスパーション干渉計及び計測方法に具体化した一実施形態を図1を参照して説明する。
ディスパーション干渉計は、第1非線形結晶素子としての非線形結晶素子10、位相変調手段としての光弾性素子12、第2非線形結晶素子としての非線形結晶素子14、波長選択フィルタ16、検出器18、ドライバ20、ロックインアンプ22,24、ディジタル回路26、及びディジタルスコープ28とを備えている。前記検出器18は干渉信号取得手段に相当する。
Hereinafter, an embodiment in which the present invention is embodied in a dispersion interferometer and a measurement method for measuring the line average electron density of plasma will be described with reference to FIG.
The dispersion interferometer includes a nonlinear crystal element 10 as a first nonlinear crystal element, a photoelastic element 12 as a phase modulation means, a nonlinear crystal element 14 as a second nonlinear crystal element, a wavelength selective filter 16, a detector 18, and a driver. 20, lock-in amplifiers 22 and 24, a digital circuit 26, and a digital scope 28. The detector 18 corresponds to interference signal acquisition means.

前記ロックインアンプ22,24、及びディジタル回路26により計測手段が構成されている。ロックインアンプ22,24は市販(例えば、(株)エヌエフ回路設計ブロック製)のものを採用することができる。なお、ドライバ20は、任意の波長及び後述する最大光学遅延量ρの設定を行うことができ、波長と最大光学遅延量ρとが入力されると、それに対応した駆動信号(すなわち電圧値)が決定され、光弾性素子12に印加する。 The lock-in amplifiers 22 and 24 and the digital circuit 26 constitute measuring means. As the lock-in amplifiers 22 and 24, commercially available ones (for example, manufactured by NF Circuit Design Block Co., Ltd.) can be used. The driver 20 can set an arbitrary wavelength and a maximum optical delay amount ρ 0 described later. When the wavelength and the maximum optical delay amount ρ 0 are input, a driver signal (that is, a voltage value) corresponding thereto is input. ) Is determined and applied to the photoelastic element 12.

又、光源には、直線偏光の炭酸ガスレーザ、若しくはNd:YAGレーザ(ネオジウム・ヤグレーザ)を用いるが、これらのレーザに限定されるものではない。前記非線形結晶素子10,14は、発生する2倍高調波W2の偏光方向が、基本波W1の偏光方向と直交するタイプIのものが好ましい。タイプIの非線形結晶素子としては、例えば、ZnGeP2を挙げることができるが、限定されるものではない。 As the light source, a linearly polarized carbon dioxide laser or an Nd: YAG laser (neodymium / yag laser) is used, but it is not limited to these lasers. The nonlinear crystal elements 10 and 14 are preferably of type I in which the polarization direction of the generated second harmonic W2 is orthogonal to the polarization direction of the fundamental wave W1. Examples of type I nonlinear crystal elements include, but are not limited to, ZnGeP 2 .

上記のように構成されたディスパーション干渉計の作用を図1を参照して説明する。
光源から、例えば炭酸ガスレーザ光を非線形結晶素子10に入射する。非線形結晶素子10により、レーザ光(角周波数ωを有する基本波W1)の一部は2倍高調波W2に変換され、該基本波W1と2倍高調波W2は、光弾性素子12に入射する。ここでの2倍高調波は第1の2倍高調波に相当する。なお、前記光弾性素子12に印加する駆動信号に基づく応力の方向は、基本波の偏光方向と平行になるように配置されているものとする。
The operation of the dispersion interferometer configured as described above will be described with reference to FIG.
For example, carbon dioxide laser light is incident on the nonlinear crystal element 10 from the light source. The nonlinear crystal element 10 converts part of the laser light (fundamental wave W1 having an angular frequency ω) into the second harmonic W2, and the fundamental wave W1 and the second harmonic W2 enter the photoelastic element 12. . The second harmonic here corresponds to the first second harmonic. The stress direction based on the drive signal applied to the photoelastic element 12 is arranged to be parallel to the polarization direction of the fundamental wave.

光弾性素子12では、ドライバ20により、駆動信号が印加され、この駆動信号により、基本波W1の位相成分にのみ位相変調ρ=ρ・sin(ωt)を加える。なお、ρは最大光学遅延量、ωは前記駆動信号による変調角周波数、すなわち、光弾性素子12の駆動角周波数である。 In the photoelastic element 12, a drive signal is applied by the driver 20, and phase modulation ρ = ρ 0 · sin (ω m t) is applied only to the phase component of the fundamental wave W 1 by this drive signal. Here, ρ 0 is the maximum optical delay amount, and ω m is the modulation angular frequency by the drive signal, that is, the drive angular frequency of the photoelastic element 12.

上記のように基本波W1の位相成分に位相変調ρ・sin(ωt)が付与されたレーザ光、及び2倍高調波W2のレーザ光を、測定対象であるプラズマ30に入射する。プラズマ30中では、波長に応じた伝播速度をもつ(すなわち、分散(dispersion)の)ため、プラズマ透過後のレーザ光のそれぞれの波長成分の間には、波長分散に応じた位相の相違が生ずる。具体的には、図1に示すように基本波W1はプラズマ30によりcL/ωの位相変化を受け、2倍高調波W2は、プラズマ30によりcL/2ωの位相変化を受ける。nはプラズマ120の線平均電子密度、Lはプラズマ中での光路長、cは定数である。 As described above, the laser light in which the phase modulation ρ 0 · sin (ω m t) is added to the phase component of the fundamental wave W1 and the laser light of the second harmonic W2 are incident on the plasma 30 to be measured. Since the plasma 30 has a propagation velocity corresponding to the wavelength (that is, dispersion), a phase difference corresponding to the wavelength dispersion occurs between the wavelength components of the laser light after passing through the plasma. . Specifically, as shown in FIG. 1, the fundamental wave W < b > 1 is subjected to a phase change of c p ne L / ω by the plasma 30, and the double harmonic W < b > 2 is phased by c p ne e L / 2ω by the plasma 30. Undergo change. ne is the linear average electron density of the plasma 120, L is the optical path length in the plasma, and cp is a constant.

プラズマ透過後のレーザ光(基本波及び2倍高調波)は、非線形結晶素子14を透過し、このとき基本波成分の一部が2倍高調波成分に変換される。ここで、基本波W1から2倍高調波W2となる高調波は第2の2倍高調波に相当する。なお、プラズマ30を透過した2倍高調波成分から4倍高調波が発生するが、変換効率の観点からその変化は無視できる。次に、2倍高調波成分のみを透過する波長選択フィルタ16に前記レーザ光が通過して、他の波長成分が除去され、波長選択フィルタ16を透過した2倍高調波成分は干渉し、その干渉信号強度Iを検出器18で検出する。   The laser light (fundamental wave and second harmonic) after passing through the plasma passes through the nonlinear crystal element 14, and at this time, a part of the fundamental wave component is converted into a second harmonic component. Here, the harmonic that becomes the second harmonic W2 from the fundamental wave W1 corresponds to the second harmonic. In addition, although a 4th harmonic is generated from the 2nd harmonic component which permeate | transmitted the plasma 30, the change can be disregarded from a viewpoint of conversion efficiency. Next, the laser light passes through the wavelength selection filter 16 that transmits only the second harmonic component, other wavelength components are removed, and the second harmonic component transmitted through the wavelength selection filter 16 interferes, The interference signal intensity I is detected by the detector 18.

検出器18で取得された干渉信号は、式(9)となる。   The interference signal acquired by the detector 18 is expressed by Equation (9).

Figure 2010107470
ここで、式(9)中、
A=I+I、B=2√(I
であり、I,Iはそれぞれ2倍高調波強度である。AはDC成分(直流成分)であり、Bは振幅強度である。又、nはプラズマ120の線平均電子密度、cは定数である。Lはプラズマ120中でレーザ光の光路長であり、既知のものである。
Figure 2010107470
Here, in formula (9),
A = I 1 + I 2 , B = 2√ (I 1 I 2 )
And I 1 and I 2 are double harmonic intensities, respectively. A is a DC component (direct current component), and B is an amplitude intensity. Further, n e is the linear average electron density of the plasma 120, the c p is a constant. L is the optical path length of the laser beam in the plasma 120 and is known.

なお、干渉信号の位相成分は、下記の通りとなって算出される。
2(ωt+ρsin(ωmt)+ωΔd/c+cpneL/ω) −(2ωt+2ωΔd/c+cpneL/2ω)
=2ρsin(ωmt) +(3/2) cpneL/ω
上記式中、左辺の第1項の括弧内は、非線形結晶素子14で2倍高調波W2となった基本波W1の位相成分であり、この中には、機械振動による位相変化分ωΔd/cが含まれる。又、第2項は、非線形結晶素子10で2倍高調波となった2倍高調波の位相成分であり、機械振動による位相変化分2ωΔd/cが含まれる。なお、式中、cは光速である。
The phase component of the interference signal is calculated as follows.
2 (ωt + ρ 0 sin (ω m t) + ωΔd / c + c p n e L / ω) − (2ωt + 2ωΔd / c + c p n e L / 2ω)
= 2ρ 0 sin (ω m t) + (3/2) c p n e L / ω
In the above formula, the parenthesis in the first term on the left side is the phase component of the fundamental wave W1 that has become the second harmonic W2 in the nonlinear crystal element 14, and includes the phase change ωΔd / c due to mechanical vibration. Is included. The second term is the phase component of the second harmonic that has become the second harmonic in the nonlinear crystal element 10, and includes a phase change 2ωΔd / c due to mechanical vibration. In the formula, c is the speed of light.

上記のようにして、非線形結晶素子10で発生した2倍高調波W2は、基本波W1と同じ光路となるため、基本波W1と同じ機械振動Δdを受けることになる。具体的には、図1に示すように基本波W1はωΔd/cの位相変化を受け、2倍高調波W2は、2ωΔd/cの位相変化を受ける。しかし、干渉信号では、基本波W1における機械振動ΔdによるωΔd/cの位相変化は非線形結晶素子14で2倍高調波に変換すると位相変化は2倍になるので、2倍高調波W2における機械振動Δdによる2ωΔd/cの位相変化は除去される。   As described above, the second harmonic W2 generated in the nonlinear crystal element 10 has the same optical path as the fundamental wave W1, and therefore receives the same mechanical vibration Δd as that of the fundamental wave W1. Specifically, as shown in FIG. 1, the fundamental wave W1 undergoes a phase change of ωΔd / c, and the double harmonic W2 undergoes a phase change of 2ωΔd / c. However, in the interference signal, the phase change of ωΔd / c due to the mechanical vibration Δd in the fundamental wave W1 is doubled when converted to the second harmonic by the nonlinear crystal element 14, so the mechanical vibration in the second harmonic W2 The phase change of 2ωΔd / c due to Δd is eliminated.

なお、干渉信号の位相成分は、プラズマ30の分散による位相変化量(3/2)(cpneL/ω)が含まれており、干渉信号は加法定理により、下記式(10)の通りとなる。 The phase component of the interference signal, phase variation due to the dispersion of the plasma 30 (3/2) (c p n e L / ω) are included, the interference signal is an addition theorem, the following equation (10) It becomes street.

Figure 2010107470
ここで、cos{2ρsin(ωmt)}、sin{2ρsin(ωmt)}は、第n次の第一種ベッセル関数Jnを用いて、
Figure 2010107470
Here, cos {2ρ 0 sin (ω m t)} and sin {2ρ 0 sin (ω m t)} are expressed using the nth-order first-order Bessel function Jn,

Figure 2010107470
Figure 2010107470

Figure 2010107470
と展開することができる。すなわち、干渉信号Iはωmの高調波成分の和(級数)と見なせる。そこで、ωm、2ωmの角周波数成分に注目し、それらの振幅強度I(ωm)、I(2ωm)とすると、
Figure 2010107470
And can be expanded. That is, the interference signal I can be regarded as the sum (series) of harmonic components of ω m . Therefore, omega m, paying attention to the angular frequency components of 2 [omega m, their amplitude intensity I (ω m), When I (2ω m),

Figure 2010107470
Figure 2010107470

Figure 2010107470
となる。なお、Jは一次のベッセル関数であり、Jは二次のベッセル関数である。
Figure 2010107470
It becomes. J 1 is a primary Bessel function, and J 2 is a secondary Bessel function.

そこで、上記のように検出された干渉信号と、ドライバ20の駆動信号に基づいてロックインアンプ22は、変調角周波数ωにおける基本波の振幅強度I(ω)を算出する。具体的には、ロックインアンプ22は、ドライバ20から入力した変調角周波数ωで変調させた駆動信号に基づくsin(ωt)のモニタ信号と、干渉信号に基づいて、上記式(13)で表わされる振幅強度I(ω)を算出する。 Therefore, the lock-in amplifier 22 calculates the amplitude intensity I (ω m ) of the fundamental wave at the modulation angular frequency ω m based on the interference signal detected as described above and the drive signal of the driver 20. Specifically, the lock-in amplifier 22 uses the above equation (13) based on the monitor signal of sin (ω mt ) based on the drive signal modulated with the modulation angular frequency ω m input from the driver 20 and the interference signal. The amplitude intensity I (ω m ) represented by

又、ロックインアンプ24は、ドライバ20から入力した変調角周波数ωで変調させた駆動信号に基づくsin(ωt)の信号を入力するが、この場合は、ロックインアンプ24の高調波測定モードを利用し、入力参照信号の2倍の高調波を参照信号とし、この参照信号と、干渉信号に基づいて、上記式(14)で表わされる振幅強度I(2ω)を算出する。 The lock-in amplifier 24 inputs a sin (ω mt ) signal based on the drive signal modulated at the modulation angular frequency ω m input from the driver 20. In this case, the lock-in amplifier 24 uses harmonics of the lock-in amplifier 24. Using the measurement mode, the harmonic twice as high as the input reference signal is used as a reference signal, and the amplitude intensity I (2ω m ) expressed by the above equation (14) is calculated based on this reference signal and the interference signal.

ロックインアンプ22,24で算出(すなわち、測定)した振幅強度I(ω)、I(2ω)に基づいて、両者の比のアークタンジェントを計算するディジタル回路26に入力する。 Based on the amplitude intensities I (ω m ) and I (2ω m ) calculated (that is, measured) by the lock-in amplifiers 22 and 24, the arc tangent of the ratio between the two is input to the digital circuit 26.

Figure 2010107470
さらに、J(2ρ)=J(2ρ)とするために、光弾性素子12の最大光学遅延量ρを1.3rad.に設定する。なお、この設定は、前記ベッセル関数の説明のために、ここで説明しているが、実計測の場合は、この計測を開始する際に、ドライバ20により光弾性素子12の最大光学遅延量ρを1.3rad.に設定するものとする。
Figure 2010107470
Further, in order to set J 1 (2ρ 0 ) = J 2 (2ρ 0 ), the maximum optical delay amount ρ 0 of the photoelastic element 12 is set to 1.3 rad. Set to. This setting is described here for the purpose of describing the Bessel function. However, in the case of actual measurement, the maximum optical delay amount ρ of the photoelastic element 12 by the driver 20 when starting this measurement. 0 to 1.3 rad. Shall be set to

なお、本実施形態では、レーザ光の基本波W1に位相変調ρ=ρ・sin(ωt)を加えるようにしたが、前記光弾性素子12により2倍高調波W2に位相変調ρを加えるようにしてもよい。この場合、前記光弾性素子12に印加する駆動信号に基づく応力の方向は、2倍高調波W2の偏光方向と平行になるように配置するものとする。又、干渉信号は、 In this embodiment, phase modulation ρ = ρ 0 · sin (ω m t) is added to the fundamental wave W1 of the laser beam. However, the phase modulation ρ is applied to the second harmonic W2 by the photoelastic element 12. You may make it add. In this case, the stress direction based on the drive signal applied to the photoelastic element 12 is arranged to be parallel to the polarization direction of the second harmonic W2. The interference signal is

Figure 2010107470
となる。この場合、前記式(9)〜式(15)において、2ρを−ρと入れ替えればよい。又、J(ρ)=J(ρ)とするために、光弾性素子12の最大光学遅延量ρを2.6rad.とする。
Figure 2010107470
It becomes. In this case, in the formula (9) to (15), it may be interchanged to 2.rho 0 and -ρ 0. Further, in order to set J 10 ) = J 20 ), the maximum optical delay amount ρ 0 of the photoelastic element 12 is set to 2.6 rad. And

話を元に戻して、上記の設定により、ディジタル回路26の計算結果である出力信号は、下式(17)で表わされ、   Returning to the original, with the above setting, the output signal as the calculation result of the digital circuit 26 is expressed by the following equation (17):

Figure 2010107470
となる。
Figure 2010107470
It becomes.

このディジタル回路26は、さらに、この式(17)に基づいて、下式(18)にてプラズマ30の線平均電子密度nを算出する。 The digital circuit 26 is further based on the equation (17), for calculating the line average electron density n e of the plasma 30 using the following equation (18).

Figure 2010107470
ここで、式(18)から分かるように、測定された線平均電子密度nは、DC成分A及び振幅強度Bに関するものがなく、DC成分A及び振幅強度Bの変動の影響を受けることがない。
Figure 2010107470
Here, as can be seen from the equation (18), the measured line average electron density ne is not related to the DC component A and the amplitude intensity B, and may be affected by fluctuations in the DC component A and the amplitude intensity B. Absent.

なお、上記の説明では、実際には第1、第2の2倍高調波成分の位相には初期値である初期位相φ、φ’が付与されるが、説明の便宜上、省略している。又、式(9)であらわされる干渉信号の位相成分では、実際には初期値成分φ−φ’が付加されている。この初期値成分は、例えばプラズマ30が生じていない状態では、同じ光路で測定することにより、測定できるため、この値に基づいて線平均電子密度を正確に算出する。なお、前記初期位相の算出は、前記方法に限定されるものではない。   In the above description, the initial phases φ and φ ′, which are initial values, are actually given to the phases of the first and second second harmonic components, but are omitted for convenience of description. In addition, the initial value component φ−φ ′ is actually added to the phase component of the interference signal expressed by Equation (9). Since this initial value component can be measured by, for example, measurement in the same optical path in the state where the plasma 30 is not generated, the line average electron density is accurately calculated based on this value. The calculation of the initial phase is not limited to the above method.

さて、上記のように構成されたディスパーション干渉計及び計測方法は下記の特徴がある。
(1) 本実施形態のディスパーション干渉計は、直線偏光のレーザ光を透過させて、基本波W1の一部を基本波W1の偏光方向と直交する2倍高調波W2に変える非線形結晶素子10(第1非線形結晶素子)を有する。又、該干渉計は、前記基本波W1に変調角周波数ω分の位相変調を発生させ、透過した2倍高調波W2と位相変調した基本波W1をプラズマ30(被測定物)に出射する光弾性素子12(位相変調手段)を備える。又、該干渉計は、プラズマ30を透過した基本波W1と2倍高調波W2を入射し、入射した基本波W1を該基本波W1と偏光方向が直交する2倍高調波W2に変え、入射した2倍高調波W2と、ここで基本波W1の一部を2倍高調波に変えて該2倍高調波を出射する非線形結晶素子14(第2非線形結晶素子)を備える。又、該干渉計は、非線形結晶素子14から出射された2倍高調波W2を選択的に透過させる波長選択フィルタ16を備える。
The dispersion interferometer and measurement method configured as described above have the following characteristics.
(1) The dispersion interferometer of the present embodiment transmits a linearly polarized laser beam and changes a part of the fundamental wave W1 to a second harmonic wave W2 orthogonal to the polarization direction of the fundamental wave W1. (First nonlinear crystal element). Further, the interferometer generates phase modulation corresponding to the modulation angular frequency ω m on the fundamental wave W1, and emits the transmitted second harmonic W2 and the phase-modulated fundamental wave W1 to the plasma 30 (measurement object). A photoelastic element 12 (phase modulation means) is provided. The interferometer receives the fundamental wave W1 transmitted through the plasma 30 and the second harmonic W2, and changes the incident fundamental wave W1 to the second harmonic W2 whose polarization direction is orthogonal to the fundamental wave W1. The second harmonic W2 and the nonlinear crystal element 14 (second nonlinear crystal element) that emits the second harmonic by changing a part of the fundamental wave W1 to the second harmonic here. The interferometer further includes a wavelength selection filter 16 that selectively transmits the second harmonic W2 emitted from the nonlinear crystal element 14.

又、干渉計は、検出器18、ロックインアンプ22、24、及びディジタル回路26、からなる計測手段を備え、前記干渉信号における変調角周波数の基本波と2倍高調波の強度比を求め、該強度比と、前記位相変化量(3/2)(cpneL/ω)に基づいて、プラズマ30の物理量である線平均電子密度nを算出するようにした。そして、測定された線平均電子密度nは、DC成分A及び振幅強度Bに関するものがなく、DC成分A及び振幅強度Bの変動の影響を受けることがない。 The interferometer includes measuring means including a detector 18, lock-in amplifiers 22 and 24, and a digital circuit 26, and obtains the intensity ratio of the fundamental wave and the second harmonic of the modulation angular frequency in the interference signal, and said intensity ratio, on the basis of the phase variation amount (3/2) (c p n e L / ω), and calculate the linear average electron density n e is the physical quantity of the plasma 30. The measured line average electron density ne is not related to the DC component A and the amplitude intensity B, and is not affected by variations in the DC component A and the amplitude intensity B.

この結果、干渉信号(変調信号)のフーリエ成分である基本波、2倍高調波に着目し、その信号強度比から位相抽出を行うことにより、高周波ノイズの影響を無くすとともに信号強度変化による測定誤差を低減し高精度化することができ、実時間制御での利用が可能となるとともに、機械振動による成分は自己補正できる。   As a result, focusing on the fundamental and double harmonics that are the Fourier components of the interference signal (modulated signal), and extracting the phase from the signal intensity ratio, the influence of high-frequency noise is eliminated and measurement error due to signal intensity changes. The accuracy can be reduced and the system can be used in real-time control, and the component caused by mechanical vibration can be self-corrected.

(2) 本実施形態のディスパーション干渉計では、光弾性素子12に印加するドライバ20の駆動信号に基づく参照信号に基づいて、干渉信号に含まれる、変調角周波数ωにおける基本波と2倍高調波の各振幅強度I(ω)、I(2ω)を算出し、両振幅強度に基づいて前記強度比を求めることにより、容易に上記(1)の効果を実現できる。 (2) In the dispersion interferometer of the present embodiment, based on the reference signal based on the drive signal of the driver 20 applied to the photoelastic element 12, the fundamental wave at the modulation angular frequency ω m included in the interference signal is doubled. By calculating the amplitude amplitudes I (ω m ) and I (2ω m ) of the harmonics and obtaining the intensity ratio based on both amplitude intensities, the effect (1) can be easily realized.

(3) 本実施形態のディスパーション干渉計では、位相変調手段が光弾性素子12により構成されていることにより、上記(1)及び(2)の作用効果を容易に実現できる。
(4) 本実施形態のディスパーション干渉計では、被測定物であるプラズマ30の電子密度の計測において、信号強度変化による測定誤差を低減し高精度化することができ、実時間制御での利用が可能となる。
(3) In the dispersion interferometer of the present embodiment, since the phase modulation means is constituted by the photoelastic element 12, the above-described effects (1) and (2) can be easily realized.
(4) In the dispersion interferometer of the present embodiment, in the measurement of the electron density of the plasma 30 that is the object to be measured, the measurement error due to the change in signal intensity can be reduced and the accuracy can be increased, and it can be used for real time control Is possible.

(5) 又、本実施形態では、計測手段には市販のロックインアンプ22,24を使用するようにした。この結果、信号処理系も市販の機器を組合わせるだけの簡素なシステムにできる。   (5) In this embodiment, commercially available lock-in amplifiers 22 and 24 are used as the measuring means. As a result, the signal processing system can also be a simple system that combines commercially available devices.

(6) 本実施形態の計測方法では、第1段階では非線形結晶素子10(第1非線形結晶素子)に対して、基本波となる直線偏光のレーザ光を透過させて、一部のレーザ光を前記基本波と偏光方向が直交する第1の2倍高調波W2に変える。又、第2段階としては、光弾性素子12(位相変調手段)に対し、非線形結晶素子10を通過した基本波W1と、前記2倍高調波W2を入射して変調角周波数ωを付与する駆動信号を印加することにより基本波W1に変調角周波数ω分の位相変調を発生させ、透過した2倍高調波W2と位相変調した前記基本波W1をプラズマ30に出射する。又、第3段階として、非線形結晶素子14(第2非線形結晶素子)に対して、プラズマ30を透過した基本波W1と前記2倍高調波W2を入射して、基本波W1を該基本波と偏光方向が直交する第2の2倍高調波に変える。第4段階として、波長選択フィルタ16により、非線形結晶素子14を通過した第1の2倍高調波W2と第2の2倍高調波W2を選択的に透過させる。第5段階として、検出器18(干渉信号取得手段)により、波長選択フィルタ16を透過した第1の2倍高調波W2と第2の2倍高調波W2の干渉信号を取得する。そして、第6段階として、ロックインアンプ22,24及びディジタル回路26(計測手段)により、干渉信号に含まれるプラズマ30による位相変化量(3/2)(cpneL/ω)に基づいてプラズマ30の線平均電子密度nを計測する。この場合、干渉信号における変調角周波数ωの基本波と2倍高調波の強度比を求め、該強度比と、位相変化量に基づいてプラズマ30の線平均電子密度nを算出する。 (6) In the measurement method of the present embodiment, in the first stage, a linearly polarized laser beam as a fundamental wave is transmitted to the nonlinear crystal element 10 (first nonlinear crystal element), and a part of the laser beam is transmitted. The fundamental wave and the polarization direction are changed to a first second harmonic W2 that is orthogonal. As a second step, the fundamental wave W1 that has passed through the nonlinear crystal element 10 and the second harmonic W2 are incident on the photoelastic element 12 (phase modulation means) to give a modulation angular frequency ω m . drive signal fundamental wave W1 to generate a phase modulation of the modulation angular frequency omega m min to by applying, to emit the fundamental wave W1 which 2-fold higher harmonic W2 phase modulated transmitted to the plasma 30. As a third stage, the fundamental wave W1 transmitted through the plasma 30 and the second harmonic W2 are incident on the nonlinear crystal element 14 (second nonlinear crystal element), and the fundamental wave W1 is converted into the fundamental wave. The polarization direction is changed to the second second harmonic. As a fourth step, the wavelength selective filter 16 selectively transmits the first second harmonic W2 and the second second harmonic W2 that have passed through the nonlinear crystal element 14. As a fifth stage, the interference signal of the first second harmonic W2 and the second second harmonic W2 transmitted through the wavelength selection filter 16 is acquired by the detector 18 (interference signal acquisition means). Then, as the sixth step, the lock-in amplifier 22, 24 and digital circuitry 26 (measuring means), based on a phase change amount due to the plasma 30 contained in the interference signal (3/2) (c p n e L / ω) Te measures the linear average electron density n e of the plasma 30. In this case, determine the fundamental wave and the second harmonic intensity ratio of the modulation angular frequency omega m of the interference signal, calculates the said intensity ratio, the line average electron density n e of the plasma 30 on the basis of the phase variation.

この結果、測定された線平均電子密度nは、DC成分A及び振幅強度Bに関するものがなく、DC成分A及び振幅強度Bの変動の影響を受けることがない。この結果、干渉信号(変調信号)のフーリエ成分である基本波、2倍高調波に着目し、その信号強度比から位相抽出を行うことにより、高周波ノイズの影響を無くすとともに信号強度変化による測定誤差を低減し高精度化することができ、実時間制御での利用が可能となる。 As a result, the measured line average electron density ne is not related to the DC component A and the amplitude intensity B, and is not affected by variations in the DC component A and the amplitude intensity B. As a result, focusing on the fundamental and double harmonics that are the Fourier components of the interference signal (modulated signal), and extracting the phase from the signal intensity ratio, the influence of high-frequency noise is eliminated and measurement error due to signal intensity changes. Can be reduced and the accuracy can be improved, and real-time control can be used.

(他の実施形態)
次に透過膜の厚さ計測が可能なディスパーション干渉計に具体化した実施形態を図2を参照して説明する。なお、前記実施形態と同一又は相当する構成については、同一符号を付してその詳細な説明を省略し、異なる構成を中心に説明する。
(Other embodiments)
Next, an embodiment embodied in a dispersion interferometer capable of measuring the thickness of the permeable membrane will be described with reference to FIG. In addition, about the structure which is the same as that of the said embodiment, or equivalent, the same code | symbol is attached | subjected, the detailed description is abbreviate | omitted, and it demonstrates centering on a different structure.

本実施形態では、厚さd、屈折率Nの透過膜52が基板50上に生成されたものを対象とし、その厚さdを計測するものである。ここで透過膜52の屈折は、波長分散を持つ。なお、基本波・2倍高調波に対する屈折率N(ω)、N(2ω)は既知であるものとする。又、基板50は、レーザ光に対して高い反射率を持つものとし、レーザ光の透過膜への入射角は限定するものではないが、本実施形態では、45度で入射するものとする。本実施形態の光学系は、前記実施形態のプラズマの密度計測の場合と同一であり、測定対象のプラズマ30の代わりに真空蒸着装置40内に収納された透過膜52を有した基板50と入れ替わるところが前記実施形態と異なっている。なお、図2において、真空蒸着装置40のケースには、後述する基本波W1、2倍高調波W2の光路上に透明部材からなる窓40aが設けられている。   In this embodiment, the thickness d and the refractive index N of the transmission film 52 generated on the substrate 50 are targeted, and the thickness d is measured. Here, the refraction of the transmission film 52 has wavelength dispersion. It is assumed that the refractive indexes N (ω) and N (2ω) for the fundamental wave and the second harmonic are known. Further, the substrate 50 has a high reflectivity with respect to the laser beam, and the incident angle of the laser beam to the transmission film is not limited, but in this embodiment, it is incident at 45 degrees. The optical system of this embodiment is the same as that in the case of the plasma density measurement of the above-described embodiment, and is replaced with a substrate 50 having a transmissive film 52 housed in a vacuum deposition apparatus 40 instead of the plasma 30 to be measured. However, this is different from the above embodiment. In FIG. 2, the case of the vacuum deposition apparatus 40 is provided with a window 40 a made of a transparent member on the optical path of the fundamental wave W <b> 1 and the second harmonic W <b> 2 described later.

ここで、光源から基本波W1が非線形結晶素子10に入射すると、前記実施形態と同様に非線形結晶素子10から入射した基本波W1の位相は光弾性素子12により変調角周波数ωで変調する。又、非線形結晶素子10で発生した2倍高調波W2は、基本波W1と同じ光路となるため、基本波W1と同じ機械振動Δdを受けることになる。具体的には、図2に示すように基本波W1はωΔd/cの位相変化を受け、2倍高調波W2は、2ωΔd/cの位相変化を受ける。 Here, the fundamental wave W1 from the light source is incident on the nonlinear crystal element 10, the embodiment as well as the phase of the non-linear crystal device fundamental wave W1 entering from 10 modulates at a modulation angular frequency omega m by photoelastic element 12. Further, since the second harmonic W2 generated in the nonlinear crystal element 10 has the same optical path as the fundamental wave W1, it receives the same mechanical vibration Δd as the fundamental wave W1. Specifically, as shown in FIG. 2, the fundamental wave W1 undergoes a phase change of ωΔd / c, and the double harmonic W2 undergoes a phase change of 2ωΔd / c.

透過膜52に前記基本波W1,2倍高調波W2が入射すると、その中での光路長は2√(2)dのため、透過膜52中で生じる位相変化は、基本波W1,2倍高調波W2でそれぞれ2√(2)dωN(ω)/c、4√(2)dωN(2ω)/cとなる。基本波W1,2倍高調波W2を透過膜52に透過した後、再び非線形結晶素子14に通して前記実施形態と同様に基本波成分より2倍高調波W2を発生させる。そして、波長選択フィルタ16により、2倍高調波W2のみを選択して、検出器18により2つの2倍高調波W2の干渉信号を取得する。   When the fundamental wave W1 and the second harmonic W2 are incident on the transmission film 52, the optical path length in the fundamental wave W2 is 2√ (2) d. The harmonics W2 become 2√ (2) dωN (ω) / c, 4√ (2) dωN (2ω) / c, respectively. After the fundamental wave W1 and the second harmonic wave W2 are transmitted through the transmission film 52, the second harmonic wave W2 is generated from the fundamental wave component again through the nonlinear crystal element 14 as in the above embodiment. Then, only the second harmonic W2 is selected by the wavelength selection filter 16, and two interference signals of the second harmonic W2 are acquired by the detector 18.

ここで、2つの2倍高調波W2成分の干渉信号の位相は、   Here, the phase of the interference signal of the two second harmonic W2 components is

Figure 2010107470
となる。
Figure 2010107470
It becomes.

これを前記実施形態のプラズマ計測と同様に、干渉信号と、ドライバ20の駆動信号に基づいてロックインアンプ22は、変調角周波数ωにおける基本波の振幅強度I(ω)を算出する。又、ロックインアンプ24は、ドライバ20から入力した変調角周波数ωで変調させた駆動信号に基づくsin(ωt)の信号を入力するが、この場合は、ロックインアンプ24の高調波測定モードを利用し、入力参照信号の2倍の高調波を参照信号とし、この参照信号と、干渉信号に基づいて、振幅強度I(2ω)を算出する。 Similarly to the plasma measurement of the above embodiment, the lock-in amplifier 22 calculates the amplitude intensity I (ω m ) of the fundamental wave at the modulation angular frequency ω m based on the interference signal and the drive signal of the driver 20. The lock-in amplifier 24 inputs a sin (ω m t) signal based on the drive signal modulated with the modulation angular frequency ω m input from the driver 20. In this case, the lock-in amplifier 24 uses the harmonics of the lock-in amplifier 24. Using the measurement mode, the harmonics twice as high as the input reference signal are used as a reference signal, and the amplitude intensity I (2ω m ) is calculated based on this reference signal and the interference signal.

そして、ロックインアンプ22,24で算出(すなわち、測定)した振幅強度I(ω)、I(2ω)に基づいて、ディジタル回路26で両者の比のアークタンジェントを計算する。この場合、アークタンジェントは式(20)で求める。ここで、式(20)の右辺は、位相変化量に相当する。 Then, based on the amplitude intensities I (ω m ) and I (2ω m ) calculated (that is, measured) by the lock-in amplifiers 22 and 24, the arc tangent of the ratio between the two is calculated by the digital circuit 26. In this case, the arc tangent is obtained by equation (20). Here, the right side of Expression (20) corresponds to the amount of phase change.

Figure 2010107470
ディジタル回路26は、さらに、下記式(21)に基づいて、透過膜52の厚さdを算出する。
Figure 2010107470
The digital circuit 26 further calculates the thickness d of the permeable membrane 52 based on the following equation (21).

Figure 2010107470
上記のようにして、本実施形態では、透過膜52の厚さdの計測を行うことができる。
Figure 2010107470
As described above, in this embodiment, the thickness d of the permeable membrane 52 can be measured.

さて、上記のように構成されたディスパーション干渉計及び計測方法は、前記実施形態の(1)〜(3)、(5)、(6)と同様の効果を奏することができる。又、下記の特徴がある。   Now, the dispersion interferometer and the measuring method configured as described above can achieve the same effects as (1) to (3), (5), and (6) of the above embodiment. In addition, it has the following characteristics.

(1) 本実施形態のディスパーション干渉計では、被測定物である透過膜52の物理量である厚さdの計測において、信号強度変化による測定誤差を低減し高精度化することができ、実時間制御での利用が可能となる。   (1) In the dispersion interferometer of the present embodiment, in measuring the thickness d, which is a physical quantity of the permeable membrane 52 that is the object to be measured, the measurement error due to a change in signal intensity can be reduced and the accuracy can be increased. Use in time control becomes possible.

なお、本発明の実施形態は以下のように変更してもよい。
○ 前記各実施形態では、ロックインアンプ22,24及びディジタル回路26により計測手段を構成したが、計測手段をコンピュータにより構成してもよい。
In addition, you may change embodiment of this invention as follows.
In each of the above embodiments, the measuring unit is configured by the lock-in amplifiers 22 and 24 and the digital circuit 26, but the measuring unit may be configured by a computer.

○ 前記各実施形態では、光弾性素子12を使用したが、光弾性素子12の代わりに位相変調手段として、電気光学素子としてもよい。この際、電気光学素子に印加する電界と前記基本波W1の偏光方向が平行になるようにする。この場合、2倍高調波に位相変調を付与することになる。この場合においてもドライバ20は、電気光学素子により、2倍高調波W2に位相変調を付与することにより、前記各実施形態と同様の効果を得ることができる。   In each of the above embodiments, the photoelastic element 12 is used. However, instead of the photoelastic element 12, a phase modulation unit may be used as an electro-optical element. At this time, the electric field applied to the electro-optical element is made parallel to the polarization direction of the fundamental wave W1. In this case, phase modulation is applied to the second harmonic. Also in this case, the driver 20 can obtain the same effects as those of the above embodiments by applying phase modulation to the second harmonic W2 by the electro-optic element.

又、電気光学素子に印加する電界と2倍高調波の偏光方向が平行になるようにしてもよい。この場合においては、基本波に位相変調を付与することになる。この場合においてもドライバ20は、電気光学素子により、基本波W1に位相変調を付与することにより、前記各実施形態と同様の効果を得ることができる。   Alternatively, the electric field applied to the electro-optic element and the polarization direction of the second harmonic may be parallel. In this case, phase modulation is applied to the fundamental wave. Also in this case, the driver 20 can obtain the same effects as those of the above embodiments by applying phase modulation to the fundamental wave W1 by the electro-optic element.

本発明の一実施形態のディスパーション干渉計の概略図。1 is a schematic diagram of a dispersion interferometer according to an embodiment of the present invention. 他の実施形態のディスパーション干渉計の概略図。Schematic of the dispersion interferometer of other embodiment. 従来の干渉計の概略図。Schematic of a conventional interferometer. (a)、(b)は、従来のディスパーション干渉計の概略図。(A), (b) is the schematic of the conventional dispersion interferometer. (a)は電気光学素子に印加するsin(ωt)の時間的変化を示すグラフ、(b)は、干渉信号の時間的変化を示すグラフ。(A) is a graph which shows the time change of sin ((omega) mt ) applied to an electro-optical element, (b) is a graph which shows the time change of an interference signal.

符号の説明Explanation of symbols

10…非線形結晶素子(第1非線形結晶素子)、
12…光弾性素子(位相変調手段)、
14…非線形結晶素子(第2非線形結晶素子)、
16…波長選択フィルタ、
18…検出器(干渉信号取得手段)、
20…ドライバ、
22…ロックインアンプ、
24…ロックインアンプ、
26…ディジタル回路(ロックインアンプ22,24とともに計測手段を構成する)、
28…ディジタルスコープ。
10: Nonlinear crystal element (first nonlinear crystal element),
12: Photoelastic element (phase modulation means),
14 ... Nonlinear crystal element (second nonlinear crystal element),
16: Wavelength selection filter,
18 ... Detector (interference signal acquisition means),
20 ... Driver,
22 ... Lock-in amplifier,
24. Lock-in amplifier,
26... Digital circuit (combining measurement means with lock-in amplifiers 22 and 24)
28: Digital scope.

Claims (6)

基本波となる直線偏光のレーザ光を透過させて、一部のレーザ光を前記基本波と偏光方向が直交する第1の2倍高調波に変える第1非線形結晶素子と、
位相変調を付与する駆動信号が印加されることにより、前記第1非線形結晶素子を介して入射した前記基本波と第1の2倍高調波のうちいずれか一方にのみ前記位相変調を発生させて、基本波及び第1の2倍高調波を共に被測定物に出射する位相変調手段と、
前記被測定物を透過した基本波と第1の2倍高調波を入射して、前記基本波を該基本波と偏光方向が直交する第2の2倍高調波に変える第2非線形結晶素子と、
前記第2非線形結晶素子を通過した第1の2倍高調波と第2の2倍高調波を選択的に透過させる波長選択フィルタと、
前記波長選択フィルタを透過した第1の2倍高調波と第2の2倍高調波の干渉信号を取得する干渉信号取得手段と、
前記干渉信号に含まれる前記被測定物による位相変化量に基づいて前記被測定物に関する物理量を計測する計測手段を備えたディスパーション干渉計において、
前記計測手段は、
前記干渉信号における変調角周波数の基本波と2倍高調波の強度比を求め、該強度比と、前記位相変化量に基づいて前記被測定物に関する物理量を算出することを特徴とするディスパーション干渉計。
A first nonlinear crystal element that transmits linearly polarized laser light serving as a fundamental wave and converts a part of the laser light into a first second harmonic whose polarization direction is orthogonal to the fundamental wave;
By applying a drive signal for applying phase modulation, the phase modulation is generated only in one of the fundamental wave and the first second harmonic wave incident through the first nonlinear crystal element. Phase modulating means for emitting both the fundamental wave and the first second harmonic to the object to be measured;
A second nonlinear crystal element that receives the fundamental wave transmitted through the object to be measured and the first second harmonic, and changes the fundamental wave into a second second harmonic whose polarization direction is orthogonal to the fundamental wave; ,
A wavelength selective filter that selectively transmits the first and second harmonics that have passed through the second nonlinear crystal element;
Interference signal acquisition means for acquiring interference signals of the first second harmonic and the second second harmonic transmitted through the wavelength selection filter;
In a dispersion interferometer provided with a measuring means for measuring a physical quantity related to the device under test based on a phase change amount by the device under test included in the interference signal,
The measuring means includes
Dispersion interference characterized by obtaining an intensity ratio between a fundamental wave and a second harmonic of a modulation angular frequency in the interference signal, and calculating a physical quantity related to the object to be measured based on the intensity ratio and the phase change amount Total.
前記計測手段は、
前記駆動信号に基づく参照信号に基づいて、前記干渉信号に含まれる、前記位相変調における基本波と2倍高調波の各振幅強度を算出し、両振幅強度に基づいて前記強度比を求めることを特徴とする請求項1に記載のディスパーション干渉計。
The measuring means includes
Based on a reference signal based on the drive signal, calculating each amplitude intensity of the fundamental wave and the second harmonic in the phase modulation included in the interference signal, and obtaining the intensity ratio based on both amplitude intensity The dispersion interferometer according to claim 1.
前記位相変調手段が、光弾性素子又は電気光学素子であることを特徴とする請求項1又は請求項2に記載のディスパーション干渉計。   The dispersion interferometer according to claim 1 or 2, wherein the phase modulation means is a photoelastic element or an electro-optic element. 前記被測定物が、プラズマであり、前記物理量が、該プラズマの電子密度であることを特徴とする請求項1乃至請求項3のうちいずれか1項に記載のディスパーション干渉計。   The dispersion interferometer according to any one of claims 1 to 3, wherein the object to be measured is plasma, and the physical quantity is an electron density of the plasma. 前記被測定物が、透過膜であり、前記物理量が、該透過膜の厚さであることを特徴とする請求項1乃至請求項3のうちいずれか1項に記載のディスパーション干渉計。   The dispersion interferometer according to any one of claims 1 to 3, wherein the object to be measured is a permeable membrane, and the physical quantity is a thickness of the permeable membrane. 第1非線形結晶素子に対して、基本波となる直線偏光のレーザ光を透過させて、一部のレーザ光を前記基本波と偏光方向が直交する第1の2倍高調波に変える第1段階と、
位相変調手段に対して、前記第1非線形結晶素子を通過した基本波と、前記第1の2倍高調波を入射して、位相変調を付与する駆動信号を印加することにより前記基本波と前記第1の2倍高調波のいずれか一方にのみ前記位相変調を発生させ、透過した基本波と第1の2倍高調波を共に被測定物に出射する第2段階と、
第2非線形結晶素子に対して、前記被測定物を透過した基本波と第1の2倍高調波を入射して、前記基本波を該基本波と偏光方向が直交する第2の2倍高調波に変える第3段階と、
波長選択フィルタにより、前記第2非線形結晶素子を通過した第1の2倍高調波と第2の2倍高調波を選択的に透過させる第4段階と、
干渉信号取得手段により、前記波長選択フィルタを透過した第1の2倍高調波と第2の2倍高調波の干渉信号を取得する第5段階と、
計測手段により、前記干渉信号に含まれる前記被測定物による位相変化量に基づいて前記被測定物に関する物理量を計測するに当たり、前記干渉信号における変調角周波数の基本波と2倍高調波の強度比を求め、該強度比と、前記位相変化量に基づいて前記被測定物に関する物理量を算出する第6段階を有することを特徴とする被測定物の物理量の計測方法。
A first stage in which linearly polarized laser light as a fundamental wave is transmitted to the first nonlinear crystal element, and a part of the laser light is changed to a first second harmonic whose polarization direction is orthogonal to the fundamental wave. When,
Applying a fundamental wave that has passed through the first nonlinear crystal element and a first second harmonic and applying a drive signal for applying phase modulation to the phase modulation means, the fundamental wave and the fundamental wave A second stage in which the phase modulation is generated only in one of the first second harmonics, and both the transmitted fundamental wave and the first second harmonic are emitted to the object to be measured;
The fundamental wave that has passed through the object to be measured and the first second harmonic wave are incident on the second nonlinear crystal element, and the fundamental wave and the second harmonic wave whose polarization directions are orthogonal to each other. The third stage to turn into waves,
A fourth stage of selectively transmitting the first second harmonic and the second second harmonic that have passed through the second nonlinear crystal element by a wavelength selection filter;
A fifth stage of acquiring an interference signal of the first second harmonic and the second second harmonic transmitted through the wavelength selection filter by an interference signal acquisition means;
When measuring the physical quantity related to the object to be measured based on the phase change amount by the object to be measured included in the interference signal by the measuring means, the intensity ratio between the fundamental wave of the modulation angular frequency and the second harmonic in the interference signal And measuring the physical quantity of the measured object based on the intensity ratio and the phase change amount.
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101839686A (en) * 2010-03-26 2010-09-22 中国计量科学研究院 Nonlinear error correction method of laser interferometer, device and interferometer applying method and device
CN111343778A (en) * 2018-12-18 2020-06-26 核工业西南物理研究院 Method for measuring high wave number spectrum in plasma turbulence
KR102253837B1 (en) * 2020-04-23 2021-05-20 한국핵융합에너지연구원 Plasma density measuring apparatus using dispersion interferometer with single passing non-linear crystal and plasma density measuring method using the same
CN114423137A (en) * 2022-02-25 2022-04-29 中国科学技术大学 Resonance laser interferometer for diagnosing particle number density in plasma of divertor

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109270028A (en) * 2018-09-28 2019-01-25 西安工业大学 A kind of micro- priming system plasma refraction rate temporal evolution test device
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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005517913A (en) * 2002-02-12 2005-06-16 ザイゴ コーポレーション Interferometer with dynamic beam direction manipulation element
JP2008281484A (en) * 2007-05-11 2008-11-20 Hamamatsu Photonics Kk Interference measuring device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005517913A (en) * 2002-02-12 2005-06-16 ザイゴ コーポレーション Interferometer with dynamic beam direction manipulation element
JP2008281484A (en) * 2007-05-11 2008-11-20 Hamamatsu Photonics Kk Interference measuring device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101839686A (en) * 2010-03-26 2010-09-22 中国计量科学研究院 Nonlinear error correction method of laser interferometer, device and interferometer applying method and device
CN111343778A (en) * 2018-12-18 2020-06-26 核工业西南物理研究院 Method for measuring high wave number spectrum in plasma turbulence
KR102253837B1 (en) * 2020-04-23 2021-05-20 한국핵융합에너지연구원 Plasma density measuring apparatus using dispersion interferometer with single passing non-linear crystal and plasma density measuring method using the same
CN114423137A (en) * 2022-02-25 2022-04-29 中国科学技术大学 Resonance laser interferometer for diagnosing particle number density in plasma of divertor

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