JP2010106149A - Thermosetting resin composition and prepreg and laminate using the same - Google Patents
Thermosetting resin composition and prepreg and laminate using the same Download PDFInfo
- Publication number
- JP2010106149A JP2010106149A JP2008279839A JP2008279839A JP2010106149A JP 2010106149 A JP2010106149 A JP 2010106149A JP 2008279839 A JP2008279839 A JP 2008279839A JP 2008279839 A JP2008279839 A JP 2008279839A JP 2010106149 A JP2010106149 A JP 2010106149A
- Authority
- JP
- Japan
- Prior art keywords
- group
- acidic substituent
- thermosetting resin
- resin composition
- sulfonic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920001187 thermosetting polymer Polymers 0.000 title claims abstract description 32
- 239000011342 resin composition Substances 0.000 title claims abstract description 24
- 230000002378 acidificating effect Effects 0.000 claims abstract description 44
- 125000001424 substituent group Chemical group 0.000 claims abstract description 44
- -1 N-substituted maleimide group Chemical group 0.000 claims abstract description 38
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 23
- 239000003822 epoxy resin Substances 0.000 claims abstract description 21
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 20
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 20
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 18
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 18
- 125000000542 sulfonic acid group Chemical group 0.000 claims abstract description 17
- 125000005843 halogen group Chemical group 0.000 claims abstract description 16
- 150000001875 compounds Chemical class 0.000 claims abstract description 13
- 229910052751 metal Inorganic materials 0.000 claims abstract description 7
- 239000002184 metal Substances 0.000 claims abstract description 7
- 239000003795 chemical substances by application Substances 0.000 claims description 22
- 125000004432 carbon atom Chemical group C* 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 14
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 6
- 125000002947 alkylene group Chemical group 0.000 claims description 5
- 238000010030 laminating Methods 0.000 claims description 5
- 125000001118 alkylidene group Chemical group 0.000 claims description 4
- 125000001033 ether group Chemical group 0.000 claims description 4
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 42
- 239000011889 copper foil Substances 0.000 abstract description 23
- 238000005219 brazing Methods 0.000 abstract 1
- 238000000197 pyrolysis Methods 0.000 abstract 1
- 125000005439 maleimidyl group Chemical group C1(C=CC(N1*)=O)=O 0.000 description 32
- 229920005989 resin Polymers 0.000 description 25
- 239000011347 resin Substances 0.000 description 25
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 22
- 238000004519 manufacturing process Methods 0.000 description 21
- 238000011156 evaluation Methods 0.000 description 19
- 229910052802 copper Inorganic materials 0.000 description 18
- 239000010949 copper Substances 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 15
- 238000010992 reflux Methods 0.000 description 14
- 238000010438 heat treatment Methods 0.000 description 13
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical class O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 11
- CWLKGDAVCFYWJK-UHFFFAOYSA-N 3-aminophenol Chemical compound NC1=CC=CC(O)=C1 CWLKGDAVCFYWJK-UHFFFAOYSA-N 0.000 description 10
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 9
- 238000001816 cooling Methods 0.000 description 8
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical class NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 7
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 description 7
- 239000003063 flame retardant Substances 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 6
- 239000007795 chemical reaction product Substances 0.000 description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 6
- 229910000679 solder Inorganic materials 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 229940018563 3-aminophenol Drugs 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 5
- 239000011256 inorganic filler Substances 0.000 description 5
- 229910003475 inorganic filler Inorganic materials 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 239000004593 Epoxy Substances 0.000 description 4
- 239000005062 Polybutadiene Substances 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 229960004050 aminobenzoic acid Drugs 0.000 description 4
- 125000003710 aryl alkyl group Chemical group 0.000 description 4
- 239000004305 biphenyl Substances 0.000 description 4
- 235000010290 biphenyl Nutrition 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 229910001593 boehmite Inorganic materials 0.000 description 4
- FAHBNUUHRFUEAI-UHFFFAOYSA-M hydroxidooxidoaluminium Chemical compound O[Al]=O FAHBNUUHRFUEAI-UHFFFAOYSA-M 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- 229920002857 polybutadiene Polymers 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 230000009257 reactivity Effects 0.000 description 4
- GUIACFHOZIQGKX-UHFFFAOYSA-N 1-[4-[4-(2,5-dioxopyrrol-1-yl)phenyl]sulfonylphenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=C(S(=O)(=O)C=2C=CC(=CC=2)N2C(C=CC2=O)=O)C=C1 GUIACFHOZIQGKX-UHFFFAOYSA-N 0.000 description 3
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 229910002706 AlOOH Inorganic materials 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 238000007259 addition reaction Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 3
- 150000002460 imidazoles Chemical class 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
- 239000012774 insulation material Substances 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 229920003192 poly(bis maleimide) Polymers 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 3
- 239000002966 varnish Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- IPJGAEWUPXWFPL-UHFFFAOYSA-N 1-[3-(2,5-dioxopyrrol-1-yl)phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC(N2C(C=CC2=O)=O)=C1 IPJGAEWUPXWFPL-UHFFFAOYSA-N 0.000 description 2
- IKFPAKYBSYICFK-UHFFFAOYSA-N 1-[4-(4-propylphenoxy)phenyl]pyrrole-2,5-dione Chemical compound C1=CC(CCC)=CC=C1OC1=CC=C(N2C(C=CC2=O)=O)C=C1 IKFPAKYBSYICFK-UHFFFAOYSA-N 0.000 description 2
- XOJRVZIYCCJCRD-UHFFFAOYSA-N 1-[4-[4-(2,5-dioxopyrrol-1-yl)phenoxy]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1OC1=CC=C(N2C(C=CC2=O)=O)C=C1 XOJRVZIYCCJCRD-UHFFFAOYSA-N 0.000 description 2
- XAZPKEBWNIUCKF-UHFFFAOYSA-N 1-[4-[4-[2-[4-[4-(2,5-dioxopyrrol-1-yl)phenoxy]phenyl]propan-2-yl]phenoxy]phenyl]pyrrole-2,5-dione Chemical compound C=1C=C(OC=2C=CC(=CC=2)N2C(C=CC2=O)=O)C=CC=1C(C)(C)C(C=C1)=CC=C1OC(C=C1)=CC=C1N1C(=O)C=CC1=O XAZPKEBWNIUCKF-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 2
- MOSSLXZUUKTULI-UHFFFAOYSA-N 3-[3-(2,5-dioxopyrrol-3-yl)-4-methylphenyl]pyrrole-2,5-dione Chemical compound CC1=CC=C(C=2C(NC(=O)C=2)=O)C=C1C1=CC(=O)NC1=O MOSSLXZUUKTULI-UHFFFAOYSA-N 0.000 description 2
- PDCMTKJRBAZZHL-UHFFFAOYSA-N 5-aminobenzene-1,3-diol Chemical compound NC1=CC(O)=CC(O)=C1 PDCMTKJRBAZZHL-UHFFFAOYSA-N 0.000 description 2
- 0 C*(C)C(CC=CC=C1)=C1N(C(C=C1)=O)C1=O Chemical compound C*(C)C(CC=CC=C1)=C1N(C(C=C1)=O)C1=O 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- RWZYAGGXGHYGMB-UHFFFAOYSA-N anthranilic acid Chemical compound NC1=CC=CC=C1C(O)=O RWZYAGGXGHYGMB-UHFFFAOYSA-N 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 239000007809 chemical reaction catalyst Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate Chemical compound [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 239000000806 elastomer Substances 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 229910001679 gibbsite Inorganic materials 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- 150000002513 isocyanates Chemical group 0.000 description 2
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 2
- 239000000347 magnesium hydroxide Substances 0.000 description 2
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 2
- 239000012766 organic filler Substances 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920001955 polyphenylene ether Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- SEULWJSKCVACTH-UHFFFAOYSA-N 1-phenylimidazole Chemical compound C1=NC=CN1C1=CC=CC=C1 SEULWJSKCVACTH-UHFFFAOYSA-N 0.000 description 1
- ZMCHBSMFKQYNKA-UHFFFAOYSA-N 2-aminobenzenesulfonic acid Chemical compound NC1=CC=CC=C1S(O)(=O)=O ZMCHBSMFKQYNKA-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- ZAJAQTYSTDTMCU-UHFFFAOYSA-N 3-aminobenzenesulfonic acid Chemical compound NC1=CC=CC(S(O)(=O)=O)=C1 ZAJAQTYSTDTMCU-UHFFFAOYSA-N 0.000 description 1
- XFDUHJPVQKIXHO-UHFFFAOYSA-N 3-aminobenzoic acid Chemical compound NC1=CC=CC(C(O)=O)=C1 XFDUHJPVQKIXHO-UHFFFAOYSA-N 0.000 description 1
- HVBSAKJJOYLTQU-UHFFFAOYSA-N 4-aminobenzenesulfonic acid Chemical compound NC1=CC=C(S(O)(=O)=O)C=C1 HVBSAKJJOYLTQU-UHFFFAOYSA-N 0.000 description 1
- KBZFDRWPMZESDI-UHFFFAOYSA-N 5-aminobenzene-1,3-dicarboxylic acid Chemical compound NC1=CC(C(O)=O)=CC(C(O)=O)=C1 KBZFDRWPMZESDI-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- SSSNEMXQMPDHCW-UHFFFAOYSA-N CC(C)(c1cc(OCC(C[n]2c(C3=CC=CCC3)ncc2)O)ccc1)c1cc(OCC(C[n]2c(-c3ccccc3)ncc2)O)ccc1 Chemical compound CC(C)(c1cc(OCC(C[n]2c(C3=CC=CCC3)ncc2)O)ccc1)c1cc(OCC(C[n]2c(-c3ccccc3)ncc2)O)ccc1 SSSNEMXQMPDHCW-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- MXRIRQGCELJRSN-UHFFFAOYSA-N O.O.O.[Al] Chemical compound O.O.O.[Al] MXRIRQGCELJRSN-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 description 1
- NOHQTLHHNIKWBA-UHFFFAOYSA-N [SiH4].NC(=O)N Chemical compound [SiH4].NC(=O)N NOHQTLHHNIKWBA-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 150000008360 acrylonitriles Chemical class 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Natural products C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 150000001565 benzotriazoles Chemical class 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000006081 fluorescent whitening agent Substances 0.000 description 1
- MSYLJRIXVZCQHW-UHFFFAOYSA-N formaldehyde;6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound O=C.NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 MSYLJRIXVZCQHW-UHFFFAOYSA-N 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000012784 inorganic fiber Substances 0.000 description 1
- 239000012796 inorganic flame retardant Substances 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
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Abstract
Description
本発明は、優れた低誘電特性、難燃性、接着性、耐熱性及び安全性や作業環境に優れる、電子部品等に好適な熱硬化性樹脂組成物に関する。 The present invention relates to a thermosetting resin composition suitable for electronic parts and the like, which has excellent low dielectric properties, flame retardancy, adhesion, heat resistance, safety and work environment.
熱硬化性樹脂は、熱硬化性樹脂に特有な架橋構造が高い耐熱性や寸法安定性を発現するため、電子部品等の分野において広く使われ、特に銅張積層板や層間絶縁材料においては、近年の高密度化や高信頼性への要求から、高い銅箔接着性や耐熱性が必要とされる。また、近年の環境問題から、鉛フリーはんだによる電子部品の搭載やハロゲンフリーによる難燃化が要求され、そのため従来のものよりも高い耐熱性及び難燃性が必要とされる。 Thermosetting resins are widely used in the field of electronic components, etc., because the cross-linked structure unique to thermosetting resins expresses high heat resistance and dimensional stability, especially in copper-clad laminates and interlayer insulation materials, Due to the recent demand for higher density and higher reliability, high copper foil adhesion and heat resistance are required. Moreover, due to recent environmental problems, mounting of electronic parts using lead-free solder and flame resistance using halogen-free are required, and therefore higher heat resistance and flame resistance than conventional ones are required.
熱硬化性樹脂であるビスマレイミド化合物は、低誘電特性、難燃性、耐熱性に優れる樹脂であるが、エポキシ樹脂との硬化反応性を有さない公知のビスマレイミド化合物は、エポキシ硬化系の熱硬化性樹脂にそのまま使用した場合、耐熱性や強靭性が不足する問題があった。特許文献1、特許文献2等にビスマレイミド化合物とアミノフェノールの付加物を製造し使用する熱硬化性樹脂に関する事例が開示されているが、これらを銅張積層板や層間絶縁材料として使用した場合も、依然として硬化反応性や強靭性が不足であり、耐熱性や信頼性、加工性等が不足である。 The bismaleimide compound, which is a thermosetting resin, is a resin that is excellent in low dielectric properties, flame retardancy, and heat resistance, but a known bismaleimide compound that does not have curing reactivity with an epoxy resin is an epoxy-curable resin. When used as it is for a thermosetting resin, there is a problem that heat resistance and toughness are insufficient. Examples relating to thermosetting resins that produce and use adducts of bismaleimide compounds and aminophenols are disclosed in Patent Document 1, Patent Document 2, etc., but when these are used as copper-clad laminates or interlayer insulation materials However, curing reactivity and toughness are still insufficient, and heat resistance, reliability, workability, etc. are insufficient.
また、特許文献3、特許文献4等にシアネート樹脂とアラルキル変性エポキシ樹脂を必須成分として含有する熱硬化性樹脂に関する事例が開示されているが、必須成分であるシアネート樹脂が靭性や硬化反応性に劣る樹脂であるため、この熱硬化性樹脂の硬化反応性や強靭性の改良が依然不足であり、これらを銅張積層板や層間絶縁材料として使用した場合も、耐熱性や信頼性、加工性等が不足である。 Moreover, although the example regarding the thermosetting resin which contains cyanate resin and an aralkyl modified epoxy resin as an essential component is indicated by patent document 3, patent document 4, etc., cyanate resin which is an essential component is toughness and hardening reactivity. Because it is an inferior resin, the improvement in curing reactivity and toughness of this thermosetting resin is still insufficient, and even when these are used as copper-clad laminates or interlayer insulation materials, heat resistance, reliability, workability Etc. are insufficient.
また、特許文献5に有機溶媒を使用せずに製造されるビスマレイミド化合物とアミノ安息香酸の付加物、ベンゾグアナミンホルムアルデヒド縮合物等を使用する熱硬化性樹脂に関する事例が開示されているが、熱分解温度が低く、近年要求される鉛フリーはんだへの耐熱性や銅付き耐熱性に不足する。 Further, Patent Document 5 discloses a case relating to a thermosetting resin using an adduct of a bismaleimide compound and an aminobenzoic acid produced without using an organic solvent, a benzoguanamine formaldehyde condensate, and the like. The temperature is low and the heat resistance to lead-free solder and the heat resistance with copper are insufficient in recent years.
本発明の目的は、銅箔接着性、耐熱性、耐湿性、難燃性、銅付き耐熱性、低誘電特性、低誘電正接性の全てに優れる熱硬化性樹脂組成物、及びその使用、例えばプリプレグ及び積層板を提供するものである。 The object of the present invention is a thermosetting resin composition excellent in all of copper foil adhesion, heat resistance, moisture resistance, flame resistance, heat resistance with copper, low dielectric properties, low dielectric loss tangent, and use thereof, for example, A prepreg and a laminate are provided.
本発明は、以下に関する。
1. (A)(a)1分子中に少なくとも2個のN−置換マレイミド基を有するマレイミド化合物と、(b)一般式(1)に示す酸性置換基を有するアミン化合物とを反応させて製造される、分子構造中に酸性置換基とN−置換マレイミド基を有する化合物、(B)アラルキル変性エポキシ樹脂、(C)熱分解温度が300℃以上である金属水和物を成分として含有することを特徴とする熱硬化性樹脂組成物。
The present invention relates to the following.
1. (A) (a) produced by reacting a maleimide compound having at least two N-substituted maleimide groups in one molecule with an amine compound having an acidic substituent represented by (b) general formula (1) A compound having an acidic substituent and an N-substituted maleimide group in the molecular structure, (B) an aralkyl-modified epoxy resin, and (C) a metal hydrate having a thermal decomposition temperature of 300 ° C. or higher as components. A thermosetting resin composition.
2. (A)化合物が、一般式(2)又は一般式(3)に示す硬化剤である前記の熱硬化性樹脂組成物。 2. (A) The said thermosetting resin composition whose compound is a hardening | curing agent shown to General formula (2) or General formula (3).
3. 前記の熱硬化性樹脂組成物を基材に含浸又は塗工してなるプリプレグ。
4. 前記のプリプレグを積層成形してなる積層板。
3. A prepreg obtained by impregnating or coating a base material with the thermosetting resin composition.
4). A laminate obtained by laminating the prepreg.
本発明により、銅箔接着性、耐熱性、耐湿性、難燃性、銅付き耐熱性、低誘電特性、低誘電正接性の全てに優れる熱硬化性樹脂組成物を提供することが可能となった。 According to the present invention, it becomes possible to provide a thermosetting resin composition excellent in all of copper foil adhesion, heat resistance, moisture resistance, flame resistance, heat resistance with copper, low dielectric properties, and low dielectric loss tangent. It was.
以下、本発明について詳細に説明する。
本発明の熱硬化性樹脂組成物は、下記化合物(A)〜(C)を成分として含有する。
(A)(a)1分子中に少なくとも2個のN−置換マレイミド基を有するマレイミド化合物と、(b)下記一般式(1)に示す酸性置換基を有するアミン化合物とを反応させて製造される、分子構造中に酸性置換基とN−置換マレイミド基を有する化合物。
(B)アラルキル変性エポキシ樹脂。
(C)熱分解温度が300℃以上である金属水和物。
Hereinafter, the present invention will be described in detail.
The thermosetting resin composition of the present invention contains the following compounds (A) to (C) as components.
(A) (a) produced by reacting a maleimide compound having at least two N-substituted maleimide groups in one molecule with (b) an amine compound having an acidic substituent represented by the following general formula (1) A compound having an acidic substituent and an N-substituted maleimide group in the molecular structure.
(B) Aralkyl-modified epoxy resin.
(C) Metal hydrate having a thermal decomposition temperature of 300 ° C. or higher.
本発明の成分(A)の分子構造中に酸性置換基とN−置換マレイミド基を有する化合物は、(a)の1分子中に少なくとも2個のN−置換マレイミド基を有するマレイミド化合物と、(b)の一般式(1)に示す酸性置換基を有するアミン化合物を有機溶媒中で、必要により加熱・保温しながら0.1時間から10時間攪拌し反応させて製造される。(a)の1分子中に少なくとも2個のN−置換マレイミド基を有するマレイミド化合物は、例えば、ビス(4−マレイミドフェニル)メタン、ポリフェニルメタンマレイミド、ビス(4−マレイミドフェニル)エーテル、ビス(4−マレイミドフェニル)スルホン、3,3−ジメチル−5,5−ジエチル−4,4−ジフェニルメタンビスマレイミド、4−メチル−1,3−フェニレンビスマレイミド、m−フェニレンビスマレイミド、2,2−ビス(4−(4−マレイミドフェノキシ)フェニル)プロパン等が挙げられ、これらの中で、反応率が高く、より高耐熱性化できるビス(4−マレイミドフェニル)メタン、ビス(4−マレイミドフェニル)スルホン、3,3−ジメチル−5,5−ジエチル−4,4−ジフェニルメタンビスマレイミド、2,2−ビス(4−(4−マレイミドフェノキシ)フェニル)プロパンが好ましく、溶剤への溶解性の点から、3,3−ジメチル−5,5−ジエチル−4,4−ジフェニルメタンビスマレイミド、ビス(4−マレイミドフェニル)メタンがより好ましく、安価である点からビス(4−マレイミドフェニル)メタンが特に好ましい。 The compound having an acidic substituent and an N-substituted maleimide group in the molecular structure of the component (A) of the present invention includes a maleimide compound having at least two N-substituted maleimide groups in one molecule of (a), ( The amine compound having an acidic substituent represented by the general formula (1) of b) is produced by stirring and reacting in an organic solvent for 0.1 to 10 hours as necessary with heating and heat retention. The maleimide compound having at least two N-substituted maleimide groups in one molecule of (a) is, for example, bis (4-maleimidophenyl) methane, polyphenylmethanemaleimide, bis (4-maleimidophenyl) ether, bis ( 4-maleimidophenyl) sulfone, 3,3-dimethyl-5,5-diethyl-4,4-diphenylmethane bismaleimide, 4-methyl-1,3-phenylenebismaleimide, m-phenylenebismaleimide, 2,2-bis (4- (4-maleimidophenoxy) phenyl) propane and the like. Among these, bis (4-maleimidophenyl) methane and bis (4-maleimidophenyl) sulfone which have a high reaction rate and can have higher heat resistance. 3,3-dimethyl-5,5-diethyl-4,4-diphenylmethane bismaleimi 2,2-bis (4- (4-maleimidophenoxy) phenyl) propane is preferred, and 3,3-dimethyl-5,5-diethyl-4,4-diphenylmethane bismaleimide from the viewpoint of solubility in a solvent, Bis (4-maleimidophenyl) methane is more preferred, and bis (4-maleimidophenyl) methane is particularly preferred because it is inexpensive.
(b)の一般式(1)に示す酸性置換基を有するアミン化合物は、例えば、m−アミノフェノール、p−アミノフェノール、o−アミノフェノール、p−アミノ安息香酸、m−アミノ安息香酸、o−アミノ安息香酸、o−アミノベンゼンスルホン酸、m−アミノベンゼンスルホン酸、p−アミノベンゼンスルホン酸、3,5−ジヒドロキシアニリン、3,5−ジカルボキシアニリン等が挙げられ、これらの中で、溶解性や合成の収率の点からm−アミノフェノール、p−アミノフェノール、p−アミノ安息香酸、3,5−ジヒドロキシアニリンが好ましく、耐熱性の点からo−アミノフェノール、m−アミノフェノール、p−アミノフェノールがより好ましく、誘電特性や低熱膨張性、安価である点からp−アミノフェノールが特に好ましい。 Examples of the amine compound having an acidic substituent represented by the general formula (1) in (b) include m-aminophenol, p-aminophenol, o-aminophenol, p-aminobenzoic acid, m-aminobenzoic acid, o -Aminobenzoic acid, o-aminobenzenesulfonic acid, m-aminobenzenesulfonic acid, p-aminobenzenesulfonic acid, 3,5-dihydroxyaniline, 3,5-dicarboxyaniline, etc., among these, M-aminophenol, p-aminophenol, p-aminobenzoic acid, and 3,5-dihydroxyaniline are preferable from the viewpoint of solubility and synthesis yield, and o-aminophenol, m-aminophenol, p-Aminophenol is more preferable, and p-aminophenol is particularly preferable in terms of dielectric properties, low thermal expansion, and low cost.
ここで、(a)のマレイミド化合物と(b)の酸性置換基を有するアミン化合物の使用量は、その当量比が、(a)のマレイミド化合物のマレイミド基当量に対し、−NH2基換算の酸性置換基を有するアミン化合物の当量が次式:2.0≦(マレイミド基当量)/(−NH2基換算の当量)≦10.0に示す範囲であることが望ましい。10.0を超えると溶剤への溶解性が不足したり熱硬化性樹脂の耐熱性が低下する場合があり、2.0未満であるとゲル化を起こしたり、熱硬化性樹脂の耐熱性が低下する場合がある。また、有機溶媒の使用量は、(a)成分と(b)成分の総和100質量部当たり、10〜1000質量部とすることが好ましく、100〜500質量部とすることがより好ましく、200〜500質量部とすることが特に好ましい。有機溶剤の配合量が少ないと溶解性が不足し、また1000質量部を超えると合成に長時間を要する。 Here, the use amount of the maleimide compound (a) and the amine compound (b) having an acidic substituent is such that the equivalent ratio is in terms of —NH 2 group with respect to the maleimide group equivalent of the maleimide compound (a). The equivalent of the amine compound having an acidic substituent is preferably in the range represented by the following formula: 2.0 ≦ (maleimide group equivalent) / (equivalent in terms of —NH 2 group) ≦ 10.0. If it exceeds 10.0, the solubility in the solvent may be insufficient or the heat resistance of the thermosetting resin may decrease, and if it is less than 2.0, gelation may occur, or the heat resistance of the thermosetting resin may decrease. May decrease. Moreover, it is preferable to set it as 10-1000 mass parts per 100 mass parts of total of (a) component and (b) component, and, as for the usage-amount of an organic solvent, it is more preferable to set it as 100-500 mass parts, 200- It is especially preferable to set it as 500 mass parts. If the amount of the organic solvent is small, the solubility is insufficient, and if it exceeds 1000 parts by mass, a long time is required for synthesis.
この反応で使用される有機溶媒は特に制限されないが、例えばエタノール、プロパノール、ブタノール、メチルセロソルブ、ブチルセロソルブ、プロピレングリコールモノメチルエーテル等のアルコール系溶剤、アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン系溶剤、テトラヒドロフラン等のエーテル系溶剤、トルエン、キシレン、メシチレン等の芳香族系溶剤、ジメチルホルムアミド、ジメチルアセトアミド、N−メチルピロリドン等のN原子含有溶剤、ジメチルスルホキシド等のS原子含有溶剤等が挙げられ、1種又は2種以上を混合して使用できる。これらの中で、溶解性の点からシクロヘキサノン、プロピレングリコールモノメチルエーテル、メチルセロソルブが好ましく、低毒性である点からシクロヘキサノン、プロピレングリコールモノメチルエーテルがより好ましく、揮発性が高くプリプレグの製造時に残溶剤として残りにくいプロピレングリコールモノメチルエーテルが特に好ましい。 The organic solvent used in this reaction is not particularly limited, but alcohol solvents such as ethanol, propanol, butanol, methyl cellosolve, butyl cellosolve, propylene glycol monomethyl ether, and ketone solvents such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone. And ether solvents such as tetrahydrofuran, aromatic solvents such as toluene, xylene and mesitylene, N atom containing solvents such as dimethylformamide, dimethylacetamide and N-methylpyrrolidone, S atom containing solvents such as dimethyl sulfoxide, and the like. One kind or a mixture of two or more kinds can be used. Among these, cyclohexanone, propylene glycol monomethyl ether, and methyl cellosolve are preferable from the viewpoint of solubility, and cyclohexanone and propylene glycol monomethyl ether are more preferable from the viewpoint of low toxicity, and they remain as residual solvents when producing prepreg because of high volatility. The difficult propylene glycol monomethyl ether is particularly preferred.
また、この反応には、必要により任意に反応触媒を使用することができ、特に限定されない。反応触媒の例としては、トリエチルアミン、ピリジン、トリブチルアミン等のアミン類、メチルイミダゾール、フェニルイミダゾール等のイミダゾール類、トリフェニルホスフィン等のリン系触媒等が挙げられ、1種又は2種以上を混合して使用できる。 In this reaction, a reaction catalyst can be optionally used as necessary, and is not particularly limited. Examples of the reaction catalyst include amines such as triethylamine, pyridine, and tributylamine, imidazoles such as methylimidazole and phenylimidazole, phosphorus-based catalysts such as triphenylphosphine, and the like. Can be used.
この反応により、例えば、下記一般式(2)又は(3)に示す分子構造中に酸性置換基とN−置換マレイミド基を有する化合物が合成され、銅箔接着性、耐熱性、耐湿性、難燃性、低誘電特性に優れる熱硬化性樹脂組成物が得られる。 By this reaction, for example, a compound having an acidic substituent and an N-substituted maleimide group in the molecular structure represented by the following general formula (2) or (3) is synthesized, and copper foil adhesion, heat resistance, moisture resistance, difficulty A thermosetting resin composition having excellent flammability and low dielectric properties can be obtained.
(B)成分であるアラルキル変性エポキシ樹脂は、下記一般式(5)で表されるビフェニルアラルキルエポキシ樹脂、又は下記一般式(6)で表されるフェノールアラルキルエポキシ樹脂、ナフタレンアラルキルエポキシ樹脂、アントラセンアラルキルエポキシ樹脂等が挙げられ、1種又は2種以上を混合して使用することができる。 The aralkyl-modified epoxy resin as component (B) is a biphenyl aralkyl epoxy resin represented by the following general formula (5), a phenol aralkyl epoxy resin represented by the following general formula (6), a naphthalene aralkyl epoxy resin, or an anthracene aralkyl. An epoxy resin etc. are mentioned, 1 type (s) or 2 or more types can be mixed and used.
これらの中で、誘電特性、耐熱性及び銅箔接着性の点からビフェニルアラルキルエポキシ樹脂、フェノールアラルキルエポキシ樹脂がより好ましく、耐湿耐熱性の点からビフェニルアラルキルエポキシ樹脂が特に好ましい。 Among these, biphenyl aralkyl epoxy resins and phenol aralkyl epoxy resins are more preferable from the viewpoint of dielectric properties, heat resistance and copper foil adhesion, and biphenyl aralkyl epoxy resins are particularly preferable from the viewpoint of moisture and heat resistance.
(C)成分である熱分解温度が300℃以上である金属水和物は、ベーマイト型水酸化アルミニウム(AlOOH)、あるいはギブサイト型水酸化アルミニウム(Al(OH)3)を熱処理によりその熱分解温度を300℃以上に調整した化合物、水酸化マグネシウム等が挙げられる。これらの中で、優れた耐熱性を有するベーマイト型水酸化アルミニウム(AlOOH)や水酸化マグネシウムがより好ましく、さらに、難燃性に優れる本研究の熱硬化性樹脂と併用する場合、難燃効果はやや劣るが、安価であり、350℃以上の特に高い熱分解温度を有するベーマイト型水酸化アルミニウム(AlOOH)であれば、特に高い耐熱性と難燃性が両立し、特に好ましい。 The metal hydrate having a thermal decomposition temperature of 300 ° C. or higher as the component (C) is obtained by heat-treating boehmite type aluminum hydroxide (AlOOH) or gibbsite type aluminum hydroxide (Al (OH) 3 ) by heat treatment. And a compound prepared by adjusting the temperature to 300 ° C. or higher, magnesium hydroxide, and the like. Among these, boehmite type aluminum hydroxide (AlOOH) and magnesium hydroxide having excellent heat resistance are more preferable, and when used in combination with the thermosetting resin of this research which is excellent in flame retardancy, the flame retardant effect is Boehmite type aluminum hydroxide (AlOOH), which is a little inferior but inexpensive and has a particularly high thermal decomposition temperature of 350 ° C. or higher, is particularly preferable because it has both particularly high heat resistance and flame retardancy.
本発明の熱硬化性樹脂組成物には、耐熱性や難燃性、銅箔接着性等の向上化のため硬化促進剤を用いることが望ましく、硬化促進剤の例としては、イミダゾール類及びその誘導体、第三級アミン類及び第四級アンモニウム塩等が挙げられる。その中でもイミダゾール類及びその誘導体が耐熱性や難燃性、銅箔接着性等の点から好ましく、更に下記一般式(7)で表されるイミダゾール基がエポキシ樹脂によって置換された化合物や、下記一般式(8)で表されるイソシアネート樹脂によって置換された化合物が200℃以下での比較的低温での硬化成形性とワニスやプリプレグの経日安定性に優れるためより好ましく、下記一般式(9)又は(10)で表される化合物が少量の配合使用でよく、また商業的にも安価であることから特に好ましい。 In the thermosetting resin composition of the present invention, it is desirable to use a curing accelerator for improving heat resistance, flame retardancy, copper foil adhesiveness, etc. Examples of the curing accelerator include imidazoles and their Derivatives, tertiary amines, quaternary ammonium salts and the like. Among them, imidazoles and derivatives thereof are preferable from the viewpoints of heat resistance, flame retardancy, copper foil adhesiveness, and the like, and compounds in which the imidazole group represented by the following general formula (7) is substituted with an epoxy resin, and the following general The compound substituted by the isocyanate resin represented by the formula (8) is more preferable because it is excellent in curing moldability at a relatively low temperature at 200 ° C. or less and the aging stability of the varnish or prepreg. Alternatively, the compound represented by (10) may be used in a small amount, and is particularly preferable because it is commercially inexpensive.
本発明の熱硬化性樹脂組成物は、該成分(A)の使用量が、固形分換算の該成分(B)との総和100質量部当たり、1〜99質量部とすることが好ましく、20〜90質量部とすることがより好ましく、50〜80質量部とすることが特に好ましい。成分(A)の配合量が少ないと難燃性が不足し、また99質量部を超えると耐熱性、接着性が低下する。該成分(C)の使用量は、固形分換算の該成分(A)と(B)の総和100質量部当たり、10〜200質量部とすることが好ましく、10〜150質量部とすることがより好ましく、50〜150質量部とすることが特に好ましい。10質量部未満であると難燃性が不足したり、200質量部を超えると耐めっき液性等の耐薬品性が低下する場合がある。硬化促進剤の使用量は、固形分換算の該成分(A)と(B)の総和100質量部当たり、0.1〜20質量部とすることが好ましく、0.1〜10質量部とすることがより好ましい。硬化促進剤の使用量が少ないと耐熱性や難燃性、銅箔接着性等が不足し、また20質量部を超える場合も耐熱性や経日安定性が低下する。 In the thermosetting resin composition of the present invention, the amount of the component (A) used is preferably 1 to 99 parts by mass per 100 parts by mass in total with the component (B) in terms of solid content. It is more preferable to set it as -90 mass parts, and it is especially preferable to set it as 50-80 mass parts. If the blending amount of component (A) is small, flame retardancy is insufficient, and if it exceeds 99 parts by mass, heat resistance and adhesiveness are reduced. The amount of the component (C) used is preferably 10 to 200 parts by mass, preferably 10 to 150 parts by mass, per 100 parts by mass of the sum of the components (A) and (B) in terms of solid content. More preferred is 50 to 150 parts by mass. If it is less than 10 parts by mass, the flame retardancy may be insufficient, and if it exceeds 200 parts by mass, chemical resistance such as plating solution resistance may be deteriorated. The amount of the curing accelerator used is preferably 0.1 to 20 parts by mass, and preferably 0.1 to 10 parts by mass per 100 parts by mass of the total of the components (A) and (B) in terms of solid content. It is more preferable. If the amount of the curing accelerator used is small, the heat resistance, flame retardancy, copper foil adhesiveness, etc. are insufficient, and if it exceeds 20 parts by mass, the heat resistance and aging stability will be reduced.
本発明の熱硬化性樹脂組成物には、任意に他の難燃剤の併用ができるが、臭素や塩素を含有する含ハロゲン系難燃剤や熱分解温度が300℃未満である金属水酸化物等は本発明の目的にそぐわない。他の難燃剤の併用の例としては、トリフェニルホスフェート、トリクレジルホスフェート、トリスジクロロプロピルホスフェート、リン酸エステル系化合物、ホスファゼン、赤リン等のリン系難燃剤、三酸化アンチモン、モリブデン酸亜鉛等の無機難燃助剤等が挙げられる。 The thermosetting resin composition of the present invention can optionally be used in combination with other flame retardants, such as halogen-containing flame retardants containing bromine or chlorine, metal hydroxides having a thermal decomposition temperature of less than 300 ° C., etc. Does not meet the purpose of the present invention. Examples of other flame retardant combinations include triphenyl phosphate, tricresyl phosphate, trisdichloropropyl phosphate, phosphoric ester compounds, phosphazenes, phosphorous flame retardants such as red phosphorus, antimony trioxide, zinc molybdate, etc. Inorganic flame retardant aids and the like.
本発明の熱硬化性樹脂組成物には、任意に無機充填剤の併用ができる。無機充填剤の例としては、シリカ、マイカ、タルク、ガラス短繊維又は微粉末及び中空ガラス、炭酸カルシウム、石英粉末等が挙げられ、これらの中で誘電特性、耐熱性、難燃性の点からシリカが特に好ましい。これら無機充填剤の使用量は、固形分換算の該成分(A)と(B)の総和100質量部に対し、0〜200質量部とすることが好ましく、20〜200質量部とすることがより好ましく、20〜150質量部とすることが特に好ましい。無機充填剤の配合量が300質量部を超えると耐めっき液性等の耐薬品性や成形性が低下する。 In the thermosetting resin composition of the present invention, an inorganic filler can be optionally used in combination. Examples of inorganic fillers include silica, mica, talc, short glass fiber or fine powder and hollow glass, calcium carbonate, quartz powder and the like, among these, from the viewpoint of dielectric properties, heat resistance, flame retardancy Silica is particularly preferred. The amount of these inorganic fillers to be used is preferably 0 to 200 parts by mass, preferably 20 to 200 parts by mass with respect to 100 parts by mass of the sum of the components (A) and (B) in terms of solid content. More preferred is 20 to 150 parts by mass. When the compounding amount of the inorganic filler exceeds 300 parts by mass, chemical resistance such as plating solution resistance and moldability are deteriorated.
本発明によれば、任意に公知の熱可塑性樹脂、エラストマー、難燃剤、有機充填剤等の併用ができる。
熱可塑性樹脂の例としては、テトラフルオロエチレン、ポリエチレン、ポリプロピレン、ポリスチレン、ポリフェニレンエーテル樹脂、フェノキシ樹脂、ポリカーボネート樹脂、ポリエステル樹脂、ポリアミド樹脂、ポリイミド樹脂、キシレン樹脂、石油樹脂及びシリコーン樹脂等が挙げられる。
According to the present invention, known thermoplastic resins, elastomers, flame retardants, organic fillers and the like can be used in combination.
Examples of the thermoplastic resin include tetrafluoroethylene, polyethylene, polypropylene, polystyrene, polyphenylene ether resin, phenoxy resin, polycarbonate resin, polyester resin, polyamide resin, polyimide resin, xylene resin, petroleum resin, and silicone resin.
エラストマーの例としては、ポリブタジエン、アクリロニトリル、エポキシ変性ポリブタジエン、無水マレイン酸変性ポリブタジエン、フェノール変性ポリブタジエン及びカルボキシ変性アクリロニトリル等が挙げられる。有機充填剤の例としては、シリコーンパウダー、テトラフルオロエチレン、ポリエチレン、ポリプロピレン、ポリスチレン、並びにポリフェニレンエーテル等の有機物粉末等が挙げられる。 Examples of the elastomer include polybutadiene, acrylonitrile, epoxy-modified polybutadiene, maleic anhydride-modified polybutadiene, phenol-modified polybutadiene, and carboxy-modified acrylonitrile. Examples of organic fillers include organic powders such as silicone powder, tetrafluoroethylene, polyethylene, polypropylene, polystyrene, and polyphenylene ether.
本発明において、任意に該樹脂組成物に対して、紫外線吸収剤、酸化防止剤、光重合開始剤、蛍光増白剤及び密着性向上剤等の添加も可能であり、特に限定されない。これらの例としては、ベンゾトリアゾール系等の紫外線吸収剤、ヒンダードフェノール系やスチレン化フェノール等の酸化防止剤、ベンゾフェノン類、ベンジルケタール類、チオキサントン系等の光重合開始剤、スチルベン誘導体等の蛍光増白剤、尿素シラン等の尿素化合物やシランカップリング剤等の密着性向上剤等が挙げられる。 In the present invention, an ultraviolet absorber, an antioxidant, a photopolymerization initiator, a fluorescent whitening agent, an adhesion improver, and the like can be arbitrarily added to the resin composition, and the resin composition is not particularly limited. Examples of these include UV absorbers such as benzotriazoles, antioxidants such as hindered phenols and styrenated phenols, photopolymerization initiators such as benzophenones, benzyl ketals, and thioxanthones, and fluorescence such as stilbene derivatives. Examples include brighteners, urea compounds such as urea silane, and adhesion improvers such as silane coupling agents.
本発明のプリプレグは、前記した本発明の熱硬化性樹脂組成物を、基材に含浸又は塗工してなるものである。以下、本発明のプリプレグについて詳述する。
本発明のプリプレグは、本発明の熱硬化性樹脂組成物を、基材に含浸又は塗工し、加熱等により半硬化(Bステージ化)して本発明のプリプレグを製造することができる。本発明の基材として、各種の電気絶縁材料用積層板に用いられている周知のものが使用できる。その材質の例としては、Eガラス、Dガラス、Sガラス及びQガラス等の無機物繊維、ポリイミド、ポリエステル及びテトラフルオロエチレン等の有機繊維、並びにそれらの混合物等が挙げられる。これらの基材は、例えば、織布、不織布、ロービンク、チョップドストランドマット及びサーフェシングマット等の形状を有するが、材質及び形状は、目的とする成形物の用途や性能により選択され、必要により、単独又は2種類以上の材質及び形状を組み合わせることができる。基材の厚さは、特に制限されず、例えば、約0.03〜0.5mmを使用することができ、シランカップリング剤等で表面処理したもの又は機械的に開繊処理を施したものが、耐熱性や耐湿性、加工性の面から好適である。該基材に対する樹脂組成物の付着量が、乾燥後のプリプレグの樹脂含有率で、20〜90質量%となるように、基材に含浸又は塗工した後、通常、100〜200℃の温度で1〜30分加熱乾燥し、半硬化(Bステージ化)させて、本発明のプリプレグを得ることができる。
The prepreg of the present invention is obtained by impregnating or coating the base material with the above-described thermosetting resin composition of the present invention. Hereinafter, the prepreg of the present invention will be described in detail.
The prepreg of the present invention can be produced by impregnating or coating the thermosetting resin composition of the present invention on a substrate and semi-curing (B-stage) by heating or the like. As the base material of the present invention, known materials used for various types of laminates for electrical insulating materials can be used. Examples of the material include inorganic fibers such as E glass, D glass, S glass, and Q glass, organic fibers such as polyimide, polyester, and tetrafluoroethylene, and mixtures thereof. These base materials have, for example, shapes such as woven fabric, non-woven fabric, robink, chopped strand mat, and surfacing mat, but the material and shape are selected depending on the intended use and performance of the molded product, and if necessary, A single material or two or more materials and shapes can be combined. The thickness of the base material is not particularly limited, and for example, about 0.03 to 0.5 mm can be used, and the surface is treated with a silane coupling agent or the like or mechanically subjected to a fiber opening treatment. However, it is suitable from the aspects of heat resistance, moisture resistance, and workability. After impregnating or coating the base material so that the amount of the resin composition attached to the base material is 20 to 90% by mass in terms of the resin content of the prepreg after drying, the temperature is usually 100 to 200 ° C. Can be heated and dried for 1 to 30 minutes and semi-cured (B-stage) to obtain the prepreg of the present invention.
本発明の積層板は、前述の本発明のプリプレグを用いて、積層成形して、形成することができる。本発明のプリプレグを、例えば、1〜20枚重ね、その片面又は両面に銅及びアルミニウム等の金属箔を配置した構成で積層成形することにより製造することができる。金属箔は、電気絶縁材料用途で用いるものであれば特に制限されない。また、成形条件は、例えば、電気絶縁材料用積層板及び多層板の手法が適用でき、例えば多段プレス、多段真空プレス、連続成形、オートクレーブ成形機等を使用し、温度100〜250℃、圧力2〜100kg/cm2、加熱時間0.1〜5時間の範囲で成形することができる。また、本発明のプリプレグと内層用配線板とを組合せ、積層成形して、多層板を製造することもできる。 The laminate of the present invention can be formed by laminate molding using the prepreg of the present invention described above. The prepreg of the present invention can be produced, for example, by laminating 1 to 20 sheets and laminating and forming a metal foil such as copper and aluminum on one or both sides thereof. The metal foil is not particularly limited as long as it is used for electrical insulating material applications. In addition, as the molding conditions, for example, a method of a laminated plate for an electrical insulating material and a multilayer plate can be applied. For example, a multistage press, a multistage vacuum press, continuous molding, an autoclave molding machine, etc. are used, and a temperature of 100 to 250 ° C. It can be molded in a range of ˜100 kg / cm 2 and a heating time of 0.1 to 5 hours. Further, the prepreg of the present invention and the inner layer wiring board can be combined and laminated to produce a multilayer board.
次に、下記の実施例により本発明を更に詳しく説明するが、これらの実施例は本発明をいかなる意味においても制限するものではない。
製造例1:酸性置換基と不飽和マレイミド基を有する硬化剤(1−1)の製造
温度計、攪拌装置、還流冷却管付き水分定量器の付いた加熱及び冷却可能な容積2リットルの反応容器に、ビス(4−マレイミドフェニル)メタン:358.0gとp−アミノフェノール:54.5g、及びプロピレングリコールモノメチルエーテル:412.50gを(マレイミド基当量)/(−NH2基換算の当量)=4.0となる比率で配合し、還流させながら5時間反応させて酸性置換基と不飽和マレイミド基を有する硬化剤(1−1)の溶液を得た。また、この溶液をGPC(ポリスチレン換算、溶離液:テトラヒドロフラン)により分析した結果、図1に示すように溶出時間が約19分付近に出現するp−アミノフェノールのピークが消失しており、付加反応物に由来するピーク(B)及び(C)が確認された。ここでピーク(A)は合成原料のビス(4−マレイミドフェニル)メタンであり、ピーク(B)は化学式(11)に示す反応生成物であり、ピーク(C)は化学式(12)に示す副反応生成物である。
Next, the present invention will be described in more detail with reference to the following examples, but these examples do not limit the present invention in any way.
Production Example 1 Production of Curing Agent (1-1) Having Acidic Substituent and Unsaturated Maleimide Group Heating and cooling reaction vessel with a volume of 2 liters equipped with a thermometer, a stirrer, and a moisture meter with a reflux condenser Bis (4-maleimidophenyl) methane: 358.0 g, p-aminophenol: 54.5 g, and propylene glycol monomethyl ether: 412.50 g (maleimide group equivalent) / (equivalent in terms of —NH 2 group) = It mix | blended in the ratio used as 4.0, it was made to react for 5 hours, making it reflux, and the solution of the hardening | curing agent (1-1) which has an acidic substituent and unsaturated maleimide group was obtained. Moreover, as a result of analyzing this solution by GPC (polystyrene conversion, eluent: tetrahydrofuran), as shown in FIG. 1, the peak of p-aminophenol that appeared at about 19 minutes disappeared, and the addition reaction Peaks (B) and (C) derived from the product were confirmed. Here, peak (A) is bis (4-maleimidophenyl) methane as a raw material for synthesis, peak (B) is a reaction product represented by chemical formula (11), and peak (C) is a secondary product represented by chemical formula (12). It is a reaction product.
製造例2:酸性置換基と不飽和マレイミド基を有する硬化剤(1−2)の製造
温度計、攪拌装置、還流冷却管付き水分定量器の付いた加熱及び冷却可能な容積2リットルの反応容器に、ビス(4−マレイミドフェニル)メタン:358.0gとm−アミノフェノール:54.50g、及びプロピレングリコールモノメチルエーテル:412.5gを(マレイミド基当量)/(−NH2基換算の当量)=4.0となる比率で配合し、還流させながら5時間反応させて酸性置換基と不飽和マレイミド基を有する硬化剤(1−2)の溶液を得た。
Production Example 2: Production of Curing Agent (1-2) Having Acidic Substituent and Unsaturated Maleimide Group A reaction vessel with a volume of 2 liters that can be heated and cooled, equipped with a thermometer, a stirrer, and a moisture meter with a reflux condenser. Bis (4-maleimidophenyl) methane: 358.0 g, m-aminophenol: 54.50 g, and propylene glycol monomethyl ether: 412.5 g (maleimide group equivalent) / (equivalent in terms of —NH 2 group) = It mix | blended in the ratio used as 4.0, it was made to react for 5 hours, making it reflux, and the solution of the hardening | curing agent (1-2) which has an acidic substituent and unsaturated maleimide group was obtained.
製造例3:酸性置換基と不飽和マレイミド基を有する硬化剤(1−3)の製造
温度計、攪拌装置、還流冷却管付き水分定量器の付いた加熱及び冷却可能な容積2リットルの反応容器に、ビス(4−マレイミドフェニル)メタン:358.0gとp−アミノ安息香酸:27.40g、及びN,N−ジメチルアセトアミド:385.4gを(マレイミド基当量)/(−NH2基換算の当量)=10.0となる比率で配合し、160℃で5時間反応させて酸性置換基と不飽和マレイミド基を有する硬化剤(1−3)の溶液を得た。
Production Example 3 Production of Curing Agent (1-3) Having Acidic Substituent and Unsaturated Maleimide Group Heating and cooling reaction vessel with a volume of 2 liters equipped with a thermometer, stirrer, and moisture meter with reflux condenser Bis (4-maleimidophenyl) methane: 358.0 g, p-aminobenzoic acid: 27.40 g, and N, N-dimethylacetamide: 385.4 g in terms of (maleimide group equivalent) / (— NH 2 group equivalent) Equivalents) = 10.0 and mixed at 160 ° C. for 5 hours to obtain a solution of a curing agent (1-3) having an acidic substituent and an unsaturated maleimide group.
製造例4:酸性置換基と不飽和マレイミド基を有する硬化剤(1−4)の製造
温度計、攪拌装置、還流冷却管付き水分定量器の付いた加熱及び冷却可能な容積1リットルの反応容器に、m−フェニレンビスマレイミド:268.0gとm−アミノフェノール:109.0g、及びN,N−ジメチルアセトアミド:377.0gを(マレイミド基当量)/(−NH2基換算の当量)=2.0となる比率で配合し、140℃で5時間反応させて酸性置換基と不飽和マレイミド基を有する硬化剤(1−4)の溶液を得た。
Production Example 4: Production of Curing Agent (1-4) Having Acidic Substituent and Unsaturated Maleimide Group A reaction vessel with a volume of 1 liter that can be heated and cooled with a thermometer, a stirrer, and a moisture meter with a reflux condenser. M-phenylenebismaleimide: 268.0 g, m-aminophenol: 109.0 g, and N, N-dimethylacetamide: 377.0 g (maleimide group equivalent) / (-NH 2 group equivalent) = 2 Was mixed at a ratio of 0.0 and reacted at 140 ° C. for 5 hours to obtain a solution of a curing agent (1-4) having an acidic substituent and an unsaturated maleimide group.
製造例5:酸性置換基と不飽和マレイミド基を有する硬化剤(1−5)の製造
温度計、攪拌装置、還流冷却管付き水分定量器の付いた加熱及び冷却可能な容積2リットルの反応容器に、3,3−ジメチル−5,5−ジエチル−4,4−ジフェニルメタンビスマレイミド:442.0gとp−アミノフェノール:54.5g、及びプロピレングリコールモノメチルエーテル:496.5gを(マレイミド基当量)/(−NH2基換算の当量)=4.0となる比率で配合し、還流させながら5時間反応させて酸性置換基と不飽和マレイミド基を有する硬化剤(1−5)の溶液を得た。
Production Example 5 Production of Curing Agent (1-5) Having Acidic Substituent and Unsaturated Maleimide Group Heating and cooling reaction vessel with a volume of 2 liters equipped with a thermometer, stirrer, and moisture meter with a reflux condenser 3,3-dimethyl-5,5-diethyl-4,4-diphenylmethane bismaleimide: 442.0 g, p-aminophenol: 54.5 g, and propylene glycol monomethyl ether: 496.5 g (maleimide group equivalent) / (- equivalent of NH 2 groups equivalent) = blended with 4.0 and consisting ratio, the solution to obtain a curing agent (1-5) having reacted for 5 hours acidic substituent and an unsaturated maleimide group at reflux It was.
製造例6:酸性置換基と不飽和マレイミド基を有する硬化剤(1−6)の製造
温度計、攪拌装置、還流冷却管付き水分定量器の付いた加熱及び冷却可能な容積2リットルの反応容器に、3,3−ジメチル−5,5−ジエチル−4,4−ジフェニルメタンビスマレイミド:442.0gとo−アミノフェノール:54.5g、及びプロピレングリコールモノメチルエーテル:496.5gを(マレイミド基当量)/(−NH2基換算の当量)=4.0となる比率で配合し、還流させながら5時間反応させて酸性置換基と不飽和マレイミド基を有する硬化剤(1−6)の溶液を得た。
Production Example 6 Production of Curing Agent (1-6) Having Acidic Substituent and Unsaturated Maleimide Group Heating and cooling reaction vessel with a volume of 2 liters equipped with a thermometer, a stirrer, and a moisture meter with a reflux condenser 3,3-dimethyl-5,5-diethyl-4,4-diphenylmethane bismaleimide: 442.0 g, o-aminophenol: 54.5 g, and propylene glycol monomethyl ether: 496.5 g (maleimide group equivalent) / (-NH 2 group equivalent) = 4.0 is mixed and reacted for 5 hours while refluxing to obtain a solution of the curing agent (1-6) having an acidic substituent and an unsaturated maleimide group. It was.
製造例7:酸性置換基と不飽和マレイミド基を有する硬化剤(1−7)の製造
温度計、攪拌装置、還流冷却管付き水分定量器の付いた加熱及び冷却可能な容積2リットルの反応容器に、ビス(4−マレイミドフェニル)スルフォン:408.0gとp−アミノフェノール:54.5g、及びN,N−ジメチルアセトアミド:462.5gを(マレイミド基当量)/(−NH2基換算の当量)=4.0となる比率で配合し、100℃で2時間反応させて酸性置換基と不飽和マレイミド基を有する硬化剤(1−7)の溶液を得た。
Production Example 7 Production of Curing Agent (1-7) Having Acidic Substituent and Unsaturated Maleimide Group Heating and cooling reaction vessel with a volume of 2 liters equipped with a thermometer, stirrer, and moisture meter with reflux condenser Bis (4-maleimidophenyl) sulfone: 408.0 g, p-aminophenol: 54.5 g, and N, N-dimethylacetamide: 462.5 g (maleimide group equivalent) / (-NH 2 group equivalent) ) = 4.0 and blended at 100 ° C. for 2 hours to obtain a solution of a curing agent (1-7) having an acidic substituent and an unsaturated maleimide group.
製造例8:酸性置換基と不飽和マレイミド基を有する硬化剤(1−8)の製造
温度計、攪拌装置、還流冷却管付き水分定量器の付いた加熱及び冷却可能な容積2リットルの反応容器に、ビス(4−マレイミドフェニル)エーテル:360.0gとp−アミノフェノール:54.5g、及びN,N−ジメチルアセトアミド:414.5gを(マレイミド基当量)/(−NH2基換算の当量)=4.0となる比率で配合し、100℃で2時間反応させて酸性置換基と不飽和マレイミド基を有する硬化剤(1−8)の溶液を得た。
Production Example 8 Production of Curing Agent (1-8) Having Acidic Substituent and Unsaturated Maleimide Group Heating and cooling reaction vessel with a volume of 2 liters equipped with a thermometer, stirrer, and moisture meter with reflux condenser Bis (4-maleimidophenyl) ether: 360.0 g, p-aminophenol: 54.5 g, and N, N-dimethylacetamide: 414.5 g (maleimide group equivalent) / (-NH 2 group equivalent) ) = 4.0 and blended at 100 ° C. for 2 hours to obtain a solution of a curing agent (1-8) having an acidic substituent and an unsaturated maleimide group.
製造例9:酸性置換基と不飽和マレイミド基を有する硬化剤(1−9)の製造
温度計、攪拌装置、還流冷却管付き水分定量器の付いた加熱及び冷却可能な容積2リットルの反応容器に、2,2’−ビス[4−(4−マレイミドフェノキシ)フェニル]プロパン:570.0gとp−アミノフェノール:54.5g、及びプロピレングリコールモノメチルエーテル:624.5gを(マレイミド基当量)/(−NH2基換算の当量)=4.0となる比率で配合し、120℃で2時間反応させて酸性置換基と不飽和マレイミド基を有する硬化剤(1−9)の溶液を得た。
Production Example 9 Production of Curing Agent (1-9) Having Acidic Substituent and Unsaturated Maleimide Group Heating and cooling reaction vessel with a volume of 2 liters equipped with a thermometer, stirrer, and moisture meter with a reflux condenser 2,2′-bis [4- (4-maleimidophenoxy) phenyl] propane: 570.0 g, p-aminophenol: 54.5 g, and propylene glycol monomethyl ether: 624.5 g (maleimide group equivalent) / (Equivalent in terms of —NH 2 group) = 4.0 was blended and reacted at 120 ° C. for 2 hours to obtain a solution of a curing agent (1-9) having an acidic substituent and an unsaturated maleimide group. .
製造例10:酸性置換基と不飽和マレイミド基を有する硬化剤(1−10)の製造
温度計、攪拌装置、還流冷却管付き水分定量器の付いた加熱及び冷却可能な容積2リットルの反応容器に、4−メチル−1,3−フェニレンビスマレイミド:282.0gとp−アミノフェノール:54.5g、及びN,N−ジメチルアセトアミド:336.5gを(マレイミド基当量)/(−NH2基換算の当量)=4.0となる比率で配合し、120℃で2時間反応させて酸性置換基と不飽和マレイミド基を有する硬化剤(1−10)の溶液を得た。
Production Example 10 Production of Curing Agent (1-10) Having Acidic Substituent and Unsaturated Maleimide Group Heating and cooling reaction vessel with a volume of 2 liters equipped with a thermometer, a stirrer, and a moisture meter with a reflux condenser 4-methyl-1,3-phenylenebismaleimide: 282.0 g, p-aminophenol: 54.5 g, and N, N-dimethylacetamide: 336.5 g (maleimide group equivalent) / (— NH 2 group (Equivalent equivalent) = 4.0 and blended at 120 ° C. for 2 hours to obtain a solution of a curing agent (1-10) having an acidic substituent and an unsaturated maleimide group.
(実施例1〜18、比較例1〜6)
成分(A)である製造例1〜10で得られた成分、成分(B)であるアラルキル変性エポキシ樹脂、また、硬化促進剤、難燃剤、無機充填剤、及び希釈溶剤にメチルエチルケトンを使用して表1から表4に示した配合割合(質量部)で混合して樹脂分65質量%の均一なワニスを得た。次に、上記ワニスを厚さ0.2mmのEガラスクロスに含浸塗工し、160℃で10分加熱乾燥して樹脂含有量55質量%のプリプレグを得た。次に、このプリプレグを4枚重ね、18μmの電解銅箔を上下に配置し、圧力25kg/cm2、温度185℃で90分間プレスを行って、銅張積層板を得た。このようにして得られた銅張積層板を用いて、銅箔接着性(銅箔ピール強度)、ガラス転移温度、はんだ耐熱性、吸湿性(吸水率)、難燃性、比誘電率(1GHz)、誘電正接(1GHz)について以下の方法で測定・評価し、表5から表8に評価結果を示した。
(Examples 1-18, Comparative Examples 1-6)
Ingredients (A) obtained in Production Examples 1 to 10, Aralkyl-modified epoxy resin (B), and a curing accelerator, a flame retardant, an inorganic filler, and a diluent solvent using methyl ethyl ketone A uniform varnish having a resin content of 65% by mass was obtained by mixing at a blending ratio (parts by mass) shown in Tables 1 to 4. Next, the varnish was impregnated and applied to an E glass cloth having a thickness of 0.2 mm and dried by heating at 160 ° C. for 10 minutes to obtain a prepreg having a resin content of 55% by mass. Next, four prepregs were stacked, 18 μm electrolytic copper foils were placed one above the other, and pressed at a pressure of 25 kg / cm 2 and a temperature of 185 ° C. for 90 minutes to obtain a copper clad laminate. Using the copper-clad laminate thus obtained, copper foil adhesion (copper foil peel strength), glass transition temperature, solder heat resistance, moisture absorption (water absorption), flame retardancy, relative dielectric constant (1 GHz ) And dielectric loss tangent (1 GHz) were measured and evaluated by the following method, and the evaluation results are shown in Tables 5 to 8.
(1)銅箔接着性(銅箔ピール強度)の評価
銅張積層板を銅エッチング液に浸漬することにより1cm幅の銅箔を形成して評価基板を作製し、引張り試験機を用いて銅箔の接着性(ピール強度)を測定した。
(2)ガラス転移温度(Tg)の測定
銅張積層板を銅エッチング液に浸漬することにより銅箔を取り除いた5mm角の評価基板を作製し、TMA試験装置(デュポン社製、TMA2940)を用い、評価基板の熱膨張特性を観察することにより評価した。
(3)はんだ耐熱性の評価
銅張積層板を銅エッチング液に浸漬することにより銅箔を取り除いた5cm角の評価基板を作製し、平山製作所(株)製プレッシャー・クッカー試験装置を用いて、121℃、2atmの条件で4時間までプレッシャー・クッカー処理を行った後、温度288℃のはんだ浴に、評価基板を20秒間浸漬した後、外観を観察することによりはんだ耐熱性を評価した。
(4)銅付き耐熱性(T−300)の評価
銅張積層板から5mm角の評価基板を作製し、TMA試験装置(デュポン社製、TMA2940)を用い、300℃で評価基板の膨れが発生するまでの時間を測定することにより評価した。
(5)吸湿性(吸水率)の評価
銅張積層板を銅エッチング液に浸漬することにより銅箔を取り除いた評価基板を作製し、平山製作所(株)製プレッシャー・クッカー試験装置を用いて、121℃、2atmの条件で5時間までプレッシャー・クッカー処理を行った後、評価基板の吸水率を測定した。
(6)難燃性の評価
銅張積層板を銅エッチング液に浸漬することにより銅箔を取り除いた評価基板から、長さ127mm、幅12.7mmに切り出した試験片を作製し、UL94の試験法(V法)に準じて評価した。
(7)比誘電率及び誘電正接の測定
得られた銅張積層板を銅エッチング液に浸漬することにより銅箔を取り除いた評価基板を作製し、Hewllet・Packerd社製比誘電率測定装置(製品名:HP4291B)を用いて、周波数1GHzでの比誘電率及び誘電正接を測定した。
(1) Evaluation of copper foil adhesion (copper foil peel strength) A copper-clad laminate is dipped in a copper etching solution to form a 1 cm wide copper foil to produce an evaluation substrate, and copper is tested using a tensile tester. The adhesion (peel strength) of the foil was measured.
(2) Measurement of glass transition temperature (Tg) A 5-mm square evaluation board from which copper foil was removed by immersing a copper clad laminate in a copper etching solution was prepared, and a TMA test apparatus (manufactured by DuPont, TMA2940) was used. Evaluation was made by observing the thermal expansion characteristics of the evaluation substrate.
(3) Evaluation of solder heat resistance A 5-cm square evaluation board from which copper foil was removed by immersing a copper-clad laminate in a copper etching solution was prepared, and using a pressure cooker test apparatus manufactured by Hirayama Mfg. Co., Ltd. After performing the pressure-cooker treatment for 4 hours under the conditions of 121 ° C. and 2 atm, the evaluation substrate was immersed in a solder bath at a temperature of 288 ° C. for 20 seconds, and then the solder heat resistance was evaluated by observing the appearance.
(4) Evaluation of heat resistance with copper (T-300) An evaluation board of 5 mm square was produced from a copper clad laminate, and the evaluation board swelled at 300 ° C. using a TMA test apparatus (manufactured by DuPont, TMA2940). It was evaluated by measuring the time to do.
(5) Evaluation of hygroscopicity (water absorption rate) A copper-clad laminate was immersed in a copper etching solution to prepare an evaluation board from which the copper foil was removed, and a pressure cooker test apparatus manufactured by Hirayama Seisakusho was used. After performing the pressure-cooker treatment for 5 hours under the conditions of 121 ° C. and 2 atm, the water absorption rate of the evaluation substrate was measured.
(6) Flame Retardancy Evaluation A test piece cut out to 127 mm in length and 12.7 mm in width was prepared from an evaluation board from which a copper foil was removed by immersing a copper-clad laminate in a copper etching solution, and tested for UL94. Evaluation was made according to the method (Method V).
(7) Measurement of relative dielectric constant and dielectric loss tangent The obtained copper-clad laminate was immersed in a copper etching solution to produce an evaluation substrate from which the copper foil was removed, and a relative dielectric constant measuring device manufactured by Hewlett-Packard Company (product) Name: HP4291B), relative permittivity and dielectric loss tangent at a frequency of 1 GHz were measured.
表中の数字は、固形分の質量部により示されている。注書きは、それぞれ
*1:ビフェニルアラルキルエポキシ樹脂(日本化薬社製;商品名NC−3000H,エポキシ当量290)
*2:フェノールアラルキルエポキシ樹脂(三井化学社製;商品名E−XL−3L,エポキシ当量235)
*3:下記に示す構造のビスフェノールA型エポキシ樹脂と2−フェニルイミダゾールの付加反応物
The numbers in the table are indicated by mass parts of solid content. * 1: Biphenyl aralkyl epoxy resin (manufactured by Nippon Kayaku Co., Ltd .; trade name NC-3000H, epoxy equivalent 290)
* 2: Phenol aralkyl epoxy resin (Mitsui Chemicals, trade name E-XL-3L, epoxy equivalent 235)
* 3: Addition reaction product of bisphenol A type epoxy resin and 2-phenylimidazole having the structure shown below
*4:下記に示す構造のヘキサメチレンジイソシアネート樹脂と2−エチル−4−メチルイミダゾールの付加反応物 * 4: Addition reaction product of hexamethylene diisocyanate resin having the structure shown below and 2-ethyl-4-methylimidazole
*5:ベーマイト型水酸化アルミニウム
*6:ビス(4−マレイミドフェニル)メタン
*7:2,2’−ビス[4−(4−マレイミドフェノキシ)フェニル]プロパン
*8:ビスフェノールA型エポキシ樹脂(ジャパンエポキシレジン(株)製、商品名:エピコート828,エポキシ当量186)
*9:ビスフェノールF型エポキシ樹脂(ジャパンエポキシレジン(株)製、商品名:エピコート807,エポキシ当量168)
*10:2−フェニルイミダゾール
*11:ギブサイト型水酸化アルミニウムを意味する。
* 5: Boehmite type aluminum hydroxide * 6: Bis (4-maleimidophenyl) methane * 7: 2,2'-bis [4- (4-maleimidophenoxy) phenyl] propane * 8: Bisphenol A type epoxy resin (Japan) Epoxy Resin Co., Ltd., trade name: Epicoat 828, epoxy equivalent 186)
* 9: Bisphenol F type epoxy resin (manufactured by Japan Epoxy Resin Co., Ltd., trade name: Epicoat 807, epoxy equivalent 168)
* 10: 2-Phenylimidazole * 11: Gibbsite type aluminum hydroxide.
表5から表8から明らかなように、本発明の実施例は、Tg、銅箔ピール強度、耐熱性、耐湿性、難燃性、銅付き耐熱性(T−288)、低誘電特性、低誘電正接性の全てに優れている。一方、比較例は、Tg、銅箔ピール強度、耐熱性、耐湿性、難燃性、銅付き耐熱性(T−300)、低誘電特性、低誘電正接性の全てを満たすものは無く、いずれかの特性に劣っている。 As is apparent from Tables 5 to 8, the examples of the present invention are Tg, copper foil peel strength, heat resistance, moisture resistance, flame resistance, heat resistance with copper (T-288), low dielectric properties, low Excellent dielectric loss tangent. On the other hand, there is no comparative example satisfying all of Tg, copper foil peel strength, heat resistance, moisture resistance, flame resistance, heat resistance with copper (T-300), low dielectric properties, and low dielectric loss tangent. The characteristics are inferior.
本発明の熱硬化性樹脂組成物を基材に含浸、又は塗工して得たプリプレグ、及び該プリプレグを積層成形することにより製造した積層板は、Tg、銅箔接着性、耐熱性、耐湿性、難燃性、銅付き耐熱性(T−300)、低誘電特性、低誘電正接性に優れ、電子機器用プリント配線板として有用である。 A prepreg obtained by impregnating or coating a base material with the thermosetting resin composition of the present invention and a laminate produced by laminating the prepreg are Tg, copper foil adhesion, heat resistance, moisture resistance. Excellent in heat resistance, flame retardancy, heat resistance with copper (T-300), low dielectric properties, low dielectric loss tangent, and useful as a printed wiring board for electronic equipment.
(A):ビス(4−マレイミドフェニル)メタンに関するピーク
(B):化学式(11)に示す反応生成物に関するピーク
(C):化学式(12)に示す反応生成物に関するピーク
(A): peak related to bis (4-maleimidophenyl) methane (B): peak related to the reaction product shown in chemical formula (11) (C): peak related to the reaction product shown in chemical formula (12)
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JP2012021098A (en) * | 2010-07-15 | 2012-02-02 | Hitachi Chem Co Ltd | Thermosetting resin composition, prepreg using the same, and laminate using the prepreg |
JP2012111930A (en) * | 2010-11-01 | 2012-06-14 | Hitachi Chemical Co Ltd | Thermocurable resin composition, prepreg using the thermocurable resin composition, laminated plate, and printed wiring board |
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JPS6271643A (en) * | 1985-09-26 | 1987-04-02 | 住友ベークライト株式会社 | Manufacture of laminated board for printed circuit |
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JP2008111096A (en) * | 2006-10-03 | 2008-05-15 | Hitachi Chem Co Ltd | Thermosetting resin composition and prepreg and laminate obtained with the same |
JP2008214602A (en) * | 2007-02-07 | 2008-09-18 | Mitsubishi Gas Chem Co Inc | Prepreg and laminate |
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JP2008111096A (en) * | 2006-10-03 | 2008-05-15 | Hitachi Chem Co Ltd | Thermosetting resin composition and prepreg and laminate obtained with the same |
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JP2012111930A (en) * | 2010-11-01 | 2012-06-14 | Hitachi Chemical Co Ltd | Thermocurable resin composition, prepreg using the thermocurable resin composition, laminated plate, and printed wiring board |
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