JP2010054561A - Photosensitive composition for protective film and color filter using the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition for a protective film, having good adhesiveness to a color layer, high transmittance, excellent flatness and good durability when a transparent electrode is formed, and to provide a color filter having the protective film formed thereon. <P>SOLUTION: The photosensitive composition for a protective film comprises (A) a binder resin, (B) a compound having an ethylenically unsaturated bond, (C) a photopolymerization initiator, and (D) a solvent, wherein the compound (B) having an ethylenically unsaturated bond has an equivalent of the ethylenically unsaturated bonds of from 90 g/eq to 450 g/eq, the number of ethylenically unsaturated double bonds in one molecule of the compound having an ethylenically unsaturated bond is from 2 to 4, and the binder resin (A) is an alkali-soluble resin having a weight average molecular weight of from 10,000 to 20,000. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a color filter used in a liquid crystal display, a plasma display, an electroluminescence panel, a color video camera, and the like, and a photosensitive composition for a protective film that can be used in the color filter.

  Color liquid crystal display devices are rapidly spreading mainly in computer terminal display devices and television image display devices. The color filter is an indispensable important component for color display of a liquid crystal display device. In recent years, there has been a high demand for higher image quality in this liquid crystal display device, and a liquid crystal display device having high contrast, a high viewing angle, and high-speed response has appeared.

  Therefore, there is a demand for higher contrast and improved flatness of the color filter. As for flatness, there is an aim of reducing the alignment disorder of the liquid crystal by flattening the color filter and improving the contrast as the liquid crystal panel. As a method for producing a color filter, it is known to use a colored photosensitive composition in which a pigment dispersion is mixed with a photosensitive composition. A colored photosensitive composition is applied, dried, exposed and developed to form a fine pattern to produce a color filter.

  In the case of using a colored photosensitive composition, a black matrix is formed, and then a colored portion is formed by patterning, so that a portion that overlaps with the pattern of the black matrix and the colored pixel is generated. A level difference occurs in the overlapping portion, and the flatness of the color filter is lost. As a method for reducing the level difference, the film thickness of the black matrix is reduced, that is, the black pigment concentration in the photosensitive composition for black matrix is increased to form a fine pattern. Moreover, control of the pattern shape of a black mat risk, control of the width of the overlapping portion between the black matrix and the colored pixel pattern, and the like can be given.

In a photosensitive composition having an increased pigment concentration, adhesion and chemical resistance are lowered. Therefore, Patent Document 1 proposes a method of forming a protective film on a black matrix or a colored pixel as a color filter having flatness, adhesion, and chemical resistance. In Patent Document 2, a thermosetting protective film is proposed. However, there is a problem that the thermosetting protective film cannot form a pattern, and the protective film is formed even in an unnecessary portion. In patent document 3, the photocurable protective film composition which mix | blended the epoxy resin in the photocurable protective film composition is proposed. In this proposal, if the amount of the epoxy resin added is increased in order to improve the adhesion, developability and flatness may be deteriorated. Moreover, in patent document 4, the material excellent in the peelability of the film | membrane after hardening is designed by prescribing | regulating the quantity of the ethylenically unsaturated group in the thermosetting composition for protective films. This means that when a defect in the protective film occurs after the formation of the protective film and the defect inspection, it can be promptly peeled off and repaired. That is, the design is such that the adhesion to the colored layer is lowered and the chemical resistance is weakened.
Japanese Patent No. 3575095 JP 2007-186542 A Japanese Patent No. 3735984 JP 2008-52249 A

  The present invention is for a protective film having good adhesion to a colored layer, high transmittance, excellent flatness, and good resistance (generation of wrinkle resistance) when a transparent electrode is formed on a protective layer. It is an object of the present invention to provide a color filter having a protective film formed using the photosensitive composition and the photosensitive composition for the protective film.

The present invention relates to a photosensitive composition for a protective film comprising (A) a binder resin, (B) a compound having an ethylenically unsaturated bond, (C) a photopolymerization initiator, and (D) a solvent.
The ethylenically unsaturated double bond in one molecule of the compound having an ethylenically unsaturated bond, wherein the compound having an ethylenically unsaturated bond (B) has an ethylenically unsaturated bond equivalent of 90 g / eq or more and 450 g / eq or less. Is a photosensitive composition for a protective film, wherein the binder resin (A) is an alkali-soluble resin and has a weight average molecular weight of 10,000 to 20,000.

  The present invention also provides the photosensitive composition for protective film according to the invention, wherein the photopolymerization initiator (C) is an α-aminoketone initiator.

  Moreover, the present invention is characterized in that in the photosensitive composition for a protective film according to the above invention, the photopolymerization initiator (C) is contained in an amount of 4% to 30% in the solid content of the protective film photosensitive composition. It is the photosensitive composition for protective films.

  In the photosensitive composition for a protective film according to the present invention, the viscosity of the compound (B) having an ethylenically unsaturated bond is from 50 mPa · s / 25 ° C. to 1000 mPa · s / 25 ° C. Is a photosensitive composition for a protective film.

  Moreover, this invention is a photosensitive composition for protective films by the said invention, 1.0 micrometer or more and 4.0 micrometer of photosensitive composition for protective films of any one of Claims 1-4 on a color filter. The color filter is characterized in that a protective film is formed through coating, drying, exposure, development, and hardening processes.

  Further, the present invention is the color filter according to the above invention, wherein the protective film photosensitive composition is applied to the color filter by 1.5 μm, and the protective film is formed through drying, exposure, development, and hardening processes. The color filter is characterized by having a step of 0.3 μm or less.

By using the photosensitive composition for a protective film of the present invention, it is possible to provide a protective film having good adhesion to the underlying colored layer and at the same time having good transmittance and flatness. In addition, a good protective film can be provided in terms of chemical resistance. Moreover, a favorable protective layer can be provided also about the tolerance in the case of forming a transparent electrode on a protective layer.
In addition, a color filter with good flatness can be formed, and it may be used as a color filter used in a liquid crystal display, a plasma display, an electroluminescence panel, a color video camera, etc. and its peripheral material. There is. Furthermore, according to the present invention, it can also be used as an interlayer insulating film for protecting the TFT array element, can reduce the difference in electrical characteristics between the color filter side and the TFT array side, and can also be used to eliminate display unevenness. is there.

Hereinafter, embodiments of the present invention will be described in detail.
In view of the above problems, the present invention is earnest in paying attention to (A) a binder resin, (B) a compound having an ethylenically unsaturated bond, and (C) a photopolymerization initiator in the photosensitive composition for a protective film. As a result of research, it has been achieved and has solved the above problems.

  The (A) binder resin of the present invention is an alkali-soluble resin. Since it is alkali-soluble, (A) as binder resin, acrylic acid having carboxylic acid, methacrylic acid, itaconic acid, crotonic acid, vinyl benzoic acid or caprolactone adduct of (meth) acrylic acid, hydroxyalkyl (meth) acrylate Examples thereof include copolymers containing an acid anhydride such as phthalic anhydride added thereto.

  In order to adjust other properties, a ternary or higher multi-component copolymer may be used by using a third component comonomer. Such comonomers include methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, benzyl methacrylate, cyclohexyl methacrylate, lauryl methacrylate, hydroxyethyl methacrylate, hydroxypropyl methacrylate, ethoxyethyl methacrylate, glycidyl methacrylate, dimethylaminoethyl methacrylate, benzyl acrylate , Methyl acrylate, ethyl acrylate, butyl acrylate, hydroxymethyl acrylate, cyclohexyl acrylate, vinyl acetate, tetrahydrofurfuryl acrylate, N-vinylpyrrolidone, propyl acrylate, hydroxyethyl acrylate, hydroxypropyl acrylate, etc. But not limited to this, it can be copolymerized if used.

  Moreover, you may use the copolymer containing the monomer which has N-substituted maleimide and an acidic functional group. N-substituted maleimides include cyclohexylmaleimide, phenylmaleimide, methylmaleimide, ethylmaleimide, n-butylmaleimide, laurylmaleimide and the like. Of these, cyclohexylmaleimide or phenylmaleimide is particularly preferable because of its good adhesion to a transparent substrate and developability.

  The molecular weight (weight average molecular weight) of the (A) binder resin of the present invention is preferably from 10,000 to 20,000. When the molecular weight is 10,000 or less, pinholes (white spots) and film uniformity are deteriorated when a coating film is formed. Furthermore, it is difficult to control the molecular weight. On the other hand, when the molecular weight exceeds 20000, the step formed by the black matrix and the colored layer follows and the flatness deteriorates. The molecular weight of the binder resin is more preferably in the range of 10,000 to 15,000.

  (B) As the compound having an ethylenically unsaturated bond, ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, tetramethylene glycol Di (meth) acrylate, dicyclopentanyl diacrylate, EO-modified bisphenol A dimethacrylate, methoxylated cyclohexyl diacrylate, caprolactone-modified hydroxypivalic acid neopentyl glycol diacrylate, neopentyl glycol-modified trimethylolpropane diacrylate, trimethylolpropane Such as tri (meth) acrylate, trimethylolethane tri (meth) acrylate, glycerol (meth) acrylate, etc. Include acrylic acid esters, but is not necessarily limited thereto. These can be used alone or in combination of two or more.

  (B) As for the viscosity of the compound which has an ethylenically unsaturated bond, the range of 50 mPa * s / 25 degreeC or more and 1000 mPa * s / 25 degrees C or less is desirable. If it is 50 mPa · s / 25 ° C. or less, tackiness is generated in the coated film, and foreign matter tends to adhere to the surface of the coated film. Furthermore, fluidity remains in the coated film after application, and unevenness occurs due to pre-baking or the like. On the other hand, when the viscosity is 1000 mPa · s / 25 ° C. or higher, the fluidity of the coating film is poor, the level difference between the black matrix and the colored layer is followed, and the flatness is poor.

  Furthermore, (B) the ethylenically unsaturated bond equivalent of the compound which has an ethylenically unsaturated bond can use 90g / eq or more and 450g / eq or less optimally. If it is 90 g / eq or less, since the number of ethylenically unsaturated bonds increases, the film shrinkage ratio after the exposure process and post-baking increases, and the adhesion between the protective film and the underlying layer decreases. When the ethylenically unsaturated bond equivalent is 450 g / eq or more, sufficient curing does not proceed and the film hardness is lowered. Therefore, when a transparent conductive film such as ITO (indium tin oxide) is formed on the protective film, it is transparent. There is a problem that wrinkles are generated on the surface of the protective film following the contraction of the conductive film.

(C) Examples of the photopolymerization initiator include acetophenone, 2,2′-diethoxyacetophenone, p-dimethylacetophenone, p-dimethylaminopropiophenone, dichloroacetophenone, trichloroacetophenone, p-tert-butylacetophenone, and the like. Acetophenones, benzophenone, 2-chlorobenzophenone, benzophenones such as p, p'-bisdimethylaminobenzophenone, benzoin ethers such as benzyl, benzoin, benzoin methyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyldimethyl ketal, thioxanthone Sulfur compounds such as 2-chlorothioxanthone, 2,4-diethylthioxanthone, 2-methylthioxanthone, 2-isopropylthioxanthone, Anthraquinones such as ethyl anthraquinone, octamethylanthraquinone, 1,2-benzanthraquinone, 2,3-diphenylanthraquinone, 2,4-trichloromethyl- (4′-methoxyphenyl) -6-triazine, 2,4-trichloromethyl Triazines such as-(4'-methoxynaphthyl) -6-triazine, 2,4-trichloromethyl- (piperonyl) -6-triazine, 2,4-trichloromethyl- (4'-methoxystyryl) -6-triazine , Organic peroxides such as azobisisobutyronitrile, benzoyl peroxide, cumene peroxide, thiol compounds such as 2-mercaptobenzoimidazole, 2-mercaptobenzoxazole, 2-mercaptobenzothiazole, etc. It is not limited to these Yes. These photopolymerization initiators can be used alone or in combination of two or more. From the viewpoint of transparency and photosensitivity, it is desirable to use α-aminoacetophenone.

(C) As content of a photoinitiator, 4 to 30% is optimal in the photosensitive composition solid content for protective films. If the photopolymerization initiator is 4% or less, sufficient sensitivity is insufficient and a pattern cannot be formed. When the photopolymerization initiator is 30% or more and 30% or more, the transparency of the protective film is lost due to coloring by the initiator.

Moreover, you may make the photosensitive composition for protective films of this invention contain a well-known solvent and a well-known additive as needed.
Examples of the solvent (D) include cyclohexanone and propylene glycol monomethyl ether acetate, but are not limited thereto. When the solvent is used, the amount (% by weight) of the solvent is not particularly limited, but is preferably 50 to 1000%, more preferably 70 to 900%, based on the solid content weight of the photocurable resin composition. Most preferably, it is 80 to 800%.

  Others, for example, thermal polymerization inhibitors, inorganic pigments, silane coupling agents, dyes, fluorescent brighteners, yellowing inhibitors, antioxidants, antifoaming agents, deodorants, fragrances, bactericides, antibacterial agents In addition, a fungicide solvent or the like can be used as necessary.

Here, the case where a protective film is formed on a color filter will be described with reference to FIG. In FIG. 1, a color filter 1 of the present invention includes a transparent substrate 2, a black matrix 3, a red pixel (4-1), a green pixel (4-2), and a blue pixel (4) formed on the substrate 2. 3), a protective film 5 is formed on the colored layer 4 with the photosensitive composition for protective film of the present invention, and a transparent electrode layer 6 to be a transparent electrode is formed thereon. It has been done.

As the transparent substrate 2 constituting the color filter 1, glass, a plastic plate, a film, or the like can be used. In recent years, plastic substrates having excellent permeability and chemical resistance have been proposed, but generally alkali-free glass having a low coefficient of thermal expansion and excellent dimensional accuracy at high temperatures is widely used.
Examples of the transparent substrate include a glass substrate, a silicon substrate, a copper plate, and an organic polymer film. Examples of the organic polymer film include synthetic resin films made of polyester resin, diacetate resin, triacetate resin, acrylic resin, polycarbonate resin, polyvinyl chloride resin, polyimide resin, cellophane, celluloid, and the like.

  The plurality of pixels are shown as a red pixel (4-1), a green pixel (4-2), and a blue pixel (4-3) in FIG. Moreover, the black matrix 3 can also be provided as needed. The black matrix 3, the red pixel (4-1), the green pixel (4-2), and the blue pixel (4-3) are combined to form a colored layer 4 here.

  The black matrix 3 provided on the transparent substrate 2 is provided between pixels of each color and outside the formation region of the colored layer 4 for the purpose of preventing a decrease in contrast due to light leakage. Such a black matrix 3 is formed by patterning a multilayer vapor-deposited thin film of chromium and chromium oxide, or by a normal photolithography method using a resin BM resist in which a light-shielding pigment such as carbon black is dispersed. It can be formed by a method or the like.

The plurality of pixels can be formed in a predetermined pattern shape by photolithography using a pigment dispersion resist for each color. That is, a photosensitive coloring composition containing a pigment adjusted to express a desired color is applied on the transparent substrate 2, and pattern exposure and development are performed to form a first color pattern. It is possible to obtain a target pixel by sequentially repeating this process for a predetermined number of colors. Here, three of red pixel (4-1), green pixel (4-2), and blue pixel (4-3) are obtained. The colors are formed sequentially.
In addition to the above method, a printing method, an ink jet method, a transfer method, or a method including the above-described photolithography method may be combined.

  Examples of the pigment used in the colored layer include a red pigment: C.I. I. Pigment Red 254 (“Ilgar Forred B-CF” manufactured by Ciba Specialty Chemicals), C.I. I. Pigment Red 177 (“Chromophthal Red A2B” manufactured by Ciba Specialty Chemicals); Green pigment: C.I. I. Pigment Green 36 (“Lionol Green 6YK” manufactured by Toyo Ink), C.I. I. Pigment Yellow 150 (“Funchon First Yellow Y-5688” manufactured by Bayer); blue pigment: C.I. I. Pigment Blue 15 (“Rionol Blue ES” manufactured by Toyo Ink), C.I. I. And CI Pigment Violet 23 ("Paliogen Violet 5890" manufactured by BASF).

  The photosensitive composition for a protective film of the present invention is uniformly applied on a substrate by a known method such as roll coating, spin coating, spray coating, slit coating, and the like, and dried to form a protective film. As the coating apparatus, a known coating apparatus can be used, and examples thereof include a spin coater, an air knife coater, a roll coater, a bar coater, a curtain coater, a gravure coater, and a comma coater. Here, an example of forming on the colored layer 4 is described.

The drying temperature when the protective film photosensitive composition is applied on the colored layer is preferably 10 ° C. or higher, more preferably 12 ° C. or higher, particularly preferably 15 ° C. or higher, most preferably 20 ° C. or higher, The temperature is preferably less than 100 ° C, more preferably 90 ° C or less, particularly preferably 60 ° C or less, and most preferably 50 ° C or less.
The drying time is preferably 30 seconds or more, more preferably 1 minute or more, particularly preferably 2 minutes or more, and preferably 10 minutes or less, more preferably 8 minutes or less, particularly preferably 5 minutes or less. Drying may be performed under reduced pressure or normal pressure, but reduced pressure is preferred. Moreover, although it may carry out in air or in an inert gas, it is preferably in an inert gas.

Next, the coating film is exposed with actinic rays through a predetermined photomask.
The actinic ray used for exposure is not particularly limited as long as the protective film photosensitive composition of the present invention can be cured. Examples of the active light include visible light, ultraviolet light, and laser light. Examples of the light source include sunlight, a high-pressure mercury lamp, a low-pressure mercury lamp, a metal halide lamp, and a semiconductor laser. Further, when the pattern is formed using a mask, the exposure amount is not particularly limited, but is preferably 20 to 300 mJ / cm ² .

  In addition, when exposing the coating film with actinic rays through a photomask, it is formed by exposure using a halftone mask in which an ITO film or a metal thin film is deposited on a part of the opening of the photomask. Also good. In that case, the protective layer has a film thickness difference between the portions corresponding to the halftone portion and the non-halftone portion of the photomask.

Subsequently, the unexposed portion is removed with a developer, and development is performed. Examples of the developer used for the development include the above-described organic solvents, water having a pH of 4 to 11, and the like, but it is preferable to use water or an alkaline aqueous solution in consideration of the environment.
As the alkaline aqueous solution, for example, an aqueous solution of an inorganic salt such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, or sodium bicarbonate, or an aqueous solution of an organic salt such as hydroxytetramethylammonium or hydroxytetraethylammonium can be used. . These can be used alone or in combination of two or more kinds, and a surfactant such as an anionic surfactant, a cationic surfactant, an amphoteric surfactant and a nonionic surfactant can be added and used.
As a developing method, there are a dip method and a shower method, but the shower method is preferable. The temperature of the developer is preferably 25 to 40 ° C. The development time is appropriately determined according to the film thickness and the solubility of the resist.

  Moreover, in order to ensure hardening more, you may heat (bake) as needed. When baking is performed, the baking temperature is preferably 100 to 250 ° C, more preferably 150 to 240 ° C, and particularly preferably 180 to 230 ° C. The baking time is 5 minutes to 6 hours, preferably 15 minutes to 4 hours, particularly preferably 30 minutes to 3 hours. The baking may be performed under reduced pressure or normal pressure, but reduced pressure is preferred. Moreover, although it may carry out in air or in an inert gas, it is preferably in an inert gas.

  After forming the protective film 5, a transparent electrode layer or the like can be formed by a general film forming method such as a sputtering method, a PVD method such as a vacuum evaporation method, or a CVD method.

  The protective film 5 imparts flatness of the color filter and plays a very important role in improving the contrast of the liquid crystal panel. When the photosensitive composition for a protective film is coated at 1.5 μm, the light transmittance at 400 nm is desirably 90% or more, and more preferably 95% or more. When the transmittance at 400 nm is 95% or less, the hue and brightness of the color filter are lowered.

  Further, the step of the color filter after applying the photosensitive composition for a protective film of the present invention on the color filter so as to have a thickness of 1.5 μm and forming the protective film through drying, exposure, development, and post-baking steps is 0. It is preferable that it is 3 μm or less. More preferably, the step is 0.1 μm or less. The lower the step, the better the contrast of the liquid crystal panel.

  As the film thickness when the protective film 5 is formed on the color filter using the photosensitive composition for protective film of the present invention, 1.0 μm or more and 4.0 μm or less can be optimally used. When the thickness is 1.0 μm or less, the step of the color filter made of the colored layer cannot be sufficiently reduced. On the other hand, when the film thickness is 4.0 μm or more, it is difficult to uniformly apply the coating film.

When the protective film 5 is formed on the color filter using the photosensitive composition for protective film of the present invention, a plurality of layers may be laminated in order to improve flatness.
If necessary, after forming the protective layer, the gas barrier layer may be formed by a PVD method such as a sputtering method or a vacuum evaporation method, or a CVD method.

  Examples of the gas barrier layer include inorganic oxides such as silicon oxide, silicon oxynitride, aluminum oxide, titanium oxide, tantalum oxide, zinc oxide, magnesium oxide, tin oxide, and indium oxide alloy; silicon nitride, aluminum nitride, titanium nitride, carbonized An inorganic nitride such as silicon nitride; a metal such as aluminum, silver, tin, chromium, nickel, titanium, or the like can be used.

  The present invention is not limited to the above embodiment. The said embodiment is an illustration and what show | plays the same effect is included by the technical scope of this invention.

Hereinafter, the present invention will be specifically described with reference to examples.
<Example 1>
[Synthesis of alkali-soluble binder resin (1)]
In a five-necked reaction vessel with an internal volume of 2 liters, 800 g of propylene glycol monomethyl ether acetate (PGMAc), 140 g of benzyl methacrylate (BzMA), 30 g of methacrylic acid (MAA), 30 g of hydroxyethyl methacrylate (HEMA), azobisisobuty 4 g of ronitrile (AIBN) was added and heated at 80 ° C. for 6 hours while blowing nitrogen to obtain (A) an alkali-soluble binder resin (1) solution.
(A) The weight average molecular weight of alkali-soluble binder resin (1) was 12000.

[Preparation of photosensitive composition (1) for protective film]
(A) Alkali-soluble binder resin (1): 100 parts by weight (B) Ethylenically unsaturated compound: 20 parts by weight EO-modified bisphenol A methacrylate (BPE-500: manufactured by Shin-Nakamura Chemical Co., Ltd.)
(Double bond equivalent: 402 g / eq, double bond number: 2, viscosity: 400 mPa · s / 25 ° C.) (C) Photopolymerization initiator: 16 parts by weight Irgacure 907 (manufactured by Ciba Specialty Chemicals)
(D) Cyclohexanone: 200 parts by weight were prepared in the above ratio to obtain a photosensitive composition (1) for a protective film.

[Preparation of each color pigment dispersion resist]
The following were used for the colorant which colors each color pigment dispersion resist (photosensitive coloring composition containing a pigment) used for formation of the colored layer of a color filter.
Colorant red pigment: C.I. I. Pigment Red 254 (“Ilgar Forred B-CF” manufactured by Ciba Specialty Chemicals) and C.I. I. Pigment Red 177 (“Chromophthal Red A2B” manufactured by Ciba Specialty Chemicals)
Green pigment: C.I. I. Pigment Green 36 (“Lionol Green 6YK” manufactured by Toyo Ink) and C.I. I. Pigment Yellow 150 (Bayer's “Funcheon First Yellow Y-5688”)
Blue pigment: C.I. I. Pigment Blue 15 (“Rionol Blue ES” manufactured by Toyo Ink) C.I. I. Pigment Violet 23 (manufactured by BASF “Paliogen Violet 5890”)
[Preparation of red pigment dispersion resist]
-Dispersion A mixture having the following composition was uniformly stirred and mixed, then dispersed in a sand mill for 5 hours using a glass bead having a diameter of 1 mm, and then filtered through a 5 m filter to obtain a red pigment dispersion.

Red pigment: C.I. I. Pigment Red 254... 18 parts by weight red pigment: C.I. I. Pigment Red 177 2 parts by weight acrylic varnish (solid content 20%) ... 108 parts by weight, red pigment dispersion resist, and then uniformly mix the following composition After stirring and mixing, the mixture was filtered through a 5 μm filter to obtain a red pigment dispersion resist.

The above dispersion ... 150 parts by weight Trimethylolpropane triacrylate ... 13 parts by weight (Shin Nakamura Chemical) "NK ester ATMPT"
Photopolymerization initiator ... 3 parts by weight ("Irgacure 907" manufactured by Ciba Specialty Chemicals)
Sensitizer ("EAB-F" manufactured by Hodogaya Chemical Co., Ltd.) ... 1 part by weight cyclohexanone ... 253 weight Part [Preparation of green pigment dispersion resist]
-Prepared by the same method as the red dispersion so that the dispersion composition had the following composition.

Green pigment: C.I. I. Pigment Green 36 ... 16 parts by weight Yellow pigment: C.I. I. Pigment Yellow 150 ... 8 parts by weight acrylic varnish (solid content 20%) ... 102 parts by weight / green pigment dispersion resist Thereafter, a mixture having the following composition is made uniform After stirring and mixing, the mixture was filtered through a 5 μm filter to obtain a green pigment dispersion resist.

The above dispersion ... 150 parts by weight Trimethylolpropane triacrylate 14 parts by weight (Shin Nakamura Chemical) "NK ester ATMPT"
Photopolymerization initiator: 4 parts by weight (“Irgacure 907” manufactured by Ciba Specialty Chemicals)
Sensitizer ("EAB-F" manufactured by Hodogaya Chemical Co., Ltd.) ... 2 parts by weight cyclohexanone ... 257 weights Part [Preparation of blue pigment dispersion resist]
-Prepared by the same method as the blue dispersion so that the dispersion composition was as follows.

Blue pigment: C.I. I. Pigment Blue 15... 50 parts by weight purple pigment: C.I. I. Pigment Violet 23 ··· 2 parts by weight dispersant ("Solce Birds 20000" manufactured by Zeneca) ······ 6 parts by weight acrylic varnish (solid content 20%) ········· 200 parts by weight Blue pigment dispersion resist Thereafter, a mixture having the following composition was stirred and mixed so as to be uniform, and then filtered through a 5 μm filter to obtain a blue pigment dispersion resist.

The above dispersion ... 150 parts by weight Trimethylolpropane triacrylate ... 19 parts by weight (Shin Nakamura Chemical) "NK ester ATMPT"
Photopolymerization initiator: 4 parts by weight (“Irgacure 907” manufactured by Ciba Specialty Chemicals)
Sensitizer ("EAB-F" manufactured by Hodogaya Chemical Co., Ltd.) ... 2 parts by weight cyclohexanone ... 214 weights Part [Create color filter]
A colored layer was formed using each of the obtained color pigment dispersion resists. In Example 1, a red pigment dispersion resist was applied to a glass substrate by spin coating so that the finished film thickness was 1.8 μm. After drying at 90 ° C. for 5 minutes, light from a high-pressure mercury lamp was irradiated through a striped photomask for forming a colored layer at 300 mJ / cm ² and developed with an alkali developer for 60 seconds. Then, it baked at 230 degreeC for 30 minutes.

Next, the green pigment dispersion resist was similarly applied by spin coating so that the finished film thickness was 1.8 μm. After drying at 90 ° C. for 5 minutes, green pixels were obtained by exposing and developing through a photomask so that a pattern was formed adjacent to the red pixels. Then, it baked at 230 degreeC for 30 minutes.
Further, in the same manner as for red and green, a blue pixel dispersed resist having a finished film thickness of 1.8 μm and adjacent to the red and green pixels was obtained. Then, it baked at 230 degreeC for 30 minutes. As a result, a colored layer composed of striped colored pixels of three colors of red, green, and blue was obtained on the glass substrate.

The alkaline developer has the following composition.
Sodium carbonate ... 1.5wt%
Sodium bicarbonate ..... 0.5% by weight
Anionic surfactant (Kao / Perylex NBL) ... 8.0% by weight
Water: 90.0% by weight
The photosensitive composition for protective film (1) of the present invention was spin-coated on a glass substrate on which the above-mentioned colored layer was formed so as to have a film thickness of 1.5 μm, and dried at 90 ° C. for 5 minutes. 150 mJ / cm ^{2 was} irradiated with light from a high-pressure mercury lamp through a photomask for forming a protective film. In addition, it exposed with the space | interval (exposure gap) of a photomask and a glass substrate being 100 micrometers. Then, it developed using the developing solution similar to preparation of a colored layer. After washing with water, baking was performed at 230 ° C. for 30 minutes to form a protective film on the colored layer.
On this, indium tin oxide (ITO) was formed as a transparent electrode layer so as to have a thickness of 1500 angstrom by a sputtering method, and the color filter of the present invention was obtained.

<Example 2>
[Synthesis of Alkali-soluble Binder Resin (2)]
In a five-necked reaction vessel with an internal volume of 2 liters, 800 g of propylene glycol monomethyl ether acetate (PGMAc), 30 g of glycidyl methacrylate (GMA), 110 g of benzyl methacrylate (BzMA), 30 g of methacrylic acid (MAA), hydroxyethyl methacrylate (HEMA) 30 g and azobisisobutyronitrile (AIBN) 4.0 g were added and heated at 80 ° C. for 6 hours while blowing nitrogen to obtain a polymer solution of GMA.

  Next, 36 g of acrylic acid (AA), 0.05 g of methoquinone (MQ) and 0.5 g of triphenylphosphine (TPP) are added to the obtained polymer solution of GMA and heated at 100 ° C. for 24 hours while blowing air. Then, an acrylic acid adduct (A) alkali-soluble binder resin (2) solution of GMA resin was obtained. (A) The weight average molecular weight of alkali-soluble binder resin (2) was 15000.

[Preparation of Photosensitive Composition (2) for Protective Film]
(A) Alkali-soluble binder resin (2): 100 parts by weight (B) Ethylenically unsaturated compound: 20 parts by weight Trimethylolpropane triacrylate (V # 295; manufactured by Osaka Organic Chemical Industry Co., Ltd.)
(Double bond equivalent: 98.8 g / eq, double bond number: 3, viscosity: 75 to 125 mPa · s / 25 ° C.)
(C) Photopolymerization initiator: 2.5 parts by weight Irgacure 907 (manufactured by Ciba Specialty Chemicals)
(D) Cyclohexanone: 200 parts by weight were prepared in the above ratio to obtain a photosensitive composition (2) for a protective film.

  The protective film formation method was performed in the same manner as in Example 1.

<Example 3>
[Preparation of photosensitive composition for protective film (3)]
(A) Alkali-soluble binder resin (1): 100 parts by weight (B) Ethylenically unsaturated compound: 20 parts by weight Neopentyl glycol-modified trimethylolpropane diacrylate (KAYARAD R-604, manufactured by Nippon Kayaku Co., Ltd.)
(Double bond equivalent: 163 g / eq, number of double bonds: 2, viscosity: 200 to 400 mPa · s / 25 ° C.)
(C) Photopolymerization initiator: 2.5 parts by weight Irgacure 907 (manufactured by Ciba Specialty Chemicals)
(D) Cyclohexanone: 200 parts by weight were prepared in the above ratio to obtain a photosensitive composition (3) for a protective film.

  The protective film formation method was performed in the same manner as in Example 1.

<Example 4>
[Preparation of photosensitive composition for protective film (4)]
(A) Alkali-soluble binder resin (1): 100 parts by weight (B) Ethylenically unsaturated compound: 20 parts by weight Glycerin PO-added triacrylate (V # GPT: manufactured by Osaka Organic Chemical Industry Co., Ltd.)
(Double bond equivalent: 147.5 g / eq, number of double bonds: 3, viscosity: 50 to 100 mPa · s / 25 ° C.)
(C) Photopolymerization initiator: 2.5 parts by weight Irgacure 907 (manufactured by Ciba Specialty Chemicals)
(D) Cyclohexanone: 200 parts by weight were prepared in the above ratio to obtain a photosensitive composition for protective film (4).

  The protective film formation method was performed in the same manner as in Example 1.

<Example 5>
[Preparation of photosensitive composition for protective film (5)]
(A) Alkali-soluble binder resin (1): 100 parts by weight (B) Ethylenically unsaturated compound: 20 parts by weight EO-modified bisphenol A methacrylate (BPE-500: manufactured by Shin-Nakamura Chemical Co., Ltd.) (double bond equivalent: 402 g / eq, number of double bonds: 2, viscosity: 400 mPa · s / 25 ° C.)
(C) Photopolymerization initiator: 2.5 parts by weight Irgacure 907 (manufactured by Ciba Specialty Chemicals)
(D) Cyclohexanone: 200 parts by weight were prepared in the above ratio to obtain a photosensitive composition for a protective film (5).

  The protective film formation method was performed in the same manner as in Example 1.

<Example 6>
[Synthesis of alkali-soluble binder resin (3)]
In a five-necked reaction vessel with an internal volume of 2 liters, 800 g of propylene glycol monomethyl ether acetate (PGMAc), 140 g of benzyl methacrylate (BzMA), 30 g of methacrylic acid (MAA), 30 g of hydroxyethyl methacrylate (HEMA), azobisisobuty 2 g of ronitrile (AIBN) was added and heated at 80 ° C. for 6 hours while blowing nitrogen to obtain (A) an alkali-soluble binder resin (3) solution.
(A) The weight average molecular weight of alkali-soluble binder resin (3) was 19000.

[Preparation of photosensitive composition for protective film (6)]
(A) Alkali-soluble binder resin (3): 100 parts by weight (B) Ethylenically unsaturated compound (B): 20 parts by weight Trimethylolpropane triacrylate (V # 295; manufactured by Osaka Organic Chemical Industry Co., Ltd.)
(Double bond equivalent: 98.8 g / eq, double bond number: 3, viscosity: 75 to 125 mPa · s / 25 ° C.)
(C) Photopolymerization initiator: 2.5 parts by weight Irgacure 907 (manufactured by Ciba Specialty Chemicals)
(D) Cyclohexanone: 200 parts by weight were prepared in the above ratio to obtain a photosensitive composition for a protective film (6).

  The protective film formation method was performed in the same manner as in Example 1.

<Example 7>
[Preparation of photosensitive composition for protective film (7)]
(A) Alkali-soluble binder resin (1): 100 parts by weight (B) ethylenically unsaturated compound: 20 parts by weight ditrimethylolpropane tetraacrylate (double bond equivalent: 1178 g / eq, double bond number: 4, viscosity: 752 mPa · s / 25 ° C)
(C) Photopolymerization initiator: 2.5 parts by weight Irgacure 369 (manufactured by Ciba Specialty Chemicals)
(D) Cyclohexanone: 200 parts by weight were prepared in the above ratio to obtain a photosensitive composition for a protective film (7).

  The protective film formation method was performed in the same manner as in Example 1.

<Example 8>
Using the photosensitive composition for protective film (1) of Example 1, the protective layer was formed by spin-coating on the glass substrate on which the colored layer had been formed so that the film thickness was 2.5 μm. Otherwise, the same procedure as in Example 1 was performed.

<Example 9>
Using the photosensitive composition for protective film (1) of Example 1, spin coating was performed on a glass substrate on which a colored layer had been formed to a film thickness of 3.8 μm to form a protective layer. Otherwise, the same procedure as in Example 1 was performed.

<Comparative Example 1>
[Synthesis of alkali-soluble binder resin (4)]
In a 5-neck reaction vessel with an internal volume of 2 liters, 800 g of propylene glycol monomethyl ether acetate (PGMAc), 280 g of benzyl methacrylate (BzMA), 60 g of methacrylic acid (MAA), 60 g of hydroxyethyl methacrylate (HEMA), azobisisobuty 4 g of ronitrile (AIBN) was added and heated at 80 ° C. for 6 hours while blowing nitrogen to obtain (A) an alkali-soluble binder resin (4) solution.
(A) The weight average molecular weight of alkali-soluble binder resin (4) was 25000.

[Preparation of Photosensitive Composition (8) for Protective Film]
(A) Alkali-soluble binder resin (4): 50 parts by weight (B) Ethylenically unsaturated compound: 20 parts by weight Trimethylolpropane triacrylate (V # 295; manufactured by Osaka Organic Chemical Industry Co., Ltd.)
(Double bond equivalent: 98.8 g / eq, double bond number: 3, viscosity: 75 to 125 mPa · s / 25 ° C.)
(C) Photopolymerization initiator: 12 parts by weight OXE-02 (manufactured by Ciba Specialty Chemicals)
(D) Cyclohexanone: 250 parts by weight were prepared in the above ratio to obtain a photosensitive composition for a protective film (8).

  The protective film formation method was performed in the same manner as in Example 1.

<Comparative example 2>
[Synthesis of Alkali-soluble Binder Resin (5)]
In a 5-neck reaction vessel having an internal volume of 2 liters, 800 g of propylene glycol monomethyl ether acetate (PGMAc), 105 g of benzyl methacrylate (BzMA), 22.5 g of methacrylic acid (MAA), 22.5 g of hydroxyethyl methacrylate (HEMA), 8 g of azobisisobutyronitrile (AIBN) was added and heated at 80 ° C. for 6 hours while blowing nitrogen to obtain (A) an alkali-soluble binder resin (5) solution.
(A) The weight average molecular weight of alkali-soluble binder resin (5) was 8000.

[Preparation of Photosensitive Composition (9) for Protective Film]
(A) Alkali-soluble binder resin (5): 133 parts by weight (B) Ethylenically unsaturated compound: 20 parts by weight Trimethylolpropane triacrylate (V # 295; manufactured by Osaka Organic Chemical Industry Co., Ltd.)
(Double bond equivalent: 98.8 g / eq, double bond number: 3, viscosity: 75 to 125 mPa · s /
25 ° C)
(C) Photopolymerization initiator: 12 parts by weight Irgacure 907 (manufactured by Ciba Specialty Chemicals)
(D) Cyclohexanone: 180 parts by weight were prepared in the above ratio to obtain a photosensitive composition for a protective film (9).

The protective film formation method was performed in the same manner as in Example 1.
<Comparative Example 3>
[Preparation of photosensitive composition for protective film (10)]
(A) Alkali-soluble binder resin (1): 100 parts by weight (B) Ethylenically unsaturated compound: 20 parts by weight Pentaerythritol acrylate (KAYARAD PET-30: manufactured by Nippon Kayaku Co., Ltd.)
(Double bond equivalent: 98.8 g / eq, Double bond number: 3, Viscosity: 800-1300 mPa · s / 25 ° C.)
(C) Photopolymerization initiator: 12 parts by weight Irgacure 907 (manufactured by Ciba Specialty Chemicals)
(C) Cyclohexanone: 200 parts by weight were prepared in the above ratio to obtain a photosensitive composition for protective film (10).

The protective film formation method was performed in the same manner as in Example 1.
<Comparative example 4>
[Preparation of Photosensitive Composition (12) for Protective Film]
(A) Alkali-soluble binder resin (1): 100 parts by weight (B) Ethylenically unsaturated compound: 20 parts by weight Dipentaerythritol hexaacrylate (KAYARAD PET-30: manufactured by Nippon Kayaku Co., Ltd.)
(Double bond equivalent: 91.6 g / eq, double bond number: 6, viscosity: 5500-7500 mPa · s / 25 ° C.)
(C) Photopolymerization initiator: 12 parts by weight Irgacure 907 (manufactured by Ciba Specialty Chemicals)
(D) Cyclohexanone: 200 parts by weight were prepared in the above ratio to obtain a photosensitive composition for a protective film (12).
The protective film formation method was performed in the same manner as in Example 1.
<Comparative Example 5>
[Preparation of Photosensitive Composition for Protective Film (13)]
(A) Alkali-soluble binder resin (1): 100 parts by weight (B) Ethylenically unsaturated compound: 20 parts by weight Phenoxydiethylene glycol acrylate (KAYARAD R-564: manufactured by Nippon Kayaku Co., Ltd.)
(Double bond equivalent: 249 g / eq, double bond number: 1, viscosity: 10 to 35 mPa · s / 25 ° C.)
(C) Photopolymerization initiator: 12 parts by weight Irgacure 907 (manufactured by Ciba Specialty Chemicals)
(D) Cyclohexanone: 200 parts by weight were prepared in the above ratio to obtain a photosensitive composition (13) for a protective film.

The protective film formation method was performed in the same manner as in Example 1.
<Comparative Example 6>
[Preparation of Photosensitive Composition (15) for Protective Film]
(A) Alkali-soluble binder resin (1): 100 parts by weight (B) Ethylenically unsaturated compound: 20 parts by weight Pentaerythritol tetraacrylate (double bond equivalent: 88 g / eq, double bond number: 4, viscosity: 1200 mPa (S / 25 ° C.) (C) Photopolymerization initiator: 24 parts by weight Irgacure 907 (manufactured by Ciba Specialty Chemicals)
(D) Cyclohexanone: 200 parts by weight were prepared in the above ratio to obtain a photosensitive composition for a protective film (15).
The protective film formation method was performed in the same manner as in Example 1.
<Comparative Example 7>
[Preparation of photosensitive composition for protective film (16)]
(A) Alkali-soluble binder resin (1): 100 parts by weight (B) Ethylenically unsaturated compound: 20 parts by weight EO-modified bisphenol A methacrylate (BPE-900: manufactured by Shin-Nakamura Chemical Co., Ltd.)
(Double bond equivalent: 556 g / eq, number of double bonds: 2, viscosity: 490 mPa · s / 25 ° C.) (C) Photopolymerization initiator: 1.2 parts by weight Irgacure 907 (manufactured by Ciba Specialty Chemicals)
(D) Cyclohexanone: 200 parts by weight were prepared in the above ratio to obtain a photosensitive composition (16) for a protective film.
The protective film formation method was performed in the same manner as in Example 1.

<Comparative Example 8>
Using the photosensitive composition for protective film (1) of Example 1, spin coating was performed on a glass substrate on which a colored layer had been formed to a thickness of 0.8 μm to form a protective layer. Otherwise, the same procedure as in Example 1 was performed.

<Comparative Example 9>
Using the photosensitive composition for protective film (1) of Example 1, spin coating was performed on a glass substrate on which a colored layer had been formed to a thickness of 5.0 μm to form a protective layer. Otherwise, the same procedure as in Example 1 was performed.

  Table 1 shows (A) type of alkali-soluble binder resin, molecular weight, (B) equivalent weight of compound having an ethylenically unsaturated bond, number of double bonds, (C) photopolymerization initiator in Examples 1 to 7 above. This represents the type, blending amount, and the like, and the performance evaluation of the protective film. Table 1 shows the comparative examples 1 to 7.

［評価］
《密着性評価》
−密着性評価用基板作製―
実施例１記載のカラーフィルタの着色層の形成に用いる各色顔料分散レジストを用いて、カラス基板上に各色顔料分散レジストをスピンコートにより仕上り膜厚が１．８μｍとなるように塗布した。９０℃５分間乾燥の後、フォトマスクを使用せず、高圧水銀灯の光を３００ｍＪ／ｃｍ² 照射し、アルカリ現像液にて６０秒間現像した。その後、２３０℃３０分焼成した。
その後、本発明の保護膜用感光性組成物を上述の着色層が形成されたガラス基板上に膜厚が１．５μｍになるようにスピンコートし、９０℃で５分間乾燥した。
フォトマスクを使用せず、高圧水銀灯の光を１５０ｍＪ／ｃｍ² 照射した。その後、着色層の作製と同様の現像液を用いて現像をした。水洗を施したのち、２３０℃３０分焼成し
て保護層を着色層上に形成した。
着色層と保護層を積層した基板を１００マス試験法（ＪＩＳ−Ｋ５４００）で評価した。カッターで碁盤目状に刃を入れ、碁盤目にセロハンテープを貼り付け、剥離後の塗膜を確認し、着色層と保護層でハガレが発生しない物を○、ハガレが発生するものを×と評価した。
この際、カッターの切込みで発生する切込み周辺部のハガレについても、ハガレが発生した場合は、×と評価した。

[Evaluation]
<Evaluation of adhesion>
-Fabrication of adhesion evaluation substrate-
Using each color pigment dispersion resist used for forming the colored layer of the color filter described in Example 1, each color pigment dispersion resist was applied onto a crow substrate by spin coating so that the finished film thickness was 1.8 μm. After drying 90 ° C. 5 minutes, without using a photomask, the light of a high pressure mercury lamp 300 mJ / cm ² was irradiated, and developed for 60 seconds with an alkaline developing solution. Then, it baked at 230 degreeC for 30 minutes.
Thereafter, the photosensitive composition for a protective film of the present invention was spin-coated on the glass substrate on which the colored layer was formed so that the film thickness became 1.5 μm, and dried at 90 ° C. for 5 minutes.
Without using a photomask, the light from a high-pressure mercury lamp was irradiated at 150 mJ / cm ² . Then, it developed using the developing solution similar to preparation of a colored layer. After washing with water, the protective layer was formed on the colored layer by baking at 230 ° C. for 30 minutes.
The board | substrate which laminated | stacked the colored layer and the protective layer was evaluated by the 100 mass test method (JIS-K5400). Put a blade in a grid pattern with a cutter, affix cellophane tape on the grid, check the coating after peeling, ○ if there is no peeling in the colored layer and protective layer, and x if there is peeling. evaluated.
At this time, the peeling around the cut generated by the cutting of the cutter was evaluated as x when peeling occurred.

<Flatness>
The level difference of the substrate produced in Example 1 was measured, and a level difference of 0.5 μm or more was evaluated as x, a level of 0.3 μm or more and 0.5 μm or less was evaluated as Δ, and a level of 0.3 μm or less was evaluated as ◯.

"sensitivity"
The photosensitive composition for protective film of the present invention was spin-coated on a glass substrate so as to have a film thickness of 1.5 μm, and dried at 90 ° C. for 5 minutes. Using a pattern mask having a photomask opening of 50 μm, light from a high-pressure mercury lamp was irradiated at 100 mJ / cm ² . Then, it developed using the developing solution similar to preparation of a colored layer. At that time, the film thickness after the exposure was evaluated as x when the ratio of the remaining film after development was 75% or less, and the film with 75% or more was evaluated as ◯.

<ITO Wrinkles>
A substrate was prepared in the same manner as for the adhesion evaluation, and ITO (indium-tin oxide) was formed on the entire surface of the laminated film substrate of the colored layer and the protective film so as to have a thickness of 1500 angstrom by a sputtering method. In that case, it evaluated by the presence or absence of generation | occurrence | production of a wrinkle on a board | substrate. The thing which can be confirmed by reflection of a sodium lamp was evaluated as x, the thing which can be confirmed by microscopic observation as Δ, and the one without wrinkle as ○.

<< Transmissivity >>
A protective film photosensitive composition was applied to a glass substrate so as to have a thickness of 1.5 μm, and a protective film layer was formed under the same conditions as in Example 1. The transmittance of the protective film layer at a wavelength of 400 nm was measured by Olympus Corporation. Product: Measured using a microspectrophotometer OSP-200.
The transmittance of 90% or less was evaluated as x, 90% or more and 95% or less as Δ, and 95% or more as ○.

  In Table 3, the coating properties and flatness of the color filters formed with protective films of Examples 8 and 9 and Comparative Examples 8 and 9 were evaluated.

《塗布性》
ガラス基板のサイズを７３０ｍｍ×９２０ｍｍの基板に実施例１同様の着色層を設けたカラーフィルタ上に、保護膜感光性組成物を実施例８、９、比較例８、９の膜厚で塗布し、保護層を形成した基板のムラの確認を行った。ナトリウムランプの反射で見えるムラのものを×、ムラの無いものを○と評価した。

<Applicability>
A protective film photosensitive composition was applied in a thickness of Examples 8 and 9 and Comparative Examples 8 and 9 on a color filter in which the same color layer as that of Example 1 was provided on a substrate having a glass substrate size of 730 mm × 920 mm. Then, the unevenness of the substrate on which the protective layer was formed was confirmed. The unevenness seen by the reflection of the sodium lamp was evaluated as x, and the unevenness was evaluated as ○.

It is sectional drawing of the color filter by this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Color filter by this invention 2 ... Transparent substrate (glass substrate)
3 ... Black matrix 4 ... Colored layer 4-1 ... Red pixel 4-2 ... Green pixel 4-3 ... Blue pixel 5 ... Protective film 6 ... Transparent electrode layer

Claims (6)

In the photosensitive composition for a protective film comprising (A) a binder resin, (B) a compound having an ethylenically unsaturated bond, (C) a photopolymerization initiator, and (D) a solvent,
The ethylenically unsaturated double bond in one molecule of the compound having an ethylenically unsaturated bond, wherein the compound having an ethylenically unsaturated bond (B) has an ethylenically unsaturated bond equivalent of 90 g / eq or more and 450 g / eq or less. 2 or more and 4 or less, the (A) binder resin is an alkali-soluble resin, and the weight average molecular weight is 10,000 or more and 20000 or less, The photosensitive composition for protective films characterized by the above-mentioned.   The photosensitive composition for a protective film according to claim 1, wherein the (C) photopolymerization initiator is an α-aminoketone-based initiator.   3. The photosensitive composition for a protective film according to claim 1, wherein the photopolymerization initiator (C) is contained in an amount of 4% to 30% in the solid content of the protective film photosensitive composition. .   4. The viscosity of the compound (B) having an ethylenically unsaturated bond is 50 mPa · s / 25 ° C. or more and 1000 mPa · s / 25 ° C. or less. A photosensitive composition for a protective film.   The protective film photosensitive composition according to any one of claims 1 to 4 is applied on a color filter to a thickness of 1.0 µm to 4.0 µm, followed by drying, exposure, development, and a hardening step. The color filter characterized by forming.   The protective film photosensitive composition is applied to a color filter by 1.5 μm, and the step when the protective film is formed through drying, exposure, development, and hardening processes is 0.3 μm or less. The color filter according to claim 5.

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