JP2008051904A - Actuator, optical scanner and image forming apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an actuator which accurately detects the behavior of a mass part, and to provide an optical scanner and an image forming apparatus. <P>SOLUTION: The actuator 1 is so constituted that the behavior of a second mass section 25 is detected, on the basis of the variation in the resistance of resistor regions 411 and 421, first mass sections 21 and 22 are turned, while first elastic parts 26 and 27 are deformed torsionally; and accordingly, the second mass part 25 is turned, while second elastic parts 28 and 29 are deformed torsionally; the second elastic parts 28 and 29 are formed on body parts 281 and 291, and have high-conductivity regions 282 and 292 constituted of a material of conductivity higher than that of the boy sections 281 and 291, respectively; and the high-conductivity regions 282 and 292 shield electrical influence from the outside of the resistor regions 411 and 421, to the resistor regions 411 and 421. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to an actuator, an optical scanner, and an image forming apparatus.

In recent years, an actuator including a torsional vibrator formed by using a micromachining technique is known (for example, see Patent Document 1). Such an actuator can be used as, for example, an optical scanner for performing optical scanning such as a laser printer or a display.
For example, Patent Document 1 discloses an actuator including a one-degree-of-freedom vibration system torsional vibrator. Such an actuator has a structure in which a mirror (mass part) is supported by a torsion bar as a torsional vibrator of a one-degree-of-freedom vibration system. This structure is obtained by processing a Si single crystal substrate. An electrode is provided at a distance from the mirror. By applying a voltage (drive voltage) between the electrode and the mirror, an electrostatic attractive force is generated between them, and the torsion bar is twisted. Rotate the mirror while deforming.

  In such an actuator, a p-type diffused resistor is formed on the torsion bar. Then, while applying a voltage to the diffusion resistance, the voltage value at the diffusion resistance due to torsional deformation of the torsion bar is detected. Based on the detection result, the amount of change in the specific resistance value of the diffusion region is detected, and the rotation angle of the mirror is detected based on the result. By rotating the mirror based on such a detection result, the behavior of the mirror can be made desired.

  However, in the actuator according to Patent Document 1, the portion that generates the electrostatic attraction as described above and the diffusion resistance are connected via the silicon diffusion resistance having uniform conductivity, and thus are detected. For example, periodic fluctuations in the drive voltage may be mixed as noise in the voltage value. In this case, the detection accuracy (sensitivity) of the behavior of the mirror is lowered.

Japanese Patent Laid-Open No. 5-119280 (see paragraphs 0013, 0014, etc.)

  An object of the present invention is to provide an actuator, an optical scanner, and an image forming apparatus that can detect the behavior of a mass part with high accuracy.

Such an object is achieved by the present invention described below.
The actuator of the present invention includes a mass part,
A support part for supporting the mass part;
A connecting portion that includes at least one elastic portion that can be elastically deformed so that the mass portion can rotate with respect to the support portion, and that connects the support portion and the mass portion;
Drive means for rotationally driving the mass part;
Behavior detecting means for detecting the behavior of the mass part,
The elastic part has a main body part and a resistance region formed on the main body part,
The behavior detecting means detects the behavior of the mass part based on a change in the resistance value of the resistance region,
An actuator configured to rotate the mass portion while twisting and deforming the elastic portion by the operation of the driving means,
The elastic part has a highly conductive region formed on the main body part and made of a material having higher conductivity than the constituent material of the main body part, and the high conductive area is formed from the outside of the resistance area. It is configured to shield an electrical influence on the resistance region.
Thereby, it is possible to prevent noise from entering the resistance region from the outside. As a result, the behavior of the mass part can be detected with high accuracy.

In the actuator according to the aspect of the invention, it is preferable that the highly conductive region is formed so as to surround an outer periphery of the resistance region.
Thereby, the function as a shield of a highly conductive region can be improved.
In the actuator according to the aspect of the invention, it is preferable that the thickness of the high conductivity region is larger than the thickness of the resistance region.
Thereby, the function as a shield of a highly conductive region can be improved.

In the actuator of the present invention, one of the main body portion and the resistance region is made of p-type silicon, the other is made of n-type silicon, and the pn is interposed between the main body portion and the resistance region. Preferably, a junction is formed, and bias applying means for applying a bias to the conductive region is preferably provided so as to maintain the pn junction in a reverse bias state.
Thereby, current leakage from the resistance region to the main body portion of the elastic portion and current leakage from the main body portion of the elastic portion to the resistance region can be prevented. As a result, the detection accuracy of the behavior detection of the mass part can be improved.

In the actuator according to the aspect of the invention, it is preferable that the driving unit includes an electrode for driving by electrostatic attraction, and the minimum value of the potential of the electrode is substantially equal to the potential of the main body.
Thereby, while preventing leakage of current from the main body portion of the elastic portion to the resistance region, a desired electrostatic attraction can be generated and the mass portion can be stably rotated.
In the actuator according to the aspect of the invention, it is preferable that the mass portion, the support portion, and the connecting portion are integrally formed by processing a p-type or n-type silicon single crystal substrate.
As a result, an actuator having excellent mechanical strength and vibration characteristics can be provided.

In the actuator of the present invention, it is preferable that the highly conductive region is made of silicon having the same conductivity type as the silicon single crystal substrate and having impurities diffused at a higher concentration than the silicon single crystal substrate.
Thereby, any one of the mass part, the support part, and the connecting part and the highly conductive region can be ohmic-bonded, and a bias can be efficiently applied to the main body part.

In the actuator according to the aspect of the invention, each of the connecting portions includes a first mass portion, and the first mass portion and the support portion so that the first mass portion is rotatable with respect to the support portion. The first mass portion and the second mass portion so that the mass portion can be rotated with respect to the first mass portion as the second mass portion. A second elastic portion connecting the first elastic portion and the second elastic portion. The first elastic portion is twisted and deformed by the operation of the driving means. The first mass part is rotated while the second elastic part is rotated, and the second elastic part is rotated while the second elastic part is torsionally deformed. It is preferable that the part has the main body part and the resistance region.
Thus, the present invention can be applied to a two-degree-of-freedom vibration system actuator. Such an actuator can increase the rotation angle of the second mass unit while suppressing the rotation angle of the first mass unit. Therefore, when the resistance region is provided in the second elastic portion, it is possible to increase the resistance value change of the resistance region accompanying the rotation of the second mass portion (mass portion). As a result, it is possible to improve the detection accuracy of the mass part behavior detection.

In the actuator according to the aspect of the invention, the driving unit includes an electrode facing the first mass part with a space therebetween, and a voltage is applied between the electrode and the first mass part, thereby It is preferable that the mass part is rotated while an electrostatic attraction is generated between the electrode and the first mass part, and the elastic part is twisted and deformed.
Thereby, the required electrostatic attraction force required for the second mass part can be generated and the second mass part can be rotated while preventing leakage of current from the main body part of the elastic part to the resistance region. .

In the actuator according to the aspect of the invention, it is preferable that each of the electrode and the first mass portion has a comb-shaped portion and are arranged so as to mesh with each other.
Thereby, the rotation angle of the 1st mass part can be enlarged, and the rotation angle of the 2nd mass part can be enlarged in connection with this.
In the actuator of the present invention, the behavior detection unit is configured to detect a voltage value of the resistance region while applying a voltage to the resistance region, and detect a resistance value of the resistance region based on the result. The reverse bias applying means satisfies the relationship of Vb−Vs> Vpn, where Vb is the main body potential, Vpn is the diffusion potential of the pn junction, and Vs is the resistance potential of the resistance region. In addition, it is preferable to apply the bias.
Thereby, it is possible to more reliably prevent current leakage from the resistance region to the main body portion of the elastic portion and current leakage from the main body portion of the elastic portion to the resistance region.

The optical scanner of the present invention includes a mass part including a light reflecting part having light reflectivity,
A support part for supporting the mass part;
A connecting portion that includes at least one elastic portion that can be elastically deformed so that the mass portion can rotate with respect to the support portion, and that connects the support portion and the mass portion;
Drive means for rotationally driving the mass part;
Behavior detecting means for detecting the behavior of the mass part,
The elastic part has a main body part and a resistance region formed on the main body part,
The behavior detecting means detects the behavior of the mass part based on a change in the resistance value of the resistance region,
An optical scanner configured to scan the light reflected by the light reflecting portion by rotating the mass portion while twisting and deforming the elastic portion by the operation of the driving means,
The elastic part has a highly conductive region formed on the main body part and made of a material having higher conductivity than the constituent material of the main body part, and the high conductive area is formed from the outside of the resistance area. It is configured to shield an electrical influence on the resistance region.
Thereby, the behavior of the mass part is detected with high accuracy, and the mass part is driven based on the detection result, whereby optical scanning can be performed in a desired range over a long period of time.

An image forming apparatus according to the present invention includes a mass part including a light reflecting part having light reflectivity,
A support part for supporting the mass part;
A connecting portion that includes at least one elastic portion that can be elastically deformed so that the mass portion can rotate with respect to the support portion, and that connects the support portion and the mass portion;
Drive means for rotationally driving the mass part;
Behavior detecting means for detecting the behavior of the mass part,
The elastic part has a main body part and a resistance region formed on the main body part,
The behavior detecting means detects the behavior of the mass part based on a change in the resistance value of the resistance region,
An optical scanner configured to scan the light reflected by the light reflecting portion while rotating the mass portion while twisting and deforming the elastic portion by the operation of the driving means, the optical scanner comprising: An image forming apparatus that forms an image by main scanning or sub-scanning light,
The elastic part has a highly conductive region formed on the main body part and made of a material having higher conductivity than the constituent material of the main body part, and the high conductive area is formed from the outside of the resistance area. It is configured to shield an electrical influence on the resistance region.
Thereby, optical scanning can be performed in a desired range over a long period of time, and an excellent image can be obtained.

Hereinafter, preferred embodiments of the actuator of the present invention will be described with reference to the accompanying drawings.
First, an embodiment of an actuator of the present invention will be described.
1 is a plan view showing an embodiment of the actuator of the present invention, FIG. 2 is a cross-sectional view taken along line AA in FIG. 1, FIG. 3 is a cross-sectional view taken along line BB in FIG. 1, and FIG. FIG. 5 is a partially enlarged perspective view showing a second mass portion and a second elastic portion of the actuator shown in FIG. 1, and FIG. 5 and FIG. 6 are diagrams for explaining a piezoresistive element provided in the actuator shown in FIG. 7 is a diagram showing the relationship between crystal orientation and piezoresistance coefficient in the (001) plane silicon substrate, FIG. 8 is a diagram showing a schematic configuration of the control system of the actuator shown in FIG. 1, and FIG. 10 is a diagram showing an example of a voltage waveform of the drive voltage of the actuator shown in FIG. 1. FIG. 10 shows the frequency of the AC voltage when the AC voltage is used as the drive voltage of the actuator shown in FIG. The relationship with the amplitude of each mass part It is to graph. In the following, for convenience of explanation, the front side in FIG. 1 is referred to as “up”, the back side in FIG. 1 is referred to as “down”, the right side is referred to as “right”, and the left side is referred to as “left”. The upper side is called “upper”, the lower side is called “lower”, the right side is called “right”, and the left side is called “left”.

The actuator 1 has a base 2 having a two-degree-of-freedom vibration system as shown in FIGS. 1 to 3 and a support substrate 3 that supports the base 2.
The base body 2 includes a pair of first mass units (drive units) 21 and 22, a pair of support units 23 and 24, a second mass unit (movable unit) 25, and a pair of first elastic members. Parts 26 and 27, a pair of second elastic parts 28 and 29, and a pair of electrodes 32 and 33. Here, the first mass portion 21, the first elastic portion 26, and the second elastic portion 28 are configured so that the second mass portion 25 that is a mass portion can be rotated with respect to the support portion 23. It is a connecting part that connects the second mass part 25 and the support part 23. Similarly, the first mass portion 22, the first elastic portion 27, and the second elastic portion 29 allow the second mass portion 25 that is a mass portion to be rotatable with respect to the support portion 24. And a connecting portion that connects the second mass portion 25 and the support portion 24 together.

  In such an actuator 1, by applying a voltage to the pair of electrodes 32, 33, an electrostatic attractive force is generated between the first mass parts 21, 22 and the electrodes 32, 33. While the pair of first elastic portions 26 and 27 is twisted and deformed, the pair of first mass portions 21 and 22 is rotated, and accordingly, the pair of second elastic portions 28 and 29 is twisted and deformed. The second mass unit 25 is rotated while being moved. At this time, the pair of first mass parts 21 and 22 and the second mass part 25 rotate about the rotation center axis X shown in FIG.

The pair of first mass portions 21 and 22 each have a plate shape, and have substantially the same dimensions and the same shape.
Further, combs having a comb-tooth shape are formed at both ends (both ends on the distal side from the rotation center axis X) in a direction perpendicular to the rotation center axis X in a plan view of the first mass unit 21. Toothed electrode portions 211 and 212 are provided. Similarly, both ends in the direction perpendicular to the rotation center axis X in the plan view of the first mass portion 22 (both ends on the distal side from the rotation center axis X) are comb-like. Comb-like electrode portions 221 and 222 are provided.

Moreover, the 2nd mass part 25 is provided between the pair of mass parts 21 and 22, and the pair of mass parts 21 and 22 is the second mass part in a plan view in FIG. 25 is provided so as to be substantially symmetrical with respect to 25.
The second mass unit 25 has a plate shape, and a light reflection unit 251 is provided on the plate surface. Thereby, the actuator 1 can be applied to an optical device such as an optical scanner, an optical attenuator, or an optical switch.

  In such first mass parts 21, 22 and second mass part 25, the first mass part 21 is supported by the support part 23 via the first elastic part 26, and the second mass part The part 25 is supported by the first mass part 21 via the second elastic part 28. Similarly, the first mass portion 22 is supported by the support portion 24 via the first elastic portion 27, and the second mass portion 25 is supported by the first mass portion 21 via the second elastic portion 29. , 22 is supported.

The support portions 23 and 24 are respectively fixed on the support substrate 3. And on the support part 23, the terminals 416-419 connected to the piezoresistive element 41 mentioned later through the insulating layer which is not shown in figure are provided.
On the other hand, terminals 426 to 429 connected to a piezoresistive element 42 described later are provided on the support portion 24 via an insulating layer (not shown).

The first elastic portion 26 connects the first mass portion 21 and the support portion 23 so that the first mass portion 21 can be rotated with respect to the support portion 23. Similarly, the first elastic portion 27 connects the first mass portion 22 and the support portion 24 so that the first mass portion 22 can be rotated with respect to the support portion 24. .
The second elastic portion 28 connects the second mass portion 25 and the first mass portion 21 so that the second mass portion 25 can be rotated with respect to the first mass portion 21. Yes. Similarly, the second elastic portion 29 is configured so that the second mass portion 25 and the first mass portion 22 are configured so that the second mass portion 25 can be rotated with respect to the first mass portion 22. Are linked.

The first elastic portions 26 and 27 and the second elastic portions 28 and 29 are provided coaxially. The first mass portions 21 and 22 are set with the rotation central axis (rotation axis) X as the first elastic portions 26 and 27 and the second elastic portions 28 and 29. The second mass portion 25 is rotatable with respect to the support portions 23 and 24 and the second mass portion 25 is rotatable with respect to the first mass portions 21 and 22.
As described above, the base 2 includes the first vibration system including the first mass parts 21 and 22 and the first elastic parts 26 and 27, the second mass part 25, and the second elastic part 28. , 29 and a second vibration system. That is, the base body 2 has a two-degree-of-freedom vibration system including a first vibration system and a second vibration system.

  As shown in FIGS. 2 and 3, such a two-degree-of-freedom vibration system is formed thinner than the entire thickness of the base 2 and is positioned on the top of the base 2. In other words, the base 2 is formed with a portion thinner than the entire thickness of the base 2, and the odd-shaped holes are formed in the thin portion, whereby the first mass parts 21, 22 and the second mass are formed. The mass portion 25, the first elastic portions 26 and 27, and the second elastic portions 28 and 29 are formed.

In the present embodiment, since the upper surface of the thin portion is located on the same plane as the upper surfaces of the support portions 23 and 24, the mass portions 21, 22, and 25 are rotated below the thin portions. A space (concave portion) 30 is formed.
Such a substrate 2 is formed by processing a p-type silicon single crystal substrate or an n-type silicon single crystal substrate, as will be described later. That is, the first mass parts 21 and 22, the second mass part 25, the support parts 23 and 24, the first elastic parts 26 and 27, and the second elastic parts 28 and 29 are p-type. These are integrally formed by processing a silicon single crystal substrate or an n-type silicon single crystal substrate. Thereby, the actuator 1 having excellent mechanical strength and vibration characteristics can be provided.

  When the base 2 is formed by processing a (001) plane p-type silicon single crystal substrate, the first elastic portions 26 and 27 and the second elastic portions 28 and 29 are respectively It extends along the <110> direction of the (001) plane p-type silicon single crystal substrate. On the other hand, when the base 2 is formed by processing a (001) -plane n-type silicon single crystal substrate, the first elastic portions 26 and 27 and the second elastic portions 28 and 29 are (001 ) Plane extending along the <100> direction or the <010> direction of the n-type silicon single crystal substrate.

  The base 2 is made of a substrate having a laminated structure, such as an SOI substrate, from the first mass parts 21, 22, the second mass part 25, the support parts 23, 24, and the first elastic parts 26, 27. Alternatively, the second elastic portions 28 and 29 and the electrodes 32 and 33 may be formed. In that case, the 1st mass parts 21 and 22, the 2nd mass part 25, a part of support parts 23 and 24, the 1st elastic parts 26 and 27, and the 2nd elastic parts 28 and 29, Are preferably formed of one layer of a substrate having a laminated structure.

  As shown in FIGS. 1 and 4, a piezoresistive element 41 and a highly conductive region 282 formed so as to surround the piezoresistive element 41 are provided on the upper surface of the second elastic portion 28 described above. Similarly, as shown in FIGS. 1 and 4, the upper surface of the second elastic portion 29 is provided with a piezoresistive element 42 and a highly conductive region 292 formed so as to surround it. It has been.

More specifically, the piezoresistive element 41 is provided in the central portion of the second elastic portion 28 in the rotation central axis X direction in the plan view of the second mass portion 25.
As shown in FIGS. 5 and 6, the piezoresistive element 41 is a resistance region formed by diffusion or ion implantation of n-type or p-type impurities provided on the body portion 281 of the second elastic portion 28. 411, a pair of input electrodes 412 and 413 juxtaposed in the rotation center axis X direction on the resistance region 411, and 1 juxtaposed in a direction perpendicular to the rotation center axis X on the resistance region 411. A pair of output electrodes 414 and 415 is provided.

  The resistance region 411 is formed by doping impurities on the surface of the second elastic portion 28. More specifically, when the substrate 2 is formed by processing a p-type silicon single crystal substrate, the n-type formed by doping impurities such as phosphorus on the surface of the second elastic portion 28. It is a silicon single crystal (n-type resistance region). On the other hand, in the case where the base 2 is formed by processing an n-type silicon single crystal substrate, a p-type silicon single crystal formed by doping impurities such as boron on the surface of the second elastic portion 28 ( p-type resistance region).

Accordingly, the second elastic portion 28 has one of the body portion 281 and the resistance region 411 made of p-type silicon and the other made of n-type silicon, and the body portion 281 and the resistance region 411 A pn junction is formed between them.
When the base 2 is formed by processing a (001) -plane p-type silicon single crystal substrate, along the <110> direction of the resistance region 411 (that is, the rotation center axis X direction). The second elastic portion 28 extends. On the other hand, when the base 2 is formed by processing an (001) -plane n-type silicon single crystal substrate, the <100> direction or <010> direction (that is, the rotation center axis X of the resistance region 411). The second elastic portion 28 extends along (direction).

When the second elastic portion 28 extends along such a crystal orientation, when a shear stress is generated in the resistance region 411 due to torsional deformation of the second elastic portion 28, the specific resistance value of the resistance region 411 is obtained. The rate of change can be maximized.
Here, the relationship between the crystal orientation in the resistance region 411 and the change rate of the specific resistance value will be described.
When the second elastic portion 28 is torsionally deformed, shear stress is predominantly generated on the upper surface of the second elastic portion 28 rather than tensile stress or compressive stress. Thereby, a shear stress is generated in the resistance region 411.

On the other hand, when the shear stress τ _xy is generated in the silicon single crystal (cubic crystal), the specific resistance change rate Δρ _xy / ρ ₀ in the silicon single crystal is expressed by the following equation (1).
Δρ _xy / ρ ₀ = π _s τ _xy (1)
Here, π _s is a piezoresistance coefficient.
As apparent from the equation (1), under a constant shear stress τ _xy , the specific resistance change rate Δρ _xy / ρ ₀ in the silicon single crystal increases as the piezoresistance coefficient π _s increases. That is, as the piezoresistance coefficient π _s increases, the specific resistance value of the silicon single crystal greatly changes with respect to the shear stress τ _xy generated in the silicon single crystal.

The piezoresistance coefficient has anisotropy due to the crystal structure of the silicon single crystal. When the silicon single crystal is p-type, the piezoresistance coefficient π _s is < It becomes maximum at 010> orientation or <100> orientation. On the other hand, when the silicon single crystal is n-type, the piezoresistance coefficient π _s is maximum in the <110> orientation, as shown in FIG.
In the actuator 1, as described above, when the base 2 is formed by processing a (001) plane p-type silicon single crystal substrate, the resistance region 411 is an n-type silicon single crystal, and The second elastic portion 28 extends along the <110> direction of the resistance region 411 (that is, the rotation center axis X direction). On the other hand, when the base 2 is formed by processing a (001) -plane n-type silicon single crystal substrate, the resistance region 411 is a p-type silicon single crystal, and the resistance region 411 < The second elastic portion 28 extends along the 100> direction or the <010> direction (that is, the rotation center axis X direction).

Therefore, the specific resistance value of the resistance region 411 changes greatly with respect to the shear stress generated in the resistance region 411.
An input electrode 412 is provided at one end (the left end in FIGS. 5 and 6) of the both ends in the rotation center axis X direction on the resistance region 411, and the other end (FIG. 5). Further, an input electrode 413 is provided on the right end portion in FIG. The input electrode 412 is connected to the terminal 416 provided on the support portion 23 described above, and the input electrode 413 is connected to the terminal 417 provided on the support portion 23 described above (see FIG. 1). A voltage can be applied between the pair of input electrodes 412 and 413 through such terminals 416 and 417.

  In addition, an output electrode 414 is provided at one end (upper end in FIGS. 5 and 6) of both ends in a direction perpendicular to the rotation center axis X on the resistance region 411, and the other end. An output electrode 415 is provided (at the lower end in FIGS. 5 and 6). The output electrode 414 is connected to the terminal 418 provided on the support part 23 described above, and the output electrode 415 is connected to the terminal 419 provided on the support part 23 described above (see FIG. 1). The voltage value and specific resistance value between the pair of output electrodes 414 and 415 can be detected via such terminals 418 and 419.

In the piezoresistive element 41 configured as described above, an electric field is applied to the resistance region 411 via the pair of input electrodes 412 and 413, and the resistance region 411 is set via the pair of output electrodes 414 and 415. By detecting this voltage value, the specific resistance value of the resistance region 411 can be detected.
More specifically, an electric field is generated on the resistance region 411 by applying a voltage between the pair of input electrodes 412 and 413. Then, when a shear stress is generated in the resistance region 411 under such an electric field, the specific resistance value of the resistance region 411 changes depending on the degree of the shear stress, and between the pair of output electrodes 414 and 415. A potential difference occurs. This potential difference depends on the amount of twist deformation of the second elastic portion 28 and the rotation angle of the second mass portion 25. Therefore, the behavior of the second mass unit 25 can be detected based on this potential difference.

  In such a piezoresistive element 41, a change in the specific resistance value of the resistance region 411 with respect to the rotation amount of the second mass unit 25 is detected as a voltage value change, and the voltage value change is detected by the second elastic portion 28. It can only be due to the above shear stress. Therefore, the behavior of the second mass unit 25 can be detected with higher accuracy, and the behavior of the second mass unit 25 can be made more surely desired.

In the vicinity of the resistance region 411 of the piezoresistive element 41, as shown in FIGS. 1 and 5, a highly conductive region 282 is formed on the main body 281 so as to surround the outer periphery of the resistance region 411. ing. In FIG. 6, the illustration of the highly conductive region 282 is omitted for convenience of explanation.
This highly conductive region 282 is made of silicon having the same conductivity type as that of the base 2 (silicon single crystal substrate) and having impurities diffused at a higher concentration than that of the base 2 (silicon single crystal substrate). It has a function to shield the electrical influence of the (shield). Such a highly conductive region 282 is connected to the power supply circuit 12 and applied with a DC potential Vb.

  Similarly to the piezoresistive element 41 described above, the piezoresistive element 42 also includes an n-type or p-type resistance region 421 provided on the second elastic portion 29, as shown in FIGS. A pair of input electrodes 422 and 423 juxtaposed in the rotation center axis X direction on the resistance region 421 and a pair of outputs juxtaposed in a direction perpendicular to the rotation center axis X on the resistance region 421 And electrodes 424 and 425.

  The resistance region 421 is formed by doping impurities on the surface of the second elastic portion 29. Therefore, similarly to the second elastic portion 28, the second elastic portion 29 also has one of the main body 291 and the resistance region 421 made of p-type silicon and the other made of n-type silicon. A pn junction is formed between the main body portion 291 and the resistance region 421.

  Further, when the base 2 is formed by processing a (001) plane p-type silicon single crystal substrate, along the <110> direction of the resistance region 421 (that is, the rotation center axis X direction). The second elastic part 29 extends. On the other hand, when the base 2 is formed by processing an (001) -plane n-type silicon single crystal substrate, the <100> direction or <010> direction of the resistance region 421 (that is, the rotation center axis X The second elastic portion 29 extends along (direction).

When the second elastic portion 29 extends along such a crystal orientation, when a shear stress is generated in the resistance region 421 due to the torsional deformation of the second elastic portion 29, the same as the resistance region 411 described above. In addition, the rate of change of the specific resistance value of the resistance region 421 can be maximized.
The input electrode 422 is provided at one end (the left end in FIG. 6) of the both ends in the rotation center axis X direction on the resistance region 421 and the other end (the right side in FIG. 6). The input electrode 423 is provided at the end of the electrode. The input electrode 422 is connected to the terminal 426 provided on the support 24 described above, and the input electrode 423 is connected to the terminal 427 provided on the support 24 described above (see FIG. 1). A voltage can be applied between the pair of input electrodes 422 and 423 through such terminals 426 and 427.

  In addition, an output electrode 424 is provided at one end (upper end in FIG. 6) of both ends in a direction perpendicular to the rotation center axis X on the resistance region 421, and the other end (FIG. 6). The output electrode 425 is provided at the lower end). The output electrode 424 is connected to the terminal 428 provided on the support 24 described above, and the output electrode 425 is connected to the terminal 429 provided on the support 24 described above (see FIG. 1). The voltage value and specific resistance value between the pair of output electrodes 424 and 425 can be detected through such terminals 428 and 429.

In the piezoresistive element 42 configured in this way, an electric field is applied to the resistance region 421 via the pair of input electrodes 422 and 423, and the resistance region 421 is set via the pair of output electrodes 424 and 425. By detecting this voltage value, the specific resistance value of the resistance region 421 can be detected.
More specifically, an electric field is generated on the resistance region 421 by applying a voltage between the pair of input electrodes 422 and 423. Then, when a shear stress is generated in the resistance region 421 under such an electric field, the specific resistance value of the resistance region 421 changes according to the degree of the shear stress, and between the pair of output electrodes 414 and 415. A potential difference occurs. This potential difference depends on the torsional deformation amount of the second elastic portion 29 and the rotation angle of the second mass portion 25. Therefore, the behavior of the second mass unit 25 can be detected based on this potential difference.

  When the piezoresistive element 42 is configured as described above, a change in the specific resistance value of the resistance region 421 with respect to the rotation amount of the second mass unit 25 is detected as a voltage value change, and the voltage value change is detected by the second elasticity. It can be due only to the shear stress on the part 29. Therefore, the behavior of the second mass unit 25 can be detected with higher accuracy, and the behavior of the second mass unit 25 can be made more surely desired.

  In particular, the relationship between the crystal orientation of the resistance regions 411 and 421 and the extending direction of the second elastic portions 28 and 29 (the rotation center axis X direction of the second mass portion 25) is optimized, and the second mass The specific resistance values of the resistance regions 411 and 421 greatly change due to the shear stress generated on the second elastic portions 28 and 29 as the portion 25 rotates. Therefore, based on the specific resistance values of the resistance regions 411 and 421, the behavior of the second mass unit 25 can be detected with high accuracy, and the behavior of the second mass unit 25 can be set as desired.

In the vicinity of the resistance region 421 of the piezoresistive element 42, a highly conductive region 292 is formed on the main body 291 so as to surround the outer periphery of the resistance region 421. In FIG. 6, the illustration of the highly conductive region 292 is omitted for convenience of explanation.
This highly conductive region 292 is made of silicon having the same conductivity type as that of the base 2 (silicon single crystal substrate) and having impurities diffused at a higher concentration than that of the base 2 (silicon single crystal substrate). It has a function to shield the electrical influence of the (shield). Such a highly conductive region 292 is connected to the power supply circuit 12 and applied with a DC potential Vb, similarly to the high conductivity region 282 described above.

In such piezoresistive elements 41 and 42, the impurity concentrations in the resistance regions 411 and 421 are not particularly limited, but are, for example, 1.0 × 10 ^{18 to} 1.0 × 10 ²⁰ cm ⁻³ . Is preferred. In this embodiment, although not shown, an insulating layer such as a silicon oxide film or a resin film is formed on the upper surface of the base 2 in FIG. 2 except for the input electrodes 412 and 413 and the output electrodes 414 and 415. The metal terminals 416 to 419 and 426 to 429 and the metal wiring are formed on the insulating layer.

  The electrodes 32 and 33 are connected to the first mass parts 21 and 22, the second mass part 25, the support parts 23 and 24, the first elastic parts 26 and 27, and the second elastic parts 28 and 29. , Separated. Thus, the electrodes 32 and 33 are connected to the first mass parts 21 and 22, the second mass part 25, the support parts 23 and 24, the first elastic parts 26 and 27, and the second elastic parts 28 and 29. It is electrically insulated.

The electrode 32 includes a comb-like electrode portion 321 provided so as to mesh with the comb-like electrode portion 211 of the first mass portion 21 described above with a space therebetween, and a comb-teeth of the first mass portion 22. A comb-like electrode portion 322 is formed so as to mesh with the electrode portion 221 with a space therebetween.
Similarly to this, the electrode 33 includes a comb-like electrode portion 331 provided so as to be engaged with the comb-like electrode portion 212 of the first mass portion 21 with a space therebetween, and the first mass portion 22. The comb-tooth-shaped electrode portion 332 is formed so as to mesh with the comb-tooth-shaped electrode portion 222 while being spaced apart from each other.

  Here, it is preferable that the comb-shaped electrode portion 211 is initially displaced in the vertical direction with respect to the comb-shaped electrode portion 321. In the same manner, the comb-like electrode part 212 is for the comb-like electrode part 331, the comb-like electrode part 221 is for the comb-like electrode part 322, and the comb-like electrode part 222 is for the comb-like electrode part 332. On the other hand, it is preferable that the initial displacement is in the vertical direction. Thereby, the start of the rotational drive of the 1st mass parts 21 and 22 can be simplified.

The electrodes 32 and 33 are connected to a power supply circuit 12 to be described later, and are configured so that an AC voltage (drive voltage) can be applied to the electrodes 32 and 33.
The support substrate 3 bonded to the base 2 as described above is made of, for example, glass or silicon as a main material.
As shown in FIGS. 2 and 3, an opening 31 is formed in the upper surface of the support substrate 3 at a portion corresponding to the second mass portion 25.

The opening 31 constitutes an escape portion that prevents contact with the support substrate 3 when the second mass portion 25 rotates (vibrates). By providing the opening (escape portion) 31, the deflection angle (amplitude) of the second mass portion 25 can be set larger while preventing the actuator 1 from being enlarged.
Note that the relief portion as described above is not necessarily opened (opened) on the lower surface (surface opposite to the second mass portion 25) of the support substrate 3 as long as the above-described effect can be sufficiently exerted. May be. In other words, the escape portion can also be configured by a recess formed on the upper surface of the support substrate 3. Further, when the depth of the space 30 is larger than the deflection angle (amplitude) of the second mass portion 25, the escape portion need not be provided.

Here, the control system of the actuator 1 will be described.
As shown in FIG. 8, the actuator 1 according to the present embodiment includes the detection circuit 11 connected to the piezoresistive elements 41 and 42 and the electrodes 32 and 33 (highly conductive regions 282, 292, 323, and 333). And a control circuit 13 (control means) for controlling the driving of the power supply circuit 12 in accordance with the output signal of the detection circuit 11.

  The detection circuit 11 includes a differential amplifier circuit 112 (differential amplifier) that amplifies a voltage corresponding to a change in the specific resistance value of the piezoresistive elements 41 and 42. The detection circuit 11 configured in this way outputs a signal corresponding to the distortion amount (deformation amount) of the piezoresistive elements 41 and 42. That is, the detection circuit 11 detects the behavior of the second mass unit 25 based on the change in the specific resistance value of the piezoresistive elements 41 and 42 provided on the second elastic portions 28 and 29 described above. It is configured. That is, the detection circuit 11 and the piezoresistive elements 41 and 42 constitute a behavior detection unit that detects the behavior of the mass unit 25.

  The power supply circuit 12 is connected to the highly conductive regions 282, 292, 323, and 333, and maintains the potential of the base 2 (more specifically, the main body of the second elastic portions 28 and 29) at a desired potential. The driving voltage is applied between the electrodes 32 and 33 and the substrate 2 (more specifically, between the comb-shaped electrode portion 211 and the comb-shaped electrode portion 321). Such a power supply circuit 12 includes the pn junction between the main body portion 281 of the second elastic portion 28 and the resistance region 411 described above, or between the main body portion 291 of the second elastic portion 29 and the resistance region 421. A drive voltage is applied while maintaining a pn junction (hereinafter, these pn junctions are also simply referred to as “pn junctions”) in a reverse bias state.

Here, the electrodes 32 and 33 and the power supply circuit 12 constitute driving means for driving the first mass parts 21 and 22 to rotate. The power supply circuit 12 and the highly conductive regions 282 and 292 constitute bias applying means for applying a bias to the main body so as to maintain the pn junction between the main body and the resistance region in a reverse bias state. To do.
The control circuit 13 is configured to control driving of the power supply circuit 12 based on the output signal of the detection circuit 11.

The actuator 1 having the above configuration is driven as follows.
For example, by the operation of the power supply circuit 12, as shown in FIG. 9, the potential of the electrode 32 and the potential of the electrode 33 are respectively applied to the first mass parts 21 and 22 and the alternating current having the amplitude Va. A potential obtained by superimposing a direct current potential (Va + Vb) on the potential is applied. As a result, the potential of the substrate 2 is always maintained at Vb, and the maximum value Va × 2 [V] and the minimum value 0 are respectively between the electrode 32 and the substrate 2 and between the electrode 33 and the substrate 2. [V] causes a potential difference that periodically changes.

In this way, a bias is applied to the main body portions 281 and 291 so that the power supply circuit 12 maintains the pn junction in the reverse bias state.
In particular, as shown in FIG. 9, when the potential of the main body portions 281 and 291 is Vb, the diffusion potential of the pn junction is Vpn, and the potentials of the resistance regions 411 and 421 are Vs, the relationship Vb−Vs> Vpn is established. The power supply circuit 12 applies the bias so as to satisfy the condition.

  Thereby, current leakage from the resistance region 411 to the main body portion 281 of the elastic portion 28 and current leakage from the main body portion 281 of the elastic portion 28 to the resistance region 411 can be prevented more reliably. Further, current leakage from the resistance region 421 to the main body portion 291 of the elastic portion 29 and current leakage from the main body portion 291 of the elastic portion 29 to the resistance region 421 can be more reliably prevented. Hereinafter, these current leaks are also simply referred to as “current leaks”.

Further, by applying a bias as described above, a desired electrostatic attractive force is generated between the electrodes 32 and 33 and the base 2 while preventing current leakage, and the second mass unit 25 is rotated. Can be made.
In particular, since the highly conductive region 282 is provided so as to surround the outer periphery of the resistance region 411, noise is mixed into the resistance region 411 from the outside (particularly, the AC component as described above is mixed through the main body 281. The highly conductive region 282 prevents this. Similarly, since the highly conductive region 292 is provided so as to surround the outer periphery of the resistance region 421, noise from the outside to the resistance region 421 (particularly, the AC component as described above causes the main body portion 291 to be mixed). The highly conductive region 292 prevents the contamination).

  Due to the potential difference as described above, between the electrode 32 and the first mass parts 21 and 22 (more specifically, between the comb-like electrode part 321 and the comb-like electrode part 211 and the comb-like shape). (Between the electrode part 322 and the comb-like electrode part 221) and between the electrode 33 and the first mass parts 21 and 22 (more specifically, the comb-like electrode part 331 and the comb-like electrode part 212). And between the comb-shaped electrode portion 332 and the comb-shaped electrode portion 222).

This electrostatic force causes the first elastic portions 26 and 27 to vibrate (rotate around the rotation center axis X) so as to be inclined with respect to the plate surface of the support substrate 3 (the paper surface in FIG. 1). Move).
The second mass part 25 connected via the second elastic parts 28 and 29 in accordance with the vibration (drive) of the first mass parts 21 and 22 is also connected to the second elastic part 28, With the axis 29 as an axis (that is, around the rotation center axis X), it vibrates (rotates) so as to be inclined with respect to the plate surface (paper surface in FIG. 1) of the support substrate 3.

At this time, shear stress is mainly generated on the second elastic portions 28 and 29 that are torsionally deformed. Thereby, the piezoresistive elements 41 and 42 are each subjected to shear stress.
More specifically, for example, when the second elastic portion 28 is torsionally deformed when the second mass portion 25 is rotated, the resistance region 411 of the piezoresistive element 41 has a direction as indicated by an arrow in FIG. Shear stress is generated.

Similarly, when the second elastic portion 29 is torsionally deformed when the second mass portion 25 is rotated, a shear stress is applied to the resistance region 421 of the piezoresistive element 42 in the direction indicated by the arrow in FIG. Occurs.
As shown in FIG. 6, the resistance regions 411 and 421 that receive such shear stress have the same electric field direction. Therefore, as the second mass unit 25 rotates, one of the specific resistance value of the piezoresistive element 41 and the specific resistance value of the piezoresistive element 42 increases and the other decreases.

Such changes in the specific resistance values of the piezoresistive elements 41 and 42 correspond to the amount of torsional deformation of the second elastic portion 28 (the amount of rotation of the second mass portion 25), respectively.
When the specific resistance values of the piezoresistive elements 41 and 42 change with the rotation of the second mass unit 25 in this way, the output signal (voltage value) of the detection circuit 11 shown in FIG. 5 according to the change amount. Also changes.

That is, the output signal from the detection circuit 11 corresponds to the behavior of the second mass unit 25 (for example, the rotation angle, amplitude, frequency, etc.).
Therefore, the control circuit 13 can control the drive of the power supply circuit 12 based on the output signal from the detection circuit 11 to make the behavior of the second mass unit 25 desired.
In particular, since the actuator 1 is configured to amplify a voltage corresponding to a change in the specific resistance value of the piezoresistive elements 41 and 42 by the differential amplifier circuit 112, a change in the specific resistance value of the piezoresistive elements 41 and 42 is achieved. (Voltage change) can be detected with high accuracy (with high sensitivity). As a result, the behavior of the second mass unit 25 can be detected with higher accuracy.

  Here, since the direction of the electric field in the piezoresistive element 41 and the direction of the electric field in the piezoresistive element 42 are the same, the voltage corresponding to the change in the specific resistance value can be amplified by the differential amplifier circuit 112. It is possible to detect a change in the specific resistance value of the piezoresistive elements 41 and 42 with higher accuracy (with high sensitivity). As a result, the behavior of the second mass unit 25 can be detected with higher accuracy.

Further, since the pair of piezoresistive elements 41 and 42 are provided symmetrically with respect to the second mass part 25 in plan view, the specific resistance value change of the piezoresistive elements 41 and 42 is regarded as a voltage value change. Further, it can be detected with high accuracy (with high sensitivity). As a result, the behavior of the second mass unit 25 can be detected with extremely high accuracy.
As described above, in the actuator 1 of the present embodiment, as described above, the highly conductive regions 282 and 292 formed so as to surround the outer periphery of the resistance region 411 function as a shield, and the resistance region 411 is externally provided. , 421 can be prevented from being mixed with noise. As a result, the behavior of the second mass unit 25 can be detected with higher accuracy.

When the high conductivity region 282 functions as a shield in this way, the thickness (depth) of the high conductivity region 282 is preferably larger than the thickness (depth) of the resistance region 411. Thereby, the function as a shield of the resistance region 411 can be improved.
Note that the shape and arrangement of the highly conductive regions 282 and 292 functioning as shields are not limited to those described above. For example, even if the highly conductive region 282 is formed over the entire thickness direction of the main body portion 281 of the second elastic portion 28, it is formed in a part of the main body portion 281 in the thickness direction. Also good. In the present embodiment, the high conductivity region 282 is provided only on the upper surface of the main body 281, but the high conductivity region 282 is provided on each of the upper and lower surfaces of the main body 281. It may be done. The same applies to the highly conductive region 292.

  In the present embodiment, the power supply circuit 12 includes the pn junction between the main body portion 281 of the second elastic portion 28 and the resistance region 411, or the main body portion 291 and the resistance region 421 of the second elastic portion 29. A bias is applied to the substrate 2 (main body portions 281 and 291) so as to maintain the pn junction between the first and second electrodes in a reverse bias state. Therefore, current leakage from the resistance region 411 to the main body portion 281 of the elastic portion 28 and current leakage from the main body portion 281 of the elastic portion 28 to the resistance region 411 can be prevented. Further, current leakage from the resistance region 421 to the main body portion 291 of the elastic portion 29 and current leakage from the main body portion 291 of the elastic portion 29 to the resistance region 421 can be prevented. As a result, the behavior of the second mass unit 25 can be detected with high accuracy.

In particular, in the present embodiment, since the minimum value of the potentials of the electrodes 32 and 33 is substantially equal to the potential of the base body 2 (main body portions 281 and 291), the desired electrostatic attraction force is prevented while preventing the current leakage as described above. And the first mass portions 21 and 22 can be stably rotated, and as a result, the second mass portion 25 can be stably rotated.
Further, since the distance between the high conductivity region 282 and the resistance region 411 and the distance between the high conductivity region 292 and the resistance region 421 are reduced, the bias is more efficiently transferred to the main body portions 281 and 291. Can be applied. As a result, the pn junction can be maintained in the reverse bias state more reliably and easily.

Further, since the power supply circuit 12 applies a bias to the main body portions 281 and 291 via the highly conductive regions 282 and 292, the bias can be efficiently applied to the main body portions 281 and 291. This is because the support portion 23 and the highly conductive regions 282 and 292 are in ohmic contact.
In addition, since the resistance region 411 is provided in the second elastic portion 28 and the resistance region 421 is provided in the second elastic portion 29, the second mass portion 25 (mass portion) is rotated. The resistance value change of the resistance regions 411 and 421 can be increased. As a result, the detection accuracy of the behavior detection of the second mass unit 25 can be improved.

  In addition, since the relationship between the crystal orientation of the resistance regions 411 and 421 and the extending direction of the second elastic portions 28 and 29 (rotation central axis X direction) is optimized, the rotation of the second mass portion 25 is optimized. The specific resistance values of the resistance regions 411 and 421 greatly change due to the shear stress generated on the second elastic portions 28 and 29 with the movement. Therefore, based on the specific resistance values of the resistance regions 411 and 421, the behavior of the second mass unit 25 can be detected with high accuracy, and the behavior of the second mass unit 25 can be set as desired.

Since the resistance regions 411 and 412 as described above are formed by doping impurities on the surfaces of the second elastic portions 28 and 29, the crystal orientation of the resistance regions 411 and 421 can be set to a desired direction relatively easily. That is, the crystal orientation of the resistance regions 411 and 421 can be made exactly parallel to the rotation center axis X direction.
In the present embodiment, the piezoresistive element 41 is provided at the center of the second elastic portion 28 in the longitudinal direction, and the piezoresistive element 42 is provided at the center of the second elastic portion 29 in the longitudinal direction. ing. The shear stress generated on the second elastic portions 28 and 29 due to the torsional deformation of the second elastic portions 28 and 29 is the central portion in the longitudinal direction of the second elastic portions 28 and 29 and extends in the longitudinal direction. Almost constant. Therefore, when the resistance regions 411 and 412 are formed at the time of manufacturing the actuator 1, it is possible to reduce variations in the quality of the actuator 1 for each product even if the formation position does not require high accuracy. As a result, the cost of the actuator 1 can be reduced.

  The piezoresistive element 41 may be provided at an end portion in the longitudinal direction of the second elastic portion 28, and the piezoresistive element 42 is provided at an end portion in the longitudinal direction of the second elastic portion 29. It may be done. The shear stress generated on the second elastic portions 28 and 29 due to the torsional deformation of the second elastic portions 28 and 29 increases from the center portion to the end portion in the longitudinal direction of the second elastic portions 28 and 29. Yes. Therefore, when the piezoresistive elements 41 and 42 are arranged as described above, the amount of change in the specific resistance value of the piezoresistive elements 41 and 42 with respect to the rotation angle of the second mass part 25 is increased, and the second mass part. 25 detection accuracy can be improved.

The length of the first substantially vertical direction from the rotational center axis X to the mass portion 21 (longitudinal direction) (the maximum length) and L _1, the rotational axis X of the first mass portion 22 the length in the direction substantially perpendicular thereto from the length in the (longitudinal) (maximum length) of the L _2, substantially perpendicular to the rotational axis X of the second mass portion 25 (the longitudinal direction) When the length (maximum length) is L ₃ , in the present embodiment, since the first mass parts 21 and 22 are provided independently, the size (length L) of the second mass part 25 is provided. Regardless of ₃ ), the first mass parts 21 and 22 and the second mass part 25 do not interfere with each other, and L ₁ and L ₂ can be reduced. Thereby, the rotation angle (swing angle) of the first mass parts 21 and 22 can be increased, and as a result, the rotation angle of the second mass part 25 can be increased.

Further, the dimensions of the first mass portions 21 and 22 and the second mass portion 25, _{respectively,} preferably set to satisfy L 1 _{<L 3} and _L 2 _{<L 3} becomes relevant.
By satisfying the above relationship, L ₁ and L ₂ can be made smaller, the rotation angle of the first mass parts 21 and 22 can be made larger, and the rotation angle of the second mass part 25 can be further increased. Can be bigger.

In this case, it is preferable that the maximum rotation angle of the second mass unit 25 is configured to be 20 ° or more.
By these, the low voltage drive of the 1st mass parts 21 and 22 and the vibration (rotation) in the large rotation angle of the 2nd mass part 25 are realizable.
For this reason, when such an actuator 1 is applied to, for example, an optical scanner used in an apparatus such as a laser printer or a scanning confocal laser microscope, the apparatus can be more easily downsized.

As described above, in the present embodiment, L ₁ and L ₂ are set to be substantially equal, but it goes without saying that L ₁ and L ₂ may be different.
By the way, in such a vibration system (two-degree-of-freedom vibration system) of the mass parts 21, 22, 25, the amplitude (deflection angle) of the first mass parts 21, 22 and the second mass part 25 and the AC applied A frequency characteristic as shown in FIG. 9 exists between the frequency of the voltage.

That is, the vibration system has two resonance frequencies fm ₁ [kHz] and fm ₃ [kHz] (however, fm) in which the amplitude of the first mass parts 21 and 22 and the amplitude of the second mass part 25 are increased. ₁ <fm ₃ ) and one anti-resonance frequency fm ₂ [kHz] at which the amplitude of the first mass parts 21 and 22 is substantially zero.
In this vibration system, it is preferable that the frequency F of the alternating voltage applied to the electrodes 32 and 33 is set so as to be approximately equal to the lower of the two resonance frequencies, that is, fm ₁ . Thereby, the deflection angle (rotation angle) of the 2nd mass part 25 can be enlarged, suppressing the amplitude of the 1st mass parts 21 and 22. FIG.

In this specification, F [kHz] and fm ₁ [kHz] being substantially equal means that the condition of (fm ₁ −1) ≦ F ≦ (fm ₁ +1) is satisfied.
The average thicknesses of the first mass parts 21 and 22 are each preferably 1 to 1500 μm, and more preferably 10 to 300 μm.
The average thickness of the second mass part 25 is preferably 1 to 1500 μm, and more preferably 10 to 300 μm.

The spring constant k ₁ of the first elastic portions 26 and 27 is preferably 1 × 10 ⁻⁴ to 1 × 10 ⁴ Nm / rad, and preferably 1 × 10 ⁻² to 1 × 10 ³ Nm / rad. Is more preferably 1 × 10 ⁻¹ to 1 × 10 ² Nm / rad. Thereby, the rotation angle (swing angle) of the second mass unit 25 can be further increased.
On the other hand, the spring constant k ₂ of the second elastic portions 28 and 29 is preferably 1 × 10 ⁻⁴ to 1 × 10 ⁴ Nm / rad, and 1 × 10 ⁻² to 1 × 10 ³ Nm / rad. More preferably, it is 1 × 10 ⁻¹ to 1 × 10 ² Nm / rad. Thereby, the deflection angle of the second mass unit 25 can be further increased while suppressing the deflection angle of the first mass units 21 and 22.

Further, the spring constant _{k 1} of the first resilient portion 26, 27 and _{k 2} the spring constant of the second elastic portion 28, _29, preferably satisfies the k 1> _{k 2} the relationship. Thereby, the rotation angle (swing angle) of the second mass unit 25 can be further increased while suppressing the deflection angle of the first mass units 21 and 22.
Furthermore, the moment of inertia of the first mass portions 21 and 22 and _{J 1,} when the moment of inertia of the second mass 25 has a _{J 2,} and _{J 1} and _{J 2,} the _{J 1} ≦ _{J 2} the relationship It is preferable to satisfy, and it is more preferable to satisfy the relationship of J ₁ <J ₂ . Thereby, the rotation angle (swing angle) of the second mass unit 25 can be further increased while suppressing the deflection angle of the first mass units 21 and 22.

By the way, the natural frequency ω ₁ of the first vibration system including the first mass parts 21 and 22 and the first elastic parts 26 and 27 is the inertia moment J _{1 of} the first mass parts 21 and 22, and According to the spring constant k _{1 of} the first elastic part 26, 27, it is given by ω ₁ = (k ₁ / J ₁ ) ^1/2 . On the other hand, the natural frequency ω ₂ of the second vibration system including the second mass part 25 and the second elastic parts 28 and 29 is the inertia moment J _{2 of} the second mass part 25 and the second elasticity. With the spring constant k ₂ of the parts 28, 29, it is given by ω ₂ = (k ₂ / J ₂ ) ^1/2

It is preferable that the natural frequency ω ₁ of the first vibration system and the natural frequency ω ₂ of the second vibration system obtained in this way satisfy the relationship ω ₁ > ω ₂ . Thereby, the rotation angle (swing angle) of the second mass unit 25 can be further increased while suppressing the deflection angle of the first mass units 21 and 22.
As described above, the actuator 1 having the two-degree-of-freedom vibration system can increase the deflection angle of the second mass unit 25 while reducing the drive voltage. In particular, the actuator 1 of this embodiment is configured to rotate the first mass parts 21 and 22 using the comb-like electrode parts 211, 212, 221, 222, 321, 322, 331, and 332 as described above. Therefore, the rotation angle of the first mass portions 21 and 22 is made larger than that in which the first mass portions 21 and 22 are rotated using parallel plate type electrodes. Accordingly, the rotation angle of the second mass unit 25 can be increased.

  In addition, as described above, in the actuator 1 having a two-degree-of-freedom vibration system, generally, the deflection angle of the second mass unit 25 is larger than the deflection angle of the first mass units 21 and 22, Since the amount of torsional deformation of the elastic portions 28 and 29 is larger than the amount of torsional deformation of the first elastic portions 26 and 27, if the piezoresistive elements 41 and 42 are provided on the second elastic portion, the second It is possible to detect the behavior of the second mass unit 25 with high accuracy by increasing the amount of change in the specific resistance value of the piezoresistive elements 41 and 42 accompanying the rotation of the mass unit 25.

Such an actuator 1 can be manufactured as follows, for example.
11 and 12 are views (longitudinal sectional views) for explaining the manufacturing method of the actuator of the first embodiment. In the following, for convenience of explanation, the upper side in FIGS. 11 and 12 is referred to as “upper” and the lower side is referred to as “lower”.
[A1] First, as shown in FIG. 11A, for example, a silicon substrate 5 (n-type single crystal silicon substrate) is prepared.

  Next, on one surface of the silicon substrate 5, as shown in FIG. 11 (b), support portions 23, 24, mass portions 21, 22, 25, elastic portions 26, 27, 28, 29, and electrodes 32 are provided. , 33, the metal mask 6 is formed of, for example, aluminum or the like so as to correspond to the shape (plan view shape). At this time, although not shown, the metal mask 6 has a shape in which a portion corresponding to the support portions 23 and 24 and a portion corresponding to the electrodes 32 and 33 are connected to each other.

Then, as shown in FIG. 11 (c), a photoresist is applied to the other surface of the silicon substrate 5, and exposure and development are performed, so that a resist having an opening that has the same shape as the plan view of the space 30 is formed. A mask 7 is formed. The resist mask 7 may be formed before the metal mask 6 is formed.
Next, after etching the other surface of the silicon substrate 5 through the resist mask 7, the resist mask 7 is removed. As a result, as shown in FIG. 11 (d), a recess 51 is formed in a region corresponding to the plan view of the space 30.

  As an etching method, for example, one or more of physical etching methods such as plasma etching, reactive ion etching, beam etching, and light-assisted etching, and chemical etching methods such as wet etching are used in combination. be able to. Note that the same method can be used for etching in the following steps.

Next, the one surface side of the silicon substrate 5 is etched through the metal mask 6 until a portion corresponding to the recess 51 penetrates.
Then, when the metal mask 6 is removed, a metal film is formed on the second mass portion 25 to form the light reflecting portion 251.
Here, after etching the silicon substrate 5, the metal mask 6 may be removed or may be left without being removed. When the metal mask 6 is not removed, the metal mask 6 remaining on the second mass portion 25 can be used as the light reflecting portion 251.

Examples of the method for forming a metal film include vacuum plating, sputtering (low temperature sputtering), dry plating methods such as ion plating, wet plating methods such as electrolytic plating and electroless plating, thermal spraying methods, and joining metal foils. . Note that the same method can also be used for forming a metal film in the following steps.
Further, the portions corresponding to the second elastic portions 28 and 29 and the electrodes 32 and 33 are doped with impurities to form highly conductive regions 282, 292, 323, and 333. Similarly, the regions corresponding to the second elastic portions 28 and 29 are doped with impurities to form the resistance regions 411 and 421.

Prior to the formation of the high conductivity regions 282, 292, 323, 333 and the resistance regions 411, 421, the portions other than the regions where the high conductivity regions 282, 292, 323, 333 and the resistance regions 411, 421 are to be formed are formed. An insulating film such as an oxide film is formed. Further, after the resistance regions 411 and 421 are formed, terminals 416 to 419 and 426 to 429 and wirings are formed on the insulating film by a known film formation method.
Through the above steps, as shown in FIG. 11E, the support portions 23, 24, the mass portions 21, 22, 25, the elastic portions 26, 27, 28, 29 and the electrodes 32, 33 are integrally formed. The obtained structure is obtained. In addition, the part between the support parts 23 and 24 and the electrodes 32 and 33 is removed in the process mentioned later.

[A2] Next, as shown in FIG. 12A, for example, a silicon substrate 9 is prepared as a substrate for forming the support substrate 3.
Then, a metal mask is formed on one surface of the silicon substrate 9 with, for example, aluminum so as to correspond to a portion excluding the region where the opening 31 is formed.
Next, after etching one surface side of the silicon substrate 9 through this metal mask, the metal mask is removed, and an opening 31 is formed as shown in FIG. That is, the support substrate 3 is obtained.

  [A3] Next, as shown in FIG. 12C, after the structure obtained in the step [A1] and the support substrate 3 obtained in the step [A2] are bonded by direct bonding, The actuator 1 is obtained by removing portions between the support portions 23 and 24 and the electrodes 32 and 33 of the structure. Note that a glass such as borosilicate glass containing mobile ions may be interposed between the base 2 and the support substrate 3, and these may be joined by anodic bonding. Further, it is possible to join the base 2 and the support substrate 3 by anodic bonding using a glass substrate instead of the silicon substrate 9.

As described above, the actuator 1 of the present embodiment is manufactured.
The actuator 1 as described above can be applied to various electronic devices, and the obtained electronic device has high reliability.
The actuator 1 as described above can be suitably applied to an optical scanner provided in an image forming apparatus such as a laser printer, a barcode reader, a scanning confocal laser microscope, or an imaging display.

  In this case, the light reflected by the light reflecting section is scanned (main scanning or sub scanning) to form an image (formation of a latent image on the photosensitive drum or drawing on a projection type screen). The actuators 1, 1 </ b> A according to the present invention can detect the behavior of the mass part with high accuracy and drive the mass part based on the detection result, thereby performing optical scanning in a desired range over a long period of time. Therefore, an excellent image can be obtained by performing optical scanning in a desired range for a long period of time.

The actuator of the present invention has been described based on the illustrated embodiment, but the present invention is not limited to this. For example, in the actuator of the present invention, the configuration of each part can be replaced with an arbitrary configuration that exhibits the same function, and an arbitrary configuration can be added.
For example, in the above-described embodiment, an actuator having a pair of piezoresistive elements has been described. However, the number of piezoresistive elements may be one or three or more. Further, the installation position of the piezoresistive element is not limited to that of the above-described embodiment, and may be on the first mass parts 21 and 22. Moreover, when it has a some piezoresistive element, the some piezoresistive element may be arrange | positioned asymmetrically with respect to the mass part (2nd mass part 25) by planar view.

Further, in the above-described embodiment, the actuator of the two free motion vibration system (that is, having the first mass parts 21 and 22 and the second mass part 25 as the mass part and the first elastic part 26 as the elastic part, 27 and the second elastic portions 28 and 29), the present invention can be applied to a vibration system actuator having one degree of freedom or three degrees of freedom or more.
In the above-described embodiment, the configuration in which the light reflecting portion is provided on the upper surface of the second mass portion (the surface opposite to the support substrate) has been described. For example, the light reflecting portion is provided on the opposite surface. The structure which is provided may be sufficient and the structure provided in both surfaces may be sufficient.

  Moreover, although what was driven by the electrostatic drive system was demonstrated in embodiment mentioned above, it is not limited to this. For example, as a driving method of an actuator having a two-degree-of-freedom vibration system, the first mass unit is rotated, and the second mass unit is rotated while twisting and deforming the second elastic unit accordingly. As long as it can be used, the present invention is not limited to the above-described one. For example, a driving method using a piezoelectric element or a driving method using a magnetic force may be used.

It is a top view which shows embodiment of the actuator of this invention. It is the sectional view on the AA line in FIG. It is the BB sectional view taken on the line in FIG. FIG. 3 is a partially enlarged perspective view showing a second mass part and a second elastic part of the actuator shown in FIG. 1. It is a figure for demonstrating the piezoresistive element with which the actuator shown in FIG. 1 was equipped. It is a figure for demonstrating the piezoresistive element with which the actuator shown in FIG. 1 was equipped. It is a figure which shows the relationship between the crystal orientation in a (001) plane silicon substrate, and a piezoresistance coefficient. It is a figure which shows schematic structure of the control system of the actuator shown in FIG. It is a figure which shows an example of the voltage waveform of the drive voltage of the actuator shown in FIG. 2 is a graph showing the relationship between the frequency of an AC voltage and the amplitude of each of a first mass part and a second mass part when an AC voltage is used as the drive voltage for the actuator shown in FIG. 1. It is a figure for demonstrating the manufacturing method of the actuator shown in FIG. It is a figure for demonstrating the manufacturing method of the actuator shown in FIG. FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Actuator 11 ... Detection circuit 112 ... Differential amplifier circuit 12 ... Power supply circuit 13 ... Control circuit 2 ... Base | substrate 21, 22 ... 1st mass part 211, 212, 221, 222 ... Comb Tooth-like electrode parts 23, 24 ... support part 25 ... second mass part 251 ... light reflecting part 26, 27 ... first elastic part 28, 29 ... second elastic part 281, 291 ... Main body 282, 292, 323, 333 ... High conductivity region 3 ... Support substrate 30 ... Space 31 ... Opening 32, 33 ... Electrode 321, 322, 331, 332 ... Comb-like electrode 41 , 42... Piezoresistive element 411, 421... Resistance region 412, 413, 422, 423... Input electrode 414, 415, 424, 425 ... Output electrode 416 to 419, 426 to 429. substrate 51 …… Recess 6 …… Metal mask 7 …… Resist mask 9 …… Silicon substrate

Claims (13)

Part by mass;
A support part for supporting the mass part;
A connecting portion that includes at least one elastic portion that can be elastically deformed so that the mass portion can rotate with respect to the support portion, and that connects the support portion and the mass portion;
Drive means for rotationally driving the mass part;
Behavior detecting means for detecting the behavior of the mass part,
The elastic part has a main body part and a resistance region formed on the main body part,
The behavior detecting means detects the behavior of the mass part based on a change in the resistance value of the resistance region,
An actuator configured to rotate the mass portion while twisting and deforming the elastic portion by the operation of the driving means,
The elastic part has a highly conductive region formed on the main body part and made of a material having higher conductivity than the constituent material of the main body part, and the high conductive area is formed from the outside of the resistance area. An actuator configured to shield an electrical influence on the resistance region.   The actuator according to claim 1, wherein the highly conductive region is formed so as to surround an outer periphery of the resistance region.   The actuator according to claim 2, wherein a thickness of the highly conductive region is larger than a thickness of the resistance region.   One of the main body and the resistance region is made of p-type silicon, the other is made of n-type silicon, and a pn junction is formed between the main body and the resistance region. 4. The actuator according to claim 1, further comprising bias applying means for applying a bias to the high conductivity region so as to maintain the pn junction in a reverse bias state.   The actuator according to claim 4, wherein the driving unit includes an electrode for driving by electrostatic attraction, and the minimum value of the potential of the electrode is substantially equal to the potential of the main body.   The actuator according to claim 4 or 5, wherein the mass portion, the support portion, and the connecting portion are integrally formed by processing a p-type or n-type silicon single crystal substrate.   The actuator according to claim 6, wherein the highly conductive region is made of silicon having the same conductivity type as the silicon single crystal substrate and having impurities diffused at a higher concentration than the silicon single crystal substrate.   Each of the connecting portions includes a first mass portion and a first mass portion that connects the first mass portion and the support portion so that the first mass portion is rotatable with respect to the support portion. A second part that connects the first mass part and the second mass part so as to be rotatable with respect to the first mass part as an elastic part and the mass part as a second mass part An elastic portion, and the elastic portion is composed of the first elastic portion and the second elastic portion, and the first elastic portion is twisted and deformed by the operation of the driving means. The mass portion is rotated, and accordingly, the second elastic portion is configured to rotate while twisting and deforming the second elastic portion, and the second elastic portion is configured to rotate the main body portion. The actuator according to claim 1, further comprising the resistance region.   The driving means includes an electrode facing the first mass part with a gap, and applying a voltage between the electrode and the first mass part allows the electrode and the first mass part to be applied. The actuator according to claim 8, wherein an electrostatic attractive force is generated between the mass portion and the mass portion is rotated while twisting and deforming the elastic portion.   The actuator according to claim 9, wherein each of the electrode and the first mass portion has a comb-shaped portion, and is disposed so as to mesh with each other.   The behavior detection means is configured to detect a voltage value of the resistance region while applying a voltage to the resistance region, and to detect a resistance value of the resistance region based on the result, The reverse bias applying means applies the bias so as to satisfy the relationship of Vb−Vs> Vpn, where Vb is Vb, the diffusion potential of the pn junction is Vpn, and the potential of the resistance region is Vs. The actuator according to any one of claims 1 to 10. A mass part provided with a light reflecting part having light reflectivity;
A support part for supporting the mass part;
A connecting portion that includes at least one elastic portion that can be elastically deformed so that the mass portion can rotate with respect to the support portion, and that connects the support portion and the mass portion;
Drive means for rotationally driving the mass part;
Behavior detecting means for detecting the behavior of the mass part,
The elastic part has a main body part and a resistance region formed on the main body part,
The behavior detecting means detects the behavior of the mass part based on a change in the resistance value of the resistance region,
An optical scanner configured to scan the light reflected by the light reflecting portion by rotating the mass portion while twisting and deforming the elastic portion by the operation of the driving means,
The elastic part has a highly conductive region formed on the main body part and made of a material having higher conductivity than the constituent material of the main body part, and the high conductive area is formed from the outside of the resistance area. An optical scanner configured to shield an electrical influence on the resistance region. A mass part provided with a light reflecting part having light reflectivity;
A support part for supporting the mass part;
A connecting portion that includes at least one elastic portion that can be elastically deformed so that the mass portion can rotate with respect to the support portion, and that connects the support portion and the mass portion;
Drive means for rotationally driving the mass part;
Behavior detecting means for detecting the behavior of the mass part,
The elastic part has a main body part and a resistance region formed on the main body part,
The behavior detecting means detects the behavior of the mass part based on a change in the resistance value of the resistance region,
An optical scanner configured to scan the light reflected by the light reflecting portion while rotating the mass portion while twisting and deforming the elastic portion by the operation of the driving means, the optical scanner comprising: An image forming apparatus that forms an image by main scanning or sub-scanning light,
The elastic part has a highly conductive region formed on the main body part and made of a material having higher conductivity than the constituent material of the main body part, and the high conductive area is formed from the outside of the resistance area. An image forming apparatus configured to shield an electrical influence on the resistance region.

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