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JP2007335909A - Substrate cleaning method - Google Patents

Substrate cleaning method Download PDF

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Publication number
JP2007335909A
JP2007335909A JP2007241594A JP2007241594A JP2007335909A JP 2007335909 A JP2007335909 A JP 2007335909A JP 2007241594 A JP2007241594 A JP 2007241594A JP 2007241594 A JP2007241594 A JP 2007241594A JP 2007335909 A JP2007335909 A JP 2007335909A
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Prior art keywords
cleaning
cleaning member
substrate
diameter
fitted
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JP2007241594A
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JP4634426B2 (en
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Fumitoshi Oikawa
文利 及川
Koji Ato
浩司 阿藤
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Ebara Corp
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Ebara Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate cleaning method provided with cleaning member detection sensors for detecting whether the cleaning member of a cleaning tool is present or not. <P>SOLUTION: In a substrate cleaning apparatus including cleaning tool mounting mechanism 20 for mounting a cleaning tool 21 having a cleaning member contactable with the cleaning surface of a substrate Wf to be cleaned, and cleaning the substrate Wf held and rotated by a substrate holding and rotating mechanism while bringing the substrate Wf into contact with the cleaning member of the cleaning tool 21, cleaning member detection sensors (a floodlight projector 27a and a photodetector 27b) for detecting whether the cleaning member of the cleaning tool 21 is present or not in a state in which the cleaning tool 21 mounted on the cleaning tool mounting mechanism 20 is at a predetermined position, are provided. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は半導体ウエハ等の被洗浄基板を保持し回転させながら該洗浄基板上に洗浄液を供給しながら洗浄具で洗浄する基板洗浄方法に関するものである。   The present invention relates to a substrate cleaning method in which a substrate to be cleaned such as a semiconductor wafer is held and rotated, and cleaning is performed with a cleaning tool while supplying a cleaning liquid onto the cleaning substrate.

図1はこの種の基板洗浄装置の構成を示す図である。図示するように、基板洗浄装置は被洗浄基板Wfを保持し回転させる基板保持回転機構10と洗浄具21を装着する洗浄具装着機構20を具備する。基板保持回転機構10は被洗浄基板Wfを水平姿勢に保持するチャック11が装着された複数本(図では4本)のアーム12を具備し、該アーム12が一体的に基台13に取付けられ、回転軸14で矢印A方向に回転できるようになっている。   FIG. 1 is a diagram showing the configuration of this type of substrate cleaning apparatus. As shown in the figure, the substrate cleaning apparatus includes a substrate holding / rotating mechanism 10 that holds and rotates a substrate to be cleaned Wf and a cleaning tool mounting mechanism 20 that mounts a cleaning tool 21. The substrate holding and rotating mechanism 10 includes a plurality of (four in the figure) arms 12 on which chucks 11 that hold the substrate to be cleaned Wf in a horizontal posture are mounted. The arms 12 are integrally attached to the base 13. The rotary shaft 14 can be rotated in the direction of arrow A.

また、洗浄具装着機構20は揺動アーム23を有し、該揺動アーム23の先端に回転軸22が設けられ、該回転軸22の先端に洗浄具が装着されている。回転軸22は図示しない回転機構により矢印B方向に回転し、洗浄具21を同方向に回転させるようになっている。また、揺動アーム23の後端部には揺動軸24が設けられ、揺動アーム23を矢印C方向に揺動させるようになっている。また、揺動軸24は揺動アーム23を矢印Dに示すように昇降させるようにもなっている。   The cleaning tool mounting mechanism 20 has a swing arm 23, a rotary shaft 22 is provided at the tip of the swing arm 23, and a cleaning tool is mounted at the tip of the rotary shaft 22. The rotating shaft 22 is rotated in the direction of arrow B by a rotating mechanism (not shown) to rotate the cleaning tool 21 in the same direction. A swing shaft 24 is provided at the rear end of the swing arm 23 so as to swing the swing arm 23 in the direction of arrow C. Further, the swing shaft 24 moves the swing arm 23 up and down as indicated by an arrow D.

洗浄具21は図2(a)に示すようにスポンジ等で構成された洗浄部材21aと該洗浄部材21aを把持する把持部材21bからなる。このような構成の洗浄具を回転軸22に固着し、洗浄部材21aを被洗浄基板Wfの上面に当接させると共に、ノズル25から洗浄液を供給し、回転軸22を回転させ、揺動アーム23を揺動させて被洗浄基板Wfの上面を洗浄する。この回転軸22の回転力、揺動アーム23の揺動力が洗浄部材21aに加わると、洗浄部材21aと被洗浄基板Wfの摩擦力により、図2(b)に示すように、洗浄部材21aが把持部材21bから脱落することがある。上記のように洗浄具21の洗浄部材21aが把持部材21bから脱落すると、本来の洗浄性能が維持できず、洗浄不良製品を製造し続けることがある。   As shown in FIG. 2A, the cleaning tool 21 includes a cleaning member 21a made of sponge or the like and a gripping member 21b that grips the cleaning member 21a. The cleaning tool having such a configuration is fixed to the rotating shaft 22, the cleaning member 21 a is brought into contact with the upper surface of the substrate Wf to be cleaned, the cleaning liquid is supplied from the nozzle 25, the rotating shaft 22 is rotated, and the swing arm 23. Is swung to clean the upper surface of the substrate Wf to be cleaned. When the rotational force of the rotary shaft 22 and the swinging force of the swing arm 23 are applied to the cleaning member 21a, the cleaning member 21a is caused to move by the frictional force between the cleaning member 21a and the substrate to be cleaned Wf as shown in FIG. The gripping member 21b may fall off. As described above, when the cleaning member 21a of the cleaning tool 21 is detached from the gripping member 21b, the original cleaning performance may not be maintained, and a product with poor cleaning may continue to be manufactured.

本発明は上述の点に鑑みてなされたもので、洗浄具装着機構に取付けられた洗浄具の洗浄部材の有無を検知する洗浄部材検出センサを設け、洗浄部材の脱落を的確に検出し、洗浄不良製品が製造し続けられることを防止できる基板洗浄方法を提供することを目的とする。   The present invention has been made in view of the above points, and is provided with a cleaning member detection sensor for detecting the presence or absence of the cleaning member of the cleaning tool attached to the cleaning tool mounting mechanism, accurately detecting the dropping of the cleaning member, and cleaning It is an object of the present invention to provide a substrate cleaning method capable of preventing a defective product from being continuously manufactured.

上記課題を解決するため請求項1に記載の発明は、基板保持回転機構及び洗浄具を具備し、該基板保持回転機構で保持し回転する被洗浄基板の面上に洗浄液を供給し、前記洗浄具の洗浄部材を前記被洗浄基板の面上に接触させ、前記洗浄部材と前記被洗浄基板の相対的運動により該被洗浄基板を洗浄する基板洗浄方法において、前記洗浄具の洗浄部材の有無を検出する洗浄部材センサにより、前記洗浄部材の有無を監視し、前記洗浄具に洗浄部材がある場合は、前記相対的運動による洗浄を開始し、前記洗浄具に洗浄部材がない場合は、前記相対的運動による洗浄を停止することを特徴とする基板洗浄方法。   In order to solve the above problems, the invention described in claim 1 comprises a substrate holding and rotating mechanism and a cleaning tool, supplying a cleaning liquid onto the surface of the substrate to be cleaned that is held and rotated by the substrate holding and rotating mechanism, and In the substrate cleaning method for cleaning the substrate to be cleaned by relative movement of the cleaning member and the substrate to be cleaned, the cleaning member of the cleaning tool is brought into contact with the surface of the substrate to be cleaned. The presence or absence of the cleaning member is monitored by a cleaning member sensor to be detected. When the cleaning tool has a cleaning member, cleaning by the relative motion is started. When the cleaning tool has no cleaning member, the relative cleaning is performed. Substrate cleaning method, characterized by stopping cleaning by dynamic movement.

請求項2に記載の発明は、請求項1に記載の基板洗浄方法において、前記洗浄具は、前記洗浄部材と該洗浄部材を保持する洗浄部材保持機構とを備え、前記洗浄部材は、円柱状で中間に小径中間部が該小径中間部の上下に上大径部及び下大径部が一体に形成された構成であり、前記洗浄部材保持機構は、前記洗浄部材の小径中間部が嵌合するフランジと、該フランジの上下に前記洗浄部材の上大径部が嵌合する溝と下大径部の上部が嵌合する凹部を有する把持部を備え、前記把持部に前記洗浄部材を、前記フランジに前記小径中間部を、前記溝に前記上大径部を、前記凹部に前記下大径部の上部をそれぞれ嵌合させて保持したことを特徴とする。   According to a second aspect of the present invention, in the substrate cleaning method according to the first aspect, the cleaning tool includes the cleaning member and a cleaning member holding mechanism that holds the cleaning member, and the cleaning member has a cylindrical shape. In the middle, the small-diameter intermediate portion is integrally formed with the upper large-diameter portion and the lower large-diameter portion above and below the small-diameter intermediate portion, and the cleaning member holding mechanism is fitted with the small-diameter intermediate portion of the cleaning member. And a gripping part having a groove in which the upper large-diameter part of the cleaning member fits above and below the flange and a concave part in which the upper part of the lower large-diameter part fits, and the cleaning member in the gripping part, The small-diameter intermediate portion is fitted to the flange, the upper large-diameter portion is fitted to the groove, and the upper portion of the lower large-diameter portion is fitted and held in the recess.

請求項3に記載の発明は、請求項1又は2に記載の基板洗浄方法において、前記把持部は、複数の把持部構成部材からなり、前記洗浄部材保持機構は該複数の把持部構成部材を円筒状に締結する締結機構を備え、前記複数の把持部構成部材はそれぞれ内側中間部に前記洗浄部材の小径中間部が嵌合するフランジが形成され、該フランジの上下に前記洗浄部材の上大径部が嵌合する溝及び下大径部の上部が嵌合する凹部がそれぞれ形成された構成であり、前記複数の把持部構成部材の間に前記洗浄部材を、前記フランジに前記小径中間部を、前記溝に前記上大径部を、前記凹部に前記下大径部の上部をそれぞれ嵌合させて配置し、前記締結機構で前記複数の把持部構成部材を一体的に締結したことを特徴とする。   According to a third aspect of the present invention, in the substrate cleaning method according to the first or second aspect, the gripping portion includes a plurality of gripping portion constituent members, and the cleaning member holding mechanism includes the plurality of gripping portion constituent members. A fastening mechanism for fastening in a cylindrical shape is provided, and each of the plurality of gripping portion constituting members has a flange in which a small-diameter intermediate portion of the cleaning member is fitted in an inner intermediate portion, and the upper and lower portions of the cleaning member are formed above and below the flange. A groove in which the diameter portion is fitted and a recess in which the upper portion of the lower large diameter portion is fitted are formed, and the cleaning member is disposed between the plurality of gripping portion constituting members, and the small diameter intermediate portion is provided in the flange. The upper large-diameter portion is arranged in the groove and the upper portion of the lower large-diameter portion is fitted in the recess, and the plurality of gripping portion constituting members are integrally fastened by the fastening mechanism. Features.

請求項4に記載の発明は、請求項3に記載の基板洗浄方法において、前記締結機構は前記締結した把持部構成部材に回転力を伝達するようになっていることを特徴とする。   According to a fourth aspect of the present invention, in the substrate cleaning method according to the third aspect, the fastening mechanism transmits a rotational force to the fastened gripping member constituting member.

また本発明は、上記に記載の基板洗浄方法において、前記把持部構成部材の前記洗浄部材に接する面に突起部を設けたことを特徴とする。   According to the present invention, in the substrate cleaning method described above, a protrusion is provided on a surface of the gripping member constituting member that contacts the cleaning member.

また本発明は、上記に記載の基板洗浄方法において、前記洗浄部材は、前記下大径部の下端面外周部に平坦な環状突起を設けたことを特徴とする。   According to the present invention, in the substrate cleaning method described above, the cleaning member is provided with a flat annular protrusion on an outer peripheral portion of a lower end surface of the lower large diameter portion.

また本発明は、上記に記載の基板洗浄方法において、前記環状突起に、半径方向に複数本の切り溝を設け、該環状突起を複数に分割したことを特徴とする。   According to the present invention, in the substrate cleaning method described above, a plurality of kerfs are provided in the radial direction on the annular protrusion, and the annular protrusion is divided into a plurality of parts.

また本発明は、上記に記載の基板洗浄方法において、前記洗浄部材は、前記下大径部の下端面に同心円状に配置した複数の円板状突起部を設けたことを特徴とする。   According to the present invention, in the substrate cleaning method described above, the cleaning member is provided with a plurality of disc-shaped protrusions arranged concentrically on a lower end surface of the lower large diameter portion.

また本発明は、上記に記載の基板洗浄方法において、前記洗浄部材は、前記小径中間部と上大径部と下大径部が一体に形成されてなるクロス保持部材と、該クロス保持部材の前記下大径部の下端面に貼り付けた環状のクロスからなることを特徴とする。   According to the present invention, in the substrate cleaning method described above, the cleaning member includes a cross holding member in which the small diameter intermediate portion, the upper large diameter portion, and the lower large diameter portion are integrally formed; and It consists of the cyclic | annular cloth affixed on the lower end surface of the said lower large diameter part, It is characterized by the above-mentioned.

請求項1に記載の発明によれば、洗浄具の洗浄部材の有無を検出する洗浄部材センサにより、洗浄部材の有無を監視し、洗浄具に洗浄部材がある場合は、相対的運動による洗浄を開始し、洗浄具に洗浄部材がない場合は、相対的運動による洗浄を停止するので、洗浄不良品を製造し続けることを回避できる。   According to the first aspect of the present invention, the presence or absence of the cleaning member is monitored by the cleaning member sensor that detects the presence or absence of the cleaning member of the cleaning tool. When the cleaning tool does not have a cleaning member, the cleaning by the relative motion is stopped, so that it is possible to avoid continuously manufacturing defective products.

以下、本願発明の実施の形態例を図面に基づいて説明する。図3は本発明に係る基板洗浄装置の構成を示す平面図である。なお、基板洗浄装置の構成の外観構成は図1と略同一であるのでその図示は省略する。基板洗浄装置1の洗浄具装着機構20の揺動アーム23は被洗浄基板Wf上の矢印4で示す洗浄範囲で揺動し、ノズル25(図1参照)から洗浄液を供給しながら、回転する洗浄具21で洗浄する。洗浄具装着機構20の揺動アーム23は矢印3で示す範囲で揺動でき、その先端に装着した洗浄具21が待避位置2に到達した状態で待避するようになっている。   Embodiments of the present invention will be described below with reference to the drawings. FIG. 3 is a plan view showing the configuration of the substrate cleaning apparatus according to the present invention. The appearance of the substrate cleaning apparatus is substantially the same as that shown in FIG. The swing arm 23 of the cleaning tool mounting mechanism 20 of the substrate cleaning apparatus 1 swings within the cleaning range indicated by the arrow 4 on the substrate Wf to be cleaned, and rotates while supplying the cleaning liquid from the nozzle 25 (see FIG. 1). Wash with tool 21. The swing arm 23 of the cleaning tool mounting mechanism 20 can swing within the range indicated by the arrow 3, and the cleaning tool 21 mounted on the tip of the swinging arm 23 is retracted in a state where it reaches the retracted position 2.

上記待避位置2を挟んで洗浄具21の洗浄部材の有無を検出する洗浄部材センサを構成する投光器27aと受光器27bが配置されている。図4に示すように、洗浄具21は洗浄部材21aと該洗浄部材21aを把持する把持部材21bを具備する。洗浄具21が待避位置2に位置し、洗浄部材21aが把持部材21bに正常に把持されている状態では、図4(a)に示すように投光器27aからの光28は洗浄部材21aに遮られ受光器27bに到達しないが、図4(b)に示すように、洗浄部材21aが把持部材21bから脱落すると投光器27aからの光28は受光器27bに到達する。従って、洗浄具21が待避位置2に位置した状態で受光器27bに投光器27aからの光28が到達するか否かで洗浄部材21aの有無を判断する。   A light projector 27a and a light receiver 27b constituting a cleaning member sensor that detects the presence or absence of the cleaning member of the cleaning tool 21 with the retracted position 2 interposed therebetween are arranged. As shown in FIG. 4, the cleaning tool 21 includes a cleaning member 21a and a gripping member 21b that grips the cleaning member 21a. In the state where the cleaning tool 21 is located at the retreat position 2 and the cleaning member 21a is normally gripped by the gripping member 21b, the light 28 from the projector 27a is blocked by the cleaning member 21a as shown in FIG. Although it does not reach the light receiver 27b, as shown in FIG. 4B, when the cleaning member 21a falls off the gripping member 21b, the light 28 from the projector 27a reaches the light receiver 27b. Therefore, the presence or absence of the cleaning member 21a is determined based on whether or not the light 28 from the projector 27a reaches the light receiver 27b in a state where the cleaning tool 21 is positioned at the retreat position 2.

上記受光器27b及び投光器27aに替えて、図5に示すように1個の投受光器27を設けるように構成してもよい。このように構成することにより、図5(a)に示すように、洗浄部材21aが把持部材21bに正常に把持されている状態で投受光器27から発せられた光28が洗浄部材21aで反射され反射光28’となって投受光器27に到達するが、図5(b)に示すように洗浄部材21aが把持部材21bから脱落した場合は、投受光器27から発せられた光28が反射されないから反射光は投受光器27に到達しない。従って、洗浄具21が待避位置2に位置した状態で投受光器27から発せられた光が反射されて該投受光器27で受光されるか否かで洗浄部材21aの有無を判断する。   Instead of the light receiver 27b and the projector 27a, a single projector / receiver 27 may be provided as shown in FIG. With this configuration, as shown in FIG. 5A, the light 28 emitted from the light emitter / receiver 27 in a state where the cleaning member 21a is normally held by the holding member 21b is reflected by the cleaning member 21a. The reflected light 28 ′ reaches the light projecting / receiving device 27, but when the cleaning member 21 a falls off the gripping member 21 b as shown in FIG. 5B, the light 28 emitted from the light projecting / receiving device 27 is emitted. Since it is not reflected, the reflected light does not reach the projector / receiver 27. Accordingly, the presence or absence of the cleaning member 21a is determined by whether or not the light emitted from the light projecting / receiving device 27 is reflected and received by the light projecting / receiving device 27 in a state where the cleaning tool 21 is located at the retracted position 2.

洗浄部材センサを構成する受光器27b又は投受光器27の検出信号は図示しない制御装置に伝送され、制御装置は所定の処理を行う。図6は制御装置の処理の流れを示す図である。先ず洗浄開始に当り、洗浄部材センサの出力により洗浄部材21aの有無を検知し(ステップST1)、洗浄部材21aが無い場合は異常アラームを出力し、基板洗浄装置を停止する(ステップST2)。洗浄部材21aがある場合は基板Wfの洗浄を開始し(ステップST3)、洗浄が終了したら(ステップST4)、洗浄部材センサの出力により洗浄部材21aの有無を検知し(ステップST5)、洗浄部材21aが無い場合は異常アラームを出力し基板洗浄装置を停止し(ステップST6)、洗浄部材21aがある場合は基板Wfの洗浄処理が正常として終了する。   The detection signal of the light receiver 27b or the light projector / receiver 27 constituting the cleaning member sensor is transmitted to a control device (not shown), and the control device performs a predetermined process. FIG. 6 is a diagram illustrating a processing flow of the control device. First, at the start of cleaning, the presence or absence of the cleaning member 21a is detected by the output of the cleaning member sensor (step ST1). If the cleaning member 21a is not present, an abnormal alarm is output and the substrate cleaning apparatus is stopped (step ST2). If the cleaning member 21a is present, cleaning of the substrate Wf is started (step ST3). When cleaning is completed (step ST4), the presence or absence of the cleaning member 21a is detected by the output of the cleaning member sensor (step ST5), and the cleaning member 21a is detected. If there is not, an abnormal alarm is output and the substrate cleaning apparatus is stopped (step ST6). If there is the cleaning member 21a, the cleaning process of the substrate Wf is terminated as normal.

なお、上記例では待避位置2を挟んで洗浄具21の洗浄部材の有無を検出する洗浄部材センサを構成する投光器27aと受光器27bを配置した例を示したが、これに限定されるものではなく、例えば、図17に示すように、投光器27a、受光器27bを洗浄具21の洗浄部材21aを挟んで配置されるように、支持部材41、42を介して揺動アーム23に取付けるようにしてもよい。これにより、常時(勿論、基板洗浄中)洗浄部材21aの有無を確認できる。   In the above example, the example in which the light projector 27a and the light receiver 27b constituting the cleaning member sensor for detecting the presence or absence of the cleaning member of the cleaning tool 21 with the retracted position 2 interposed therebetween is shown, but the present invention is not limited to this. For example, as shown in FIG. 17, the light projector 27 a and the light receiver 27 b are attached to the swing arm 23 via the support members 41 and 42 so as to be disposed with the cleaning member 21 a of the cleaning tool 21 interposed therebetween. May be. Thereby, the presence or absence of the cleaning member 21a can be confirmed at all times (of course, during the substrate cleaning).

また、図17では洗浄部材21aの有無を投光器27aと受光器27bを対向して配置した透過式のセンサ例を示したが、図5に示す投受光器27を揺動アーム23に適当な支持部材を介して取付けるようにしてもよい。   FIG. 17 shows an example of a transmission type sensor in which the projector 27a and the light receiver 27b are arranged to face each other with or without the cleaning member 21a, but the light emitter / receiver 27 shown in FIG. You may make it attach through a member.

図7乃至図12は本発明に係る洗浄具の構成を示す図で、図7は分解斜視図、図8は平面図、図9は図8のA−A断面図、図10は駆動力伝達部材の平面図、図11は図9のB−B断面図、図12は図9のC−C断面図である。本洗浄具は一対の把持部材31、32、駆動力伝達部材33、筒状の締結部材34、洗浄部材35及びビス36、36等からなる。   7 to 12 are views showing the structure of the cleaning tool according to the present invention. FIG. 7 is an exploded perspective view, FIG. 8 is a plan view, FIG. 9 is a cross-sectional view taken along the line AA in FIG. FIG. 11 is a cross-sectional view taken along the line BB in FIG. 9, and FIG. 12 is a cross-sectional view taken along the line CC in FIG. 9. The cleaning tool includes a pair of gripping members 31 and 32, a driving force transmission member 33, a cylindrical fastening member 34, a cleaning member 35, screws 36 and 36, and the like.

洗浄部材35は円柱状のPVA(ポリビニルアルコール)スポンジ(=多孔質基質PVF(ポリビニルホルマール))からなり、該洗浄部材35は把持部材31、32で把持される部分に径の小さい小径中間部(外周に溝を形成した構成)35aを有し、小径中間部35aの上部がフランジ状の上大径部35bとなっており、下部が円柱状の下大径部35cとなっている。   The cleaning member 35 is made of a cylindrical PVA (polyvinyl alcohol) sponge (= porous substrate PVF (polyvinyl formal)), and the cleaning member 35 is a small diameter intermediate portion ( 35a), the upper portion of the small-diameter intermediate portion 35a is a flange-like upper large-diameter portion 35b, and the lower portion is a cylindrical lower-large-diameter portion 35c.

把持部材31、32はそれぞれ下部の大径部31a、32aと上部の小径部31b、32bとからなる。把持部材31の大径部31aの内側上部には洗浄部材35の上大径部35bが嵌合する溝31cが形成され、小径部31bの上部には駆動力伝達部材33の基台部33aが嵌合する溝31dが形成されている。また、把持部材32の大径部32aの内側上部には洗浄部材35の上大径部35bが嵌合する溝32cが形成され、小径部32bの上部には駆動力伝達部材33の基台部33aが嵌合する溝32dが形成されている。   The holding members 31 and 32 are respectively composed of lower large-diameter portions 31a and 32a and upper small-diameter portions 31b and 32b. A groove 31c into which the upper large-diameter portion 35b of the cleaning member 35 is fitted is formed in the upper portion inside the large-diameter portion 31a of the grip member 31, and a base portion 33a of the driving force transmitting member 33 is formed in the upper portion of the small-diameter portion 31b. A fitting groove 31d is formed. Further, a groove 32c into which the upper large diameter portion 35b of the cleaning member 35 is fitted is formed on the inner upper portion of the large diameter portion 32a of the grip member 32, and the base portion of the driving force transmitting member 33 is formed on the upper portion of the small diameter portion 32b. A groove 32d into which 33a is fitted is formed.

駆動力伝達部材33は円板の両側を切断した形状の基台部33aを有し、該基台部33aの上面に円柱部33bが立設している。該円柱部33bの中央部には図1の洗浄具装着機構20の回転軸22の先端が装着される装着ネジ孔33cが形成されている。駆動力伝達部材33の基台部33aは把持部材31、32の小径部31b、32bの溝31d、32dに挿入されるようになっており、挿入された状態で基台部33aの両側面33d、33dは溝31d、32dの両側壁面に密接するようになっている。また、把持部材31、32の大径部31a、32aの内側下方には洗浄部材35の下大径部35cの上端部が嵌合する凹部31e、32eが形成され、凹部31e、32eと溝31c、32cの間に洗浄部材35の小径中間部35aに嵌合するフランジ31h、32hが形成されている。   The driving force transmission member 33 has a base portion 33a having a shape obtained by cutting both sides of the disk, and a cylindrical portion 33b is provided upright on the upper surface of the base portion 33a. A mounting screw hole 33c to which the tip of the rotating shaft 22 of the cleaning tool mounting mechanism 20 of FIG. 1 is mounted is formed at the center of the cylindrical portion 33b. The base portion 33a of the driving force transmission member 33 is inserted into the grooves 31d and 32d of the small diameter portions 31b and 32b of the grip members 31 and 32, and both side surfaces 33d of the base portion 33a in the inserted state. , 33d are in close contact with both side walls of the grooves 31d, 32d. Further, recessed portions 31e and 32e into which the upper end portion of the lower large diameter portion 35c of the cleaning member 35 is fitted are formed below the large diameter portions 31a and 32a of the gripping members 31 and 32, and the recessed portions 31e and 32e and the groove 31c are formed. , 32c are formed with flanges 31h and 32h that fit into the small-diameter intermediate portion 35a of the cleaning member 35.

また、締結部材34は円筒状でその内径は対向した一対の把持部材31、32の上部小径部31b、32bが嵌入できる大きさである。また、締結部材34の上部中央部には駆動力伝達部材33の円柱部33bが挿入される穴34aが形成され、ビス36、36が挿入される孔34b、34bが形成されている。   The fastening member 34 is cylindrical and has an inner diameter that allows the upper small diameter portions 31b and 32b of the pair of gripping members 31 and 32 facing each other to be fitted. Further, a hole 34a into which the cylindrical portion 33b of the driving force transmission member 33 is inserted is formed in the upper center portion of the fastening member 34, and holes 34b and 34b into which screws 36 and 36 are inserted are formed.

上記部品構成の洗浄具21の組み立ては、先ず、洗浄部材35の上大径部35bを把持部材31、32の溝31c、32cに挿入すると共に、洗浄部材35の下大径部35cの上部を把持部材31、32の凹部31e、32eに挿入して、一対の把持部材31、32で洗浄部材35を把持する。   In assembling the cleaning tool 21 having the above-described component configuration, first, the upper large diameter portion 35b of the cleaning member 35 is inserted into the grooves 31c and 32c of the gripping members 31 and 32, and the upper portion of the lower large diameter portion 35c of the cleaning member 35 is inserted. The cleaning member 35 is gripped by the pair of gripping members 31 and 32 by being inserted into the recesses 31 e and 32 e of the gripping members 31 and 32.

次に駆動力伝達部材33の基台部33aを把持部材31、32の小径部31b、32bの溝31d、32dに挿入し、この状態で締結部材34の内径に把持部材31、32の小径部31b、32bを挿入すると、駆動力伝達部材33の円柱部33bは締結部材34の穴34aに挿入される。   Next, the base portion 33a of the driving force transmission member 33 is inserted into the grooves 31d and 32d of the small diameter portions 31b and 32b of the gripping members 31 and 32, and in this state, the small diameter portions of the gripping members 31 and 32 are connected to the inner diameter of the fastening member 34. When 31 b and 32 b are inserted, the cylindrical portion 33 b of the driving force transmission member 33 is inserted into the hole 34 a of the fastening member 34.

次にビス36、36を締結部材34の孔34b、34bを通して把持部材31、32の小径部31b、32bに形成されたビス孔31f、32fに螺入することにより、締結部材34、一対の把持部材31、32、駆動力伝達部材33及び洗浄部材35は一体的に組み立てられる。   Next, the screws 36, 36 are screwed into the screw holes 31f, 32f formed in the small diameter portions 31b, 32b of the holding members 31, 32 through the holes 34b, 34b of the fastening member 34. The members 31, 32, the driving force transmission member 33, and the cleaning member 35 are assembled together.

把持部材31、32の凹部31e、32eの洗浄部材35の上大径部35b上面に当接する部分には複数(図ではそれぞれ2個ずつ計4個)の円弧状の突起部31g、32gが設けられており、ビス36、36でビス36、36と把持部材31、32を締結した状態で、突起部31g、32gは洗浄部材35の下大径部35cの上面に喰い込み(突き刺さった状態)、把持部材31、32が回転した際、同時に回転し空転しないようになっている。   A plurality (four in total, four each) of arcuate protrusions 31g and 32g are provided on the portions of the recesses 31e and 32e of the gripping members 31 and 32 that contact the upper surface of the upper large diameter portion 35b of the cleaning member 35. In the state where the screws 36 and 36 and the gripping members 31 and 32 are fastened with the screws 36 and 36, the protruding portions 31g and 32g bite into the upper surface of the lower large-diameter portion 35c of the cleaning member 35 (a state where they are pierced). When the gripping members 31 and 32 are rotated, they are simultaneously rotated so as not to idle.

上記のようにして組み立てられた洗浄具21の駆動力伝達部材33の円柱部33bに形成されたネジ孔33cに洗浄具装着機構20の回転軸22を装着し(図1参照)、該回転軸22を回転することにより、駆動力伝達部材33は回転する。この時、駆動力伝達部材33の基台部33aの両側面33dは把持部材31、32の小径部31b、32bの溝31d、32dの壁面に密接しているので、この回転力は基台部33aの両側面33dから面接触で把持部材31、32に伝達され、該把持部材31、32は回転する。この時上記のように把持部材31、32の円弧状の突起部31g、32gが洗浄部材35の下大径部35cの上面に喰い込んでいるので、洗浄部材35の下端面が被洗浄基板に当接し摩擦力を受けても空転することがない。   The rotating shaft 22 of the cleaning tool mounting mechanism 20 is mounted in the screw hole 33c formed in the cylindrical portion 33b of the driving force transmission member 33 of the cleaning tool 21 assembled as described above (see FIG. 1). By rotating 22, the driving force transmission member 33 rotates. At this time, since both side surfaces 33d of the base portion 33a of the driving force transmission member 33 are in close contact with the wall surfaces of the grooves 31d and 32d of the small diameter portions 31b and 32b of the grip members 31, 32, this rotational force is applied to the base portion. The gripping members 31 and 32 are transmitted to the gripping members 31 and 32 by surface contact from the both side surfaces 33d of 33a, and the gripping members 31 and 32 rotate. At this time, as described above, the arc-shaped protrusions 31g and 32g of the gripping members 31 and 32 bite into the upper surface of the lower large diameter portion 35c of the cleaning member 35, so that the lower end surface of the cleaning member 35 is on the substrate to be cleaned. Even if it abuts and receives frictional force, it does not run idle.

上記のように洗浄具21の洗浄部材35は把持部材31、32で把持される部分に小径中間部35aを有し、小径中間部35aの上部がフランジ状の上大径部35b、下部が円柱状の下大径部35cとなっており、上大径部35bが把持部材31、32の溝31c、32cに、下大径部35cの上端部が把持部材31、32の凹部31e、32eに、更に洗浄部材35の小径中間部35aに把持部材31、32のフランジ31h、32hが嵌合する。   As described above, the cleaning member 35 of the cleaning tool 21 has the small-diameter intermediate portion 35a at the portion gripped by the gripping members 31 and 32, the upper portion of the small-diameter intermediate portion 35a is a flange-like upper large-diameter portion 35b, and the lower portion is a circle. The lower large diameter portion 35c is a columnar shape. The upper large diameter portion 35b is formed in the grooves 31c and 32c of the holding members 31 and 32, and the upper end portion of the lower large diameter portion 35c is formed in the recessed portions 31e and 32e of the holding members 31 and 32. Further, the flanges 31 h and 32 h of the gripping members 31 and 32 are fitted into the small diameter intermediate portion 35 a of the cleaning member 35.

従って、洗浄部材35の保持は完璧なものとなり、仮に洗浄部材35が基板保持回転機構10(図1参照)の突起部(チャック11)に干渉したような場合にも、洗浄部材35が把持部材31、32から外れたり、抜けかかったりすることがなく、被洗浄基板Wfを連続して洗浄処理するような場合に、洗浄部材35が外れたことに気がつかずに洗浄処理を継続することがない。   Accordingly, the holding of the cleaning member 35 becomes perfect, and even if the cleaning member 35 interferes with the protrusion (chuck 11) of the substrate holding and rotating mechanism 10 (see FIG. 1), the cleaning member 35 is held by the gripping member. In the case where the substrate to be cleaned Wf is continuously cleaned without being detached from or coming off from 31 and 32, the cleaning process is not continued without noticing that the cleaning member 35 has been detached. .

また、上記構成の洗浄具では、把持部材31、32の凹部31e、32eに洗浄部材35の下大径部35cの上端部が嵌合するので、洗浄部材35の下端面が被洗浄基板Wfに当接して横方向の摩擦力を受けて横方向に移動しようとした場合、洗浄部材35の下大径部35cの上端部側面を把持部材31、32の凹部31e、32eで押えるから、この移動は阻止される。   Further, in the cleaning tool having the above configuration, since the upper end portion of the lower large diameter portion 35c of the cleaning member 35 is fitted into the concave portions 31e and 32e of the grip members 31 and 32, the lower end surface of the cleaning member 35 is placed on the substrate to be cleaned Wf. When the contact member receives the frictional force in the lateral direction and tries to move in the lateral direction, the upper end side surface of the lower large diameter portion 35c of the cleaning member 35 is pressed by the recesses 31e and 32e of the gripping members 31 and 32. Is blocked.

洗浄部材35の構成は上記例に限定されるものではなく、例えば図13乃至図16に示す形状のものであってもよい。なお、図13乃至図16において、(a)は側面図、(b)は底面図である。図13乃至図16に示す洗浄部材35は、把持部材31、32で把持される部分に径の小さい小径中間部35aを有し、該小径中間部35aの上下部に上大径部35b及び下大径部35cを有している点は、上記例と同一であるが、下記の点でそれぞれ相違する。   The configuration of the cleaning member 35 is not limited to the above example, and may be, for example, the shape shown in FIGS. 13 to 16, (a) is a side view and (b) is a bottom view. The cleaning member 35 shown in FIGS. 13 to 16 has a small-diameter intermediate portion 35a having a small diameter at a portion gripped by the gripping members 31 and 32, and an upper large-diameter portion 35b and a lower portion on the upper and lower portions of the small-diameter intermediate portion 35a. Although the point which has the large diameter part 35c is the same as the said example, it differs in the following points, respectively.

図13に示す洗浄部材は、洗浄部材35の下端面の外周部の下面(被洗浄基板への接触面)に平坦な環状突起35dを設けている。洗浄部材35をこのように構成することにより、把持部材31、32の凹部31e、32eの下面が洗浄部材35の下大径部35cの外周上面に当接しているから、被洗浄基板Wfは環状突起35dの接触面に均等な接触圧で洗浄されることになる。   The cleaning member shown in FIG. 13 is provided with a flat annular projection 35d on the lower surface (contact surface to the substrate to be cleaned) of the outer peripheral portion of the lower end surface of the cleaning member 35. By configuring the cleaning member 35 in this way, the lower surfaces of the recesses 31e and 32e of the gripping members 31 and 32 are in contact with the outer peripheral upper surface of the lower large diameter portion 35c of the cleaning member 35. The contact surface of the protrusion 35d is cleaned with a uniform contact pressure.

図14に示す洗浄部材は、洗浄部材35の下端面の外周部に設けた環状突起35dに半径方向に複数本の切り溝35eを設け、環状突起35dを複数個(図では4個)に分割している。このように切り溝35eを設けることにより、被洗浄基板Wf上面に供給された洗浄液が該切り溝35eを通して流れ、洗浄効果が向上する。   The cleaning member shown in FIG. 14 is provided with a plurality of kerfs 35e in the radial direction on an annular protrusion 35d provided on the outer peripheral portion of the lower end surface of the cleaning member 35, and the annular protrusion 35d is divided into a plurality (four in the figure). is doing. By providing the cut groove 35e in this way, the cleaning liquid supplied to the upper surface of the substrate Wf to be cleaned flows through the cut groove 35e, and the cleaning effect is improved.

図15に示す洗浄部材は、洗浄部材35の下端面に複数の円板状突起部35f、35gを同心円状に等ピッチで配置している。ここでは外周側に直径の大きい複数の円板状突起部35fを等ピッチで配置し、その内側に直径の小さい複数の円板状突起部35gを等ピッチで配置している。このように構成することにより、洗浄液は円板状突起部35f、35gの間をとおって流れ、洗浄効果が向上する。   In the cleaning member shown in FIG. 15, a plurality of disc-shaped protrusions 35 f and 35 g are arranged on the lower end surface of the cleaning member 35 in a concentric manner at an equal pitch. Here, a plurality of disk-shaped projections 35f having a large diameter are arranged at an equal pitch on the outer peripheral side, and a plurality of disk-shaped projections 35g having a small diameter are arranged at an equal pitch on the inner side. By comprising in this way, a washing | cleaning liquid flows through between the disk-shaped protrusion parts 35f and 35g, and the washing | cleaning effect improves.

図7乃至図12に示す洗浄具において、洗浄部材35を保持する保持機構を構成する一対の把持部材31、32、駆動力伝達部材33、筒状の締結部材34の材料には特に限定しないが、例えば、プラスチック材を用いる。プラスチック材としては、PVC(ポリ塩化ビニル)、PE(ポリエチレン)、PP(ポリプロピレン)、PET(ポリエチレンテレフタレート)、PVDF(ポリフッ化ビニリデン)、PEEK(ポリエーテルエーテルケトン)、PTFE(ポリテトロフロロエチレン)等が使用される。   In the cleaning tool shown in FIGS. 7 to 12, the material of the pair of gripping members 31, 32, the driving force transmission member 33, and the cylindrical fastening member 34 constituting the holding mechanism that holds the cleaning member 35 is not particularly limited. For example, a plastic material is used. Plastic materials include PVC (polyvinyl chloride), PE (polyethylene), PP (polypropylene), PET (polyethylene terephthalate), PVDF (polyvinylidene fluoride), PEEK (polyetheretherketone), PTFE (polytetrofluoroethylene). Etc. are used.

また、上記例では洗浄部材35の構成材料として、PVA(ポリビニルアルコール)スポンジ(=多孔質基質PVF(ポリビニルホルマール))を使用した例を示したが、吸液性の多孔質体であれば、特に限定しない。   Moreover, although the example which used PVA (polyvinyl alcohol) sponge (= porous substrate PVF (polyvinyl formal)) was shown as a constituent material of the washing | cleaning member 35 in the said example, if it is a liquid-absorbing porous body, There is no particular limitation.

また、上記例では一対の把持部材31、32で把持される洗浄部材35をPVAスポンジのような多孔質体としているが、これに限定されるものではなく、図16に示すように、下面に環状のクロス38を貼り付けたクロス保持部材37を一対の把持部材31、32で把持させるようにしてもよい。クロス保持部材37の形状は把持部材31、32で把持される部分に径の小さい小径中間部37aを有し、小径中間部37aの上部がフランジ状の上大径部37bとなっており、下部が円柱状の下大径部37cとなっている点は、洗浄部材35と同じである。   In the above example, the cleaning member 35 held by the pair of holding members 31 and 32 is a porous body such as PVA sponge. However, the present invention is not limited to this, and as shown in FIG. You may make it hold | grip the cross holding member 37 which stuck the cyclic | annular cloth | cross 38 with a pair of holding members 31 and 32. FIG. The cross holding member 37 has a small-diameter intermediate portion 37a having a small diameter at the portion held by the holding members 31 and 32, and the upper portion of the small-diameter intermediate portion 37a is a flange-shaped upper large-diameter portion 37b. Is the same as the cleaning member 35 in that it is a cylindrical lower large diameter portion 37c.

上記クロス保持部材37の材料としては、プラスチック、FKM(フッ素ゴム)、EPDM(エチレンプロピレンゴム)、ウレタンゴム等も使用できる。また、クロス38の材料としては発泡ウレタン、繊維をウレタン樹脂で固めた不織布やスエードタイプの研磨布等のように表面に微細孔が形成されており、この孔の中にクロス38と被洗浄基板Wfとの摩擦で該被洗浄基板Wfの洗浄面から除去されたダスト等の異物が取り込まれる性質のクロスであればよい。   As the material of the cloth holding member 37, plastic, FKM (fluoro rubber), EPDM (ethylene propylene rubber), urethane rubber, or the like can be used. Further, as the material of the cloth 38, fine holes are formed on the surface thereof, such as urethane foam, a nonwoven fabric in which fibers are hardened with urethane resin, and a suede type polishing cloth. The cloth 38 and the substrate to be cleaned are formed in the holes. Any cloth having a property of taking in foreign matters such as dust removed from the cleaning surface of the substrate to be cleaned Wf by friction with Wf may be used.

上記のようにクロス38を用いた洗浄具としては、軟質(例えばゴム類)のクロス保持部材37に、それよりも硬質のクロス38を貼り合わせた構造のものが好ましいが、これに限定されるものではなく、クロス38とクロス保持部材37を一体的に形成したもの、或いは弾性の無いプラスチック類からなるクロス保持部材37にクロス38を貼り付けた構造のものでもよい。   As described above, the cleaning tool using the cloth 38 is preferably a structure in which a hard cloth 38 is bonded to a soft (for example, rubber) cloth holding member 37, but is not limited thereto. Instead of this, a structure in which the cloth 38 and the cloth holding member 37 are integrally formed, or a structure in which the cloth 38 is attached to the cloth holding member 37 made of inelastic plastic may be used.

従来の基板洗浄装置の構成を示す図である。It is a figure which shows the structure of the conventional board | substrate cleaning apparatus. 従来の洗浄具の断面構成を示す図で、図2(a)は正常状態、図2(b)は洗浄部材が把持部材から脱落した状態を示す図である。It is a figure which shows the cross-sectional structure of the conventional cleaning tool, FIG. 2 (a) is a normal state, FIG.2 (b) is a figure which shows the state which the cleaning member fell from the holding member. 本発明に係る基板洗浄装置の構成を示す平面図である。It is a top view which shows the structure of the board | substrate cleaning apparatus which concerns on this invention. 本発明に係る基板洗浄装置の洗浄部材センサの動作状態を示す図で、図4(a)は洗浄部材が正常状態の場合、図4(b)は洗浄部材が把持部材から脱落した場合を示す図である(透過式)。4A and 4B are diagrams illustrating an operation state of the cleaning member sensor of the substrate cleaning apparatus according to the present invention. FIG. 4A illustrates a case where the cleaning member is in a normal state, and FIG. 4B illustrates a case where the cleaning member is detached from the gripping member. It is a figure (transmission type). 本発明に係る基板洗浄装置の洗浄部材センサの動作状態を示す図で、図5(a)は洗浄部材が正常状態の場合、図5(b)は洗浄部材が把持部材から脱落した場合を示す図である(反射式)。FIGS. 5A and 5B are diagrams showing an operation state of the cleaning member sensor of the substrate cleaning apparatus according to the present invention, FIG. 5A shows a case where the cleaning member is in a normal state, and FIG. 5B shows a case where the cleaning member is dropped from the gripping member. It is a figure (reflection type). 本発明に係る基板洗浄装置の制御装置の洗浄部材センサ出力信号の処理流れを示す図である。It is a figure which shows the processing flow of the cleaning member sensor output signal of the control apparatus of the board | substrate cleaning apparatus which concerns on this invention. 本発明に係る洗浄具の構成を示す分解斜視図であるIt is a disassembled perspective view which shows the structure of the cleaning tool which concerns on this invention. 本発明に係る洗浄具の平面図である。It is a top view of the cleaning tool which concerns on this invention. 図8のA−A断面図である。It is AA sectional drawing of FIG. 本発明に係る洗浄具の駆動力伝達部材の平面図である。It is a top view of the driving force transmission member of the cleaning tool concerning the present invention. 図9のB−B断面図である。It is BB sectional drawing of FIG. 図9のC−C断面図である。It is CC sectional drawing of FIG. 本発明に係る洗浄具の洗浄部材の構成例を示す図で、図13(a)は側面図、図13(b)は底面図である。It is a figure which shows the structural example of the cleaning member of the cleaning tool which concerns on this invention, Fig.13 (a) is a side view, FIG.13 (b) is a bottom view. 本発明に係る洗浄具の洗浄部材の構成例を示す図で、図14(a)は側面図、図14(b)は底面図である。It is a figure which shows the structural example of the washing | cleaning member of the cleaning tool which concerns on this invention, Fig.14 (a) is a side view, FIG.14 (b) is a bottom view. 本発明に係る洗浄具の洗浄部材の構成例を示す図で、図15(a)は側面図、図15(b)は底面図である。It is a figure which shows the structural example of the cleaning member of the cleaning tool which concerns on this invention, Fig.15 (a) is a side view, FIG.15 (b) is a bottom view. 本発明に係る洗浄具の洗浄部材の構成例を示す図で、図16(a)は側面図、図16(b)は底面図である。It is a figure which shows the structural example of the cleaning member of the cleaning tool which concerns on this invention, Fig.16 (a) is a side view, FIG.16 (b) is a bottom view. 本発明に係る基板洗浄装置の構成を示す側面図である。It is a side view which shows the structure of the board | substrate cleaning apparatus which concerns on this invention.

符号の説明Explanation of symbols

10 基板保持回転機構
11 チャック
12 アーム
13 基台
14 回転軸
20 洗浄具装着機構
21 洗浄具
22 回転軸
23 揺動アーム
24 揺動軸
25 ノズル
27 投受光器
27a 投光器
27b 受光器
28 光
28’ 反射光
31 把持部材
32 把持部材
33 駆動力伝達部材
34 締結部材
35 洗浄部材
36 ビス
37 クロス保持部材
38 クロス
41 支持部材
42 支持部材
DESCRIPTION OF SYMBOLS 10 Substrate holding | maintenance rotation mechanism 11 Chuck 12 Arm 13 Base 14 Rotating shaft 20 Cleaning tool mounting mechanism 21 Cleaning tool 22 Rotating shaft 23 Swing arm 24 Swing shaft 25 Nozzle 27 Emitter / receiver 27a Emitter 27b Receiver 28 Light 28 'Reflection Light 31 Holding member 32 Holding member 33 Driving force transmission member 34 Fastening member 35 Cleaning member 36 Screw 37 Cross holding member 38 Cross 41 Support member 42 Support member

Claims (4)

基板保持回転機構及び洗浄具を具備し、該基板保持回転機構で保持し回転する被洗浄基板の面上に洗浄液を供給し、前記洗浄具の洗浄部材を前記被洗浄基板の面上に接触させ、前記洗浄部材と前記被洗浄基板の相対的運動により該被洗浄基板を洗浄する基板洗浄方法において、
前記洗浄具の洗浄部材の有無を検出する洗浄部材センサにより、前記洗浄部材の有無を監視し、前記洗浄具に洗浄部材がある場合は、前記相対的運動による洗浄を開始し、前記洗浄具に洗浄部材がない場合は、前記相対的運動による洗浄を停止することを特徴とする基板洗浄方法。
A substrate holding and rotating mechanism and a cleaning tool are provided, a cleaning liquid is supplied onto the surface of the substrate to be cleaned that is held and rotated by the substrate holding and rotating mechanism, and the cleaning member of the cleaning tool is brought into contact with the surface of the substrate to be cleaned. In the substrate cleaning method for cleaning the substrate to be cleaned by relative movement of the cleaning member and the substrate to be cleaned,
The cleaning member sensor that detects the presence or absence of the cleaning member of the cleaning tool monitors the presence or absence of the cleaning member, and when the cleaning tool has a cleaning member, starts cleaning by the relative motion, If there is no cleaning member, the cleaning by the relative motion is stopped.
請求項1に記載の基板洗浄方法において、
前記洗浄具は、前記洗浄部材と該洗浄部材を保持する洗浄部材保持機構とを備え、
前記洗浄部材は、円柱状で中間に小径中間部が該小径中間部の上下に上大径部及び下大径部が一体に形成された構成であり、
前記洗浄部材保持機構は、前記洗浄部材の小径中間部が嵌合するフランジと、該フランジの上下に前記洗浄部材の上大径部が嵌合する溝と下大径部の上部が嵌合する凹部を有する把持部を備え、
前記把持部に前記洗浄部材を、前記フランジに前記小径中間部を、前記溝に前記上大径部を、前記凹部に前記下大径部の上部をそれぞれ嵌合させて保持したことを特徴とする基板洗浄方法。
The substrate cleaning method according to claim 1,
The cleaning tool includes the cleaning member and a cleaning member holding mechanism that holds the cleaning member,
The cleaning member has a cylindrical shape with a small-diameter intermediate portion formed in the middle and an upper large-diameter portion and a lower large-diameter portion integrally formed above and below the small-diameter intermediate portion,
The cleaning member holding mechanism includes a flange in which a small-diameter intermediate portion of the cleaning member is fitted, a groove in which the upper large-diameter portion of the cleaning member is fitted on the top and bottom of the flange, and an upper portion of the lower large-diameter portion. A grip portion having a recess,
The holding member is held by fitting the cleaning member, the flange with the small-diameter intermediate portion, the groove with the upper large-diameter portion, and the concave portion with the upper portion of the lower large-diameter portion. Substrate cleaning method.
請求項1又は2に記載の基板洗浄方法において、
前記把持部は、複数の把持部構成部材からなり、前記洗浄部材保持機構は該複数の把持部構成部材を円筒状に締結する締結機構を備え、
前記複数の把持部構成部材はそれぞれ内側中間部に前記洗浄部材の小径中間部が嵌合するフランジが形成され、該フランジの上下に前記洗浄部材の上大径部が嵌合する溝及び下大径部の上部が嵌合する凹部がそれぞれ形成された構成であり、
前記複数の把持部構成部材の間に前記洗浄部材を、前記フランジに前記小径中間部を、前記溝に前記上大径部を、前記凹部に前記下大径部の上部をそれぞれ嵌合させて配置し、前記締結機構で前記複数の把持部構成部材を一体的に締結したことを特徴とする基板洗浄方法。
In the substrate cleaning method according to claim 1 or 2,
The grip portion is composed of a plurality of grip portion constituent members, and the cleaning member holding mechanism includes a fastening mechanism for fastening the plurality of grip portion constituent members in a cylindrical shape,
Each of the plurality of gripping member constituting members has a flange in which the small-diameter intermediate portion of the cleaning member is fitted in the inner intermediate portion, and a groove and a lower large groove that fit the upper-large diameter portion of the cleaning member above and below the flange. It is a configuration in which a recess into which the upper part of the diameter part fits is formed,
The cleaning member is fitted between the plurality of gripping portion constituting members, the small diameter intermediate portion is fitted to the flange, the upper large diameter portion is fitted to the groove, and the upper portion of the lower large diameter portion is fitted to the recess. A substrate cleaning method comprising: arranging and integrally fastening the plurality of gripping portion constituting members by the fastening mechanism.
請求項3に記載の基板洗浄方法において、
前記締結機構は前記締結した把持部構成部材に回転力を伝達するようになっていることを特徴とする基板洗浄方法。
The substrate cleaning method according to claim 3,
The substrate cleaning method, wherein the fastening mechanism transmits a rotational force to the fastened gripping member constituting member.
JP2007241594A 2007-09-18 2007-09-18 Substrate cleaning method Expired - Lifetime JP4634426B2 (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014216393A (en) * 2013-04-23 2014-11-17 株式会社荏原製作所 Substrate processing apparatus and method for manufacturing processed substrate
JP2018142738A (en) * 2014-11-20 2018-09-13 株式会社荏原製作所 Cleaning tool, cleaning tool manufacturing method and substrate cleaning device
JP2019087685A (en) * 2017-11-09 2019-06-06 株式会社ディスコ Wafer cleaning device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1174238A (en) * 1997-08-29 1999-03-16 Shibaura Eng Works Co Ltd Brush-cleaning equipment and method therefor
JPH11287721A (en) * 1998-04-03 1999-10-19 Tokyo Electron Ltd Treatment equipment and treatment method
JP2000051128A (en) * 1998-08-07 2000-02-22 Amano Corp Floor polishing cleaner

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1174238A (en) * 1997-08-29 1999-03-16 Shibaura Eng Works Co Ltd Brush-cleaning equipment and method therefor
JPH11287721A (en) * 1998-04-03 1999-10-19 Tokyo Electron Ltd Treatment equipment and treatment method
JP2000051128A (en) * 1998-08-07 2000-02-22 Amano Corp Floor polishing cleaner

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014216393A (en) * 2013-04-23 2014-11-17 株式会社荏原製作所 Substrate processing apparatus and method for manufacturing processed substrate
JP2018142738A (en) * 2014-11-20 2018-09-13 株式会社荏原製作所 Cleaning tool, cleaning tool manufacturing method and substrate cleaning device
US10625308B2 (en) 2014-11-20 2020-04-21 Ebara Corporation Cleaning device, method of manufacturing the same and substrate cleaning apparatus
JP2019087685A (en) * 2017-11-09 2019-06-06 株式会社ディスコ Wafer cleaning device

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