JP2007308600A - Gas refiner and method for producing methane - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a gas refiner capable of stably refining at low cost a raw gas containing sulfur-based impurities and moisture. <P>SOLUTION: The gas refiner 10 for refining a raw gas 1 containing sulfur-based impurities 1a and moisture 1c is provided. This gas refiner 10 includes an adsorption column 11 packed with a first adsorbent 12 for the impurities 1a and another adsorption column 21 packed with a second adsorbent 24 for the moisture 1c, wherein the first adsorbent 12 is silicalite, while the second adsorbent 24 is silica gel. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a gas purification apparatus and a method for producing methane, and in particular, biogas such as sewage digestion gas and food waste fermentation methane gas, and waste pyrolysis gas generated by pyrolyzing waste such as waste. Thus, the present invention is effective when applied to purify a gas containing sulfur impurities and moisture.

  Biogas such as sewage digestion gas and food waste fermented methane gas, and waste pyrolysis gas generated by pyrolyzing wastes such as garbage, etc., can be used effectively for power generation by driving gas engines and micro gas turbines In this case, the harmful substances such as sulfur impurities (for example, hydrogen sulfide, thiocarbonyl, thiophene, mercaptan) and organic silicon impurities (for example, siloxane) contained in the gas are removed in advance. Therefore, it is necessary to purify the gas. For this reason, conventionally, sulfur-based impurities in raw gases such as the biogas and the waste pyrolysis gas are chemically absorbed and removed with an aqueous sodium hydroxide solution (Takahax method) or physically with iron oxide or the like. The raw gas is purified by adsorption or removal (Dalai powder layer method) or by physically adsorbing and removing organic silicon impurities in the raw gas with activated carbon or the like.

  For example, in Patent Document 1, raw organic gas is fed to a first treatment tank, and the organic silicon is adsorbed by an organosilicon impurity adsorbent and a sulfur impurity adsorbent disposed in the first treatment tank. A gas refining device is disclosed that purifies a purified gas composed of methane by adsorbing and removing system impurities and the sulfur impurities. In this gas purification apparatus, a moisture adsorbent is provided in the first treatment tank on the downstream side of the impurity adsorbent in the first treatment tank in the gas flow direction, and is included in the raw gas. Moisture was removed by adsorption.

JP 2006-16439 A

  However, in the gas purification apparatus described above, when the moisture adsorbed by the moisture adsorbent is desorbed and exhausted, the moisture is exhausted in the exhaust path or in the first treatment tank. Above the saturated water vapor pressure, liquid water is obtained. In this liquid water, sulfur-based impurities desorbed from the sulfur-based impurity adsorbent are dissolved, and this solution is discharged into the exhaust path (for example, piping, valves, and vacuum). Pump, etc.), the first treatment tank, etc. may be corroded, or the adsorption performance of the adsorbent may be deteriorated. For this reason, the first treatment tank, the adsorbent, and the like must be periodically replaced, which increases the running cost. Moreover, there is a possibility that the purified gas cannot be purified stably.

  Furthermore, there is a possibility that precipitates are generated in the exhaust path or the adsorbent due to a chemical reaction of the solution, and the adsorbent adsorption performance is further deteriorated by the precipitates.

  Therefore, the present invention has been proposed in view of the above-described problems, and provides a gas purification apparatus and a method for producing methane that can stably purify a raw gas containing sulfur-based impurities and moisture at low cost. For the purpose.

  A gas purification apparatus according to a first invention that solves the above-described problem is a gas purification apparatus that purifies a raw gas containing sulfur-based impurities and moisture, and includes a first treatment tank and the first treatment. A first gas feeding means for circulating the raw gas from one side to the other side of the tank; a first reduced pressure exhausting means for depressurizing and exhausting the inside of the first processing tank; and the first processing tank. A sulfur-based impurity adsorbent that adsorbs the sulfur-based impurities, a second processing tank, and the first processing tank, which are arranged in the first processing tank so as to partition one side and the other side of the first processing tank A second gas feeding means for circulating the gas flowing from one side to the other side of the second processing tank from the one side to the other side of the second processing tank; And the second processing tank so as to partition the one side and the other side in the second processing tank. Disposed, and a moisture adsorbent adsorbs moisture, the sulfur-based impurities adsorbent is a silicalite, the water adsorbent, characterized in that it is a silica gel.

  A gas purification apparatus according to a second invention that solves the above-described problem is a gas purification apparatus that purifies a raw gas containing sulfur-based impurities and moisture, and includes a first treatment tank and the first treatment. The first reduced pressure exhaust means for depressurizing and exhausting the inside of the tank, and disposed in the first processing tank so as to partition one side and the other side in the first processing tank, and the sulfur impurities The sulfur-based impurity adsorbent to be adsorbed, the second treatment tank, and the raw gas are circulated from one side of the first treatment tank to the other side, and from one side of the first treatment tank to the other side. A second gas feeding means for circulating the circulated gas from one side to the other side of the second processing tank; a second reduced pressure exhausting means for evacuating and exhausting the inside of the second processing tank; It is arranged in the second processing tank so as to partition one side and the other side in the second processing tank, A moisture adsorbent which adsorbs min, the sulfur-based impurities adsorbent is a silicalite, the water adsorbent, characterized in that it is a silica gel.

  A gas purification apparatus according to a third invention for solving the above-described problem is the gas purification apparatus described in the first or second invention, wherein one side and the other side in the first processing tank are connected. The organic silicon-based impurity adsorbent is arranged in the first treatment tank so as to partition and adsorbs the organic silicon-based impurities, and the organic silicon-based impurity adsorbents are MCM-41, USY, MCM-48. , USM.

A gas purification apparatus according to a fourth invention for solving the above-described problem is the gas purification apparatus described in any one of the first to third inventions, wherein the third treatment tank and the second treatment are performed. A third gas feeding means for circulating the gas flowing from one side of the tank to the other side from the one side of the third processing tank and the third processing tank for depressurizing and exhausting the inside of the third processing tank Three decompression means, and a carbon dioxide adsorbent that adsorbs carbon dioxide, arranged in the third treatment tank so as to partition one side and the other side in the third treatment tank, The carbon dioxide adsorbent is an X-type zeolite using any one of Li, Ca, Sr, Mg, and Na as an exchange cation.
Examples of the carbon dioxide adsorbent include X-type zeolite having a silica / alumina ratio of 2 to 2.5.

  A gas purification apparatus according to a fifth invention for solving the above-described problem is the gas purification apparatus described in any one of the first to fourth inventions, wherein a plurality of the first and second treatment tanks are provided. And connected in parallel.

  A gas purification apparatus according to a sixth invention for solving the above-described problem is the gas purification apparatus described in the fourth invention, wherein a plurality of the first and second treatment tanks are provided and connected in parallel. In addition, at least three third treatment tanks are provided and connected in parallel.

  A gas purification apparatus according to a seventh invention for solving the above-described problem is the gas purification apparatus according to the sixth invention, wherein the gas purification apparatus is exhausted from the third treatment tank by the third decompression means. A first exhaust gas re-feeding means for feeding gas to one side of the third treatment tank again and feeding the gas to the other side of the first and second treatment tanks; And a second exhaust re-transmission means for feeding the gas flowing from one side to the other side to the other side of the third treatment tank.

  A gas purification apparatus according to an eighth invention for solving the above-described problem is the gas purification apparatus described in any one of the first to seventh inventions, wherein the sulfur-based impurity adsorbent is in a gas flow direction. In the above, it is arranged upstream of the moisture adsorbent.

  A gas purification apparatus according to a ninth invention for solving the above-mentioned problem is the gas purification apparatus described in the third invention, wherein the organosilicon impurity adsorbent is the sulfur impurity in the gas flow direction. It is arranged downstream of the adsorbent.

  A gas purification apparatus according to a tenth invention for solving the above-mentioned problem is the gas purification apparatus described in the fourth invention, wherein the carbon dioxide adsorbent is more than the moisture adsorbent in the gas flow direction. It is arranged on the downstream side.

  A gas purification apparatus according to an eleventh invention for solving the above-described problems is the gas purification apparatus described in any one of the first to tenth inventions, and has a catalyst layer that adsorbs the organosilicon impurities. The pretreatment tank is provided upstream of the first treatment tank in the gas flow direction.

  A gas purification apparatus according to a twelfth invention for solving the above-described problem is the gas purification apparatus described in any of the fourth to eleventh inventions, wherein the fourth treatment tank and the third treatment are provided. A fourth gas feeding means for circulating the gas exhausted from one side of the tank from one side of the fourth processing tank to the other side; and a fourth gas exhausting the inside of the fourth processing tank under reduced pressure A vacuum exhaust means; and a carbon dioxide adsorbent that is disposed in the fourth treatment tank so as to partition one side and the other side in the fourth treatment tank and adsorbs carbon dioxide, and The carbon adsorbent is an X-type zeolite using any one of Li, Ca, Sr, Mg, and Na as an exchange cation.

  A gas purifying apparatus according to a thirteenth invention for solving the above-described problems is the gas purifying apparatus described in any one of the first to twelfth inventions, wherein the first and second vacuum exhaust means are provided with dry air. It is characterized by letting you feed.

  A gas purifier according to a fourteenth aspect of the present invention for solving the above-described problem is the gas purifier according to any one of the first to thirteenth aspects, wherein the drain tank has the first and second reduced pressure exhausts. It is provided in the vicinity of the gas supply port of the means.

  A gas purification apparatus according to a fifteenth aspect of the present invention for solving the above-described problem is the gas purification apparatus according to any one of the seventh to fourteenth aspects, wherein the third exhaust gas re-transmission means is configured to perform the third operation. The flow rate adjusting valve for adjusting the flow rate of the gas supplied to one side of the treatment tank, the gas flowing from one side of the third treatment tank to the other side, and the third decompression means Based on the carbon dioxide concentration measuring means that measures the concentration of carbon dioxide in the gas exhausted from one side of the third treatment tank, and the carbon dioxide concentration measured by the carbon dioxide measuring means, the flow control valve And a control means for controlling the opening degree.

  A gas purification device according to a sixteenth invention for solving the above-described problem is the gas purification device according to any one of the seventh to fifteenth inventions, wherein the mixing tank is the third gas purification device in the gas flow direction. Provided upstream of the gas supply means, the gas flowing from one side of the second treatment tank to the other side and the first exhaust retransmission supply means are sent to one side of the third treatment tank. The supplied gas flows into the mixing tank.

  A gas purification apparatus according to a seventeenth aspect of the present invention for solving the above-described problem is the gas purification apparatus according to any one of the fourth to sixteenth aspects, wherein the jacket is capable of adjusting the temperature in the third treatment tank. Is provided.

  A gas purifier according to an eighteenth aspect of the present invention for solving the above-described problem is the gas purifier according to any one of the fourth to seventeenth aspects, wherein the heat exchanger is the third gas purifier in the gas flow direction. It is provided in the downstream rather than the gas supply means.

  A gas purification apparatus according to a nineteenth invention for solving the above-mentioned problems is the gas purification apparatus according to any one of the first to eighteenth inventions, wherein the adsorbent has a honeycomb shape. And

  A gas purification device according to a twentieth invention for solving the above-described problems is the gas purification device according to any one of the first to nineteenth inventions, wherein the raw gas is biogas or waste pyrolysis. It is a gas.

  The method for producing methane according to the twenty-first invention for solving the above-described problem is a method for producing methane by refining a raw gas containing sulfur-based impurities, moisture, and methane, and producing the methane, the raw gas Is passed through a sulfur-based impurity adsorbent disposed in the first treatment tank, the sulfur-based impurities are adsorbed and removed, and the gas from which the impurities are adsorbed and removed is transferred to a moisture adsorbent disposed in the second treatment tank. It is characterized in that the water is adsorbed and removed by circulation to purify methane.

  The method for producing methane according to the twenty-second aspect of the invention for solving the above-mentioned problem is the production of methane by refining sulfur-based impurities, organic silicon-based impurities, moisture, carbon dioxide, and raw gas containing methane to produce methane. In the method, the raw gas is passed through a sulfur-based impurity adsorbent and an organic silicon-based impurity adsorbent disposed in a first treatment tank, and the sulfur-based impurities and the organosilicon-based impurities are respectively adsorbed and removed. The gas from which the impurities have been adsorbed and removed is passed through the moisture adsorbent disposed in the second treatment tank, the moisture is adsorbed and removed, and the gas from which the moisture has been adsorbed and removed is disposed in the third treatment tank. The carbon dioxide is adsorbed and removed through the adsorbent to purify methane.

  According to the gas purification apparatus according to the first invention, the sulfur-based impurities and moisture contained in the raw gas are disposed in the sulfur-based impurity adsorbent disposed in the first treatment tank and the second treatment tank. The sulfur-based impurities are adsorbed by the moisture adsorbent, and the sulfur-based impurities and the moisture are discharged out of the system through different exhaust paths, so that the sulfur-based impurities and the moisture are not in contact with each other. Therefore, it is possible to avoid corrosion of the treatment tank, the adsorbent, and an exhaust path through which the sulfur impurities are exhausted by a solution in which the sulfur impurities are dissolved in the moisture. As a result, purification by removing sulfur impurities and moisture from the raw gas can be stably performed at low cost.

  According to the gas purification apparatus according to the second invention, the sulfur-based impurities and moisture contained in the raw gas are disposed in the sulfur-based impurity adsorbent disposed in the first treatment tank and the second treatment tank. The sulfur-based impurities are adsorbed by the moisture adsorbent, and the sulfur-based impurities and the water are discharged out of the system through different exhaust paths, so that the sulfur-based impurities and the water do not come into contact with each other. Therefore, it is possible to avoid corrosion of the treatment tank, the adsorbent, and an exhaust path through which the sulfur impurities are exhausted by a solution in which the sulfur impurities are dissolved in the moisture. As a result, purification by removing sulfur impurities and moisture from the raw gas can be stably performed at low cost. Furthermore, corrosion of the second gas supply means due to contact between the second gas supply means and sulfur-based impurities contained in the raw gas can be avoided.

  According to the gas purification apparatus according to the third aspect of the invention, the purification by removing the organosilicon impurities from the raw gas can be carried out stably at a low cost.

  According to the gas purification apparatus of the fourth invention, carbon dioxide is removed from the raw gas, and a purified gas having high calorie and purity can be obtained.

  According to the gas purification apparatus according to the fifth aspect of the present invention, since the purification process of the raw gas can be performed continuously, the processing efficiency can be improved.

  According to the gas purification apparatus according to the sixth aspect of the invention, the purification process of the raw gas can be performed continuously, so that the processing efficiency can be improved.

  According to the gas purification apparatus according to the seventh aspect of the invention, the recovery rate of the purified gas from the raw gas can be improved. In addition, the sulfur-based impurity adsorbent, the organosilicon impurity adsorbent, and the moisture adsorbent can be efficiently regenerated.

  According to the gas purification apparatus of the eighth invention, it is possible to suppress the deterioration of the moisture adsorbent due to the sulfur-based impurities.

  According to the gas purification apparatus of the ninth aspect, it is possible to suppress the deterioration of the organosilicon impurity adsorbent due to the sulfur impurities.

  According to the gas purification apparatus of the tenth invention, deterioration of the carbon dioxide adsorbent due to sulfur impurities, organosilicon impurities, and moisture can be suppressed.

  According to the gas purification apparatus pertaining to the eleventh aspect of the invention, it is possible to more reliably remove organosilicon impurities from the raw gas and obtain a purified gas with higher purity.

  According to the gas purification apparatus pertaining to the twelfth aspect of the invention, the purity of carbon dioxide removed from the raw gas becomes high and can be used effectively.

  According to the gas purification apparatus of the thirteenth aspect of the present invention, in the first and second reduced pressure exhaust means, liquefaction of the exhausted impurities and the like is prevented, and the adsorbent regeneration efficiency is further improved. As a result, it is possible to prevent corrosion of the first and second decompression exhaust means and the exhaust path due to liquefied impurities, etc., and further reduce the load on the decompression exhaust means, thereby suppressing an increase in running cost.

  According to the gas purification apparatus of the fourteenth aspect of the present invention, even if the impurities adsorbed on the adsorbent are liquefied and the liquefied impurities are discharged from the first and second vacuum exhaust means, they are stored in the drain tank. It is done. As a result, corrosion of the exhaust path downstream of the drain tank in the gas flow direction is prevented, and an increase in running cost can be suppressed.

  According to the gas purification apparatus of the fifteenth aspect of the present invention, carbon dioxide can be efficiently and stably removed from the raw gas, and a purified gas with high purity can be obtained.

  According to the gas purification apparatus of the sixteenth aspect, the gas is homogenized in the mixing tank, and the purified gas can be stably obtained from the raw gas.

  According to the gas purification apparatus of the seventeenth invention, the adsorption performance of the carbon dioxide adsorbent can be stably expressed, and carbon dioxide is efficiently removed from the raw gas to obtain a purified gas with high purity. Can do.

  According to the gas purification apparatus according to the eighteenth aspect of the invention, the adsorption performance of the carbon dioxide adsorbent can be stably expressed, and carbon dioxide is efficiently removed from the raw gas to obtain a purified gas with high purity. Can do.

  According to the gas purification apparatus of the nineteenth aspect of the present invention, it is possible to reduce the pressure loss when the raw gas is circulated, and to use a relatively small blower, rather than the granular adsorbent. As a result, initial costs and running costs can be further reduced, and at the same time, a smaller installation space can be achieved.

  According to the gas purification apparatus pertaining to the twentieth invention, the effects described above can be most effectively obtained.

  According to the method for producing methane according to the twenty-first aspect, the sulfur-based impurities and moisture contained in the raw gas are disposed in the sulfur-based impurity adsorbent disposed in the first treatment tank and the second treatment tank. Since the sulfur-based impurities and the water are discharged out of the system through different exhaust paths, the sulfur-based impurities and the water are not in contact with each other. Therefore, it is possible to avoid corrosion of the treatment tank, the adsorbent, and an exhaust path through which the sulfur impurities are exhausted by a solution in which the sulfur impurities are dissolved in the moisture. As a result, purification by removing sulfur impurities and moisture from the raw gas can be stably performed at low cost.

  According to the method for producing methane according to the twenty-second invention, the sulfur-based impurities and moisture contained in the raw gas are disposed in the sulfur-based impurity adsorbent disposed in the first treatment tank and the second treatment tank. Since the sulfur-based impurities and the water are discharged out of the system through different exhaust paths, the sulfur-based impurities and the water are not in contact with each other. Therefore, it is possible to avoid corrosion of the treatment tank, the adsorbent, and an exhaust path through which the sulfur impurities are exhausted by a solution in which the sulfur impurities are dissolved in the moisture. As a result, purification by removing sulfur impurities and moisture from the raw gas can be stably performed at low cost. Further, carbon dioxide can be removed from the raw gas to obtain a calorie and highly purified gas.

  Below, the best form for implementing the gas purification apparatus which concerns on this invention is demonstrated concretely based on each embodiment.

[First embodiment]
Hereinafter, the gas purification apparatus according to the first embodiment of the present invention will be specifically described with reference to the drawings.

  FIG. 1 is a schematic configuration diagram of a gas purification apparatus according to the first embodiment of the present invention, and FIG. 2 is an explanatory diagram of a third treatment tank that it has.

As shown in FIG. 1, the gas purification apparatus according to the present embodiment includes biogas such as sewage digestion gas and food waste fermentation methane gas, and waste pyrolysis gas generated by pyrolyzing waste such as garbage. Such as sulfur-based impurities (for example, hydrogen sulfide, thiocarbonyl, thiophene, mercaptan) 1a (content: 1000 ppm or more), organosilicon-based impurities (for example, siloxane) 1b (content: about 50 mg / Nm ³⁾ ), A gas purification apparatus 10 for purifying the raw gas 1 containing moisture 1c and carbon dioxide 1d, and a first treatment tank that adsorbs and removes sulfur-based impurities 1a and organosilicon-based impurities 1b from the raw gas 1 The first adsorbing tower 11, the first gas feeding means for circulating the raw gas 1 from the lower side (one side) to the upper side (the other side) of the adsorbing tower 11, The first reduced-pressure exhaust means for exhausting the impurities 1a and 1b adsorbed in the adsorption tower 11 and the purified gas 1e that is circulated from the lower side to the upper side of the adsorption tower 11 to adsorb moisture 1c. An adsorption tower 21 which is a second treatment tank to be removed, a second gas feeding means for circulating the purified gas 1e from the lower side (one side) to the upper side (the other side) of the adsorption tower 21, and the adsorption tower 21 The second reduced pressure exhaust means for evacuating the water 1c adsorbed in the adsorption tower 21 and the lower pressure (one side) to the upper side (the other side) of the adsorption tower 21 were purified. An adsorption tower 31 that is a third treatment tank that adsorbs and removes carbon dioxide 1d from the purified gas 1f, and a first gas that passes the purified gas 1f from the lower side (one side) to the upper side (the other side) of the adsorption tower 31. Three gas feeding means and the adsorption tower 31 are depressurized and the adsorption tower 31 And a third decompression means for exhausting the adsorbed carbon dioxide 1d.

  In addition, the gas purification apparatus 10 described above causes carbon dioxide (gas) 1d that has been decompressed and exhausted from one side of the adsorption tower 31 to be fed again from one side of the adsorption tower 31, and the other of the adsorption towers 11 and 21. A first exhaust re-transmission means for feeding the gas to the side, and a second exhaust re-transmission means for feeding the gas 1g flowing from one side of the adsorption tower 31 to the other side to the other side of the adsorption tower 31.

  Examples of the first gas supply means include a blower 16 and valves 18a and 18b.

  Examples of the first vacuum exhaust means include a vacuum pump 56 and a valve 19a.

  A plurality of (two in this embodiment) adsorption towers 11 are provided and connected in parallel. The adsorption tower 11 is arranged in the adsorption tower 11 so as to partition the lower side (one side) and the upper side (the other side) in the adsorption tower 11 and is made of a high silica zeolite that adsorbs the sulfur impurities 1a. The honeycomb-shaped sulfur-based impurity adsorbent 12 is disposed in the adsorption tower 11 so as to partition the lower side (one side) and the upper side (the other side) in the adsorption tower 11, and the organosilicon impurities 1b are It has a honeycomb-shaped organosilicon impurity adsorbent 13 made of adsorbing high silica zeolite.

  Silicalite is mentioned as a high silica zeolite which comprises the sulfur type impurity adsorption agent 12. FIG.

  Note that the high silica zeolite has hydrophobicity, and the amount of adsorption is hardly reduced even in the presence of moisture.

  Examples of the high silica zeolite that constitutes the organosilicon impurity adsorbent 13 include MCM-41, USY, MCM-48, and USM. In particular, MCM-41 and USY are preferable, and USY is the most preferable. preferable.

  A plurality (two in this embodiment) of adsorption towers 21 are provided and connected in parallel. The adsorption tower 21 is arranged in the adsorption tower 21 so as to partition the lower side (one side) and the upper side (the other side) in the adsorption tower 21 and is made of silica gel that adsorbs moisture and has a honeycomb-shaped moisture. It has an adsorbent 24.

  Examples of the second gas supply means include a blower 26 and valves 28a and 28b.

  Examples of the second decompression means include a vacuum pump 66 and a valve 29a.

  A plurality (three in this embodiment) of adsorption towers 31 are provided and connected in parallel. The adsorption tower 31 is disposed in the adsorption tower 31 so as to partition the lower side (one side) and the upper side (the other side) in the adsorption tower 31 and adsorbs the carbon dioxide 1d. It has a carbon dioxide adsorbent 35 made of zeolite.

  As the X-type zeolite constituting the carbon dioxide adsorbent 35, an X-type zeolite (Li-X, Ca-X, Sr-X, Mg) using any one of Li, Ca, Sr, Mg, and Na as an exchange cation. -X, Na-X), and the silica / alumina ratio is preferably 2 to 2.5, particularly X-type zeolite (Li-X or Na-X) having Li or Na as an exchange cation. More preferably, the silica / alumina ratio is most preferably 2.

  Examples of the third gas feeding means include a blower 36 and valves 38a and 38b.

  Examples of the third decompression means include a vacuum pump 46 and a valve 39a.

  Examples of the first exhaust retransmission supply means include a first surge tank 47, valves 14a, 14b, 19b, 29b, 49a, 49b, flow rate adjusting valves 2, 3 and the like.

  Examples of the second exhaust re-transmission supply means include a second surge tank 57, a flow rate adjusting valve 6, a valve 39b, and the like.

  In the gas purification device 10 described above, the sulfur-based impurity adsorbent 12 is disposed upstream of the organosilicon-based impurity adsorbent 13 in the flow direction of the raw gas 1. The moisture adsorbent 24 is disposed downstream of the sulfur-based impurity adsorbent 12 and the organosilicon impurity adsorbent 13 in the flow direction of the raw gas 1. The carbon dioxide adsorbent 35 is disposed downstream of the sulfur-based impurity adsorbent 12, the organosilicon impurity adsorbent 13, and the moisture adsorbent 24 in the flow direction of the raw gas 1.

  By disposing the sulfur-based impurity adsorbent 12 at such a position, deterioration of the organosilicon impurity adsorbent 13 and the moisture adsorbent 24 due to the sulfur-based impurity 1a can be suppressed. By disposing the carbon dioxide adsorbent 35 at such a position, it is possible to suppress the deterioration of the carbon dioxide adsorbent 35 due to the sulfur-based impurities 1a, the organic silicon-based impurities 1b, and the moisture 1c.

  The gas 1h that flows from the first surge tank 47 to the other side of the adsorption tower 31 and joins the purified gas 1f is adjusted by the flow rate control valves 7 and 8. The carbon dioxide 1d is exhausted outside the system through the flow rate adjustment valve 32 and the valve 33. 1 g of purified gas is recovered via the flow rate control valve 37.

  In such a gas purification apparatus 10, an adsorption step for adsorbing and removing sulfur-based impurities 1 a and organosilicon-based impurities 1 b is performed in one adsorption tower 11, and adsorbents 12, A desorption process for desorbing the sulfur-based impurities 1a and the organosilicon-based impurities 1b adsorbed on the respective 13 is performed. Further, an adsorption process for adsorbing and removing the moisture 1c is performed in one adsorption tower 21, and a desorption process for desorbing the moisture 1c adsorbed by the adsorbent 24 in the other adsorption tower 21 is performed. Further, an adsorption process for adsorbing and removing carbon dioxide 1d is performed in one adsorption tower 31, a purge process for desorbing 1 g of purified gas adsorbed in the other adsorption tower 31 is performed, and another one is performed. A desorption process for desorbing carbon dioxide 1d adsorbed by the adsorbent 35 in the two adsorption towers 31 is performed.

  That is, when an adsorption process is performed in one adsorption tower 11, the valves 18a and 18b corresponding to the gas flow path are opened, while the valves 19a and 19b are closed and the blower 16 is operated, whereby the raw gas 1 is fed into the adsorption tower 11. At this time, the raw gas 1 flows through the adsorption tower 11 from the lower side to the upper side, and the impurities 1a and 1b are adsorbed and removed by the adsorbents 12 and 13 in the adsorption tower 11, respectively. As a result, the raw gas 1 becomes purified gas 1e and is sent out from above the adsorption tower 11.

  When the desorption process is performed in the other adsorption tower 11, the valve 19 a corresponding to the gas flow path is opened, while the valves 18 a, 18 b, and 19 b are closed and the vacuum pump 56 is operated, whereby the adsorption tower 11 is operated. The inside is depressurized. At this time, the impurities 1 a and 1 b adsorbed on the adsorbents 12 and 13 are desorbed from the adsorbents 12 and 13 and exhausted out of the system through the vacuum pump 56.

  Subsequently, when such desorption is performed for a predetermined time, the valves 18a and 18b are closed, while the valves 14b, 19a and 19b are opened, and the flow rate adjusting valve 3 is adjusted, whereby the first surge tank 47 Of carbon dioxide 1d is fed into the adsorption tower 11. By performing this operation, the impurities 1a and 1b adsorbed on the adsorbents 12 and 13 are further desorbed.

  Subsequently, after performing the above-described operation for a predetermined time, the valves 14b, 18a, 18b, and 19a are closed, while the valves 15b and 19b are opened and the flow rate control valve 5 is adjusted to increase the pressure by the vacuum pump 46. The carbon dioxide 1d is fed from the first surge tank 47 into the adsorption tower 11. Thereby, the inside of the adsorption tower 11 is pressurized and becomes a normal pressure. The exhausted impurities 1a and 1b may be recovered.

  When the adsorption process and the desorption process described above are performed for a predetermined time, the desorption process is performed in the adsorption tower 11 that has performed the adsorption process, and the adsorption process is performed in the adsorption tower 11 that has performed the desorption process. By repeatedly performing the above-described steps alternately in the two adsorption towers 11, the removal of the impurities 1a and 1b from the raw gas 1 (purification treatment of the raw gas 1) can be performed continuously.

  Further, when the adsorption process is performed in one adsorption tower 21, the valves 28a and 28b corresponding to the gas flow path are opened, while the valves 29a and 29b are closed and the blower 26 is operated, whereby the adsorption tower is operated. The purified gas 1 e that has been circulated from one side of 11 to the other side and purified is fed into the adsorption tower 21. At this time, the purified gas 1e flows through the adsorption tower 21 from the lower side to the upper side, and the impurities 1c are adsorbed and removed by the adsorbent 24 in the adsorption tower 21. Thereby, the purified gas 1e becomes the purified gas 1f and is sent from the upper side of the adsorption tower 21.

  When the desorption process is performed in the other adsorption tower 21, the valve 29 a corresponding to the gas flow path is opened, while the valves 28 a, 28 b, and 29 b are closed and the vacuum pump 56 is operated, thereby the adsorption tower 21. The inside is depressurized. At this time, the moisture 1c adsorbed by the adsorbent 24 is desorbed from the adsorbent 24 and exhausted outside the system through the vacuum pump 66.

  Subsequently, when such desorption is performed for a predetermined time, the valves 28a and 28b are closed, while the valves 14a, 29a and 29b are opened, and the flow rate control valve 2 is adjusted, so that the inside of the first surge tank 47 Of carbon dioxide 1d is fed into the adsorption tower 21. By performing this operation, the impurity 1c adsorbed on the adsorbent 24 is further desorbed.

  Subsequently, after performing the above-described operation for a predetermined time, the valves 14a, 28a, 28b, and 29a are closed, while the valves 15a and 29b are opened and the flow rate adjusting valve 4 is adjusted so that the pressure is applied by the vacuum pump 46. The carbon dioxide 1d is fed from the first surge tank 47 into the adsorption tower 21. Thereby, the inside of the adsorption tower 21 is pressurized and becomes a normal pressure. The exhausted impurity 1c may be recovered.

  When the adsorption process and the desorption process described above are performed for a predetermined time, the desorption process is performed in the adsorption tower 21 that has performed the adsorption process, and the adsorption process is performed in the adsorption tower 21 that has performed the desorption process. By repeatedly performing the above-described steps alternately in the two adsorption towers 21, the removal of the impurity 1c from the purified gas 1e (purification treatment of the raw gas 1) can be performed continuously.

  Here, an adsorption process, a purge process, and a desorption process in the adsorption tower 31 will be described with reference to FIG. In this figure, the adsorption process is performed in the adsorption tower 31 on the left side in the figure, the purge process is performed in the central adsorption tower 31 in the figure, and the desorption process is performed in the adsorption tower 31 on the right side in the figure. Is shown.

  In one adsorption tower 31 (left side in the figure), the valves 38a and 38b corresponding to the gas flow path of the adsorption tower 31 are opened, while the valves 39a, 39b, 49a and 49b are closed, and the blower 36 is opened. By operating, the purified gas 1 f that is circulated and purified from one side of the adsorption tower 21 to the other side is fed into the adsorption tower 31. At this time, the purified gas 1 f flows from the lower side to the upper side in the adsorption tower 31, and the impurities 1 d are adsorbed and removed by the adsorbent 35 in the adsorption tower 31. As a result, the purified gas 1 f becomes 1 g of purified gas and is sent from above the adsorption tower 31.

  In another adsorption tower 31 (center in the figure), the valves 49a and 49b corresponding to the gas flow path of the adsorption tower 31 are opened, while the valves 38a, 38b, 39a and 39b are closed, and the blower By operating 36 and the vacuum pump 46, the gas 1d in the first surge tank 47 is circulated from one side of the adsorption tower 31 to the other side. At this time, the partial pressure of carbon dioxide 1d is increased in the adsorption tower 31, the carbon dioxide 1d and the purified gas 1g adsorbed on the adsorbent 35 are replaced, and the purified gas 1g is desorbed, and the purified gas 1h. Is delivered from above the adsorption tower 31. This purified gas 1h joins with the purified gas 1f flowing from one side of the adsorption tower 21 to the other side and is fed into an (other) adsorption tower 31 (left in the figure) that performs an adsorption step. Therefore, since 1 g of purified gas adsorbed on the adsorbent 35 can be recovered, the recovery rate of 1 g of purified gas from the raw gas 1 can be improved.

  Further, in another adsorption tower 31 (right side in the figure), the valve 39a corresponding to the gas flow path of the adsorption tower 31 is opened, while the valves 38a, 38b, 39b, 49b are closed, and the vacuum pump By operating 46, the inside of the adsorption tower 31 is depressurized. At this time, the carbon dioxide 1 d adsorbed by the adsorbent 35 is desorbed from the adsorbent 35, passes through the vacuum pump 46, and is stored in the first surge tank 47.

  Subsequently, after performing the above-described operation for a predetermined time, the valve 38a, 38b, 39a, 49a, 49b is closed, while the valve 39b is opened and the flow rate adjustment valve 6 is adjusted so that the pressure is applied by the blower 36. 1 g of purified gas is fed from the second surge tank 57 into the adsorption tower 31. Thereby, the inside of the adsorption tower 31 is pressurized and becomes a normal pressure. In addition, you may make it collect | recover the exhausted carbon dioxide 1d.

  When each of the above-described steps is performed for a predetermined time, the purge step is performed in the adsorption tower 31 that has performed the adsorption step, the desorption step is performed in the adsorption tower 31 that has performed the purge step, and the desorption step is performed. An adsorption step is performed at 31. Further, when each step is performed for a predetermined time, the desorption process is performed in the adsorption tower 31 where the purge process is performed, the adsorption process is performed in the adsorption tower 31 where the desorption process is performed, and the adsorption process is performed. A purge step is performed in the broken adsorption tower 31. Therefore, the process which removes the carbon dioxide 1d from the refined gas 1f and refine | purifies the refined gas 1g can be performed continuously by repeating the process mentioned above in the three adsorption towers 31 sequentially.

  1 g of the purified gas described above can be used as a fuel for power generation in a gas engine or a micro gas turbine.

  Therefore, the purification of the raw gas 1 can be continuously performed by repeatedly performing the operations in the adsorption towers 11, 21, 31 described above.

  The gas purification apparatus 10 described above is disposed in the adsorption tower 11, the sulfur-based impurity adsorbent 12 and the organosilicon impurity adsorbent 13, the moisture adsorbent 24 disposed in the adsorption tower 21, and the adsorption tower 31. And the impurities 1a, 1b, the moisture 1c and the carbon dioxide 1d can be separately removed from the raw gas 1 by pressure swing adsorption (PSA).

  Therefore, conventionally, the sulfur-based impurities removed by the sulfur-based impurity adsorbent are dissolved in the water removed by the moisture adsorbent, and the adsorbent, the adsorption tower, and the exhaust path of the impurities (piping, vacuum pump, valve) In the present embodiment, sulfur-based impurities 1a and moisture 1c contained in the raw gas 1 are sulfur-based impurity adsorbents 12 disposed in the adsorption tower 11, and Since the sulfur-based impurities 1a and the moisture 1c are respectively adsorbed by the moisture adsorbent 24 disposed in the adsorption tower 21 and are discharged out of the system through different exhaust paths, the sulfur-based impurities 1a and the moisture 1c are not in contact with each other. . Therefore, it is possible to avoid corrosion of the adsorption towers 11, 21, the adsorbents 12, 13, and 24, and the exhaust path through which the sulfur impurities 1 a are exhausted by the solution in which the sulfur impurities 1 a are dissolved in the moisture 1 c. it can. As a result, purification by removing sulfur-based impurities 1a and moisture 1c from the raw gas 1 can be carried out stably at a low cost.

  Therefore, according to the gas purification apparatus 10 according to the first embodiment of the present invention, the sulfur-based impurity 1a and the moisture 1c contained in the raw gas 1 are disposed in the adsorption tower 11, the sulfur-based impurity adsorbent 12, and Since the sulfur-based impurities 1a and the moisture 1c are respectively adsorbed by the moisture adsorbent 24 disposed in the adsorption tower 21 and are discharged out of the system through different exhaust paths, the sulfur-based impurities 1a and the moisture 1c are not in contact with each other. . Therefore, it is possible to avoid corrosion of the adsorption towers 11, 21, the adsorbents 12, 13, and 24, and the exhaust path through which the sulfur impurities 1 a are exhausted by the solution in which the sulfur impurities 1 a are dissolved in the moisture 1 c. it can. As a result, purification by removing sulfur-based impurities 1a and moisture 1c from the raw gas 1 can be carried out stably at a low cost.

  In addition, by arranging the organosilicon impurity adsorbent 13 in the adsorption tower 11, purification by removing the organosilicon impurity 1b from the raw gas 1 can be carried out stably at a low cost. By supplying the purified gas 1f discharged from the adsorption tower 21 to the adsorption tower 31 in which the carbon dioxide adsorbent 35 is disposed, the carbon dioxide 1d is adsorbed and removed by the carbon dioxide adsorbent 35, and the calorie and the purity are adjusted. 1 g of high purified gas can be obtained.

  By providing a plurality of adsorption towers 11 and 21 and connecting them in parallel, the purification process of the raw gas 1 can be performed continuously, and the processing efficiency can be improved. Further, by providing three adsorption towers 31 and connecting them in parallel, the purification process of the raw gas 1 can be performed continuously, and the processing efficiency can be improved.

  Since the carbon dioxide 1d desorbed from the carbon dioxide adsorbent 35 disposed in the adsorption tower 31 is fed to one side of the adsorption tower 31, the recovery rate of 1 g of purified gas from the raw gas 1 can be improved. . Further, by supplying the carbon dioxide 1d to the other side of the adsorption towers 11 and 21, the impurities 1a and 1b adsorbed on the adsorbents 12, 13 and 24 and the moisture 1c can be desorbed. 13 and 24 can be efficiently reproduced.

  Further, since the adsorbents 12 and 13 have a honeycomb shape, pressure loss when the raw gas 1 is circulated can be reduced as compared with the case where the adsorbents 12 and 13 are formed in a granular shape. Therefore, a relatively small blower 16 can be used. it can. As a result, initial costs and running costs can be further reduced, and at the same time, a smaller installation space can be achieved.

[Second Embodiment]
Hereinafter, a gas purification apparatus according to a second embodiment of the present invention will be described with reference to the drawings.
FIG. 3 is a schematic configuration diagram of a gas purification apparatus according to the second embodiment of the present invention. However, this gas purification apparatus is the same as the above-described gas purification apparatus according to the first embodiment of the present invention, provided with a flow meter, a control device, and a carbon dioxide concentration meter. It is the same structure as the gas purification apparatus which concerns on this embodiment, The same code | symbol is attached | subjected to the same location and the description is abbreviate | omitted.

  As shown in FIG. 3, the gas purifier 20 according to the second embodiment of the present invention has a flow meter 23 a that measures the gas flow rate of the gas 1 d flowing from the first surge tank 47 to one side of the adsorption tower 31. A flow meter 23b for measuring the gas flow rate of the gas 1h fed from the other side of the adsorption tower 31 to the upstream side of the blower 36, and carbon dioxide 1d in the first surge tank 47 and the second surge tank 57. Carbon dioxide concentration meters 27a and 27b which are carbon dioxide concentration measuring means for measuring the concentration of carbon dioxide, the carbon dioxide concentration measured by the carbon dioxide concentration meters 27a and 27b, and the gas flow rate measured by the flow meters 23a and 23b. And control devices 25a and 25b which are control means for controlling the opening degree of the flow rate control valves 7 and 8, respectively.

  In this gas purification device 20, the flow rate of the gas 1d or gas 1h flowing from one side of the adsorption tower 31 to the other side is controlled by the control devices 25a and 25b in one purge step in the adsorption tower 31. .

  Specifically, in the control devices 25a and 25b, when the concentration of carbon dioxide 1d in the second surge tank 57 measured by the carbon dioxide concentration meters 27a and 27b becomes a first predetermined value, for example, 5 vol% or more. The opening degree of one or both of the flow rate adjusting valves 7 and 8 is reduced (adjusted), and the flow rates of the gases 1d and 1h are reduced.

  When the concentration of carbon dioxide 1d in the first surge tank 47 measured by the carbon dioxide concentration meters 27a and 27b becomes a second predetermined value, for example, 95 vol% or less, either one of the flow rate control valves 7 or 8 or Both the openings are relaxed (adjusted), and the flow rates of the gases 1d and 1h are increased.

  Therefore, the carbon dioxide in the mixed gas 1j fed to the adsorption tower 31 is adjusted to a predetermined concentration range, and the carbon dioxide in the purified gas 1g purified by the adsorption tower 31 is reduced to a predetermined concentration or less. Can do.

  In the gas purification apparatus 20 described above, the sulfur-based impurities 1a and the organic silicon-based impurities are converted from the raw gas 1 in the adsorption tower 11 by operating in the same manner as the gas purification apparatus 10 according to the first embodiment described above. 1b is adsorbed and removed to become purified gas 1e, moisture 1c is adsorbed and removed from purified gas 1e by adsorption tower 21 to become purified gas 1f, and carbon dioxide 1d is adsorbed and removed from purified gas 1f by adsorption tower 31 to be purified. It becomes 1g of gas. 1 g of this purified gas is sent from above the adsorption tower 31 and supplied to a gas engine, a micro gas turbine or the like, and used as a fuel for power generation.

  Therefore, according to the gas purification device 20 according to the second embodiment of the present invention, the same effect as the gas purification device 10 according to the first embodiment described above is obtained, and the carbon dioxide 1d is converted from the raw gas 1 to carbon dioxide 1d. Since it is efficiently and stably removed, carbon dioxide in 1 g of purified gas purified from raw gas 1 can be reduced to a predetermined concentration or less to obtain 1 g of purified gas having a high purity. The recovery rate of methane, which is 1 g of gas, can be improved.

[Third embodiment]
Below, the gas purification apparatus which concerns on 3rd embodiment of this invention is demonstrated using drawing.
FIG. 4 is a schematic configuration diagram of a gas purification apparatus according to the third embodiment of the present invention. However, this gas purification apparatus is a gas purification apparatus according to the first embodiment of the present invention described above, in which a mixing tank is provided on the upstream side of the blower arranged in the vicinity of the third treatment tank, Other than that, it is the same structure as the gas purification apparatus which concerns on 1st embodiment of this invention, and attaches | subjects the same code | symbol to the same location, and abbreviate | omits the description.

  As shown in FIG. 4, the gas purification device 30 according to the third embodiment of the present invention has a mixing tank 34 provided on the upstream side of the blower 36 in the gas flow direction and in the vicinity thereof. The mixing tank 34 is supplied with the purified gas 1 f circulated from one side of the adsorption tower 21 to the other side, the first surge tank 47, and the gas 1 h circulated from one side of the adsorption tower 31 to the other side. Accumulated.

  In the mixing tank 34, the gas 1h and the purified gas 1f are mixed and homogenized. The homogenized gas 1 j is circulated from one side of the adsorption tower 31 to the other side by the blower 36.

  However, the mixing tank 34 is more than the sum of the flow rate of the purified gas 1f discharged in one adsorption step in the adsorption tower 21 and the flow rate of the gas 1h discharged in one purge step in the adsorption tower 31. Large capacity.

  In this gas purification device 30, the flow rate of the gas 1h flowing into the mixing tank 34 from the adsorption tower 31 in which the purge process is performed is adjusted by adjusting the flow rate control valves 7 and 8. Therefore, the concentration of methane and carbon dioxide in the gas 1j can be adjusted to a predetermined range. As a result, even if the concentration of 1 g of methane in the gas 1 h fluctuates, the concentration of 1 g of methane in the gas 1 j can be adjusted within a predetermined range, and the adsorption performance of the carbon dioxide adsorbent 35 can be sufficiently expressed. Thus, 1 g of purified gas (methane) can be obtained efficiently and stably from the mixed gas 1j.

  In the gas purification apparatus 30 described above, the sulfur-based impurities 1a and the organic silicon-based impurities are converted from the raw gas 1 in the adsorption tower 11 by operating in the same manner as the gas purification apparatus 10 according to the first embodiment described above. 1b is adsorbed and removed to become purified gas 1e, moisture 1c is adsorbed and removed from purified gas 1e by adsorption tower 21 to become purified gas 1f, and carbon dioxide 1d is adsorbed and removed from purified gas 1f by adsorption tower 31 to be purified. It becomes 1g of gas. 1 g of this purified gas is sent from above the adsorption tower 31 and supplied to a gas engine, a micro gas turbine or the like, and used as a fuel for power generation.

  Therefore, according to the gas purification apparatus according to the third embodiment of the present invention, the flow control valves 7 and 8 are adjusted in addition to the same effects as the gas purification apparatus 10 according to the first embodiment described above. As a result, the flow rate of the gas 1h flowing from one side to the other side of the first surge tank 47 and the adsorption tower 31 is adjusted, and the concentration of methane and the concentration of carbon dioxide in the gas 1h are adjusted to predetermined ranges, respectively. Is done. As a result, this gas 1h and the purified gas 1f purified by the adsorption tower 21 flow into the mixing tank 34, and are mixed and homogenized. The gas 1j also has a predetermined concentration of methane and carbon dioxide in the gas 1j. Adjusted to range. Therefore, the mixed gas 1j is circulated from one side of the adsorption tower 31 to the other side for purification, and the adsorption performance of the carbon dioxide adsorbent 35 in the adsorption tower 31 is sufficiently expressed. 1 g of purified gas can be obtained efficiently and stably.

[Fourth embodiment]
A gas purification apparatus according to a fourth embodiment of the present invention will be described below with reference to the drawings.
FIG. 5 is a schematic configuration diagram of a gas purification apparatus according to the fourth embodiment of the present invention. However, this gas purification apparatus is the same as the gas purification apparatus according to the first embodiment described above, except that the third processing tank is provided with a jacket whose temperature can be adjusted within a predetermined temperature range, while being fed to the third processing tank. Is provided with a heat exchanger capable of adjusting the temperature of the gas to be within a predetermined temperature range, and other than that, it has the same configuration as the gas purification apparatus according to the first embodiment of the present invention, and is the same in the same place. Reference numerals are added and explanations thereof are omitted.

  In the gas purification apparatus 40 according to the fourth embodiment of the present invention, as shown in FIG. 5, a jacket 41 capable of adjusting the temperature within a predetermined temperature range is provided in the adsorption tower 31 that is the third treatment tank, A heat exchanger 42 capable of adjusting the temperature of the gas fed into the adsorption tower 31 to a predetermined temperature range is provided on the downstream side of the blower 36.

  Examples of the jacket 41 include a jacket in which a heat medium (for example, water or air) having a predetermined temperature is circulated in the jacket 41. The jacket 41 only needs to have a structure capable of circulating a heat medium therein. Any structure and shape that can transfer the heat of the heat medium to the adsorption tower 31 may be used.

  The heat exchanger 42 only needs to be capable of adjusting the temperature within a predetermined temperature range.

  Therefore, the carbon dioxide adsorbent 35 itself in the adsorption tower 31 is adjusted to a predetermined temperature range by the jacket 41.

  Further, since the gas supplied to the adsorption tower 31 by the heat exchanger 42 is adjusted to a predetermined temperature range, the heat of this gas is transmitted to the carbon dioxide adsorbent 35, and this carbon dioxide adsorbent 35 is at a predetermined temperature. It becomes a range.

  As a result, the carbon dioxide adsorbent 35 can exhibit a predetermined adsorption performance. The recovery rate of 1 g of purified gas from the raw gas 1 can be improved. Furthermore, it is possible to suppress a decrease in the amount of adsorption of the carbon dioxide adsorbent 35 disposed in the adsorption tower 31 due to 1 g of methane in the purified gas 1f adhering to the third adsorption tower 31.

  In the gas purification apparatus 40 described above, by operating in the same manner as in the case of the gas purification apparatus 10 according to the first embodiment described above, the organosilicon irregular material 1a and the sulfur-based material are converted from the raw gas 1 in the adsorption tower 11. The impurities 1a are adsorbed and removed to become purified gas 1e, the adsorption tower 21 adsorbs and removes moisture 1c from the purified gas 1e to become purified gas 1f, and the adsorption tower 31 adsorbs and removes carbon dioxide 1d from the purified gas 1f. Purified gas 1g. 1 g of this purified gas is sent from above the adsorption tower 31 and supplied to a gas engine, a micro gas turbine or the like, and used as a fuel for power generation.

  Therefore, according to the gas purification apparatus 40 according to the fourth embodiment of the present invention, the same effect as the gas purification apparatus 10 according to the first embodiment described above is obtained, and the gas purification apparatus 40 is disposed in the adsorption tower 31. Since the carbon dioxide adsorbent 35 itself falls within a predetermined temperature range, adsorption of 1 g of the purified gas to the adsorbent 35 can be suppressed, and the adsorption performance of the carbon dioxide adsorbent 35 can be sufficiently expressed. As a result, the recovery rate of 1 g of purified gas from the raw gas 1 can be improved.

[Other Embodiments]
In the gas purification apparatuses 10, 20, 30, and 40 according to the first to fourth embodiments described above, the sulfur-based impurities 1a and the organic silicon-based impurities 1b are caused by the adsorbents 12 and 13 disposed in the adsorption tower 11. The adsorbent 24 arranged in the adsorption tower 21 adsorbs and removes the moisture 1c, and the adsorbent 35 arranged in the adsorption tower 31 adsorbs and removes the carbon dioxide 1d. The adsorbent 12 disposed in the adsorption tower 11 may be a gas purification apparatus that adsorbs and removes the sulfur-based impurities 1 a by the adsorbent 12 disposed and adsorbs and removes moisture by the adsorbent 24 disposed in the adsorption tower 21. , 13 can adsorb and remove sulfur-based impurities 1a and organosilicon-based impurities 1b, and can also be used as a gas purification device that adsorbs and removes moisture 1c with an adsorbent 24 disposed in the adsorption tower 21. . Even in such a gas purification apparatus, the sulfur-based impurities 1a and the moisture 1c are not brought into contact with each other because the sulfur-based impurities 1a and the moisture 1c are discharged out of the system through different exhaust paths. Therefore, it is possible to avoid corrosion of the adsorption tower, the adsorbent, and the exhaust path through which the sulfur-based impurity 1a is exhausted due to a solution in which the sulfur-based impurity 1a is dissolved in the moisture 1c. As a result, purification by removing sulfur-based impurities 1a and moisture 1c from the raw gas 1 can be carried out stably at a low cost.

  In the gas purification apparatus 10 according to the first embodiment described above, the organosilicon impurity 1b is adsorbed and removed using the organosilicon impurity adsorbent 13 disposed in the first adsorption tower 11. As shown in FIG. 6, two adsorption towers 51 provided in the present embodiment and connected in parallel in the gas flow direction, and arranged in the adsorption tower 51, are disposed in the adsorption tower 51. It is good also as the gas purification apparatus 50 which has the activated carbon 52 which is the adsorption layer to adsorb | suck, and the valves 53a and 53b provided before and behind the adsorption tower 51. FIG. In such a gas purification apparatus 50, the organosilicon impurities 1b are more reliably removed from the raw gas 1 by the activated carbon 52, and a purified gas 1g having higher purity can be obtained.

  Further, as another embodiment, high-purity carbon dioxide is supplied by supplying the recovered carbon dioxide to a carbon dioxide adsorbent or the like in the gas purification apparatus according to the first embodiment described above, and depressurizing and exhausting the carbon dioxide. It is good also as a gas refining device which made recovery possible. According to such a gas purification device, the same effect as the gas purification device according to the first embodiment of the present invention described above can be obtained, and high-purity carbon dioxide can be recovered. It can be used effectively, such as using high-concentration carbon dioxide during welding, sterilizing treated water in water purification or sewage treatment, or cooling the carbon dioxide and using it as dry ice. it can.

  As another embodiment, for example, as shown in FIG. 7, the raw gas 1 is circulated from one side of the adsorption tower 11 to the other side by a blower 26 disposed between the adsorption tower 11 and the adsorption tower 21. At the same time, a gas purifier 60 having a blower 26 for circulating the gas 1e flowing from one side of the adsorption tower 11 to the other side from the one side to the other side of the adsorption tower 21 may be used. In such a gas purifier 60, corrosion of the blower 26 due to contact between the blower 26 and the sulfur-based impurity 1a contained in the raw gas 1 can be avoided.

  As another embodiment, for example, as shown in FIG. 8, a gas purifier 70 that can supply dry air 71 to a vacuum pump 56 that depressurizes the adsorption tower 11 and a vacuum pump 66 that depressurizes the adsorption tower 21. good. In such a gas purifier 70, the evacuated impurities 1a, 1b, 1c and the like are prevented from being liquefied by the vacuum pumps 56, 66, and the regeneration efficiency of the adsorbents 12, 13, 24 is further improved. As a result, corrosion of the vacuum pumps 56 and 66 and the exhaust path due to liquefied impurities and the like can be prevented, and further, the load on the vacuum pumps 56 and 66 can be reduced to suppress an increase in running cost.

  Furthermore, as another embodiment, for example, as shown in FIG. 9, a gas purification device 80 in which a drain tank 81 is provided in the vicinity of gas supply ports 56 a and 66 a of vacuum pumps 56 and 66 may be used. In such a gas purification device 80, even if the impurities 1a, 1b, 1c and the like adsorbed by the adsorbents 12, 13, and 24 are liquefied and the liquefied impurities are discharged from the vacuum pumps 56 and 66, the drain tank 81 Can be stored. As a result, corrosion of the exhaust path and the like downstream of the drain tank 81 in the gas flow direction is prevented, and an increase in running cost can be suppressed.

  In the gas purification apparatus 20 according to the second embodiment of the present invention described above, the flow meters 23a and 23b are provided to measure the flow rates of the gases 1d and 1h. Of these flow meters 23a and 23b, It is good also as a gas purification apparatus which provided only either one. Even such a gas purifier has the same effects as the gas purifier 20 according to the second embodiment of the present invention described above.

  In the above, in the gas purification apparatus 30 according to the third embodiment of the present invention, the mixing tank 34 is provided, but this mixing tank is used in the first, second, fourth, and other embodiments of the present invention. The gas purifier 10, 20, 40 to 80 according to the embodiment may be provided, and such a gas purifier also has the same effect as the gas purifier 30.

  In the gas purification apparatuses 10 to 90 according to the first to fourth and other embodiments described above, the raw gas 1 includes biogas such as sewage digestion gas and food waste fermentation methane gas, and waste such as garbage. In the case of using a waste pyrolysis gas generated by pyrolyzing the gas, if purifying a gas containing an organosilicon impurity and a sulfur impurity, the first to fourth, It can be applied in the same manner as in the other embodiments.

  In addition, the gas purification apparatuses 10 to 90 according to the first to fourth and other embodiments described above can be used alone or applied to sewage purification equipment, and the biogas It is also possible to connect to the downstream side of various facilities that generate the pyrolysis gas or the like and to make a system capable of continuous purification treatment.

  In the gas purification apparatuses 10 to 90 according to the first to fourth and other embodiments described above, 1 g of purified gas is supplied to a gas engine, a micro gas turbine, or the like so as to be used as a fuel for power generation or the like. However, for example, it can be used as a fuel gas for a fuel cell or as a raw material for various compounds (for example, dimethyl ether).

  In the gas purification apparatuses 10 to 90 according to the first to fourth and other embodiments of the present invention described above, the impurities 1a and 1a in the raw gas 1 are formed by pressure swing adsorption (PSA). Although 1b, 1c, and 1d are removed, the present invention can be applied to, for example, temperature swing adsorption (TSA).

  The gas purification apparatus and the methane production method according to the present invention can obtain, for example, high-purity methane gas by applying it to a sewage purification treatment facility, which can be used as fuel for incineration facilities. It can be supplied to gas engines, micro gas turbines, etc., and used as fuel for power generation, or as fuel gas for fuel cells and raw materials for various compounds (such as dimethyl ether). Can be used very beneficially.

It is a schematic block diagram of the gas purification apparatus which concerns on 1st embodiment of this invention. It is explanatory drawing of the 3rd processing tank which the gas purification apparatus which concerns on 1st embodiment of this invention has. It is a schematic block diagram of the gas purification apparatus which concerns on 2nd embodiment of this invention. It is a schematic block diagram of the gas purification apparatus which concerns on 3rd embodiment of this invention. It is a schematic block diagram of the gas purification apparatus which concerns on 4th embodiment of this invention. It is a schematic block diagram of the gas purification apparatus which concerns on other embodiment of this invention. It is a schematic block diagram of the gas purification apparatus which concerns on other embodiment of this invention. It is a schematic block diagram of the gas purification apparatus which concerns on other embodiment of this invention. It is a schematic block diagram of the gas purification apparatus which concerns on other embodiment of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Source gas 1a Sulfur system impurity 1b Organosilicon system impurity 1c Water | moisture content 1d Carbon dioxide 1e, 1f, 1g Purified gas 1h Gas 1j Gas 2,3,4,5,6,7,8 Flow control valve 10 Gas refiner 11 Adsorption Tower 12 Sulfur-based impurity adsorbent 13 Organosilicon-based impurity adsorbent 16 Blower 18a, 18b, 19a, 19b Valve 20 Gas purification device 21 Adsorption tower 23a, 23b Flow meter 24 Water adsorbent 25a, 25b Control device 26 Blower 27a, 27b Carbon dioxide concentration meter 30 Gas purification device 31 Adsorption tower 33, 37 Flow control valve 34 Mixing tank 35 Carbon dioxide adsorbent 36 Blower 38a, 38b, 39a, 39b Valve 46, 56, 66 Vacuum pump 40 Gas purification device 41 Jacket 42 Heat Exchanger 47 First surge tank 50 Gas purification device 51 Adsorption tower 52 Activated carbon catalyst 5 3a, 53b Valve 57 Third surge tank 60 Gas purification device 70 Gas purification device 71 Dry air 80 Gas purification device 81 Drain tank

Claims (22)

A gas purification apparatus for purifying a raw gas containing sulfur-based impurities and moisture,
A first treatment tank;
First gas feeding means for circulating the raw gas from one side of the first treatment tank to the other side;
First reduced pressure exhaust means for evacuating and exhausting the inside of the first treatment tank;
A sulfur-based impurity adsorbent that is disposed in the first processing tank so as to partition one side and the other side in the first processing tank, and adsorbs the sulfur-based impurities;
A second treatment tank;
A second gas feeding means for circulating the gas flowing from one side of the first processing tank to the other side from the one side of the second processing tank;
A second vacuum exhaust means for evacuating and exhausting the inside of the second treatment tank;
A water adsorbent that is arranged in the second treatment tank so as to partition one side and the other side in the second treatment tank, and adsorbs moisture;
The sulfur-based impurity adsorbent is silicalite,
The gas purification apparatus, wherein the moisture adsorbent is silica gel. A gas purification apparatus for purifying a raw gas containing sulfur-based impurities and moisture,
A first treatment tank;
First reduced pressure exhaust means for evacuating and exhausting the inside of the first treatment tank;
A sulfur-based impurity adsorbent that is disposed in the first processing tank so as to partition one side and the other side in the first processing tank, and adsorbs the sulfur-based impurities;
A second treatment tank;
The raw gas is circulated from one side of the first processing tank to the other side, and the gas circulated from one side of the first processing tank to the other side is transferred from one side of the second processing tank to the other side. A second gas supply means for distribution to
A second vacuum exhaust means for evacuating and exhausting the inside of the second treatment tank;
It is arranged in the second treatment tank so as to partition one side and the other side in the second treatment tank, and has a moisture adsorbent that adsorbs moisture,
The sulfur-based impurity adsorbent is silicalite,
The gas purification apparatus, wherein the moisture adsorbent is silica gel. The gas purifier according to claim 1 or 2, wherein
Arranged in the first treatment tank so as to partition one side and the other side in the first treatment tank, and having an organosilicon impurity adsorbent that adsorbs the organosilicon impurities,
The gas purification apparatus characterized in that the organosilicon impurity adsorbent is any one of MCM-41, USY, MCM-48, and USM. A gas purification device according to any one of claims 1 to 3,
A third treatment tank;
A third gas feeding means for circulating the gas flowing from one side of the second processing tank to the other side from the one side of the third processing tank;
A third decompression means for decompressing and exhausting the inside of the third treatment tank;
A carbon dioxide adsorbent that is disposed in the third treatment tank so as to partition one side and the other side in the third treatment tank, and adsorbs carbon dioxide;
The gas purification apparatus, wherein the carbon dioxide adsorbent is an X-type zeolite using any one of Li, Ca, Sr, Mg, and Na as an exchange cation. A gas purifier according to any one of claims 1 to 4,
A gas purification apparatus comprising a plurality of the first and second treatment tanks connected in parallel. The gas purifier according to claim 4, wherein
A plurality of the first and second treatment tanks are provided and connected in parallel,
A gas purification apparatus comprising at least three third treatment tanks connected in parallel. The gas purifier according to claim 6, wherein
The gas exhausted from the third treatment tank by the third decompression means is sent again to one side of the third treatment tank and sent to the other side of the first and second treatment tanks. First exhaust re-feeding means for feeding,
A gas refining apparatus comprising: a second exhaust re-transmission means for feeding a gas circulated from one side to the other side of the third processing tank to the other side of the third processing tank. A gas purifier according to any one of claims 1 to 7,
The sulfur-based impurity adsorbent is disposed upstream of the moisture adsorbent in the gas flow direction. A gas purifier according to claim 3, wherein
The gas purification apparatus, wherein the organosilicon impurity adsorbent is disposed downstream of the sulfur impurity adsorbent in a gas flow direction. The gas purifier according to claim 4, wherein
The gas purification apparatus, wherein the carbon dioxide adsorbent is disposed downstream of the moisture adsorbent in a gas flow direction. A gas purifier according to any one of claims 1 to 10, wherein
A gas purification apparatus, wherein a pretreatment tank having a catalyst layer for adsorbing the organosilicon impurities is provided upstream of the first treatment tank in a gas flow direction. A gas purifier according to any one of claims 4 to 11,
A fourth treatment tank;
A fourth gas feeding means for circulating the gas exhausted from one side of the third processing tank from one side of the fourth processing tank to the other side;
A fourth depressurizing means for depressurizing and exhausting the inside of the fourth treatment tank;
A carbon dioxide adsorbent that is disposed in the fourth treatment tank so as to partition one side and the other side in the fourth treatment tank, and adsorbs carbon dioxide;
The gas purification apparatus, wherein the carbon dioxide adsorbent is an X-type zeolite using any one of Li, Ca, Sr, Mg, and Na as an exchange cation. A gas purifier according to any one of claims 1 to 12,
Dry gas is supplied to the first and second reduced pressure exhaust means. A gas purifier. A gas purifier according to any one of claims 1 to 13,
A gas purification apparatus, wherein a drain tank is provided in the vicinity of a gas supply port of the first and second decompression means. A gas purifier according to any one of claims 7 to 14,
A flow rate adjusting valve that adjusts the flow rate of the gas fed to one side of the third treatment tank by the first exhaust gas re-feeding means;
Measure the concentration of carbon dioxide in the gas flowing from one side of the third processing tank to the other side and in the gas exhausted from one side of the third processing tank by the third decompression means. Carbon dioxide concentration measuring means;
And a control means for controlling the opening of the flow rate control valve based on the carbon dioxide concentration measured by the carbon dioxide measuring means. A gas purifier according to any one of claims 7 to 15,
A mixing tank is provided on the upstream side of the third gas feeding means in the gas flow direction, and the gas circulated from one side to the other side of the second processing tank, and the first exhaust retransmission feeding means And the gas fed to one side of the third treatment tank is flowed into the mixing tank. A gas purifier according to any one of claims 4 to 16,
A gas purification apparatus, wherein the third treatment tank is provided with a temperature-adjustable jacket. A gas purifier according to any one of claims 4 to 17,
A gas purification apparatus, wherein the heat exchanger is provided downstream of the third gas supply means in the gas flow direction. A gas purifier according to any one of claims 1 to 18, comprising:
The gas purification apparatus, wherein the adsorbent has a honeycomb shape. A gas purifier according to any one of claims 1 to 19,
The gas purification apparatus, wherein the raw gas is biogas or waste pyrolysis gas. A process for producing methane by refining a raw gas containing sulfur-based impurities, moisture, and methane to produce methane,
The sulfur-based impurities are adsorbed and removed by circulating the raw gas through a sulfur-based impurity adsorbent disposed in the first treatment tank,
A method for producing methane, wherein the gas from which the impurities have been adsorbed and removed is circulated through a moisture adsorbent disposed in a second treatment tank so that the moisture is adsorbed and removed to purify methane. A method for producing methane, comprising purifying a raw gas containing sulfur-based impurities, organic silicon-based impurities, moisture, carbon dioxide, and methane to produce methane,
The sulfur gas and the organosilicon impurity are respectively adsorbed and removed by circulating the raw gas through a sulfur impurity adsorbent and an organosilicon impurity adsorbent disposed in the first treatment tank,
Moisture is adsorbed and removed by circulating the gas from which the impurities have been adsorbed and removed through a water adsorbent disposed in the second treatment tank,
A method for producing methane, wherein the gas from which moisture has been removed by adsorption is circulated through a carbon dioxide adsorbent disposed in a third treatment tank so that the carbon dioxide is adsorbed and removed to purify methane.

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