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JP2007017996A - Substrate bonding device - Google Patents

Substrate bonding device Download PDF

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Publication number
JP2007017996A
JP2007017996A JP2006232836A JP2006232836A JP2007017996A JP 2007017996 A JP2007017996 A JP 2007017996A JP 2006232836 A JP2006232836 A JP 2006232836A JP 2006232836 A JP2006232836 A JP 2006232836A JP 2007017996 A JP2007017996 A JP 2007017996A
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substrate
vacuum
substrates
pressure
temporary fixing
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Masatomo Endo
政智 遠藤
Yukinori Nakayama
幸徳 中山
Satoshi Hachiman
聡 八幡
Kiyoshi Imaizumi
潔 今泉
Akira Hirai
明 平井
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Hitachi Plant Technologies Ltd
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Hitachi Plant Technologies Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate bonding device which does not cause a positional deviation between upper and lower substrates in a way of conveyance of a cell and permits a desired gap even near a UV-curing agent. <P>SOLUTION: The substrate bonding device is provide with a temporary fixing mechanism S4 in which two sheets of substrates disposed within a vacuum chamber 15 are bonded to each other by pressing in an evacuated state, thereafter, adhesives 53 for temporary fixation disposed on plural parts at least on either side of both substrates are irradiated with UV light and are cured. The temporary fixing mechanism S4 is configured such that a UV fiber 45 is vacuum-shielded and arranged in a hollow cylindrical compression bar 60, which can be vertically moved in a vacuum chamber 15 while maintaining the vacuum state in the vacuum chamber 15. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、減圧状態で液晶表示パネルの構成部材たる一対の基板を貼り合わせる基板貼り合わせ装置に係り、特に液晶表示パネルの不良品発生を防止するのに好適な基板貼り合わせ装置に関する。   The present invention relates to a substrate bonding apparatus for bonding a pair of substrates as constituent members of a liquid crystal display panel under reduced pressure, and more particularly to a substrate bonding apparatus suitable for preventing the occurrence of defective products of a liquid crystal display panel.

液晶表示パネルの製造には、透明電極や薄膜トランジスタアレイ等が設けられた二枚のガラス基板を、基板の周縁部に口字状に設けた接着剤(以下、「シール剤」ともいう)で例えば2μm程度の極めて接近した間隔をもって貼り合わせ(以下、その貼り合わせ後の基板を「セル」という)、その各基板と接着剤で形成される空間に液晶を封止するという工程がある。   For manufacturing a liquid crystal display panel, for example, an adhesive (hereinafter also referred to as “sealant”) in which two glass substrates provided with a transparent electrode, a thin film transistor array and the like are provided in a mouth shape on the peripheral edge of the substrate is used. There is a process of bonding with extremely close intervals of about 2 μm (hereinafter, the substrate after the bonding is referred to as “cell”), and sealing the liquid crystal in a space formed by each substrate and an adhesive.

従来、その液晶の封止を行う際の基板貼り合わせ方法としては、注入口を設けないようにシール剤をクローズしたパターン(口字形)に描画した一方の基板上に液晶を滴下しておく。そして、真空チャンバ内にて他方の基板を一方の基板の上方に配置し、真空状態でその他方の基板と一方の基板との間隔を狭めて加圧して上下の基板を貼り合わせる、という下記特許文献1に開示された方法がある。また、その各基板を貼り合わせる際の接着剤(シール剤)を硬化させる方法としては、基板に塗布したシール剤を照射エネルギーにより仮硬化させた後、基板上に液晶を滴下して二枚の基板を貼り合わせ、しかる後、先に照射した照射エネルギーとは異なる照射エネルギーでシール材を硬化させる、という下記特許文献2に開示された方法がある。
特開2000−284295号公報 特開平10−177178号公報
Conventionally, as a method of laminating a substrate when sealing the liquid crystal, the liquid crystal is dropped on one substrate drawn in a pattern (letter shape) in which a sealing agent is closed so as not to provide an injection port. Then, the following patent in which the other substrate is placed above one substrate in a vacuum chamber, and the upper and lower substrates are bonded together by applying pressure while reducing the distance between the other substrate and one substrate in a vacuum state. There is a method disclosed in Document 1. In addition, as a method of curing the adhesive (sealing agent) when the substrates are bonded together, the sealing agent applied to the substrate is temporarily cured by irradiation energy, and then a liquid crystal is dropped onto the substrate to drop two sheets. There is a method disclosed in Patent Document 2 below in which the substrates are bonded together and then the sealing material is cured with an irradiation energy different from the irradiation energy previously irradiated.
JP 2000-284295 A Japanese Patent Laid-Open No. 10-177178

ところで、近年、液晶表示パネルの大型化が進み、現在では一辺が1000mmを超え且つ厚さが0.7mmという基板が出てきた。ここで、このような大型化された基板の両端を保持して持ち上げた場合、その自重で約80〜100mm位撓んでしまうことが実験やコンピュータ解析によって確認されている。これが為、二枚の大型基板が貼り合わされたセルもその搬送途中に自重で撓んでしまい、例えば下基板のシール面には圧縮力が作用すると共に上基板のシール面には引張り力が作用するので、上下の基板の間ではズレが生じ、これによりシール部分が決壊して液晶の流失が発生する、という不都合があった。   By the way, in recent years, an increase in the size of a liquid crystal display panel has progressed, and now a substrate having a side exceeding 1000 mm and a thickness of 0.7 mm has come out. Here, when holding and lifting both ends of such a large substrate, it has been confirmed by experiments and computer analysis that it bends about 80 to 100 mm by its own weight. For this reason, the cell on which the two large substrates are bonded also bends due to its own weight in the middle of its transportation. For example, a compressive force acts on the seal surface of the lower substrate and a tensile force acts on the seal surface of the upper substrate. As a result, there is a problem in that a deviation occurs between the upper and lower substrates, causing the seal portion to break and liquid crystal to flow out.

更に、そのような大型基板には、基板上に複数個の切れ目の無いシールパターンを設け、その各パターン内に液晶を封止して複数個の液晶表示パネルを作成する、という多面取りが行われる場合がある。かかる場合の二枚の基板の貼り合わせは、例えば上記特許文献1に開示された方法の如く二枚の基板を減圧状態で加圧する。そして、真空チャンバ内を大気圧に戻す際に基板に掛かる加圧力で為される。しかしながら、このような大型基板にあってはその大気圧に戻す際に均等に加圧されず、基板間距離が適正なギャップにならない、という不都合があった。かかる不都合を改善する,即ち加圧力が均一に加わるようにする為には、シール剤から成る液晶封入の為のシールパターンの外にもう一巡のダミーシールパターンを付加する方法が考えられる。また、そのダミーシールパターンの近くに仮止め用UV(紫外線)硬化剤を打点塗布し、真空チャンバの外からUV光を照射してUV硬化剤を硬化させることで仮固定する方法もある。   Further, such a large substrate is provided with a plurality of cut patterns in which a plurality of continuous seal patterns are provided on the substrate, and a liquid crystal is sealed in each pattern to create a plurality of liquid crystal display panels. May be. In such a case, the two substrates are bonded together by, for example, pressing the two substrates under reduced pressure as in the method disclosed in Patent Document 1 above. The pressure is applied to the substrate when the inside of the vacuum chamber is returned to atmospheric pressure. However, such a large substrate has a disadvantage that it is not evenly pressurized when returning to the atmospheric pressure, and the distance between the substrates does not become an appropriate gap. In order to improve such an inconvenience, that is, to apply the applied pressure uniformly, a method of adding another round of dummy seal pattern in addition to the seal pattern for sealing liquid crystal made of a sealing agent is conceivable. There is also a method in which a temporary fixing UV (ultraviolet) curing agent is applied in the vicinity of the dummy seal pattern and temporarily fixed by irradiating UV light from outside the vacuum chamber to cure the UV curing agent.

しかしながら、これらの改善方法の場合、真空中で貼り合わせたセルを大気圧に戻した時にダミーシールの内側と外側で圧力差が生じ、打点塗布されたUV硬化剤が潰れずにその高さがシール剤よりも高くなってしまう。そして、これによりUV硬化剤付近での基板間のギャップ不良が生じ、点灯後の色ムラ不良を引き起こす要因の一つとなってしまう、という不都合があった。   However, in the case of these improvement methods, when the cell bonded in a vacuum is returned to atmospheric pressure, a pressure difference occurs between the inside and the outside of the dummy seal, and the height of the UV curing agent applied to the spot does not collapse. It becomes higher than the sealant. As a result, a gap defect between the substrates in the vicinity of the UV curing agent occurs, which is one of the factors that cause a color unevenness defect after lighting.

本発明は、かかる従来例の有する不都合を改善し、セルの搬送途中に上下の基板の位置ズレが生じず,且つUV硬化剤付近でも所望のギャップを得ることのできる基板貼り合わせ装置を提供することを、そして、それによりセルの不良品発生を防止することを、その目的とする。   The present invention provides a substrate bonding apparatus that improves the inconveniences of the conventional example, does not cause the positional deviation of the upper and lower substrates during the transfer of the cell, and can obtain a desired gap even near the UV curing agent. The purpose of this is to prevent the generation of defective cells.

上記目的を達成する為、本発明では、真空チャンバ内に配置した二枚の基板を真空状態で加圧貼り合わせを行った後、その各基板のうちの少なくともいずれか一方に複数箇所設けた仮固定用の接着剤にUV光を照射して硬化させる仮固定機構を備えた基板貼り合わせ装置において、前記仮固定機構は、中空円筒加圧バー内に、UVファイバを真空遮断して配置したものであって、真空チャンバ内の減圧状態を保ったまま前記中空円筒加圧バーを真空チャンバ内で上下移動可能に構成したことを第1の特徴とする。   In order to achieve the above object, according to the present invention, after two substrates arranged in a vacuum chamber are pressed and bonded in a vacuum state, a plurality of temporary substrates are provided on at least one of the substrates. In the substrate laminating apparatus provided with a temporary fixing mechanism for irradiating and curing the fixing adhesive with UV light, the temporary fixing mechanism is arranged in a hollow cylindrical pressure bar with the UV fiber cut off in vacuum. The first feature is that the hollow cylindrical pressure bar can be moved up and down in the vacuum chamber while maintaining a reduced pressure state in the vacuum chamber.

更に本発明は、前記特徴の基板貼り合わせ装置において、前記中空円筒加圧バーの先端部には内部にガラスが保持され、前記ガラスに当接する筒状の狭窄部が設けてあり、前記狭窄部で基板に加圧力を加える構成としたことを第2の特徴とし、前記第1の特徴の基板貼り合わせ装置において、前記真空チャンバにフランジを取り付け、前記フランジ内を前記中空円筒加圧バーが上下動する構成としたことを第2の特徴とする。   Furthermore, the present invention is the substrate bonding apparatus according to the above feature, wherein the hollow cylindrical pressure bar is provided with a cylindrical constriction portion that holds glass inside and abuts against the glass, and the constriction portion In the substrate bonding apparatus of the first feature, a flange is attached to the vacuum chamber, and the hollow cylindrical pressure bar is vertically moved in the flange. The second feature is that it is configured to move.

本発明により基板貼り合わせ装置は、真空チャンバに、減圧状態の当該真空チャンバ内で間隔を狭めて二枚の基板を一次加圧した後、その各基板の内の少なくとも何れか一方に複数箇所設けた仮固定用の接着剤を、減圧状態の真空チャンバ内で加圧しながらUV光を照射して硬化させる仮固定機構を設けている。例えば、その仮固定機構とは、中空円筒加圧バー内に、UVファイバ素子の結束体をUV光を通過させる材料で真空遮断して配置したものであって、真空チャンバ内の減圧状態を保ったままその真空チャンバ内で上下動できるものである。   According to the present invention, a substrate bonding apparatus is provided in a vacuum chamber at a plurality of locations on at least one of the substrates after first pressurizing two substrates at a reduced interval in the vacuum chamber in a reduced pressure state. A temporary fixing mechanism is provided for curing the temporary fixing adhesive by irradiating it with UV light while being pressurized in a vacuum chamber in a reduced pressure state. For example, the temporary fixing mechanism is a structure in which a bundle of UV fiber elements is placed in a hollow cylindrical pressure bar while being vacuum-blocked with a material that allows UV light to pass through, and the vacuum chamber is kept in a reduced pressure state. It can move up and down in the vacuum chamber.

本発明では、上記一次加圧の工程の後、その仮固定機構を用いて、一次加圧工程を経た各基板における仮固定用の接着剤を加圧しながらUV光を照射して硬化させる仮止め工程を行う。例えば、この仮止め工程は、上記中空円筒加圧バー先端で基板における仮固定用の接着剤が設けられた部分を所定の力で加圧し、その加圧部分の基板間を最終ギャップにした後その基板間に挟まれた仮固定用の接着剤にUV照射して硬化させる。これにより仮固定用接着剤が設けられた部分だけでも最終ギャップとなり、かかる位置での仮止めができる。本発明にあっては、その仮止め工程の後、真空チャンバ内を大気圧に戻すことで加圧して貼り合わせを行う二次加圧工程を行う。   In the present invention, after the primary pressing step, using the temporary fixing mechanism, temporary fixing is performed by irradiating UV light while curing the temporary fixing adhesive on each substrate that has undergone the primary pressing step. Perform the process. For example, in this temporary fixing step, the portion of the substrate where the adhesive for temporary fixing is provided at the tip of the hollow cylindrical pressure bar is pressed with a predetermined force, and the gap between the substrates in the pressurized portion is made the final gap. The temporary fixing adhesive sandwiched between the substrates is cured by UV irradiation. As a result, only the portion where the temporary fixing adhesive is provided becomes the final gap, and temporary fixing at this position is possible. In the present invention, after the temporary fixing step, a secondary pressurizing step is performed in which the inside of the vacuum chamber is returned to the atmospheric pressure to perform pressurization and bonding.

本発明に係る基板貼り合わせ装置によれば、仮固定用接着剤が設けられた部分の基板間距離を減圧下で所望のギャップにでき、且つかかる位置での仮固定ができるので最終的に所望する基板間距離を保つことができる。また、従来例の如く二枚の大型基板が貼り合わされたセルであっても、最終的に所望する基板間距離を保ち固定されたセルであるので、その搬送途中における上下の基板の位置ズレを防止できる。そして、以上のことにより、セルの不良品発生を防止できる。   According to the substrate bonding apparatus according to the present invention, the distance between the substrates in the portion where the temporary fixing adhesive is provided can be set to a desired gap under reduced pressure, and can be temporarily fixed at such a position, so that it is finally desired. The distance between the substrates can be maintained. In addition, even in a cell in which two large substrates are bonded as in the conventional example, the cell is finally fixed while maintaining a desired inter-substrate distance. Can be prevented. As a result, the generation of defective cells can be prevented.

[第一実施形態]
本発明に係る基板貼り合わせ装置の第一実施形態について図1からに図5に基づいて説明する。
[基板貼り合わせ装置の構成]
この基板貼り合わせ装置は、図1に示すように大きく分類すれば、貼り合わせ対象物たる二つの基板33,34(以下、後述するテーブル9に載置保持する基板33を「下基板33」と、後述する加圧板16に保持する基板34を「上基板34」という。)の位置決めを行うXYθステージ部S1と、各基板33,34の貼り合わせ動作を行う基板貼り合わせ部S2と、後述する各基板33,34の一次加圧を行うZ軸移動ステージ部S3とから構成されており、その各部S1,S2,S3が架台1上に順次配置されている。ここで、XYθステージ部S1は架台1上に載置保持され、基板貼り合わせ部S2は架台1上に立設された例えば四つの支柱を備えた第一フレーム2に支持され、Z軸移動ステージ部S3は架台1上に立設された例えば四つの支柱を備えた第二フレーム3に支持される。以下、これら各部S1,S2,S3について詳述する。
[XYθステージ部]
[First embodiment]
1st Embodiment of the board | substrate bonding apparatus which concerns on this invention is described based on FIG. 5 from FIG.
[Configuration of substrate bonding equipment]
If this board | substrate bonding apparatus is divided roughly as shown in FIG. 1, two board | substrates 33 and 34 (henceforth the board | substrate 33 mounted and hold | maintained on the table 9 mentioned later is called "lower board | substrate 33" if it categorizes roughly. , A substrate 34 held on the pressure plate 16 to be described later is referred to as an “upper substrate 34”), an XYθ stage portion S1 for positioning, a substrate bonding portion S2 for performing bonding operations of the substrates 33 and 34, and a later-described. Each substrate 33, 34 is composed of a Z-axis moving stage portion S 3 that performs primary pressurization, and the respective portions S 1, S 2, S 3 are sequentially arranged on the gantry 1. Here, the XYθ stage unit S1 is placed and held on the gantry 1, and the substrate bonding unit S2 is supported by a first frame 2 provided with, for example, four support columns standing on the gantry 1, and a Z-axis moving stage. The part S3 is supported by the second frame 3 provided with, for example, four support columns provided on the gantry 1. Hereinafter, these parts S1, S2, and S3 will be described in detail.
[XYθ stage section]

XYθステージ部S1は、架台1上に配設されたXステージ4aと、このXステージ4a上に配設されたYステージ4bと、このYステージ4b上に配設されたθステージ4cとを有する。本実施形態のXステージ4aは、駆動モータ5によってYステージ4bとθステージ4cを左右方向(図1中のX軸方向)に移動できるよう構成される。また、Yステージ4bは、駆動モータ6によってθステージ4cを前後方向(図1中のY軸方向)に移動できるよう構成される。更に又、θステージ4cは、回転ベアリング7を介し駆動モータ8によってYステージ4bに対して図1に示すθ方向に回転するよう構成される。   The XYθ stage unit S1 includes an X stage 4a disposed on the gantry 1, a Y stage 4b disposed on the X stage 4a, and a θ stage 4c disposed on the Y stage 4b. . The X stage 4a of the present embodiment is configured such that the drive motor 5 can move the Y stage 4b and the θ stage 4c in the left-right direction (X-axis direction in FIG. 1). The Y stage 4b is configured to be able to move the θ stage 4c in the front-rear direction (Y-axis direction in FIG. 1) by the drive motor 6. Furthermore, the θ stage 4 c is configured to rotate in the θ direction shown in FIG. 1 with respect to the Y stage 4 b by the drive motor 8 through the rotary bearing 7.

ここで、θステージ4c上には、下基板33を載置保持するテーブル9が支持柱10を介して固定されている。また、Yステージ4bには、回転ベアリング13と真空シール14を介して支持柱10の下部側を被包するアーム11が配設されており、これにより支持柱10の回転に伴ってアーム11がつられて回転しないようになっている。更に又、そのアーム11と基板貼り合わせ部S2の後述する真空貼り合わせ室15との間には、アーム11上に一端を固定し且つ真空貼り合わせ室15の下部に他端を固定すると共に支持柱10に覆設する蛇腹状の弾性体から成る真空ベローズ12が配設されており、これにより貼り合わせ時における真空貼り合わせ室15内の減圧状態を保持している。   Here, on the θ stage 4 c, a table 9 for mounting and holding the lower substrate 33 is fixed via a support column 10. Further, the Y stage 4 b is provided with an arm 11 that encloses the lower side of the support column 10 via a rotary bearing 13 and a vacuum seal 14, so that the arm 11 is moved along with the rotation of the support column 10. It is designed not to rotate. Furthermore, between the arm 11 and a vacuum bonding chamber 15 (to be described later) of the substrate bonding portion S2, one end is fixed on the arm 11 and the other end is fixed to the lower portion of the vacuum bonding chamber 15 and supported. A vacuum bellows 12 made of an accordion-like elastic body covering the column 10 is disposed, thereby maintaining a reduced pressure state in the vacuum bonding chamber 15 at the time of bonding.

尚、本実施形態にあっては支持柱10をテーブル9の略中央に一本配設しているが、必ずしもこれに限定するものではなく、例えばθステージ4cによるテーブル9の所定量(後述する位置合わせマークの位置ずれ量)を補正するだけの回転が可能であればその支持柱10を複数本設けてもよい。
[基板貼り合わせ部]
In the present embodiment, one support column 10 is disposed at substantially the center of the table 9, but the present invention is not limited to this. For example, a predetermined amount of the table 9 by the θ stage 4c (described later). A plurality of support columns 10 may be provided as long as the rotation enough to correct the misalignment amount of the alignment mark is possible.
[Board bonding part]

基板貼り合わせ部S2は、図1に示すように、減圧下にて二枚の基板33,34の貼り合わせを行う真空貼り合わせ室(真空チャンバ)15と、この真空貼り合わせ室15内に配設されたテーブル9と、同じく真空貼り合わせ室15内でテーブル9の上方に対向して配設された加圧板16とを有する。この場合、テーブル9には後述するダミーシール54,UV硬化剤53,接着剤37や液晶39が設けられた下基板33が載置保持され、加圧板16にはその下基板33に貼り合わせる上基板34が保持される。   As shown in FIG. 1, the substrate bonding portion S2 is arranged in a vacuum bonding chamber (vacuum chamber) 15 for bonding two substrates 33 and 34 under reduced pressure, and in the vacuum bonding chamber 15. The table 9 is provided, and the pressure plate 16 is disposed in the vacuum bonding chamber 15 so as to be opposed to the upper side of the table 9. In this case, a lower substrate 33 provided with a dummy seal 54, a UV curing agent 53, an adhesive 37, and a liquid crystal 39, which will be described later, is placed and held on the table 9, and the pressure plate 16 is bonded to the lower substrate 33. The substrate 34 is held.

上記真空貼り合わせ室15の側部には、各基板33,34を出入する為の第一開口部15aが設けられており、更にこの第一開口部15aを閉塞するゲートバルブ17が備えられている。ここで、このゲートバルブ17は、シリンダ17Aによって上下方向(図1中のZ軸方向)に移動自在に構成される。   A side opening of the vacuum bonding chamber 15 is provided with a first opening 15a for entering and exiting the substrates 33 and 34, and a gate valve 17 for closing the first opening 15a is provided. Yes. Here, the gate valve 17 is configured to be movable in the vertical direction (Z-axis direction in FIG. 1) by the cylinder 17A.

更に、真空貼り合わせ室15の下部には真空貼り合わせ室15内を真空排気する為の第一及び第二の排気管20a,20bが配設されており、これら各排気管20a,20bは、図示しない切換バルブを介して真空ポンプに接続される。ここで、第一排気管20aは、第二排気管20bに比べて細いものが用いられ、例えば各々断面略円形の排気管の場合、第一排気管20aの径を1とすると、太い方の第二排気管20bは約10〜100倍程度の径のものが用いられる。この場合、第一排気管20aの径は、この第一排気管20aから後述するが如く真空貼り合わせ室15内を真空排気する際に、ガスの流れによって基板33,34の暴れ、下基板33上の液晶の飛散や減圧による水分の凍結が発生しない速度となるように設定する。例えばその径の設定の際には、種々の径の配管にて予め実験し、その実験結果に基づいて定めた径の第一排気管20aを配設する。ここで、本実施形態における貼り合わせ時の真空貼り合わせ室15内の圧力は、0.67Pa(5×10−3Torr)程度である。   Furthermore, the 1st and 2nd exhaust pipe 20a, 20b for evacuating the inside of the vacuum bonding chamber 15 is arrange | positioned in the lower part of the vacuum bonding chamber 15, These exhaust pipes 20a, 20b are respectively It is connected to a vacuum pump via a switching valve (not shown). Here, the first exhaust pipe 20a is thinner than the second exhaust pipe 20b. For example, in the case of an exhaust pipe having a substantially circular cross section, if the diameter of the first exhaust pipe 20a is 1, the larger one is used. The second exhaust pipe 20b has a diameter of about 10 to 100 times. In this case, the diameter of the first exhaust pipe 20a is such that when the inside of the vacuum bonding chamber 15 is evacuated from the first exhaust pipe 20a as will be described later, the substrates 33 and 34 are disturbed by the gas flow, and the lower substrate 33 The speed is set so that the liquid crystal does not scatter and water freezes due to reduced pressure. For example, when the diameter is set, the first exhaust pipe 20a having a diameter determined based on the experimental result is arranged in advance with piping having various diameters. Here, the pressure in the vacuum bonding chamber 15 at the time of bonding in the present embodiment is about 0.67 Pa (5 × 10 −3 Torr).

尚、本実施形態にあっては太さの異なる第一及び第二の排気管20a,20bを切換バルブによって切り換えて排気経路を変更し、これにより排気速度を制御しているが、必ずしもその方法に限定するものではなく、例えば本実施形態の如く二つの排気管20a,20bを設けずに一つの排気管のみで構成してこの排気管に真空ポンプを接続し、この真空ポンプを制御して排気速度を制御してもよい。この場合、排気管は、太い方の管径(即ち本実施形態の第二排気管20bの管径)にすることが望ましい。   In the present embodiment, the first and second exhaust pipes 20a and 20b having different thicknesses are switched by the switching valve to change the exhaust path, thereby controlling the exhaust speed. For example, as in the present embodiment, the two exhaust pipes 20a and 20b are not provided, but only one exhaust pipe is provided, a vacuum pump is connected to the exhaust pipe, and the vacuum pump is controlled. The exhaust speed may be controlled. In this case, it is desirable that the exhaust pipe has a larger diameter (that is, the diameter of the second exhaust pipe 20b of the present embodiment).

また、真空貼り合わせ室15内のテーブル9側には、下基板33を図示しない移載機から受け取る,若しくはセルを取り出す為に使用される複数の昇降ピン35が立設される。この昇降ピン35は、その一端(図1中の下端)にシリンダ36が配設されており、このシリンダ36によってテーブル9に形成した貫通孔の中を上下方向に移動できるよう構成されている。   Further, on the table 9 side in the vacuum bonding chamber 15, a plurality of lifting pins 35 used for receiving the lower substrate 33 from a transfer machine (not shown) or taking out a cell are provided upright. A cylinder 36 is disposed at one end (the lower end in FIG. 1) of the elevating pin 35, and the cylinder 36 is configured to be able to move in a vertical direction in a through hole formed in the table 9.

更に又、真空貼り合わせ室15の上部にはその真空貼り合わせ室15内の減圧状態を大気圧に戻す為の配管21と、真空貼り合わせ室15内にガス(空気)を導入する若しくは遮断する為に配管21の途中に備えた弁22とが配設される。ここで、配管21には図示しない圧力源(例えばポンプ)が接続されており、これにより真空貼り合わせ室15内へのガスの導入速度を制御することができる。尚、その圧力源は、必ずしも配設されてなくてもよい。   Furthermore, a pipe 21 for returning the decompressed state in the vacuum bonding chamber 15 to atmospheric pressure is introduced into the upper portion of the vacuum bonding chamber 15 and gas (air) is introduced into or shut off from the vacuum bonding chamber 15. For this purpose, a valve 22 provided in the middle of the pipe 21 is provided. Here, a pressure source (for example, a pump) (not shown) is connected to the pipe 21, so that the gas introduction speed into the vacuum bonding chamber 15 can be controlled. Note that the pressure source is not necessarily provided.

また、真空貼り合わせ室15の側面(前述したゲートバルブ17が備えられた側とは反対側)にはその真空貼り合わせ室15に形成された略円形の第二開口部15bを閉塞する板状体から成る大気開放弁23と、この大気開放弁23を第二開口部15bから離間させるシリンダ24とが配設される。このように、大気開放弁23を設け、この大気開放弁23を第二開口部15bから離間させることによって、真空貼り合わせ室15内を急速に大気圧に戻すことができる。ここで、前述した配管21に断面略円形のものを用いた場合は、その配管21の径を1とすると、第二開口部15bの口径は5以上にすることが望ましい。   Further, a plate-like shape that closes the substantially circular second opening 15b formed in the vacuum bonding chamber 15 on the side surface of the vacuum bonding chamber 15 (the side opposite to the side on which the gate valve 17 is provided). An air release valve 23 made of a body and a cylinder 24 for separating the air release valve 23 from the second opening 15b are disposed. Thus, by providing the air release valve 23 and separating the air release valve 23 from the second opening 15b, the inside of the vacuum bonding chamber 15 can be rapidly returned to atmospheric pressure. Here, when the pipe 21 having a substantially circular cross section is used, if the diameter of the pipe 21 is 1, the diameter of the second opening 15b is desirably 5 or more.

更に、真空貼り合わせ室15の上部には加圧板16に形成された図示しないマーク認識用孔を通して上下の各基板33,34の位置合わせマークを観測する為の窓25が複数設けられる。ここで、その位置合わせマークの観測には図1に示す認識用カメラ26が用いられ、この認識用カメラ26によって各基板33,34の位置合わせマークのずれを測定する。   Further, a plurality of windows 25 for observing the alignment marks of the upper and lower substrates 33 and 34 through a mark recognition hole (not shown) formed in the pressure plate 16 are provided in the upper part of the vacuum bonding chamber 15. Here, the recognition camera 26 shown in FIG. 1 is used for observing the alignment mark, and the displacement of the alignment mark on each of the substrates 33 and 34 is measured by the recognition camera 26.

続いて、テーブル9には、静電気又は吸引吸着によって下基板33を吸着する為の図示しない静電吸着用電極と複数の吸引吸着孔9aとが設けられている。   Subsequently, the table 9 is provided with an electrostatic suction electrode (not shown) and a plurality of suction suction holes 9a for sucking the lower substrate 33 by static electricity or suction suction.

その静電吸着用電極は、本実施形態にあっては略矩形の平板電極であり、テーブル9の上面の両端側に形成された二つの略矩形の凹部に各々嵌着される。また、その静電吸着用電極は、その表面(テーブル9の上面側)が誘電体で覆われており、この誘電体の主面がテーブル9の上面と面一になるよう設けられる。このようにテーブル9に配設された静電吸着用電極は、夫々正負の直流電源に適宜なスイッチを介して接続されている。これが為、各静電吸着用電極に正或いは負の電圧が印加されると、上記誘電体の主面に負或いは正の電荷が誘起される。そして、その電荷によって下基板33に形成されている透明電極膜との間に発生するクーロン力で下基板33がテーブル9に静電吸着される。ここで、各静電吸着用電極に印加する電圧は、同極でもよいし、夫々異なる双極でもよい。   In this embodiment, the electrostatic chucking electrode is a substantially rectangular flat plate electrode, and is fitted into two substantially rectangular recesses formed on both ends of the upper surface of the table 9. Further, the surface of the electrostatic attraction electrode (the upper surface side of the table 9) is covered with a dielectric, and the main surface of the dielectric is provided so as to be flush with the upper surface of the table 9. Thus, the electrostatic chucking electrodes arranged on the table 9 are respectively connected to positive and negative DC power sources via appropriate switches. Therefore, when a positive or negative voltage is applied to each electrostatic chucking electrode, a negative or positive charge is induced on the main surface of the dielectric. Then, the lower substrate 33 is electrostatically attracted to the table 9 by a Coulomb force generated between the transparent electrode film formed on the lower substrate 33 by the electric charge. Here, the voltage applied to each electrode for electrostatic attraction may be the same polarity, or may be different from each other.

尚、真空貼り合わせ室15内が大気の場合は、前述した吸引吸着孔9aによる吸引吸着を行った方がよい。その理由は、静電吸着を行う場合、下基板33とテーブル9の間に空気層があると、静電気による放電現象が発生して下基板33やテーブル9を損傷してしまう。これが為、例えば下基板33をテーブル9に最初に密着保持するときは周囲が大気下にあるので、先ず吸引吸着を行い、減圧室内を減圧していって放電現象が発生しない程度まで減圧されてから静電吸着を行うことが望ましい。   In addition, when the inside of the vacuum bonding chamber 15 is air | atmosphere, it is better to perform attraction | suction adsorption by the attraction | suction adsorption hole 9a mentioned above. The reason is that, when electrostatic adsorption is performed, if there is an air layer between the lower substrate 33 and the table 9, a discharge phenomenon due to static electricity occurs and the lower substrate 33 and the table 9 are damaged. For this reason, for example, when the lower substrate 33 is first tightly held on the table 9, the surroundings are in the atmosphere, so suction suction is performed first, and the pressure is reduced to such an extent that no discharge phenomenon occurs by reducing the pressure in the vacuum chamber. It is desirable to perform electrostatic adsorption.

次に、各吸引吸着孔9aは、配管18を介して真空貼り合わせ室15の外部に配設した図示しない吸着バルブに接続され、この吸着バルブを経由して図示しない真空ポンプに接続されている。この場合、その配管18の途中には吸引吸着解除用のバルブを介して大気開放する為のバイパス配管が設けられており、その吸引吸着解除用バルブを大気開放することによって吸着状態を強制的に解除している。このように構成されたテーブル9は、前述したが如く支持柱10を介してθステージ4c上に固定される。   Next, each suction suction hole 9a is connected to a suction valve (not shown) disposed outside the vacuum bonding chamber 15 via a pipe 18, and is connected to a vacuum pump (not shown) via this suction valve. . In this case, a bypass pipe is provided in the middle of the pipe 18 for opening to the atmosphere via a suction / adsorption release valve, and the suction state is forcibly released by opening the suction / adsorption release valve to the atmosphere. It has been released. The table 9 configured in this manner is fixed on the θ stage 4c via the support column 10 as described above.

また、加圧板16には、テーブル9と同様に上基板34を吸着する為の静電吸着用電極と複数の吸引吸着孔16aとが設けられている。ここで、後述するが如く加圧板16にて上基板34を吸引吸着している状態で真空貼り合わせ室15内を減圧していくと、その吸着力が小さくなり上基板34が落下する虞がある。これが為、真空貼り合わせ室15内には、加圧板16の僅か下の位置で上基板34を受け止める図示しない基板保持爪が設けられている。この基板保持爪は、例えば上基板34の対角位置たる二つの角部に対応して配設されており、真空貼り合わせ室15の上部から下方に向けて延設したシャフトで釣り下げ保持される。   The pressure plate 16 is provided with an electrostatic chucking electrode and a plurality of suction chucking holes 16 a for sucking the upper substrate 34, similar to the table 9. Here, as will be described later, if the pressure inside the vacuum bonding chamber 15 is reduced while the upper substrate 34 is sucked and sucked by the pressure plate 16, the suction force may be reduced and the upper substrate 34 may fall. is there. Therefore, a substrate holding claw (not shown) that receives the upper substrate 34 at a position slightly below the pressure plate 16 is provided in the vacuum bonding chamber 15. The substrate holding claws are disposed corresponding to, for example, two corners that are diagonal positions of the upper substrate 34, and are suspended and held by a shaft extending downward from the upper portion of the vacuum bonding chamber 15. The

具体的には、図示しないが、真空貼り合わせ室15の上部に形成された貫通孔にシャフトが挿通されており、このシャフトがその軸中心で回転し且つ上下移動できるように構成されている。この場合、真空貼り合わせ室15内が真空漏れを起こさないようにシャフトに真空シールが覆設されている。上記回転はシャフトの端部に接続された図示しない回転アクチェータによって、上下移動は同様にシャフトの端部に接続された図示しない昇降アクチェータによって行われる。このようにシャフトを回転又は上下移動させることによって、各基板33,34の貼り合わせを行ない、下基板33上に滴下された液晶剤を各基板33,34の主面の広がり方向に拡張させる際に邪魔にならぬように基板保持爪を退避させることができる。   Specifically, although not shown, a shaft is inserted through a through hole formed in the upper portion of the vacuum bonding chamber 15, and this shaft is configured to rotate about its axis and move up and down. In this case, the shaft is covered with a vacuum seal so as not to cause a vacuum leak in the vacuum bonding chamber 15. The rotation is performed by a rotation actuator (not shown) connected to the end of the shaft, and the vertical movement is similarly performed by a lift actuator (not shown) connected to the end of the shaft. By rotating or vertically moving the shaft in this manner, the substrates 33 and 34 are bonded to each other, and the liquid crystal agent dropped on the lower substrate 33 is expanded in the spreading direction of the main surfaces of the substrates 33 and 34. The substrate holding claw can be retracted so as not to get in the way.

上記各吸引吸着孔16aは、配管19を介して真空貼り合わせ室15の外部に配設した図示しない吸着バルブに接続され、この吸着バルブを経由して図示しない真空ポンプに接続されている。この場合、その配管19の途中にはテーブル9と同様に吸引吸着解除用のバルブを介して大気開放する為のバイパス配管が設けられており、その吸引吸着解除用バルブを大気開放することによって吸着状態を強制的に解除している。このように構成された加圧板16は、複数の支持柱27を介してZ軸移動ステージ部S3の後述する移動ベース29に吊り下げ固定されている。   Each of the suction suction holes 16a is connected to a suction valve (not shown) disposed outside the vacuum bonding chamber 15 via a pipe 19, and is connected to a vacuum pump (not shown) via the suction valve. In this case, a bypass pipe is provided in the middle of the pipe 19 for opening to the atmosphere via a suction suction release valve in the same manner as the table 9, and the suction is released by opening the suction suction release valve to the atmosphere. The state is forcibly released. The pressure plate 16 configured in this manner is suspended and fixed to a later-described moving base 29 of the Z-axis moving stage unit S3 via a plurality of support columns 27.

ここで、真空貼り合わせ室15と移動ベース29との間には、真空貼り合わせ室15上に一端を固定し且つ移動ベース29の下部に他端を固定すると共に支持柱27に覆設する蛇腹状の弾性体から成る真空ベローズ28が配設されており、これにより貼り合わせ時における真空貼り合わせ室15内の減圧状態を保持している。   Here, between the vacuum bonding chamber 15 and the moving base 29, one end is fixed on the vacuum bonding chamber 15 and the other end is fixed to the lower portion of the moving base 29, and the bellows is provided on the support column 27. A vacuum bellows 28 made of an elastic body is disposed, and this maintains a decompressed state in the vacuum bonding chamber 15 at the time of bonding.

更に、この真空貼り合わせ室15の上部には、図1に示すが如く、後述する一次加圧後(減圧状態で各基板33,34を加圧して貼り合わせた後)に、加圧板16を上昇させた状態で、下基板33に予め設けた仮固定用のUV硬化剤53を加圧しながらUV光を照射して硬化させる仮固定機構部S4が設けられる。以下に、この仮固定機構部S4について図2を用いて説明する。   Further, as shown in FIG. 1, a pressure plate 16 is placed on the upper portion of the vacuum bonding chamber 15 after the primary pressurization described later (after the substrates 33 and 34 are pressed and bonded in a reduced pressure state). In the raised state, there is provided a temporary fixing mechanism portion S4 for irradiating and curing the UV light while pressurizing the UV fixing agent 53 for temporary fixing provided in advance on the lower substrate 33. Below, this temporary fixing mechanism part S4 is demonstrated using FIG.

この仮固定機構部S4は、その先端部分(真空貼り合わせ室15内に配設されている部分)から、内部にガラス44を保持する筒体から成るガラスホルダ42と、このガラスホルダ42を螺着する筒体から成る中空円筒加圧バー60と、この中空円筒加圧バー60の内部で且つガラス44の近傍に配設されたUV光照射用のUVファイバ45と、真空貼り合わせ室15の上面に真空遮断用Oリング46を介して固定され且つ中空円筒加圧バー60が挿通される筒体から成るフランジ50と、中空円筒加圧バー60を上下方向に移動させる移動手段とを有する。   The temporary fixing mechanism portion S4 includes a glass holder 42 made of a cylindrical body that holds the glass 44 inside, and a screwed portion of the glass holder 42 from its tip portion (portion disposed in the vacuum bonding chamber 15). A hollow cylindrical pressure bar 60 comprising a cylindrical body to be worn, a UV fiber 45 for UV light irradiation disposed inside the hollow cylindrical pressure bar 60 and in the vicinity of the glass 44, and a vacuum bonding chamber 15. It has a flange 50 that is fixed to the upper surface via a vacuum interrupting O-ring 46 and that has a cylindrical body through which the hollow cylindrical pressure bar 60 is inserted, and a moving means that moves the hollow cylindrical pressure bar 60 in the vertical direction.

本実施形態の移動手段は、中空円筒加圧バー60の上下動を付勢するシリンダ49と、フランジ50の外周部に配設されたシリンダ49固定用のシリンダ固定金具52と、中空円筒加圧バー60の一端(図2にあっては上端)に配設され且つシリンダ49の稼動部(移動軸)に固定された連結金具48とで構成される。また、中空円筒加圧バー60が円滑に上下動できるように、フランジ50内にはベアリング51が配設されている。ここで、中空円筒加圧バー60が上下動するとUVファイバ45も一緒に上下動するので、中空円筒加圧バー60の一端から延設されているUVファイバ45の損傷防止を図る為に、その延設部分を固定金具55で連結金具48に固定している。このように固定することで上下動時のUVファイバ45へのストレスが軽減され、例えばその断裂を防止できる。   The moving means of the present embodiment includes a cylinder 49 that urges the vertical movement of the hollow cylindrical pressure bar 60, a cylinder fixing bracket 52 for fixing the cylinder 49 disposed on the outer peripheral portion of the flange 50, and a hollow cylindrical pressure bar. The connecting member 48 is disposed at one end (the upper end in FIG. 2) of the bar 60 and is fixed to the operating portion (moving shaft) of the cylinder 49. A bearing 51 is provided in the flange 50 so that the hollow cylindrical pressure bar 60 can move up and down smoothly. Here, when the hollow cylindrical pressure bar 60 moves up and down, the UV fiber 45 also moves up and down together. Therefore, in order to prevent damage to the UV fiber 45 extending from one end of the hollow cylindrical pressure bar 60, The extended portion is fixed to the connecting metal 48 by the fixing metal 55. By fixing in this way, stress on the UV fiber 45 during vertical movement can be reduced, and for example, the tearing can be prevented.

ここで、ガラスホルダ42の先端には、ガラス44の下面に当接する筒状の狭窄部が設けられている。これにより、後述するが如くその狭窄部が基板を押圧しても、その押圧面が小さいので隣り合うUV硬化剤53に対して同時に圧が掛かることは無い。更に、その狭窄部がUV光の照射口になるので、ガラス44を介したUV光を基板に直接照射することは無い。   Here, at the tip of the glass holder 42, a cylindrical narrowed portion that abuts the lower surface of the glass 44 is provided. As a result, as will be described later, even if the constricted portion presses the substrate, the pressing surface is small, so that no pressure is simultaneously applied to the adjacent UV curing agent 53. Further, since the narrowed portion serves as a UV light irradiation port, the substrate is not directly irradiated with UV light through the glass 44.

また、ガラスホルダ42と中空円筒加圧バー60の接合端には真空遮断用Oリング41が,ガラスホルダ42とガラス44との間には真空遮断用Oリング43が,真空貼り合わせ室15の上面とフランジ50の下面との間には真空遮断用Oリング46が,フランジ50の内周と中空円筒加圧バー60の外周との間には真空遮断用Oリング47が配設されており、これにより真空貼り合わせ室15内の減圧状態を保つことができる。即ち中空円筒加圧バー60内が大気圧となるので、この部分を利用してUVファイバ45を構造上基板に最も近い位置(例えばガラス44の近傍)に配置する。そして、このような位置にUVファイバ45を配設しているので、基板に照射されるUV光の減衰が少なく、大口径の集光レンズ等を設ける必要が無い。これが為、ガラス44は、UV光透過率の最も良いもの、例えば石英ガラスが適している。   Further, a vacuum blocking O-ring 41 is provided at the joining end of the glass holder 42 and the hollow cylindrical pressure bar 60, and a vacuum blocking O-ring 43 is provided between the glass holder 42 and the glass 44 in the vacuum bonding chamber 15. A vacuum interrupting O-ring 46 is disposed between the upper surface and the lower surface of the flange 50, and a vacuum interrupting O-ring 47 is disposed between the inner periphery of the flange 50 and the outer periphery of the hollow cylindrical pressure bar 60. Thus, the reduced pressure state in the vacuum bonding chamber 15 can be maintained. That is, since the inside of the hollow cylindrical pressure bar 60 becomes atmospheric pressure, the UV fiber 45 is disposed at a position closest to the substrate (for example, in the vicinity of the glass 44) using this portion. Since the UV fiber 45 is disposed at such a position, the attenuation of the UV light applied to the substrate is small, and there is no need to provide a condensing lens having a large aperture. For this reason, the glass 44 having the best UV light transmittance, for example, quartz glass is suitable.

以上の如く構成された仮固定機構部S4は、設計上、可能な範囲で且つ有効接着位置を検討することで複数設けても良いが、図3に示すように最低でも基板の各辺に二箇所(図3におけるUV硬化剤53の上方)ずつ設けることが望ましい。また、真空貼り合わせ室15内の減圧状態を保つことができるのであれば、仮固定機構部S4に基板上で水平方向に移動させる移動機構を付加し、その仮固定機構部S4を基板の各辺に一箇所ずつ設けるよう構成しても良い。
[Z軸移動ステージ部]
A plurality of temporary fixing mechanism portions S4 configured as described above may be provided by design and within a possible range by examining the effective bonding position. However, at least two temporary fixing mechanism portions S4 may be provided on each side of the substrate as shown in FIG. It is desirable to provide each location (above the UV curing agent 53 in FIG. 3). Further, if the reduced pressure state in the vacuum bonding chamber 15 can be maintained, a movement mechanism for moving the temporary fixing mechanism portion S4 in the horizontal direction on the substrate is added to the temporary fixing mechanism portion S4. You may comprise so that it may provide one place in a edge | side.
[Z-axis moving stage]

Z軸移動ステージ部S3は、加圧板16を吊り下げ保持する移動ベース29と、その両端に配設されたリニアガイド30と、このリニアガイド30と係合し且つフレーム3に設けられた上下方向(図1に示すZ軸方向)のレール3aと、そのZ軸方向の出力軸を備えた電動モータ32と、一端が移動ベース29側に係合し且つ他端が電動モータ32の出力軸側に係合するボールネジ31とを有する。このようにZ軸移動ステージ部S3を構成することによって、駆動させた電動モータ32で移動ベース29をレールに沿って上下方向に移動させ、加圧板16を上下移動させることができる。
[基板貼り合わせ装置の動作]
The Z-axis moving stage unit S3 includes a moving base 29 for suspending and holding the pressure plate 16, linear guides 30 disposed at both ends thereof, and a vertical direction that is engaged with the linear guide 30 and provided on the frame 3. The rail 3a (in the Z-axis direction shown in FIG. 1), the electric motor 32 having an output shaft in the Z-axis direction, one end engaged with the moving base 29 side, and the other end on the output shaft side of the electric motor 32 And a ball screw 31 to be engaged. By configuring the Z-axis moving stage unit S3 in this way, the moving base 29 can be moved in the vertical direction along the rail by the driven electric motor 32, and the pressure plate 16 can be moved up and down.
[Operation of substrate bonding equipment]

次に、本実施形態の基板貼り合わせ装置の動作を説明する。ここでは貼り合わせ対象物たる基板として液晶パネル用の基板を用いた場合について例示する。   Next, the operation of the substrate bonding apparatus according to this embodiment will be described. Here, a case where a substrate for a liquid crystal panel is used as the substrate to be bonded is illustrated.

予め、貼り合わせる二枚の基板の何れか一方には、その各基板を貼り合わせた際に液晶を決められた枠内に閉じ込め封入する為、図3に示すが如く、液晶封止用シール剤(接着剤)37で切れ目無く枠を設けておく。また、その枠を囲うように同じく切れ目の無い枠(以下、「ダミーシール」という)54を接着剤37とは別に設ける。更に、そのダミーシール54の基板端部側の近くには、UV硬化剤53が点若しくはある程度の長さをもった線形状に設けられる。そして、接着剤37から成る液晶封止用の枠内に液晶39を所定量滴下しておく。本実施形態にあっては、この液晶39等が滴下された基板を下基板33とする。ここで、ダミーシール54が設けられない場合もある。かかる場合にあっても、略同等の位置にUV硬化剤53が設けられる。   As shown in FIG. 3, a sealing agent for sealing a liquid crystal is used in order to confine and enclose the liquid crystal in a predetermined frame when the respective substrates are bonded together. (Adhesive) 37 is used to provide a seamless frame. Further, a frame (hereinafter referred to as “dummy seal”) 54 is also provided separately from the adhesive 37 so as to surround the frame. Further, a UV curing agent 53 is provided in the form of a dot or a line having a certain length near the substrate end portion side of the dummy seal 54. Then, a predetermined amount of liquid crystal 39 is dropped into a liquid crystal sealing frame made of an adhesive 37. In the present embodiment, the substrate on which the liquid crystal 39 or the like is dropped is referred to as the lower substrate 33. Here, the dummy seal 54 may not be provided. Even in such a case, the UV curing agent 53 is provided at substantially the same position.

先ず、真空貼り合わせ室15の外部に配設された図示しない移載機のハンドを用いて、膜面を下方に向けた上基板34の周縁部を下側から吸引吸着する。そして、真空貼り合わせ室15の第一開口部15aに備えたゲートバルブ17を開け、その第一開口部15aから移載機のハンドを真空貼り合わせ室15内に挿入し、電動モータ32を駆動して下降させた加圧板16を上基板34に押し付ける。しかる後、ハンドの吸引吸着を解除し、真空ポンプを作動させて吸引吸着孔16aで上基板34を加圧板16に吸引吸着する。この上基板34の吸着が終了すると、ハンドを真空貼り合わせ室15外に退避させる。   First, using the hand of a transfer machine (not shown) disposed outside the vacuum bonding chamber 15, the peripheral edge of the upper substrate 34 with the film surface facing downward is sucked and adsorbed from below. Then, the gate valve 17 provided in the first opening 15a of the vacuum bonding chamber 15 is opened, the hand of the transfer machine is inserted into the vacuum bonding chamber 15 from the first opening 15a, and the electric motor 32 is driven. Then, the pressure plate 16 lowered is pressed against the upper substrate 34. Thereafter, the suction suction of the hand is released, the vacuum pump is operated, and the upper substrate 34 is sucked and sucked to the pressure plate 16 through the suction suction holes 16a. When the suction of the upper substrate 34 is completed, the hand is retracted out of the vacuum bonding chamber 15.

続いて、各昇降ピン35を、その先端がテーブル9の上面から突出するようにシリンダ36を作動させて上昇させておく。そして、液晶を滴下した面を上にした下基板33の周縁部を移載機のハンドで下側から吸引吸着し、そのハンドを真空貼り合わせ室15内に挿入して下基板33を各昇降ピン35上に移載する。この下基板33の移載が終了すると、ハンドを真空貼り合わせ室15外に退避させてゲートバルブ17を閉じる。しかる後、各昇降ピン35を下降させて下基板33をテーブル9上に載置し、真空ポンプを作動させて吸引吸着孔9aで下基板33をテーブル9に吸引吸着する。   Subsequently, each lift pin 35 is raised by operating the cylinder 36 so that the tip of the lift pin 35 protrudes from the upper surface of the table 9. Then, the peripheral portion of the lower substrate 33 with the liquid crystal dripped surface is sucked and adsorbed from below by the hand of the transfer machine, and the hand is inserted into the vacuum bonding chamber 15 to move the lower substrate 33 up and down. Transfer on the pin 35. When the transfer of the lower substrate 33 is completed, the hand is retracted out of the vacuum bonding chamber 15 and the gate valve 17 is closed. Thereafter, the respective raising and lowering pins 35 are lowered to place the lower substrate 33 on the table 9, and the vacuum pump is operated to suck and suck the lower substrate 33 to the table 9 through the suction suction holes 9a.

以上の如きテーブル9と加圧板16への各基板33,34の吸着が終了すると、第一排気管20a側のバルブを開放して真空貼り合わせ室15内のガスを徐々に排気する。具体的には、本実施形態にあっては装置の初期状態にて第一及び第二の排気管20a,20bが切換バルブによって双方共閉じられた状態に設定されており、各基板33,34の吸着が終了すると、第一排気管20a側を開放し且つ第二排気管20b側を閉じた状態になるよう切換バルブを切り換えて真空貼り合わせ室15内のガスを徐々に排気する。この場合、前述したが如き径に設定した第一排気管20aを用いて低速排気しているので、ガスの流れによる基板33,34の暴れ、下基板33上の液晶の飛散や減圧による水分の凍結が発生を防止することができる。   When the adsorption of the substrates 33 and 34 to the table 9 and the pressure plate 16 is completed as described above, the valve in the first exhaust pipe 20a side is opened, and the gas in the vacuum bonding chamber 15 is gradually exhausted. Specifically, in the present embodiment, the first and second exhaust pipes 20a and 20b are both closed by the switching valve in the initial state of the apparatus, and the respective substrates 33 and 34 are set. When the adsorption is completed, the switching valve is switched so that the first exhaust pipe 20a side is opened and the second exhaust pipe 20b side is closed, and the gas in the vacuum bonding chamber 15 is gradually exhausted. In this case, since the first exhaust pipe 20a having the diameter set as described above is exhausted at a low speed, the substrates 33 and 34 are disturbed by the gas flow, the liquid crystal is scattered on the lower substrate 33, and moisture is depressurized. Freezing can be prevented from occurring.

続いて、第一排気管20aによる排気によって真空貼り合わせ室15内が所定の圧になったときに、具体的には図示しない圧力計にて測定した真空貼り合わせ室15内の気圧が排気速度を上げても基板暴れ,液晶飛散や水分凍結が発生しない圧力になったとき(例えば、吸引吸着力で吸着している上基板34が加圧板16から離れない程度の圧まで減圧したとき)に、第一排気管20aのバルブを閉じる。   Subsequently, when the inside of the vacuum bonding chamber 15 reaches a predetermined pressure by exhausting through the first exhaust pipe 20a, specifically, the air pressure in the vacuum bonding chamber 15 measured by a pressure gauge (not shown) is the exhaust speed. When the pressure is such that the substrate does not violate, the liquid crystal scatters, or the water freezes even when the pressure is raised (for example, when the upper substrate 34 adsorbed by the suction adsorption force is reduced to a pressure that does not separate from the pressure plate 16) Then, the valve of the first exhaust pipe 20a is closed.

そして、第二排気管20bのバルブを開放し、各基板33,34を貼り合わせる為の圧力(本実施形態にあっては約0.67Pa)まで真空貼り合わせ室15内を急速に減圧する。ここで、その圧力下では上基板34の吸引吸着力よりも真空貼り合わせ室15内の気圧の方が低くなっているので、その上基板34が加圧板16から離れてしまう。しかしながら、加圧板16の下面側には前述した基板保持爪が具備されており、前述した回転アクチェータや昇降アクチェータによって基板保持爪を動かして上基板34が保持されているので、その上基板34は加圧板16から離間しない。   And the valve | bulb of the 2nd exhaust pipe 20b is open | released, and the inside of the vacuum bonding chamber 15 is rapidly pressure-reduced to the pressure (about 0.67 Pa in this embodiment) for bonding each board | substrate 33 and 34 together. Here, since the atmospheric pressure in the vacuum bonding chamber 15 is lower than the suction and adsorption force of the upper substrate 34 under the pressure, the upper substrate 34 is separated from the pressure plate 16. However, the above-described substrate holding claw is provided on the lower surface side of the pressure plate 16, and the upper substrate 34 is held by moving the substrate holding claw by the above-described rotary actuator or lifting actuator. It is not separated from the pressure plate 16.

上述したが如く真空貼り合わせ室15内の減圧が終了すると、真空中でも各基板33,34をテーブル9と加圧板16に各々吸着できるように、そのテーブル9及び加圧板16の静電吸着電極に電圧を印加して各基板33,34を静電吸着する。しかる後、電動モータ32を駆動して移動ベース29を下降させ、上基板34を下基板33に接近させる。そして、認識用カメラ26を用いて各基板33,34に設けた位置合わせマークを観測して基板33,34間の位置ずれを測定し、この測定値に基づきXステージ4a,Yステージ4b並びにθステージ4cの動作制御を行ってテーブル9を水平移動させ、下基板33と上基板34との高精度な位置合わせを行う。   As described above, when the decompression in the vacuum bonding chamber 15 is finished, the electrostatic chucking electrodes of the table 9 and the pressure plate 16 are arranged so that the substrates 33 and 34 can be attracted to the table 9 and the pressure plate 16 even in a vacuum. A voltage is applied to electrostatically attract the substrates 33 and 34. Thereafter, the electric motor 32 is driven to lower the moving base 29, so that the upper substrate 34 approaches the lower substrate 33. Then, the alignment mark provided on each of the substrates 33 and 34 is observed using the recognition camera 26 to measure the positional deviation between the substrates 33 and 34, and the X stage 4a, the Y stage 4b, and θ are measured based on the measured values. By controlling the operation of the stage 4c, the table 9 is moved horizontally, and the lower substrate 33 and the upper substrate 34 are aligned with high accuracy.

その位置合わせが終了すると、移動ベース29を更に下降させて上基板34でUV硬化剤53,ダミーシール54及び接着剤37を押し潰し、その接着剤37で形成された枠内に液晶を封止した状態にする。このようにして一次加圧が終了する。この一次加圧の後、加圧板16の静電吸着電極の印加電圧を切断し、電動モータ32を駆動して加圧板16を上昇させる。   When the alignment is completed, the moving base 29 is further lowered to crush the UV curing agent 53, the dummy seal 54 and the adhesive 37 with the upper substrate 34, and the liquid crystal is sealed in the frame formed by the adhesive 37. To the state. In this way, primary pressurization is completed. After this primary pressurization, the voltage applied to the electrostatic adsorption electrode of the pressure plate 16 is cut, and the electric motor 32 is driven to raise the pressure plate 16.

ここで、この一次加圧後の各基板33,34の状態を図4に示す。この場合の基板33,34間の間隔は約15μm程度であり、まだ所望の間隔になっていない。これが為、接着剤37の潰れ量が少なく、その接着剤37における各基板33,34との接触面積が小さい(接触部長さが短い)ので接着状態が不完全である。更には、接着剤37の枠内の液晶39が広がらず、その液晶39間に大きな真空空間部40ができている。   Here, the state of each of the substrates 33 and 34 after the primary pressurization is shown in FIG. In this case, the distance between the substrates 33 and 34 is about 15 μm, which is not yet a desired distance. For this reason, the amount of crushing of the adhesive 37 is small, and the contact area of the adhesive 37 with each of the substrates 33 and 34 is small (the length of the contact portion is short), so the bonding state is incomplete. Further, the liquid crystal 39 in the frame of the adhesive 37 does not spread, and a large vacuum space 40 is formed between the liquid crystals 39.

ここで、真空貼り合わせ室15内の圧力を減圧状態から大気圧へと変化させると、基板33,34間の空間部分(前述した真空空間部40)は減圧状態である為、各基板33,34には略均一にその外部から大きな圧力が加わる。例えば各基板33,34の大きさが1200mm×1000mmの場合は、その基板33,34間の空間部分が減圧状態のときに大気圧を加えると121.6kNの力を掛けることができる。これが為、本実施形態にあっては後述するが如く二次加圧を行い、適正な基板間隔である5μm以下好ましくは4μm以下の間隔にする。   Here, when the pressure in the vacuum bonding chamber 15 is changed from the reduced pressure state to the atmospheric pressure, the space portion between the substrates 33 and 34 (the vacuum space portion 40 described above) is in the reduced pressure state. A large pressure is applied to 34 from the outside substantially uniformly. For example, when the size of each of the substrates 33 and 34 is 1200 mm × 1000 mm, a force of 121.6 kN can be applied by applying atmospheric pressure when the space between the substrates 33 and 34 is in a reduced pressure state. For this reason, in the present embodiment, as will be described later, secondary pressurization is performed so that an appropriate substrate interval is 5 μm or less, preferably 4 μm or less.

前述したが如く一次加圧終了後に真空貼り合わせ室15内を減圧状態から大気圧へと圧力を変化させると、各基板33,34には略均一に圧力を加えることができる。しかしながら、急激に大気圧に戻した場合は、前述したが如く接着剤37がまだ十分に潰れていない為、真空貼り合わせ室15内に導入したガスがそのダミーシール54や接着剤37を破って真空空間部40に入り込み、液晶基板として不良品になってしまう。または、大気圧に戻した後の搬出途中において、前述した従来例の如く一方の基板のシール面には圧縮力が,他方の基板のシール面には引張り力が作用して上下の基板33,34の間でズレが生じるので、シール部分(接着剤37,ダミーシール54)が決壊して液晶39が流失してしまい、液晶基板として不良品になってしまう。   As described above, when the pressure in the vacuum bonding chamber 15 is changed from the reduced pressure state to the atmospheric pressure after the completion of the primary pressurization, the pressure can be applied to each of the substrates 33 and 34 substantially uniformly. However, when the pressure is suddenly returned to the atmospheric pressure, the adhesive 37 is not yet sufficiently crushed as described above, so the gas introduced into the vacuum bonding chamber 15 breaks the dummy seal 54 and the adhesive 37. It enters the vacuum space 40 and becomes a defective product as a liquid crystal substrate. Alternatively, in the middle of unloading after returning to atmospheric pressure, a compressive force is applied to the sealing surface of one substrate and a tensile force is applied to the sealing surface of the other substrate as in the conventional example described above, whereby the upper and lower substrates 33, Therefore, the seal portion (adhesive 37, dummy seal 54) breaks down and the liquid crystal 39 is washed away, resulting in a defective liquid crystal substrate.

これが為、本実施形態にあっては、一次加圧終了後であって二次加圧開始前に、接着剤37やダミーシール54とは別に設けたUV硬化剤53を最終ギャップ(適正な,即ち所望の基板間隔)まで局部的に加圧し、しかる後、UV硬化剤53にUV光を照射して仮止めを行う。以下に、この仮止めについて図5を用いて詳述する。   Therefore, in the present embodiment, after the primary pressurization is finished and before the secondary pressurization is started, the UV curing agent 53 provided separately from the adhesive 37 and the dummy seal 54 is provided with the final gap (appropriate, That is, the pressure is locally applied to a desired substrate interval), and then the UV curing agent 53 is irradiated with UV light to temporarily fix it. Below, this temporary fix | stop is explained in full detail using FIG.

先ず、図2に示すシリンダ49を駆動して各基板33,34におけるUV硬化剤53位置の上方から中空円筒加圧バー60を下降させ、ガラスホルダ42の狭窄部の先端で各基板33,34を所定の力で加圧して基板間隔を最終ギャップにする。かかる状態で、UVファイバ45からUV光を照射する。そのUV光は、真空遮断されたガラス44を透過してUV硬化剤53に照射されるので、そのUV硬化剤53が硬化して仮止めが為される。尚、ガラスホルダ42を基板に押し付ける時の加圧力は、UV硬化剤53にもよるが0.1MPa〜0.5MPa程度とすることが好ましい。   First, the cylinder 49 shown in FIG. 2 is driven to lower the hollow cylindrical pressure bar 60 from above the position of the UV curing agent 53 in each substrate 33, 34, and each substrate 33, 34 at the tip of the narrow portion of the glass holder 42. Is pressed with a predetermined force to make the substrate gap the final gap. In this state, UV light is irradiated from the UV fiber 45. Since the UV light passes through the vacuum-blocked glass 44 and is irradiated onto the UV curing agent 53, the UV curing agent 53 is cured and temporarily fixed. The pressure applied when pressing the glass holder 42 against the substrate is preferably about 0.1 MPa to 0.5 MPa although it depends on the UV curing agent 53.

以上の如く仮止めが行われた後、シリンダ24を作動させ、急速に真空貼り合わせ室15内を大気圧に戻す為の大気開放弁23を開放して各基板33,34に加圧力を加える(二次加圧)。これにより、前述したが如く各基板33,34に加圧力が掛かり、その各基板33,34の本圧着が行われる。   After the temporary fixing is performed as described above, the cylinder 24 is operated, and the atmosphere release valve 23 for rapidly returning the inside of the vacuum bonding chamber 15 to the atmospheric pressure is opened to apply pressure to the substrates 33 and 34. (Secondary pressurization). As a result, a pressure is applied to the substrates 33 and 34 as described above, and the substrates 33 and 34 are finally pressure-bonded.

このように、減圧状況下で一次加圧した後、シール部分(接着剤37,ダミーシール54)以外の場所に設けた仮固定用のUV硬化剤53を所望の基板間隔まで加圧して硬化させ、その後、真空貼り合わせ室15内を大気圧に戻して基板同士を本圧着する構成としたので、真空貼り合わせ室15内が急激に大気圧に戻されても、半接着状態のシール部分の決壊による液晶39の漏れや基板同士のずれの発生を防止できる。   As described above, after the primary pressure is applied under a reduced pressure condition, the temporary fixing UV curing agent 53 provided at a place other than the seal portion (adhesive 37, dummy seal 54) is pressurized to a desired substrate interval and cured. Then, since the inside of the vacuum bonding chamber 15 is returned to atmospheric pressure and the substrates are subjected to main pressure bonding, even if the inside of the vacuum bonding chamber 15 is suddenly returned to atmospheric pressure, It is possible to prevent occurrence of leakage of the liquid crystal 39 and displacement of the substrates due to breakage.

以上示したが如く貼り合わせが終了し、更には真空貼り合わせ室15内の圧力が大気圧になると、ゲートバルブ17を開ける。そして、中空円筒加圧バー60を上昇させ、テーブル9の静電吸着電極の印加電圧を遮断し、且つ吸引吸着孔9aにおける吸引を解除した後、各昇降ピン35を上昇させてセルをテーブル9上から押し上げる。しかる後、移載機のハンドを第一開口部15aからセルの下部(セルとテーブル9の間)に挿入し、そのハンド上にセルを移載して真空貼り合わせ室15外に搬出する。   As described above, when the bonding is completed and the pressure in the vacuum bonding chamber 15 reaches atmospheric pressure, the gate valve 17 is opened. Then, the hollow cylindrical pressure bar 60 is raised, the voltage applied to the electrostatic suction electrode of the table 9 is cut off, and the suction in the suction suction hole 9a is released. Push up from above. Thereafter, the hand of the transfer machine is inserted into the lower part of the cell (between the cell and the table 9) through the first opening 15a, and the cell is transferred onto the hand and carried out of the vacuum bonding chamber 15.

尚、仮止め後に急激に真空貼り合わせ室15内を大気圧に戻さず、以下の如く行っても良い。先ず仮止め後に細い配管21の弁22を開放し、その配管21に接続した圧力源から加圧されたガスを真空貼り合わせ室15内に導入することで、徐々に大気圧に戻す。このように真空貼り合わせ室15内を徐々に大気圧に戻していくと、各基板33,34には徐々に圧力が加わり、シール部分(接着剤37,ダミーシール54)が徐々に潰れていく。そしてこれにより、シール部分と各基板33,34との接触面積も徐々に拡大する。このようにして真空空間部40の内圧と真空貼り合わせ室15内の圧力との差を徐々に大きくするので、導入されたガスの真空空間部40内への侵入をより有効に防止することができる。   In addition, after the temporary fixing, the inside of the vacuum bonding chamber 15 may not be rapidly returned to the atmospheric pressure, but may be performed as follows. First, after temporarily fixing, the valve 22 of the thin pipe 21 is opened, and a gas pressurized from a pressure source connected to the pipe 21 is introduced into the vacuum bonding chamber 15 to gradually return to the atmospheric pressure. When the inside of the vacuum bonding chamber 15 is gradually returned to atmospheric pressure in this way, pressure is gradually applied to the substrates 33 and 34, and the seal portions (adhesive 37 and dummy seal 54) are gradually crushed. . As a result, the contact area between the seal portion and each of the substrates 33 and 34 also gradually increases. Thus, since the difference between the internal pressure of the vacuum space 40 and the pressure in the vacuum bonding chamber 15 is gradually increased, it is possible to more effectively prevent the introduced gas from entering the vacuum space 40. it can.

例えば、この状態の各基板33,34間の間隔は約10μm程度になっている。ここで、前述したが如く真空貼り合わせ室15内にガスを導入すると、接着剤37は、潰れることで流動が起こり、チクソトロピー性によって粘度が低下する。そして、その粘度が低下した状態で、急速に真空貼り合わせ室15内を大気圧に戻す為の大気開放弁23を開放して更に各基板33,34に加圧力を加える。具体的には、真空貼り合わせ室15内に設けた圧力計が所定圧を超えたことを検出したときに弁22を閉じ、且つシリンダ24を作動させて大気開放弁23を開放することによって、各基板33,34に加圧力が加わり貼り合わせが終了する。例えばその所定圧としては、導入されたガスが接着剤37を破って真空空間部40内に入り込むことがなくなったときの圧力を予め実験等で検出しておき、その圧力を設定しておけばよい。   For example, the distance between the substrates 33 and 34 in this state is about 10 μm. Here, as described above, when the gas is introduced into the vacuum bonding chamber 15, the adhesive 37 is crushed to flow, and the viscosity is reduced by thixotropy. And in the state which the viscosity fell, the air release valve 23 for returning the inside of the vacuum bonding chamber 15 to atmospheric pressure rapidly is open | released, and a pressurizing force is further applied to each board | substrate 33,34. Specifically, by detecting that the pressure gauge provided in the vacuum bonding chamber 15 exceeds a predetermined pressure, the valve 22 is closed, and the cylinder 24 is operated to open the atmosphere release valve 23, A pressure is applied to each of the substrates 33 and 34 to complete the bonding. For example, as the predetermined pressure, if the introduced gas breaks the adhesive 37 and does not enter the vacuum space 40, the pressure is detected in advance by experiments and the pressure is set. Good.

上記の如き工程を経て急速に真空貼り合わせ室15内を大気圧に戻すことによって、接着剤37の接触面積が各基板33,34に対して広がりシール性が向上するので、基板33,34間へのガスの侵入をより有効に防止できる。また、接着剤37はその粘度が低下している為に速やかに潰れ、且つ液晶39も加圧されて潰れて広がるので、各基板33,34の貼り合わせ時間が短くなる。   By rapidly returning the inside of the vacuum bonding chamber 15 to the atmospheric pressure through the steps as described above, the contact area of the adhesive 37 spreads with respect to the substrates 33 and 34, and the sealing performance is improved. Intrusion of gas into the water can be prevented more effectively. In addition, since the viscosity of the adhesive 37 is reduced, the adhesive 37 is quickly crushed, and the liquid crystal 39 is also crushed and spread, so that the bonding time of the substrates 33 and 34 is shortened.

また、一次加圧後に上記配管21及び弁22によるガス導入を行い、上記所定圧になった後で前述した仮止めを行ってもよい。かかる場合、その仮止めの後に、急激に真空貼り合わせ室15内を大気圧にして本圧着が行われる。
[第二実施形態]
Further, after the primary pressurization, the gas may be introduced by the pipe 21 and the valve 22, and the temporary fixing described above may be performed after the predetermined pressure is reached. In such a case, after the temporary fixing, the main pressure bonding is performed by suddenly setting the inside of the vacuum bonding chamber 15 to atmospheric pressure.
[Second Embodiment]

次に、本発明に係る基板貼り合わせ装置の第二実施形態について図6に基づいて説明する。
この基板貼り合わせ装置は、前述した第一実施形態の装置とは以下の点で異なり、他はその第一実施形態と同様に構成される。具体的には、第一実施形態と同様の構成から成る仮固定機構部S4を真空貼り合わせ室15の下部に配置したものである。そして、この仮固定機構部S4に、第一実施形態の昇降ピン35と同様の機能を持たせた構成としたものである。これにより、本実施形態にあっては、昇降ピン35を設けずとも第一実施形態と同様のUV光による仮止めをしつつ基板を持ち上げることも可能となり、作業時間短縮にも貢献できる。
Next, a second embodiment of the substrate bonding apparatus according to the present invention will be described with reference to FIG.
This substrate bonding apparatus is different from the apparatus of the first embodiment described above in the following points, and the other configuration is the same as that of the first embodiment. Specifically, a temporary fixing mechanism portion S4 having the same configuration as that of the first embodiment is disposed at the lower portion of the vacuum bonding chamber 15. And this temporary fixing mechanism part S4 is set as the structure which gave the function similar to the raising / lowering pin 35 of 1st embodiment. Accordingly, in this embodiment, it is possible to lift the substrate while temporarily fixing with UV light as in the first embodiment without providing the lifting pins 35, which can contribute to shortening the working time.

このように、仮固定機構部S4を本実施形態の如き構成とすることで、真空貼り合わせ室15内を急激に大気圧に戻した際のシール部分の決壊による液晶漏れや基板のズレの防止、という第一実施形態と同様の効果を得るだけでなく、装置を構成する部品点数の大幅な増加をも防止できる。   As described above, the temporary fixing mechanism portion S4 is configured as in the present embodiment, thereby preventing liquid crystal leakage and substrate displacement caused by breakage of the seal portion when the inside of the vacuum bonding chamber 15 is suddenly returned to atmospheric pressure. In addition to the same effects as the first embodiment, it is possible to prevent a significant increase in the number of parts constituting the apparatus.

本発明の基板貼り合わせ装置の第一実施形態を側面から見た概略構成図である。It is the schematic block diagram which looked at 1st embodiment of the board | substrate bonding apparatus of this invention from the side surface. 本実施形態の仮固定機構部の構成を示す断面図である。It is sectional drawing which shows the structure of the temporary fixing mechanism part of this embodiment. 本実施形態における基板上のUV硬化剤の塗布位置,即ち基板に対する仮固定機構部の配設位置を説明する上面図である。It is a top view explaining the application | coating position of the UV hardening agent on the board | substrate in this embodiment, ie, the arrangement position of the temporary fixing mechanism part with respect to a board | substrate. 本実施形態における一次加圧後の一対の基板の状態の一例を示す側面図である。It is a side view which shows an example of the state of a pair of board | substrate after the primary pressurization in this embodiment. 本実施形態における仮止め時の一対の基板の状態の一例を示す側面図である。It is a side view which shows an example of the state of a pair of board | substrate at the time of temporary fixing in this embodiment. 本発明の基板貼り合わせ装置の第二実施形態を側面から見た図であって、本実施形態の仮固定機構部の配設位置を説明する説明図である。It is the figure which looked at 2nd embodiment of the board | substrate bonding apparatus of this invention from the side surface, Comprising: It is explanatory drawing explaining the arrangement | positioning position of the temporary fixing mechanism part of this embodiment.

符号の説明Explanation of symbols

9:テーブル、15:真空貼り合わせ室(真空チャンバ)、16:加圧板、20a:第一排気管
20b:第二排気管、21:配管、22:弁、23:大気開放弁、33,34:基板、37:接着剤、39:液晶、40:真空空間部、53:UV硬化剤(仮固定用の接着剤)、54:ダミーシール、S4:仮固定機構部。
9: Table, 15: Vacuum bonding chamber (vacuum chamber), 16: Pressure plate, 20a: First exhaust pipe 20b: Second exhaust pipe, 21: Piping, 22: Valve, 23: Atmospheric release valve, 33, 34 : Substrate, 37: adhesive, 39: liquid crystal, 40: vacuum space, 53: UV curing agent (adhesive for temporary fixing), 54: dummy seal, S4: temporary fixing mechanism.

Claims (3)

真空チャンバ内に配置した二枚の基板を真空状態で加圧貼り合わせを行った後、その各基板のうちの少なくともいずれか一方に複数箇所設けた仮固定用の接着剤にUV光を照射して硬化させる仮固定機構を備えた基板貼り合わせ装置において、
前記仮固定機構は、中空円筒加圧バー内に、UVファイバを真空遮断して配置したものであって、真空チャンバ内の減圧状態を保ったまま前記中空円筒加圧バーを真空チャンバ内で上下移動可能に構成したことを特徴とする基板貼り合わせ装置。
After the two substrates placed in the vacuum chamber are pressure bonded together in a vacuum state, UV light is irradiated to the temporary fixing adhesive provided at a plurality of positions on at least one of the substrates. In a substrate laminating apparatus equipped with a temporary fixing mechanism to be cured by
The temporary fixing mechanism is arranged by vacuum blocking the UV fiber in a hollow cylindrical pressure bar, and the hollow cylindrical pressure bar is moved up and down in the vacuum chamber while maintaining a reduced pressure state in the vacuum chamber. A substrate bonding apparatus characterized by being configured to be movable.
請求項1記載の基板貼り合わせ装置において、
前記中空円筒加圧バーの先端部には内部にガラスが保持され、前記ガラスに当接する筒状の狭窄部が設けてあり、前記狭窄部で基板に加圧力を加える構成とした基板貼り合わせ装置。
In the board | substrate bonding apparatus of Claim 1,
A substrate laminating apparatus in which glass is held inside the hollow cylindrical pressure bar, and a cylindrical constriction is provided in contact with the glass, and pressure is applied to the substrate at the constriction. .
請求項1記載の基板貼り合わせ装置において、
前記真空チャンバにフランジを取り付け、前記フランジ内を前記中空円筒加圧バーが上下動する構成としたことを特徴とする基板貼り合わせ装置。
In the board | substrate bonding apparatus of Claim 1,
A substrate bonding apparatus, wherein a flange is attached to the vacuum chamber, and the hollow cylindrical pressure bar moves up and down in the flange.
JP2006232836A 2006-08-29 2006-08-29 Substrate bonding device Withdrawn JP2007017996A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111029601A (en) * 2019-12-25 2020-04-17 章春元 Device for gluing and curing battery and support
JP2021101229A (en) * 2019-12-24 2021-07-08 日本ゼオン株式会社 Panel manufacturing device and panel manufacturing method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021101229A (en) * 2019-12-24 2021-07-08 日本ゼオン株式会社 Panel manufacturing device and panel manufacturing method
JP7380186B2 (en) 2019-12-24 2023-11-15 日本ゼオン株式会社 Panel manufacturing equipment and panel manufacturing method
CN111029601A (en) * 2019-12-25 2020-04-17 章春元 Device for gluing and curing battery and support
CN111029601B (en) * 2019-12-25 2022-11-29 章春元 Device for gluing and curing battery and support

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