JP2006518938A - 電子装置 - Google Patents
電子装置 Download PDFInfo
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K19/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic element specially adapted for rectifying, amplifying, oscillating or switching, covered by group H10K10/00
- H10K19/10—Integrated devices, or assemblies of multiple devices, comprising at least one organic element specially adapted for rectifying, amplifying, oscillating or switching, covered by group H10K10/00 comprising field-effect transistors
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/466—Lateral bottom-gate IGFETs comprising only a single gate
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- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/468—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/484—Insulated gate field-effect transistors [IGFETs] characterised by the channel regions
- H10K10/488—Insulated gate field-effect transistors [IGFETs] characterised by the channel regions the channel region comprising a layer of composite material having interpenetrating or embedded materials, e.g. a mixture of donor and acceptor moieties, that form a bulk heterojunction
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- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/114—Poly-phenylenevinylene; Derivatives thereof
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- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
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Abstract
Description
実施例1
図1に示されているインバータ10は、第1電界効果トランジスタ11と第2電界効果トランジスタ12とを有する。インバータ10は電気絶縁基板1を有する。基板1上には第1電極層2及び第2電極層3がある。第1電極層においては、ソース電極21、21’及びドレイン電極22、22’の範囲が定められ、これらの電極対21、22及び21’、22’は、各々、チャネル23、23’によって互いから分離される。第2電極層においては、ゲート電極24、24’及びそれらを相互接続する相互接続部25の範囲が定められる。第1電極層2上のゲート電極24の垂直突起部において、ゲート電極24は、実質的にチャネル23と部分的に重なる。更に、中間層4及び活性層5がある。
Claims (9)
- 各々がソース電極及びドレイン電極を含む第1電界効果トランジスタ及び第2電界効果トランジスタを備えるインバータユニットを有する電子装置であって、前記電界効果トランジスタの前記電極が、導電性材料の同じ電極層内に配置され、ソース電極とドレイン電極との対が、n型導電性を持つ第1チャネル及びp型導電性を持つ第2チャネルによって相互接続され、前記チャネルが、有機半導体材料を含み、前記第1トランジスタ及び前記第2トランジスタに共通する1つの活性層内に配置され、前記トランジスタの各々が、誘電層によって前記チャネルから分離されるゲート電極を有する電子装置。
- 前記第1トランジスタ及び前記第2トランジスタのための共通ゲート電極があることを特徴とする請求項1に記載の電子装置。
- 前記第1トランジスタ及び前記第2トランジスタの前記ドレイン電極が共通であることを特徴とする請求項1又は2に記載の電子装置。
- 前記ソース電極と前記ドレイン電極とが、互いにかみ合わされた電極対を形成し、前記電極対において、前記ソース電極が、前記ドレイン電極の介在部によって互いに保護されることを特徴とする請求項3に記載の電子装置。
- 前記ドレイン電極が、第1面と該第1面から離れた方に向けられる第2面とを備えるボデイを有し、前記ボディが、前記第1面及び前記第2面上に指様の構造を持ち、前記ソース電極が、前記第1面上に配置され、この第1面上の前記指様の構造と共に互いにかみ合わされた電極対を形成し、前記ドレイン電極が、前記第2面上に配置され、この第2面上の前記指様の構造と共に互いにかみ合わされた電極対を形成することを特徴とする請求項4に記載の電子装置。
- 前記活性層が、有機キャリア材料と、p型半導体材料と、n型半導体材料との混合物を含むことを特徴とする請求項1に記載の電子装置。
- 前記ソース電極及び前記ドレイン電極が貴金属の群から選ばれる材料を有することを特徴とする請求項1に記載の電子装置。
- 前記n型半導体材料と前記p型半導体材料とが、互いの割合μn:μpが0.1から10までの範囲内である移動度μn、μpを持つことを特徴とする請求項1に記載の電子装置。
- 機能性有機n型半導体材料及び機能性有機p型半導体材料を含む共通活性層を備える第1電界効果トランジスタ及び第2電界効果トランジスタを持つインバータユニットを有する電子装置を製造する方法であって、前記活性層が溶液から基板に塗布される電子装置を製造する方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03100177 | 2003-01-28 | ||
PCT/IB2004/050053 WO2004068267A2 (en) | 2003-01-28 | 2004-01-26 | Electronic device |
Publications (1)
Publication Number | Publication Date |
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JP2006518938A true JP2006518938A (ja) | 2006-08-17 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2006502543A Pending JP2006518938A (ja) | 2003-01-28 | 2004-01-26 | 電子装置 |
Country Status (8)
Country | Link |
---|---|
US (2) | US20060243965A1 (ja) |
EP (2) | EP1590721B1 (ja) |
JP (1) | JP2006518938A (ja) |
KR (1) | KR20050096162A (ja) |
CN (2) | CN1742392A (ja) |
AT (2) | ATE359545T1 (ja) |
DE (2) | DE602004005824T2 (ja) |
WO (2) | WO2004068267A2 (ja) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004008784B3 (de) * | 2004-02-23 | 2005-09-15 | Infineon Technologies Ag | Verfahren zur Durchkontaktierung von Feldeffekttransistoren mit einer selbstorganisierten Monolage einer organischen Verbindung als Gatedielektrikum |
JP4661065B2 (ja) * | 2004-03-22 | 2011-03-30 | セイコーエプソン株式会社 | 相補型有機半導体装置 |
TWI228833B (en) * | 2004-05-04 | 2005-03-01 | Ind Tech Res Inst | Method for enhancing the electrical characteristics of organic electronic devices |
DE102004059467A1 (de) * | 2004-12-10 | 2006-07-20 | Polyic Gmbh & Co. Kg | Gatter aus organischen Feldeffekttransistoren |
KR100585629B1 (ko) * | 2005-02-04 | 2006-06-07 | 삼성전자주식회사 | 신뢰성을 향상시키는 안티퓨즈 회로 및 이를 이용한안티퓨징 방법 |
DE102005034414B4 (de) * | 2005-07-22 | 2007-11-15 | Siemens Ag | Verwendung eines lösungsprozessierbaren Materials als aktive halbleitende Schicht in einem n-Typ-Transistor |
US20070146426A1 (en) * | 2005-12-28 | 2007-06-28 | Nelson Brian K | All-inkjet printed thin film transistor |
TWI345326B (en) * | 2006-03-29 | 2011-07-11 | Pioneer Corp | Organic thin film transistor device and manufacturing method therefor |
US8247801B2 (en) * | 2006-03-31 | 2012-08-21 | Imec | Organic semi-conductor photo-detecting device |
US20070286953A1 (en) * | 2006-05-20 | 2007-12-13 | Macpherson Charles D | Solution processible materials and their use in electronic devices |
KR100943146B1 (ko) * | 2007-02-13 | 2010-02-18 | 주식회사 엘지화학 | 티아졸로티아졸 유도체를 이용한 유기 트랜지스터 및 이의제조방법 |
US8129714B2 (en) * | 2007-02-16 | 2012-03-06 | Idemitsu Kosan Co., Ltd. | Semiconductor, semiconductor device, complementary transistor circuit device |
GB0706756D0 (en) * | 2007-04-05 | 2007-05-16 | Imp Innovations Ltd | Improvements in organic field-effect transistors |
US7652339B2 (en) * | 2007-04-06 | 2010-01-26 | Xerox Corporation | Ambipolar transistor design |
DE102009043348B4 (de) * | 2009-09-29 | 2012-12-13 | Siemens Aktiengesellschaft | Material für eine photoaktive Schicht in organischen Photodioden, Verwendung dazu, sowie eine organische Photodiode |
EP2810313B1 (en) * | 2012-02-02 | 2017-06-14 | Basf Se | Method for producing an organic semiconductor device |
US10005879B2 (en) | 2012-02-03 | 2018-06-26 | Basf Se | Method for producing an organic semiconductor device |
US9147615B2 (en) | 2014-02-14 | 2015-09-29 | International Business Machines Corporation | Ambipolar synaptic devices |
US10692863B2 (en) * | 2016-09-30 | 2020-06-23 | Rohm Co., Ltd. | Semiconductor device and semiconductor package |
US10475698B2 (en) * | 2017-03-31 | 2019-11-12 | Teresa Oh | Ambipolar transistor and electronic sensor of high sensitivity using the same |
KR102363387B1 (ko) * | 2020-01-21 | 2022-02-15 | 금오공과대학교 산학협력단 | 불소 처리 그래핀을 이용한 2차원 구조 센서 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05152560A (ja) * | 1991-03-22 | 1993-06-18 | Mitsubishi Electric Corp | インバータ |
JPH0974217A (ja) * | 1995-09-07 | 1997-03-18 | Nippon Shokubai Co Ltd | 有機太陽電池 |
WO2001027998A1 (en) * | 1999-10-11 | 2001-04-19 | Koninklijke Philips Electronics N.V. | Integrated circuit |
JP2001177109A (ja) * | 1999-11-17 | 2001-06-29 | Lucent Technol Inc | 薄膜トランジスタ |
JP2002026336A (ja) * | 2000-04-06 | 2002-01-25 | Agere Systems Inc | バイポーラ半導体膜を備えたデバイス |
JP2002324931A (ja) * | 2001-03-30 | 2002-11-08 | Lucent Technol Inc | 集積回路薄膜トランジスタデバイスの製造方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2813428B2 (ja) * | 1989-08-17 | 1998-10-22 | 三菱電機株式会社 | 電界効果トランジスタ及び該電界効果トランジスタを用いた液晶表示装置 |
US5380807A (en) | 1992-01-15 | 1995-01-10 | U.S. Philips Corporation | Electrically conductive alternating copolymer and method of preparing such a copolymer |
JP3246189B2 (ja) * | 1994-06-28 | 2002-01-15 | 株式会社日立製作所 | 半導体表示装置 |
TW293172B (ja) * | 1994-12-09 | 1996-12-11 | At & T Corp | |
US6278127B1 (en) * | 1994-12-09 | 2001-08-21 | Agere Systems Guardian Corp. | Article comprising an organic thin film transistor adapted for biasing to form a N-type or a P-type transistor |
US5574291A (en) * | 1994-12-09 | 1996-11-12 | Lucent Technologies Inc. | Article comprising a thin film transistor with low conductivity organic layer |
US5625199A (en) * | 1996-01-16 | 1997-04-29 | Lucent Technologies Inc. | Article comprising complementary circuit with inorganic n-channel and organic p-channel thin film transistors |
EP0968537B1 (en) * | 1997-08-22 | 2012-05-02 | Creator Technology B.V. | A method of manufacturing a field-effect transistor substantially consisting of organic materials |
JP2002326305A (ja) * | 2001-04-27 | 2002-11-12 | Nisshinbo Ind Inc | 透視性電磁波シールド板、その製造方法及びディスプレイ装置 |
US6794220B2 (en) * | 2001-09-05 | 2004-09-21 | Konica Corporation | Organic thin-film semiconductor element and manufacturing method for the same |
JP2005505142A (ja) * | 2001-10-01 | 2005-02-17 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 電子デバイス及び構成並びに方法 |
EP1306909A1 (en) * | 2001-10-24 | 2003-05-02 | Interuniversitair Micro-Elektronica Centrum | Ambipolar organic transistors |
US6555411B1 (en) * | 2001-12-18 | 2003-04-29 | Lucent Technologies Inc. | Thin film transistors |
-
2004
- 2004-01-26 CN CN200480002935.8A patent/CN1742392A/zh active Pending
- 2004-01-26 KR KR1020057013847A patent/KR20050096162A/ko not_active Application Discontinuation
- 2004-01-26 JP JP2006502543A patent/JP2006518938A/ja active Pending
- 2004-01-26 US US10/543,277 patent/US20060243965A1/en not_active Abandoned
- 2004-01-26 EP EP04705146A patent/EP1590721B1/en not_active Expired - Lifetime
- 2004-01-26 WO PCT/IB2004/050053 patent/WO2004068267A2/en active IP Right Grant
- 2004-01-26 DE DE602004005824T patent/DE602004005824T2/de not_active Expired - Fee Related
- 2004-01-26 AT AT04705146T patent/ATE359545T1/de not_active IP Right Cessation
- 2004-01-27 WO PCT/IB2004/050055 patent/WO2004068609A1/en active Application Filing
- 2004-01-27 US US10/543,276 patent/US7750339B2/en not_active Expired - Fee Related
- 2004-01-27 DE DE602004030214T patent/DE602004030214D1/de not_active Expired - Lifetime
- 2004-01-27 CN CN200480002930.5A patent/CN1742393B/zh not_active Expired - Fee Related
- 2004-01-27 EP EP04705480A patent/EP1590839B1/en not_active Expired - Lifetime
- 2004-01-27 AT AT04705480T patent/ATE489730T1/de not_active IP Right Cessation
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05152560A (ja) * | 1991-03-22 | 1993-06-18 | Mitsubishi Electric Corp | インバータ |
JPH0974217A (ja) * | 1995-09-07 | 1997-03-18 | Nippon Shokubai Co Ltd | 有機太陽電池 |
WO2001027998A1 (en) * | 1999-10-11 | 2001-04-19 | Koninklijke Philips Electronics N.V. | Integrated circuit |
JP2001177109A (ja) * | 1999-11-17 | 2001-06-29 | Lucent Technol Inc | 薄膜トランジスタ |
JP2002026336A (ja) * | 2000-04-06 | 2002-01-25 | Agere Systems Inc | バイポーラ半導体膜を備えたデバイス |
JP2002324931A (ja) * | 2001-03-30 | 2002-11-08 | Lucent Technol Inc | 集積回路薄膜トランジスタデバイスの製造方法 |
Also Published As
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EP1590839A1 (en) | 2005-11-02 |
WO2004068609A1 (en) | 2004-08-12 |
US20060243965A1 (en) | 2006-11-02 |
CN1742393B (zh) | 2011-12-28 |
ATE489730T1 (de) | 2010-12-15 |
ATE359545T1 (de) | 2007-05-15 |
CN1742392A (zh) | 2006-03-01 |
WO2004068267A2 (en) | 2004-08-12 |
EP1590839B1 (en) | 2010-11-24 |
US20060163561A1 (en) | 2006-07-27 |
CN1742393A (zh) | 2006-03-01 |
EP1590721A2 (en) | 2005-11-02 |
KR20050096162A (ko) | 2005-10-05 |
US7750339B2 (en) | 2010-07-06 |
DE602004030214D1 (de) | 2011-01-05 |
DE602004005824T2 (de) | 2008-01-10 |
DE602004005824D1 (de) | 2007-05-24 |
EP1590721B1 (en) | 2007-04-11 |
WO2004068267A3 (en) | 2004-09-16 |
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