JP2006328516A - Surface treatment method - Google Patents
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- JP2006328516A JP2006328516A JP2005157554A JP2005157554A JP2006328516A JP 2006328516 A JP2006328516 A JP 2006328516A JP 2005157554 A JP2005157554 A JP 2005157554A JP 2005157554 A JP2005157554 A JP 2005157554A JP 2006328516 A JP2006328516 A JP 2006328516A
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- 238000000034 method Methods 0.000 title claims abstract description 19
- 238000004381 surface treatment Methods 0.000 title claims abstract description 15
- 238000005498 polishing Methods 0.000 claims abstract description 15
- 229910052751 metal Inorganic materials 0.000 claims abstract description 14
- 239000002184 metal Substances 0.000 claims abstract description 14
- 239000000126 substance Substances 0.000 claims abstract description 11
- 238000005554 pickling Methods 0.000 claims abstract description 9
- 239000003513 alkali Substances 0.000 claims abstract description 5
- 239000013522 chelant Substances 0.000 claims description 12
- -1 carboxylate salt Chemical class 0.000 claims description 4
- 238000005406 washing Methods 0.000 claims description 2
- 150000001735 carboxylic acids Chemical class 0.000 claims 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 abstract description 7
- 229910017604 nitric acid Inorganic materials 0.000 abstract description 7
- 239000007788 liquid Substances 0.000 abstract description 6
- 150000001732 carboxylic acid derivatives Chemical class 0.000 abstract description 3
- 238000009489 vacuum treatment Methods 0.000 abstract 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 41
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 21
- 238000004140 cleaning Methods 0.000 description 15
- 239000004744 fabric Substances 0.000 description 13
- 239000007789 gas Substances 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 8
- 239000010935 stainless steel Substances 0.000 description 7
- 229910001220 stainless steel Inorganic materials 0.000 description 7
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- 239000001509 sodium citrate Substances 0.000 description 5
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 239000004317 sodium nitrate Substances 0.000 description 4
- 235000010344 sodium nitrate Nutrition 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005868 electrolysis reaction Methods 0.000 description 3
- 239000008151 electrolyte solution Substances 0.000 description 3
- 230000007935 neutral effect Effects 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- LFVGISIMTYGQHF-UHFFFAOYSA-N ammonium dihydrogen phosphate Chemical compound [NH4+].OP(O)([O-])=O LFVGISIMTYGQHF-UHFFFAOYSA-N 0.000 description 2
- 229910000387 ammonium dihydrogen phosphate Inorganic materials 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 235000015165 citric acid Nutrition 0.000 description 2
- 238000004255 ion exchange chromatography Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000001630 malic acid Substances 0.000 description 2
- 235000011090 malic acid Nutrition 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 235000019837 monoammonium phosphate Nutrition 0.000 description 2
- 229910000403 monosodium phosphate Inorganic materials 0.000 description 2
- 235000019799 monosodium phosphate Nutrition 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000004745 nonwoven fabric Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 description 2
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 241000221561 Ustilaginales Species 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- VBIXEXWLHSRNKB-UHFFFAOYSA-N ammonium oxalate Chemical compound [NH4+].[NH4+].[O-]C(=O)C([O-])=O VBIXEXWLHSRNKB-UHFFFAOYSA-N 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- HQWKKEIVHQXCPI-UHFFFAOYSA-L disodium;phthalate Chemical compound [Na+].[Na+].[O-]C(=O)C1=CC=CC=C1C([O-])=O HQWKKEIVHQXCPI-UHFFFAOYSA-L 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229940099690 malic acid Drugs 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- KYKNRZGSIGMXFH-ZVGUSBNCSA-M potassium bitartrate Chemical compound [K+].OC(=O)[C@H](O)[C@@H](O)C([O-])=O KYKNRZGSIGMXFH-ZVGUSBNCSA-M 0.000 description 1
- 239000001472 potassium tartrate Substances 0.000 description 1
- 229940111695 potassium tartrate Drugs 0.000 description 1
- 235000011005 potassium tartrates Nutrition 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000000176 sodium gluconate Substances 0.000 description 1
- 229940005574 sodium gluconate Drugs 0.000 description 1
- 235000012207 sodium gluconate Nutrition 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- YWYZEGXAUVWDED-UHFFFAOYSA-N triammonium citrate Chemical compound [NH4+].[NH4+].[NH4+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O YWYZEGXAUVWDED-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
- C23G1/19—Iron or steel
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F3/00—Brightening metals by chemical means
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
- C23G1/16—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions using inhibitors
- C23G1/18—Organic inhibitors
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F1/00—Electrolytic cleaning, degreasing, pickling or descaling
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Electrochemistry (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
Description
本発明は、真空処理装置を構成する金属製部品の表面を清浄化するための表面処理方法に関するものである。 The present invention relates to a surface treatment method for cleaning the surface of a metal part constituting a vacuum processing apparatus.
真空容器等の真空処理装置を構成するステンレス鋼部材は、溶接、機械加工等をして、真空容器の形状にした後、加工過程において付着した潤滑剤や手の脂分等を除去するために表面処理をするようにしている。
近年真空装置が大型化し、大型化した真空処理装置を構成する部材全体を一度に処理することが困難になってきたため、本出願人は、特願2004−219001において部分電解処理を提案した。
この部分電解処理であっても、処理のために使用した薬液を除去するために純水等による洗浄が必要である。部分電解処理の過程で表面にスマットと呼ばれる金属性の付着物(ステンレス鋼の場合は、Cr,Ni,Fe等の酸化物および塩が不均一に付着している)は、高圧ジェットを用いた純水洗浄をしても除去することは難しく、真空雰囲気下において、前記金属性付着物が空間に放出されたり、その後の成膜時に荷電粒子に叩かれて空間に放出されたりして、真空装置を汚染する可能性があるという問題があった。これらの金属性付着物を除去するためには、部分電解処理後に、取り扱う際の危険性の高い硝酸を使用し洗浄しなければならないという問題があった。
装置の表面処理方法として、上述の部分電解処理の他、従来から行われている電解研磨、化学研磨などがあるが、これらの方法いずれも、処理後には、金属表面に上述のスマットが付着する。スマットをそのまま付着させておくことは、部分電解処理のときと同様に空間中に放出され真空装置を汚染する可能性があるという問題があった。また、これらの金属性付着物を除去するためには、部分電解処理後に、取り扱う際の危険性の高い硝酸を使用し洗浄しなければならないという問題があった。
Stainless steel members that make up vacuum processing equipment such as vacuum vessels are welded, machined, etc. to form the shape of the vacuum vessel, and then remove the lubricant and hand grease etc. that have adhered during the processing process Surface treatment is done.
In recent years, the size of the vacuum apparatus has increased, and it has become difficult to process all the members constituting the large-sized vacuum processing apparatus at one time. Therefore, the present applicant has proposed partial electrolytic treatment in Japanese Patent Application No. 2004-21901.
Even in this partial electrolytic treatment, cleaning with pure water or the like is necessary to remove the chemical solution used for the treatment. A metal deposit called smut on the surface in the process of partial electrolysis treatment (in the case of stainless steel, oxides and salts of Cr, Ni, Fe, etc. are non-uniformly deposited) used a high-pressure jet. It is difficult to remove even by washing with pure water. In a vacuum atmosphere, the metallic deposits are released into the space, or are hit by charged particles during the subsequent film formation and released into the space. There was a problem that could contaminate the device. In order to remove these metallic deposits, there has been a problem that after partial electrolytic treatment, it is necessary to use nitric acid, which is highly dangerous when handled.
As the surface treatment method of the apparatus, there are the conventional electrolytic polishing and chemical polishing other than the above-mentioned partial electrolytic treatment. However, in any of these methods, the above-mentioned smut adheres to the metal surface after the treatment. . If the smut is adhered as it is, there is a problem that the vacuum device may be contaminated by being discharged into the space as in the case of the partial electrolytic treatment. Further, in order to remove these metallic deposits, there has been a problem that after partial electrolysis treatment, it is necessary to use nitric acid, which is highly dangerous when handled.
そこで、本発明は、上記従来の問題を解決するもので、真空容器等の真空処理装置を構成する部材の表面に付着した薬液や金属等の付着物を、危険性の高い硝酸等を使用せず、しかも、浸漬処理することなく除去することを目的とする。 Accordingly, the present invention solves the above-mentioned conventional problems, and uses highly dangerous nitric acid or the like for the deposits such as chemicals and metals adhering to the surface of the members constituting the vacuum processing apparatus such as a vacuum vessel. Furthermore, it aims at removing without carrying out immersion treatment.
上記課題を解決するために、本発明者等は鋭意検討の結果、硝酸の代わりにアルカリ系キレート液を使用することにより、上記課題を解決することができるという知見に基づき、下記の通り解決手段を見出した。
即ち、本発明の表面処理方法は、請求項1に記載の通り、真空処理装置を構成する金属製部品を被処理物とする表面処理方法であって、前記被処理物の表面を電解研磨、部分電解処理、化学研磨、酸洗又は電解酸洗した後に、0.5重量%以上3重量%未満の希アルカリ液に、濃度が0.5重量%以上10重量%未満となるようにカルボン酸又はカルボン酸塩を添加して得られたアルカリ系キレート液により、前記被処理物の表面を洗浄することを特徴とする。
また、請求項2に記載の表面処理方法は、請求項1に記載の表面処理方法において、前記アルカリ系キレート液の温度を、10〜80℃とすることを特徴とする。
In order to solve the above-mentioned problems, the present inventors have conducted intensive studies, and based on the knowledge that the above-mentioned problems can be solved by using an alkaline chelating solution instead of nitric acid, the following means for solving the problems I found.
That is, the surface treatment method of the present invention is a surface treatment method in which a metal part constituting a vacuum processing apparatus is an object to be processed as claimed in
Moreover, the surface treatment method according to
本発明の表面処理方法によれば、比較的簡素な構成で被処理物の表面を洗浄することができる。また、被処理物表面の金属等の付着物を、硝酸を使用しなくても除去することができるので危険性が少ない。更に、本発明により表面処理された部材により真空処理装置を構成すれば、真空雰囲気下において、放出されるガスを少なくすることができる。 According to the surface treatment method of the present invention, the surface of the workpiece can be cleaned with a relatively simple configuration. Moreover, since deposits such as metals on the surface of the object to be processed can be removed without using nitric acid, there is little danger. Furthermore, if the vacuum processing apparatus is constituted by the surface-treated member according to the present invention, the gas released can be reduced in a vacuum atmosphere.
本発明は、真空処理装置を構成する金属製部品を被処理物とする表面処理方法であって、前記被処理物の表面を電解研磨、部分電解処理、化学研磨、酸洗又は電解酸洗した後に、0.5重量%以上3重量%未満の希アルカリ液に、濃度が0.5重量%以上10重量%未満となるようにカルボン酸又はカルボン酸塩を添加して得られたアルカリ系キレート液により、前記被処理物の表面を洗浄することを特徴とするものである。
前記真空処理装置を構成する金属製部品は、真空処理環境下におかれる部品であれば特に制限するものではない。一例を挙げると、金属製容器等が挙げられる。尚、前記金属としては、ステンレス鋼、アルミニウム合金、チタン合金等が挙げられる。
前記処理媒体としては、前記電極間に電流を流すことができれば、材料や形状は限定されるものではないが、例えば、不織布を使用することができる。
The present invention is a surface treatment method using a metal part constituting a vacuum processing apparatus as an object to be processed, and the surface of the object to be processed is subjected to electrolytic polishing, partial electrolytic treatment, chemical polishing, pickling or electrolytic pickling. Later, an alkaline chelate obtained by adding a carboxylic acid or a carboxylate salt to a dilute alkali solution of 0.5 wt% or more and less than 3 wt% so that the concentration becomes 0.5 wt% or more and less than 10 wt% The surface of the object to be processed is washed with a liquid.
The metal parts constituting the vacuum processing apparatus are not particularly limited as long as they are parts placed in a vacuum processing environment. An example is a metal container. Examples of the metal include stainless steel, aluminum alloy, titanium alloy, and the like.
As the treatment medium, the material and the shape are not limited as long as a current can flow between the electrodes. For example, a nonwoven fabric can be used.
前記電解研磨、化学研磨、酸洗又は電解酸性は、公知のものであり、また、部分電解処理とは、被処理物を電源の陽極側に接続するとともに、陰極側に被処理物の表面に電解液を接触させるための処理媒体を接続し、電極間に、電解液を介して直流電流を流すことにより、被処理物の表面を電解研磨することをいうものとし、この処理により、被処理物の表面粗度(Rmax)を0.1μmとすることが更に好ましい。尚、具体例は、特願2004−219001に記載されている。
前記電解研磨又は部分電解処理に使用される電解液としては、無機酸、有機酸、無機酸塩及び有機酸塩のうちの少なくともいずれかを含むもので、具体的には、リン酸、硫酸、クエン酸アンモニウム、塩化アンモニウム、リン酸2水素アンモニウム、硫酸アンモニウム、硝酸ナトリウム、クエン酸等を挙げることができる。
また、部分電解処理に使用できる処理媒体としては、前記電極間に直流電流を流すことができれば、材料や形状は限定されるものではないが、例えば、不織布を使用することができる。
電解研磨又は部分電解処理における電解電流密度は、被処理物により異なるが、例えば、ステンレス鋼であれば、0.1〜0.5A/cm2である。
The electrolytic polishing, chemical polishing, pickling or electrolytic acidity are known, and the partial electrolytic treatment is to connect the workpiece to the anode side of the power source and to the cathode side on the surface of the workpiece. A treatment medium for contacting an electrolytic solution is connected, and a direct current is passed between the electrodes through the electrolytic solution to electrolytically polish the surface of the object to be treated. More preferably, the surface roughness (R max ) of the product is 0.1 μm. A specific example is described in Japanese Patent Application No. 2004-21901.
The electrolytic solution used for the electrolytic polishing or partial electrolytic treatment includes at least one of an inorganic acid, an organic acid, an inorganic acid salt, and an organic acid salt. Specifically, phosphoric acid, sulfuric acid, Ammonium citrate, ammonium chloride, ammonium dihydrogen phosphate, ammonium sulfate, sodium nitrate, citric acid and the like can be mentioned.
Moreover, as a processing medium which can be used for a partial electrolysis process, if a direct current can be sent between the said electrodes, a material and a shape will not be limited, For example, a nonwoven fabric can be used.
The electrolytic current density in the electrolytic polishing or the partial electrolytic treatment varies depending on the object to be treated, but is 0.1 to 0.5 A / cm 2 for stainless steel, for example.
アルカリ系キレート液としては、水酸化ナトリウム等の希アルカリ水溶液に、クエン酸、クエン酸ナトリウム、シュウ酸アンモニウム、フタル酸ナトリウム、酒石酸カリウム、グルコン酸ナトリウム、リンゴ酸等を添加した溶液等を挙げることができる。 Examples of the alkaline chelating solution include a solution obtained by adding citric acid, sodium citrate, ammonium oxalate, sodium phthalate, potassium tartrate, sodium gluconate, malic acid, etc. to a dilute alkaline aqueous solution such as sodium hydroxide. Can do.
前記アルカリ系キレート液は、10℃〜80℃とすることが好ましい。10℃未満では、反応速度が著しく低下し、80℃超えでは取扱性が悪く、また、アルカリ腐食のおそれがあるからである。 The alkaline chelating solution is preferably set to 10 ° C to 80 ° C. If the temperature is less than 10 ° C., the reaction rate is remarkably reduced, and if it exceeds 80 ° C., the handleability is poor and there is a risk of alkaline corrosion.
また、前記アルカリ系キレート液による処理は、布等の処理媒体に染み込ませて行うことが好ましい。被処理物が大型化しても局所的に表面処理をすることができるからである。 The treatment with the alkaline chelating solution is preferably carried out by soaking it in a treatment medium such as cloth. This is because the surface treatment can be locally performed even if the workpiece is enlarged.
SUS304(300mm×150mm×1mm)の被処理物にリン酸2水素ナトリウム、硝酸ナトリウムの中和塩により部分電解処理を施し、表面に生じた赤色及び青色のスマットについて、下記2種類のキレート液により次の処理を行った。
a)1重量%の水酸化ナトリウム溶液に、濃度が3重量%となるようにクエン酸ナトリウムを添加した溶液
b)1重量%の水酸化ナトリウム溶液に、濃度が3重量%となるようにリンゴ酸を添加した溶液
各キレート液を40〜50℃に加温し、洗浄布に含ませて被処理物の全面のワイピングを行った。ワイピング終了後、50℃に加温した純水により高圧ジェット洗浄を行い、電解研磨に使用した薬液及びアルカリ系キレート溶液の除去を行った。そして、仕上げとして気化させた液体窒素により乾燥した。
スマット除去の効果を確認するために、イオンクロマト分析を行った。詳細には、洗浄前後の被処理物を対象として、純水を染み込ませた洗浄布により全面をワイピングした後に、前記洗浄布に染み込んだ純水100mlを抽出し、単位面積当たりの各イオン量を算出した。
この結果を、aについては表1に、bについては表2に示す。
SUS304 (300 mm x 150 mm x 1 mm) to be treated was subjected to partial electrolytic treatment with sodium dihydrogen phosphate and sodium nitrate neutral salt, and red and blue smuts generated on the surface were treated with the following two chelating solutions. The following processing was performed.
a) A solution in which sodium citrate is added to a 1% by weight sodium hydroxide solution to a concentration of 3% by weight. b) An apple having a concentration of 3% by weight in a 1% by weight sodium hydroxide solution. Solution to which acid was added Each chelate solution was heated to 40 to 50 ° C. and included in a cleaning cloth to wipe the entire surface of the object to be treated. After completion of wiping, high-pressure jet cleaning was performed with pure water heated to 50 ° C., and the chemical solution and the alkaline chelate solution used for the electropolishing were removed. And it dried with the liquid nitrogen vaporized as finishing.
In order to confirm the effect of removing smut, ion chromatography analysis was performed. Specifically, for the object to be treated before and after cleaning, after wiping the entire surface with a cleaning cloth soaked with pure water, 100 ml of pure water soaked in the cleaning cloth is extracted, and the amount of each ion per unit area is extracted. Calculated.
The results are shown in Table 1 for a and in Table 2 for b.
上記表1及び表2から、スマット除去後は、除去前に比べて合金成分の付着塩となるアニオンとともに、Na+のカチオンも少なくなった。 From Table 1 and Table 2, after removal of the smut, the number of cations of Na + was reduced as well as the anion that became the adhering salt of the alloy component compared to before removal.
SUS304(300mm×150mm×1mm)の被処理物に、リン酸2水素ナトリウム、硝酸ナトリウムの中和塩により部分電解処理を施し、表面に生じた赤色及び青色のスマットについて、下記2種類のキレート液により次の処理を行った。
a)40℃に加温した1重量%の水酸化ナトリウム溶液に、濃度が3重量%となるようにクエン酸ナトリウムを添加した溶液
b)40℃に加温した1重量%の水酸化ナトリウム溶液に、濃度が3重量%となるようにリンゴ酸を添加した溶液
a、bのキレート液について、洗浄布に含ませて被処理物の全面のワイピングを行った。ワイピング終了後、スマット除去の効果を確認するために、使用した各洗浄布を100mlの純水に浸漬し、各キレート液への金属成分の溶出量を純水に抽出した。そして、分析対象となる金属をステンレス合金の成分であるFe,Cr,Niとして、原子吸光分析により測定した。
尚、検出されたステンレス鋼成分がスマット部分からであり、ステンレス鋼自体からではないことを示すために、30重量%の硝酸溶液によるスマット除去、水洗後、aにより処理し、このaによる処理において使用した洗浄布から抽出したサンプルを作成し、これをcとした。
この結果を、表3に示す。
SUS304 (300mm x 150mm x 1mm) to be treated is subjected to partial electrolytic treatment with sodium dihydrogen phosphate and sodium nitrate neutral salt, and the following two types of chelating solutions for red and blue smut generated on the surface The following processing was performed.
a) A solution in which sodium citrate is added to a 1% by weight sodium hydroxide solution heated to 40 ° C. to a concentration of 3% by weight b) A 1% by weight sodium hydroxide solution heated to 40 ° C. In addition, the chelate solution of solutions a and b to which malic acid was added so as to have a concentration of 3% by weight was included in a cleaning cloth, and the entire surface of the object to be treated was wiped. After the wiping was completed, in order to confirm the effect of removing smut, each used cleaning cloth was immersed in 100 ml of pure water, and the elution amount of the metal component in each chelate solution was extracted into pure water. And the metal used as an analysis object was measured by atomic absorption analysis as Fe, Cr, Ni which is a component of a stainless alloy.
In addition, in order to show that the detected stainless steel component is from the smut portion and not from the stainless steel itself, the smut is removed with a 30% by weight nitric acid solution, washed with water, and then treated with a. A sample extracted from the used cleaning cloth was prepared, and this was designated as c.
The results are shown in Table 3.
上記結果から、a,bを使用した洗浄布からは、Fe,Crが検出された。一方、cでは、Fe,Cr,Niのステンレス鋼を構成する元素は検出されなかった。
この結果から、a,bでは、被処理物自体に損傷を与えることなく、スマットが除去されることがわかった。
From the above results, Fe and Cr were detected from the cleaning cloth using a and b. On the other hand, in c, an element constituting Fe, Cr, Ni stainless steel was not detected.
From this result, it was found that the smut was removed in a and b without damaging the workpiece itself.
SUS304(300mm×150mm×1mm)の被処理物にリン酸2水素アンモニウム、硝酸ナトリウムの中和塩により部分電解処理を施し、1重量%の水酸化ナトリウム溶液に、濃度が3重量%となるようにクエン酸ナトリウムを添加して得られた溶液を洗浄布に染み込ませてワイピングしたものと、しないものとのガス放出特性を評価した。 A SUS304 (300 mm × 150 mm × 1 mm) workpiece is subjected to partial electrolytic treatment with a neutral salt of ammonium dihydrogen phosphate and sodium nitrate so that the concentration in a 1 wt% sodium hydroxide solution is 3 wt%. The gas release characteristics of a solution obtained by adding a sodium citrate solution to a cleaning cloth and wiping with a cleaning cloth were evaluated.
ガス放出特性は、昇温脱離法を用い、室温から500℃まで昇温する間に放出される単位面積当たりのガス放出速度の変化で評価した。
図1は、単位面積当たりのガス放出速度の変化を示す図であり、図中1は、キレート液による処理を行った試料のガス放出速度であり、図中2は、処理を行わなかった試料のガス放出速度である。
図1より、キレート液による処理を行った試料は、処理をしなかった試料に比べ、特に250℃以上の温度でのガス放出速度が少なくなった。この温度領域で放出されるガスの源がキレート液による処理によって除去された。
The gas release characteristics were evaluated by the change in the gas release rate per unit area released while the temperature was raised from room temperature to 500 ° C. using the temperature programmed desorption method.
FIG. 1 is a diagram showing a change in gas release rate per unit area, where 1 is a gas release rate of a sample treated with a chelate solution, and 2 in the figure is a sample not treated. The gas release rate.
From FIG. 1, the sample subjected to the treatment with the chelate solution had a lower gas release rate particularly at a temperature of 250 ° C. or higher than the sample not treated. The source of gas released in this temperature region was removed by treatment with a chelating solution.
SUS304(300mm×150mm×1mm)の被処理物に70%リン酸、30%硫酸溶液により電解研磨処理を施し、表面に生じたスマットについて、下記1種類のキレート液により次の処理を行った。
a)1%の水酸化ナトリウム溶液に、濃度が3%となるようにクエン酸ナトリウムを添加した溶液
上記キレート液を40℃〜50℃に加温し、清浄布に含ませて被処理物の全面のワイピングを行なった。ワイピング終了後、50℃に加温した純水を使用した高圧ジェット洗浄を行ない、電解研磨に使用した薬液及び、アルカリ系キレート溶液の除去を行なった。仕上げとして気化させた液体窒素により乾燥した。
スマット除去の効果を確認するために、イオンクロマト分析を行った。詳細には、洗浄前後の被処理物を対象として、純水を染み込ませた清浄布にて全面をワイピングした後に、前記清浄布に染み込んだ純水100ml抽出し、単位面積当たりの各イオンの量を算出した。結果を表に示す。
An SUS304 (300 mm × 150 mm × 1 mm) object to be processed was subjected to electrolytic polishing treatment with a 70% phosphoric acid and 30% sulfuric acid solution, and the smut generated on the surface was subjected to the following treatment with the following one type of chelating solution.
a) A solution in which sodium citrate is added to a 1% sodium hydroxide solution to a concentration of 3%. The chelate solution is heated to 40 ° C. to 50 ° C. and contained in a clean cloth. The entire surface was wiped. After completion of the wiping, high-pressure jet cleaning using pure water heated to 50 ° C. was performed to remove the chemical solution used for the electropolishing and the alkaline chelate solution. As a finish, it was dried with vaporized liquid nitrogen.
In order to confirm the effect of removing smut, ion chromatography analysis was performed. Specifically, for the object to be treated before and after cleaning, after wiping the entire surface with a clean cloth soaked with pure water, 100 ml of pure water soaked in the clean cloth is extracted, and the amount of each ion per unit area Was calculated. The results are shown in the table.
上記表から、スマット除去後は、除去前に比べて合金成分の付着塩となるアニオンとともに、Na+のカチオンがともに少なくなったことがわかる。 From the above table, it can be seen that after smut removal, both the cations of Na + were reduced together with the anion that became the adhering salt of the alloy component compared to before removal.
1 キレート液による処理を行った試料の単位面積当たりのガス放出速度
2 キレート液による処理をしなかった試料の単位面積当たりのガス放出速度
1 Gas release rate per unit area of sample treated with
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