JP2006317522A - Positive resist composition for electron beam and resist pattern forming method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a positive resist composition for an electron beam capable of forming a high-resolution resist pattern, and a resist pattern forming method. <P>SOLUTION: The positive resist composition for an electron beam contains a resin component (A) having an acid-dissociable dissolution inhibiting group and having alkali solubility increased by the action of an acid, and an acid forming agent component (B) which generates an acid upon irradiation with radiation, wherein the resin component (A) is a resin prepared by protecting part of all hydroxyl groups of an alkali-soluble novolac resin with an acid-dissociable dissolution inhibiting group, and the acid generator component (B) contains an oxime sulfonate-based acid forming agent (B1) and an onium salt-based acid forming agent (B2). <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to an electron beam positive resist composition and a resist pattern forming method.

In the manufacture of semiconductor elements, liquid crystal display elements, and the like, a fine processing technique based on a lithography technique is used, and in recent years, the miniaturization is rapidly progressing due to the advancement of the lithography technique.
As a technique for miniaturization, the wavelength of an exposure light source is generally shortened. Specifically, as described above, ultraviolet rays typified by g-line and i-line have been used in the past, but now KrF excimer laser (248 nm) is the center of mass production, and ArF excimer laser ( 193 nm) is beginning to be introduced in mass production. Research is also being conducted on lithography technology using an F ₂ excimer laser (157 nm), extreme ultraviolet light (EUV), electron beam (EB) or the like as a light source (radiation source).

Resist materials used in lithography techniques are required to have sensitivity to an exposure light source. In general, a base resin having a film forming ability is used as a resist material. Conventionally, g-line and i-line are the mainstream as exposure light sources.
With recent shortening of the wavelength of exposure light sources and miniaturization of required dimensions, resist materials are required to further improve sensitivity and resolution with respect to these light sources. A chemically amplified positive resist composition containing a resin in which a part of all hydroxyl groups of a soluble novolak resin is protected with an acid dissociable, dissolution inhibiting group and an oxime sulfonate acid generator has been proposed (for example, see Patent Document 1). ).
JP 2004-354609 A

In order to form a finer pattern using the positive resist composition, the present inventors attempted pattern formation using an electron beam. However, the resolution was insufficient.
This invention is made | formed in view of the said situation, Comprising: It aims at providing the positive resist composition and resist pattern formation method which can form a high-resolution resist pattern.

As a result of intensive studies, the present inventors have used the above-mentioned problem by using a novolak resin having an acid dissociable, dissolution inhibiting group as a resin component and using two specific acid generators as an acid generator component. The present invention has been completed.
That is, the first aspect of the present invention is a resin component (A) having an acid dissociable, dissolution inhibiting group, whose alkali solubility is increased by the action of an acid, and an acid generator component that generates an acid upon irradiation with radiation ( A positive resist composition for electron beam containing B),
The resin component (A) is a resin in which a part of all hydroxyl groups of the alkali-soluble novolak resin is protected with an acid dissociable, dissolution inhibiting group,
The acid generator component (B) contains an oxime sulfonate acid generator (B1) and an onium salt acid generator (B2), and is a positive resist composition for electron beams.
The second aspect of the present invention includes a step of forming a resist film on a substrate using the positive resist composition for electron beams of the first aspect, a step of selectively exposing the resist film, and The resist pattern forming method includes a step of forming a resist pattern by alkali developing the resist film.

  In the present invention, the exposure includes direct drawing of an electron beam or irradiation through a mask.

  ADVANTAGE OF THE INVENTION According to this invention, the positive resist composition for electron beams which can form a high-resolution resist pattern, and the resist pattern formation method can be provided.

<Positive resist composition>
The positive resist composition of the present invention comprises a resin component (A) whose alkali solubility is increased by the action of an acid (hereinafter sometimes referred to as (A) component) and an acid that generates an acid upon irradiation (exposure) of radiation. And a generator component (B) (hereinafter also referred to as component (B)).
In the component (A), when the acid generated from the component (B) by exposure acts, the entire component (A) changes from alkali-insoluble to alkali-soluble. Therefore, in the formation of the resist pattern, when the resist film made of the positive resist composition is selectively exposed or heated after exposure in addition to the exposure, the exposed portion turns into alkali-soluble while the unexposed portion becomes alkali-insoluble. Thus, a positive resist pattern can be formed by alkali development.

[(A) component]
In the positive resist composition of the present invention, the component (A) is a resin in which a part of all hydroxyl groups of the alkali-soluble novolak resin is protected with an acid dissociable, dissolution inhibiting group.
In the component (A), the alkali-soluble novolak resin (hereinafter referred to as novolak resin (a)) in which the hydroxyl group is not protected at all by the acid dissociable, dissolution inhibiting group is not particularly limited, It can be arbitrarily selected from those that have been proposed as those that can be normally used as a film-forming substance in a positive resist composition. Preferably, an aromatic hydroxy compound and an aldehyde and / or a ketone are subjected to a condensation reaction. The novolak resin obtained by making it can be mentioned.

  Examples of the aromatic hydroxy compound used for the synthesis of the novolak resin (a) include phenol; cresols such as m-cresol, p-cresol, and o-cresol; 2,3-xylenol, 2,5-xylenol, 3, Xylenols such as 5-xylenol and 3,4-xylenol; m-ethylphenol, p-ethylphenol, o-ethylphenol, 2,3,5-trimethylphenol, 2,3,5-triethylphenol, 4-tert Alkylphenols such as butylphenol, 3-tert-butylphenol, 2-tert-butylphenol, 2-tert-butyl-4-methylphenol, 2-tert-butyl-5-methylphenol; p-methoxyphenol, m-methoxyphenol P-Ethoxypheno , Alkoxyphenols such as m-ethoxyphenol, p-propoxyphenol, m-propoxyphenol; o-isopropenylphenol, p-isopropenylphenol, 2-methyl-4-isopropenylphenol, 2-ethyl-4- Examples include isopropenylphenols such as isopropenylphenol; arylphenols such as phenylphenol; polyhydroxyphenols such as 4,4′-dihydroxybiphenyl, bisphenol A, resorcinol, hydroquinone, and pyrogallol. These may be used alone or in combination of two or more.

Examples of aldehydes used in the synthesis of the novolak resin (a) include formaldehyde, paraformaldehyde, trioxane, acetaldehyde, propionaldehyde, butyraldehyde, trimethylacetaldehyde, acrolein, crotonaldehyde, cyclohexanealdehyde, furfural, furylacrolein, benzaldehyde, terephthale Aldehyde, phenylacetaldehyde, α-phenylpropylaldehyde, β-phenylpropylaldehyde, o-hydroxybenzaldehyde, m-hydroxybenzaldehyde, p-hydroxybenzaldehyde, o-methylbenzaldehyde, m-methylbenzaldehyde, p-methylbenzaldehyde, o-chloro Benzaldehyde, m-chlorobenzaldehyde, p -Chlorobenzaldehyde, cinnamic aldehyde and the like. These may be used alone or in combination of two or more.
Among these aldehydes, it is preferable to use formaldehyde because of its availability. In particular, since heat resistance is good, it is preferable to use formaldehyde in combination with hydroxybenzaldehydes such as o-hydroxybenzaldehyde, m-hydroxybenzaldehyde, and p-hydroxybenzaldehyde.

Examples of the ketones used for the synthesis of the novolak resin (a) include acetone, methyl ethyl ketone, diethyl ketone, and diphenyl ketone. These may be used alone or in combination of two or more.
Furthermore, the above aldehydes and ketones may be used in appropriate combination.

  The novolak resin (a) can be produced by subjecting the aromatic hydroxy compound and aldehydes and / or ketones to a condensation reaction by a known method in the presence of an acidic catalyst. In this case, hydrochloric acid, sulfuric acid, formic acid, oxalic acid, paratoluenesulfonic acid, etc. can be used as the acidic catalyst.

  The weight average molecular weight (Mw) of the novolak resin (a) (polystyrene conversion by gel permeation chromatography (GPC)), that is, the Mw of the component (A) before being protected with the acid dissociable dissolution inhibiting group is 2000 to 50000. It is preferable that it is in the range of 3000-20000, 3000-20000 is more preferable, and 4000-15000 is further more preferable. When the Mw is 2000 or more, the applicability when the positive resist composition is dissolved in an organic solvent and applied onto the substrate is good, and when it is 50000 or less, the resolution is good.

In the present invention, the novolak resin (a) is preferably subjected to a treatment for separating and removing the low molecular weight substance before protecting the hydroxyl group with an acid dissociable, dissolution inhibiting group. Thereby, heat resistance improves further.
Here, the low molecular weight substance in the present specification includes, for example, a residual monomer left unreacted among monomers such as aromatic hydroxy compounds, aldehydes, and ketones used for the synthesis of the novolak resin (a), A dimer in which two molecules of monomers are bonded, a trimer in which three molecules are bonded, and the like (monomers and 2-3 nuclei) are included.
The low molecular weight fractionation method is not particularly limited. For example, a method of purifying using an ion exchange resin or a known method using a good solvent (such as alcohol) and a poor solvent (such as water) of the resin. A fractionation operation can be used. According to the former method, the acid component and the metal component can be removed together with the low molecular weight substance.
The yield in such a low molecular weight fraction removal treatment is desirably in the range of 50 to 95% by mass. When it is 50% by mass or more, the solubility in an aqueous alkali solution is sufficiently increased by the action of an acid generated from the component (B) described later. Therefore, the difference in dissolution rate between the exposed part and the unexposed part becomes large, and the resolution is good. Moreover, the effect by performing a separation removal is fully acquired as it is 95 mass% or less.
Further, the content of the low molecular weight substance having Mw of 500 or less is 15% or less, preferably 12% or less on the GPC chart. By setting it to 15% or less, the effect of improving the heat resistance of the resist pattern is exhibited, and at the same time, the effect of suppressing the amount of sublimate generated during the heat treatment is exhibited.

  The component (A) is a resin in which a part of all hydroxyl groups of the novolak resin (a) is protected with an acid dissociable, dissolution inhibiting group. The component (A) is hardly soluble or insoluble in alkali because a part of all hydroxyl groups of the novolak resin (a) is protected with an acid dissociable, dissolution inhibiting group, and is acid dissociable by the action of an acid. When the dissolution inhibiting group is dissociated, it changes to alkali-soluble.

  The acid dissociable, dissolution inhibiting group in component (A) may be any group that can be dissociated by an acid generated from component (B), which will be described later. For example, 1-ethoxymethyl group, 1-ethoxyethyl group, 1-propoxy Linear or branched alkoxyalkyl groups such as a methyl group, 1-propoxyethyl group, 1-n-butoxymethyl group, 1-iso-butoxymethyl group, 1-tert-butoxymethyl group; tetrahydrofuranyl group, Cyclic acetal group such as tetrahydropyranyl group; alkoxycarbonylalkyl group such as tert-butoxycarbonyl group, tert-butoxycarbonylmethyl group, tert-butoxycarbonylethyl group; trimethylsilyl group, triethylsilyl group, triphenylsilyl group, etc. An alkylsilyl group is mentioned.

  The component (A) can be obtained by subjecting the novolak resin (a) and a compound corresponding to the acid dissociable, dissolution inhibiting group to an addition reaction.

  In the present invention, since the effect of the present invention is particularly excellent, the component (A) is a novolak resin (a) and a compound represented by the following general formula (I) (hereinafter referred to as compound (I). It is preferable that it is a reaction product.

［式中、Ｒ^１は、置換基を有していてもよく、主鎖にエーテル結合を含んでいてもよい炭素原子数１〜１０のアルキレン基、または下記一般式（ＩＩ）で表される基を表す。］

[Wherein, R ¹ may have a substituent and may be an alkylene group having 1 to 10 carbon atoms which may contain an ether bond in the main chain, or the following general formula (II): Represents a group. ]

［式中、Ｒ^４は、置換基を有していてもよい炭素原子数１〜１０のアルキレン基を表し、ｍは０または１を表す。］

[Wherein, R ⁴ represents an alkylene group having 1 to 10 carbon atoms which may have a substituent, and m represents 0 or 1. ]

In the general formula (I), R ¹ may have a substituent, and a branched or linear alkylene group having 1 to 10 carbon atoms which may contain an ether bond in the main chain. Or represented by the general formula (II).
Examples of the substituent that the alkylene group represented by R ¹ may have include a methyl group and an ethyl group.
In addition, the alkylene group may include an ether bond (—O—) in the main chain.
In the general formula (II), each R ⁴ is independently a branched or straight chain alkylene group having 1 to 10 carbon atoms which may have a substituent. Examples are the same as the alkylene group for R ¹ .
R ⁴ is particularly preferably a methylene group.

In the present invention, R ¹ is represented by —C ₄ H ₈ —, —C ₂ H ₄ OC ₂ H ₄ —, —C ₂ H ₄ OC ₂ H ₄ OC ₂ H ₄ — or the general formula (II). Are preferred. Of these, a group represented by formula (II) is preferable. Particularly preferred is a group wherein R ⁴ is a methylene group and m is 1.

When the novolak resin (a) is reacted with the compound (I), at least one of the two vinyl groups at the terminal of the compound (I) is a hydroxyl group of the novolak resin (a), for example, a phenolic hydroxyl group in the side chain. To form a reaction product.
In such a reaction product, one of the two vinyl groups at the end of compound (I) is bonded to the hydroxyl group in novolak resin (a), and the terminal of compound (I) is terminated. There is at least one of structural units formed by bonding both vinyl groups to the hydroxyl group in the novolak resin (a).
Here, a structural unit means the monomer unit which comprises resin (polymer).

Specifically, when one of the two vinyl groups at the end of the compound (I) is bonded to one phenolic hydroxyl group of the side chain in the novolak resin (a), for example, the following formula (1A) The structural unit (1A) represented by Further, when both of the two vinyl groups at the end of the compound (I) are bonded to two phenolic hydroxyl groups in the side chain in the novolak resin (a), an intermolecular bridge is formed. The structural unit (1B) represented by 1B) is formed.
In general, there are both a structural unit in which only one terminal of compound (I) is bound (for example, structural unit (1A)) and a structural unit in which both are bound (for example, structural unit (1B)). A product is obtained.

In the above formula, R ¹ is the same as R ¹ in the formula (I).
R ² represents a substituent bonded to the benzene ring when the aromatic hydroxy compound described in the description of the novolak resin is an aromatic hydroxy compound having a benzene ring as an aromatic ring, and n is The number of the substituent is shown.
R ³ is a group derived from aldehydes and / or ketones described in the description regarding the novolak resin.

As described above, one or both of the two vinyl groups at the end of the compound (I) react with the hydroxyl group of the novolak resin (a), for example, the phenolic hydroxyl group of the side chain, and the vinyl group doubles. A monovalent or divalent group formed by cleaving the bond functions as an acid dissociable, dissolution inhibiting group. That is, the reaction product is less soluble in an alkaline aqueous solution than the novolak resin (a) because the compound (I) is bonded to the hydroxyl group of the novolak resin (a). Further, when a positive resist composition containing the reaction product is applied on a substrate and then heated, an unprotected hydroxyl group in the reaction product and a terminal vinyl group of the structural unit (1A) are obtained. The reaction proceeds to form a cross-linked structure, whereby the solubility in an alkaline aqueous solution is further reduced, and it becomes hardly soluble in an alkaline aqueous solution such as an alkaline developer used in forming a resist pattern. When an acid is generated from the component (B) by exposure, the acid acts on the crosslinked structure, and an oxygen atom derived from a hydroxyl group of the novolak resin (a) and a vinyl compound (I) bonded to the oxygen atom. The bond between the carbon atom derived from the group is broken and the solubility of the positive resist composition in an alkaline aqueous solution is increased.
Further, such a crosslinked structure is more easily dissociated than, for example, the acid dissociable, dissolution inhibiting group as described above, and as a component (B), compared to an onium salt-based acid generator that is considered to have a strong acid strength. Even when an oxime sulfonate acid generator having a weak acid strength is used, the dissociation reaction tends to proceed. Therefore, the dissolution contrast between the exposed part and the unexposed part is large, and a pattern with high resolution can be formed.
Further, the formation of the above-described crosslinked structure increases the molecular weight of the component (A), for example, about 2 to 20 times that when there is no crosslinking. Therefore, the heat resistance is further improved, and even when the formed resist pattern is heated at a temperature of 130 ° C. or higher, for example, the shape is maintained without causing deformation such as thermal sagging. Therefore, it can be suitably used for the production of MEMS.

The reaction between the novolak resin (a) and the compound (I) can be performed by a conventional method, for example, by heating them in a solvent to promote the reaction.
1-15 mass parts is preferable with respect to 100 mass parts of novolak resin (a), and, as for the usage-amount of compound (I), 4-8 mass parts is more preferable. When the amount is 1 part by mass or more, the film loss of the resist pattern unexposed part is small and the contrast of the resist pattern tends to increase. When the amount is 15 parts by mass or less, the solubility in the developer (alkaline aqueous solution) is good. There are advantages such as excellent sensitivity and easy pattern resolution.
In the reaction between the novolak resin (a) and the compound (I), since the reaction proceeds without using an acid catalyst, it is not essential to use an acid catalyst. Rather, an acid component such as an acid catalyst is reacted. The presence in the system is not preferable in terms of storage stability after the resist preparation. The acid component is, for example, an acid catalyst used in the synthesis of the novolak resin (a) or an organic acid such as a free acid present in the reaction solvent, and can be analyzed by gas chromatography or the like.
Examples of the method for removing the acid component include known methods. For example, methods such as the use of an ion exchange resin, washing with pure water, and neutralization with an alkali can be applied.
Before the reaction with the compound (I), the concentration of the acid component in the novolak resin (a) is preferably 0.1 ppm or less, particularly 0.01 ppm or less.

In the component (A), the ratio of the hydroxyl groups protected by the acid dissociable, dissolution inhibiting group (protection rate), that is, the total number of hydroxyl groups of the novolak resin (a) used as the precursor of the component (A), The ratio (%) of the number of hydroxyl groups protected by the acid dissociable, dissolution inhibiting group in component (A) is preferably in the range of 1 to 30%, more preferably 3 to 20%, 10% is most preferred.
The protection rate of the component (A) can be measured, for example, by proton NMR.

In the present invention, the component (A) is preferably subjected to a treatment for separating and removing the low molecular weight substance after protecting the hydroxyl group with an acid dissociable, dissolution inhibiting group. Thereby, heat resistance improves further.
The low molecular weight fractionation method, the yield in the low molecular weight fraction removal treatment, the content of low molecular weight Mw of 500 or less, and the like are the same as described in the description of the novolak resin (a). .

(A) It is preferable that the mass mean molecular weight (Mw) of a component exists in the range of 2000-100000. When the Mw is 2000 or more, the heat resistance is good. Also, the coating property when the positive resist composition is dissolved in an organic solvent and coated on a substrate is good. On the other hand, when Mw is 100,000 or less, the resolution is good.
When the component (A) is not a reaction product of the novolak resin (a) and the compound (I), the mass average molecular weight (Mw) of the component (A) is 3000 in consideration of resolution and heat resistance. ~ 20000 is more preferable, and 4000-15000 is more preferable.
When the component (A) is a reaction product of the novolak resin (a) and the compound (I), the mass average molecular weight (Mw) of the reaction product is preferably 10,000 to 100,000, particularly 20000 to 60,000. preferable. When the Mw is 10,000 or more, the effect of improving the heat resistance of the resist pattern is further improved.

[Component (B)]
The positive resist composition of the present invention comprises, as component (B), an oxime sulfonate acid generator (B1) (hereinafter sometimes referred to as (B1) component) and an onium salt acid generator (B2) (hereinafter referred to as “B”). And (B2) component). With this component (B), a high-resolution resist pattern can be formed.

-Component (B1) The component (B1) can be arbitrarily selected from oxime sulfonate acid generators that have been proposed as acid generators for chemically amplified resists.

  Here, the oxime sulfonate acid generator is a compound having at least one group represented by the following general formula (B-1) or a compound represented by the following general formula (III) or (IV) (USP 6004724)) and has the property of generating an acid upon irradiation with radiation.

（式（Ｂ−１）中、Ｒ^２１、Ｒ^２２はそれぞれ独立に有機基を表す。）

(In formula (B-1), R ²¹ and R ²² each independently represents an organic group.)

The organic group of R ²¹ and R ^{22 is} a group containing a carbon atom, and an atom other than a carbon atom (for example, a hydrogen atom, an oxygen atom, a nitrogen atom, a sulfur atom, a halogen atom (fluorine atom, chlorine atom, etc.)) You may have.
The organic group for R ²¹ is preferably a linear, branched or cyclic alkyl group or aryl group. These alkyl groups and aryl groups may have a substituent. There is no restriction | limiting in particular as this substituent, For example, a fluorine atom, a C1-C6 linear, branched or cyclic alkyl group etc. are mentioned. Here, “having a substituent” means that part or all of the hydrogen atoms of the alkyl group or aryl group are substituted with a substituent.
As an alkyl group, C1-C20 is preferable, C1-C10 is more preferable, C1-C8 is more preferable, C1-C6 is especially preferable, and C1-C4 is the most preferable. As the alkyl group, a partially or completely halogenated alkyl group (hereinafter sometimes referred to as a halogenated alkyl group) is particularly preferable. The partially halogenated alkyl group means an alkyl group in which a part of hydrogen atoms is substituted with a halogen atom, and the fully halogenated alkyl group means that all of the hydrogen atoms are halogen atoms. Means an alkyl group substituted with Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom, and a fluorine atom is particularly preferable. That is, the halogenated alkyl group is preferably a fluorinated alkyl group.
The aryl group preferably has 4 to 20 carbon atoms, more preferably 4 to 10 carbon atoms, and most preferably 6 to 10 carbon atoms. As the aryl group, a partially or completely halogenated aryl group is particularly preferable. The partially halogenated aryl group means an aryl group in which a part of hydrogen atoms is substituted with a halogen atom, and the fully halogenated aryl group means that all of the hydrogen atoms are halogen atoms. Means an aryl group substituted with.
R ²¹ is particularly preferably an alkyl group having 1 to 4 carbon atoms having no substituent or a fluorinated alkyl group having 1 to 4 carbon atoms.

As the organic group for R ²² , a linear, branched, or cyclic alkyl group, aryl group, or cyano group is preferable. As the alkyl group and aryl group for R ^22, the same alkyl groups and aryl groups as those described above for R ²¹ can be used.
R ²² is particularly preferably a cyano group, an alkyl group having 1 to 8 carbon atoms having no substituent, or a fluorinated alkyl group having 1 to 8 carbon atoms.

  As the oxime sulfonate acid generator, a compound represented by the following general formula (III) or (IV) (see USP 6004724) is preferably used because of its high acid generation efficiency with respect to electron beam irradiation.

［式（ＩＩＩ）中、ｍ’は０又は１；Ｘは１又は２；Ｒ_１は、１又はそれ以上のＣ_１−Ｃ_１２アルキル基が置換していてもよいフェニル基、ヘテロアリール基、又は、ｍ’が０の場合はさらにＣ_２−Ｃ_６アルコキシカルボニル基、フェノキシカルボニル基、ＣＮ（シアノ基）；Ｒ_２はＲ_１と同義；Ｒ_３’は、Ｘ＝１のときＣ_１−Ｃ_１８アルキル基、Ｘ＝２のときＣ_２−Ｃ_１２アルキレン基、フェニレン基；Ｒ_４，Ｒ_５は独立に水素原子、ハロゲン原子、Ｃ_１−Ｃ_６アルキル基；Ａは−Ｓ−、−Ｏ−、−Ｎ（Ｒ_６）−を示す。］

[In the formula (III), m ′ is 0 or 1; X is 1 or 2; R ₁ is a phenyl group, a heteroaryl group, which may be substituted by one or more C ₁ -C ₁₂ alkyl groups, Or when m ′ is 0, C ₂ -C ₆ alkoxycarbonyl group, phenoxycarbonyl group, CN (cyano group); R ₂ is synonymous with R ₁ ; R ₃ ′ is C _1- when X = 1 C ₁₈ alkyl group, when X = 2, C ₂ -C ₁₂ alkylene group, phenylene group; R ₄ and R ₅ are independently hydrogen atom, halogen atom, C ₁ -C ₆ alkyl group; A is —S—, — _{O -, - N (R 6} ) - indicates a. ]

［式（ＩＶ）中、Ｒ_１’はＣ_２−Ｃ_１２アルキレン基；Ｒ_２、Ｒ_４、Ｒ_５、Ａは上記と同義；Ｒ_３はＣ_１−Ｃ_１８アルキル基を示す。］

[In formula (IV), R ₁ ′ is a C ₂ -C ₁₂ alkylene group; R ₂ , R ₄ , R ₅ , A are as defined above; R ₃ is a C ₁ -C ₁₈ alkyl group. ]

  As such a compound, a thiolene-containing oxime sulfonate represented by the following formula (V) is particularly preferable.

  In addition to these, the component (B1) includes a triazine compound (VI) represented by the following formula (VI) [bis (trichloromethyl) triazine], the triazine compound (VI) and the following formula (VII). A triazine compound (VII) represented by [bis (trichloromethyl) triazine] in combination as desired (see JP-A-6-289614 and JP-A-7-34412), the following formula (VIII) And a compound represented by the following formula (IX).

（式中、Ｒ^６、Ｒ^７は、それぞれ炭素数１〜３のアルキル基を示す。）

(In formula, R < ⁶ >, R < ⁷ > shows a C1-C3 alkyl group, respectively.)

（式中、Ｚは、４−アルコキシフェニル基等を示す。）

(In the formula, Z represents a 4-alkoxyphenyl group or the like.)

（式中、Ａｒは置換又は未置換のフェニル基またはナフチル基；Ｒは炭素原子数１〜９のアルキル基；ｎは２又は３の整数を示す。）

(In the formula, Ar represents a substituted or unsubstituted phenyl group or naphthyl group; R represents an alkyl group having 1 to 9 carbon atoms; and n represents an integer of 2 or 3.)

  Specific examples of the triazine compound (VI) include 2- [2- (3,4-dimethoxyphenyl) ethenyl] -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- [ 2- (3-methoxy-4-ethoxyphenyl) ethenyl] -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- [2- (3-methoxy-4-propoxyphenyl) ethenyl] -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- [2- (3-ethoxy-4-methoxyphenyl) ethenyl] -4,6-bis (trichloromethyl) -1,3 , 5-triazine, 2- [2- (3,4-diethoxyphenyl) ethenyl] -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- [2- (3-ethoxy- 4-propoxy Enyl) ethenyl] -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- [2- (3-propoxy-4-methoxyphenyl) ethenyl] -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- [2- (3-propoxy-4-ethoxyphenyl) ethenyl] -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- [2- (3,4-dipropoxyphenyl) ethenyl] -4,6-bis (trichloromethyl)-, 3,5-triazine and the like. These triazine compounds may be used alone or in combination of two or more.

  Examples of the triazine compound (VII) used in combination with the triazine compound (VI) as desired include 2- (4-methoxyphenyl) -4,6-bis (trichloromethyl) -1,3,5- Triazine, 2- (4-ethoxyphenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4-propoxyphenyl) -4,6-bis (trichloromethyl) -1, 3,5-triazine, 2- (4-butoxyphenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4-methoxynaphthyl) -4,6-bis (trichloromethyl) ) -1,3,5-triazine, 2- (4-ethoxynaphthyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4-propoxynaphthyl) ) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4-butoxynaphthyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- ( 4-methoxy-6-carboxynaphthyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4-methoxy-6-hydroxynaphthyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- [2- (2-furyl) ethenyl] -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- [2- (5-methyl-) 2-furyl) ethenyl] -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- [2- (5-ethyl-2-furyl) ethenyl] -4,6-bis (trichloromethyl) ) -1,3,5-triazine, -[2- (5-propyl-2-furyl) ethenyl] -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- [2- (3,5-dimethoxyphenyl) ethenyl]- 4,6-bis (trichloromethyl) -1,3,5-triazine, 2- [2- (3-methoxy-5-ethoxyphenyl) ethenyl] -4,6-bis (trichloromethyl) -1,3 5-triazine, 2- [2- (3-methoxy-5-propoxyphenyl) ethenyl] -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- [2- (3-ethoxy- 5-methoxyphenyl) ethenyl] -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- [2- (3,5-diethoxyphenyl) ethenyl] -4,6-bis (trichloro Methyl) -1,3,3 5-triazine, 2- [2- (3-ethoxy-5-propoxyphenyl) ethenyl] -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- [2- (3-propoxy- 5-methoxyphenyl) ethenyl] -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- [2- (3-propoxy-5-ethoxyphenyl) ethenyl] -4,6-bis ( Trichloromethyl) -1,3,5-triazine, 2-2 (3,5-dipropoxyphenyl) ethenyl] -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (3 , 4-methylenedioxyphenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- [2- (3,4-methylenedioxyphenyl) ethenyl] -4,6-bis (Trichrome Methyl) -1,3,5-triazine. These triazine compounds may be used alone or in combination of two or more.

  These compounds may be used alone or in combination of two or more. Among the compounds exemplified above, in particular, the compound represented by the formula (V) and the compound represented by the formula (IX) are preferably used because of excellent acid generation efficiency with respect to an electron beam.

-Component (B2) Component (B2) is not particularly limited, and any of onium salt acid generators such as iodonium salts and sulfonium salts that have been proposed as acid generators for chemically amplified resists. You can choose to use.
Examples of the onium salt acid generator include compounds represented by the following general formula (b-1) or (b-2).

［式中、Ｒ^１”〜Ｒ^３”，Ｒ^５”〜Ｒ^６”は、それぞれ独立に、アリール基またはアルキル基を表し；Ｒ^４”は、直鎖、分岐または環状のアルキル基またはフッ素化アルキル基を表し；Ｒ^１”〜Ｒ^３”のうち少なくとも１つはアリール基を表し、Ｒ^５”〜Ｒ^６”のうち少なくとも１つはアリール基を表す。］

[Wherein R ¹ ″ to R ³ ″ and R ⁵ ″ to R ⁶ ″ each independently represents an aryl group or an alkyl group; R ⁴ ″ represents a linear, branched or cyclic alkyl group or fluorinated group. Represents an alkyl group; at least one of R ¹ ″ to R ³ ″ represents an aryl group, and at least one of R ⁵ ″ to R ⁶ ″ represents an aryl group.]

In formula (b-1), R ¹ ″ to R ³ ″ each independently represents an aryl group or an alkyl group. At least one of R ¹ ″ to R ³ ″ represents an aryl group. Of R ¹ ″ to R ³ ″, two or more are preferably aryl groups, and most preferably all R ¹ ″ to R ³ ″ are aryl groups.
The aryl group for R ¹ ″ to R ³ ″ is not particularly limited, and is, for example, an aryl group having 6 to 20 carbon atoms, in which part or all of the hydrogen atoms are alkyl groups, alkoxy groups It may or may not be substituted with a group, a halogen atom or the like. The aryl group is preferably an aryl group having 6 to 10 carbon atoms because it can be synthesized at a low cost. Specific examples include a phenyl group and a naphthyl group.
The alkyl group that may be substituted for the hydrogen atom of the aryl group is preferably an alkyl group having 1 to 5 carbon atoms, and is a methyl group, an ethyl group, a propyl group, an n-butyl group, or a tert-butyl group. Is most preferred.
The alkoxy group that may be substituted for the hydrogen atom of the aryl group is preferably an alkoxy group having 1 to 5 carbon atoms, and most preferably a methoxy group or an ethoxy group.
The halogen atom that may be substituted for the hydrogen atom of the aryl group is preferably a fluorine atom.
The alkyl group for R 1 ^{"~R 3",} is not particularly limited, for example, a straight, include alkyl groups such as branched or cyclic. It is preferable that it is C1-C5 from the point which is excellent in resolution. Specific examples include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, an n-pentyl group, a cyclopentyl group, a hexyl group, a cyclohexyl group, a nonyl group, and a decanyl group. A methyl group is preferable because it is excellent in resolution and can be synthesized at low cost.
Among these, it is most preferable that all of R ¹ ″ to R ³ ″ are phenyl groups.

R ⁴ ″ represents a linear, branched or cyclic alkyl group or a fluorinated alkyl group.
The linear alkyl group preferably has 1 to 10 carbon atoms, more preferably 1 to 8 carbon atoms, and most preferably 1 to 4 carbon atoms.
The cyclic alkyl group is a cyclic group as indicated by R ¹ ″ and preferably has 4 to 15 carbon atoms, more preferably 4 to 10 carbon atoms, and more preferably 6 carbon atoms. Most preferably, it is -10.
The fluorinated alkyl group preferably has 1 to 10 carbon atoms, more preferably 1 to 8 carbon atoms, and most preferably 1 to 4 carbon atoms. Also. The fluorination rate of the fluorinated alkyl group (ratio of fluorine atoms in the alkyl group) is preferably 10 to 100%, more preferably 50 to 100%, and particularly those in which all hydrogen atoms are substituted with fluorine atoms. Since the strength of the acid is increased, it is preferable.
R ⁴ ″ is most preferably a linear or cyclic alkyl group or a fluorinated alkyl group.

In formula (b-2), R ⁵ ″ to R ⁶ ″ each independently represents an aryl group or an alkyl group. At least one of R ⁵ ″ to R ⁶ ″ represents an aryl group. Of R ⁵ ″ to R ⁶ ″, two or more are preferably aryl groups, and most preferably R ⁵ ″ to R ⁶ ″ are all aryl groups.
As the aryl group for R ⁵ ″ to R ⁶ ″, the same as the aryl groups for R ¹ ″ to R ³ ″ can be used.
Examples of the alkyl group for R ⁵ ″ to R ⁶ ″ include the same as the alkyl group for R ¹ ″ to R ³ ″.
Among these, it is most preferable that all of R ⁵ ″ to R ⁶ ″ are phenyl groups.
"As ^{R 4} in the formula (b-1)" ^{R 4} in the In the formula (b-2) include the same as.

  Specific examples of the onium salt-based acid generator include diphenyliodonium trifluoromethanesulfonate or nonafluorobutanesulfonate, bis (4-tert-butylphenyl) iodonium trifluoromethanesulfonate or nonafluorobutanesulfonate, and triphenylsulfonium trifluoromethane. Sulfonate, its heptafluoropropane sulfonate or its nonafluorobutane sulfonate, tri (4-methylphenyl) sulfonium trifluoromethane sulfonate, its heptafluoropropane sulfonate or its nonafluorobutane sulfonate, dimethyl (4-hydroxynaphthyl) sulfonium trifluoromethane Sulfonate, its heptafluoropropane sulphonate or its Nafluorobutane sulfonate, trifluoromethane sulfonate of monophenyldimethylsulfonium, heptafluoropropane sulfonate or nonafluorobutane sulfonate thereof, trifluoromethane sulfonate of diphenyl monomethylsulfonium, heptafluoropropane sulfonate or nonafluorobutane sulfonate thereof, (4- Trifluoromethanesulfonate of methylphenyl) diphenylsulfonium, its heptafluoropropanesulfonate or its nonafluorobutanesulfonate, trifluoromethanesulfonate of (4-methoxyphenyl) diphenylsulfonium, its heptafluoropropanesulfonate or its nonafluorobutanesulfonate, tri (4 -Tert-bu E) phenylsulfonium trifluoromethanesulfonate, heptafluoropropanesulfonate or nonafluorobutanesulfonate, diphenyl (1- (4-methoxy) naphthyl) sulfonium trifluoromethanesulfonate, heptafluoropropanesulfonate or nonafluorobutanesulfonate Is mentioned. In addition, onium salts in which the anion portion of these onium salts is replaced with methanesulfonate, n-propanesulfonate, n-butanesulfonate, or n-octanesulfonate can also be used.

  Moreover, what replaced the anion part by the anion part represented by the following general formula (b-3) or (b-4) in the said general formula (b-1) or (b-2) can also be used. (The cation moiety is the same as (b-1) or (b-2)).

［式中、Ｘ”は、少なくとも１つの水素原子がフッ素原子で置換された炭素数２〜６のアルキレン基を表し；Ｙ”、Ｚ”は、それぞれ独立に、少なくとも１つの水素原子がフッ素原子で置換された炭素数１〜１０のアルキル基を表す。］

[Wherein X ″ represents an alkylene group having 2 to 6 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; Y ″ and Z ″ each independently represent at least one hydrogen atom as a fluorine atom; Represents an alkyl group having 1 to 10 carbon atoms and substituted with

X ″ is a linear or branched alkylene group in which at least one hydrogen atom is substituted with a fluorine atom, and the alkylene group has 2 to 6 carbon atoms, preferably 3 to 5 carbon atoms, Preferably it is C3.
Y ″ and Z ″ are each independently a linear or branched alkyl group in which at least one hydrogen atom is substituted with a fluorine atom, and the alkyl group has 1 to 10 carbon atoms, preferably It is C1-C7, More preferably, it is C1-C3.
The carbon number of the alkylene group of X ″ or the carbon number of the alkyl group of Y ″ and Z ″ is preferably as small as possible because the solubility in the resist solvent is good within the above carbon number range.
In addition, in the alkylene group of X ″ or the alkyl group of Y ″ and Z ″, as the number of hydrogen atoms substituted with fluorine atoms increases, the strength of the acid increases, and high-energy light or electron beam of 200 nm or less The ratio of fluorine atoms in the alkylene group or alkyl group, that is, the fluorination rate is preferably 70 to 100%, more preferably 90 to 100%, and most preferably all. Are a perfluoroalkylene group or a perfluoroalkyl group in which a hydrogen atom is substituted with a fluorine atom.
These can be used alone or in combination.

(B) As for the compounding quantity of a component, 1-30 mass parts is preferable with respect to 100 mass parts of (A) component, and 1-20 mass parts is especially preferable.
Moreover, in (B) component, the ratio (mass ratio) of the compounding quantity of (B1) component and (B2) component exists in the range of (B1) :( B2) = 99: 1 to 1:99. Is preferred, 95: 5 to 50:50 is more preferred, 90:10 to 60:40 is more preferred, and 90:10 to 70:30 is most preferred. Within the above range, the effects of the present invention are excellent, and there are advantages such as a good pattern shape and high sensitivity.

"Optional ingredients"
The positive resist composition of the present invention may further contain a nitrogen-containing organic compound (D) (hereinafter referred to as “component (D)”) in order to improve the resist pattern shape, the stability over time, and the like. preferable.
The component (D) is not particularly limited as long as it has compatibility with other components in the positive resist composition. For example, it is described in JP-A-9-6001. A compound can be mentioned.
In particular, the amount of an acid component that may be by-produced in the positive resist composition over time by blending a relatively bulky specific basic compound (d1) represented by the following general formula (X) And the long-term storage stability of the positive resist composition can be improved.

In the general formula (X), one or more (preferably two or more, most preferably three) of X, Y and Z are (1) linear or branched alkyl having 4 or more carbon atoms. And (2) at least one group selected from the group consisting of a cyclic alkyl group having 3 or more carbon atoms, (3) a phenyl group, and (4) an aralkyl group.
In the alkyl group having 4 or more carbon atoms of (1), having 4 or more carbon atoms is effective in improving the temporal stability. The number of carbon atoms is preferably 5 or more, particularly 8 or more. The upper limit of the number of carbon atoms is not particularly limited, but is preferably 20 or less, particularly preferably 15 or less, from the viewpoint that a time-stable effect is recognized and it is easily commercially available. In addition, when it exceeds 20, basic strength will become weak and there exists a possibility that the effect of storage stability may not fully be acquired.
The alkyl group of (1) may be linear or branched. A straight chain is particularly preferable, and specifically, for example, an n-decyl group, an n-octyl group, an n-pentyl group, and the like are preferable.
In the (2) cyclic alkyl group having 3 or more carbon atoms, a cycloalkyl group having 4 to 8 carbon atoms is particularly commercially available, and is excellent in the effect of improving the temporal stability. Particularly preferred is a cyclohexyl group having 6 carbon atoms.
The aralkyl group of (4) is a group obtained by removing one hydrogen atom from the side chain of an aromatic hydrocarbon having a side chain, and is represented by the general formula -R'-P (R 'is an alkylene group, and P is an aryl group). Can be expressed as Examples of the aryl group of P include a phenyl group and a naphthyl group, and a phenyl group is preferable. The alkylene group for R ′ may have 1 or more carbon atoms, preferably 1 to 3 carbon atoms.
As the aralkyl group of (4), a benzyl group, a phenylethyl group and the like are preferable.

One or two of X, Y, and Z may be groups or atoms other than the above (1) to (4). As the group or atom other than (1) to (4), (1 ′) a group or atom selected from the group consisting of a linear or branched alkyl group having 3 or less carbon atoms and (2 ′) a hydrogen atom It is preferable that
The alkyl group having 3 or less carbon atoms (1 ′) may be either linear or branched. In particular, a methyl group and an ethyl group are preferable.

  X, Y and Z may be the same or different from each other, but when two or more of X, Y and Z are groups selected from the above (1) to (4), The groups corresponding to these are preferably the same from the viewpoint of the stability of the effect.

As the basic compound (d1), those constituting a tertiary amine are preferable, and among X, Y, and Z, those other than (1) to (4) are selected from (1 ′). Is preferred. Specific examples include tri-n-decylamine, methyl-di-n-octylamine, tri-n-pentylamine, N, N-dicyclohexylmethylamine, tribenzylamine and the like.
Among these, at least one selected from tri-n-decylamine, methyl-di-n-octylamine, and tri-n-pentylamine is preferable, and tri-n-decylamine is particularly preferable.

  As the component (D), a pyridine compound can also be used. In particular, 2,6-lutidine is preferable because it is excellent in the stability of holding after exposure.

As the component (D), any one of these may be used alone, or two or more may be mixed and used.
(D) component is normally used in 0.01-5.0 mass parts with respect to 100 mass parts of (A) component.

In addition, the positive resist composition of the present invention includes an organic carboxylic acid as an optional component for the purpose of preventing sensitivity deterioration due to the blending of the component (D), and improving the resist pattern shape, retention stability, and the like. Acid or phosphorus oxo acid or its derivative (E) (hereinafter referred to as component (E)) can be contained. In addition, (D) component and (E) component can also be used together, and any 1 type can also be used.
As the organic carboxylic acid, for example, malonic acid, citric acid, malic acid, succinic acid, benzoic acid, salicylic acid and the like are suitable.
Phosphorus oxoacids or derivatives thereof include phosphoric acid, phosphoric acid di-n-butyl ester, phosphoric acid diphenyl ester and other phosphoric acid or derivatives thereof such as phosphonic acid, phosphonic acid dimethyl ester, phosphonic acid- Like phosphonic acids such as di-n-butyl ester, phenylphosphonic acid, phosphonic acid diphenyl ester, phosphonic acid dibenzyl ester and their esters, phosphinic acids such as phosphinic acid, phenylphosphinic acid and their esters Among these, phosphonic acid is particularly preferable.
(E) A component is used in the ratio of 0.01-5.0 mass parts per 100 mass parts of (A) component.

It is preferable to add a storage stabilizer to the positive resist composition of the present invention because the decomposition reaction of the organic solvent can be suppressed as described later.
The storage stabilizer is not particularly limited as long as it has an action of suppressing the decomposition reaction of the organic solvent, and examples thereof include an antioxidant as described in JP-A No. 58-94834. Can do. As the antioxidant, phenolic compounds and amine compounds are known, and phenolic compounds are particularly preferable, and 2,6-di (tert-butyl) -p-cresol and derivatives thereof are ester solvents. It is effective in terms of deterioration of the ketone solvent, is commercially available, is inexpensive, and is preferable in view of excellent storage stability. In particular, the effect of preventing deterioration of propylene glycol monoalkyl ether acetate and 2-heptanone is extremely excellent.

The positive resist composition of the present invention preferably further contains a dye.
The dye in the present invention has absorption for radiation (exposure light source) used for exposure in the formation of a resist pattern. By blending such a dye, the sensitivity to the exposure light source can be adjusted. Further, the influence of standing waves by the exposure light source is reduced, and line edge roughness (LER) is reduced, in-plane uniformity of the pattern size to be formed, and the depth of focus are improved.

  The positive resist composition of the present invention further contains miscible additives as desired, for example, additional resins for improving the performance of the resist film, surfactants for improving coating properties, dissolution inhibitors, A plasticizer, a colorant, an antihalation agent, and the like can be appropriately added and contained.

The positive resist composition of the present invention can be produced by dissolving the material in an organic solvent.
Any organic solvent may be used as long as it can dissolve each component to be used to form a uniform solution, and one or two kinds of conventionally known solvents for chemically amplified resists can be used. These can be appropriately selected and used.
For example, lactones such as γ-butyrolactone, ketones such as acetone, methyl ethyl ketone, cyclohexanone, methyl isoamyl ketone, 2-heptanone, ethylene glycol, ethylene glycol monoacetate, diethylene glycol, diethylene glycol monoacetate, propylene glycol, propylene glycol monoacetate Polyhydric alcohols such as dipropylene glycol or dipropylene glycol monoacetate monomethyl ether, monoethyl ether, monopropyl ether, monobutyl ether or monophenyl ether and derivatives thereof, cyclic ethers such as dioxane, Methyl lactate, ethyl lactate, methyl acetate, ethyl acetate, butyl acetate, methyl pyruvate, ethyl pyruvate, Methyl Kishipuropion acid, esters such as ethyl ethoxypropionate can be exemplified.
These organic solvents may be used independently and may be used as 2 or more types of mixed solvents.
A mixed solvent obtained by mixing propylene glycol monomethyl ether acetate (PGMEA) and a polar solvent is preferable. The blending ratio (mass ratio) may be appropriately determined in consideration of the compatibility between PGMEA and the polar solvent, preferably 1: 9 to 9: 1, more preferably 2: 8 to 8: 2. It is preferable to be within the range.
Although the amount of the organic solvent used is not particularly limited, it is a concentration that can be applied to a substrate or the like and is appropriately set according to the coating film thickness. Generally, the solid content concentration of the resist composition is 2 to 60. It is used so that it may become in the range of 5 mass%, Preferably it is 5-50 mass%, More preferably, it is 5-40 mass%.

In addition, some of these organic solvents may decompose with time to generate acid as a by-product, but in the presence of the component (D) or in the presence of a storage stabilizer, the decomposition reaction may occur. Is suppressed. In particular, among the organic solvents described above, the effect is remarkable in ester solvents such as PGMEA and esters such as butyl acetate. Therefore, in the presence of the component (D) and / or the storage stabilizer, an ester solvent is preferable as the organic solvent, and PGMEA is particularly preferable.
In addition, as an acid component byproduced by the said decomposition | disassembly, in the case of 2-heptanone, formic acid, acetic acid, propionic acid, etc. are confirmed to be produced.

<Resist pattern formation method>
The resist pattern forming method of the present invention can be performed, for example, as follows.
That is, first, the positive resist composition of the present invention is coated on a substrate such as a silicon wafer with a spinner or the like, and prebaked at a temperature of 60 to 180 ° C. for 10 to 600 seconds, preferably 60 to 90 seconds. And a resist film is formed.
The film thickness of the resist film is not particularly limited. The resist film is preferably a thick film having a thickness of 100 nm to 10 μm, more preferably 200 nm to 5 μm. According to the present invention, a high-resolution resist pattern can be formed even when such a thick resist film is formed. Therefore, for example, a resist pattern having a high aspect ratio of 7 or more can be obtained. Such a high aspect ratio resist pattern is excellent in various resistances such as plating resistance, ionic etching resistance, and dry etching resistance, and is therefore preferably used in, for example, the production of MEMS described later.
The resist film is selectively exposed with an electron beam drawing apparatus or the like with or without a desired mask pattern. That is, after exposing through a mask pattern or drawing by direct irradiation with an electron beam without passing through a mask pattern, heat treatment (post-exposure baking (PEB)) is performed at a temperature of 80 to 150 ° C. for 40 to 120. Second, preferably 60-90 seconds. Subsequently, a resist pattern can be formed by developing this using an alkali developing solution, for example, 0.1-10 mass% tetramethylammonium hydroxide (TMAH) aqueous solution.
An organic or inorganic antireflection film can be provided between the substrate and the coating layer of the resist composition.

  The above-described positive resist composition and resist pattern forming method of the present invention can be suitably used in the following mix-and-match and MEMS (Micro Electro Mechanical Systems) manufacturing processes.

[Mix and match]
First, mix and match will be described.
At present, as a means for forming a high-resolution pattern, studies are being made not only from the above-mentioned materials but also from the viewpoint of processes.
For example, a three-layer resist method using a laminate in which an organic film, an intermediate film made of a silica-based inorganic film, and a resist film are stacked on a substrate, and superior in that the number of steps is smaller than the three-layer resist method. In addition, a multilayer resist method such as a two-layer resist method (see, for example, JP-A-6-202338 and JP-A-8-29987) has been proposed. In such a multilayer resist method, there is a possibility that high resolution can be realized.
However, the multi-layer resist method has a problem of reduction in throughput and cost due to an increase in the number of processes and a decrease in yield.
The throughput problem is particularly serious in a lithography process using an electron beam. In such a lithography process, there is a possibility that high resolution can be realized. However, exposure is usually performed in vacuum by exposure through a desired mask pattern or direct writing. Therefore, since it is necessary to perform a decompression operation, a purge operation, etc., it takes time compared to a process using an excimer laser or the like. In particular, in direct writing using an electron beam, it takes a very long time to pattern the entire substrate.
Therefore, a method called “mix and match” in which exposure is performed using two or more types of light sources has been attracting attention in recent years.
In this method, for example, an entire pattern is usually formed using a light source necessary for forming a fine pattern, for example, an electron beam, and an electron beam is used for a fine pattern, and rough processing that does not require a very high resolution is required. With respect to the pattern, it is said that the throughput can be improved by using a light source other than that, for example, a KrF excimer laser, and exposing all at once through the mask pattern to shorten the time required for forming the rough pattern. .
However, generally, as described above, the composition of the resist material varies depending on the type of exposure light source used, and a plurality of light sources, for example, three or more types of light sources have no sensitivity. For example, non-chemically amplified resists used for g-line and i-line exposures usually do not have sensitivity to KrF excimer lasers or electron beams, and therefore cannot be used for mix-and-match using these light sources. . Therefore, there are limitations on the combinations of light sources that can be used for mix and match.
Therefore, there is an increasing demand for a resist material that can be used in mix and match using any of these light sources. In particular, a combination of an electron beam capable of forming a high-resolution pattern and other light sources, particularly a mix-and-match in combination with a widely used low-cost g-line and / or i-line. There is a strong demand for resist materials that can be used.
As described above, the positive resist composition of the present invention is excellent in resolution, and generates an oxime sulfonate acid that easily generates acid upon irradiation with g-line, i-line, KrF excimer laser and electron beam. Since it contains the agent (B1), it has sensitivity to any of g-line, i-line, KrF excimer laser and electron beam. Therefore, even if any of g-line, i-line, KrF excimer laser, and electron beam is selected as the exposure light source, mix and match can be performed, but the positive resist composition for electron beam of the present invention is used. When performing mix and match, it is necessary to use at least an electron beam as an exposure light source. Therefore, it is preferable that the process is an exposure process using at least one selected from g-line, i-line, and KrF excimer laser and an electron beam. In this case, a fine pattern, for example, a fine pattern having a dimension of 200 nm or less is formed by using an electron beam, and a rougher pattern, for example, a pattern having a dimension exceeding 200 nm is formed by g-line, i-line or KrF excimer laser. Use to form. Thereby, compared with the case where only an electron beam is used, for example, the throughput can be greatly improved.
Furthermore, considering that the exposure apparatus is inexpensive and the cost can be reduced, it is preferable to use g-line and / or i-line. That is, the step is preferably a step of exposing using g-line and / or i-line and electron beam.
In particular, when two types of exposure light sources are used as the exposure light source, it is preferable to use i-line and electron beam.

Pattern formation by mix and match can be performed, for example, as follows.
First, a resist film is formed in the same manner as described above.
The resist film is selectively exposed with or without a desired mask pattern using one type (first exposure light source) selected from g-line, i-line, KrF excimer laser and electron beam. . That is, exposure is performed through the mask pattern, or drawing is performed by direct irradiation with an electron beam without using the mask pattern.
Next, a desired mask pattern is formed on the resist film using one type (second exposure light source) other than the first exposure light source selected from g-line, i-line, KrF excimer laser, and electron beam. Selectively expose with or without.
After selective exposure, a resist pattern can be formed by applying PEB in the same manner as described above and developing the PEB using an alkali developer.
As a combination of the first exposure light source and the second exposure light source, one may be an electron beam, and the other light source can be arbitrarily selected from g-line, i-line and KrF excimer laser. In the present invention, in particular, as described above, a combination of g-line and / or i-line and electron beam is more preferable, and a combination of i-line and electron beam is most preferable.

[MEMS Manufacturing Process]
Next, the MEMS manufacturing process will be described.
MEMS is an advanced technology in which various fine structures (functional elements such as sensors, electrodes, wiring, bumps, connection terminals such as leads, etc.) are integrated on a substrate by micromachining technology, which is a three-dimensional microfabrication technology. It is a small system. MEMS is expected to be used in various fields such as information communication, automobiles, medicine, and biotechnology as various sensors such as a magnetic head of a magnetic recording medium.
Lithography technology is used as a micromachining technology used for manufacturing such MEMS. For example, Japanese Patent Application Laid-Open No. 2002-110536 describes a method of manufacturing a micro device such as a magnetic head using a resist pattern having a specific shape.
As MEMS is further miniaturized, it is required that the resist material be able to form a high-resolution resist pattern for fine processing.
As described above, as described above, the wavelength of the exposure light source is generally shortened as described above. Recently, as a resist material applicable to the MEMS manufacturing process using an electron beam, sensitivity to the electron beam is increased. There is an increasing demand for a resist material that has a high resolution pattern.
However, a conventional chemically amplified positive resist composition using, for example, a resin in which a hydroxyl group of a PHS resin is protected with an acid dissociable, dissolution inhibiting group as a resin component is considered to be sensitive to electron beams. However, there is a problem that various resistances required in the production of MEMS are not sufficient.
That is, in the manufacture of MEMS, a step of forming a conductor structure such as a wiring by a plating method or the like is performed together with a lithography step. Various processes such as dry etching, ion implantation of impurities such as phosphorus and boron in vacuum, acceleration by a high electric field (hereinafter referred to as an implant), ion etching such as ion milling, etc. For example, in the manufacture of a magnetic head, ionic etching of a magnetic film is performed using a resist pattern. In these steps, the resist pattern is often heated. Therefore, the resist material used for manufacturing MEMS is required to have good plating resistance, heat resistance, dry etching resistance, implant resistance, ionic etching resistance, adhesion to a substrate, and the like.
However, when the conventional chemical amplification type positive resist composition as described above is used, these characteristics are not satisfactory. For example, when the plating process is performed, there is a problem that the resist pattern becomes thick and the plating is peeled off. In addition, when heated at a high temperature, for example, 130 ° C., there is a problem that the shape of the resist pattern deteriorates due to heat sag.
On the other hand, in the positive resist composition of the present invention, not only can a high resolution pattern be formed with sensitivity to electron beams, but also a novolac resin is used as the component (A). Therefore, it is preferably used for producing MEMS using an electron beam.

  Specifically, as a MEMS, a magnetic head of a magnetic recording medium, a perpendicular magnetic head, an MRAM [(Magnetic Random Access Memory): a magneto-resistive GMR (giant magnetoresistive) film or a TMR (tunnel magnetoresistive) film as a memory element. Non-volatile memory used. ] Etc. can be illustrated.

Hereinafter, an example of a MEMS manufacturing process using the present invention will be described with reference to FIGS.
FIG. 1A to FIG. 1E are schematic views (side sectional views) showing respective steps of manufacturing a lead portion (reading head portion) of a magnetic head of a magnetic recording medium.
First, as shown in FIG. 1A, a magnetic film 2 ′ is laminated on a substrate 1, and a base film 3 ′ soluble in an alkali developer and a resist film 4 ′ are sequentially formed thereon. Laminate.
Next, selective exposure is performed from above the resist film 4 ′ using an electron beam with or without a mask pattern. Next, when alkali development is performed, a predetermined range of the resist film 4 ′ (exposed portion if positive, unexposed portion if negative) is etched, and a resist pattern 4 is obtained. At this time, the base film 3 ′ located under the etched portion of the resist film 4 ′ is also removed together with the alkaline developer to form the base pattern 3. The base film 3 ′ is usually formed of a resist. The alkali solubility is higher than that of the film 4 ′, and the width W ¹ of the base pattern 3 is narrower than the width W ² of the resist pattern 4. Due to this difference in dissolution rate, as shown in FIG. 1 (b), a cross-sectional wing plate-like pattern 5 is obtained, which is composed of a narrow base pattern 3 and a wider resist pattern 4.
Next, when ionic etching is performed using the pattern 5 as a mask, the magnetic film 2 ′ around the pattern 5 is etched as shown in FIG. 1C, and the magnetic film pattern 2 is formed under and around the pattern 5. It is formed. As ionic etching, ion milling is frequently used.
Further, when sputtering is performed, an electrode film 6 is formed on the pattern 5 and on the substrate 1 around the magnetic film pattern 2 as shown in FIG.
Finally, the pattern 5 is removed (lifted off) by dissolving the base pattern 3 using an alkali developer or the like and removing the resist pattern 4. Due to such lift-off of the pattern 5, as shown in FIG. 1E, the substrate 1 is composed of a magnetic film pattern 2 having a predetermined width formed thereon and an electrode film 6 formed therearound. The magnetic head 10 is obtained.

Hereinafter, the process shown in FIG. 1 will be described in more detail.
[Process of forming magnetic film 2 ']
First, as shown in FIG. 1A, a magnetic film 2 ′ is formed on a substrate 1 such as a silicon wafer by a sputtering apparatus.
The substrate is not particularly limited, and a conventionally known substrate can be used. For example, a substrate for an electronic component can be exemplified. Examples of the material for the substrate include silicon wafers, metals such as copper, chromium, iron, and aluminum, and glass.
As the magnetic material used for the magnetic film 2 ′, a material containing an element such as Ni, Co, Cr, Pt or the like is used.

[Formation process of base film 3 ']
Next, a resist composition or a resin solution for forming a base film is applied to the formed magnetic film 2 ′ by a spinner or the like, preferably at 200 to 300 ° C. for 30 to 300 seconds, preferably 60 to 180. A baking process is performed under heating conditions for 2 seconds to form a base film 3 ′.
The undercoat film is an organic film that is insoluble in an alkali developer used for development after exposure and is possible by a conventional dry etching method.
By using such a base film 3 ′, as described later, only the resist film 4 ′ is exposed and alkali-developed by ordinary photolithography to form a resist pattern 4, and then the resist pattern 4 is used as a mask. The resist pattern 4 is transferred by dry-etching the base film 3 ′, and the base pattern 3 is formed on the base film 3 ′.
The material for forming the base film 3 ′ does not necessarily require photosensitivity like the resist film 4 ′, and is generally used as a base material in the manufacture of semiconductor elements and liquid crystal display elements. A resist or resin may be used.
Further, since it is necessary to transfer the resist pattern 4 to the base film 3 ′, the base film 3 ′ is preferably a material that can be etched by oxygen plasma.
As such a material, it is easy to perform etching by oxygen plasma, and at the same time, it is used for etching a fluorocarbon gas used for etching a substrate such as silicon or a substrate or a magnetic film in a later process. In view of strong resistance to dry etching such as ionic etching such as ion milling, a material mainly composed of at least one selected from the group consisting of novolak resin, acrylic resin and soluble polyimide is preferably used.

As the novolak resin, those generally used in resist compositions can be used, and i-line and g-line resists containing the novolak resin as a main component can also be used. As this novolak resin, the thing similar to the novolak resin (a) in the (A) component mentioned above can be illustrated, for example.
As the acrylic resin, those generally used for positive resist compositions can be used. For example, a structural unit derived from a polymerizable compound having an ether bond and a polymerizable compound having a carboxyl group can be used. Mention may be made of acrylic resins containing derived structural units.
Examples of the polymerizable compound having an ether bond include 2-methoxyethyl (meth) acrylate, methoxytriethylene glycol (meth) acrylate, 3-methoxybutyl (meth) acrylate, ethyl carbitol (meth) acrylate, phenoxy polyethylene glycol (meta And (meth) acrylic acid derivatives having an ether bond and an ester bond such as acrylate, methoxypolypropylene glycol (meth) acrylate, and tetrahydrofurfuryl (meth) acrylate. These compounds can be used alone or in combination of two or more.
Examples of the polymerizable compound having a carboxyl group include monocarboxylic acids such as acrylic acid, methacrylic acid, and crotonic acid; dicarboxylic acids such as maleic acid, fumaric acid, and itaconic acid; 2-methacryloyloxyethyl succinic acid, and 2-methacryloyloxyethyl. Examples include maleic acid, 2-methacryloyloxyethyl phthalic acid, 2-methacryloyloxyethyl hexahydrophthalic acid and other compounds having a carboxyl group and an ester bond, and acrylic acid and methacrylic acid are preferred. These compounds can be used alone or in combination of two or more.
The soluble polyimide is a polyimide that can be made liquid by the organic solvent as described above.
Among these, a novolak resin and an acrylic resin having an alicyclic moiety or an aromatic ring in the side chain are preferably used because they are inexpensive and widely used and have excellent dry etching resistance in the subsequent steps.

[Process for forming resist film 4 ']
Next, the positive resist composition solution of the present invention is applied onto the lower layer film 3 ′ using a spinner or the like, and then pre-baked (PAB treatment) to form a resist film 4 ′. A laminated body is obtained in which a base film 3 ′ and a resist film 4 ′ made of the positive resist composition of the present invention are laminated on the magnetic film 2 ′.
Although prebaking conditions change with kinds of each component in a composition, a mixture ratio, a coating film thickness, etc., they are 70-150 degreeC normally, Preferably it is 80-140 degreeC, and is about 0.5 to 60 minutes.
An organic or inorganic antireflection film may be provided between the base film and the resist film.

In this laminated body, the thickness of the base film 3 ′ and the resist film 4 ′ is preferably 15 μm or less in total from the balance of throughput considering the target aspect ratio and the time required for etching the base film 3 ′. More preferably, it is 5 μm or less. The total lower limit value is not particularly limited, but is preferably 0.1 μm or more, more preferably 0.35 μm or more.
The thickness of the base film 3 ′ is preferably 20 to 10,000 nm, more preferably 30 to 5000 nm, and still more preferably 30 to 3000 nm. By setting the thickness of the base film 3 ′ within this range, there are effects that a resist pattern with a high aspect ratio can be formed and sufficient etching resistance can be secured during substrate etching.
The thickness of the resist film 4 ′ is preferably 50 to 1000 nm, more preferably 100 nm to 800 nm, and still more preferably 100 to 500 nm. By setting the thickness of the resist film 4 ′ within this range, there are effects that the resist pattern 4 can be formed with high resolution, and etching resistance to an alkaline developer, ionic etching, etc. can be sufficiently obtained.

In a resist laminate in which a resist pattern is formed, it is preferable that a pattern with a high aspect ratio can be formed without causing pattern collapse or the like. As the pattern has a higher aspect ratio, the fine pattern can be formed on the support as described later with higher accuracy.
The aspect ratio here is the ratio (y / x) of the height y of the base pattern 3 to the pattern width x of the resist pattern. The pattern width x of the resist pattern is the same as the width of the base pattern 3 after being transferred to the base pattern 3.
The pattern width means the width of a ridge (line) when the resist pattern is a line pattern such as a line and space pattern or an isolated line pattern. When the resist pattern is a hole pattern, the pattern width refers to the inner diameter of the formed hole (hole). Further, when the resist pattern is a cylindrical dot pattern, it means the diameter. Each of these pattern widths is a width below the pattern.

[Resist pattern formation process]
Next, as described in the above <Resist pattern formation method>, the resist film 4 ′ is selectively exposed with or without an electron beam through a desired mask pattern, subjected to PEB, and developed. A predetermined range (exposed portion) of the resist film 4 ′ is developed to obtain a resist pattern 4 as shown in FIG.

[Over-etching process]
Next, using the obtained resist pattern 4 as a mask pattern, the base film 3 ′ is dry-etched to form the base pattern 3 on the base film 3 ′.
At this time, by performing over-etching of the base film 3 ′, the base film 3 ′ located under the resist pattern 4 is removed, and only the lower part near the center of the resist pattern 4 remains. As a result, as shown in FIG. 1 (b), 'and base pattern 3, which from the width W ² resist film 4' narrow base film 3 having a width W ¹ of a resist pattern 4 which in cross-section battledore A pattern 5 is obtained.
Known dry etching methods include chemical etching such as downflow etching and chemical dry etching; physical etching such as sputter etching and ion beam etching; and chemical and physical etching such as RIE (reactive ion etching). This method can be used.
The most common dry etching is parallel plate RIE. In this method, first, a resist laminate is put in a chamber of an RIE apparatus, and a necessary etching gas is introduced. When a high frequency voltage is applied to the holder of the resist laminate placed in parallel with the upper electrode in the chamber, the gas is turned into plasma. In the plasma, there are charged particles such as positive and negative ions and electrons, and neutral active species. When these etching species are adsorbed on the lower organic layer, a chemical reaction occurs, the reaction product is detached from the surface and exhausted to the outside, and etching proceeds.
Examples of the etching gas include oxygen and sulfur dioxide, but oxygen is preferably used.

[Ionic etching process of magnetic film 2 ']
Next, the lead portion of the magnetic head is manufactured using the pattern 5 obtained as described above.
When ionic etching is performed using the pattern 5 formed of the tapered resist pattern 4 and the base pattern 3 shown in FIG. 1B as a mask, as shown in FIG. The magnetic film 2 ′ is etched, the magnetic film 2 ′ below the pattern 5 remains, and the magnetic film pattern 2 is printed.
Examples of ionic etching at this time include anisotropic etching such as ion milling. A conventionally well-known method can be applied to ion milling, and for example, it can be performed by an ion beam milling apparatus IML series manufactured by Hitachi, Ltd.

[Sputtering process]
When sputtering is further performed, an electrode film 6 is formed on the pattern 5 and on the substrate 1 around the magnetic film pattern 2 as shown in FIG.
For this sputtering, a conventionally known method can be applied. For example, it can be carried out by using a sputtering apparatus ISM-2200 or ISP-1801 manufactured by Hitachi, Ltd.

[Lift-off process]
Finally, the underlying pattern 3 is etched by dry etching to remove the pattern 5 (lift-off), so that the substrate 1 and the magnetic film pattern 2 formed thereon are formed as shown in FIG. The lead portion 20 of the magnetic head is manufactured, which is composed of the electrode film 6 formed around the periphery.

Next, the manufacturing process of the write part (write head part) of the magnetic head of the magnetic recording medium will be described with reference to FIG. In this step, a technique of forming a fine magnetic film pattern by forming a fine trench type resist pattern and plating using the resist pattern as a frame is used.
FIG. 2A to FIG. 2C are schematic views (side cross-sectional views) showing each process of manufacturing the write part of the magnetic head.
First, as shown in FIG. 2 (a), a plating seed layer 11 is formed on the upper surface of a base material (not shown) on which a desired laminated structure is formed on a substrate, and a cross section is formed thereon by the conventional lithography described above. A substantially rectangular slit-like resist pattern 12 is obtained.
Next, as shown in FIG. 2B, plating is performed in the trench portion (recessed portion) surrounded by the obtained resist pattern 12 to form a magnetic film 13 ′.
Thereafter, as shown in FIG. 2C, by removing the resist pattern 12, a magnetic film pattern 13 having a substantially rectangular cross section or a trapezoidal (reverse taper) cross section whose width becomes narrower toward the substrate is obtained. It is done.

  In the above description, the process for manufacturing the magnetic head in which the magnetic film 2 is laminated on the substrate 1 is exemplified. However, the present invention is not limited to this, and the positive resist composition according to the present invention. Can be suitably used for all uses for manufacturing MEMS, for example, for manufacturing MRAM, including the case where a magnetic film is not provided.

As described above, according to the positive resist composition and the resist pattern forming method of the present invention, a high-resolution resist pattern can be formed. In particular, in lithography using an electron beam, a very high resolution resist pattern can be formed. The reason why the above-mentioned effect can be obtained by the combination of the above-described component (A) and the component (B) that specifically contains two kinds of acid generators (B1) and (B2) is not clear, but (B1 ) In combination with (B2), the acid strength is increased, the contrast is increased, and the resolution is improved.
Moreover, since the positive resist composition of the present invention contains an oxime sulfonate-based acid generator (B1) that generates an acid upon irradiation with g-line, i-line, KrF excimer laser, and electron beam, It has sensitivity to any of the X-ray, KrF excimer laser and electron beam. Therefore, it can be suitably used in a mix and match process in which exposure is performed using at least two types of exposure light sources selected from g-line, i-line, KrF excimer laser, and electron beam.
Furthermore, since the positive resist composition of the present invention uses a resin based on a novolak resin as the component (A), plating resistance, heat resistance, dry etching resistance, implant resistance, ionic etching resistance, substrate Adhesiveness with respect to is good. Therefore, it is suitably used for the production of MEMS, particularly for the production of MEMS using an electron beam.

EXAMPLES Hereinafter, although an Example is shown and this invention is demonstrated further in detail, this invention is not limited to a following example.
In the following Examples and Comparative Examples, the following resin (A) -1 was used as the component (A).
Resin (A) -1
Using a mixed phenol of m-cresol / p-cresol = 6/4 (molar ratio) and a mixed aldehyde of formaldehyde / salicylaldehyde = 1 / 0.3 (molar ratio), Mw = Novolak resin 1 having 5462 and Mw / Mn = 10 was synthesized.
The novolak resin 1 is stirred and dissolved in a methyl isobutyl ketone (MIBK) solvent so as to have a concentration of 30% by mass, and the internal temperature is adjusted to 100 to 110 ° C. Then, the compound represented by the following formula (I-1) is converted into a resin solid An amount corresponding to 8 parts by mass was added dropwise to 100 parts by mass.
After the reaction for 24 hours, post-stirring was performed at room temperature for 12 hours or more, and then solvent replacement from MIBK to 2-heptanone was performed.
As a result, Mw = 38200, and resin (A) -1 in which 7.5% of the hydroxyl groups of novolak resin 1 was protected was obtained.

Moreover, the numerical value in [] in the following table | surface shows a compounding quantity (mass part). Moreover, the symbol in a table | surface has the following meaning.
(B) -1: Compound (B) -2: Triphenylsulfonium nonafluorobutanesulfonate (D) -1: 2,6-lutidine (D) -2: Tri-n- represented by the above formula (V) Decylamine Add1: antioxidant (2,6-di (tert-butyl) -p-cresol, trade name: BHT Swanox, manufactured by Seiko Chemical Co., Ltd.)
Add2: Surfactant (trade name: XR-104, manufactured by Dainippon Ink & Chemicals, Inc.)
Add3: Dye (trade name: HHBP, manufactured by Daitokemix)
(S) -1: Mixed solvent of PGMEA / butyl acetate = 7/3 (mass ratio)

Example 1 and Comparative Example 1
Each component shown in Table 1 below was mixed and dissolved to prepare a positive resist composition solution.

Next, the following evaluation was performed on the obtained positive resist composition.
The obtained positive resist composition solution was uniformly applied on an 8-inch silicon substrate that had been subjected to hexamethyldisilazane treatment, and was baked (PAB) at 130 ° C. for 90 seconds to form a film. A resist film having a thickness of 500 nm was obtained.
The resist film was drawn by an electron beam drawing machine (Hitachi HL-800D, 70 kV acceleration voltage), and then baked (PEB) at 110 ° C. for 90 seconds to obtain 2.38 mass% TMAH. Development was performed with an aqueous solution (23 ° C.) for 60 seconds, rinsed with pure water for 30 seconds, shaken and dried, and then post-baked at 100 ° C. for 60 seconds.
The substrate was observed with a scanning electron microscope (SEM), and the limit resolution (nm) at the optimum exposure dose Eop at which a trench pattern with a width of 80 nm was formed was determined. The results are shown in Table 2 as “resolution”.

From the results of Table 2, resin (A) -1 which is a reaction product of a novolak resin and a compound represented by formula (I-1) is used as component (A), and (B)- In Example 1 using a mixture of 1 and (B) -2, a high-resolution pattern could be formed.
On the other hand, Comparative Example 1 using only (B) -1 as the (B) component had lower resolution than Example 1.

Example 2
Each component shown in Table 3 below was mixed and dissolved to prepare a positive resist composition solution.

Next, the following evaluation was performed on the obtained positive resist composition.
[Sensitivity to electron beam]
The obtained positive resist composition solution was uniformly applied on an 8-inch silicon substrate that had been subjected to hexamethyldisilazane treatment, and was baked (PAB) at 130 ° C. for 90 seconds to form a film. A resist film having a thickness of 500 nm was obtained.
The resist film was drawn by an electron beam drawing machine (Hitachi HL-800D, 70 kV acceleration voltage), and then baked (PEB) at 110 ° C. for 90 seconds to obtain 2.38 mass% TMAH. Developed with an aqueous solution (23 ° C.) for 60 seconds.
Then, as a result of observing whether the pattern was formed about this board | substrate with the scanning electron microscope (SEM), the pattern was formed. From this, it was confirmed that (B) -1 generated an acid by irradiation with an electron beam.

[Sensitivity to KrF excimer laser]
A resist film having a thickness of 500 nm was formed in the same manner as described above, and a KrF excimer was applied to the resist film using a KrF exposure apparatus FPA3000EX3 (manufactured by Canon; NA (numerical aperture) = 0.55, σ = 0.55). After selectively irradiating with a laser (248 nm) through a mask pattern, the substrate was baked (PEB) at 110 ° C. for 90 seconds, and developed with a 2.38 mass% TMAH aqueous solution (23 ° C.) for 60 seconds.
As a result of observing whether or not a pattern was formed on the substrate by SEM, a pattern was formed. From this, it was confirmed that (B) -1 generated an acid by irradiation with KrF.

[Sensitivity to g-line]
In the same manner as described above, a resist film having a thickness of 500 nm was formed, and the resist film was selectively irradiated with g-rays (436 nm) through a mask pattern by NSR-1505G7E (manufactured by Nikon Corporation). The substrate was baked (PEB) at 110 ° C. for 90 seconds, and developed with a 2.38 mass% TMAH aqueous solution (23 ° C.) for 60 seconds.
As a result, a pattern was formed. From this, it was confirmed that (B) -1 generated an acid by g-ray irradiation.

[Sensitivity to i-line]
A resist film having a thickness of 500 nm is formed in the same manner as described above, and the resist film is selectively irradiated with i-line (365 nm) through a mask pattern by NSR2205i14E (manufactured by Nikon), and then 110 ° C. The substrate was baked for 90 seconds (PEB) and developed with a 2.38 mass% TMAH aqueous solution (23 ° C.) for 60 seconds.
As a result, a pattern was formed. From this, it was confirmed that (B) -1 generated an acid by i-ray irradiation.

From these results, (B) -1 (compound represented by the above formula (V)) generates an acid upon irradiation with any exposure light source of g-line, i-line, KrF excimer laser, and electron beam. Was confirmed.
As is clear from these results, the positive resist composition of Example 2 has sensitivity to all exposure light sources of g-line, i-line, KrF excimer laser, and electron beam. Two or more of these can be arbitrarily selected and mixed and matched.

Next, an actual mix and match was performed. That is, using the positive resist composition of Example 2, a resist pattern was formed by mix-and-match using i-line and electron beam in the procedure shown in FIGS. The i-line and electron beam exposure conditions are the same as those used in the above evaluation. 3 to 6 are illustrated by partially changing the scale from the actual dimensions for convenience of explanation.
First, as shown in FIG. 3, large-area patterns 14 and 14 of 5 μm square were formed at 1 μm intervals with i line. Next, as shown in FIG. 4, a trench pattern 15 having a width of 100 nm was formed by an electron beam so as to connect the large area patterns 14 and 14. In this way, a resist pattern 16 having a shape in which the large area patterns 14 and 14 are connected by the trench pattern 15 can be formed. A perspective view of the resist pattern 16 is shown in FIG.
Next, the formed resist pattern 16 was subjected to a plating process at 65 ° C. for 40 minutes by an electroplating method using a non-cyanide gold sulfite plating solution, and the non-resist portion was buried by plating to form a plating pattern 17. At this time, as shown in FIG. 6A, the entire non-resist portion was not filled and the height of the resist film was made higher. FIG. 6B shows a longitudinal sectional view at position AA ′ in FIG. Finally, the resist film is removed by a known method.
The plating pattern 17 obtained in this way can be used, for example, for manufacturing a magnetic head.

It is a schematic diagram for explaining a process of forming a magnetic film pattern by ionic etching using a resist pattern as a mask. It is a schematic diagram for explaining a process of forming a magnetic film pattern by a plating method using a resist pattern as a frame. It is a figure for demonstrating the process of forming a resist pattern by the mix and match using i line | wire and an electron beam. It is a figure for demonstrating the process of forming a resist pattern by the mix and match using i line | wire and an electron beam. It is a perspective view which shows the resist pattern formed by the mix and match using i line | wire and an electron beam. It is a figure for demonstrating the process of plating to the resist pattern formed by the mix and match using i line | wire and an electron beam.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Substrate, 2 '... Magnetic film, 2 ... Magnetic film pattern, 3' ... Base pattern, 3 ... Base film, 4 '... Resist film, 4 ... Resist pattern, 5 ... Pattern, 6 ... Electrode film, 10 ... Magnetic Head (lead part), 11 ... plating seed layer, 12 ... resist pattern, 13 '... magnetic film, 13 ... magnetic film pattern, 14 ... large area pattern, 15 ... trench pattern, 16 ... resist pattern, 17 ... plating pattern

Claims (4)

A positive resist for electron beams containing a resin component (A) having an acid dissociable, dissolution inhibiting group and increasing alkali solubility by the action of an acid, and an acid generator component (B) that generates an acid upon irradiation with radiation A composition comprising:
The resin component (A) is a resin in which a part of all hydroxyl groups of the alkali-soluble novolak resin is protected with an acid dissociable, dissolution inhibiting group,
The positive resist composition for electron beams, wherein the acid generator component (B) comprises an oxime sulfonate acid generator (B1) and an onium salt acid generator (B2). The positive resist composition for an electron beam according to claim 1, wherein the resin component (A) is a reaction product of an alkali-soluble novolak resin and a compound represented by the following general formula (I).

[Wherein, R ¹ may have a substituent and may be an alkylene group having 1 to 10 carbon atoms which may contain an ether bond in the main chain, or the following general formula (II): Represents a group. ]

[Wherein, R ⁴ represents an alkylene group having 1 to 10 carbon atoms which may have a substituent, and m represents 0 or 1. ]   Furthermore, the positive resist composition for electron beams of Claim 1 or 2 containing a nitrogen-containing organic compound (D). A step of forming a resist film on a substrate using the positive resist composition for an electron beam according to any one of claims 1 to 3, a step of selectively exposing the resist film, and the resist film A resist pattern forming method including a step of forming a resist pattern by alkali development.

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