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JP2006252705A - Original disk for transfer, holder for transfer, transfer device and magnetic recording medium - Google Patents

Original disk for transfer, holder for transfer, transfer device and magnetic recording medium Download PDF

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JP2006252705A
JP2006252705A JP2005069576A JP2005069576A JP2006252705A JP 2006252705 A JP2006252705 A JP 2006252705A JP 2005069576 A JP2005069576 A JP 2005069576A JP 2005069576 A JP2005069576 A JP 2005069576A JP 2006252705 A JP2006252705 A JP 2006252705A
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transfer
master
holder
masters
thickness distribution
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Akihito Kamatani
彰人 鎌谷
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Fujifilm Holdings Corp
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Fuji Photo Film Co Ltd
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Priority to JP2005069576A priority Critical patent/JP2006252705A/en
Priority to US11/371,905 priority patent/US20060203366A1/en
Publication of JP2006252705A publication Critical patent/JP2006252705A/en
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Abstract

<P>PROBLEM TO BE SOLVED: To make an original disk for transfer adhere to an object to be transferred with high precision by successfully specifying an in-surface adhesion order between the original disk for transfer and the object to be transferred. <P>SOLUTION: Original disks 11, 12 for transfer have thickness distributions in which adhesion between the original disks 11, 12 for transfer and the object 15 to be transferred starts from a specific part of transfer surfaces 11a, 12a of the original disks 11, 12 for transfer and sequentially occurs over the whole. It is desirable that the thickness distribution of the original disks 11, 12 for transfer is the one in which the maximum thickness difference of an area having transfer information is 1-100 μm. It is desirable that the thickness distribution of the original disks 11, 12 for transfer is symmetrical to centers or diameters of the original disks 11, 12 for transfer. It is desirable that the thickness distribution of the original disks 11, 12 for transfer continuously becomes thicker from the periphery side toward the center side or continuously becomes thicker from the center side to the periphery side. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、被転写体に転写する転写情報を有する転写用原盤、これを用いる転写用ホルダ及び転写装置、及び磁気転写により製造される磁気記録媒体に関するものである。   The present invention relates to a transfer master having transfer information to be transferred to a transfer object, a transfer holder and transfer device using the transfer master, and a magnetic recording medium manufactured by magnetic transfer.

表面に転写情報を有する転写用原盤と被転写体とを密着させて、転写用原盤の転写情報を被転写体に転写するナノインプリントや磁気転写等の転写技術がある。かかる転写技術では、転写用原盤と被転写体とを高精度に密着させることが重要である。   There are transfer techniques such as nanoimprint and magnetic transfer, in which a transfer master having transfer information on the surface is brought into close contact with a transfer target and the transfer information of the transfer master is transferred to the transfer target. In such a transfer technique, it is important to closely attach the transfer master and the transfer target.

従来は転写用原盤と被転写体とを各々できる限り互いに平行になるよう保持してから、これらを密着させている。しかしながら、転写用原盤の転写面と被転写体の被転写面はいずれも表面平滑性に僅かながらもバラツキ(これは製作精度による)があるため、転写用原盤と被転写体の密着を開始してから終了するまでの面内密着順序は成り行き任せとなっている。そのため、面内密着順序によっては転写面と被転写面との間にエア溜りが発生するなどして、転写用原盤と被転写体とが良好に密着されない恐れがある。かかる背景下、転写用原盤を湾曲させて転写面の突出箇所から密着を開始する提案がなされている(特許文献1)。
特開平11−161956号公報
Conventionally, a transfer master and a transfer object are held as parallel as possible to each other, and then are brought into close contact with each other. However, since the transfer surface of the transfer master and the transfer surface of the transferred object both have slight variations in surface smoothness (this depends on the manufacturing accuracy), the transfer master and the transferred object start to contact each other. The in-plane contact order from the end to the end is up to the task. For this reason, depending on the in-plane contact order, an air pool may be generated between the transfer surface and the transfer surface, and there is a possibility that the transfer master and the transfer target body may not be in good contact. Under such circumstances, a proposal has been made to start adhesion from a protruding portion of a transfer surface by curving a transfer master (Patent Document 1).
Japanese Patent Application Laid-Open No. 11-161956

転写用原盤を湾曲させる特許文献1に記載の技術では、湾曲形状を高精度に制御することが難しく現実的ではない。また、湾曲した転写用原盤は転写用ホルダの内面から浮いた状態となり転写用ホルダによる保持が不安定である。そのため、密着開始初期の低圧力印加状態でも湾曲状態を維持できず、平坦な転写用原盤と変わりなくなり、面内密着順序を良好に規定できない恐れがある。   With the technique described in Patent Document 1 for bending the transfer master, it is difficult and difficult to control the curved shape with high accuracy. Further, the curved transfer master becomes floating from the inner surface of the transfer holder, and the holding by the transfer holder is unstable. For this reason, the curved state cannot be maintained even when a low pressure is applied at the beginning of the close contact, which is no different from a flat master for transfer, and the in-plane close contact order may not be well defined.

本発明は上記事情に鑑みてなされたものであり、転写用原盤と被転写体との面内密着順序を良好に規定でき、転写用原盤と被転写体とを高精度に密着することが可能な転写技術、及びこれを適用した磁気記録媒体を提供することを目的とするものである。   The present invention has been made in view of the above circumstances, and it is possible to satisfactorily define the in-plane contact order between the transfer master and the transfer object, and to closely contact the transfer master and the transfer object. It is an object of the present invention to provide a simple transfer technique and a magnetic recording medium to which the transfer technique is applied.

本発明者は、転写用原盤を湾曲させるのではなく、転写用原盤に厚み分布を持たせることで上記課題を解決し得ることを見出し、本発明を完成した。   The present inventor has found that the above problem can be solved by giving the transfer master a thickness distribution instead of curving the transfer master, and completed the present invention.

本発明の転写用原盤は、転写情報を有する転写面を有し、該転写面に被転写体が密着され前記転写情報の転写が行われる転写用原盤において、前記被転写体との密着が前記転写面の特定箇所から開始し順次全体に渡って起こる厚み分布を有することを特徴とするものである。   The transfer master of the present invention has a transfer surface having transfer information, and the transfer master in which the transfer target is in close contact with the transfer surface and the transfer information is transferred. It has a thickness distribution that starts from a specific portion of the transfer surface and sequentially occurs over the entire surface.

本発明の転写用原盤において、前記厚み分布は、前記転写情報を有する領域の最大厚み差が1〜100μmの分布であることが好ましい。前記転写用原盤及び前記被転写体が円盤状の場合、前記厚み分布は前記転写用原盤の中心又は径に対して対称な分布であることが好ましい。また、前記厚み分布は、外周側から中心側に向けて連続的に厚くなる又は中心側から外周側に向けて連続的に厚くなる厚み分布であることが好ましい。   In the master for transfer according to the present invention, it is preferable that the thickness distribution is a distribution in which the maximum thickness difference of the area having the transfer information is 1 to 100 μm. When the transfer master and the transfer target are disk-shaped, it is preferable that the thickness distribution is symmetric with respect to the center or diameter of the transfer master. Moreover, it is preferable that the said thickness distribution is a thickness distribution which becomes thick continuously from an outer peripheral side toward a center side, or becomes thick continuously from a center side toward an outer peripheral side.

本発明の転写用原盤は、磁気転写用として好適である。   The master for transfer according to the present invention is suitable for magnetic transfer.

本発明の転写用ホルダは、上記の本発明の転写用原盤と前記被転写体とを挟持し保持する互いに接近離間自在な一対の挟持部材を備えたことを特徴とするものである。   The transfer holder of the present invention is characterized by comprising a pair of clamping members which can hold and hold the above-mentioned transfer master of the present invention and the transfer object, and can be moved close to and away from each other.

本発明の転写装置は、上記の本発明の転写用ホルダと、該転写用ホルダを加圧する加圧手段とを備え、該加圧手段による前記転写用ホルダの加圧力が0.05〜10.0MPaとされたことを特徴とするものである。   The transfer device of the present invention comprises the above-described transfer holder of the present invention and a pressurizing unit that pressurizes the transfer holder, and the pressing force of the transfer holder by the pressurizing unit is 0.05 to 10. It is characterized by being 0 MPa.

本発明の磁気記録媒体は、磁気転写用である本発明の転写用原盤に前記被転写体を密着させ、前記転写情報を前記被転写面に磁気転写して製造されたものであることを特徴とするものである。   The magnetic recording medium of the present invention is manufactured by bringing the transfer object into close contact with the transfer master of the present invention for magnetic transfer and magnetically transferring the transfer information to the transfer surface. It is what.

本発明は、転写用原盤を湾曲させるのではなく、転写用原盤に厚み分布を持たせることで、転写用原盤と被転写体との密着が転写面の特定箇所から開始し順次全体に渡って起こることを実現したものである。本発明によれば、転写用原盤と被転写体との面内密着順序を良好に規定できるので、エア溜り等の発生を抑制し、転写用原盤と被転写体とを高精度に密着することが可能となる。   In the present invention, instead of curving the transfer master, the transfer master has a thickness distribution, so that the close contact between the transfer master and the transfer target starts from a specific location on the transfer surface and sequentially extends over the entire surface. It is what has happened. According to the present invention, it is possible to satisfactorily define the in-plane contact order between the transfer master and the transfer target, so that the occurrence of air accumulation or the like is suppressed, and the transfer master and the transfer target are closely contacted with each other. Is possible.

本発明は、転写用原盤に厚み分布を持たせる構成としているので、転写用原盤を湾曲させる特許文献1に記載の技術と異なり、面内密着順序を規定する構造の高精度な加工が容易である。また、特許文献1に記載の技術と異なり、密着開始初期の低圧力印加状態でも面内密着順序を規定する構造が良好に維持されるので、高精度な密着を安定的に実施できる。   In the present invention, since the transfer master is configured to have a thickness distribution, unlike the technique described in Patent Document 1 in which the transfer master is curved, high-precision processing of a structure that defines the in-plane contact order is easy. is there. In addition, unlike the technique described in Patent Document 1, a structure that prescribes the in-plane contact sequence is maintained well even in a low pressure application state at the beginning of contact, so that highly accurate contact can be stably performed.

図面を参照して、両面磁気転写を例として、本発明に係る実施形態の転写用原盤、これを用いる転写用ホルダ及び転写装置の構造について説明する。図1(a)及び(b)は本実施形態の転写用原盤、転写用ホルダ、及び転写装置の構成を示す側面図であり、(a)は一対の挟持部材の最離間状態、(b)は最接近状態を示す図である。図1中、転写用ホルダについては断面図で示してある。図3は転写用原盤の平面図、図4は磁気転写原理を示す転写用原盤及び被転写体のトラック方向厚み断面図である。   With reference to the drawings, the structure of a transfer master according to an embodiment of the present invention, a transfer holder using the same, and a transfer device will be described by taking double-sided magnetic transfer as an example. 1A and 1B are side views showing configurations of a transfer master, a transfer holder, and a transfer apparatus according to the present embodiment, wherein FIG. 1A is the most separated state of a pair of clamping members, and FIG. These are figures which show a closest approach state. In FIG. 1, the transfer holder is shown in a sectional view. FIG. 3 is a plan view of the transfer master, and FIG. 4 is a cross-sectional view in thickness in the track direction of the transfer master and the transfer object showing the principle of magnetic transfer.

図1に示す如く、本実施形態では、一対の転写用原盤11、12の表面情報が被転写体15に両面転写される。   As shown in FIG. 1, in this embodiment, the surface information of the pair of transfer masters 11 and 12 is transferred on both sides to the transfer target 15.

図3に示す如く、転写用原盤11、12は平面視、中心部に開口部を有する円盤状物であり、被転写体15に転写する信号パターンに応じた微細な表面凹凸パターン(表面情報)Pを有する複数の信号転写領域20と、隣接する信号転写領域20の間に位置し表面凹凸パターンPを有しない非信号転写領域30とを有するものである(表面凹凸パターンPは図3を参照)。複数の信号転写領域20は中心側から放射状に延び、隣接する信号転写領域20の間に略扇形の非信号転写領域30がある。すなわち、転写用原盤11、12は、トラック方向視、信号転写領域20と非信号転写領域30とを繰り返し有するものである。   As shown in FIG. 3, the transfer masters 11 and 12 are disk-like objects having an opening at the center in plan view, and a fine surface uneven pattern (surface information) corresponding to the signal pattern transferred to the transfer target 15. A plurality of signal transfer regions 20 having P and a non-signal transfer region 30 which is located between the adjacent signal transfer regions 20 and does not have the surface uneven pattern P (see FIG. 3 for the surface uneven pattern P) ). The plurality of signal transfer regions 20 extend radially from the center side, and there is a substantially fan-shaped non-signal transfer region 30 between adjacent signal transfer regions 20. That is, the transfer masters 11 and 12 repeatedly have the signal transfer region 20 and the non-signal transfer region 30 as viewed in the track direction.

図4(b)に示す如く、転写用原盤11、12の信号転写領域20は断面視、被転写体15に転写する信号パターンに応じた表面凹凸パターンPと略同じ表面凹凸パターンを有する金属製の転写用原盤基板(マスタ基板)13と、その表面形状に沿って積層され表面凹凸パターンPを有する磁性層14とから構成されている。   As shown in FIG. 4B, the signal transfer region 20 of the transfer masters 11 and 12 is made of a metal having a surface concavo-convex pattern substantially the same as the surface concavo-convex pattern P corresponding to the signal pattern transferred to the transfer target 15 in a sectional view. The master substrate for transfer (master substrate) 13 and a magnetic layer 14 having a surface unevenness pattern P laminated along the surface shape.

被転写体15としては、両面に磁気記録層(図示略)が形成され、中心部に開口部を有する円盤状のスレーブ媒体が使用される。   As the transfer target 15, a disk-shaped slave medium having a magnetic recording layer (not shown) on both sides and an opening at the center is used.

図4(a)に示す如く、あらかじめ被転写体15に対してトラック方向又は厚み方向に磁界Hinを印加し、磁気記録層(図示略)を初期磁化させる(トラック方向に磁界Hinを印加した場合について図示してある)。この状態で被転写体15を転写用原盤11(12)の表面に対向配置し、両者を密着させる。 As shown in FIG. 4A, a magnetic field H in is applied in advance in the track direction or the thickness direction to the transfer target 15 to initially magnetize the magnetic recording layer (not shown) (the magnetic field H in is applied in the track direction). This is shown in the figure). In this state, the transfer target 15 is placed opposite to the surface of the transfer master 11 (12), and both are brought into close contact with each other.

次に、図4(b)に示す如く、密着させた転写用原盤11(12)及び被転写体15に対して、初期磁化方向と略反対方向に転写用磁界Hduを印加する。この際、転写用磁界Hduは転写用原盤11(12)において被転写体15と密着した磁性層14の凸部14aにのみ略選択的に吸い込まれる。その結果、面内記録の場合、被転写体15の磁気記録層では、凸部14aに密着した部分の初期磁化は反転せずその他の部分の初期磁化が反転する。垂直記録の場合には逆に、被転写体15の磁気記録層では、凸部14aに密着した部分の初期磁化が反転しその他の部分の初期磁化は反転しない。このようにして、転写用原盤11、12の表面凹凸パターンPに応じた磁化パターンが被転写体15に磁気転写され、磁気記録媒体が製造される。 Next, as shown in FIG. 4B, a transfer magnetic field H du is applied in a direction substantially opposite to the initial magnetization direction to the transfer master 11 (12) and the transfer target 15 that are in close contact with each other. At this time, the transfer magnetic field H du is substantially selectively sucked only into the convex portion 14 a of the magnetic layer 14 in close contact with the transfer target 15 in the transfer master 11 (12). As a result, in the case of in-plane recording, in the magnetic recording layer of the transfer target 15, the initial magnetization of the portion in close contact with the convex portion 14a is not reversed but the initial magnetization of other portions is reversed. In the case of perpendicular recording, conversely, in the magnetic recording layer of the transfer target 15, the initial magnetization of the portion in close contact with the convex portion 14a is reversed and the initial magnetization of other portions is not reversed. In this way, the magnetization pattern corresponding to the surface unevenness pattern P of the transfer masters 11 and 12 is magnetically transferred to the transfer target 15, and a magnetic recording medium is manufactured.

図1に示す如く、本実施形態の転写用ホルダ1は、一対の転写用原盤11、12と被転写体15とを挟持し保持する互いに接近離間自在な一対の挟持部材41、42から概略構成されている。挟持部材41、42の内面が転写用原盤11、12及び被転写体15を保持する保持面41a、42aとなっている。挟持部材41、42には減圧ポンプ等の吸引手段に接続された複数の吸引孔(図示略)が開孔されており、転写用原盤11、12は各々挟持部材41、42の保持面41a、42aに吸引固定されている。吸引孔の形状は特に制限なく、円筒状や溝状等が挙げられる。   As shown in FIG. 1, the transfer holder 1 of this embodiment is schematically composed of a pair of sandwiching members 41 and 42 that can sandwich and hold a pair of transfer masters 11 and 12 and a transfer target 15 and can be moved close to and away from each other. Has been. The inner surfaces of the holding members 41 and 42 are holding surfaces 41 a and 42 a for holding the transfer masters 11 and 12 and the transfer target 15. The holding members 41 and 42 have a plurality of suction holes (not shown) connected to suction means such as a decompression pump, and the transfer masters 11 and 12 respectively hold the holding surfaces 41a and 41a of the holding members 41 and 42, respectively. It is fixed by suction to 42a. The shape of the suction hole is not particularly limited, and examples thereof include a cylindrical shape and a groove shape.

図2(a)に示す如く、挟持部材41、42の保持面41a、42aには複数の吸引孔(図示略)が開孔された弾性材51、52を取り付け、転写用原盤11、12が弾性材51、52を介して挟持部材41、42に吸引固定される構成とすることが好ましい。弾性材51、52を設けることで、転写用原盤11、12及び被転写体15の厚みや挟持部材41、42の保持面41a、42aの形状の微小なバラツキが補正され、転写用原盤11、12と被転写体15との密着を良好に実施でき、好ましい。弾性材51、52は特に被転写体15の面積が大きい場合に有効である。弾性材は少なくとも一方の挟持部材の保持面に設ける構成とすれば、かかる効果が得られる。   As shown in FIG. 2A, elastic materials 51 and 52 each having a plurality of suction holes (not shown) are attached to the holding surfaces 41a and 42a of the clamping members 41 and 42, and the transfer masters 11 and 12 are attached. It is preferable to adopt a configuration that is sucked and fixed to the holding members 41 and 42 via the elastic members 51 and 52. By providing the elastic members 51 and 52, the thickness of the transfer masters 11 and 12 and the transfer target 15 and the minute variations in the shape of the holding surfaces 41a and 42a of the holding members 41 and 42 are corrected. 12 and transfer target 15 can be satisfactorily carried out, which is preferable. The elastic materials 51 and 52 are particularly effective when the area of the transfer target 15 is large. This effect can be obtained if the elastic material is provided on the holding surface of at least one clamping member.

挟持部材41、42は、転写用原盤11、12及び被転写体15の形状に対応した略円板状部材である。挟持部材42には、その周面に沿って転写用ホルダ1の周面をなす周壁43が取り付けられている。周壁43は挟持部材42の保持面と反対側の面42b側から挟持部材42の周面側に折曲された断面視略L字状を呈するもので、挟持部材42の面42bに平行な板状部材43aと、挟持部材42の周面に平行な板状部材43bと、板状部材43a/43b間に介挿されたバネ部材43cとから構成されている。板状部材43bはバネ部材43cの伸縮によって挟持部材42に対して摺動自在とされている。   The clamping members 41 and 42 are substantially disk-shaped members corresponding to the shapes of the transfer masters 11 and 12 and the transfer target 15. A peripheral wall 43 that forms the peripheral surface of the transfer holder 1 is attached to the clamping member 42 along the peripheral surface thereof. The peripheral wall 43 is substantially L-shaped in cross-section when bent from the surface 42b side opposite to the holding surface of the clamping member 42 to the peripheral surface side of the clamping member 42, and is a plate parallel to the surface 42b of the clamping member 42 It is comprised from the plate-shaped member 43a, the plate-shaped member 43b parallel to the surrounding surface of the clamping member 42, and the spring member 43c inserted between plate-shaped member 43a / 43b. The plate-like member 43b is slidable with respect to the holding member 42 by expansion and contraction of the spring member 43c.

転写用ホルダ1では、図1(a)に示す如く、離間状態の一対の挟持部材41、42に固定された一対の転写用原盤11、12の間に被転写体15が供給され、一対の転写用原盤11、12及び被転写体15が対向配置される。その後、図1(b)に示す如く、一対の挟持部材41、42が互いに接近して転写用原盤11/被転写体15/転写用原盤12が加圧密着される。周壁43に伸縮自在なバネ部材43cが組み込まれているので、転写用原盤11、12及び被転写体15の密着終了時には、転写用原盤11、12及び被転写体15の厚みによらず、挟持部材41と周壁43とが密着し、転写用ホルダ1内が封止される。   In the transfer holder 1, as shown in FIG. 1A, a transfer target 15 is supplied between a pair of transfer masters 11 and 12 fixed to a pair of spaced-apart clamping members 41 and 42. The transfer masters 11 and 12 and the transfer target 15 are arranged to face each other. Thereafter, as shown in FIG. 1B, the pair of clamping members 41 and 42 come close to each other, and the transfer master 11 / the transfer target 15 / transfer master 12 are brought into pressure contact. Since the elastic spring member 43c is incorporated in the peripheral wall 43, when the close contact between the transfer masters 11 and 12 and the transfer target 15 is finished, the transfer masters 11 and 12 and the transfer target 15 are sandwiched regardless of the thickness. The member 41 and the peripheral wall 43 are in close contact with each other, and the inside of the transfer holder 1 is sealed.

本実施形態の転写装置7は転写用ホルダ1を備えたものであり、その他にも上記磁気転写を実施するに必要な装置構成を備えたものである。転写装置7には例えば、被転写体15を収容する被転写体収容部、被転写体収容部から転写用ホルダ1に被転写体15を移送するロボットアーム等の移送手段、転写用ホルダ1をなす一対の挟持部材41、42のうち少なくとも一方を移動させ、一対の挟持部材41、42の接近離間を制御する挟持部材移動手段、及び転写用ホルダ1の外側から転写用ホルダ1に保持された転写用原盤11、12及び被転写体15に磁界を印加する磁界印加手段等が備えられている。   The transfer device 7 of this embodiment is provided with a transfer holder 1, and in addition, has a device configuration necessary for carrying out the magnetic transfer. The transfer device 7 includes, for example, a transfer body storage section that stores the transfer body 15, transfer means such as a robot arm that transfers the transfer body 15 from the transfer body storage section to the transfer holder 1, and the transfer holder 1. At least one of the pair of sandwiching members 41, 42 is moved, the sandwiching member moving means for controlling the approach and separation of the pair of sandwiching members 41, 42, and held by the transfer holder 1 from the outside of the transfer holder 1 A magnetic field applying means for applying a magnetic field to the transfer masters 11 and 12 and the transfer target 15 is provided.

図1では転写用ホルダ1以外の転写装置7の構成要素として、挟持部材移動手段の構成要素である押圧部材(加圧手段)61、62のみを図示してある。押圧部材61、62は挟持部材41、42の保持面と反対側の面41b、42bに取り付けられており、挟持部材41、42を支持すると共に、一対の挟持部材41、42を互いに接近する方向に押圧する部材である。   In FIG. 1, only pressing members (pressing means) 61 and 62 which are constituent elements of the holding member moving means are shown as constituent elements of the transfer device 7 other than the transfer holder 1. The pressing members 61 and 62 are attached to the surfaces 41b and 42b opposite to the holding surfaces of the holding members 41 and 42, support the holding members 41 and 42, and make the pair of holding members 41 and 42 approach each other. It is a member that presses against.

以下、本実施形態の特徴である転写用原盤11、12の構成と、転写用原盤11、12及び被転写体15の密着プロセスについて説明する。   Hereinafter, the structure of the transfer masters 11 and 12 and the contact process of the transfer masters 11 and 12 and the transfer target 15 which are the characteristics of the present embodiment will be described.

本実施形態の転写用原盤11、12は、外周側から中心側に向けて連続的に厚くなり中心側が最も厚い厚み分布を有している。挟持部材41、42の保持面41a、42aは平坦であるので、挟持部材41、42に比して柔軟で挟持部材41、42に吸引固定される転写用原盤11、12は、挟持部材41、42側の面11b、12bが平坦となり、転写面11a、12aが上記厚み分布に応じた形状となる。本実施形態では、転写面11a、12aは中心に対して対称な部分球面状の凸面形状であり、外周側から中心側に向けて連続的に面高さが高くなり中心側が最も突出した高低分布を有するものとなっている。図中、中心軸線に符号Aを付してある。   The transfer masters 11 and 12 according to the present embodiment have a thickness distribution in which the thickness increases continuously from the outer peripheral side toward the central side and is thickest on the central side. Since the holding surfaces 41 a and 42 a of the holding members 41 and 42 are flat, the transfer masters 11 and 12 that are flexible compared to the holding members 41 and 42 and are sucked and fixed to the holding members 41 and 42 are the holding members 41 and 42. The surfaces 11b and 12b on the 42 side are flat, and the transfer surfaces 11a and 12a have a shape corresponding to the thickness distribution. In the present embodiment, the transfer surfaces 11a and 12a are partially spherical convex surfaces symmetrical with respect to the center, and the height distribution is such that the surface height continuously increases from the outer peripheral side toward the center side and the center side protrudes most. It has become. In the figure, the reference A is attached to the central axis.

転写用原盤11、12における信号転写領域20(転写情報を有する領域)の最大厚み差は1〜100μm、特に5〜100μmであることが好ましい。かかる微小な厚み分布を有する転写用原盤11、12は、研磨、切削、エッチング、フォトリソグラフィー等によって精度よく加工することができる。また、微小な厚み分布を有する転写用原盤11、12は、研磨、切削、エッチング、フォトリソグラフィー等によって加工された型を用いて電鋳等を実施することでも精度よく製造加工できる。   The maximum thickness difference of the signal transfer area 20 (area having transfer information) in the transfer masters 11 and 12 is preferably 1 to 100 μm, and particularly preferably 5 to 100 μm. The transfer masters 11 and 12 having such a minute thickness distribution can be processed with high precision by polishing, cutting, etching, photolithography, or the like. In addition, the transfer masters 11 and 12 having a minute thickness distribution can be manufactured and processed with high accuracy by performing electroforming or the like using a mold processed by polishing, cutting, etching, photolithography, or the like.

転写用原盤11、12の片面又は両面には、必要に応じて表面処理が施される。例えば、摩擦力低減等を目的として、転写用原盤11、12にブラスト加工等の粗面化処理を施すことができる。   One or both surfaces of the transfer masters 11 and 12 are subjected to surface treatment as necessary. For example, for the purpose of reducing the frictional force, the transfer masters 11 and 12 can be subjected to a roughening process such as blasting.

転写用ホルダ1の外側から転写用ホルダ1内に保持された転写用原盤11、12及び被転写体15に良好に磁界を印加するため、挟持部材41、42の信号転写領域20に対応する領域の厚みは通常mmオーダーであり、10mm以下が好ましい。mmオーダー厚みの挟持部材41、42に対して転写用原盤11、12の厚み分布はμmオーダーと小さいが、図面では視認しやすくするため、転写用原盤11、12の厚み分布を誇張して図示してある。   An area corresponding to the signal transfer area 20 of the holding members 41 and 42 in order to satisfactorily apply a magnetic field to the transfer masters 11 and 12 and the transfer target 15 held in the transfer holder 1 from the outside of the transfer holder 1. The thickness is usually on the order of mm, and is preferably 10 mm or less. Although the thickness distribution of the transfer masters 11 and 12 is as small as μm with respect to the sandwiching members 41 and 42 having a thickness of mm order, the thickness distribution of the transfer masters 11 and 12 is exaggerated for easy understanding in the drawings. It is shown.

本実施形態では、転写用原盤11、12の最も突出した箇所である内周部から被転写体15との密着が開始される。すなわち、転写用原盤11と被転写体15との密着及び被転写体15と転写用原盤12との密着はいずれも、転写面11a、12aの内周部から開始し外周部に向けて順次全体に渡って起こる。   In this embodiment, the close contact with the transfer target 15 is started from the inner peripheral portion that is the most protruding portion of the transfer masters 11 and 12. That is, both the close contact between the transfer master 11 and the transfer target 15 and the close contact between the transfer target 15 and the transfer master 12 start from the inner peripheral portion of the transfer surfaces 11a and 12a and sequentially move toward the outer peripheral portion. Happens across.

本実施形態では、図1(b)あるいは図2(b)に示す如く、転写面11a、12aの信号転写領域20の最大高低差が加圧密着終了時に密着開始前より低減し、密着終了時の転写面11a、12aが平坦面又はそれに近い面形状となるよう、転写面11a、12aの材質等が設計されている。かかる構成では、密着終了時の転写用原盤11、12の転写面と反対側の面11b、12bが外側に押し出されて、例えば図示する凸面形状となる。転写用原盤11、12の転写面と反対側の面11b、12bの押出しに伴って、挟持部材41、42あるいは弾性材51、52が変形する。加圧密着によって転写面11a、12aの高低差が密着前より低減し、転写面11a、12aが平坦面又はそれに近い面形状となることで、一対の転写用原盤11、12と被転写体15との密着が全面に渡って良好に実施され、好ましい。   In the present embodiment, as shown in FIG. 1B or FIG. 2B, the maximum height difference of the signal transfer region 20 on the transfer surfaces 11a and 12a is reduced from before the close contact at the end of the press contact, and at the end of the close contact. The material and the like of the transfer surfaces 11a and 12a are designed so that the transfer surfaces 11a and 12a have a flat surface or a surface shape close thereto. In such a configuration, the surfaces 11b and 12b opposite to the transfer surfaces of the transfer masters 11 and 12 at the end of the close contact are pushed outward to form, for example, a convex shape as shown in the figure. As the surfaces 11b and 12b opposite to the transfer surfaces of the transfer masters 11 and 12 are pushed, the holding members 41 and 42 or the elastic members 51 and 52 are deformed. The pressure difference between the transfer surfaces 11a and 12a is reduced by the pressure contact, and the transfer surfaces 11a and 12a are flat or close to the surface shape, so that the pair of transfer masters 11 and 12 and the transfer target 15 are transferred. Adhesion with is favorably carried out over the entire surface, which is preferable.

本発明者は、転写用原盤11、12の信号転写領域20の最大厚み差を1μm以上、好ましくは5μm以上とすることで、面内密着順序が上記のように良好に規定されることを見出している。本発明者は、同領域の最大厚み差を100μm以下とすることで、転写用原盤11、12が挟持部材41、42(又は弾性材51、52)から浮くことなく、転写用原盤11、12の面全体が挟持部材41、42(又は弾性材51、52)に良好に密着して転写用原盤11、12が転写用ホルダ1に安定的に保持されることを見出している。また、同領域の最大厚み差を100μm以下とすることで、転写用原盤11、12の湾曲による損傷が抑制されることも見出している。   The present inventor has found that the in-plane contact order is well defined as described above by setting the maximum thickness difference of the signal transfer region 20 of the transfer masters 11 and 12 to 1 μm or more, preferably 5 μm or more. ing. The inventor of the present invention sets the maximum thickness difference in the region to 100 μm or less, so that the transfer masters 11 and 12 do not float from the sandwiching members 41 and 42 (or the elastic members 51 and 52), and the transfer masters 11 and 12 It has been found that the entire surface of the sheet is in good contact with the clamping members 41 and 42 (or the elastic members 51 and 52) and the transfer masters 11 and 12 are stably held by the transfer holder 1. It has also been found that by causing the maximum thickness difference in the region to be 100 μm or less, damage due to the curvature of the transfer masters 11 and 12 is suppressed.

本実施形態において、押圧部材(加圧手段)61、62による転写用ホルダ1の加圧力は好ましくは0.05〜10.0MPaである。磁気転写では加圧力が0.05〜1.0MPaであることが特に好ましい。加圧力が過小では転写用原盤11、12と被転写体15との密着が不充分となる恐れがあり、加圧力が過大では転写用原盤11、12と被転写体15との密着速度が速くなりすぎ、面内密着順序が上記のように良好に規定されなくなる恐れがある。   In the present embodiment, the pressure applied to the transfer holder 1 by the pressing members (pressing means) 61 and 62 is preferably 0.05 to 10.0 MPa. In magnetic transfer, the applied pressure is particularly preferably 0.05 to 1.0 MPa. If the applied pressure is too small, the transfer masters 11 and 12 and the transfer target 15 may not be in close contact with each other. If the applied pressure is excessive, the contact speed between the transfer masters 11 and 12 and the transfer target 15 is high. There is a possibility that the in-plane contact order is not well defined as described above.

本実施形態の転写用原盤11、12、転写用ホルダ1、及び転写装置7は、以上のように構成されている。   The transfer masters 11 and 12, the transfer holder 1, and the transfer device 7 according to the present embodiment are configured as described above.

本実施形態は、転写用原盤を湾曲させるのではなく、転写用原盤11、12に厚み分布を持たせることで、転写用原盤11、12と被転写体15との密着が転写面11a、12aの特定箇所から開始し順次全体に渡って起こることを実現したものである。本実施形態によれば、転写用原盤11、12と被転写体15との面内密着順序を良好に規定できるので、エア溜り等の発生を抑制し、転写用原盤11、12と被転写体15とを高精度に密着することが可能となる。   In this embodiment, instead of curving the transfer master, the transfer masters 11 and 12 have a thickness distribution so that the transfer masters 11 and 12 and the transfer target 15 are in close contact with the transfer surfaces 11a and 12a. It starts from a specific point of and realizes what happens sequentially throughout. According to this embodiment, since the in-plane contact order between the transfer masters 11 and 12 and the transfer target 15 can be well defined, the occurrence of air accumulation or the like is suppressed, and the transfer masters 11 and 12 and the transfer target are suppressed. 15 can be closely attached to each other with high accuracy.

本実施形態では、転写用原盤11、12の厚み分布を転写用原盤11、12の中心に対して対称な分布(中心軸線Aに対して回転対称な分布)としているので、転写用原盤11、12と被転写体15との密着が内周部から外周部に向けて順次周方向均等に安定的に進行し、面内密着順序が良好に規定される。   In the present embodiment, the thickness distribution of the transfer masters 11 and 12 is a distribution that is symmetric with respect to the center of the transfer masters 11 and 12 (a distribution that is rotationally symmetric with respect to the central axis A). 12 and the transfer target 15 are sequentially and stably progressed uniformly from the inner peripheral portion toward the outer peripheral portion in the circumferential direction, and the in-plane contact order is well defined.

本実施形態では、転写用原盤11、12を湾曲させる特許文献1に記載の技術と異なり、面内密着順序を規定する転写用原盤11、12の高精度な加工を容易にかつ低コストに実施できる。上記の如く、転写用原盤11、12は例えば、研磨、切削、エッチング、フォトリソグラフィー等によって精度よく加工することができる。転写用原盤11、12はまた、研磨、切削、エッチング、フォトリソグラフィー等によって加工された型を用いて電鋳等を実施することでも精度よく製造加工することができる。また、特許文献1に記載の技術と異なり、転写用原盤11、12は挟持部材41、42(又は弾性材51、52)から浮くことなく面全体が転写用ホルダ1に安定的に保持されるので、密着開始初期の低圧力印加状態でも面内密着順序を規定する転写用原盤11、12の形状が良好に維持され、高精度な密着を安定的に実施できる。   In this embodiment, unlike the technique described in Patent Document 1 in which the transfer masters 11 and 12 are curved, high-precision processing of the transfer masters 11 and 12 that defines the in-plane contact order is easily performed at low cost. it can. As described above, the transfer masters 11 and 12 can be accurately processed by, for example, polishing, cutting, etching, photolithography, or the like. The transfer masters 11 and 12 can also be manufactured and processed with high accuracy by performing electroforming or the like using a mold processed by polishing, cutting, etching, photolithography, or the like. Unlike the technique described in Patent Document 1, the entire surfaces of the transfer masters 11 and 12 are stably held by the transfer holder 1 without floating from the sandwiching members 41 and 42 (or the elastic members 51 and 52). Therefore, the shapes of the transfer masters 11 and 12 that define the in-plane contact sequence can be maintained well even in a low pressure application state at the beginning of contact, and high-precision contact can be stably performed.

本実施形態では磁界印加終了後の被転写体15を取り出す際には、転写用ホルダ1への加圧力の解除によって、転写用原盤11、12に元の形状に戻ろうとする復元力が作用する。この復元力は被転写体15を転写用原盤11、12の転写面から剥離する力として作用するので、被転写体15の転写用原盤11、12からの剥離・取出しも容易となる。   In the present embodiment, when the transferred object 15 is removed after the application of the magnetic field, a restoring force for returning to the original shape acts on the transfer masters 11 and 12 by releasing the applied pressure to the transfer holder 1. . Since the restoring force acts as a force for peeling the transfer body 15 from the transfer surfaces of the transfer masters 11 and 12, the transfer object 15 can be easily peeled from and removed from the transfer masters 11 and 12.

本実施形態の転写用ホルダ1及び転写装置7は、転写用原盤11、12を用いるものであるので高精度な磁気転写を実施できるものとなる。本実施形態の転写用ホルダ1及び転写装置7を用いることで、転写精度が良好な磁気記録媒体を安定的に製造することができる。   Since the transfer holder 1 and the transfer device 7 of this embodiment use the transfer masters 11 and 12, high-precision magnetic transfer can be performed. By using the transfer holder 1 and the transfer device 7 of the present embodiment, a magnetic recording medium with good transfer accuracy can be stably manufactured.

(その他の態様)
上記実施形態は一例にすぎず、適宜設計変更可能である。
(Other aspects)
The above embodiment is merely an example, and the design can be changed as appropriate.

転写用原盤11、12は、被転写体15との密着が転写面11a、12aの特定箇所から開始し順次全体に渡って起こる厚み分布を有するものであれば、上記実施形態と同様の効果が得られる。   The transfer masters 11 and 12 have the same effects as those of the above-described embodiment as long as the masters 11 and 12 have a thickness distribution that starts from a specific portion of the transfer surfaces 11a and 12a and sequentially occurs over the entire surface. can get.

図5(a)に示す転写用ホルダ2は、転写用原盤11、12が中心側から外周側に向けて連続的に厚くなり外周側が最も突出した厚み分布を有し、転写面11a、12aが被転写体15の中心に対して対称な部分球面状の凹面形状となる態様である。かかる構成では、転写用原盤11、12と被転写体15との密着が外周部から内周部に向けて順次起こる。   The transfer holder 2 shown in FIG. 5A has a thickness distribution in which the transfer masters 11 and 12 are continuously thick from the center side toward the outer peripheral side, and the outer peripheral side protrudes most. The transfer surfaces 11a and 12a are This is a mode in which the concave shape is a partial spherical shape that is symmetric with respect to the center of the transfer body 15. In such a configuration, the close contact between the transfer masters 11 and 12 and the transfer target 15 occurs sequentially from the outer peripheral portion toward the inner peripheral portion.

転写用原盤11と転写用原盤12とは異なる厚み分布としてもよい。図5(b)に示す転写用ホルダ3は、転写用原盤11は図1(a)に示した厚み分布を有し、転写用原盤12は図4(a)に示した厚み分布を有する態様である。   The transfer master 11 and the transfer master 12 may have different thickness distributions. In the transfer holder 3 shown in FIG. 5B, the transfer master 11 has the thickness distribution shown in FIG. 1A, and the transfer master 12 has the thickness distribution shown in FIG. 4A. It is.

図6(a)、(b)に示す転写用ホルダ4、5は、上記実施形態と同様、転写用原盤11、12が外周側から中心側に向けて連続的に厚くなり中心側が最も突出した厚み分布を有するが、転写面11a、12aが被転写体15の中心に対して対称な略円錐状の凸面形状となる態様である。   In the transfer holders 4 and 5 shown in FIGS. 6A and 6B, the transfer masters 11 and 12 are continuously thickened from the outer peripheral side toward the center side, and the center side protrudes the most, as in the above embodiment. Although it has a thickness distribution, the transfer surfaces 11 a and 12 a have a substantially conical convex shape symmetrical with respect to the center of the transfer target 15.

転写用原盤11、12は径に対して対称な厚み分布を有し、転写面11a、12aが径に対して対称な面形状となる構成でもよい。かかる構成でも、転写用原盤11、12と被転写体15との密着が転写面形状に対応して対称的に進行し、面内密着順序が良好に規定される。径に対して対称な面形状としては放物面状、部分円筒面状、鞍面状等が挙げられる。   The transfer masters 11 and 12 may have a thickness distribution that is symmetric with respect to the diameter, and the transfer surfaces 11a and 12a may have a surface shape that is symmetric with respect to the diameter. Even in such a configuration, the close contact between the transfer masters 11 and 12 and the transfer target 15 proceeds symmetrically corresponding to the shape of the transfer surface, and the in-plane contact order is well defined. Examples of the surface shape symmetric with respect to the diameter include a parabolic shape, a partial cylindrical surface shape, and a saddle surface shape.

図7に示す転写用ホルダ6Aは、転写用原盤11、12の転写面11a、12aが部分円筒状となる態様である。図7(a)は部分円筒状の転写面11aの斜視図である。図7(b)は転写用原盤11〜挟持部材41を転写用原盤11の転写面側から見た平面図、及び転写用原盤11〜挟持部材41を90°ずれた方向から見た2つの側面図(挟持部材41については断面図で示してある。)である。挟持部材42側は同様の構成であるので、図示を省略してある。   The transfer holder 6A shown in FIG. 7 is an aspect in which the transfer surfaces 11a and 12a of the transfer masters 11 and 12 are partially cylindrical. FIG. 7A is a perspective view of a partially cylindrical transfer surface 11a. FIG. 7B is a plan view of the transfer master 11 to the sandwiching member 41 as viewed from the transfer surface side of the transfer master 11 and two side surfaces of the transfer master 11 to the sandwiching member 41 as viewed from a direction shifted by 90 °. It is a figure (The clamping member 41 is shown with sectional drawing). Since the holding member 42 side has the same configuration, the illustration is omitted.

図8に示す転写用ホルダ6Bは、転写用原盤11、12の転写面11a、12aが鞍面状となる態様である。図8は図7に対応する図である。鞍面状の転写面11a(12a)では、外周部の同径上の2箇所が最も突出し、そこから90°ずれた箇所が最も窪んだ凹凸面形状となる。かかる構成では、転写用原盤11、12と被転写体15との密着が、最も突出した外周部の同径上の2箇所から開始し面高さの高い方から低い方に向けて順次進行する。   The transfer holder 6B shown in FIG. 8 is an embodiment in which the transfer surfaces 11a and 12a of the transfer masters 11 and 12 are in the shape of a flange. FIG. 8 corresponds to FIG. On the flange-shaped transfer surface 11a (12a), the two locations on the same diameter of the outer periphery protrude most, and the portion shifted by 90 ° is the most concave and convex surface shape. In such a configuration, the close contact between the transfer masters 11 and 12 and the transfer target 15 starts from two locations on the same diameter of the outermost protruding portion and proceeds sequentially from the highest surface height to the lower one. .

転写用原盤11、12は、厚みの厚い側から薄い側に向けて連続的に厚みが変化するものであることが好ましいが、厚みの厚い側から薄い側に向けて段階的に厚みが変化するものとしてもよい。   The transfer masters 11 and 12 preferably have a thickness that continuously changes from the thicker side to the thinner side, but the thickness changes stepwise from the thicker side to the thinner side. It may be a thing.

転写用原盤11、12の挟持部材41、42への固定は吸引固定に制限されず、接着剤や磁力等による固定でもよい。   The fixing of the transfer masters 11 and 12 to the sandwiching members 41 and 42 is not limited to suction fixing, but may be fixing by an adhesive or magnetic force.

転写用ホルダ1〜5、6A、6Bは、本発明の転写用原盤を一対用いたものであるが、少なくとも一方が本発明の転写用原盤であれば、厚み分布のない平坦な転写用原盤のみを用いる従来の転写用ホルダよりも良好な密着が実施できる。   The transfer holders 1 to 5, 6A, and 6B use a pair of transfer masters according to the present invention. If at least one of the transfer masters according to the present invention is used, only a flat transfer master with no thickness distribution is used. It is possible to carry out better adhesion than conventional transfer holders using.

上記実施形態は両面転写について説明したが、本発明は、離間状態の一対の挟持部材41、42の間に1個の転写用原盤11及び被転写体15を互いに対向配置し、一対の挟持部材41、42を互いに接近させて転写用原盤11及び被転写体15を加圧密着し、被転写体15に転写用原盤11の転写情報を転写する片面転写にも適用可能である。   In the above-described embodiment, the double-sided transfer has been described. However, in the present invention, one transfer master 11 and the transfer target 15 are arranged to face each other between a pair of holding members 41 and 42 in a separated state, and a pair of holding members. It can also be applied to single-sided transfer in which transfer information on the transfer master 11 is transferred to the transfer target 15 by pressing and adhering the transfer master 11 and the transfer target 15 by bringing 41 and 42 close to each other.

本発明は、厳密な位置調整が必要な磁気転写に好ましく適用できるが、転写用原盤と被転写体とを密着させて、磁気情報や形状等の情報を転写する任意の転写技術に適用可能である。   The present invention can be preferably applied to magnetic transfer that requires strict position adjustment, but can be applied to any transfer technology that transfers information such as magnetic information and shape by bringing a transfer master and a transfer target into close contact with each other. is there.

本発明は、表面に所定の凹凸パターンを有する転写用原盤を被転写体に密着させ、転写用原盤の凹凸パターンに応じた磁気情報や凹凸パターン形状等の情報を転写する、磁気転写、ナノインプリンティング、パターンドメディア等の転写技術に好ましく適用することができる。   The present invention relates to magnetic transfer, nano-in transfer, in which a transfer master having a predetermined concavo-convex pattern on the surface is brought into close contact with a transfer target, and information such as magnetic information and concavo-convex pattern shape corresponding to the concavo-convex pattern of the transfer master is transferred. It can be preferably applied to a transfer technique such as printing and patterned media.

(a)、(b)は本発明に係る実施形態の転写用原盤、転写用ホルダ、及び転写装置の構成を示す側面図(A), (b) is a side view which shows the structure of the master for transfer of the embodiment which concerns on this invention, the holder for transfer, and the transfer apparatus. (a)、(b)は本発明の転写用ホルダの他の態様を示す図(A), (b) is a figure which shows the other aspect of the holder for transcription | transfer of this invention. 転写用原盤の平面図Plan view of master for transfer 磁気転写原理を示す断面図Sectional view showing the principle of magnetic transfer (a)、(b)は本発明の転写用原盤及び転写用ホルダの他の態様を示す図(A), (b) is a figure which shows the other aspect of the master for transcription | transfer of this invention, and the holder for transcription | transfer. (a)、(b)は本発明の転写用原盤及び転写用ホルダの他の態様を示す図(A), (b) is a figure which shows the other aspect of the master for transcription | transfer of this invention, and the holder for transcription | transfer. (a)、(b)は本発明の転写用原盤及び転写用ホルダの他の態様を示す図(A), (b) is a figure which shows the other aspect of the master for transcription | transfer of this invention, and the holder for transcription | transfer. (a)、(b)は本発明の転写用原盤及び転写用ホルダの他の態様を示す図(A), (b) is a figure which shows the other aspect of the master for transcription | transfer of this invention, and the holder for transcription | transfer.

符号の説明Explanation of symbols

1〜6A、6B 転写用ホルダ
7 転写装置
11、12 転写用原盤
11a、12a 転写面
11b、12b 転写面と反対側の面
15 被転写体
41、42 挟持部材
51、52 弾性材
61、62 押圧部材(加圧手段)
1-6A, 6B Transfer holder 7 Transfer device 11, 12 Transfer master 11a, 12a Transfer surface 11b, 12b Surface opposite to the transfer surface 15 Transfer object 41, 42 Holding member 51, 52 Elastic material 61, 62 Press Member (Pressurizing means)

Claims (9)

転写情報を有する転写面を有し、該転写面に被転写体が密着され前記転写情報の転写が行われる転写用原盤において、前記被転写体との密着が前記転写面の特定箇所から開始し順次全体に渡って起こる厚み分布を有することを特徴とする転写用原盤。   In a transfer master having a transfer surface having transfer information, and the transfer object is brought into close contact with the transfer surface and the transfer information is transferred, the close contact with the transfer object starts from a specific location on the transfer surface. A transfer master having a thickness distribution that occurs sequentially over the whole. 前記厚み分布は、前記転写情報を有する領域の最大厚み差が1〜100μmの分布であることを特徴とする請求項1に記載の転写用原盤。   2. The master for transfer according to claim 1, wherein the thickness distribution is a distribution having a maximum thickness difference of 1 to 100 μm in a region having the transfer information. 前記転写用原盤及び前記被転写体は円盤状であり、前記厚み分布は前記転写用原盤の中心又は径に対して対称な分布であることを特徴とする請求項1又は2に記載の転写用原盤。   The transfer master according to claim 1 or 2, wherein the transfer master and the transfer target are disk-shaped, and the thickness distribution is symmetrical with respect to a center or a diameter of the transfer master. Master. 前記厚み分布は、外周側から中心側に向けて連続的に厚くなる又は中心側から外周側に向けて連続的に厚くなる厚み分布であることを特徴とする請求項3に記載の転写用原盤。   4. The transfer master according to claim 3, wherein the thickness distribution is a thickness distribution that continuously increases from the outer peripheral side toward the center side or continuously increases from the center side toward the outer periphery side. . 前記転写面と反対側の面が平坦面であり、前記転写面が前記厚み分布に応じた高低分布を有するものであり、該転写面の前記転写情報を有する領域の最大高低差は、前記密着の終了時に前記密着の開始前より低減する構成とされたことを特徴とする請求項1〜4のいずれかに記載の転写用原盤。   The surface opposite to the transfer surface is a flat surface, the transfer surface has a height distribution corresponding to the thickness distribution, and the maximum height difference of the region having the transfer information on the transfer surface is the adhesion The transfer master according to any one of claims 1 to 4, wherein the transfer master is configured to be reduced from the start of the close contact at the end of the step. 磁気転写用であることを特徴とする請求項1〜5のいずれかに記載の転写用原盤。   The master for transfer according to any one of claims 1 to 5, which is for magnetic transfer. 請求項1〜6のいずれかに記載の転写用原盤と前記被転写体とを挟持し保持する互いに接近離間自在な一対の挟持部材を備えたことを特徴とする転写用ホルダ。   7. A transfer holder comprising a pair of clamping members that are capable of approaching and separating from each other and that holds and holds the transfer master according to claim 1 and the transfer target. 請求項7に記載の転写用ホルダと、該転写用ホルダを加圧する加圧手段とを備え、該加圧手段による前記転写用ホルダの加圧力が0.05〜10.0MPaとされたことを特徴とする転写装置。   A transfer holder according to claim 7 and a pressurizing unit that pressurizes the transfer holder, and the pressing force of the transfer holder by the pressurizing unit is set to 0.05 to 10.0 MPa. Characteristic transfer device. 請求項6に記載の転写用原盤に前記被転写体を密着させ、前記転写情報を前記被転写面に磁気転写して製造されたものであることを特徴とする磁気記録媒体。   7. A magnetic recording medium manufactured by bringing the transfer medium into close contact with the transfer master according to claim 6 and magnetically transferring the transfer information onto the transfer surface.
JP2005069576A 2005-03-11 2005-03-11 Original disk for transfer, holder for transfer, transfer device and magnetic recording medium Withdrawn JP2006252705A (en)

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