JP2005250179A - Photosetting resin composition for black matrix, method for manufacturing substrate for liquid crystal display panel, black matrix, and liquid crystal display panel - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a photosetting resin composition for a black matrix with which a liquid crystal display panel having no leak of light or without display irregularity on liquid crystal display and having excellent quality of the display screen can be easily manufactured in the manufacture of a liquid crystal display panel, and to provide a method for manufacturing a substrate for a liquid crystal display panel by using the above photosetting resin composition for a black matrix, and to provide a black matrix and a liquid crystal display panel. <P>SOLUTION: The photosetting resin composition for a black matrix contains a resist component, a colorant for a black matrix and spacer fine particles. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

The present invention provides a photocurable black matrix resin composition capable of easily producing a liquid crystal display panel having no display unevenness in liquid crystal display and excellent display screen quality in the production of a liquid crystal display panel, and the photocuring The present invention relates to a method for producing a substrate for a liquid crystal display panel using a resin composition for a black matrix, a black matrix, and a liquid crystal display panel.

A liquid crystal display panel used for manufacturing a liquid crystal display panel or the like generally forms a black matrix and colored pixels such as red (R), green (G), and blue (B) on a glass substrate by a photolithography technique. Then, after forming a transparent electrode such as ITO and an alignment film thereon, a counter substrate is fixed at a certain interval, and liquid crystal is sealed between them.

In such a liquid crystal display panel, when the distance between the liquid crystal display panel substrate and the counter substrate is not uniform, the electric field strength applied to the liquid crystal enclosed between them when the liquid crystal display panel is driven differs. It was a cause of unevenness.
Therefore, in order to keep the distance between the liquid crystal display panel and the counter substrate uniform, resin particles called spacers having a diameter of about several μm (spacer particles) are usually interposed between them.

However, in the conventional method for manufacturing a liquid crystal display panel, spacer fine particles are randomly scattered on the liquid crystal display panel, and therefore, the spacer fine particles may be arranged in the colored pixel portion. If there are spacer fine particles in the colored pixel part, there is a problem that the image quality may be deteriorated, such as light leakage from the light leakage of the spacer part or disturbance of the liquid crystal alignment around the spacer, and the contrast of the image may be lowered. It was.

On the other hand, Patent Documents 1, 2, and 3 disclose a method of arranging spacer fine particles using a photolithography technique above a black matrix that does not transmit light. According to these methods, since the spacer fine particles are not present in the colored pixel portion, the display image quality is excellent.
However, conventionally, in the manufacture of liquid crystal display panels, it is necessary to perform a photolithography process at least four times in order to form colored pixels such as black matrix, R, G, B, etc., which are disclosed in Patent Documents 1, 2, and 3. In this method, in order to place and fix the spacer fine particles above the black matrix, it is necessary to perform a further photolithography process, so that the number of photolithography processes is very large, the work becomes very complicated, and the manufacturing process takes a long time. Was necessary.

Japanese Patent Laid-Open No. 9-160009 Japanese Patent Laid-Open No. 10-115066 JP 2000-180866 A

In light of the above-mentioned present situation, the present invention provides a photocurable black matrix capable of easily producing a liquid crystal display panel excellent in display screen quality without light leakage or display unevenness in the production of a liquid crystal display panel. An object of the present invention is to provide a resin composition for a liquid crystal display, a method for producing a substrate for a liquid crystal display panel using the photocurable resin composition for a black matrix, a black matrix, and a liquid crystal display panel.

The present invention is a photocurable black matrix resin composition containing a resist component, a black matrix colorant, and spacer fine particles.
The present invention is described in detail below.

The resin composition for photocurable black matrix of the present invention (hereinafter also referred to as the photocurable resin composition of the present invention) contains spacer fine particles.
The raw material of the spacer fine particles is not particularly limited, and examples thereof include those similar to those conventionally used as spacer fine particles for liquid crystal display panels.

Moreover, it is preferable that the spacer fine particles used for the photocurable resin composition of the present invention have high affinity for a resist component described later or can be chemically bonded. As will be described in detail later, when a liquid crystal display panel is manufactured using the photocurable resin composition of the present invention, the spacer fine particles are fixed in a state of being partially buried in the black matrix. An alignment film is applied on the fixed black matrix and subjected to a rubbing treatment. If the spacer fine particles and the resist component have a high affinity or are capable of chemical bonding, the spacer fine particles are firmly fixed to the solidified black matrix. Therefore, the spacer fine particles are removed by the rubbing process. And misalignment are less likely to occur.

In the photocurable resin composition of the present invention, the spacer fine particles are preferably light-shielding fine particles. Since the black matrix formed using the photocurable resin composition of the present invention exists in a state in which a part of the spacer fine particles are buried, the spacer fine particles are transparent and light-transmitting fine particles. Light leakage may occur from the spacer fine particle portions, and the display quality of the screen of the liquid crystal display panel to be manufactured may be deteriorated.

The light shielding fine particles are not particularly limited, but are preferably fine particles colored with a dye or pigment, and particularly preferably fine particles colored with a black pigment.

The size of the spacer fine particles is not particularly limited and is appropriately selected according to the cell gap of the liquid crystal display panel, but the resist thickness is larger than the particle size of those conventionally selected as the spacer fine particles according to the cell gap. It is preferable that the average particle size is large by the amount. Specifically, the preferred lower limit is 3 μm and the preferred upper limit is 10 μm. If it is less than 3 μm, the spacer fine particles as a whole are buried in the black matrix, or the height of the spacer fine particles becomes lower than the height of the colored pixels such as R, G, B, etc. Sometimes. If it exceeds 10 μm, the produced liquid crystal display panel may be too thick. A more preferable lower limit is 5 μm, and a more preferable upper limit is 8 μm.

The spacer fine particles are preferably uniform in size, and specifically, the CV value of the particle diameter of the spacer fine particles is preferably 10% or less. If it exceeds 10%, when a liquid crystal display panel is produced using the photocurable resin composition of the present invention, the liquid crystal display panel substrate and the counter substrate are not fixed in parallel, and the quality of the display screen is inferior. Sometimes.

In the photocurable resin composition of the present invention, the content of the spacer fine particles is not particularly limited, but a preferable lower limit is 0.01 parts by weight and a preferable upper limit is 10 parts by weight with respect to 100 parts by weight of a resist component described later. It is. When the amount is less than 0.01 part by weight, a sufficient amount of spacer fine particles are not present in the black matrix to be formed, and the distance between the liquid crystal display panel substrate and the counter substrate is fixed in parallel in the manufacture of the liquid crystal display panel. It may not be possible. When the amount exceeds 10 parts by weight, the amount of the spacer fine particles present in the black matrix to be formed becomes excessive, and the spacer fine particles may be laminated in layers. A more preferred lower limit is 0.1 parts by weight, and a more preferred upper limit is 1 part by weight.

The photocurable resin composition of the present invention contains a resist component.
The resist component is not particularly limited as long as it is a resin that is cured by irradiation with actinic rays such as ultraviolet rays, but a compound having a bifunctional or higher unsaturated bond, an alkali-soluble polymer compound having a reactive functional group, and It is preferable to contain a photopolymerization initiator. This is because the pattern of the black matrix can be produced by irradiating the actinic ray such as ultraviolet rays.
Furthermore, you may add a thermal polymerization initiator in order to improve the sclerosis | hardenability of the photocurable resin composition of this invention.

The compound having a bifunctional or higher unsaturated bond is not particularly limited, and examples thereof include a polyfunctional vinyl monomer and an epoxy resin.

The polyfunctional vinyl monomer is not particularly limited, and examples thereof include divinylbenzene, 1,6-hexanediol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, and tetramethylolmethane tri (meth) acrylate. Tetramethylolpropane tetra (meth) acrylate, diallyl phthalate and isomers thereof, triallyl isocyanurate and derivatives thereof, trimethylolpropane tri (meth) acrylate and derivatives thereof, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) ) Acrylate, dipentaerythritol hexa (meth) acrylate and its derivatives, polyethylene glycol di (meth) acrylate such as ethylene glycol di (meth) acrylate, propylene Polypropylene glycol di (meth) acrylate such as recall di (meth) acrylate, polytetramethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, 1,3-butylene glycol di (meth) acrylate, 2,2- Bis [4- (methacryloxyethoxy) phenyl] propanedi (meth) acrylate, 2,2-hydrogenated bis [4- (acryloxypolyethoxy) phenyl] propanedi (meth) acrylate, 2,2-bis [4- ( Acryloxyethoxypolypropoxy) phenyl] propane di (meth) acrylate, diallyl phthalate and isomers thereof, triallyl isocyanurate and derivatives thereof, triallyl isocyanate, benzoguanamine and the like. These polyfunctional vinyl monomers may be used alone or in combination of two or more. In this specification, (meth) acrylate refers to acrylate or methacrylate.

The epoxy resin is not particularly limited. For example, bisphenol type epoxy resins such as bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol AD type epoxy resin, and bisphenol S type epoxy resin; phenol novolac type epoxy resin, cresol novolak Type epoxy resin novolac type epoxy resin; aromatic epoxy resin such as trisphenol methane triglycidyl ether, and hydrogenated products and brominated products thereof. These epoxy resins may be used independently and 2 or more types may be used together.
Moreover, the said polyfunctional vinyl-type monomer and epoxy resin may be used independently, and may be used together.

As the compound having a bifunctional or higher unsaturated bond, a resin having an epoxy group and at least one (meth) acryl group in one molecule can also be used. Examples of such a resin having an epoxy group and a (meth) acryl group in one molecule include a (meth) acrylic acid-modified epoxy resin and a urethane-modified (meth) acrylic epoxy resin.
Examples of the (meth) acrylic acid-modified epoxy resin include novolak type epoxy resin, bisphenol type epoxy resin; biphenyl type epoxy resin, naphthalene type epoxy resin, tris (hydroxyphenyl) alkyl type epoxy resin, tetrakis (hydroxyphenyl) alkyl. And a partially (meth) acrylated type epoxy resin.
The urethane-modified (meth) acrylic epoxy resin is, for example, a method in which a polyol and a bifunctional or higher functional isocyanate are reacted, and further a (meth) acrylic monomer having a hydroxyl group and a glycidol are reacted therewith; It can be produced by a method of reacting a hydroxyl group-containing (meth) acrylic monomer or glycidol with the above isocyanate; a method of reacting an isocyanate group-containing (meth) acrylate with glycidol.

The minimum with preferable content of the said resist component in the photocurable resin composition of this invention is 20 weight%, and a preferable upper limit is 80 weight%. If it is less than 20% by weight, the curability is low, and it may not be cured even when irradiated with light. If it exceeds 80% by weight, the resulting cured product may be brittle. A more preferred lower limit is 30% by weight, and a more preferred upper limit is 60% by weight.

The alkali-soluble polymer compound having a reactive functional group is not particularly limited as long as it can be dissolved and removed by the alkali treatment after photocuring, for example, a conventional resin such as a resin having a carboxyl group in the side chain. A known alkali-soluble resin can be used.
When forming a black matrix using the photocurable resin composition of the present invention, an alkali development that removes an unexposed uncured portion from a cured product obtained by exposing and curing the photocurable resin composition of the present invention. In the processing step, it is important not to remove even the hardened portions that are desired to remain. Therefore, when the resist component is a polyfunctional vinyl monomer and / or epoxy resin, the alkali-soluble resin has a functional group such as an epoxy group or a polymerizable double bond so that it can be bonded to these. It is preferable to have. As such an alkali-soluble resin, among them, a segment A having a carboxyl group in the side chain, a segment B in which a group having a polymerizable double bond is bonded to the side chain via an ester bond, and nonionic The copolymer comprising the segment C is particularly suitable because it has excellent alkali solubility and storage stability and is extremely easy to produce. Examples of the segment B of the alkali-soluble resin include those represented by the following general formula (1).

In formula (1), R ¹ and R ² represent H or CH ₃ , and X represents an alkyl ether such as —CH—O—CH ₂ — or —CH ₂ —O—C (═O) —, an alkyl Ester, ester, etc., such as ester group, novolak resin, bisphenol group, biphenyl group, naphthalene group and urethane group are represented.

The preferable lower limit of the composition ratio of the segment A in the alkali-soluble resin is 10% by weight, and the preferable upper limit is 30% by weight. If it is less than 10% by weight, the alkali solubility becomes low and may not be removed even by alkali treatment. If it exceeds 30% by weight, the alkali solubility becomes too high and dissolves to the cured part during the alkali treatment. May end up.
The minimum with the preferable composition ratio of the said segment B in the said alkali-soluble resin is 20 weight%. If it is less than 20% by weight, crosslinking by light irradiation is weak, and the cured part may be dissolved during alkali treatment. The upper limit is not particularly limited, but it is preferably 50% by weight or less so that the double bond can react without steric hindrance.

The method for producing the alkali-soluble resin is not particularly limited. For example, since it can be easily produced without self-condensation or the like, a vinyl-based polymerizable monomer having a carboxyl group and a nonionic polymerizable monomer A method is preferred in which a copolymer is prepared by copolymerizing the product, and the resulting copolymer is reacted with a compound having an epoxy group and a polymerizable double bond.

Examples of the vinyl polymerizable monomer having a carboxyl group constituting the segment A include acrylic acid, methacrylic acid, itaconic acid, fumaric acid, maleic acid and the like. These may be used independently and 2 or more types may be used together.

Examples of the nonionic polymerizable monomer constituting the segment C include styrene, acrylonitrile, methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, and (meth) acrylic acid. Polymerizable monomers having one polymerizable unsaturated bond in one molecule such as benzyl, glycidyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate; 2-hydroxyethyl (meth) acrylate, polyethylene glycol And hydrophilic monomers such as (meth) acrylate, (meth) acrylamide, and methylolacrylamide. These nonionic polymerizable monomers may be used alone or in combination of two or more.

As a blend of the vinyl polymerizable monomer having a carboxyl group and a nonionic polymerizable monomer in the copolymerization, a preferable lower limit of the vinyl polymerizable monomer is 30 parts by weight, A preferred upper limit is 80 parts by weight. If it is out of this range, an alkali-soluble resin having the above-described configuration may not be obtained.

A copolymer of the vinyl-based polymerizable monomer having the carboxyl group and the nonionic polymerizable monomer thus obtained, and a compound having an epoxy group and a polymerizable double bond are obtained. By reacting, the alkali-soluble resin can be synthesized without self-condensation. The segment B thus obtained is represented by the general formula (1).
Although it does not specifically limit as said reaction method, For example, the method of using basic catalysts, such as a trimethylamine, a triethylamine, a triphenylamine, etc. are mentioned. Preferably, a method of heating at 90 to 120 ° C. for 3 to 8 hours using these basic catalysts can be mentioned.

It does not specifically limit as a compound which has the said epoxy group and polymeric double bond, For example, the compound etc. which are represented by following formula (2) can be used.

In the formula (2), R ² represents H or CH ₃ , X is an alkyl ether such as —CH—O—CH ₂ — or —CH ₂ —O—C (═O) —, an alkyl ester group, Represents novolak resins, ethers such as bisphenol groups, biphenyl groups, naphthalene groups, urethane groups, esters, and the like.

Examples of the compound having an epoxy group and a polymerizable double bond include allyl glycidyl ether, glycidyl (meth) acrylate, 2-methylglycidyl (meth) acrylate, 3,4-epoxycyclohexyl (meth) acrylate, Mention may be made of epoxy group-containing esters such as (meth) acrylic acid 3,4-epoxybutyl; glycidyl ethers such as allyl glycidyl ether. Moreover, resin which has an epoxy group and a (meth) acryl group in 1 molecule, such as the above-mentioned (meth) acrylic acid modified epoxy resin and urethane modified (meth) acrylic epoxy resin, can also be used. By reacting the carboxyl group with an epoxy group, a double bond can be stably introduced into the alkali-soluble resin.

When the alkali-soluble polymer compound is the alkali-soluble resin, the preferable lower limit of the content of the alkali-soluble resin in the photocurable resin composition of the present invention is 30% by weight, and the preferable upper limit is 80% by weight. . If it is less than 30% by weight, the alkali developability may deteriorate, and if it exceeds 80% by weight, the film may be dissolved during alkali development. A more preferred lower limit is 40% by weight, and a more preferred upper limit is 65% by weight.

The photopolymerization initiator is not particularly limited, and examples thereof include benzophenone, 2,2-diethoxyacetophenone, benzyl, benzoyl isopropyl ether, benzyl dimethyl ketal, 1-hydroxycyclohexyl phenyl ketone, and thioxanthone. These photopolymerizable initiators may be used alone or in combination of two or more.

The minimum with preferable content of the said photoinitiator in the photocurable resin composition of this invention is 1 weight%, and a preferable upper limit is 15 weight%. If it is less than 1% by weight, the photocurable resin composition of the present invention may not be cured without photopolymerization. If it exceeds 15% by weight, the durability may be lowered or a liquid crystal display panel may be produced. The liquid crystal may be contaminated. A more preferred lower limit is 5% by weight, and a more preferred lower limit is 11% by weight.

The photocurable resin composition of the present invention contains a black matrix colorant.
The black matrix colorant is not particularly limited, and examples thereof include known black pigments conventionally used as black matrix colorants. By including such a black matrix colorant, the black matrix formed around the colored pixels of R, G, B, etc. using the photocurable resin composition of the present invention transmits light. The color contrast between the colored pixels is excellent.

The content of the colorant for the black matrix in the photocurable resin composition of the present invention is appropriately adjusted so that the black matrix to be formed has sufficient light-shielding properties, but the optical density (OD value) of the cured film Is preferably adjusted to be 2 or more. If the OD value is less than 2, the light blocking property of the black matrix to be formed becomes insufficient, and light omission and contrast between colored pixels may be lowered.

If necessary, the photocurable resin composition of the present invention is a silane coupling agent, a leveling agent, a polymerization inhibitor that does not interfere with photopolymerization such as hydroquinone or a derivative thereof, and a color that does not interfere with photopolymerization of dyes or pigments. An additive such as an agent may be contained.

The photocurable resin composition of the present invention may be used in a state dissolved or suspended in an organic solvent.
The organic solvent is not particularly limited, and examples thereof include a new aqueous organic solvent. Examples of such a new aqueous organic solvent include ethanol, n-propanol, 2-propanol, 1-butanol, 2-butanol, Monoalcohols such as 1-hexanol, 1-methoxy-2-propanol, furfuryl alcohol, tetrahydrofurfuryl alcohol; ethylene glycols such as ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol; propylene glycol, dipropylene glycol , Propylene glycols such as tripropylene glycol and tetrapropylene glycol; ethylene glycol and propylene glycol monomethyl ether, monoethyl ether, monoisopropyl ether Lower monoalkyl ethers such as ethylene, monopropyl ether and monobutyl ether; lower dialkyl ethers such as dimethyl ether, diethyl ether, diisopropyl ether and dipropyl ether of ethylene glycol and propylene glycol; ethylene glycol and propylene glycol Alkyl esters such as monoacetate and diacetate; 1,3-propanediol, 1,2-butanediol, 1,3-butanediol, 1,4-butanediol, 3-methyl-1,5-pentanediol, 3-hexene-2,5-diol, 1,5-pentanediol, 2,4-pentanediol, 2-methyl-2,4-pentanediol, 2,5-hexanediol, 1,6-hexanediol, neo Such as pentyl glycol Ols; ether derivatives of diols; acetate derivatives of diols; glycerin, 1,2,4-butanetriol, 1,2,6-hexanetriol, 1,2,5-pentanetriol, trimethylolpropane, trimethylol Polyhydric alcohols such as ethane and pentaerythritol; ether derivatives of polyhydric alcohols; acetate derivatives of polyhydric alcohols, dimethyl sulfoxide, thiodiglycol, N-methyl-2-pyrrolidone, N-vinyl-2- Pyrrolidone, γ-butyrolactone, 1,3-dimethyl-2-imidazolidine, sulfolane, formamide, N, N-dimethylformamide, N, N-diethylformamide, N-methylformamide, acetamide, N-methylacetamide, α-terpineol ,ethylene Boneto, propylene carbonate, bis -β- hydroxyethyl sulfone, bis -β- hydroxyethyl urea, N, N-diethylethanolamine, Abiechinoru, diacetone alcohol, urea, and the like.

Further, the viscosity of the photocurable resin composition of the present invention is appropriately determined in consideration of the coating method on the substrate, film uniformity during drying, drying efficiency, raw materials used, etc. It is preferable to adjust the photocurable resin composition of the invention to a viscosity that can be applied using a slit coater. If the viscosity is too low, a coating film cannot be formed, and a black matrix may not be formed. If the viscosity is too high, it may not be possible to form a coating having a uniform thickness.

The method for producing the photocurable resin composition of the present invention is not particularly limited, and examples thereof include a method of mixing the above-described resist component, black matrix colorant, spacer fine particles and the like by a conventionally known method. . At this time, in order to remove ionic impurities, it may be brought into contact with an ion-adsorbing solid such as a layered silicate mineral.

Since the photocurable resin composition of the present invention contains spacer fine particles, a black matrix is formed by coating on a substrate and performing a photolithography process, and part of the spacer fine particles are contained in the black matrix. Can be fixed in the buried state. That is, according to the photocurable resin composition of the present invention, the formation of the black matrix and the arrangement of the spacer fine particles can be performed simultaneously. In addition, since the spacer fine particles are present only in the black matrix portion through which light does not transmit, a liquid crystal display panel with excellent display screen quality can be easily manufactured.

A method for producing a liquid crystal display panel substrate using the photocurable resin composition of the present invention is also one aspect of the present invention.
The method for producing a substrate for a liquid crystal display panel of the present invention comprises a coating film forming step of coating the resin composition for a photocurable black matrix of the present invention on a substrate to form a coating film, and photopolymerization to the coating film. A photocuring step of irradiating an actinic ray that activates the initiator to crosslink the photocurable black matrix resin composition to obtain a photocured product, and an alkali development of the photocured product after the photocuring step And a developing step for forming a black matrix having a predetermined pattern.

In the method for producing a substrate for a liquid crystal display panel of the present invention, first, a coating film forming step is performed in which the photocurable black matrix resin composition of the present invention is coated on a substrate to form a coating film.

The method for coating the photocurable resin composition of the present invention on the substrate is not particularly limited. For example, a conventionally known method such as slot die, slit coater, gravure coater, spin coater, screen printing, flexographic printing, inkjet, etc. Coating, printing method and the like.

The thickness of the coating film is not particularly limited, but may be appropriately adjusted so that the thickness of the black matrix formed on the substrate for a liquid crystal display panel manufactured through a subsequent process is about 1 μm. preferable.

Next, the photocuring process which obtains a photocured material by irradiating the said coating film with the actinic ray which activates a photoinitiator and carrying out the crosslinking reaction of the said resin composition for photocurable black matrices is performed.

The means for irradiating the actinic ray for activating the photopolymerization initiator is not particularly limited. For example, a known high-pressure mercury lamp or the like can be used, and the irradiation intensity is not particularly limited. It is appropriately determined according to the type of photopolymerization initiator, the thickness of the coating film, and the like.
The mask used when irradiating the actinic ray may be a photomask that has been conventionally used for forming a black matrix by a photolithography process.

Next, the photocured product after the photocuring step is subjected to an alkali development to form a black matrix having a predetermined pattern.

It does not specifically limit as an alkaline solution used for the said alkali image development, For example, 0.2% tetramethylammonium hydroxide aqueous solution etc. are mentioned.
The conditions for the alkali development are not particularly limited, and are appropriately determined according to the resist component, alkali solution, and the like to be used.

In addition, in order to improve the sclerosis | hardenability of the said resin composition for photocurable black matrices, you may perform a heating process as needed.

By performing this development process, the photocurable resin composition and the spacer fine particles in the unexposed area are removed, and a black matrix having a predetermined pattern is formed in which the spacer fine particles are partially embedded on the substrate. The
Such a black matrix fixed with a part of the spacer fine particles buried therein is also one aspect of the present invention.

Colored pixels such as red (R), green (G), and blue (B) are formed at predetermined positions on a liquid crystal display panel substrate manufactured using the photocurable resin composition of the present invention by a photolithography process. Then, a transparent electrode such as ITO is formed thereon, and after removing or masking the ITO on the spacer fine particles, an alignment film is formed and a rubbing treatment or the like is performed as necessary. Then, a sealant is applied using a dispenser or the like so as to surround these areas, and liquid crystal is dropped onto the entire inner surface surrounded by the sealant, and the counter substrate is immediately overlaid, and a high pressure is applied to the sealant application part. A liquid crystal display panel in which a black matrix fixed in a state where a part of spacer fine particles are buried is interposed between opposing substrates by curing the sealant by irradiating ultraviolet rays using a mercury lamp or the like and liquid crystal annealing. Can be manufactured.
Such a liquid crystal display panel in which a black matrix fixed in a state where a part of spacer fine particles are buried is interposed between opposing substrates is also one aspect of the present invention.

According to the present invention, in the production of a liquid crystal display panel, a photocurable black matrix resin composition capable of easily producing a liquid crystal display panel with less display unevenness in the liquid crystal display and excellent display screen quality, The manufacturing method of the board | substrate for liquid crystal display panels using the resin composition for photocurable black matrices, a black matrix, and a liquid crystal display panel can be provided.

Hereinafter, the present invention will be described in more detail with reference to examples. However, the present invention is not limited to these examples.

(Example 1)
(1) Preparation of resist component 20 g of acrylic soluble resin (Vanaresin PSY-110: Shin-Nakamura Chemical Co., Ltd.), 15 g of bisphenol epoxy acrylate (Daicel UCB: EBECRYL 3700), 100 g of diethylene glycol dimethyl ether and Irgacure as a photopolymerization initiator A resist component was prepared by mixing 2 g of 907 (manufactured by Ciba Specialty Chemicals).

(2) Preparation of resin composition for photocurable black matrix 3 g of black pigment (manufactured by Cabot Specialty Chemicals, trade name “MONARCH460”) was added to 100 g of the obtained resist component, and the pigment was added to the pigment over 24 hours using a ball mill. Dispersion was performed. To this solution, 1 g of black spacer fine particles having a diameter of 4.5 μm (manufactured by Sekisui Chemical Co., Ltd., Micropearl KBN-5045) was added and dispersed by ultrasonic irradiation to obtain a photocurable black matrix resin composition.

(3) Manufacture of substrate for liquid crystal display panel The obtained photocurable black matrix resin composition was coated on a glass substrate using a slit coater, and then dried in a clean oven at 80 ° C. for 5 minutes. A coating film having a thickness of 1 μm was formed.
Next, a chromium-coated quartz mask having an opening having a diameter of 20 μm was placed on the coating film of the glass substrate on which the coating film was formed, and ultraviolet rays were irradiated with a high-pressure mercury lamp so that the exposure amount was 500 mJ / m ² .
Thereafter, the substrate was developed with a 0.2% tetramethylene ammonium hydroxide aqueous solution for 1 minute, and further washed with pure water for 1 minute. The obtained substrate was heated in a clean oven at 230 ° C. for 30 minutes to produce a liquid crystal display panel substrate on which a black matrix was formed.

(4) Manufacture of liquid crystal display panel Red (R), green (G), and blue (B) colored pixels are formed on the manufactured liquid crystal display panel substrate by a photolithography process, and then a thickness of 0 is formed thereon. A 15 μm ITO film (transparent electrode) was formed by sputtering.
Next, the ITO film formed on the spacer fine particles fixed to the black matrix was removed by etching to form a polyimide alignment film, and then rubbed as an alignment treatment.
Next, a sealant (manufactured by Sekisui Chemical Co., Ltd.) was applied around the black matrix and colored pixels with a dispenser so as to draw a rectangular frame.
Then, fine droplets of liquid crystal (manufactured by Chisso Co., Ltd., JC-5004LA) are dropped onto the entire surface of the sealant frame, and the counter substrate on which the electrodes are formed is immediately overlaid, and a high pressure mercury lamp is used for the sealant part. Was irradiated at 50 mW / cm ² for 60 seconds, and liquid crystal annealing was performed at 120 ° C. for 1 hour to thermally cure the sealant, thereby manufacturing a liquid crystal display panel in which spacer fine particles were fixed only on the black matrix portion.

(Evaluation)
The following evaluation was performed on the liquid crystal display panel substrate and the liquid crystal display panel obtained in Example 1.

(1) Observation of state of spacer fine particles The prepared liquid crystal display panel substrate was observed with a microscope. As a result, it was confirmed that the spacer fine particles were fixed substantially uniformly on the entire surface of the black matrix, and no spacer fine particles were observed at all other portions than the black matrix.

(2) Evaluation of the display state of the liquid crystal display panel The produced liquid crystal display panel was lit and displayed, and the display state was visually observed. As a result, no decrease in contrast or uneven color due to light leakage was observed.

According to the present invention, in the production of a liquid crystal display panel, there is no light leakage or display unevenness in the liquid crystal display, and a liquid crystal display panel excellent in display screen quality can be easily produced. Product, a method for producing a substrate for a liquid crystal display panel using the photocurable black matrix resin composition, a black matrix, and a liquid crystal display panel.

Claims (7)

A photocurable black matrix resin composition comprising a resist component, a black matrix colorant, and spacer fine particles. 2. The photocurable black matrix resin composition according to claim 1, wherein the spacer fine particles are light-shielding fine particles. 3. The photocurable black matrix resin composition according to claim 1, wherein the spacer fine particles have an average particle diameter of 3 to 10 [mu] m and a CV value of 10% or less. The resist component contains a compound having a bifunctional or higher unsaturated bond, an alkali-soluble polymer compound having a reactive functional group, and a photopolymerization initiator. Photocurable black matrix resin composition. A coating film forming step of coating the photocurable black matrix resin composition according to claim 1, 2, 3 or 4 on a substrate to form a coating film,
A photocuring step of irradiating the coating film with an actinic ray that activates a photopolymerization initiator to cause a cross-linking reaction of the photocurable black matrix resin composition to obtain a photocured product;
And a development step of forming a black matrix having a predetermined pattern by alkali development of the photocured product. A black matrix characterized in that a part of spacer fine particles is fixed in a buried state. A liquid crystal display panel, wherein a black matrix fixed in a state where a part of spacer fine particles is buried is interposed between opposing substrates.