JP2005148207A - Beam splitter - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To solve problems that wavelength dependency and polarization dependency are increased when a mirror film for transmitting/reflecting incident light is formed of a metal film such as an Au film in a beam splitter. <P>SOLUTION: A 1st mirror film 1 having a deposition area 5 for reflecting the incident light and a non-deposition area 6 for transmitting the incident light and a 2nd mirror film 2 for reflecting the light reflected by the 1st mirror film 1 are symmetrically arranged on both sides of the beam splitter by taking the diagonal surface 11 of the beam splitter as a reference, and the 1st mirror film 1 is arranged so that the incident angle of the light may be 22.5°. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a beam splitter used for an optical device such as an optical pickup device and a beam splitter used for signal branching in optical communication, and more particularly to a beam splitter with improved polarization dependency and wavelength dependency.

  In recent years, with the spread of multimedia, it is necessary to process various information from characters to images in large quantities and at high speed, and the storage capacity is much larger than conventional porcelain recording media while being compact in shape, In addition, the demand for optical discs such as CDs and DVDs capable of high-speed reading and writing is rapidly expanding. An optical pickup device is used as a device for reading digital signals such as audio and video written on the optical disc. A beam splitter used as an optical component of the optical pickup device has a function of separating incident light into two parts of transmitted light and reflected light. The beam splitter is required to be able to separate light with any polarization plane at a predetermined ratio, that is, to have low polarization dependency, and to separate light in a wide wavelength band with the recent increase in capacity. It is required to be able to do so, that is, to have small wavelength dependency. In optical communication, as a means for confirming the signal at the midpoint of the path, the signal is branched and monitored by a beam splitter. However, in a wavelength division multiplexing (WDM) system in which wavelengths such as C-band and L-band are wide, It is required that light having any polarization plane in a wide wavelength band can be separated at a predetermined ratio, that is, the wavelength dependency is small and the polarization dependency is small.

  FIG. 6 is a view for explaining the structure of a conventional beam splitter. The beam splitter 60 is a prism type beam splitter in which two triangular prisms are bonded. When incident light is incident on the mirror film 61 of the beam splitter 60, it is separated into transmitted light and reflected light at a predetermined ratio. The mirror film 61 is generally a multilayer film in which a thin film of a high refractive index material and a thin film of a low refractive index material are alternately superposed on the entire joint surface of the prism.

  In addition to the beam splitter in which the mirror film is formed of a multilayer film as described above, there is a beam splitter in which the mirror film is formed of a film formation region and a non-film formation region. FIG. 7 shows a three-dimensional view of the beam splitter. In the beam splitter 70, a mirror film 73 is formed by a non-film formation region 71 where a film is not formed and a film formation region 72 where a film is formed, and the non-film formation region 71 is patterned in a dot shape with respect to the film formation region 72. The light incident on the non-film formation region 71 is transmitted and the light incident on the film formation region 72 is reflected. The film formation region 72 is made of a metal film such as Au having a high reflectance, and the non-film formation region 71 is mainly formed by a lift-off method. In the beam splitter, the separation ratio between transmitted light and reflected light is determined by the area ratio of the non-film formation region 71, that is, the region that transmits incident light, and the film formation region 72, that is, the region that reflects incident light. Compared with a beam splitter in which a mirror film is formed of a multilayer film, the wavelength dependency is small, and since it is divided into transmitted light and reflected light at a constant ratio regardless of polarization, the polarization dependency can be reduced.

  By the way, in the case of the prism type beam splitter as described above, the incident angle of light is often 45 ° with respect to the mirror film. However, when the mirror film is formed of a metal film, the light is incident obliquely. There has been a problem that polarization dependence occurs in terms of physical properties.

In order to solve this problem, there has been proposed a beam splitter in which a mirror film is formed of a multilayer film of a TiO ₂ film and a SiO ₂ film in a beam splitter in which a mirror film is formed of a film formation region and a non-film formation region. However, there is a problem that the beam splitter cannot cope with a wavelength-division multiplexing (WDM) C-band (1525 to 1570 mm), L-band (1570 to 1630 mm), and other such wide-band wavelengths. Further, the film thickness d of the mirror film of the beam splitter is determined by n × d = λ / 4 × cos θ (n: refractive index, λ: wavelength of light, θ: incident angle), but the refraction of the TiO ₂ film. Since the rate is relatively small at 2.25, it is necessary to increase the film thickness. Therefore, in the process of forming the mirror film forming region and the non-film forming region, if the film thickness is large, the film in the non-film forming region cannot be removed well when the lift-off occurs, and the manufacturing yield deteriorates. There was a problem.
JP-A-7-218722

In a beam splitter in which a mirror film is composed of a film formation region and a non-film formation region, if the film formation region is formed of a metal film, the polarization dependence increases, and the film formation region is formed of a TiO ₂ film and a SiO ₂ film. If it is formed of a multilayer film, it cannot cope with the broadening of the wavelength, and the film thickness increases, so that the yield deteriorates and the manufacturing cost increases.

  In order to achieve the above object, the beam splitter according to claim 1 of the present invention has the first mirror film and the second mirror film arranged symmetrically on both sides with respect to the diagonal plane. In the beam splitter having a substantially square cross section, the first mirror film includes a film formation region and a non-film formation region, the film formation region reflects incident light, and the non-film formation region transmits incident light. The beam splitter has a function, and the second mirror film has a function of reflecting the reflected light from the first mirror film.

  According to a second aspect of the present invention, in the beam according to the first aspect, the first mirror film of the beam splitter is disposed so that an incident angle of light is 22.5 °. It is a splitter.

  The invention according to claim 3 is characterized in that the first mirror film of the beam splitter is formed of Au or a laminated film in which different dielectric films are alternately stacked. 2. The beam splitter according to 2.

  According to a fourth aspect of the present invention, in the first mirror film of the beam splitter, the non-film formation region is formed in a dot shape with respect to the film formation region. The beam splitter according to any one of the above.

The invention according to claim 5 is a beam splitter in which two triangular prism-shaped optical prisms are bonded together and a mirror film is formed on the joint surface. The mirror film is a multilayer film in which Si films and SiO ₂ films are alternately stacked. In addition, the beam splitter is a mirror film having a film formation region and a non-film formation region.

According to a sixth aspect of the present invention, in the beam splitter in which a mirror film is formed on the surface of a plate-type optical member, the mirror film is a multilayer film in which Si films and SiO ₂ films are alternately stacked. A beam splitter characterized by being a mirror film having a region and a non-deposition region.

  The invention according to claim 7 is characterized in that the mirror film of the beam splitter is formed of Au or a multilayer film in which different dielectric films are alternately stacked. It is a beam splitter.

  The invention according to claim 8 is the beam according to any one of claims 5 to 7, wherein the mirror film of the beam splitter is arranged so that an incident angle of light is 45 °. It is a splitter.

  According to a ninth aspect of the present invention, in the mirror film of the beam splitter, the non-film formation region is formed in a dot shape with respect to the film formation region. It is a beam splitter as described in above.

The invention according to claim 10, wherein the mirror film and a deposition region and the non-film-forming region of the beam splitter, the illumination area of the incident light S _L, the area of the non-film area S _N, mirror film Where P is the amount of light incident on the beam splitter, the amount of light T transmitted through the beam splitter and the amount of light R reflected are T = P × (S _N / S _L ) and R = P × (1−S _N / S _L ). The beam splitter according to claim 1, wherein the beam splitter is defined.

  Since the beam splitter according to the present invention has a polarization dependency and a wavelength dependency much smaller than those of the prior art, if the beam splitter of the present invention is used in an optical pickup device or an optical communication system device, an excellent effect can be obtained.

  Hereinafter, the present invention will be described in detail based on the embodiments shown in the drawings. 1A and 1B show a beam splitter according to a first embodiment of the present invention, in which FIG. 1A shows the principle of operation, and FIG. 1B shows a plan view of the mirror film 1 viewed from the incident direction of light. The beam splitter 10 is formed by bonding three optical glass members, and has a substantially square cross-sectional shape. Two mirror films 1 and 2 are disposed on the glass bonding surface at symmetrical positions with the diagonal plane 11 as a reference plane, and the mirror films 1 and 2 have angles A and B between the opposing glass surfaces. Both are arranged so that 22.5 °, that is, angle A + B = 45 °. As shown in FIG. 1B, the mirror film 1 is composed of a film-forming region 5 and a non-film-forming region 6, and the non-film-forming region 6 is patterned in a dot shape with respect to the film-forming region 5. Yes. The film-forming region 5 reflects incident light, and the non-film-forming region 6 has a function of transmitting incident light. Reflected light depends on the area ratio of the film-forming region 5 and the non-film-forming region 6. And the transmitted light separation ratio. The mirror film 2 is a dielectric multilayer film mirror and has a function of reflecting the reflected light from the mirror film 1. By disposing the mirror films 1 and 2 on the beam splitter 10 in this way, incident light is separated into transmitted light and reflected light at a predetermined ratio by the mirror film 1, and the transmitted light is linearly transmitted and reflected. The light is reflected by the mirror film 2 and emitted toward the vertically lower side.

  As a method of forming the film formation region 5 and the non-film formation region 6 of the mirror film 1, a lift-off method capable of accurately forming a fine pattern is optimal. FIG. 2 shows a manufacturing flowchart of the mirror film 1. First, a resist coating process for depositing a resist film 22 on the surface of the glass member 21 is performed (a), and a photolithography process for patterning the resist film 22 by performing exposure and development through a photomask is performed (b). After photolithography, a metal film 23 is formed on the glass member 21 and the resist film 22 (c), and the resist film 22 is peeled to form a mirror film having a film formation region and a non-film formation region (d). ). In this embodiment, gold (Au) having a high reflectance is used for the metal film 23.

  Here, the polarization dependence of the beam splitter was investigated. FIG. 3A shows the relationship between the P-polarized component reflectance Rp and the S-polarized component reflectance Rs with respect to the incident angle, and FIG. 3B shows the relationship between the polarization-dependent loss (PDL) with respect to the incident angle. . As can be seen from FIG. 3A, when the incident angle increases, the P-polarized component easily reflects and the S-polarized component hardly reflects. That is, the polarization dependence increases as the incident angle increases. Here, when the incident angle of the present invention is 22.5 ° and the conventional incident angle is 45 °, the reflectance of the P-polarized component and the S-polarized component is obtained when the incident angle is 45 °. Difference | Rp-Rs | is 1.37 (%), but when the incident angle is 22.5 °, | Rp-Rs | is 0.31 (%), which is about 1/4. I understand that That is, the polarization dependence is reduced to about 1/4 of the conventional one. As shown in FIG. 3B, the PDL is about 0.06 (dB) when the conventional incident angle is 45 °, whereas the incident angle is 22.5 °. It can be seen that it is about 0.015 (dB), which is about 1/4 of the conventional value.

  As described above, according to the first embodiment of the present invention, the mirror film including the film formation region and the non-film formation region so that the incident angle of light is 22.5 ° in the cubic beam splitter. Therefore, it is possible to provide a beam splitter in which the polarization dependency is significantly reduced as compared with the prior art.

Next, a beam splitter corresponding to the second embodiment of the present invention will be described. FIG. 4A is a diagram for explaining the beam splitter of the present embodiment. The beam splitter 30 is formed by bonding triangular prism-shaped optical prisms 31 and 32 having an angle C of 45 °, and a mirror film 33 on the joint surface. Is forming. The mirror film 33 includes a film formation region 35 and a non-film formation region 36, and the non-film formation region 36 is patterned in a dot shape with respect to the film formation region 35. The film-forming region 35 reflects incident light, and the non-film-forming region 36 has a function of transmitting incident light. Reflected light depends on the area ratio of the film-forming region 35 and the non-film-forming region 36. And the transmitted light separation ratio. FIG. 4 (b) shows a cross-sectional view of the mirror film 33, the mirror film 33 is a multilayer film alternately stacked and a SiO ₂ film 51 and the Si film 52 on the glass member. In the present example, 20 layers were sequentially laminated with a Si film of 128 mm and an SiO2 film of 400 mm, and the film formation region 35 and the non-film formation region 36 were formed by the lift-off method as in the first example.

Here, the wavelength dependence of the beam splitter was investigated. FIG. 5 shows the relationship between the P-polarized component reflectance Rp and the S-polarized component reflectance Rs with respect to the wavelength. FIG. 5A shows a beam splitter in which the mirror film according to the present embodiment is formed of a Si / SiO ₂ multilayer film. Characteristics (b) shows the characteristics of a conventional beam splitter in which a mirror film is made of Au. From this figure, when the mirror film is made of Au, the P-polarized component reflectance is about 98.6 (%) and the S-polarized component reflectance is about 97.2 (%), which causes a large reflection loss. the by forming at Si / SiO ₂ multilayer film, it can be seen P polarization component and S reflectance of the polarization component almost no reflection loss is up to about 100% over a wide band. Therefore, it has been found that the wavelength dependency can be reduced by forming the mirror film with a Si / SiO ₂ multilayer film as compared with the Au film.

Furthermore, the refractive index of the Si film of the Si / SiO2 multilayer film 3.2, the refractive index of the SiO ₂ film is large difference in refractive index of 1.44 and both the polarization dependence regardless of the incident angle smaller it can.

  The film thickness d of the mirror film of the beam splitter is determined by n × d = λ / 4 × cos θ (n: refractive index, λ: wavelength of light, θ: incident angle), and the Si film has a refractive index. Is relatively large at 3.2, so the film can be made thin. In the mirror film coating design, it is necessary to make the total film thickness as small as possible to reduce the mechanical stress in the film. In addition, also in the step of forming the film formation region and the non-film formation region on the mirror film, the smaller film thickness can easily lift off the film in the non-film formation region, which can greatly contribute to the improvement of the manufacturing yield.

  Although only the prism type beam splitter has been mentioned so far, it goes without saying that the present embodiment can be similarly applied to a plate type beam splitter.

As described above, according to the beam splitter of this embodiment, since the mirror film is formed of the Si / SiO ₂ multilayer film, the wavelength dependency and polarization dependency can be greatly reduced as compared with the conventional case, and the film thickness can be reduced. As a result, the production yield can be improved.

In the beam splitter in which the film formation region and the non-film formation region are configured on the mirror film as described above, the separation ratio of transmitted light and reflected light can be determined by the area ratio of the film formation region and the non-film formation region. it can. Here, when the irradiation area of the incident light is S _L , the area of the non-deposition region is S _N , and the light amount incident on the mirror film is P, the light amount T transmitted through the beam splitter and the light amount R reflected are expressed by the following equations: Can be expressed as:
T = P × (S _N / S _L ) (1)
R = P × (1−S _N / S _L ) (2)
According to the above formula, if the irradiation area S _{L of} incident light is determined, the separation ratio of transmitted light and reflected light can be arbitrarily set by adjusting the non-film-forming area S _N. When the separation ratio between the transmitted light and the reflected light is determined by the area ratio as described above, the separation ratio does not change when the wavelength changes. In addition, when the separation ratio of transmitted light and reflected light is set by the above method, the prism type beam splitter does not have polarization dependency, but the plate type beam splitter has a polarization dependency because the refractive index of the incident medium is different. Will occur. Therefore, when applied to a plate-type beam splitter, it is necessary to suppress the polarization dependency by forming an AR coat (antireflection film) on the base of the mirror film.

BRIEF DESCRIPTION OF THE DRAWINGS It is a figure explaining the beam splitter which concerns on 1st Example of this invention, Comprising: (a) An operation principle figure is shown, (b) shows the enlarged view of the mirror film | membrane seen from the incident direction of light. 1 shows a method of forming a mirror film having a film forming region and a non-film forming region of a beam splitter according to the present invention. It is a figure which shows the polarization dependence of the beam splitter which concerns on 1st Example of this invention, Comprising: (a) is the relationship between the reflectance of P polarization component with respect to an incident angle, and the reflectance of an S polarization component, (b) is relative to an incident angle. The relationship of PDL (polarization dependence loss) is shown. It is a figure explaining the beam splitter which concerns on the 2nd Example of this invention, Comprising: (a) An operation principle figure is shown, (b) shows sectional drawing of a mirror film | membrane. A graph showing the wavelength dependence of the beam splitter according to a second embodiment of the present invention, the characteristics of the case where the mirror film was formed by Si / SiO ₂ multilayer film (a), the mirror film (b) The characteristics when formed with an Au film are shown. It is a figure explaining the conventional prism type beam splitter. It is a figure explaining the beam splitter which comprised the film-forming area | region and the non-film-forming area | region in the conventional mirror film | membrane.

Explanation of symbols

1, 2: Mirror film 5: Film formation region 6: Non-film formation region 10: Beam splitter 21: Glass member 22: Resist film 23: Metal film 30: Beam splitter 31, 32: Triangular prism 33: Mirror film 35: Formation film region 36: non-film area 51: SiO ₂ film 52: Si film

Claims (10)

  In the beam splitter having a substantially square cross section in which the first mirror film and the second mirror film are arranged so as to be symmetrical on both sides with respect to the diagonal plane, the first mirror film is not formed on the film formation region. A film region, the film formation region reflects incident light, the non-film formation region has a function of transmitting incident light, and the second mirror film reflects light from the first mirror film. A beam splitter characterized by having a function of reflecting light.   2. The beam splitter according to claim 1, wherein the first mirror film of the beam splitter is arranged so that an incident angle of light is 22.5 °.   3. The beam splitter according to claim 1, wherein the first mirror film of the beam splitter is formed of Au or a multilayer film in which different dielectric films are alternately stacked.   4. The beam splitter according to claim 1, wherein the first mirror film of the beam splitter has the non-film formation region formed in a dot shape with respect to the film formation region. 5. In a beam splitter in which two triangular prismatic optical prisms are bonded and a mirror film is formed on the joint surface, the mirror film is a multilayer film in which Si films and SiO ₂ films are alternately stacked, and has a non-deposition area. A beam splitter characterized by being a mirror film having a film formation region. In the beam splitter in which a mirror film is formed on the surface of a plate-type optical member, the mirror film is a multilayer film in which Si films and SiO ₂ films are alternately stacked, and has a film formation area and a non-film formation area. A beam splitter characterized by being a mirror film.   7. The beam splitter according to claim 5, wherein the mirror film of the beam splitter is formed of Au or a multilayer film in which different dielectric films are alternately stacked.   The beam splitter according to any one of claims 5 to 7, wherein the mirror film of the beam splitter is arranged so that an incident angle of light is 45 °.   9. The beam splitter according to claim 5, wherein the mirror film of the beam splitter has the non-film formation area formed in a dot shape with respect to the film formation area. In the mirror film having the beam splitter film-forming region and the non-film-forming region, the incident light irradiation area is S _L , the non-film-forming region area is S _N , and the amount of light incident on the mirror film is P The amount of light T transmitted through the beam splitter and the amount of light R reflected are defined by T = P × (S _N / S _L ) and R = P × (1−S _N / S _L ). Item 10. A beam splitter according to any one of Items 1 to 9.

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