JP2005146043A - Anisotropic conductive adhesive - Google Patents
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- JP2005146043A JP2005146043A JP2003382549A JP2003382549A JP2005146043A JP 2005146043 A JP2005146043 A JP 2005146043A JP 2003382549 A JP2003382549 A JP 2003382549A JP 2003382549 A JP2003382549 A JP 2003382549A JP 2005146043 A JP2005146043 A JP 2005146043A
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- 239000000853 adhesive Substances 0.000 title claims abstract description 44
- 230000001070 adhesive effect Effects 0.000 title claims abstract description 43
- 239000003822 epoxy resin Substances 0.000 claims abstract description 40
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 40
- 239000002245 particle Substances 0.000 claims abstract description 39
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 20
- 239000002184 metal Substances 0.000 claims description 19
- 229910052751 metal Inorganic materials 0.000 claims description 19
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 18
- 230000005389 magnetism Effects 0.000 claims description 12
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 7
- 239000002923 metal particle Substances 0.000 claims description 7
- 229910001111 Fine metal Inorganic materials 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 6
- 239000000956 alloy Substances 0.000 claims description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 4
- 229920000877 Melamine resin Polymers 0.000 claims description 3
- 150000008065 acid anhydrides Chemical class 0.000 claims description 3
- 150000001412 amines Chemical class 0.000 claims description 3
- 239000002131 composite material Substances 0.000 claims description 3
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 claims description 3
- 150000004658 ketimines Chemical class 0.000 claims description 3
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 claims description 3
- 239000000155 melt Substances 0.000 abstract description 26
- 239000010410 layer Substances 0.000 description 64
- 229920005989 resin Polymers 0.000 description 21
- 239000011347 resin Substances 0.000 description 21
- 230000000052 comparative effect Effects 0.000 description 10
- 239000000843 powder Substances 0.000 description 9
- 239000000126 substance Substances 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 239000004593 Epoxy Substances 0.000 description 5
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 239000004020 conductor Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000003094 microcapsule Substances 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000012790 adhesive layer Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- -1 titanium ions Chemical class 0.000 description 2
- 241000132023 Bellis perennis Species 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 235000005633 Chrysanthemum balsamita Nutrition 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 239000002775 capsule Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
Landscapes
- Adhesives Or Adhesive Processes (AREA)
- Conductive Materials (AREA)
- Non-Insulated Conductors (AREA)
- Adhesive Tapes (AREA)
Abstract
【課題】 微細化するICチップや回路基板の電極接続を、信頼性の高い接続ができる異方導電性接着剤を提供する。
【解決手段】 エポキシ樹脂、硬化剤、導電性粒子及び一部硬化反応が進行したエポキシ樹脂硬化物を含み、その溶融粘度の最低値が50℃から200℃の範囲内で400Pa・s以上、50000Pa・s以下である導電性層と、該導電性層の少なくとも片側に積層され、その溶融粘度の最低値が、50℃から200℃の範囲内で前記導電性層が示す値の1/2以下である絶縁層を有することを特徴とする異方導電性接着剤である。使用する導電性粒子には、直鎖状あるいは針状のものが好ましい。
【選択図】 なしPROBLEM TO BE SOLVED: To provide an anisotropic conductive adhesive capable of highly reliable connection of electrodes of IC chips and circuit boards to be miniaturized.
SOLUTION: An epoxy resin, a curing agent, conductive particles, and a cured epoxy resin that has undergone a partial curing reaction, and a minimum melt viscosity of 400 Pa · s or more and 50000 Pa within a range of 50 ° C. to 200 ° C. A conductive layer that is less than or equal to s, and is laminated on at least one side of the conductive layer, and the minimum value of the melt viscosity is not more than 1/2 of the value that the conductive layer exhibits in the range of 50 ° C. to 200 ° C. An anisotropic conductive adhesive characterized by having an insulating layer. The conductive particles used are preferably linear or needle-shaped.
[Selection figure] None
Description
本発明は、高密度実装化する回路基板とICチップの接続等に用いられ、ファインピッチの回路においても電極間ショートしにくい異方導電性接着剤に関する。 The present invention relates to an anisotropic conductive adhesive that is used for connecting a circuit board and an IC chip to be mounted at high density, and that is less likely to cause a short circuit between electrodes even in a fine pitch circuit.
電子機器の軽量化、小型化に伴って、構成部品の小型化が急速に進行している。この結果、各部の回路(ピッチ)や電極間の距離が小さくなり、最近では十数μmにまで近接している。このような回路や電極を、ショートを起こさずに接合するためには、従来使用する異方性導電膜では困難になりつつある。 As electronic devices become lighter and smaller, component parts are rapidly becoming smaller. As a result, the circuit (pitch) of each part and the distance between the electrodes are reduced, and recently, they are close to a few tens of μm. In order to join such circuits and electrodes without causing a short circuit, it is becoming difficult to use an anisotropic conductive film conventionally used.
異方導電性接着剤には、一旦接着した後、接着剤が硬化等の固定化するものを使用する。そして、例えば、回路基板とICチップの電極を接続する等の操作においては、回路基板とICチップとの間に異方導電性接着剤を介在させ、加熱加圧により接続させる。この時に該異方導電性接着剤は流動するが、それと同時に接着剤中に含まれる導電性物質が流動する場合があり、ICと回路基板との電極間に介在して残るはずの導電性物質が接着剤と共に流動する場合がある。このような状況となると、前記電極間は導通不良となり、異方導電性接着剤の役割が果たせない。 As the anisotropic conductive adhesive, one that is once bonded and then fixed by hardening or the like of the adhesive is used. For example, in an operation such as connecting the circuit board and the electrode of the IC chip, an anisotropic conductive adhesive is interposed between the circuit board and the IC chip, and the circuit board and the IC chip are connected by heating and pressing. At this time, the anisotropic conductive adhesive flows, but at the same time, the conductive substance contained in the adhesive may flow, and the conductive substance that should remain between the electrodes of the IC and the circuit board. May flow with the adhesive. If it becomes such a situation, it will become poor conduction between the electrodes, and the role of an anisotropic conductive adhesive cannot be fulfilled.
この解決手段として導電性物質を含む層とその外側に絶縁性接着剤層とを設け、前記導電性物質を含む層の150℃における溶融粘度が100poise以上であり、該絶縁性接着剤層の150℃における溶融粘度が100poise未満である複層構造の多層異方導電性接着剤の開示がある(特許文献1参照)。このようにすることで、昇温すると、まず絶縁性接着剤層が溶融流動し、ICや回路基板等の電極周囲にある隙間を埋めることで、さらなる昇温により導電性粒子を含む層が流動する余地を減らすため、前記導電性粒子が流動による流れだしを防ぐことができるというものである。
しかし、特許文献1の手段でも十分な対応とは言えず、流動性においてさらなる解決手段が必要である。特に流動性が大きすぎると、所望の接着温度で異方導電性接着剤を使用する際に、接着剤が周囲に流れ出し、隣接する電極あるいは回路に影響を与える場合があるため、接着温度付近における樹脂の流動性をコントロールする必要があると考えられる。また、導電性物質を含む層の流動性と絶縁層の流動性においては、一定のバランスが必要である。 However, even the means of Patent Document 1 cannot be said to be sufficient, and further solution means is required in terms of fluidity. In particular, if the fluidity is too high, when using anisotropic conductive adhesive at the desired bonding temperature, the adhesive may flow out to the surroundings and affect adjacent electrodes or circuits. It is considered necessary to control the fluidity of the resin. In addition, a certain balance is required between the fluidity of the layer containing a conductive substance and the fluidity of the insulating layer.
本発明は前記概念を具現化した発明である。即ち、エポキシ樹脂、硬化剤、導電性粒子及び一部硬化反応が進行したエポキシ樹脂硬化物を含み、その溶融粘度の最低値が50℃から200℃の範囲内で400Pa・s以上、50000Pa・s以下である導電性層と、該導電性層の少なくとも片側に積層され、その溶融粘度の最低値が、50℃から200℃の範囲内で前記導電性層が示す値の1/2以下である絶縁層を有することを特徴とする異方導電性接着剤である。このように、導電性粒子を含む導電層である導電性層の流動性と、導電性物質を含まない絶縁層の流導性の関係が前記範囲にあれば、該異方導電性接着剤が加温され、流動した時点で、まず絶縁層が流動して電極間空間を埋め、その後の加温により、導電性物質を含む導電性層が流動する。このときは既に絶縁層が電極間空間を埋めて硬化過程にあり、導電性層が流動しても大きな流動は起こらない。そのバランスが絶縁層の50℃〜200℃における溶融粘度の最低値を、導電性層の50℃〜200℃における溶融粘度の最低値の1/2以下とした点である。 The present invention embodies the above concept. That is, it includes an epoxy resin, a curing agent, conductive particles, and a cured epoxy resin that has undergone a partial curing reaction, and the minimum value of the melt viscosity is within a range of 50 ° C. to 200 ° C. The conductive layer is laminated on at least one side of the conductive layer, and the minimum value of the melt viscosity is not more than ½ of the value indicated by the conductive layer in the range of 50 ° C. to 200 ° C. An anisotropic conductive adhesive comprising an insulating layer. Thus, if the relationship between the fluidity of the conductive layer, which is a conductive layer containing conductive particles, and the flow conductivity of the insulating layer containing no conductive substance are within the above range, the anisotropic conductive adhesive is At the time of heating and flowing, the insulating layer first flows to fill the space between the electrodes, and the subsequent heating causes the conductive layer containing the conductive material to flow. At this time, the insulating layer already fills the space between the electrodes and is in the curing process, and even if the conductive layer flows, no large flow occurs. The balance is that the minimum value of the melt viscosity of the insulating layer at 50 ° C. to 200 ° C. is ½ or less of the minimum value of the melt viscosity of the conductive layer at 50 ° C. to 200 ° C.
前記発明において、このような接着性をコントロールするには、特にエポキシ樹脂を用いるのが好ましく、流動性を調節する手段として、既に硬化が進行したエポキシ樹脂を加えているのが特徴である。このエポキシ樹脂硬化物は、エポキシ樹脂を一旦硬化した後、粉砕し、粉末状にして添加するのが好ましい。
また、導電性層に対し、絶縁層の50℃〜200℃における溶融粘度の最低値が1/2以上では、絶縁層が十分な流動が進まない状態で、導電性層の流動が始まるため、導電性層の流動範囲が大きくなり好ましくない。
そして、前記絶縁層の50℃〜200℃における溶融粘度の最低値が10Pa・s以上であると好ましい。10Pa・s未満であると、溶融時の流動性が良すぎるため、周囲へ絶縁層材料が流れ出しやすくなる。絶縁層に使用する樹脂も、接着性や、導電性層との相溶性の観点から、エポキシ樹脂を用いるのが好ましい。
In the invention, in order to control such adhesion, it is particularly preferable to use an epoxy resin, and as a means for adjusting fluidity, an epoxy resin that has already been cured is added. The cured epoxy resin is preferably added after the epoxy resin is once cured and then pulverized and powdered.
Further, with respect to the conductive layer, when the minimum value of the melt viscosity at 50 ° C. to 200 ° C. of the insulating layer is 1/2 or more, the flow of the conductive layer starts in a state where the insulating layer does not sufficiently flow, The flow range of the conductive layer is undesirably increased.
And it is preferable in the minimum value of the melt viscosity in 50 to 200 degreeC of the said insulating layer being 10 Pa.s or more. If it is less than 10 Pa · s, the fluidity at the time of melting is too good, so that the insulating layer material easily flows out to the surroundings. The resin used for the insulating layer is also preferably an epoxy resin from the viewpoint of adhesion and compatibility with the conductive layer.
前記エポキシ樹脂硬化物が、ビスフェノールA型、F型又はS型のエポキシ樹脂と、イミダゾール系、アミン系、ジシアンジアミド系、メラミン系、ケチミン系、酸無水物系及びフェノール系からなる群より選ばれる1種以上の硬化剤により一部硬化反応させたものであると、より好ましい。脂環式エポキシ樹脂は一般に耐熱性が不十分であり、フェノールノボラック型エポキシでは、溶媒への溶解性に劣るため、本発明では、前記ビスフェノール系エポキシ樹脂が好まれる。 The epoxy resin cured product is selected from the group consisting of a bisphenol A type, F type or S type epoxy resin and an imidazole type, amine type, dicyandiamide type, melamine type, ketimine type, acid anhydride type and phenol type 1 It is more preferable that it is a partly cured reaction with at least one type of curing agent. In general, the alicyclic epoxy resin is insufficient in heat resistance, and the phenol novolac type epoxy is poor in solubility in a solvent. Therefore, in the present invention, the bisphenol-based epoxy resin is preferred.
前記導電性粒子が、前記導電性層の厚み方向に配向されていると、隣り合う電極への回路間ショートが起こりにくく、非常に好ましい。
前記導電性粒子が、微細な金属粒が多数、直鎖状に繋がった形状、又は針形状であると、好ましい。このような形状の場合、特に前記配向性の操作を組み合わせることにより好ましい選択となる。
前記導電性粒子が、磁性を有する金属単体、磁性を有する2種類以上の合金、磁性を有する金属と他の金属との合金及び磁性を有する金属を含む複合体のいずれかであるものを選択すると、好ましい。これは、磁性を有する金属が、互いに引き合うことにより溶融流動時に導電性物質が電極間に挟まれた導電性物質に集合しやすいためである。また、磁力による配向操作ができるので好ましい。
It is very preferable that the conductive particles are oriented in the thickness direction of the conductive layer, because short circuit between adjacent electrodes hardly occurs.
It is preferable that the conductive particles have a shape in which a large number of fine metal particles are connected in a straight chain or a needle shape. In the case of such a shape, it becomes a preferable choice especially by combining the operations of the orientation.
When the conductive particles are selected from one of a simple metal having magnetism, two or more kinds of alloys having magnetism, an alloy of a metal having magnetism with another metal, and a composite containing a metal having magnetism ,preferable. This is because the metal having magnetism attracts each other so that the conductive material is likely to gather in the conductive material sandwiched between the electrodes during the melt flow. Further, it is preferable because an alignment operation by magnetic force can be performed.
導電性粒子が、微細な金属粒が多数、直鎖状に繋がった形状であり、その鎖の太さが50nm以上1μm以下であり、かつアスペクト比が10以上である粒子を50%以上含んでいると、好ましい。これは、導電性層で厚み方向に配向させておけば、厚み方向に加圧されても導電性層中で電極間に挟まれたときに、強固な導電回路形成ができる。
さらに、導電性層の厚みが、前記導電粒子の長さ以下であると、導電性層を突き抜けた状態で導電性粒子が存在するため、絶縁層が流動した時点で電極間に挟まれた状態となり、導電性層の流動においても、該導電性粒子が流動されずに残るので好ましい。
The conductive particles have a shape in which a large number of fine metal particles are connected in a straight chain, the thickness of the chain is 50 nm or more and 1 μm or less, and the particles have an aspect ratio of 10 or more and include 50% or more. It is preferable. If the conductive layer is oriented in the thickness direction, a strong conductive circuit can be formed when it is sandwiched between electrodes in the conductive layer even if it is pressurized in the thickness direction.
Furthermore, when the thickness of the conductive layer is equal to or less than the length of the conductive particles, the conductive particles exist in a state of penetrating the conductive layer, and therefore, the state sandwiched between the electrodes when the insulating layer flows Thus, even when the conductive layer flows, it is preferable because the conductive particles remain without flowing.
本発明になる異方導電性接着剤は、適度に調整された溶融流動性により、ファインピッチの回路基板や、ICチップ等の接着には導通性がよく、かつ隣り合う電極へのリークも抑えられた好適な異方導電性接着剤である。 The anisotropic conductive adhesive according to the present invention has good conductivity for bonding fine pitch circuit boards, IC chips and the like, and suppresses leakage to adjacent electrodes due to moderately adjusted melt fluidity. The preferred anisotropic conductive adhesive.
本発明になる異方導電接着剤は、導電性粒子を含む導電性層に用いるエポキシ樹脂に、その使用時における溶融粘度の最低値を高めるために、一部硬化反応が進行したエポキシ樹脂硬化物を加えたことに一つの特徴がある。 The anisotropic conductive adhesive according to the present invention is an epoxy resin cured product in which a curing reaction has partially progressed to an epoxy resin used for a conductive layer containing conductive particles in order to increase the minimum value of melt viscosity at the time of use. There is one feature in adding.
通常、ある温度範囲において、樹脂の溶融粘度の最低値を大きくしようとする場合は、低い温度で反応し始める硬化剤を用いるが、この場合、保存安定性が悪くなる。また、別の方策として、樹脂の分子量を高める手段も考えられるが、接着後の熱軟化点が低くなるため、十分な増粘効果が得られない。 Usually, in order to increase the minimum value of the melt viscosity of the resin in a certain temperature range, a curing agent that starts to react at a low temperature is used, but in this case, the storage stability is deteriorated. As another measure, a means for increasing the molecular weight of the resin is also conceivable. However, since the heat softening point after adhesion is lowered, a sufficient thickening effect cannot be obtained.
本発明は、予め導電性層の主材料となるエポキシ樹脂を予め硬化剤により反応させ、反応後の樹脂を溶剤に溶解するか、反応後の樹脂を粉砕してから溶剤に溶解することにより、高分子化された樹脂溶液を作製し、これに未反応のエポキシ樹脂と硬化剤と導電性粒子を加えることにより溶液を作製し、これをフィルム状に展延、乾燥するものである。このように作製されたフィルム状の導電性層は、加えるエポキシ樹脂硬化物の熱軟化温度が高く、又少量の添加量で、溶融粘度の最低値が大幅に高められるので、接着性にも影響を及ぼさない。
即ち、導電性層の50℃〜200℃における溶融粘度の最低値を、前記エポキシ樹脂硬化物の使用量により調節できることにより、異方導電性接着剤として合わせて用いられる絶縁層の50℃〜200℃における溶融粘度の最低値を適宜選択できることになる。
In the present invention, the epoxy resin as the main material of the conductive layer is reacted in advance with a curing agent, and the resin after the reaction is dissolved in a solvent, or the resin after the reaction is crushed and dissolved in the solvent, A polymerized resin solution is prepared, and an unreacted epoxy resin, a curing agent, and conductive particles are added thereto to prepare a solution, which is spread into a film and dried. The film-like conductive layer produced in this way has a high heat softening temperature of the epoxy resin cured product to be added, and the minimum melt viscosity value can be greatly increased with a small amount of addition, which also affects the adhesion. Does not affect.
That is, the minimum value of the melt viscosity at 50 ° C. to 200 ° C. of the conductive layer can be adjusted by the amount of the epoxy resin cured product used, so that the insulating layer used in combination as the anisotropic conductive adhesive has a temperature of 50 ° C. to 200 ° C. The minimum value of the melt viscosity at 0 ° C. can be selected as appropriate.
絶縁層に用いる樹脂の溶融粘度は低すぎると流動して基板上に展延し、不要な範囲にまで樹脂層を形成することになるため、10Pa・s以上あるものを選択するのが良い。
好ましくは、使用温度に合わせて溶融粘度の最低値を選択することになる。その後、導電性層に用いる樹脂の前記溶融粘度の最低値を調整し、絶縁層の溶融粘度より2倍以上の溶融粘度を有する樹脂配合とすればよい。
If the melt viscosity of the resin used for the insulating layer is too low, it will flow and spread on the substrate, and the resin layer will be formed to an unnecessary range. Therefore, it is preferable to select a resin having a viscosity of 10 Pa · s or more.
Preferably, the minimum value of the melt viscosity is selected according to the use temperature. Then, what is necessary is just to adjust the minimum value of the said melt viscosity of resin used for an electroconductive layer, and to make it the resin compound which has a melt viscosity 2 times or more than the melt viscosity of an insulating layer.
ここで使用するエポキシ樹脂硬化物を作製するには、エポキシ樹脂としてビスフェノールA型、F型又はS型のエポキシ樹脂を用いるのが好ましい。そして使用する硬化剤としては、イミダゾール系、アミン系、ジシアンジアミド系、メラミン系、ケチミン系、酸無水物系及びフェノール系からなる群より選ばれる1種以上を選択するのが良い。特にイミダゾール系が好ましく用いられる。 In order to produce the cured epoxy resin used here, it is preferable to use a bisphenol A type, F type or S type epoxy resin as the epoxy resin. And as a hardening | curing agent to be used, it is good to select 1 or more types chosen from the group which consists of an imidazole type | system | group, an amine type, a dicyandiamide type | system | group, a melamine type | system | group, a ketimine type | system | group, an acid anhydride type | system | group, and a phenol type. In particular, an imidazole system is preferably used.
また、本発明に用いるエポキシ樹脂としては、前記したエポキシ樹脂硬化物に用いるビスフェノール系樹脂を好適に用いることができる。また、硬化剤としては、前記したエポキシ樹脂硬化物に用いる硬化剤を用いることができるが、導電性粒子を混合した後、乾燥している間に硬化しては意味をなさないため、接着剤としての使用温度付近で反応する目的から、マイクロカプセル化してある硬化剤が好適に使用できる。硬化剤の種類は、前記したエポキシ硬化物で用いるイミダゾール系の硬化剤カプセルが好適に使用できる。 Moreover, as an epoxy resin used for this invention, the bisphenol-type resin used for the above-mentioned epoxy resin hardened | cured material can be used suitably. Moreover, as a hardening | curing agent, although the hardening | curing agent used for the above-mentioned epoxy resin hardened | cured material can be used, since it does not make sense when it hardens while drying after mixing electroconductive particle, it is an adhesive agent. For the purpose of reacting in the vicinity of the use temperature, a microencapsulated curing agent can be preferably used. As the kind of the curing agent, an imidazole-based curing agent capsule used in the above-described epoxy cured product can be suitably used.
一方、導電性粒子としては、金属粉末が使用できるが、好ましくは、微細な金属粒が多数、直鎖状に繋がった形状、又は針形状である、いわゆるアスペクト比が大きい形状を有するものが好ましい。
そして、これらの粒子は、導電性層を形成する時点で厚み方向にかけた磁場の中を通過させることにより、厚み方向に配向させて用いるのが好ましい。
従って、用いる金属粉末は、その一部に磁性金属が含まれるものが良く、磁性を有する金属単体、磁性を有する2種類以上の合金、磁性を有する金属と他の金属との合金及び磁性を有する金属を含む複合体のいずれかであるのが好ましい。
On the other hand, as the conductive particles, metal powder can be used, but preferably, a shape having a large number of fine metal particles, linearly connected, or a needle shape, a so-called aspect ratio large shape is preferable. .
These particles are preferably used by being oriented in the thickness direction by passing through a magnetic field applied in the thickness direction at the time of forming the conductive layer.
Accordingly, the metal powder to be used preferably contains a magnetic metal in part, and has a magnetic simple substance, two or more kinds of alloys having magnetism, an alloy of magnetism metal and another metal, and magnetism. It is preferably one of composites containing a metal.
特に好ましくは、導電性粒子が、微細な金属粒が多数、直鎖状に繋がった形状であり、その鎖の太さが50nm以上1μm以下であり、かつアスペクト比が10以上である粒子を50%以上含んでいるものが良い。鎖の太さが50nm未満であると、製造工程中の外力により、折れたりすると長さの効果を得ることができない。又、太さが1μmを超えると、大きな金属粒末となるため、分散性に影響する。アスペクト比が10未満では、膜厚方向に配向させる場合、配向の効果が少ない。
より好ましくは、導電性層の厚みが、前記導電粒子の長さ以下であるように、厚みを調整するとよい。若しくは所望の導電性層の厚みより長い鎖状の金属粉末を用いればよい。
前記する微細な金属が多数鎖状に繋がった形状を有する金属粉末は、3価のチタンイオンの存在下で4価のチタンイオンを還元剤として用い、クエン酸等をクラスターとして利用した湿式還元方法により、入手することができる。
Particularly preferably, the conductive particles have a shape in which a large number of fine metal particles are connected in a straight chain, the chain thickness is 50 nm or more and 1 μm or less, and the aspect ratio is 10 or more. What contains more than% is good. If the chain thickness is less than 50 nm, the length effect cannot be obtained if the chain is broken by an external force during the manufacturing process. On the other hand, when the thickness exceeds 1 μm, a large metal particle powder is produced, which affects the dispersibility. When the aspect ratio is less than 10, the orientation effect is small when the film is oriented in the film thickness direction.
More preferably, the thickness is adjusted so that the thickness of the conductive layer is equal to or less than the length of the conductive particles. Alternatively, a chain metal powder longer than the desired thickness of the conductive layer may be used.
The metal powder having a shape in which a number of fine metals are connected in a chain form is a wet reduction method using tetravalent titanium ions as a reducing agent in the presence of trivalent titanium ions and using citric acid or the like as a cluster. Can be obtained.
以上の組み合わせにより、本発明の異方導電性接着剤は、回路のピッチが十数μm程度の電子回路や、電極間に用いても、隣り合う電極間の電気抵抗も大きく、且つ接着対象電極間の導通抵抗は十分に小さいものとなる。 By the above combination, the anisotropic conductive adhesive of the present invention has a large electric resistance between adjacent electrodes even when it is used between an electronic circuit having a circuit pitch of about a dozen μm or between electrodes, and an electrode to be bonded. The conduction resistance between them is sufficiently small.
以下に実施例をあげるが、本発明は実施例に限定するものでもない。
(実施例)
(溶液の作製)導電性粒子としては3μmから15μmまでの長さ分布を有する直鎖状ニッケル粉末を用いた。導電性層の樹脂としては、2種のエポキシ樹脂〔JER(株)製、商品名エピコート1010(分子量約5500)および商品名エピコート828(分子量約380)〕を用い、硬化剤にはマイクロカプセル型硬化剤〔旭化成エポキシ(株)製商品名ノバキュアHX3941〕を用いた。以上の重量比が70/30/10の割合となるようにした。エポキシ樹脂硬化物としては、2種のエポキシ樹脂〔JER(株)製商品名エピコート1010(分子量約5500)および商品名エピコート1001(分子量約900)〕と、硬化剤としてイミダゾール系硬化剤〔四国化成工業(株)製商品名キュアゾール2MA−OK〕とを重量比で50/50/5の割合で混合し、200℃の恒温槽中で1時間加熱したものを用いた。
Examples are given below, but the present invention is not limited to the examples.
(Example)
(Preparation of Solution) As the conductive particles, linear nickel powder having a length distribution from 3 μm to 15 μm was used. As the resin for the conductive layer, two types of epoxy resins [manufactured by JER Corporation, trade name Epicoat 1010 (molecular weight about 5500) and trade name Epicoat 828 (molecular weight about 380)] are used, and the microcapsule type is used as the curing agent. A curing agent [trade name NOVACURE HX3941 manufactured by Asahi Kasei Epoxy Co., Ltd.] was used. The above weight ratio was set to a ratio of 70/30/10. The epoxy resin cured product includes two types of epoxy resins (trade name Epicoat 1010 (molecular weight about 5500) and trade name Epicoat 1001 (molecular weight about 900) manufactured by JER Corporation), and an imidazole-based curing agent [Shikoku Chemicals Co., Ltd. Industrial Co., Ltd. trade name Curesol 2MA-OK] was mixed at a weight ratio of 50/50/5 and heated in a thermostatic bath at 200 ° C. for 1 hour.
これらのエポキシ樹脂配合物とエポキシ硬化物とを80/20の割合で配合し、酢酸ブチル、メチルイソブチルケトン、トルエンの重量比55/25/20の混合溶媒に溶解、三本ロールを用いて混合し、樹脂濃度が40重量%である溶液を得た。
この溶液に、固形分の総量(Ni粉末+樹脂)に占める割合で表される金属充填率が、0.5体積%となるように前記Ni粉末を添加した後、遠心撹拌ミキサーを用いて撹拌することでNi粉末を均一に分散し、導電性層用の溶液を調製した。
別に、絶縁層用として、前記エポキシ樹脂硬化物と、Ni粉末を加えないエポキシ樹脂溶液を用意した。
These epoxy resin blends and epoxy cured products are blended at a ratio of 80/20, dissolved in a mixed solvent of butyl acetate, methyl isobutyl ketone and toluene in a weight ratio of 55/25/20, and mixed using a three-roll. A solution having a resin concentration of 40% by weight was obtained.
To this solution, the Ni powder was added so that the metal filling rate represented by the ratio of the total solid content (Ni powder + resin) was 0.5% by volume, and then stirred using a centrifugal stirring mixer. As a result, Ni powder was uniformly dispersed to prepare a solution for the conductive layer.
Separately, for the insulating layer, the cured epoxy resin and an epoxy resin solution to which Ni powder was not added were prepared.
(異方導電膜の作製)上記で調製した導電性層用の溶液を、離型処理したPETフィルム上にドクターナイフを用いて塗布した後、磁束密度100mTの磁場中、80℃で30分間、乾燥、固化させて、膜中の直鎖状粒子が磁場方向に配向した、厚さ12μmの導電性層を得た。この上に、前記絶縁層用溶液を塗布し、再び80℃で30分間、乾燥、固化させて、目的とする総厚みが25μmの異方導電性接着剤を作製した。 (Preparation of anisotropic conductive film) After applying the solution for the conductive layer prepared above onto a PET film subjected to a release treatment using a doctor knife, in a magnetic field with a magnetic flux density of 100 mT at 80 ° C for 30 minutes, After drying and solidifying, a conductive layer having a thickness of 12 μm in which the linear particles in the film were oriented in the magnetic field direction was obtained. The insulating layer solution was applied thereon, and again dried and solidified at 80 ° C. for 30 minutes to produce an anisotropic conductive adhesive having a target total thickness of 25 μm.
(溶融粘度の測定)前記導電性層用溶液の溶媒を、硬化反応が進行しないよう40℃真空下で除去、500μm厚のフィルムを作製し、粘弾性測定装置(レオメトリック社製ARES)を用いて50℃から200℃までの溶融粘度を測定し、その最低値を求めた。
同様に、前記絶縁槽用溶液の溶媒を、硬化反応が進行しないよう40℃真空下で除去、500μm厚のフィルムを作製し、粘弾性測定装置(レオメトリック社製ARES)を用いて50℃から200℃までの溶融粘度を測定し、その最低値を求めた。
得られた溶融粘度の最低値を表1に示す。
(Measurement of melt viscosity) The solvent of the solution for the conductive layer is removed under vacuum at 40 ° C. so that the curing reaction does not proceed, a 500 μm-thick film is produced, and a viscoelasticity measuring apparatus (ARES manufactured by Rheometric Co., Ltd.) is used. The melt viscosity from 50 ° C. to 200 ° C. was measured, and the minimum value was determined.
Similarly, the solvent of the solution for the insulating tank is removed under vacuum at 40 ° C. so that the curing reaction does not proceed, a film having a thickness of 500 μm is produced, and from 50 ° C. using a viscoelasticity measuring apparatus (ARES manufactured by Rheometric Co., Ltd.). The melt viscosity up to 200 ° C. was measured and the minimum value was determined.
Table 1 shows the lowest melt viscosity obtained.
(比較例1)
絶縁層の樹脂として、2種のエポキシ樹脂〔JER(株)製商品名エピコート1010(分子量約5500)および商品名エピコート828(分子量約380)〕と、硬化剤としてマイクロカプセル型硬化剤〔旭化成エポキシ(株)製商品名ノバキュアHX3941〕との重量比を95/5/5の割合で用いたこと以外は実施例と同様にして総厚みが25μmの異方導電性接着剤を作製した。この絶縁層は、導電性層の50℃〜200℃における溶融粘度の最低値に対して、同温度域における溶融粘度の最低値が、1/2を超える値となる。
(Comparative Example 1)
Two types of epoxy resins (trade name Epicoat 1010 (molecular weight about 5500) and trade name Epicoat 828 (molecular weight about 380) manufactured by JER) and microcapsule type curing agent [Asahi Kasei Epoxy Co., Ltd. An anisotropic conductive adhesive having a total thickness of 25 μm was produced in the same manner as in the example except that the weight ratio with the product name NOVACURE HX3941 manufactured by Co., Ltd. was used at a ratio of 95/5/5. In this insulating layer, the minimum value of the melt viscosity in the same temperature range exceeds 1/2 with respect to the minimum value of the melt viscosity at 50 ° C. to 200 ° C. of the conductive layer.
(比較例2)
導電性層の樹脂として、2種のエポキシ樹脂〔JER(株)製商品名エピコート1256(分子量約5万)および商品名エピコート828(分子量約380)〕と、硬化剤としてマイクロカプセル型硬化剤〔旭化成エポキシ(株)製商品名ノバキュアHX3941〕とを重量比で70/30/10の割合で用いた(エポキシ硬化物は添加していない)こと以外は実施例と同様にして総厚みが25μmの異方導電性接着剤を作製した。
(Comparative Example 2)
Two types of epoxy resins (trade name Epicoat 1256 (molecular weight of about 50,000) and trade name Epicoat 828 (molecular weight of about 380) manufactured by JER Corporation) as a resin for the conductive layer, and a microcapsule type curing agent [ Asahi Kasei Epoxy Co., Ltd. product name Novacure HX3941] was used at a ratio of 70/30/10 in weight ratio (no epoxy cured product added), and the total thickness was 25 μm. An anisotropic conductive adhesive was prepared.
(比較例3)
導電性層の樹脂として、2種のエポキシ樹脂〔JER(株)製エピコート1256(分子量約5万)および828(分子量約380)〕と、マイクロカプセル型硬化剤〔旭化成エポキシ(株)製ノバキュアHX3941〕とを重量比で70/30/10の割合で用いた(エポキシ硬化物は添加していない)こと、導電粒子として直径5μmの金メッキ樹脂粒子を用い、樹脂+導電性粒子を100とした時、10体積%添加したこと以外は実施例と同様にして総厚みが25μmの異方導電性接着剤を作製した。
(Comparative Example 3)
As the resin for the conductive layer, two kinds of epoxy resins [Epicoat 1256 (molecular weight of about 50,000) and 828 (molecular weight of about 380) manufactured by JER Co., Ltd.] and a microcapsule type curing agent [Novacure HX3941 manufactured by Asahi Kasei Epoxy Co., Ltd.] ] At a ratio of 70/30/10 by weight (no epoxy cured product added), gold-plated resin particles having a diameter of 5 μm were used as the conductive particles, and the resin + conductive particles were taken as 100. An anisotropic conductive adhesive having a total thickness of 25 μm was prepared in the same manner as in the example except that 10% by volume was added.
以上の実施例と比較例1〜3を異方導電性接着剤として性能評価した。
(抵抗評価)
幅15μm、長さ100μm、高さ16μmのAuメッキバンプが15μm間隔で700個配列されたICチップと、それと同じ線幅で透明導電回路(ITO)が形成されたガラス基板とを用意した。このICチップと回路基板との間に実施例、比較例で作製した異方導電性接着剤をはさみ、200℃に加熱しながら、1バンプ当たり30gfの圧力で15秒間加圧して接着させた。
そして、ITO電極、異方導電性接着剤とAuバンプとを介して導電接続された連続する480個の電極間の導体抵抗も含めた回路抵抗値を測定した。結果を表1に示す。
The above Examples and Comparative Examples 1 to 3 were evaluated as anisotropic conductive adhesives.
(Resistance evaluation)
An IC chip in which 700 Au plated bumps having a width of 15 μm, a length of 100 μm, and a height of 16 μm were arranged at intervals of 15 μm and a glass substrate on which a transparent conductive circuit (ITO) was formed with the same line width were prepared. The anisotropic conductive adhesives produced in Examples and Comparative Examples were sandwiched between the IC chip and the circuit board, and were heated and bonded at a pressure of 30 gf per bump for 15 seconds while being heated to 200 ° C.
And the circuit resistance value including the conductor resistance between the continuous 480 electrodes conductively connected through the ITO electrode, the anisotropic conductive adhesive and the Au bump was measured. The results are shown in Table 1.
(接着力評価)
幅15μm、長さ100μm、高さ16μmのAuメッキバンプが15μm間隔で700個配列されたICチップと、回路を形成していないITOガラス板とを用意した。このICチップとガラス板との間に実施例、比較例で作製した異方導電接着剤をはさみ、200℃に加熱しながら、1バンプ当たり30gfの圧力で15秒間加圧して接着させた。その後、シェア強度テスター(デイジー製2400PC)を用いて接着力を測定した。得られた結果を表1に示す。
(Adhesive strength evaluation)
An IC chip in which 700 Au plated bumps having a width of 15 μm, a length of 100 μm, and a height of 16 μm were arranged at intervals of 15 μm and an ITO glass plate on which no circuit was formed were prepared. The anisotropic conductive adhesives produced in Examples and Comparative Examples were sandwiched between the IC chip and the glass plate, and were heated and bonded at a pressure of 30 gf per bump for 15 seconds while being heated to 200 ° C. Thereafter, the adhesive strength was measured using a shear strength tester (2400PC manufactured by Daisy). The obtained results are shown in Table 1.
表1に示すように、本発明の一例である実施例は、異方導電性接着剤として使用した際に、接着力がよく、接続抵抗も小さい。比較例1は接着時における溶融粘度の最低値が導電性層の値の1/2より絶縁層のそれが大きくなったため、電極間の接続が好ましくなく、接続抵抗を大きくしている。導電性層にエポキシ樹脂硬化物を配合していない比較例2は、導電性層の溶融粘度を大きくするために、高分子のエポキシ樹脂を使用した結果、接着時の外観は良いが、接着力が低下し接触抵抗も大きくなっている。さらに、比較例3は、比較例2の結果に対比して、導電性層に使用する導電性粒子を直鎖状ニッケル粉末に代え、直径5μmの金めっきされた樹脂の粒子を用いたものである。50℃〜200℃における導電性層の溶融粘度の最低値は導電性粒子を多く含んだため大きくなるが、接着性には寄与度が減少するため、接着強度は低下する。また、溶融粘度の最低値が大きいため、導電粒子の流動性が好ましくなく、互いに接触しにくくなるため、接続抵抗も大きくなる。
以上のように、本発明になる異方導電性接着剤は、ファインピッチの回路基板やICチップの接続に信頼性のある接続をもたらすものである。とりわけ、導電性層に含まれる導電粒子を配向させることにより、その効果は向上する。
As shown in Table 1, when the example which is an example of the present invention is used as an anisotropic conductive adhesive, the adhesive strength is good and the connection resistance is also small. In Comparative Example 1, since the minimum value of the melt viscosity at the time of adhesion is that of the insulating layer is larger than ½ of the value of the conductive layer, the connection between the electrodes is not preferable, and the connection resistance is increased. In Comparative Example 2 in which the epoxy resin cured product is not blended in the conductive layer, the appearance at the time of adhesion is good as a result of using a polymer epoxy resin in order to increase the melt viscosity of the conductive layer. Decreases and the contact resistance increases. Further, in Comparative Example 3, in contrast to the result of Comparative Example 2, the conductive particles used in the conductive layer were replaced with linear nickel powder, and gold-plated resin particles having a diameter of 5 μm were used. is there. Although the minimum value of the melt viscosity of the conductive layer at 50 ° C. to 200 ° C. increases because it contains a large amount of conductive particles, the contribution to the adhesiveness decreases, so the adhesive strength decreases. In addition, since the minimum value of the melt viscosity is large, the fluidity of the conductive particles is not preferable, and it is difficult to contact each other, so that the connection resistance is increased.
As described above, the anisotropic conductive adhesive according to the present invention provides a reliable connection for the connection of fine pitch circuit boards and IC chips. In particular, the effect is improved by orienting the conductive particles contained in the conductive layer.
Claims (8)
Priority Applications (1)
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JP2003382549A JP2005146043A (en) | 2003-11-12 | 2003-11-12 | Anisotropic conductive adhesive |
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JP2003382549A JP2005146043A (en) | 2003-11-12 | 2003-11-12 | Anisotropic conductive adhesive |
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WO2007034801A1 (en) * | 2005-09-20 | 2007-03-29 | Sumitomo Electric Industries, Ltd. | Flexible printed wiring board and method for manufacturing same |
JP2007083213A (en) * | 2005-09-26 | 2007-04-05 | Sumitomo Electric Ind Ltd | Particle classifying device and adhesive containing particles classified by the device |
JP2007242872A (en) * | 2006-03-08 | 2007-09-20 | Sumitomo Electric Printed Circuit Inc | Multilayer printed wiring board, and manufacturing method thereof |
JP2010037389A (en) * | 2008-08-01 | 2010-02-18 | Sumitomo Electric Ind Ltd | Adhesive and electrode-connecting method using the same |
JP2010116530A (en) * | 2008-01-30 | 2010-05-27 | Yasuhara Chemical Co Ltd | Two-component reaction type hot melt resin composition and method of application thereof |
JP2010206233A (en) * | 2010-06-23 | 2010-09-16 | Sumitomo Electric Printed Circuit Inc | Multilayer printed wiring board and manufacturing method of the same |
WO2012046923A1 (en) * | 2010-10-08 | 2012-04-12 | 제일모직 주식회사 | Anisotropic conductive film |
US20120168213A1 (en) * | 2010-12-29 | 2012-07-05 | Young Woo Park | Anisotropic conductive film and apparatus including the same |
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CN108410388A (en) * | 2018-03-09 | 2018-08-17 | 太原氦舶新材料有限责任公司 | A kind of room temperature curing conducting resinl |
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EP1928218A1 (en) * | 2005-09-20 | 2008-06-04 | Sumitomo Electric Industries, Ltd. | Flexible printed wiring board and method for manufacturing same |
WO2007034801A1 (en) * | 2005-09-20 | 2007-03-29 | Sumitomo Electric Industries, Ltd. | Flexible printed wiring board and method for manufacturing same |
JP2007088055A (en) * | 2005-09-20 | 2007-04-05 | Sumitomo Electric Ind Ltd | Flexible printed wiring board and manufacturing method thereof |
EP1928218A4 (en) * | 2005-09-20 | 2009-12-02 | Sumitomo Electric Industries | FLEXIBLE PRINTED BOARD AND METHOD FOR MANUFACTURING THE SAME |
US8061527B2 (en) | 2005-09-26 | 2011-11-22 | Sumitomo Electric Industries, Ltd. | Grain classifying device and adhesive containing grains classified by the device |
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JP2007083213A (en) * | 2005-09-26 | 2007-04-05 | Sumitomo Electric Ind Ltd | Particle classifying device and adhesive containing particles classified by the device |
JP2007242872A (en) * | 2006-03-08 | 2007-09-20 | Sumitomo Electric Printed Circuit Inc | Multilayer printed wiring board, and manufacturing method thereof |
JP2010116530A (en) * | 2008-01-30 | 2010-05-27 | Yasuhara Chemical Co Ltd | Two-component reaction type hot melt resin composition and method of application thereof |
JP2010037389A (en) * | 2008-08-01 | 2010-02-18 | Sumitomo Electric Ind Ltd | Adhesive and electrode-connecting method using the same |
JP2010206233A (en) * | 2010-06-23 | 2010-09-16 | Sumitomo Electric Printed Circuit Inc | Multilayer printed wiring board and manufacturing method of the same |
WO2012046923A1 (en) * | 2010-10-08 | 2012-04-12 | 제일모직 주식회사 | Anisotropic conductive film |
US10141084B2 (en) | 2010-10-08 | 2018-11-27 | Cheil Industries, Inc. | Electronic device |
US20120168213A1 (en) * | 2010-12-29 | 2012-07-05 | Young Woo Park | Anisotropic conductive film and apparatus including the same |
CN102568656A (en) * | 2010-12-29 | 2012-07-11 | 第一毛织株式会社 | Double-layered anisotropic conductive film and apparatus including the same |
US9173303B2 (en) * | 2010-12-29 | 2015-10-27 | Cheil Industries, Inc. | Anisotropic conductive film and apparatus including the same |
KR20160059354A (en) * | 2014-11-18 | 2016-05-26 | 에이치엔에스하이텍 (주) | Anisotropic conductive adhesive film including nano-sized conductive particles |
WO2016080677A1 (en) * | 2014-11-18 | 2016-05-26 | 에이치엔에스하이텍(주) | Anisotropic conductive adhesive film comprising conductive nanoparticles |
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CN108410388A (en) * | 2018-03-09 | 2018-08-17 | 太原氦舶新材料有限责任公司 | A kind of room temperature curing conducting resinl |
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